A high-flow-rate alkali metal atomic vapor production device
By using a quartz glass tube array and a micro-pore structure, combined with pressure regulating valve control, the problem of unstable alkali metal vapor flow rate was solved, enabling the production of large-flow and high-efficiency alkali metal atomic vapor.
Patent Information
- Application Number
- CN202311192555.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-09-15
- Publication Date
- 2026-01-30
- Estimated Expiration
- 2043-09-15
AI Technical Summary
In existing alkali metal vapor generation technologies, the alkali metal vapor flow rate is unstable and difficult to control precisely. Alkali metals are prone to splashing under the action of carrier gas, resulting in changes in their distribution.
A quartz glass tube array structure is adopted, and the outflow of liquid alkali metal is controlled by micro-holes and pressure regulating valves. The alkali metal is evaporated by blowing high-purity carrier gas on the outer surface of the quartz glass tube, forming a stable alkali metal atom vapor.
It achieves stable output of high flow rate and high concentration of alkali metal atomic vapor, improves vapor generation efficiency, and avoids alkali metal splashing.
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Figure CN119651320B_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to the field of gas laser technology, in particular, especially relates to a large flow alkali metal atom vapor production device. BACKGROUND
[0002] Alkali metal vapor laser has the advantages of gas and solid laser, and is a research hotspot in the field of high-power laser technology in recent years. The laser gain medium of alkali metal vapor laser is alkali metal vapor. How to efficiently and stably produce alkali metal vapor is one of the key technologies to be solved. Generally, the method for producing alkali metal vapor is to use a certain flow of carrier gas, such as helium or methane, to blow the surface of liquid alkali metal heated to a certain temperature, mix with the vapor generated by evaporation of alkali metal, and then take out the evaporation device together to achieve the purpose of producing alkali metal vapor. The biggest problem of this technology is that in order to obtain sufficient carrier gas flow and alkali metal vapor flow, the amount of alkali metal and the flow of carrier gas need to be increased. Alkali metal is very easy to splash under the action of carrier gas, resulting in frequent changes in the distribution state of alkali metal in the alkali metal vapor generator, unstable flow of generated alkali metal vapor, and inability to accurately control. SUMMARY
[0003] According to the technical problem of unstable flow of the existing vapor production technology, a large flow alkali metal atom vapor production device is provided.
[0004] The technical means adopted by the present application is as follows:
[0005] A large flow alkali metal atom vapor production device, comprising a heating furnace and a plurality of quartz glass tubes;
[0006] The heating furnace is internally provided with a pressure loading chamber, and the pressure loading chamber is provided with a pressure regulating valve;
[0007] The quartz glass tube is located inside the heating furnace, and the open end faces upward and is welded and fixed in communication with the pressure loading chamber. The quartz glass tube contains alkali metal inside, and the heating furnace is used to melt the alkali metal into liquid state. A plurality of micro holes communicating with the inside of the quartz glass tube are arrayed on the wall of the quartz glass tube. When the pressure inside and outside the quartz glass tube is consistent, the liquid alkali metal cannot flow out through the micro holes;
[0008] The heating furnace is provided with a carrier gas inlet and a carrier gas outlet; the pressure loading chamber and the quartz glass tube are located between the carrier gas inlet and the carrier gas outlet.
[0009] Further, the pressure regulating valve is used to regulate the gas pressure inside the pressure loading chamber, and then regulate the pressure applied to the liquid alkali metal in the quartz glass tube.
[0010] Further, the diameter of the micro hole is 0.1 mm.
[0011] Further, the pressure regulating valve is connected to a device for providing high-pressure high-purity helium, and the gas pressure inside the pressure loading chamber is regulated by controlling the high-pressure high-purity helium introduced into the pressure loading chamber, and then regulating the pressure applied to the liquid alkali metal in the quartz glass tube.
[0012] Further, the carrier gas introduced into the heating furnace is methane or helium with a purity greater than 5N.
[0013] Further, when the pressure applied to the liquid alkali metal in the quartz glass tube is higher than the pressure inside the heating furnace, the liquid alkali metal can flow out of the micro hole and coat the outer surface of the quartz glass tube, and the alkali metal on the outer surface of the quartz glass tube can be evaporated by heating of the heating furnace and mixed with the carrier gas introduced into the heating furnace, to produce alkali metal atomic vapor.
[0014] Compared with the prior art, the present application has the following advantages:
[0015] The present application provides a large-flow alkali metal atomic vapor production device, which uses a micro hole structure to coat a thin layer of liquid alkali metal on the outer wall of a quartz glass tube, and evaporate it under high temperature conditions. A plurality of quartz glass tubes are arranged in an array, and a high-purity carrier gas is used to blow and flow through the quartz glass tube array, thereby realizing large-flow and high-concentration output of alkali metal atomic vapor. Since the thin layer of alkali metal is in close contact with the surface of the glass tube, even under the condition of large-flow carrier gas, splashing does not occur, thereby improving the stability of the flow of alkali metal vapor. In addition, a large evaporation specific surface area can be obtained, and the generation efficiency of alkali metal vapor can be improved.
[0016] Based on the above reasons, the present application can be widely popularized in the field of gas lasers. BRIEF DESCRIPTION OF DRAWINGS
[0017] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the drawings needed in the following embodiment or prior art description will be briefly introduced. Obviously, the drawings in the following description are some embodiments of the present application, and other drawings can also be obtained by those skilled in the art without creative labor.
[0018] Fig. 1 The structure of the present application is shown in the schematic diagram.
[0019] Fig. 2 The quartz glass tube structure schematic diagram of the present application.
[0020] Fig. 3 The quartz glass tube internal structure schematic diagram of the present application.
[0021] In the figure: 1, quartz glass tube; 11, alkali metal; 12, micro-pore; 2, heating furnace; 3, pressure loading chamber; 4, pressure regulating valve. DETAILED DESCRIPTION
[0022] In order to make the purpose, technical scheme and advantages of the embodiments of the present application more clear, the technical scheme in the embodiments of the present application will be described clearly and completely below in combination with the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. The description of the at least one exemplary embodiment is actually only illustrative, but not as any limitation on the present application and its application or use. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the present application.
[0023] Embodiment 1
[0024] As shown in the figure, the present application provides a large-flow alkali metal atom vapor production device, comprising a heating furnace 2 and a plurality of quartz glass tubes 1; Figs. 1-3
[0025] The heating furnace 2 is internally provided with a pressure loading chamber 3, and the pressure loading chamber 3 is provided with a pressure regulating valve 4;
[0026] The quartz glass tube 1 is open at one end and closed at the other end; the quartz glass tube 1 is located inside the heating furnace 2, and the open end is upwardly welded and fixed in communication with the pressure loading chamber 3;
[0027] The quartz glass tube 1 is internally provided with alkali metals 11, and the heating furnace 2 is used to heat and melt the alkali metals into liquid state;
[0028] The quartz glass tube 1 is internally provided with alkali metals 11, and the heating furnace 2 is used to heat and melt the alkali metals into liquid state;
[0029] The pressure regulating valve 4 is used to adjust the gas pressure inside the pressure loading chamber 3, and further adjust the pressure applied to the liquid state alkali metal in the quartz glass tube 1;
[0030] The heating furnace 2 is provided with a carrier gas inlet and a carrier gas outlet; the pressure loading chamber 3 and the quartz glass tube 1 are located between the carrier gas inlet and the carrier gas outlet.
[0031] Further, several quartz glass tubes 1 are arranged in an array.
[0032] Further, 100 quartz glass tubes 1 are included.
[0033] Further, the diameter of the micro-holes 12 is 0.1 mm.
[0034] Further, the pressure regulating valve 4 is connected to a device for providing high-pressure high-purity helium, and the gas pressure inside the pressure loading chamber 3 is regulated by controlling the high-pressure high-purity helium flowing into the pressure loading chamber 3, so as to regulate the pressure applied to the liquid alkali metal 11 in the quartz glass tube 1.
[0035] Further, the carrier gas flowing into the heating furnace 2 is methane or helium with a purity greater than 5N.
[0036] Further, when the pressure applied to the liquid alkali metal 11 in the quartz glass tube 1 is higher than the pressure inside the heating furnace 2, the liquid alkali metal 11 can flow out of the micro-holes 12 and coat the outer surface of the quartz glass tube 1, and the alkali metal 11 on the outer surface of the quartz glass tube 1 can evaporate and mix with the carrier gas flowing into the heating furnace 2 by heating of the heating furnace 2, to generate alkali metal atomic vapor.
[0037] When the large-flow alkali metal atomic vapor generating device provided by the application works, the pressure regulating valve 4 is used to make the pressure applied to the liquid alkali metal 11 in the quartz glass tube 1 higher than the pressure inside the heating furnace 2, and the liquid alkali metal 11 in the quartz glass tube 1 flows out of the micro-holes 12 on the wall of the quartz glass tube 1 under the action of the external pressure difference, and coats the outer surface of the wall of the entire quartz glass tube 1, and the alkali metal evaporates under high-temperature conditions, and then mixes with the carrier gas flowing into the heating furnace 2 from the carrier gas inlet of the heating furnace 2, and finally flows out from the carrier gas outlet of the heating furnace 2 together, to realize the generation of alkali metal atomic vapor.
[0038] Finally, it should be noted that the above examples are only used to illustrate the technical solutions of the application, and not to limit them; although the application has been described in detail with reference to the foregoing examples, those skilled in the art should understand that they can still modify the technical solutions recorded in the foregoing examples, or make equivalent replacement for part or all of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the application.
Claims
1. A large flow alkali metal atomic vapor generation device, characterized by, The heating furnace and a plurality of quartz glass tubes are included; The heating furnace is internally provided with a pressure loading chamber, and the pressure loading chamber is provided with a pressure regulating valve; The quartz glass tube is located inside the heating furnace, and the open end is upwardly welded and fixed to the pressure loading chamber and communicates with the pressure loading chamber; the quartz glass tube is internally provided with alkali metal, and the heating furnace is used for melting the alkali metal into liquid state; a plurality of micro holes communicating with the inside of the quartz glass tube are arrayed on the wall of the quartz glass tube, and when the pressure inside and outside the quartz glass tube is consistent, the liquid alkali metal cannot flow out through the micro holes; The heating furnace is provided with a carrier gas inlet and a carrier gas outlet; the pressure loading chamber and the quartz glass tube are located between the carrier gas inlet and the carrier gas outlet; When the pressure applied to the liquid alkali metal in the quartz glass tube is higher than the pressure inside the heating furnace, the liquid alkali metal can flow out of the micro holes and be coated on the outer surface of the quartz glass tube, and the alkali metal on the outer surface of the quartz glass tube can be evaporated by heating of the heating furnace and mixed with the carrier gas introduced into the heating furnace to generate alkali metal atomic vapor.
2. The large flux alkali metal atomic vapor producing apparatus according to claim 1, wherein, The pressure regulating valve is used for adjusting the gas pressure inside the pressure loading chamber and further adjusting the pressure applied to the liquid alkali metal in the quartz glass tube.
3. The large flux alkali metal atomic vapor producing apparatus according to claim 1, wherein, The diameter of the micro hole is 0.1mm.
4. The large flux alkali metal atomic vapor producing apparatus according to claim 1, wherein, The pressure regulating valve is connected to a device for providing high-pressure high-purity helium, and the gas pressure inside the pressure loading chamber is adjusted by controlling the high-pressure high-purity helium introduced into the pressure loading chamber, so as to adjust the pressure applied to the liquid alkali metal in the quartz glass tube.
5. The large flux alkali metal atomic vapor producing apparatus according to claim 1, wherein, The carrier gas introduced into the heating furnace is methane or helium with a purity greater than 5N.
Citation Information
Patent Citations
Deposition device, deposition equipment and operation method of deposition equipment
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Metal vapor laser device
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