Display substrate and display device

Abstract

A display substrate and a display device. The display substrate includes a substrate, a plurality of sub-pixels, an insulating layer, and a pixel defining pattern. The insulating layer includes a plurality of recesses, the recesses being at least partially located between adjacent sub-pixels, and the pixel defining pattern includes a pixel defining portion surrounding a plurality of first openings and a plurality of second openings. The display substrate further includes an isolation layer, the isolation layer including a flat portion, an edge of the flat portion being covered by the pixel defining portion; an isolation structure is disposed in the recess, the isolation structure including a first isolation portion and a second isolation portion, an edge of the second isolation portion being protruded relative to an edge of the first isolation portion to form a protruding portion. The protruding portion is configured to isolate at least one layer of a multi-layer film layer, and the second isolation portion is a portion of the isolation layer exposed by the second opening. By providing the isolation layer and the isolation structure, the flatness of the first electrode can be improved, while the ghosting problem and the crosstalk problem between adjacent sub-pixels can be alleviated.

Description

TECHNICAL FIELD

[0001] The display substrate and the display device of at least one embodiment of the present disclosure relate to a display substrate and a display device. BACKGROUND

[0002] A tandem organic light emitting display device improves the lifetime and brightness of the light emitting device and reduces power consumption by adding at least one light emitting layer and a charge generation layer in the organic light emitting device to meet the user's demand for the lifetime and power consumption of the display device. SUMMARY

[0003] The display substrate and the display device of at least one embodiment of the present disclosure relate to a display substrate and a display device.

[0004] The display substrate and the display device of at least one embodiment of the present disclosure relate to a display substrate and a display device.

[0005] For example, according to at least one embodiment of the present disclosure, the first isolation portion and the insulating layer are integrally formed.

[0006] For example, according to at least one embodiment of the present disclosure, the isolation structure has a spacing between a projection of the isolation structure on the substrate and a projection of the pixel defining portion on the substrate in a direction parallel to the substrate.

[0007] For example, according to at least one embodiment of the present disclosure, the protruding portion is configured to isolate the second electrode.

[0008] For example, according to at least one embodiment of the present disclosure, a ratio of a spacing between the flat portion and the substrate in a direction perpendicular to the substrate to a spacing between the second isolation portion and the substrate is 0.9-1.1.

[0009] For example, according to at least one embodiment of the present disclosure, a maximum depth of the recess is greater than a maximum dimension of the light-emitting functional layer in a direction perpendicular to the substrate; the maximum depth of the recess is 0.2-0.5 microns.

[0010] For example, according to at least one embodiment of the present disclosure, a projection of the first electrode on the substrate is located within a projection of the flat portion on the substrate; in any direction parallel to the substrate, a dimension of the flat portion is not less than a dimension of the first electrode.

[0011] For example, according to at least one embodiment of the present disclosure, the pixel defining portion includes a portion located within the recess, and the portion is spaced apart from the first isolation portion.

[0012] For example, according to at least one embodiment of the present disclosure, an isolation column is disposed in the second opening, located on a side of the isolation structure away from the substrate, and covering at least part of the second isolation portion other than the protruding portion.

[0013] For example, according to at least one embodiment of the present disclosure, the pixel defining portion includes a first side wall, at least part of the first side wall has a first slope angle with respect to a contact surface between the pixel defining portion and a bottom wall of the recess; a projection of the first side wall on the substrate overlaps a projection of the bottom wall of the recess on the substrate; the isolation column includes a second side wall, at least part of the second side wall has a second slope angle with respect to a contact surface between the isolation column and the second isolation portion; the first slope angle is greater than the second slope angle, and both the first slope angle and the second slope angle are less than 90 degrees.

[0014] For example, according to at least one embodiment of the present disclosure, the pixel defining portion and the isolation column are configured to be formed by one patterning process.

[0015] For example, according to at least one of the embodiments of the present disclosure, the display substrate further comprises a touch structure on a side of the pixel defining pattern away from the substrate substrate; the touch structure comprises a plurality of layers of touch electrodes, and a normal projection of at least one layer of the plurality of layers of touch electrodes on the substrate substrate overlaps with a normal projection of a part of the isolation structure other than the protruding part on the substrate substrate.

[0016] For example, according to at least one of the embodiments of the present disclosure, a isolation column is arranged in the second opening on a side of the isolation structure away from the substrate substrate, and the isolation column covers at least part of the second isolation part other than the protruding part; a normal projection of at least one of the plurality of layers of touch electrodes on the substrate substrate overlaps with a normal projection of the isolation column on the substrate substrate.

[0017] For example, according to at least one of the embodiments of the present disclosure, the isolation structure in the at least one groove comprises a plurality of sub-isolation structures, and the plurality of sub-isolation structures are arranged at intervals in the arrangement direction of adjacent sub-pixels.

[0018] For example, according to at least one of the embodiments of the present disclosure, the number of the second openings is less than the number of groove openings of the grooves.

[0019] For example, according to at least one of the embodiments of the present disclosure, the distance between the normal projection of the second isolation part on the substrate substrate and the normal projection of the pixel defining part adjacent thereto on the substrate substrate in the arrangement direction of the adjacent sub-pixels is 1-3 microns.

[0020] For example, according to at least one of the embodiments of the present disclosure, the size of the protruding part in the arrangement direction of adjacent sub-pixels is greater than the maximum thickness of the light-emitting functional layer.

[0021] For example, according to at least one of the embodiments of the present disclosure, the size of the second isolation part in the arrangement direction of adjacent sub-pixels is 5-7 microns.

[0022] The display device provided in at least one of the embodiments of the present disclosure comprises the display substrate provided in any one of the above embodiments. BRIEF DESCRIPTION OF DRAWINGS

[0023] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly introduced below. Obviously, the drawings described below only relate to some of the embodiments of the present disclosure, and not limit the present disclosure.

[0024] Figure 1 The planar schematic diagram of the display substrate provided in an example of at least one of the embodiments of the present disclosure.

[0025] Figure 2 The planar schematic diagram of the display substrate provided in an example of at least one of the embodiments of the present disclosure. Figure 1A cross-sectional view taken along line AA' is shown.

[0026] Figure 3 A cross-sectional view taken along line AA' is shown. Figure 1 A cross-sectional view taken along line AA' is shown.

[0027] Figure 4 A cross-sectional view taken along line AA' is shown.

[0028] Figure 5 A cross-sectional view taken along line AA' is shown.

[0029] Figure 6 A cross-sectional view taken along line AA' is shown. Figure 5 A cross-sectional view taken along line AA' is shown.

[0030] Figure 7 A cross-sectional view taken along line AA' is shown. Figure 8 A cross-sectional view taken along line AA' is shown.

[0031] Figure 9 A cross-sectional view taken along line AA' is shown. Figure 10 A cross-sectional view taken along line AA' is shown. DETAILED DESCRIPTION

[0032] In order to make the objects, technical solutions and advantages of the embodiments of the present disclosure clearer, the technical solutions of the embodiments of the present disclosure will be described clearly and completely below with reference to the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are only some of the embodiments of the present disclosure, but not all the embodiments of the present disclosure. Based on the described embodiments of the present disclosure, all other embodiments obtained by those of ordinary skill in the art without creative effort belong to the scope of protection of the present disclosure.

[0033] Unless otherwise defined, technical or scientific terms used in the present disclosure should have the same meaning as commonly understood by one of ordinary skill in the art to which the present disclosure belongs. The terms "first", "second", and similar terms are used to distinguish one element from another element, and are not necessarily used to describe a sequential or chronological order or importance. The terms "comprises", "comprising", "includes", "including" and the like are intended to mean that the elements listed after the terms are included, but not to the exclusion of other elements.

[0034] The terms "parallel," "perpendicular," and "identical" and the like used in the present disclosure include the strict "parallel," "perpendicular," "identical" and the like, and "approximately parallel," "approximately perpendicular," "approximately identical" and the like with a certain error, which, considering the measurement and the error related to the measurement of a specific quantity (that is, the limitation of the measurement system), represents the acceptable deviation range for the specific value determined by the person skilled in the art. The "center" in the embodiments of the present disclosure can include the position strictly located at the geometric center and the position of the approximate center located within a small area around the geometric center. For example, "approximately" can represent within one or more standard deviations, or within 10% or 5% of the value.

[0035] A single-layer organic light-emitting display device is an organic light-emitting display device including one light-emitting layer, also known as a Single device. Since the display life of the Single device is limited, it is difficult to meet the user's demand, and the Tandem technology emerges as the times require. Since the Tandem device needs to be subjected to at least two times of evaporation of light-emitting materials, the crosstalk problem is particularly serious.

[0036] In the research, the inventors of the present application found that an inorganic isolation structure can be designed around the sub-pixel to separate the light-emitting layer, thereby improving the above-mentioned crosstalk problem. In the research, the inventors of the present application also found that after introducing the above-mentioned inorganic isolation structure, there is a new optical problem under the new process condition, and the display panel has a more serious trailing problem and crosstalk problem under low brightness. Specifically, in the light-emitting layer separated by the position of the isolation groove, the charge generation layer and the cathode directly contact at the position close to the sub-pixel light-emitting area, causing the short circuit of the second layer device (such as the second layer light-emitting layer and the like film layer), and the total capacitance of the second layer device is too large. For example, limited by the material properties of the light-emitting layer in the green sub-pixel, the capacitance of the green sub-pixel is large and the efficiency is high, which will cause the display picture of the display device to have a trailing problem.

[0037] At least one embodiment of this disclosure provides a display substrate and a display device. The display substrate includes a substrate, a plurality of sub-pixels, an insulating layer, and a pixel defining pattern. The plurality of sub-pixels are located on the substrate. At least a portion of the sub-pixels include a light-emitting functional layer and a first electrode and a second electrode located on opposite sides of the light-emitting functional layer along a direction perpendicular to the substrate. The first electrode is located between the light-emitting functional layer and the substrate. The light-emitting functional layer includes a plurality of film layers. The insulating layer is located between the first electrode and the substrate. The insulating layer includes a plurality of grooves, at least partially located between adjacent sub-pixels. The pixel defining pattern is located on the side of the first electrode away from the substrate. The pixel defining pattern includes a plurality of first openings and a plurality of second openings, and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings. Each sub-pixel corresponds to at least one first opening, and the light-emitting functional layer of the sub-pixel is at least partially located within the first opening corresponding to the sub-pixel. The first opening is configured to expose the first electrode; wherein, the display substrate further includes an isolation layer located between the first electrode and the insulating layer; the isolation layer includes a planar portion that overlaps with the first electrode in a direction perpendicular to the substrate, and the edge of the planar portion is covered by a pixel defining portion; an isolation structure is provided in at least a portion of the groove, and at least a portion of the isolation structure is exposed by the second opening; the isolation structure includes a first isolation portion and a second isolation portion stacked together, the first isolation portion being located between the second isolation portion and the substrate, at least a portion of the first isolation portion being located in the groove, and the edge of the second isolation portion protruding relative to the edge of the first isolation portion to form a protrusion, the protrusion being configured to block at least one layer of the multilayer film; the second isolation portion is the portion of the isolation layer exposed by the second opening.

[0038] The display substrate and display device provided in at least one embodiment of this disclosure, by providing an isolation layer, can improve the flatness of the first electrode by utilizing the flat portion, while simultaneously using the protrusion of the second isolation portion to isolate at least one layer of the multilayer film of the light-emitting functional layer, thereby improving the crosstalk problem between adjacent sub-pixels. Furthermore, the isolation structure provided within the groove can divide the groove into multiple sub-grooves, which is beneficial for extending the crosstalk path between adjacent sub-pixels. In addition, when the protrusion isolates at least one layer of the multilayer film in the light-emitting functional layer, even if a short circuit occurs due to direct contact between the isolated film layer and the second electrode as shown in the figure, the short circuit occurs at the isolation structure, i.e., on the side of the sub-grooves away from the light-emitting area of ​​the sub-pixel, thus reducing or even eliminating the impact of the short circuit on the sub-pixel, which is beneficial for mitigating the ghosting problem.

[0039] The display substrate and display device are described below with reference to the accompanying drawings and through some embodiments.

[0040] Figure 1 This is a plan view of a display substrate provided as an example in at least one embodiment of the present disclosure. Figure 2 for Figure 1A cross-sectional view taken along line AA' is shown. Figure 3 As shown in Figure 1 A cross-sectional view of a partial structure of a display substrate is shown.

[0041] For example, Figure 3 A cross-sectional view of a display substrate is shown, which is different from Figure 2 A cross-sectional view of a display substrate is shown, which is different from Figure 3 The display substrate in Figure 3 The structure in the display substrate shown can be the same as the structure of the display substrate shown in Figure 2 The display substrate shown in Figure 3 The display substrate shown in Figure 2 The display substrate shown in

[0042] Referring to Figure 1 , Figure 2 and Figure 3 , the display substrate includes a substrate substrate 01, a plurality of sub-pixels 100, an insulating layer 200, and a pixel definition pattern 300. The plurality of sub-pixels 100 are located on the substrate substrate 01, and each of at least some of the sub-pixels 100 includes a light-emitting functional layer 130 and a first electrode 110 and a second electrode 120 located on both sides of the light-emitting functional layer 130 in a direction Z perpendicular to the substrate substrate 01, the first electrode 110 being located between the light-emitting functional layer 130 and the substrate substrate 10, the light-emitting functional layer 130 including a plurality of film layers. For example, all of the sub-pixels can include the light-emitting functional layer, the first electrode, and the second electrode. However, the present disclosure is not limited thereto, and only some of the sub-pixels can include the light-emitting functional layer, the first electrode, and the second electrode.

[0043] Referring to Figure 1 , Figure 2 and Figure 3 , the insulating layer 200 is located between the first electrode 110 and the substrate substrate 01, and the insulating layer 200 includes a plurality of grooves 210, the grooves 210 being located at least partially between adjacent sub-pixels 100. As shown in Figure 3 , the dashed box schematically shows the area where the groove 210 is located. For example, adjacent sub-pixels refer to the absence of other sub-pixels between the two adjacent sub-pixels. For example, the groove can be completely located between adjacent sub-pixels, or only a part of it can be located between adjacent sub-pixels, which is not limited by the present disclosure.

[0044] Referring to Figure 1 , Figure 2 and Figure 3The pixel definition pattern 300 is located on the side of the first electrode 110 away from the substrate 01, and the pixel definition pattern 300 includes a plurality of first openings 301 and a plurality of second openings 302, and a pixel definition portion 310 surrounding the plurality of first openings 301 and the plurality of second openings 302, and one sub-pixel 100 corresponds to at least one first opening 301. For example, one sub-pixel can correspond to one first opening, or can correspond to two or more first openings.

[0045] Referring to Figure 1 , Figure 2 and Figure 3 , the light-emitting functional layer 130 of the sub-pixel 100 is at least partially located in the first opening 301 corresponding to the sub-pixel 100, and the first opening 301 is configured to expose the first electrode 110. For example, the first electrode 110 and the second electrode 120 located on both sides of the light-emitting functional layer 130 can drive the light-emitting functional layer 130 in the first opening 301 of the pixel definition pattern 300 to emit light. For example, the light-emitting functional layer can be located only in the first opening, or can be located in the first opening and on the pixel definition portion, or can be located in the first opening, on the pixel definition portion, and in the second opening and the isolation structure in the example described below, and the present disclosure does not limit this.

[0046] Referring to Figure 1 , Figure 2 and Figure 3 , the display substrate further includes an isolation layer 02 located between the first electrode 110 and the insulating layer 200. The isolation layer 02 includes a flat portion 400 overlapping the first electrode 110 in a direction perpendicular to the substrate 01, and the edges of the flat portion 400 are covered by the pixel definition portion 310. For example, the flat portion 400 can provide a flat surface for the first electrode 110, reducing the risk of disconnection of the first electrode 110.

[0047] Referring to Figure 1 , Figure 2 and Figure 3 , the isolation structure 500 is disposed in at least part of the groove 210. For example, the isolation structure can be disposed in all grooves, or only in part of the grooves, and the present disclosure does not limit this. At least part of the isolation structure 500 is exposed by the second opening 302. For example, the second opening can expose all of the isolation structure, or only part of the isolation structure, and the present disclosure does not limit this.

[0048] Referring to Figure 1 , Figure 2 and Figure 3The isolation structure 500 includes a first isolation portion 510 and a second isolation portion 520 which are arranged in a stack, and the first isolation portion 510 is located between the second isolation portion 520 and the substrate 01. At least part of the first isolation portion 510 is located in the groove 210. For example, the first isolation portion can be completely located in the groove, or only part of the first isolation portion can be located in the groove, and the present disclosure does not limit this.

[0049] With reference to Figure 1 , Figure 2 and Figure 3 , the edge of the second isolation portion 520 protrudes relative to the edge of the first isolation portion 510 to form a protruding portion 521, and the protruding portion 521 is configured to isolate at least one layer of the multi-layer film layer, and the second isolation portion 520 is the portion of the isolation layer 02 exposed by the second opening 302. For example, the protruding portion can isolate one film layer of the multi-layer film layer, or the protruding portion can isolate all film layers of the multi-layer film layer, and the present disclosure does not limit this.

[0050] With reference to Figure 1 , Figure 2 and Figure 3 , the display substrate provided by the embodiments of the present disclosure can isolate at least one layer of the multi-layer film layer of the light-emitting functional layer 130 by using the protruding portion 521 of the second isolation portion 520 while improving the flatness of the first electrode 110 by using the flat portion 400, thereby improving the crosstalk problem between adjacent sub-pixels 100. Moreover, the isolation structure 500 arranged in the groove 210 can divide the groove 210 into multiple sub-grooves, which is conducive to prolonging the crosstalk path between adjacent sub-pixels 100. In addition, in the case where the protruding portion 521 isolates at least one film layer of the multi-layer film layer of the light-emitting functional layer 130, even if the isolated film layer directly contacts the second electrode 120 to cause a short circuit as shown in Figure 2 , since the position where the short circuit occurs is at the isolation structure 500, i.e., at the side of the sub-groove away from the light-emitting area of the sub-pixel 100, the influence of the short circuit on the sub-pixel 100 can be reduced or even eliminated, which is conducive to improving the ghosting problem.

[0051] For example, the material of the first isolation portion is different from the material of the second isolation portion, so that the protruding portion of the second isolation portion can be formed by using the different material characteristics of the first isolation portion and the second isolation portion in the etching process.

[0052] For example, the material of the isolation layer includes an inorganic non-metallic material, and the material of the insulating layer includes an organic material. For example, the material of the isolation layer can include silicon nitride or silicon oxide. For example, the insulating layer can be a planarization layer, and the material of the insulating layer can include polyimide and the like. It can be understood that in combination with the foregoing examples, the materials of the flat portion and the second isolation portion can both be inorganic non-metallic materials, and the material of the first isolation portion can be an organic material.

[0053] Reference is made to Figure 1 , Figure 2 and Figure 3 , after forming the insulating material layer on the substrate, a planar isolation material layer is formed, and the isolation material layer is etched by an etching liquid to form a flat portion, a groove, and an isolation structure disposed in the groove. Taking the example of etching two sub-grooves in the isolation material layer by the etching liquid to form the isolation structure, since the etching selectivity of the etching liquid to the material of the insulating material layer is greater than the etching selectivity of the etching liquid to the material of the isolation material layer, the edges of the two sub-grooves formed after etching are respectively recessed relative to the edges of the flat portion and the second isolation portion. Thus, the edge of the second isolation portion can protrude relative to the edge of the first isolation portion, thereby forming a protruding portion of the second isolation portion, and the edge of the flat portion can protrude relative to the edge of the groove, thereby forming a protruding portion of the flat portion.

[0054] For example, Figure 2 The protruding portion 521 of the second isolation portion 520 is schematically circled by a dashed line box, and the protruding portion 410 in the flat portion 400 that protrudes relative to the edge of the groove 211 is divided by a dashed line. For example, the protruding portion 521 and the portion of the second isolation portion 520 other than the protruding portion 521 are integrally formed. For example, the protruding portion 410 and the portion of the flat portion 400 other than the protruding portion 410 are integrally formed.

[0055] Reference is made to Figure 1 , for example, Figure 1 A plurality of openings in the isolation layer 02 are schematically shown. In combination with Figure 1 and Figure 2 , the openings in the isolation layer 02 described above are the intervals between adjacent sub-pixels 100 between the flat portion 400 and the second isolation portion 520 along the arrangement direction of the adjacent sub-pixels 100. In combination with Figures 1 to 3 , the openings in the isolation layer 02 are located in the groove opening 201 of the groove 210, and the isolation structure 500 is located between the openings in the two isolation layers 02 that are adjacent to each other along the arrangement direction of the adjacent sub-pixels 100.

[0056] Reference is made to Figure 1 , Figure 2 and Figure 3 , for example, the plurality of sub-pixels 100 can include a first sub-pixel 101, a second sub-pixel 102, and a third sub-pixel 103. For example, the first sub-pixel 101 can be a red sub-pixel, the second sub-pixel 102 can be a green sub-pixel, and the third sub-pixel 103 can be a blue sub-pixel.

[0057] Reference is made to Figure 1 , Figure 2 and Figure 3For example, the first opening 301 surrounded by the pixel defining portion 310 is used to define a light emitting area of the sub-pixel 100. For example, the second opening 302 can be formed by the pixel defining portion 310. For example, the light emitting area can refer to an area in which the sub-pixel 100 effectively emits light, and the shape of the light emitting area can refer to a two-dimensional shape. For example, the shape of the light emitting area can be the same as the shape of the first opening 301 surrounded by the pixel defining portion 310.

[0058] Referring to Figure 1 , Figure 2 and Figure 3 For example, the first electrode 110 can be an anode, and the second electrode 120 can be a cathode. For example, the anode can be formed of a transparent conductive material having a high work function. For example, the cathode can be formed of a material having high conductivity and a low work function. For example, the cathode can be formed of a metal material.

[0059] Referring to Figure 1 For example, the first electrode 110 can include a body portion 111 and a connection portion 112. For example, the first opening 301 exposes a portion of the body portion 111 to define a light emitting area of the sub-pixel 100. For example, the connection portion 112 is configured to be electrically connected to other structures. For example, the connection portion 112 is configured to be electrically connected to a pixel circuit through a via hole.

[0060] Referring to Figure 1 , Figure 2 and Figure 3 For example, the light emitting functional layer 130 can include a first light emitting layer (EML), a charge generation layer 133 (CGL), and a second light emitting layer (EML) stacked. The charge generation layer 133 is located between the first light emitting layer and the second light emitting layer. The charge generation layer 133 has strong conductivity, and can make the light emitting functional layer have the advantages of long service life, low power consumption, and high brightness. For example, compared with a light emitting functional layer without a charge generation layer, the light emitting brightness of the sub-pixel can be increased by nearly one time by setting the charge generation layer in the light emitting functional layer.

[0061] Referring to Figure 1 and Figure 2 For example, in each sub-pixel 100, the light emitting functional layer 130 can further include a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL), and an electron injection layer (EIL). For example, the hole injection layer, the hole transport layer, the electron transport layer, the electron injection layer, and the charge generation layer are common film layers of multiple sub-pixels, and can be referred to as common layers. For example, the common layers and the second electrode described above can be film layers formed using an open mask.

[0062] Referring to Figure 1 and Figure 2For example, the second light-emitting layer can be located between the first light-emitting layer and the second electrode 120, and the hole injection layer can be located between the first electrode 110 and the first light-emitting layer. For example, an electron transport layer can be further arranged between the charge generation layer and the first light-emitting layer. For example, a hole transport layer can be arranged between the second light-emitting layer and the charge generation layer. For example, an electron transport layer and an electron injection layer can be arranged between the second light-emitting layer and the second electrode 120.

[0063] Referring to Figure 1 and Figure 2 For example, the material of the flat portion 400 can be the same as the material of the second isolation portion 520, so that the flat portion 400 and the second isolation portion 520 can be formed by one patterning process, thereby simplifying the manufacturing process.

[0064] Referring to Figure 1 and Figure 2 In some examples, the first isolation portion 510 and the insulating layer 200 are integrally formed, so as to simplify the manufacturing process. For example, Figure 2 The dashed line extending in the X direction schematically shows the boundary between the first isolation portion 510 and the insulating layer 200. For example, the material of the first isolation portion can be the same as the material of the material layer. For example, the two sub-grooves can be formed by etching, so as to form the isolation structure arranged in the groove.

[0065] However, the present disclosure is not limited thereto. For example, the first isolation portion can also be a structure that is not integrally formed with the insulating layer. For example, the material of the first isolation portion can be different from the material of the insulating layer.

[0066] Referring to Figure 2 In some examples, in the arrangement direction of the adjacent sub-pixels 100, such as the X direction, the orthographic projection of the isolation structure 500 on the substrate 01 has a spacing G with the orthographic projection of the pixel defining portion 310 on the substrate 01, so that the spacing G and the protruding portion 521 can be used in cooperation, so that part of the light-emitting functional layer 130 can extend to the bottom wall of the groove 210, preventing the part of the light-emitting functional layer 130 covering the second isolation portion 520 from directly contacting the part of the light-emitting functional layer 130 covering the pixel defining portion 310, and achieving the isolation of at least one film layer in the light-emitting functional layer 130.

[0067] Referring to Figure 1 and Figure 2 For example, Figure 1 and Figure 2 schematically show a group of adjacent blue sub-pixels 103 and green sub-pixels 102 arranged in the X direction, but the present disclosure does not limit the arrangement direction of the sub-pixels to the X direction. For example, Figure 1A group of adjacent blue sub-pixels 103 and green sub-pixels 102 arranged in the Y direction, a group of adjacent green sub-pixels 102 and red sub-pixels 101 arranged in the X direction, and a group of red sub-pixels 101 and green sub-pixels 102 arranged in the Y direction are also shown.

[0068] Reference is made to Figure 1 For example, the X direction is perpendicular to the Y direction, and both are parallel to the substrate 01.

[0069] Reference is made to Figure 2 In some examples, the protrusion 521 is configured to isolate the second electrode 120. For example, the protrusion 521 can isolate all film layers in the light-emitting functional layer 130 and the second electrode 120, thereby improving the improvement effect on the crosstalk problem.

[0070] Reference is made to Figure 3 In some examples, in the direction Z perpendicular to the substrate 01, the ratio of the spacing D1 between the flat portion 400 and the substrate 01 to the spacing D2 between the second isolation portion 520 and the substrate 01 is 0.9-1.1. For example, the spacing D1 between the flat portion 400 and the substrate 01 is substantially the same as the spacing D2 between the second isolation portion 520 and the substrate 01, facilitating the same layer arrangement of the flat portion 400 and the second isolation portion 520.

[0071] Reference is made to Figure 3 For example, the ratio of the spacing D1 to the spacing D2 can be 0.91-1.09. For example, the ratio of the spacing D1 to the spacing D2 can be 0.91-1.09. For example, the ratio of the spacing D1 to the spacing D2 can be 0.95-1.05. For example, the ratio of the spacing D1 to the spacing D2 can be 1.

[0072] Reference is made to Figure 2 And Figure 3 In some examples, the maximum depth D3 of the groove 210 is greater than the maximum dimension D4 of the light-emitting functional layer 130 in the direction Z perpendicular to the substrate 01, and the maximum depth D3 of the groove 210 is 0.2-0.5 microns. Thus, the groove 210 can assist the isolation structure 500 to isolate the light-emitting functional layer 130.

[0073] Reference is made to Figure 2 In some examples, the orthographic projection of the first electrode 110 on the substrate 01 is located within the orthographic projection of the flat portion 400 on the substrate 01. Thus, the flat portion 400 can provide a larger area of flat surface for the first electrode 110 above it, which is beneficial to prevent the first electrode 110 from forming structures such as steps and causing disconnection.

[0074] Reference is made to Figure 2In some examples, the size of the flat portion 400 is not less than the size of the first electrode 110 in any direction parallel to the substrate 01, such as the X direction, to facilitate the flatness of the first electrode 110.

[0075] For example, the size of the flat portion can be greater than the size of the first electrode in any direction parallel to the substrate. For example, the size of the flat portion can be equal to the size of the first electrode in any direction parallel to the substrate.

[0076] Reference Figure 2 and Figure 3 In some examples, the pixel defining portion 310 includes a portion 311 located in the groove 210, and the portion 311 is spaced apart from the first isolation portion 510. The portion 311 of the pixel defining portion 310 extends into the groove 210, so as to cover the edge of the flat portion 400, prevent the light-emitting functional layer 130 and the second electrode 120 from being cut off by the flat portion 400, and facilitate the continuous arrangement of the second electrode 120 on the pixel defining portion 310 while extending the crosstalk path of the charge generation layer.

[0077] Reference Figure 2 and Figure 3 For example, the material of the flat portion 400 can be different from the material of the insulating layer 200. In combination with the foregoing example of etching the protruding portion 521 of the second isolation portion 520 by using the etching liquid, after etching by using the etching liquid, the edge of the flat portion 400 protrudes to form the protruding portion 410 relative to the opening of the groove 210. The portion 311 of the pixel defining portion 310 located in the groove 210 can cover the protruding portion 410, so that the light-emitting functional layer 130 and the second electrode 120 can be continuously arranged on the side of the pixel defining portion 310 away from the substrate 01 without being cut off.

[0078] Reference Figure 1 and Figure 3 For example, in the X direction, the size a of the edge of the first electrode 110 covered by the pixel defining portion 310 is not greater than 2 microns. By setting the numerical range of the size a, the pixel aperture ratio can be improved while the covering effect of the first electrode 110 is improved.

[0079] Reference Figure 1 and Figure 3For example, the size a can be 2 micrometers. For example, the size a can be 0.1 micrometers to 1.9 micrometers. For example, the size a can be 0.2 micrometers to 1.85 micrometers. For example, the size a can be 0.3 micrometers to 1.8 micrometers. For example, the size a can be 0.4 micrometers to 1.7 micrometers. For example, the size a can be 0.5 micrometers to 1.6 micrometers. For example, the size a can be 0.6 micrometers to 1.5 micrometers. For example, the size a can be 0.7 micrometers to 1.4 micrometers. For example, the size a can be 0.8 micrometers to 1.3 micrometers. For example, the size a can be 0.9 micrometers to 1.2 micrometers. For example, the size a can be 1 micrometers to 1.1 micrometers. It can be understood that the size a can also be other values within the above ranges, which are not listed one by one herein.

[0080] Referring to Figure 1 , Figure 2 and Figure 3 , for example, in the X direction, the size of the orthogonal projection of the pixel defining part 310 on the substrate 01 is the size a, and the difference between the size a and the size b is 3 micrometers to 4.5 micrometers. By setting the numerical range of the above-mentioned size b, the protruding part 410 of the planar layer 400 can be well covered, and the light-emitting functional layer 130 and the second electrode 120 can be prevented from being cut off.

[0081] Referring to Figure 1 , Figure 2 and Figure 3 , for example, the size b can be 3 micrometers to 4.4 micrometers. For example, the size b can be 3.1 micrometers to 4.35 micrometers. For example, the size b can be 3.15 micrometers to 4.3 micrometers. For example, the size b can be 3.2 micrometers to 4.25 micrometers. For example, the size b can be 3.25 micrometers to 4.2 micrometers. For example, the size b can be 3.3 micrometers to 4.15 micrometers. For example, the size b can be 3.4 micrometers to 4.1 micrometers. For example, the size b can be 3.5 micrometers to 4 micrometers. For example, the size b can be 3.6 micrometers to 3.9 micrometers. For example, the size b can be 3.7 micrometers to 3.8 micrometers. It can be understood that the size b can also be other values within the above ranges, which are not listed one by one herein.

[0082] Referring to Figure 1 , Figure 2 and Figure 3 , in some examples, the distance c between the orthogonal projection of the second isolation part 520 on the substrate 01 and the orthogonal projection of the pixel defining part 310 adjacent thereto on the substrate 01 in the arrangement direction of the adjacent sub-pixels 100 is 1 micrometers to 3 micrometers. By setting the numerical range of the above-mentioned distance c, the second isolation part 520 can be prevented from directly contacting the pixel defining part 310, so as to cut off at least one layer in the light-emitting functional layer 130 by the protruding part 521 of the second isolation part 520.

[0083] With reference to Figure 1 , Figure 2 and Figure 3 For example, the interval c can be 1.1 microns to 2.9 microns. For example, the interval c can be 1.2 microns to 2.8 microns. For example, the interval c can be 1.3 microns to 2.7 microns. For example, the interval c can be 1.4 microns to 2.6 microns. For example, the interval c can be 1.5 microns to 2.5 microns. For example, the interval c can be 1.55 microns to 2.4 microns. For example, the interval c can be 1.6 microns to 2.3 microns. For example, the interval c can be 1.65 microns to 2.2 microns. For example, the interval c can be 1.7 microns to 2.1 microns. For example, the interval c can be 1.75 microns to 2 microns. For example, the interval c can be 1.8 microns to 1.9 microns. It can be understood that the interval c can also be other values within the above ranges, which are not listed one by one herein.

[0084] With reference to Figure 1 , Figure 2 and Figure 3 For example, the orthographic projection on the substrate 01 of the second isolation portion 520 adjacent to each other and the orthographic projection on the substrate 01 of the pixel defining portion 310 means that there is no orthographic projection on the substrate 01 of other second isolation portions 520 between the two orthographic projections, and there is no orthographic projection on the substrate 01 of other pixel defining portions 310. However, there can be orthographic projections of other film layers or other structures between the two orthographic projections, such as orthographic projections of the insulating layer 200 on the substrate 01 between the two orthographic projections, and the present disclosure does not limit this.

[0085] With reference to Figure 1 , Figure 2 and Figure 3 In some examples, the size d of the second isolation portion 520 in the arrangement direction of the adjacent sub-pixels 100 is 5 microns to 7 microns. For example, the size d can be much larger than the maximum thickness of the light-emitting functional layer 130. By setting the above size d value range, it is beneficial to isolate at least one film layer in the light-emitting functional layer 130, and to make the position where the second electrode 120 directly contacts the charge generation layer 133 in the light-emitting functional layer 130 and causes short circuit as far away from the first electrode 110 as possible, reducing the impact of short circuit on the sub-pixel 100.

[0086] With reference to Figure 1 , Figure 2 and Figure 3For example, the size d can be 5.1 to 6.9 micrometers. For example, the size d can be 5.2 to 6.8 micrometers. For example, the size d can be 5.3 to 6.7 micrometers. For example, the size d can be 5.4 to 6.6 micrometers. For example, the size d can be 5.5 to 6.5 micrometers. For example, the size d can be 5.65 to 6.45 micrometers. For example, the size d can be 5.7 to 6.4 micrometers. For example, the size d can be 5.75 to 6.39 micrometers. For example, the size d can be 5.8 to 6.31 micrometers. For example, the size d can be 5.9 to 6.3 micrometers. For example, the size d can be 5.95 to 6.25 micrometers. For example, the size d can be 6 to 6.2 micrometers. For example, the size d can be 6.1 to 6.15 micrometers. It can be understood that the size d can also be other values within the above ranges, which are not listed one by one herein.

[0087] With reference to Figure 1 , Figure 2 and Figure 3 In some examples, the size of the protrusion 521 in the arrangement direction (e.g., the X direction) of the adjacent sub-pixels 100 is greater than the maximum thickness of the light-emitting functional layer 130, so as to block all film layers in the light-emitting functional layer 130 by the protrusion 521.

[0088] With reference to Figure 1 , Figure 2 and Figure 3 For example, the maximum thickness of the light-emitting functional layer 130 can refer to the maximum distance between the side surface of the light-emitting functional layer 130 away from the substrate 01 and the flat surface in the direction Z perpendicular to the substrate 01. For example, the flat surface can refer to the surface of the first electrode 110 away from the substrate 01. For example, the flat surface can refer to the surface of the second isolation portion 520 away from the substrate 01.

[0089] With reference to Figure 1 , Figure 2 and Figure 3For example, the protrusion 521 has a dimension in the arrangement direction (e.g., the X direction) of the adjacent sub-pixels 100 that is greater than the sum of the maximum thickness of the light-emitting functional layer 130 and the maximum thickness of the second electrode 120, so as to block the entire film layer in the light-emitting functional layer 130 and the second electrode 120 by using the protrusion 521. For example, the maximum thickness of the second electrode 120 can refer to the maximum distance between the side surface of the second electrode 120 located on the flat surface and the flat surface away from the substrate 01 in the direction Z perpendicular to the substrate 01. For example, the flat surface can refer to the surface of the first electrode 110 away from the substrate 01. For example, the flat surface can refer to the surface of the second isolation portion 520 away from the substrate 01.

[0090] Reference is made to Figure 2 and Figure 3 For example, the insulating layer 200 and the substrate 01 are provided with other film layers 011, which can include film layers or structures in the pixel circuit (e.g., including thin film transistors, storage capacitors, etc.), such as gate insulating layers, interlayer insulating layers, data lines, gate lines, initialization signal lines, power signal lines, reset power signal lines, reset control signal lines, light-emitting control signal lines, etc. For example, the side surface of the insulating layer 200 facing the substrate 01 can be in contact with the interlayer insulating layer.

[0091] Reference is made to Figures 1 to 3 For example, in the arrangement direction (e.g., the X direction) of the adjacent sub-pixels 100, the distance between the orthographic projection of the isolation structure 500 on the substrate 01 and the orthographic projection of the first electrode 100 of the two sub-pixels 100 on the substrate 01 is substantially the same. For example, the isolation structure 500 can be arranged as much as possible in the middle of the groove 210, so as to facilitate the consistency of the crosstalk path of the elongated charge generation layer of each sub-pixel 100. However, the disclosure is not limited thereto, for example, the position of the isolation structure can be closer to one of the two adjacent sub-pixels.

[0092] Figure 4 A cross-sectional schematic view of a display substrate provided for an example of at least one embodiment of the disclosure.

[0093] For example, Figure 4 Only part of the structure in the display substrate is schematically shown, such as the structure of the light-emitting functional layer, the second electrode, etc. For example, Figure 4 The display substrate shown in Figure 3 The difference between the display substrate shown in Figure 4 The display substrate shown in includes an isolation column. It can be understood that Figure 4 The structure in the display substrate shown in Figure 3 The structure in the display substrate shown in Figure 4The display substrate shown can also be different from Figure 3 The display substrate shown has other differences, which are not limited by the disclosure.

[0094] Referring to Figure 4 In some examples, a separation column 320 is arranged in the second opening 302, located away from the substrate substrate 01 side of the isolation structure 500, and the separation column 320 covers at least part of the second isolation part 520 except the protruding part 521. The separation column 320 avoids the part where the protruding part 521 is located, which is conducive to reliably isolating at least one film layer in the light-emitting functional layer by the protruding part 521. By arranging the separation column 320, it is conducive to prolonging the crosstalk path of the light-emitting functional layer, so as to alleviate the ghosting problem of the sub-pixel while reducing the crosstalk between adjacent sub-pixels.

[0095] Referring to Figure 4 For example, the second opening 302 can be formed by the pixel defining part 310.

[0096] Referring to Figure 4 For example, the separation column 320 can cover all of the isolation structure 500 except the protruding part 521, or it can only cover part of the part of the isolation structure 500 except the protruding part 521, which is not limited by the disclosure.

[0097] Referring to Figure 4 In some examples, the pixel defining part 310 includes a first side wall 3101, and the included angle between at least part of the first side wall 3101 and the contact surface between the pixel defining part 310 and the bottom wall 211 of the groove 210 is a first slope angle p, and the orthographic projection of the first side wall 3101 on the substrate substrate 01 overlaps the orthographic projection of the bottom wall 211 of the groove 210 on the substrate substrate 01. For example, in the arrangement direction (such as the X direction) of the adjacent sub-pixels 100, the first side wall 3101 is the side wall of the side of the pixel defining part 310 away from the first electrode 110.

[0098] Referring to Figure 4 In some examples, the separation column 320 includes a second side wall 3201, and the included angle between at least part of the second side wall 3201 and the contact surface between the separation column 320 and the second isolation part 520 is a second slope angle q.

[0099] Referring to Figure 4 In some examples, the first slope angle p is greater than the second slope angle q, and both the first slope angle p and the second slope angle q are less than 90 degrees, so as to facilitate the continuous arrangement of the light-emitting functional layer and the second electrode by arranging the second slope angle q with a smaller angle.

[0100] Referring to Figure 4For example, the pixel defining portion 310 further includes a third side wall 3102 opposite to the first side wall 3101 in the X direction, at least a portion of the third side wall 3102 has a third slope angle m with a plane parallel to the contact surface between the first electrode 110 and the pixel defining portion 310, and the third slope angle m is smaller than the first slope angle p.

[0101] With reference to Figure 4 For example, the third slope angle m is not greater than the second slope angle q. For example, the third slope angle m can be equal to the second slope angle q. For example, the third slope angle m can be smaller than the second slope angle q.

[0102] With reference to Figure 4 For example, the isolation column 320 further includes a fourth side wall 3202 opposite to the second side wall 3201 in the X direction, at least a portion of the fourth side wall 3202 has a fourth slope angle n with a plane parallel to the contact surface between the isolation column 320 and the second isolation portion 520, and the fourth slope angle n is substantially the same as the second slope angle q.

[0103] For example, the above-mentioned slope angle refers to an acute angle between two surfaces. For example, the above-mentioned slope angle ranges from 20 degrees to 60 degrees. For example, the above-mentioned slope angle ranges from 30 degrees to 50 degrees. The above-mentioned slope angle ranges from 35 degrees to 45 degrees.

[0104] For example, Figure 4 It is schematically shown that the first side wall 3101, the second side wall 3201, the third side wall 3102, and the fourth side wall 3202 are straight edges, but are not limited thereto. In actual processes, the above-mentioned side walls (for example, the first side wall 3101, the second side wall 3201, the third side wall 3102, and the fourth side wall 3202) can also be curved edges. For example, the curved edges curve to one side away from the center of the pixel defining portion (for example, the pixel defining portion 310 and the isolation column 320) where the curved edges are located, or the curved edges curve to one side close to the center of the pixel defining portion where the curved edges are located. In this case, the slope angle between the curved edges and the contact surface can refer to the included angle between the tangent line at the midpoint of the curved edges and the contact surface, or the included angle between the tangent line at the intersection point of the curved edges and the contact surface and the contact surface.

[0105] With reference to Figure 4 In some examples, the pixel defining portion 310 and the isolation column 320 are configured to be formed by one patterning process, so as to facilitate simplifying the manufacturing process.

[0106] Figure 5 A plan view of a display substrate provided for an example in at least one embodiment of the present disclosure. Figure 6 For Figure 5 A cross-sectional view taken along the line BB' is shown.

[0107] For example, Figure 5The display substrate shown in Figure 1 The display substrate shown in Figure 5 The display substrate shown in Figure 5 The structure of the display substrate shown in Figure 1 The display substrate shown in Figure 5 The display substrate shown in Figure 1 The display substrate shown in

[0108] Referring to Figure 5 and Figure 6 In some examples, the display substrate further comprises a touch structure 600 located on the side of the pixel defining pattern 300 away from the substrate 01. The touch structure 600 comprises a plurality of layers of touch electrodes 610, and the orthographic projection of at least one of the plurality of layers of touch electrodes 610 on the substrate 01 overlaps the orthographic projection of the part of the isolation structure 500 other than the protruding portion 521 on the substrate 01.

[0109] Referring to Figure 5 and Figure 6 The second electrode 120 located above the isolation structure 500 (i.e. on the side away from the substrate 01) is not blocked, and thus the signals transmitted by the structures such as data lines, gate lines, initialization signal lines, etc. between the insulating layer 200 and the substrate 01 can be shielded by the second electrode 120. Therefore, by arranging at least one of the plurality of layers of touch electrodes 610 above the isolation structure 500 while avoiding the protruding portion 521, the signal shielding can be achieved by the second electrode 120, preventing the signals transmitted by the touch structure 600 from being affected by the coupling of other signals. In this way, it is beneficial to prevent the abnormal function of the touch structure, so as to improve the display effect.

[0110] For example, only one layer of touch electrodes can have the orthographic projection on the substrate 01 overlapping the orthographic projection of the part of the isolation structure other than the protruding portion on the substrate 01. For example, a plurality of layers of touch electrodes can have the orthographic projection on the substrate 01 overlapping the orthographic projection of the part of the isolation structure other than the protruding portion on the substrate 01. For example, all the orthographic projections of the touch electrodes on the substrate 01 can overlap the orthographic projection of the part of the isolation structure other than the protruding portion on the substrate 01.

[0111] For example, the touch structure can be a single-layer touch structure or a double-layer touch structure, and the present disclosure is not limited in this regard. For example, the touch electrode can comprise a first touch electrode and a second touch electrode. Referring to Figure 5 , Figure 5It is shown that the first touch electrode and the second touch electrode are arranged in the same layer in the case of the single-layer touch structure. In the case of the double-layer touch structure, the first touch electrode and the second touch electrode are arranged in different layers. The embodiments of the present disclosure do not limit the specific structure of the touch structure.

[0112] For example, referring to Figure 6 , the second electrode 120 and the touch structure 600 can further be provided with other film layers 012, which can be film layers such as encapsulation layers, and the present disclosure does not limit this.

[0113] Figure 7 and Figure 8 are cross-sectional schematic diagrams of display substrates provided in different examples of at least one embodiment of the present disclosure.

[0114] For example, Figure 7 The display substrate shown in Figure 6 The difference between the display substrate shown in Figure 7 The display substrate shown in Figure 7 The light-emitting functional layer in the display substrate shown in Figure 6 The light-emitting functional layer in the display substrate shown in Figure 7 The display substrate shown in Figure 6 The display substrate shown in

[0115] For example, Figure 8 The display substrate shown in Figure 8 The display substrate shown in

[0116] For example, Figure 7 In some examples, the second opening 302 is provided with an isolation column 320 located away from the substrate 01 on the side of the isolation structure 500, and the isolation column 320 covers at least part of the second isolation portion 520 except the protruding portion 521. The orthographic projection of at least one of the multi-layer touch electrodes 610 on the substrate 01 overlaps with the orthographic projection of the isolation column 320 on the substrate 01.

[0117] For example, Figure 7The isolation column 320 avoids the portion where the protruding portion 521 is located, and facilitates the protruding portion 521 to reliably cut off at least one film layer in the light-emitting functional layer. By arranging the isolation column 320, the crosstalk path of the light-emitting functional layer is facilitated to be extended, so that the crosstalk between adjacent sub-pixels can be reduced while the ghosting problem of the sub-pixel is alleviated. At the same time, at least one of the plurality of touch electrodes 610 is arranged above the isolation column 320, and the signal shielding can be realized by the second electrode 120 located above the isolation column 320, so as to prevent the signal transmitted by the touch structure 600 from being affected by the coupling of other signals. In this way, the function abnormality of the touch structure is prevented, so as to improve the display effect.

[0118] For example, the isolation column can cover all of the second isolation portion except the protruding portion, or can cover only a part of the part of the second isolation portion except the protruding portion, and the present disclosure does not limit this.

[0119] For example, the orthographic projection of the first touch electrode on the substrate substrate can overlap the orthographic projection of the isolation column on the substrate substrate. For example, the orthographic projection of the second touch electrode on the substrate substrate can overlap the orthographic projection of the isolation column on the substrate substrate. For example, the orthographic projection of the first touch electrode and the second touch electrode on the substrate substrate can all overlap the orthographic projection of the isolation column on the substrate substrate.

[0120] Reference Figure 7 For example, in the arrangement direction (such as the X direction) of the adjacent sub-pixels 100, the orthographic projection of the isolation column 320 on the substrate substrate 01 is substantially the same as the interval between the orthographic projection of the first electrode 110 of the two sub-pixels 100 on the substrate substrate 01. For example, the isolation column 320 can be arranged as much as possible in the middle of the second isolation portion 520, so as to facilitate the crosstalk path of the extended charge generation layer of each sub-pixel 100 to be consistent. However, the present disclosure is not limited thereto, for example, the position of the isolation column can be closer to one of the two adjacent sub-pixels.

[0121] For example, Figure 8 The display substrate shown in FIG. 1 is different from the display substrate shown in FIG. 2 in that Figure 3 The display substrate shown in FIG. 1 is different from the display substrate shown in FIG. 2 in that Figure 8 The isolation structure in the display substrate shown in FIG. 1 is different from the isolation structure in the display substrate shown in FIG. 2. Figure 3 The isolation structure in the display substrate shown in FIG. 1 is different from the isolation structure in the display substrate shown in FIG. 2.

[0122] Reference Figure 8 In some examples, the isolation structure 500 in the at least one groove 210 includes a plurality of sub-isolation structures 501. Figure 8The dashed line box shown schematically circumscribes a sub-isolation structure 501. Multiple sub-isolation structures 501 are arranged at intervals in the arrangement direction (e.g., the X direction) of adjacent sub-pixels 100. By arranging multiple sub-isolation structures 501, the groove 210 can be divided into multiple sub-grooves, which is conducive to lengthening the crosstalk path of the charge generation layer in the light-emitting functional layer and also enhances the isolation effect on the light-emitting functional layer.

[0123] For example, referring to Figure 8 , the isolation structure 500 in at least one groove 210 can include two sub-isolation structures 501, thereby dividing the groove 210 into three sub-grooves. For example, the three sub-grooves can be formed by etching, thereby forming two sub-isolation structures arranged in the groove. However, the present disclosure is not limited thereto, and the isolation structure can also include more than three isolation structures.

[0124] For example, referring to Figure 8 , each sub-isolation structure 501 includes a sub-first isolation portion 5101 and a sub-second isolation portion 5202, and the edge of the sub-second isolation portion 5202 protrudes relative to the sub-first isolation portion 5101 to form a protruding portion. Thus, in the case where the isolation structure 500 includes multiple sub-isolation structures 501, the number of positions that can isolate the light-emitting functional layer can be increased by using the protruding portion of each sub-second isolation portion 5202 to lengthen the crosstalk path and enhance the isolation effect.

[0125] For example, only one groove can be provided with an isolation structure including multiple sub-isolation structures as shown in Figure 8 . For example, multiple grooves can be provided with an isolation structure including multiple sub-isolation structures as shown in Figure 8 . For example, all grooves can be provided with an isolation structure including multiple sub-isolation structures as shown in Figure 8 .

[0126] Figure 9 and Figure 10 are cross-sectional schematic views of display substrates provided for different examples in at least one embodiment of the present disclosure.

[0127] Figure 9 The display substrate shown is different from the display substrate shown in Figure 10 in that Figure 9 the number of second openings of the display substrate shown is different from the number of second openings of the display substrate shown in Figure 10 . However, the present disclosure is not limited thereto, Figure 9 the display substrate shown can also differ from the display substrate shown in Figure 10 in that Figure 9 the shape of the second openings is different from the shape of the second openings shown in Figure 10 .

[0128] refer to Figure 9 In conjunction with the foregoing example, the opening of the isolation layer 02 is located within the recess opening 201 of the recess 210, and the isolation structure 500 is located between the openings of two isolation layers 02 that are adjacent to each other along the arrangement direction of adjacent sub-pixels 100. For example, the number of second openings 302 is the same as the number of recess openings 201 of the recess 210. For example, the shape of the second opening 302 is rectangular, just like the shape of the recess opening 201. For example, multiple second openings 302 correspond one-to-one with multiple recess openings 201 of multiple recesses 210. For example, with two adjacent sub-pixels 100 as a group, in each group of sub-pixels, a second opening 302 formed by the pixel defining portion 310 is included between the two sub-pixels 100, and the second openings 302 in different sub-pixel groups may not be connected. Thus, the recess opening 201 can be provided in a one-to-one correspondence with the second opening 302.

[0129] refer to Figure 10 In some examples, the number of second openings 302 differs from the number of recess openings 201 in the recess 210. For instance, with adjacent sub-pixels 100 grouped together, in each sub-pixel group, a second opening 302 formed by the pixel defining portion 310 surrounds the two sub-pixels 100, and the second openings 302 in different sub-pixel groups can communicate with each other. Figure 10 As shown, the groove opening 201 is rectangular in shape, while the second openings 302 in different sub-pixel groups are irregularly shaped because they can be interconnected. Therefore, the number of groove openings 201 can differ from the number of second openings 302, in order to extend the crosstalk path between adjacent sub-pixels 100.

[0130] refer to Figure 10 For example, in different sub-pixel groups, only a portion of the second openings 302 in the sub-pixel groups may be interconnected. However, this disclosure is not limited to this; for example, the second openings in all sub-pixel groups may be interconnected.

[0131] For example, Figure 9 and Figure 10 This illustration merely shows that the arrangement of subpixels can be a real subpixel (Real RGB) arrangement. However, this disclosure is not limited thereto; embodiments of this disclosure may include... Figures 2 to 4 , Figures 6 to 8 The cross-sectional view shown can also be matched with other sub-pixel arrangements to form a corresponding display substrate.

[0132] This disclosure also provides a display device including the aforementioned display substrate. Since the display device according to this disclosure includes the aforementioned display substrate, it also possesses corresponding beneficial technical effects, which will not be elaborated upon here.

[0133] For example, the display device can be a display device such as an organic light emitting diode display device, and any product or component having a display function such as a television, a digital camera, a mobile phone, a watch, a tablet computer, a notebook computer, a navigator, or the like including the display device, and the embodiments are not limited thereto.

[0134] The following points need to be explained:

[0135] (1) In the drawings of the embodiments of the present disclosure, only the structures related to the embodiments of the present disclosure are involved, and other structures can be referred to the general design.

[0136] (2) In the case of no conflict, the features in the same and different embodiments of the present disclosure can be combined with each other.

[0137] The above description is only exemplary embodiments of the present disclosure, and is not intended to limit the protection scope of the present disclosure, and the protection scope of the present disclosure is determined by the appended claims.

Claims

1. A display substrate, comprising: a substrate substrate; a plurality of sub-pixels on the substrate substrate, each of at least some of the sub-pixels comprising a light-emitting functional layer and a first electrode and a second electrode on both sides of the light-emitting functional layer in a direction perpendicular to the substrate substrate, the first electrode being between the light-emitting functional layer and the substrate substrate, the light-emitting functional layer comprising a plurality of film layers; an insulating layer between the first electrode and the substrate substrate; the insulating layer comprising a plurality of grooves, the grooves being at least partially between adjacent sub-pixels; a pixel defining pattern on a side of the first electrode away from the substrate substrate, the pixel defining pattern comprising a plurality of first openings and a plurality of second openings, and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, one of the sub-pixels corresponding to at least one first opening, the light-emitting functional layer of the sub-pixel being at least partially in the first opening corresponding to the sub-pixel, and the first opening being configured to expose the first electrode; wherein the display substrate further comprises an isolation layer between the first electrode and the insulating layer; the isolation layer comprising a flat portion overlapping the first electrode in a direction perpendicular to the substrate substrate, an edge of the flat portion being covered by the pixel defining portion; an isolation structure is provided in at least some of the grooves, at least part of the isolation structure being exposed by the second opening; the isolation structure comprising a first isolation portion and a second isolation portion arranged in layers, the first isolation portion being between the second isolation portion and the substrate substrate, at least part of the first isolation portion being in the groove, an edge of the second isolation portion protruding relative to an edge of the first isolation portion to form a protruding portion, the protruding portion being configured to isolate at least one of the plurality of film layers; the second isolation portion is a portion of the isolation layer exposed by the second opening. 2.The display substrate of claim 1, wherein, the first isolation portion and the insulating layer are integrally formed. 3.The display substrate of claim 1, wherein, in a direction of arrangement of adjacent sub-pixels, a projection of the isolation structure on the substrate substrate has a spacing with a projection of the pixel defining portion on the substrate substrate. 4.The display substrate of claim 1, wherein, the protruding portion is configured to isolate the second electrode. 5.The display substrate of claim 1, wherein, in a direction perpendicular to the substrate substrate, a ratio of a spacing between the flat portion and the substrate substrate to a spacing between the second isolation portion and the substrate substrate is 0.9-1.

1. 6.The display substrate of claim 1, wherein, a maximum depth of the groove is greater than a maximum dimension of the light-emitting functional layer in a direction perpendicular to the substrate substrate; the maximum depth of the groove is 0.2-0.5 microns. 7.The display substrate of claim 1, wherein, a projection of the first electrode on the substrate substrate is within a projection of the flat portion on the substrate substrate; in any direction parallel to the substrate substrate, a dimension of the flat portion is not less than a dimension of the first electrode. 8.The display substrate of claim 1, wherein, the pixel defining portion comprises a portion in the groove, and the portion is spaced apart from the first isolation portion. 9.The display substrate of any one of claims 1-8, wherein, The second opening is provided with an isolation column on a side of the isolation structure away from the substrate substrate, and the isolation column covers at least part of the second isolation portion except the protruding portion. 10.The display substrate of claim 9, wherein, The pixel defining portion includes a first side wall, and an included angle between at least part of the first side wall and a contact surface between the pixel defining portion and a bottom wall of the groove is a first slope angle; a normal projection of the first side wall on the substrate substrate overlaps a normal projection of the bottom wall of the groove on the substrate substrate; The isolation column includes a second side wall, and an included angle between at least part of the second side wall and a contact surface between the isolation column and the second isolation portion is a second slope angle; The first slope angle is greater than the second slope angle, and the first slope angle and the second slope angle are both less than 90 degrees. 11.The display substrate of claim 10, wherein, The pixel defining portion and the isolation column are configured to be formed by one patterning process. 12.The display substrate of any one of claims 1-8, wherein, Further comprising a touch structure on a side of the pixel defining pattern away from the substrate substrate; The touch structure includes a plurality of layers of touch electrodes, and a normal projection of at least one layer of the plurality of layers of touch electrodes on the substrate substrate overlaps a normal projection of a part of the isolation structure except the protruding portion on the substrate substrate. 13.The display substrate of claim 12, wherein, The second opening is provided with an isolation column on a side of the isolation structure away from the substrate substrate, and the isolation column covers at least part of the second isolation portion except the protruding portion; A normal projection of at least one of the plurality of layers of touch electrodes on the substrate substrate overlaps a normal projection of the isolation column on the substrate substrate.

14. The display substrate according to any one of claims 1-8, wherein, The isolation structure in the at least one groove includes a plurality of sub-isolation structures, and the plurality of sub-isolation structures are arranged at intervals in an arrangement direction of adjacent sub-pixels.

15. The display substrate according to any one of claims 1-8, wherein, The number of the second openings is less than the number of groove openings of the grooves.

16. The display substrate according to any one of claims 1-8, wherein, A spacing between a normal projection of the second isolation portion on the substrate substrate and a normal projection of the pixel defining portion adjacent thereto on the substrate substrate in the arrangement direction of the adjacent sub-pixels is 1-3 microns.

17. The display substrate according to any one of claims 1-8, wherein, A dimension of the protruding portion in the arrangement direction of the adjacent sub-pixels is greater than a maximum thickness of the light-emitting functional layer.

18. The display substrate according to any one of claims 1-8, wherein, A dimension of the second isolation portion in the arrangement direction of the adjacent sub-pixels is 5-7 microns.

19. A display device comprising the display substrate according to any one of claims 1-18.

Images