Display panel and display device

Abstract

The invention relates to a display panel and a display device. The display panel comprises an opening area, an isolation area and a display area. The display panel comprises a substrate, at least one isolation structure located in an isolation area and an insulating layer. The isolation structure comprises a first isolation part and a second isolation part. The orthographic projection of one part of the second isolation part on the substrate is located in the orthographic projection range of the first isolation part on the substrate, and the orthographic projection of the other part of the second isolation part on the substrate is located outside the orthographic projection of the first isolation part on the substrate. The second isolation part comprises a first surface, a second surface, a first side face and a second side face, the first side face and the second side face are connected with the first surface and the second surface, the first side face faces the display area, and the second side face faces the hole opening area. And the material of the second isolation part comprises a conductive material. The orthographic projection of the insulating layer on the substrate covers at least part of the orthographic projection of the second surface on the substrate, and covers at least one of the first side surface and the second side surface.

Description

Technical Field

[0001] The present disclosure relates to the field of display technology, and in particular to a display panel and a display device. Background Art

[0002] Organic Light-Emitting Diode (OLED) has the advantages of self-luminescence, fast response, wide viewing angle, high brightness, bright colors, and light weight, and is considered to be the next generation of display technology.

[0003] With the development of display technology, narrow borders and full screens have become one of the development directions of display products. In order to reduce the screen border and increase the screen-to-body ratio, some OLED display products use the HIAA (Hole in Active Area) design, that is, a hole is made in the AA area (Active Area, effective display area), and sensors such as cameras are set on the non-display side of the screen, and are set opposite to the hole in the AA area. Summary of the invention

[0004] The present disclosure aims to solve at least one of the technical problems existing in the prior art, and proposes a display panel and a display device.

[0005] In order to achieve the above-mentioned object, the present disclosure provides a display panel, comprising an opening area, an isolation area and a display area, wherein the isolation area surrounds the opening area, and the display area surrounds the isolation area; the display panel comprises:

[0006] substrate substrate;

[0007] At least one isolation structure located at one side of the substrate and located in the isolation area; the isolation structure is arranged around the opening area;

[0008] The isolation structure comprises a first isolation portion and a second isolation portion which are sequentially arranged in a direction away from the base substrate; a part of the second isolation portion has an orthographic projection on the base substrate located within the orthographic projection range of the first isolation portion on the base substrate, and another part of the second isolation portion has an orthographic projection on the base substrate located outside the orthographic projection of the first isolation portion on the base substrate; the second isolation portion comprises: a first surface facing the base substrate, a second surface facing away from the base substrate, and a first side surface and a second side surface connecting the first surface and the second surface, the first side surface facing the display area, and the second side surface facing the opening area; the material of the second isolation portion comprises a conductive material;

[0009] An insulating layer, wherein the insulating layer is located in the isolation region and on a side of the isolation structure away from the substrate; the orthographic projection of the insulating layer on the substrate covers at least a portion of the orthographic projection of the second surface on the substrate, and the insulating layer covers at least one of the first side and the second side.

[0010] In some embodiments, the insulating layer covers one of the first side and the second side;

[0011] The display panel further comprises: an insulating support column located in the isolation area;

[0012] The insulating support column covers the other of the first side surface and the second side surface.

[0013] In some embodiments, the first isolation portion includes a third side surface and a fourth side surface, the third side surface faces the display area, and the fourth side surface faces the opening area;

[0014] The fourth side surface is a curved surface that is bent away from the opening area; and / or the third side surface is a curved surface that is bent away from the display area.

[0015] In some embodiments, the fourth side surface is a curved surface that is bent away from the opening area; the insulating layer also covers the third side surface,

[0016] Alternatively, the third side surface is a curved surface that is bent away from the display area, and the insulating layer also covers the fourth side surface.

[0017] In some embodiments, the isolation structure further includes a fifth isolation portion located between the first isolation portion and the base substrate;

[0018] The fifth isolation portion includes a fifth side surface and a sixth side surface, the fifth side surface faces the display area, and the sixth side surface faces the opening area;

[0019] The insulating layer also covers the third side surface and the fifth side surface;

[0020] Alternatively, the insulating layer also covers the fourth side surface and the sixth side surface.

[0021] In some embodiments, the display panel further includes a first source-drain metal layer and a second source-drain metal layer located in the display area and sequentially arranged in a direction away from the base substrate;

[0022] The first isolation portion is disposed in the same layer as at least a portion of the first source-drain metal layer, and the fifth isolation portion is disposed in the same layer as at least a portion of the second source-drain metal layer.

[0023] In some embodiments, the display panel further comprises a source-drain metal layer, a passivation layer and a planarization layer sequentially arranged in a direction away from the base substrate; the source-drain metal layer, the passivation layer and the planarization layer are located in the display area; the source-drain metal layer comprises a first metal layer and a second metal layer located on a side of the first metal layer away from the base substrate;

[0024] The first isolation portion is disposed on the same layer as the first metal layer;

[0025] The second isolation portion includes a first isolation layer and a second isolation layer sequentially arranged in a direction away from the base substrate; wherein the first isolation layer is arranged on the same layer as the second metal layer, the second isolation layer is arranged on the same layer as the passivation layer, and the insulating layer is arranged on the same layer as the planarization layer.

[0026] In some embodiments, the display panel further comprises a source-drain metal layer, a first planarization layer, and a second planarization layer sequentially arranged in a direction away from the base substrate; the source-drain metal layer, the first planarization layer, and the second planarization layer are located in the display area; the source-drain metal layer comprises a first metal layer and a second metal layer located on a side of the first metal layer away from the base substrate;

[0027] The first isolation portion is disposed on the same layer as the first metal layer;

[0028] The second isolation portion includes a first isolation layer and a second isolation layer arranged in sequence along a direction away from the base substrate; wherein the first isolation layer is arranged on the same layer as the second metal layer, the second isolation layer is arranged on the same layer as the first planarization layer, and the insulating layer is arranged on the same layer as the second planarization layer.

[0029] In some embodiments, the isolation structure further includes a fourth isolation portion located between the insulating layer and the second isolation portion; the fourth isolation portion includes a third surface facing the base substrate, a fourth surface away from the base substrate, and a seventh side surface and an eighth side surface located between the third surface and the fourth surface, the seventh side surface faces the opening area, and the eighth side surface faces the display area;

[0030] The insulating layer covers the fourth surface, the seventh side surface, and the eighth side surface.

[0031] In some embodiments, the display panel further includes a first source-drain metal layer and a second source-drain electrode layer sequentially arranged in a direction away from the base substrate; the first source-drain metal layer and the second source-drain electrode layer are located in the display area;

[0032] The first isolation portion is disposed in the same layer as at least a portion of the first source-drain metal layer;

[0033] The fourth isolation portion is disposed in the same layer as at least a portion of the second source-drain metal layer.

[0034] In some embodiments, the display panel further includes a light shielding layer, a gate metal layer, and a gate insulating layer, which are located in the display area and are sequentially arranged in a direction away from the base substrate;

[0035] The display panel further includes a spacer structure located between the isolation structure and the base substrate, and the spacer structure is disposed in the same layer as at least one of the light shielding layer, the gate metal layer, and the gate insulating layer.

[0036] In some embodiments, the display panel further includes a first electrode layer located on a side of the layer where the insulating layer is located away from the substrate;

[0037] The first electrode layer includes a first electrode located in the display area and a redundant electrode located in the isolation area; at least a portion of the redundant electrode is located on a side of the insulating layer away from the base substrate.

[0038] In some embodiments, the isolation structure further includes a third isolation portion located between the first isolation portion and the base substrate;

[0039] There are multiple isolation structures, the first isolation parts of the multiple isolation structures are spaced apart from each other, and the second isolation parts of the multiple isolation structures are spaced apart from each other; and the third isolation parts of at least two adjacent isolation structures are connected to form an integrated structure.

[0040] The present disclosure also provides a display device, comprising:

[0041] A display panel as described in any one of the above;

[0042] A photosensitive element is located on the non-display side of the display panel and is arranged opposite to the opening. BRIEF DESCRIPTION OF THE DRAWINGS

[0043] The accompanying drawings are used to provide a further understanding of the present disclosure and constitute a part of the specification. Together with the following specific embodiments, they are used to explain the present disclosure but do not constitute a limitation of the present disclosure. In the accompanying drawings:

[0044] Figure 1 is a schematic diagram of a planar structure of a display panel in some embodiments;

[0045] Figure 2 is a schematic cross-sectional view of an isolation structure in some embodiments;

[0046] Figure 3 is a schematic diagram of a cross-sectional structure of a display panel in some embodiments of the present disclosure;

[0047] Figure 4A is a schematic diagram of the cross-sectional structure of the display area in some embodiments of the present disclosure;

[0048] Figure 4B is a schematic diagram of the cross-sectional structure of the display area in some other embodiments of the present disclosure;

[0049] Figure 5A is a schematic cross-sectional structural diagram of an isolation structure in some embodiments of the present disclosure;

[0050] Figure 5B is a schematic diagram of a cross-sectional structure of a display panel in some other embodiments of the present disclosure;

[0051] Figure 5C is a schematic diagram of a cross-sectional structure of a display panel in some other embodiments of the present disclosure;

[0052] Figure 5D is a schematic diagram of a cross-sectional structure of a display panel in some other embodiments of the present disclosure;

[0053] Fig. 6A is a schematic diagram of a cross-sectional structure of a display panel in some other embodiments of the present disclosure;

[0054] Figure 6B is a schematic diagram of a cross-sectional structure of a display panel in some other embodiments of the present disclosure;

[0055] Fig. 7A is a schematic diagram of a cross-sectional structure of a display panel in some other embodiments of the present disclosure;

[0056] Figure 7B is a schematic diagram of a cross-sectional structure of a display panel in some other embodiments of the present disclosure;

[0057] Figure 7C is a schematic diagram of a cross-sectional structure of a display panel in some other embodiments of the present disclosure;

[0058] Fig. 8A is a schematic diagram of a cross-sectional structure of a display panel in some other embodiments of the present disclosure;

[0059] Figure 8B is a schematic diagram of a cross-sectional structure of a display panel in some other embodiments of the present disclosure;

[0060] Figure 8C is a schematic diagram of a cross-sectional structure of a display panel in some other embodiments of the present disclosure;

[0061] Fig.9A is a schematic diagram of a cross-sectional structure of a display panel in some other embodiments of the present disclosure;

[0062] Fig. 9B is a schematic diagram of a cross-sectional structure of a display panel in some other embodiments of the present disclosure;

[0063] Fig. 9C is a schematic diagram of a cross-sectional structure of a display panel in some other embodiments of the present disclosure;

[0064] Fig. 10A is a schematic diagram of a cross-sectional structure of a display panel in some embodiments of the present disclosure;

[0065] Fig. 10B is a schematic diagram of a cross-sectional structure of a display panel in some embodiments of the present disclosure;

[0066] Fig.11A is a flow chart of preparing an isolation structure in some embodiments of the present disclosure;

[0067] Fig. 11B is a schematic cross-sectional structural diagram of an isolation structure in some other embodiments of the present disclosure;

[0068] Fig. 11C is a schematic cross-sectional structural diagram of an isolation structure in some other embodiments of the present disclosure;

[0069] Fig.11D is a schematic cross-sectional structural diagram of an isolation structure in some other embodiments of the present disclosure;

[0070] Fig.11E is a schematic cross-sectional structural diagram of an isolation structure in some other embodiments of the present disclosure;

[0071] Fig.11F is a schematic cross-sectional structural diagram of an isolation structure in some other embodiments of the present disclosure;

[0072] Fig.12 is a schematic diagram of a cross-sectional structure of a display panel in some other embodiments of the present disclosure;

[0073] Fig.13 is a schematic diagram of a cross-sectional structure of a display panel in some other embodiments of the present disclosure;

[0074] Fig.14 It is a schematic diagram of the cross-sectional structure of the display panel in some other embodiments of the present disclosure. DETAILED DESCRIPTION

[0075] The specific implementation of the present disclosure is described in detail below in conjunction with the accompanying drawings. It should be understood that the specific implementation described herein is only used to illustrate and explain the present disclosure, and is not used to limit the present disclosure.

[0076] In order to make the purpose, technical solution and advantages of the embodiments of the present disclosure clearer, the technical solution of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0077] Unless otherwise defined, the technical terms or scientific terms used in the embodiments of the present disclosure should be understood by people of ordinary skills in the field to which the present disclosure belongs. The "first", "second" and similar words used in the present disclosure do not represent any order, quantity or importance, but are only used to distinguish different components. Similarly, "including" or "comprising" and similar words mean that the elements or objects appearing in front of the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0078] As used herein, "parallel" and "perpendicular" include the described situation and the situation similar to the described situation, and the range of the similar situation is within the acceptable deviation range, wherein the acceptable deviation range is determined by a person of ordinary skill in the art taking into account the measurement in question and the error associated with the measurement of a specific quantity (i.e., the limitations of the measurement system). For example, "parallel" includes absolute parallelism and approximate parallelism, wherein the acceptable deviation range of approximate parallelism can be, for example, a deviation within 5°; "perpendicular" includes absolute perpendicularity and approximate perpendicularity, wherein the acceptable deviation range of approximate perpendicularity can also be, for example, a deviation within 5°.

[0079] It will be understood that when a layer or an element is referred to as being on another layer or substrate, it can be directly on the other layer or substrate, or intervening layers may be present between the layer or element and the other layer or substrate.

[0080] Exemplary embodiments are described herein with reference to cross-sectional views and / or plan views that are idealized exemplary drawings. In the drawings, the thickness of layers and regions are exaggerated for clarity. Therefore, variations in shape relative to the drawings due to, for example, manufacturing techniques and / or tolerances are conceivable. Therefore, the exemplary embodiments should not be interpreted as being limited to the shapes of the regions shown herein, but include deviations in shape due to, for example, manufacturing. Therefore, the regions shown in the drawings are schematic in nature, and their shapes are not intended to illustrate the actual shapes of regions of the device, and are not intended to limit the scope of the exemplary embodiments.

[0081] In the related art, in order to increase the screen-to-body ratio of the display screen, an opening can be set in the OLED display panel, and some photosensitive elements such as a camera can be set on the back side of the opening. However, setting the opening in the display area easily allows water vapor and oxygen to corrode the OLED display panel through the opening, thereby causing problems such as poor display.

[0082] Figure 1 Schematic diagram of the planar structure of the display panel in some embodiments. Figure 1 It can be seen that the display panel has an opening area CC, an isolation area BB surrounding the opening area CC, a display area AA surrounding the isolation area BB, and a non-display area NA surrounding the display area AA. Among them, the display panel includes a driving circuit layer located in the display area AA, a light-emitting device located on one side of the driving circuit layer, and at least one isolation structure located in the isolation area BB. The isolation structure is arranged around the opening area CC to prevent water and oxygen from entering the display area AA from the opening area CC. The driving circuit layer includes a pixel circuit. The pixel circuit includes a thin film transistor, the thin film transistor includes a gate, a source, a drain and an active layer, and the light-emitting device includes a second electrode and a first electrode arranged in sequence in a direction away from the thin film transistor. The second electrode is electrically connected to the pixel circuit. The pixel circuit provides a driving signal for the thin film transistor.

[0083] Figure 2: is a schematic diagram of the cross-sectional structure of the display panel in some embodiments. Among them, the isolation structure 20 is located on one side of the base substrate 10, and is arranged in the same layer as the source and drain of the thin film transistor in the display area. The isolation structure 20 can isolate the subsequently deposited film layer. For example, the display panel also includes a planarization layer located in the display area AA and a redundant film layer 80 located in the isolation area BB. The redundant film layer 80 is arranged in the same layer as the planarization layer, that is, the planarization material layer deposited when the planarization layer is formed is isolated by the isolation structure 20, thereby forming a redundant film layer 80 in the isolation area BB. The first electrode of each light-emitting device in the display panel is connected to form a first electrode layer of the entire layer. When the first electrode layer is formed, the first electrode layer is isolated at the position of the isolation structure 20, and a redundant electrode 70 located in the isolation area BB is formed. At this time, in some embodiments, the redundant electrode 70 may overlap the side of the isolation structure 20, so that the redundant electrode 70 in the isolation area BB and the isolation structure 20 cannot be disconnected, and a current channel between the first electrode, the redundant electrode 70 and the isolation structure is constructed, that is, the isolation area BB is "charged" and an electric field can be formed. On the other hand, the display panel also includes a polarizer (POL) located on the side of the light-emitting device away from the substrate. The polarizer contains chemical substances such as iodine ions and potassium ions, and the thickness of the polarizer is small, so these chemical substances can easily enter the display panel. The electric field formed in the isolation area BB and the combined action of water, oxygen and chemical substances entering the display panel will cause electrochemical corrosion to occur, thereby causing GDSH (water vapor oxidation in the open area caused by cracks, scratches, top injuries, etc. caused by packaging or external forces), affecting the display effect of the display panel.

[0084] In order to at least alleviate or solve one of the above-mentioned technical problems, the present disclosure provides a display panel and a display device.

[0085] The schematic diagram of the planar structure of the display panel in the embodiment of the present disclosure is Figure 1 The planar structural schematic diagrams of the display panels shown are the same. Figure 3 In some embodiments of the present disclosure, Figure 1 FIG. 4 is a schematic diagram of a cross-sectional structure of a display panel along a cutting line DO.

[0086] In some embodiments, Figure 1 As shown, a display panel disclosed in the present invention includes an opening area CC, an isolation area BB, a display area AA and a non-display area NA, the isolation area BB surrounds the opening area CC, the display area AA surrounds the isolation area BB, and the non-display area NA surrounds the display area AA.

[0087] Figure 4A It is a schematic diagram of the cross-sectional structure of the display area AA in some embodiments of the present disclosure. Figure 4BIt is a schematic diagram of the cross-sectional structure of the display area AA in some other embodiments of the present disclosure.

[0088] In some embodiments, Figure 4A As shown, the display panel includes a base substrate 10, and a driving circuit layer 60 located on one side of the base substrate 10 and located in the display area AA. The driving circuit layer 60 includes a semiconductor layer, a first gate insulating layer GI1, a first gate metal layer gate1, a second gate insulating layer GI2, a second gate metal layer gate2, an interlayer dielectric layer ILD, a first source-drain metal layer SD1, a first planarization layer PLN1, a first passivation layer PVX1, a second planarization layer PLN2, a second source-drain metal layer SD2, a pixel defining layer PDL, a light-emitting layer EML, and an electrode layer. Among them, the semiconductor layer includes an active layer T_A of a thin film transistor T, and the first gate insulating layer GI1 includes a gate T_G of the thin film transistor T and a first electrode C1 of a storage capacitor C. The second gate insulating layer GI2 includes a second electrode C2 of the storage capacitor C. The first source-drain electrode layer SD1 includes a source T_S and a drain T_D of the thin film transistor T. The second source-drain metal layer SD2 includes a second electrode AND of the light-emitting device L, for example, the second electrode AND may be an anode. The second electrode AND is electrically connected to the drain electrode T_D of the thin film transistor T. The thin film transistor T is used to provide a driving signal for the light emitting device L. The electrode layer includes a first electrode CTD of the light emitting device L, for example, the first electrode CTD may be a cathode.

[0089] Optionally, the base substrate 10 may be a glass substrate or a flexible substrate.

[0090] Optionally, a buffer layer BUFFER is provided between the base substrate 10 and the active layer T_A.

[0091] Optionally, a reflective metal layer BSM is disposed between the buffer layer BUFFER and the base substrate 10 .

[0092] Optionally, the light-emitting device L is an organic light-emitting diode (OLED), wherein the organic light-emitting diode (OLED) can emit, for example, red light, green light, blue light or white light.

[0093] Optionally, the second electrode AND may be made of at least one material selected from metal, metal alloy, metal nitride, conductive metal oxide, transparent conductive material and the like.

[0094] Optionally, the first electrode CTD may be made of at least one material such as metal, metal alloy, metal nitride, conductive metal oxide, transparent conductive material, etc. For example, in one example, the first electrode CTD includes stacked ITO (indium zinc oxide), Ag and ITO.

[0095] Optionally, the passivation layer PVX material may include a silicon compound, for example, at least one of silicon oxide, silicon nitride or silicon oxynitride.

[0096] Optionally, the planarization layer PLN is made of an organic insulating material, for example, the organic insulating material may include one or more resin materials such as polyimide, epoxy resin, acrylic, polyester, photoresist, polyacrylate, polyamide, siloxane, etc. The organic insulating material may also be elastic, for example, the organic insulating material may include one or more elastic materials such as urethane, thermoplastic polyurethane (TPU), etc.

[0097] Optionally, the materials of the source-drain metal layer SD and the gate metal layer gate may include metals, for example, any one or more of silver (Ag), copper (Cu), aluminum (Al), titanium (Ti) and molybdenum (Mo). In addition, the gate 220, the drain 210, and the source 240 may be a single-layer structure, or a multi-layer structure stacked along the thickness direction of the display panel, wherein each layer may include one or more of the aforementioned metals. Optionally, when the gate 220, the drain 210, or the source 240 includes multiple metals, it may be an alloy material, such as aluminum-neodymium alloy (AlNd) or molybdenum-niobium alloy (MoNb), or a multi-layer stacked structure, such as Ti, Al, Ti (Ti / Al / Ti) stacked in sequence.

[0098] In other embodiments, Figure 4B As shown, the driving circuit layer 60 includes a semiconductor layer, a first gate insulating layer GI1, a first gate metal layer gate1, a second gate insulating layer GI2, a second gate metal layer gate2, an interlayer dielectric layer ILD, a first source-drain metal layer SD1, a first planarization layer PLN1, a passivation layer PVX, a second planarization layer PLN2, a second source-drain metal layer SD2, a third planarization layer PLN3, a third source-drain metal layer SD3, a pixel defining layer PDL, a light-emitting layer EML and an electrode layer, which are sequentially arranged in a direction away from the base substrate 10. Among them, the third source-drain metal layer SD3 includes the second electrode AND of the light-emitting device L. The second source-drain metal layer SD2 includes a conductive portion 11, and the conductive portion 11 is electrically connected to the second electrode AND and the drain T_S of the thin film transistor T, respectively.

[0099] like Figure 3As shown, the display panel also includes at least one isolation structure 20 located on one side of the base substrate 10 and located in the isolation area BB. And the isolation structure 20 is arranged around the opening area CC. When there are multiple isolation structures 20, the isolation structures 20 are arranged at intervals from each other. It can be understood that the isolation structure 20 is an annular structure. It should be noted that the opening area CC can be a symmetrical shape such as a circle, a quadrilateral, or an asymmetrical shape. Correspondingly, the isolation structure 20 can also be a stacked shape such as a circular ring, a polygonal ring, or an asymmetrical shape. Figure 1 The illustrated embodiment shows a case where the opening area CC is circular.

[0100] Figure 5A is a schematic diagram of the cross-sectional structure of a display panel in some embodiments of the present disclosure. Figure 5B It is a schematic diagram of the cross-sectional structure of the display panel in some other embodiments of the present disclosure. Figure 5C It is a schematic diagram of the cross-sectional structure of the display panel in some other embodiments of the present disclosure. Figure 5D It is a schematic diagram of the cross-sectional structure of the display panel in some other embodiments of the present disclosure. Fig. 6A It is a schematic diagram of the cross-sectional structure of the display panel in some other embodiments of the present disclosure. Figure 6B It is a schematic diagram of the cross-sectional structure of the display panel in some other embodiments of the present disclosure.

[0101] like FIG. 5A to FIG. 5D as well as Fig. 6A and Figure 6B As shown, the isolation structure 20 includes a first isolation portion 21 and a second isolation portion 22 which are sequentially arranged in a direction away from the base substrate 10. The orthographic projection of a portion of the second isolation portion 22 on the base substrate 10 is located within the orthographic projection range of the first isolation portion 21 on the base substrate 10, and the orthographic projection of another portion of the second isolation portion 22 on the base substrate 10 is located outside the orthographic projection of the first isolation portion 21 on the base substrate 10.

[0102] It should be noted that, in the embodiment of the present disclosure, the orthographic projection of a portion of the second isolation portion 22 on the base substrate 10 is located within the orthographic projection range of the first isolation portion 21 on the base substrate 10, and the orthographic projection of another portion on the base substrate 10 is located outside the orthographic projection of the first isolation portion 21 on the base substrate 10. This is to allow the second isolation portion 22 to extend beyond the first isolation portion 21 in a direction parallel to the plane of the base substrate 10, so that the first isolation portion 21 forms an undercut structure, thereby ensuring the isolation effect of the isolation structure 20.

[0103] For example, in Figure 5A , Fig. 6A and Figure 6BIn the illustrated embodiment, the orthographic projection of the second isolation portion 22 on the base substrate 10 exceeds the orthographic projection of the first isolation portion 21 on the base substrate 10 on both the side close to the opening area CC and the side close to the display area AA. Figure 5B and Figure 5C In the illustrated embodiment, the orthographic projection of the second isolation portion 22 on the base substrate 10 exceeds the orthographic projection of the first isolation portion 21 on the base substrate 10 on the side close to the opening area CC. Figure 5D In the illustrated embodiment, the orthographic projection of the second isolation portion 22 on the base substrate 10 exceeds the orthographic projection of the first isolation portion 21 on the base substrate 10 on the side close to the display area AA.

[0104] The second isolation portion 22 includes: a first surface 221 facing the base substrate 10, a second surface 222 facing away from the base substrate 10, and a first side surface 223 and a second side surface 224 connecting the bottom surface and the top surface, the first side surface 223 facing the display area AA, and the second side surface 224 facing the opening area CC. The material of the second isolation portion 22 includes a conductive material. The display panel also includes: an insulating layer 40 located in the isolation area BB and on the side of the isolation structure 20 away from the base substrate 10. The orthographic projection of the insulating layer 40 on the base substrate 10 covers at least part of the orthographic projection of the second surface 222 on the base substrate 10, and the insulating layer 40 covers at least one of the first side surface 223 and the second side surface 224. For example, in FIG. 5A to FIG. 5D as well as Fig. 6A and Figure 6B In the illustrated embodiment, a portion of the insulating layer 40 covers the second surface 222, and another portion covers at least one of the first side surface 223 and the second side surface 224. Fig. 6A In the illustrated embodiment, the insulating layer 40 covers a portion of the second surface 222 and the second side surface 224. Figure 5A , Figure 5B , Figure 5C and Figure 5D In the illustrated embodiment, the insulating layer 40 covers the second surface 222, the first side surface 223 and the second side surface 224. Figure 6B In the illustrated embodiment, the insulating layer 40 covers a portion of the second surface 222 and the first side surface 223 .

[0105] like FIG. 5A to FIG. 5D As shown, the display panel further includes a first electrode layer located on the side of the layer where the insulating layer 40 is located away from the substrate. The first electrode layer includes a first electrode CTD located in the display area AA and a redundant electrode 70 located in the isolation area BB. At least part of the redundant electrode 70 is located on the side of the insulating layer 40 away from the substrate 10. Optionally, part of the redundant electrode 70 is also located between two adjacent isolation structures 20.

[0106] exist FIG. 5A to FIG. 5D The illustrated embodiment provides an insulating layer 40 on a side of the isolation structure 20 away from the base substrate, and the insulating layer 40 covers the first side 223 and the second side 224 of the second isolation portion 22, so that the side of the second isolation portion 22 facing the opening area CC and the side facing the display area AA can be effectively isolated from the redundant electrode 70, which is equivalent to providing a layer of insulating layer 40 between the redundant electrode 70 and the isolation structure 20 to avoid overlapping of the isolation structure 20 and the redundant electrode 70 on the side of the isolation structure 20, thereby increasing the power-off effect of the isolation structure 20, avoiding the isolation structure 20 from being charged, and further avoiding the occurrence of electrochemical corrosion and the generation of GDSH.

[0107] Fig. 7A It is a schematic diagram of the cross-sectional structure of the display panel in some other embodiments of the present disclosure. Figure 7B It is a schematic diagram of the cross-sectional structure of the display panel in some other embodiments of the present disclosure.

[0108] Specifically, Fig. 7A and Figure 7B As shown, when the isolation structure 20 separates the first electrode layer to form the redundant electrode 70, it can achieve the power-off effect in both the "lateral" and "circumferential" directions. Wherein, "lateral" refers to the arrangement direction of the opening area CC and the display area AA. For example, the redundant electrode 70 between two adjacent isolation structures 20 and the redundant electrode 70 on the side of the isolation structure 20 away from the base substrate 10 are disconnected in the "lateral" direction. "Circumferential" refers to the direction surrounding the opening area CC. For example, the redundant electrode 70 located on the side of the isolation structure 20 away from the base substrate 10 also surrounds the opening area CC and is disconnected from the isolation structure 20 as a whole. Therefore, the embodiment of the present disclosure can completely disconnect the isolation structure 20 from the first electrode layer.

[0109] exist Figure 7B In the embodiment shown, since the insulating layer 40 covers one complete side surface of the isolation structure 20, even if a portion of the redundant electrode 70 falls between two adjacent isolation structures 20, power can be cut off in the "lateral" and "circumferential" directions. Fig. 7A In the embodiment shown, in order to prevent the redundant electrode 70 located between two adjacent isolation structures 20 from being electrically connected to the bottom of the isolation structure 20, a certain distance is required between the two adjacent isolation structures 20. Figure 7B The embodiment shown does not require the spacing between two adjacent isolation structures 20. Even if the distance is relatively close, the isolation structure 20 in FIG. 7 can be completely disconnected from the first electrode layer due to the presence of the insulating layer 70. Figure 7B The embodiment shown is compared to Fig. 7A The illustrated embodiment is more conducive to achieving a narrow frame of the display panel.

[0110] exist Fig. 6A and Figure 6B In the illustrated embodiment, the insulating layer 40 covers one of the first side surface 223 and the second side surface 224. That is, the other of the first side surface 223 and the second side surface 224 is not covered by the insulating layer 40. In this case, the first side surface 223 or the second side surface 224 not covered by the insulating layer 40 is still easy to overlap with the redundant electrode 70, so that the isolation structure 20 and the first electrode layer cannot be completely disconnected, and an electric field still exists in the isolation area BB, thereby causing electrochemical corrosion and resulting in GDSH. Figure 7C Schematic diagram of the cross-sectional structure of the display panel in other embodiments of the present disclosure. Figure 7C As shown, in order to further completely cut off the power supply of the isolation structure 20, the display panel further includes: an insulating support column 30 located in the isolation area BB, and the insulating support column 30 covers the other of the first side surface 223 and the second side surface 224. The insulating support column 30 can play a role of electrical insulation. Therefore, the embodiment of the present disclosure can achieve a design of completely cutting off the power supply of the isolation structure 20 and the first electrode layer in the "lateral" and "circumferential directions" under the combined action of the insulating layer 40 and the insulating support column 30.

[0111] Optionally, the material of the insulating support column 30 may include an organic material, such as photoresist (Pr).

[0112] Compared to Figure 7C The embodiment shown, Fig. 7A and Figure 7B The illustrated embodiment does not require the additional provision of insulating support pillars 30 to achieve complete electrical disconnection between the isolation structure 20 and the first electrode layer in the “lateral” and “circumferential” directions.

[0113] In some embodiments, the step of preparing the insulating support column 30 includes: after forming an organic material layer on a side of the isolation structure 10 away from the base substrate 10, patterning the organic material layer to form the insulating support column 30. Fig. 7A and Figure 7B Since the illustrated embodiment does not require the provision of the insulating support column 30 , the problem of residual organic materials due to the need to prepare the insulating support column 30 can also be avoided.

[0114] Fig. 8A It is a schematic diagram of the cross-sectional structure of the display panel in some other embodiments of the present disclosure. Figure 8B It is a schematic diagram of the cross-sectional structure of the display panel in some other embodiments of the present disclosure. Figure 8C It is a schematic diagram of the cross-sectional structure of the display panel in some other embodiments of the present disclosure.

[0115] In some embodiments, Fig. 8A , Figure 8B and Figure 8C As shown, the isolation structure 20 further includes a third isolation portion 23 located between the first isolation portion 21 and the substrate 10. There are multiple isolation structures 20, and the first isolation portions 21 of the multiple isolation structures 20 are spaced apart from each other. The second isolation portions 22 of the multiple isolation structures 20 are spaced apart from each other.

[0116] like Fig. 8A and Figure 8C As shown, the third isolation parts 23 of at least two adjacent isolation structures 20 are connected as an integral structure. The embodiment of the present disclosure can use the same patterned isolation material layer to prepare two adjacent isolation structures 20. In the two adjacent isolation structures 20, the side of one isolation structure 20 facing the opening area CC is arranged opposite to the side of the other isolation structure 20 facing the display area AA. Therefore, the embodiment of the present disclosure can use the same etching process to synchronously etch the two oppositely arranged sides of the two adjacent isolation structures 20, thereby reducing the difficulty of preparing the isolation structure.

[0117] In some embodiments, FIG. 5A to FIG. 5D as well as Fig. 6A and Figure 6B As shown, the first isolation portion 21 includes a third side surface 213 and a fourth side surface 214, the third side surface 213 faces the display area AA, and the fourth side surface 214 faces the opening area CC. The fourth side surface 224 is a curved surface that is bent away from the opening area CC, and / or the third side surface 223 is a curved surface that is bent away from the display area AA.

[0118] For example, in Figure 5A , Fig. 6A and Figure 6B In the embodiment shown, the fourth side surface 214 is a curved surface that is bent away from the opening area CC, and the third side surface 213 is a curved surface that is bent away from the display area AA. Figure 5B and Figure 5C In the embodiment shown, the fourth side surface 214 is a curved surface that is bent away from the opening area CC. Figure 5D In the illustrated embodiment, the third side surface 213 is a curved surface that is bent away from the display area AA.

[0119] In the disclosed embodiment, since the insulating layer 20 covers at least one of the first side surface 223 and the second side surface 224 of the second isolation portion 22, that is, the insulating layer 20 does not cover the third side surface 213 of the first isolation portion 21, nor does it cover the fourth side surface 214 of the first isolation portion 21. In this case, in order to further avoid the first electrode layer from overlapping the third side surface 213 or the fourth side surface 214 of the first isolation portion 31, the fourth side surface 224 is designed to be a curved surface that is bent away from the opening area CC, and / or the third side surface 223 is designed to be a curved surface that is bent away from the display area AA, that is, it can be understood that at least one of the third side surface 213 and the fourth side surface 214 is an inwardly concave curved surface, so that the third side surface 213 and the fourth side surface 214 are away from the redundant electrode 70 that falls on the side of the isolation structure 20, thereby further enhancing the power-off effect of the isolation structure 20. At the same time, since at least one of the third side surface 213 and the fourth side surface 214 is an inwardly concave curved surface, the isolation effect of the isolation structure 20 can also be enhanced. Especially in such as Figure 5A , Fig. 6A and Figure 6B In the illustrated embodiment, the third side surface 213 and the fourth side surface 214 are both inwardly concave curved surfaces, which can further ensure the power-off effect between the first isolation portion 21 and the first electrode layer, and can also ensure the isolation effect of the isolation structure 20 on both sides facing the opening area CC and the display area AA.

[0120] In some embodiments, Figure 5B and Figure 5C As shown, the fourth side surface 214 is a curved surface that is bent away from the opening area CC, and the insulating layer 40 also covers the third side surface 213 .

[0121] In some embodiments, Figure 5D As shown, the third side surface 213 is a curved surface that is bent away from the display area AA, and the insulating layer 40 also covers the fourth side surface 214 .

[0122] In the embodiment of the present disclosure, when one of the third side surface 213 and the fourth side surface 214 is an inwardly concave curved surface, the other of the third side surface 213 and the fourth side surface 214 is further covered by the insulating layer 40, that is, the third side surface 213 or the fourth side surface 214 in the first isolation portion 21 that is not arranged as an inwardly concave curved surface is covered by the insulating layer 40, which can further ensure the power-off effect between the third side surface 213 or the fourth side surface 214 that is not arranged as an inwardly concave curved surface and the first electrode layer.

[0123] Fig.9A It is a schematic diagram of the cross-sectional structure of the display panel in some other embodiments of the present disclosure. Fig. 9B It is a schematic diagram of the cross-sectional structure of the display panel in some other embodiments of the present disclosure. Fig. 9CIt is a schematic diagram of the cross-sectional structure of the display panel in some other embodiments of the present disclosure.

[0124] In some embodiments, Fig.9A , Fig. 9B and Fig. 9C As shown, the isolation structure 20 further includes a fifth isolation portion 25 located between the first isolation portion 21 and the base substrate 10. Fig.9A and Fig. 9B As shown, the fifth isolation portion 25 includes a fifth side surface 251 and a sixth side surface 252 , the fifth side surface 251 faces the display area AA, and the sixth side surface 252 faces the opening area CC.

[0125] exist Fig.9A In the illustrated embodiment, the fourth side surface 214 is a curved surface that is bent away from the opening region CC, and the insulating layer 40 also covers the third side surface 213 and the fifth side surface 251 .

[0126] exist Fig. 9B In the illustrated embodiment, the third side surface 213 is a curved surface that is bent away from the display area AA, and the insulating layer 40 also covers the fourth side surface 214 and the sixth side surface 252 .

[0127] In the embodiment of the present disclosure, by setting the fifth isolation part 25 between the first isolation part 21 and the base substrate 10, the overall height or thickness of the isolation structure 20 can be adjusted, thereby improving the isolation effect of the isolation structure 20. Furthermore, the fourth side surface 214 is an inwardly concave curved surface, which can ensure the isolation effect of the isolation structure 20. At the same time, the insulating layer 40 also covers the third side surface 213 and the fifth side surface 251, which can effectively ensure the power-off effect between the isolation structure 20 and the first electrode layer. Similarly, the third side surface 213 is an inwardly concave curved surface, which can ensure the isolation effect of the isolation structure 20. At the same time, the insulating layer 40 also covers the fourth side surface 214 and the sixth side surface 252, which can effectively ensure the power-off effect between the isolation structure 20 and the first electrode layer.

[0128] In some embodiments, the display panel further includes a first source-drain metal layer SD1 and a second source-drain metal layer SD2 located in the display area AA and sequentially arranged in a direction away from the base substrate 10. The first isolation portion 21 is arranged in the same layer as at least a portion of the first source-drain metal layer SD1, and the fifth isolation portion 25 is arranged in the same layer as at least a portion of the second source-drain metal layer SD2.

[0129] In the embodiment of the present disclosure, the first isolation portion 21 is disposed in the same layer as at least part of the first source-drain metal layer SD1 , and the fifth isolation portion 25 is disposed in the same layer as at least part of the second source-drain metal layer SD2 , which can reduce the difficulty of manufacturing and save the manufacturing cost.

[0130] Fig. 10A is a schematic diagram of the cross-sectional structure of a display panel in some embodiments of the present disclosure. Fig. 10B is a schematic diagram of the cross-sectional structure of a display panel in some embodiments of the present disclosure.

[0131] In some embodiments, Fig. 10A As shown, the display panel further includes a source-drain metal layer SD, a passivation layer PVX and a planarization layer PLN sequentially arranged in a direction away from the base substrate 10. Moreover, the source-drain metal layer SD, the passivation layer PVX and the planarization layer PLN are all located in the display area AA.

[0132] The source-drain metal layer SD includes a first metal layer 61 and a second metal layer 62 located on a side of the first metal layer 61 away from the substrate 10. The first isolation portion 21 is disposed on the same layer as the first metal layer 61.

[0133] The second isolation part 22 includes a first isolation layer 201 and a second isolation layer 202 sequentially arranged in a direction away from the base substrate 10. The first isolation layer 201 is arranged in the same layer as the second metal layer 62, the second isolation layer 202 is arranged in the same layer as the passivation layer PVX, and the insulating layer 40 is arranged in the same layer as the planarization layer PLN.

[0134] Alternatively, in other embodiments, Fig. 10A As shown, the source-drain metal layer SD further includes a third metal layer 63 located on the side of the first metal layer 61 close to the substrate 10. The isolation structure 20 further includes a third isolation portion 23 located on the side of the first isolation portion 21 close to the substrate 10. The third isolation portion 23 and the third metal layer 63 are disposed in the same layer.

[0135] It should be noted that the first metal layer 61, the second metal layer 62 and the third metal layer 63 are not necessarily independent metal film layers, but may be parts of the same metal film layer. Fig. 10B In the embodiment shown, the material of the source-drain metal layer SD includes Ti, Al, and Ti stacked in sequence. The Ti, Al, and Ti stacked in sequence in a direction away from the substrate 10 do not correspond in sequence. Fig. 10A The third metal layer 63, the first isolation layer 201 and the second metal layer 62 in the embodiment of the present invention are shown in FIG. 1 . For example, the second metal layer 62 may include Ti and a portion of Al located on the side of Al away from the substrate 10. The first metal layer 61 may include a portion of Al. The third metal layer 63 may include Ti located on the side of Al close to the substrate 10, or may include Ti and a portion of Al located on the side of Al close to the substrate 10.

[0136] For ease of understanding, the preparation method of the isolation structure of the embodiment of the present disclosure is described. Fig.11A is a flow chart of preparing the isolation structure in some embodiments of the present disclosure. The preparation method of the isolation structure in some embodiments of the present disclosure comprises the following steps:

[0137] Step S1: Fig.11A As shown in (a) of FIG. 1 , a second isolation layer 202 of the second isolation portion 22 is formed on a side of the material layers (Ti / Al / Ti) of the source / drain metal layers SD stacked in sequence away from the base substrate 10 .

[0138] Step S2: Fig.11A As shown in (b), the material layer of the source-drain metal layer SD is etched to obtain the first isolation layer 201 of the second isolation part, and the etching depth can be set according to actual needs. Fig.11A In the embodiment shown in (b), Ti and a portion of Al located on the side of Al away from the substrate 10 are etched, and the corresponding metal film layer after etching corresponds to the first isolation layer 201 formed.

[0139] Step S3: Fig.11A As shown in (c), an insulating layer 40 is formed on the side of the second isolation layer 202 away from the base substrate 10, wherein the insulating layer 40 covers the second surface of the second isolation portion 22 away from the base substrate 10. And it also covers at least one of the first side of the second isolation portion 22 facing the display area AA and the second side facing the opening area. In the embodiment of the present disclosure, the insulating layer 40 covers the first side of the second isolation portion 22 facing the display area AA. For the film layer located on the side of the second isolation portion 22 close to the base substrate 10, that is, part of Al and the side of Ti located on the side of Al close to the base substrate 10 facing the opening area CC and the side facing the display area AA, the insulating layer 40 at most wraps one of the two sides. The side not wrapped by the insulating layer 40 is subsequently used to prepare the concave side of the first isolation portion 21. For example, in the embodiment of the present disclosure, the insulating layer 40 wraps the side of the film layer located on the side of the second isolation portion 22 close to the base substrate 10 facing the display area AA. The side surface of the film layer located at the side of the second isolation portion 22 close to the base substrate 10 and facing the opening region CC is used as the inwardly concave side surface of the first isolation portion 21 .

[0140] Step S4: Fig.11A As shown in (d), the portion of the film layer located on the side of the second isolation portion 22 close to the base substrate 10 and not covered by the insulating layer 40 is further etched, and the etching depth can also be set according to actual needs. For example, Fig.11A The embodiment shown in (d) in FIG. 10 etches part of Al. Optionally, vertical etching can be first performed in this step, that is, after the film layer located on the side of the second isolation portion 22 close to the base substrate 10 is etched in this step, its side surface is perpendicular to the base substrate 10.

[0141] Step S5: Fig.11AAs shown in (e) in step S4, the vertical side surface in step S4 is further etched. Optionally, lateral etching is adopted in this step, that is, a concave side surface is formed. Among them, a portion of Al with a concave side surface is the first isolation portion 21. The remaining portion of Al and Ti located on the side of Al close to the substrate 10 are the third isolation portion 23.

[0142] From the above, it can be seen that the first metal layer 61, the second metal layer 62 and the third metal layer 63 of the source-drain electrode layer SD in the embodiment of the present disclosure do not necessarily correspond to the Ti, Al, and Ti film layers in sequence. Those skilled in the art should know that the specific film layers of the first metal layer 61, the second metal layer 62 and the third metal layer 63 of the source-drain electrode layer SD in the embodiment of the present disclosure are actually related to the actual preparation process.

[0143] The disclosed embodiment enables the first isolation layer 201 to be disposed on the same layer as the second metal layer 62, the second isolation layer 202 to be disposed on the same layer as the passivation layer PVX, and the insulating layer 40 to be disposed on the same layer as the planarization layer PLN, which can simplify the preparation process and reduce the difficulty of preparation. At the same time, since the passivation layer PVX will not be etched when the material of the source-drain metal layer SD is etched, the second isolation layer 202 can also be used to assist in the preparation of the first isolation layer 201 and the first isolation portion 21, and to assist in the subsequent formation of the insulating layer 40 to cover the first side and / or the second side of the second isolation portion 22, thereby ensuring the power-off effect between the isolation structure 20 and the subsequent first electrode layer.

[0144] Optionally, when the display panel includes multiple source-drain metal layers SD, for example Figure 4B In the illustrated embodiment, when the first source-drain metal layer SD1 is used to prepare the first isolation portion 21, the etching in step S2 is the same etching process as the etching for obtaining the second source-drain metal layer SD2, the etching in step S4 is the same etching process as the etching for obtaining the third source-drain metal layer SD3, and the etching in step S5 is the same etching process as the etching for obtaining the second electrode AND.

[0145] The disclosed embodiment can prepare the isolation structure 20 without adding an additional etching process, thereby simplifying the preparation process and reducing the preparation cost.

[0146] Fig. 11B It is a schematic diagram of the cross-sectional structure of the isolation structure in other embodiments of the present disclosure.

[0147] In some other embodiments, in step S1, Fig.11AAs shown in (a) of FIG. 1 , before the second isolation layer 202 of the second isolation portion 22 is formed on the side of the source / drain metal layer SD stacked in sequence (Ti / Al / Ti) away from the substrate 10, the source / drain metal layer SD may be etched first, for example, Ti located on the side of Al away from the substrate 10 is etched away. On this basis, steps S2 to S5 are performed to obtain Fig. 11B The isolation structure shown.

[0148] Fig.11A The isolation structure obtained in (e) is compared with Fig. 11B The isolation structure shown has one less etching process, thus reducing the difficulty of preparation and saving costs.

[0149] Fig.12 It is a schematic diagram of the cross-sectional structure of the display panel in some other embodiments of the present disclosure.

[0150] In some embodiments, Fig.12 As shown, the display panel further includes a source-drain metal layer SD, a first planarization layer PLN1 and a second planarization layer PLN2 sequentially arranged in a direction away from the base substrate 10. Moreover, the source-drain metal layer SD, the first planarization layer PLN1 and the second planarization layer PLN2 are all located in the display area AA.

[0151] The source-drain metal layer SD includes a first metal layer 61 and a second metal layer 62 located on a side of the first metal layer 61 away from the substrate 10. The first isolation portion 21 is disposed on the same layer as the first metal layer 61;

[0152] The second isolation part 22 includes a first isolation layer 201 and a second isolation layer 202 which are sequentially arranged in a direction away from the base substrate 10. The first isolation layer 201 is arranged in the same layer as the second metal layer 62, the second isolation layer 202 is arranged in the same layer as the first planarization layer PLN1, and the insulating layer 40 is arranged in the same layer as the second planarization layer PLN2.

[0153] The disclosed embodiment enables the first isolation layer 201 to be disposed on the same layer as the second metal layer 62, the second isolation layer 202 to be disposed on the same layer as the first planarization layer PLN1, and the insulating layer 40 to be disposed on the same layer as the second planarization layer PLN2, which can simplify the preparation process and reduce the difficulty of preparation. At the same time, since the material of the first passivation layer PLN1 will not be etched when the material of the source-drain metal layer SD is etched, the second isolation layer 202 can also assist in the preparation of the first isolation layer 201 and the first isolation portion 21, and assist in the subsequent formation of the insulating layer 40 to cover the first side and / or the second side of the second isolation portion 22, thereby ensuring the power-off effect between the isolation structure 20 and the subsequent first electrode layer.

[0154] It should be noted that the embodiment of the present disclosure does not limit the number of layers of the source and drain metal layer SD, the passivation layer PVX, and the planarization layer PLN. On the basis of meeting the film layer material of the isolation structure 20 in the embodiment of the present disclosure, during preparation, a combination of film layers whose front and back relationships meet the requirements can be selected according to actual conditions. The following is an explanation of each in conjunction with specific embodiments.

[0155] For example, in Figure 4A In the display panel shown, the first source-drain metal layer SD1 includes a first metal layer 61 and a second metal layer 62 located on the side of the first metal layer 61 away from the base substrate 10. The first isolation portion 21 is disposed in the same layer as the first metal layer 61. The first isolation layer 201 of the second isolation portion 22 is disposed in the same layer as the second metal layer 62.

[0156] The second isolation layer 202 of the second isolation part 22 is disposed in the same layer as the first passivation layer PVX1, and the insulating layer 40 is disposed in the same layer as the second planarization layer PLN2. Alternatively, the second isolation layer 202 of the second isolation part 22 is disposed in the same layer as the first planarization layer PLN1, and the insulating layer 40 is disposed in the same layer as the second planarization layer PLN2.

[0157] For example, this Figure 4B In the lower middle display panel shown, the first source-drain metal layer SD1 includes a first metal layer 61 and a second metal layer 62 located on the side of the first metal layer 61 away from the base substrate 10. The first isolation portion 21 is disposed in the same layer as the first metal layer 61. The first isolation layer 201 of the second isolation portion 22 is disposed in the same layer as the second metal layer 62.

[0158] The second isolation layer 202 of the second isolation portion 22 is arranged in the same layer as the first passivation layer PVX1, and the insulating layer 40 is arranged in the same layer as the second planarization layer PLN2. Alternatively, the second isolation layer 202 of the second isolation portion 22 is arranged in the same layer as the planarization layer PVX, and the insulating layer 40 is arranged in the same layer as the third planarization layer PLN3. Alternatively, the second isolation layer 202 of the second isolation portion 22 is arranged in the same layer as the first planarization layer PLN1, and the insulating layer 40 is arranged in the same layer as the second planarization layer PLN2. Alternatively, the second isolation layer 202 of the second isolation portion 22 is arranged in the same layer as the first planarization layer PLN1, and the insulating layer 40 is arranged in the same layer as the third planarization layer PLN3. Alternatively, the second isolation layer 202 of the second isolation portion 22 is arranged in the same layer as the second planarization layer PLN2, and the insulating layer 40 is arranged in the same layer as the third planarization layer PLN3.

[0159] Optionally, a second passivation layer may be disposed between the second source-drain metal layer SD2 and the third planarization layer PLN.

[0160] In this case, the first source-drain metal layer SD1 includes a first metal layer 61 and a second metal layer 62 located on a side of the first metal layer 61 away from the base substrate 10. The first isolation portion 21 is arranged in the same layer as the first metal layer 61. The first isolation layer 201 of the second isolation portion 22 is arranged in the same layer as the second metal layer 62. The second isolation layer 202 of the second isolation portion is arranged in the same layer as the second passivation layer, and the insulating layer 40 is arranged in the same layer as the third planarization layer PLN3.

[0161] Alternatively, the second source-drain metal layer SD2 includes a first metal layer 61 and a second metal layer 62 located on a side of the first metal layer 61 away from the base substrate 10. The first isolation portion 21 is arranged in the same layer as the first metal layer 61. The first isolation layer 201 of the second isolation portion 22 is arranged in the same layer as the second metal layer 62. The second isolation layer 202 of the second isolation portion is arranged in the same layer as the second passivation layer, and the insulating layer 40 is arranged in the same layer as the third planarization layer PLN3.

[0162] Of course, the passivation layer can also be set in multiple layers according to actual needs. For example, the first passivation layer PVX1 and the second passivation layer between the second source and drain metal layer SD2 and the third planarization layer PLN exist at the same time. In this case, different embodiments can combine the source and drain metal layers SD, the passivation layer PVX and the planarization layer PLN that satisfy the film layer relationship according to actual needs to prepare an isolation structure 20 and an insulating layer 40, etc.

[0163] The disclosed embodiment can use the source-drain metal layer SD to prepare a first isolation portion with a partitioning effect, and use the planarization layer PLN above the source-drain metal layer SD to form an insulating layer 40 covering at least part of the side of the isolation structure 20 to ensure the power-off effect of the isolation structure 20. Furthermore, the passivation layer PVX between the source-drain metal layer SD and the planarization layer PLN above it, or another planarization layer PLN between the source-drain metal layer SD and the planarization layer PLN above it, is used to prepare a second isolation portion 22 to assist in preparing the first isolation portion 22 with a partitioning effect, simplify the preparation process, and reduce the difficulty of preparation.

[0164] Fig.13 It is a schematic diagram of the cross-sectional structure of the display panel in some other embodiments of the present disclosure.

[0165] In some embodiments, Fig.13As shown, the isolation structure 20 further includes a fourth isolation portion 24 located between the insulating layer 40 and the second isolation portion 22; the fourth isolation portion 24 includes a third surface 241 facing the base substrate 10, a fourth surface 242 facing away from the base substrate 10, and a seventh side surface 243 and an eighth side surface 244 located between the third surface 241 and the fourth surface 242, the seventh side surface 243 facing the opening area CC, and the eighth side surface 244 facing the display area AA. The insulating layer 40 covers the fourth surface 242, the seventh side surface 243 and the eighth side surface 244.

[0166] In the embodiment of the present disclosure, by disposing the fourth isolation portion 24 on the side of the second isolation portion 22 away from the base substrate 10 , the thickness or height of the isolation structure 20 as a whole can be flexibly adjusted, thereby enhancing the power-off effect of the isolation structure 20 .

[0167] Alternatively, if Fig.13 As shown, the minimum distance from the orthographic projection of the seventh side 243 on the base substrate 10 to the edge of the display area AA is smaller than the minimum distance from the orthographic projection of the third side 213 on the base substrate 10 to the edge of the display area AA, and / or the minimum distance d1 from the orthographic projection of the eighth side 244 on the base substrate 10 to the edge CC of the opening area is smaller than the minimum distance d2 from the orthographic projection of the fourth side 214 on the base substrate 10 to the edge of the opening area CC. Fig.13 An exemplary case is given in which the minimum distance d1 of the orthogonal projection of the eighth side surface 244 on the base substrate 10 to the edge CC of the opening area is less than the minimum distance d2 of the orthogonal projection of the fourth side surface 214 on the base substrate 10 to the edge of the opening area CC. It can also be understood that, in the embodiment of the present disclosure, the fourth isolation portion 24 exceeds the first isolation portion 21 on at least one side close to the display area AA and close to the opening area CC. The embodiment of the present disclosure can increase the partition effect of the isolation structure 10.

[0168] In some embodiments, the display panel further includes a first source-drain metal layer SD1 and a second source-drain electrode layer SD2 which are sequentially arranged in a direction away from the base substrate 10. The first source-drain metal layer SD1 and the second source-drain electrode layer SD2 are located in the display area AA. The first isolation portion 21 is arranged in the same layer as at least a portion of the first source-drain metal layer SD1, and the fourth isolation portion 24 is arranged in the same layer as at least a portion of the second source-drain metal layer SD2. It can also be understood that the embodiment of the present disclosure uses a layer of source-drain metal layer SD to prepare the first isolation portion 21, and uses another layer of source-drain metal layer SD2 located on the upper layer of the source-drain metal layer SD to prepare the fourth isolation portion 24. For example, in Fig.13 In the embodiment shown, the first isolation portion 21 is disposed in the same layer as at least part of the first source-drain metal layer SD2, and the fourth isolation portion 24 is disposed in the same layer as at least part of the second source-drain metal layer SD3. The disclosed embodiment can simplify the manufacturing process and reduce the difficulty of manufacturing.

[0169] Fig.14 It is a schematic diagram of the cross-sectional structure of the display panel in some other embodiments of the present disclosure.

[0170] In some embodiments, Fig.14 As shown, the display panel further includes a light shielding layer BSM, a gate metal layer gate, and a gate insulating layer GI which are located in the display area AA and are sequentially arranged in a direction away from the base substrate 10. Figure 4A and Figure 4B In the illustrated embodiment, the display panel further includes a light shielding layer BSM, a first gate metal layer gate1 , a first gate insulating layer GI1 , a first gate metal layer gate2 and a first gate insulating layer GI2 which are sequentially arranged in a direction away from the base substrate 10 .

[0171] The display panel further includes a spacer structure 50 located between the isolation structure 20 and the base substrate 10. The spacer structure 50 is disposed in the same layer as at least one of the light shielding layer BSM, the gate metal layer gate, and the gate insulating layer GI.

[0172] exist Fig.14 In the embodiment shown, the spacer structure 50 includes a first spacer layer 51, a second spacer layer 52, a third spacer layer 53 and a fourth spacer layer 54 which are sequentially arranged in a direction away from the base substrate 10. The first spacer layer 51, the second spacer layer 52, the third spacer layer 53 and the fourth spacer layer 54 are respectively and sequentially arranged with the base substrate 10. Figure 4A or Figure 4B The first gate metal layer gate1, the first gate insulating layer GI1, the first gate metal layer gate2 and the first gate insulating layer GI2 are arranged in the same layer.

[0173] In summary, the embodiment of the present disclosure can prevent the redundant electrode 70 from overlapping the side of the second isolation part 22 only through the insulating layer 40 or through the cooperation of the insulating layer 40 and the insulating support column 30. At the same time, the embodiment of the present disclosure sets at least one side of the first isolation part 21 as a concave curved surface, while ensuring the isolation effect of the isolation structure 20, it can further prevent the redundant electrode 70 from overlapping the side of the first isolation part 21. Therefore, the embodiment of the present disclosure can cut off the power of the isolation structure 20.

[0174] Fig. 11C It is a schematic diagram of the cross-sectional structure of the isolation structure in other embodiments of the present disclosure. Fig.11D It is a schematic diagram of the cross-sectional structure of the isolation structure in other embodiments of the present disclosure. Fig.11E It is a schematic diagram of the cross-sectional structure of the isolation structure in other embodiments of the present disclosure. Fig.11F It is a schematic diagram of the cross-sectional structure of the isolation structure in other embodiments of the present disclosure.

[0175] When the display area AA is provided with a plurality of source-drain metal layers SD, (e) and (e) in FIG. Fig. 11C as well as Fig.11D In the isolation structure shown, there is a film layer disposed at the same layer as the source-drain metal layer SD, wherein the source-drain metal layer SD is not limited to a specific layer and can be selected according to actual conditions and preparation processes. Fig.11E and Fig.11F The isolation structures shown all have film layers disposed on the same layer as the first source-drain metal layer SD1 and the second source-drain metal layer SD2. Specifically, Fig.11E The isolation structure 20 includes a first isolation portion 21, a second isolation portion 22, a third isolation portion 23 and a fifth isolation portion 25. The fifth isolation portion 25 is disposed in the same layer as the first source-drain metal layer SD1, and the first isolation layer 201, the first isolation portion 21 and the third isolation portion 23 are disposed in the same layer as the second source-drain metal layer SD2. Fig.11F The isolation structure 20 in the embodiment includes a first isolation portion 21, a second isolation portion 22, a third isolation portion 23 and a fourth isolation portion 24. The fourth isolation portion 24 is disposed in the same layer as the second source-drain metal layer SD2, and the first isolation layer 201, the first isolation portion 21 and the third isolation portion 23 are disposed in the same layer as the first source-drain metal layer SD1. Similarly, when a multi-layer passivation layer PVX and a multi-layer planarization layer PLN are disposed in the display area AA, the second isolation layer 202 in the embodiment of the present disclosure can be adaptively selected according to the preparation order of the film layers.

[0176] The disclosed embodiment can match the preparation of corresponding isolation structures 20 and insulating layers 40 in different display panels through the combination of source-drain metal layers SD, passivation layers PVX and planarization layers PLN, thereby disconnecting the isolation structure 20 from the first electrode layer to avoid electrochemical corrosion.

[0177] It should be noted that in the embodiment of the present disclosure, the marking of the display area AA, the isolation area BB and the opening area CC is to illustrate the position or direction relationship between the isolation structure 20 and the display area AA and the opening area CC respectively, and is not a limitation on the position of the isolation structure 20 in the isolation area BB.

[0178] The present disclosure also provides a display device, comprising a display panel and a photosensitive element as described in any embodiment of the present disclosure. The photosensitive element is located on the non-display side of the display panel and is arranged opposite to the opening. The photosensitive element can be a camera or the like.

[0179] It is to be understood that the above embodiments are merely exemplary embodiments used to illustrate the principles of the present disclosure, but the present disclosure is not limited thereto. For those of ordinary skill in the art, various modifications and improvements can be made without departing from the spirit and substance of the present disclosure, and these modifications and improvements are also considered to be within the scope of protection of the present disclosure.

Claims

1. A display panel, characterized in that: It comprises an opening area, an isolation area and a display area, wherein the isolation area surrounds the opening area, and the display area surrounds the isolation area; The display panel comprises: substrate substrate; At least one isolation structure located at one side of the substrate and located in the isolation area; the isolation structure is arranged around the opening area; The isolation structure comprises a first isolation portion and a second isolation portion which are sequentially arranged in a direction away from the base substrate; a part of the second isolation portion has an orthographic projection on the base substrate located within the orthographic projection range of the first isolation portion on the base substrate, and another part of the second isolation portion has an orthographic projection on the base substrate located outside the orthographic projection of the first isolation portion on the base substrate; the second isolation portion comprises: a first surface facing the base substrate, a second surface facing away from the base substrate, and a first side surface and a second side surface connecting the first surface and the second surface, the first side surface facing the display area, and the second side surface facing the opening area; the material of the second isolation portion comprises a conductive material; An insulating layer, wherein the insulating layer is located in the isolation region and on a side of the isolation structure away from the substrate; the orthographic projection of the insulating layer on the substrate covers at least a portion of the orthographic projection of the second surface on the substrate, and the insulating layer covers at least one of the first side and the second side.

2. The display panel according to claim 1, characterized in that: The insulating layer covers one of the first side surface and the second side surface; The display panel further comprises: an insulating support column located in the isolation area; The insulating support column covers the other of the first side surface and the second side surface.

3. The display panel according to claim 1, characterized in that: The first isolation portion includes a third side surface and a fourth side surface, the third side surface faces the display area, and the fourth side surface faces the opening area; The fourth side surface is a curved surface that is bent away from the opening area; And / or, the third side surface is a curved surface that is bent away from the display area.

4. The display panel according to claim 3, characterized in that: The fourth side surface is a curved surface that is bent away from the opening area; the insulating layer also covers the third side surface, Alternatively, the third side surface is a curved surface that is bent away from the display area, and the insulating layer also covers the fourth side surface.

5. The display panel according to claim 4, characterized in that: The isolation structure further includes a fifth isolation portion located between the first isolation portion and the base substrate; The fifth isolation portion includes a fifth side surface and a sixth side surface, the fifth side surface faces the display area, and the sixth side surface faces the opening area; The insulating layer also covers the third side surface and the fifth side surface; Alternatively, the insulating layer also covers the fourth side surface and the sixth side surface.

6. The display panel according to claim 5, characterized in that: The display panel further comprises a first source-drain metal layer and a second source-drain metal layer located in the display area and sequentially arranged in a direction away from the base substrate; The first isolation portion is disposed in the same layer as at least a portion of the first source-drain metal layer, and the fifth isolation portion is disposed in the same layer as at least a portion of the second source-drain metal layer.

7. The display panel according to any one of claims 1 to 5, characterized in that: The display panel further comprises a source-drain metal layer, a passivation layer and a planarization layer which are sequentially arranged in a direction away from the base substrate; the source-drain metal layer, the passivation layer and the planarization layer are located in the display area; the source-drain metal layer comprises a first metal layer and a second metal layer which is located on a side of the first metal layer away from the base substrate; The first isolation portion is disposed on the same layer as the first metal layer; The second isolation portion includes a first isolation layer and a second isolation layer sequentially arranged in a direction away from the base substrate; wherein the first isolation layer is arranged on the same layer as the second metal layer, the second isolation layer is arranged on the same layer as the passivation layer, and the insulating layer is arranged on the same layer as the planarization layer.

8. The display panel according to any one of claims 1 to 5, characterized in that: The display panel further comprises a source-drain metal layer, a first planarization layer and a second planarization layer which are sequentially arranged in a direction away from the base substrate; the source-drain metal layer, the first planarization layer and the second planarization layer are located in the display area; the source-drain metal layer comprises a first metal layer and a second metal layer located on a side of the first metal layer away from the base substrate; The first isolation portion is disposed on the same layer as the first metal layer; The second isolation portion includes a first isolation layer and a second isolation layer arranged in sequence along a direction away from the base substrate; wherein the first isolation layer is arranged on the same layer as the second metal layer, the second isolation layer is arranged on the same layer as the first planarization layer, and the insulating layer is arranged on the same layer as the second planarization layer.

9. The display panel according to any one of claims 1 to 5, characterized in that: The isolation structure further includes a fourth isolation portion located between the insulating layer and the second isolation portion; the fourth isolation portion includes a third surface facing the base substrate, a fourth surface away from the base substrate, and a seventh side surface and an eighth side surface located between the third surface and the fourth surface, the seventh side surface faces the opening area, and the eighth side surface faces the display area; The insulating layer covers the fourth surface, the seventh side surface, and the eighth side surface.

10. The display panel according to claim 9, characterized in that: The display panel further comprises a first source-drain metal layer and a second source-drain electrode layer which are sequentially arranged in a direction away from the base substrate; the first source-drain metal layer and the second source-drain electrode layer are located in the display area; The first isolation portion is disposed in the same layer as at least a portion of the first source-drain metal layer; The fourth isolation portion is disposed in the same layer as at least a portion of the second source-drain metal layer.

11. The display panel according to any one of claims 1 to 5, characterized in that: The display panel further comprises a light shielding layer, a gate metal layer, and a gate insulating layer which are located in the display area and are sequentially arranged in a direction away from the base substrate; The display panel further includes a spacer structure located between the isolation structure and the base substrate, and the spacer structure is disposed in the same layer as at least one of the light shielding layer, the gate metal layer, and the gate insulating layer.

12. The display panel according to any one of claims 1 to 5, characterized in that: The display panel further comprises a first electrode layer located on a side of the layer where the insulating layer is located away from the substrate; The first electrode layer includes a first electrode located in the display area and a redundant electrode located in the isolation area; at least a portion of the redundant electrode is located on a side of the insulating layer away from the base substrate.

13. The display panel according to any one of claims 1 to 6, characterized in that: The isolation structure further includes a third isolation portion located between the first isolation portion and the base substrate; There are multiple isolation structures, the first isolation parts of the multiple isolation structures are spaced apart from each other, and the second isolation parts of the multiple isolation structures are spaced apart from each other; The third isolation parts of at least two adjacent isolation structures are connected to form an integrated structure.

14. A display device, characterized in that: include: The display panel according to any one of claims 1 to 13; A photosensitive element is located on the non-display side of the display panel and is arranged opposite to the opening.

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