Display device and method of manufacturing same

Abstract

The invention relates to a display device and a method of manufacturing the same. The display device includes a substrate defining a light emitting area and a light blocking area adjacent to the light emitting area; a light blocking pattern on the substrate at the light blocking region; a transmissive bank on the light blocking pattern and defining a first opening exposing at least a portion of the light blocking pattern; and a reflective pattern on the transmissive bank and the light blocking pattern exposed by the first opening of the transmissive bank.

Description

Technical Field

[0001] One or more embodiments of the present disclosure may relate to a display device providing visual information and a method of manufacturing the display device. Background Art

[0002] The display device may include a light emitting layer and a color conversion layer to improve display quality. Light may be emitted from the light emitting layer, and the color conversion layer may convert the wavelength of the light emitted from the light emitting layer. Thus, the color conversion layer may emit light in a wavelength band different from the wavelength band of the incident light.

[0003] The color conversion layer may include wavelength conversion particles such as quantum dots.For example, the color conversion layer may be divided into a red conversion pattern, a green conversion pattern, and a transmission pattern (or a blue conversion pattern). Summary of the invention

[0004] Embodiments provide a display device with improved display quality.

[0005] An embodiment provides a method of manufacturing a display device.

[0006] According to one or more embodiments of the present disclosure, a display device may include: a substrate defining a light emitting area and a light blocking area adjacent to the light emitting area; a light blocking pattern on the substrate at the light blocking area; a transmission dam on the light blocking pattern and defining a first opening exposing at least a portion of the light blocking pattern; and a reflective pattern on the transmission dam and the light blocking pattern exposed by the first opening.

[0007] The reflective pattern may extend from an upper surface of the light blocking pattern to an upper surface of the transmissive bank along a side surface of the first opening.

[0008] The light blocking pattern may have a thickness less than or equal to about 1 μm.

[0009] A width of the light blocking pattern may be greater than or equal to a width of the first opening.

[0010] The width of the light blocking pattern may be less than or equal to the width of the transmission bank.

[0011] The display device may further include: a color conversion pattern on the substrate at the light emitting area.

[0012] The transmissive bank may also define a second opening overlapping the light emitting area, and the color conversion pattern is in the second opening.

[0013] The display device may further include: a transmissive pattern on the substrate at the light emitting region.

[0014] The transmissive pattern may be in the second opening as well as on the reflective pattern.

[0015] The reflective pattern may include metal.

[0016] The display device may further include: a light emitting layer between the substrate and the light blocking pattern.

[0017] According to one or more embodiments of the present disclosure, a method for manufacturing a display device may include: forming a light blocking pattern at a light blocking area on a substrate defining a light blocking area and a light emitting area adjacent to the light blocking area; forming a transmission dam on the light blocking pattern that defines a first opening that exposes at least a portion of the light blocking pattern; and forming a reflective pattern on the transmission dam and the light blocking pattern exposed by the first opening.

[0018] The reflective pattern may extend from an upper surface of the light blocking pattern to an upper surface of the transmissive bank along a side surface of the first opening.

[0019] The light blocking pattern may have a thickness less than or equal to about 1 μm.

[0020] A width of the light blocking pattern may be greater than or equal to a width of the first opening.

[0021] The width of the light blocking pattern may be less than or equal to the width of the transmission bank.

[0022] The method may further include forming a color conversion pattern on the substrate at the light emitting region after forming the transmission bank and before forming the reflection pattern.

[0023] The transmission bank may further define a second opening overlapping the light emitting area, and the color conversion pattern is formed in the second opening.

[0024] The method may further include forming a transmissive pattern on the substrate at the light emitting region after forming the reflective pattern.

[0025] The transmissive pattern may be formed in the second opening and on the reflective pattern.

[0026] The method may further include forming a light emitting layer on the substrate before forming the light blocking pattern.

[0027] In a display device according to one or more embodiments of the present disclosure, the display device may include a light blocking pattern, a transmission dam, and a reflection pattern. The light blocking pattern may include a material with a relatively high absorptivity. The light blocking pattern may absorb light toward adjacent pixels in incident light emitted by the light emitting element, and may prevent or reduce color mixing between adjacent pixels.

[0028] In the process of forming the transmission dam, because the unnecessary part of the transmission dam caused by the exposure reflection can not be formed by the light blocking pattern, the light transmitted through the transmission dam and not reflected by the reflective pattern can be minimized or reduced. Therefore, the color mixing between the pixels adjacent to each other can be further prevented or reduced. In some embodiments, because the light transmitted through the transmission dam is reflected by the reflective pattern, the light efficiency of the display device can be improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 is a perspective view showing a display device according to one or more embodiments of the present disclosure.

[0030] Figure 2 According to one or more embodiments of the present disclosure, Figure 1 A cross-sectional view taken along line II'.

[0031] Figure 3 According to one or more embodiments of the present disclosure, Figure 1 A cross-sectional view taken along line II-II'.

[0032] Figure 4 and Figure 5 According to one or more embodiments of the present disclosure Figure 3 An enlarged cross-sectional view of area A.

[0033] Figure 6 , Figure 7 , Figure 8 , Fig. 9 , Fig.10 , Fig.11 , Fig.12 , Fig.13 and Fig.14 The invention is a method of manufacturing a device according to one or more embodiments of the present invention. Figure 3 A cross-sectional view of a method of displaying a device.

[0034] Fig.15 is a cross-sectional view illustrating a display device according to one or more other embodiments of the present disclosure.

[0035] Fig.16 is a cross-sectional view showing a display device according to still one or more other embodiments of the present disclosure. DETAILED DESCRIPTION

[0036] By referring to the detailed description of the drawings and embodiments, it is easier to understand the aspects of some embodiments of the present disclosure and the methods for realizing them. The described embodiments are provided as examples so that the present disclosure will be thorough and complete, and will fully convey the aspects of the present disclosure to those skilled in the art. Therefore, redundant, irrelevant or unrelated to the description of the embodiments or unnecessary processes, elements and techniques for fully understanding the various aspects of the present disclosure for those of ordinary skill in the art can be omitted. Unless otherwise stated, in the entire drawings and written descriptions, the same reference numerals, characters or combinations thereof represent the same elements, and therefore, their repeated descriptions can be omitted.

[0037] The described embodiments may have various modifications and may be implemented in different forms, and should not be construed as being limited to the embodiments shown herein. The use of "can", "may" or "may not" when describing an embodiment corresponds to one or more embodiments of the present disclosure. The present disclosure encompasses all modifications, equivalents and substitutions within the scope of the ideas and techniques of the present disclosure. In addition, each of the features of the various embodiments of the present disclosure may be combined with each other in part or in its entirety, and various interlocks and drives are technically possible. Each embodiment may be implemented independently of one another, or may be implemented together in association.

[0038] In the drawings, the relative sizes of elements, layers, and regions may be exaggerated for clarity and / or descriptive purposes. In addition, the use of cross-hatching and / or shading is generally provided in the drawings to clarify the boundaries between adjacent elements. Therefore, unless specified, the presence or absence of cross-hatching or shading does not convey or indicate any preference or requirement for specific materials, material properties, dimensions, proportions, commonalities between the elements shown, and / or any other characteristics, attributes, properties, etc. of the elements.

[0039] Various embodiments are described herein with reference to cross-sectional views as schematic diagrams of embodiments and / or intermediate structures. Therefore, variations in the shape of the figures due to, for example, manufacturing techniques and / or tolerances should be expected. In addition, the specific structural or functional descriptions disclosed herein are merely exemplary for the purpose of describing embodiments according to the concepts of the present disclosure. Therefore, the embodiments disclosed herein should not be interpreted as being limited to the shapes of the elements, layers, or regions shown, but should include deviations in shapes caused, for example, by manufacturing.

[0040] For example, an implanted region illustrated as a rectangle will, typically, have rounded or curved features and / or a gradient of implant concentration at its edges rather than a binary change from implanted to non-implanted region. Likewise, a buried region formed by implantation may result in some implantation in the region between the buried region and the surface through which the implantation occurs.

[0041] For ease of explanation, spatial relative terms such as "below", "below", "lower", "lower side", "below", "above", "upper side", etc. may be used herein to describe the relationship between an element or feature and another (some) element or feature as shown in the drawings. It will be understood that, in addition to the orientation depicted in the drawings, spatial relative terms are intended to include different orientations of the device in use or in operation. For example, if the device in the drawings is turned over, the elements described as being "below", "below" or "below" other elements or features will then be oriented "above" other elements or features. Therefore, the exemplary terms "below" and "below" can include both upper and lower orientations. The device can be oriented in other ways (e.g., rotated 90 degrees or in other orientations), and the spatial relative descriptors used herein should be interpreted accordingly. Similarly, when a first portion is described as being arranged "on" a second portion, this means that the first portion is arranged at the upper or lower side of the second portion, without being limited to its upper side based on the direction of gravity.

[0042] In addition, the phrase "in a plan view" means when the object portion is observed from above, and the phrase "in a schematic cross-sectional view" means when a schematic cross section taken by vertically cutting the object portion is observed from the side. The term "overlap" or "overlapped" means that the first object can be above or below the second object, or on one side of the second object, and vice versa. In addition, the term "overlap" may include stacking, facing or facing, extending on, covering or partially covering, or any other suitable term as will be appreciated and understood by a person of ordinary skill in the art. The expression "non-overlapping" may include meanings such as "separated from" or "separated from" or "offset from" and any other suitable equivalents as will be appreciated and understood by a person of ordinary skill in the art. The terms "face" and "facing" may mean that the first object may be directly opposite or indirectly opposite to the second object. In the case where a third object is between the first object and the second object, the first object and the second object may be understood to be indirectly opposite to each other, but still facing each other.

[0043] It will be understood that when an element, layer, region, or component is referred to as being "formed on," "on," "connected to," or "(operably or communicatively) coupled to" another element, layer, region, or component, it may be directly formed on, directly on, directly connected to, or directly coupled to, or indirectly formed on, indirectly on, indirectly connected to, or indirectly coupled to, such that there may be one or more intervening elements, layers, regions, or components. Furthermore, this may collectively mean directly coupled or directly connected or indirectly coupled or indirectly coupled as well as integrally coupled or integrally coupled or non-integrally coupled or non-integrally coupled. For example, when a layer, region, or component is referred to as being "electrically connected" or "electrically coupled" to another layer, region, or component, it may be directly electrically connected or directly electrically coupled to the other layer, region, and / or component, or there may be one or more intervening layers, regions, or components. The one or more intervening components may include switches, resistors, capacitors, etc. When describing embodiments, unless explicitly described as being directly connected, expressions of connection indicate electrical connection, and "directly connected / directly coupled" or "directly on..." means that one component is directly connected or directly coupled to another component or directly on another component without intermediate components.

[0044] In addition, in this specification, when a part of a layer, film, region, plate, etc. is formed on another part, the formation direction is not limited to the upper direction, but includes forming the part on the side surface or in the lower direction. On the contrary, when a part of a layer, film, region, plate, etc. is formed "under" another part, this includes not only the situation that the part is "directly under" another part, but also the situation that there is another part between the part and the other part. At the same time, other expressions describing the relationship between components such as "between...", "directly between..." or "adjacent to..." and "directly adjacent to..." can be interpreted similarly. It will be understood that when an element or layer is referred to as "between" two elements or layers, it can be the only element or layer between the two elements or layers, or one or more intervening elements or layers may also be present.

[0045] For the purposes of this disclosure, when following a list element, expressions such as "at least one of" or "any one of" or "one or more of" modify the elements of the entire list and do not modify individual elements in the list. For example, "at least one of X, Y, and Z" and "at least one selected from the group consisting of X, Y, and Z" can be interpreted as only X, only Y, only Z, any combination of two or more of X, Y, and Z (such as, for example, XYZ, XY, YZ, and XZ) or any variation thereof. Similarly, the expression "at least one of A and B" may include A, B, or A and B. As used herein, "or" generally means "and / or", and the term "and / or" includes any and all combinations of one or more of the relevant listed items. For example, the expression "A and / or B" may include A, B, or A and B. Similarly, when following / preceding a list element, expressions such as "at least one of", "a plurality of", "one of", and other prepositional phrases modify the elements of the entire list and do not modify individual elements in the list.

[0046] It will be understood that although the terms "first", "second", "third", etc. can be used herein to describe various elements, components, areas, layers and / or sections, these elements, components, areas, layers and / or sections should not be limited by these terms. These terms do not correspond to a specific order, position or advantage, and are only used to distinguish an element, member, component, area, region, layer, section or part from another element, member, component, area, region, layer, section or part. Therefore, without departing from the spirit and scope of the present disclosure, the first element, first component, first area, first layer or first section described below can be referred to as the second element, second component, second area, second layer or second section. Describing an element as a "first" element may not require or imply the presence of a second element or other element. The terms "first", "second", etc. can also be used herein to distinguish elements of different categories or groups. For the sake of simplicity, the terms "first", "second", etc. can respectively represent "first category (or first group)", "second category (or second group)", etc.

[0047] In the example, the x-axis, y-axis and / or z-axis are not limited to the three axes of the rectangular coordinate system, and can be interpreted in a broader sense. For example, the x-axis, y-axis and z-axis can be perpendicular to each other, or can represent different directions that are not perpendicular to each other. The same applies to the first direction, the second direction and / or the third direction.

[0048] The terms used herein are only used for the purpose of describing the embodiments and are not intended to limit the present disclosure. As used herein, the singular forms "a" and "an" are intended to include the plural forms as well, and the plural forms are intended to include the singular forms as well, unless the context clearly indicates otherwise. It will also be understood that the terms "comprises", "comprising", "have", "having", "includes" and "including" when used in this specification specify the presence of stated features, wholes, steps, operations, elements and / or components, but do not exclude the presence or addition of one or more other features, wholes, steps, operations, elements, components and / or groups thereof.

[0049] When one or more embodiments can be implemented differently, a specific process order can be performed differently from the described order. For example, two processes described in succession can be performed substantially simultaneously, or in the reverse order of the described order.

[0050] As used herein, the terms "substantially", "about", "approximately" and similar terms are used as approximate terms and not as terms of degree, and are intended to allow for the inherent deviations of measured or calculated values ​​that will be recognized by those of ordinary skill in the art. For example, "substantially" may include a range of + / - 5% of the corresponding value. In view of the measurement discussed and the errors associated with the measurement of a particular quantity (i.e., the limitations of the measurement system), "about" or "approximately" as used herein include the value and mean within an acceptable deviation range of a particular value determined by a person of ordinary skill in the art. For example, "approximately" may mean within one or more standard deviations, or within ±30%, ±20%, ±10%, ±5% of the value. In addition, when describing embodiments of the present disclosure, the use of "may" refers to "one or more embodiments of the present disclosure".

[0051] Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by those of ordinary skill in the art to which the present disclosure belongs. It will also be understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning consistent with their meaning in the context of the relevant art and / or this specification, and should not be interpreted in an idealized or overly formal sense unless explicitly defined as such herein.

[0052] Figure 1 is a perspective view showing a display device according to some embodiments of the present disclosure.

[0053] refer to Figure 1, the display device 10 may include a display area DA and a non-display area NDA.

[0054] A plurality of pixels may be arranged in the display area DA. The plurality of pixels may be arranged in a matrix along a first direction D1 and along a second direction D2 intersecting the first direction D1. For example, the first direction D1 may be orthogonal (e.g., vertical) to the second direction D2. Each of the plurality of pixels may emit light. When each of the plurality of pixels emits light, the display area DA may display an image.

[0055] Lines connected to the plurality of pixels may be further arranged in the display area DA. For example, the lines may include data signal lines, gate signal lines, power lines, and the like.

[0056] The non-display area NDA may be an area where no image is displayed. The non-display area NDA may be located around the display area DA. For example, the non-display area NDA may surround the display area DA (eg, in a plan view).

[0057] A driver driving a plurality of pixels may be disposed in the non-display area NDA. For example, the driver may include a data driver, a gate driver, a power voltage generator, a timing controller, etc. The plurality of pixels may emit light based on a signal received from the driver.

[0058] Figure 2 It is along Figure 1 A cross-sectional view taken along line II'.

[0059] refer to Figure 1 and Figure 2 In the embodiment, the display device 10 may include a first structure 100 , a second structure 200 , and a sealing member 300 .

[0060] The second structure 200 may be arranged on the first structure 100. The first structure 100 and the second structure 200 may face each other. The second structure 200 may be spaced apart from the first structure 100 in a third direction D3 intersecting each of the first direction D1 and the second direction D2. For example, the third direction D3 may be orthogonal (e.g., perpendicular) to each of the first direction D1 and the second direction D2.

[0061] Therefore, a space 400 may be defined between the first structure 100 and the second structure 200. The space 400 may include a gap between the first structure 100 and the second structure 200. In one or more embodiments, the space 400 may be filled with a filler. For example, the filler may include an organic material such as silicone, epoxy, etc., air, etc. In one or more embodiments, the filler may also include a material for matching the refractive index. In one or more other embodiments, the space 400 may be in a vacuum state.

[0062] The first structure 100 may be a substrate including a light emitting element. The light emitting element may be arranged in the display area DA and may generate light according to a driving signal. The second structure 200 may be a substrate including a color filter layer that selectively transmits light in a specific wavelength band or multiple wavelength bands.

[0063] The sealing member 300 may be arranged between the first structure 100 and the second structure 200. The sealing member 300 may be arranged along the non-display area NDA. The sealing member 300 may be arranged in the non-display area NDA along the edges of the first structure 100 and the second structure 200. For example, the sealing member 300 may be arranged between the first structure 100 and the second structure 200 to surround the display area DA in a plan view. The first structure 100 and the second structure 200 may be coupled by the sealing member 300.

[0064] Since the space 400 between the first structure 100 and the second structure 200 is sealed by the sealing member 300, it is possible to prevent or reduce the penetration of external moisture, air, impurities, etc. into the space 400. In one or more embodiments, the sealing member 300 may maintain the space 400 between the first structure 100 and the second structure 200. For example, the sealing member 300 may include an organic material such as epoxy resin, etc.

[0065] Figure 3 It is along Figure 1 A cross-sectional view taken along line II-II'. Figure 4 and Figure 5 yes Figure 3 An enlarged cross-sectional view of region A. For example, Figure 3 may be a cross-sectional view showing an example of a display area DA included in the display device 10, and Figure 4 and Figure 5 may be a cross-sectional view illustrating a range of a width WD of the light blocking pattern BP included in the display device 10 .

[0066] refer to Figure 1 , Figure 2 , Figure 3 , Figure 4 and Figure 5 , the display area DA may include a plurality of light emitting areas and a light blocking area BA. Each of the light emitting areas may be an area that emits light.

[0067] Light (hereinafter, referred to as 'incident light') L1 generated in the first structure 100 may be emitted to the outside through the light emitting area. The light emitting area may include a first light emitting area LA1, a second light emitting area LA2, and a third light emitting area LA3.

[0068] The first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3 may emit light in different wavelength bands. For example, the first light emitting area LA1 may emit a first transmission light L2B in a blue wavelength band, the second light emitting area LA2 may emit a second transmission light L2G in a green wavelength band, and the third light emitting area LA3 may emit a third transmission light L2R in a red wavelength band, but the present disclosure is not limited thereto.

[0069] In some embodiments, the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3 may be spaced apart from each other in a plan view and may be arranged to be repeated. The light blocking area BA may be located between the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3 that are adjacent to each other. The light blocking area BA may surround the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3 in a plan view. For example, the light blocking area BA may have a grid shape in a plan view. The light blocking area BA may be an area that does not emit light.

[0070] In some embodiments, the first structure 100 may include a first substrate SUB1, a buffer layer BFR, a first transistor TR1, a second transistor TR2, and a third transistor TR3, an insulating layer IL, a pixel defining layer PDL, a first light emitting element LE1, a second light emitting element LE2, and a third light emitting element LE3, an encapsulation layer TFE, a light blocking pattern BP, a transmission dam TB, a first color conversion pattern CCP1, a second color conversion pattern CCP2, a capping layer CPL, a reflection pattern RP, and a transmission pattern LTP.

[0071] Here, the first light emitting element LE1 may include a first pixel electrode PE1, a light emitting layer EL and a common electrode CE. The second light emitting element LE2 may include a second pixel electrode PE2, a light emitting layer EL and a common electrode CE. The third light emitting element LE3 may include a third pixel electrode PE3, a light emitting layer EL and a common electrode CE.

[0072] The first substrate SUB1 may include a transparent material or an opaque material. For example, the first substrate SUB1 may be made of a rigid glass substrate, a plastic substrate, a flexible film, a metal substrate, etc. These may be used alone or in combination with each other. Since the display area DA of the display device 10 includes the first light emitting area LA1, the second light emitting area LA2, the third light emitting area LA3, and the light blocking area BA, the first substrate SUB1 may also define the first light emitting area LA1, the second light emitting area LA2, the third light emitting area LA3, and the light blocking area BA.

[0073] The buffer layer BFR may be disposed on the first substrate SUB1 (as used herein, "on" may mean "above"). The buffer layer BFR may prevent or reduce diffusion of metal atoms or impurities from the first substrate SUB1 to the first transistor TR1, the second transistor TR2, and the third transistor TR3. In one or more embodiments, if the surface of the first substrate SUB1 is not substantially uniform (for example, when the surface of the first substrate SUB1 is not substantially uniform), the buffer layer BFR may improve the flatness of the surface of the first substrate SUB1. The buffer layer BFR may include a material such as silicon oxide (SiO x ), Silicon Nitride (SiN x ), Silicon Carbide (SiC x ), silicon oxynitride (SiO x N y ), Silicon Oxycarbide (SiO x C y ) etc. These materials may be used alone or in combination with each other.

[0074] The first transistor TR1, the second transistor TR2, and the third transistor TR3 may be arranged on the buffer layer BFR. The channel layer of each of the first transistor TR1, the second transistor TR2, and the third transistor TR3 may include a silicon semiconductor material or an oxide semiconductor material. Examples of silicon semiconductor materials may include amorphous silicon, polycrystalline silicon, and the like. Examples of oxide semiconductor materials may include indium gallium zinc oxide (IGZO), indium tin zinc oxide (ITZO), and the like. These may be used alone or in combination with each other.

[0075] The insulating layer IL may be disposed on the buffer layer BFR and may cover the first transistor TR1, the second transistor TR2, and the third transistor TR3. The insulating layer IL may include an inorganic material such as silicon oxide, silicon nitride, silicon carbide, silicon oxynitride, silicon oxycarbide, etc. In one or more embodiments, the insulating layer IL may include an organic material such as a phenolic resin, an acrylic resin, a polyimide resin, a polyamide resin, a siloxane resin, an epoxy resin, etc. These may be used alone or in combination with each other.

[0076] The first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3 may be arranged on the insulating layer IL. The first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3 may overlap the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3, respectively. The first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3 may be connected to the first transistor TR1, the second transistor TR2, and the third transistor TR3 through contact holes formed in the insulating layer IL, respectively. Each of the first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3 may include a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive material, etc. They may be used alone or in combination with each other.

[0077] The pixel defining layer PDL may be disposed on the insulating layer IL and may cover at least a portion of each of the first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3. In other words, the pixel defining layer PDL may define an opening that exposes at least a portion of the upper surface of each of the first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3. The pixel defining layer PDL may include an organic material such as an epoxy resin, a silicone resin, or the like.

[0078] The light-emitting layer EL may be arranged on the pixel defining layer PDL and the first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3 exposed by the pixel defining layer PDL. In some embodiments, the light-emitting layer EL may extend continuously across a plurality of pixels in the display area DA. For example, the light-emitting layer EL may completely or substantially overlap the first light-emitting area LA1, the second light-emitting area LA2, and the third light-emitting area LA3 and the light-blocking area BA. In one or more other embodiments, the light-emitting layer EL may be separated from the light-emitting layer of an adjacent pixel. For example, the light-emitting layer EL may overlap the first light-emitting area LA1, the second light-emitting area LA2, and the third light-emitting area LA3, respectively, and may not overlap the light-blocking area BA.

[0079] The light emitting layer EL may include at least one of an organic material and a quantum dot that emits light of a specific color (e.g., a preset color). For example, the light emitting layer EL may emit light in a blue wavelength band, but the present disclosure is not limited thereto. The light emitting layer EL may have a multilayer structure. Functional layers such as a hole injection layer, a hole transport layer, an electron transport layer, an electron injection layer, etc. may be arranged on or below the light emitting layer EL.

[0080] In some embodiments, the light emitting layer EL may have a structure in which a plurality of organic light emitting layers emitting light in a blue wavelength band are stacked. For example, the light emitting layer EL may have a structure in which three blue organic light emitting layers are stacked. However, the present disclosure is not limited thereto. In some embodiments, the light emitting layer EL may have a structure in which a plurality of organic light emitting layers emitting light in a blue wavelength band and organic light emitting layers emitting light in different wavelength bands are stacked. For example, the light emitting layer EL may have a structure in which three blue organic light emitting layers and one green organic light emitting layer are stacked.

[0081] The common electrode CE may be arranged on the light emitting layer EL. The common electrode CE may extend continuously across a plurality of pixels in the display area DA. For example, the common electrode CE may completely or substantially overlap the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3 and the light blocking area BA. The common electrode CE may include a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive material, etc. They may be used alone or in combination with each other.

[0082] Therefore, the first light emitting element LE1 including the first pixel electrode PE1, the light emitting layer EL and the common electrode CE may be arranged in the first light emitting area LA1 on the first substrate SUB1. The second light emitting element LE2 including the second pixel electrode PE2, the light emitting layer EL and the common electrode CE may be arranged in the second light emitting area LA2 on the first substrate SUB1. The third light emitting element LE3 including the third pixel electrode PE3, the light emitting layer EL and the common electrode CE may be arranged in the third light emitting area LA3 on the first substrate SUB1. Each of the first light emitting element LE1, the second light emitting element LE2 and the third light emitting element LE3 may emit incident light L1 in a direction toward the second structure 200 (e.g., in a third direction D3).

[0083] The encapsulation layer TFE may be disposed on the common electrode CE. The encapsulation layer TFE may protect the first light emitting element LE1, the second light emitting element LE2, and the third light emitting element LE3 from external oxygen and moisture. The encapsulation layer TFE may include at least one inorganic layer and at least one organic layer.

[0084] The light blocking pattern BP may be arranged on the encapsulation layer TFE. In some embodiments, the light blocking pattern BP may overlap with the light blocking area BA. The light blocking pattern BP may not overlap with the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3. The light blocking pattern BP may include a light blocking material having a relatively high absorptivity. For example, the light blocking pattern BP may include an organic material including a light blocking material such as a black pigment, a black dye, carbon black, etc. However, the present disclosure is not limited thereto, and the light blocking pattern BP may include one or more suitable materials having relatively low transmittance and reflectivity and relatively high absorptivity.

[0085] The light blocking pattern BP can absorb the high angle component of the incident light L1. Since the light blocking pattern BP absorbs light emitted toward another adjacent light emitting region of the incident light L1 and blocks its transmission, color mixing between adjacent pixels can be prevented or reduced.

[0086] For example, in the case where the light blocking pattern BP is adjacent to the second light emitting area LA2, the light blocking pattern BP can absorb the light emitted toward the first light emitting area LA1 or toward the third light emitting area LA3 from the incident light L1 emitted by the second light emitting element LE2 overlapping the second light emitting area LA2. Therefore, it is possible to prevent or reduce the incident light L1 emitted by the second light emitting element LE2 from being emitted to the first light emitting area LA1 or the third light emitting area LA3 or from being emitted toward the first light emitting area LA1 or the third light emitting area LA3, thereby causing color mixing between the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3 (for example, between pixels adjacent to each other).

[0087] In some embodiments, the thickness TH of the light blocking pattern BP may be less than or equal to about 1 μm in the third direction D3 . However, the present disclosure is not limited thereto, and the thickness TH of the light blocking pattern BP may be variously changed according to the purpose, design, etc. of the display device 10 .

[0088] The transmission dam TB may be arranged on the encapsulation layer TFE and the light blocking pattern BP. The transmission dam TB may overlap the light blocking area BA. In some embodiments, the transmission dam TB may define a first opening OP1 exposing at least a portion of the light blocking pattern BP. In one or more embodiments, the transmission dam TB may define a second opening OP2 overlapping each of the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3. The second opening OP2 may expose the encapsulation layer TFE.

[0089] The transmission dam TB may include a transparent material. For example, the transmission dam TB may include an organic material such as acrylic resin, epoxy resin, polyimide resin, etc. These materials may be used alone or in combination with each other. Since the transmission dam TB includes a transparent material, the transmission dam TB may transmit light incident on the transmission dam TB.

[0090] In some embodiments, the width WD of the light blocking pattern BP may be greater than or equal to the width W1 of the first opening OP1. In this case, the width WD of the light blocking pattern BP and the width W1 of the first opening OP1 may be the lengths of the light blocking pattern BP and the first opening OP1 in the first direction D1, respectively. For example, the width of the upper surface of the light blocking pattern BP may be greater than or equal to the width of the upper surface of the light blocking pattern BP exposed by the first opening OP1. For example, the width W1 of the first opening OP1 may be the minimum width (e.g., minimum value width) of the light blocking pattern BP. In this case, the light transmitted through the transmission dam TB may be increased (e.g., maximized) (see Figure 4 ).

[0091] In one or more embodiments, the width WD of the light blocking pattern BP may be less than or equal to the width W2 of the transmission dam TB. In this case, the width W2 of the transmission dam TB may be the length of the transmission dam TB in the first direction D1. For example, the width of the lower surface of the light blocking pattern BP may be less than or equal to the width of the lower surface of the transmission dam TB. For example, the width W2 of the transmission dam TB may be the widest width (e.g., the maximum value width) of the light blocking pattern BP. In this case, color mixing between pixels adjacent to each other may be minimized or reduced (see Figure 5 ). The width WD of the light blocking pattern BP may be changed between a minimum width and a maximum width.

[0092] Each of the first color conversion pattern CCP1 and the second color conversion pattern CCP2 may be arranged in the second opening OP2 defined by the transmission bank TB. The first color conversion pattern CCP1 may be arranged in the second opening OP2 overlapping the second light emitting area LA2, and the second color conversion pattern CCP2 may be arranged in the second opening OP2 overlapping the third light emitting area LA3. Each of the first color conversion pattern CCP1 and the second color conversion pattern CCP2 may convert the incident light L1 into light in a corresponding wavelength band.

[0093] In some embodiments, the first color conversion pattern CCP1 may convert the incident light L1 to emit the second transmission light L2G. The first color conversion pattern CCP1 may include first quantum dots excited by the incident light L1 to emit the second transmission light L2G. In one or more embodiments, the first color conversion pattern CCP1 may further include first scattering particles and a first photosensitive polymer in which the first scattering particles are dispersed. For example, when the incident light L1 passes through the first color conversion pattern CCP1, the second transmission light L2G in the green wavelength band may be emitted from the second light emitting area LA2, but the present disclosure is not limited thereto.

[0094] In some embodiments, the second color conversion pattern CCP2 may convert the incident light L1 to emit the third transmission light L2R. The second color conversion pattern CCP2 may include a second quantum dot excited by the incident light L1 to emit the third transmission light L2R. In one or more embodiments, the second color conversion pattern CCP2 may further include second scattering particles and a second photosensitive polymer in which the second scattering particles are dispersed. For example, when the incident light L1 passes through the second color conversion pattern CCP2, the third transmission light L2R in the red wavelength band may be emitted from the third light emitting area LA3, but the present disclosure is not limited thereto.

[0095] The capping layer CPL may be arranged on the first color conversion pattern CCP1 and the second color conversion pattern CCP2, the transmission dam TB, and the encapsulation layer TFE. The capping layer CPL may cover the encapsulation layer TFE in the first light emitting area LA1, may cover the first color conversion pattern CCP1 and the second color conversion pattern CCP2 in the second light emitting area LA2 and the third light emitting area LA3, respectively, and may cover the transmission dam TB and the light blocking pattern BP exposed by the first opening OP1 in the light blocking area BA. For example, the capping layer CPL may include an inorganic material such as silicon oxide, silicon nitride, silicon oxynitride, etc. These materials may be used alone or in combination with each other.

[0096] The reflective pattern RP may be arranged on the capping layer CPL. The reflective pattern RP may overlap the light blocking pattern BP and the transmission dam TB. The reflective pattern RP may overlap the light blocking area BA. The reflective pattern RP may be arranged along the outline of the capping layer CPL in the light blocking area BA. In some embodiments, the reflective pattern RP may extend from the upper surface of the light blocking pattern BP to the upper surface of the transmission dam TB along the side surface of the first opening OP1.

[0097] The reflective pattern RP may reflect light incident thereon. Since the reflective pattern RP reflects the incident light L1 or light transmitted through the transmission bank TB and the capping layer CPL among the first transmission light L2B, the second transmission light L2G, and the third transmission light L2R, light efficiency may be improved.

[0098] For example, in the case of the reflective pattern RP adjacent to the second light emitting area LA2, the reflective pattern RP may reflect light transmitted through the transmission bank TB and the capping layer CPL among the incident light L1 emitted by the second light emitting element LE2 overlapping the second light emitting area LA2 or the second transmitted light L2G emitted by the first color conversion pattern CCP1 toward the first color conversion pattern CCP1 or the second structure 200. Therefore, light deviated from the light path may be recycled and light efficiency may be maximized or increased.

[0099] In some embodiments, the reflective pattern RP may include metal. For example, the reflective pattern RP may include aluminum (Al), silver (Ag), gold (Au), etc. However, the present disclosure is not limited thereto, and the reflective pattern RP may include one or more suitable materials having relatively high reflectivity.

[0100] The transmissive pattern LTP may be disposed on the capping layer CPL. The transmissive pattern LTP may be disposed in the second opening OP2 defined by the transmissive bank TB. The transmissive pattern LTP may be disposed in the second opening OP2 overlapping the first light emitting area LA1.

[0101] In one or more embodiments, the transmissive pattern LTP may be disposed on the reflective pattern RP. Therefore, the transmissive pattern LTP may overlap the first light emitting area LA1 and the light blocking area BA. The transmissive pattern LTP overlapping the light blocking area BA may serve as a spacer. In some embodiments, the transmissive pattern LTP may be formed by a different process from the first color conversion pattern CCP1 and the second color conversion pattern CCP2.

[0102] In some embodiments, the transmission pattern LTP may transmit the incident light L1 to emit the first transmission light L2B. The transmission pattern LTP may include third scattering particles and a third photosensitive polymer in which the third scattering particles are dispersed. The transmission pattern LTP may not include (e.g., may exclude) quantum dots. For example, when the incident light L1 passes through the transmission pattern LTP, the first transmission light L2B in the blue wavelength band may be emitted from the first light emitting area LA1, but the present disclosure is not limited thereto.

[0103] The first scattering particles, the second scattering particles, and the third scattering particles may scatter and emit the incident light L1. The first scattering particles, the second scattering particles, and the third scattering particles may include the same material. Each of the first photosensitive polymer, the second photosensitive polymer, and the third photosensitive polymer may include an organic material having light transmittance such as silicone resin, epoxy resin, etc.

[0104] In some embodiments, the second structure 200 may include a second substrate SUB2 , a color filter layer CF, a refractive layer LR, and a protective layer PL The second structure 200 may be disposed on the first structure 100 with the space 400 interposed therebetween.

[0105] The second substrate SUB2 may include a transparent material or an opaque material. For example, the second substrate SUB2 may include a rigid glass substrate, a plastic substrate, a flexible film, a metal substrate, etc. These materials may be used alone or in combination with each other. Since the display area DA of the display device 10 includes the first light emitting area LA1, the second light emitting area LA2, the third light emitting area LA3, and the light blocking area BA, the second substrate SUB2 may also define the first light emitting area LA1, the second light emitting area LA2, the third light emitting area LA3, and the light blocking area BA.

[0106] The color filter layer CF may be disposed on (eg, under) the second substrate SUB2. The color filter layer CF may include a first color filter CF1, a second color filter CF2, and a third color filter CF3.

[0107] The first color filter CF1 may overlap the second light emitting area LA2, the second color filter CF2 may overlap the third light emitting area LA3, and the third color filter CF3 may overlap the first light emitting area LA1. Each of the first color filter CF1, the second color filter CF2, and the third color filter CF3 may selectively transmit light in a corresponding wavelength band.

[0108] The first color filter CF1 may transmit the second transmission light L2G, but may block or reduce light in a wavelength band different from the wavelength band of the second transmission light L2G. For example, the first color filter CF1 may transmit the second transmission light L2G in a green wavelength band, but the present disclosure is not limited thereto. Therefore, in the second light emitting area LA2, the second transmission light L2G may pass through the second substrate SUB2 and may be emitted to the outside (for example, in a third direction D3).

[0109] The second color filter CF2 may transmit the third transmission light L2R, but may block or reduce light in a wavelength band different from the wavelength band of the third transmission light L2R. For example, the second color filter CF2 may transmit the third transmission light L2R in a red wavelength band, but the present disclosure is not limited thereto. Therefore, in the third light emitting area LA3, the third transmission light L2R may pass through the second substrate SUB2 and may be emitted to the outside (e.g., in a third direction D3).

[0110] The third color filter CF3 may transmit the first transmission light L2B, but may block or reduce light in a wavelength band different from the wavelength band of the first transmission light L2B. For example, the third color filter CF3 may transmit the first transmission light L2B in a blue wavelength band, but the present disclosure is not limited thereto. Therefore, in the first light emitting area LA1, the first transmission light L2B may pass through the second substrate SUB2 and may be emitted to the outside (for example, in the third direction D3).

[0111] In some embodiments, each of the first color filter CF1, the second color filter CF2, and the third color filter CF3 may overlap with the light blocking area BA. For example, the first color filter CF1 may overlap with the second light emitting area LA2 and the light blocking area BA, but may not overlap with the first light emitting area LA1 and the third light emitting area LA3. The second color filter CF2 may overlap with the third light emitting area LA3 and the light blocking area BA, but may not overlap with the first light emitting area LA1 and the second light emitting area LA2. The third color filter CF3 may overlap with the first light emitting area LA1 and the light blocking area BA, but may not overlap with the second light emitting area LA2 and the third light emitting area LA3.

[0112] In this case, in the light blocking area BA, the first color filter CF1, the second color filter CF2, and the third color filter CF3 may overlap each other in the third direction D3. For example, in the light blocking area BA, the third color filter CF3 may be arranged on the second color filter CF2 (e.g., below the second color filter CF2), and the first color filter CF1 may be arranged on the third color filter CF3 (e.g., below the third color filter CF3). Therefore, color mixing between the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3 adjacent to each other may be prevented or reduced.

[0113] The refraction layer LR may be disposed on (eg, below) the color filter layer CF. The refraction layer LR may increase light extraction efficiency, and the brightness and lifespan of the display device 10 may increase. For example, the refraction layer LR may include an organic material.

[0114] The protective layer PL may be disposed on (eg, below) the refractive layer LR. The protective layer PL may cover the lower surface of the refractive layer LR. For example, the protective layer PL may include an inorganic material such as silicon oxide, silicon nitride, silicon oxynitride, etc. These materials may be used alone or in combination with each other.

[0115] The display device 10 according to some embodiments of the present disclosure may include a light blocking pattern BP, a transmission dam TB, and a reflection pattern RP. The light blocking pattern BP may include a material having a relatively high absorptivity. Because the light blocking pattern BP absorbs light toward adjacent pixels in the incident light L1 emitted by the light emitting element, color mixing between adjacent pixels may be prevented or reduced.

[0116] In one or more embodiments, in the process of forming the transmission dam TB, because the unnecessary part of the transmission dam TB caused by the exposure reflection may not be formed by the light blocking pattern BP, the light transmitted through the transmission dam TB and not reflected by the reflection pattern RP may be minimized or reduced. Therefore, color mixing between pixels adjacent to each other may be further prevented or reduced. In one or more embodiments, because the light transmitted through the transmission dam TB is reflected by the reflection pattern RP, the light efficiency of the display device 10 may be improved.

[0117] Figure 6 , Figure 7 , Figure 8 , Fig. 9 , Fig.10 , Fig.11 , Fig.12 , Fig.13 and Fig.14 It shows the manufacturing Figure 3 A cross-sectional view of a method of displaying a device. For example, Figure 6 , Figure 7 , Figure 8 , Fig. 9 , Fig.10 and Fig.11 may be a cross-sectional view showing a method of manufacturing the first structure 100, and Fig.12 and Fig.13 It may be a cross-sectional view illustrating a method of manufacturing the second structure 200 .

[0118] refer to Figure 6 , Figure 7 , Figure 8 , Fig. 9 , Fig.10 , Fig.11 , Fig.12 , Fig.13 and Fig.14 The method for manufacturing a display device described herein may be a method for manufacturing a display device according to a reference Figure 1 , Figure 2 , Figure 3 , Figure 4 and Figure 5 Therefore, a redundant description will not be provided or may be simplified.

[0119] refer to Figure 6A buffer layer BFR, a first transistor TR1, a second transistor TR2, and a third transistor TR3, an insulating layer IL, a first pixel electrode PE1, a second pixel electrode PE2, and a third pixel electrode PE3, a pixel defining layer PDL, a light emitting layer EL, a common electrode CE, and an encapsulation layer TFE may be sequentially formed on the first substrate SUB1.

[0120] A light blocking layer may be formed on the encapsulation layer TFE. The light blocking layer may include a light blocking material having a relatively high absorptivity. For example, the light blocking layer may include an organic material containing a light blocking material such as a black pigment, a black dye, carbon black, etc.

[0121] In some embodiments, the light blocking layer may be patterned by a photolithography process to form a light blocking pattern BP. The light blocking pattern BP may overlap the light blocking area BA and may not overlap the first, second, and third light emitting areas LA1, LA2, and LA3.

[0122] refer to Figure 7 A bank layer may be formed on the encapsulation layer TFE and the light blocking pattern BP. For example, the bank layer may include a transparent organic material. In some embodiments, the bank layer may be patterned by a photolithography process to form a transmissive bank TB. The transmissive bank TB may overlap the light blocking area BA.

[0123] In the photolithography process, light reflected by the lower component during exposure may be absorbed by the light blocking pattern BP. Therefore, the transmission bank TB may be formed without including an unnecessary portion due to exposure reflection.

[0124] The transmission bank TB may be formed to define a first opening OP1 exposing at least a portion of the light blocking pattern BP. In one or more embodiments, the transmission bank TB may be formed to define a second opening OP2 overlapping each of the first, second, and third light emitting areas LA1, LA2, and LA3.

[0125] refer to Figure 8 The first color conversion pattern CCP1 may be formed in the second opening OP2 overlapping the second light emitting area LA2, and the second color conversion pattern CCP2 may be formed in the second opening OP2 overlapping the third light emitting area LA3. The first color conversion pattern CCP1 and the second color conversion pattern CCP2 may be formed by an inkjet process.

[0126] For example, the first color conversion pattern CCP1 may be formed by repeatedly dropping the first ink composition into the second opening OP2 overlapping the second light emitting area LA2. The first ink composition may be a material forming the first color conversion pattern CCP1.

[0127] In one or more embodiments, the second color conversion pattern CCP2 may be formed by repeatedly dropping the second ink composition into the second opening OP2 overlapping the third light emitting area LA3. The second ink composition may be a material forming the second color conversion pattern CCP2.

[0128] refer to Fig. 9 , a capping layer CPL may be formed on the encapsulation layer TFE, the transmission bank TB, and the first and second color conversion patterns CCP1 and CCP2. The capping layer CPL may be formed to cover the encapsulation layer TFE exposed by the second opening OP2 in the first light emitting area LA1, to cover the first and second color conversion patterns CCP1 and CCP2 in the second and third light emitting areas LA2 and LA3, respectively, and to cover the transmission bank TB and the light blocking pattern BP exposed by the first opening OP1 in the light blocking area BA.

[0129] refer to Fig.10 , a reflective layer may be formed on the capping layer CPL. The reflective layer may include a material having a relatively high reflectivity. For example, the reflective layer may include a metal.

[0130] In some embodiments, the reflective layer may be patterned by a photolithography process to form a reflective pattern RP. The reflective pattern RP may overlap the light blocking pattern BP and the transmissive dam TB. In some embodiments, the reflective pattern RP may be formed to extend from an upper surface of the light blocking pattern BP to an upper surface of the transmissive dam TB along a side surface of the first opening OP1.

[0131] refer to Fig.11 A transmission layer may be formed on the capping layer CPL and the reflective pattern RP. The transmission layer may include third scattering particles and a third photosensitive polymer. The transmission layer may not include (eg, may exclude) quantum dots.

[0132] In some embodiments, the transmission layer may be patterned by a photolithography process to form the transmission pattern LTP. The transmission pattern LTP may be formed in the second opening OP2 overlapping the first light emitting area LA1 and on the reflection pattern RP. Therefore, in some embodiments, the transmission pattern LTP may not be formed by an inkjet process.

[0133] Therefore, it can be formed Figure 3 The first structure 100 is shown in FIG.

[0134] refer to Fig.12 , a second color filter CF2 may be formed on the second substrate SUB2. The second color filter CF2 may overlap the third light emitting area LA3 and the light blocking area BA.

[0135] A third color filter CF3 may be formed on the second substrate SUB2 and the second color filter CF2. The third color filter CF3 may overlap the first light emitting area LA1 and the light blocking area BA.

[0136] The first color filter CF1 may be formed on the second substrate SUB2 and the third color filter CF3. The first color filter CF1 may overlap the second light emitting area LA2 and the light blocking area BA.

[0137] refer to Fig.13 , a refractive layer LR and a protective layer PL may be sequentially formed on the color filter layer CF. Thus, a refractive layer LR and a protective layer PL may be formed. Figure 3 The second structure 200 is shown in FIG.

[0138] refer to Figure 3 and Fig.14 , the first structure 100 and the second structure 200 can be coupled to each other. For example, the sealing member (e.g., Figure 2 The sealing member 300) couples the first structure 100 and the second structure 200 to each other. Figure 3 The display device 10 shown in FIG.

[0139] Fig.15 is a cross-sectional view showing a display device according to one or more other embodiments of the present disclosure. For example, Fig.15 Can correspond to Figure 3 For example, Fig.15 may be a cross-sectional view illustrating an example of a display area DA included in the display device 20 .

[0140] In addition to the transmissive pattern LTP and the capping layer CPL, reference Fig.15 The display device 20 described can be used with reference Figure 1 , Figure 2 , Figure 3 , Figure 4 and Figure 5 The display device 10 described is substantially the same or similar. Therefore, a redundant description will not be provided or may be simplified.

[0141] refer to Fig.15 The display device 20 may include a display area DA, and the display area DA may include a first light emitting area LA1, a second light emitting area LA2, a third light emitting area LA3, and a light blocking area BA. The light blocking area BA may be arranged between the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3 adjacent to each other.

[0142] The display device 20 may include a first structure 100 and a second structure 200 facing each other. The second structure 200 may be spaced apart from the first structure 100 in the third direction D3. Incident light L1 generated from the first structure 100 may be emitted to the outside through the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3 (eg, in the third direction D3).

[0143] The first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3 may emit light in different wavelength bands. For example, the first light emitting area LA1 may emit a first transmission light L2B in a blue wavelength band, the second light emitting area LA2 may emit a second transmission light L2G in a green wavelength band, and the third light emitting area LA3 may emit a third transmission light L2R in a red wavelength band, but the present disclosure is not limited thereto.

[0144] In some embodiments, the first structure 100 may include a first substrate SUB1, a buffer layer BFR, a first transistor TR1, a second transistor TR2, and a third transistor TR3, an insulating layer IL, a pixel defining layer PDL, a first light emitting element LE1, a second light emitting element LE2, and a third light emitting element LE3, an encapsulation layer TFE, a light blocking pattern BP, a transmission dam TB, a transmission pattern LTP, a first color conversion pattern CCP1, a second color conversion pattern CCP2, a capping layer CPL, and a reflection pattern RP.

[0145] Here, the first light emitting element LE1 may include a first pixel electrode PE1, a light emitting layer EL and a common electrode CE, the second light emitting element LE2 may include a second pixel electrode PE2, a light emitting layer EL and a common electrode CE, and the third light emitting element LE3 may include a third pixel electrode PE3, a light emitting layer EL and a common electrode CE.

[0146] A buffer layer BFR, first, second, and third transistors TR1, TR2, and TR3, an insulating layer IL, first, second, and third pixel electrodes PE1, PE2, and PE3, a pixel defining layer PDL, a light emitting layer EL, a common electrode CE, and an encapsulation layer TFE may be sequentially arranged on the first substrate SUB1.

[0147] The light blocking pattern BP may be arranged in the light blocking area BA on the encapsulation layer TFE. The light blocking pattern BP may include a light blocking material having a relatively high absorptivity. For example, the light blocking pattern BP may include an organic material including a light blocking material such as black pigment, black dye, carbon black, etc.

[0148] The light blocking pattern BP can absorb the high angle component of the incident light L1. Because the light blocking pattern BP absorbs the light emitted toward another adjacent light emitting area in the incident light L1 to block or reduce transmission, color mixing between the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3 adjacent to each other (e.g., between adjacent pixels) can be prevented or reduced. In some embodiments, the thickness of the light blocking pattern BP can be less than or equal to about 1 μm.

[0149] The transmission dam TB may be arranged in the light blocking area BA on the encapsulation layer TFE and the light blocking pattern BP. In some embodiments, the transmission dam TB may define a first opening OP1 exposing at least a portion of the light blocking pattern BP, and may define a second opening OP2 overlapping the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3 and exposing the encapsulation layer TFE. In some embodiments, the transmission dam TB may include a transparent material and may transmit light incident on the transmission dam TB.

[0150] In some embodiments, the width of the first opening OP1 may be the minimum width (eg, minimum value width) of the light blocking pattern BP, and the width of the transmission bank TB may be the maximum width (eg, maximum value width) of the light blocking pattern BP.

[0151] Each of the transmissive pattern LTP, the first color conversion pattern CCP1, and the second color conversion pattern CCP2 may be arranged in the second opening OP2 defined by the transmissive dam TB. The transmissive pattern LTP may be arranged in the second opening OP2 overlapping the first light emitting area LA1, the first color conversion pattern CCP1 may be arranged in the second opening OP2 overlapping the second light emitting area LA2, and the second color conversion pattern CCP2 may be arranged in the second opening OP2 overlapping the third light emitting area LA3.

[0152] The transmission pattern LTP may transmit the incident light L1 , and each of the first and second color conversion patterns CCP1 and CCP2 may convert the incident light L1 into light in a corresponding wavelength band.

[0153] In some embodiments, the transmission pattern LTP may transmit the incident light L1 to emit the first transmission light L2B. The first color conversion pattern CCP1 may convert the incident light L1 to emit the second transmission light L2G. The second color conversion pattern CCP2 may convert the incident light L1 to emit the third transmission light L2R.

[0154] In some embodiments, the transmissive pattern LTP and each of the first and second color conversion patterns CCP1 and CCP2 may be formed by an inkjet process. Therefore, the transmissive pattern LTP may not be formed by a photolithography process.

[0155] The capping layer CPL may be arranged on the transmissive pattern LTP, the first and second color conversion patterns CCP1 and CCP2, and the transmissive dam TB. The capping layer CPL may cover the transmissive pattern LTP and the first and second color conversion patterns CCP1 and CCP2 in the first, second, and third light emitting areas LA1, LA2, and LA3, respectively, and may cover the transmissive dam TB and the light blocking pattern BP exposed by the first opening OP1 in the light blocking area BA.

[0156] The reflective pattern RP may be disposed in the light blocking area BA on the capping layer CPL. In some embodiments, the reflective pattern RP may extend from an upper surface of the light blocking pattern BP to an upper surface of the transmissive bank TB along a side surface of the first opening OP1.

[0157] In some embodiments, the reflective pattern RP may include metal. The reflective pattern RP may reflect light incident on the reflective pattern RP. Since the reflective pattern RP reflects the incident light L1 or the light transmitted through the transmission dam TB and through the capping layer CPL among the first transmission light L2B, the second transmission light L2G, and the third transmission light L2R, light efficiency may be improved.

[0158] In some embodiments, the second structure 200 may include a second substrate SUB2, a color filter layer CF, a refractive layer LR, and a protective layer PL. The color filter layer CF may include a first color filter CF1, a second color filter CF2, and a third color filter CF3. The color filter layer CF, the refractive layer LR, and the protective layer PL may be sequentially arranged on the second substrate SUB2 (e.g., under the second substrate SUB2).

[0159] Fig.16 is a cross-sectional view showing a display device according to one or more other embodiments of the present disclosure. For example, Fig.16 Can correspond to Figure 3 Therefore, Fig.16 may be a cross-sectional view illustrating an example of a display area DA included in the display device 30 .

[0160] Except that the light blocking pattern BP, the transmissive bank TB, the first color conversion pattern CCP1, the second color conversion pattern CCP2, the capping layer CPL, and the transmissive pattern LTP are included in the second structure 200 (eg, not in the first structure 100), referring to Fig.16 The display device 30 described can be used with reference Figure 1 , Figure 2 , Figure 3 , Figure 4 and Figure 5The display device 10 described is substantially the same or similar. Therefore, a redundant description will not be provided or may be simplified.

[0161] refer to Fig.16 The display device 30 may include a display area DA, and the display area DA may include a first light emitting area LA1, a second light emitting area LA2, a third light emitting area LA3, and a light blocking area BA. The light blocking area BA may be arranged between the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3 adjacent to each other.

[0162] The display device 30 may include a first structure 100 and a second structure 200 facing each other. The second structure 200 may be spaced apart from the first structure 100 in the third direction D3. Incident light L1 generated from the first structure 100 may be emitted to the outside through the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3 (eg, in the third direction D3).

[0163] The first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3 may emit light in different wavelength bands. For example, the first light emitting area LA1 may emit a first transmission light L2B in a blue wavelength band, the second light emitting area LA2 may emit a second transmission light L2G in a green wavelength band, and the third light emitting area LA3 may emit a third transmission light L2R in a red wavelength band, but the present disclosure is not limited thereto.

[0164] In some embodiments, the first structure 100 may include a first substrate SUB1, a buffer layer BFR, first, second and third transistors TR1, TR2 and TR3, an insulating layer IL, a pixel defining layer PDL, first, second and third light emitting elements LE1, LE2 and LE3, and an encapsulation layer TFE.

[0165] Here, the first light emitting element LE1 may include a first pixel electrode PE1, a light emitting layer EL and a common electrode CE, the second light emitting element LE2 may include a second pixel electrode PE2, a light emitting layer EL and a common electrode CE, and the third light emitting element LE3 may include a third pixel electrode PE3, a light emitting layer EL and a common electrode CE.

[0166] A buffer layer BFR, first, second, and third transistors TR1, TR2, and TR3, an insulating layer IL, first, second, and third pixel electrodes PE1, PE2, and PE3, a pixel defining layer PDL, a light emitting layer EL, a common electrode CE, and an encapsulation layer TFE may be sequentially arranged on the first substrate SUB1.

[0167] In some embodiments, the second structure 200 may include a second substrate SUB2, a color filter layer CF, a refractive layer LR, a protective layer PL, a light blocking pattern BP, a transmissive dam TB, a first color conversion pattern CCP1, a second color conversion pattern CCP2, a capping layer CPL, a reflective pattern RP, and a transmissive pattern LTP.

[0168] The color filter layer CF may include a first color filter CF1, a second color filter CF2, and a third color filter CF3. The color filter layer CF, the refractive layer LR, and the protection layer PL may be sequentially disposed on (eg, under) the second substrate SUB2.

[0169] The light blocking pattern BP may be arranged in the light blocking area BA on the protective layer PL (e.g., under the protective layer PL). The light blocking pattern BP may include a light blocking material having a relatively high absorptivity. For example, the light blocking pattern BP may include an organic material including a light blocking material such as a black pigment, a black dye, carbon black, etc. In some embodiments, the thickness of the light blocking pattern BP may be less than or equal to about 1 μm.

[0170] The transmission dam TB may be arranged in the light blocking area BA on the protection layer PL and the light blocking pattern BP (e.g., under the protection layer PL and the light blocking pattern BP). In some embodiments, the transmission dam TB may define a first opening OP1 exposing at least a portion of the light blocking pattern BP and a second opening OP2 overlapping the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3 and exposing the protection layer PL. The transmission dam TB may transmit light incident on the transmission dam TB. In some embodiments, the width of the first opening OP1 may be the minimum width (e.g., minimum value width) of the light blocking pattern BP, and the width of the transmission dam TB may be the maximum width (e.g., maximum value width) of the light blocking pattern BP.

[0171] The first color conversion pattern CCP1 may be disposed in the second opening OP2 overlapping the second light emitting area LA2, and the second color conversion pattern CCP2 may be disposed in the second opening OP2 overlapping the third light emitting area LA3. In some embodiments, the first color conversion pattern CCP1 may convert the incident light L1 to emit the second transmission light L2G, and the second color conversion pattern CCP2 may convert the incident light L1 to emit the third transmission light L2R.

[0172] The capping layer CPL may be arranged on (e.g., below) the first and second color conversion patterns CCP1 and CCP2, the transmission dam TB, and the protective layer PL. The capping layer CPL may cover the protective layer PL in the first light emitting area LA1, may cover the first and second color conversion patterns CCP1 and CCP2 in the second and third light emitting areas LA2 and LA3, respectively, and may cover the transmission dam TB and the light blocking pattern BP exposed by the first opening OP1 in the light blocking area BA.

[0173] The reflective pattern RP may be disposed in the light blocking area BA on the capping layer CPL (e.g., below the capping layer CPL). In some embodiments, the reflective pattern RP may extend from the lower surface of the light blocking pattern BP to the lower surface of the transmissive dam TB along the side surface of the first opening OP1. The reflective pattern RP may reflect light incident on the reflective pattern RP.

[0174] The transmissive pattern LTP may be disposed in the second opening OP2 overlapping the first light emitting area LA1. In some embodiments, the transmissive pattern LTP may transmit the incident light L1 to emit the first transmissive light L2B.

[0175] In some embodiments, the transmissive pattern LTP may be formed by a photolithography process and may be further arranged in the light blocking area BA on the reflective pattern RP (e.g., below the reflective pattern RP). However, the present disclosure is not limited thereto. In some embodiments, the transmissive pattern LTP may be formed by an inkjet process and may not be further arranged on the reflective pattern RP (e.g., below the reflective pattern RP). In one or more embodiments, the capping layer CPL may cover the transmissive pattern LTP in the first light emitting area LA1.

[0176] Embodiments of the present disclosure may be applied to one or more suitable display devices. For example, embodiments of the present disclosure may be applied to one or more suitable display devices such as display devices for vehicles, ships and aircraft, portable communication devices, display devices for display or information transmission, medical display devices, etc.

[0177] The foregoing is an example of an embodiment and should not be construed as limiting the same. Although several embodiments have been described, it will be readily appreciated by those skilled in the art that many modifications are possible in the embodiments without substantially departing from aspects of the present disclosure. Therefore, all such modifications are intended to be included within the scope of the present disclosure as defined in the claims. Therefore, it should be understood that the foregoing is an example of one or more suitable embodiments and should not be construed as being limited to the specific embodiments disclosed, and modifications to the disclosed embodiments as well as other embodiments are intended to be included within the scope of the appended claims and their functional equivalents.

Claims

1. A display device, comprising: a substrate defining a light emitting region and a light blocking region adjacent to the light emitting region; a light blocking pattern over the substrate at the light blocking area; a transmissive bank over the light blocking pattern and defining a first opening exposing at least a portion of the light blocking pattern; as well as A reflective pattern is above the transmissive bank and the light blocking pattern exposed by the first opening.

2. The display device according to claim 1, wherein: The reflective pattern extends from an upper surface of the light blocking pattern to an upper surface of the transmission dam along a side surface of the first opening.

3. The display device according to claim 1, wherein: The light blocking pattern has a thickness less than or equal to 1 μm.

4. The display device according to claim 1, wherein: A width of the light blocking pattern is greater than or equal to a width of the first opening.

5. The display device according to claim 4, wherein: The width of the light blocking pattern is less than or equal to a width of the transmission bank. 6 . The display device of claim 1 , further comprising a color conversion pattern over the substrate at the light emitting region.

7. The display device according to claim 6, wherein: The transmission bank further defines a second opening overlapping the light emitting area, and Wherein, the color conversion pattern is in the second opening. 8 . The display device according to claim 7 , further comprising a transmissive pattern over the substrate at the light emitting area.

9. The display device according to claim 8, wherein: The transmission bank further defines a third opening overlapping the light emitting area, and Wherein, the transmission pattern is in the third opening and above the reflection pattern.

10. The display device according to claim 1, wherein: The reflective pattern includes metal. The display device of claim 1 , further comprising a light emitting layer between the substrate and the light blocking pattern.

12. A method for manufacturing a display device, the method comprising: forming a light blocking pattern at the light blocking area over a substrate defining a light blocking area and a light emitting area adjacent to the light blocking area; forming a transmissive dam over the light blocking pattern defining a first opening exposing at least a portion of the light blocking pattern; as well as A reflective pattern is formed over the light blocking pattern exposed by the first opening and over the transmissive bank.

13. The method according to claim 12, wherein: The reflective pattern extends from an upper surface of the light blocking pattern to an upper surface of the transmission dam along a side surface of the first opening.

14. The method according to claim 12, wherein: The light blocking pattern has a thickness less than or equal to 1 μm.

15. The method according to claim 12, wherein: A width of the light blocking pattern is greater than or equal to a width of the first opening.

16. The method according to claim 15, wherein: The width of the light blocking pattern is less than or equal to a width of the transmission bank.

17. The method of claim 12, further comprising forming a color conversion pattern at the light emitting region over the substrate after forming the transmission dam and before forming the reflection pattern.

18. The method according to claim 17, wherein: The transmission bank further defines a second opening overlapping the light emitting area, and Wherein, the color conversion pattern is formed in the second opening. 19 . The method of claim 18 , further comprising forming a transmissive pattern over the substrate at the light emitting region after forming the reflective pattern.

20. The method according to claim 19, wherein: The transmission bank further defines a third opening overlapping the light emitting area, and Wherein, the transmission pattern is formed in the third opening and above the reflection pattern. 21 . The method of claim 12 , further comprising forming a light emitting layer on the substrate before forming the light blocking pattern.

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