Low-emissivity film for buildings and automobiles having excellent visibility and heat-insulating properties

Abstract

The present invention relates to a low-emissivity film for buildings and automobiles, which has excellent visibility and heat insulation performance. The low-emissivity film for buildings and automobiles according to the present invention comprises: a transparent substrate layer; and an infrared shielding layer which is formed on the transparent substrate layer using a sputtering method and includes a metal layer containing at least one selected from the group consisting of nickel, chromium and silver, and which has a thermal cross-flow rate of 4.6 W / m2 K or less. The low-radiation film for buildings and automobiles has excellent visibility and heat insulation performance.

Description

Technical Field

[0001] The present invention relates to a low-emissivity film for buildings and automobiles having excellent visibility and heat insulation performance. Background Art

[0002] Sunlight is generally divided into ultraviolet rays (100-380nm), visible light (380-780nm), and infrared rays (780-60000nm). Infrared rays are further divided into near infrared rays and far infrared rays. Of these, ultraviolet rays account for about 6%, visible light for about 46%, and infrared rays account for about 48%. When the skin is exposed to ultraviolet rays for a long time, ultraviolet rays can cause skin aging and cancer. Infrared rays can increase indoor temperatures and cause increased cooling costs in summer.

[0003] Cooling and heating costs are a large factor in maintaining a building. Therefore, heat loss from a building directly affects the cooling and heating costs and is therefore a factor that must be carefully considered when constructing a building.

[0004] In particular, if we look closely at the heat loss of buildings in winter, the heat loss through the outer wall is 39%, the heat loss through the glass window is 32%, the heat loss through the ground is 9%, and the heat loss through the roof is about 19%. Among them, heat loss prevention measures can be established during the construction of buildings, such as by installing insulation materials, for heat loss generated from the outer wall, roof and ground.

[0005] However, due to the characteristics of glass windows, it is difficult to install heat insulation materials. In addition, the number of elevator buildings with outward balconies has increased recently, and the heat loss of such elevator buildings through glass windows has increased significantly.

[0006] In order to solve this problem, Korean Patent Publication No. 2013-0064419 discloses a bonded heat insulation sheet for glass windows. The bonded heat insulation sheet for glass windows disclosed in Korean Patent Publication No. 2013-0064419 uses bubble bags to block the indoor temperature from direct contact with the outside air, thereby preventing the indoor temperature from dropping and saving heating costs.

[0007] However, the adhesive heat-insulating sheet for glass windows has a problem of reducing the visibility of the window because it is formed opaquely on the structure of the bubble bag. Therefore, in order to check the outside, the window needs to be opened, which has a problem of lowering the temperature in the room. In addition, since the bubble bag forms an opaque curved structure based on the bubble structure, the light transmitted from the sun is refracted or reflected and blocked when entering the room, which has a problem of reducing the amount of sunlight.

[0008] The average temperature rises due to global warming, and climate change such as the destruction of the ozone layer due to environmental pollution has led to the gradual increase in the adverse effects of ultraviolet rays, infrared rays, and solar radiation.

[0009] Recently, the demand for products that create a comfortable environment in living spaces and office spaces and are used for physical health is increasing, and the demand for technical development of such functional products is also on the rise.

[0010] Prior art literature

[0011] Patent Literature

[0012] Patent Document 1: Korean Patent Publication No. 10-2017-0062091 Summary of the invention

[0013] In order to solve the above-mentioned problems of the prior art, the present inventors provide the following low-emissivity film for buildings and automobiles, which forms an infrared blocking layer with a multi-layer metal thin film, thereby not only improving the optical properties such as visible light transmittance of the low-emissivity film, but also ensuring excellent heat insulation performance.

[0014] In order to solve the above-mentioned problems, the present invention provides the following low-emissivity film for buildings and automobiles, comprising: a transparent substrate layer; and an infrared protection layer, which is formed on the above-mentioned transparent substrate layer using a sputtering method and includes a metal layer containing any one or more selected from the group consisting of nickel, chromium and silver, and has a heat permeability of less than 5.0 W / ㎡K.

[0015] Furthermore, the present invention can provide a low-emissivity film for buildings and automobiles, wherein the infrared shielding layer is formed of two or more thin films that are repeated by the metal layer, and the thin film has a thickness of 30 to 100 nm.

[0016] Furthermore, the present invention can provide the following low-emissivity film for buildings and automobiles, further comprising an ultraviolet protection layer, wherein the ultraviolet protection layer is located on the transparent substrate layer.

[0017] Furthermore, the present invention can provide a low-emissivity film for buildings and automobiles, wherein the thickness of the film is 3 mil or more.

[0018] Furthermore, the present invention can provide a low-emissivity film for buildings and automobiles having a heat permeability of 4.6 W / ㎡K or less.

[0019] Furthermore, the present invention can provide a low-emissivity film for buildings and automobiles having a heat permeability of 4.2 W / ㎡K or less.

[0020] Furthermore, the present invention can provide a low-emissivity film for buildings and automobiles with a total solar energy blocking rate of more than 60%.

[0021] Furthermore, the present invention can provide a low-emissivity film for buildings and automobiles with a total solar energy blocking rate of more than 75%.

[0022] Furthermore, the present invention can provide a low-emissivity film for buildings and automobiles having a heat insulation rate of 99% or more.

[0023] According to the low-emissivity film for buildings and automobiles of the present invention, the new alloy metal layer formed by the sputtering method is formed by multiple layers, and the infrared protection layer is formed by multiple layers of metal thin films, thereby having the effect of improving the optical properties such as visible light transmittance of the low-emissivity film.

[0024] Furthermore, the low-emissivity film for buildings and automobiles according to the present invention has the effect of ensuring excellent heat insulation performance.

[0025] Furthermore, by applying the anti-ultraviolet film according to the present invention to window glass of the outer wall of a residential or commercial building, or to glass of an automobile, a more comfortable driving, living and working environment can be created by blocking infrared rays.

[0026] Furthermore, the low-emissivity film according to the present invention has a multi-layer structure, has excellent impact resistance, and has an effect of preventing scattering. DETAILED DESCRIPTION

[0027] The following embodiments are provided to fully convey the concept of the present invention to those skilled in the art. The present invention is not limited to the embodiments provided herein, but can be embodied in other ways.

[0028] The technical terms used in this specification are only used to refer to specific embodiments and do not limit the present invention. In addition, the singular form used therein can also include the plural form as long as the sentence does not express an obviously contrary meaning. In addition, the meaning of "including" or "comprising" used in this specification is to concretize specific characteristics, regions, constants, steps, operations, elements or components, and does not exclude the addition of other specific characteristics, regions, constants, steps, operations, elements or components.

[0029] In the present invention, the terms "first", "second", etc. are used to describe various structural elements, and the above terms are used only for the purpose of distinguishing one structural element from other structural elements.

[0030] Furthermore, the terms used in this specification are only used to illustrate exemplary embodiments and do not limit the present invention. Singular expressions include plural expressions as long as they are not clearly different in context. In this specification, the terms "including", "having" or "having" are used to specify the existence of implemented features, numbers, steps, structural elements or their combinations, and it should be understood that the existence or possibility of adding one or more other features or numbers, steps, structural elements or their combinations is not excluded in advance.

[0031] The present invention can be modified in many ways and can have many forms. Specific embodiments are illustrated and described in detail below. However, this does not limit the present invention to a specific disclosure form, but should be understood to include all changes, equivalent solutions and even alternative solutions included in the thought and technical scope of the present invention.

[0032] Hereinafter, the low-emissivity films for buildings and automobiles having excellent visibility and heat-insulating properties according to the present invention will be described in detail one by one.

[0033] The present invention relates to a low-emissivity film for buildings and automobiles, and more particularly to a low-emissivity film for buildings and automobiles having excellent visibility and heat insulation performance.

[0034] The low-emissivity film for buildings and automobiles includes a transparent substrate layer and an infrared shielding layer formed on the transparent substrate layer.

[0035] The transparent substrate layer is a member that supports the UV protection film and may have a visible light transmittance of 70% or more. The material used for the transparent substrate layer is not particularly limited as long as the above transmittance is satisfied.

[0036] Specifically, the transparent substrate layer is formed of a transparent polymer resin, and is particularly preferably formed of a transparent ultraviolet curable resin to prevent the user's field of vision from being blocked.

[0037] For example, the transparent substrate layer may be made of any one or more transparent polymer resins selected from the group consisting of polyester, acrylic, cellulose, polyolefin, polyvinyl chloride, polycarbonate, phenol, and polyurethane.

[0038] For example, the transparent polymer resin is preferably an acrylic, polyester, or polycarbonate resin having a good balance between heat resistance and flexibility, and more preferably a biaxially stretched polyester or polycarbonate resin.

[0039] For example, although the thickness of the substrate layer is not particularly limited, it may be 5 um or more, 10 um or more, 20 um or more, or 30 um or more, and the upper limit thereof may be 150 um or 200 um.

[0040] Based on this, the heat permeability of the low emissivity film is 5.0 W / ㎡K or less.

[0041] For example, the heat transfer rate of the low-emissivity film may be 4.6 W / ㎡K or less. For example, the heat transfer rate of the low-emissivity film may be 4.2 W / ㎡K or less.

[0042] The total solar energy blocking rate of the low-emissivity film may be greater than 60%, and preferably, the total solar energy blocking rate may be greater than 75%.

[0043] The heat insulation rate of the low-emissivity film may be above 99%.

[0044] The infrared ray preventing layer performs the function of reflecting or blocking infrared rays having a wavelength of about 380 nm to 780 nm. The infrared ray reflecting layer should have a low refractive index and a high reflectivity for infrared rays.

[0045] For example, the infrared shielding layer is formed on the transparent base layer by sputtering and includes a metal layer including at least one of the group consisting of nickel (Ni), chromium (Cr), and silver (Ag).

[0046] The above-mentioned sputtering method refers to a method in which a sputtering gas is injected into a chamber formed by a vacuum atmosphere to generate plasma, and then the particles in the above-mentioned plasma collide with the target material to be formed into a film, and the material separated from the target material by the collision is coated on the substrate. Usually, argon (Ar) as an inert gas is used as the sputtering gas. The sputtering system uses the target as the cathode and the substrate as the anode.

[0047] When power is applied, the injected sputtering gas collides with the electrons released from the cathode and ionizes (Ar+). The ions are attracted to the target material, which is the cathode, and collide with the target material. Through this collision, the energy held by the ions is transferred to the target material, and the atoms and molecules of the target material are released into the chamber. The target material released in this way forms a thin film on the substrate.

[0048] The sputtering thin film manufacturing technology can precisely adjust the thickness of the coating layer to tens of nanometers, and the coating process can be easily handled by using a simple mask.

[0049] The infrared shielding layer may include a metal oxide, and specifically, may be a structure in which two or more thin film layers are stacked.

[0050] The infrared blocking layer may include a metal layer formed of two or more thin films that are repeated on the transparent base layer.

[0051] For example, the metal layer may be formed of two thin film layers, and the nickel thin film layer or the chromium thin film layer may be formed of two layers. Differently, the metal layer may be formed of three or more layers, preferably a multilayer thin film layer of five layers.

[0052] Furthermore, as required, the metal layer may be formed by a structure in which a silver thin film layer, a nickel thin film layer or a chromium thin film layer are stacked sequentially or non-sequentially.

[0053] More preferably, the metal layer may be formed by stacking the silver thin film layers into five layers.

[0054] Different from this, the interlayer of the metal layer may further include a dielectric layer.

[0055] In order to suppress the surface reflection of the low-emissivity film according to the embodiment of the present invention and improve the visible light transmittance, the dielectric layer may have a high refractive index and a low light absorption rate.

[0056] For example, the dielectric layer may include a material selected from titanium oxide (TiO 2 ), aluminum oxide (Al 2 O 3 ), zirconium oxide (ZrO 2 ), Tantalum Oxide (Ta 2 O 5 ), niobium oxide (Nb 2 O 5 ), lanthanum oxide (La 2 O 3 ), yttrium oxide (Y 2 O 3 ), zinc oxide (ZnO), zinc sulfide (ZnS) and indium oxide (In2O3) Any one or more of the group consisting of.

[0057] For example, preferably, the dielectric layer may include zinc oxide (ZnO) or titanium oxide (TiO 2 ).

[0058] The metal layer may have a thickness of 5 to 20 nm, preferably, the metal layer may have a thickness of 5 to 15 nm, and more preferably, the metal layer may have a thickness of 7 to 10 nm.

[0059] For example, the infrared ray blocking layer may have a thickness of 10 to 100 nm, preferably, the infrared ray blocking layer may have a thickness of 30 to 70 nm, and more preferably, the infrared ray blocking layer may have a thickness of 40 to 50 nm.

[0060] The infrared shielding layer is formed by stacking multiple thin film metal layers and is thicker than conventional infrared shielding layers, which can improve the heat insulation effect and prevent the decrease in optical properties such as visible light transmittance due to thickness.

[0061] The low-emissivity film for buildings and automobiles may further include a super-coating layer on the anti-ultraviolet layer, a functional layer on the super-coating layer, and a protective film on the functional layer.

[0062] The supercoat can maintain the transmittance for visible light and prevent the damage of the infrared protection layer. The material of the supercoat is not greatly restricted and the commonly used material in the field can be used without restriction. For example, the supercoat can include a cured product of a composition comprising a monofunctional or multifunctional photocurable organic compound and inorganic or organic particles.

[0063] The super coating layer may have a thickness of less than 100 nm. When the thickness exceeds the above, the transmittance of the low-emissivity film will be reduced, and the infrared reflection function of the low-emissivity film will be reduced due to the infrared absorption of the super coating layer.

[0064] The functional layer may be included on the super coating layer, and the functional layer may be a waterproof coating, a flame retardant layer, an anti-scattering layer, an anti-glare layer, or a combination thereof.

[0065] A protective film may also be included on the upper portion of the functional layer. The protective film may protect the window film from external forces or external environment generated during the handling, movement or construction of the UV protection film. The protective film may be peeled off from one side of the UV protection film without damaging the super coating layer during construction.

[0066] The material of the above-mentioned protective film can use a polymer film known in the relevant technical field. For example, a polyester film of polyethylene terephthalate or polybutylene terephthalate, a polytetrafluoroethylene film, a polyethylene film, a polypropylene film, a polybutylene film, a polybutadiene film, a poly (vinyl chloride) film or a polyimide film or the like can be used. These films can be used as a single layer, or can also be used as a multilayer stacked on each other. Although not particularly limited, the thickness of the above-mentioned protective film can be in the range of 10 μm to 100 μm.

[0067] The above-mentioned UV protection film for buildings and automobiles may further include an infrared protection layer on the above-mentioned transparent substrate layer.

[0068] The above-mentioned ultraviolet protection layer and the above-mentioned infrared protection layer can be stacked on the above-mentioned transparent substrate layer in sequence, and can have the following stacked form: as a first example, the above-mentioned ultraviolet protection layer is formed on the above-mentioned transparent substrate layer, and the above-mentioned infrared protection layer is formed on the above-mentioned ultraviolet protection layer, or as a second example, the above-mentioned infrared protection layer is formed on the above-mentioned transparent substrate layer, and the above-mentioned ultraviolet protection layer is formed on the above-mentioned infrared protection layer.

[0069] The architectural and automotive UV protection film according to an embodiment of the present invention may have a thickness of 3 mil or more.

[0070] Hereinafter, the present invention will be described in more detail based on embodiments and experimental examples.

[0071] However, the following examples and experimental examples are merely for illustrating the present invention, and the contents of the present invention are not limited to the following examples and experimental examples.

[0072] Example 1 (2-layer film)

[0073] A transparent glass substrate (corning 1747) as a transparent substrate was introduced into a dry deposition machine for fixation at about 110- 7 If the pressure condition of the above deposition machine is met, argon (10 sccm) is injected into the deposition machine to maintain a vacuum of 110- 3 The plasma was formed by applying 50W of 13.56MHz radio frequency (RF) power to the sputtering gun installed in the deposition machine in a manner of adjusting the temperature of 10000 MHz to 20000 MHz. Then, a silver thin film layer with an average thickness of 20nm, a titanium oxide layer with an average thickness of 10nm, and a silver thin film layer with an average thickness of 20nm were deposited in sequence on the transparent glass substrate by RF / DC sputtering, thereby manufacturing a low-emissivity film.

[0074] Example 2 (3-layer film)

[0075] A silver thin film layer, a titanium oxide layer, a silver thin film layer, a titanium oxide layer, and a silver thin film layer were deposited on a transparent glass substrate by RF / DC sputtering in a manner having average thicknesses of 10 nm, 5 nm, 10 nm, 5 nm, and 10 nm, respectively. Except for this, a low-emissivity film was manufactured in the same manner as in the above-mentioned Example 1.

[0076] Example 3 (4-layer film)

[0077] A silver thin film layer, a titanium oxide layer, a silver thin film layer, a titanium oxide layer, a silver thin film layer, a titanium oxide layer, and a silver thin film layer were deposited on a transparent glass substrate by RF / DC sputtering in a manner having average thicknesses of 10nm, 2nm, 10nm, 2nm, 10nm, 2nm, and 10nm, respectively. Except for this, a low-emissivity film was manufactured in the same manner as in the above-mentioned Example 1.

[0078] Example 4 (5-layer film)

[0079] A silver thin film layer, a titanium oxide layer, a silver thin film layer, a titanium oxide layer, a silver thin film layer, a titanium oxide layer, a silver thin film layer, a titanium oxide layer, a silver thin film layer, a titanium oxide layer and a silver thin film layer were deposited on a transparent glass substrate by an RF / DC sputtering method in a manner having average thicknesses of 8nm, 2nm, 8nm, 2nm, 8nm, 2nm, 8nm, 2nm and 8nm, respectively. Except for this, a low-emissivity film was manufactured in the same manner as in the above-mentioned Example 1.

[0080] Comparative Example 1

[0081] A UV protection film was produced in the same manner as in Example 1, except that a silver thin film layer was deposited on the transparent glass substrate to have an average thickness of 70 nm by RF / DC sputtering.

[0082] Comparative Example 2

[0083] A UV protection film was produced in the same manner as in Example 1, except that a silver thin film layer was deposited on the transparent glass substrate to have an average thickness of 100 nm by RF / DC sputtering.

[0084] The optical properties of the film according to the above example were tested according to KS L 2016: 2014, 6.3, and the results are shown in the following Table 1. The test environment was maintained at a temperature of 21 to 25°C and a humidity of 60 to 65% RH. The measurements were performed using a T-IR Spectrophotometer (Nicolet, 6700, USA) and a UV-VIS-NIR Spectrophotometer (Perkin-Elmer, Lambda 950 & 1050, USA).

[0085] Table 1

[0086]

[0087] The heat permeability of the low-emissivity film manufactured according to Examples 1 to 4 of the embodiments of the present invention is less than 5.0 W / ㎡K, which shows that it has excellent thermal insulation performance. For general plate glass, it has a heat permeability of about 6.0 W / ㎡K, and the heat insulation film generally available on the market has a heat permeability in the range of 5.7 to 6.0 W / ㎡K. In addition, the low-emissivity film according to the embodiment has a visible light transmittance of more than 52%, but the comparative example has a reduced visible light transmittance as the thickness increases, which is reduced to about 47%.

[0088] In particular, Example 4 was confirmed to have a value of 4.2 W / ㎡K, which indicates that it has a very excellent thermal insulation performance value. In contrast, the heat permeability value of the comparative example formed of a single layer with a relatively thick thickness was inferior to that of the example, and in particular, it was confirmed that the visible light transmittance as an optical characteristic was also inferior.

[0089] The solar energy transmittance of the examples is less than 40%, and in particular, it is 34.5% for Example 4. That is, it can be seen that the total solar energy blocking rate of the low-emissivity film according to the examples is more than 60%.

[0090] That is, the low-emissivity film manufactured according to the embodiment of the present invention has an infrared shielding layer formed by a plurality of metal thin films, which can not only improve the optical properties such as visible light transmittance of the low-emissivity film but also ensure excellent heat insulation performance.

[0091] The above description of the present application is for illustration, and a person skilled in the art of the present application can understand that it can be easily transformed into other specific forms without changing the technical ideas or essential features of the present application. Therefore, it should be understood that the embodiments described above are illustrative in all aspects, rather than restrictive. For example, each structural element described in a single type can also be implemented in a dispersed manner. Similarly, the structural elements described as dispersed can also be implemented in a combined manner.

[0092] The scope of the present application is indicated by the appended claims rather than the above detailed description, and all changes or modifications derived from the meaning and scope of the claims and their equivalent concepts should be interpreted as being included in the scope of the present application.

Claims

1. A low-emissivity film for buildings and automobiles, characterized in that: include: a transparent substrate layer; as well as The infrared protection layer is formed on the transparent base material layer by sputtering and includes a metal layer including at least one metal selected from the group consisting of nickel, chromium and silver. The heat flux is below 5.0W / ㎡K.

2. The low-emissivity film for buildings and automobiles according to claim 1, characterized in that: The infrared protection layer is formed by repeating the metal layer and being composed of two or more thin films. The film has a thickness of 30 to 100 nm.

3. The low-emissivity film for buildings and automobiles according to claim 1, characterized in that: Also includes: The UV protection layer is located on the transparent substrate layer.

4. The low-emissivity film for buildings and automobiles according to claim 1, characterized in that: The thickness of the film is 3 mil or more.

5. The low-emissivity film for buildings and automobiles according to claim 1, characterized in that: The heat flux is below 4.6W / ㎡K.

6. The low-emissivity film for buildings and automobiles according to claim 1, characterized in that: The heat flux is below 4.2W / ㎡K.

7. The low-emissivity film for buildings and automobiles according to claim 1, characterized in that: The total solar energy blocking rate is over 60%.

8. The low-emissivity film for buildings and automobiles according to claim 1, characterized in that: The total solar energy blocking rate is over 75%.

9. The low-emissivity film for buildings and automobiles according to claim 1, characterized in that: The thermal insulation rate is over 99%.

Images