Automatic cleaning control method and system for screen soaking pool

Abstract

The invention relates to an automatic cleaning control method and system for a screen plate soaking pool, and the method comprises the steps: obtaining a screen plate residue image in the screen plate soaking pool, carrying out the image analysis of the screen plate residue image, carrying out the positioning processing of a residue position, obtaining the residue positioning data of a to-be-cleaned screen plate, and carrying out the cleaning of the to-be-cleaned screen plate. The soaking time and cleaning rotation parameters of the to-be-cleaned screen plate are analyzed according to the residue positioning data, cleaning control data of a rotary cleaning device of the screen plate soaking pool are obtained, in the rotary cleaning process according to the cleaning control data, the cleaning effect of the to-be-cleaned screen plate in the adjacent cleaning periods is obtained, residue cleaning difference analysis is conducted, and the cleaning time of the to-be-cleaned screen plate is obtained. And residue cleaning difference data of the to-be-cleaned screen plate is obtained, the lower wheel cleaning rotation speed and the staying soaking time of the rotary cleaning device are adjusted according to the residue cleaning difference data, and rotary cleaning control data of the to-be-cleaned screen plate in the soaking pool are obtained. The device has the effect of improving the cleaning control automation degree of the screen soaking pool.

Description

Technical Field

[0001] The present application relates to the technical field of screen cleaning, and in particular to an automated cleaning control method and system for a screen soaking tank. Background Art

[0002] At present, mesh plates are widely used in the breeding industry. The mesh plate soaking tank is one of the important tools for cleaning the mesh plates. The soaking process in the soaking tank can effectively decompose the stubborn stains attached to the mesh plates, thereby improving the cleaning efficiency of the mesh plates.

[0003] In the aquaculture industry, the mesh serves as a supporting part for aquaculture. In addition to supporting the aquacultured objects, it also plays the function of supporting the feeding of feed. In actual use, the feed needs to be mixed with water for feeding, but the feed is easy to produce adhesion after being exposed to water. Once the feed is not completely consumed, it is easy to adhere to the mesh to form stubborn stains that are difficult to clean. The cleaning of the existing mesh soaking tank is often done by a cleaning worker manually preparing the solution and adding it to the soaking tank, and then adding the mesh to be cleaned for soaking. During this period, the worker intermittently checks the decomposition of the stains on the mesh for manual analysis, thereby determining the soaking time of the mesh. However, when cleaning a large number of meshes, due to the different dirt conditions of different meshes, the worker is required to perform multiple soaking effect checks on each mesh, which not only wastes manpower time, but also during the mesh soaking effect inspection process, the worker's arms are soaked in the solution too much, which is easy to cause injury. Therefore, there is room for further optimization of the cleaning control method of the mesh soaking tank. Summary of the invention

[0004] In order to improve the degree of automation of cleaning control of a stencil soaking tank, the present application provides an automated cleaning control method and system for a stencil soaking tank.

[0005] In the first aspect, the above-mentioned invention objective of the present application is achieved through the following technical solutions:

[0006] An automatic cleaning control method for a screen soaking tank, the automatic cleaning control method is used to control a rotating cleaning device of the screen soaking tank, comprising:

[0007] Acquire a stencil residue image in a stencil immersion tank, perform image analysis on the stencil residue image and perform positioning processing on the residue position to obtain residue positioning data of the stencil to be cleaned;

[0008] Analyze the immersion time and cleaning rotation parameters of the screen to be cleaned according to the residue positioning data to obtain cleaning control data of the rotary cleaning device of the screen immersion tank;

[0009] In the process of performing rotational cleaning according to the cleaning control data, the cleaning effects of the screen to be cleaned in adjacent cleaning cycles are obtained to perform residue cleaning difference analysis, and the residue cleaning difference data of the screen to be cleaned is obtained;

[0010] The cleaning rotation speed and the dwelling soaking time of the lower wheel of the rotary cleaning device are adjusted according to the residue cleaning difference data to obtain the rotary cleaning control data of the screen to be cleaned in the soaking tank.

[0011] By adopting the above calculation scheme, the attachment position of the residue on the stencil is located by analyzing the stencil residue image, which helps to accurately soak and rinse the stencil, adjust the soaking time and cleaning rotation parameters of the stencil to be cleaned through the residue positioning data, and accurately control the operation of the cleaning rotation device through the cleaning control data to improve the degree of automation of cleaning the stencil soaking pool for the stencil to be cleaned. In the rotary cleaning process, the residue cleaning difference analysis is performed in combination with the cleaning effects of adjacent cleaning cycles, which helps to further judge whether the current cleaning force and soaking time effectively flush and clean the residue, and then adjust the cleaning rotation speed of the lower wheel of the rotary cleaning device to improve the adaptability between the stencil flushing force and the stencil residue, and reduce the adhesion force of the residue to the stencil by adjusting the immersion time of the stencil residue position in the immersion pool, thereby achieving the effect of the automated control immersion pool on cleaning the stencil to be cleaned, and improving the degree of automation of cleaning control of the stencil soaking pool.

[0012] In a preferred example, the present application can be further configured as follows: the immersion time and cleaning rotation parameters of the screen to be cleaned are analyzed according to the residue positioning data to obtain the cleaning control data of the rotary cleaning device of the screen immersion tank, specifically including:

[0013] Obtaining the distribution state of the stencil residue according to the stencil residue image analysis result, and analyzing the soaking time of the stencil to be cleaned according to the stencil residue distribution state;

[0014] According to the residue positioning data, the rotation angle required for the rotary cleaning device to rotate the screen to be cleaned into the soaking tank for complete soaking is analyzed to obtain the rotation angle data of the rotary cleaning device;

[0015] Soaking the screen to be cleaned according to the soaking time, and analyzing the cleaning rotation frequency and the rotation operation power of the screen to be cleaned according to the initial soaking effect to obtain the rotation operation data of the rotary cleaning device;

[0016] The rotation angle data and the rotation operation data are combined with the corresponding cleaning cycle to obtain the cleaning control data of the rotary cleaning device of the screen immersion tank.

[0017] By adopting the above technical scheme, the residue distribution state on the screen is analyzed in combination with the screen residue image analysis result, and the immersion time of the screen to be cleaned in the immersion tank is analyzed according to the residue distribution state, and the rotation angle of the rotary cleaning device is controlled in combination with the residue positioning data, and the screen to be cleaned is rotated into the immersion tank until the residue attachment position is completely immersed, thereby obtaining the rotation angle data of the rotary cleaning device, and after the screen to be cleaned is immersed according to the immersion time, the cleaning rotation frequency and the rotation operation power of the screen to be cleaned are analyzed according to the immersion effect, and the automation degree of the rotary cleaning device is further improved through the rotation operation data, and the rotation angle data and the rotation operation data are combined with the corresponding cleaning cycle to obtain the cleaning control data, which helps to improve the control automation degree of the rotary cleaning device.

[0018] In a preferred example, the present application can be further configured as follows: in the process of performing rotational cleaning according to the cleaning control data, the cleaning effect of the stencil to be cleaned in adjacent cleaning cycles is obtained to perform residue cleaning difference analysis, and the residue cleaning difference data of the stencil to be cleaned is obtained, specifically including:

[0019] In the process of performing rotary cleaning according to the cleaning control data, a screen plate residue image of each rotation cycle of the rotary cleaning device is obtained, and the screen plate residue images of adjacent rotation cycles are compared to obtain the screen plate cleaning effect;

[0020] According to the screen cleaning effect, the residue cleaning difference of each rotation cycle is compared and analyzed to obtain the residue cleaning difference data of the screen to be cleaned.

[0021] By adopting the above technical scheme, in the process of the rotary cleaning device performing rotary cleaning according to the cleaning control data, the screen plate residue image of each rotation cycle is collected, and the screen plate residue images of adjacent rotation cycles are compared to obtain the screen plate cleaning effect. The residue cleaning differences of each rotation cycle are compared and analyzed according to the screen plate cleaning effect, which helps to make targeted adjustments to residues with different degrees of attachment and improve the effectiveness of residue cleaning.

[0022] In a preferred example, the present application can be further configured as follows: the lower wheel cleaning rotation speed and the dwelling soaking time of the rotary cleaning device are adjusted according to the residue cleaning difference data to obtain the rotary cleaning control data of the screen to be cleaned in the soaking tank, specifically including:

[0023] Based on the residue cleaning difference data, an evaluation is performed on whether the rotary cleaning frequency of the rotary cleaning device can effectively clean the stencil residue, thereby obtaining an evaluation on the effectiveness of residue cleaning of the stencil to be cleaned;

[0024] According to the residue cleaning effectiveness evaluation, the cleaning rotation speed of the lower wheel of the rotary cleaning device and the residence time of the residue fixed point in the soaking tank are adjusted to obtain the rotary cleaning control data of the screen to be cleaned in the soaking tank.

[0025] By adopting the above technical scheme, it is evaluated based on the residue cleaning difference data whether the rotary cleaning frequency of the rotary cleaning device can effectively clean the screen residue. Therefore, combined with the residue cleaning effectiveness evaluation of the screen to be cleaned, the next cleaning rotation speed and the residence time of the residue fixed point in the immersion tank are adjusted, which helps to improve the intelligent judgment of screen residue cleaning.

[0026] In a preferred example, the present application can be further configured as follows: the image of the stencil residue in the stencil immersion pool is obtained, image analysis is performed on the stencil residue image, and the residue position is positioned to obtain the residue positioning data of the stencil to be cleaned, specifically including:

[0027] Receiving assembly trigger information of the stencil to be cleaned in the stencil soaking tank, and acquiring a stencil residue image in the stencil soaking tank when the assembly trigger information is received;

[0028] The image of the screen plate residue is analyzed, and the position of the screen plate residue is located in combination with a preset screen plate cleaning template to obtain the residue location data of the screen plate to be cleaned.

[0029] By adopting the above technical solution, by receiving the assembly trigger information of the stencil to be cleaned in the stencil immersion tank, it is determined whether the stencil to be cleaned is correctly assembled in the preset cleaning position of the immersion tank, and when the assembly trigger information is received, the stencil residue image in the stencil immersion tank is timely collected for image analysis, and the stencil residue position is located with reference to the preset stencil cleaning template, which helps to improve the accuracy of residue positioning.

[0030] In the second aspect, the above invention objective of the present application is achieved through the following technical solutions:

[0031] An automatic cleaning control system for a screen soaking tank, the system is applied to the automatic cleaning control method for the screen soaking tank, the system comprises:

[0032] A data acquisition module is used to acquire a stencil residue image in a stencil immersion tank, perform image analysis on the stencil residue image and perform positioning processing on the residue position to obtain residue positioning data of the stencil to be cleaned;

[0033] A data analysis module, used for analyzing the immersion time and cleaning rotation parameters of the screen to be cleaned according to the residue positioning data, and obtaining cleaning control data of the rotary cleaning device of the screen immersion tank;

[0034] A cleaning analysis module, used to obtain the cleaning effect of the stencil to be cleaned in adjacent cleaning cycles during the process of rotary cleaning according to the cleaning control data, and perform residue cleaning difference analysis to obtain residue cleaning difference data of the stencil to be cleaned;

[0035] The parameter adjustment module is used to adjust the lower cleaning rotation speed and the dwelling soaking time of the rotary cleaning device according to the residue cleaning difference data, so as to obtain the rotary cleaning control data of the screen to be cleaned in the soaking tank.

[0036] By adopting the above calculation scheme, the attachment position of the residue on the stencil is located by analyzing the stencil residue image, which helps to accurately soak and rinse the stencil, adjust the soaking time and cleaning rotation parameters of the stencil to be cleaned through the residue positioning data, and accurately control the operation of the cleaning rotation device through the cleaning control data to improve the degree of automation of cleaning the stencil soaking pool for the stencil to be cleaned. In the rotary cleaning process, the residue cleaning difference analysis is performed in combination with the cleaning effects of adjacent cleaning cycles, which helps to further judge whether the current cleaning force and soaking time effectively flush and clean the residue, and then adjust the cleaning rotation speed of the lower wheel of the rotary cleaning device to improve the adaptability between the stencil flushing force and the stencil residue, and reduce the adhesion force of the residue to the stencil by adjusting the immersion time of the stencil residue position in the immersion pool, thereby achieving the effect of the automated control immersion pool on cleaning the stencil to be cleaned, and improving the degree of automation of cleaning control of the stencil soaking pool.

[0037] On the third aspect, the above-mentioned purpose of the present application is achieved through the following technical solutions:

[0038] A computer device comprises a memory, a processor and a computer program stored in the memory and executable on the processor. When the processor executes the computer program, the steps of the above-mentioned automatic cleaning control method for a screen immersion tank are implemented.

[0039] Fourthly, the above-mentioned purpose of the present application is achieved through the following technical solutions:

[0040] A computer-readable storage medium stores a computer program, and when the computer program is executed by a processor, the steps of the above-mentioned automatic cleaning control method for a screen immersion tank are implemented.

[0041] In summary, the present application includes at least one of the following beneficial technical effects:

[0042] 1. The attachment position of the residue on the stencil is located by analyzing the stencil residue image, which is helpful for accurately soaking and flushing the stencil. The soaking time and cleaning rotation parameters of the stencil to be cleaned are adjusted by the residue positioning data. The operation of the cleaning rotation device is accurately controlled by the cleaning control data to improve the cleaning automation of the stencil soaking pool for the stencil to be cleaned. In the process of rotary cleaning, the difference analysis of residue cleaning is carried out in combination with the cleaning effects of adjacent cleaning cycles, which is helpful for further judging whether the current cleaning strength and soaking time are effectively flushing and cleaning the residue. Then, the cleaning rotation speed of the lower wheel of the rotary cleaning device is adjusted to improve the adaptability between the stencil flushing strength and the stencil residue. By adjusting the immersion time of the stencil residue position in the soaking pool, the adhesion strength of the residue to the stencil is reduced, thereby achieving the cleaning effect of the automated control soaking pool on the stencil to be cleaned, and improving the cleaning automation of the stencil soaking pool.

[0043] 2. By adopting the above technical solution, the residue distribution state on the screen is analyzed in combination with the screen residue image analysis result, and the immersion time of the screen to be cleaned in the immersion tank is analyzed according to the residue distribution state. The rotation angle of the rotary cleaning device is controlled in combination with the residue positioning data, and the screen to be cleaned is rotated into the immersion tank until the residue attachment position is completely immersed, thereby obtaining the rotation angle data of the rotary cleaning device. After the screen to be cleaned is immersed according to the immersion time, the cleaning rotation frequency and the rotation operation power of the screen to be cleaned are analyzed according to the immersion effect. The automation degree of the rotary cleaning device is further improved through the rotation operation data, and the rotation angle data, the rotation operation data and the corresponding cleaning cycle are combined to obtain the cleaning control data, which is helpful to improve the control automation degree of the rotary cleaning device;

[0044] 3. When the rotary cleaning device performs rotary cleaning according to the cleaning control data, the screen plate residue image of each rotation cycle is collected, and the screen plate residue images of adjacent rotation cycles are compared to obtain the screen plate cleaning effect. The residue cleaning differences of each rotation cycle are compared and analyzed according to the screen plate cleaning effect, which helps to make targeted adjustments to residues with different degrees of attachment and improve the effectiveness of residue cleaning. BRIEF DESCRIPTION OF THE DRAWINGS

[0045] Figure 1 Schematic diagram of the structure of the mesh plate immersion pool of this embodiment.

[0046] Figure 2 This is a flow chart for implementing an automated cleaning control method for a screen immersion tank in this embodiment.

[0047] Figure 3 This is a flow chart for implementing step S10 of the automatic cleaning control method of this embodiment.

[0048] Figure 4 It is a flow chart for implementing step S20 of the automatic cleaning control method of this embodiment.

[0049] Figure 5 This is a flow chart for implementing step S30 of the automated cleaning control method of this embodiment.

[0050] Figure 6 This is a flow chart for implementing step S40 of the automated cleaning control method of this embodiment.

[0051] Figure 7 This is a structural block diagram of an automatic cleaning control system for a screen soaking tank according to this embodiment.

[0052] Figure 8 It is a schematic diagram of the internal structure of a computer device used to implement an automated cleaning control method.

[0053] In the figure, there is a soaking tank 100, a driving assembly 200, a rotating ring 300, and a mesh plate 400. DETAILED DESCRIPTION

[0054] The present application is further described in detail below in conjunction with the accompanying drawings.

[0055] In one embodiment, the automatic cleaning control method in this embodiment is used to control the rotary cleaning device of the stencil soaking tank. The assembly position of the rotary cleaning device in the soaking tank is as follows: Figure 1 As shown, the rotary cleaning device includes a driving component 200 and a paired rotating ring 300. The driving component 200 and the rotating ring 300 are driven by a hinge, and the rotating ring 300 is driven to drive the screen 400 to rotate in the soaking tank 100. The screen 400 is automatically cleaned by adjusting the soaking time of the screen 400 in the soaking tank 100 and the rotation speed of the driving ring 300. The present application discloses an automatic cleaning control method for a screen soaking tank. The automatic cleaning control method of this embodiment is as follows Figure 2 As shown, the specific steps include:

[0056] S10: obtaining a stencil residue image in the stencil immersion tank, performing image analysis on the stencil residue image and positioning processing on the residue position, and obtaining residue positioning data of the stencil to be cleaned.

[0057] Specifically, Figure 3 As shown, step S10 includes:

[0058] S101: receiving assembly trigger information of a stencil to be cleaned in a stencil soaking tank, and acquiring a stencil residue image in the stencil soaking tank when the assembly trigger information is received.

[0059] Specifically, an image acquisition device preset at the edge of the immersion tank is used to obtain whether there is a stencil placed at the stencil placement position of the stencil to be cleaned. When it is detected that stencil images are acquired at all stencil placement positions, assembly trigger information of the stencil to be cleaned in the stencil immersion tank is triggered. When the driving component receives the assembly trigger information, the image of the stencil residue in the stencil immersion tank is obtained for analysis.

[0060] S102: performing image analysis on the stencil residue image, and performing positioning processing on the stencil residue position in combination with a preset stencil cleaning template to obtain residue positioning data of the stencil to be cleaned.

[0061] Specifically, the stencil residue image is analyzed and compared with the stencil parameters in the preset stencil cleaning template, the image sites that are different from the stencil cleaning template parameters are marked as residue positions, and the degree of residue adhesion is judged according to the size of the residue to obtain the residue positioning data of the stencil to be cleaned.

[0062] S20: Analyze the immersion time and cleaning rotation parameters of the screen to be cleaned according to the residue positioning data, and obtain cleaning control data of the rotary cleaning device of the screen immersion tank.

[0063] Specifically, Figure 4 As shown, step S20 includes:

[0064] S201: obtaining a distribution state of stencil residue according to a stencil residue image analysis result, and analyzing a soaking time of a stencil to be cleaned according to the stencil residue distribution state.

[0065] Specifically, the distribution position and distribution state of the residue on the screen are obtained according to the results of the screen residue image analysis, and the immersion time of the screen to be cleaned is analyzed according to the distribution state of the screen residue. If the residue is concentrated, the screen immersion time is increased; if the residue is dispersed, the residue immersion time is reduced. It should be noted that in this embodiment, the immersion time can also be adjusted according to the size of the residue, and the larger the residue, the longer the immersion time.

[0066] S202: Analyze the rotation angle required for the rotary cleaning device to rotate the screen to be cleaned into the immersion tank for complete immersion according to the residue positioning data, and obtain the rotation angle data of the rotary cleaning device.

[0067] Specifically, the rotation angle required for the current residue positioning position to be rotated to complete immersion is analyzed according to the residue positioning data, and the rotation angle of the rotary cleaning device is adjusted according to the analysis result to obtain the rotation angle data of the rotary cleaning device.

[0068] S203: Soaking the screen to be cleaned according to the soaking time, and analyzing the cleaning rotation frequency and the rotation operation power of the screen to be cleaned according to the initial soaking effect to obtain the rotation operation data of the rotary cleaning device.

[0069] Specifically, the rotary cleaning device is controlled to soak the screen to be cleaned in the soaking pool according to the soaking time, and the screen soaking image is obtained after the soaking time is over to analyze the residue dissolution, so as to obtain the initial soaking effect. The cleaning rotation frequency and the rotation operation power of the screen to be cleaned are analyzed according to the initial soaking effect. If the residue dissolution is good, the screen rotation frequency and the operation power are reduced. If the residue dissolution is the same as before dissolution, the rotation frequency and the operation power are increased to increase the instantaneous contact force between the screen and the soaking pool water, and to increase the flushing force of the screen residue, so as to obtain the rotation operation data of the rotary cleaning device.

[0070] S204: The rotation angle data and the rotation operation data are combined with the corresponding cleaning cycle to obtain the cleaning control data of the rotation cleaning device of the screen immersion tank.

[0071] Specifically, the rotation angle data, the rotation operation data and the corresponding cleaning cycle are combined, and the cleaning cycle is the number of revolutions of the screen to be cleaned driven by the rotary cleaning device, thereby obtaining the cleaning control data of the rotary cleaning device of the screen immersion tank.

[0072] S30: In the process of performing rotational cleaning according to the cleaning control data, the cleaning effects of the screen to be cleaned in adjacent cleaning cycles are obtained to perform residue cleaning difference analysis to obtain residue cleaning difference data of the screen to be cleaned.

[0073] Specifically, Figure 5 As shown, step S30 includes:

[0074] S301: in the process of performing rotary cleaning according to the cleaning control data, obtaining a screen residue image of each rotation cycle of the rotary cleaning device, performing image comparison on the screen residue images of adjacent rotation cycles, and obtaining a screen cleaning effect.

[0075] Specifically, in the process of operating the rotary cleaning device to perform rotary cleaning on the screen to be cleaned according to the cleaning control data, the screen residue image of each rotation cycle is collected by the image acquisition device, and the screen residue images of adjacent rotation cycles are compared, and the screen cleaning effect is obtained according to the changes in the residue images of adjacent rotation cycles.

[0076] S302: According to the screen cleaning effect, the residue cleaning difference of each rotation cycle is compared and analyzed to obtain the residue cleaning difference data of the screen to be cleaned.

[0077] Specifically, according to the stencil cleaning effect, the residue cleaning difference of each rotation cycle is compared and analyzed, such as whether the residue cleaning effects of adjacent rotation cycles are the same, thereby obtaining the residue cleaning difference data of the stencil to be cleaned.

[0078] S40: adjusting the cleaning rotation speed and the dwelling soaking time of the lower wheel of the rotary cleaning device according to the residue cleaning difference data, and obtaining the rotary cleaning control data of the screen to be cleaned in the soaking tank.

[0079] Specifically, Figure 6 As shown, step S40 includes:

[0080] S401: Based on the residue cleaning difference data, an evaluation is performed on whether the rotary cleaning frequency of the rotary cleaning device can effectively clean the stencil residue, and an evaluation of the effectiveness of residue cleaning of the stencil to be cleaned is obtained.

[0081] Specifically, based on the residue cleaning difference data, an evaluation is performed to determine whether the rotary cleaning frequency of the rotary cleaning device can effectively clean the screen residue. If the cleaning effect of adjacent residues tends to be positive, it is effective cleaning; otherwise, it is ineffective cleaning. In this embodiment, a decrease in the size of the residue attachment is considered positive cleaning, while an unchanged size of the residue attachment is considered negative cleaning, thereby obtaining an evaluation of the effectiveness of the residue cleaning of the screen to be cleaned.

[0082] S402: According to the evaluation of the effectiveness of the residue cleaning, the cleaning rotation speed of the lower wheel of the rotary cleaning device and the residence time of the residue fixed position in the soaking tank are adjusted to obtain the rotary cleaning control data of the screen to be cleaned in the soaking tank.

[0083] Specifically, according to the evaluation results of the effectiveness of residue cleaning, the cleaning speed of the lower wheel of the rotary cleaning device is adjusted, as well as the residence and immersion time of the residue fixed position in the immersion tank is adjusted. For example, when ineffective cleaning is performed, the cleaning speed of the lower wheel is accelerated and the residence and immersion time is extended, etc., so as to obtain the rotary cleaning control data of the screen to be cleaned in the immersion tank.

[0084] It should be understood that the size of the serial numbers of the steps in the above embodiments does not mean the order of execution. The execution order of each process should be determined by its function and internal logic, and should not constitute any limitation on the implementation process of the embodiments of the present application.

[0085] In one embodiment, an automatic cleaning control system for a screen soaking tank is provided, and the automatic cleaning control system for a screen soaking tank corresponds one-to-one with the automatic cleaning control method for a screen soaking tank in the above embodiment. Figure 7 As shown, the automatic cleaning control system for the screen soaking tank includes a data acquisition module, a data analysis module, a cleaning analysis module and a parameter adjustment module. The detailed description of each functional module is as follows:

[0086] The data acquisition module is used to acquire the stencil residue image in the stencil immersion tank, perform image analysis on the stencil residue image and perform positioning processing on the residue position to obtain the residue positioning data of the stencil to be cleaned.

[0087] The data analysis module is used to analyze the immersion time and cleaning rotation parameters of the screen to be cleaned according to the residue positioning data, and obtain the cleaning control data of the rotating cleaning device of the screen immersion tank.

[0088] The cleaning analysis module is used to obtain the cleaning effect of the screen to be cleaned in adjacent cleaning cycles during the rotation cleaning according to the cleaning control data, and perform residue cleaning difference analysis to obtain the residue cleaning difference data of the screen to be cleaned.

[0089] The parameter adjustment module is used to adjust the lower wheel cleaning rotation speed and the dwelling soaking time of the rotary cleaning device according to the residue cleaning difference data, and obtain the rotary cleaning control data of the screen to be cleaned in the soaking tank.

[0090] Preferably, the data analysis module specifically includes:

[0091] The parameter analysis submodule is used to obtain the distribution state of the stencil residue according to the stencil residue image analysis result, and analyze the immersion time of the stencil to be cleaned according to the stencil residue distribution state.

[0092] The angle analysis submodule is used to analyze the rotation angle required for the rotary cleaning device to rotate the screen to be cleaned into the immersion tank for complete immersion according to the residue positioning data, and obtain the rotation angle data of the rotary cleaning device.

[0093] The operation analysis submodule is used to soak the screen to be cleaned according to the soaking time, and analyze the cleaning rotation frequency and rotation operation power of the screen to be cleaned according to the initial soaking effect to obtain the rotation operation data of the rotary cleaning device.

[0094] The data collection submodule is used to collect the rotation angle data and the rotation operation data with the corresponding cleaning cycle to obtain the cleaning control data of the rotation cleaning device of the screen immersion tank.

[0095] Preferably, the cleaning analysis module specifically includes:

[0096] The comparison and analysis submodule is used to obtain the screen residue image of each rotation cycle of the rotary cleaning device during the rotary cleaning process according to the cleaning control data, and compare the screen residue images of adjacent rotation cycles to obtain the screen cleaning effect.

[0097] The residue analysis submodule is used to compare and analyze the residue cleaning difference of each rotation cycle according to the stencil cleaning effect, and obtain the residue cleaning difference data of the stencil to be cleaned.

[0098] Preferably, the parameter adjustment module specifically includes:

[0099] The effectiveness evaluation submodule is used to evaluate and analyze whether the rotary cleaning frequency of the rotary cleaning device effectively cleans the stencil residue based on the residue cleaning difference data, and obtain the residue cleaning effectiveness evaluation of the stencil to be cleaned.

[0100] The parameter adjustment submodule is used to adjust the cleaning rotation speed of the lower wheel of the rotary cleaning device and the residence time of the residue fixed point in the immersion tank according to the residue cleaning effectiveness evaluation, and obtain the rotary cleaning control data of the screen to be cleaned in the immersion tank.

[0101] Preferably, the data acquisition module specifically includes:

[0102] The image acquisition submodule is used to receive assembly trigger information of the stencil to be cleaned in the stencil immersion tank, and obtain the stencil residue image in the stencil immersion tank when the assembly trigger information is received.

[0103] The residue positioning submodule is used to perform image analysis on the stencil residue image, and to position the stencil residue position in combination with a preset stencil cleaning template to obtain the residue positioning data of the stencil to be cleaned.

[0104] For the specific definition of the automatic cleaning control system for the screen soaking pool, please refer to the definition of the automatic cleaning control method for the screen soaking pool above, which will not be repeated here. Each module in the above-mentioned automatic cleaning control system for the screen soaking pool can be implemented in whole or in part by software, hardware and a combination thereof. The above-mentioned modules can be embedded in or independent of the processor in the computer device in the form of hardware, or can be stored in the memory of the computer device in the form of software, so that the processor can call and execute the operations corresponding to the above modules.

[0105] In one embodiment, a computer device is provided. The computer device may be a server, and its internal structure diagram may be as follows: Figure 8 As shown. The computer device includes a processor, a memory, a network interface and a database connected through a system bus. Among them, the processor of the computer device is used to provide computing and control capabilities. The memory of the computer device includes a non-volatile storage medium and an internal memory. The non-volatile storage medium stores an operating system, a computer program and a database. The internal memory provides an environment for the operation of the operating system and the computer program in the non-volatile storage medium. The database of the computer device is used to store cleaning control data of the stencil immersion tank. The network interface of the computer device is used to communicate with an external terminal through a network connection. When the computer program is executed by the processor, an automatic cleaning control method for a stencil immersion tank is implemented.

[0106] In one embodiment, a computer-readable storage medium is provided, on which a computer program is stored, and when the computer program is executed by a processor, the steps of an automated cleaning control method for a screen immersion tank are implemented.

[0107] Those skilled in the art can understand that all or part of the processes in the above-mentioned embodiment methods can be completed by instructing the relevant hardware through a computer program, and the computer program can be stored in a non-volatile computer-readable storage medium. When the computer program is executed, it can include the processes of the embodiments of the above-mentioned methods. Among them, any reference to memory, storage, database or other media used in the embodiments provided in this application can include non-volatile and / or volatile memory. Non-volatile memory can include read-only memory (ROM), programmable ROM (PROM), electrically programmable ROM (EPROM), electrically erasable programmable ROM (EEPROM) or flash memory. Volatile memory can include random access memory (RAM) or external cache memory. As an illustration and not limitation, RAM is available in many forms, such as static RAM (SRAM), dynamic RAM (DRAM), synchronous DRAM (SDRAM), double data rate SDRAM (DDRSDRAM), enhanced SDRAM (ESDRAM), synchronous link (Synchlink) DRAM (SLDRAM), memory bus (Rambus) direct RAM (RDRAM), direct memory bus dynamic RAM (DRDRAM), and memory bus dynamic RAM (RDRAM).

[0108] Those skilled in the art will clearly understand that for the sake of convenience and brevity of description, only the division of the above-mentioned functional units and modules is used as an example. In actual applications, the above-mentioned functions can be distributed and completed by different functional units and modules as needed, that is, the internal structure of the system can be divided into different functional units or modules to complete all or part of the functions described above.

[0109] The embodiments described above are only used to illustrate the technical solutions of the present application, rather than to limit them. Although the present application has been described in detail with reference to the aforementioned embodiments, a person skilled in the art should understand that the technical solutions described in the aforementioned embodiments may still be modified, or some of the technical features may be replaced by equivalents. Such modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present application, and should all be included in the protection scope of the present application.

Claims

1. An automated cleaning control method for a screen soaking tank, characterized in that: The automatic cleaning control method is used to control a rotary cleaning device of a screen soaking tank, the rotary cleaning device comprising a driving component (200) and a paired rotary ring (300), the driving component (200) and the rotary ring (300) being driven by a hinge, the rotary ring (300) being driven to drive the screen (400) to rotate in the soaking tank (100), and the screen (400) being automatically cleaned by adjusting the soaking time of the screen (400) in the soaking tank (100) and the rotation speed of the driving ring (300), the method comprising: Acquire a stencil residue image in a stencil immersion tank, perform image analysis on the stencil residue image and perform positioning processing on the residue position to obtain residue positioning data of the stencil to be cleaned; Analyze the immersion time and cleaning rotation parameters of the screen to be cleaned according to the residue positioning data to obtain cleaning control data of the rotary cleaning device of the screen immersion tank; In the process of performing rotational cleaning according to the cleaning control data, the cleaning effects of the screen to be cleaned in adjacent cleaning cycles are obtained to perform residue cleaning difference analysis, and the residue cleaning difference data of the screen to be cleaned is obtained; According to the residue cleaning difference data, the lower wheel cleaning rotation speed and the dwelling immersion time of the rotary cleaning device are adjusted to obtain the rotary cleaning control data of the screen to be cleaned in the immersion tank; The step of analyzing the immersion time and the cleaning rotation parameters of the screen to be cleaned according to the residue positioning data to obtain the cleaning control data of the rotary cleaning device of the screen immersion tank specifically includes: Obtaining the distribution state of the stencil residue according to the stencil residue image analysis result, and analyzing the soaking time of the stencil to be cleaned according to the stencil residue distribution state; According to the residue positioning data, the rotation angle required for the rotary cleaning device to rotate the screen to be cleaned into the soaking tank for complete soaking is analyzed to obtain the rotation angle data of the rotary cleaning device; Soaking the screen to be cleaned according to the soaking time, and analyzing the cleaning rotation frequency and the rotation operation power of the screen to be cleaned according to the initial soaking effect to obtain the rotation operation data of the rotary cleaning device; The rotation angle data and the rotation operation data are combined with the corresponding cleaning cycle to obtain the cleaning control data of the rotary cleaning device of the screen immersion tank.

2. The automatic cleaning control method for a screen soaking tank according to claim 1, characterized in that: In the process of performing rotational cleaning according to the cleaning control data, the cleaning effect of the stencil to be cleaned in adjacent cleaning cycles is obtained to perform residue cleaning difference analysis, and the residue cleaning difference data of the stencil to be cleaned is obtained, specifically including: In the process of performing rotary cleaning according to the cleaning control data, a screen plate residue image of each rotation cycle of the rotary cleaning device is obtained, and the screen plate residue images of adjacent rotation cycles are compared to obtain the screen plate cleaning effect; According to the screen cleaning effect, the residue cleaning difference of each rotation cycle is compared and analyzed to obtain the residue cleaning difference data of the screen to be cleaned.

3. The automatic cleaning control method for a screen soaking tank according to claim 1, characterized in that: The step of adjusting the cleaning rotation speed and the dwelling soaking time of the lower wheel of the rotary cleaning device according to the residue cleaning difference data to obtain the rotary cleaning control data of the screen to be cleaned in the soaking tank specifically includes: Based on the residue cleaning difference data, an evaluation is performed on whether the rotary cleaning frequency of the rotary cleaning device can effectively clean the stencil residue, thereby obtaining an evaluation on the effectiveness of residue cleaning of the stencil to be cleaned; According to the residue cleaning effectiveness evaluation, the cleaning rotation speed of the lower wheel of the rotary cleaning device and the residence time of the residue fixed point in the soaking tank are adjusted to obtain the rotary cleaning control data of the screen to be cleaned in the soaking tank.

4. The automatic cleaning control method for a screen soaking tank according to claim 1, characterized in that: The obtaining of the stencil residue image in the stencil immersion tank, performing image analysis on the stencil residue image and positioning processing on the residue position, and obtaining the residue positioning data of the stencil to be cleaned specifically includes: Receiving assembly trigger information of the stencil to be cleaned in the stencil soaking tank, and acquiring a stencil residue image in the stencil soaking tank when the assembly trigger information is received; The image of the screen plate residue is analyzed, and the position of the screen plate residue is located in combination with a preset screen plate cleaning template to obtain the residue location data of the screen plate to be cleaned.

5. An automated cleaning control system for a screen soaking tank, characterized in that: The system is applied to the automatic cleaning control method for the screen soaking pool according to any one of claims 1 to 4 above, and the system comprises: A data acquisition module is used to acquire a stencil residue image in a stencil immersion tank, perform image analysis on the stencil residue image and perform positioning processing on the residue position to obtain residue positioning data of the stencil to be cleaned; A data analysis module, used for analyzing the immersion time and cleaning rotation parameters of the screen to be cleaned according to the residue positioning data, and obtaining cleaning control data of the rotary cleaning device of the screen immersion tank; A cleaning analysis module, used to obtain the cleaning effect of the stencil to be cleaned in adjacent cleaning cycles during the process of rotary cleaning according to the cleaning control data, and perform residue cleaning difference analysis to obtain residue cleaning difference data of the stencil to be cleaned; A parameter adjustment module, used to adjust the cleaning rotation speed and the dwelling soaking time of the lower wheel of the rotary cleaning device according to the residue cleaning difference data, so as to obtain the rotary cleaning control data of the screen to be cleaned in the soaking tank; Wherein, the data analysis module specifically includes: The parameter analysis submodule is used to obtain the distribution state of the stencil residue according to the stencil residue image analysis result, and analyze the immersion time of the stencil to be cleaned according to the stencil residue distribution state; An angle analysis submodule, for analyzing the rotation angle required for the rotary cleaning device to rotate the screen to be cleaned into the soaking tank for complete soaking according to the residue positioning data, and obtaining the rotation angle data of the rotary cleaning device; An operation analysis submodule is used to soak the screen to be cleaned according to the soaking time, and analyze the cleaning rotation frequency and rotation operation power of the screen to be cleaned according to the initial soaking effect, so as to obtain the rotation operation data of the rotary cleaning device; The data collection submodule is used to collect the rotation angle data and the rotation operation data with the corresponding cleaning cycle to obtain the cleaning control data of the rotation cleaning device of the screen immersion tank.

6. A computer device comprising a memory, a processor, and a computer program stored in the memory and executable on the processor, characterized in that: When the processor executes the computer program, the steps of the automated cleaning control method for a screen immersion tank as described in any one of claims 1 to 4 are implemented.

7. A computer-readable storage medium storing a computer program, characterized in that: When the computer program is executed by the processor, the steps of the automated cleaning control method for a screen immersion tank as claimed in any one of claims 1 to 4 are implemented.

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