Measuring device for a suppression system

Abstract

The invention relates to a measuring device for a subtraction system. A measuring device (101) for measuring a characteristic of a subduction gas. The measuring apparatus comprises a mass spectrometer (120), an infrared spectrometer (110), a first fluid connection point for connection to an inlet of the abatement device, a second fluid connection point for connection to an outlet of the abatement device, and a plurality of fluid lines (125). A plurality of fluid lines fluidly connect each of the first and second fluid connection points to both the mass spectrometer and the infrared spectrometer. Each of a mass spectrometer and an infrared spectrometer is used to measure one or more characteristics of a gas present at the inlet and / or outlet of the abatement device.

Description

Technical Field

[0001] The present invention relates to a device for measuring properties of a gas in an abatement system. Background Art

[0002] Abatement systems are used in a variety of industries (e.g., semiconductor manufacturing, scientific research) to treat process gases so that the gases can be released safely. Abatement systems use a variety of techniques, such as combustion, plasma treatment, wet scrubbing, and / or dry-bed absorption, to treat the process gases.

[0003] In abatement systems, a parameter called the destruction removal efficiency (DRE) can be calculated to assess the efficacy of treating the process gas. Summary of the invention

[0004] According to aspects, a measuring device for measuring characteristics of abatement gas is provided. The measuring device includes a mass spectrometer, an infrared spectrometer, a first fluid connection point for connecting to an inlet of the abatement device, a second fluid connection point for connecting to an outlet of the abatement device, and a plurality of fluid pipelines. The plurality of fluid pipelines fluidly connect each of the first and second fluid connection points to both the mass spectrometer and the infrared spectrometer. Each of the mass spectrometer and the infrared spectrometer is used to measure one or more characteristics of the gas present at the inlet and / or outlet of the abatement device.

[0005] The measurement device may further include a nitrogen supply fluidly connected to the mass spectrometer and the infrared spectrometer via a plurality of fluid lines.

[0006] The nitrogen supply may be configured to supply nitrogen to the fluid line to mix with the gas received via the first fluid connection point.

[0007] The measuring device may further comprise a krypton gas supply.The krypton gas supply may be fluidly connectable to the inlet of the abatement device.

[0008] The measuring device may further comprise a standard gas supply fluidly connected to the mass spectrometer and the infrared spectrometer via a plurality of fluid lines.The standard gas supply may be configured to supply standard gas to the fluid lines.

[0009] The measuring device may further include a temperature sensor connected to a point on one of the plurality of fluid pipelines for measuring a temperature of the gas at the point.

[0010] The measuring device may further include a pressure sensor connected to a point on one of the plurality of fluid lines for measuring the gas pressure at the point.

[0011] The measuring device may further include a flow rate sensor connected to a point on one of the plurality of fluid pipelines for measuring a gas flow rate at the point.

[0012] The measuring device may further include a test gas access point fluidly connected to the mass spectrometer and the infrared spectrometer via a plurality of fluid lines. The test gas access point may be separate from the first and second fluid connection points. The test gas access point may be connectable to a test gas supply for measuring one or more characteristics of the test gas using the mass spectrometer and / or the infrared spectrometer.

[0013] The one or more characteristics may include a volumetric gas concentration of the substance.

[0014] The one or more characteristics may include a damage removal efficiency (DRE) value.

[0015] The mass spectrometer may be a quadrupole mass spectrometer.

[0016] The infrared spectrometer may be a Fourier transform infrared spectrometer.

[0017] The measurement device may be an integrated tool fluidly connectable to the abatement equipment.

[0018] In a further aspect, a system is provided, the system comprising an abatement device, and a measurement device of the above aspects fluidly connected to the abatement device.The first fluid connection point may be connected to an inlet of the abatement device and the second fluid connection point may be connected to an outlet of the abatement device.

[0019] In yet another aspect, a method performed by the measurement device of the above aspect is provided. The method includes receiving an inlet gas of the abatement device at a first fluid connection point; receiving an outlet gas of the abatement device at a second fluid connection point; measuring one or more characteristics of the inlet gas using a mass spectrometer and / or an infrared spectrometer; and measuring one or more characteristics of the outlet gas using a mass spectrometer and / or an infrared spectrometer.

[0020] In yet another aspect, a method performed by the measurement device of the above aspect is provided. The method includes connecting a test gas supply to a test gas access point; supplying the test gas from the test gas supply to a mass spectrometer and / or an infrared spectrometer; and measuring one or more characteristics of the test gas using the mass spectrometer and / or the infrared spectrometer. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 is a diagram (not to scale) showing a schematic diagram of a system for measuring properties of an abatement gas;

[0022] Figure 2is a diagram (not to scale) showing a perspective view of a measuring device for measuring properties of abatement gas;

[0023] Figure 3 is an illustration (not to scale) of a flow chart showing a method performed by a measurement device for measuring a property of an abatement gas; and

[0024] Figure 4 is an illustration (not to scale) of a flow chart showing another method performed by a measurement device for measuring a property of a test gas. DETAILED DESCRIPTION

[0025] Figure 1 1 is a diagram (not to scale) showing a schematic diagram of a system 100 for measuring properties of abatement gas. The system 100 includes a measurement device 101 and an abatement device 102. Figure 1 In FIG. 1 , the components of the abatement device 102 are surrounded by dashed lines and the components of the measuring device 101 are the remaining elements not surrounded by dashed lines.

[0026] The measuring device 101 includes a Fourier transform infrared (FTIR) spectrometer 110, a quadrupole mass spectrometer (QMS) 120, a krypton gas supply 130a, a first nitrogen gas supply 130b, a standard gas supply 130c, a second nitrogen gas supply 130d, a plurality of sampling pumps 140, a test gas access point 150 and a dilution module 115. The measuring device 101 further includes a plurality of valves 1, 2, 4, 5, 6, 7, 8, 9, 10, 15, 17, 18, 19, 20, 26, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 46, 47, 48, 49, 50, a plurality of first pressure sensors 11, 13, 14, a first temperature sensor 16, a plurality of flow controllers 24, 25, 27, 44 and a plurality of fluid (e.g., gas) pipelines 125.

[0027] The Fourier transform infrared (FTIR) spectrometer 110 is configured to use FTIR spectroscopy to detect the presence of various chemical species in the gas passing through the FTIR spectrometer 110. The detailed underlying physical / chemical mechanisms behind FTIR spectroscopy are fully understood and will not be described here for the sake of brevity. It will be appreciated that although an FTIR spectrometer is described, in general any other suitable type of infrared spectrometer may be used.

[0028] The quadrupole mass spectrometer (QMS) 120 is configured to detect the presence of various chemical species in the gas passing through the QMS 120 using quadrupole mass spectrometry. The detailed underlying physical / chemical mechanisms behind quadrupole mass spectrometry are also fully understood and will not be described here for the sake of brevity. It will be appreciated that although a QMS is described, in general any other suitable type of mass spectrometer may be used.

[0029] The krypton gas supply 130a is configured to supply krypton gas (Kr) to the system 100. The nitrogen gas supplies 130b, 130d are configured to supply nitrogen gas to the system 100. The standard gas supply 130c is configured to supply standard gas to the system 100.

[0030] The sampling pump 140 is configured to pump gas through the system 100. In this embodiment, there are two sampling pumps 140, one for pumping gas through the FTIR spectrometer 110 and one for pumping gas through the QMS 120.

[0031] The test gas access point 150 is a connection point for connecting the measurement device 101 to a test gas source. The detailed purpose and function of the test gas access point 150 will be described in more detail below.

[0032] The dilution module 115 is a module for mixing and diluting the process gas with nitrogen. The detailed purpose and function of the dilution module 115 will be described in more detail below.

[0033] Each of the plurality of valves 1 , 2 , 4 , 5 , 6 , 7 , 8 , 9 , 10 , 15 , 17 , 18 , 19 , 20 , 26 , 28 , 29 , 30 , 31 , 32 , 33 , 34 , 35 , 36 , 37 , 38 , 39 , 40 , 41 , 42 , 43 , 46 , 47 , 48 , 49 , 50 is configured to open / close to control the flow of gas within the measurement device 101 .

[0034] Each of the plurality of first pressure sensors 11 , 13 , 14 is configured to detect the pressure of the gas at their location. Specifically, one of the first pressure sensors 11 is configured to measure the pressure of the gas at the inlet of the abatement device 170 .

[0035] The first temperature sensor 16 is configured to detect the temperature of the gas at its location. Specifically, the first temperature sensor 16 is configured to measure the temperature of the gas at the inlet of the abatement device 170.

[0036] Each of the plurality of flow controllers 24 , 25 , 27 , 44 is configured to control the flow of gas at their respective locations.

[0037] A plurality of gas lines 125 fluidly connect the other components of the measurement device 101 to each other and to the abatement device 102 .

[0038] The abatement device 102 includes an input point 160 , an abatement apparatus 170 , an output line 180 , a second temperature sensor 15 , and a second pressure sensor 12 .

[0039] The input point 160 is configured to receive process gas from a process gas source (not shown). For example, the process gas source may be a semiconductor manufacturing system that produces hazardous waste process gas. A pump may be present at the input point 160 to pump the process gas from the process gas source into the system 100.

[0040] The abatement device 170 is configured to treat the received process gas and output the treated process gas into an output line 180. The abatement device 170 may, for example, include a combustion abatement device, a plasma treatment abatement device, a wet scrubbing abatement device, and / or a dry bed absorption abatement device. It will be appreciated that, in general, the abatement device 170 may be any suitable type of abatement device.

[0041] The output line 180 is configured to receive gas that has been processed by the abatement device 170 and to transport the processed gas elsewhere, such as for release to an external environment.

[0042] The second temperature sensor 15 is configured to detect the temperature of the gas at its location. Specifically, the second temperature sensor 15 is configured to measure the temperature of the gas at the outlet of the abatement device 170.

[0043] The second pressure sensor 12 is configured to detect the gas pressure at its location. Specifically, the second pressure sensor 12 is configured to measure the pressure of the gas at the outlet of the abatement device 170.

[0044] The measuring device 101 can be disconnected from the abatement device 102 and can be reconnected to another abatement device. Thus, the measuring device 101 can be used with the other abatement device in the same manner as it can be used with the abatement device 102.

[0045] The system 100 further includes a computing device (not shown) configured to receive data from the above-mentioned components of the system 100. For example, the computing device is configured to receive and process data from the FTIR spectrometer 110, the QMS 120, the pressure sensor, and the temperature sensor. The computing device may include a display for displaying data received from other components of the system to a user.

[0046] Figure 2is an illustration (not to scale) showing a perspective view of a measurement device 101 for measuring characteristics of abatement gas according to an embodiment. In this embodiment, the measurement device 101 includes a cabinet 200 (or other type of enclosure), and the remaining components of the measurement device 101 are contained within and / or attached to the cabinet 200. In this embodiment, the measurement device 101 further includes a plurality of wheels 210 coupled to the cabinet 200 and the cabinet 200 is movable on the wheels 210. However, it will be appreciated that this is one non-limiting example option for packaging the measurement device 101 and other alternative configurations may be used.

[0047] As from Figure 2 It can be seen that the measurement device 101 constitutes an integrated tool in which all the functionalities described herein are included. Thus, the measurement device 101 can be easily moved to a desired location and connected to an abatement system to provide both full QMS and FTIR functionalities in a single integrated tool.

[0048] Now refer to Figure 3 and Figure 4 Various methods of operating system 100 are described.

[0049] Figure 3 is a diagram (not to scale) showing a flow chart of a method 300 for measuring a property of an abatement gas performed by the measurement device 101 .

[0050] In step 301 , method 300 begins.

[0051] In step 302 , a gas line leak check is performed. In this step, nitrogen is supplied from the second nitrogen supply 130 d through the gas line 125 and two of the first plurality of pressure sensors 13 , 14 are monitored using a computing device to detect if there is a leak in the gas line 125 .

[0052] In step 303, a background scan and a standard gas verification are performed for the QMS 120. To perform a background scan, nitrogen is supplied from the second nitrogen supply 130d through the first section 125-1 of the gas line 125 and the QMS 120 to remove impurities present in the gas line, and the QMS 120 is monitored using a computing device to detect when the impurities have been removed. Once all impurities have been removed, there will be a null or substantially null signal from the QMS 120. To perform a standard gas verification, a standard gas (e.g., a 1000 ppm certified standard gas for CF4 DRE testing) is supplied from the standard gas supply 130c through the QMS 120, and the QMS 120 is monitored using a computing device to detect a QMS signal from the standard gas indicating the concentration of the standard gas. The indicated concentration of the standard gas is compared to the known concentration of the standard gas to check whether the QMS 120 is operating normally. If the indicated concentration of the standard gas does not match the known concentration of the standard gas, there is a fault (e.g., an error in the data stored in the system 100).

[0053] In step 304, a background scan and a standard gas verification are performed for the FTIR spectrometer 110. To perform the background scan, nitrogen is supplied from the second nitrogen supply 130d through the second section 125-2 of the gas line 125 and the FTIR spectrometer 110 to remove impurities present in the gas line, and the FTIR spectrometer 110 is monitored using a computing device to detect when the impurities have been removed. Once all impurities have been removed, there will be an empty or substantially empty signal from the FTIR spectrometer 110. To perform the standard gas verification, a standard gas (e.g., a 1000ppm certified standard gas for CF4DRE testing) is supplied from the standard gas supply 130c through the FTIR spectrometer 110, and the FTIR spectrometer 110 is monitored using a computing device to detect an FTIR signal from the standard gas indicating the concentration of the standard gas. The indicated concentration of the standard gas is compared with the known concentration of the standard gas to check whether the FTIR spectrometer 110 is operating normally.

[0054] In step 305, the outlet gas concentration of the output of the abatement device 170 is measured. In this step, the process gas is supplied from the input point 160 to the inlet of the abatement device 170. Once processed by the abatement device, the output gas of the abatement device 170 is supplied to the FTIR spectrometer 110 and / or the QMS 120 via the third section 125-3 of the gas pipeline 125 to measure the gas concentration of one or more gas types in the output gas of the abatement device 170. For example, only the QMS can be used to measure the concentration of hydrogen or chlorine, which the FTIR spectrometer 110 cannot detect. For example, the QMS and / or the FTIR spectrometer can be used to measure the concentration of carbon tetrafluoride. The FTIR spectrometer 110 and / or QMS 120 signals for the outlet gas are provided to the computing device to measure the outlet gas concentration of one or more gas types.

[0055] In step 306, the inlet gas concentration of the input of the abatement device 170 is measured. In this step, the process gas is supplied from the input point 160 to the inlet of the abatement device 170. The input process gas of the abatement device 170 is supplied to the FTIR spectrometer 110 and / or the QMS 120 via the fourth section 125-4 of the gas pipeline 125 to measure the gas concentration of one or more gas types in the input gas of the abatement device 170, wherein the fourth section 125-4 of the gas pipeline 125 branches off from the gas pipeline section supplying the inlet of the abatement device 170. For example, only the QMS can be used to measure the concentration of hydrogen or chlorine, which cannot be detected by the FTIR spectrometer 110. For example, the QMS and / or the FTIR spectrometer can be used to measure the concentration of carbon tetrafluoride. In addition, in this step, nitrogen is supplied to the QMS 120 and / or the FTIR spectrometer 110 from the first nitrogen supply 130b via the dilution module 115. The FTIR spectrometer 110 and / or QMS 120 signals for the inlet gas are provided to a computing device to measure the inlet gas concentration of one or more gas types.

[0056] In step 307, the outlet flow rate of the abatement device 170 is measured. In this step, krypton gas is supplied from the krypton gas supply 130a to the inlet of the abatement device 170, through the abatement device 170, out of the outlet of the abatement device 170, through the third section 125-3 of the gas line 125, and supplied to the QMS 120. The measurement of the outlet flow rate is provided by one of the flow controllers 44. The QMS 120 also provides a signal indicative of the concentration of the krypton gas passing therethrough.

[0057] In step 308, the inlet flow rate of the abatement device 170 is measured. In this step, krypton gas is supplied from the krypton gas supply 130a through the fourth section 125-4 of the gas line 125 and supplied to the QMS 120, wherein the fourth section 125-4 of the gas line 125 branches off from the gas line section supplying the inlet of the abatement device 170. The measurement of the inlet flow rate is provided by one of the flow controllers 44. The QMS 120 also provides a signal indicative of the concentration of the krypton gas passing therethrough.

[0058] In step 309 , method 300 ends.

[0059] The above-described system and method provide a way to collect data for determining the destruction removal efficiency (DRE) of the abatement device 102. Specifically, the value of the DRE of the abatement device 102 for a particular substance can be calculated using the following formula:

[0060] DRE=1-[(Cout×Qout) / (CinxQn)]

[0062] Where Cout is the volumetric gas concentration of the substance at the outlet of the abatement device 170, Qout is the volumetric gas flow rate of the substance at the outlet of the abatement device 170, Ci n is the volumetric gas concentration of the substance in the inlet of the abatement device 170 , and Qin is the volumetric gas flow rate of the substance in the inlet of the abatement device 170 .

[0063] In the above system and method, the substance is passed through the QMS and / or FTIR spectrometer 110, and the C is measured by the QMS 120 and / or the FTIR spectrometer 110. out and C in When krypton is additionally supplied through the abatement device 102, the krypton ratio Q out / Q in With ratio C out / C in Therefore, a method for determining the value of DRE is provided.

[0064] The computing device of system 100 uses the above data collected from system 100 to calculate DRE. Figure 3 Following the steps described, the DRE may be calculated by a computing device using the data collected in the method.

[0065] Figure 4 is an illustration (not to scale) of a flow chart showing a method 400 for measuring a property of a test gas performed by the measurement device 101. It will be appreciated that during this method 400, the abatement device 102 may not be connected to the measurement device 101.

[0066] In step 401 , method 400 begins.

[0067] In step 402 , a test gas source, such as a test gas bag containing a test gas, is fluidly connected to a test gas access point 150 of the measurement device 101 .

[0068] In step 403 , a test gas is supplied from a test gas source to the FTIR spectrometer 110 and / or the QMS 120 .

[0069] In step 404, the FTIR spectrometer(s) 110 and / or QMS 120 signals are read to determine the concentration of one or more gas types in the test gas source. The FTIR spectrometer 110 and / or QMS 120 signals for the test gas source are provided to a computing device to measure the gas concentration of the one or more gas types in the test gas source.

[0070] In step 405 , method 400 ends.

[0071] Thus, systems and methods for measuring properties of an abatement gas are provided.

[0072] Advantageously, the above system provides an integrated tool that includes both a QMS and an FTIR spectrometer that can be used in gas analysis. This increases the flexibility of the measurement device because the two different spectrometers have different capabilities in terms of what substances they can detect. For example, a QMS can detect gases formed by diatomic elements such as O2, while an FTIR spectrometer cannot.

[0073] Advantageously, the above described system provides a way to improve the accuracy of abatement inlet gas concentration detection by introducing nitrogen to dilute the inlet gas to improve measurement accuracy. This is because inlet gas concentrations tend to be very high, which prevents accurate measurement using QMS or FTIR spectrometers.

[0074] Advantageously, the above described system provides a way to measure both the temperature and pressure of the inlet and outlet gases of an abatement device in order to assess their impact on the abatement DRE test results.

[0075] It will be appreciated that various modifications / deviations may be made to the embodiments described above without departing from the scope of the present invention.

[0076] Reference Numbers List

[0077] 100: System

[0078] 101: Measuring device

[0079] 102: Mitigation Device

[0080] 110: Fourier Transform Infrared (FTIR) Spectrometer

[0081] 120: Quadrupole Mass Spectrometer (QMS)

[0082] 130a: Krypton Supply

[0083] 130b: First nitrogen supply

[0084] 130c: Standard gas supply

[0085] 130d: Second nitrogen supply,

[0086] 140: Sampling pump

[0087] 150: Test gas access point

[0088] 115: Dilution module

[0089] 1, 2, 4, 5, 6, 7, 8, 9, 10, 15, 17, 18, 19, 20, 26, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 46, 47, 48, 49, 50: valve

[0090] 11, 13, 14: First pressure sensor

[0091] 16: First temperature sensor

[0092] 24, 25, 27, 44: Flow controller

[0093] 125: Gas pipeline

[0094] 160: Input point

[0095] 170: Mitigation Equipment

[0096] 180: Output pipeline

[0097] 15: Second temperature sensor

[0098] 12: Second pressure sensor.

Claims

1. A measuring device for measuring a property of an abatement gas, the measuring device comprising: Mass spectrometer; Infrared spectrometer; a first fluid connection point for connection to an inlet of an abatement device; a second fluid connection point for connection to an outlet of the abatement device; and Multiple fluid lines, wherein a plurality of fluid lines fluidly connect each of the first and second fluid connection points to both the mass spectrometer and the infrared spectrometer, and Each of the mass spectrometer and the infrared spectrometer is used to measure one or more characteristics of the gas present at the inlet and / or outlet of the abatement device.

2. The measurement device of claim 1 , further comprising a nitrogen supply fluidly connected to the mass spectrometer and the infrared spectrometer via a plurality of fluid lines, wherein the nitrogen supply is configured to supply nitrogen to the fluid lines to mix with the gas received via the first fluid connection point.

3. A measurement arrangement according to any preceding claim, further comprising a krypton gas supply, wherein the krypton gas supply is fluidly connectable to the inlet of the abatement device.

4. The measuring device according to any preceding claim, further comprising a standard gas supply fluidly connected to the mass spectrometer and the infrared spectrometer via a plurality of fluid lines, wherein the standard gas supply is configured to supply standard gas to the fluid lines.

5. A measuring device according to any preceding claim, further comprising a temperature sensor connected to a point on one of the plurality of fluid lines for measuring the temperature of the gas at that point.

6. A measuring device according to any preceding claim, further comprising a pressure sensor connected to a point on one of the plurality of fluid lines for measuring the pressure of the gas at that point.

7. A measuring device according to any preceding claim, further comprising a flow sensor connected to a point on one of the plurality of fluid lines for measuring the flow of the gas at that point.

8. The measurement device according to any preceding claim, further comprising a test gas access point, fluidly connected to the mass spectrometer and the infrared spectrometer via a plurality of fluid lines, wherein the test gas access point is separate from the first and second fluid connection points, and wherein the test gas access point is connectable to a test gas supply for measuring one or more characteristics of the test gas using the mass spectrometer and / or the infrared spectrometer.

9. A measuring device according to any preceding claim, wherein: The one or more characteristics include a volumetric gas concentration of the substance.

10. A measuring device according to any preceding claim, wherein: The one or more characteristics include a damage removal efficiency (DRE) value.

11. A measuring device according to any preceding claim, wherein The mass spectrometer is a quadrupole mass spectrometer.

12. A measuring device according to any preceding claim, wherein: Infrared spectrometer is a Fourier transform infrared spectrometer.

13. A measuring device according to any preceding claim, wherein: The measurement device is an integrated tool that can be fluidly connected to the abatement equipment.

14. A system comprising: abatement equipment; and The measuring device according to any preceding claim, fluidly connected to an abatement device, Wherein the first fluid connection point is connected to an inlet of the abatement device and the second fluid connection point is connected to an outlet of the abatement device.

15. A method performed by the measuring device according to any one of claims 1 to 13, the method comprising: receiving an inlet gas from an abatement device at a first fluid connection point; receiving outlet gas from the abatement device at a second fluid connection point; measuring one or more characteristics of the inlet gas using a mass spectrometer and / or an infrared spectrometer; and One or more characteristics of the outlet gas are measured using a mass spectrometer and / or an infrared spectrometer.

16. A method performed by the measuring device of claim 8 or any one of claims 9 to 13 when dependent on claim 8, the method comprising: Connect the test gas supply to the test gas access point; supplying a test gas from a test gas supply to a mass spectrometer and / or an infrared spectrometer; and One or more characteristics of the test gas are measured using a mass spectrometer and / or an infrared spectrometer.

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