Sewage treatment plant

Abstract

The application discloses a sewage treatment device and relates to the technical field of sewage treatment. The sewage treatment device comprises a reaction chamber, a base shaft, a plurality of electrode plate assemblies and a lifting polishing mechanism. The plurality of electrode plate assemblies are arranged around the base shaft, each electrode plate assembly is detachably connected with the base shaft, and each electrode plate assembly comprises a plurality of electrode sheets arranged at intervals and in parallel. The lifting polishing mechanism is arranged in the second function cavity on the side of the first function cavity when the lifting polishing mechanism is in the first position, the surface of the electrode sheet can be polished when the lifting polishing mechanism is in the second position, and the electrode sheet can be clamped and taken out of the first function cavity when the lifting polishing mechanism is in the third position. The lifting polishing mechanism provided in the application can polish or replace the electrode sheet while continuously treating sewage, so that the sewage treatment device has no vacuum period, and the continuous treatment of sewage is facilitated.

Description

Technical Field

[0001] This invention relates to the field of wastewater treatment, and more particularly to a wastewater treatment device. Background Technology

[0002] Electrocoagulation, a commonly used electrochemical method in water treatment, can complete oxidation, reduction, flocculation, and flotation processes in a single step. In wastewater treatment devices employing electrocoagulation, electrode materials are needed to treat impurities in the wastewater; these electrode materials are used as consumables during this process.

[0003] In existing wastewater treatment devices, once the electrode material is consumed to a certain extent, it needs to be ground or replaced to maintain efficient wastewater treatment. However, the wastewater treatment device needs to be shut down during the grinding or replacement process, resulting in a long period of inactivity, which is detrimental to continuous wastewater treatment. Summary of the Invention

[0004] The present invention discloses a wastewater treatment device to at least partially improve the above-mentioned technical problems.

[0005] To solve the above problems, the present invention adopts the following technical solution:

[0006] This application provides a wastewater treatment device, including: a reaction chamber, a base shaft, multiple sets of electrode plate assemblies, and a lifting and polishing mechanism. The reaction chamber has a first functional cavity and a second functional cavity that are interconnected. The base shaft is disposed within the first functional cavity. Multiple sets of electrode plate assemblies are disposed around the base shaft within the first functional cavity, and each electrode plate assembly is detachably connected to the base shaft; each electrode plate assembly includes multiple spaced and parallel electrode plates. The lifting and polishing mechanism can switch between a first position, a second position, and a third position in a vertical direction, wherein the second position is located between the first position and the second position. When the lifting and polishing mechanism is in the first position, it is disposed within the second functional cavity. When the lifting and polishing mechanism is in the second position, it at least partially extends into the gap between the electrode plates and is used to polish the surface of the electrode plates. When the lifting and polishing mechanism is in the third position, it can unlock the electrode plates from the base shaft and clamp and fix the electrode plates.

[0007] In one embodiment, the wastewater treatment device further includes: an elastic buckle, the fixed end of which is connected to the base shaft, the electrode plate being provided with a buckle groove, and the free end of which is selectively embedded in the buckle groove;

[0008] The lifting and polishing mechanism includes a lifting cylinder, a clamping component, and a triggering component. The clamping component is connected to the lifting cylinder and is used to clamp the electrode sheet. The triggering component is connected to the lifting cylinder and is used to open the free end of the elastic buckle so that the free end of the elastic buckle disengages from the buckle groove.

[0009] In one embodiment, the lifting and polishing mechanism further includes: a support frame, a first rod, a second rod, a first gear, a drive gear, and a second drive member. The first rod and the second rod are movably connected to the support frame, the trigger member is connected to the support frame, and the clamping member includes: a first polishing disc and a second polishing disc. The first polishing disc is threadedly connected to the first rod, the second polishing disc passes through the second rod, the first gear is connected to the first rod, the drive gear meshes with the first gear, and the second drive member is connected to the drive gear and is used to drive the drive gear to rotate.

[0010] The lifting and grinding mechanism further includes: a second gear, which is connected to the second rod, and a second grinding disc is threadedly connected to the second rod. The first gear meshes with the second gear, and the rotation directions of the first gear and the second gear are opposite.

[0011] In one embodiment, the lifting and grinding mechanism further includes: a structural frame, which is movably disposed on the lifting cylinder and can reciprocate relative to the lifting cylinder in a first direction; and a support frame, which is movably disposed on the structural frame and can reciprocate relative to the structural frame in a second direction, wherein the first direction is perpendicular to the second direction.

[0012] In one embodiment, the lifting and grinding mechanism further includes: a transverse guide rail, which is connected between the structural frame and the support frame. The transverse guide rail can reciprocate relative to the structural frame in the second direction, and the support frame can reciprocate relative to the transverse guide rail in the second direction.

[0013] In one embodiment, the base shaft includes a first shaft body, a second shaft body, a first wiring group, and a second wiring group. The first shaft body is fixedly connected to the reaction chamber, and the second shaft body is sleeved on the first shaft body and rotates in cooperation with the first shaft body.

[0014] The first wiring group and the second wiring group are spaced apart along the axial direction of the first shaft. Both the first wiring group and the second wiring group include positive and negative terminals that are spaced apart and alternately arranged along the circumferential direction of the first shaft.

[0015] The second shaft is provided with a plurality of third wiring groups, which are connected to the electrode plates. Each third wiring group includes a first wiring mechanism and a second wiring mechanism. The first wiring mechanism is connected to the first wiring group, and the second wiring mechanism is connected to the second wiring group. One of the first wiring mechanism and the second wiring mechanism is connected to the positive terminal connector, and the other is connected to the negative terminal connector.

[0016] In one embodiment, both the first wiring mechanism and the second wiring mechanism include a first conductive terminal, a second conductive terminal, and a Hall switch. The first conductive terminal is used to conduct to the electrode plate, and the second conductive terminal is used to conduct to one of the first wiring group and the second wiring group.

[0017] The first conductive terminal and the second conductive terminal are connected via the Hall switch;

[0018] The electrode plate is equipped with a magnetic element. When the lifting and grinding mechanism causes the electrode plate assembly to separate from the base shaft, the Hall switch is turned off; when the electrode plate assembly is connected to the base shaft, the Hall switch is turned on.

[0019] In one embodiment, the electrode sheet has a connection interface, which is connected to the third wiring group, and a one-way conductive membrane is provided at the connection interface;

[0020] And / or, the first wiring mechanism and the second wiring mechanism are offset from each other in the axial direction of the second shaft.

[0021] In one embodiment, the wastewater treatment device further includes a first driving member connected to the base shaft and used to drive the base shaft to rotate.

[0022] In one embodiment, the wastewater treatment device further includes an agitator connected to the base shaft and extending radially along the base shaft.

[0023] The technical solution adopted in this invention can achieve the following beneficial effects:

[0024] The wastewater treatment device provided in this application embodiment has a base shaft set in the first functional chamber of the reaction chamber, and multiple sets of electrode plate assemblies are arranged around the base shaft. Each set of electrode plates is detachably connected to the base shaft and includes multiple spaced and parallel electrode pieces. A lifting and grinding mechanism is also provided. When the lifting and grinding mechanism is in the first position, it is located in the second functional chamber on one side of the first functional chamber. When the lifting and grinding mechanism is in the second position, it extends at least partially into the first functional chamber and into the gap between the electrode pieces, at which time the surface of the electrode pieces can be ground. When the lifting and grinding mechanism is in the third position, it can unlock the electrode pieces from the base and clamp the electrode pieces to remove them from the first functional chamber. In this embodiment, since multiple sets of electrode plate assemblies are spaced apart on the outer circumferential surface of the base shaft, during the process of removing the electrode plates or grinding the electrode plates, the other motor plates are not affected except for the electrode plates that are in contact with the lifting and grinding mechanism. Therefore, the lifting and grinding mechanism provided in this application embodiment can continue to treat sewage while grinding or replacing the electrode plates, so that the entire sewage treatment device has no vacuum period, which is conducive to the continuous treatment of sewage. Attached Figure Description

[0025] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0026] Figure 1 A schematic diagram of a wastewater treatment device according to an embodiment of this application is shown.

[0027] Figure 2 A schematic diagram of the structure of a grinding electrode sheet in a wastewater treatment device according to an embodiment of this application is shown.

[0028] Figure 3 A schematic diagram of the structure of a wastewater treatment device for grasping electrode plates is shown in one embodiment of this application.

[0029] Figure 4 This illustration shows a schematic diagram of a wastewater treatment device according to an embodiment of the present application, in which an electrode sheet is pulled out of the reaction chamber.

[0030] Figure 5 for Figure 2 Enlarged view of point A in the middle.

[0031] Figure 6A top view of a portion of the structure of a lifting and grinding mechanism in a wastewater treatment device according to an embodiment of this application is shown.

[0032] Figure 7 The diagram shows the arrangement of the structural frame, transverse guide rail, and support frame in the lifting and grinding mechanism of a wastewater treatment device according to an embodiment of this application.

[0033] Figure 8 An axial cross-sectional view along the base axis of an electrode plate assembly in a wastewater treatment apparatus according to an embodiment of this application is shown.

[0034] Figure 9 A partial electrode plate assembly and a base shaft axial cross-sectional view are shown in one embodiment of a wastewater treatment apparatus according to this application.

[0035] Figure 1 0 is Figure 8 Enlarged view of point B in the middle.

[0036] In the diagram: 1. Wastewater treatment device;

[0037] 10. Reaction chamber; 110. First functional chamber; 120. Second functional chamber;

[0038] 20. Base shaft; 210. First shaft body; 220. Second shaft body; 250. Positive terminal connector; 260. Negative terminal connector; 270. Third wiring group; 271. First wiring mechanism; 272. Second wiring mechanism; 281. First conductive terminal; 282. Second conductive terminal; 283. Hall effect switch;

[0039] 30. Electrode plate assembly; 310. Electrode sheet; 311. Clip; 312. Insulating base; 313. Connection interface; 314. Magnetic component; 315. One-way conductive membrane; 320. Elastic buckle;

[0040] 40. Lifting and grinding mechanism; 410. Lifting cylinder; 420. Clamping component; 421. First grinding disc; 422. Second grinding disc; 430. Trigger; 440. Support frame; 450. First rod; 460. Second rod; 470. First gear; 480. Drive gear; 490. Second drive component; 4110. Second gear; 4120. Structural frame; 4130. Transverse guide rail;

[0041] 50. First driving component;

[0042] 60. Agitator. Detailed Implementation

[0043] To make the objectives, technical solutions, and advantages of this invention clearer, the technical solutions of this invention will be described in detail below. Obviously, the described embodiments are merely some embodiments of this invention, and not all embodiments. Based on the embodiments of this invention, all other implementation methods obtained by those skilled in the art without creative effort are within the scope of protection of this invention.

[0044] The terms "first," "second," etc., used in the specification and claims of this application are used to distinguish similar objects and not to describe a specific order or sequence. It should be understood that such use of data can be interchanged where appropriate so that embodiments of this application can be implemented in orders other than those illustrated or described herein, and the objects distinguished by "first," "second," etc., are generally of the same class and the number of objects is not limited; for example, a first object can be one or more. Furthermore, in the specification and claims, "and / or" indicates at least one of the connected objects, and the character " / " generally indicates that the preceding and following objects are in an "or" relationship.

[0045] In the various embodiments of this application, "near end" and "far end" refer to the distance of each component from the user in the usage environment. The end closer to the user is designated as the "near end", and the end farther from the user is designated as the "far end".

[0046] The inventive concept of this application is described here:

[0047] Electrocoagulation, a commonly used electrochemical method in water treatment, can complete oxidation, reduction, flocculation, and flotation processes in a single step. In wastewater treatment devices employing electrocoagulation, electrode materials are needed to treat impurities in the wastewater; these electrode materials are used as consumables during this process.

[0048] In existing wastewater treatment devices, once the electrode material is consumed to a certain extent, it needs to be ground or replaced to maintain efficient wastewater treatment. However, the wastewater treatment device needs to be shut down during the grinding or replacement process, resulting in a long period of inactivity, which is detrimental to continuous wastewater treatment.

[0049] Based on this, the inventors provide a sewage treatment device that does not need to be shut down during the grinding or replacement of electrode plates. In other words, the sewage treatment device provided in this application embodiment allows sewage treatment, grinding or replacement of electrode plates to be carried out simultaneously, which can avoid the vacuum period caused by grinding or replacing electrode plates and facilitate the continuous treatment of sewage by the sewage treatment device.

[0050] The following is in conjunction with the appendix Figures 1 to 10 The wastewater treatment device 1 provided in this application will be described in detail through specific embodiments and application scenarios.

[0051] Please also refer to Figures 1-4 This application provides a wastewater treatment device 1, including: a reaction vessel, a base shaft 20, multiple sets of electrode plate assemblies 30, and a lifting and grinding mechanism 40.

[0052] The reaction chamber 10 can serve as the outer shell of the wastewater treatment device 1. The interior of the reaction chamber 10 can form a first functional cavity 110 and a second functional cavity 120 that are interconnected. In this embodiment, the first functional cavity 110 can be used for wastewater treatment, and the second functional cavity 120 can be disposed above the first functional cavity 110 and used to clamp the electrode plate assembly 30.

[0053] The base shaft 20 can be disposed in the first functional cavity 110 and serve as a carrier for multiple sets of electrode plate assemblies 30.

[0054] Multiple sets of electrode plate assemblies 30 can be disposed within the first functional cavity 110 and spaced apart around the outer peripheral surface of the base shaft 20. For example, in one embodiment, the electrode plate assemblies 30 can be configured as 4, 5, or 6 sets. Each set of electrode plate assemblies 30 can include multiple electrode sheets 310 spaced apart and arranged in parallel along the axial direction of the base shaft 20. The electrode sheets 310 can be connected to the base shaft 20 and can be used for electrocoagulation. In this embodiment, the electrode plate assemblies 30 and the electrode sheets 310 can be detachably connected relative to the base shaft 20.

[0055] The lifting and polishing mechanism 40 can be installed inside the reaction chamber 10, and the lifting and polishing mechanism 40 can switch between a first position, a second position and a third position in the vertical direction, wherein the second position is located between the first position and the third position.

[0056] Specifically, when the lifting and polishing mechanism 40 is in the first position, the lifting and polishing mechanism 40 is located in the second functional cavity 120, and the lifting and polishing mechanism 40 does not work at this time.

[0057] Please see Figure 2 When the lifting and polishing mechanism 40 is in the second position, the lifting and polishing mechanism 40 extends at least partially into the gap between the electrode plates 310 and can abut against the surface of the electrode plates 310 to polish the surface of the electrode plates 310.

[0058] Please also refer to Figure 3 and Figure 4When the lifting and polishing mechanism 40 is in the third position, the lifting and polishing mechanism 40 can unlock the electrode plate 310 and the base shaft 20, and can clamp and fix the electrode plate 310 to clamp the electrode plate 310 out of the first functional cavity 110.

[0059] In other words, in this embodiment, the lifting and polishing mechanism 40 not only has the function of polishing the electrode sheet 310, but also has the function of removing the electrode sheet 310 from the first functional cavity 110, which makes it convenient for the user to replace the electrode sheet 310.

[0060] Please also refer to Figure 2 and Figure 5 It should be noted that this application does not limit the detachable method between the electrode plate 310 and the base shaft 20. For example, in one embodiment, the sewage treatment device 1 may further include an elastic buckle 320. The fixed end of the elastic buckle 320 may be connected to the base shaft 20. The electrode plate 310 may be provided with a buckle groove 311. The free end of the elastic member may be selectively embedded in the buckle groove 311. When the free end of the elastic member is embedded in the buckle groove 311, the electrode plate 310 and the base shaft 20 are locked. When the free end of the elastic member is outside the buckle groove 311, the electrode plate 310 and the base shaft 20 are unlocked.

[0061] Please also refer to Figure 2 , Figure 4 and Figure 5 Correspondingly, the lifting and polishing mechanism 40 may include a lifting cylinder 410, a clamping member 420, and a trigger member 430. The lifting cylinder 410 may be vertically arranged, and both the clamping member 420 and the trigger member 430 may be connected to the lifting cylinder 410 to facilitate switching of the lifting and polishing mechanism 40 between the aforementioned first position, second position, and third position. The clamping member 420 may be used to abut against the electrode plate 310 to polish the electrode plate 310 or to clamp the electrode plate 310 to grasp the electrode plate 310. The trigger member 430 may be used to unlock the electrode plate 310 from the base shaft 20. Specifically, when the lifting and polishing mechanism 40 is in the third position, the trigger member 430 may open the free end of the elastic buckle 320, thereby causing the elastic buckle 320 to disengage from the buckle groove 311, thus achieving the effect of unlocking the electrode plate 310 from the base shaft 20.

[0062] For further information, please refer to the following: Figure 4 and Figure 6In one embodiment, the lifting and grinding mechanism 40 may further include: a support frame 440, a first rod 450, a second rod 460, a first gear 470, a drive gear 480, and a second drive member 490. The first rod 450 and the second rod 460 are both movably connected to the support frame 440, specifically, they are rotatable relative to the support frame 440. A trigger member 430 may also be connected to the support frame 440. In other embodiments, a portion of the frame of the support frame 440 may be used as the trigger member 430, depending on the specific circumstances.

[0063] As mentioned above, in this embodiment, the clamping member 420 may include a first polishing disc 421 and a second polishing disc 422. The first polishing disc 421 and the second polishing disc 422 can cooperate with each other to approach the electrode sheet 310, thereby polishing or gripping the electrode sheet 310. It should be noted that this embodiment does not limit the specific positions of the first polishing disc 421 and the second polishing disc 422. For example, in one embodiment, the first polishing disc 421 can be close to the electrode plate 310, and the second polishing disc 422 can be relatively far away from the electrode plate 310. The first polishing disc 421 can be threadedly connected to the first rod 450 and can move closer to or further away from the electrode plate 310 as the first rod 450 rotates. The second polishing disc 422 can be connected to the second rod 460. When the first rod 450 rotates and drives the first polishing disc 421 to approach the electrode plate 310, the first polishing disc 421 can abut against the surface of the electrode plate 310. At this time, the first polishing disc 421 and the second polishing disc 422 sandwich the electrode plate 310 in the middle, thereby polishing the surface of the electrode plate 310. When the first rod 450 continues to rotate and drives the first polishing disc 421 to move closer to the electrode plate 310, the first polishing disc 421 and the second polishing disc 422 can together clamp the electrode plate 310, thereby allowing the electrode plate 310 to be gripped out of the first functional cavity 110. That is to say, in the aforementioned embodiment, the distance and contact force between the first polishing disc 421 and the electrode plate 310 can be adjusted to allow the first polishing disc 421 and the second polishing disc 422 to cooperate to achieve polishing or gripping operations. Furthermore, in the aforementioned embodiment, only the first polishing disc 421 can be configured as a movable structure, while the second polishing disc 422 can be configured as a fixed structure.

[0064] The first gear 470 can be connected to the first rod 450, and the drive gear 480 can mesh with the first gear 470. The second drive can be connected to the drive gear 480 and used to drive the drive gear 480 to rotate. When the drive gear 480 rotates, it can drive the first gear 470 to rotate, which in turn can drive the first rod 450 to rotate, thereby realizing the operation of the first grinding disc 421 moving closer to or further away from the electrode disc 310. The aforementioned structure can make the entire lifting and grinding mechanism 40 more automated.

[0065] It is understood that, in another embodiment, both the first polishing disc 421 and the second polishing disc 422 can be configured as movable structures. In this embodiment, the second polishing disc 422 can also be connected to the second rod 460, so that the first polishing disc 421 and the second polishing disc 422 can move towards the electrode plate 310 or away from the electrode plate 310 at the same time.

[0066] Furthermore, in one embodiment, the lifting and polishing mechanism 40 may also include a second gear 4110, which may be connected to the second rod 460. The first gear 470 and the second gear 4110 may mesh with each other, and the rotation directions of the first gear 470 and the second gear 4110 are opposite. That is to say, in this embodiment, during the rotation of the drive gear, the first polishing disc 421 and the second polishing disc 422 may be driven to move closer to or further away from each other.

[0067] In addition, please continue to refer to Figure 4 and Figure 6 In some embodiments, the lifting and grinding mechanism 40 may further include: a structural frame 4120, which is movably mounted on the lifting cylinder 410 and can reciprocate relative to the lifting cylinder 410 along a first direction. In this embodiment, the first direction may be a vertical direction, i.e., a vertical direction. A support frame 440 may be movably mounted on the structural frame 4120 and can reciprocate relative to the structural frame 4120 along a second direction, wherein the first direction is perpendicular to the second direction. That is, in this embodiment, the support frame 440 may move horizontally relative to the structural frame 4120, i.e., move left and right.

[0068] In this embodiment, the structural frame 4120 can slide along the first direction on the first track, carrying the support frame 440 from the second functional cavity 120 into the first functional cavity 110. Then, the clamping member 420 and the trigger member 430 connected to the support frame 440 can be used to grind the electrode plate 310 or unlock the electrode plate 310 from the base shaft 20 and grab and fix the electrode plate 310. Then, the structural frame 4120 can continue to slide on the lifting cylinder 410 and bring the support frame 440 from the first functional cavity 110 into the second functional cavity 120. Then, the support frame 440 can slide relative to the structural frame 4120 along the second direction and move the electrode plate 310 from directly above the base shaft 20 to the side above the base shaft 20. For example, the electrode plate 310 can be brought out of the reaction chamber to facilitate the user to replace the electrode plate 310.

[0069] Please also refer to Figure 4 and Figure 7In a more specific embodiment, the lifting and grinding mechanism 40 may further include a transverse guide rail 4130, which can be connected between the structural frame 4120 and the support frame 440. The transverse guide rail 4130 can reciprocate relative to the structural frame 4120 in a second direction, and the support frame 440 can reciprocate relative to the transverse guide rail 4130 in a second direction. That is to say, in this embodiment, the difference from the aforementioned embodiment is that a transverse guide rail 4130 is provided between the structural frame 4120 and the support frame 440. This allows the support frame 440 to move further relative to the structural frame 4120 in the second direction, thereby making it easier for the user to replace the electrode sheet 310.

[0070] This application embodiment also does not limit the electrical connection method between the electrode sheet 310 and the base shaft 20. For example, in one embodiment, please refer to... Figure 8 The electrode sheet 310 may have a connection interface 313. It should be noted that the connection interface 313 has no polarity restriction. When the connection interface 313 is connected to the positive electrode, the electrode sheet 310 is a positive electrode sheet. When the connection interface 313 is connected to the negative electrode, the electrode sheet 310 is a negative electrode sheet. In two adjacent electrode sheets 310, the connection interface 313 of one electrode sheet 310 can be connected to the positive electrode and the other can be connected to the negative electrode to form a circuit, thereby enabling electrocoagulation.

[0071] Please see Figure 9 The base shaft 20 may include a first shaft 210, a second shaft 220, a first wiring group, and a second wiring group. The first shaft 210 may be fixedly connected to the reaction chamber 10. The second shaft 220 may be sleeved on the outer surface of the first shaft 210 and rotated with the first shaft 210. The electrode sheet 310 may be connected to the second shaft 220. At this time, by rotating the second shaft 220, the electrode sheet 310 located at different positions may cooperate with the clamping member 420 to perform grinding operations on the electrode sheet 310 or to grab the electrode sheet 310.

[0072] In one embodiment, the wastewater treatment device 1 may further include a first driving member 50, which may be connected to the base shaft 20 and specifically to the second shaft 220, and is used to drive the second shaft 220 to rotate, thereby making the rotation of the second shaft 220 more automated. It should be noted that the embodiments of this application do not limit the specific structure of the first driving member 50. For example, in some embodiments, the first driving member 50 may be a cylinder or a motor, etc., and can be set according to the actual situation.

[0073] Furthermore, in one embodiment, the wastewater treatment device 1 may further include an agitator 60, which may be connected to the base shaft 20 and specifically to the second shaft 220, and the agitator 60 may extend radially along the second shaft 220. The agitator 60 can be used to agitate the wastewater in the first functional chamber 110 during the rotation of the second shaft 220, thereby enabling the wastewater in the first functional chamber 110 to be treated more uniformly by electrocoagulation.

[0074] It should be noted that the embodiments of this application do not limit the specific location of the agitator 60. For example, in one embodiment, the agitator 60 may be disposed between adjacent electrode plates 310. The embodiments of this application also do not limit the length of the agitator 60. For example, in one embodiment, the length of the agitator 60 in the radial direction of the base shaft 20 is greater than the length of the electrode plate 310 in the radial direction of the base shaft 20. In some other embodiments, the agitator 60 may also be disposed in other locations, such as on the electrode plate 310, and the length of the agitator 60 may be set according to actual conditions.

[0075] As mentioned above, in this embodiment, the first wiring group and the second wiring group can be arranged axially spaced along the first shaft 210. Both the first and second wiring groups include a positive terminal connector 250 and a negative terminal connector 260 arranged alternately and axially spaced along the first shaft 210. That is, in this embodiment, the first wiring group and the second wiring group are arranged one after the other in the radial direction of the first shaft 210 to match the position of the electrode plate 310. It should be noted that, due to... Figure 9 The diagram shown is a cross-sectional view. Because the first and second wiring groups are spaced one after the other in the axial direction of the base shaft 20, therefore... Figure 9 Only the structure of the first or second wiring group is shown.

[0076] Multiple third wiring groups 270 can be provided on the second shaft 220. Each third wiring group 270 can include a first wiring mechanism 271 and a second wiring mechanism 272. The first wiring mechanism 271 is connected to the first wiring group, and the second wiring mechanism 272 is connected to the second wiring group. Both the first wiring mechanism 271 and the second wiring mechanism 272 can include a first conductive end 281 and a second conductive end 282. The first conductive end 281 can be used to conduct electricity with the electrode plate 310, and the second conductive end 282 can be used to conduct electricity with one of the first wiring group and the second wiring group. That is, the third wiring group 270, the first wiring group, and the second wiring group together form a circuit. The first wiring mechanism 271 can be connected to the positive terminal connector 250 of the first wiring group and to the connection interface 313 of one of the electrode plates 310. The second wiring mechanism 272 can be connected to the negative terminal connector 260 of the second wiring group and to the connection interface 313 of the other electrode plate 310.

[0077] Alternatively, the first wiring mechanism 271 can be connected to the negative terminal connector 260 of the first wiring group and to the connection interface 313 of one of the electrode plates 310, and the second wiring mechanism 272 can be connected to the positive terminal connector 250 of the second wiring group and to the connection interface 313 of the other electrode plate 310.

[0078] This allows each electrode plate 310 to be selectively used as a positive or negative electrode plate during the rotation of the second shaft 220. Similarly, in this embodiment, the first wiring mechanism 271 and the second wiring mechanism 272 are also arranged to be offset from each other in the axial direction of the second shaft 220, i.e., one in front of the other, which also facilitates matching with the position of the electrode plate 310.

[0079] Understandably, in the electrocoagulation process, the positive electrode plate is usually the consumable. Therefore, the alternating use of the positive and negative electrode plates mentioned above can make full use of the electrode plates and avoid the situation where only a portion of the electrode plates 310 in the same electrode plate assembly 30 are consumed as positive electrode plates, while the other portion are not consumed as negative electrode plates. When the lifting and grinding mechanism 40 grinds or clamps and replaces the electrode plates 310 in a set of electrode plate assemblies 30, some electrode plates 310 do not need to be replaced, resulting in resource waste. In this embodiment, the alternating switching of the polarity of the electrode plates 310 is beneficial to extending the service life of the electrode plate assembly 30 and reducing the replacement frequency of the electrode plate assembly 30.

[0080] Furthermore, in some embodiments, both the first wiring mechanism 271 and the second wiring mechanism 272 may include a Hall switch 283, and the first conductive end 281 and the second conductive end 282 can be connected through the Hall switch 283. The electrode plate 310 may be provided with a magnetic element 314, which can be used to trigger the Hall switch 283. Specifically, when the lifting and grinding mechanism 40 causes the electrode plate assembly 30 to separate from the base shaft 20, the Hall switch 283 is disconnected; when the electrode plate assembly 30 is connected to the base shaft 20, the Hall switch 283 is connected. This can avoid or reduce the electrochemical corrosion of the first wiring mechanism 271 or the second wiring mechanism 272 exposed to sewage.

[0081] Please also refer to Figure 8 and Figure 10 In one embodiment, a one-way conductive membrane 315 may be provided at the connection interface 313 of the electrode plate 310. The one-way conductive membrane 315 is used to conduct one-way traffic through the connection interface 313, and the conduction direction is from the outside of the electrode plate 310 to the inside of the electrode plate 310. That is, when the connection interface 313 is connected to the first wiring mechanism 271 or the second wiring mechanism 272, the aforementioned one-way conductive membrane 315 can be opened, thereby allowing the electrode plate 310 to connect with the third wiring group 270. The provision of the one-way conductive membrane 315 can prevent the connection interface 313 from being contaminated by sewage during the installation of the electrode plate 310 on the second shaft 220, which would cause sewage to clog the connection interface 313 and thus affect the installation of the electrode plate 310 and the second shaft 220.

[0082] As mentioned above, please also refer to Figures 8-10 In some embodiments, the electrode plate assembly 30 may further include an insulating base 312, within which the electrode sheet 310 can be mounted. It should be noted that in this embodiment, the insulating base 312 only covers a portion of the electrode sheet 310, specifically the area of ​​the electrode sheet 310 used for connection to the third wiring group 270. This prevents the conductive area of ​​the electrode sheet 310 from being exposed. As mentioned above, the side of the connection interface 313 can be enclosed within the insulating base 312, and the unidirectional conductive membrane 315 can also be formed on the insulating base 312. When replacing the electrode sheet 310, the user only needs to remove the electrode sheet 310 from the insulating base 312, allowing the insulating base 312 to be reused.

[0083] In summary, the wastewater treatment device 1 provided in this application embodiment has a base shaft 20 set in the first functional cavity 110 of the reaction chamber 10, and multiple sets of electrode plate assemblies 30 are spaced apart on the outer peripheral surface of the base shaft 20. Each set of electrode plates includes multiple electrode pieces 310 spaced apart along the axial direction of the base shaft 20. At the same time, a lifting and grinding mechanism 40 is provided. When the lifting and grinding mechanism 40 is in the first position, it is located in the second functional cavity 120 on one side of the first functional cavity 110. When the lifting and grinding mechanism 40 is in the second position, it extends at least partially into the first functional cavity 110 and into the gap between the electrode pieces 310. At this time, the surface of the electrode pieces 310 can be ground. When the lifting and grinding mechanism 40 is in the third position, it can unlock the electrode pieces 310 from the base and clamp the electrode pieces 310 to remove them from the first functional cavity 110. In this embodiment, since multiple sets of electrode plate assemblies 30 are spaced apart on the outer peripheral surface of the base shaft 20, during the process of removing the electrode sheet 310 or grinding the electrode sheet 310, the other electrode sheets are not affected except for the electrode sheet 310 that is in contact with the lifting and grinding mechanism 40. Therefore, the lifting and grinding mechanism 40 provided in this embodiment can grind or replace the electrode sheet 310 while continuing to treat the sewage, so that the entire sewage treatment device 1 has no vacuum period, which is conducive to the continuous treatment of sewage.

[0084] It should be noted that, in this document, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Unless otherwise specified, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes that element.

[0085] Furthermore, it should be noted that the scope of the methods and apparatus in the embodiments of this application is not limited to performing functions in the order shown or discussed, but may also include performing functions substantially simultaneously or in the reverse order, depending on the functions involved. For example, the described methods may be performed in a different order than described, and various steps may be added, omitted, or combined. In addition, features described with reference to certain examples may be combined in other examples.

[0086] The above description is merely a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any changes or substitutions that can be easily conceived by those skilled in the art within the scope of the technology disclosed in the present invention should be included within the scope of protection of the present invention.

Claims

1. A wastewater treatment device, characterized in that, include: The reaction chamber has a first functional cavity and a second functional cavity that are interconnected inside the reaction chamber. A base shaft is disposed within the first functional cavity; Multiple sets of electrode plate assemblies are arranged around the base shaft within the first functional cavity, and each electrode plate assembly is detachably connected to the base shaft; each electrode plate assembly includes multiple spaced and parallel electrode plates; and An elastic buckle, wherein the fixed end of the elastic buckle is connected to the base shaft, the electrode plate is provided with a buckle groove, and the free end of the elastic buckle is selectively embedded in the buckle groove; A lifting and polishing mechanism includes a lifting cylinder, a clamping component, and a triggering component. The clamping component is connected to the lifting cylinder and is used to clamp the electrode sheet. The triggering component is connected to the lifting cylinder and is used to open the free end of the elastic buckle so that the free end of the elastic buckle disengages from the buckle groove. The lifting and grinding mechanism further includes: a support frame, a first rod, a second rod, a first gear, a drive gear, a structural frame, and a second drive member. The first rod and the second rod are movably connected to the support frame. The trigger member is connected to the support frame. The clamping member includes: a first grinding disc and a second grinding disc. The first grinding disc is threadedly connected to the first rod, and the second grinding disc passes through the second rod. The first gear is connected to the first rod, and the drive gear meshes with the first gear. The second drive member is connected to the drive gear and is used to drive the drive gear to rotate. The structural frame is movably disposed on the lifting cylinder and can reciprocate relative to the lifting cylinder in a first direction. The support frame is movably disposed on the structural frame and can reciprocate relative to the structural frame in a second direction. The first direction is perpendicular to the second direction. The lifting and polishing mechanism can switch between a first position, a second position, and a third position in the vertical direction, wherein the second position is located between the first position and the second position; When the lifting and polishing mechanism is in the first position, the lifting and polishing mechanism is disposed in the second functional cavity; When the lifting and polishing mechanism is in the second position, the lifting and polishing mechanism extends at least partially into the gap between the electrode plates and is used to polish the surface of the electrode plates; When the lifting and polishing mechanism is in the third position, the lifting and polishing mechanism can unlock the electrode plate from the base shaft and clamp and fix the electrode plate.

2. The wastewater treatment device according to claim 1, characterized in that, The lifting and grinding mechanism further includes: a second gear, which is connected to the second rod, and a second grinding disc is threadedly connected to the second rod. The first gear meshes with the second gear, and the rotation directions of the first gear and the second gear are opposite.

3. The wastewater treatment device according to claim 2, characterized in that, The lifting and grinding mechanism further includes a transverse guide rail, which is connected between the structural frame and the support frame. The transverse guide rail can reciprocate relative to the structural frame in the second direction, and the support frame can reciprocate relative to the transverse guide rail in the second direction.

4. The wastewater treatment device according to claim 1, characterized in that, The base shaft includes: a first shaft body, a second shaft body, a first wiring group, and a second wiring group. The first shaft body is fixedly connected to the reaction chamber, and the second shaft body is sleeved on the first shaft body and rotates in cooperation with the first shaft body. The first wiring group and the second wiring group are spaced apart along the axial direction of the first shaft. Both the first wiring group and the second wiring group include positive and negative terminals that are spaced apart and alternately arranged along the circumferential direction of the first shaft. The second shaft is provided with a plurality of third wiring groups, which are connected to the electrode plates. Each third wiring group includes a first wiring mechanism and a second wiring mechanism. The first wiring mechanism is connected to the first wiring group, and the second wiring mechanism is connected to the second wiring group. One of the first wiring mechanism and the second wiring mechanism is connected to the positive terminal connector, and the other is connected to the negative terminal connector.

5. The wastewater treatment device according to claim 4, characterized in that, Both the first wiring mechanism and the second wiring mechanism include a first conductive terminal, a second conductive terminal, and a Hall switch. The first conductive terminal is used to conduct electricity with the electrode plate, and the second conductive terminal is used to conduct electricity with one of the first wiring group and the second wiring group. The first conductive terminal and the second conductive terminal are connected via the Hall switch; The electrode plate is equipped with a magnetic element. When the lifting and grinding mechanism causes the electrode plate assembly to separate from the base shaft, the Hall switch is turned off; when the electrode plate assembly is connected to the base shaft, the Hall switch is turned on.

6. The wastewater treatment device according to claim 4, characterized in that, The electrode sheet has a connection interface, which is connected to the third wiring group, and a one-way conductive membrane is provided at the connection interface; And / or, the first wiring mechanism and the second wiring mechanism are offset from each other in the axial direction of the second shaft.

7. The wastewater treatment device according to claim 1, characterized in that, The wastewater treatment device further includes: a first driving member, which is connected to the base shaft and is used to drive the base shaft to rotate.

8. The wastewater treatment device according to claim 7, characterized in that, The wastewater treatment device further includes an agitator connected to the base shaft and extending radially along the base shaft.

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