OPC correction method and system using OPC correction database, terminal and medium

Abstract

The invention provides an OPC correction method and system using an OPC correction database, a terminal and a medium, and the method comprises the steps: firstly segmenting each layer of each layout, extracting unit elements of each layer, and constructing a comprehensive basic graphic library; then, OPC correction is carried out on each unit element in the basic graphics library, and an OPC correction database is formed; in the face of a new layout, unit elements matched with the basic graphics library in the layout are quickly corrected by utilizing the established OPC database, and extra correction is performed on unmatched parts. According to the method, an efficient layout correction solution is provided for individual requirements of different customers, the running time is effectively shortened, and the research and development efficiency and the production stability are improved.

Description

Technical Field

[0001] The present invention relates to the semiconductor field, and in particular to an OPC correction method, system, terminal and medium using an OPC correction database. Background Art

[0002] When the chip process is small, diffraction will occur during lithography exposure, which will cause distortion of the pattern after lithography. In order to improve the resolution of lithography, it is necessary to implement optical proximity correction (OPC) on the layout. When performing OPC correction on the customer's layout, the traditional method requires OPC correction of each layer of the layout one by one, and finally integrate all the corrected layers to form a complete OPC corrected layout file. However, this method has obvious shortcomings: every time a new customer submits a layout, the OPC correction work needs to be repeated layer by layer. The layouts submitted by different customers may contain the same cell units or smaller unit elements. This means that in the layouts of different customers, the same cell units or smaller unit elements will be repeatedly corrected, resulting in waste of resources and inefficiency. Summary of the invention

[0003] In view of the shortcomings of the prior art described above, the purpose of the present invention is to provide an OPC correction method, system, terminal and medium using an OPC correction database, so as to solve the technical problems in the prior art that when facing layouts of different customers, OPC correction needs to be repeated on the unit elements of each layout, resulting in low efficiency and waste of resources.

[0004] To achieve the above-mentioned purpose and other related purposes, the present invention provides an OPC correction method using an OPC correction database, the method comprising: dividing each layer of each layout according to the layout design, extracting each unit element of each layer of each layout, and constructing a basic graphic library; performing OPC correction on each unit element in the basic graphic library, and constructing an OPC correction database; using the OPC correction database to correct the unit elements in the new layout that match the basic graphic library, and making additional corrections to the unmatched parts of the new layout.

[0005] In one embodiment of the present invention, each layer of each layout is divided according to the layout design, and each unit element of each layer of each layout is extracted, including: dividing each layer of each layout according to the IP to obtain each IP of each layer of each layout; extracting each unit element from each IP to obtain each unit element of each layer of each layout.

[0006] In an embodiment of the present invention, the types of the unit elements include: a top-level cell unit, a first-level cell sub-unit nested in the cell unit, and a second-level cell sub-unit nested in the first-level cell sub-unit.

[0007] In one embodiment of the present invention, a method for constructing a basic graphics library includes: performing deduplication processing on each unit element of each layer of each obtained layout, storing each unit element after deduplication processing in an image library, and obtaining a basic graphics library.

[0008] In one embodiment of the present invention, the use of the OPC correction database to correct the unit elements in the new layout that match the basic graphic library, and additionally correcting the unmatched parts of the new layout includes: replacing the unit elements in each layer of the new layout that match the basic graphic library with the corresponding corrected unit elements in the OPC correction database, and additionally correcting the unmatched parts in each layer.

[0009] In one embodiment of the present invention, the replacing of the unit elements matching the basic graphics library in each layer of the new layout with the corresponding corrected unit elements in the OPC correction database, and performing additional corrections on the unmatched parts in each layer includes: identifying the unit elements matching the basic graphics library in each IP divided in the current layer; replacing the unit elements matching the basic graphics library determined in each IP of the current layer with the corresponding corrected unit elements in the OPC correction database; and performing additional corrections on the unmatched unit elements and cell unit connection parts in each IP of the current layer.

[0010] In one embodiment of the present invention, the identifying of unit elements in each IP divided in the current layer that match the basic graphics library includes: calculating the shape feature similarity of each unit element of each IP in the current layer with the basic graphics library, and determining the unit elements of each IP that match the basic graphics library based on the similarity calculation results.

[0011] To achieve the above-mentioned purpose and other related purposes, the present invention provides an OPC correction system using an OPC correction database, the system comprising: a basic graphic library construction module, used to segment each layer of each layout according to the layout design, extract each unit element of each layer of each layout, and construct a basic graphic library; a correction database construction module, connected to the basic graphic library construction module, used to perform OPC correction on each unit element in the basic graphic library and construct an OPC correction database; a correction module, connected to the correction database construction module, used to use the OPC correction database to correct the unit elements in the new layout that match the basic graphic library, and to perform additional corrections on the unmatched parts in the new layout.

[0012] To achieve the above-mentioned purpose and other related purposes, the present invention provides an electronic terminal, comprising: one or more memories and one or more processors; the one or more memories are used to store computer programs; the one or more processors are connected to the memories and are used to run the computer programs to execute the OPC correction method using the OPC correction database.

[0013] To achieve the above-mentioned object and other related objects, the present invention provides a computer-readable storage medium storing a computer program, wherein the computer program is executed by one or more processors to perform the method described.

[0014] As described above, the present invention is an OPC correction method, system, terminal and medium using an OPC correction database, which has the following beneficial effects: First, the present invention extracts unit elements of each layer by segmenting each layer of each layout, and then builds a comprehensive basic graphics library. Subsequently, OPC correction is performed on each unit element in the basic graphics library to form an OPC correction database. When facing a new layout, the present invention uses the established OPC correction database to quickly correct the unit elements in the layout that match the basic graphics library, and performs additional corrections on the unmatched parts. This method provides an efficient layout correction solution for the personalized needs of different customers, effectively reducing the running time, and improving R&D efficiency and production stability. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a flowchart of an OPC correction method using an OPC correction database in one embodiment of the present invention.

[0016] Figure 2 Shown is a schematic diagram of the layout IP and unit element division in one embodiment of the present invention.

[0017] Figure 3Shown is a schematic diagram of the layout IP and unit element division in one embodiment of the present invention.

[0018] Figure 4 Shown is a schematic diagram of the secondary cell subunit division in one embodiment of the present invention.

[0019] Figure 5 It is a schematic diagram of the process of performing OPC correction on a new layout in one embodiment of the present invention.

[0020] Figure 6 It is a schematic diagram showing the structure of an OPC correction system using an OPC correction database in one embodiment of the present invention.

[0021] Figure 7 Shown is a schematic structural diagram of an electronic terminal in an embodiment of the present invention. DETAILED DESCRIPTION

[0022] The following describes the embodiments of the present invention by specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments, and the details in this specification can also be modified or changed in various ways based on different viewpoints and applications without departing from the spirit of the present invention. It should be noted that the following embodiments and features in the embodiments can be combined with each other without conflict.

[0023] It should be noted that in the following description, reference is made to the accompanying drawings, which describe several embodiments of the present invention. It should be understood that other embodiments may also be used, and that mechanical composition, structural, electrical and operational changes may be made without departing from the spirit and scope of the present invention. The following detailed description should not be considered restrictive, and the scope of the embodiments of the present invention is limited only by the claims of the published patents. The terms used herein are only for describing specific embodiments and are not intended to limit the present invention. Spatially related terms, such as "upper", "lower", "left", "right", "below", "below", "lower", "above", "upper", etc., may be used in the text to facilitate the description of the relationship between an element or feature shown in the figure and another element or feature.

[0024] Throughout the specification, when a part is said to be "connected" to another part, this includes not only the case of "direct connection" but also the case of "indirect connection" by placing other elements therebetween. In addition, when a part is said to "include" a certain constituent element, unless otherwise stated, it does not exclude other constituent elements, but means that other constituent elements may be included.

[0025] The terms first, second and third mentioned herein are used to describe various parts, components, regions, layers and / or segments, but are not limited thereto. These terms are only used to distinguish a certain part, component, region, layer or segment from other parts, components, regions, layers or segments. Therefore, the first part, component, region, layer or segment described below may refer to the second part, component, region, layer or segment within the scope of the present invention.

[0026] Furthermore, as used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, unless there is an indication to the contrary in the context. It should be further understood that the terms "comprise", "include" indicate the presence of the described features, operations, elements, components, items, kinds, and / or groups, but do not exclude the presence, occurrence or addition of one or more other features, operations, elements, components, items, kinds, and / or groups. The terms "or" and "and / or" used herein are interpreted as inclusive, or mean any one or any combination. Therefore, "A, B or C" or "A, B and / or C" means "any of the following: A; B; C; A and B; A and C; B and C; A, B and C". Exceptions to this definition will only occur when the combination of elements, functions or operations is inherently mutually exclusive in some way.

[0027] The present invention provides an OPC correction method using an OPC correction database, by first segmenting each layer of each layout, extracting the unit elements of each layer, and then building a comprehensive basic graphics library. Subsequently, OPC correction is performed on each unit element in the basic graphics library to form an OPC correction database. When facing a new layout, the present invention uses the established OPC correction database to quickly correct the unit elements in the layout that match the basic graphics library, and performs additional corrections on the unmatched parts. This method provides an efficient layout correction solution for the personalized needs of different customers, effectively reducing the running time, and improving R&D efficiency and production stability.

[0028] At the same time, in order to make the purpose, technical solution and advantages of the present invention more clear, the technical solution in the embodiment of the present invention is further described in detail through the following embodiments and in combination with the accompanying drawings. It should be understood that the specific embodiments described here are only used to explain the present invention and are not used to limit the invention.

[0029] Before further describing the present invention in detail, the nouns and terms involved in the embodiments of the present invention are explained. The nouns and terms involved in the embodiments of the present invention are applicable to the following interpretations:

[0030] <1> OPC (Optical Proximity Correction) is a technology used to improve the resolution of photolithography processes. It reduces imaging distortion by pre-compensating the photomask pattern so that the imaging on the silicon wafer meets the design specifications as closely as possible.

[0031] <2> Layout refers to the layout and composition of the various components in an integrated circuit chip, which determines the distribution and layout of the integrated circuit components on the chip, including the placement, connection and hierarchy of circuit components. Layout design not only directly affects chip performance and power consumption, but also affects the coordination and efficiency of the entire chip supply chain.

[0032] <3> A layer is a layer used to define different physical structures or material levels in the semiconductor chip manufacturing process. Each layer creates different circuit components on the silicon wafer through specific process steps, such as active areas, polysilicon gates, metal interconnect layers, etc., which together constitute the complete physical structure of the integrated circuit.

[0033] The following is a detailed description of the embodiments of the present invention with reference to the accompanying drawings so that those skilled in the art can easily implement the present invention. The present invention can be embodied in many different forms and is not limited to the embodiments described herein.

[0034] like Figure 1 A flow chart showing an OPC correction method using an OPC correction database according to an embodiment of the present invention is shown.

[0035] The method comprises:

[0036] Step S1: Divide each layer of each layout according to the layout design, extract each unit element of each layer of each layout, and build a basic graphics library.

[0037] In one embodiment, each layer of each layout is segmented according to the layout design, and each unit element of each layer of each layout is extracted, including:

[0038] Each layer of each layout is divided according to IP to obtain each IP of each layer of each layout; specifically, firstly, layouts of multiple different customers are collected according to demand, and each layer of each layout is divided according to IP according to the design of the device to obtain each IP of each layer of each layout; IP (Intellectual Property) refers to a verified, reusable integrated circuit module with specific functions in an integrated circuit, which is generated through device design. In this patent, a layout contains multiple IPs, and each IP is an independent module with unique functions. According to different uses, semiconductor IP can be divided into processor IP, interface IP, memory IP and other IPs.

[0039] Extract each unit element from each IP according to the requirements to obtain each unit element of each layer of each layout.

[0040] For example, if Figure 2 a and Figure 2 b shows the version of customer 1. Figure 1 IP11~IP1n divided by the layer layer, and the unit elements cell1, cell2 and cell3 extracted from IP11; Figure 3 a and Figure 3 b shows the version of customer 2. Figure 1 IP21~IP2n divided by layer, and the unit elements cell1, cell2, cell3, cell4 and cell5 extracted from IP21.

[0041] In a specific embodiment, the type of the unit element can be selected according to requirements, and specific types include: a top-level cell unit, a first-level cell subunit nested in a cell unit, and a second-level cell subunit nested in a first-level cell subunit.

[0042] If the unit element selected for extraction is the top-level cell unit, each IP is divided into multiple cell units for extraction; the first-level cell sub-unit is a smaller unit that constitutes the top-level cell unit. If the unit element selected for extraction is the first-level cell sub-unit, each IP is first divided into multiple cell units, and then each cell unit is divided into multiple first-level cell sub-units for extraction; the second-level cell sub-unit is a smaller unit further nested in the first-level cell sub-unit. If the unit element selected for extraction is the second-level cell sub-unit, each IP is first divided into multiple cell units, and then each cell unit is divided into multiple first-level cell sub-units, and then each first-level cell sub-unit is divided into multiple second-level cell sub-units for extraction.

[0043] In a preferred embodiment, if there is a need for high recognition accuracy, a high-level unit can be set, because a high-level unit contains more complete design information; if there is a need for easy recognition and matching as many unit elements as possible, a low-level unit can be set, because a low-level unit is smaller and easier to recognize. In order to ensure that it contains enough details to ensure high-accuracy recognition and is general enough to match multiple similar unit elements, we prefer to set the unit element type to a secondary cell subunit.

[0044] For example, if Figure 4 , IP2 can be first divided into top-level cell1, cell2, cell3, and cell4, where cell1 can be divided into first-level cell sub-units cell11 and cell12, cell2 can be divided into first-level cell sub-units cell21 and cell22, cell3 can be divided into first-level cell sub-units cell31 and cell32, and cell4 can be divided into first-level cell sub-units cell41 and cell42; wherein cell11, cell12, cell21, cell22, cell31, cell32, cell41, and cell42 also include multiple second-level cell sub-units respectively.

[0045] In one embodiment, we can build an independent basic graphic library for each collected layout, or we can build a complete basic graphic library for all collected layouts; since the extracted unit elements may be repeated, before building the basic graphic library, it is necessary to deduplicate the unit elements of each layer of each layout obtained, which can be achieved by comparing the characteristics and attributes of the unit elements, identifying and eliminating duplicate unit elements, which helps to reduce redundancy and reduce the amount of data. After deduplication, each unit element is stored in the image library to form a basic graphic library.

[0046] Step S2: Perform OPC correction on each unit element in the basic graphic library and build an OPC correction database.

[0047] In one embodiment, the OPC correction tool is used to perform corresponding OPC corrections on the characteristics of different unit elements in the basic graphic library and the photolithography process requirements to obtain the corrected unit elements corresponding to each unit element, and store them to obtain an OPC correction database. The OPC correction tool is a software tool specifically used to optimize pattern distortion in the photolithography process. It fine-tunes the pattern on the photolithography mask through the algorithm in the OPC correction tool to compensate for the pattern distortion caused by the non-ideal characteristics of the light source (such as diffraction effect).

[0048] Step S3: using the OPC correction database to correct the unit elements in the new layout that match the basic graphic library, and to make additional corrections to the unmatched parts in the new layout.

[0049] In one embodiment, step S3 includes:

[0050] Replace the unit elements in each layer of the new layout that match the basic graphic library with the corresponding corrected unit elements in the OPC correction database; and perform additional corrections on the unmatched parts in each layer.

[0051] It should be noted that the method for making additional corrections is to use the OPC correction tool to make corresponding OPC corrections for the unmatched parts in each layer.

[0052] In one embodiment, replacing the unit elements in each layer of the new layout that match the basic graphic library with the corresponding corrected unit elements in the OPC correction database, and performing additional corrections on the unmatched parts in each layer includes:

[0053] Identify the unit elements in each IP divided in the current layer that match the basic graphics library; specifically, first, divide the IP for each layer of the new layout, then call the OPC correction database, and use automated tools or algorithms in each IP to identify the unit elements that match the OPC correction database.

[0054] Replace the unit elements determined in each IP of the current layer that match the basic graphics library with the corresponding corrected unit elements in the OPC correction database; specifically, for the unit elements determined in each IP of the current layer that match the basic graphics library, replace them with the corresponding corrected unit elements in the database to complete the correction of the matching unit elements.

[0055] Perform additional corrections on the unmatched unit elements and cell unit connection parts in each IP of the current layer. Specifically, use the OPC correction tool to perform corresponding OPC corrections based on the characteristics of the unmatched unit elements and cell unit connection parts and the requirements of the lithography process.

[0056] For example, if Figure 5, divide the current layer of the new layout into IP1~IPn, and extract the cell elements for each IP, IP1 contains cell11~cell1n, IP2 contains cell21~cell2n, and so on. Then call the OPC correction database, identify the cell elements cell that match the OPC correction database in each IP, and replace the cell with the corresponding OPCEDcell in the OPC correction database, and then perform OPC correction on the remaining parts.

[0057] In one embodiment, the identifying unit elements in each IP divided in the current layer that match the basic graphics library includes:

[0058] Calculate the shape feature similarity of each unit element of each IP in the current layer with the basic graphics library, and determine the unit element that matches each IP with the basic graphics library based on the similarity calculation results;

[0059] Specifically, for each unit element of each IP in the current layer, its shape features are extracted. These features can be simple geometric parameters (such as length, width, angle) or more complex shape descriptors (such as contour point sets, Fourier descriptors, etc.). Similarly, shape features are extracted for each unit element in the basic graphics library. The unit element features of the current IP are matched with the unit element features in the basic graphics library. This can be achieved by calculating the distance or similarity between the features, such as Euclidean distance, Manhattan distance, cosine similarity, etc. A similarity threshold can also be set. If the similarity calculation result between a unit element and a corrected unit element exceeds this threshold, they are considered to be matched.

[0060] In one embodiment, the method further includes: updating the corrected unit elements obtained by performing additional corrections on the unmatched unit elements in each IP of the current layer into the OPC correction database to improve the coverage and correction accuracy of the database.

[0061] Similar to the principle of the above embodiment, the present invention provides an OPC correction system using an OPC correction database.

[0062] The following provides specific embodiments in conjunction with the accompanying drawings:

[0063] like Figure 6 A structural schematic diagram of an OPC correction system using an OPC correction database in an embodiment of the present invention is shown.

[0064] The system comprises:

[0065] The basic graphic library construction module 1 is used to segment each layer of each layout according to the layout design, extract each unit element of each layer of each layout, and construct the basic graphic library;

[0066] A correction database construction module 2 is connected to the basic graphic library construction module 1 and is used to perform OPC correction on each unit element in the basic graphic library to construct an OPC correction database;

[0067] The correction module 3 is connected to the correction database construction module 2 and is used to use the OPC correction database to correct the unit elements in the new layout that match the basic graphic library, and to make additional corrections to the unmatched parts in the new layout.

[0068] Since the implementation principle of the OPC correction system using the OPC correction database has been described in the aforementioned embodiment, it will not be repeated here.

[0069] The OPC correction method using the OPC correction database provided in the embodiment of the present invention can be implemented on the terminal side or the server side. As for the hardware structure of the electronic terminal, please refer to Figure 7 , is an optional hardware structure diagram of an electronic terminal 1000 provided in an embodiment of the present invention. The terminal 1000 may be a mobile phone, a computer device, a tablet device, a personal digital processing device, a factory background processing device, etc. The terminal 1000 includes: at least one processor 1001, a memory 1002, at least one network interface 10010 and a user interface 1009. The various components in the device are coupled together through a bus system 1005. It can be understood that the bus system 1005 is used to realize the connection and communication between these components. In addition to the data bus, the bus system 1005 also includes a power bus, a control bus and a status signal bus. However, for the sake of clarity, in Figure 7 In the specification, various buses are labeled as bus systems.

[0070] The user interface 1009 may include a display, a keyboard, a mouse, a trackball, a click gun, keys, buttons, a touch pad or a touch screen.

[0071] It is understood that the memory 1002 can be a volatile memory or a non-volatile memory, and can also include both volatile and non-volatile memories. Among them, the non-volatile memory can be a read-only memory (ROM), a programmable read-only memory (PROM), which is used as an external cache. By way of exemplary but not limiting explanation, many forms of RAM are available, such as static random access memory (SRAM), synchronous static random access memory (SSRAM). The memory described in the embodiments of the present invention is intended to include but is not limited to these and any other suitable categories of memory.

[0072] The memory 1002 in the embodiment of the present invention is used to store various types of data to support the operation of the terminal 1000. Examples of these data include: any executable program used to operate on the terminal 1000, such as an operating system 10021 and an application 10022; the operating system 10021 includes various system programs, such as a framework layer, a core library layer, a driver layer, etc., for implementing various basic services and processing hardware-based tasks. The application 10022 can include various applications, such as a media player (MediaPlayer), a browser (Browser), etc., for implementing various application services. The OPC correction method using the OPC correction database provided in the embodiment of the present invention can be included in the application 10022.

[0073] The method disclosed in the above embodiment of the present invention can be applied to the processor 1001, or implemented by the processor 1001. The processor 1001 may be an integrated circuit chip with signal processing capabilities. In the implementation process, each step of the above method can be completed by the hardware integrated logic circuit in the processor 1001 or the instruction in the form of software. The above processor 1001 may be a general processor, a digital signal processor (DSP, Digital Signal Processor), or other programmable logic devices, discrete gates or transistor logic devices, discrete hardware components, etc. The processor 1001 can implement or execute the methods, steps and logic block diagrams disclosed in the embodiment of the present invention. The processor 1001 may be a microprocessor or any conventional processor, etc. In combination with the steps of the accessory optimization method provided in the embodiment of the present invention, it can be directly embodied as a hardware decoding processor to execute, or it can be executed by a combination of hardware and software modules in the decoding processor. The software module can be located in a storage medium, which is located in a memory, and the processor reads the information in the memory and completes the steps of the above method in combination with its hardware.

[0074] In an exemplary embodiment, the terminal 1000 may be implemented by one or more application specific integrated circuits (ASIC), DSP, programmable logic device (PLD), complex programmable logic device (CPLD) to execute the aforementioned method.

[0075] Those skilled in the art can understand that all or part of the steps of implementing the above-mentioned method embodiments can be completed by hardware related to the computer program. The aforementioned computer program can be stored in a computer-readable storage medium. When the program is executed, the steps of the above-mentioned method embodiments are executed; and the aforementioned storage medium includes: ROM, RAM, magnetic disk or optical disk and other media that can store program codes.

[0076] In the embodiments provided in the present application, the computer readable and writable storage medium may include a read-only memory, a random access memory, an EEPROM, a CD-ROM or other optical disk storage device, a disk storage device or other magnetic storage device, a flash memory, a USB flash drive, a mobile hard disk, or any other medium that can be used to store a desired program code in the form of an instruction or data structure and can be accessed by a computer. In addition, any connection can be appropriately referred to as a computer-readable medium. For example, if the instruction is sent from a website, a server or other remote source using a coaxial cable, an optical fiber cable, a twisted pair, a digital subscriber line (DSL), or wireless technologies such as infrared, radio, and microwaves, the coaxial cable, optical fiber cable, twisted pair, DSL, or wireless technologies such as infrared, radio, and microwaves are included in the definition of the medium. However, it should be understood that computer readable and writable storage media and data storage media do not include connections, carriers, signals, or other temporary media, but are intended to be non-temporary, tangible storage media. Disk and disc, as used in this application, includes compact disc (CD), laser disc, optical disc, digital versatile disc (DVD), floppy disk and Blu-ray disc where disks usually reproduce data magnetically, while discs reproduce data optically with lasers.

[0077] In summary, the OPC correction method, system, terminal and medium using the OPC correction database of the present invention first divide each layer of each layout, extract the unit elements of each layer, and then build a comprehensive basic graphics library. Subsequently, OPC correction is performed on each unit element in the basic graphics library to form an OPC correction database. When facing a new layout, the present invention uses the established OPC correction database to quickly correct the unit elements in the layout that match the basic graphics library, and performs additional corrections on the unmatched parts. This method provides an efficient layout correction solution for the personalized needs of different customers, effectively reduces the running time, and improves R&D efficiency and production stability. Therefore, the present invention effectively overcomes the various shortcomings in the prior art and has a high industrial utilization value.

[0078] The above embodiments are merely illustrative of the principles and effects of the present invention, and are not intended to limit the present invention. Anyone familiar with the technology may modify or change the above embodiments without violating the spirit and scope of the present invention. Therefore, all equivalent modifications or changes made by a person of ordinary skill in the art without departing from the spirit and technical ideas disclosed by the present invention shall still be covered by the claims of the present invention.

Claims

1. An OPC correction method using an OPC correction database, characterized in that: The method comprises: Divide each layer of each layout according to the layout design, extract each unit element of each layer of each layout, and build a basic graphics library; Perform OPC correction on each unit element in the basic graphics library and build an OPC correction database; The OPC correction database is used to correct the unit elements in the new layout that match the basic graphic library, and the unmatched parts of the new layout are additionally corrected.

2. The OPC correction method using the OPC correction database according to claim 1, characterized in that: The step of dividing each layer of each layout according to the layout design and extracting each unit element of each layer of each layout includes: dividing each layer of each layout according to the IP to obtain each IP of each layer of each layout; Extract each unit element from each IP to obtain each unit element of each layer of each layout.

3. The OPC correction method using the OPC correction database according to claim 2, characterized in that: The types of the unit elements include: a top-level cell unit, a first-level cell sub-unit nested in a cell unit, and a second-level cell sub-unit nested in a first-level cell sub-unit.

4. The OPC correction method using the OPC correction database according to claim 3, characterized in that: The method of constructing the basic graphics library includes: performing deduplication processing on each unit element of each layer of each layout, storing the deduplication-processed unit elements in an image library, and obtaining the basic graphics library.

5. The OPC correction method using the OPC correction database according to claim 3, characterized in that: The method of using the OPC correction database to correct the unit elements in the new layout that match the basic graphic library and additionally correcting the unmatched parts in the new layout includes: Replace the unit elements in each layer of the new layout that match the basic graphics library with the corresponding corrected unit elements in the OPC correction database, and make additional corrections to the unmatched parts in each layer.

6. The OPC correction method using the OPC correction database according to claim 5, characterized in that: The step of replacing the unit elements in each layer of the new layout that match the basic graphic library with the corresponding corrected unit elements in the OPC correction database, and performing additional corrections on the unmatched parts in each layer includes: Identify the unit elements in each IP divided in the current layer that match the basic graphics library; Replace the unit elements that match the basic graphics library in each IP of the current layer with the corresponding corrected unit elements in the OPC correction database; Make additional corrections to the unmatched unit elements and cell unit connections in each IP of the current layer.

7. The OPC correction method using the OPC correction database according to claim 6, characterized in that: The identification of unit elements matching the basic graphics library in each IP divided in the current layer includes: The shape feature similarity of each unit element of each IP in the current layer is calculated with the basic graphics library, and the unit elements that match each IP with the basic graphics library are determined based on the similarity calculation results.

8. An OPC correction system using an OPC correction database, characterized in that: The system comprises: The basic graphics library construction module is used to segment each layer of each layout according to the layout design, extract each unit element of each layer of each layout, and build the basic graphics library; A correction database construction module is connected to the basic graphic library construction module and is used to perform OPC correction on each unit element in the basic graphic library to construct an OPC correction database; The correction module is connected to the correction database construction module and is used to use the OPC correction database to correct the unit elements in the new layout that match the basic graphic library, and to make additional corrections to the unmatched parts in the new layout.

9. An electronic terminal, characterized in that: include: one or more memories and one or more processors; The one or more memories are used to store computer programs; The one or more processors, connected to the memory, are configured to run the computer program to perform the method according to any one of claims 1 to 7.

10. A computer-readable storage medium, characterized in that: A computer program is stored, and when the computer program is executed by one or more processors, the method according to any one of claims 1 to 7 is performed.

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