Display device and method for inspecting display device

Abstract

A display apparatus and a method for inspecting the display apparatus are provided. The display device includes a substrate, a light emitting element layer on the substrate and including a plurality of light emitting elements, and a light control layer on the light emitting element layer and including a light transmitting film and a light blocking film. The light control layer further includes an inspection pattern overlapping the light blocking film in a first direction, and the inspection pattern extends in the first direction, the first direction being the same direction as an extending direction of the plurality of regions of the light blocking film.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to and all benefits derived from Korean Patent Application No. 10-2023-0104150 filed in the Korean Intellectual Property Office on August 9, 2023, the contents of which are incorporated herein by reference in their entirety. Technical Field

[0003] The present disclosure relates to a display device and a method for inspecting the display device. Background Art

[0004] The display device may be a flat panel display device such as a liquid crystal display, a field emission display, or a light-emitting display. The light-emitting display device may be an organic light-emitting display device including an organic light-emitting diode element as a light-emitting element, or an inorganic light-emitting diode display device including an inorganic light-emitting diode element such as a light-emitting diode (LED) as a light-emitting element.

[0005] The development of the information society has placed increasing demands on display devices. For example, when an image is displayed on a vehicle display device at night, the image may be reflected by the windshield of the vehicle, and the reflected image may interfere with the driver's driving. Therefore, in order to prevent such reflection, it may be necessary to control the viewing angle of the image displayed on the vehicle display device. In addition, in order to protect privacy by preventing passengers from observing the image, it may be necessary to control the viewing angle of the image displayed on the vehicle display device arranged in front of the driver. Summary of the invention

[0006] Aspects of the present disclosure provide a display device including an inspection pattern for measuring an etching amount and an etching shape of a light-transmitting layer and a method for inspecting the display device.

[0007] Aspects of the present disclosure also provide a display device having improved reliability of a light-management layer and a method for inspecting the display device.

[0008] However, the aspects of the present disclosure are not limited to those set forth herein. The above and other aspects of the present disclosure will become more apparent to those of ordinary skill in the art to which the present disclosure belongs by referring to the detailed description of the present disclosure given below.

[0009] According to aspects of the present disclosure, a display device includes a substrate, a light-emitting element layer disposed on the substrate and including a plurality of light-emitting elements, and a light-control layer disposed on the light-emitting element layer and including a light-transmitting film and a light-blocking film. The light-control layer also includes an inspection pattern overlapping the light-blocking film in a first direction, and the inspection pattern extends in the first direction, which is the same direction as the extension direction of the plurality of zones of the light-blocking film.

[0010] In an embodiment, the inspection pattern is arranged between at least two regions among the plurality of regions of the light blocking film, the at least two regions being aligned along the first direction.

[0011] In an embodiment, the plurality of regions of the light-transmitting film and the plurality of regions of the light-blocking film are alternately arranged in a second direction different from the first direction.

[0012] In an embodiment, the inspection pattern is arranged between a plurality of regions of the light-transmitting film that are adjacent in the second direction.

[0013] In an embodiment, the plurality of regions of the light-transmitting film disposed on opposite sides of the checking pattern are connected to each other through the checking pattern, and the plurality of regions of the light-transmitting film disposed on opposite sides of the checking pattern are physically coupled with the checking pattern to form a single component.

[0014] In an embodiment, the inspection pattern includes the same material as that of the light-transmitting film.

[0015] In an embodiment, a width of the inspection pattern is equal to a width of each of the plurality of regions of the light blocking film in a second direction different from the first direction.

[0016] In an embodiment, a length of the inspection pattern in a first direction is greater than a width of the inspection pattern in a second direction different from the first direction.

[0017] In an embodiment, the thickness of the inspection pattern is equal to the thickness of the light-transmitting film.

[0018] In an embodiment, the substrate includes a display area in which a plurality of light emitting elements are arranged and a non-display area arranged on at least one side of the display area, and the inspection pattern is arranged in the display area.

[0019] In an embodiment, the display area includes an emission area configured to emit light, and the inspection pattern does not overlap the emission area.

[0020] In an embodiment, the plurality of regions of the light blocking film include a plurality of regions separated from each other in a second direction different from the first direction, the inspection pattern includes a plurality of sub-inspection patterns, and the plurality of sub-inspection patterns each overlaps the plurality of regions of the light blocking film in the first direction.

[0021] In an embodiment, the display device may further include a plurality of pixels in which the plurality of light emitting elements are respectively arranged, the inspection pattern includes a first inspection pattern and a second inspection pattern, and the first inspection pattern and the second inspection pattern are arranged between the plurality of pixels adjacent to each other.

[0022] In an embodiment, in a second direction different from the first direction, a width of the plurality of regions of the light-transmitting film is greater than a width of the plurality of regions of the light-blocking film.

[0023] According to aspects of the present disclosure, a display device includes a substrate, a light-emitting element layer arranged on the substrate and including a plurality of light-emitting elements, and a light-control layer arranged on the light-emitting element layer and including a first light-transmitting film area, a light-blocking film area, and a second light-transmitting film area. The first light-transmitting film area, the light-blocking film area, and the second light-transmitting film area are arranged alternately in a first direction. The light-control layer also includes an inspection pattern arranged between the first light-transmitting film area and the second light-transmitting film area in the first direction, the light-blocking film area including a first light-blocking film segment and a second light-blocking film segment adjacent in a second direction different from the first direction, and the inspection pattern is arranged between the first light-blocking film segment and the second light-blocking film segment in the second direction.

[0024] In an implementation, the first light-blocking film segment, the second light-blocking film segment, and the inspection pattern extend in the second direction.

[0025] In an embodiment, the thickness of the inspection pattern is equal to the thickness of the light blocking film.

[0026] According to aspects of the present disclosure, a method for inspecting a display device is provided, the display device comprising a substrate, a light-emitting element layer disposed on the substrate and comprising a plurality of light-emitting elements, a light-transmitting film comprising a plurality of light-transmitting film regions disposed on the light-emitting element layer, and an inspection pattern disposed between the plurality of light-transmitting film regions. The method comprises inspecting the light-transmitting film using an atomic force microscope having a tip, wherein the inspection pattern extends in a first direction, the first direction being the same direction as the extension direction of the plurality of light-transmitting film regions of the light-transmitting film, and in the inspection of the light-transmitting film, the tip moves in the first direction.

[0027] In an embodiment, a length of the inspection pattern in a first direction is greater than a width of the inspection pattern in a second direction different from the first direction.

[0028] In an embodiment, the display device may further include a light-blocking film between the plurality of light-transmitting film regions of the light-transmitting film.

[0029] A display device and a method for inspecting the display device according to one embodiment of the present disclosure may include an inspection pattern for measuring an etching amount and an etching shape of a light-transmitting layer.

[0030] According to the display device and the method for inspecting the display device according to one embodiment of the present disclosure, the reliability of the light management layer may be improved.

[0031] However, the effects according to the embodiments of the present disclosure are not limited to those exemplified above, and various other effects are included herein. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] The above and other aspects and features of the present disclosure will become more apparent by describing in detail embodiments of the present disclosure with reference to the attached drawings.

[0033] Figure 1 is an exploded perspective view showing a display device according to one embodiment.

[0034] Figure 2 is a plan view illustrating a display device according to an embodiment.

[0035] Figure 3 is an exploded perspective view showing a display device according to another embodiment.

[0036] Figure 4 The diagram is along Figure 2 Schematic cross-sectional view of the display device taken along line X1-X1'.

[0037] Figure 5 is a cross-sectional view illustrating an example of a display panel according to an embodiment.

[0038] Figure 6 is a plan view illustrating a portion of a display area including an emission area in a display device according to an embodiment.

[0039] Figure 7 is a plan view illustrating a portion of a display area including a light control layer and an emission area in a display device according to an embodiment.

[0040] Figure 8 is along Figure 7 A cross-sectional view taken along line X2-X2'.

[0041] Fig. 9 yes Figure 7 Magnified view of area A.

[0042] Fig.10 is along Fig. 9 A cross-sectional view taken along line X3-X3'.

[0043] Fig.11 is a plan view illustrating a portion of a display area including a light control layer and an emission area in a display device according to another embodiment.

[0044] Fig.12 is a plan view illustrating a portion of a display area including a light control layer and an emission area in a display device according to another embodiment.

[0045] Fig.13 is a flowchart illustrating a method for inspecting a display device according to one embodiment.

[0046] Fig.14 It is shown Fig.13 FIG. 5 is a cross-sectional view of a structure that can be formed in step S100.

[0047] Fig.15 It is shown Fig.13 FIG. 5 is a cross-sectional view of a structure that can be formed in step S200 .

[0048] Fig.16 It is shown Fig.13 FIG. 5 is a cross-sectional view of a structure that can be formed in step S300 .

[0049] Fig.17 is a perspective view showing a structure that may be formed in step S400 according to a comparative embodiment.

[0050] Fig.18 It is shown Fig.13 A perspective view of a structure that may be formed in step S400.

[0051] Fig.19 It is shown Fig.13 FIG. 5 is a cross-sectional view of a structure that can be formed in step S400.

[0052] Fig. 20 It is shown Fig.13 FIG. 5 is a cross-sectional view of a structure that can be formed in step S500 . DETAILED DESCRIPTION

[0053] Hereinafter, the specific embodiments of the present disclosure will be described more fully with reference to the accompanying drawings. However, the embodiments may be carried out in different forms and should not be construed as being limited to the specific embodiments set forth herein. On the contrary, these embodiments are provided so that the present disclosure will be thorough and complete and will fully convey the principles of the present disclosure to those skilled in the art.

[0054] In the following content, when a layer is referred to as being “on” another layer or a substrate, the layer can be directly on the other layer or the substrate, or intervening layers may also be present.

[0055] Throughout the specification and drawings, the same reference numbers refer to the same or like parts.

[0056] Hereinafter, embodiments of the present disclosure will be described in detail with reference to the accompanying drawings.

[0057] Figure 1 is an exploded perspective view showing a display device according to one embodiment. Figure 2 is a plan view illustrating a display device according to an embodiment. Figure 3 is an exploded perspective view showing a display device according to another embodiment.

[0058] Reference Figures 1 to 3, the display device 10 may be a device for displaying a moving image or a still image. The display device 10 may be used as a display screen of various devices such as televisions, laptop computers, monitors, billboards, and Internet of Things (IOT) devices, and portable electronic devices such as mobile phones, smart phones, tablet personal computers, smart clocks, clock phones, mobile communication terminals, electronic notebooks, electronic books, portable multimedia players (PMPs), navigation devices, and ultra mobile personal computers (UMPCs). The display device 10 may be any one of an organic light emitting display device, a liquid crystal display device, a plasma display device, a field emission display device, an electrophoretic display device, an electrowetting display device, a quantum dot light emitting display device, and a micro LED display device. In the following description, it is assumed that the display device 10 is an organic light emitting display device, but the present disclosure is not limited thereto.

[0059] A display device 10 according to one embodiment may include a display panel 100 , a display driving circuit 250 , a circuit board 300 , and a touch driving circuit 400 .

[0060] The display panel 100 may include a plurality of pixels PX arranged in a first direction DR1 and a second direction DR2. Each of the plurality of pixels PX may have a rectangular shape, a square shape, or a diamond shape in a plan view. For example, as shown in the figure, each of the plurality of pixels PX may have a square shape in a plan view. However, the embodiment is not limited thereto, and the pixel PX may have other various shapes in a plan view, such as other polygonal, circular, and elliptical shapes.

[0061] In the illustrated diagram, the first direction DR1 and the second direction DR2 intersect each other in a horizontal plane. For example, the first direction DR1 and the second direction DR2 may be orthogonal to each other. In addition, the third direction DR3 intersects the first direction DR1 and the second direction DR2, and may be, for example, perpendicular or orthogonal to the first direction DR1 and the second direction DR2.

[0062] The display panel 100 may include a main area MA and a protrusion area PA protruding from one side of the main area MA.

[0063] The main area MA may have a rectangular shape with short sides extending in the first direction DR1 and long sides extending in the second direction DR2 in a plan view. Each corner at which the short side and the long side intersect may be rounded to have a predetermined curvature, or may be a right angle. The planar shape of the display device 10 is not limited to a quadrilateral shape, and may be formed in another polygonal shape, a circular shape, or an elliptical shape. The main area MA may be formed to be flat, but is not limited thereto, and may include a bent portion formed at the left end or left edge and the right end or right edge. In this case, the bent portion may have a constant curvature or a variable curvature.

[0064] The main area MA may include a display area DA in which the pixels PX may display an image and a non-display area NDA which is a peripheral area of ​​the display area DA.

[0065] In the display area DA, not only the pixels PX but also the scan lines, data lines, and power lines connected to the pixels PX may be arranged. When the main area MA includes a bent portion, the display area DA may extend onto the bent portion. In this case, at least a portion of the image on the display panel 100 may also be seen on the bent portion.

[0066] The non-display area NDA may be defined as a region extending from a boundary of the display area DA to an edge of the display panel 100. Scan drivers for applying scan signals to scan lines and link lines connecting data lines to the display driving circuit 250 may be arranged in the non-display area NDA.

[0067] The protruding area PA may protrude from one side of the main area MA. Figure 2 As shown in , the protrusion area PA may also protrude from the lower side of the main area MA. The length of the protrusion area PA in the first direction DR1 may be smaller than the length of the main area MA in the first direction DR1.

[0068] The protruding area PA may include a bending area BA and a pad area PDA. In this case, the pad area PDA may be arranged on one side of the bending area BA, and the main area MA may be arranged on the other side of the bending area BA. For example, the pad area PDA may be arranged below the bending area BA, and the main area MA may be arranged above the bending area BA.

[0069] The display panel 100 may be flexible so that the display panel 100 can be bent, curved, folded, or curled. Therefore, the display panel 100 may be bent in the thickness direction (i.e., in the third direction DR3) in the bending area BA. In this case, one surface of the pad area PDA of the display panel 100 faces upward before the display panel 100 is bent, but after the display panel 100 is bent, the surface of the pad area PDA of the display panel 100 faces downward. Therefore, since the pad area PDA may be arranged below the main area MA after bending, the pad area PDA may overlap with the main area MA.

[0070] Pads electrically connected to the display driving circuit 250 and the circuit board 300 may be arranged in the pad area PDA of the display panel 100 .

[0071] The display driving circuit 250 outputs a signal and a voltage for driving the display panel 100. For example, the display driving circuit 250 may supply a data voltage to a data line. In addition, the display driving circuit 250 may supply a power supply voltage to a power supply line, and may supply a scan control signal to a scan driver. The display driving circuit 250 may be formed as an integrated circuit (IC) and mounted on the display panel 100 in the pad area PDA. A chip on glass (COG) method, a chip on plastic (COP) method, or an ultrasonic bonding method may mount the display driving circuit 250 on the display panel 100, but the present disclosure is not limited thereto. For example, the display driving circuit 250 may be mounted on a circuit board 300.

[0072] The pads may include a display pad electrically connected to the display driving circuit 250 and a touch pad electrically connected to the touch line.

[0073] The circuit board 300 may be attached to the pad using an anisotropic conductive film. Thus, the leads of the circuit board 300 may be electrically connected to the pad. The circuit board 300 may be a flexible printed circuit board, a rigid printed circuit board, or a flexible film such as a chip on film.

[0074] The touch driving circuit 400 may be connected to the touch sensor layer TSU (see Figure 4 ) of the touch electrode. The touch driving circuit 400 applies a driving signal to the touch sensor layer TSU (see Figure 4 ) and measures the capacitance value of the touch electrode. The driving signal may be a signal having a plurality of driving pulses. The touch driving circuit 400 may determine whether a touch is input based on the capacitance value associated with the touch electrode, and may calculate the touch coordinates at which the touch is input.

[0075] The touch driving circuit 400 may be disposed on the circuit board 300. The touch driving circuit 400 may be formed as an integrated circuit (IC) and mounted on the circuit board 300.

[0076] In the display device 10 according to the present embodiment, the display panel 100 may further include a light control layer LCL.

[0077] The light control layer LCL may be directly disposed on the main area MA of the display panel 100. For example, the light control layer LCL may be embedded in the display panel 100 and directly disposed on the main area MA of the display panel 100. By embedding the light control layer LCL in the display panel 100, the thickness and manufacturing cost of the display device 10 may be reduced compared to a case where a separate light control film is attached thereto.

[0078] In some embodiments, the light control layer LCL may be disposed on the display area DA of the main area MA. The light control layer LCL may adjust a viewing angle of light emitted from the display panel 100.

[0079] In some embodiments, the area of ​​the light-control layer LCL may be greater than the area of ​​the display area DA in a plan view. In this case, the light-control layer LCL may overlap both the display area DA and the non-display area NDA.

[0080] The light control layer LCL may include transmission areas OA arranged in the first direction DR1 and the second direction DR2 and non-transmission areas LSA surrounding the transmission areas OA.

[0081] The transmission area OA may be a region in which the light blocking film LS is not disposed (see Figure 7 The transmission area OA is an area that transmits light.

[0082] like Figure 1 and Figure 2 , each of the plurality of transmission areas OA may have a quadrangular shape in a plan view, but the shape is not limited thereto. Each of the plurality of transmission areas OA may have a circular shape, an elliptical shape, or a polygonal shape in a plan view.

[0083] In another embodiment, the transmission area OA may have a shape with a greater length extending in the first direction DR1 or the second direction DR2. Figure 3 As shown in , each of the plurality of transmission areas OA may extend mainly in the first direction DR1, and the transmission area OA may be arranged along the second direction DR2. As another example, each of the plurality of transmission areas OA may extend mainly in the second direction DR2, and the transmission area OA may be arranged along the first direction DR1.

[0084] When Figure 1 When the transmission areas OA shown in FIG. 5 are arranged along the first direction DR1 and the second direction DR2, the viewing angle can be controlled in both the first direction DR1 and the second direction DR2. Figure 3 When the transmission area OA shown in FIG. 1 is arranged along the first direction DR1 or the second direction DR2, the viewing angle can be controlled in the first direction DR1 or the second direction DR2. That is, the arrangement and shape of the transmission area OA can be variously modified according to the desired viewing angle control direction.

[0085] The non-transmission area LSA may be a remaining area of ​​the light control layer LCL except for the transmission area OA. The non-transmission area LSA may be an area in which the light blocking film LS (see Figure 7 ) area.

[0086] In the drawings, the non-transmission area LSA is illustrated as surrounding the transmission area OA, but the non-transmission area LSA is not limited thereto. In some embodiments, the non-transmission area LSA may include areas extending in the same direction as the direction of the areas of the transmission area OA and may be alternately arranged or staggered with the areas of the transmission area OA. For example, Figure 3 As shown in , when the transmission area OA extends in the first direction DR1, the non-transmission area LSA may include regions mainly extending in the first direction DR1, and regions of the non-transmission area LSA may be arranged in the second direction DR2 and between adjacent regions of the transmission area OA.

[0087] The light control layer LCL may include a light emitting layer 172 (see Figure 5 ) light-blocking film LS (see Figure 7 ) and a light-transmitting film LT (see Figure 7 ). Figure 7 etc. to describe the detailed structure of the light control layer LCL.

[0088] Figure 4 The diagram is along Figure 2 Schematic cross-sectional view of the display device taken along line X1-X1'.

[0089] Reference Figure 4 The display device 10 may include a display panel 100 in which a light control layer LCL is embedded. The display panel 100 may include a base member BS, a thin film transistor layer TFTL, a light emitting element layer EML, a thin film encapsulation layer TFEL, a touch sensor layer TSU, and a light control layer LCL.

[0090] The base member BS may include a substrate. The substrate may be formed of an insulating material such as glass, quartz, or a polymer material or resin. Examples of polymer materials may include polyethersulfone (PES), polyacrylate (PA), polyarylate (PAR), polyetherimide (PEI), polyethylene naphthalate (PEN), polyethylene terephthalate (PET), polyphenylene sulfide (PPS), polyallyl ester, polyimide (PI), polycarbonate (PC), cellulose triacetate (TAC), cellulose acetate propionate (CAP), or a combination thereof. Alternatively, the substrate may include a metal material.

[0091] The substrate may be a rigid substrate or a flexible substrate capable of being bent, folded, or rolled. When the substrate is a flexible substrate, the substrate may be formed of polyimide (PI), but is not limited thereto.

[0092] The thin film transistor layer TFTL may be disposed on the base member BS. In the thin film transistor layer TFTL, a scan line, a data line, a power line, a scan control line, a link line connecting a pad to a data line, and a thin film transistor of each of a plurality of pixels PX may be formed. Each of the plurality of thin film transistors may include a gate electrode, a semiconductor layer, a source electrode, and a drain electrode.

[0093] The thin film transistor layer TFTL may be arranged in the display area DA and the non-display area NDA. Specifically, the thin film transistor, the scan line, the data line, and the power line of each of the plurality of pixels PX of the thin film transistor layer TFTL may be arranged in the display area DA. The scan control line and the link line of the thin film transistor layer TFTL may be arranged in the non-display area NDA.

[0094] The light emitting element layer EML may be disposed on the thin film transistor layer TFTL. The light emitting element layer EML may include a first electrode (eg, Figure 5 The first light emitter electrode 171 in the embodiment of the present invention is provided, and the light emitting layer 172 (see Figure 5 ) and a second electrode (e.g., Figure 5 The second light emitter electrode 173 in the light emitting element 170 (see Figure 5 ), and a pixel defining layer defining an area of ​​the light emitting element 170. The light emitting layer 172 may be an organic light emitting layer including an organic material. In this case, the light emitting layer 172 may include a hole transport layer, an organic light emitting layer, and an electron transport layer. When a predetermined voltage is applied to the first electrode through the thin film transistor of the thin film transistor layer TFTL and a cathode voltage is applied to the second electrode, holes and electrons are respectively transferred to the organic light emitting layer through the hole transport layer and the electron transport layer, and are combined with each other to emit light in the organic light emitting layer. The pixels PX of the light emitting element layer EML may be arranged in the display area DA.

[0095] The thin film encapsulation layer TFEL may be arranged on the light emitting element layer EML. The thin film encapsulation layer TFEL may be used to prevent oxygen or moisture from penetrating into the light emitting element layer EML. To this end, the thin film encapsulation layer TFEL may include at least one inorganic layer. The inorganic layer may be a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, or an aluminum oxide layer, but the inorganic layer is not limited thereto. In addition, the thin film encapsulation layer TFEL may be used to protect the light emitting element layer EML from foreign matter such as dust. To this end, the thin film encapsulation layer TFEL may include at least one organic layer. The organic layer may include an acrylic resin, an epoxy resin, a phenolic resin, a polyamide resin, or a polyimide resin, but the organic layer is not limited thereto.

[0096] The thin film encapsulation layer TFEL may be arranged in both the display area DA and the non-display area NDA. Specifically, the thin film encapsulation layer TFEL may cover the thin film transistor layer TFTL and the light emitting element layer EML in the display area DA, and may cover the thin film transistor layer TFTL in the non-display area NDA where the light emitting element layer EML may not be arranged.

[0097] The touch sensor layer TSU may be disposed on the thin film encapsulation layer TFEL to reduce the thickness of the display device 10 compared to a case where a separate touch panel including the touch sensor layer TSU is attached on the thin film encapsulation layer TFEL.

[0098] The touch sensor layer TSU may include a touch electrode for capacitively sensing a user's touch and a touch line connecting a pad to the touch electrode. For example, the touch sensor layer TSU may sense a user's touch using a self-capacitance method or a mutual-capacitance method.

[0099] The touch electrodes of the touch sensor layer TSU may be arranged in the touch sensor area overlapping the display area DA. The touch wires of the touch sensor layer TSU may be arranged in the touch peripheral area overlapping the non-display area NDA.

[0100] The light control layer LCL may be disposed on the touch sensor layer TSU. The light control layer LCL may overlap the display area DA. The light control layer LCL may be used to absorb or block light that deviates from a specific angle relative to the third direction DR3 among the light emitted from the light emitting element layer EML. That is, the light control layer LCL may control the viewing angle for the image on the display panel 100.

[0101] Although not shown in the drawings, the display device 10 may further include a cover window. The cover window may be additionally disposed on the light control layer LCL, and in this case, the light control layer LCL and the cover window may be attached by a transparent adhesive member such as an optically clear adhesive (OCA) film.

[0102] Figure 5 is a cross-sectional view illustrating an example of a display panel according to an embodiment.

[0103] Reference Figure 5 , the display panel 100 may include a display layer DU and a touch sensor layer TSU. The display layer DU may include a base member BS, a thin film transistor layer TFTL, a light emitting element layer EML, and a thin film encapsulation layer TFEL.

[0104] The base member BS may include a first substrate SUB1, a first buffer layer BF1 disposed on the first substrate SUB1, and a second substrate SUB2 disposed on the first buffer layer BF1.

[0105] The first substrate SUB1 and the second substrate SUB2 may be made of an insulating material such as glass, quartz, polymer resin, etc. Examples of polymer materials may include polyethersulfone (PES), polyacrylate (PA), polyarylate (PAR), polyetherimide (PEI), polyethylene naphthalate (PEN), polyethylene terephthalate (PET), polyphenylene sulfide (PPS), polyallyl ester, polyimide (PI), polycarbonate (PC), triacetyl cellulose (TAC), cellulose acetate propionate (CAP), or a combination thereof. Alternatively, the first substrate SUB1 or the second substrate SUB2 may include a metal material.

[0106] The first substrate SUB1 and the second substrate SUB2 may be flexible substrates or rigid substrates that can be bent, folded, or rolled. When the first substrate SUB1 or the second substrate SUB2 is a flexible substrate, the first substrate SUB1 or the second substrate SUB2 may be formed of polyimide (PI), but the embodiment is not limited thereto.

[0107] The first buffer layer BF1 is a layer for protecting the first thin film transistor ST1 and the light emitting layer 172 from moisture that penetrates through the first substrate SUB1 and the second substrate SUB2 that may be susceptible to moisture penetration. The first buffer layer BF1 may be formed of a stack of inorganic layers. For example, the first buffer layer BF1 may be formed of a plurality of layers in which one or more inorganic layers of a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, and an aluminum oxide layer are alternately stacked.

[0108] The thin film transistor layer TFTL may include a lower metal layer BML, a second buffer layer BF2, a first active layer ACT1, a first gate insulating layer GI1, a first interlayer insulating layer 141, a first capacitor electrode CAE1, a second interlayer insulating layer 142, a first anode connection electrode ANDE1, a first organic layer 160, a second anode connection electrode ANDE2, and a second organic layer 180.

[0109] The lower metal layer BML may be disposed on the second substrate SUB2. The lower metal layer BML may overlap with a region of the first active layer ACT1 in the first thin film transistor ST1 in the third direction DR3 to prevent leakage current from being generated when light is incident on the first active layer ACT1 of the first thin film transistor ST1. The lower metal layer BML may be formed as a single layer or a plurality of layers made of any one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu), or alloys thereof. In some embodiments, the lower metal layer BML may be omitted.

[0110] The second buffer layer BF2 may be disposed on the lower metal layer BML. The second buffer layer BF2 is a layer for protecting the first thin film transistor ST1 and the light emitting layer 172 from moisture that penetrates through the first substrate SUB1 and the second substrate SUB2 that may be susceptible to moisture penetration. The second buffer layer BF2 may be formed of a stack of inorganic layers. For example, the second buffer layer BF2 may be formed of a plurality of layers in which one or more inorganic layers of a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, and an aluminum oxide layer are alternately stacked.

[0111] The first active layer ACT1 may be arranged on the second buffer layer BF2. The first active layer ACT1 may include polycrystalline silicon, single crystal silicon, low temperature polycrystalline silicon, amorphous silicon, or an oxide semiconductor. The region of the first active layer ACT1 in the first thin film transistor ST1 includes regions that are not covered by the first gate insulating layer GI1 or overlapped with the first gate insulating layer GI1, and these regions may be doped with impurities or ions and thus may have conductivity. Therefore, a first source electrode TS1 and a first drain electrode TD1 of the first active layer ACT1 of the first thin film transistor ST1 may be formed.

[0112] The first gate insulating layer GI1 may be disposed on the first active layer ACT1 of the first thin film transistor ST1. Figure 5 The first gate insulating layer GI1 is illustrated as being disposed between the first active layer ACT1 of the first thin film transistor ST1 and the first gate electrode TG1, but the embodiment is not limited thereto. The first gate insulating layer GI1 may be disposed between the first interlayer insulating layer 141 and the first active layer ACT1 and between the first interlayer insulating layer 141 and the second buffer layer BF2. The first gate insulating layer GI1 may be formed of an inorganic layer such as a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, or an aluminum oxide layer.

[0113] The first gate electrode TG1 of the first thin film transistor ST1 may be disposed on the first gate insulating layer GI1. The first gate electrode TG1 of the first thin film transistor ST1 may overlap the first active layer ACT1 in the third direction DR3. The first gate electrode TG1 of the first thin film transistor ST1 may be formed as a single layer or a plurality of layers made of any one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu), or alloys thereof.

[0114] The first interlayer insulating layer 141 may be disposed on the first gate electrode TG1 of the first thin film transistor ST1. The first interlayer insulating layer 141 may be formed of an inorganic layer such as a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, or an aluminum oxide layer. The first interlayer insulating layer 141 may include a plurality of inorganic layers.

[0115] The first capacitor electrode CAE1 may be disposed on the first interlayer insulating layer 141. The first capacitor electrode CAE1 may overlap the first gate electrode TG1 of the first thin film transistor ST1 in the third direction DR3. The first interlayer insulating layer 141 may have a predetermined dielectric constant, and the first capacitor electrode CAE1, the first gate electrode TG1, and the first interlayer insulating layer 141 disposed therebetween may form a capacitor. The first capacitor electrode CAE1 may be formed as a single layer or a plurality of layers made of any one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu), or alloys thereof.

[0116] The second interlayer insulating layer 142 may be disposed on the first capacitor electrode CAE1. The second interlayer insulating layer 142 may be formed of an inorganic layer such as a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, or an aluminum oxide layer. The second interlayer insulating layer 142 may include a plurality of inorganic layers.

[0117] The first anode connection electrode ANDE1 may be disposed on the second interlayer insulating layer 142. The first anode connection electrode ANDE1 may be connected to the first drain electrode TD1 of the first thin film transistor ST1 via a first anode contact hole ANCT1 penetrating the first and second interlayer insulating layers 141 and 142 to cover the first drain electrode TD1 of the first thin film transistor ST1. The first anode connection electrode ANDE1 may be formed as a single layer or a plurality of layers made of any one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu), or alloys thereof.

[0118] The first organic layer 160 for planarization may be disposed on the first anode connection electrode ANDE1. The first organic layer 160 may be formed of an organic material such as acrylic resin, epoxy resin, phenol resin, polyamide resin, polyimide resin, or the like.

[0119] The second anode connection electrode ANDE2 may be disposed on the first organic layer 160. The second anode connection electrode ANDE2 may be connected to the first anode connection electrode ANDE1 via a second anode contact hole ANCT2 penetrating the first organic layer 160. The second anode connection electrode ANDE2 may be formed as a single layer or a plurality of layers made of any one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu), or an alloy thereof.

[0120] The second organic layer 180 may be disposed on the second anode connection electrode ANDE2. The second organic layer 180 may be formed of an organic material such as acrylic resin, epoxy resin, phenol resin, polyamide resin, polyimide resin, or the like.

[0121] although Figure 5 The first thin film transistor ST1 is illustrated as being configured as a top gate type in which the first gate electrode TG1 is positioned on top of the first active layer ACT1, but the present disclosure is not limited thereto. The first thin film transistor ST1 may be configured as a bottom gate type in which the first gate electrode TG1 is positioned below the first active layer ACT1, or a dual gate type in which the first gate electrode TG1 is positioned above and below the first active layer ACT1.

[0122] The light emitting element layer EML may be disposed on the second organic layer 180. The light emitting element layer EML may include a light emitting element 170 and a bank 190. Each of the plurality of light emitting elements 170 may include a first light emitter electrode 171, a light emitting layer 172, and a second light emitter electrode 173.

[0123] The first light emitter electrode 171 may be formed on the second organic layer 180. The first light emitter electrode 171 may penetrate the second organic layer 180 to be connected to the second anode connection electrode ANDE2 via a third anode contact hole ANCT3 overlapping the second anode connection electrode ANDE2.

[0124] In the top emission structure in which light is emitted toward the second light emitter electrode 173, the first light emitter electrode 171 may be formed of a metal material having high reflectivity. For example, the first light emitter electrode 171 may have a stacked structure of aluminum and titanium (Ti / Al / Ti), a stacked structure of aluminum and ITO (ITO / Al / ITO), an APC alloy, and a stacked structure including an APC alloy and ITO (ITO / APC / ITO). The APC alloy may be an alloy of silver (Ag), palladium (Pd), and copper (Cu).

[0125] The bank 190 may be on the second organic layer 180 and may have an opening overlapping the first light emitter electrode 171, thereby defining an emission area EA. The bank 190 may be formed to cover an edge of the first light emitter electrode 171. The bank 190 may be formed of an organic material such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, etc.

[0126] The emission area EA indicates a region where the first light emitter electrode 171, the light emitting layer 172, and the second light emitter electrode 173 are sequentially stacked, and holes from the first light emitter electrode 171 and electrons from the second light emitter electrode 173 combine with each other in the light emitting layer 172 to emit light.

[0127] The light emitting layer 172 may be formed on the first light emitter electrode 171 and the bank 190. The light emitting layer 172 may include an organic material to emit light having a predetermined color. For example, the light emitting layer 172 may include a hole transport layer, an organic material layer, and an electron transport layer.

[0128] The second light emitter electrode 173 may be disposed on the light emitting layer 172. The second light emitter electrode 173 may be formed to cover the light emitting layer 172. The second light emitter electrode 173 may be a common layer formed in common to all emission areas EA. Although not shown, in some embodiments, a cap layer may be formed on the second light emitter electrode 173.

[0129] In the top emission structure, the second light emitter electrode 173 may be formed of a transparent conductive oxide (TCO) such as indium tin oxide (ITO) and indium zinc oxide (IZO) that can transmit light, or a semi-transmissive conductive material such as magnesium (Mg), silver (Ag), or an alloy of magnesium (Mg) and silver (Ag). When the second light emitter electrode 173 is formed of a semi-transmissive conductive material, light emission efficiency can be improved due to a microcavity effect.

[0130] The thin film encapsulation layer TFEL may be arranged on the second light emitter electrode 173. The thin film encapsulation layer TFEL may include at least one inorganic layer to prevent oxygen or moisture from penetrating into the light emitting element layer EML. In addition, the thin film encapsulation layer TFEL may include at least one organic layer to protect the light emitting element layer EML from foreign matter such as dust. For example, the thin film encapsulation layer TFEL may include a first encapsulation film TFE1, a second encapsulation film TFE2, and a third encapsulation film TFE3.

[0131] The first encapsulation film TFE1 (e.g., a first inorganic encapsulation film) may be disposed on the second light emitter electrode 173. The first encapsulation film TFE1 may be an inorganic layer including a single layer or a plurality of layers. The first encapsulation film TFE1 may be formed as a single layer or a plurality of layers in which one or more inorganic layers of silicon nitride layers, silicon oxynitride layers, silicon oxide layers, titanium oxide layers, and aluminum oxide layers are alternately stacked.

[0132] The second encapsulation film TFE2 (e.g., the first organic encapsulation film) may be arranged on the first encapsulation film TFE1. The second encapsulation film TFE2 may be an organic layer including a single layer or a plurality of layers. The second encapsulation film TFE2 may include a polymer-based material. The polymer-based material may include polyethylene terephthalate, polyethylene naphthalate, polycarbonate, polyimide, polyethylene sulfonate, polyoxymethylene, polyacrylate, hexamethyldisiloxane, and acrylic resin (e.g., polymethyl methacrylate, polyacrylic acid, etc.) or any combination thereof.

[0133] The third encapsulation film TFE3 (e.g., a second inorganic encapsulation film) may be arranged on the second encapsulation film TFE2. The third encapsulation film TFE3 may be an inorganic layer including a single layer or a plurality of layers. The third encapsulation film TFE3 may include the same material as that of the first encapsulation film TFE1. For example, the third encapsulation film TFE3 may be formed as a single layer or a plurality of layers in which one or more inorganic layers such as a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, and an aluminum oxide layer are stacked.

[0134] The touch sensor layer TSU may be arranged on the thin film encapsulation layer TFEL. The touch sensor layer TSU may include a plurality of touch electrodes for capacitive sensing of a user's touch and touch lines connecting the plurality of touch electrodes to a touch driver. For example, a mutual capacitance method or a self capacitance method using the touch sensor layer TSU may be used to sense a user's touch.

[0135] In another embodiment, the touch sensor layer TSU may be disposed on a separate substrate disposed on the display layer DU. In this case, the substrate supporting the touch sensor layer TSU may be an encapsulation member encapsulating the display layer DU.

[0136] A plurality of touch electrodes of the touch sensor layer TSU may be arranged in a touch sensor area overlapping the display area DA, and a touch line of the touch sensor layer TSU may be arranged in a touch peripheral area overlapping the non-display area NDA.

[0137] The touch sensor layer TSU may include a first touch insulating layer SIL1 , a first touch electrode REL, a second touch insulating layer SIL2 , a second touch electrode TEL, and a third touch insulating layer SIL3 .

[0138] The first touch insulating layer SIL1 may be arranged on the thin film encapsulation layer TFEL. The first touch insulating layer SIL1 may have insulating and optical functions. The first touch insulating layer SIL1 may include at least one inorganic layer. For example, the first touch insulating layer SIL1 may be an inorganic layer including at least one of a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, or an aluminum oxide layer. Optionally, the first touch insulating layer SIL1 may be omitted.

[0139] The first touch electrode REL may be arranged on the first touch insulating layer SIL1. The first touch electrode REL may not overlap the light emitting element 170. The first touch electrode REL may be formed as a single layer including molybdenum (Mo), titanium (Ti), copper (Cu), aluminum (Al), or indium tin oxide (ITO), or may be formed to have a stack structure of aluminum and titanium (Ti / Al / Ti), a stack structure of aluminum and ITO (ITO / Al / ITO), an Ag-Pd-Cu (APC) alloy, or a stack structure of an APC alloy and ITO (ITO / APC / ITO).

[0140] The second touch insulating layer SIL2 may cover the first touch electrode REL and the first touch insulating layer SIL1. The second touch insulating layer SIL2 may have insulating and optical functions. For example, the second touch insulating layer SIL2 may be made of the material exemplified in association with the first touch insulating layer SIL1.

[0141] The second touch electrode TEL may be arranged on the second touch insulating layer SIL2. The second touch electrode TEL may not overlap the light emitting element 170. The second touch electrode TEL may be formed as a single layer including molybdenum (Mo), titanium (Ti), copper (Cu), aluminum (Al), or indium tin oxide (ITO), or may be formed to have a stack structure of aluminum and titanium (Ti / Al / Ti), a stack structure of aluminum and ITO (ITO / Al / ITO), an Ag-Pd-Cu (APC) alloy, or a stack structure of an APC alloy and ITO (ITO / APC / ITO).

[0142] The third touch insulating layer SIL3 may cover the second touch electrode TEL and the second touch insulating layer SIL2. The third touch insulating layer SIL3 may have insulating and optical functions. The third touch insulating layer SIL3 may be made of the materials exemplified in association with the second touch insulating layer SIL2.

[0143] In some embodiments, the first touch insulating layer SIL1, the second touch insulating layer SIL2, and the third touch insulating layer SIL3 may be organic layers. Each of the first touch insulating layer SIL1, the second touch insulating layer SIL2, and the third touch insulating layer SIL3 may be an organic layer such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, etc.

[0144] The touch sensor layer TSU may further include a planarization layer PAS for planarization. The planarization layer PAS may be formed of an organic material such as acrylic resin, epoxy resin, phenol resin, polyamide resin, polyimide resin, or the like.

[0145] Figure 6 is a plan view illustrating a portion of a display area including an emission area in a display device according to an embodiment.

[0146] Apart from Figure 5 In addition, refer to Figure 6 , the display area DA of the display device 10 may include a plurality of emission areas EA. Each emission area EA may be a region through which light generated by the light emitting element 170 may be emitted from the light emitting element layer EML.

[0147] A plurality of emission areas EA may be defined by the bank 190. For example, the plurality of emission areas EA may be areas overlapping the light emitting layer 172 disposed in the opening of the bank 190. Each of the plurality of emission areas EA may be a region in which the first light emitter electrode 171, the light emitting layer 172, and the second light emitter electrode 173 are sequentially stacked while overlapping each other.

[0148] In some embodiments, the plurality of emission areas EA may include a first emission area EA1, a second emission area EA2, and a third emission area EA3. Although three types of emission areas EA are illustrated as being included in the display area DA in the drawings, the present disclosure is not limited thereto.

[0149] The first emission area EA1 may emit light of a first color, the second emission area EA2 may emit light of a second color, and the third emission area EA3 may emit light of a third color. The light of the first color may be light of a red wavelength band, the light of the second color may be light of a green wavelength band, and the light of the third color may be light of a blue wavelength band. The red wavelength band may be a wavelength band from about 600nm to 750nm, the green wavelength band may be a wavelength band from about 480nm to 560nm, and the blue wavelength band may be a wavelength band from about 370nm to 460nm, but the present disclosure is not limited thereto.

[0150] Each of the first emission area EA1, the second emission area EA2, and the third emission area EA3 may have a rectangular shape, a square shape, or a diamond shape in a plan view. Figure 6 As shown in FIG. 1 , each of the first emission area EA1 , the second emission area EA2 , and the third emission area EA3 may have a rectangular shape with rounded corners, but the embodiment is not limited thereto.

[0151] In some embodiments, the first emission area EA1 and the second emission area EA2 may be alternately arranged together in a column extending in the second direction DR2. The third emission area EA3 may be in a column extending in the second direction DR2 and arranged along the first direction DR1 between the columns in the first emission area EA1 and the second emission area EA2. The second emission area EA2 may overlap the first emission area EA1 in the second direction DR2, and the third emission area EA3 may overlap the first emission area EA1 and the second emission area EA2 in the first direction DR1.

[0152] The area of ​​the third emission region EA3 may be greater than the area of ​​the first emission region EA1 and the area of ​​the second emission region EA2, and the area of ​​the second emission region EA2 may be greater than the area of ​​the first emission region EA1. However, the present disclosure is not limited thereto, and the first emission region EA1, the second emission region EA2, and the third emission region EA3 may all have the same area.

[0153] Two of each of the first emission area EA1, the second emission area EA2, and the third emission area EA3 may be included in one pixel PX. For example, two first emission areas EA1 may be arranged side by side in the first direction DR1 in one pixel PX, two second emission areas EA2 may be arranged side by side in the first direction DR1 in one pixel PX, and two third emission areas EA3 may be arranged side by side in the first direction DR1 in one pixel PX. However, the present disclosure is not limited thereto, and the number of the first emission area EA1, the second emission area EA2, and the third emission area EA3 included in one pixel PX may change.

[0154] In some embodiments, one end EA3a of the third emission area EA3 included in the pixel PX arranged in the first row R1 in the second direction DR2 may be arranged adjacent to one end EA1a of the first emission area EA1 included in the pixel PX arranged in the first row R1 in the second direction DR2. The other end EA3b of the third emission area EA3 included in the pixel PX arranged in the second row R2 in the second direction DR2 may be arranged adjacent to the other end EA2a of the second emission area EA2 included in the pixel PX arranged in the second row R2 in the second direction DR2. Therefore, the distance in the second direction DR2 between the third emission area EA3 included in the pixel PX arranged in the first row R1 and the third emission area EA3 included in the pixel PX arranged in the second row R2 may be relatively large.

[0155] In the display device 10 according to the present embodiment, an inspection pattern ISP (see Figure 7 ) may be arranged in a space formed between the third emission area EA3 in the first row R1 and the third emission area EA3 in the second row R2. The inspection pattern ISP (see Figure 7 ) can be used according to the display device inspection method S1 to be described later (see Fig.13 ) to check the light-transmitting film LT (see Figure 7 ) of the etching amount and etching shape. Figure 7 and Fig. 9 The inspection pattern ISP is further described.

[0156] Figure 7 is a plan view illustrating a portion of a display area including a light control layer and an emission area in a display device according to an embodiment. Figure 8 is along Figure 7 A cross-sectional view taken along line X2-X2'.

[0157] Apart from Figures 1 to 3 In addition, refer to Figure 7 and Figure 8In the display device 10 according to the present embodiment, similarly to Figure 3 In the display device 10 of the embodiment of the present invention, as an example, the transmission area OA and the non-transmission area LSA are shown to extend in the first direction DR1. Hereinafter, for simplicity, an example in which the transmission area OA and the non-transmission area LSA include separate stripe-shaped areas extending in the first direction DR1 is described below.

[0158] The emission area EA of the display area DA may overlap the transmission area OA and the non-transmission area LSA. For example, the first emission area EA1, the second emission area EA2, and the third emission area EA3 may overlap the transmission area OA and the non-transmission area LSA.

[0159] The transmission area OA may be an area where the light blocking film LS of the light control layer LCL is not disposed. The non-transmission area LSA may be an area where the light blocking film LS of the light control layer LCL is disposed. The light transparent film LT may be disposed in the transmission area OA.

[0160] In some embodiments, the transmission area OA and the non-transmission area LSA may include stripes extending in the first direction DR1. The stripes of the transmission area OA and the non-transmission area LSA may be alternately arranged in the second direction DR2.

[0161] like Figure 8 As shown in FIG. , the light control layer LCL can be arranged in the above reference Figure 5 The touch sensor layer TSU described above is formed on the touch sensor layer TS. The light control layer LCL may control the viewing angle of light emitted from the light emitting layer 172. For example, when the light emitted from the light emitting layer 172 travels at a predetermined angle or less relative to the third direction DR3, the light may pass through the light control layer LCL to be emitted from the display panel 100. On the other hand, when the light emitted from the light emitting layer 172 travels at an angle greater than the predetermined angle relative to the third direction DR3, the light may be absorbed or blocked by the light blocking film LS and may not be emitted from the display panel 100.

[0162] The light control layer LCL may include a light blocking film LS and a light transmitting film LT.

[0163] The light blocking film LS may be disposed on the touch sensor layer TSU. The light blocking film LS may be disposed in the non-transmission area LSA. Figure 7 As shown in , the light-blocking film LS may include stripe-shaped areas arranged alternately with the stripe-shaped areas of the light-transmitting film LT. In an alternative embodiment, the stripe-shaped areas may extend in the first direction DR1 or the second direction DR2. In another embodiment, the light-blocking film LS may include a plurality of openings arranged in the transmission area OA, such as Figure 1 In this case, the light-blocking film LS may surround the area of ​​the light-transmitting film LT.

[0164] The light blocking film LS may absorb or block light emitted from the light emitting layer 172. The light blocking film LS may include a light blocking organic material. For example, the light blocking film LS may be a photosensitive resin capable of absorbing or blocking light, and may include an organic material including an organic black pigment such as carbon black.

[0165] The light-transmitting film LT may be disposed on the touch sensor layer TSU. The light-transmitting film LT may be disposed in the transmission area OA. Figure 7 As shown in , the light-transmitting film LT may include stripe-shaped areas arranged alternately with the stripe-shaped areas of the light-blocking film LS. In addition, the stripe-shaped areas may extend in the first direction DR1 or the second direction DR2. In another embodiment, as shown in Figure 1 As shown in , the light-transmitting film LT may be arranged in the opening in the light-blocking film LS and may be surrounded by the light-blocking film LS.

[0166] The light-transmitting film LT may transmit light emitted from the light-emitting layer 172. The light-transmitting film LT may include a transparent organic material. For example, the light-transmitting film LT may include an organic layer such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, etc. In another embodiment, the light-transmitting film LT may include silicon oxynitride or silicon oxide.

[0167] In some embodiments, the width LT_W of each stripe-shaped region of the light-transmitting film LT may be greater than the width LS_W of each stripe-shaped region of the light-blocking film LS. For example, the width LT_W may be 2 to 5 times the width LS_W. In one example, the width LS_W may be approximately 2 μm to 10 μm, but is not limited thereto.

[0168] In the display device 10 according to the present embodiment, the light control layer LCL may include an inspection pattern ISP. The inspection pattern ISP may be arranged and patterned so as to facilitate inspection of an etching amount and an etching shape of the light-transmitting film LT or the light-blocking film LS. The following describes a display device inspection method S1 (see Fig.13 ) implementation method.

[0169] The inspection pattern ISP may include the same material as that of the light-transmitting film LT. The inspection pattern ISP may extend in the first direction DR1. The inspection pattern ISP may overlap the non-transmitting area LSA and may overlap with the light-transmitting film LT. Figure 7 The inspection pattern ISP may be arranged between remaining portions of the stripes of the light blocking film LS extending in the first direction DR1.

[0170] In some embodiments, the inspection pattern ISP may be arranged in the display area DA. In the display device 10 according to the present embodiment, by placing the inspection pattern ISP in the display area DA, inspection accuracy may be improved compared to a case where the inspection pattern ISP exists on a test element group (TEG) area arranged in the non-display area NDA. The TEG area may be a test area separately provided for the purpose of inspecting whether the light emitting element 170 arranged in the display area DA is driven.

[0171] The check pattern ISP may not overlap with the emission area EA. For example, the check pattern ISP may be arranged between the third emission areas EA3 in the columns extending in the second direction DR2. For example, the check pattern ISP may be arranged in a space formed between the third emission area EA3 included in the pixel PX arranged in the first row R1 and the third emission area EA3 included in the pixel PX arranged in the second row R2. The check pattern ISP may be arranged between the first emission areas EA1 (in the first direction DR1) and / or between the second emission areas EA2 in adjacent columns.

[0172] This disclosure is not limited to Figure 7 , and the check pattern ISP may be arranged between the first emission area EA1 and the second emission area EA2 in the second direction DR2, between the first emission area EA1 and the third emission area EA3 in the first direction DR1, or between the second emission area EA2 and the third emission area EA3 in the first direction DR1. That is, the check pattern ISP may be arranged at various positions in the area that does not overlap with the emission area EA.

[0173] In the display device 10 according to the present embodiment, by placing the inspection pattern ISP so as not to overlap with the emission area EA, it is possible to prevent the viewing angle control characteristic of the light control layer LCL from being degraded.

[0174] Fig. 9 yes Figure 7 Magnified view of area A. Fig.10 is along Fig. 9 A cross-sectional view taken along line X3-X3'.

[0175] Apart from Figures 1 to 3 and Figure 7 In addition, refer to Fig. 9 and Fig.10 , the inspection pattern ISP may include the same material as that of the light-transmitting film LT. The inspection pattern ISP may be a single component physically connected to the light-transmitting films LT adjacent to the opposite sides of the inspection pattern ISP in the second direction DR2. For example, the light-transmitting films LT adjacent to the opposite sides of the inspection pattern ISP may be connected to each other through the inspection pattern ISP.

[0176] The light blocking film LS may be arranged on opposite sides of the inspection pattern ISP in the first direction DR1. The inspection pattern ISP may overlap the light blocking film LS extending in the first direction DR1 in the first direction DR1.

[0177] In some embodiments, the width ISP_W of the inspection pattern ISP in the second direction DR2 may be the same as the width LS_W of the light blocking film LS in the second direction DR2. For example, the width ISP_W of the inspection pattern ISP may be about 2 μm to 10 μm, but is not limited thereto.

[0178] In some embodiments, the thickness ISP_TH of the inspection pattern ISP may be the same as the thickness LS_TH of the light blocking film LS and the thickness LT_TH of the light transparent film LT. For example, the thickness ISP_TH of the inspection pattern ISP may be about 20 μm to 50 μm, but is not limited thereto.

[0179] In the display device 10 according to the present embodiment, the length ISP_L of the inspection pattern ISP in the first direction DR1 may be greater than the width ISP_W of the inspection pattern ISP in the second direction DR2. For example, the length ISP_L of the inspection pattern ISP in the first direction DR1 may be about 5 μm to 20 μm, but is not limited thereto.

[0180] In the display device 10 according to the present embodiment, since the length ISP_L of the inspection pattern ISP in the first direction DR1 is greater than the width ISP_W of the inspection pattern ISP in the second direction DR2, when the display device inspection method S1 described below (see Fig.13 ) When checking the etching amount and etching shape of the light-transmitting film LT, it is possible to prevent the inspection device AFM (see Fig.18 )TIP (see Fig.18 ) is damaged. Fig.13 Describe this.

[0181] Hereinafter, other embodiments of the display device 10 are described. In the following embodiments, descriptions of components that are the same as those described above and are denoted by the same reference numerals may be omitted or simplified, and differences are mainly described.

[0182] Fig.11 is a plan view illustrating a portion of a display area including a light control layer and an emission area in a display device according to another embodiment.

[0183] Reference Fig.11 The display device 10 according to this embodiment is different from the reference Figure 7 The display device 10 according to one embodiment described in the examples is different in that: Fig.11The inspection pattern ISP includes a first sub-inspection pattern IPa, a second sub-inspection pattern ISPb, and a third sub-inspection pattern ISPc.

[0184] exist Fig.11 In the embodiment, the space formed between the third emission area EA3 included in the pixel PX arranged in the first row R1 and the third emission area EA3 included in the pixel PX arranged in the second row R2 may overlap with a plurality of regions of the non-transmission area LSA in the third direction DR3. For example, as shown in the drawings, the space may overlap with three regions of the non-transmission area LSA respectively arranged in the first sub-row SR1, the second sub-row SR2, and the third sub-row SR3 in the third direction DR3.

[0185] The inspection pattern ISP may include a first sub-inspection pattern IPa, a second sub-inspection pattern ISPb, and a third sub-inspection pattern ISPc. The first sub-inspection pattern IPa, the second sub-inspection pattern ISPb, and the third sub-inspection pattern ISPc may be arranged to overlap with the above-mentioned space in the third direction DR3. For example, the first sub-inspection pattern IPa may be arranged in the first sub-row SR1, the second sub-inspection pattern ISPb may be arranged in the second sub-row SR2, and the third sub-inspection pattern ISPc may be arranged in the third sub-row SR3.

[0186] The first to third sub-inspection patterns IPa, ISPb, and ISPc may be arranged side by side in the second direction DR2. Each of the first to third sub-inspection patterns IPa, ISPb, and ISPc may extend in the first direction DR1 and may have the same length in the first direction DR1.

[0187] Each of the first sub-inspection pattern IPa, the second sub-inspection pattern ISPb, and the third sub-inspection pattern ISPc may be arranged between a plurality of segments of the light-blocking film LS extending in the first direction DR1. For example, the first sub-inspection pattern IPa may be arranged between a plurality of segments of the light-blocking film LS arranged in the first sub-row SR1, the second sub-inspection pattern ISPb may be arranged between a plurality of segments of the light-blocking film LS arranged in the second sub-row SR2, and the third sub-inspection pattern ISPc may be arranged between a plurality of segments of the light-blocking film LS arranged in the third sub-row SR3.

[0188] In accordance with Fig.11 In the display device 10 of the embodiment of the present invention, since the inspection pattern ISP includes the first sub-inspection pattern IPa, the second sub-inspection pattern ISPb and the third sub-inspection pattern ISPc, the display device inspection method S1 described below (see Fig.13 ) inspection accuracy.

[0189] Fig.12 is a plan view showing a portion of a display area including a light control layer and an emission area in a display device according to another embodiment.

[0190] Reference Fig.12 ,according to Fig.12 The display device 10 of the embodiment is the same as that according to the reference Fig.11 The display device 10 of the embodiment described in the above is different in that: Fig.12 An embodiment includes a plurality of inspection patterns ISP.

[0191] More specifically, the space formed between the third emission area EA3 included in the pixel PX arranged in the first row R1 and the third emission area EA3 included in the pixel PX arranged in the second row R2 may overlap with the plurality of non-transmission areas LSA in the third direction DR3. For example, as shown in the drawings, the space may overlap with three regions of the non-transmission area LSA respectively arranged in the first sub-row SR1, the second sub-row SR2, and the third sub-row SR3 in the third direction DR3. The space may include a first space arranged in the first column C1 and a second space arranged in the second column C2.

[0192] The plurality of check patterns ISP may include a first check pattern ISP1 and a second check pattern ISP2. The first check pattern ISP1 may be arranged in a first column C1, and the second check pattern ISP2 may be arranged in a second column C2.

[0193] The first check pattern ISP1 may include a first sub-check pattern ISP1a, a second sub-check pattern ISP1b, and a third sub-check pattern ISP1c. The first sub-check pattern ISP1a, the second sub-check pattern ISP1b, and the third sub-check pattern ISP1c may be arranged to overlap with the first space in the third direction DR3. For example, the first sub-check pattern ISP1a may be arranged in the first column C1 and in the first sub-row SR1, the second sub-check pattern ISP1b may be arranged in the first column C1 and in the second sub-row SR2, and the third sub-check pattern ISP1c may be arranged in the first column C1 and in the third sub-row SR3.

[0194] The second check pattern ISP2 may include a fourth sub-check pattern ISP2a, a fifth sub-check pattern ISP2b, and a sixth sub-check pattern ISP2c. The fourth sub-check pattern ISP2a, the fifth sub-check pattern ISP2b, and the sixth sub-check pattern ISP2c may be arranged to overlap with the second space in the third direction DR3. For example, the fourth sub-check pattern ISP2a may be arranged in the second column C2 and in the first sub-row SR1, the fifth sub-check pattern ISP2b may be arranged in the second column C2 and in the second sub-row SR2, and the sixth sub-check pattern ISP2c may be arranged in the second column C2 and in the third sub-row SR3.

[0195] The first, second, and third sub-inspection patterns ISP1a, ISP1b, and ISP1c may be arranged side by side in the second direction DR2 in the first column C1. Each of the first, second, and third sub-inspection patterns ISP1a, ISP1b, and ISP1c may extend in the first direction DR1 and may have the same length in the first direction DR1.

[0196] The fourth, fifth, and sixth sub-inspection patterns ISP2a, ISP2b, and ISP2c may be arranged side by side in the second column C2 along the second direction DR2. Each of the fourth, fifth, and sixth sub-inspection patterns ISP2a, ISP2b, and ISP2c may extend in the first direction DR1 and may have the same length in the first direction DR1.

[0197] Each of the first sub-inspection pattern ISP1a, the second sub-inspection pattern ISP1b, and the third sub-inspection pattern ISP1c may be arranged between a plurality of segments of the light-blocking film LS extending in the first direction DR1. For example, the first sub-inspection pattern ISP1a may be arranged between a plurality of segments of the light-blocking film LS arranged in the first sub-row SR1, the second sub-inspection pattern ISP1b may be arranged between a plurality of segments of the light-blocking film LS arranged in the second sub-row SR2, and the third sub-inspection pattern ISP1c may be arranged between a plurality of segments of the light-blocking film LS arranged in the third sub-row SR3.

[0198] Each of the fourth sub-inspection pattern ISP2a, the fifth sub-inspection pattern ISP2b, and the sixth sub-inspection pattern ISP2c may be arranged between a plurality of segments of the light-blocking film LS extending in the first direction DR1. For example, the fourth sub-inspection pattern ISP2a may be arranged between a plurality of segments of the light-blocking film LS arranged in the first sub-row SR1, the fifth sub-inspection pattern ISP2b may be arranged between a plurality of segments of the light-blocking film LS arranged in the second sub-row SR2, and the sixth sub-inspection pattern ISP2c may be arranged between a plurality of segments of the light-blocking film LS arranged in the third sub-row SR3.

[0199] The first sub-inspection pattern ISP1a and the fourth sub-inspection pattern ISP2a may be positioned opposite to each other with the segment of the light-blocking film LS interposed therebetween. The second sub-inspection pattern ISP1b and the fifth sub-inspection pattern ISP2b may be positioned opposite to each other with the segment of the light-blocking film LS interposed therebetween. The third sub-inspection pattern ISP1c and the sixth sub-inspection pattern ISP2c may be positioned opposite to each other with the segment of the light-blocking film LS interposed therebetween.

[0200] In accordance with Fig.12 In the display device 10 of the embodiment, since a plurality of inspection patterns ISP are included, the display device inspection method S1 described below can be improved (see Fig.13 ) inspection accuracy.

[0201] Hereinafter, a method of manufacturing the display device 10 according to one embodiment will be described.

[0202] Fig.13 is a flowchart illustrating a method for inspecting a display device according to one embodiment. Fig.14 It is shown Fig.13 FIG. 5 is a cross-sectional view of a structure that can be formed in step S100. Fig.15 It is shown Fig.13 FIG. 5 is a cross-sectional view of a structure that can be formed in step S200 . Fig.16 It is shown Fig.13 FIG. 5 is a cross-sectional view of a structure that can be formed in step S300 . Fig.17 is a perspective view showing a structure that may be formed in step S400 according to a comparative embodiment. Fig.18 It is shown Fig.13 A perspective view of a structure that may be formed in step S400. Fig.19 It is shown Fig.13 FIG. 5 is a cross-sectional view of a structure that can be formed in step S400. Fig. 20 It is shown Fig.13 FIG. 5 is a cross-sectional view of a structure that can be formed in step S500 .

[0203] Reference Figures 13 to 20 According to one embodiment, a display device inspection method S1 may include: forming a light-transmitting material layer on a touch sensor layer (step S100); forming a hard mask on the light-transmitting material layer (step S200); forming a light-transmitting film (step S300); inspecting an etching amount and an etching shape of the light-transmitting film (step S400); and forming a light-blocking film (step S500).

[0204] First, step S100 may form a light-transmitting material layer LTM on the touch sensor layer TSU of the display panel 100. The display panel 100 may specifically include the touch sensor layer TSU shown above. Figure 5The prepared display layer DU and touch sensor layer TSU. In one embodiment, the light-transmitting material layer LTM may include an organic layer such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, etc. In another embodiment, the light-transmitting film LT may include silicon oxynitride or silicon oxide.

[0205] Secondly, step S200 may form a hard mask HM on the light-transmitting material layer LTM. For example, a deposition process and a patterning process may form the hard mask HM. More specifically, the material contained in the hard mask HM may be deposited on the entire surface of the light-transmitting material layer LTM. The material contained in the hard mask HM may include at least one of aluminum, chromium, copper, nickel, and their oxides, but is not limited thereto. The material contained in the hard mask HM may be deposited by a sputtering process or another physical vapor deposition (PVD) method. However, the present disclosure is not limited thereto, and the material may be deposited by a chemical vapor deposition (CVD) method, an atomic layer deposition (ALD) method, or the like. A hard mask material layer may be arranged on the entire surface of the light-transmitting material layer LTM, and may be patterned to form the hard mask HM. For example, the hard mask HM may be patterned by a photolithography process.

[0206] Third, step S300 forms a light-transmitting film LT. In particular, the light-transmitting material layer LTM may be patterned using the hard mask HM to form the inspection pattern ISP and the light-transmitting film LT. For example, the etching process may remove the portion of the light-transmitting material layer LTM that does not overlap with the hard mask HM. The portion of the light-transmitting material layer LTM that does not overlap with the hard mask HM may be etched by dry etching, but is not limited thereto.

[0207] A groove GRV or a plurality of grooves GRV may be formed in a portion in which the light-transmitting material layer LTM is etched, so that the light-transmitting film LT may be formed. In one embodiment, the groove GRV and the light-transmitting film LT may include stripes extending in the first direction DR1, such as Fig.18 as shown in .

[0208] The etching of the light-transmitting material layer LTM may also form the inspection pattern ISP between a plurality of regions of the light-transmitting film LT extending in the first direction DR1. Fig.16 and Fig.18 As shown in FIG, the inspection pattern ISP may be arranged between a plurality of grooves GRV extending in the first direction DR1. Fig.18 As shown in , the inspection pattern ISP may be arranged between a plurality of stripe-shaped regions extending in the first direction DR1 of the light transparent film LT.

[0209] Fourth, in the step S400 of inspecting the etching amount and etching shape of the light-transmitting film LT, the etching amount and etching shape of the light-transmitting film LT may be inspected using an inspection device AFM. The inspection device AFM may be a type of scanning probe microscope such as an atomic force microscope. In the present embodiment, the inspection device AFM is illustrated as a non-contact atomic force microscope, but is not limited thereto. For example, the inspection device AFM may be a contact or tapping atomic force microscope.

[0210] The inspection device AFM may include a scanner PZT, a cantilever CTV and a tip TIP.

[0211] The scanner PZT may expand and contract so that a constant atomic force may act between the object and the tip TIP. For example, the scanner PZT may include a piezoelectric tube.

[0212] The cantilever CTV may be a structure in which one end is fixed to the scanner PZT and the other end is freely movable. The cantilever CTV may have flexibility and may be bent according to the movement of the tip TIP coupled to the free end of the cantilever CTV.

[0213] The tip TIP may move in the first direction DR1, the second direction DR2, and the third direction DR3 according to the shape of the object (e.g., the light-transmitting film LT). The tip TIP may have a shape protruding from the cantilever CTV toward the object. The tip TIP may be formed of the same material as that of the cantilever CTV and formed integrally with the cantilever CTV.

[0214] like Fig.17 As shown in FIG. 1 , according to the display device inspection method S1 of the comparative embodiment, the inspection device AFM may scan the light-transmitting film LT in the second direction DR2 instead of the first direction DR1, and the first direction DR1 is the extension direction of the groove GRV and the light-transmitting film LT. In this case, the width GRV_W of the groove GRV is smaller than the width LT_W of the light-transmitting film LT and the thickness TH1 of the light-transmitting film LT, which may cause problems such as the tip TIP of the inspection device AFM being broken or damaged in the process of measuring the depth of the groove GRV. For example, when moving to the top surface of the light-transmitting film LT after measuring the depth of the groove GRV, the tip TIP may be broken or damaged.

[0215] On the other hand, Fig.18 and Fig.19 As shown in , according to the display device inspection method S1 according to the present embodiment, the inspection device AFM may scan the light transparent film LT in the first direction DR1 which is the extending direction of the groove GRV and the light transparent film LT.

[0216] In this case, in the display device 10 according to the present embodiment, since the length ISP_L of the inspection pattern ISP arranged between the plurality of grooves GRV in the first direction DR1 can be sufficiently ensured, damage to the tip TIP of the inspection device AFM can be minimized. For example, when moving toward the top surface ISP_US of the inspection pattern ISP after measuring the depth of the groove GRV, damage to the tip TIP can be minimized.

[0217] Fifth, in the step S500 of forming the light-blocking film, when there is no abnormality in the etching amount and the etching shape of the light-transmitting film LT, the light-blocking film LS may be formed in the groove GRV.

[0218] For example, the material included in the light blocking film LS may be arranged between the plurality of regions of the light transmitting film LT, that is, in the groove GRV. For example, the material included in the light blocking film LS may be a photosensitive resin capable of absorbing or blocking light, and may include an organic material containing an organic black pigment such as carbon black.

[0219] The light-blocking film LS may be formed in the groove GRV, and thus, the light-controlling layer LCL including the light-transmitting film LT and the light-blocking film LS may be formed.

[0220] According to the display device inspection method S1 according to the present embodiment, in the process of forming the light control layer LCL of the display device 10, after etching the light-transmitting film LT, the inspection pattern ISP may be directly inspected to inspect the etching amount and etching shape of the light-transmitting film LT. Therefore, the reliability of the light control layer LCL may be improved.

[0221] At the end of the detailed description, those skilled in the art will recognize that many changes and modifications can be made to the preferred embodiment without departing from the principles of the present disclosure. Therefore, the disclosed preferred embodiments are used only in a general and descriptive sense and not for the purpose of limitation.

Claims

1. A display device, comprising: substrate; a light emitting element layer, the light emitting element layer being arranged on the substrate and comprising a plurality of light emitting elements; as well as a light control layer, which is arranged on the light emitting element layer and includes a light-transmitting film and a light-blocking film, Wherein, the light control layer further comprises an inspection pattern overlapping with the light blocking film in a first direction, and The inspection pattern extends in the first direction, which is the same direction as an extending direction of the plurality of regions of the light-blocking film.

2. The display device according to claim 1, wherein: The inspection pattern is arranged between at least two of the plurality of regions of the light blocking film, and the at least two regions are aligned along the first direction.

3. The display device according to claim 1, wherein: The plurality of regions of the light-transmitting film and the plurality of regions of the light-blocking film are alternately arranged in a second direction different from the first direction.

4. The display device according to claim 3, wherein: The inspection pattern is arranged between a plurality of regions of the light-transmitting film that are adjacent in the second direction.

5. The display device according to claim 4, wherein: The plurality of regions of the light-transmitting film arranged on opposite sides of the inspection pattern are connected to each other through the inspection pattern, and The plurality of regions of the light-transmitting film disposed on the opposite sides of the checking pattern are physically coupled with the checking pattern to form a single component.

6. The display device according to claim 1, wherein: The inspection pattern includes the same material as that of the light-transmitting film.

7. The display device according to claim 1, wherein: In a second direction different from the first direction, a width of the inspection pattern is equal to a width of each of the plurality of regions of the light blocking film.

8. The display device according to claim 1, wherein: A length of the check pattern in the first direction is greater than a width of the check pattern in a second direction different from the first direction.

9. The display device according to claim 1, wherein: The thickness of the inspection pattern is equal to the thickness of the light-transmitting film.

10. The display device according to claim 1, wherein: The substrate includes a display area where the plurality of light emitting elements are arranged and a non-display area arranged on at least one side of the display area, and The inspection pattern is arranged in the display area.

11. The display device according to claim 10, wherein: The display area includes an emission area configured to emit light, and The inspection pattern does not overlap the emission area.

12. The display device according to claim 1, wherein: The plurality of regions of the light-blocking film include a plurality of regions separated from each other in a second direction different from the first direction, The check pattern includes a plurality of sub-check patterns, and The plurality of sub-inspection patterns each overlaps the plurality of regions of the light-blocking film in the first direction.

13. The display device according to claim 12, further comprising a plurality of pixels each having the plurality of light emitting elements arranged therein, The inspection pattern includes a first inspection pattern and a second inspection pattern, and The first check pattern and the second check pattern are arranged between the plurality of pixels adjacent to each other.

14. The display device according to claim 1, wherein: In a second direction different from the first direction, widths of the plurality of regions of the light-transmitting film are greater than widths of the plurality of regions of the light-blocking film.

15. A display device, comprising: substrate; a light emitting element layer, the light emitting element layer being arranged on the substrate and comprising a plurality of light emitting elements; as well as a light control layer, the light control layer being arranged on the light emitting element layer and comprising a first light-transmitting film area, a light-blocking film area, and a second light-transmitting film area, wherein the first light-transmitting film area, the light-blocking film area, and the second light-transmitting film area are alternately arranged in a first direction, Wherein, the light control layer further includes an inspection pattern arranged between the first light-transmitting film area and the second light-transmitting film area in the first direction, The light-blocking film area includes a first light-blocking film segment and a second light-blocking film segment adjacent to each other in a second direction different from the first direction, and The inspection pattern is arranged between the first light-blocking film segment and the second light-blocking film segment in the second direction.

16. The display device according to claim 15, wherein: The first light-blocking film segment, the second light-blocking film segment, and the inspection pattern extend in the second direction.

17. The display device according to claim 15, wherein: The thickness of the inspection pattern is equal to the thickness of the light-blocking film area.

18. A method for inspecting a display device, the display device comprising a substrate, a light emitting element layer disposed on the substrate and comprising a plurality of light emitting elements, a light-transmitting film comprising a plurality of light-transmitting film regions disposed on the light-emitting element layer, and an inspection pattern disposed between the plurality of light-transmitting film regions of the light-transmitting film, the method comprising: The light-transmitting film was examined using an atomic force microscope with a tip, The inspection pattern extends in a first direction, which is the same direction as the extension direction of the plurality of light-transmitting film regions of the light-transmitting film, and In the inspection of the light-transmitting film, the tip moves in the first direction.

19. The method for inspecting a display device according to claim 18, wherein: A length of the check pattern in the first direction is greater than a width of the check pattern in a second direction different from the first direction.

20. The method for inspecting a display device according to claim 18, wherein: The display device further includes a light-blocking film between the plurality of light-transmitting film regions of the light-transmitting film.

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