Manufacturing method and manufacturing equipment for amorphous alloy thick plate

Abstract

The invention discloses a method for manufacturing an amorphous alloy thick plate. The method comprises the following steps: manufacturing at least two amorphous alloy plates; placing the two amorphous alloy plates in a vacuum cavity, and respectively fixing the two amorphous alloy plates on a positive electrode and a negative electrode in the vacuum cavity; the vacuum cavity is vacuumized and then is filled with inert gas; applying voltage to the positive electrode and the negative electrode; the distance between the positive electrode and the negative electrode is adjusted, so that uniform electric arcs are generated between the surfaces of the positive electrode and the negative electrode; the voltage is increased and kept for a certain time, so that the surface of the amorphous alloy plate is molten into a liquid state; and the voltage between the positive electrode and the negative electrode is cut off, and the amorphous alloy plates on the positive electrode and the negative electrode are close to each other and combined. According to the method, the amorphous alloy thick plate with poor amorphous forming ability can be manufactured. In addition, the invention further discloses amorphous alloy thick plate manufacturing equipment.

Description

Technical Field

[0001] The invention relates to a method for manufacturing an amorphous alloy plate, and in particular to a method and equipment for manufacturing an amorphous alloy thick plate. Background Art

[0002] Large amorphous alloy plates have attracted much attention due to their excellent performance, and have been used on a small scale in the fields of mobile phones, sports equipment, medical equipment, automobiles, etc. However, since the formation of amorphous requires an extremely fast cooling speed, and the thermal conductivity of the amorphous itself is low, the heat in the core of the larger amorphous alloy cannot be quickly dissipated and crystallized, affecting the performance of the amorphous alloy. Therefore, amorphous alloy plates cannot currently be used for thicker products, which limits the promotion and application of amorphous alloys. Although multiple thin amorphous alloy plates can be stacked to form a thick amorphous alloy plate through traditional welding processes such as spot welding or laser welding, the existing welding process heats the amorphous plate unevenly, making the amorphous plate prone to stress and crystallization problems. Even if it is welded into a thick plate, it will affect the performance of the amorphous. Summary of the invention

[0003] The object of the present invention is to provide a method for manufacturing an amorphous alloy thick plate with poor amorphous forming ability.

[0004] Another object of the present invention is to provide an amorphous alloy thick plate manufacturing device, which can manufacture an amorphous alloy thick plate with poor amorphous forming ability.

[0005] In order to achieve the above object, the method for manufacturing an amorphous alloy thick plate provided by the present invention comprises the following steps:

[0006] At least two amorphous alloy plates are prepared; the two amorphous alloy plates are placed in a vacuum chamber and fixed on a positive electrode and a negative electrode in the vacuum chamber respectively; the vacuum chamber is evacuated and then filled with an inert gas; voltage is applied to the positive electrode and the negative electrode; the distance between the positive electrode and the negative electrode is adjusted so that a uniform electric arc is generated between the surfaces of the two electrodes; the voltage is increased and maintained for a certain period of time so that the surface of the amorphous alloy plate melts into a liquid state; the voltage between the positive electrode and the negative electrode is disconnected, and the amorphous alloy plates on the positive electrode and the negative electrode are brought close to each other for bonding.

[0007] Compared with the prior art, since the present invention generates an arc by applying a high voltage between the positive electrode and the negative electrode, the arc is used to instantly heat and melt the surfaces of the two amorphous alloy plates into a liquid state, and then quickly fit together, so that the surfaces of the two amorphous alloy plates are combined into a whole. Since the arc heating speed is fast enough, there is no crystallization phenomenon in the amorphous alloy. At the same time, due to the short heating time and the low thermal conductivity of the amorphous, the heat generated by the arc has no time to diffuse, so the heat-affected zone is small, and the interior of the amorphous alloy plate will not be crystallized due to this heat. In addition, since the action time is very short, the actual heat generated is very small, and the speed of combined diffusion cooling is very fast, so the bonding interface also maintains a completely amorphous state. In addition, the arc is uniformly generated on the surface of the amorphous alloy plate, so that the entire bonding surface is uniformly heated at the same time, the thermal stress is uniformly distributed, and there is no thermal stress problem caused by welding and 3D printing process. Therefore, the amorphous alloy thin plate can be combined into an amorphous alloy thick plate with excellent performance.

[0008] Preferably, the two amorphous alloy plates are pressure-maintained and cooled after being brought into close proximity with each other and bonded together.

[0009] Preferably, before the amorphous alloy plate is placed in the vacuum chamber, the edge of the amorphous alloy plate is ground into a rounded corner. By rounding the corners of the amorphous alloy plate, it is possible to prevent the occurrence of tip discharge under high voltage, ensure that the arc is generated uniformly on the surface of the amorphous alloy plate, and thus improve the processing quality.

[0010] Preferably, before applying voltage to the positive electrode and the negative electrode, the positive electrode and the negative electrode are first continuously circulated and cooled by cooling circulating water. In this way, the positive electrode, the negative electrode and other places of the two amorphous alloy plates except the surface can be quickly cooled, which not only protects the safety of the electrodes, but also prevents the amorphous alloy plates from being crystallized.

[0011] Preferably, the range of the vacuum chamber being evacuated is 0.06 to 20 Pa. By evacuating the vacuum chamber, it can be ensured that the arc can be generated uniformly.

[0012] Preferably, the vacuum chamber is filled with inert gas at a pressure ranging from 500 to 10000 Pa.

[0013] Preferably, the voltage applied before an arc is generated between the positive electrode and the negative electrode is in the range of 500-700V.

[0014] Preferably, in the step of increasing the voltage, the voltage is increased to be equal to or greater than 1800V and maintained for a time range of 25-35 milliseconds.

[0015] Preferably, a hydraulic driving device is used to drive the positive electrode and the negative electrode to approach each other.

[0016] A kind of amorphous alloy thick plate manufacturing equipment, suitable for heating and combining two amorphous alloy plates, comprises a vacuum chamber, a positive electrode, a negative electrode, a power supply device, a vacuum pumping device, an air charging device, a water cooling device and a driving device, wherein the positive electrode and the negative electrode are arranged in the vacuum chamber in an upper and lower arrangement, wherein one amorphous alloy plate is connected to the surface of the positive electrode, and the other amorphous alloy plate is connected to the surface of the negative electrode opposite to the surface of the positive electrode; the positive electrode and the negative electrode are respectively connected to the positive and negative electrodes of the power supply device; an air suction port and an air charging port are provided in the vacuum chamber, the vacuum pumping device is connected to the air suction port; the air charging device is connected to the air charging port; the positive electrode and the negative electrode are both provided with cooling channels, the water outlet of the water cooling device is respectively connected to one end of the cooling channels of the positive electrode and the negative electrode, and the water inlet of the water cooling device is respectively connected to the other end of the cooling channels of the positive electrode and the negative electrode; the driving device is arranged outside the vacuum chamber, and the output end extends into the vacuum chamber and drives one of the positive electrode and the negative electrode to approach the other. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a flow chart of the method for manufacturing amorphous alloy thick plate of the present invention.

[0018] Figure 2 It is the manufacturing equipment used in the manufacturing method of the amorphous alloy thick plate of the present invention. DETAILED DESCRIPTION

[0019] In order to explain the technical content, structural features and achieved effects of the present invention in detail, the following is a detailed description in conjunction with the implementation methods and the accompanying drawings.

[0020] like Figure 1 As shown, the method for manufacturing an amorphous alloy thick plate of the present invention is to heat and combine at least two amorphous alloy thin plates to form an amorphous alloy thick plate, which includes the following steps:

[0021] Step S1, make at least two amorphous alloy plates 200, the thickness of which is less than 1 mm; the thickness of the two amorphous alloy plates 200 in this embodiment is 0.8 mm. The amorphous alloy plates 200 are made by die casting, extrusion strip throwing and the like, and the plane shape of the amorphous alloy plates 200 is the same as the plane shape of the electrode described below. The amorphous alloy plates 200 are titanium-based amorphous plates. When making the amorphous alloy plates 200, it is also necessary to grind the edges of the amorphous alloy plates into rounded corners. By rounding the amorphous alloy plates 200, it is possible to prevent tip discharge under high voltage, ensure that the arc is generated evenly on the surface of the amorphous alloy plates 200, and thus improve the quality of processing.

[0022] Step S2, placing the two amorphous alloy plates 200 in the vacuum chamber 1, and fixing them on the positive electrode 2 and the negative electrode 3 in the vacuum chamber 1 respectively; the positive electrode 2 and the negative electrode 3 are copper electrodes.

[0023] Step S3, after evacuating the vacuum chamber 1, fill it with an inert gas; specifically, the vacuum chamber 1 is evacuated by a vacuum pumping device 4, so that the amorphous alloy plate 200 is processed in a vacuum environment. The vacuum degree range of the vacuum chamber 1 is 0.06 to 20Pa, and the vacuum leakage rate of the vacuum chamber 1 is not higher than 2Pa / minute. The vacuum value in the vacuum chamber 1 of this embodiment is 0.06Pa. By evacuating the vacuum chamber 1, it can be ensured that the arc can be generated uniformly. In addition, in this step, the air pressure range of the inert gas filled into the vacuum chamber 1 is 500-10000Pa; the air pressure value of this embodiment is preferably 2000Pa.

[0024] Step S4, the positive electrode 2 and the negative electrode 3 are continuously circulated and cooled by cooling circulating water. In this way, the positive electrode 2, the negative electrode 3 and other places of the two amorphous alloy plates 200 except the surface can be quickly cooled, which not only protects the safety of the electrodes, but also prevents the amorphous alloy plates 200 from being crystallized.

[0025] Step S5, applying voltage to the positive electrode 2 and the negative electrode 3; the voltage applied before an arc is generated between the positive electrode 2 and the negative electrode 3 is in the range of 500-4000V. The voltage value of this embodiment is preferably 600V.

[0026] Step S6, adjusting the distance between the positive electrode 2 and the negative electrode 3 so that a uniform arc is generated between the surfaces of the positive electrode 2 and the negative electrode 3;

[0027] Step S7, increasing the voltage and maintaining it for a certain time, so that the surface of the amorphous alloy plate 200 melts into a liquid state; in this step, the voltage is increased to equal to or greater than 1800V, and the maintenance time range is 0.005-2 seconds. In this embodiment, the voltage is increased to 2000V in this step, and the maintenance time is 30 milliseconds.

[0028] Step S8, disconnecting the voltage between the positive electrode 2 and the negative electrode 3, bringing the amorphous alloy plates 200 on the positive electrode 2 and the negative electrode 3 close to each other to form an amorphous alloy thick plate; specifically, using the hydraulic drive device 7 to drive the positive electrode 2 to move downward, so that the positive electrode 2 and the negative electrode 3 are close to each other, and the relative surfaces of the two amorphous alloys are heated to a molten state under the action of the high voltage in the previous step. In this step, when the two are close to each other, the two amorphous alloy plates 200 are combined together due to the molten surfaces.

[0029] Step S9, after the two amorphous alloy plates 200 are close to each other and combined, they are cooled under pressure, and then the amorphous alloy thick plate is taken out. The above-mentioned pressure-keeping cooling time is 12 seconds, and the obtained amorphous alloy thick plate is 1.54 mm.

[0030] Compared with the prior art, since the present invention generates an arc by applying a high voltage between the positive electrode 2 and the negative electrode 3, the arc is used to instantly heat and melt the surfaces of the two amorphous alloy plates 200 into a liquid state, and then quickly fit together, so that the surfaces of the two amorphous alloy plates 200 are combined into a whole. Since the arc heating speed is fast enough, there is no crystallization phenomenon in the amorphous alloy. At the same time, due to the short heating time and the low thermal conductivity of the amorphous, the heat generated by the arc has no time to diffuse, so the heat-affected zone is small, and the interior of the amorphous alloy plate 200 will not be crystallized due to this heat. In addition, since the action time is very short, the actual heat generated is very small, and the speed of combined diffusion cooling is very fast, so the bonding interface also maintains a completely amorphous state. In addition, the arc is uniformly generated on the surface of the amorphous alloy plate 200, so that the entire bonding surface is uniformly heated at the same time, the thermal stress is uniformly distributed, and there is no thermal stress problem caused by welding and 3D printing process. Therefore, the amorphous alloy thin plate can be combined into an amorphous alloy thick plate with excellent performance.

[0031] like Figure 2 As shown, the amorphous alloy thick plate manufacturing method of the present invention can be carried out using the following amorphous alloy thick plate manufacturing equipment 100. Specifically, the amorphous alloy thick plate manufacturing equipment 100 is used to heat and combine two amorphous alloy thin plates, and includes a vacuum chamber 1, a positive electrode 2, a negative electrode 3, a vacuum pumping device 4, an air charging device 5, a water cooling device 6, a driving device 7 and a power supply device 8. The positive electrode 2 and the negative electrode 3 are arranged in the vacuum chamber 1 in an upper and lower arrangement, wherein one amorphous alloy plate 200 is connected to the surface of the positive electrode 2, and the other amorphous alloy plate 200 is connected to the surface of the negative electrode 3 opposite to the surface of the positive electrode 2; the positive electrode 2 and the negative electrode 3 are respectively connected to the positive and negative poles of the power supply device 8. The vacuum chamber 1 is provided with an air extraction port 11 and an air charging port 12, the vacuum extraction device 4 is connected to the air extraction port 11; the air charging device 5 is connected to the air charging port 12; the positive electrode 2 and the negative electrode 3 are both provided with cooling channels, the water outlet of the water cooling device 6 is respectively connected to the inlet of one end of the cooling channel of the positive electrode 2 and the negative electrode 3, and the water inlet of the water cooling device 6 is respectively connected to the outlet of the other end of the cooling channel of the positive electrode 2 and the negative electrode 3; the driving device 7 is arranged outside the vacuum chamber 1 and the output end extends into the vacuum chamber 1 and drives one of the positive electrode 2 and the negative electrode 3 to approach the other. The driving device 7 can be a cylinder or an oil cylinder.

[0032] The structures of the power supply device, vacuum device 4, inflation device 5, water cooling device 6 and driving device 7 involved in the amorphous alloy thick plate manufacturing equipment of the present invention are well known to ordinary technicians in this field and will not be described in detail here.

[0033] The above disclosure is only a preferred embodiment of the present invention, and certainly cannot be used to limit the scope of rights of the present invention. Therefore, equivalent changes made according to the scope of the patent application of the present invention still fall within the scope covered by the present invention.

Claims

1. A method for manufacturing an amorphous alloy thick plate, characterized in that: The following steps are involved: Making at least two amorphous alloy plates; Placing the two amorphous alloy plates in a vacuum chamber and fixing them on the positive electrode and the negative electrode in the vacuum chamber respectively; The vacuum chamber is evacuated and then filled with an inert gas; Applying voltage to the positive electrode and the negative electrode; Adjusting the distance between the positive electrode and the negative electrode so that a uniform arc is generated between the surfaces of the positive electrode and the negative electrode; Increasing the voltage and maintaining it for a certain period of time so that the surface of the amorphous alloy plate melts into a liquid state; The voltage between the positive electrode and the negative electrode is disconnected, and the amorphous alloy plates on the positive electrode and the negative electrode are brought close to each other and combined.

2. The method for manufacturing an amorphous alloy thick plate according to claim 1, characterized in that: After the two amorphous alloy plates are close to each other and bonded, they are cooled under pressure.

3. The method for manufacturing an amorphous alloy thick plate according to claim 1, characterized in that: Before placing the amorphous alloy plate into the vacuum chamber, the edge of the amorphous alloy plate is polished into a rounded corner.

4. The method for manufacturing an amorphous alloy thick plate according to claim 1, characterized in that: Before applying voltage to the positive electrode and the negative electrode, the positive electrode and the negative electrode are first continuously circulated and cooled by cooling circulating water.

5. The method for manufacturing an amorphous alloy thick plate according to claim 1, characterized in that: The vacuum chamber is evacuated in a range of 0.06 to 20 Pa.

6. The method for manufacturing an amorphous alloy thick plate according to claim 1, characterized in that: The vacuum chamber is filled with inert gas at a pressure ranging from 500 to 10000 Pa.

7. The method for manufacturing an amorphous alloy thick plate according to claim 1, characterized in that: The voltage applied before an arc is generated between the positive electrode and the negative electrode is in the range of 500-4000V.

8. The method for manufacturing an amorphous alloy thick plate according to claim 1, characterized in that: In the step of increasing the voltage, the voltage is increased to be equal to or greater than 1800 V and maintained for a time ranging from 25 to 35 milliseconds.

9. The method for manufacturing an amorphous alloy thick plate according to claim 1, characterized in that: The positive electrode and the negative electrode are driven to approach each other by a hydraulic driving device.

10. An amorphous alloy thick plate manufacturing device, suitable for heating and bonding two amorphous alloy plates, characterized in that: It includes a vacuum chamber, a positive electrode, a negative electrode, a power supply device, a vacuum pumping device, an air charging device, a water cooling device and a driving device, wherein the positive electrode and the negative electrode are arranged in the vacuum chamber in an upper and lower arrangement, wherein an amorphous alloy plate is connected to the surface of the positive electrode, and the other amorphous alloy plate is connected to the surface of the negative electrode opposite to the surface of the positive electrode; the positive electrode and the negative electrode are respectively connected to the positive and negative electrodes of the power supply device; an air suction port and an air charging port are provided in the vacuum chamber, and the vacuum pumping device is connected to the air suction port; the air charging device is connected to the air charging port; the positive electrode and the negative electrode are both provided with cooling channels, and the water outlet of the water cooling device is respectively connected to one end of the cooling channel of the positive electrode and the negative electrode, and the water inlet of the water cooling device is respectively connected to the other end of the cooling channel of the positive electrode and the negative electrode; the driving device is arranged outside the vacuum chamber, and the output end extends into the vacuum chamber and drives one of the positive electrode and the negative electrode to approach the other.

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