Evaporation line source crucible and evaporation equipment

Abstract

The invention provides an evaporation line source crucible and evaporation device.The evaporation line source crucible comprises a crucible body and a cover which covers the top of the crucible body and is provided with a nozzle, the crucible body comprises an upper crucible body and a lower crucible body connected to the bottom of the upper crucible body, and the lower crucible body comprises a plurality of sub crucible bodies arranged at intervals in the length direction; a heating component is arranged on the outer wall of each sub-crucible body, so that the heating temperature and the heating efficiency of each sub-crucible body can be independently controlled by independently controlling the heating component outside each sub-crucible body, the temperature of each sub-crucible body is ensured to be relatively consistent under independent control, the temperature uniformity in the crucible is improved, and the service life of the crucible is prolonged. The vaporization uniformity of an evaporation material in the crucible is improved, and finally the thickness uniformity of a film layer is improved; the plurality of sub-crucible bodies are arranged at intervals, so that the phenomenon of heat transfer between the sub-crucible bodies is basically avoided, the temperatures in the sub-crucible bodies are not mutually influenced, and the independence and the accuracy of internal temperature control of the sub-crucible bodies are improved.

Description

Technical Field

[0001] The present application relates to the technical field of evaporation equipment, and in particular to an evaporation line source crucible and evaporation equipment. Background Art

[0002] Organic light-emitting diodes (OLEDs) have the advantages of high contrast, wide viewing angle, fast response time, flexible and thin design, low power consumption, no need for backlight, eco-friendly, high color saturation, etc., and are widely used in the field of high-performance display technology. In the current vacuum evaporation preparation of OLED devices, the line source crucible is used as the evaporation source of the evaporation equipment. The material to be evaporated is placed in the crucible of the vacuum evaporation source device. By heating the crucible, the atoms, atomic groups or molecules of the material are transformed from solid to gaseous, overflowing through the nozzle on the crucible cover, and then condensed onto the surface of the substrate to be coated to form a thin film, which is used to realize the light emission of OLED devices. Summary of the invention

[0003] In view of this, the purpose of the present application is to provide an evaporation line source crucible and an evaporation device.

[0004] Based on the above-mentioned purpose, the first aspect of the present application provides a evaporation line source crucible, comprising: a crucible body with an open top and a hollow structure formed inside, a cover body arranged on the top of the crucible body and provided with a nozzle, the crucible body comprising an upper crucible body and a lower crucible body connected to the bottom of the upper crucible body, the lower crucible body comprising a plurality of sub-crucible bodies arranged at intervals along the length direction, and the outer wall of each sub-crucible is provided with a heating assembly.

[0005] Optionally, a first airflow balancing plate is further included, which is arranged along the length direction of the upper crucible body and connected to the inner wall of the upper crucible body, and the first airflow balancing plate is provided with a plurality of first airflow holes.

[0006] Optionally, a plurality of airflow regulating components are further included, and the plurality of airflow regulating components correspond one-to-one to the plurality of sub-crumbs, and each of the airflow regulating components is arranged on the top of the corresponding sub-crumb body and forms a balancing gap with the first airflow balancing plate.

[0007] Optionally, in the height direction of the evaporation line source crucible, the ratio of the size of the balance gap to the size of the lower crucible body is 0.5:10 to 2:10.

[0008] Optionally, the airflow regulating assembly includes a second airflow balancing plate, which is connected to the inner wall of the corresponding sub-crucible body, and is provided with a plurality of second airflow holes, wherein the aperture of the second airflow holes is smaller than the aperture of the first airflow holes.

[0009] Optionally, the first air flow holes and the second air flow holes are arranged alternately.

[0010] Optionally, in the length direction of the evaporation line source crucible, the first sub-crubbing body and the last sub-crubbing body are both called edge crucibles, and the sub-crubbing bodies except the first sub-crubbing body and the last sub-crubbing body are all called intermediate crucibles, and the aperture of the second air flow hole on the second air flow balancing plate corresponding to the intermediate crucible is smaller than the aperture of the second air flow hole on the second air flow balancing plate corresponding to the edge crucible.

[0011] Optionally, the airflow adjustment assembly includes a support rod and a plurality of adjustment blades rotatably connected to the support rod, the support rod is connected to the inner wall of the corresponding sub-crumb body, and the adjustment blades can rotate relative to the support rod to adjust the opening size of the top of the sub-crumb body.

[0012] Optionally, a heat-insulating gap is formed between outer walls of two adjacent sub-crumbs, and a size of the heat-insulating gap is 5 to 10 cm in the length direction of the lower crucible.

[0013] Optionally, a plurality of heat insulation plates are further included, and the plurality of heat insulation plates correspond one-to-one to the plurality of heat insulation gaps. The heat insulation plates are located in the corresponding heat insulation gaps and are not in contact with the outer walls of the adjacent sub-crumbs and the heating assembly.

[0014] Optionally, it further comprises a crucible support seat, the crucible support seat is provided with a support groove, the crucible body is located in the support groove, and the heat insulation plate is connected to the inner wall of the support groove.

[0015] A second aspect of the present application provides an evaporation device, comprising the evaporation line source crucible as described in any one of the first aspects above.

[0016] From the above, it can be seen that the evaporation line source crucible and evaporation equipment provided by the present application, the evaporation line source crucible includes a crucible body, a cover body arranged on the top of the crucible body and provided with a nozzle, the crucible body includes an upper crucible body and a lower crucible body connected to the bottom of the upper crucible body, the lower crucible body includes a plurality of sub-crucifixes arranged at intervals along the length direction, and the outer wall of each sub-crucifix is ​​provided with a heating component, so that the heating temperature and heating efficiency of each sub-crucifix can be independently controlled by independently controlling the heating component outside each sub-crucifix, ensuring that the temperature of each sub-crucifix is ​​relatively consistent under independent control, thereby improving the temperature uniformity in the crucible, and then improving the vaporization uniformity of the evaporation material in the crucible, and finally improving the uniformity of the thickness of the film layer formed on the surface of the substrate; at the same time, the spacing of the multiple sub-crucifixes can ensure that there is basically no heat transfer between each sub-crucifix, so that the temperature inside each sub-crucifix will not affect each other, thereby improving the independence and accuracy of the internal temperature control of each sub-crucifix. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the technical solutions in the present application or related technologies, the drawings required for use in the embodiments or related technical descriptions are briefly introduced below. Obviously, the drawings described below are only embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0018] Figure 1 This is a schematic structural diagram of an evaporation line source crucible according to an embodiment of the present application;

[0019] Figure 2 This is a first cross-sectional schematic diagram of the evaporation line source crucible according to an embodiment of the present application;

[0020] Figure 3 A second cross-sectional schematic diagram of the evaporation line source crucible according to an embodiment of the present application;

[0021] Figure 4 A third cross-sectional schematic diagram of the evaporation line source crucible according to an embodiment of the present application;

[0022] Figure 5 This is a fourth cross-sectional schematic diagram of the evaporation line source crucible according to an embodiment of the present application.

[0023] In the figure: 1, crucible body; 11, lower crucible body; 111, sub-crucible body; 111a, edge crucible body; 111b, middle crucible body; 12, upper crucible body; 2, cover body; 21, nozzle; 3, heating assembly; 4, insulation board; 5, first airflow balancing plate; 51, first airflow hole; 6, airflow adjustment assembly; 6′, second airflow balancing plate; 61, second airflow hole; 62, support rod; 63, adjustment blade; 7, support seat; 8, balance gap; 9, insulation gap. DETAILED DESCRIPTION

[0024] In order to make the objectives, technical solutions and advantages of the present application more clearly understood, the present application is further described in detail below in combination with specific embodiments and with reference to the accompanying drawings.

[0025] It should be noted that, unless otherwise defined, the technical terms or scientific terms used in the embodiments of the present application should be the usual meanings understood by people with ordinary skills in the field to which the present application belongs. The "first", "second" and similar words used in the embodiments of the present application do not represent any order, quantity or importance, but are only used to distinguish different components. "Including" or "comprising" and similar words mean that the elements or objects appearing in front of the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0026] In the current vacuum evaporation preparation of OLED devices, a line source crucible is used as the evaporation source of the evaporation equipment. The material to be evaporated is placed in the crucible of the vacuum evaporation source device. By heating the crucible, the atoms, atomic groups or molecules of the material are transformed from solid to gaseous and overflow from the nozzle on the crucible cover. They are then condensed onto the surface of the substrate to be coated to form a thin film, which is used to realize the luminescence of the OLED device.

[0027] In the mass production process of OLED, line source scanning evaporation is mainly used. In order to make the produced screens have the same performance, the thickness of the film deposited on the substrate is required to be as uniform as possible. The uniformity of the film thickness is closely related to the line source used.

[0028] The line sources currently used are usually organic materials, which are usually polymers or small molecules. They have relatively poor thermal conductivity. When heated in the crucible, the material near the side wall of the crucible heats up and vaporizes first, while the temperature of the material in the middle needs to continue to transfer heat from the outside to reach the same temperature as the outside. Therefore, the line sources located at both ends of the crucible are prone to heat concentration, which will cause poor temperature uniformity in the crucible, and then cause uneven vaporization of the evaporation material in the crucible, and finally lead to poor uniformity of the thickness of the film layer formed on the surface of the substrate, reducing the uniformity of the substrate film. This phenomenon becomes more and more obvious as the size of the evaporation source increases. In addition, since the line sources located at both ends of the crucible are prone to heat concentration, it is easy to cause the line sources at both ends of the crucible to be partially burned out at the end of production, which seriously affects the progress of mass production.

[0029] Therefore, how to improve the temperature uniformity in the crucible is an urgent problem to be solved.

[0030] Based on this, see Figure 1The present application provides a evaporation line source crucible, comprising: a crucible body 1 with an open top and a hollow structure formed inside, a cover body 2 which is arranged on the top of the crucible body 1 and is provided with a nozzle 21, the crucible body 1 comprises an upper crucible body 12 and a lower crucible body 11 connected to the bottom of the upper crucible body 12, the lower crucible body 11 comprises a longitudinal direction (i.e. Figure 1 A plurality of sub-cruciforms 111 are spaced apart from each other (in the direction indicated by A in FIG), and a heating component 3 is disposed on the outer wall of each sub-cruciform 111.

[0031] Specifically, the crucible body 1 has an open top and a hollow structure formed inside, and the hollow structure inside is used to place the evaporation line source. The cover body 2 is provided on the top of the crucible body 1 to close the top opening of the crucible body 1. A nozzle 21 is provided on the top of the cover body 2, and the evaporation line source in the hollow structure is heated and vaporized and then ejected from the nozzle 21.

[0032] The crucible body 1 includes an upper crucible 12 and a lower crucible 11 connected to the bottom of the upper crucible 12. The lower crucible 11 includes a plurality of sub-crucifixes 111 spaced apart along the length direction, and each of the sub-crucifixes 111 is used to place a vapor deposition line source. The plurality of sub-crucifixes 111 are spaced apart along the length direction, so that heat transfer basically does not occur between each sub-crucifix 111, and the temperature inside each sub-crucifix 111 does not affect each other, thereby improving the independence and accuracy of the internal temperature control of each sub-crucifix 111.

[0033] The outer wall of each sub-crucifix 111 is provided with a heating component 3, and the heating component 3 can be an electric heating wire, etc. Each heating component 3 is independently controlled, and the heating temperature and heating efficiency of each sub-crucifix 111 can be independently controlled, so as to independently control the temperature of each independent sub-crucifix 111. In this way, for the sub-crucifix 111 located in the middle, it can also be directly heated by its corresponding heating component 3, and there will be no phenomenon that the sub-crucifix 111 in the middle is heated slowly, while the sub-crucifix 111 at the edge is heated quickly, thereby ensuring that the temperature of each sub-crucifix 111 is relatively consistent under independent control, improving the temperature uniformity in the crucible, thereby improving the vaporization uniformity of the evaporation material in the crucible, and finally improving the uniformity of the thickness of the film layer formed on the surface of the substrate.

[0034] In the present application, the evaporation line source crucible includes a crucible body 1, a cover body 2 which is covered on the top of the crucible body 1 and is provided with a nozzle 21, the crucible body 1 includes an upper crucible body 12 and a lower crucible body 11 connected to the bottom of the upper crucible body 12, the lower crucible body 11 includes a plurality of sub-crucifixes 111 arranged at intervals along the length direction, and the outer wall of each of the sub-crucifixes 111 is provided with a heating component 3, so that the heating temperature and heating efficiency of each sub-crucifix 111 can be independently controlled by independently controlling the heating component 3 outside each sub-crucifix 111, ensuring that the temperature of each sub-crucifix 111 is relatively consistent under independent control, thereby improving the temperature uniformity in the crucible, thereby improving the vaporization uniformity of the evaporation material in the crucible, and finally improving the uniformity of the thickness of the film layer formed on the surface of the substrate; at the same time, the plurality of sub-crucifixes 111 are arranged at intervals to ensure that there is basically no heat transfer between each sub-crucifix 111, so that the temperature inside each sub-crucifix 111 will not affect each other, thereby improving the independence and accuracy of the internal temperature control of each sub-crucifix 111.

[0035] In some embodiments, see Figure 2 The evaporation line source crucible also includes a first airflow balancing plate 5, which is arranged along the length direction of the upper crucible body 12 (i.e. Figure 2 The first airflow balancing plate 5 is arranged in the direction shown by A in FIG. 1 and connected to the inner wall of the upper crucible body 12 , and a plurality of first airflow holes 51 are provided on the first airflow balancing plate 5 .

[0036] Specifically, the first airflow balancing plate 5 is located in the upper crucible 12 and completely covers the top opening of the upper crucible 12, and the first airflow balancing plate 5 is connected to the inner wall of the upper crucible 12, so that the evaporation line source in each sub-crucifix 111 rises to the top of the sub-crucifix 111 after being heated and vaporized, and then continues to pass through the first airflow hole 51 of the first airflow balancing plate 5 and is ejected from the nozzle 21 of the cover body 2.

[0037] The first airflow balancing plate 5 is provided with a plurality of first airflow holes 51, and the plurality of first airflow holes 51 are evenly distributed, and the number of airflow holes distributed on the top of each sub-crubbing body 111 is the same. In this way, the evenly distributed plurality of first airflow holes 51 can make the distribution of the heated and vaporized evaporation line source flowing through the first airflow balancing plate 5 more even, thereby making the amount of the evaporation line source evaporated from each sub-crubbing body 111 more consistent and uniform, which can further improve the uniformity of the thickness of the film layer formed on the surface of the substrate.

[0038] In some embodiments, see Figure 3 and Figure 4As shown, the evaporation line source crucible also includes a plurality of airflow regulating components 6, and the plurality of airflow regulating components 6 correspond one-to-one to the plurality of sub-crucible bodies 111. Each of the airflow regulating components 6 is arranged at the top of the corresponding sub-crucible body 111 and a balancing gap 8 is formed between the first airflow balancing plate 5.

[0039] Specifically, the plurality of airflow regulating components 6 correspond one-to-one to the plurality of sub-crubbing bodies 111, that is, each sub-crubbing body 111 corresponds to an airflow regulating component 6, and each of the airflow regulating components 6 is arranged at the top of the corresponding sub-crubbing body 111 and a balancing gap 8 is formed between the first airflow balancing plate 5. In this way, the airflow regulating component 6 can perform a first adjustment on the gaseous evaporation line source evaporated from the top of the corresponding sub-crubbing body 111 to control the discharge amount of the evaporation material in each sub-crubbing body 111, so that the evaporation material is initially homogenized when moving out of the sub-crubbing body 111, and then the gaseous material evaporated from all the sub-crubbing bodies 111 continues to be homogenized for the second time by the first airflow balancing plate 5 and is discharged from the nozzle 21. In this way, the uniformity of the material sprayed out of each sub-crubbing body 111 can be further improved, thereby improving the thickness uniformity of the film layer formed by evaporation onto the substrate.

[0040] In addition, each of the airflow regulating components 6 is arranged on the top of the corresponding sub-crubbing body 111, so that the amount of gaseous material evaporated in each sub-crubbing body 111 can be controlled individually by controlling each of the airflow regulating components 6. In this way, when the film thickness of the substrate obtained by final evaporation is required to be relatively uniform, the airflow amount of the airflow regulating components 6 corresponding to each sub-crubbing body 111 can be controlled to be consistent, so that the amount of gaseous material evaporated in each sub-crubbing body 111 is consistent, so that the film thickness of the substrate obtained by final evaporation is relatively uniform; when the film layer of some parts of the substrate obtained by final evaporation is required to be thicker and the film layer of other parts is thinner, the airflow amount of the airflow regulating components 6 corresponding to the sub-crubbing body 111 corresponding to the position with thicker film layer can be independently controlled to be larger, while the airflow amount of the airflow regulating components 6 corresponding to the sub-crubbing body 111 corresponding to the position with thinner film layer can be smaller, so that the film thickness of the substrate obtained by final evaporation can be flexibly controlled.

[0041] A balancing gap 8 is formed between each of the airflow regulating components 6 and the first airflow balancing plate 5, so that the gaseous material passing through the airflow regulating component 6 can pass through the balancing gap 8 and then enter the first airflow balancing plate 5. The setting of the balancing gap 8 allows the gaseous material passing through the airflow regulating component 6 to have a certain distance for uniform mixing, and then enter the first airflow balancing plate 5 for secondary homogenization, which can significantly improve the uniformity of the gaseous material finally evaporated from the second airflow balancing plate 6'.

[0042] In addition, a balancing gap 8 is formed between each of the airflow adjustment components 6 and the first airflow balancing plate 5, which can ensure that there is no interference between the airflow adjustment component 6 and the first airflow balancing plate 5 when adjusting the airflow volume of the airflow adjustment component 6, thereby ensuring that the airflow volume of the airflow adjustment component 6 can be flexibly adjusted.

[0043] In some embodiments, see Figure 3 As shown, in the height direction of the evaporation line source crucible (i.e. Figure 3 In the B direction), the ratio of the size of the balancing gap 8 to the size of the lower crucible 11 is 0.5:10 to 2:10.

[0044] Specifically, when the ratio of the size of the balancing gap 8 to the size of the lower crucible 11 is 0.5:10 to 2:10, the size of the balancing gap 8 is moderate, which can ensure that there is no interference between the airflow adjustment component 6 and the first airflow balance plate 5, and ensure that the gaseous material evaporated from the airflow adjustment component 6 can quickly enter the first airflow balance plate 5 without blocking the first airflow hole 51 on the first airflow balance plate 5.

[0045] When the ratio of the size of the balancing gap 8 to the size of the lower crucible 11 is less than 0.5:10, the size of the balancing gap 8 is too small, which may cause interference between the airflow adjustment component 6 and the first airflow balance plate 5 when adjusting the airflow adjustment component 6, thereby making it impossible to flexibly adjust the airflow adjustment component 6.

[0046] When the ratio of the size of the balancing gap 8 to the size of the lower crucible 11 is greater than 2:10, the size of the balancing gap 8 is too large, so that the gaseous material evaporated from the airflow regulating component 6 needs a long time to enter the first airflow balancing plate 5, and the long time will cause the temperature of the gaseous material to drop and solidify, which may cause the material to block the first airflow hole 51 on the first airflow balancing plate 5 when passing through the first airflow balancing plate 5, thereby reducing the amount of air evaporated from the first airflow hole 51.

[0047] Exemplarily, the ratio of the size of the balancing gap 8 to the size of the lower crucible 11 can be 0.5:10, 0.6:10, 0.7:10, 0.8:10, 0.9:10, 1.0:10, 1.1:10, 1.2:10, 1.3:10, 1.4:10, 1.5:10, 1.6:10, 1.7:10, 1.8:10, 1.9:10, 2.0:10, etc.

[0048] In some embodiments, see Figure 3As shown, the airflow regulating assembly 6 includes a second airflow balancing plate 6', which is connected to the inner wall of the corresponding sub-crumb body 111, and a plurality of second airflow holes 61 are provided on the second airflow balancing plate 6', and the aperture of the second airflow hole 61 is smaller than the aperture of the first airflow hole 51.

[0049] Specifically, the second airflow balancing plate 6' is located in the corresponding sub-crubbing body 111 and completely covers the top opening of the sub-crubbing body 111, and the second airflow balancing plate 6' is connected to the inner wall of the corresponding sub-crubbing body 111, so that the evaporation line source in each sub-crubbing body 111 rises to the top of the sub-crubbing body 111 after being heated and vaporized, and then passes through the second airflow holes 61 on the second airflow balancing plate 6'. The second airflow holes 61 evenly distributed on the top of the sub-crubbing body 111 can control the discharge amount of the heated and vaporized evaporation line source flowing through the second airflow balancing plate 6' and make the gas material discharged from each position tend to be uniform, thereby improving the uniformity of the thickness of the film layer formed on the surface of the substrate.

[0050] The aperture of the second air flow hole 61 is smaller than that of the first air flow hole 51. Thus, on one hand, the aperture of the second air flow hole 61 is smaller, while the aperture of the first air flow hole 51 is larger. Thus, the first air flow hole 51 and the second air flow hole 61 can gradually release the vacuum pressure inside the sub-crucifix 111, thereby preventing the vacuum pressure inside the sub-crucifix 111 from being released too much at one time, causing too much gaseous material inside the sub-crucifix 111 to be ejected, making it difficult to control the amount of gas discharged. On the other hand, since the gaseous material evaporated in the sub-cruciform 111 first passes through the second airflow balance plate 6' and then passes through the first airflow balance plate 5, the temperature of the gaseous material is still relatively high when passing through the second airflow balance plate 6', and the gaseous material remains in a high-temperature gaseous form, so it can pass through the smaller second airflow hole 61 on the second airflow balance plate 6', and the temperature of the gaseous material gradually decreases when passing through the first airflow balance plate 5, resulting in partial solidification of the material. Therefore, the aperture of the first airflow hole 51 on the first airflow balance plate 5 needs to be larger to ensure that the material can pass through the first airflow hole 51 and will not block the first airflow hole 51. If the aperture of the first airflow hole 51 is small, the material may block the first airflow hole 51 when passing through it, resulting in a reduction in the amount of material ejected, thereby affecting the uniformity of the film layer finally obtained by evaporation.

[0051] In some embodiments, the first air flow holes 51 and the second air flow holes 61 are arranged alternately, so that the material passing through the second air flow holes 61 does not directly enter the first air flow holes 51, but needs to pass through a certain curved route before flowing out of the first air flow holes 51, so as to improve the mixing uniformity of the gas material.

[0052] In some embodiments, see Figure 3, in the length direction of the evaporation line source crucible (i.e. Figure 3 In the direction shown by A in the figure, the first sub-crubbing body 111 and the last sub-crubbing body 111 are both called edge crucibles 111a, and the other sub-crubbing bodies 111 except the first sub-crubbing body 111 and the last sub-crubbing body 111 are all called intermediate crucibles 111b, and the aperture of the second air flow hole 61 on the second air flow balancing plate 6′ corresponding to the intermediate crucible 111b is smaller than the aperture of the second air flow hole 61 on the second air flow balancing plate 6′ corresponding to the edge crucible 111a.

[0053] Specifically, although a plurality of sub-crumbs 111 are arranged at intervals, there is a certain gap between adjacent sub-crumbs 111 to avoid the temperature of adjacent sub-crumbs 111 from affecting each other as much as possible. However, in specific implementation, since both sides of the middle crucible 111b are adjacent to the sub-crumbs 111, and only one side of the edge crucible 111a is adjacent to the sub-crumb 111, the temperature of the middle crucible 111b is more likely to be affected by the adjacent sub-crumbs 111 on both sides. Therefore, when the heating temperature of the heating assembly 3 is the same, the temperature in the middle crucible 111b may be slightly higher than the temperature of the edge crucible 111a. In this case, if the temperature of the middle crucible 111b is slightly higher and the temperature of the edge crucible 111a is lower, the evaporation line source in the middle crucible 111b will heat up faster and evaporate faster, while the evaporation line source in the edge crucible 111a will heat up slower and evaporate slower. In this way, the material output in the middle crucible 111b will be greater than the material output in the edge crucible 111a in the same period of time, resulting in insufficient thickness uniformity of the film layer finally obtained by evaporation.

[0054] Based on this problem, in the present application, the aperture of the second air flow hole 61 on the second air flow balance plate 6′ corresponding to the middle crucible 111b can be controlled to be smaller than the aperture of the second air flow hole 61 on the second air flow balance plate 6′ corresponding to the edge crucible 111a. In this way, the smaller aperture of the second air flow hole 61 corresponding to the middle crucible 111b can slightly reduce the discharge amount of the middle crucible 111b, and then neutralize the larger evaporation amount caused by the faster temperature rise in the middle crucible 111b, so as to control the discharge amount of the middle crucible 111b and the edge crucible 111a as consistent as possible, thereby improving the uniformity of the thickness of the film layer obtained by vapor deposition.

[0055] In some embodiments, see Figure 4 As shown, the airflow adjustment assembly 6 includes a support rod 62 and a plurality of adjustment blades 63 rotatably connected to the support rod 62, the support rod 62 is connected to the inner wall of the corresponding sub-crucifix body 111, and the adjustment blades 63 can rotate relative to the support rod 62 to adjust the opening size at the top of the sub-crucifix body 111.

[0056] Specifically, the angle between the adjusting blade 63 and the top of the sub-crucifix 111 can be adjusted by rotating the adjusting blade 63, so that the opening size of the top of the sub-crucifix 111 can be adjusted, and then the discharge amount of the gaseous material evaporated from the opening can be adjusted.

[0057] The larger the included angle between the adjusting blade 63 and the top of the sub-crucifix 111, the larger the opening size at the top of the sub-crucifix 111, so that the amount of gaseous material evaporated from the opening is greater, and the film layer finally obtained by evaporation is thicker. The smaller the included angle between the adjusting blade 63 and the top of the sub-crucifix 111, the smaller the opening size at the top of the sub-crucifix 111, so that the amount of gaseous material evaporated from the opening is less, and the film layer finally obtained by evaporation is thinner.

[0058] In this way, the angle of the adjusting blade 63 corresponding to each sub-crubbing body 111 can be adjusted respectively to adjust the opening size at the top of each sub-crubbing body 111. In this way, the discharge amount of each sub-crubbing body 111 can be flexibly controlled, and then the thickness of the film layer after vapor deposition corresponding to each sub-crubbing body 111 can be controlled, so as to flexibly and accurately control the thickness of the film layer after vapor deposition.

[0059] In some embodiments, see Figure 5 As shown, a heat-insulating gap 9 is formed between the outer walls of two adjacent sub-crumbs 111 , and a size of the heat-insulating gap 9 is 5 to 10 cm in the length direction of the lower crucible 11 .

[0060] Specifically, when the size of the insulation gap 9 is 5 to 10 cm, the size of the insulation gap 9 is moderate, which can ensure that the temperatures of two adjacent sub-crucibles 111 will basically not affect each other, ensuring the independence and accuracy of the temperature of each sub-crucible 111, and at the same time ensure the continuity of the evaporated material in the lower crucible 11.

[0061] When the size of the thermal insulation gap 9 is less than 5 cm, the size of the thermal insulation gap 9 is too small, so that the temperatures of two adjacent sub-crucifixes 111 will significantly affect each other, thereby reducing the independence and accuracy of the temperature of each sub-crucifix 111.

[0062] When the size of the thermal insulation gap 9 is greater than 10 cm, the size of the thermal insulation gap 9 is too large. When the overall size of the crucible remains unchanged, the excessive size of the thermal insulation gap 9 will lead to a reduction in the filling amount of the evaporation material, which is not conducive to mass production and use, and will cause the continuity of the distribution of the evaporation material to be reduced, which is not conducive to achieving the purpose of uniform film thickness.

[0063] Exemplarily, the size of the thermal insulation gap 9 may be 5 cm, 6 cm, 7 cm, 8 cm, 9 cm, 10 cm, etc.

[0064] In some embodiments, see Figure 5 As shown, the evaporation line source crucible also includes a plurality of insulation plates 4, which correspond one by one to the plurality of insulation gaps 9. The insulation plates 4 are located in the corresponding insulation gaps 9 and are not in contact with the outer walls of the adjacent sub-crucible bodies 111 and the heating assembly 3.

[0065] Specifically, the heat insulation board 4 is made of a heat insulation material or a material with poor thermal conductivity, and is used to isolate heat transfer between two adjacent sub-crumbs 111 .

[0066] The heat insulation plate 4 is located in the corresponding heat insulation gap 9, so that there is almost no heat transfer between two adjacent sub-crucifix bodies 111, ensuring that the temperature of each sub-crucifix body 111 can be independently and accurately controlled, thereby improving the accuracy of temperature control.

[0067] The heat insulation plate 4 does not contact the outer wall of the adjacent sub-crucifix 111 and the heating assembly 3, thereby ensuring that the setting of the heat insulation plate 4 will not affect the temperature of the adjacent sub-crucifix 111, and further ensuring that the temperature of each sub-crucifix 111 can be independently and accurately controlled, thereby improving the accuracy of temperature control.

[0068] In some embodiments, see Figure 5 As shown, the evaporation line source crucible also includes a crucible support seat 7, a support groove is formed on the crucible support seat 7, the crucible body 1 is located in the support groove, and the heat insulation board 4 is connected to the inner wall of the support groove.

[0069] Specifically, the crucible support seat 7 is used to support the entire evaporation line source crucible to improve the stability of the evaporation line source crucible.

[0070] The heat insulation board 4 is connected to the inner wall of the support groove to fix the heat insulation board 4. Exemplarily, the heat insulation board 4 can be connected to the inner bottom wall of the support groove, or to the inner side wall of the support groove, as long as the heat insulation board 4 can be fixed.

[0071] In some embodiments, the evaporation line source crucible of the present application adopts a semi-separated design for the integrated crucible, and each sub-crucifix body 111 is heated separately to ensure the temperature uniformity in the extension direction of the line source. In addition, only the lower crucible body 11 is semi-separated, so that the materials are heated separately in the sub-crucifix bodies 111. After the materials evaporate, they are discharged from the sub-crucifix bodies 111 and can be re-mixed evenly on the first airflow balance plate 5 above.

[0072] A separate heating component 3 is provided for each sub-crucible body 111, and each heating component 3 can be independently controlled. This structure can better control the temperature distribution in the length direction of the crucible, and then control the evaporation rate of each part of the material, adjust the film thickness distribution, and improve the uniformity of evaporation. At the same time, through local refinement control, it can also control the areas where the material is prone to dry out, to prevent the material from drying out and affecting mass production.

[0073] The cross section of the separated sub-crucifix body 111 can be rectangular or circular, or any other highly symmetrical shape, so that the vapor deposition material inside the sub-crucifix body 111 can be heated as evenly as possible. At the same time, the separation interval (i.e., the insulation gap 9) of the sub-crucifix body 111 should not be too large, and the separation interval is preferably 5-10 cm. If the overall size of the crucible remains unchanged, a too large interval will lead to a reduction in the amount of material filled, which is not conducive to mass production and long-term use, and will lead to a reduction in the continuity of the distribution of the vapor deposition material, which is not conducive to achieving the purpose of uniform film thickness.

[0074] In order to improve the independence of each separated sub-crucifix 111, a heat insulation board 4 can be arranged between adjacent sub-crucifixes 111 to prevent the thermal influence between two adjacent sub-crucifixes 111, and further improve the independence of the temperature control of the sub-crucifixes 111. The heat insulation board 4 should be arranged to avoid contact with the heating component 3 as much as possible, so that in the vacuum chamber environment, heat can only be conducted in the form of thermal radiation, further improving the thermal insulation performance.

[0075] In order to mix the evaporated materials evenly, an additional airflow regulating component 6 can be added to the upper part of each sub-crucifix 111 for each sub-crucifix 111. The airflow regulating component 6 is located below the original first airflow balancing plate 5. By controlling the first airflow balancing plate 5 of each sub-crucifix 111, the evaporation of the material in each sub-crucifix 111 can be controlled, so that the evaporated material is initially homogenized when moving out of the sub-crucifix 111, and then the evaporated materials in all the sub-crucifixes 111 are secondary homogenized by the first airflow balancing plate 5 and discharged from the nozzle 21, and evaporated onto the substrate to form a uniform film thickness distribution.

[0076] The airflow regulating assembly 6 of each sub-crucifix 111 can be controlled individually, and can be controlled to be closed or opened according to actual conditions, and the rotation angle can also be controlled, so as to further adjust the evaporation rate of each sub-crucifix 111, and further realize the local adjustment function of the thickness of the evaporated film on the substrate. Exemplarily, the airflow regulating assembly 6 can be any shape that can meet the use requirements, such as a grid type, and the airflow regulating assembly 6 can rotate 360°.

[0077] The present application also provides an evaporation device, comprising the evaporation line source crucible described in any of the above embodiments. The evaporation device has the technical effects described in any of the above embodiments, which will not be described in detail here.

[0078] It should be noted that the above describes some embodiments of the present application. Other embodiments are within the scope of the appended claims. In some cases, the actions or steps recorded in the claims can be performed in an order different from that in the above embodiments and still achieve the desired results. In addition, the processes depicted in the accompanying drawings do not necessarily require the specific order or continuous order shown to achieve the desired results. In some embodiments, multitasking and parallel processing are also possible or may be advantageous.

[0079] A person skilled in the art should understand that the discussion of any of the above embodiments is merely illustrative and is not intended to imply that the scope of the present application is limited to these examples. In line with the concept of the present application, the technical features in the above embodiments or different embodiments may be combined, the steps may be implemented in any order, and there are many other variations of the different aspects of the embodiments of the present application as described above, which are not provided in detail for the sake of simplicity.

[0080] The embodiments of the present application are intended to cover all such substitutions, modifications and variations that fall within the broad scope of the present application. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the embodiments of the present application should be included in the protection scope of the present application.

Claims

1. A evaporation line source crucible, characterized in that: include: A crucible body with an open top and a hollow structure formed inside, and a cover body arranged on the top of the crucible body and provided with a nozzle, the crucible body includes an upper crucible body and a lower crucible body connected to the bottom of the upper crucible body, the lower crucible body includes a plurality of sub-crucifix bodies arranged at intervals along the length direction, and the outer wall of each sub-crucifix is ​​provided with a heating component.

2. The evaporation line source crucible according to claim 1, characterized in that: The first airflow balancing plate is arranged along the length direction of the upper crucible body and connected to the inner wall of the upper crucible body. The first airflow balancing plate is provided with a plurality of first airflow holes.

3. The evaporation line source crucible according to claim 2, characterized in that: It also includes a plurality of airflow regulating components, which correspond to the plurality of sub-crumbs one by one, and each of the airflow regulating components is arranged on the top of the corresponding sub-crumb body and forms a balancing gap with the first airflow balancing plate.

4. The evaporation line source crucible according to claim 3, characterized in that: In the height direction of the evaporation line source crucible, the ratio of the size of the balance gap to the size of the lower crucible body is 0.5:10 to 2:

10.

5. The evaporation line source crucible according to claim 3, characterized in that: The airflow regulating assembly includes a second airflow balancing plate, which is connected to the inner wall of the corresponding sub-crumb body. The second airflow balancing plate is provided with a plurality of second airflow holes, and the aperture of the second airflow holes is smaller than the aperture of the first airflow holes.

6. The evaporation line source crucible according to claim 5, characterized in that: The first air flow holes and the second air flow holes are arranged alternately.

7. The evaporation line source crucible according to claim 5, characterized in that: In the length direction of the evaporation line source crucible, the first sub-crubbing body and the last sub-crubbing body are both called edge crucibles, and the sub-crubbing bodies except the first sub-crubbing body and the last sub-crubbing body are all called intermediate crucibles, and the aperture of the second air flow hole on the second air flow balancing plate corresponding to the intermediate crucible is smaller than the aperture of the second air flow hole on the second air flow balancing plate corresponding to the edge crucible.

8. The evaporation line source crucible according to claim 3, characterized in that: The airflow adjustment assembly includes a support rod and a plurality of adjustment blades rotatably connected to the support rod, the support rod is connected to the inner wall of the corresponding sub-crumb body, and the adjustment blades can rotate relative to the support rod to adjust the opening size of the top of the sub-crumb body.

9. The evaporation line source crucible according to claim 1, characterized in that: An insulation gap is formed between the outer walls of two adjacent sub-crumbs, and a size of the insulation gap is 5 to 10 cm in the length direction of the lower crucible.

10. The evaporation line source crucible according to claim 9, characterized in that: It also includes a plurality of heat insulation plates, which correspond one to one with the plurality of heat insulation gaps. The heat insulation plates are located in the corresponding heat insulation gaps and are not in contact with the outer walls of the adjacent sub-crumbs and the heating assembly.

11. The evaporation line source crucible according to claim 10, characterized in that: It also includes a crucible support seat, the crucible support seat is provided with a support groove, the crucible body is located in the support groove, and the heat insulation board is connected to the inner wall of the support groove.

12. A vapor deposition device, characterized in that: The invention comprises the evaporation line source crucible according to any one of claims 1 to 11.

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