Color filter structure and forming method thereof

Abstract

The invention discloses a color filter structure and a forming method thereof, and relates to the technical field of display, the color filter structure comprises a substrate, the substrate comprises a display area and a frame area, the display area comprises a light-transmitting area and a light-shielding area, and the substrate is provided with a first side and a second side which are opposite to each other; the antireflection layer is located on the first side and covers the substrate; the shading layer is located on the first side, the projection, facing the substrate, of the shading layer covers the frame area and the shading area, the antireflection layer is located between the substrate and the shading layer, and the refractive index of the antireflection layer is located between the refractive index of the substrate and the refractive index of the shading layer; the light resistance structure is located on the first side, the projection, facing the substrate, of the light resistance structure covers the light-transmitting area, and the antireflection layer is further located between the substrate and the light resistance structure; and the protective layer is positioned on the first side and covers the shading layer and the photoresist structure. The antireflection layer is used as a refraction transition layer between the substrate and the shading layer, so that the absorption of light rays incident from the back surface is increased, the chromatic aberration caused by large reflectivity difference between the display area and the frame area is reduced, and the integrated visual effect of the screen is improved.

Description

Technical Field

[0001] The present invention relates to the field of display technology, and in particular to a color filter structure and a method for forming the same. Background Art

[0002] With the advancement and development of science and technology, liquid crystal displays have been widely used. Among them, thin film transistor liquid crystal displays (TFT-LCD) have gradually occupied the display field due to their low power consumption, excellent picture quality and high production yield.

[0003] The TFT-LCD is composed of two pieces of glass, with a color filter on the top and a TFT (Thin Film Transistor) on the bottom, with a layer of liquid crystal in the middle, and a complete display module with components such as polarizer, backlight and drive circuit. Among them, the color filter (CF) is a key component of the TFT-LCD, which is used to make the LCD produce color images. It is mainly composed of a transparent glass substrate, a black matrix layer (BM) and a color photoresist layer.

[0004] However, the performance of existing color filter structures needs to be further improved. Summary of the invention

[0005] The problem solved by the present invention is to provide a color filter structure and a method for forming the same, so as to reduce the color difference between the display area and the frame area of ​​the display screen when the display screen is in the off state, and improve the integrated visual effect of the screen.

[0006] To solve the above problems, the technical solution of the present invention provides a color filter structure, including: a substrate, the substrate including a display area and a frame area, the frame area surrounds the display area, the display area includes a light-transmitting area and a light-shielding area, and the substrate has a first side and a second side opposite to each other; a reflection-reducing layer, the reflection-reducing layer is located on the first side, and the reflection-reducing layer covers the substrate; a light-shielding layer, the light-shielding layer is located on the first side, and the projection of the light-shielding layer toward the substrate covers the frame area and the light-shielding area, the reflection-reducing layer is located between the substrate and the light-shielding layer, and the refractive index of the reflection-reducing layer is between the refractive index of the substrate and the refractive index of the light-shielding layer; a light-blocking structure, the light-blocking structure is located on the first side, and the projection of the light-blocking structure toward the substrate covers the light-transmitting area, and the reflection-reducing layer is also located between the substrate and the light-blocking structure; a protective layer, the protective layer is located on the first side, and the protective layer covers the light-shielding layer and the light-blocking structure.

[0007] Optionally, the anti-reflection layer is a transparent insulating material; wherein the transparent insulating material includes: one or more of polymethyl methacrylate, polyimide and siloxane.

[0008] Optionally, the transmittance of the transparent insulating material to full-band visible light is greater than or equal to 97%.

[0009] Optionally, the volume resistivity of the transparent insulating material is greater than 1E14 ohms.

[0010] Optionally, the anti-reflection layer is a gray photoresist material.

[0011] Optionally, the transmittance of the gray photoresist material to full-band visible light is greater than or equal to 70%.

[0012] Optionally, the volume resistivity of the gray photoresist material is greater than 1E14 ohms.

[0013] Optionally, the anti-reflection layer is a film layer that completely covers the entire surface of the substrate.

[0014] Optionally, the anti-reflection layer is a patterned film layer partially covering the substrate.

[0015] Optionally, the pattern of the anti-reflection layer includes: a dot pattern or a grid pattern.

[0016] Optionally, the photoresist structure includes: a red photoresist layer, a green photoresist layer and a blue photoresist layer.

[0017] Optionally, the material of the protective layer includes: polymethyl methacrylate or polyimide.

[0018] Optionally, it further includes a plurality of support columns, wherein the support columns are located on the first side, the support columns are located on the protective layer, and the support columns correspond to the light-shielding layer.

[0019] Correspondingly, the technical solution of the present invention also provides a method for forming a color filter structure, comprising: providing a substrate, the substrate comprising a display area and a frame area, the frame area surrounds the display area, the display area comprises a light-transmitting area and a light-shielding area, the substrate having a first side and a second side opposite to each other; forming a reflection-reducing layer on the first side, the reflection-reducing layer covers the substrate; forming a light-shielding layer on the first side, the projection of the light-shielding layer toward the substrate covers the frame area and the light-shielding area, the reflection-reducing layer is located between the substrate and the light-shielding layer, and the refractive index of the reflection-reducing layer is between the refractive index of the substrate and the refractive index of the light-shielding layer; forming a light-blocking structure on the first side, the projection of the light-blocking structure toward the substrate covers the light-transmitting area, and the reflection-reducing layer is also located between the substrate and the light-blocking structure; forming a protective layer on the first side, the protective layer covers the light-shielding layer and the light-blocking structure.

[0020] Optionally, the anti-reflection layer is a film layer that completely covers the entire surface of the substrate.

[0021] Optionally, the method for forming the anti-reflection layer includes: forming an initial anti-reflection layer on the substrate, and performing thermal curing treatment on the initial anti-reflection layer to form the anti-reflection layer.

[0022] Optionally, the anti-reflection layer is a patterned film layer partially covering the substrate.

[0023] Optionally, the pattern of the anti-reflection layer includes: a dot pattern or a grid pattern.

[0024] Optionally, the method for forming the anti-reflection layer includes: forming an initial anti-reflection layer on the substrate; performing patterned exposure and development treatment on the initial anti-reflection layer; after the patterned exposure and development treatment, performing UV light curing treatment on the initial anti-reflection layer to form the anti-reflection layer.

[0025] Optionally, the method for forming the anti-reflection layer includes: forming the anti-reflection layer on the surface of the substrate using an inkjet printing process.

[0026] Optionally, the photoresist structure includes: a red photoresist layer, a green photoresist layer and a blue photoresist layer.

[0027] Optionally, after forming the protective layer, the method further includes: forming a plurality of support columns on the first side, wherein the support columns are located on the protective layer and correspond to the light shielding layer.

[0028] Compared with the prior art, the technical solution of the present invention has the following advantages:

[0029] In the color filter structure of the technical solution of the present invention, the anti-reflection layer is added on the first side, the anti-reflection layer is located between the substrate and the light shielding layer, and the refractive index of the anti-reflection layer is between the refractive index of the substrate and the refractive index of the light shielding layer. The anti-reflection layer is used as a refractive transition layer between the substrate and the light shielding layer to increase the absorption of light incident from the back, thereby reducing the color difference caused by the large difference in reflectivity between the display area and the frame area, and improving the integrated visual effect of the screen.

[0030] Furthermore, the anti-reflection layer is made of gray color resist material, and the NTSC color gamut of the gray photoresist material is less than 1%. The anti-reflection layer is made of gray color resist material, which can have better adhesion to the substrate, and the gray color resist material has a lower reflectivity, so the thickness of the anti-reflection layer can be made thinner.

[0031] In the method for forming a color filter structure of the technical solution of the present invention, the anti-reflection layer is formed on the first side, the anti-reflection layer is located between the substrate and the light shielding layer, and the refractive index of the anti-reflection layer is between the refractive index of the substrate and the refractive index of the light shielding layer. The anti-reflection layer is used as a refractive transition layer between the substrate and the light shielding layer to increase the absorption of light incident from the back, thereby reducing the color difference caused by the large difference in reflectivity between the display area and the frame area, and improving the integrated visual effect of the screen. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] Figures 1 to 6 is a structural schematic diagram of each step of a method for forming a color filter structure according to an embodiment of the present invention;

[0033] Figure 7 is a top view of a reflection reduction layer in a color filter structure according to an embodiment of the present invention;

[0034] Figure 8 is a top view of a reflection reduction layer in a color filter structure according to another embodiment of the present invention;

[0035] Fig. 9 FIG. 4 is a top view of a reflection reduction layer in a color filter structure according to another embodiment of the present invention. DETAILED DESCRIPTION

[0036] As described in the background art, the performance of the existing color filter structure needs to be improved, which will be described in detail below.

[0037] The ultra-narrow-border "full-screen" display effect of current smartphones provides users with an increasingly stronger experience, prompting smart terminals such as car displays, smart wearables, and mid-to-high-end touch laptops to gradually require the display screens to be beautiful in detail and have a sense of technology. That is, when the screen is off, the color difference between the display area and the border area must be difficult to distinguish with the naked eye, so that the display screen blends into one black.

[0038] However, the applicant has found that when the current display screen is in the off state, the color difference between the display area and the frame still has a lot of room for improvement.

[0039] The applicant has found that the above-mentioned problem occurs because when the display screen is in the off state, a large portion of the optical light incident from the back of the display screen is still reflected back, which causes a large color difference between the display area and the frame area of ​​the display screen when the display screen is in the off state.

[0040] The applicant has further discovered that, under ideal conditions, a film layer is added between two media. If the refractive index of the new film layer is between the refractive indexes of the two media, the new film layer can increase the absorption of light as a refractive transition layer, thereby reducing the reflectivity.

[0041] In order to make the above-mentioned purposes, features and advantages of the present invention more obvious and easy to understand, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0042] In the description of the present invention, it should be understood that the terms "upper", "lower", "top surface", "bottom surface" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the positions or elements referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as limitations of the present invention. In addition, the terms "first" and "second" are used for descriptive purposes only and cannot be understood as indicating or implying relative importance.

[0043] Figures 1 to 6 is a structural schematic diagram of each step of a method for forming a color filter structure according to an embodiment of the present invention; Figure 7 is a top view of a reflection reduction layer in a color filter structure according to an embodiment of the present invention; Figure 8 is a top view of a reflection reduction layer in a color filter structure according to another embodiment of the present invention; Fig. 9 FIG. 4 is a top view of a reflection reduction layer in a color filter structure according to another embodiment of the present invention.

[0044] Please refer to Figure 1 , providing a substrate 100, the substrate 100 includes a display area I and a frame area II, the frame area II surrounds the display area I, the display area I includes a light-transmitting area A and a light-shielding area B, and the substrate 100 has a first side 100a and a second side 100b opposite to each other.

[0045] It should be noted that, in this embodiment, the first side 100a is the front side of the substrate 100, the second side 100b is the back side of the substrate 100, the display area I includes a plurality of pixel areas, each pixel area includes a plurality of light-transmitting areas A, and the light-shielding area B is located between adjacent light-transmitting areas A. In the subsequent process, the light-transmitting areas A need to be coated with a photoresist layer on their surface, and the light-resistance layer blocks the color light that does not need to be transmitted, and the light-transmitting areas A need to be coated with a light-shielding layer on their surface in the subsequent process, and the light-shielding layer prevents light crosstalk between the photoresist layers formed on the adjacent light-transmitting areas A. Since the frame area II is not used for display, it also needs to be coated with a light-shielding layer on its surface in the subsequent production.

[0046] In this embodiment, the substrate 100 needs to be a light-transmitting substrate 100 , and specifically a glass substrate 100 may be used.

[0047] Please refer to Figure 2 A reflection reduction layer 101 is formed on the first side 100 a , and the reflection reduction layer 101 covers the substrate 100 .

[0048] It should be noted that, in this embodiment, the anti-reflection layer 101 is used to reduce the reflectivity of the back of the display screen, and its own material properties need to have transparency and insulation. The transparency is used to prevent the front display of the display screen from being affected, and the insulation is used to prevent crosstalk in the circuit.

[0049] In one embodiment, the anti-reflection layer 101 is a transparent insulating material, which includes one or more of polymethyl methacrylate, polyimide and siloxane. The transmittance of the transparent insulating material to visible light in the full band (wavelength range is 380nm~780nm) is greater than or equal to 97%, and the volume resistivity of the transparent insulating material is greater than 1E14 ohms.

[0050] In one embodiment, the anti-reflection layer 101 may also be a gray color resist material, the gray color resist material has a transmittance of greater than or equal to 70% for full-wave light (wavelength range of 380nm to 780nm) visible light, and the volume resistivity of the gray photoresist material is greater than 1E14 ohms. The anti-reflection layer 101 using the gray color resist material can have better adhesion to the substrate 100, and the gray color resist material has a lower reflectivity, so the thickness of the anti-reflection layer 101 can be made thinner.

[0051] Please refer to Figure 7 In this embodiment, the anti-reflection layer 101 is a film layer that completely covers the entire surface of the substrate 100. The corresponding method for forming the anti-reflection layer 101 includes: forming an initial anti-reflection layer (not shown) on the substrate 100, and performing thermal curing treatment on the initial anti-reflection layer to form the anti-reflection layer 101.

[0052] Please refer to Figure 8 and Fig. 9 In other embodiments, the anti-reflection layer 101 is a patterned film layer partially covering the substrate 100, and the pattern of the anti-reflection layer 101 includes: a dot pattern (such as Figure 8 as shown) or a grid pattern (as Fig. 9 ). The corresponding method for forming the anti-reflection layer 101 includes: forming an initial anti-reflection layer (not shown) on the substrate 100; performing patterned exposure and development processing on the initial anti-reflection layer; after the patterned exposure and development processing, performing UV light curing processing on the initial anti-reflection layer to form the anti-reflection layer 101. Alternatively, the method for forming the anti-reflection layer 101 may also include: forming the anti-reflection layer 101 on the surface of the substrate 100 by inkjet printing process.

[0053] Please refer to Figure 3 After the reflection reducing layer 101 is formed, a shading layer 102 is formed on the first side 100a, and the projection of the shading layer 102 toward the substrate 100 covers the frame area II and the shading area B. The reflection reducing layer 101 is located between the substrate 100 and the shading layer 102, and the refractive index of the reflection reducing layer 101 is between the refractive index of the substrate 100 and the refractive index of the shading layer 102.

[0054] The reflection reduction layer 101 is formed on the first side 100a, and the reflection reduction layer 101 is located between the substrate 100 and the light shielding layer 102, and the refractive index of the reflection reduction layer 101 is between the refractive index of the substrate 100 and the refractive index of the light shielding layer 102. The reflection reduction layer 101 is used as a refractive transition layer between the substrate 100 and the light shielding layer 102, so as to increase the absorption of light incident from the back, thereby reducing the color difference caused by the large difference in reflectivity between the display area I and the frame area II, and improving the integrated visual effect of the screen.

[0055] In this embodiment, the material of the light shielding layer 102 is a black organic material, and the black organic material can be a black photoresist. The corresponding method for forming the light shielding layer 102 includes: forming a light shielding material layer (not shown) on the surface of the substrate 100; exposing and developing the light shielding material layer to form the light shielding layer 102 on the surface of the light shielding area B.

[0056] In other embodiments, the material of the light shielding layer 102 may also be metal. The corresponding method for forming the light shielding layer 102 includes: forming a light shielding material layer on the surface of the substrate 100; forming a patterned mask layer on the surface of the light shielding material layer; etching the light shielding material layer using the patterned mask layer as a mask to form the light shielding layer 102 on the surface of the light shielding area B.

[0057] Please refer to Figure 4 After the light shielding layer 102 is formed, the projection of the light blocking structure 103 toward the substrate 100 covers the light transmission area A, and the anti-reflection layer 101 is also located between the substrate 100 and the light blocking structure 103 .

[0058] It should be noted that, in this embodiment, the light blocking structure 103 allows light to become monochromatic light after passing through the light blocking structure 103 to meet the needs of the device. The light blocking structure 103 includes a plurality of photoresist layers, and each of the light-transmitting areas A has one of the photoresist layers; the plurality of photoresist layers include a red photoresist layer 1031, a green photoresist layer 1032, and a blue photoresist layer 1033. Each pixel area has at least one of the red photoresist layers 1031, at least one of the green photoresist layers 1032, and at least one of the blue photoresist layers 1033.

[0059] In this embodiment, the material of the photoresist layer includes photoresist that transmits monochromatic light. The material of the red photoresist layer 1031 includes photoresist that transmits red light, the material of the green photoresist layer 1032 includes photoresist that transmits green light, and the material of the blue photoresist layer 1033 includes photoresist that transmits blue light.

[0060] In this embodiment, the light blocking structure 103 is also located on a portion of the light shielding layer 102. Specifically, the red light blocking layer 1031 is also located on a portion of the light shielding layer 102, the green light blocking layer 1032 is also located on a portion of the light shielding layer 102, and the blue light blocking layer 1033 is also located on a portion of the light shielding layer 102. By also locating the light blocking structure 103 on a portion of the light shielding layer 102, a gap is prevented from appearing between the light shielding layer 102 and the light blocking layer, thereby preventing the problem of light leakage.

[0061] In this embodiment, the method for forming the red photoresist layer 1031 includes: forming a red photoresist material layer (not shown) on the surface of the substrate 100 and the surface of the light-shielding layer 102; exposing and developing the red photoresist material layer to form a red photoresist layer 1031 on one of the light-transmitting areas A and a portion of the light-shielding layer 102.

[0062] In this embodiment, the method for forming the green photoresist layer 1032 includes: forming a green photoresist material layer (not shown) on the surface of the substrate 100 and the surface of the light-shielding layer 102; exposing and developing the green photoresist material layer to form the green photoresist layer 1032 on one of the light-transmitting areas A and a portion of the light-shielding layer 102.

[0063] In this embodiment, the method for forming the blue photoresist layer 1033 includes: forming a blue photoresist material layer (not shown) on the surface of the substrate 100 and the surface of the light-shielding layer 102; exposing and developing the blue photoresist material layer to form the blue photoresist layer 1033 on one of the light-transmitting areas A and a portion of the light-shielding layer 102.

[0064] It should be noted that there is no distinction in the order of manufacturing the red photoresist layer 1031 , the green photoresist layer 1032 , and the blue photoresist layer 1033 .

[0065] Please refer to Figure 5 After the light blocking structure 103 is formed, a protective layer 104 is formed on the first side 100 a , and the protective layer 104 covers the light shielding layer 102 and the light blocking structure 103 .

[0066] In this embodiment, the protective layer 104 is used to cover and protect the light-shielding layer 102 and the light-blocking structure 103. The material of the protective layer 104 needs to be a transparent material to ensure that light can penetrate and illuminate the light-blocking structure 103. The material of the protective layer 104 can specifically be polymethyl methacrylate or polyimide.

[0067] Please refer to Figure 6 After the protective layer 104 is formed, a plurality of support columns 105 are formed on the first side 100 a . The support columns 105 are located on the protective layer 104 , and the support columns 105 correspond to the light shielding layer 102 .

[0068] It should be noted that, in this embodiment, the support column 105 is used to support the color filter structure and the active matrix substrate after the color filter structure is used to form a liquid crystal display, so as to leave enough space for the liquid crystal layer between the color filter structure and the active matrix substrate. The purpose of the support column 105 corresponding to the light shielding layer 102 is to prevent the light from being located on the light blocking structure 103, thereby affecting the transmission of light in the light-transmitting area A.

[0069] In this embodiment, the material of the support column 105 includes an organic material, and specifically, photoresist can be used. The process of forming the support column 105 adopts an exposure and development process.

[0070] Correspondingly, a color filter structure is also provided in the embodiment of the present invention, please continue to refer to Figure 6 , comprising: a substrate 100, wherein the substrate 100 comprises a display area I and a frame area II, wherein the frame area II surrounds the display area I, wherein the display area I comprises a light-transmitting area A and a light-shielding area B, and wherein the substrate 100 has a first side 100a and a second side 100b opposite to each other; a reflection-reducing layer 101, wherein the reflection-reducing layer 101 is located on the first side 100a and covers the substrate 100; and a light-shielding layer 102, wherein the light-shielding layer 102 is located on the first side 100a and a projection of the light-shielding layer 102 toward the substrate 100 covers the frame area II and the light-shielding area B, and wherein the reflection-reducing layer 101 is located on the first side 100a and covers the light-shielding layer 102. 1 is located between the substrate 100 and the light-shielding layer 102, and the refractive index of the reflection-reducing layer 101 is between the refractive index of the substrate 100 and the refractive index of the light-shielding layer 102; a light-blocking structure 103, the light-blocking structure 103 is located on the first side 100a, and the projection of the light-blocking structure 103 toward the substrate 100 covers the light-transmitting area A, and the reflection-reducing layer 101 is also located between the substrate 100 and the light-blocking structure 103; a protective layer 104, the protective layer 104 is located on the first side 100a, and the protective layer 104 covers the light-shielding layer 102 and the light-blocking structure 103.

[0071] The anti-reflection layer 101 is additionally provided on the first side 100a, and the anti-reflection layer 101 is located between the substrate 100 and the light shielding layer 102, and the refractive index of the anti-reflection layer 101 is between the refractive index of the substrate 100 and the refractive index of the light shielding layer 102. The anti-reflection layer 101 is used as a refractive transition layer between the substrate 100 and the light shielding layer 102, so as to increase the absorption of light incident from the back, thereby reducing the color difference caused by the large difference in reflectivity between the display area I and the frame area II, and improving the integrated visual effect of the screen.

[0072] In one embodiment, the anti-reflection layer 101 is a transparent insulating material, which includes one or more of polymethyl methacrylate, polyimide and siloxane. The transmittance of the transparent insulating material to visible light in the full band (wavelength range is 380nm~780nm) is greater than or equal to 97%, and the volume resistivity of the transparent insulating material is greater than 1E14 ohms.

[0073] In one embodiment, the anti-reflection layer 101 may also be a gray color resist material, the gray color resist material has a transmittance of greater than or equal to 70% for full-wave light (wavelength range of 380nm to 780nm) visible light, and the volume resistivity of the gray photoresist material is greater than 1E14 ohms. The anti-reflection layer 101 using the gray color resist material can have better adhesion to the substrate 100, and the gray color resist material has a lower reflectivity, so the thickness of the anti-reflection layer 101 can be made thinner.

[0074] Please continue to refer to Figure 7 In this embodiment, the anti-reflection layer 101 is a film layer that completely covers the entire surface of the substrate 100 .

[0075] Please continue to refer to Figure 8 and Fig. 9 In other embodiments, the anti-reflection layer 101 is a patterned film layer partially covering the substrate 100, and the pattern of the anti-reflection layer 101 includes: a dot pattern (such as Figure 8 as shown) or a grid pattern (as Fig. 9 shown).

[0076] In this embodiment, the photoresist structure 103 includes a red photoresist layer 1031 , a green photoresist layer 1032 and a blue photoresist layer 1033 .

[0077] In this embodiment, the material of the protection layer 104 includes polymethyl methacrylate or polyimide.

[0078] In this embodiment, a plurality of support columns 105 are further included. The support columns 105 are located on the first side 100 a , and the support columns 105 are located on the protection layer 104 , and the support columns 105 correspond to the light shielding layer 102 .

[0079] It should be understood that the examples and embodiments herein are merely illustrative and that various modifications and corrections may be made by those skilled in the art without departing from the spirit and scope of the present invention as defined in this application and the appended claims.

Claims

1. A color filter structure, characterized in that: include: A substrate, the substrate comprising a display area and a frame area, the frame area surrounds the display area, the display area comprises a light-transmitting area and a light-shielding area, and the substrate has a first side and a second side opposite to each other; a reflection-reducing layer, the reflection-reducing layer being located on the first side and covering the substrate; a light-shielding layer, the light-shielding layer being located on the first side and a projection of the light-shielding layer toward the substrate covering the frame area and the light-shielding area, the reflection-reducing layer being located between the substrate and the light-shielding layer, and the refractive index of the reflection-reducing layer being between the refractive index of the substrate and the refractive index of the light-shielding layer; A light blocking structure, wherein the light blocking structure is located at the first side, and a projection of the light blocking structure toward the substrate covers the light-transmitting area, and the anti-reflection layer is also located between the substrate and the light blocking structure; A protective layer is located on the first side and covers the light shielding layer and the light blocking structure.

2. The color filter structure according to claim 1, wherein: The anti-reflection layer is a transparent insulating material; wherein the transparent insulating material includes: one or more of polymethyl methacrylate, polyimide and siloxane.

3. The color filter structure according to claim 2, wherein: The transmittance of the transparent insulating material to full-band visible light is greater than or equal to 97%.

4. The color filter structure according to claim 2, wherein: The volume resistivity of the transparent insulating material is greater than 1E14 ohms.

5. The color filter structure according to claim 1, wherein: The anti-reflection layer is a gray photoresist material.

6. The color filter structure according to claim 5, characterized in that: The transmittance of the gray photoresist material to full-band visible light is greater than or equal to 70%.

7. The color filter structure according to claim 5, characterized in that: The volume resistivity of the gray photoresist material is greater than 1E14 ohms.

8. The color filter structure according to claim 1, wherein: The anti-reflection layer is a film layer that completely covers the entire surface of the substrate.

9. The color filter structure according to claim 1, wherein: The anti-reflection layer is a pattern film layer partially covering the substrate.

10. The color filter structure according to claim 9, characterized in that: The pattern of the anti-reflection layer includes: a dot pattern or a grid pattern.

11. The color filter structure according to claim 1, wherein: The photoresist structure includes: a red photoresist layer, a green photoresist layer and a blue photoresist layer.

12. The color filter structure according to claim 1, wherein: The material of the protective layer includes: polymethyl methacrylate or polyimide.

13. The color filter structure according to claim 1, wherein: It also includes a plurality of support columns, wherein the support columns are located on the first side, the support columns are located on the protective layer, and the support columns correspond to the light shielding layer.

14. A method for forming a color filter structure, characterized in that: include: Providing a substrate, the substrate comprising a display area and a frame area, the frame area surrounding the display area, the display area comprising a light-transmitting area and a light-shielding area, the substrate having a first side and a second side opposite to each other; forming a reflection reduction layer on the first side, wherein the reflection reduction layer covers the substrate; A light shielding layer is formed on the first side, wherein a projection of the light shielding layer toward the substrate covers the frame area and the light shielding area, the reflection reducing layer is located between the substrate and the light shielding layer, and the refractive index of the reflection reducing layer is between the refractive index of the substrate and the refractive index of the light shielding layer; forming a light blocking structure on the first side, wherein a projection of the light blocking structure toward the substrate covers the light-transmitting area, and the anti-reflection layer is also located between the substrate and the light blocking structure; A protection layer is formed on the first side, wherein the protection layer covers the light shielding layer and the light blocking structure.

15. The method for forming a color filter structure according to claim 14, wherein: The anti-reflection layer is a film layer that completely covers the entire surface of the substrate.

16. The method for forming a color filter structure according to claim 15, wherein: The method for forming the anti-reflection layer comprises: forming an initial anti-reflection layer on the substrate, and performing a thermal curing treatment on the initial anti-reflection layer to form the anti-reflection layer.

17. The method for forming a color filter structure according to claim 14, wherein: The anti-reflection layer is a pattern film layer partially covering the substrate.

18. The method for forming a color filter structure according to claim 17, wherein: The pattern of the anti-reflection layer includes: a dot pattern or a grid pattern.

19. The method for forming a color filter structure according to claim 17, wherein: The method for forming the anti-reflection layer comprises: forming an initial anti-reflection layer on the substrate; performing patterned exposure and development treatment on the initial anti-reflection layer; after the patterned exposure and development treatment, performing UV light curing treatment on the initial anti-reflection layer to form the anti-reflection layer.

20. The method for forming a color filter structure according to claim 17, wherein: The method for forming the anti-reflection layer comprises: forming the anti-reflection layer on the surface of the substrate by using an inkjet printing process.

21. The method for forming a color filter structure according to claim 14, wherein: The photoresist structure includes: a red photoresist layer, a green photoresist layer and a blue photoresist layer.

22. The method for forming a color filter structure according to claim 14, wherein: After forming the protective layer, the method further includes: forming a plurality of support columns on the first side, wherein the support columns are located on the protective layer and correspond to the light shielding layer.

Images