Color filter and forming method thereof

Abstract

The invention discloses a color filter and a forming method thereof. The color filter comprises a light-transmitting substrate; the black matrix layer is located on the light-transmitting substrate, a plurality of single-color openings which are arranged in an array mode are formed in the black matrix layer, the single-color openings comprise a first opening, a second opening and a third opening, and the single-color openings are exposed out of the light-transmitting substrate; the first light filtering layer is located on the black matrix layer, a fourth opening is formed in the first light filtering layer, the first opening is filled with the first light filtering layer, and the fourth opening exposes the second opening and the third opening; the second filter layer is positioned in the second opening; the third filter layer is positioned in the third opening; by means of the supporting columns located on the first filter layer on the black matrix layer, the uniformity of the gap between the color filter and the thin film transistor array is improved, and therefore the image quality of a formed displayer is improved.

Description

Technical Field

[0001] The present invention relates to the field of liquid crystal display, and in particular to a color filter and a method for forming the same. Background Art

[0002] With the advancement and development of science and technology, liquid crystal displays have been widely used. Among them, thin film transistor liquid crystal displays (TFT-LCD) have gradually occupied the display field due to their low power consumption, excellent picture quality and high production yield.

[0003] The TFT-LCD is composed of two pieces of glass, with a color filter on the top and a TFT (Thin Film Transistor) on the bottom, with a layer of liquid crystal in the middle, and a complete display module with components such as polarizer, backlight and drive circuit. Among them, the color filter (CF) is a key component of the TFT-LCD, which is used to make the LCD produce color images. It is mainly composed of a transparent glass substrate, a black matrix layer (BM) and a color photoresist layer.

[0004] However, the performance of existing color filters needs to be further improved. Summary of the invention

[0005] The technical problem solved by the present invention is to provide a color filter and a method for forming the same, so as to improve the performance of the formed color filter.

[0006] To solve the above technical problems, the technical solution of the present invention provides a color filter, including: a light-transmitting substrate; a black matrix layer located on the light-transmitting substrate, the black matrix layer having a plurality of monochrome openings arranged in an array, the plurality of monochrome openings including a first opening, a second opening and a third opening, the monochrome openings exposing the light-transmitting substrate; a first filter layer located on the black matrix layer, the first filter layer having a fourth opening, the first filter layer filling the first opening, and the fourth opening exposing the second opening and the third opening; a second filter layer located in the second opening; a third filter layer located in the third opening; and a plurality of support columns on the first filter layer located on the black matrix layer.

[0007] Optionally, the light-transmitting substrate includes an opening area and a peripheral area surrounding the opening area, and the plurality of single-color openings are located in the opening area.

[0008] Optionally, the first opening, the second opening and the third opening are arranged along a first direction; a number of the first openings are arranged along a second direction, and the first direction and the second direction are perpendicular to each other.

[0009] Optionally, along the second direction, the first filter layer between adjacent second openings and the first filter layer between adjacent third openings both have a first width; the first filter layer on the peripheral area has a second width, and the second width is greater than or equal to the first width.

[0010] Optionally, the first filter layer is in contact with the second filter layer, and a first contact surface is provided between the first filter layer and the second filter layer; the first filter layer is in contact with the third filter layer, and a second contact surface is provided between the first filter layer and the third filter layer.

[0011] Optionally, the size range of the first contact surface from the adjacent side wall of the second opening is greater than 3 microns; the size range of the second contact surface from the adjacent side wall of the third opening is greater than 3 microns.

[0012] Optionally, it also includes: a protective layer, which is located on the first filter layer, the second filter layer and the third filter layer; and the plurality of support columns are located on the protective layer.

[0013] Correspondingly, the technical solution of the present invention also provides a method for forming a color filter, comprising: providing a light-transmitting substrate; forming a black matrix layer on the light-transmitting substrate, the black matrix layer having a plurality of monochrome openings arranged in an array, the plurality of monochrome openings including a first opening, a second opening and a third opening, the monochrome openings exposing the light-transmitting substrate; forming a first filter layer on the black matrix layer, the first filter layer having a fourth opening, the first filter layer filling the first opening, and the fourth opening exposing the second opening and the third opening; after forming the first filter layer, forming a second filter layer in the second opening and a third filter layer in the third opening respectively; and forming a plurality of support columns on the first filter layer on the black matrix layer.

[0014] Optionally, the light-transmitting substrate includes an opening area and a peripheral area surrounding the opening area, and the plurality of single-color openings are located in the opening area.

[0015] Optionally, the first opening, the second opening and the third opening are arranged along a first direction; a number of the first openings are arranged along a second direction, and the first direction and the second direction are perpendicular to each other.

[0016] Optionally, along the second direction, the first filter layer between adjacent second openings and the first filter layer between adjacent third openings both have a first width; the first filter layer on the peripheral area has a second width, and the second width is greater than or equal to the first width.

[0017] Optionally, the first filter layer is in contact with the second filter layer, and a first contact surface is provided between the first filter layer and the second filter layer; the first filter layer is in contact with the third filter layer, and a second contact surface is provided between the first filter layer and the third filter layer.

[0018] Optionally, the size range of the first contact surface from the adjacent side wall of the second opening is greater than 3 microns; the size range of the second contact surface from the adjacent side wall of the third opening is greater than 3 microns.

[0019] Optionally, after forming the first filter layer, the second filter layer and the third filter layer and before forming the plurality of support columns, a protective layer is formed on the first filter layer, the second filter layer and the third filter layer.

[0020] Optionally, the method for forming the first filter layer includes: coating a first color photoresist material on the light-transmitting substrate to form a third color photoresist material layer; exposing the first color photoresist material layer using a first mask; removing unexposed areas of the first color photoresist material layer by development; and baking the developed first color photoresist material layer to solidify the pattern.

[0021] Optionally, the method for forming the second filter layer includes: coating a second color photoresist material on the light-transmitting substrate to form a second color photoresist material layer; exposing the second color photoresist material layer using a second mask; removing unexposed areas of the second color photoresist material layer by development; and baking the developed second color photoresist material layer to solidify the pattern.

[0022] Optionally, the method for forming the third filter layer includes: coating a third color photoresist material on the light-transmitting substrate to form a third color photoresist material layer; exposing the third color photoresist material layer using a third mask; removing unexposed areas of the third color photoresist material layer by development; and baking the developed third color photoresist material layer to solidify the pattern.

[0023] Compared with the prior art, the technical solution of the embodiment of the present invention has the following beneficial effects:

[0024] In the method for forming a color filter provided by the technical solution of the present invention, a first filter layer is formed on the black matrix layer, the first filter layer has a fourth opening, the first filter layer fills the first opening, and the fourth opening exposes the second opening and the third opening. After the first filter layer is formed, a second filter layer is formed in the second opening, and a third filter layer is formed in the third opening. A plurality of support columns are formed on the first filter layer on the black matrix layer. Since each support column is located on the first filter layer and the bottom of each support column is located on the top surface of the same material film, the uniformity of the distribution of the support columns is improved. In addition, since the second filter layer is formed after the first filter layer, and the first filter layer is located on the black matrix layer on the side wall of the second opening, in the process of forming the second filter layer, the first filter layer increases the height of the side wall of the second opening, which is conducive to the flow of the photoresist material into the second opening, thereby increasing the amount of the photoresist material used in the process of the second filter layer. For the same reason, the amount of the photoresist material used in the process of the third filter layer is also reduced accordingly, thereby reducing the production cost as a whole.

[0025] Furthermore, along the second direction, the first filter layer between adjacent second openings and the first filter layer between adjacent third openings both have a first width; the first filter layer on the peripheral area has a second width, and the second width is greater than or equal to the first width. When the second filter layer (the third filter layer) is formed, it is beneficial to the consistency of the flow of the photoresist material from the second opening (the third opening) to the surrounding area, and it is beneficial to improve the uniformity of the distribution of the photoresist material during the process.

[0026] Furthermore, a size range of a distance between a first contact surface between the first filter layer and the second filter layer and a side wall of the second opening adjacent thereto is greater than 3 microns; a size range of a distance between a second contact surface between the first filter layer and the third filter layer and a side wall of the third opening adjacent thereto is greater than 3 microns. The purpose of selecting the size range is to reduce the probability of color mixing between photoresist layers of different colors.

[0027] In the color filter provided by the technical solution of the present invention, the plurality of support columns on the first filter layer on the black matrix layer are located on the first filter layer, and since each support column is located on the first filter layer and the bottom of each support column is located on the top surface of the same material film, the uniformity of the distribution of the support columns is improved, thereby improving the uniformity of the gap between the color filter and the thin film transistor array, thereby improving the image quality of the formed display. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figures 1 to 4 It is a structural schematic diagram of a color filter forming process;

[0029] Figures 5 to 13 It is a structural schematic diagram of each step of the method for forming a color filter according to an embodiment of the present invention. DETAILED DESCRIPTION

[0030] It should be noted that the terms “surface” and “on” in this specification are used to describe relative positional relationships in space and are not limited to direct contact.

[0031] As described in the background art, the performance of the color filter formed by the prior art needs to be further improved. Now, a method for forming a color filter is described and analyzed.

[0032] Figures 1 to 4 It is a structural schematic diagram of the color filter formation process.

[0033] Please refer to Figure 1 and Figure 2 , Figure 1 for Figure 2 A top view of the structure. Figure 2 for Figure 1 A cross-sectional structural diagram along the DD1 direction is provided, providing a transparent substrate 100; a black matrix layer 101 is formed on the transparent substrate 100, and the black matrix layer 101 includes a plurality of openings 102 arranged in an array along a first direction X, and the openings 102 expose the transparent substrate 100.

[0034] Please refer to Figure 3 and Figure 4 , Figure 3 for Figure 4 The top view of the protective layer 106 is omitted. Figure 4 for Figure 3 , a plurality of RGB photoresist layers arranged along the second direction Y are formed on the transparent substrate 100, each RGB photoresist layer includes a red photoresist layer 103, a green photoresist layer 104 and a blue photoresist layer 105 arranged along the second direction Y, each of the red photoresist layers 103, each of the green photoresist layers 104 and each of the blue photoresist layers 105 are respectively located in the same row of the openings 102 (such as Figure 1 As shown in the figure, on the black matrix layer 101 within the openings 102 in the same row; a protective layer 106 is formed on the RGB photoresist layer; a plurality of support columns 107 are formed on the protective layer 106, and the support columns 107 are also located on the black matrix layer 101 between the adjacent openings 102 in the same row.

[0035] The above method is used to form a color filter, wherein a plurality of the support pillars 107 are used to support and maintain the gap between the color filter and the thin film transistor array. However, the support pillars 107 in different rows are located on different photoresist layers, such as the support pillars 107 located on the red photoresist layer 103 and the support pillars 107 located on the blue photoresist layer 105. Due to the different thicknesses of the red photoresist layer 103 and the blue photoresist layer 105, the top surfaces of the support pillars 107 in different rows may be located at different heights, thereby causing the gap between the color filter and the thin film transistor array to be uneven, thereby affecting the image quality of the formed display.

[0036] In order to solve the above problems, in a color filter and a method for forming the same provided by the present invention, a plurality of support columns are formed on the first filter layer on the black matrix layer. Since each support column is located on the first filter layer and the bottom of each support column is located on the top surface of the same material film, the uniformity of the distribution of the support columns is improved, thereby improving the uniformity of the gap between the color filter and the thin film transistor array, thereby improving the image quality of the formed display; in addition, since the second filter layer is formed after the first filter layer, and the first filter layer is located on the black matrix layer on the side wall of the second opening, in the process of forming the second filter layer, the first filter layer increases the height of the side wall of the second opening, which is beneficial to the flow of the photoresist material into the second opening, thereby increasing the amount of the photoresist material used in the process of the second filter layer. For the same reason, the amount of the photoresist material used in the process of the third filter layer is also reduced accordingly, thereby reducing the production cost as a whole.

[0037] In order to make the above-mentioned objects, features and beneficial effects of the present invention more obvious and easy to understand, specific embodiments of the present invention are described in detail below with reference to the accompanying drawings.

[0038] Figures 5 to 13 It is a structural schematic diagram of each step of the method for forming a color filter according to an embodiment of the present invention.

[0039] Please refer to Figure 5 and Figure 6 , Figure 5 for Figure 6 A top view of the structure. Figure 6 for Figure 5 A cross-sectional structural diagram along the EE1 direction is provided in which a light-transmitting substrate 200 is provided.

[0040] In this embodiment, the light-transmitting substrate 200 is a glass substrate.

[0041] Please continue to refer to Figure 5 and Figure 6A black matrix layer 201 is formed on the light-transmitting substrate 200 , wherein the black matrix layer 201 has a plurality of single-color openings arranged in an array, wherein the plurality of single-color openings include a first opening 202 , a second opening 203 and a third opening 204 , and the single-color openings expose the light-transmitting substrate 200 .

[0042] In this embodiment, the black matrix layer 201 is made of chrome or resin with low reflectivity, and is used to separate the filter layers to enhance color contrast.

[0043] In this embodiment, the light-transmitting substrate 200 includes an opening area I and a peripheral area II surrounding the opening area I, and a plurality of single-color openings are located in the opening area I.

[0044] In this embodiment, the first opening 202, the second opening 203 and the third opening 204 are arranged along a first direction X; a plurality of the first openings 202 are arranged along a second direction Y, and the first direction X is perpendicular to the second direction Y. The first opening 202 is used to form a first filter layer, the second opening 203 is used to form a second filter layer, and the third opening 204 is used to form a third filter layer.

[0045] In this embodiment, the color filters are arranged in stripes, and the first filter layer, the second filter layer and the third filter layer form a minimum pixel unit. In other embodiments, the color filters may be arranged in other ways.

[0046] Please refer to Figure 7 and Figure 8 , Figure 7 for Figure 8 A top view of the structure. Figure 8 for Figure 7 In the cross-sectional structural schematic diagram along the EE1 direction, a first filter layer 205 is formed on the black matrix layer 201, and a fourth opening 206 is provided in the first filter layer 205. The first filter layer 205 fills the first opening 202, and the fourth opening 206 exposes the second opening 203 and the third opening 204.

[0047] The first filter layer 205 is one of the three primary color photoresist materials of red (R), green (G), and blue (B). In this embodiment, the first filter layer 205 is a red photoresist material.

[0048] In this embodiment, the method for forming the first filter layer 205 includes: coating a first color photoresist material on the light-transmitting substrate 200 to form a third color photoresist material layer (not shown in the figure); exposing the first color photoresist material layer using a first mask; removing the unexposed area of ​​the first color photoresist material layer by development; and baking the developed first color photoresist material layer to solidify the pattern.

[0049] In this embodiment, the coating process includes a spin coating process.

[0050] In this embodiment, along the second direction Y, the first filter layer 205 between adjacent second openings 203 and the first filter layer 205 between adjacent third openings 204 both have a first width d1; the first filter layer 205 on the peripheral area II has a second width d2, and the second width d2 is greater than or equal to the first width d1.

[0051] The reason for selecting the second width d2 to be greater than or equal to the first width d1 is that when forming the second filter layer (the third filter layer), it is beneficial to the consistency of the photoresist material flowing from the second opening 203 (the third opening 204) to the surroundings, which is beneficial to improving the uniformity of the distribution of the photoresist material during the process.

[0052] Subsequently, after forming the first filter layer 205, a second filter layer is formed in the second opening 203, and a third filter layer is formed in the third opening 204. In this embodiment, the second filter layer is formed first, and then the third filter layer is formed.

[0053] Please refer to Figures 9 to 11 , Fig. 9 for Fig.10 A top view of the structure. Fig.10 for Fig. 9 Schematic diagram of the cross-sectional structure along the EE1 direction, Fig.11 The viewing direction is the same as Fig.10 , at the second opening 203 (such as Figure 7 A second filter layer 207 is formed inside the substrate.

[0054] The second filter layer 207 is one of the three primary color photoresist materials of red (R), green (G), and blue (B), and is different from the material of the first filter layer 205. In this embodiment, the second filter layer 207 is a green photoresist material.

[0055] For ease of explanation, Fig.11 The structural diagram shows the process of coating the second color photoresist material 208 on the light-transmitting substrate 200 .

[0056] In this embodiment, the method for forming the second filter layer 207 includes: coating a second color photoresist material on the transparent substrate 200 to form a second color photoresist material layer 208; exposing the second color photoresist material layer 208 using a second mask (not shown in the figure); removing the unexposed area of ​​the second color photoresist material layer 208 by development; and baking the developed second color photoresist material layer 208 to solidify the pattern.

[0057] In this embodiment, the coating process includes a spin coating process.

[0058] Since the second filter layer 207 is formed after the first filter layer 205, and the first filter layer 205 is located on the black matrix layer 201 on the side wall of the second opening 203, during the process of forming the second filter layer 207, the first filter layer 205 increases the height of the side wall of the second opening 203, which is beneficial to the flow of the photoresist material into the second opening 203 (see the direction indicated by the arrow), thereby increasing the amount of photoresist material used in the process of the second filter layer 207.

[0059] In this embodiment, the first filter layer 205 and the second filter layer 207 are in contact with each other, and a first contact surface is formed between the first filter layer 205 and the second filter layer 207; the first contact surface is a distance from the adjacent second opening 203 (such as Figure 8 The size m of the side wall is greater than 3 micrometers. The purpose of selecting the size range is to reduce the probability of color mixing between photoresist layers of different colors.

[0060] Please refer to Fig.12 and Fig.13 , Fig.12 for Fig.13 The top view of the protective layer is omitted. Fig.13 for Fig.12 The cross-sectional structure diagram along the EE1 direction in FIG. 1 shows that after the second filter layer 207 is formed, the third filter layer 209 is formed.

[0061] In this embodiment, the method for forming the third filter layer 209 includes: coating a third color photoresist material on the transparent substrate 200 to form a third color photoresist material layer (not shown in the figure); exposing the third color photoresist material layer using a third mask (not shown in the figure); removing the unexposed area of ​​the third color photoresist material layer by development; and baking the developed third color photoresist material layer to solidify the pattern.

[0062] In this embodiment, the coating process includes a spin coating process.

[0063] In this embodiment, the first filter layer 205 is in contact with the third filter layer 209, and a second contact surface is formed between the first filter layer 205 and the third filter layer 209; the second contact surface is 100% away from the adjacent third opening 204 (eg Fig. 9 The size range of the sidewall is greater than 3 microns. The purpose of selecting the size range is to reduce the probability of color mixing between photoresist layers of different colors.

[0064] Since the third filter layer 209 is formed after the first filter layer 205, and the first filter layer 205 is located on the black matrix layer 201 on the side wall of the third opening 204, during the formation of the third filter layer 209, the first filter layer 205 increases the height of the side wall of the third opening 204, which is beneficial to the flow of the photoresist material into the third opening 204, thereby increasing the amount of photoresist material used in the process of the third filter layer 209, thereby reducing the overall production cost.

[0065] Please continue to refer to Fig.12 and Fig.13 , a plurality of support pillars 210 are formed on the first filter layer 205 on the black matrix layer 201 .

[0066] At this point, since each support column 210 is located on the first filter layer 205 and the bottom of each support column 210 is located on the top surface of the same material film, the uniformity of the distribution of the support columns 210 is improved, thereby improving the uniformity of the gap between the color filter and the thin film transistor array, thereby improving the image quality of the formed display.

[0067] In this embodiment, after forming the first filter layer 205 , the second filter layer 207 and the third filter layer 209 , and before forming the plurality of support columns 210 , a protective layer 211 is formed on the first filter layer 205 , the second filter layer 207 and the third filter layer 209 .

[0068] Correspondingly, the embodiment of the present invention also provides a color filter formed by the above method, please continue to refer to Fig.12 and Fig.13 The color filter comprises: a light-transmitting substrate 200; a black matrix layer 201 located on the light-transmitting substrate 200, wherein the black matrix layer 201 has a plurality of monochromatic openings arranged in an array, wherein the plurality of monochromatic openings include a first opening 202 (such as Figure 5 As shown), the second opening 203 (as shown Figure 5 as shown) and the third opening 204 (as shown Figure 5 ), the monochrome opening exposes the light-transmitting substrate 200; a first filter layer 205 located on the black matrix layer 201, the first filter layer 205 having a fourth opening 206 (as shown Figure 7 As shown), the first filter layer 205 fills the first opening 202, and the fourth opening 206 exposes the second opening 203 and the third opening 204; the second filter layer 207 is located in the second opening 203; the third filter layer 209 is located in the third opening 204; and a plurality of support columns 210 on the first filter layer 205 on the black matrix layer 201.

[0069] In the color filter, since each support column 210 is located on the first filter layer 205 and the bottom of each support column 210 is located on the top surface of the same material film, the uniformity of the distribution of the support columns 210 is improved, thereby improving the uniformity of the gap between the color filter and the thin film transistor array, thereby improving the image quality of the formed display.

[0070] In this embodiment, the light-transmitting substrate 200 includes an opening area I and a peripheral area II surrounding the opening area I, and a plurality of single-color openings are located in the opening area I.

[0071] In this embodiment, the first opening 202 , the second opening 203 and the third opening 204 are arranged along a first direction X; a plurality of the first openings 202 are arranged along a second direction Y, and the first direction X and the second direction Y are perpendicular to each other.

[0072] In this embodiment, along the second direction Y, the first filter layer 205 between the adjacent second openings 203 and the first filter layer 205 between the adjacent third openings 204 both have a first width d1 (eg, Fig.10 The first filter layer 205 on the peripheral region II has a second width d2 (as shown); Fig.10 As shown), the second width d2 is greater than or equal to the first width d1.

[0073] In this embodiment, the first filter layer 205 is in contact with the second filter layer 207, and a first contact surface is provided between the first filter layer 205 and the second filter layer 207; the first filter layer 205 is in contact with the third filter layer 209, and a second contact surface is provided between the first filter layer 205 and the third filter layer 209.

[0074] In this embodiment, the distance between the first contact surface and the adjacent side wall of the second opening 203 is greater than 3 micrometers; the distance between the second contact surface and the adjacent side wall of the third opening 204 is greater than 3 micrometers.

[0075] In this embodiment, the color filter further includes: a protective layer 211 , the protective layer 211 is located on the first filter layer 205 , the second filter layer 207 and the third filter layer 209 ; and the plurality of support columns 210 are located on the protective layer 211 .

[0076] Although the present invention is disclosed as above, the present invention is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the scope defined by the claims.

Claims

1. A color filter, characterized in that: include: Light-transmitting substrate; a black matrix layer located on the light-transmitting substrate, wherein the black matrix layer has a plurality of single-color openings arranged in an array, wherein the plurality of single-color openings include a first opening, a second opening, and a third opening, and the single-color openings expose the light-transmitting substrate; a first filter layer located on the black matrix layer, wherein the first filter layer has a fourth opening, the first filter layer fills the first opening, and the fourth opening exposes the second opening and the third opening; a second filter layer located in the second opening; a third filter layer located in the third opening; A plurality of support columns are located on the first filter layer on the black matrix layer.

2. The color filter according to claim 1, wherein: The light-transmitting substrate comprises an opening area and a peripheral area surrounding the opening area, and a plurality of the single-color openings are located in the opening area.

3. The color filter according to claim 2, wherein: The first opening, the second opening and the third opening are arranged along a first direction; a plurality of the first openings are arranged along a second direction, and the first direction and the second direction are perpendicular to each other.

4. The color filter according to claim 3, wherein: Along the second direction, the first filter layer between adjacent second openings and the first filter layer between adjacent third openings both have a first width; the first filter layer on the peripheral area has a second width, and the second width is greater than or equal to the first width.

5. The color filter according to claim 1, wherein: The first filter layer is in contact with the second filter layer, and a first contact surface is provided between the first filter layer and the second filter layer; the first filter layer is in contact with the third filter layer, and a second contact surface is provided between the first filter layer and the third filter layer.

6. The color filter according to claim 5, wherein: The size range of the first contact surface from the adjacent side wall of the second opening is greater than 3 microns; the size range of the second contact surface from the adjacent side wall of the third opening is greater than 3 microns.

7. The color filter according to claim 1, wherein: Also includes: A protective layer is located on the first filter layer, the second filter layer and the third filter layer; and the plurality of support columns are located on the protective layer.

8. A method for forming a color filter, characterized in that: include: providing a light-transmitting substrate; forming a black matrix layer on the light-transmitting substrate, wherein the black matrix layer has a plurality of single-color openings arranged in an array, wherein the plurality of single-color openings include a first opening, a second opening, and a third opening, and the single-color openings expose the light-transmitting substrate; forming a first filter layer on the black matrix layer, wherein the first filter layer has a fourth opening, the first filter layer fills the first opening, and the fourth opening exposes the second opening and the third opening; After forming the first filter layer, forming a second filter layer in the second opening and forming a third filter layer in the third opening respectively; A plurality of support columns are formed on the first filter layer on the black matrix layer.

9. The method for forming a color filter according to claim 8, wherein: The light-transmitting substrate comprises an opening area and a peripheral area surrounding the opening area, and a plurality of the single-color openings are located in the opening area.

10. The method for forming a color filter according to claim 9, wherein: The first opening, the second opening and the third opening are arranged along a first direction; a plurality of the first openings are arranged along a second direction, and the first direction and the second direction are perpendicular to each other.

11. The method for forming a color filter according to claim 10, wherein: Along the second direction, the first filter layer between adjacent second openings and the first filter layer between adjacent third openings both have a first width; the first filter layer on the peripheral area has a second width, and the second width is greater than or equal to the first width.

12. The method for forming a color filter according to claim 8, wherein: The first filter layer is in contact with the second filter layer, and a first contact surface is provided between the first filter layer and the second filter layer; the first filter layer is in contact with the third filter layer, and a second contact surface is provided between the first filter layer and the third filter layer.

13. The method for forming a color filter according to claim 12, wherein: The size range of the first contact surface from the adjacent side wall of the second opening is greater than 3 microns; the size range of the second contact surface from the adjacent side wall of the third opening is greater than 3 microns.

14. The method for forming a color filter according to claim 8, wherein: After forming the first filter layer, the second filter layer and the third filter layer and before forming the plurality of support columns, a protective layer is formed on the first filter layer, the second filter layer and the third filter layer.

15. The method for forming a color filter according to claim 8, wherein: The method for forming the first filter layer includes: coating a first color photoresist material on the light-transmitting substrate to form a third color photoresist material layer; exposing the first color photoresist material layer using a first mask; removing the unexposed area of ​​the first color photoresist material layer by development; and baking the developed first color photoresist material layer to solidify the pattern.

16. The method for forming a color filter according to claim 8, wherein: The method for forming the second filter layer includes: coating a second color photoresist material on the light-transmitting substrate to form a second color photoresist material layer; exposing the second color photoresist material layer using a second mask; removing the unexposed area of ​​the second color photoresist material layer by development; and baking the developed second color photoresist material layer to solidify the pattern.

17. The method for forming a color filter according to claim 8, wherein: The method for forming the third filter layer includes: coating a third color photoresist material on the light-transmitting substrate to form a third color photoresist material layer; exposing the third color photoresist material layer using a third mask; removing the unexposed area of ​​the third color photoresist material layer by development; and baking the developed third color photoresist material layer to solidify the pattern.

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