A one-stage and two-stage switchable test structure for a hardness and silicon removal reaction tank

Abstract

The present invention discloses a first-level and second-level switchable test structure for a hardness and silicon removal reaction tank, comprising: a first-level silicon removal tank, a first-level hardness removal tank, a second-level silicon removal high-density sedimentation tank, a second-level hardness removal high-density sedimentation tank, a silicon removal water production tank, a hardness removal water production tank, a water inlet pipeline, a first-level silicon removal water supply pipeline, a first-level hardness removal water supply pipeline, a second-level silicon removal water supply pipeline, and a second-level hardness removal water supply pipeline. The water inlet pipeline is used to transport untreated wastewater to the first-level silicon removal tank or the first-level hardness removal tank; the first-level silicon removal water supply pipeline is used to transport wastewater to the first-level hardness removal tank or the second-level hardness removal high-density sedimentation tank; the first-level hardness removal water supply pipeline is used to transport wastewater to the first-level silicon removal tank or the second-level hardness removal high-density sedimentation tank; the second-level silicon removal water supply pipeline is used to transport produced water to the first-level hardness removal tank or a predetermined water storage point; the second-level hardness removal water supply pipeline is used to transport produced water to the first-level silicon removal tank or a predetermined water storage point. The present invention can test the optimal reaction sequence of the first-level / second-level hardness and silicon removal, and is simple to operate.

Description

Technical Field

[0001] The present invention relates to the technical field of wastewater treatment, in particular to a primary and secondary switchable testing structure of a hardness and silicon removal reaction tank. Background Art

[0002] At present, a large amount of industrial wastewater is generated in industrial production. The wastewater may contain a large amount of metal ions, organic matter, calcium magnesium silicon scaling factors, suspended solids, etc. Therefore, removing hardness and silicon from industrial wastewater is of great significance for protecting the environment, improving the recycling rate of water resources, and ensuring the stable operation of industrial equipment.

[0003] De-hardening (softening): refers to the removal of calcium ions (Ca 2+ ) and magnesium ions (Mg 2+ ), these two ions are the main components that cause water hardness. Hard water has many effects on industrial production and domestic water use. For example, in heat exchange systems, hard water will cause scaling, reduce thermal efficiency, and increase equipment maintenance costs. Common methods for removing hardness include: ion exchange (using ion exchange resins to replace calcium and magnesium ions in water), chemical precipitation (adding reagents (such as lime, soda ash, etc.) to water to form insoluble precipitates for calcium and magnesium ions to be removed), and distillation (evaporating water and condensing it for recovery to remove all dissolved solids in the water, including hardness ions).

[0004] Desiliconization refers to the removal of silicate and its salts from water. Although the content of silicate in water is not high, when the water is heated, the silicate forms an insoluble silica scale. This silica scale is hard and difficult to remove, forming deposits in equipment such as boilers and heat exchangers, reducing thermal efficiency and even causing equipment damage. Common desiliconization methods include: chemical coagulation (adding a coagulant to the water to cause the silicate to form flocculent precipitation), ion exchange (using specific ion exchange resins to remove silicate ions from the water), pretreatment, and reverse osmosis (removing the silica content in the water through pretreatment (such as adding acid to adjust the pH value) and reverse osmosis membrane technology).

[0005] However, for different industrial wastewaters, the concentrations of calcium and magnesium ions and calcium-magnesium-silicon scaling factors are not the same. Therefore, different industrial wastewaters require different amounts of reagent reactions. For example, for industrial wastewaters with relatively higher calcium and magnesium ions, it is necessary to increase the amount of reagents added and extend the time for the reagents to react with the wastewater. The processing volume of industrial wastewater is very large. Adding too much reagent will lead to a significant increase in cost, and too little will affect the effect of hardness and silicon removal. In addition, in order to improve the effect of hardness and silicon removal, a primary and secondary reaction tank and a sedimentation tank can be set up, wherein the optimal hardness and silicon removal sequence corresponding to each industrial wastewater will also be different, such as first-level silicon removal and then secondary silicon removal, then first-level hardness removal and then secondary hardness removal, or first-level silicon removal and then first-level hardness removal, and then secondary silicon removal and secondary hardness removal, etc. Therefore, the reaction sequence for each industrial wastewater needs to be tested to find the optimal reaction sequence to ensure wastewater treatment efficiency and reduce treatment costs. However, there is no testing structure in this regard in the prior art.

[0006] In view of this, it is necessary to provide a first-level and second-level switchable test structure for a hardness and silicon removal reaction tank to overcome the above-mentioned defects. Summary of the Invention

[0007] The purpose of the present invention is to provide a first-level and second-level switchable test structure for a hardness and silicon removal reaction tank, aiming to solve the problem of how to obtain the optimal silicon and hardness removal reaction sequence for each type of industrial wastewater, ensure the wastewater treatment effect, and reduce the treatment cost.

[0008] In order to achieve the above objectives, the present invention provides a first-level and second-level switchable test structure for a hardness and silicon removal reaction tank, comprising:

[0009] First-level silicon removal tank, first-level hardness removal tank, second-level silicon removal high-density sedimentation tank, second-level hardness removal high-density sedimentation tank;

[0010] A desiliconization water production tank, which is used to receive the water discharged from the secondary desiliconization high-density sedimentation tank;

[0011] a hardness removal water production tank, the hardness removal water production tank being used to receive the produced water discharged from the secondary hardness removal high-density sedimentation tank;

[0012] A water inlet pipeline, the water inlet pipeline is used to transport the wastewater to be treated to the primary desiliconization tank or the primary dehardness removal tank;

[0013] A primary desiliconization water pipeline, the primary desiliconization water pipeline is used to transport the wastewater treated in the primary desiliconization tank to the primary hardness removal tank or the secondary desiliconization high-density sedimentation tank;

[0014] A primary hardness removal water pipeline, the primary hardness removal water pipeline is used to transport the wastewater treated in the primary hardness removal tank to the primary silicon removal tank or the secondary hardness removal high-density sedimentation tank;

[0015] A secondary desiliconization water pipeline, which is used to transport the water produced by the desiliconization water production tank to the primary hardness removal tank or a predetermined water storage point;

[0016] The secondary desiliconization water pipeline is used to transport the water produced from the desiliconization water production tank to the primary desiliconization pool or a predetermined water storage point.

[0017] In a preferred embodiment, the water inlet pipeline includes a water inlet main line and a first water inlet branch and a second water inlet branch both connected to the water inlet main line; the first water inlet branch is connected to the first-level silicon removal tank, and the second water inlet branch is connected to the first-level hardness removal tank; the water inlet main line is provided with a water inlet pump, and the water inlet pump is used to pump the untreated wastewater in the water inlet main line into the first water inlet branch and the second water inlet branch.

[0018] In a preferred embodiment, the water inlet main line is provided with a water inlet pump bypass arranged in parallel with the water inlet pump; the water inlet pump bypass is used to return part of the untreated wastewater pumped out by the water inlet pump to the front end of the water inlet main line when the water inlet pump is running.

[0019] In a preferred embodiment, the first-level desiliconization water supply pipeline includes a first-level desiliconization main line connected to the first-level desiliconization tank at one end, a first-level desiliconization branch and a second-level desiliconization branch both connected to the first-level desiliconization main line away from the first-level desiliconization tank; the first-level desiliconization branch is connected to the first-level hardness removal tank at one end away from the first-level desiliconization main line, and the second-level desiliconization branch is connected to the second-level desiliconization high-density sedimentation tank at one end away from the first-level desiliconization main line; the first-level desiliconization main line is provided with a desiliconization pump, which is used to pump out the wastewater treated in the first-level desiliconization tank.

[0020] In a preferred embodiment, the first-level hardness removal water supply pipeline includes a first-level hardness removal main line connected to the first-level hardness removal tank at one end, a first-level hardness removal branch and a second-level hardness removal branch both connected to the first-level hardness removal main line away from the first-level hardness removal tank; the first-level hardness removal branch is connected to the first-level silicon removal tank at one end away from the first-level hardness removal main line, and the second-level hardness removal branch is connected to the second-level hardness removal high-density sedimentation tank at one end away from the first-level hardness removal main line; the first-level hardness removal main line is provided with a hardness removal pump, which is used to pump out the wastewater treated in the first-level hardness removal tank.

[0021] In a preferred embodiment, the first-level silicon removal main line is provided with a silicon removal pump bypass arranged in parallel with the silicon removal pump; the silicon removal pump bypass is used to return part of the wastewater pumped out by the silicon removal pump to the front end of the first-level silicon removal main line when the silicon removal pump is running; the first-level hardness removal main line is provided with a hardness removal pump bypass arranged in parallel with the hardness removal pump; the hardness removal pump bypass is used to return part of the wastewater pumped out by the hardness removal pump to the front end of the first-level hardness removal main line when the hardness removal pump is running.

[0022] In a preferred embodiment, the secondary desiliconization water supply pipeline includes a secondary desiliconization main line connected to the desiliconization water production tank at one end, a first secondary desiliconization branch and a second secondary desiliconization branch both connected to the secondary desiliconization main line away from the side of the desiliconization water production tank; the end of the first secondary desiliconization branch away from the secondary desiliconization main line is connected to the first hardness removal pool, and the end of the second secondary desiliconization branch away from the secondary desiliconization main line is used to connect to a predetermined water storage point; the secondary desiliconization main line is provided with a desiliconization water production pump, which is used to pump out the water in the desiliconization water production tank.

[0023] In a preferred embodiment, the secondary hardness removal water supply pipeline includes a secondary hardness removal main line connected to the hardness removal water production tank at one end, a first secondary hardness removal branch and a second secondary hardness removal branch both connected to the secondary hardness removal main line away from the hardness removal water production tank; the end of the first secondary hardness removal branch away from the secondary hardness removal main line is connected to the first silicon removal pool, and the end of the second secondary hardness removal branch away from the secondary hardness removal main line is used to be connected to a predetermined water storage point; the secondary hardness removal main line is provided with a hardness removal water production pump, and the hardness removal water production pump is used to pump out the water in the hardness removal water production tank.

[0024] In a preferred embodiment, the secondary desiliconization main line is provided with a desiliconization water production pump bypass arranged in parallel with the desiliconization water production pump; the desiliconization water production pump bypass is used to return part of the water pumped out by the desiliconization water production pump to the desiliconization water production tank when the desiliconization water production pump is running; the secondary dehardness main line is provided with a dehardness water production pump bypass arranged in parallel with the dehardness water production pump; the dehardness water production pump bypass is used to return part of the water pumped out by the dehardness water production pump to the dehardness water production tank when the dehardness water production pump is running.

[0025] In a preferred embodiment, a silicon removal water production pipeline is provided between the secondary silicon removal high-density sedimentation tank and the silicon removal water production tank, and the water overflowing from the secondary silicon removal high-density sedimentation tank after the reaction enters the silicon removal water production tank through the silicon removal water production pipeline; a hardness removal water production pipeline is provided between the secondary hardness removal high-density sedimentation tank and the hardness removal water production tank, and the water overflowing from the secondary hardness removal high-density sedimentation tank after the reaction enters the hardness removal water production tank through the hardness removal water production pipeline.

[0026] The first- and second-level switchable test structure of the hardness and silicon removal reaction tank provided by the present invention switches the flow direction of wastewater in the first-level silicon removal tank, the first-level hardness removal tank, the second-level silicon removal high-density sedimentation tank, the second-level hardness removal high-density sedimentation tank, the silicon removal water production tank, and the hardness removal water production tank through the water inlet pipeline, the first-level / secondary silicon removal water supply pipeline, and the first-level / secondary hardness removal water supply pipeline, thereby testing the optimal reaction sequence of the first-level / secondary hardness and silicon removal, and the operation is simple. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following briefly introduces the drawings required for use in the embodiments. It should be understood that the following drawings only illustrate certain embodiments of the present invention and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without paying any creative work.

[0028] Figure 1 Schematic diagram of the pipeline of the first-level and second-level switchable test structure of the hardness and silicon removal reaction tank in an exemplary embodiment.

[0029] Reference numeral 100 in the figure: a first-level and second-level switchable test structure of a hardness and silicon removal reaction tank;

[0030] 10. Primary silica removal tank; 20. Primary hardness removal tank; 30. Secondary silica removal high-density sedimentation tank; 40. Secondary hardness removal high-density sedimentation tank; 50. Silica removal water production tank; 60. Hardness removal water production tank;

[0031] 101. Silicon removal water production pipeline; 102. Hardness removal water production pipeline;

[0032] 201, water inlet main line; 202, first water inlet branch line; 203, second water inlet branch line; 204, water inlet pump; 205, water inlet pump bypass;

[0033] 301, primary desiliconization main line; 302, first primary desiliconization branch line; 303, second primary desiliconization branch line; 304, desiliconization pump; 305, desiliconization pump bypass;

[0034] 401, first-level hardness removal main line; 402, first-level hardness removal branch line; 403, second-level hardness removal branch line; 404, hardness removal pump; 405, hardness removal pump bypass;

[0035] 501, secondary desiliconization main line; 502, first and second desiliconization branch line; 503, second and second desiliconization branch line; 504, desiliconization water production pump; 505, desiliconization water production pump bypass;

[0036] 601, secondary hard water removal main line; 602, first and second hard water removal branch lines; 603, second and second hard water removal branch lines; 604, hard water removal pump; 605, hard water removal pump bypass. DETAILED DESCRIPTION

[0037] In order to make the purpose, technical solution and beneficial technical effects of the present invention more clear, the present invention is further described in detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described in this specification are only for the purpose of explaining the present invention and are not intended to limit the present invention.

[0038] It should also be understood that the terminology used in this specification is for the purpose of describing particular embodiments only and is not intended to limit the present invention. As used in the specification and appended claims, the singular forms "a," "an," and "the" are intended to include the plural forms unless the context clearly indicates otherwise.

[0039] It should be further understood that the term "and / or" used in the present description and the appended claims refers to and includes any and all possible combinations of one or more of the associated listed items.

[0040] In an embodiment of the present invention, a first-level and second-level switchable test structure 100 of a hardness and silicon removal reaction tank is provided for testing an optimal or better reaction sequence for silicon and hardness removal of target industrial wastewater.

[0041] like Figure 1 As shown, the first-level and second-level switchable test structure 100 of the hardness and silicon removal reaction tank includes: a first-level silicon removal tank 10, a first-level hardness removal tank 20, a second-level silicon removal high-density sedimentation tank 30, a second-level hardness removal high-density sedimentation tank 40, a silicon removal water production tank 50, a hardness removal water production tank 60, a water inlet pipeline, a first-level silicon removal water supply pipeline, a first-level hardness removal water supply pipeline, a second-level silicon removal water supply pipeline, and a second-level hardness removal water supply pipeline. Among them, the first-level silicon removal tank 10 is used to perform a preliminary reaction on silicate and its salts in the wastewater. The first-level hardness removal tank 20 is used to perform a preliminary reaction on calcium and magnesium ions in the wastewater. The second-level silicon removal high-density sedimentation tank 30 is used to mix, flocculate, and precipitate silicates and preliminary reaction products in the wastewater. The second-level hardness removal high-density sedimentation tank 40 is used to mix, flocculate, and precipitate calcium and magnesium ions and preliminary reaction products in the wastewater.

[0042] Specifically, the desiliconization water production tank 50 is used to receive the water discharged from the secondary desiliconization high-density sedimentation tank 30 ; the hardness removal water production tank 60 is used to receive the water discharged from the secondary hardness removal high-density sedimentation tank 40 .

[0043] A desiliconization water production pipeline 101 is provided between the secondary desiliconization high-density sedimentation tank 30 and the desiliconization water production tank 50. Water overflowing from the secondary desiliconization high-density sedimentation tank 30 after reaction flows through the desiliconization water production pipeline 101 and enters the desiliconization water production tank 50. A hardness removal water production pipeline 102 is provided between the secondary hardness removal high-density sedimentation tank 40 and the hardness removal water production tank 60. Water overflowing from the secondary hardness removal high-density sedimentation tank 40 after reaction flows through the hardness removal water production pipeline 102 and enters the hardness removal water production tank 60.

[0044] In this embodiment, the water inlet pipeline is used to transport the wastewater to be treated to the primary desiliconization tank 10 or the primary dehardness removal tank 20 .

[0045] The water inlet pipeline includes a water inlet main line 201 and a first water inlet branch line 202 and a second water inlet branch line 203 connected to the water inlet main line 201. The first water inlet branch line 202 is connected to the primary desiliconization tank 10. The second water inlet branch line 203 is connected to the primary desiliconization tank 20.

[0046] The water inlet main line 201 is provided with a water inlet pump 204, which is used to pump the untreated wastewater in the water inlet main line 201 into the first water inlet branch 202 and the second water inlet branch 203, thereby transporting the untreated wastewater to the primary desiliconization tank 10 or the primary dehardness tank 20.

[0047] Furthermore, the water inlet main line 201 is provided with a water inlet pump bypass 205 arranged in parallel with the water inlet pump 204. The water inlet pump bypass 205 is used to return part of the untreated wastewater pumped out by the water inlet pump 204 to the front end of the water inlet main line 201 when the water inlet pump 204 is running, thereby allowing the water inlet pump 204 to operate at full rated power and preventing the water inlet pump 204 from being damaged due to pressure buildup.

[0048] In this embodiment, the primary desiliconization water pipeline is used to transport the wastewater treated in the primary desiliconization tank 10 to the primary hardness removal tank 20 or the secondary desiliconization high-density sedimentation tank 30 .

[0049] Specifically, the primary desiliconization water supply pipeline includes a primary desiliconization main line 301, one end of which is connected to the primary desiliconization tank 10, and a first primary desiliconization branch line 302 and a second primary desiliconization branch line 303, both of which are connected to the primary desiliconization main line 301 on the side away from the primary desiliconization tank 10. The end of the first primary desiliconization branch line 302 away from the primary desiliconization main line 301 is connected to the primary hardness removal tank 20, and the end of the second primary desiliconization branch line 303 away from the primary desiliconization main line 301 is connected to the secondary desiliconization high-density sedimentation tank 30. The primary desiliconization main line 301 is equipped with a desiliconization pump 304, which is used to pump wastewater treated in the primary desiliconization tank 10 out so that it can be pumped into the primary hardness removal tank 20 or the secondary desiliconization high-density sedimentation tank 30.

[0050] Similarly, the primary hardness removal water pipeline is used to transport the wastewater treated in the primary hardness removal tank 20 to the primary silicon removal tank 10 or the secondary hardness removal high-density sedimentation tank 40 .

[0051] Specifically, the primary hardness removal water supply pipeline includes a primary hardness removal main line 401, one end of which is connected to the primary hardness removal tank 20, and a first primary hardness removal branch line 402 and a second primary hardness removal branch line 403, both of which are connected to the primary hardness removal main line 401 on the side away from the primary hardness removal tank 20. The end of the first primary hardness removal branch line 402 away from the primary hardness removal main line 401 is connected to the primary desiliconization tank 10, and the end of the second primary hardness removal branch line 403 away from the primary hardness removal main line 401 is connected to the secondary hardness removal high-density sedimentation tank 40. The primary hardness removal main line 401 is equipped with a hardness removal pump 404, which is used to pump the wastewater treated in the primary hardness removal tank 20 out so that it can be pumped into the primary desiliconization tank 10 or the secondary hardness removal high-density sedimentation tank 40.

[0052] Furthermore, the primary desiliconization main line 301 is provided with a desiliconization pump bypass 305 arranged in parallel with the desiliconization pump 304. The desiliconization pump bypass 305 is used to return some of the wastewater pumped out by the desiliconization pump 304 to the front end of the primary desiliconization main line 301 when the desiliconization pump 304 is in operation, thereby preventing the desiliconization pump 304 from being damaged due to pressure buildup. The primary hardness removal main line 401 is provided with a hardness removal pump bypass 405 arranged in parallel with the hardness removal pump 404. The hardness removal pump bypass 405 is used to return some of the wastewater pumped out by the hardness removal pump 404 to the front end of the primary desiliconization main line 401 when the hardness removal pump 404 is in operation, thereby preventing the hardness removal pump 404 from being damaged due to pressure buildup.

[0053] In this embodiment, the secondary desiliconization water pipeline is used to transport the water produced by the desiliconization water production tank 50 to the primary desiliconization tank 20 or a predetermined water storage point. The predetermined water storage point can be a reserved water point or a fiber ball filter.

[0054] Specifically, the secondary desiliconization water pipeline includes a secondary desiliconization main line 501, one end of which is connected to the desiliconization water production tank 50, and a first secondary desiliconization branch line 502 and a second secondary desiliconization branch line 503, both of which are connected to the secondary desiliconization main line 501 on the side away from the desiliconization water production tank 50. The end of the first secondary desiliconization branch line 502 away from the secondary desiliconization main line 501 is connected to the primary hardness removal tank 20, while the end of the second secondary desiliconization branch line 503 away from the secondary desiliconization main line 501 is connected to a predetermined water storage point. The secondary desiliconization main line 501 is equipped with a desiliconization water production pump 504, which is used to pump the water from the desiliconization water production tank 50 into the primary hardness removal tank 20 or directly discharge it to a predetermined external water storage point.

[0055] In this embodiment, the secondary desiliconization water pipeline is used to transport the water produced by the desiliconization water production tank 60 to the primary desiliconization tank 10 or a predetermined water storage point. The predetermined water storage point can be a reserved water point or a fiber ball filter.

[0056] Specifically, the secondary de-hardening water pipeline includes a secondary de-hardening main line 601, one end of which is connected to the de-hardening produced water tank 60, and a first secondary de-hardening branch line 602 and a second secondary de-hardening branch line 603, both of which are connected to the secondary de-hardening main line 601 on the side away from the de-hardening produced water tank 60. The end of the first secondary de-hardening branch line 602 away from the secondary de-hardening main line 601 is connected to the primary desiliconization tank 10, while the end of the second secondary de-hardening branch line 603 away from the secondary de-hardening main line 601 is connected to a predetermined water storage point. The secondary de-hardening main line 601 is equipped with a de-hardening produced water pump 604, which is used to pump the produced water from the de-hardening produced water tank 60 into the primary desiliconization tank 10 or directly discharge it to a predetermined external water storage point.

[0057] Furthermore, the secondary desiliconization main circuit 501 is equipped with a desiliconization pump bypass 505, which is connected in parallel with the desiliconization pump 504. This bypass 505 is used to return some of the water pumped out by the desiliconization pump 504 to the desiliconization tank 50 when the desiliconization pump 504 is in operation, thereby preventing damage to the desiliconization pump 504 due to pressure buildup. The secondary de-hardening main circuit 601 is equipped with a de-hardening pump bypass 605, which is connected in parallel with the de-hardening pump 604. This bypass 605 is used to return some of the water pumped out by the de-hardening pump 604 to the de-hardening tank 60 when the de-hardening pump 604 is in operation, thereby preventing damage to the de-hardening pump 604 due to pressure buildup.

[0058] It should be noted that each trunk line, branch line, and bypass line described in the present invention is provided with a corresponding valve structure for controlling the on / off of the pipeline itself.

[0059] For example, if the process is first primary desiliconization, then secondary desiliconization, and then primary hardness removal, then secondary hardness removal, the process is as follows: the wastewater to be treated passes through the water inlet main line 201, the first water inlet branch line 202, the primary desiliconization tank 10, the primary desiliconization main line 301, the second primary desiliconization branch line 303, the secondary desiliconization high-density sedimentation tank 30, the desiliconization water production pipeline 101, the desiliconization water production tank 50, the secondary desiliconization main line 501, the first and second desiliconization branches 502, the primary hardness removal tank 20, the primary hardness removal main line 401, the second primary hardness removal branch line 403, the secondary hardness removal high-density sedimentation tank 40, the hardness removal water production pipeline 102, and the hardness removal water production tank 60 in sequence;

[0060] For another example, if the first level hardness removal and then the first level silicon removal are performed, and then the second level silicon removal and then the first level hardness removal and the second level hardness removal are performed, the process is as follows: the wastewater to be treated passes through the water inlet main line 201, the second water inlet branch line 203, the first level hardness removal tank 20, the first level hardness removal main line 401, the first level hardness removal branch line 402, the first level silicon removal tank 10, the first level silicon removal main line 301, the second level silicon removal branch line 303, the second level silicon removal high-density sedimentation tank 30, the silicon removal water production pipeline 101, the silicon removal water production tank 50, the second level silicon removal main line 501, the first and second level silicon removal branches 502, the first level hardness removal tank 20, the first level hardness removal main line 401, the second level hardness removal branch line 403, the second level hardness removal high-density sedimentation tank 40, the hardness removal water production pipeline 102, and the hardness removal water production tank 60.

[0061] Of course, the combination of test processes is not limited to the above exemplary embodiments, and will not be listed one by one here.

[0062] To sum up, the first-level and second-level switchable test structure 100 of the hardness and silicon removal reaction tank provided by the present invention switches the flow direction of wastewater in the first-level silicon removal tank 10, the first-level silicon removal tank 20, the second-level silicon removal high-density sedimentation tank 30, the second-level hardness removal high-density sedimentation tank 40, the silicon removal water production tank 50, and the hardness removal water production tank 60 through the water inlet pipeline, the first-level / secondary silicon removal water supply pipeline, and the first-level / secondary hardness removal water supply pipeline, thereby testing the optimal reaction sequence of the first-level / secondary hardness and silicon removal, and the operation is simple.

[0063] The present invention is not limited to what is described in the specification and embodiments, and additional advantages and modifications will be readily apparent to those skilled in the art. Therefore, the present invention is not limited to the specific details, representative devices, and illustrative examples shown and described herein without departing from the spirit and scope of the general concept defined by the claims and their equivalents.

Claims

1. A one-stage and two-stage switchable test structure for a hardness and silicon removal reaction tank, characterized in that: include: First-level silicon removal tank, first-level hardness removal tank, second-level silicon removal high-density sedimentation tank, second-level hardness removal high-density sedimentation tank; A desiliconization water production tank, which is used to receive the water discharged from the secondary desiliconization high-density sedimentation tank; a hardness removal water production tank, the hardness removal water production tank being used to receive the produced water discharged from the secondary hardness removal high-density sedimentation tank; A water inlet pipeline, the water inlet pipeline is used to transport the wastewater to be treated to the primary desiliconization tank or the primary dehardness removal tank; A primary desiliconization water pipeline, the primary desiliconization water pipeline is used to transport the wastewater treated in the primary desiliconization tank to the primary hardness removal tank or the secondary desiliconization high-density sedimentation tank; A primary hardness removal water pipeline, the primary hardness removal water pipeline is used to transport the wastewater treated in the primary hardness removal tank to the primary silicon removal tank or the secondary hardness removal high-density sedimentation tank; A secondary desiliconization water pipeline, which is used to transport the water produced by the desiliconization water production tank to the primary hardness removal tank or a predetermined water storage point; The secondary desiliconization water pipeline is used to transport the water produced from the desiliconization water production tank to the primary desiliconization pool or a predetermined water storage point.

2. The one-stage and two-stage switchable test structure of the hardness and silicon removal reaction pool according to claim 1, characterized in that: The water inlet pipeline includes a water inlet main line and a first water inlet branch and a second water inlet branch both connected to the water inlet main line; the first water inlet branch is connected to the first-level silicon removal tank, and the second water inlet branch is connected to the first-level hardness removal tank; the water inlet main line is provided with a water inlet pump, which is used to pump the untreated wastewater in the water inlet main line into the first water inlet branch and the second water inlet branch.

3. The one-stage and two-stage switchable test structure of the hardness and silicon removal reaction pool according to claim 2, characterized in that: The water inlet main line is provided with a water inlet pump bypass arranged in parallel with the water inlet pump; the water inlet pump bypass is used to return part of the untreated wastewater pumped out by the water inlet pump to the front end of the water inlet main line when the water inlet pump is running.

4. The one-stage and two-stage switchable test structure of the hardness and silicon removal reaction pool according to claim 1, characterized in that: The first-level desiliconization water supply pipeline includes a first-level desiliconization main line connected to the first-level desiliconization tank at one end, a first-level desiliconization branch and a second-level desiliconization branch both connected to the first-level desiliconization main line away from the first-level desiliconization tank; the first-level desiliconization branch is connected to the first-level hardness removal tank at one end away from the first-level desiliconization main line, and the second-level desiliconization branch is connected to the second-level desiliconization high-density sedimentation tank at one end away from the first-level desiliconization main line; the first-level desiliconization main line is provided with a desiliconization pump, which is used to pump out the wastewater treated in the first-level desiliconization tank.

5. The one-stage and two-stage switchable test structure of the hardness and silicon removal reaction tank according to claim 4, characterized in that: The first-level hardness removal water supply pipeline includes a first-level hardness removal main line connected to the first-level hardness removal tank at one end, a first-level hardness removal branch line and a second-level hardness removal branch line both connected to the first-level hardness removal main line away from the first-level hardness removal tank; the first-level hardness removal branch line is connected to the first-level silicon removal tank at one end away from the first-level hardness removal main line, and the second-level hardness removal branch line is connected to the second-level hardness removal high-density sedimentation tank at one end away from the first-level hardness removal main line; the first-level hardness removal main line is provided with a hardness removal pump, which is used to pump out the wastewater treated in the first-level hardness removal tank.

6. The one-stage and two-stage switchable test structure of the hardness and silicon removal reaction tank according to claim 5, characterized in that: The first-level desiliconization main line is provided with a desiliconization pump bypass arranged in parallel with the desiliconization pump; the desiliconization pump bypass is used to return part of the wastewater pumped out by the desiliconization pump to the front end of the first-level desiliconization main line when the desiliconization pump is running; the first-level hardness removal main line is provided with a hardness removal pump bypass arranged in parallel with the hardness removal pump; the hardness removal pump bypass is used to return part of the wastewater pumped out by the hardness removal pump to the front end of the first-level hardness removal main line when the hardness removal pump is running.

7. The one-stage and two-stage switchable test structure of the hardness and silicon removal reaction pool according to claim 1, characterized in that: The secondary desiliconization water pipeline includes a secondary desiliconization trunk line connected to the desiliconization water production tank at one end, a first secondary desiliconization branch line and a second secondary desiliconization branch line both connected to the secondary desiliconization trunk line away from the desiliconization water production tank. The end of the first secondary desiliconization branch away from the secondary desiliconization main road is connected to the first hardness removal pool, and the end of the second secondary desiliconization branch away from the secondary desiliconization main road is used to connect with a predetermined water storage point; the secondary desiliconization main road is provided with a desiliconization water production pump, and the desiliconization water production pump is used to pump out the water in the desiliconization water production tank.

8. The one-stage and two-stage switchable test structure of the hardness and silicon removal reaction pool according to claim 7, characterized in that: The secondary hardness removal water supply pipeline includes a secondary hardness removal main line connected to the hardness removal water production tank at one end, a first secondary hardness removal branch and a second secondary hardness removal branch both connected to the secondary hardness removal main line away from the side of the hardness removal water production tank; the first secondary hardness removal branch is connected to the primary silicon removal pool at one end away from the secondary hardness removal main line, and the second secondary hardness removal branch is used to connect to a predetermined water storage point at one end away from the secondary hardness removal main line; the secondary hardness removal main line is provided with a hardness removal water production pump, which is used to pump out the water in the hardness removal water production tank.

9. The one-stage and two-stage switchable test structure of the hardness and silicon removal reaction pool according to claim 8, characterized in that: The secondary desiliconization main line is provided with a desiliconization water production pump bypass arranged in parallel with the desiliconization water production pump; the desiliconization water production pump bypass is used to return part of the water pumped out by the desiliconization water production pump to the desiliconization water production tank when the desiliconization water production pump is running; the secondary dehardness water production main line is provided with a dehardness water production pump bypass arranged in parallel with the dehardness water production pump; the dehardness water production pump bypass is used to return part of the water pumped out by the dehardness water production pump to the dehardness water production tank when the dehardness water production pump is running.

10. The one-stage and two-stage switchable test structure of the hardness and silicon removal reaction pool according to claim 1, characterized in that: A desiliconization water production pipeline is provided between the secondary desiliconization high-density sedimentation tank and the desiliconization water production tank, and the water overflowing from the secondary desiliconization high-density sedimentation tank after the reaction enters the desiliconization water production tank through the desiliconization water production pipeline; a hardness removal water production pipeline is provided between the secondary hardness removal high-density sedimentation tank and the hardness removal water production tank, and the water overflowing from the secondary hardness removal high-density sedimentation tank after the reaction enters the hardness removal water production tank through the hardness removal water production pipeline.

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