Insulator shed material and preparation method and application thereof

Abstract

The present application relates to the technical field of insulator materials, and particularly relates to an insulator shed material and a preparation method and application thereof. The insulator shed material is composed of an insulator shed precursor with a porous pore structure and trichlorosilane colloidal particles grafted in the pore structure, the insulator shed material is a microporous structure, the porous structure has a significant inhibitory effect on the surface flashover process of the insulator, and the insulator shed material can effectively improve the flashover strength of the insulator under dry, rain, humidity and pollution conditions. Meanwhile, the preparation method of the present application forms a nanoscale rough structure on the pore surface after grafting trichlorosilane colloidal particles with a specific grafting rate, so that the porous sample can greatly improve the hydrophobic property of the sample while maintaining high flashover performance. Furthermore, the preparation method and process of the present application for preparing the insulator shed material or the insulator shed are simple and can be compatible with the manufacturing process of existing outdoor insulators.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of insulator materials, and particularly relates to an insulator shed material and a preparation method and application thereof. BACKGROUND

[0002] Overhead transmission lines are one of the most important devices in power systems, and outdoor insulators, as the core components, have the functions of electrical insulation and fixed support. Composite insulators have excellent hydrophobic properties, light weight, high mechanical strength and other advantages, and have been widely used in recent years. The essence of a transmission line is a composite insulator-air (solid-gas) insulation structure. The difference in dielectric parameters between the solid and gas phases causes distortion of the electric field on the surface of the insulator, and discharge first develops on the surface of the insulator. Therefore, the insulation strength at the interface is much lower than that of the solid and gas, that is, surface flashover is more likely to occur than body breakdown. In addition, outdoor insulators are affected by environmental factors such as rain, moisture and contamination, which further deteriorate the flashover strength, causing the insulator to possibly have a contaminated flashover under working voltage, indicating that the hydrophobicity of the insulator is another important property. In the statistical investigation of insulation failures, the probability of surface flashover of insulators is the highest, which seriously affects the safe and stable operation of high-voltage electrical equipment.

[0003] Scholars at home and abroad have improved the flashover strength under conditions of rain, moisture and contamination by constructing a super-hydrophobic structure on the surface of the insulator. A super-hydrophobic coating can be constructed on the surface of the insulator by spraying or brushing, or a micro-nano binary rough structure can be printed on the surface of the insulator by a template method to endow the insulator with super-hydrophobic properties.

[0004] CN114316798B discloses a dielectric multifunctional nano coating, a preparation method and application thereof. The method comprises the following steps: weighing a polydimethylsiloxane prepolymer, placing it in n-hexane, and stirring at room temperature to form a uniform solution; weighing nano particles and multi-walled carbon nanotubes, placing them in the solution, stirring at room temperature, and ultrasonic treating for a certain period of time to form a suspension; adding a PDMS curing agent to the solution and continuing to ultrasonic treat for a period of time; pretreating the surface of the substrate with abrasive paper; spraying the prepared solution on the substrate to form a nano coating; curing the coating sample in a 100℃ vacuum box for 4 hours; changing the mass percentage of the nano particles, repeating the above steps, and preparing nano coatings with different concentration gradients as required. When the morphology of the coating in this technical solution is damaged, the hydrophobic properties and the flashover strength will both decrease, and there is no obvious interaction between the organic prepolymer and the inorganic particles, so the inorganic particles are easy to fall off, which also causes the performance of the final material to decrease.

[0005] CN116403788A discloses a method for improving the flashover voltage of a porcelain insulator, relates to the field of porcelain insulators, and places the porcelain insulator in a treatment liquid for ultrasonic immersion, dries after immersion, and the treatment liquid comprises base glue 10-50 parts, modified nano-silicon dioxide particles 1-10 parts, hydroxyl-terminated polydimethylsiloxane, butyl glycidyl ether, silane coupling agent 1-4 parts, and crosslinking agent 1-8 parts. The treatment liquid in this technical solution forms a coating on the surface of the porcelain insulator, wherein the modified nano-silicon dioxide particles added play a hydrophobic role. Although in the process of long-term use, with the micro-cracks generated on the coating, the fluorine-containing polymer emulsion particle coated with paraffin in the modified nano-silicon dioxide particles continues to form a micro-nano rough surface structure at the crack, so that the hydrophobic property is maintained, but in actual use, the number of micro-cracks generated and the rough surface structure formed are random and uncertain in any way, which may result in different hydrophobicities of the same coating in different environments, and finally lead to great instability of the probability of surface flashover of the insulator, seriously affecting the safe and stable operation of high-voltage electrical equipment.

[0006] Based on the above situation, the prior art does not consider the flashover performance of the insulator under dry conditions, although the super-hydrophobic property is obtained, but the dry flashover voltage is reduced; and the coating and the template printing method only have super-hydrophobic property on the surface of the insulator, but the mechanical stability of the micro-nano binary rough structure on the surface is poor, and after the surface morphology is damaged, the hydrophobic property and the flashover strength are still poor and low, which are technical problems to be solved. SUMMARY

[0007] To solve the above technical problems, the present application provides an insulator shed material, which is composed of an insulator shed precursor with a porous pore structure and trichlorosilane colloidal particles grafted in the pore structure, and the grafting rate is 60-100%, the grafting rate being the ratio of the surface area of the trichlorosilane colloidal particles covering the pore structure to the total surface area of the pore structure.

[0008] The pore diameter of the insulator shed precursor is 1-500 μm, and the porosity is 30-60%.

[0009] The particle size of the trichlorosilane colloidal particles is 50-400 nm.

[0010] The flashover voltage of the insulator shed material is 22.9-26.8 kV, and the water contact angle is 146.2-155.0°.

[0011] Further, the insulator shed precursor with a porous pore structure is prepared from a silicon-containing compound, a curing agent, and a pore-forming agent.

[0012] Further, the silicon-containing compound is one or more of polydimethylsiloxane or an addition type two-component room temperature vulcanized silicone rubber.

[0013] Further, the mass ratio of the silicon-containing compound and the curing agent is 10:1.

[0014] Further, the curing agent is a curing agent matched with the silicon-containing compound.

[0015] Further, the curing agent is a platinum gold catalyst or a polydimethylsiloxane curing agent.

[0016] Further, the polydimethylsiloxane curing agent is specifically Dow Corning SYLGARD 184.

[0017] Further, the mass ratio of the silicon-containing compound and the pore-forming agent is 1:(1-8).

[0018] Further, the mass ratio of the silicon-containing compound and the pore-forming agent is preferably 1:(3-5).

[0019] Further, the particle size of the pore-forming agent is 1-500 μm.

[0020] Further, the pore-forming agent is one or more of granulated sugar, soft sugar, sodium bicarbonate, and polyvinyl alcohol.

[0021] Further, the particle size of the granulated sugar is 200-500 μm.

[0022] The particle size of the soft sugar is 100-200 μm.

[0023] The particle size of the sodium bicarbonate is 1-50 μm.

[0024] The particle size of the polyvinyl alcohol is 1-100 μm.

[0025] Further, the raw material for preparing the trichlorosilane colloidal particles includes trichlorosilane.

[0026] Further, the trichlorosilane includes one or more of octadecyltrichlorosilane, hexadecyltrichlorosilane, tetradecyltrichlorosilane, dodecyltrichlorosilane, decyltrichlorosilane, perfluorododecyltrichlorosilane, and perfluorodecyltrichlorosilane.

[0027] The present application also provides a preparation method of the insulator shed material.

[0028] Step 1, preparing an insulator shed precursor with a porous pore structure by using a hard template method.

[0029] Step 2, grafting trichlorosilane colloidal particles in the pore structure of the insulator umbrella skirt precursor, to obtain the insulator umbrella skirt material.

[0030] Further, the porosity P The content of the pore-forming agent satisfies the following relationship:

[0031] ,

[0032] In the formula, w is the mass ratio of the insulator umbrella skirt precursor to the pore-forming agent, is the density of the pore-forming agent, is the density of the insulator umbrella skirt material.

[0033] Further, step 1 includes the following steps:

[0034] Step 1-1, uniformly mixing and stirring the silicon-containing compound, the curing agent, and the pore-forming agent to obtain a mixture;

[0035] Step 1-2, curing the mixture to obtain a cured body;

[0036] Step 1-3, placing the cured body into a solution for removing the pore-forming agent, heating, and then drying to obtain the insulator umbrella skirt precursor with a porous pore structure.

[0037] Further, in step 1-1, the silicon-containing compound and the pore-forming agent are first mixed, and then the curing agent is added for second mixing after uniform mixing.

[0038] Further, the first mixing is at a speed of 500 r / min for 0.5 h, and the second mixing is at a speed of 500 r / min for 0.5 h.

[0039] Further, in step 1-2, the curing temperature is 100°C, and the curing time is 3 h.

[0040] Further, in step 1-3, the solution for removing the pore-forming agent is water;

[0041] The heating conditions are: a pressure of 0.1 MPa-0.48 MPa, a temperature of 100-150°C, and a time of 12 h;

[0042] The drying conditions are: a drying temperature of 100°C, and a drying time of 3 h.

[0043] Further, when the pore-forming agent is granulated sugar or soft sugar, the heating conditions are specifically: in an open environment, a pressure of 0.1 MPa, a temperature of 100°C, and a heating and soaking time of 12 h;

[0044] When the pore-forming agent is sodium bicarbonate or polyvinyl alcohol, the heating conditions are specifically as follows: in a hydrothermal reaction kettle, the pressure is 0.48 MPa, the temperature is 150 DEG C, and the heating soaking time is 12 h;

[0045] Further, step 2 comprises the following steps:

[0046] Step 2-1, dissolving trichlorosilane in a solvent to obtain a trichlorosilane suspension after sufficient stirring;

[0047] Step 2-2, immersing the insulator umbrella skirt precursor prepared in step 1 in the trichlorosilane suspension for ultrasonic treatment;

[0048] Step 2-3, placing the ultrasonically treated insulator umbrella skirt precursor in air for standing, so that the trichlorosilane in the trichlorosilane suspension undergoes hydrolysis and condensation reaction in the pore structure of the insulator umbrella skirt precursor having a porous pore structure, forming trichlorosilane colloidal particles on the pore walls of the pore structure, to obtain a pre-reaction body;

[0049] Step 2-4, continuing the hydrolysis and condensation reaction of the pre-reaction body under drying conditions to obtain the insulator umbrella skirt material.

[0050] Further, the mass-volume ratio of the trichlorosilane and the solvent in step 2-1 is 1:10, wherein the unit of mass is g and the unit of volume is mL.

[0051] Further, the solvent in step 2-1 includes one or more of n-hexane and ethyl acetate.

[0052] Further, the temperature of the ultrasonic treatment in step 2-2 is room temperature, the frequency is 40 kHz, and the time is 60 min.

[0053] Further, the time for standing of the ultrasonically treated insulator umbrella skirt precursor in air in step 2-3 is 6 h, and the humidity of the air is 60-90%.

[0054] Further, the hydrolysis and condensation reaction occurring in steps 2-3 and 2-4 is specifically as follows: the Si-Cl group in trichlorosilane reacts with water molecules in the air to form Si-OH groups, and then the Si-OH groups undergo polycondensation to form polymers with Si-O-Si as the main chain;

[0055] Meanwhile, in step 2-3, the chlorosilane group (Si-Cl group) of trichlorosilane also undergoes ethylene siliconization reaction with the ethylene group of the insulator umbrella skirt precursor, so that stable chemical connection is formed between the trichlorosilane colloidal particles and the insulator umbrella skirt precursor.

[0056] Further, the drying temperature in step 2-4 is 100 DEG C, and the time is 1 h.

[0057] The application also provides an insulator shed, which comprises an insulator core rod and the insulator shed material.

[0058] Further, the insulator shed further comprises a sheath and a hardware fitting.

[0059] Further, the sheath and the insulator shed are made of the same material.

[0060] The application also provides an outdoor high-voltage power equipment, which comprises the insulator shed.

[0061] The application has the following advantages:

[0062] 1. The insulator shed material prepared by the application is composed of an insulator shed precursor with a porous pore structure and trichlorosilane colloidal particles grafted in the pore structure, and the grafting rate is 60-100%, the grafting rate being the ratio of the surface area of the trichlorosilane colloidal particles covering the pore structure to the total surface area of the pore structure; the pore diameter of the insulator shed precursor is 1-500 microns, and the porosity is 30-60%; the particle size of the trichlorosilane colloidal particles is 50-400 nm; the flashover voltage of the insulator shed material is 22.9-26.8 kV, and the water contact angle is 146.2-155.0 degrees.

[0063] The insulator shed material is of a micron porous structure, and after being prepared into an insulator shed, the porous structure has a significant inhibitory effect on the surface flashover process of the insulator, and can effectively improve the flashover strength of the insulator under dry, rain, humidity and pollution conditions, wherein, in the application, the specific mechanism of the porous structure in improving the surface flashover strength includes: the pore structure can capture the electrons generated by discharge, the pore wall blocks the emission of electrons to the outside, and inhibits the secondary electron emission coefficient; the pore wall can block the electron impact ionization process of the surface flashover; the surface charge of the insulator is easy to migrate into the pore, which promotes the dissipation of the surface charge and inhibits the electric field distortion caused by the accumulation of the surface charge; at the same time, in improving the surface flashover strength, the nanometer rough morphology formed by the specific trichlorosilane colloidal particles has a certain blocking effect on the streamer development, which further improves the flashover strength.

[0064] And in the application, the trichlorosilane colloidal particles are subjected to ethylene siliconization reaction with the ethylene groups of the insulator shed precursor through the chlorine silicon groups (Si-Cl groups) of the trichlorosilane, so that a stable chemical connection is formed between the trichlorosilane colloidal particles and the insulator shed precursor, and even in extreme environments, the performance instability caused by the particle falling off in the prior art will not occur.

[0065] 2、The insulator shed in the prior art does not have excellent super-hydrophobic performance, and the surface micro-nano binary rough structure is damaged by the existing coating and template printing method, and the super-hydrophobic performance is lost; after the specific grafting rate of trichlorosilane colloidal particles is grafted by using the preparation method of the application, a nano-scale rough structure is formed on the surface of the pore structure, so that the hydrophobic performance of the porous sample can be greatly improved while maintaining high flashover performance; at the same time, the body of the insulator shed material prepared by the application has hydrophobic characteristics, so that even if the surface structure is damaged, the internal porous pore structure and the trichlorosilane colloidal particles grafted in the pore structure can still have super-hydrophobic performance, so that the insulator shed prepared by the application can maintain good super-hydrophobic performance for a long time in a harsh environment, and the service life of the insulator shed is also prolonged;

[0066] 3、Through experimental research, the insulator shed prepared by the method of the application can also improve various performances of the insulator, such as AC / DC surface flashover strength, super-hydrophobic surface, self-cleaning ability and anti-icing performance, etc.

[0067] 4、The preparation method and process of the insulator shed material or the insulator shed of the application are simple, can be compatible with the manufacturing process of the existing outdoor insulator, and the preparation conditions are mild, and the pore-forming agents such as sugar, cotton sugar, sodium bicarbonate and polyvinyl alcohol are biodegradable raw materials, which are good for the environment and meet the national development needs;

[0068] 5、In addition, during the preparation of the insulator shed material of the application, the types and contents of the pore-forming agents can be changed to flexibly control the surface flashover and mechanical strength of the insulator shed to adapt to different working conditions and environmental requirements. BRIEF DESCRIPTION OF DRAWINGS

[0069] Figure 1 It is a flashover voltage graph in Example 1 of the application;

[0070] Figure 2 It is a super-hydrophobic performance test graph in Example 1 of the application;

[0071] Figure 3 It is a super-hydrophobic performance test graph in Example 2 of the application;

[0072] Figure 4 It is a flashover voltage comparison graph in Examples 2 and 3 of the application;

[0073] Figure 5 It is a super-hydrophobic performance test graph in Example 3 of the application;

[0074] Figure 6 It is a pore distribution graph of the microstructure of the insulator shed material in Example 3 of the application;

[0075] Figure 7 This is a test diagram of the superhydrophobic performance in Embodiment 7 of the present invention;

[0076] Figure 8 A schematic diagram of the structure of the insulator skirt in Embodiment 10 of the present invention;

[0077] Figure 9 This is a flashover voltage diagram from Comparative Example 2 of the present invention;

[0078] Figure 10 This is a test diagram of the hydrophobic performance in Comparative Example 2 of the present invention;

[0079] Figure 11 This is a flashover voltage diagram from Comparative Example 3 of the present invention;

[0080] Figure 12 This is a test diagram of the hydrophobic performance in Comparative Example 3 of the present invention;

[0081] Figure 13 This is a flashover voltage diagram from Comparative Example 4 of the present invention;

[0082] Figure 14 This is a test diagram of the hydrophobic performance in Comparative Example 4 of the present invention;

[0083] The names of the labels in the diagram are:

[0084] 1. Insulator core rod; 2. Insulator skirt material; 3. Sheath; 4. Fittings. Detailed Implementation

[0085] Examples 1-9 describe the materials used for insulator skirts and their preparation methods.

[0086] The test method for flashover voltage is as follows: based on 1kVs -1 A DC voltage is applied at a rising rate until a flashover occurs, and the flashover voltage value is recorded. The flashover voltage is analyzed using a two-parameter Weibull distribution.

[0087] The method for testing the water contact angle is as follows: drop approximately 5 μL of water onto the horizontal surface of the material, and use a JC2000 contact angle measuring instrument to investigate the hydrophobic properties of the coating surface.

[0088] Example 10 is an insulator skirt prepared using the insulator skirt material in Example 1.

[0089] Example 1

[0090] This embodiment provides an insulator skirt material and its preparation method, including the following steps:

[0091] Step 1: Prepare the insulator skirt precursor with a porous structure using the hard template method:

[0092] Step 1-1, first mix 5g polydimethylsiloxane and 20g pore-forming agent sugar (m PDMS / m 砂糖 =1:4) at room temperature using an electric mixer at a speed of 500r / min for 0.5h, then add 0.5g curing agent (Dow Corning SYLGARD 184) and continue mixing at a speed of 500r / min for 0.5h to obtain a mixture;

[0093] wherein the particle size of the sugar is 200-500μm;

[0094] Step 1-2, cure the mixture at a temperature of 100℃ for 3h to obtain a cured body;

[0095] Step 1-3, immerse the cured body in 100℃ hot water at a pressure of 0.1Mpa for 12h, then dry to obtain a insulator shed material precursor with a porous structure;

[0096] Step 2, graft trichlorosilane colloidal particles in the pores of the insulator shed precursor to obtain the insulator shed material:

[0097] Step 2-1, dissolve 6g hexadecyltrichlorosilane in 60mL n-hexane solvent, mix the hexadecyltrichlorosilane and the solvent uniformly by electric stirring to obtain a trichlorosilane suspension;

[0098] Step 2-2, immerse the insulator shed material precursor prepared in step 1 in the trichlorosilane suspension and ultrasonically treat it; the ultrasonic treatment is carried out at room temperature at a frequency of 40kHz for 60min;

[0099] Step 2-3, place the ultrasonically treated insulator shed precursor in air and let it stand for 6h, the humidity of the air is 70%, so that the trichlorosilane in the trichlorosilane suspension undergoes hydrolysis and condensation reaction in the pores of the insulator shed material precursor with a porous structure, forming trichlorosilane colloidal particles on the pore walls of the pores, obtaining a pre-reaction body; at the same time, the chlorosilicon group (Si-Cl group) of the trichlorosilane also undergoes ethylene siliconization reaction with the ethylene group of the insulator shed precursor, forming a stable chemical connection between the trichlorosilane colloidal particles and the insulator shed precursor;

[0100] Step 2-4, continue the hydrolysis and condensation reaction of the pre-reaction body under drying conditions at a temperature of 100℃ for 1h to obtain the insulator shed material.

[0101] The grafting rate of the insulator shed material of the embodiment is 90%, as shown in the table, the flashover voltage is 23.7 kV, as shown in the table, the water contact angle is 146.2°. Figure 1 Figure 2

[0102] Embodiment 2

[0103] The embodiment provides an insulator shed material and a preparation method thereof, comprising the following steps:

[0104] Step 1, preparing an insulator shed precursor with a porous pore structure by using a hard template method:

[0105] Step 1-1, first, mixing 5 g of polydimethylsiloxane and 20 g of a pore-forming agent, cotton sugar (m PDMS 绵糖 =1:4) at room temperature using an electric mixer at a speed of 500 r / min for 0.5 h, and then adding 0.5 g of a curing agent (Dow Corning SYLGARD 184) to continue mixing at a speed of 500 r / min for 0.5 h to obtain a mixed material;

[0106] The particle size of the cotton sugar is 100-200 μm.

[0107] Step 1-2, curing the mixed material at a temperature of 100 ℃ for 3 h to obtain a cured body;

[0108] Step 1-3, placing the cured body in 100 ℃ hot water under an open environment at a pressure of 0.1 MPa for 12 h of soaking, and then drying at a temperature of 100 ℃ for 3 h to obtain an insulator shed material precursor with a porous pore structure;

[0109] Step 2, grafting trichlorosilane colloidal particles in the pores of the insulator shed precursor to obtain the insulator shed material:

[0110] Step 2-1, dissolving 6 g of octadecyltrichlorosilane in 60 mL of n-hexane solvent, and mixing the octadecyltrichlorosilane and the solvent uniformly by using an electric mixer to obtain a trichlorosilane suspension;

[0111] Step 2-2, immersing the insulator shed material precursor prepared in step 1 in the trichlorosilane suspension for ultrasonic treatment; the ultrasonic treatment is performed at room temperature at a frequency of 40 kHz for 60 min;

[0112] ​​​Step 2-3, the insulator shed precursor after ultrasonic treatment is placed in air, the humidity of the air is 70%, and the time for standing is 6h, so that the trichlorosilane in the trichlorosilane suspension undergoes hydrolysis condensation reaction in the pores of the insulator shed material precursor with a porous pore structure, trichlorosilane colloidal particles are formed on the pore walls of the pores, and a pre-reaction body is obtained, and at the same time, the chlorosilane groups (Si-Cl groups) of the trichlorosilane also undergo ethylene silication with the ethylene groups of the insulator shed precursor, so that stable chemical connection is formed between the trichlorosilane colloidal particles and the insulator shed precursor;

[0113] Step 2-4, the pre-reaction body continues to undergo hydrolysis condensation reaction under drying conditions, the temperature for drying is 100℃, and the time for drying is 1h, so that the insulator shed material is obtained.

[0114] The grafting rate of the insulator shed material in this embodiment is 86%, as shown in Figure 4 , the flashover voltage is 24.6kV, as shown in Figure 3 , and the water contact angle is 152.6°.

[0115] Embodiment 3

[0116] The embodiment provides an insulator shed material and a preparation method thereof, which comprises the following steps:

[0117] Step 1, an insulator shed precursor with a porous pore structure is prepared by using a hard template method:

[0118] Step 1-1, 5g of polydimethylsiloxane and 25g of a pore-forming agent, cotton sugar (m PDMS / m 绵糖 =1:5) are first mixed at room temperature by using an electric mixer, the first mixing rate is 500r / min, and the time for first mixing is 0.5h, after uniform mixing, 0.5g of a curing agent (Dow Corning SYLGARD 184) is further added for second mixing, the second mixing rate is 500r / min, and the time for second mixing is 0.5h, so that a mixed material is obtained;

[0119] In the formula, the particle size of the cotton sugar is 100-200μm;

[0120] Step 1-2, the mixed material is cured, the curing temperature is 100℃, and the curing time is 3h, so that a cured body is obtained;

[0121] Step 1-3, the cured body is placed in 100℃ hot water under an open environment, the pressure is 0.1MPa, and the soaking time is 12h, then drying is performed, the drying temperature is 100℃, and the drying time is 3h, so that the insulator shed material precursor with a porous pore structure is obtained;

[0122] Step 2, grafting trichlorosilane colloidal particles in the pores of the insulator shed precursor to obtain the insulator shed material:

[0123] Step 2-1, dissolve 6g hexadecyltrichlorosilane in 60mL n-hexane solvent, mix the hexadecyltrichlorosilane and the solvent uniformly by electric stirring to obtain a trichlorosilane suspension;

[0124] Step 2-2, immerse the insulator shed material precursor prepared in step 1 in the trichlorosilane suspension and ultrasonic treatment; the temperature of the ultrasonic treatment is room temperature, the frequency is 40kHz, and the time is 60min;

[0125] Step 2-3, place the insulator shed precursor after ultrasonic treatment in air and stand for 6h, the humidity of the air is 70%, so that the trichlorosilane in the trichlorosilane suspension undergoes hydrolysis condensation reaction in the pores of the insulator shed material precursor with a porous pore structure, trichlorosilane colloidal particles are formed on the pore walls of the pores, and a pre-reaction body is obtained, and at the same time, the chlorosilane group (Si-Cl group) of the trichlorosilane also undergoes ethylene silication with the ethylene group of the insulator shed precursor, so that the trichlorosilane colloidal particles and the insulator shed precursor are previously formed into a stable chemical connection;

[0126] Step 2-4, continue the hydrolysis condensation reaction of the pre-reaction body under the condition of drying, the temperature of drying is 100℃, and the time is 1h, and the insulator shed material is obtained.

[0127] The grafting rate of the insulator shed material of the embodiment is 92%, as shown in Figure 4 , the flashover voltage is 26.4kV, which is slightly improved than that of the flashover voltage of the embodiment 2, as shown in Figure 5 , the water contact angle is 154.0°.

[0128] The microstructure of the insulator shed material is observed by a scanning electron microscope, and the results are shown in Figure 6 . It can be seen that the average pore diameter of the obtained insulator shed material is 162μm.

[0129] Embodiment 4

[0130] The embodiment provides an insulator shed material and a preparation method thereof, comprising the following steps:

[0131] Step 1, preparing an insulator shed precursor with a porous pore structure by a hard template method:

[0132] Step 1-1, first dissolve 5g polydimethylsiloxane and 30g pore-forming agent cotton sugar (m PDMS / m 绵糖=1:6) first mixing at room temperature using an electric stirrer at a rate of 500 r / min for 0.5 h, after uniform mixing, 0.5 g of a curing agent (Dow Corning SYLGARD 184) was added to continue second mixing at a rate of 500 r / min for 0.5 h to obtain a mixed material;

[0133] wherein the particle size of the silk sugar is 100-200 μm;

[0134] Step 1-2, curing the mixed material at a temperature of 100 °C for 3 h to obtain a cured body;

[0135] Step 1-3, soaking the cured body in hot water at 100 °C for 12 h, and then drying at a temperature of 100 °C for 3 h to obtain an insulator shed material precursor having a porous structure;

[0136] Step 2, grafting trichlorosilane colloidal particles in the pores of the insulator shed precursor to obtain the insulator shed material:

[0137] Step 2-1, dissolving 6 g of tetradecyltrichlorosilane in 60 mL of n-hexane solvent, and mixing the tetradecyltrichlorosilane and the solvent uniformly by electric stirring to obtain a trichlorosilane suspension;

[0138] Step 2-2, immersing the insulator shed material precursor prepared in Step 1 in the trichlorosilane suspension for ultrasonic treatment; the ultrasonic treatment is at room temperature, at a frequency of 40 kHz, and for 60 min;

[0139] Step 2-3, placing the ultrasonically treated insulator shed precursor in air for 6 h, the humidity of the air being 70%, so that the trichlorosilane in the trichlorosilane suspension undergoes hydrolytic condensation reaction in the pores of the insulator shed material precursor having a porous structure, forming trichlorosilane colloidal particles on the pore walls of the pores, to obtain a pre-reaction body, and at the same time, the chlorosilicon groups (Si-Cl groups) of the trichlorosilane also undergo ethylene siliconization reaction with the ethylene groups of the insulator shed precursor, forming stable chemical connection between the trichlorosilane colloidal particles and the insulator shed precursor;

[0140] Step 2-4, continuing the hydrolytic condensation reaction of the pre-reaction body under drying conditions at a temperature of 100 °C for 1 h to obtain the insulator shed material.

[0141] The grafting rate of the insulator shed material of this example is 94%, the flashover voltage is 26.3 kV, and the water contact angle is 153.9°.

[0142] Example 5

[0143] The embodiment provides an insulator shed material and a preparation method thereof, and comprises the following steps:

[0144] Step 1, using a hard template method to prepare an insulator shed precursor with a porous pore structure:

[0145] Step 1-1, first mix 5g of polydimethylsiloxane and 5g of a pore-forming agent sodium bicarbonate (m PDMS / m 碳酸氢钠 =1:1) at room temperature using an electric mixer at a speed of 500r / min for 0.5h, and then add 0.5g of a curing agent (Dow Corning SYLGARD 184) to continue mixing at a speed of 500r / min for 0.5h, to obtain a mixture;

[0146] The particle size of the sodium bicarbonate is 1-50μm.

[0147] Step 1-2, curing the mixture at a temperature of 100℃ for 3h to obtain a cured body;

[0148] Step 1-3, placing the cured body into a hydrothermal reactor for heating at a temperature of 150℃ and a pressure of 0.48MPa for 12h, and then drying at a temperature of 100℃ for 3h to obtain an insulator shed material precursor with a porous pore structure;

[0149] Step 2, grafting trichlorosilane colloidal particles in the pores of the insulator shed precursor to obtain the insulator shed material:

[0150] Step 2-1, dissolving 6g of dodecyltrichlorosilane in 60mL of n-hexane solvent, and mixing the dodecyltrichlorosilane and the solvent uniformly by electric stirring to obtain a trichlorosilane suspension;

[0151] Step 2-2, immersing the insulator shed material precursor prepared in step 1 in the trichlorosilane suspension for ultrasonic treatment; the ultrasonic treatment is carried out at room temperature, at a frequency of 40kHz for 60min;

[0152] Step 2-3, the insulator shed precursor after ultrasonic treatment is placed in air for standing, the humidity of the air is 70%, so that the trichlorosilane in the trichlorosilane suspension has a hydrolysis condensation reaction in the pores of the insulator shed material precursor with a porous pore structure, trichlorosilane colloidal particles are formed on the pore walls of the pores, a pre-reaction body is obtained, and at the same time, the chlorosilicon groups (Si-Cl groups) of the trichlorosilane also have a vinyl siliconization reaction with the ethylene groups of the insulator shed precursor, so that the trichlorosilane colloidal particles are stably connected in front of the insulator shed precursor;

[0153] Step 2-4, the pre-reaction body continues to have a hydrolysis condensation reaction under drying conditions, the temperature of the drying is 100°C, and the time is 1h, so that the insulator shed material is obtained.

[0154] The grafting rate of the insulator shed material of the embodiment is 72%, the flashover voltage is 23.8kV, and the water contact angle is 155.0°.

[0155] Embodiment 6

[0156] The embodiment provides an insulator shed material and a preparation method thereof, and the preparation method comprises the following steps:

[0157] Step 1, an insulator shed precursor with a porous pore structure is prepared by using a hard template method:

[0158] Step 1-1, 5g of polydimethylsiloxane and 10g of a pore-forming agent sodium bicarbonate (m PDMS / m 碳酸氢钠 =1:2) are first mixed at room temperature by using an electric stirrer, the first mixing rate is 500r / min, and the time is 0.5h, then 0.5g of a curing agent (Dow Corning SYLGARD 184) is added to continue second mixing, the second mixing rate is 500r / min, and the time is 0.5h, so that a mixed material is obtained;

[0159] In the formula, the particle size of the sodium bicarbonate is 1-50μm.

[0160] Step 1-2, the mixed material is cured, the curing temperature is 100°C, and the curing time is 3h, so that a cured body is obtained;

[0161] Step 1-3, the cured body is placed in a hydrothermal reaction kettle for heating, the heating temperature is 150°C, the pressure is 0.48MPa, the heating soaking time is 12h, then drying is performed, the drying temperature is 100°C, and the drying time is 3h, so that the insulator shed material precursor with a porous pore structure is obtained.

[0162] Step 2, trichlorosilane colloidal particles are grafted in the pores of the insulator shed precursor, so that the insulator shed material is obtained.

[0163] Step 2-1, 6g of decyltrichlorosilane was dissolved in 60mL of n-hexane solvent, and the decyltrichlorosilane was mixed uniformly with the solvent by electric stirring to obtain a trichlorosilane suspension;

[0164] Step 2-2, the insulator umbrella skirt material precursor prepared in step 1 was immersed in the trichlorosilane suspension and ultrasonically treated; the ultrasonic temperature was room temperature, the frequency was 40kHz, and the time was 60min;

[0165] Step 2-3, the insulator umbrella skirt precursor after ultrasonic treatment was placed in the air and stood for 6h, the humidity of the air was 70%, so that the trichlorosilane in the trichlorosilane suspension occurred hydrolysis condensation reaction in the pores of the insulator umbrella skirt material precursor with porous pore structure, trichlorosilane colloidal particles were formed on the pore wall of the pores, and a pre-reaction body was obtained, and at the same time, the chlorosilane group (Si-Cl group) of trichlorosilane also occurred ethylene silication with the ethylene group of the insulator umbrella skirt precursor, so that the trichlorosilane colloidal particles and the insulator umbrella skirt precursor were formed before the stable chemical connection;

[0166] Step 2-4, the pre-reaction body continued to carry out hydrolysis condensation reaction under the condition of drying, the drying temperature was 100℃, and the time was 1h, and the insulator umbrella skirt material was obtained.

[0167] The grafting rate of the insulator umbrella skirt material of the embodiment was 75%, the flashover voltage was 26.8V, and the water contact angle was 155.0°.

[0168] Example 7

[0169] The embodiment provides an insulator umbrella skirt material and a preparation method thereof, which comprises the following steps:

[0170] Step 1, using a hard template method to prepare an insulator umbrella skirt precursor with a porous pore structure:

[0171] Step 1-1, first, 5g of polydimethylsiloxane and 5g of pore-forming agent polyvinyl alcohol (m PDMS / m 聚乙烯醇 =1:1) were first mixed at room temperature using an electric stirrer, the first mixing rate was 500r / min, and the time was 0.5h, then 0.5g of curing agent (Dow Corning SYLGARD 184) was added and second mixing was continued, the second mixing rate was 500r / min, and the time was 0.5h, and a mixed material was obtained;

[0172] The particle size of the polyvinyl alcohol is 1-100μm;

[0173] Step 1-2, curing the mixture at a temperature of 100℃ for 3h to obtain a cured body;

[0174] Step 1-3, placing the cured body into a hydrothermal reactor for heating at a temperature of 150℃ and a pressure of 0.48MPa for 12h, and then drying at a temperature of 100℃ for 3h to obtain an insulator shed material precursor with a porous structure;

[0175] Step 2, grafting trichlorosilane colloidal particles in the pores of the insulator shed precursor to obtain the insulator shed material:

[0176] Step 2-1, dissolving 6g of perfluorododecyltrichlorosilane in 60mL of n-hexane solvent, and mixing the perfluorododecyltrichlorosilane and the solvent uniformly by electric stirring to obtain a trichlorosilane suspension;

[0177] Step 2-2, immersing the insulator shed material precursor prepared in step 1 into the trichlorosilane suspension for ultrasonic treatment; the ultrasonic treatment is performed at room temperature, at a frequency of 40kHz for 60min;

[0178] Step 2-3, placing the ultrasonic treated insulator shed precursor in air for 6h, and the humidity of the air is 70%, so that the trichlorosilane in the trichlorosilane suspension undergoes hydrolysis condensation reaction in the pores of the insulator shed material precursor with a porous structure, forming trichlorosilane colloidal particles on the pore walls of the pores, obtaining a pre-reaction body, and at the same time, the chlorosilane groups (Si-Cl groups) of the trichlorosilane also undergo ethylene silication with the ethylene groups of the insulator shed precursor, forming a stable chemical connection between the trichlorosilane colloidal particles and the insulator shed precursor;

[0179] Step 2-4, continuing the hydrolysis condensation reaction of the pre-reaction body under drying conditions at a temperature of 100℃ for 1h to obtain the insulator shed material.

[0180] The grafting rate of the insulator shed material of the present example is 68%, and the flashover voltage is 22.9kV, and the water contact angle is 152.8°, as shown in Figure 7 .

[0181] Example 8

[0182] The present example provides an insulator shed material and a preparation method thereof, comprising the following steps:

[0183] Step 1, preparing an insulator shed precursor with a porous structure by a hard template method:

[0184] Step 1-1, first mix 5g polydimethylsiloxane and 10g pore-forming agent polyvinyl alcohol (m PDMS / m 聚乙烯醇 =1:2) at room temperature using an electric mixer, the first mixing rate is 500r / min, the time is 0.5h, after mixing evenly, then add 0.5g curing agent (Dow Corning SYLGARD 184) to continue the second mixing, the second mixing rate is 500r / min, the time is 0.5h, to obtain the mixture;

[0185] Wherein, the particle size of the polyvinyl alcohol is 10-100μm;

[0186] Step 1-2, the mixture is cured, the curing temperature is 100℃, the curing time is 3h, to obtain the cured body;

[0187] Step 1-3, the cured body is placed in a hydrothermal reactor for heating, the heating temperature is 150℃, the pressure is 0.48MPa, the heating soaking time is 12h, then drying, the drying temperature is 100℃, the drying time is 3h, to obtain the insulator shed material precursor with porous pore structure;

[0188] Step 2, grafting trichlorosilane colloidal particles in the pores of the insulator shed precursor, to obtain the insulator shed material:

[0189] Step 2-1, dissolve 6g perfluorodecyltrichlorosilane in 60mL n-hexane solvent, mix the perfluorodecyltrichlorosilane and the solvent evenly by electric stirring, to obtain the trichlorosilane suspension;

[0190] Step 2-2, immerse the insulator shed material precursor prepared in step 1 in the trichlorosilane suspension for ultrasonic treatment; the ultrasonic temperature is room temperature, the frequency is 40kHz, the time is 60min;

[0191] Step 2-3, place the ultrasonic treated insulator shed precursor in air for standing, the standing time is 6h, the humidity of the air is 70%, so that the trichlorosilane in the trichlorosilane suspension occurs hydrolysis condensation reaction in the pores of the insulator shed material precursor with porous pore structure, to form trichlorosilane colloidal particles on the pore wall of the pores, to obtain the pre-reaction body, at the same time, the chlorosilicon group (Si-Cl group) of the trichlorosilane also occurs ethylene siliconization reaction with the ethylene group of the insulator shed precursor, to form stable chemical connection between the trichlorosilane colloidal particles and the insulator shed precursor;

[0192] Step 2-4, the pre-reaction body continues to carry out hydrolysis condensation reaction under drying conditions, the drying temperature is 100℃, the time is 1h, to obtain the insulator shed material.

[0193] The grafting rate of the insulator shed material of the embodiment is 74%, the flashover voltage is 25.7 kV, and the water contact angle is 154.3.

[0194] Embodiment 9

[0195] The embodiment provides an insulator shed material and a preparation method thereof, and the preparation method comprises the following steps:

[0196] Step 1, preparing an insulator shed precursor with a porous pore structure by using a hard template method:

[0197] Step 1-1, first mixing 5 g of addition type two-component room temperature vulcanized silicone rubber and 20 g of pore-forming agent sand sugar (m PDMS / m 砂糖 =1:4) at room temperature by using an electric mixer at a speed of 500 r / min for 0.5 h, and then adding 0.5 g of a curing agent (a commercially available platinum catalyst) to continue second mixing at a speed of 500 r / min for 0.5 h, to obtain a mixed material;

[0198] In the step, the particle size of the sand sugar is 200-500 μm.

[0199] Step 1-2, curing the mixed material at a temperature of 100 ℃ for 3 h to obtain a cured body;

[0200] Step 1-3, soaking the cured body in hot water at 100 ℃ under an open environment at a pressure of 0.1 Mpa for 12 h, and then drying to obtain an insulator shed material precursor with a porous pore structure;

[0201] Step 2, grafting trichlorosilane colloidal particles in the pores of the insulator shed precursor to obtain the insulator shed material:

[0202] Step 2-1, dissolving 6 g of hexadecyltrichlorosilane in 60 mL of n-hexane solvent, and mixing the hexadecyltrichlorosilane and the solvent uniformly by using an electric mixer to obtain a trichlorosilane suspension;

[0203] Step 2-2, immersing the insulator shed material precursor prepared in step 1 in the trichlorosilane suspension for ultrasonic treatment; the ultrasonic treatment is performed at room temperature at a frequency of 40 kHz for 60 min;

[0204] Steps 2-3: Place the ultrasonically treated insulator skirt precursor in the air for 6 hours at a humidity of 70%. This allows the trichlorosilane in the trichlorosilane suspension to undergo a hydrolysis-condensation reaction in the pores of the insulator skirt precursor with a porous structure, forming trichlorosilane colloidal particles on the pore walls to obtain a pre-reacted body. At the same time, the chlorosilane groups (Si-Cl groups) of trichlorosilane also undergo an ethylene silanization reaction with the vinyl groups of the insulator skirt precursor, forming a stable chemical bond between the trichlorosilane colloidal particles and the insulator skirt precursor.

[0205] Steps 2-4: The pre-reactant continues to undergo hydrolysis and condensation reaction under drying conditions. The drying temperature is 100℃ and the time is 1 hour to obtain the insulator skirt material.

[0206] In this embodiment, the grafting rate of the insulator skirt material is 91%, the flashover voltage is 23.4kV, and the water contact angle is 150.1°.

[0207] Example 10

[0208] This embodiment provides an insulator skirt, such as Figure 8 As shown, the device includes an insulator core rod 1 and the insulator skirt material 2 from Embodiment 1, as well as a sheath 3 and fittings 4. The sheath 3 and the insulator skirt material 2 are made of the same material.

[0209] The preparation of the insulator skirt includes the following steps:

[0210] Step 1: Prepare the insulator skirt precursor, including the insulator core rod 1, using the hard template method:

[0211] Step 1-1: First, mix 5g of polydimethylsiloxane and 20g of pore-forming agent sucrose (m PDMS / m 砂糖 The mixture was mixed at a ratio of 1:4. The first mixing was carried out at room temperature using an electric stirrer at a speed of 500 r / min for 0.5 h. After the mixture was homogeneous, 0.5 g of curing agent (Dow Corning SYLGARD 184) was added and the second mixing was carried out at a speed of 500 r / min for 0.5 h to obtain the mixture.

[0212] The particle size of the sugar is 200-500μm;

[0213] Steps 1-2: Place the insulator core rod 1 into the silicone rubber mold, pour in the mixture and cure it. The curing temperature is 100℃ and the curing time is 3 hours to obtain the cured body.

[0214] Step 1-3, the solidified body is soaked in hot water at 100℃ under an open environment with a pressure of 0.1 Mpa for 12 h, and then dried at 100℃ for 3 h to obtain an insulator shed skirt precursor with a porous structure;

[0215] Step 2, grafting trichlorosilane colloidal particles in the pores of the insulator shed skirt precursor to obtain the insulator shed skirt material including the insulator core rod:

[0216] Step 2-1, 6 g of hexadecyltrichlorosilane is dissolved in 60 mL of n-hexane solvent, and the hexadecyltrichlorosilane is uniformly mixed with the solvent by electric stirring to obtain a trichlorosilane suspension;

[0217] Step 2-2, the insulator shed skirt material precursor prepared in step 1 is immersed in the trichlorosilane suspension for ultrasonic treatment; the ultrasonic temperature is room temperature, the frequency is 40 kHz, and the time is 60 min;

[0218] Step 2-3, the insulator shed skirt precursor after ultrasonic treatment is placed in air for standing for 6 h, and the humidity of the air is 70%, so that the trichlorosilane in the trichlorosilane suspension undergoes hydrolysis and condensation reaction in the pores of the insulator shed skirt material precursor with a porous structure, and trichlorosilane colloidal particles are formed on the pore walls of the pores to obtain a pre-reaction body;

[0219] Step 2-4, the pre-reaction body continues to undergo hydrolysis and condensation reaction under drying conditions, the drying temperature is 100℃, the time is 1 h, and finally the sheath 3 and the fitting 4 are installed to obtain the insulator shed skirt as shown in Figure 8 The structure thereof can be adjusted according to the mold and the actual application needs, and the embodiment is only one of many structures of the insulator shed skirt.

[0220] The insulator shed skirt and the sheath prepared in the embodiment are of micron porous structure, and the porous structure has a significant inhibitory effect on the surface flashover process of the insulator, which can effectively improve the flashover strength of the insulator under dry, rain, humidity and pollution conditions.

[0221] Comparative Example 1

[0222] The comparative example provides an insulator shed skirt material without pores and grafted with trichlorosilane and a preparation method thereof, including the following steps:

[0223] Step 1, first mix 5 g of polydimethylsiloxane and 0.5 g of a curing agent (Dow Corning SYLGARD 184) at a rate of 500 r / min for 0.5 h to obtain a mixture;

[0224] Step 2, curing the mixture, the curing temperature is 100℃, the curing time is 3h, to obtain a cured body;

[0225] Step 3, drying the cured body, the drying temperature is 100℃, the drying time is 3h, to obtain the insulator shed material of the present comparative example.

[0226] The flashover voltage of the insulator shed material of the present comparative example is 17.7kV, and the water contact angle is 120.0°.

[0227] Comparative Example 2

[0228] The present comparative example provides an insulator shed material containing pores but not grafted with trichlorosilane and a preparation method thereof, comprising the following steps:

[0229] Step 1, first mix 5g of polydimethylsiloxane and 20g of pore-forming agent sand sugar at room temperature using an electric mixer, the first mixing rate is 500r / min, the time is 0.5h, after uniform mixing, add 0.5g of curing agent (Dow Corning SYLGARD 184) to continue the second mixing, the second mixing rate is 500r / min, the time is 0.5h, to obtain a mixture;

[0230] The particle size of the sand sugar is 200-500μm;

[0231] Step 2, curing the mixture, the curing temperature is 100℃, the curing time is 3h, to obtain a cured body;

[0232] Step 3, soaking the cured body in 100℃ hot water for 12h, and then drying, the drying temperature is 100℃, the drying time is 3h, to obtain the insulator shed material of the present comparative example.

[0233] As shown in Figure 9 , the flashover voltage of the insulator shed material of the present comparative example is 22.9kV, and as shown in Figure 10 , the water contact angle is 132.8°.

[0234] Comparative Example 3

[0235] The present comparative example provides an insulator shed material containing pores but not grafted with trichlorosilane and a preparation method thereof, comprising the following steps:

[0236] Step 1, first mix 5g of polydimethylsiloxane and 20g of pore-forming agent cotton sugar (m PDMS / m 绵糖=1:4) at room temperature using an electric mixer, the first mixing rate is 500 r / min, the time is 0.5 h, after mixing evenly, 0.5 g of curing agent (Dow Corning SYLGARD 184) is added to continue the second mixing, the second mixing rate is 500 r / min, the time is 0.5 h, and a mixed material is obtained;

[0237] The particle size of the sand sugar is 200-500 μm.

[0238] Step 2, curing the mixed material at a temperature of 100 °C for 3 h to obtain a cured body.

[0239] Step 3, soaking the cured body in hot water at 100 °C for 12 h, and then drying at a temperature of 100 °C for 3 h to obtain the insulator shed material of the present example.

[0240] As shown in Figure 11 , the flashover voltage of the insulator shed material of the present example is 24.2 kV, and as shown in Figure 12 , the water contact angle is 138.7°.

[0241] Comparative Example 4

[0242] The present comparative example provides an insulator shed material containing pores but not grafted with trichlorosilane and a preparation method thereof, including the following steps:

[0243] Step 1, 5 g of polydimethylsiloxane and 25 g of pore-forming agent cotton sugar (m PDMS / m 绵糖 =1:5) at room temperature using an electric mixer, the first mixing rate is 500 r / min, the time is 0.5 h, after mixing evenly, 0.5 g of curing agent (Dow Corning SYLGARD 184) is added to continue the second mixing, the second mixing rate is 500 r / min, the time is 0.5 h, and a mixed material is obtained;

[0244] The particle size of the sand sugar is 200-500 μm.

[0245] Step 2, curing the mixed material at a temperature of 100 °C for 3 h to obtain a cured body.

[0246] Step 3, soaking the cured body in hot water at 100 °C for 12 h, and then drying at a temperature of 100 °C for 3 h to obtain the insulator shed material of the present example.

[0247] As shown in Figure 13As shown, the flashover voltage of the insulator shed material of the present comparative example is 24.8 kV, and the water contact angle is 141.8°. Figure 14 As shown, the flashover voltage of the insulator shed material of the present comparative example is 24.8 kV, and the water contact angle is 141.8°.

[0248] It can be seen from the comparison results of the examples and the comparative examples that the insulator shed prepared by the present application has multiple effects, including inhibiting secondary electron emission, blocking along surface discharge collision ionization, promoting surface charge migration to pores, and forming bulk and surface micro-nano binary rough morphology. Therefore, the porous structure of the insulator shed has high surface flashover strength and super-hydrophobic performance, ensuring that the insulator has high flashover strength under dry, rain, humidity and pollution conditions, and the insulator shed surface morphology is still able to maintain super-hydrophobic performance after being damaged.

[0249] The mass ratio of the silicon-containing compound (polydimethylsiloxane or addition type two-component room temperature vulcanized silicone rubber) to the pore-forming agent is selected according to the surface flashover strength and shed mechanical strength to be achieved. When a higher surface flashover strength is required, the content of the pore-forming agent should be increased, but the mechanical strength of the shed is easily reduced. When a higher mechanical strength of the shed is required, the content of the pore-forming agent should be reduced, but the surface flashover strength is reduced. Therefore, considering the surface flashover strength and the mechanical strength of the shed, the preferred mass ratio of the silicon-containing compound to the pore-forming agent is 1: (3-5).

[0250] It should be understood that the present application is not limited to what has been described above and illustrated in the drawings and that various modifications and changes can be made without departing from its scope. The scope of the application is limited only by the claims that follow.

Claims

1. An insulator shed material, characterized by, The insulator shed material is composed of an insulator shed precursor with a porous pore structure and trichlorosilane colloidal particles grafted in the pore structure, and the grafting rate is 60-100%, the grafting rate being the ratio of the surface area of the trichlorosilane colloidal particles covering the pore structure to the total surface area of the pore structure; The pore diameter of the insulator shed precursor is 1-500 μm, and the porosity is 30-60%. The particle size of the trichlorosilane colloidal particles is 50-400 nm. The flashover voltage of the insulator shed material is 22.9-26.8 kV, and the water contact angle is 146.2-155.0°.

2. The insulator shed material of claim 1, wherein The insulator shed precursor with a porous pore structure is prepared from a silicon-containing compound, a curing agent, and a pore-forming agent.

3. The insulator shed material of claim 2, wherein The silicon-containing compound is one or more of polydimethylsiloxane or addition type two-component room temperature vulcanized silicone rubber.

4. The insulator shed material of claim 2, wherein The curing agent is a curing agent matched with the silicon-containing compound.

5. The insulator shed material of claim 2, wherein The pore-forming agent is one or more of granulated sugar, soft sugar, sodium bicarbonate, and polyvinyl alcohol.

6. The insulator shed material of claim 1, wherein The raw material for preparing the trichlorosilane colloidal particles includes trichlorosilane.

7. A method of making the insulator shed material of any one of claims 1-6, characterized by, The method comprises the following steps: Step 1: preparing an insulator shed precursor with a porous pore structure by using a hard template method; Step 2: grafting trichlorosilane colloidal particles in the pore structure of the insulator shed precursor to obtain the insulator shed material.

8. The method of claim 7, wherein the insulator shed material is prepared by the steps of: Step 1 comprises the following steps: Step 1-1: uniformly mixing and stirring the silicon-containing compound, the curing agent, and the pore-forming agent to obtain a mixture; Step 1-2: curing the mixture to obtain a cured body; Step 1-3: placing the cured body into a solution without the pore-forming agent, heating, and then drying to obtain the insulator shed precursor with a porous pore structure; Step 2 comprises the following steps: Step 2-1: dissolving trichlorosilane in a solvent to obtain a trichlorosilane suspension after sufficient stirring; Step 2-2: immersing the insulator shed precursor prepared in step 1 in the trichlorosilane suspension and performing ultrasonic treatment; Step 2-3: placing the insulator shed precursor after ultrasonic treatment in air and standing still, so that trichlorosilane in the trichlorosilane suspension undergoes a hydrolysis and condensation reaction in the pore structure of the insulator shed precursor with a porous pore structure, trichlorosilane colloidal particles are formed on the pore walls of the pore structure, and a pre-reaction body is obtained; Step 2-4: continuing the hydrolysis and condensation reaction of the pre-reaction body under drying conditions to obtain the insulator shed material.

9. An insulator shed, characterized by The insulator comprises an insulator core rod and the insulator shed material according to any one of claims 1-6.

10. An outdoor high voltage power device, characterized in that, The outdoor high-voltage power equipment comprises the insulator shed according to claim 9.

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