Edge type passivation vacuum equipment

Abstract

The invention discloses edge type passivation vacuum equipment which comprises a cavity assembly which comprises a vacuum reaction cavity with a furnace door arranged on the side face, a rotating disc arranged in the vacuum reaction cavity and used for evenly placing a plurality of material boxes, and a waste gas channel arranged on the periphery of the rotating disc in the vacuum reaction cavity and isolated from the vacuum reaction cavity. The driving assembly drives the turntable to rotate; an air exhaust assembly; the gas assembly comprises a plurality of radial waste gas channels communicated with the waste gas channels and a layer plate structure arranged below the radial waste gas channels and used for gas inlet and gas uniformization, and waste gas holes communicated with the corresponding radial waste gas channels are formed in the layer plate structure; the gas assembly is arranged at the top of the vacuum reaction cavity, and the distance between the gas assembly and the solar cells in the material box is smaller than or equal to a preset distance; the preset distance is the distance that process gas enters the vacuum reaction cavity to react with the cutting surface of the solar cell and then directly enters the waste gas hole. According to the invention, large-batch uniform passivation coating can be realized.

Description

Technical Field

[0001] The invention relates to the technical field of solar cell processing equipment, and in particular to an edge-type passivation vacuum equipment. Background Art

[0002] With the rapid development of the photovoltaic industry, the market demand for increased power and production capacity of solar panels is growing. In order to reduce the series resistance and power loss of the module, laser splitting technology is widely used to cut the entire solar cell into two or more small pieces. This technology can effectively reduce the current load in the module and improve the conversion efficiency. However, during the laser cutting process, the cut section of the silicon wafer is prone to tiny cracks and fragments. These cutting defects become the gathering area of ​​carriers, which seriously affects the performance stability of the cell.

[0003] In order to solve these defects, the industry usually adopts the process of passivation coating on the cross section of silicon wafers. By forming a protective film on the cut section, the adverse effects of carriers can be effectively reduced and the electrical performance of the cell can be improved. However, existing passivation coating equipment has many problems:

[0004] The existing coating equipment has too low efficiency in passivation treatment of half-wafers, and cannot perform passivation coating on the cross-section evenly in large quantities. A new type of reaction chamber is needed to adapt to the process requirements of edge coating.

[0005] In existing equipment, when process gases enter the vacuum chamber, they tend to form a disturbed airflow. This irregular airflow further exacerbates the uneven distribution of gas during the coating process, affecting the passivation effect. Especially at the edge, the instability of the airflow makes it difficult to control the thickness and uniformity of the coating layer.

[0006] Existing equipment makes it difficult to ensure that the process gas can evenly cover the surface of the silicon wafer. Especially when coating large quantities of silicon wafers, the uniformity and consistency of the surface coating are poor, which directly affects the quality of the final product. Summary of the invention

[0007] In order to solve the technical problem that edge coating equipment in the prior art cannot perform large-scale passivation coating only on the cross section, the present invention proposes edge passivation vacuum equipment.

[0008] The edge-type passivation vacuum device proposed by the present invention comprises:

[0009] A chamber assembly, comprising a vacuum reaction chamber with a furnace door on the side, a turntable arranged in the vacuum reaction chamber for evenly placing a plurality of material boxes, and an exhaust duct arranged around the turntable in the vacuum reaction chamber and isolated from the vacuum reaction chamber;

[0010] A driving assembly, driving the turntable to rotate;

[0011] An exhaust component for exhausting the exhaust duct;

[0012] A gas component, comprising a plurality of radial exhaust channels connected to the exhaust channels, a layer plate structure for air intake and gas uniformity arranged below the radial exhaust channels, the layer plate structure being provided with exhaust holes connected to the corresponding radial exhaust channels; the gas component is arranged at the top of the vacuum reaction chamber, and the distance from the solar cell in the material box is less than or equal to a preset distance; the preset distance is a distance for the process gas to directly enter the exhaust hole after entering the vacuum reaction chamber and reacting with the cut surface of the solar cell.

[0013] Furthermore, the layer plate structure comprises:

[0014] At least one layer of air-distributing plate, each layer of air-distributing plate is provided with a plurality of air inlet holes and exhaust holes opened in the radial direction, and the air inlet holes and the exhaust holes are arranged alternately;

[0015] An air intake ring plate is arranged around the air uniforming plate and is provided with at least one annular air intake passage connected to the air intake assembly;

[0016] An air intake substrate, which is arranged above the air homogenizing plate and is provided with a plurality of air intake holes and exhaust holes opened in a radial direction and arranged alternately;

[0017] An air guide plate is arranged above the air intake substrate and is provided with a plurality of radially opened exhaust holes, and a side facing the air intake substrate is provided with a plurality of radially opened air guide grooves connected to the corresponding annular air intake channel, and the air guide grooves and the exhaust holes are alternately arranged.

[0018] Further, the air intake assembly comprises:

[0019] At least one intracavity air inlet pipe is arranged horizontally, one end of each intracavity air inlet pipe is connected to an annular air inlet channel in a one-to-one correspondence, and the other end is provided with a sleeve connected vertically therewith;

[0020] A movable connecting rod, comprising a connecting pipe with a closed bottom end and inserted into the sleeve, a bellows connected to the top of the connecting pipe, a pressure block arranged at the top of the bellows, an inner limit ring arranged on the outer peripheral wall of the bottom end of the connecting pipe and located inside the sleeve, an outer limit ring arranged on the outer peripheral wall of the top end of the connecting pipe and located outside the sleeve, and an air inlet arranged at the bottom end of the connecting pipe facing the annular air inlet duct;

[0021] At least one extracavity air inlet pipe, each of which is connected to the corresponding bellows.

[0022] Furthermore, a heating component is also included; the heating component includes:

[0023] A bottom surface heater assembly, comprising a mounting plate fixedly connected to the bottom surface of the vacuum reaction chamber below the turntable, and a plurality of heaters evenly distributed on the mounting plate; a gap is provided between the turntable and the bottom surface heater;

[0024] A side heater assembly fixed on the inner wall of the vacuum reaction chamber;

[0025] A top surface heater assembly is in contact with the top surface of the gas assembly to achieve heat conduction effect on the process gas.

[0026] Further, the bottom center of the vacuum reaction chamber is recessed downward to form a mounting groove; the driving assembly includes:

[0027] Motor components;

[0028] A shaft sleeve, the bottom end of which is fixedly connected to the inner bottom surface of the mounting groove, and the top end of which is fixedly connected to the mounting plate;

[0029] A connecting shaft, which passes through the sleeve, has a top end connected to the turntable, and a bottom end connected to the output end of the motor through the coupling, and a supporting ring is provided in the middle of the connecting shaft located in the sleeve;

[0030] Two tapered roller bearings are installed back to back on the upper and lower sides of the support ring;

[0031] A magnetic fluid transmission component, comprising a magnetic fluid rotating shaft connected to the connecting shaft and rotating coaxially, a sleeve sleeved on the magnetic fluid rotating shaft and fixedly connected to the outer bottom surface of the mounting groove, and a magnetic fluid bearing connected between the magnetic fluid rotating shaft and the sleeve;

[0032] A coupling, connecting the magnetic fluid transmission component and the motor assembly;

[0033] The support sleeve connects the motor assembly and the outer bottom surface of the mounting sleeve, and encapsulates the magnetic fluid transmission component and the coupling therein.

[0034] Furthermore, a detection device for detecting the rotation angle of the magnetic fluid rotating shaft of the magnetic fluid transmission component is installed on the magnetic fluid transmission component.

[0035] Furthermore, the vacuum reaction chamber includes a chamber seat and a sealing cover, and a top cover mechanism is arranged above the chamber seat. The top cover mechanism includes a top cover and at least two lifters for driving the top cover to rise and fall.

[0036] Furthermore, an annular sealing groove is provided on the upper surface of the upper flange connecting the cavity seat and the top cover, and a sealing ring is provided in the annular sealing groove.

[0037] Furthermore, a square wave cooling pipeline is provided on the outer wall of the cavity assembly.

[0038] Furthermore, an upper flange cooling pipeline is provided at a position in the upper flange directly opposite to the annular sealing groove.

[0039] The present invention arranges an air intake assembly above the vacuum reaction chamber and simultaneously extracts the waste gas, so that the process gas reacts with the cut surfaces of multiple solar cell sheets tightly arranged in the material box and then is quickly extracted without disturbing the normal airflow in the reaction area, thereby achieving uniform coating in large quantities. The present invention can meet the process capacity of multiple silicon wafer carriers, and the rotating speed of the turntable can be adjusted to plate different film thicknesses in the same time, and the waste gas generated after the reaction can be sucked back in time without dissipating; and the present invention adopts a fully covered heating system, and the space around the cavity can be evenly heated; the present invention adopts a liftable top cover, and the cylinder structure can be used to lift the top cover for maintenance. BRIEF DESCRIPTION OF THE DRAWINGS

[0040] The present invention is described in detail below with reference to the embodiments and accompanying drawings, wherein:

[0041] Figure 1 It is a three-dimensional schematic diagram of an embodiment of the present invention.

[0042] Figure 2 It is a cross-sectional view of the main structure of an embodiment of the present invention.

[0043] Figure 3 FIG. 1 is a top view of a chamber seat of a vacuum reaction chamber according to an embodiment of the present invention.

[0044] Figure 4 It is a schematic diagram of the overall structure of a gas component according to an embodiment of the present invention.

[0045] Figure 5 It is a partially enlarged schematic diagram of an air homogenizing plate according to an embodiment of the present invention.

[0046] Figure 6 FIG. 4 is an exploded view of a gas component according to an embodiment of the present invention.

[0047] Figure 7 Schematic diagram of a cross-section of a gas component according to an embodiment of the present invention.

[0048] Figure 8 It is a schematic structural diagram of an air intake assembly according to an embodiment of the present invention.

[0049] Fig. 9 It is a schematic diagram of the partial structure of a heating component according to an embodiment of the present invention.

[0050] Fig.10 It is a schematic diagram of the position of the top surface component of an embodiment of the present invention.

[0051] Fig.11 It is a partial enlarged schematic diagram of an upper flange of an embodiment of the present invention.

[0052] Fig.12 Schematic diagram of the structure of a square wave cooling pipeline according to an embodiment of the present invention.

[0053] Description of reference numerals:

[0054] 10. Cavity assembly; 20. Drive assembly; 40. Gas assembly; 50. Frame; 60. Air intake assembly;

[0055] 101, vacuum reaction chamber; 102, exhaust duct; 103, furnace door; 104, turntable; 105, furnace door mechanism; 106, mounting groove; 107, top cover; 108, lifter; 109, upper flange; 110, annular sealing groove; 111, square wave cooling pipeline; 112 upper flange cooling pipeline;

[0056] 201, motor assembly; 202, bushing; 203, connecting shaft; 204, tapered roller bearing; 205, magnetofluid transmission element; 206, coupling; 207, support sleeve; 208, light shielding sheet;

[0057] 401, radial exhaust duct; 402, exhaust hole; 403, air inlet hole; 404, air uniforming plate; 405, air inlet ring plate; 406, air inlet base plate; 407, air flow guide plate; 408, exhaust cover plate; 409, exhaust partition rib; 410, annular air inlet duct; 411, air guide groove;

[0058] 501, bottom heater assembly; 502, side heater assembly; 503, top heater assembly; 504, wiring flange;

[0059] 601, air inlet pipe inside the cavity; 602, sleeve; 603, connecting pipe; 604, bellows; 605, pressing block; 606, air inlet pipe outside the cavity; 607, inner limit ring; 608, outer limit ring. DETAILED DESCRIPTION

[0060] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present invention more clearly understood, the present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the present invention.

[0061] Thus, a feature indicated in this specification will be used to illustrate one of the features of an embodiment of the present invention, rather than implying that each embodiment of the present invention must have the described feature. In addition, it should be noted that this specification describes many features. Although some features can be combined together to illustrate possible system designs, these features can also be used in other combinations that are not explicitly described. Thus, unless otherwise stated, the described combinations are not intended to be limiting.

[0062] The edge-type passivation vacuum equipment proposed in the present invention includes a cavity assembly 10 , a driving assembly 20 , a vacuum assembly and a gas assembly 40 .

[0063] The chamber assembly 10 includes a vacuum reaction chamber 101 , an exhaust duct 102 , a furnace door 103 and a turntable 104 . Figure 1 The chamber assembly 10 of one embodiment of the present invention is shown, and the chamber assembly 10 is placed on a rack 50. The vacuum reaction chamber 101 is cylindrical in shape, with upper and lower flanges welded, the lower flange ensures the chamber is level, the upper flange is provided with a sealing ring and a cooling water channel to ensure sealing, and a furnace door is provided in the front opening of the vacuum reaction chamber 101 for placing / taking out a silicon wafer material box (carrier).

[0064] The furnace door 103 is disposed on the side of the vacuum reaction chamber 101 , and is driven to open or close by a furnace door mechanism 105 disposed on the frame 50 .

[0065] like Figure 2 As shown, the turntable 104 is arranged at the center of the vacuum reaction chamber 101 and close to the inner bottom surface of the vacuum reaction chamber 101. Along the circumferential direction of the turntable 104, a plurality of material boxes can be evenly placed, and a plurality of cut solar cells are placed in each material box. These solar cells are squeezed in a direction parallel to the tangent of the turntable 104 so that the cut surfaces of all solar cells in one material box can form an integral surface, and the gaps between adjacent solar cells are eliminated as much as possible. The integral surface formed by the cut surfaces of the solar cells faces the top surface of the vacuum reaction chamber 101, that is, towards the direction of the top cover of the vacuum reaction chamber 101.

[0066] The exhaust duct 102 is arranged around the turntable 104 and is isolated from the vacuum reaction chamber 101. That is, without the communication function of the gas assembly 40, the space of the vacuum reaction chamber 101 where the turntable 104 is located is not connected to the exhaust duct 102. The furnace door 103 needs to be fed, so the exhaust duct 102 is not arranged at the furnace door 103. Figure 3 FIG. 1 is a top view of a vacuum reaction chamber 101 according to an embodiment of the present invention. It can be seen that a pipe-type sheet metal part 106 is provided at the bottom of the exhaust channel 102 for connecting an exhaust component.

[0067] The driving assembly 20 is connected to the lower bottom surface of the turntable 104 from the bottom of the vacuum reaction chamber 101 to drive the turntable 104 to rotate.

[0068] The exhaust assembly is used to exhaust air from the exhaust passage 102 .

[0069] like Figure 4 As shown, the gas assembly 40 includes a radial exhaust channel 401 located at the topmost layer and a layer plate structure located below the radial exhaust channel 401 .

[0070] The radial exhaust passage 401 is connected to the exhaust passage 102 .

[0071] The layer plate structure is arranged below the exhaust channel for air intake and uniform gas flow. The layer plate structure is provided with exhaust holes 402 communicating with the corresponding radial exhaust channels. The exhaust holes 402 communicate with the radial exhaust channels 402 and the vacuum reaction chamber 101 . Figure 5 It is shown that three types of gas inlet holes 403 are provided on the layer plate structure, and the three types of gas inlet holes are respectively used to transport different process gases to the vacuum reaction chamber.

[0072] The gas assembly 40 is arranged at the top of the vacuum reaction chamber 101, and the distance between the gas assembly 40 and the cut surface of the solar cell in the material box is less than or equal to the preset distance; the preset distance is the distance at which the process gas can directly enter the exhaust hole 402 after entering the vacuum reaction chamber 101 and contacting the cut surface of the solar cell. In practice, the preset distance can be 2-15mm according to the specific situation. After the process gas is ejected from the gas assembly, it is sucked out of the vacuum reaction chamber by the exhaust duct around the vacuum reaction chamber, and will not affect the subsequent gas flow.

[0073] The present invention uses multiple material boxes evenly placed on the turntable 104, and multiple solar cells are placed in each material box. The cut surfaces of these solar cells are all placed upward, and the solar cells in a material box are closely arranged with each other, so that their cut surfaces form a larger cut surface that is almost the same size as the opening size of the upper surface of the material box. By releasing the process gas at the top, and then reacting with the cut surface, it is quickly drawn away at the top surface, thereby avoiding the process gas from causing air flow turbulence to the vacuum reaction chamber 101, so that the present invention can achieve large-scale uniform cross-section passivation coating, improve production capacity and efficiency, and effectively avoid other factors that affect product quality.

[0074] In one embodiment, the layer plate structure includes at least one layer of air-distributing plate 404, an air-intake ring plate 405 arranged around one or more layers of air-distributing plate 404, an air-intake base plate 406 arranged above the air-distributing plate 404, the upper surface of the air-intake ring plate 405 is in close contact with the lower surface of the air-intake base plate 406, and an air flow guide plate 407 arranged above the air-intake base plate 406. Figure 6As shown, the layer plate structure of this specific embodiment is provided with two layers of uniform air plates 404 (the bottom layer can be called a spray plate), an air intake ring plate 405 arranged around the uniform air plates 404, an air intake base plate 406, and an air flow guide plate 407. The air flow guide plate 407, the exhaust gas cover plate 408, and the exhaust gas partition ribs 409 form a radial exhaust gas channel 401.

[0075] like Figure 7 As shown, a gap is provided between the two layers of air uniforming plates 404 , a groove is provided on the side of the air intake substrate 406 facing the air uniforming plate 404 , the groove forms a gap between the air intake substrate 406 and the air uniforming plate 404 , and an air guide groove 411 is provided on the side of the air guide plate 407 facing the air intake substrate 406 .

[0076] The gas homogenizing plate 404 may be provided with one layer, two layers, or more than two layers to homogenize the process gas. Each layer of the gas homogenizing plate 404 is provided with a plurality of radially-opened inlet holes 403 and exhaust holes 402, and the inlet holes 403 and the exhaust holes 402 are alternately arranged. For example, both sides of one or more inlet holes 403 in a radial direction are provided with exhaust holes 402 arranged in the radial direction.

[0077] The air inlet ring plate 405 is arranged around the air uniforming plate 404, and is provided with at least one circle of annular air inlet channels 410 connected to the air inlet assembly 60. The number of annular air inlet channels 410 is related to the type of process gas required. For example, when three types of process gases are required, three annular air inlet channels 410 are provided. Each annular air inlet channel 410 can be connected to a corresponding air inlet assembly 60. Through the air inlet assembly 60, the process gas is introduced from the outside into the cut surface of the solar cell in the equipment.

[0078] The air intake substrate 406 is arranged above the air homogenizing plate 404. When the air homogenizing plate 404 has a multi-layer structure, it is arranged at the top of the multi-layer structure of the air homogenizing plate 404. The air intake substrate 406 is provided with a plurality of air intake holes 403 and exhaust holes 402 which are alternately arranged along the radial direction. The air intake holes 403 of the air intake substrate 406 are communicated with the air intake holes 403 at the corresponding positions of the air homogenizing plate 404, and the exhaust holes 402 of the air intake substrate 406 are communicated with the exhaust holes 402 at the corresponding positions of the air homogenizing plate 404.

[0079] The air guide plate 407 is arranged above the air intake substrate 406, and is provided with a plurality of radially opened exhaust holes 402, and a side facing the air intake substrate 406 is provided with a plurality of radially opened air guide grooves 411 connected to the corresponding annular air intake channel 410, and the air guide grooves 411 and the exhaust holes 402 are alternately arranged.

[0080] The process gas passes through the corresponding air intake assembly 60 and enters the corresponding annular air intake duct 410, flows into the corresponding multiple radially arranged air guide grooves 411 in the annular air intake duct 410, and then passes through the air intake hole 403 of the air intake substrate 406 in the air guide groove 411, and then passes through the air intake hole 403 of one or more layers of the air uniforming plate 404, and finally reaches the vacuum reaction chamber 101, approaches the cut surface of the solar cell, and after reacting with the cut surface, quickly enters the exhaust hole 402 of the air uniforming plate 404, passes through the exhaust hole 402 of the air intake substrate 406 and the exhaust hole 402 of the air guide plate 407, comes to the radial exhaust duct 401, and then comes to the exhaust duct 102, and then is recycled.

[0081] Through this arrangement, the present invention can ensure that after the process gas reacts with the cut surface of the solar cell, the exhaust gas will not be turbulent and affect the flow direction of subsequent gases in the vacuum reaction chamber 101.

[0082] In one embodiment, the air intake assembly 60 includes an intracavitary air intake pipe 601 , a movable connecting rod, and an extracavitary air intake pipe 606 .

[0083] The number of the intracavity air inlet pipes 601 is the same as the number of the annular air inlet channels 410, and there are one or more. The intracavity air inlet pipes 601 are arranged horizontally, and one end of each intracavity air inlet pipe 601 is connected to one annular air inlet channel 410 in a one-to-one correspondence, and the other end is provided with a sleeve 602 connected vertically thereto.

[0084] The movable connecting rod comprises a connecting pipe 603 , a bellows 604 and a pressing block 605 from bottom to top.

[0085] The bottom end of the connecting tube 603 is closed and inserted into the sleeve 602 , and the air inlet is arranged on the side of the bottom end of the connecting tube 603 facing the annular air inlet channel 410 , and the air inlet direction is that the connecting tube 603 inlets air toward the air inlet pipe 601 in the cavity.

[0086] The bellows 604 is connected to the top of the connecting tube 603, the pressing block 605 is arranged at the top of the bellows 604, an inner limiting ring 607 is arranged on the outer peripheral wall of the bottom end of the connecting tube 603 and is located inside the sleeve 602, and an outer limiting ring is arranged on the outer peripheral wall of the top end of the connecting tube 603 and is located outside the sleeve 602. The bellows 604 has a certain elasticity, and when the corresponding component of the vacuum reaction chamber 101 presses the pressing block 605 downward, the bellows 604 will shrink and squeeze the connecting tube 603 downward, so that the connecting tube 603 enters the sleeve 602 and reaches the limiting position of the outer limiting ring, and is connected with the air inlet pipe 601 in the chamber. When the corresponding component releases the pressure block 605, the bellows 604 recovers, driving the connecting tube 603 to move upward to the limit position of the inner limit ring 607, so that the air inlet on the connecting tube 603 is blocked by the inner wall of the sleeve 602, thereby disconnecting the connecting tube 603 from the air inlet pipe 601 in the cavity.

[0087] The extra-cavity air inlet pipe 606 is arranged in one-to-one correspondence with the intra-cavity air inlet pipe 601 , and the extra-cavity air inlet pipe 606 is connected to the corresponding bellows 604 .

[0088] Figure 8 The specific structure of a process gas intake structure of the intake assembly 60 is shown. The intake assembly of the present invention can cooperate with other components to control the intake assembly to disconnect or form a passage. In this embodiment, those skilled in the art can select a button to cooperate with the intake assembly, or some components of the vacuum reaction chamber that can move up and down to cooperate with the intake assembly.

[0089] In one embodiment, the edge passivation vacuum equipment of the present invention includes a chamber assembly 10 , a driving assembly 20 , a vacuum assembly 3 , a gas assembly 40 and a heating assembly 50 .

[0090] The cavity assembly 10, the driving assembly 20, the vacuum assembly 3 and the gas assembly 40 are the same as those in other embodiments, and the heating assembly 50 is described in detail below.

[0091] like Fig. 9 , Fig.10 As shown, the heating assembly includes a bottom heater assembly 501 , a side heater assembly 502 and a top heater assembly 503 .

[0092] The bottom surface heater assembly 501 includes a mounting plate fixedly connected to the bottom surface of the vacuum reaction chamber 101 below the turntable 104, and a plurality of heaters evenly distributed on the mounting plate; a gap is provided between the turntable 104 and the bottom surface heater;

[0093] The side heater assembly 502 is fixed on the inner wall of the vacuum reaction chamber 101;

[0094] Both the bottom heater and the side heater heat the vacuum reaction chamber 101 by thermal radiation.

[0095] The top surface heater assembly 503 contacts the top surface of the gas assembly 40 to achieve heat conduction to the process gas. The heating effect of heat conduction is higher than the heat conduction efficiency of heat radiation, which is more conducive to the process temperature requirement in the vacuum reaction chamber 101.

[0096] The corresponding connection terminals are welded to the connection flange 504 of the heating assembly, so that the vacuum sealing environment of the vacuum reaction chamber 101 is not affected by the connection.

[0097] In one embodiment, the center of the bottom of the vacuum reaction chamber 101 is recessed downward to form a mounting groove 106 .

[0098] The driving assembly 20 includes: a motor assembly 201 , a shaft sleeve 202 , a connecting shaft 203 , a tapered roller bearing 204 , a magnetic fluid transmission component 205 , a coupling 206 and a support sleeve 207 .

[0099] The bottom end of the sleeve 202 is fixedly connected to the inner bottom surface of the mounting groove 106, and the top end is fixedly connected to the mounting plate; the sleeve 202 shares most of the pressure of the connecting shaft 203, and at the same time, it also plays a sealing role for the movable connection between the connecting shaft 203 and the vacuum reaction chamber 101.

[0100] The connecting shaft 203 passes through the shaft sleeve 202 , the top end is connected to the rotating disk 104 , and the bottom end is connected to the output end of the motor through the coupling 206 . A supporting ring is provided in the middle of the connecting shaft 203 located in the shaft sleeve 202 .

[0101] Two tapered roller bearings 204 are installed back-to-back on the upper and lower sides of the support ring. The two tapered roller bearings 204 installed back-to-back can withstand axial and radial forces to ensure the stability of the horizontal rotation of the turntable 104. When the turntable is loaded with only half or less loads, the turntable will be subjected to an overturning moment due to uneven force. The two tapered roller bearings 204 installed back-to-back ensure the parallelism of the turntable relative to the spray head during the entire process, that is, to ensure uniform contact with the spray gas during rotation.

[0102] The magnetic fluid transmission member 205 includes a magnetic fluid rotating shaft connected to the connecting shaft 203 and coaxially rotating, a sleeve sleeved on the magnetic fluid rotating shaft and fixedly connected to the outer bottom surface of the mounting groove 106, and a magnetic fluid bearing connected between the magnetic fluid rotating shaft and the sleeve;

[0103] The coupling 206 connects the magnetic fluid transmission component 205 and the motor assembly 201;

[0104] The support sleeve 207 connects the motor assembly 201 and the outer bottom surface of the mounting sleeve, and encapsulates the magnetic fluid transmission component 205 and the coupling 206 therein.

[0105] A magnetic fluid-coupling structure is used between the shaft system and the motor to ensure the sealing performance of the cavity when the motor transmits torque. The present invention can ensure the sealing performance of the vacuum reaction 101 when the motor transmits torque through the above components.

[0106] In a further embodiment, a detection device for detecting the rotation angle of the magnetic fluid rotating shaft of the magnetic fluid transmission member 205 is installed on the magnetic fluid transmission member 205. The type of the detection device and the specific installation position can be set by technicians in this field as needed. In a specific embodiment, the present invention uses a light shielding baffle 208 and a photoelectric sensor for detection. A photoelectric sensor is set between the coupling and the magnetic fluid to locate the initial position and the placement / removal position of the silicon wafer carrier.

[0107] In one embodiment, the vacuum reaction chamber of the present invention includes a chamber seat and a top cover mechanism in which a sealing cover is arranged above the chamber seat. The top cover mechanism includes a top cover 107 and at least two lifters 108 for driving the top cover to rise and fall. The entire top cover 107 can be opened for easy maintenance, and can be used to open the top cover to clean the interior and gas components during maintenance.

[0108] Air is taken in from the top side wall of the vacuum reaction chamber, and a pressure block is installed on the top cover to tighten the air for gas transmission. By changing the height of the jet assembly hoisting studs (adding or reducing gaskets), the height of the jet assembly is changed, and the use of bellows for gas transmission can adapt and adjust the relative height between the jet assembly and the coating surface of the silicon wafer.

[0109] like Fig.11 As shown, in one embodiment, an annular sealing groove 110 is provided on the upper surface of the upper flange 109 connecting the chamber seat and the top cover 107, and a sealing ring is provided in the annular sealing groove to ensure that the vacuum sealing performance of the vacuum reaction chamber meets the standard.

[0110] like Fig.12 As shown, in one embodiment, a square wave cooling pipeline 111 is provided on the outer wall of the cavity assembly. The cooling pipeline is evenly arranged outside the cavity, which is conducive to preventing the cavity assembly from being deformed due to heating by the heater. There can be multiple cooling pipelines, for example, a cooling pipeline is provided on the cavity top cover to ensure that the top cover will not be deformed by temperature rise; a cooling pipeline is provided at the upper flange to ensure that the temperature of the top cover sealing ring is appropriate and will not melt due to heat; a cooling pipeline is provided on the side wall of the cavity to ensure that the cavity body will not be deformed by heat; a cooling pipeline is provided at the bottom of the cavity to ensure that the bottom flange will not be deformed by heat.

[0111] In one embodiment, an upper flange cooling pipeline 112 is provided at the position of the annular sealing groove in the upper flange 109. The sealing ring can be cooled by part of the cooling pipeline to extend the service life of the sealing ring.

[0112] The present invention adopts the form of a magnetic fluid linkage turntable, on which 6 material boxes are placed. When the turntable is rotated, each material box can evenly contact the process gas ejected by the jet assembly; the heaters of the side heater assembly of the present invention are evenly distributed on the inner side of the cavity wall, so that the solar cell sheets in the material box are heated evenly; and the top heater assembly is attached to the upper surface of the spray head, located in the middle position between the top cover and the spray head, and the heating efficiency is improved by utilizing the characteristic that the thermal conduction efficiency is much higher than that of thermal radiation in a vacuum environment.

[0113] By adopting the above technical solution of the present invention, the vacuum sealing performance of the cavity can meet the standard, with the bottom pressure less than 1Pa and the leakage rate less than 1×10^-9Pa·m^3 / s;

[0114] The heating component can keep the temperature in the cavity within the range of 120℃~150℃;

[0115] The turntable speed under vacuum can be within the range of 1r / min to 5r / min;

[0116] The exhaust gas trough can effectively guide the gas so that the exhaust gas after the process will not be turbulent and affect the subsequent gas flow direction.

[0117] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. An edge-type passivation vacuum device, characterized in that: include: A chamber assembly, comprising a vacuum reaction chamber with a furnace door on the side, a turntable arranged in the vacuum reaction chamber for evenly placing a plurality of material boxes, and an exhaust duct arranged around the turntable in the vacuum reaction chamber and isolated from the vacuum reaction chamber; A driving assembly, driving the turntable to rotate; An exhaust component for exhausting the exhaust duct; A gas component, comprising a plurality of radial exhaust channels connected to the exhaust channels, a layer plate structure for air intake and gas uniformity arranged below the radial exhaust channels, the layer plate structure being provided with exhaust holes connected to the corresponding radial exhaust channels; the gas component is arranged at the top of the vacuum reaction chamber, and the distance from the solar cell in the material box is less than or equal to a preset distance; the preset distance is a distance for the process gas to directly enter the exhaust hole after entering the vacuum reaction chamber and reacting with the cut surface of the solar cell.

2. The edge passivation vacuum device according to claim 1, characterized in that: The layer plate structure comprises: At least one layer of air-distributing plate, each layer of air-distributing plate is provided with a plurality of air inlet holes and exhaust holes opened in the radial direction, and the air inlet holes and the exhaust holes are arranged alternately; An air intake ring plate is arranged around the air uniforming plate and is provided with at least one annular air intake passage connected to the air intake assembly; An air intake substrate, which is arranged above the air homogenizing plate and is provided with a plurality of air intake holes and exhaust holes opened in a radial direction and arranged alternately; An air guide plate is arranged above the air intake substrate and is provided with a plurality of radially opened exhaust holes, and a side facing the air intake substrate is provided with a plurality of radially opened air guide grooves connected to the corresponding annular air intake channel, and the air guide grooves and the exhaust holes are alternately arranged.

3. The edge passivation vacuum device according to claim 2, characterized in that: The air intake assembly comprises: At least one intracavity air inlet pipe is arranged horizontally, one end of each intracavity air inlet pipe is connected to an annular air inlet channel in a one-to-one correspondence, and the other end is provided with a sleeve connected vertically thereto; A movable connecting rod, comprising a connecting pipe with a closed bottom end and inserted into the sleeve, a bellows connected to the top of the connecting pipe, a pressure block arranged at the top of the bellows, an inner limit ring arranged on the outer peripheral wall of the bottom end of the connecting pipe and located inside the sleeve, an outer limit ring arranged on the outer peripheral wall of the top end of the connecting pipe and located outside the sleeve, and an air inlet arranged at the bottom end of the connecting pipe facing the annular air inlet duct; At least one extracavity air inlet pipe, each of which is connected to the corresponding bellows.

4. The edge passivation vacuum device according to any one of claims 1 to 3, characterized in that: Also includes a heating component; the heating component includes: A bottom surface heater assembly, comprising a mounting plate fixedly connected to the bottom surface of the vacuum reaction chamber below the turntable, and a plurality of heaters evenly distributed on the mounting plate; a gap is provided between the turntable and the bottom surface heater; A side heater assembly fixed on the inner wall of the vacuum reaction chamber; A top surface heater assembly is in contact with the top surface of the gas assembly to achieve heat conduction effect on the process gas.

5. The edge passivation vacuum device according to claim 4, characterized in that: The center of the bottom of the vacuum reaction chamber is sunken downward to form a mounting groove; the driving assembly includes: Motor components; A shaft sleeve, the bottom end of which is fixedly connected to the inner bottom surface of the mounting groove, and the top end of which is fixedly connected to the mounting plate; A connecting shaft, which passes through the shaft sleeve, has a top end connected to the turntable, and a bottom end connected to the output end of the motor through a coupling, and a supporting ring is provided in the middle of the connecting shaft located in the shaft sleeve; Two tapered roller bearings are installed back to back on the upper and lower sides of the support ring; A magnetic fluid transmission component, comprising a magnetic fluid rotating shaft connected to the connecting shaft and rotating coaxially, a sleeve sleeved on the magnetic fluid rotating shaft and fixedly connected to the outer bottom surface of the mounting groove, and a magnetic fluid bearing connected between the magnetic fluid rotating shaft and the sleeve; A coupling, connecting the magnetic fluid transmission component and the motor assembly; The support sleeve connects the motor assembly and the outer bottom surface of the mounting sleeve, and encapsulates the magnetic fluid transmission component and the coupling therein.

6. The edge passivation vacuum device according to claim 5, characterized in that: The magnetic fluid transmission component is provided with a detection device for detecting the rotation angle of the magnetic fluid rotation shaft of the magnetic fluid transmission component.

7. The edge passivation vacuum device according to any one of claims 1 to 3, characterized in that: The vacuum reaction chamber comprises a chamber seat and a sealing cover; a top cover mechanism is arranged above the chamber seat; the top cover mechanism comprises a top cover and at least two lifters for driving the top cover to rise and fall.

8. The edge passivation vacuum device according to claim 7, characterized in that: An annular sealing groove is arranged on the upper surface of the upper flange connecting the cavity seat and the top cover, and a sealing ring is arranged in the annular sealing groove.

9. The edge passivation vacuum device according to claim 8, characterized in that: A square wave cooling pipeline is arranged on the outer wall of the cavity assembly.

10. The edge passivation vacuum device according to claim 8, characterized in that: An upper flange cooling pipeline is provided at a position in the upper flange directly opposite to the annular sealing groove.

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