Abnormal segmentation method of self-supervised learning negative bidirectional distillation

Through self-supervised learning of the abnormal segmentation method of negative two-way distillation, using simulated abnormal data sets and differentiated model structures, the problem that models in the existing technology are difficult to effectively learn abnormal information is solved, and higher abnormal detection accuracy and stability are achieved.

CN119832247APending Publication Date: 2025-04-15SOUTH CHINA UNIV OF TECH

Patent Information

Application Number
CN202510014568.7
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-01-06
Publication Date
2025-04-15

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Abstract

The invention discloses a self-supervised learning negative two-way distillation anomaly segmentation method, which comprises the steps of preprocessing a non-anomaly unsupervised anomaly detection training data set, and constructing a simulated anomaly data set; training a student network encoder by combining knowledge distillation and negative learning thoughts according to the simulated abnormal data set; performing multi-scale feature fusion on an output result of the encoder; inputting a feature fusion result into a student network decoder, and training the decoder through a reverse distillation and self-supervision anomaly reconstruction task; performing feature fusion on output results of corresponding layers of the student network and the teacher network by using feature fusion based on a channel attention mechanism; and taking the fused features as input to train a segmentation network so as to accurately predict an abnormal position. According to the method, a bidirectional distillation network structure is constructed, and a self-supervised reconstruction task is combined with a negative learning idea, so that the decision-making ability of the model is effectively enhanced, and the image segmentation accuracy in anomaly detection is remarkably improved.
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Citation Information

Patent Citations

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