Particle discharge device and method for wet cleaning of particle discharge device

Abstract

The invention relates to a particle discharge device (1) for separating particles from a process gas stream and to a method for wet cleaning of a particle discharge device (1).

Description

Technical Field

[0001] The present invention relates to a particle discharge device for separating particles from a process gas flow, comprising the following items: a device housing having a vertical axis in a vertical direction; a filter, which divides the device housing into a process chamber containing particles to be separated and a clean gas chamber containing dust-removed process gas; a particle inlet, which is arranged at the process chamber, and a particle outlet, which is arranged at the process chamber; and a clean gas outlet, which is arranged in the clean gas chamber.

[0002] The present invention also relates to a method for wet cleaning a particle emission device, which is used to separate particles from a process gas flow and includes the following items: a device housing having a vertical axis in a vertical direction; a filter, which divides the device housing into a process chamber containing particles to be separated and a clean gas chamber containing process gas that has been dust-free; a particle inlet, which is arranged at the process chamber, and a particle outlet, which is arranged at the process chamber; and a clean gas outlet, which is arranged in the clean gas chamber. Background Art

[0003] In the prior art not listed in the publication, the particle discharge device has a detachable and cleanable filter. For this purpose, it is suitable that the particle discharge device is arranged on a lifting column, which is suitable for lowering the particle discharge device to an operating height that facilitates the removal of the filter. Summary of the invention

[0004] Therefore, the object of the present invention is to provide a particle discharge device and a method for achieving cleaning in place (CIP) without disassembling the filter.

[0005] This object is achieved in a particle discharge device of the type mentioned at the outset in that the particle discharge device comprises a clean gas chamber cleaning device arranged in a clean gas chamber, the clean gas chamber cleaning device comprises at least one clean gas chamber cleaning nozzle and is used for wet cleaning of a filter having a filter plane inclined relative to a vertical axis during cleaning operation, and the particle discharge device comprises a bypass device through which a bypass channel is interspersed, wherein the bypass channel comprises a bypass inlet connected to the clean gas chamber and a bypass outlet connected to the process chamber, wherein the bypass device also comprises a bypass channel closing component, which can be selectively located in a closed position preventing a fluid from passing through the bypass channel or in at least one open position allowing a fluid to pass through. Advantageously, this embodiment of the particle discharge device allows the particle discharge device to be CIP-cleaned. This also eliminates the need for a costly lifting column for the particle discharge device.

[0006] Cleaning operation refers to an operating mode of the particle discharge device in which, when the filtering action is interrupted, the filter is cleaned of particles by means of at least one cleaning device arranged in the particle discharge device. The process carried out during the cleaning operation is called a wet cleaning process.

[0007] Wet cleaning is understood to mean the cleaning of the filter during a cleaning operation with a cleaning fluid in liquid form, for example, in particular in the form of water.

[0008] The process of drying the filter after the wet cleaning process is called the drying process.

[0009] In contrast to the clean operation, the working operation refers to the operating process in which particles introduced into the particle removal device by means of a process gas are separated from the process gas flow by a filter.

[0010] Dry cleaning refers to the cleaning of the filter during operation using gas, especially air.

[0011] According to an advantageous development of the particle discharge device in this respect, the bypass device comprises a closing element drive device assigned to the bypass channel closing element, which moves the bypass channel closing element from the closed position to the open position and vice versa, thereby achieving further automation of the particle discharge device.

[0012] Furthermore, it is advantageous if a process chamber cleaning device is arranged in the process chamber, comprising at least one process chamber cleaning nozzle, wherein the at least one process chamber cleaning nozzle can be moved radially from the vertical axis towards the housing wall of the device and also in the opposite direction. This development of the particle discharge device ensures that both the clean gas chamber and the process gas chamber can be automatically cleaned by means of the clean gas cleaning device. Thus, in addition to cleaning the top surface of the filter arranged in the clean gas chamber, it is now also possible to clean the bottom surface of the filter arranged in the process gas chamber, thereby protecting the filter from particles that clog the filter.

[0013] According to another preferred design of the particle discharge device, the particle discharge opening is arranged in the region of the device housing base. The arrangement of the particle discharge opening on the device housing base is, on the one hand, advantageous for emptying the particle discharge device, and on the other hand, due to the effect of gravity, it is advantageous for the cleaning fluid in the form of the cleaned liquid to flow out of the particle discharge device via the particle discharge opening.

[0014] According to a further advantageous development of the particle discharge device, the filter is connected with its edge region to the inner surface of the device housing wall, so that a cleaning fluid collection point is formed in the edge region on the device housing wall, which is connected to the bypass inlet, wherein the cleaning fluid collection point preferably has a lowest point and the bypass inlet is connected to the cleaning fluid collection point at the lowest point of the cleaning fluid collection point. Since the filter plane of the filter is inclined relative to the vertical axis, that is, the normal vector of the filter plane forms an angle with the vertical axis, a cleaning fluid collection point with a lowest point is formed in the edge region of the filter adjacent to the inner surface of the device housing wall. In the cleaning operation, during wet cleaning with interruption of the filtering action, a cleaning chamber cleaning device for wet cleaning (arranged in the clean gas chamber and preferably comprising at least one clean gas chamber cleaning nozzle) sprays a cleaning fluid in the form of a cleaning liquid, which cleans the filter and flows away through the top surface of the filter facing the clean gas chamber. The cleaning liquid then collects at the lowest point of the cleaning fluid collection point, where the cleaning fluid can flow through the bypass inlet and the bypass channel adjacent thereto through the bypass device and into the process chamber. This design of the particle discharge device therefore ensures that the particle discharge device can be CIP cleaned.

[0015] Preferably, the particle discharge device comprises a conveying device arranged downstream of the clean gas outlet for variably adjusting the process gas flow. The process gas flow can be variably adjusted by the conveying device, which, in addition to processing the particles in the processing device, also suitably conveys the particles from the processing device, which is particularly designed as a fluidizing device, to the particle discharge device. In this regard, the conveying device comprises a control unit and a conveying unit. In order to adjust the process gas flow, the conveying unit (suitably designed as a blower) can be adjusted or the control unit (suitably having a regulating function) can be adjusted. Preferably, the control unit is designed as a control valve including a control unit drive or a regulating butterfly valve (Regelklappe) including a control unit drive. In this way, on the one hand, fluctuations of the blower in conveying the process gas flow can be compensated, and on the other hand, the process gas flow can be adjusted by adjusting the through cross section and the resulting pressure loss by the control unit designed as a control valve or a regulating butterfly valve.

[0016] According to another advantageous development of the particle emission device, the particle emission device comprises a dry cleaning device which is suitable for cleaning the filter during operation. This means that if a high pressure loss across the filter is detected during operation, the filter can be cleaned easily and effectively. Whether the filter has been clogged with particles can be determined, for example, by measuring the pressure difference between the process chamber and the clean gas chamber, wherein the particle emission device comprises a measuring device for detecting the pressure difference for this purpose. Other measuring methods are also conceivable.

[0017] The particle discharge device then comprises a control device which expediently has a regulating function and is particularly suitable for controlling and / or regulating the particle discharge device. In particular, the control device is configured to control and / or regulate the conveying device and / or the closing element drive and / or the control unit drive and / or the dry cleaning drive and / or the clean gas chamber cleaning device and / or the process chamber cleaning device. Advantageously, automated operation is thus possible.

[0018] Furthermore, the object is achieved in a method of the type mentioned at the outset in that the particle discharge device comprises a clean gas chamber cleaning device arranged in the clean gas chamber, the clean gas chamber cleaning device comprising at least one clean gas chamber cleaning nozzle and for wet cleaning of a filter having a filter plane inclined relative to a vertical axis in a cleaning operation, and the particle discharge device comprises a bypass device through which a bypass channel is interspersed, wherein the bypass channel comprises a bypass inlet connected to the clean gas chamber and a bypass outlet connected to the process chamber, wherein the bypass device further comprises a bypass channel closing element which can be selectively positioned in a closed position preventing a fluid from passing through the bypass channel or in at least one open position allowing a fluid to pass through, wherein in a cleaning operation the clean gas chamber cleaning device dispenses a cleaning fluid in the form of a cleaning liquid and the bypass channel closing element is moved from the closed position to the open position so that the cleaning fluid can at least partially flow from the clean gas chamber into the process gas chamber through the bypass channel. Advantageously, the particle discharge device can be CIP-cleaned by the method, thereby saving considerable investment costs, for example without expensive lifting columns.

[0019] According to an advantageous development of the method in this respect, the bypass channel closing element is moved from the closed position to the open position before, during or after the dispensing of the cleaning fluid. Advantageously, after the bypass channel closing element is opened, the cleaning fluid in the form of a cleaning liquid can then flow through the bypass device via the bypass inlet and the adjacent bypass channel and into the process chamber, and can then be discharged from the process chamber, for example via the particle discharge opening.

[0020] According to a further advantageous embodiment of the method, the cleaning fluid is discharged from the process chamber via the particle discharge opening. In this way, the cleaning fluid in the form of a cleaning liquid can be conveniently dispensed.

[0021] Furthermore, the filter is preferably dried after wet cleaning by letting an empty process gas flow through the particle discharge device, wherein the closing element remains in an open position at least at the beginning of the drying process so that the empty process gas can at least partially flow through the bypass device. According to an advantageous development of the method in this respect, the empty process gas is heated before flowing through the particle discharge device in order to evaporate or vaporize the cleaning fluid adhering to the filter after wet cleaning. After wet cleaning, a large part of the filter through openings is blocked by the cleaning liquid, which causes a large pressure loss in the filter. For this reason, the bypass channel closing element remains open or is opened so that the empty process gas can flow through the process chamber, bypassing the filter into the clean gas chamber. As the drying process proceeds, the bypass channel closing element can be closed further so that a larger part of the empty process gas is forced to flow through the filter. This means that the bypass channel closing element moves from the original open position to an open position that more strongly blocks the flow of fluid. This significantly shortens the drying process. The heated process gas can also heat the filter so that the cleaning fluid that clogs the filter after wet cleaning evaporates or vaporizes. Once the cleaning fluid has evaporated or vaporized and the filter is dry, the drying process can be stopped. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] The present invention will be described in more detail below with reference to the accompanying drawings, in which:

[0023] Figure 1 A process flow chart of a particle production device including a particle discharge device is shown,

[0024] Figure 2 shows a perspective view of a particle discharge device,

[0025] Figure 3 shows a bottom view of the particle discharge device,

[0026] Figure 4 shows the particle discharge device along Figure 3 A cross-sectional view of section BB is shown in FIG.

[0027] Figure 5 Shows Figure 4 An enlarged view of section D of the particle discharge device shown in FIG. DETAILED DESCRIPTION

[0028] Unless otherwise stated, the following description refers to the embodiment of the preferred particle discharge device 1 shown in the accompanying drawings.

[0029] Figure 1 Detailed description of the invention is given in FIG. 1 , which is a process flow diagram of a particle production device 2 comprising a particle discharge device 1 , in particular for producing microparticles referred to as granules P for use in the pharmaceutical industry.

[0030] The granulation production device 2 shown as an example comprises a storage container 3 for the raw material AS, which is designed as a mobile suspension tank 4. The storage container 3 is connected to a granulator 8 via a first conveying line 7a, which comprises a conveying device 6 designed as a pump 5. The raw material AS is granulated in the granulator 8. In an embodiment not shown, the raw materials AS are conveyed separately from each other into the granulator 8.

[0031] The granules produced in the granulator 8 are sieved in a sieving device 9 connected to the granulator 8 and then conveyed to a fluidizing device 11 designed as a fluidized layer dryer 10 by means of a second conveying line 7b through which a process gas PG in the form of a conveying gas TG flows. In the fluidizing device 11, the sieved granules are further processed, in particular dried, in a fluidized state using the process gas PG. In order to achieve fluidization in the fluidizing device 11, the granulation production device 2 comprises a conveying device 13 designed as a conveying unit 14 for generating a process gas flow. It is expedient that the conveying unit 14 is designed as a blower 12 or a fan.

[0032] After treatment in the fluidizing device 11, the treated particles, which are referred to as particles P, are also transported from the process gas PG to the particle discharge device 1 by means of a conveying device 13 via a third conveying line 7c. In order to variably adjust the process gas flow, the conveying device 13 includes, in addition to a conveying unit 12 including an upstream filter device 15, a control unit 17 designed as a control valve 16. The particles P conveyed from the process gas PG to the particle discharge device 1 are separated from the process gas flow at the filter 24, wherein the particles P are collected in a collecting container 19, and the cleaned process gas PG (referred to as clean gas RG) is conveyed out of the particle production device 2 by the conveying device 13, for example, into the environment. The process gas flow can additionally be variably adjusted in the particle production device 2 by means of a corresponding control valve or regulating valve 20.

[0033] Since the conveying device 13 is arranged downstream of the fluidizing device 11 and downstream of the particle discharge device 1, a negative pressure prevails in the particle production device 2. The negative pressure is preferably between 50 mbar and 500 mbar, but preferably about 100 mbar.

[0034] Figure 2 A perspective view of a particle discharge device 1 for separating particles P from a process gas stream is shown.

[0035] The particle discharge device 1 comprises a device housing 21 having a vertical axis AA in a vertical direction. In the embodiment shown, the device housing 21 including the device housing wall 28 comprises a device housing cover 54 , a cylindrical device housing section 22 , a conical device housing section 23 and a device housing base 30 .

[0036] In the embodiment shown, a filter 24 is arranged in the cylindrical device housing section 22, which divides the device housing 21 into a process chamber 25 for accommodating the particles P separated from the process gas flow and a clean gas chamber 26 for accommodating the dust-free process gas PG. Here, the process gas chamber 25 extends to the conical device housing section 23 and partially extends on the cylindrical device housing section 22. The clean gas chamber 26 extends only on the cylindrical device housing section 22.

[0037] In the illustrated embodiment, the filter 24 is designed as a metal filter 27 and is arranged in a filter plane CC inclined relative to the vertical axis AA, that is, the normal vector 51 of the filter plane CC forms an angle 52 with the vertical axis AA. The angle 52 preferably has an angle range of 1° to 20°, in particular 3° to 10°. In an embodiment not shown, the filter 24 is implemented as a fabric filter. In addition, the filter 24 is connected to the inner surface 36 of the device housing wall 28 with its edge region 35. In the edge region 35, due to this, a clean fluid collection point 37 is formed on the inner surface 36 of the device housing wall 28, which is connected to the bypass inlet 38, wherein, as shown in the illustrated embodiment, it is appropriate that the clean fluid collection point 37 has a lowest point 39, and the bypass inlet 38 is connected to the clean fluid collection point at the lowest point 39 of the clean fluid collection point 37.

[0038] The particle discharge device 1 further comprises a bypass device 44 interspersed with a bypass channel 43, wherein the bypass channel 43 comprises a bypass inlet 38 connected to the clean gas chamber 26 and a bypass outlet 45 connected to the process chamber 25. The bypass device 44 further comprises a bypass channel closing component 46, which can be selectively located in a closed position that blocks the fluid from passing through the bypass channel 44 or in at least one open position that allows the fluid to pass through. In order to selectively move the bypass channel closing component 46 from the closed position to the open position or vice versa, the bypass device 44 suitably comprises a closing component drive device 49 assigned to the bypass channel closing component 46.

[0039] Furthermore, the particle discharge device 1 comprises a clean gas chamber cleaning device 42 arranged in the clean gas chamber 26, which comprises at least one clean gas chamber cleaning nozzle 41 and is used for wet cleaning of the filter 24 in the cleaning operation, the filter having a filter plane CC inclined relative to the vertical axis AA, i.e., the normal vector 51 of the filter plane CC forms an angle 52 with the vertical axis AA. The angle 52 preferably has an angle range of 1° to 20°, in particular 3° to 10°. In this way, in the cleaning operation, the cleaning fluid in the form of a cleaning liquid can effectively flow on the filter top surface 53 toward the cleaning fluid collection point 37, so as to then flow from the clean gas chamber 26 into the process chamber 25 through the bypass channel 44.

[0040] From the particle discharge device 1 Figure 3 It can be seen from the sectional view of the section BB shown in that a process chamber cleaning device 48 is arranged in the process chamber 25, and the process chamber cleaning device includes at least one process chamber cleaning nozzle 47. In the embodiment shown, the process chamber cleaning device 48 is designed as a cleaning spray gun 55, which allows the at least one process chamber cleaning nozzle 47 to be moved radially from the vertical axis AA toward the device housing wall 28, and also in the opposite direction. In this way, the process chamber cleaning device 48 can be moved out of the process chamber 25 from the vertical axis AA toward the device housing wall 28 during operation, and the head of the process chamber cleaning device (not shown) can be sunk into the device housing wall 28 flush with the surface, so as not to hinder the separation of particles and process gas during operation. In addition, during the operation of the particle discharge device 1, the fluid (suitably the process gas PG) always flows through the process chamber cleaning device 48 to prevent the particles P from clogging the at least one process chamber cleaning nozzle 47. During the cleaning operation, the process chamber cleaning device 48 in the process chamber 25 moves toward the vertical axis AA to clean the particles P attached to the filter bottom surface 56 of the filter 24.

[0041] The particle discharge device 1 comprises a particle inlet 31 arranged at the process chamber 25 in the cylindrical device housing section 22. In operation, particles discharged from the fluidizing device 11 via the conveying line 7c with the aid of process gas are conveyed to the particle discharge device 1 via the particle inlet 31.

[0042] In the conical device housing section 23, the particle discharge device 1 is arranged with a particle discharge opening 33 in the region 32 of the device housing base 30. During operation, particles separated from the process gas PG by the filter 24 are discharged from the particle discharge device 1 via the particle discharge opening 32 and collected in the collecting container 19.

[0043] In addition, as the particle discharge device 1 Figure 4As shown in the enlarged view of the section D shown in FIG, the device housing 21 includes in the device housing cover 54, in addition to the manhole pipe 29 arranged for inspection purposes and closed in both working and cleaning operation, a clean gas outlet 34 connected to the clean gas chamber 26. The particle discharge device 1 includes a conveying device 13 designed as a blower 12 downstream of the clean gas outlet 34 for variably adjusting the process gas flow. In this regard, the conveying device 13 includes a conveying unit 12 and a control unit 17, wherein the control unit 17 is designed as a control valve 16 including a control unit drive device 50 in the embodiment shown. In an embodiment not shown, the control device 17 is realized as a regulating butterfly valve including a control unit drive device 50.

[0044] The particle discharge device 1 further comprises a dry cleaning device 57 for the wet-cleaned filter 24. In the embodiment shown, the dry cleaning device 57 is designed as a regulating valve 59 including a dry cleaning drive 58. In an embodiment not shown, the dry cleaning device 57 is realized as a regulating butterfly valve including a dry cleaning drive 58.

[0045] During operation in which particles P introduced into the particle discharge device 1 by means of the process gas PG are separated from the process gas flow by the filter 24, the filter 24 becomes clogged with particles P. This increases the pressure loss formed at the filter 24, so that it is necessary to dry or wet clean the filter to remove the particles P therein.

[0046] Dry cleaning is performed in particular during operation when the control valve 16 is closed and the regulating valve 59 is open, which causes the filter 24 to experience a pressure surge due to the negative pressure prevailing in the particle discharge device 1, which at least partially removes the particles P that clog the filter 24 from the filter 24. Once the dry cleaning is performed, the control valve 16 is opened and the regulating valve 59 is closed, and the separation of the particles P from the process gas flow can continue. Dry cleaning can be performed at any time and at any frequency during operation. In an embodiment not shown, the dry cleaning device is implemented to use compressed air for cleaning.

[0047] Cleaning operation refers to an operating mode of the particle discharge device, in which the filter is cleaned of particles when the filtering action is interrupted. In the cleaning operation, the control valve 16 and the regulating valve 59 and the particle inlet 31 are preferably closed as much as possible.

[0048] The method for wet cleaning the particle discharge device 1 is performed in the cleaning operation. Here, when the filtering action is interrupted, the clean air chamber cleaning nozzle 41 of the clean air chamber cleaning device 42 sprays a cleaning fluid in the form of a cleaning liquid in the clean air chamber 26, thereby detaching the particles P attached to the filter 24 from the filter 24, and the filter 24 is thus cleaned.

[0049] The filter 24 is arranged in a filter plane CC that is inclined relative to the vertical axis AA, that is, the normal vector 51 of the filter plane CC forms an angle 52 with the vertical axis AA, which allows the sprayed cleaning liquid (such as water or other solvents) to flow on the top surface 53 of the filter toward the cleaning fluid collection point 37 (which is formed in the edge area 35 of the filter 24 on the device housing wall 28).

[0050] Before, during or after dispensing the cleaning fluid, the bypass channel closing member 46 can be moved from the closed position to the open position. Preferably, the bypass channel closing member is moved to the open position before dispensing the cleaning fluid in the cleaning operation, so that the cleaning fluid accumulated at the cleaning fluid collection point 37 can at least partially flow from the clean gas chamber 26 to the process gas chamber 25 through the bypass channel 43.

[0051] Suitably, the cleaning fluid is subsequently discharged from the process gas chamber 25 via the particle discharge port 33. In an embodiment not shown, the cleaning fluid is discharged from the process chamber 25 via a cleaning fluid discharge device.

[0052] After wet cleaning, the filter 24 is dried. To dry the filter 24, the empty process gas PG flows through the particle discharge device 1, wherein the bypass channel closing element 46 is kept in an open position at least at the beginning of the drying process so that the empty process gas PG can at least partially flow through the bypass device 44. Here, it is expedient that the empty process gas PG is heated before flowing through the particle discharge device 1 in order to evaporate or vaporize the cleaning fluid adhering to the filter 24 after wet cleaning. It is expedient that as the drying process proceeds, the bypass channel closing element 46 is closed more and more tightly until the bypass channel closing element 46 is in its closed position at the end of the drying process.

Claims

1. A particle discharge device (1) for separating particles (P) from a process gas flow, comprising the following: a device housing (21) having a vertical axis (AA) in a vertical direction; a filter (24) dividing the device housing (21) into a process chamber (25) containing the particles (P) to be separated and a clean gas chamber (26) containing the dust-free process gas (PG); a particle inlet (31) arranged at the process chamber (25), and a particle outlet (33) arranged at the process chamber (25); and a clean gas outlet (34) arranged in the clean gas chamber (26), characterized in that The particle discharge device (1) comprises a clean gas chamber cleaning device (42) arranged in the clean gas chamber (26), the clean gas chamber cleaning device comprising at least one clean gas chamber cleaning nozzle (41) and being used for wet cleaning a filter (24) having a filter plane (CC) inclined relative to the vertical axis (AA) during cleaning operation, and the particle discharge device comprises a bypass device (44) interspersed with a bypass channel (43), wherein the bypass channel (43) comprises a bypass inlet (38) connected to the clean gas chamber (26) and a bypass outlet (45) connected to the process chamber (25), wherein the bypass device (44) further comprises a bypass channel closing component (46), which can be selectively located in a closed position preventing fluid from passing through the bypass channel (43) or in at least one open position allowing fluid to pass through.

2. The particle discharge device (1) according to claim 1, characterized in that: The bypass device (44) comprises a closing member driving device (49) assigned to the bypass channel closing member (46), the closing member driving device being used to move the bypass channel closing member (46) from the closing position to the opening position, and vice versa.

3. The particle discharge device (1) according to any one of the preceding claims, characterized in that A process chamber cleaning device (48) comprising at least one process chamber cleaning nozzle (47) is arranged in the process chamber (25), wherein the at least one process chamber cleaning nozzle (47) is movable radially from the vertical axis (AA) toward the device housing wall (28) and also in the opposite direction.

4. The particle discharge device (1) according to any one of the preceding claims, characterized in that The particle outlet (33) is arranged in the region (32) of the device housing base (30).

5. The particle discharge device (1) according to any one of the preceding claims, characterized in that The filter (24) is connected with its edge region (35) to the inner surface (36) of the device housing wall (28), so that a clean fluid collection point (37) is formed in the edge region (35) on the device housing wall (28), and the clean fluid collection point is connected to the bypass inlet (38), wherein the clean fluid collection point (37) has a lowest point (39) and the bypass inlet (38) is connected to the clean fluid collection point (37) at the lowest point of the clean fluid collection point (39).

6. The particle discharge device (1) according to any one of the preceding claims, characterized in that The particle discharge device (1) comprises a conveying device (13) arranged downstream of the clean gas outlet (34) for variably adjusting the process gas flow.

7. The particle discharge device (1) according to claim 6, characterized in that: The conveying device (13) comprises a control unit (17) and a conveying unit (14), wherein the control unit has a regulating function.

8. The particle discharge device (1) according to claim 7, characterized in that The control unit (17) is designed as a control valve (16) including a control unit drive device (50), or a regulating butterfly valve including a control unit drive device (50).

9. The particle discharge device (1) according to any one of the preceding claims, characterized in that The particle discharge device (1) comprises a dry cleaning device, which is suitable for cleaning the filter during operating operation.

10. A method for wet cleaning a particle discharge device (1), the particle discharge device being used to separate particles (P) from a process gas flow and comprising the following: a device housing (21) having a vertical axis (AA) in a vertical direction; a filter (24) dividing the device housing (21) into a process chamber (25) containing the particles (P) to be separated and a clean gas chamber (26) containing the process gas (PG) which has been dust-free; a particle inlet (31) arranged at the process chamber (25), and a particle outlet (33) arranged at the process chamber (25); and a clean gas outlet (34) arranged in the clean gas chamber (26), characterized in that The particle discharge device (1) comprises a clean gas chamber cleaning device (42) arranged in the clean gas chamber (26), the clean gas chamber cleaning device comprising at least one clean gas chamber cleaning nozzle (41) and being used for wet cleaning of a filter (24) having a filter plane (CC) inclined relative to the vertical axis (AA) during cleaning operation, and the particle discharge device comprising a bypass device (44) interspersed with a bypass channel (43), wherein the bypass channel (43) comprises a bypass inlet (38) connected to the clean gas chamber (26) and a bypass outlet connected to the process chamber (25). (45), wherein the bypass device (44) further comprises a bypass channel closing component (46), wherein the bypass channel closing component can be selectively located in a closed position for preventing fluid from passing through the bypass channel (43) or in at least one open position for allowing fluid to pass through, wherein, during the cleaning operation, the clean gas chamber cleaning device (42) dispenses a cleaning fluid in the form of a cleaning liquid, and the bypass channel closing component (46) moves from a closed position to an open position so that the cleaning fluid can at least partially flow from the clean gas chamber (26) into the process gas chamber (25) through the bypass channel (43).

11. The method according to claim 10, characterized in that The bypass passage closing member (46) moves from the closed position to the open position before, during or after dispensing of the cleaning fluid.

12. The method according to claim 10 or 11, characterized in that: The cleaning fluid is discharged from the process chamber (25) via the particle discharge port (33).

13. The method according to any one of claims 10 to 12, characterized in that The filter (24) is dried after wet cleaning by allowing unladen process gas (PG) to flow through the particle discharge device (1), wherein the shut-off element (46) is kept in an open position at least at the beginning of the drying process so that the unladen process gas (PG) can at least partially flow through the bypass device (44).

14. The method according to claim 13, characterized in that As the drying process proceeds, the bypass channel closing member is further closed.

15. The method according to claim 13 or 14, characterized in that The unladen process gas (PG) is heated before flowing through the particle discharge device (1) in order to evaporate or vaporize the cleaning fluid adhering to the filter (24) after the wet cleaning.

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