Control circuit and etching vacuum system

Abstract

The present application provides a control circuit and an etching vacuum system, wherein the control circuit includes: a power supply module, an interlock control module, and a switch module; the interlock control module includes: a power supply control unit and a connection control unit; the output end of the connection control unit is respectively connected to the entrance carrier lock and the exit carrier lock of the plasma etcher; the power supply control unit is used to power on when the switch module is turned on and send an electromagnetic signal to the connection control unit; the connection control unit is used to form a loop between the output end of the connection control unit and the entrance carrier lock and the vacuum extraction device of the plasma etcher under the action of the electromagnetic signal, so as to connect the entrance carrier lock with the vacuum extraction device of the plasma etcher and disconnect the exit carrier lock from the vacuum extraction device of the plasma etcher. The present application can control the vacuum extraction process of the plasma etcher, thereby effectively avoiding the occurrence of atmospheric re-injection.

Description

Technical Field

[0001] The present application relates to the field of process manufacturing control technology, and in particular to a control circuit and an etching vacuum system. Background Art

[0002] In a plasma etcher, the inlet and outlet locks share the same pump and are vacuumed via two isolation valves. Specifically, when the plasma etcher is operating remotely, the outlet lock's isolation valve opens first to evacuate the device. If the outlet lock is not pumped to its bottom pressure, the inlet lock's isolation valve also opens. At this point, because the inlet lock is in atmospheric pressure and the outlet lock is in vacuum, a significant pressure differential exists between the two locks, causing atmospheric pressure from the inlet lock to flow back into the outlet lock. This can cause particles in the pipeline to be lifted, leading to product defects.

[0003] In the prior art, a pump can be added to the plasma etcher so that the inlet carrier lock and the outlet carrier lock each use a pump, thereby effectively avoiding a pressure difference between the two carrier locks and avoiding atmospheric back-injection, thereby ensuring product quality.

[0004] However, this method of preventing atmospheric backflow by adding a pump to the plasma etcher will generate additional operating costs, increase the difficulty of operating and maintaining the plasma etcher, and generate unnecessary noise. Summary of the Invention

[0005] The purpose of this application is to provide a control circuit and an etching vacuum system to address the deficiencies in the above-mentioned prior art, so as to solve the problems in the prior art of preventing atmospheric backflow, such as high cost, difficulty in operation and maintenance, and high noise.

[0006] To achieve the above objectives, the technical solutions adopted in the embodiments of the present application are as follows:

[0007] In a first aspect, an embodiment of the present application provides a control circuit, the control circuit comprising: a power module, an interlock control module, and a switch module;

[0008] The interlock control module includes: a power supply control unit and a connection control unit;

[0009] The first output end of the power module is connected to the first end of the power supply control unit, the second output end of the power module is connected to the input end of the switch module, and the output end of the switch module is connected to the second end of the power supply control unit;

[0010] The output end of the connection control unit is connected to the entrance carrier lock of the plasma etcher and the exit carrier lock of the plasma etcher respectively;

[0011] The power supply control unit is used to power on when the switch module is turned on and send an electromagnetic signal to the connection control unit;

[0012] The connection control unit is configured to form a loop between an output end of the connection control unit and the entrance carrier lock and a vacuum extraction device of the plasma etcher under the action of the electromagnetic signal, so as to connect the entrance carrier lock to the vacuum extraction device of the plasma etcher and disconnect the exit carrier lock from the vacuum extraction device of the plasma etcher;

[0013] Alternatively, a loop is formed between the output end of the connection control unit and the exit carrier lock and the vacuum extraction device of the plasma etcher to connect the exit carrier lock to the vacuum extraction device of the plasma etcher and disconnect the entrance carrier lock from the vacuum extraction device of the plasma etcher.

[0014] In a possible implementation, the connection control unit includes: a first switch and a second switch;

[0015] The first switch and the second switch each have three output terminals;

[0016] The first switch is connected to the entrance load lock, and the second switch is connected to the exit load lock.

[0017] In a possible implementation, the connection control unit is specifically configured to:

[0018] Under the action of the electromagnetic signal, the entrance carrier lock is connected to the vacuum extraction device of the plasma etcher through the two output ends of the first switch, and the entrance carrier lock is disconnected from the vacuum extraction device of the plasma etcher through the two output ends of the second switch;

[0019] Alternatively, under the action of the electromagnetic signal, the entrance carrier lock is disconnected from the vacuum extraction device of the plasma etcher through the two output ends of the first switch, and the entrance carrier lock is connected to the vacuum extraction device of the plasma etcher through the two output ends of the second switch;

[0020] In a possible implementation, the first switch includes: a first normally-open terminal, a first normally-closed terminal, and a first common terminal;

[0021] The first common end is connected to one end of the entrance carrier lock, and the first normally closed end is connected to the other end of the entrance carrier lock.

[0022] In a possible implementation, the second switch includes: a second normally-open terminal, a second normally-closed terminal, and a second common terminal;

[0023] The second common end is connected to one end of the exit carrier lock, and the second normally open end is connected to the other end of the entrance carrier lock.

[0024] In a possible implementation, the first switch includes: a first normally-open terminal, a first normally-closed terminal, and a first common terminal;

[0025] The first common end is connected to one end of the entry carrier lock, and the first normally open end is connected to the other end of the entry carrier lock.

[0026] In a possible implementation, the second switch includes: a second normally-open terminal, a second normally-closed terminal, and a second common terminal;

[0027] The second common end is connected to one end of the exit carrier lock, and the second normally closed end is connected to the other end of the entrance carrier lock.

[0028] In one possible implementation, the switch module includes a vacuum switch;

[0029] The vacuum switch is used to be turned on or off when the vacuum degree of the entrance carrier lock of the plasma etcher meets the preset vacuum degree condition;

[0030] Alternatively, the vacuum switch is used to be disconnected or connected when the vacuum degree of the outlet carrier lock of the plasma etcher meets a preset vacuum degree condition.

[0031] In a possible implementation, the third end of the power module is further connected to a power supply of the plasma etcher.

[0032] In a second aspect, another embodiment of the present application provides an etching vacuum system, which includes: the control circuit and plasma etcher described in any one of the first aspects.

[0033] The beneficial effects of the present application are as follows: by arranging a power supply module, an interlocking control module and a switch module in the control circuit, and arranging a power supply control unit and a connection control unit in the interlocking control module, the first output end of the power supply module is connected to the first end of the power supply control unit, the second output end of the power supply module is connected to the input end of the switch module, the output end of the switch module is connected to the second end of the power supply control unit, and the output end of the connection control unit is respectively connected to the entrance lock of the plasma etcher and the exit lock of the plasma etcher, so that the power supply control unit is powered on when the switch module is turned on, and sends an electromagnetic signal to the connection control unit, so that the connection control unit is connected to the entrance lock under the action of the electromagnetic signal. A loop is formed between the carrier lock and the vacuum extraction device of the plasma etcher to connect the inlet carrier lock to the vacuum extraction device of the plasma etcher and to disconnect the outlet carrier lock from the vacuum extraction device of the plasma etcher; alternatively, a loop is formed between the output end of the control unit and the outlet carrier lock and the vacuum extraction device of the plasma etcher to connect the outlet carrier lock to the vacuum extraction device of the plasma etcher and to disconnect the inlet carrier lock from the vacuum extraction device of the plasma etcher. This allows for controlling the vacuum extraction process of the plasma etcher, thereby effectively avoiding the occurrence of atmospheric re-injection. At the same time, it avoids the need to install a vacuum extraction device in the plasma etcher, reduces additional operating costs, and has the advantages of simple operation and easy maintenance. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following is a brief introduction to the drawings required for use in the embodiments. It should be understood that the following drawings only show certain embodiments of the present application and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without creative work.

[0035] Figure 1 A schematic diagram of adding a vacuum extraction device to a plasma etching machine in the prior art;

[0036] Figure 2 A schematic diagram of the structure of a control circuit provided in an embodiment of the present application;

[0037] Figure 3 A schematic diagram of a structure of a control unit connected to a control circuit provided in an embodiment of the present application;

[0038] Figure 4 A schematic structural diagram of a first switch in a control circuit provided in an embodiment of the present application;

[0039] Figure 5 A schematic diagram of the structure of a second switch in the control circuit provided in an embodiment of the present application;

[0040] Figure 6 Another structural diagram of the first switch in the control circuit provided in an embodiment of the present application;

[0041] Figure 7 Another structural diagram of the second switch in the control circuit provided in an embodiment of the present application;

[0042] Figure 8 A schematic diagram of the structure of a switch module in a control circuit provided in an embodiment of the present application;

[0043] Figure 9 A schematic structural diagram of the etching vacuum system provided in an embodiment of the present application. DETAILED DESCRIPTION

[0044] In order to make the purpose, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. It should be understood that the drawings in the present application only serve the purpose of illustration and description and are not used to limit the scope of protection of the present application. In addition, it should be understood that the schematic drawings are not drawn to scale. The flowcharts used in this application illustrate the operations implemented according to some embodiments of the present application. It should be understood that the operations of the flowcharts can be implemented out of sequence, and steps without logical context can be reversed or implemented simultaneously. In addition, those skilled in the art, under the guidance of the contents of this application, can add one or more other operations to the flowchart, or remove one or more operations from the flowchart.

[0045] In addition, the described embodiments are only a part of the embodiments of the present application, rather than all of the embodiments. The components of the embodiments of the present application generally described and shown in the drawings here can be arranged and designed in various configurations. Therefore, the following detailed description of the embodiments of the present application provided in the drawings is not intended to limit the scope of the claimed application, but merely represents selected embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without making creative work are within the scope of protection of the present application.

[0046] It should be noted that the term "comprising" will be used in the embodiments of the present application to indicate the existence of the features declared thereafter, but does not exclude the addition of other features.

[0047] In a plasma etcher, the inlet and outlet locks share the same pump and are vacuumed via two isolation valves. Specifically, when the plasma etcher is operating remotely, the outlet lock's isolation valve opens first to evacuate the device. If the outlet lock is not pumped to its bottom pressure, the inlet lock's isolation valve also opens. At this point, because the inlet lock is in atmospheric pressure and the outlet lock is in vacuum, a significant pressure differential exists between the two locks, causing atmospheric pressure from the inlet lock to flow back into the outlet lock. This can cause particles in the pipeline to be lifted, leading to product defects.

[0048] In order to prevent the phenomenon of atmospheric backflow in the plasma etcher, Figure 1 A schematic diagram of a vacuum extraction device installed in a plasma etching machine in the prior art, referring to Figure 1 As shown, in the prior art, a pump can be added to the plasma etcher so that the inlet carrier lock and the outlet carrier lock each use a pump, thereby effectively avoiding a pressure difference between the two carrier locks and avoiding atmospheric back-injection, thereby ensuring product quality.

[0049] However, this method of preventing atmospheric backflow by adding a vacuum extraction device to the plasma etcher will generate additional operating costs, increase the difficulty of operating and maintaining the plasma etcher, and generate unnecessary noise.

[0050] Based on the above problems, the embodiments of the present application propose a control circuit and an etching vacuum system, which provides a power supply module, an interlock control module and a switch module in the control circuit, and provides a power supply control unit and a connection control unit in the interlock control module, so as to connect the first output end of the power supply module to the first end of the power supply control unit, connect the second output end of the power supply module to the input end of the switch module, connect the output end of the switch module to the second end of the power supply control unit, and connect the output end of the connection control unit to the entrance lock and the exit lock of the plasma etcher respectively, so that the power supply control unit is powered on when the switch module is turned on, and sends an electromagnetic signal to the connection control unit, so that the connection ... A loop is formed between the output end of the control unit and the inlet carrier lock and the vacuum extraction device of the plasma etcher, so as to connect the inlet carrier lock with the vacuum extraction device of the plasma etcher and disconnect the outlet carrier lock from the vacuum extraction device of the plasma etcher; or, a loop is formed between the output end of the connection control unit and the outlet carrier lock and the vacuum extraction device of the plasma etcher, so as to connect the outlet carrier lock with the vacuum extraction device of the plasma etcher and disconnect the inlet carrier lock from the vacuum extraction device of the plasma etcher. The vacuum extraction process of the plasma etcher can be controlled, thereby effectively avoiding the occurrence of atmospheric back-injection phenomenon. At the same time, it avoids the installation of a vacuum extraction device in the plasma etcher, reduces additional operating costs, and has the advantages of simple operation and easy maintenance.

[0051] The control circuit provided in the embodiments of the present application is described in detail below in conjunction with multiple embodiments.

[0052] Figure 2 A schematic diagram of a control circuit according to an embodiment of the present application is provided. Figure 2 As shown, the control circuit includes: a power supply module, an interlock control module and a switch module.

[0053] Optionally, the power supply module is used to power the control circuit provided in the embodiment of the present application, and the interlock control module is used to interlock the vacuum extraction process of the entrance carrier lock and the exit carrier lock of the plasma etcher when the switch module is turned on.

[0054] The interlock control module includes: a power supply control unit and a connection control unit.

[0055] The first output end of the power module is connected to the first end of the power supply control unit, the second output end of the power module is connected to the input end of the switch module, and the output end of the switch module is connected to the second end of the power supply control unit.

[0056] Optionally, the first output end of the power module can be a positive pole, the positive pole of the power module is connected to the first end of the power supply control unit, and the second output end of the power module can be a negative pole, the negative pole of the power module is connected to the input end of the switch module.

[0057] Optionally, the first output end of the power module can be a negative pole, the negative pole of the power module is connected to the first end of the power supply control unit, and the second output end of the power module can be a positive pole, the positive pole of the power module is connected to the input end of the switch module.

[0058] The output end of the control unit is connected to an entrance carrier lock of the plasma etching machine and an exit carrier lock of the plasma etching machine respectively.

[0059] Optionally, the output end of the control unit is connected to the entrance chamber in the entrance carrier lock of the plasma etcher and the isolation valve in the entrance carrier lock to turn on or off the vacuum extraction process of the entrance carrier lock of the plasma etcher under the action of the power supply control unit.

[0060] Optionally, the output end of the control unit is connected to the outlet chamber in the outlet carrier lock of the plasma etcher and the isolation valve in the outlet carrier lock to disconnect or connect the vacuum extraction process of the outlet carrier lock of the plasma etcher under the action of the power supply control unit.

[0061] The power supply control unit is used to power on when the switch module is turned on and send an electromagnetic signal to the connection control unit.

[0062] Optionally, the power supply control unit may be an electromagnetic transmitting unit. Specifically, the power supply control unit may include a transmitting coil, which is powered on after the switch module is turned on, generates an AC electromagnetic signal, converts it into an electromagnetic field, and radiates it outward so that the connection control unit can receive the electromagnetic signal.

[0063] The connection control unit is used to form a loop between the output end of the connection control unit and the entrance carrier lock and the vacuum extraction device of the plasma etcher under the action of an electromagnetic signal, so as to connect the entrance carrier lock to the vacuum extraction device of the plasma etcher and disconnect the exit carrier lock from the vacuum extraction device of the plasma etcher; or, to form a loop between the output end of the connection control unit and the exit carrier lock and the vacuum extraction device of the plasma etcher, so as to connect the exit carrier lock to the vacuum extraction device of the plasma etcher and disconnect the entrance carrier lock from the vacuum extraction device of the plasma etcher.

[0064] Optionally, the connection control unit may include multiple magnetic switches, which can be turned on or off under the action of electromagnetic signals to form a loop between the output end of the connection control unit and the entrance carrier lock and the vacuum extraction device of the plasma etcher, thereby connecting the entrance carrier lock to the vacuum extraction device of the plasma etcher and disconnecting the exit carrier lock from the vacuum extraction device of the plasma etcher.

[0065] Optionally, multiple magnetic switches can also be turned on or off under the action of electromagnetic signals, forming a loop between the output end of the control unit and the exit carrier lock and the vacuum extraction device of the plasma etcher, thereby disconnecting the entrance carrier lock from the vacuum extraction device of the plasma etcher and connecting the exit carrier lock to the vacuum extraction device of the plasma etcher.

[0066] The vacuum extraction device may be a pump in a plasma etching machine.

[0067] In this embodiment, a power supply module, an interlock control module and a switch module are provided in the control circuit, and a power supply control unit and a connection control unit are provided in the interlock control module, so that the first output end of the power supply module is connected to the first end of the power supply control unit, the second output end of the power supply module is connected to the input end of the switch module, the output end of the switch module is connected to the second end of the power supply control unit, and the output end of the connection control unit is connected to the entrance lock and the exit lock of the plasma etcher respectively, so that the power supply control unit is powered on when the switch module is turned on, and sends an electromagnetic signal to the connection control unit, so that the connection control unit is connected to the entrance lock under the action of the electromagnetic signal. And a loop is formed between the vacuum extraction device of the plasma etcher to connect the inlet carrier lock with the vacuum extraction device of the plasma etcher and disconnect the outlet carrier lock from the vacuum extraction device of the plasma etcher; or, a loop is formed between the output end of the connection control unit and the outlet carrier lock and the vacuum extraction device of the plasma etcher to connect the outlet carrier lock with the vacuum extraction device of the plasma etcher and disconnect the inlet carrier lock from the vacuum extraction device of the plasma etcher. The vacuum extraction process of the plasma etcher can be controlled, thereby effectively avoiding the occurrence of atmospheric back-injection phenomenon. At the same time, it avoids the installation of a vacuum extraction device in the plasma etcher, reduces additional operating costs, and has the advantages of simple operation and easy maintenance.

[0068] Figure 3 A schematic diagram of a structure connecting a control unit in a control circuit provided in an embodiment of the present application.

[0069] In one possible implementation, refer to Figure 3 As shown, in Figure 2 On the basis of, the connection control unit includes: a first switch and a second switch.

[0070] The first switch and the second switch respectively have three output terminals. The first switch is connected to the entry carrier lock, and the second switch is connected to the exit carrier lock.

[0071] Optionally, both the first switch and the second switch may be magnetic switches, for example, the first switch being a normally closed magnetic switch and the second switch being a normally open magnetic switch. The first switch is configured to, under the control of the power supply control unit, enable or disable the vacuum extraction process of the entrance carrier lock of the plasma etcher, and the second switch is configured to, under the control of the power supply control unit, enable or disable the vacuum extraction process of the entrance carrier lock of the plasma etcher.

[0072] Optionally, the first switch may have three output ends, two of which are used to connect to the entry carrier lock, and the second switch may have three output ends, two of which are used to connect to the exit carrier lock.

[0073] Exemplarily, two of the three output ends of the first switch are used to connect to the entrance chamber in the entrance load lock and the isolation valve in the entrance load lock, and two of the three output ends of the second switch are used to connect to the exit chamber in the exit load lock and the isolation valve in the exit load lock.

[0074] By setting the first switch and the second switch in the connection control unit, the first switch and the second switch can control the entrance lock and the vacuum extraction process of the outlet of the plasma etcher, effectively avoiding the occurrence of atmospheric back-injection phenomenon, and also has the advantages of simple operation and easy maintenance.

[0075] In one possible implementation, continue to refer to Figure 3 As shown, the connection control unit is specifically used to:

[0076] Under the action of the electromagnetic signal, the entrance carrier lock and the vacuum extraction device of the plasma etcher are connected through the two output ends of the first switch, and the entrance carrier lock and the vacuum extraction device of the plasma etcher are disconnected through the two output ends of the second switch.

[0077] Optionally, when the plasma etcher is in remote operation state, when the outlet carrier lock is evacuated, after the outlet carrier lock evacuation process is completed, the connection control unit can, under the action of the electromagnetic signal, connect the entrance carrier lock with the vacuum extraction device of the plasma etcher through the two output ends of the first switch, and disconnect the entrance carrier lock from the vacuum extraction device of the plasma etcher through the two output ends of the second switch, thereby realizing the switching from the outlet carrier lock to the entrance carrier lock, so that the entrance carrier lock can be normally evacuated, thereby avoiding the pressure difference between the outlet carrier lock and the entrance carrier lock, and avoiding the generation of atmospheric back-injection.

[0078] Alternatively, under the action of the electromagnetic signal, the entrance carrier lock is disconnected from the vacuum extraction device of the plasma etcher through the two output ends of the first switch, and the entrance carrier lock is connected to the vacuum extraction device of the plasma etcher through the two output ends of the second switch.

[0079] Optionally, after the vacuum pumping process of the entrance carrier lock is completed, the connection control unit can disconnect the entrance carrier lock from the vacuum extraction device of the plasma etcher through the two output ends of the first switch under the action of the electromagnetic signal, and connect the entrance carrier lock to the vacuum extraction device of the plasma etcher through the two output ends of the second switch, thereby realizing the switching from the entrance carrier lock to the exit carrier lock, so that the exit carrier lock can be normally vacuumed again, thereby avoiding the pressure difference between the entrance carrier lock and the exit carrier lock, and avoiding the generation of atmospheric back-injection.

[0080] That is to say, the switch module can be turned on or off after the entrance carrier lock or the exit carrier lock is evacuated, so as to switch between the entrance carrier lock and the exit carrier lock, thereby ensuring that the plasma etcher can evacuate the entrance carrier lock and the exit carrier lock in a manner that does not generate atmospheric back-injection, and at the same time, it can also ensure the flexibility of switching between the entrance carrier lock and the exit carrier lock.

[0081] Figure 4 A schematic structural diagram of a first switch in a control circuit provided in an embodiment of the present application.

[0082] In one possible implementation, refer to Figure 4 As shown, in Figure 3 On the basis of, the first switch includes: a first normally-open terminal NO1, a first normally-closed terminal NC1 and a first common terminal C1.

[0083] The first common terminal C1 is connected to one end of the entry carrier lock, and the first normally closed terminal NC1 is connected to the other end of the entry carrier lock.

[0084] Optionally, continue with reference to Figure 4 As shown, the first common terminal C1 is connected to the inlet chamber of the inlet carrier lock, and the first normally closed terminal NC1 is connected to the isolation valve of the inlet carrier lock.

[0085] That is to say, in the control circuit provided in the embodiment of the present application, when the first normally closed terminal NC1 and the first common terminal C1 of the first switch are connected to the entrance carrier lock, the entrance carrier lock of the plasma etcher is turned on under the action of the first switch, so that the vacuum extraction device of the plasma etcher can perform vacuum extraction on the entrance carrier lock.

[0086] Figure 5 A schematic diagram of the structure of the second switch in the control circuit provided in an embodiment of the present application.

[0087] In one possible implementation, referring to Figure 5 As shown, in Figure 4 On the basis of, the second switch includes: a second normally-open terminal NO2, a second normally-closed terminal NC2 and a second common terminal C2.

[0088] The second common terminal C2 is connected to one end of the exit carrier lock, and the second normally open terminal NO2 is connected to the other end of the entry carrier lock.

[0089] Optionally, continue with reference to Figure 5 As shown, the second common end C2 is connected to the outlet chamber of the outlet carrier lock, and the second normally open end NO2 is connected to the isolation valve of the outlet carrier lock.

[0090] That is to say, in the control circuit provided in the embodiment of the present application, when the first normally closed terminal NC1 and the first common terminal C1 of the first switch are connected to the entrance carrier lock, the entrance carrier lock of the plasma etcher is turned on under the action of the first switch, and at the same time, the second common terminal C2 of the second switch is connected to one end of the exit carrier lock, and the second normally open terminal NO2 is connected to the other end of the entrance carrier lock. The exit carrier lock of the plasma etcher is disconnected under the action of the second switch, so that the vacuum extraction device of the plasma etcher can vacuum extract the entrance carrier lock without being affected by the exit carrier lock, effectively avoiding the occurrence of atmospheric re-injection. At the same time, it avoids the need to install a vacuum extraction device in the plasma etcher, reduces additional operating costs, and has the advantages of simple operation and easy maintenance.

[0091] It can be understood that the above is an exemplary description of the first connection method of connecting the control unit and the plasma etcher, and the following is an exemplary description of the second connection method of connecting the control unit and the plasma etcher.

[0092] Figure 6 Another structural schematic diagram of the first switch in the control circuit provided in an embodiment of the present application.

[0093] In one possible implementation, refer to Figure 6 As shown, in Figure 3 On the basis of, the first switch includes: a first normally-open terminal NO1, a first normally-closed terminal NC1 and a first common terminal C1.

[0094] The first common terminal C1 is connected to one end of the entry carrier lock, and the first normally open terminal NO1 is connected to the other end of the entry carrier lock.

[0095] Optionally, continue with reference to Figure 6 As shown, the first common terminal C1 is connected to the inlet chamber of the inlet carrier lock, and the first normally open terminal NO1 is connected to the isolation valve of the inlet carrier lock.

[0096] Optionally, in the control circuit provided in an embodiment of the present application, when the first normally-open terminal NO1 and the first common terminal C1 of the first switch are connected to the entrance carrier lock, the entrance carrier lock of the plasma etcher is disconnected under the action of the first switch, thereby enabling the vacuum extraction device of the plasma etcher to perform vacuum extraction on the exit carrier lock.

[0097] Figure 7 Another structural schematic diagram of the second switch in the control circuit provided in an embodiment of the present application.

[0098] In one possible implementation, refer to Figure 7 As shown, in Figure 6 On the basis of, the second switch includes: a second normally-open terminal NO2, a second normally-closed terminal NC2 and a second common terminal C2.

[0099] The second common terminal C2 is connected to one end of the exit carrier lock, and the second normally closed terminal NC2 is connected to the other end of the entrance carrier lock.

[0100] Optionally, continue with reference to Figure 7 As shown, the second common end C2 is connected to the outlet chamber of the outlet carrier lock, and the second normally closed end NC2 is connected to the isolation valve of the outlet carrier lock.

[0101] That is to say, in the control circuit provided in the embodiment of the present application, when the second normally closed terminal NC2 and the second common terminal C2 of the second switch are connected to the exit carrier lock, the exit carrier lock of the plasma etcher is turned on under the action of the second switch. At the same time, the first common terminal C1 of the first switch is connected to one end of the entrance carrier lock, and the first normally open terminal NO1 is connected to the other end of the entrance carrier lock. The entrance carrier lock of the plasma etcher is disconnected under the action of the first switch, so that the vacuum extraction device of the plasma etcher can vacuum extract the exit carrier lock without being affected by the entrance carrier lock, effectively avoiding the occurrence of atmospheric back-injection. At the same time, it avoids the need to install a vacuum extraction device in the plasma etcher, reduces additional operating costs, and has the advantages of simple operation and easy maintenance.

[0102] Figure 8 A schematic diagram of the structure of a switch module in a control circuit provided in an embodiment of the present application.

[0103] In one possible implementation, refer to Figure 8 As shown, in Figure 2 On the basis of the switch module includes a vacuum switch.

[0104] The vacuum switch is used to open or close when the vacuum degree of the inlet carrier lock of the plasma etcher meets the preset vacuum degree condition; or, the vacuum switch is used to open or close when the vacuum degree of the outlet carrier lock of the plasma etcher meets the preset vacuum degree condition.

[0105] Optionally, when the vacuum extraction device of the plasma etcher performs vacuum extraction on the entrance carrier lock of the plasma etcher, the vacuum switch can detect the vacuum degree of the entrance carrier lock of the plasma etcher, and disconnect when the vacuum degree of the entrance carrier lock of the plasma etcher meets the preset first vacuum degree condition, thereby enabling the exit carrier lock of the plasma etcher to be vacuum extracted.

[0106] Optionally, when the vacuum extraction device of the plasma etcher performs vacuum extraction on the outlet carrier lock of the plasma etcher, the vacuum switch can detect the vacuum degree of the entrance carrier lock of the plasma etcher, and be turned on when the vacuum degree of the entrance carrier lock of the plasma etcher meets the preset second vacuum degree condition, thereby enabling the entrance carrier lock of the plasma etcher to perform vacuum extraction.

[0107] Optionally, when the vacuum extraction device of the plasma etcher performs vacuum extraction on the outlet carrier lock of the plasma etcher, the vacuum switch can also detect the vacuum degree of the outlet carrier lock of the plasma etcher, so as to disconnect when the vacuum degree of the outlet carrier lock of the plasma etcher meets the preset first vacuum degree condition, thereby allowing the entrance carrier lock of the plasma etcher to be vacuum extracted.

[0108] Optionally, when the vacuum extraction device of the plasma etcher performs vacuum extraction on the entrance carrier lock of the plasma etcher, the vacuum switch can also detect the vacuum degree of the exit carrier lock of the plasma etcher, so as to be turned on when the vacuum degree of the exit carrier lock of the plasma etcher meets the preset first vacuum degree condition, thereby allowing the exit carrier lock of the plasma etcher to be vacuum extracted.

[0109] By arranging a vacuum switch in the switch module, the vacuum switch can be turned on or off when the vacuum degree of the entrance carrier lock of the plasma etcher meets the preset vacuum degree conditions; or, the vacuum switch can be turned on or off when the vacuum degree of the exit carrier lock of the plasma etcher meets the preset vacuum degree conditions, which can ensure that the plasma etcher can evacuate the entrance carrier lock and the exit carrier lock in a manner that does not generate atmospheric back-injection, and at the same time, it can also ensure the flexibility of switching between the entrance carrier lock and the exit carrier lock.

[0110] In a possible implementation, the third end of the power module is also connected to a power supply of the plasma etcher.

[0111] Optionally, the third end of the power module is also connected to the power supply of the plasma etcher so that the power supply of the plasma etcher can supply power to the power module in the control circuit provided in the embodiment of the present application, which can simplify the wiring and reduce the need for additional power conversion or isolation components, thereby reducing the total cost of the control circuit provided in the embodiment of the present application to a certain extent.

[0112] Based on the same inventive concept, the embodiment of the present application also provides an etching vacuum system. Figure 9 A schematic diagram of the structure of the etching vacuum system provided in the embodiment of the present application, referring to Figure 9 As shown, the etching vacuum system includes: the above-mentioned control circuit and a plasma etcher.

[0113] Optionally, the control circuit is connected to the plasma etcher.

[0114] For descriptions of the processing flow of each module in the control circuit and the interaction flow between each module, reference can be made to the relevant descriptions in the above control circuit embodiment, which will not be described in detail here.

[0115] The above is only a specific implementation method of the present application, but the protection scope of the present application is not limited thereto. Any technician familiar with this technical field can easily think of changes or replacements within the technical scope disclosed in this application, which should be covered by the protection scope of the present application.

Claims

1. A control circuit, characterized in that: include: Power supply module, interlock control module and switch module; The interlock control module includes: a power supply control unit and a connection control unit; The first output end of the power module is connected to the first end of the power supply control unit, the second output end of the power module is connected to the input end of the switch module, and the output end of the switch module is connected to the second end of the power supply control unit; The output end of the connection control unit is connected to the entrance carrier lock of the plasma etcher and the exit carrier lock of the plasma etcher respectively; The power supply control unit is used to power on when the switch module is turned on and send an electromagnetic signal to the connection control unit; The connection control unit is configured to form a loop between an output end of the connection control unit and the entrance carrier lock and a vacuum extraction device of the plasma etcher under the action of the electromagnetic signal, so as to connect the entrance carrier lock to the vacuum extraction device of the plasma etcher and disconnect the exit carrier lock from the vacuum extraction device of the plasma etcher; Alternatively, a loop is formed between the output end of the connection control unit and the exit carrier lock and the vacuum extraction device of the plasma etcher to connect the exit carrier lock to the vacuum extraction device of the plasma etcher and disconnect the entrance carrier lock from the vacuum extraction device of the plasma etcher.

2. The control circuit according to claim 1, wherein: The connection control unit includes: a first switch and a second switch; The first switch and the second switch each have three output terminals; The first switch is connected to the entrance load lock, and the second switch is connected to the exit load lock.

3. The control circuit according to claim 2, characterized in that: The connection control unit is specifically used for: Under the action of the electromagnetic signal, the entrance carrier lock is connected to the vacuum extraction device of the plasma etcher through the two output ends of the first switch, and the entrance carrier lock is disconnected from the vacuum extraction device of the plasma etcher through the two output ends of the second switch; Alternatively, under the action of the electromagnetic signal, the entrance carrier lock is disconnected from the vacuum extraction device of the plasma etcher through the two output ends of the first switch, and the entrance carrier lock is connected to the vacuum extraction device of the plasma etcher through the two output ends of the second switch.

4. The control circuit according to claim 2, characterized in that: The first switch includes: a first normally open terminal, a first normally closed terminal and a first common terminal; The first common end is connected to one end of the entrance carrier lock, and the first normally closed end is connected to the other end of the entrance carrier lock.

5. The control circuit according to claim 4, characterized in that: The second switch includes: a second normally open end, a second normally closed end, and a second common end; The second common end is connected to one end of the exit carrier lock, and the second normally open end is connected to the other end of the entrance carrier lock.

6. The control circuit according to claim 2, characterized in that: The first switch includes: a first normally open terminal, a first normally closed terminal and a first common terminal; The first common end is connected to one end of the entry carrier lock, and the first normally open end is connected to the other end of the entry carrier lock.

7. The control circuit according to claim 6, characterized in that: The second switch includes: a second normally open end, a second normally closed end, and a second common end; The second common end is connected to one end of the exit carrier lock, and the second normally closed end is connected to the other end of the entrance carrier lock.

8. The control circuit according to claim 1, wherein: The switch module includes a vacuum switch; The vacuum switch is used to be turned on or off when the vacuum degree of the entrance carrier lock of the plasma etcher meets the preset vacuum degree condition; Alternatively, the vacuum switch is used to be disconnected or connected when the vacuum degree of the outlet carrier lock of the plasma etcher meets a preset vacuum degree condition.

9. The control circuit according to claim 1, wherein: The third end of the power module is also connected to the power supply of the plasma etcher.

10. An etching vacuum system comprising: The control circuit and plasma etcher according to any one of claims 1 to 9.

Images