Multifunctional beauty phototherapy device

Abstract

The invention discloses a multifunctional beauty phototherapy device which comprises a thin film ultrasonic layer, a light-emitting assembly, a negative pressure giving layer and an electric driving device. According to the multifunctional beauty phototherapy device, in particular, the film piezoelectric material and the light-emitting assembly are integrated on the same layer, large-area phototherapy can be achieved while the ultrasonic vibration function is achieved, further, a negative pressure device is further combined, the multiple functions of cleaning skin, guiding in nutrient solution, enhancing skin qi and blood circulation and the like are integrated, and the multifunctional beauty phototherapy device is suitable for popularization and application. And the treatment effect is greatly enhanced.

Description

Technical Field

[0001] The present invention relates to the field of multifunctional phototherapy, and in particular, to a multifunctional beauty phototherapy device, which at least comprises a thin film ultrasound layer, a light-emitting component, a negative pressure imparting layer and an electric driving device. Background Art

[0002] In the mid-to-late 20th century, technologies such as low light laser treatment and photobiomodulation (PBM) appeared, both of which used light as a means of treating diseases in the medical field (Michael R. Hamblin, Ying-ying Huang, Handbook of Photomedicine, CRC Press). In recent years, many studies have shown that red light to near-infrared light can help promote the regeneration of tissues such as collagen and skin cells, and can be used in anti-wrinkle beauty, promoting wound healing, removing spots and scars, and other fields (Chan Hee Nam et al., Dermatologic Surgery, 2017, 43: 371-380; Daniel Barolet, Semin Cutan Med Surg, 2008, 27: 227-238; Yongmin Jeon, Adv. Mater. Technol. 2018, 1700391). With the rapid development of micro-light therapy and photobiomodulation technology, more and more phototherapy products have emerged, especially wearable phototherapy products, such as phototherapy masks, phototherapy hair growth caps, phototherapy shaping clothes, eye phototherapy devices, etc., which have become the ideal home beauty, body or health care products for more and more people. The light source used in phototherapy products can emit light with a peak wavelength between 400-1400nm, preferably red light and near-infrared light with a peak wavelength between 600-970nm. Light in this band has the effects of anti-wrinkle, skin regeneration, freckle removal, and even anti-inflammatory (such as styes, acne), wound healing, and scar reduction (Daniel Barolet, Semin Cutan Med Surg, 27: 227-238, 2008).

[0003] Ultrasonic devices have been used in beauty devices. For example, patent application CN117547738A mentions a beauty device comprising a light energy component and an acoustic wave component. In the application, the light emitted by the light source is emitted through a dimming component to form a light-emitting surface, but the application does not provide any teaching or inspiration on the integrated design of the light energy component and the ultrasonic device.

[0004] Existing phototherapy devices still have problems such as incomplete functions and low degree of integration. Therefore, more portable, easy-to-use and more comprehensive beauty devices still need further research and development. Summary of the invention

[0005] The present invention aims to provide a multifunctional beauty phototherapy device to at least solve some of the above problems. The multifunctional beauty phototherapy device of the present invention integrates thin film piezoelectric materials and light-emitting components on the same layer, which can realize large-area phototherapy while realizing ultrasonic vibration function. Furthermore, it is also combined with a negative pressure device, integrating multiple functions such as cleaning the skin, introducing nutrient solution, and enhancing the blood circulation of the skin, which greatly enhances the treatment effect.

[0006] According to one embodiment of the present invention, a multifunctional cosmetic phototherapy device is disclosed, comprising: a thin film ultrasound layer, a light emitting component, a negative pressure imparting layer and an electric driving device;

[0007] The light emitting assembly comprises a light source component;

[0008] The light source component comprises a point light source component or a surface light source component;

[0009] The light emitting component and the thin film ultrasonic layer share a layer, and the layer is a common layer;

[0010] The light-emitting component has at least one light-emitting surface, and the light-emitting area of ​​the light-emitting surface is not less than 5cm 2 ;

[0011] The light emitting assembly is electrically connected to the electric drive device;

[0012] At least one hole, the at least one hole passing through the light-emitting component and the thin film ultrasound layer;

[0013] The negative pressure imparting layer is arranged on a side of the thin film ultrasonic layer away from the light emitting direction of the light emitting component. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 It is a schematic diagram of the structure of a single-layer OLED device.

[0015] Figure 2 It is a schematic diagram of the structure of a stacked OLED device.

[0016] Figure 3 It is a cross-sectional schematic diagram of the flexible OLED light-emitting panel adopted by the present invention.

[0017] Figure 4a-4b It is a partial plan view of the flexible OLED light-emitting panel with holes of the present invention.

[0018] Figure 5a-5e yes Figure 4aSchematic diagram of the cross-sectional structure along the AA' cutting line.

[0019] Figure 6a It is a schematic diagram of the cross-sectional structure of the flexible OLED light-emitting panel of the present invention with a supporting substrate before punching.

[0020] Figure 6b It is a schematic diagram of the cross-sectional structure of the flexible OLED light-emitting panel of the present invention with a supporting substrate after being punched.

[0021] Figure 7a 4 is a cross-sectional schematic diagram of a multifunctional beauty phototherapy device according to a first embodiment of the present invention.

[0022] Figure 7b 4 is a cross-sectional schematic diagram of a multifunctional beauty phototherapy device according to a second embodiment of the present invention.

[0023] Figure 8 4 is a cross-sectional schematic diagram of a multifunctional beauty phototherapy device according to a third embodiment of the present invention.

[0024] Fig. 9 4 is a cross-sectional schematic diagram of a multifunctional beauty phototherapy device according to a fourth embodiment of the present invention.

[0025] Fig.10 4 is a cross-sectional schematic diagram of a multifunctional beauty phototherapy device according to a fifth embodiment of the present invention.

[0026] Fig.11a 4 is a cross-sectional schematic diagram of a multifunctional beauty phototherapy device according to a sixth embodiment of the present invention.

[0027] Fig.11b 4 is a cross-sectional schematic diagram of a multifunctional beauty phototherapy device according to a seventh embodiment of the present invention.

[0028] Fig.11c 4 is a cross-sectional schematic diagram of a multifunctional beauty phototherapy device according to an eighth embodiment of the present invention.

[0029] Figures 12a-12d It is a schematic cross-sectional view of the optical waveguide component of the present invention.

[0030] Fig.13 It is a cross-sectional schematic diagram of the thin film ultrasonic layer used in the present invention. DETAILED DESCRIPTION

[0031] The technical solution of the present invention is further described below by specific implementation methods. It should be understood by those skilled in the art that the embodiments are only to help understand the present invention and should not be regarded as specific limitations of the present invention.

[0032] The structure of a typical single-layer OLED device 100 is as follows: Figure 1As shown. The OLED device 100 includes an anode layer 101, a hole injection layer (HIL) 102, a hole transport layer (HTL) 103, an electron blocking layer (EBL) 104, an emitting layer (EML) 105, a hole blocking layer (HBL) 106, an electron transport layer (ETL) 107, an electron injection layer (EIL) 108, a cathode layer 109, and a capping layer (CPL) 110. In a bottom emission device, the anode layer 101 is a transparent or semi-transparent material, including but not limited to ITO, IZO, MoO x (molybdenum oxide), etc., whose transparency is generally greater than 50%, preferably greater than 70%; cathode layer 109 is a material with high reflectivity, including but not limited to Al, Ag, etc., with a reflectivity greater than 70%, preferably greater than 90%. In the top emission device, anode layer 101 is a material or a combination of materials with high reflectivity, including but not limited to Ag, Ti, Cr, Pt, Ni, TiN, and the above materials combined with ITO and / or MoO x (molybdenum oxide) combination, usually the reflectivity is greater than 50%; preferably, greater than 80%; more preferably, greater than 90%; and the cathode layer 109 should be a semi-transparent or transparent conductive material, including but not limited to MgAg alloy, MoO x , Yb, Ca, ITO, IZO or a combination thereof, and its transparency is generally greater than 30%; preferably, greater than 50%. The electron injection layer 108 can be a metal element such as Yb, or an organic material such as LiQ. The light-emitting layer 105 generally also includes at least one host material and at least one light-emitting material, while the electron blocking layer 104 and the hole blocking layer 106 are optional layers, and the capping layer 110 may not be required in the bottom-emitting device. The hole injection layer 102 can be a single material layer, such as the commonly used HATCN; the hole injection layer 102 can also be a hole transport material doped with a certain proportion of p-type conductive doping material, usually the doping ratio is not higher than 5%, and the commonly used range is between 1% and 3%.

[0033] The structure of a typical stacked OLED device 200 is as follows: Figure 2 As shown, it includes an anode layer 201, a first light-emitting unit 202, a charge generation layer (CGL) 203, a second light-emitting unit 204, and a cathode layer 205. The first light-emitting unit 202 and the second light-emitting unit 204 may further include several organic layers from 102 to 108 in the single-layer light-emitting device 100, and the light-emitting layers of the first light-emitting unit and the second light-emitting unit may be the same or different. The charge generation layer 203 is generally composed of an n-type material and a p-type material, and a buffer layer may also be added, as described in patent application CN112687811A. If the stacked device is a top-emitting device, a capping layer (not shown in the figure) may also be added on the cathode layer 205. Figure 2The device shown is a double-unit stacked device, and a third light-emitting unit and a second charge generation layer can be added to form a triple-unit stacked device. The preparation of single-layer and stacked OLED devices is well known in the industry and will not be described in detail here.

[0034] A flexible OLED light source can be a flexible OLED light emitting panel. A cross-sectional view of a flexible OLED light emitting panel is shown in Figure 3The flexible OLED light-emitting panel 300 includes a flexible substrate 301, an OLED device 302, a pair of contact electrodes 304 electrically connected to the OLED device 302, and a flexible encapsulation layer 303 but exposing the contact electrodes 304. The flexible substrate 301 can be an ultra-thin flexible glass, preferably a non-fragile material, including but not limited to plastic (PET, PEN, PI), textiles, leather, paper, metal foil or a combination thereof. In particular, the substrate 301 can be a material (such as PI, i.e. Polyimide, a polyimide material) that is previously coated on a supporting base plate in the form of a solution, and is used for device preparation after curing and flattening. After the device preparation is completed, it is peeled off from the supporting base plate using a laser and transferred to other flexible films as needed. A moisture barrier layer (not shown) can be additionally coated on the flexible substrate 301. The OLED device 302 can be a bottom-emitting device or a top-emitting device, preferably a top-emitting device because it has a higher luminous efficiency. The OLED device 302 may be a single-layer structure or a laminated structure. The laminated structure is preferred because it has a longer life at the same brightness and because a thicker film layer is conducive to improving the production yield. The organic material in the OLED device 302 may be formed by thermal evaporation in a vacuum chamber (vacuum evaporation method), or may be partially or completely formed using a solution method, including but not limited to ink jet printing, spin coating, organic vapor spray printing (OVJP), etc. The flexible encapsulation layer 303 may be an ultra-thin glass adhered to the device using UV curing glue. Preferably, the flexible encapsulation layer 303 is a thin film encapsulation layer, and the thickness is usually above 5 μm, such as a single-layer inorganic thin film, or a multilayer structure of alternating organic and inorganic thin films, formed by PECVD, ALD, printing, spin coating, etc. The contact electrode 304 may include at least one anode contact and one cathode contact. On this basis, a light extraction layer, a front cover film, a rear cover film, an external circuit (such as an FPC circuit board), etc. can also be added. The specific description can be found in Chinese patent application CN108644628A, which is incorporated by reference in its entirety. It is not within the scope of the present application. Such a flexible OLED light-emitting panel is a flexible OLED light source when it is electrically connected to an external electric drive (regardless of whether it is in an on or off state), and is one of the basic components of the present invention. The OLED devices in the above-mentioned flexible OLED light-emitting panel all use a common organic layer, especially a common organic light-emitting layer, that is, a non-pixelated process, and can only emit light of one color at a fixed working point. The above-mentioned flexible OLED light-emitting panel can emit at least one wavelength of light in the range of 400-2000nm, and preferably the above-mentioned flexible OLED light-emitting panel can emit at least one wavelength of light in the range of 450-1000nm.If it is used in scenarios such as facial masks and Band-Aids, it is preferred to use red light and near-infrared OLED light-emitting panels, that is, the above-mentioned flexible OLED light-emitting panel can emit at least one light with a wavelength between 600-970nm.

[0035] As used herein, "near infrared light" refers to light with a wavelength in the 700-2500nm band. In particular, in the application scenario of phototherapy, "near infrared light" can represent a portion of this band, such as 700-1400nm light. As used herein, "visible light" refers to light with a wavelength in the 400-700nm range. As used herein, "deep red light" refers to light with a wavelength in the 660-700nm range. As used herein, "red light" refers to light with a wavelength in the 600-660nm range.

[0036] As used herein, a wavelength "above" a certain wavelength refers to a wavelength greater than or equal to a certain wavelength, for example, "light above 600nm" refers to light with a wavelength ≥ 600nm. Correspondingly, a wavelength "below" a certain wavelength refers to a wavelength less than (shorter than) or equal to a certain wavelength. For example, "light below 400nm" refers to light with a wavelength ≤ 400nm.

[0037] As used herein, "organic small molecule material" refers to any organic or organometallic material that is not a polymer. As long as it has a precise structure, the molecular weight of the small molecule can be very large. Dendritic polymers with a well-defined structure can be considered small molecules. Preferably, the organic small molecule refers to an organic compound with a molecular weight of less than 10,000; more preferably, an organic compound with a molecular weight of less than 5,000; most preferably, an organic compound with a molecular weight of less than 2,000.

[0038] As used in this article, "sharing a layer" means that when the light source component is a point light source, "sharing a layer" means that the optical waveguide component and the thin film ultrasonic layer are directly integrated on the same flexible substrate to form a compact and functionally integrated design; when the light source component is a surface light source (such as a flexible OLED light-emitting panel), "sharing a layer" means that the flexible OLED light-emitting panel and the thin film ultrasonic layer are both integrated based on the same flexible substrate, or are still attached to the same flexible substrate under the separation of a functional isolation layer.

[0039] Even when there is a functional isolation layer between the thin film ultrasound layer and the light source component, when the light source component is a point light source, "sharing a layer" means that the optical waveguide component and the thin film ultrasound layer are directly integrated on the same flexible substrate to form a design with tight structure and functional integration; when the light source component is a surface light source (such as a flexible OLED light-emitting panel), "sharing a layer" means that the flexible OLED light-emitting panel and the thin film ultrasound layer are integrated based on the same flexible substrate, or are still attached to the same flexible substrate under the separation of the functional isolation layer. Even when there is a functional isolation layer between the thin film ultrasound layer and the flexible OLED light-emitting panel, "sharing a layer" can still be defined as: the thin film ultrasound layer and the flexible OLED light-emitting component share the same flexible substrate, and the physical separation and functional independence are ensured by the functional isolation layer, but the overall design is centered on the shared substrate to achieve the coordinated integration of ultrasound and light source functions. This design uses a flexible substrate as a carrier, and by optimizing the material and interlayer bonding process, it not only ensures the thinness of the structure, but also realizes the integration of ultrasound and phototherapy functions.

[0040] As used herein, "light-conducting component" refers to an optical component that conducts light emitted by a point light source or a line light source from one end of the component to the other end with a loss of no more than 50%, preferably no more than 20%, and more preferably no more than 10%. The material of the light-conducting component is selected from optical fiber, or any other component that can achieve total reflection inside the conducting channel.

[0041] As used herein, "optical waveguide component" refers to a component that converts a point light source or a line light source into a surface light source, and its loss is not higher than 90%, preferably, not higher than 70%, and more preferably, not higher than 50%. The optical waveguide component can be a composite structure, for example, comprising an optical waveguide body, a reflective layer, a scattering structure, and a combination thereof, or it can be a single-layer structure, for example, nanoparticles with scattering properties are doped into the interior of the optical waveguide body. Preferably, the optical waveguide body is a transparent film layer with a high refractive index. The refractive index of the optical waveguide body is greater than or equal to 1.4, preferably, greater than or equal to 1.45, and more preferably, greater than or equal to 1.49. The optical waveguide body is preferably made of a flexible material. The scattering structure of the optical waveguide component may contain nanoparticles, including but not limited to, SiO x, oxide particles such as Al2O3, TiO2, ZrO, ZnO, or metal particles such as Ag, Pt, Cu, Au, or organic particles such as polystyrene microspheres (PS), polymethyl methacrylate (PMMA), silicone, or a combination thereof. Preferably, the nanoparticles include oxide particles, metal particles, organic particles, or a combination thereof. The diameter of the nanoparticles should be between 10nm-1000nm, preferably between 100-1000nm, and more preferably between 100-800nm. The scattering structure of the optical waveguide component can be arranged in the form of a film layer on the side of the optical waveguide body away from the reflective layer, or can be doped at intervals inside the optical waveguide body.

[0042] As used herein, "optical coupling" refers to light exiting from one medium and arriving at / entering another medium.

[0043] As used herein, "luminous uniformity of a luminous surface" refers to the ratio of the light intensity values ​​of any two regions on the entire luminous surface. For example, if the light intensity value of a certain region of the luminous surface is A and the light intensity value of another region is B, then "luminous uniformity" refers to the ratio of A / B. The ratio of A / B is within the range of 1±0.5, preferably within the range of 1±0.3, and more preferably within the range of 1±0.1. When the ratio of A / B is equal to 1 or is closer to 1, the luminous uniformity is better.

[0044] As used herein, "down conversion layer" refers to a film layer that converts high energy light (short wavelength light, such as ultraviolet light, blue light, etc.) into low energy light (long wavelength light, such as red light, deep red light, near infrared light, etc.). The down conversion layer comprises a down conversion material, and the down conversion material includes but is not limited to fluorescent materials, perovskite materials, quantum dot materials, organic small molecule luminescent materials, graphene, etc. The preparation of the "down conversion layer" is already known to those skilled in the art and will not be repeated here.

[0045] As used herein, "encapsulation layer" refers to a film layer having water and oxygen barrier properties, preferably a thin film encapsulation layer. A physical protective film layer (hard coating) may also be provided on the surface of the encapsulation layer to prevent physical scratches and wear.

[0046] As used herein, "negative pressure wound healing (NPWT)" refers to a treatment method that uses a micropump to apply negative pressure to the wound to promote wound healing.

[0047] As used herein, "negative pressure pump component" refers to a device capable of performing negative pressure suction on a wound, including but not limited to a negative pressure pump, etc.

[0048] As used herein, "the area ratio of the holes relative to the light-emitting surface" refers to the ratio of the sum of the cross-sectional areas of the holes on the entire light-emitting surface to the area of ​​the entire light-emitting surface.

[0049] As used herein, "ultrasound" refers to ultrasonic technology, which generally generates sound waves with frequencies above the human hearing range in a device to facilitate specific applications such as cleaning, heating, introduction or material transfer.

[0050] As used herein, "thin film ultrasound layer" refers to a piezoelectric device formed by integrating piezoelectric materials on a flexible film. This structure can efficiently convert electrical energy into mechanical energy, thereby realizing the function of ultrasound. Among them, the piezoelectric device is the core component of the flexible ultrasound device, and its design directly determines the operating frequency of the device. The natural frequency of the piezoelectric device is determined by factors such as the physical properties, geometry, and thickness of the material. Therefore, by selecting different piezoelectric materials, optimizing geometric parameters, or adjusting thickness, its resonant frequency can be flexibly changed to meet a variety of application requirements.

[0051] The present invention aims to provide a multifunctional beauty phototherapy device to at least solve some of the above problems. The multifunctional beauty phototherapy device of the present invention integrates thin film piezoelectric materials and light-emitting components on the same layer, which can realize large-area phototherapy while realizing ultrasonic vibration function. Furthermore, it is also combined with a negative pressure device, integrating multiple functions such as cleaning the skin, introducing nutrient solution, and enhancing the blood circulation of the skin, which greatly enhances the treatment effect.

[0052] According to one embodiment of the present invention, a multifunctional cosmetic phototherapy device is disclosed, comprising: a thin film ultrasound layer, a light emitting component, a negative pressure imparting layer and an electric driving device;

[0053] The light emitting assembly comprises a light source component;

[0054] The light source component comprises a point light source component or a surface light source component;

[0055] The light emitting component and the thin film ultrasonic layer share a layer, and the layer is a common layer;

[0056] The light-emitting component has at least one light-emitting surface, and the light-emitting area of ​​the light-emitting surface is not less than 5cm 2 ;

[0057] The light emitting assembly is electrically connected to the electric drive device;

[0058] At least one hole, the at least one hole passing through the light-emitting component and the thin film ultrasound layer;

[0059] The negative pressure imparting layer is arranged on a side of the thin film ultrasonic layer away from the light emitting direction of the light emitting component.

[0060] According to an embodiment of the present invention, the light source component is a point light source component, and the light source component further includes an optical waveguide component.

[0061] According to an embodiment of the present invention, the optical waveguide component is planar and has at least one light emitting surface, and the common layer is a part of the optical waveguide component.

[0062] According to an embodiment of the present invention, the point light source component is arranged at an edge or both sides of the optical waveguide component.

[0063] According to an embodiment of the present invention, the optical waveguide component further comprises a reflective layer, and the reflective layer is arranged on a side of the optical waveguide component close to the thin film ultrasonic layer.

[0064] According to an embodiment of the present invention, the light source component is a surface light source component, and the surface light source component includes at least one flexible OLED light-emitting panel.

[0065] According to one embodiment of the present invention, the flexible OLED light-emitting panel has at least one light-emitting surface, and the common layer is a part of the flexible OLED light-emitting panel.

[0066] According to one embodiment of the present invention, the vibration frequency of the thin film ultrasonic layer ranges from 20 kHz to 1 MHz.

[0067] According to an embodiment of the present invention, the vibration frequency of the thin film ultrasonic layer ranges from 20 kHz to 100 kHz.

[0068] According to one embodiment of the present invention, the vibration frequency of the thin film ultrasonic layer ranges from 100 kHz to 500 kHz.

[0069] According to one embodiment of the present invention, the thin film ultrasound layer further comprises a piezoelectric device and a metal wire.

[0070] According to an embodiment of the present invention, the piezoelectric device and the metal wire are arranged on a common layer.

[0071] According to one embodiment of the present invention, the common layer is a flexible substrate or an encapsulation layer of a flexible OLED light-emitting panel.

[0072] According to an embodiment of the present invention, the encapsulation layer is a flexible film.

[0073] According to one embodiment of the present invention, the piezoelectric device is selected from piezoelectric ceramics, piezoelectric polymers or their composite materials; wherein the piezoelectric ceramics include lead zirconate titanate (PZT) and barium titanate (BaTiO3); the piezoelectric polymers include polyvinylidene fluoride (PVDF) and its copolymers, polylactic acid (PLA); the composite material includes a ceramic-polymer composite film.

[0074] According to one embodiment of the present invention, the metal wire is selected from copper, silver, gold or aluminum wire.

[0075] According to an embodiment of the present invention, the metal wire may be a gold-plated or silver-plated structure.

[0076] According to an embodiment of the present invention, the optical waveguide component comprises an optical waveguide body, and the optical waveguide component is flexible.

[0077] According to an embodiment of the present invention, the optical waveguide component has a three-dimensional structure.

[0078] According to an embodiment of the present invention, the material of the optical waveguide body includes a transparent material with a high refractive index.

[0079] According to an embodiment of the present invention, the refractive index of the transparent material is greater than or equal to 1.4.

[0080] According to an embodiment of the present invention, the refractive index of the transparent material is greater than or equal to 1.49.

[0081] According to one embodiment of the present invention, the material of the optical waveguide body includes any one of flexible glass, silicone, PET (polyethylene terephthalate), PEN (polyethylene naphthalate), PMMA (polymethyl methacrylate), and PI (polyimide).

[0082] According to an embodiment of the present invention, the optical waveguide body is an optical waveguide having a grating structure on its surface.

[0083] According to an embodiment of the present invention, a scattering structure (eg, a scattering point) is disposed inside the optical waveguide body.

[0084] According to an embodiment of the present invention, the scattering structure is arranged on one side or inside the optical waveguide body or a combination thereof.

[0085] According to an embodiment of the present invention, the scattering structure includes a scattering layer and / or scattering points.

[0086] According to an embodiment of the present invention, the scattering structure includes nanoparticles.

[0087] According to one embodiment of the present invention, the nanoparticles include oxide particles, metal particles, organic particles, or a combination thereof.

[0088] According to one embodiment of the present invention, the oxide particles include SiO x , Al2O3, TiO2, ZrO, ZnO, the metal particles include one or more of Ag, Pt, Cu, Au, the organic particles include one or more of polystyrene microspheres (PS), polymethyl methacrylate (PMMA), silica gel (Silicon).

[0089] According to an embodiment of the present invention, the diameter of the nanoparticles is between 10 nm and 1000 nm.

[0090] According to one embodiment of the present invention, the diameter of the nanoparticles is between 100-1000 nm.

[0091] According to one embodiment of the present invention, the diameter of the nanoparticles is between 100-800 nm.

[0092] According to an embodiment of the present invention, the optical waveguide component further comprises a reflective layer, and the reflective layer is arranged on a side of the optical waveguide body away from the site to be treated.

[0093] According to an embodiment of the present invention, the reflective layer is a film layer with high reflectivity.

[0094] According to an embodiment of the present invention, the reflectivity of the reflective film layer is greater than or equal to 50%.

[0095] According to an embodiment of the present invention, the reflectivity of the reflective film layer is greater than or equal to 70%.

[0096] According to an embodiment of the present invention, the reflectivity of the reflective film layer is greater than or equal to 90%.

[0097] According to an embodiment of the present invention, the reflective layer includes any one or more of a metal reflective layer, a metal oxide reflective layer, and a non-metal reflective layer.

[0098] According to an embodiment of the present invention, the metal oxide reflective layer includes a metal oxide thin film layer formed by any one or more of titanium dioxide, tin oxide, indium oxide, and zinc oxide.

[0099] According to one embodiment of the present invention, the non-metallic reflective layer includes a non-metallic film layer composed of either one or both of carbon fiber and magnesium fluoride.

[0100] According to one embodiment of the present invention, the multifunctional cosmetic light therapy device comprises a heating module.

[0101] According to an embodiment of the present invention, the heating module is integrated on the electric drive device.

[0102] According to an embodiment of the present invention, the heating module is integrated on a conductive line of the piezoelectric device.

[0103] According to an embodiment of the present invention, the heating module is integrated on the conductive wires of the flexible OLED light-emitting panel.

[0104] According to an embodiment of the present invention, the optical waveguide component further comprises a down conversion layer.

[0105] According to an embodiment of the present invention, the down conversion layer is arranged on a side of the optical waveguide body close to the part to be treated.

[0106] According to an embodiment of the present invention, the down conversion layer is arranged on a side of the optical waveguide body away from the site to be treated.

[0107] According to one embodiment of the present invention, the optical waveguide component includes, from top to bottom, stacked reflection layers, down conversion layers, an optical waveguide body and a scattering structure.

[0108] According to one embodiment of the present invention, the optical waveguide component includes, from top to bottom, stacked reflective layers, an optical waveguide body, a down-conversion layer and a scattering structure.

[0109] According to one embodiment of the present invention, the optical waveguide component includes, from top to bottom, a stacked reflection layer, an optical waveguide body, a scattering structure, a down-conversion layer and a packaging layer.

[0110] According to an embodiment of the present invention, the material of the lower conversion layer includes one or more of fluorescent materials, perovskite materials, quantum dot materials, organic small molecule light-emitting materials, and graphene.

[0111] According to an embodiment of the present invention, the peak wavelength of the light emitted by the light source component is in the range of 400-1400 nm.

[0112] According to an embodiment of the present invention, the peak wavelength of the light emitted by the light source component is in the range of 600-1400 nm.

[0113] According to one embodiment of the present invention, the light-emitting component further comprises a skin-friendly layer, and the skin-friendly layer is arranged between the light-emitting surface and the part to be treated.

[0114] According to one embodiment of the present invention, the light emitting component comprises an optical waveguide component, a down conversion layer and a skin-friendly layer which are stacked in sequence.

[0115] According to an embodiment of the present invention, the material of the skin-friendly layer includes any one of cotton, silk, linen, gauze, and medical silicone.

[0116] According to an embodiment of the present invention, the skin-friendly layer is made of transparent medical silicone.

[0117] According to an embodiment of the present invention, micro-channels can be prepared on the membrane layer of the skin-friendly layer, and holes can be left in a section for receiving nutrient solution.

[0118] According to one embodiment of the present invention, the light emitting area of ​​the light emitting surface is not less than 10 cm 2 .

[0119] According to one embodiment of the present invention, the luminous area of ​​the luminous surface is not less than 20 cm 2 .

[0120] According to an embodiment of the present invention, the light emitting uniformity of the light emitting surface is within the range of 1±0.5.

[0121] According to an embodiment of the present invention, the light emitting uniformity of the light emitting surface is within the range of 1±0.3.

[0122] According to an embodiment of the present invention, the light emitting uniformity of the light emitting surface is within the range of 1±0.1.

[0123] According to one embodiment of the present invention, the multifunctional light therapy device further comprises at least one light transmission component and at least one optical connection structure;

[0124] The light source component is connected to the light transmission component,

[0125] The light-conducting component is connected to the light-waveguide component,

[0126] The optical connection structure is arranged between the light source component and the light conducting component, and / or between the light conducting component and the optical waveguide component, and at least one optical connection structure enables the two connected components to be separable.

[0127] Herein, the expression “the optical connection structure is provided between the light source component and the light conduction component, and / or between the light conduction component and the optical waveguide component, and at least one optical connection structure makes the two connected components separable” includes at least the following situations: a first situation, the optical connection structure is provided only between the light source component and the light conduction component, and the light source component and the light conduction component are detachably separable (i.e., the light source component and the light conduction component are detachably connected via the optical connection structure); a second situation, the optical connection structure is provided only between the light conduction component and the optical waveguide component, and the light conduction component and the optical waveguide component are detachably separable (i.e., the light conduction component and the optical waveguide component are detachably connected via the optical connection structure); a third situation, the optical connection structure is provided between the light source component and the light conduction component, and is provided between the light conduction component and the optical waveguide component, and the light source component and the light conduction component are detachably separable, while the light conduction component and the optical waveguide component are detachably separable (i.e., the light source component and the light conduction component are detachably connected via the optical connection structure, while the light conduction component and the optical waveguide component are detachably connected via the optical connection structure).

[0128] According to an embodiment of the present invention, the cross-sectional shape of the channel is circular, polygonal or elliptical.

[0129] According to an embodiment of the present invention, the cross-sectional shape of the hole is circular, and the diameter of the hole is between 0.1-2 mm.

[0130] According to an embodiment of the present invention, the diameter of the hole is between 0.2-1 mm.

[0131] According to an embodiment of the present invention, the diameter of the hole is between 0.2-0.5 mm.

[0132] According to one embodiment of the present invention, the shortest distance between the centers of the channels is between 2-10 mm.

[0133] According to one embodiment of the present invention, the shortest distance between the centers of the channels is between 2-5 mm.

[0134] According to one embodiment of the present invention, the edges of the holes are sealed by melting a protective film and / or a flexible film.

[0135] According to one embodiment of the present invention, the channels are formed by a method selected from the following group: punching, dry etching, wet etching, laser etching, plasma bombardment, and combinations thereof.

[0136] According to an embodiment of the present invention, the cross-sectional area of ​​the channel accounts for 0.01%-50% of the area of ​​the light-emitting surface.

[0137] According to an embodiment of the present invention, the cross-sectional area of ​​the channel accounts for 0.1%-30% of the area of ​​the light-emitting surface.

[0138] According to an embodiment of the present invention, the cross-sectional area of ​​the channel accounts for 0.2%-10% of the area of ​​the light-emitting surface.

[0139] According to one embodiment of the present invention, the flexible film includes an inorganic film material, an organic film material or an organic-inorganic composite film; wherein the inorganic film material is selected from one or more of silicon oxide (SiO2), aluminum oxide (Al2O3), silicon nitride (Si3N4), and zinc oxide (ZnO); the organic film material is selected from one or more of polyimide (PI), polyethylene terephthalate (PET), and cycloolefin copolymer (COC); the organic-inorganic composite film is a multilayer composite structure formed by combining organic materials and inorganic materials.

[0140] According to one embodiment of the present invention, the material of the flexible film includes polyimide (PI), polydimethylsiloxane (PDMS), silicone rubber, polyethylene terephthalate (PET), thermoplastic polyurethane (TPU), ethylene-vinyl acetate copolymer (EVA), polymethyl methacrylate (PMMA), polyphenylene sulfide (PPS); the flexible film may further include a layer of transparent coating material, such as silicon oxide (SiO2) or silicon nitride (Si3N4).

[0141] According to one embodiment of the present invention, the peak wavelengths of the light emitted by the light source components differ by 50 nm or more. In some specific embodiments, the peak wavelengths of the light emitted by the light source components differ by 50 nm, 100 nm, 200 nm, 300 nm, 400 nm, 500 nm, 600 nm or 700 nm.

[0142] According to one embodiment of the present invention, the peak wavelengths of light emitted by at least one flexible OLED light-emitting panel differ by 50nm or more. In some specific embodiments, the peak wavelengths of light emitted by a flexible OLED light-emitting panel may be different, and the peak wavelengths may differ by 50nm or more. In some specific embodiments, the peak wavelengths of light emitted by at least one flexible OLED light-emitting panel differ by 50nm, 100nm, 200nm, 300nm, 400nm, 500nm, 600nm or 700nm.

[0143] According to one embodiment of the present invention, the negative pressure applying layer comprises a negative pressure pump component and a negative pressure pipeline, and the negative pressure pump component is connected to the negative pressure pipeline.

[0144] According to one embodiment of the present invention, the negative pressure pump component further includes a collecting component, and the collecting component is connected to the negative pressure pipeline.

[0145] According to one embodiment of the present invention, the negative pressure applying layer is arranged on a side of the thin film ultrasonic layer away from the light emitting component.

[0146] According to one embodiment of the present invention, it is characterized in that it further comprises a functional isolation layer, and the functional isolation layer is arranged between the thin film ultrasound layer and the light-emitting component.

[0147] According to one embodiment of the present invention, the multifunctional cosmetic light therapy device is wearable.

[0148] According to one embodiment of the present invention, the multifunctional cosmetic phototherapy device is provided with a fixing device, and the fixing device is used to detachably fix the device to a part of the human body to be treated.

[0149] In addition, by adjusting the driving circuit, for example, designing a frequency-adjustable signal generator and connecting it to the driving system of the device, a driving signal with an adjustable ultrasonic frequency can be dynamically generated, further enhancing the controllability of the ultrasonic frequency and the adaptability of the device.

[0150] It is worth noting that filling epoxy resin in piezoelectric materials can significantly improve the longitudinal penetration of ultrasound. As a filling material, epoxy resin can optimize the impedance matching of piezoelectric materials and enhance the transmission efficiency of ultrasound, thereby effectively improving its penetration depth and energy transfer capacity to the skin. This technology is particularly important for the application of ultrasound equipment in the introduction of skin care products. The choice of ultrasound frequency directly affects its effect in the field of skin care. Low-frequency ultrasound (20kHz~100kHz) has a longer wavelength and a stronger penetration depth, and can reach the dermis or even deeper. This feature makes it particularly suitable for the introduction of high molecular weight or deep active ingredients, such as hyaluronic acid or polypeptide ingredients, to promote absorption and repair of deep skin. Medium-frequency ultrasound (0.1MHz~1MHz) has a moderate wavelength and a shallow penetration depth, and its range of action is mainly concentrated in the surface or middle layer of the skin. It is suitable for the absorption and surface care of lightweight ingredients, can improve the circulation and metabolism of local skin, and is also relatively gentle for slight adjustments to the skin barrier function.

[0151] The present invention uses an optical waveguide component or an OLED light-emitting panel to provide a surface light source, and the optical waveguide component and the OLED light-emitting panel are provided with channels to ensure the circulation of gas and liquid. When combined with a negative pressure device, it can achieve the dual wound healing functions of negative pressure and phototherapy, and can achieve large-area treatment. When an optical waveguide component is used to provide a surface light source, the light source component in the present invention can be integrated on the side of the optical waveguide component, and can also be further configured into a detachable mode through a light-conducting component to achieve a disposable effect. In addition, when the light source emits blue light, the light-emitting component can also include a down-conversion layer to down-convert the blue light into red light and light with a longer wavelength, such as near-infrared light.

[0152] The present invention will be further described below in conjunction with the accompanying drawings, but the present invention is not limited thereto.

[0153] Figure 4a-4b A partial plan view of a flexible OLED light-emitting panel 400 with holes is shown, which has a plurality of holes 401. Each hole 401 has a center o, a diameter d, and a spacing s between holes. We define the hole area ratio F as the ratio of the sum of the cross-sectional areas of the holes on the entire flexible OLED panel to the area of ​​the entire flexible OLED panel. Figure 4a-4b In the embodiment, all the channels 401 have the same diameter, and the channel spacing is equal in both the x and y directions. Figure 4aIn such an array of equal-area channels arranged equidistantly, the channel area ratio F is the ratio of the channel area contained in the unit triangle 402 to the area of ​​the entire triangle. Note that in some embodiments, the channels 401 can be arranged non-equidistantly, for example, they are arranged equidistantly in the x direction with a spacing s1, and they are arranged equidistantly in the y direction with a spacing s2, where s1≠s2. In other embodiments, the channels 401 can also be arranged non-equidistantly in a single direction. However, preferably, the channels 401 are arranged equidistantly in at least one direction of the x or y axis, and more preferably, the channels 401 are arranged equidistantly in both the x and y directions. The channels 401 can also have different diameters d from each other. For example, channels with larger openings (i.e., larger diameter d) can be used in the main area of ​​the wound, while channels with relatively smaller openings (i.e., smaller diameter d) can be used at the edge of the wound. According to the actual application needs, the pore area ratio F should be between 0.01%-50%, preferably between 0.1%-30%, and more preferably between 0.2%-10%. In order to ensure a certain gas and liquid permeability and minimize the loss of light-emitting area, the pore diameter d should be between 0.1-2mm, preferably between 0.2-1mm, and more preferably between 0.2-0.5mm. For the same reason, the pore spacing s should be controlled between 1-10mm, preferably between 1-5mm. In addition Figure 4a-4b In addition to the circular hole shown above, the cross section of the hole can also be other shapes, including but not limited to polygons (such as squares, hexagons, rectangles, triangles, diamonds, strips, etc.), ellipses, etc., which are not drawn here one by one. For the convenience of processing, the cross section of the hole is preferably a circle or a regular polygon; more preferably a circle. The flexible OLED light-emitting panel also needs to prepare a contact electrode 403, such as Figure 4a-4b The electrode strips on the periphery of the panel are shown in . These contact electrodes will be electrically connected to the external circuit (such as an FPC circuit board) after the device is packaged so as to be driven by an external power supply. The final product can be realized using a single flexible OLED light-emitting panel 400, or it can be realized by splicing multiple flexible OLED light-emitting panels 400. Each flexible OLED light-emitting panel can emit the same color of light or different colors of light. The specific splicing method can refer to the description in the inventor's previous application US20190376650.

[0154] When the flexible OLED light-emitting panel 400 is prepared as a light therapy product (such as a light-emitting mask) in a single piece, the light-emitting area is usually large. In this case, in order to reduce the voltage drop generated when the current passes through the electrode with a lower block resistivity, some metal wires (buslines) such as Figure 4b4031 and 4032 shown in . If the OLED light-emitting panel adopts a bottom-emitting device structure, the resistivity of the anode (usually ITO) is usually large, and its square resistance is generally around 10-25ohm / sq, that is, a metal wire can be prepared on the anode in advance to reduce the resistivity; if the OLED light-emitting panel adopts a top-emitting device structure, the resistivity of the cathode (usually MgAg alloy) is usually large, and its square resistance is generally between 1-30ohm / sq, so a metal wire can be prepared on the cathode to reduce the resistivity. The specific method of preparing the metal wire can refer to the inventor's previous patent US8,927,308. Figure 4b The metal wires 4031 and 4032 shown in the figure are only examples. The arrangement of the metal wires is well known to those skilled in the art and will not be described in detail here.

[0155] Flexible OLED light-emitting panel 500 Figure 5a As shown, it includes a flexible substrate 501, an OLED device 502, an encapsulation layer 503, and a contact electrode 504. From the AA' cross section, the flexible substrate 501, the OLED device 502, and the encapsulation layer 503 are all covered with holes 507 (corresponding to Figure 4a-4b4 ), but note that from the plan view of FIG4 , they are still continuous in the area outside the channel 401. During the preparation process, the flexible substrate 501 is attached to a supporting substrate 505 to ensure the normal process flow. The supporting substrate 505 is generally hard, such as glass, silicon wafer, etc. If the flexible substrate 501 is a solid film, such as PET, PEN, aluminum foil, etc., Kapton tape can be used to fix the flexible substrate 501 on the supporting substrate 505, and a solid film coated with a moisture barrier layer can also be selected; preferably, the PI solution is applied to the supporting substrate 505 by spin coating, printing, spraying, etc. and cured to form the flexible substrate 501. Note that the supporting substrate 505 will eventually be removed and will not appear in the final product. One solution to increase the air permeability of the flexible OLED light-emitting panel is to perform a hole punching process on the flexible substrate 501 before preparing the OLED device 502. If the flexible substrate 501 is a solid film, it can be punched before being applied to the supporting substrate 505. If it is applied to the supporting substrate 505 in the form of a solution, it can be punched after curing. Here, it is preferred to use a solution method to apply PI and solidify to form the flexible substrate 501. The thickness of the flexible substrate 501 is generally 25-500μm, preferably 30-200μm, and more preferably 50-100μm. In order to ensure accuracy and controllability, punching can be performed by punching by punching, wet etching, dry etching, laser, etc., preferably by laser drilling, to form a plurality of channels 507 on the flexible substrate 501, which have a center o, a diameter d, and a spacing s between two adjacent channels. Thereafter, an OLED device 502 is prepared on the flexible substrate 501 having the channels 507. Since the thickness of the flexible substrate is at least 25 μm, and the overall thickness of the OLED device 501 is generally in the order of 1-2 μm, the organic film or metal electrode film layer of the OLED device will not cover the channel 507 during the preparation process. Moreover, due to in-situ growth, the center of the channel of one layer of the OLED device coincides with the center of the channel on the substrate. After the device is prepared, it needs to be packaged, preferably using a thin film package, which is generally less than 10 μm thick. At this time, since the packaging process is generally isotropic, part of the packaging layer 5031 will cover all sides of the OLED device 502 and part or even all sides of the flexible substrate 501, so that the OLED device 502 can be effectively protected from being corroded from the side by water and oxygen in the environment. Although the encapsulation layer will wrap a part of the side wall, since the encapsulation layer itself is very thin, the part covering the side wall will be thinner, generally less than 5μm, and the diameter of the channel is at least 0.1mm, i.e. 100μm. Therefore, it can be considered that the channel diameter d' after encapsulation is reduced by 10% or less compared with the diameter d before encapsulation, and the channel center of the encapsulation layer, OLED device layer and substrate layer are all coincident.After the package is completed, the flexible substrate 501 needs to be peeled off from the supporting substrate 505. There are several methods for this. First, the FPC circuit board 6 can be electrically connected to the contact electrode 504, and then the protective film 506 can be applied on the packaging layer 503, and the flexible OLED light-emitting panel 510 is as shown. Figure 5b As shown. The FPC circuit board 508 can be in a continuous film form connected to an external power supply, preferably in a grid-like or frame-like form, only connecting the contact electrode 504 and completely exposing the encapsulation layer 503. The use of the FPC circuit board 508 in the OLED light-emitting panel can refer to the inventor's previous application US20190376650. The protective film 506 can be applied to the flexible panel in the form of a laminate, and then the flexible substrate 501 is peeled off from the supporting substrate 505. If the flexible substrate 501 is a solid film, the tape can be directly torn off. If it is a PI film, laser peeling is required, and laser peeling of the PI film is preferably used. The material of the protective film includes but is not limited to PET, PEN, PI, FPC circuit board, silicone and other artificial materials, and can also be natural materials with good air permeability such as silk, cotton and linen. If it is such a natural material with good air permeability, no additional holes are required. If the protective film 506 is an airtight material, it also needs to be punched. The flexible OLED light-emitting panel 520 is as Figure 5cAs shown. The position of the hole on the protective film 506 should correspond to the hole 507 formed on the flexible substrate and the OLED device, that is, its center point coincides with the center point o of the hole 507 or the coincidence degree is more than 50%. Here, the coincidence degree refers to the ratio of the area of ​​the overlapping part of the hole of the protective film and the hole A in the vertical projection of the substrate plane to the vertical projection area of ​​the hole A; preferably, the coincidence degree of the hole is more than 70%. The diameter of the hole on the protective film 506 is D, preferably D≥d. The hole on the protective film 506 can be punched in advance, so that when laminating, it is necessary to perform a positioning operation to ensure alignment with the inherent hole 507; another solution is to perform the punching operation after laminating. The advantage of this is that no additional alignment is required to ensure that the center of the protective film is basically aligned with the existing center point o, but the disadvantage is that there is a risk of damaging the OLED device during the punching process. Punching of the protective film can be performed by punching, laser, etc. In the second method, the protective film 506 can also be an FPC circuit board that has integrated circuits. This has an advantage: generally, a positioning system is provided when making circuit connections (bonding), so that the circuit connections (bonding) can be made simultaneously during the lamination, solving the problem of channel alignment. In this case, no additional FPC circuit board 508 is required. The thickness of the protective film 506 is generally 25-500μm, preferably 50-200μm. If the flexible OLED light-emitting panel uses a top-emitting device, the protective film needs to be light-transmitting, with a transmittance of more than 10%, preferably a transmittance of more than 20%, and more preferably a transmittance of more than 50%. The third method is as follows Figure 5d As shown, when the flexible substrate 501 is peeled off from the supporting substrate 505, a transfer film 5061 can be first applied to the flexible OLED light-emitting panel 530, and then the flexible substrate 501 can be peeled off from the supporting substrate 505, and then the flexible substrate 501 together with the OLED device 502 and the encapsulation layer 503 thereon are transferred and attached to the flexible film 509, and then the transfer film 5061 is removed. The FPC circuit board 508 can be electrically connected to the contact electrode 504 before the transfer, or it can be electrically connected after the transfer film 5061 is removed. If the OLED device 502 is a bottom-emitting device, the flexible film 509 is required to be transparent. If the flexible film 509 is an airtight film, such as various plastics or silicone materials, it also needs to be punched so that it has a number of channels E, such as Figure 5eAs shown in , punching can be achieved by stamping, laser and other methods. At this time, the position of the hole on the flexible film 509 should be aligned with the existing hole 507, that is, its center point coincides with the center point o of the hole 507 or the overlap is more than 50%. Here, the overlap refers to the ratio of the area of ​​the overlapping part of the hole of the flexible film and the hole A in the vertical projection of the substrate plane to the vertical projection area of ​​the hole A. Preferably, the overlap of the hole is more than 70%. It is also possible to punch holes from top to bottom, and the hole diameter D' is not larger than the hole diameter d' of the hole 507 to ensure that the existing devices and packaging layers are not damaged. Figure 5e As shown by the arrow in , this method can ensure that the center of the hole on the flexible membrane 509 coincides with the existing center. The flexible membrane 509 may already have a hole, and the diameter should not be less than the diameter d of the hole 507. The two holes need to be aligned during transfer. Of course, the flexible membrane 509 can also be a skin-friendly protective material with its own gaps, such as natural materials with good air permeability such as silk, cotton and linen, so that no additional punching is required. The thickness of the flexible membrane 509 is generally 25-500μm, preferably 50-200μm. Finally, a protective film 506 can also be added to the encapsulation layer 503 of the flexible OLED light-emitting panel 540. The method and selection are as described above and will not be repeated.

[0156] In some embodiments, the holes can be punched after the OLED device and the encapsulation layer are completed. Figure 6a A schematic diagram of the cross-sectional structure of the flexible OLED light-emitting panel 600 of the present invention with a supporting substrate before punching, wherein a flexible substrate 601 is attached to a supporting substrate 605, on which a prepared OLED device 602 and a complete encapsulation layer 603 are located, as well as a contact electrode 604 exposed outside the encapsulation layer 603. Since the total thickness of the entire OLED device 602 and the encapsulation layer 603 is generally about 10-15 μm, it can be cut from top to bottom by laser (e.g., Figure 6a As shown by the arrow in the middle, precise etching is performed to form Figure 6bThe hole 607 in the cross-sectional structural diagram of the flexible OLED light-emitting panel 610 of the present invention with a supporting substrate after being punched. A mask can also be set on the completed device, and then plasma bombardment is used in the PECVD chamber to form holes on the encapsulation layer 603 and the OLED device 602, and then the hole is formed on the flexible substrate 601 by laser or stamping. The hole 607 has a diameter d and a spacing s. The FPC circuit board 606 can be bonded before punching or after punching. This method exposes the side 6021 of the OLED device 602, which may cause the device performance to deteriorate. At this time, a protective film and / or a flexible film can be applied in the subsequent process, and then the edge of the hole can be sintered by laser or high temperature. Since the general protective film and the flexible film can be made of plastic or silicone, they will melt under laser or high temperature burning, and they can be re-solidified after cooling to seal the side of the hole to avoid exposure of the OLED organic layer. It is also possible to make holes through the protective film and / or flexible film after applying the protective film and / or flexible film, that is, to make holes in the protective film, encapsulation layer, OLED device, flexible substrate, and flexible film together, and then use high temperature to seal the edges. This approach avoids the use of alignment and simplifies the process. In other embodiments, improvements can be made on the basis of the above. Specifically, the OLED device is first preliminarily packaged, such as first using PECVD to deposit a 1-2μm thick semiconductor film, including but not limited to SiO x (Silicon oxide), AlO x (aluminum oxide), SiN x (silicon nitride), etc. Then, holes are punched, as described above. Then, the organic layer is printed to continue the encapsulation, and on this basis, it can be transferred back to PECVD to make the second semiconductor film and print the second organic layer. In this way, the side 6021 of the OLED device can be protected by the encapsulation layer. This multi-layer encapsulation process is well known in the industry and will not be described in detail here.

[0157] Figure 7a The figure shows a cross-sectional schematic diagram of a multifunctional cosmetic phototherapy device 700 according to the first embodiment of the present invention, which includes a flexible substrate 702, a thin film ultrasound layer 703, a functional isolation layer 704, a surface light source component, namely a flexible OLED light-emitting panel 705, an encapsulation layer 706, an electrical connection device 7040, a negative pressure providing layer 701, a negative pressure pipeline 707, a negative pressure pump component 708 and an electric drive device 709.

[0158] In this design, the thin film ultrasonic layer 703 is arranged on the flexible substrate 702, and is responsible for realizing ultrasonic vibration functions, such as cleaning the skin and promoting blood circulation. In order to optimize the uniformity of vibration and the energy transfer path, a series of holes are designed in the thin film ultrasonic layer 703, which structurally avoid the position of the piezoelectric unit, thereby ensuring mechanical stability and the integrity of the ultrasonic function. A functional isolation layer 704 is arranged on the thin film ultrasonic layer 703, and its main function is to serve as a support and isolation structure to reduce the interference of ultrasonic vibration on the upper OLED and provide a flat deposition surface. The functional isolation layer is usually made of flexible polyimide (PI), silicone and other materials, and the thickness can be designed to be in the range of 200-300μm, and at the same time, it contains conductive through holes as needed. The OLED layer 705 deposited on the functional isolation layer 704 is a flexible surface light source, and its light emission direction is toward the part to be treated. The OLED is composed of a transparent anode (such as ITO) and a metal cathode, and is driven to emit light by current provided by an external power supply. The functional isolation layer 704 only serves as a mechanical support structure and does not participate in the realization of the core function of the OLED. Therefore, the functional isolation layer does not constitute the substrate of the OLED, and the substrate function of the OLED is clearly provided by the lower flexible substrate 702. In order to ensure that the OLED can work properly, the conductive through-holes in the functional isolation layer transmit the electric field provided by the ultrasonic layer or the electric drive device 709 to the anode of the OLED, while the cathode of the OLED is connected to the external connection device 7040 through the encapsulation layer 706, thereby forming a complete current loop. This design not only ensures the effective connection between the electrodes, but also avoids the interference of the functional isolation layer on the electric field distribution and optical performance of the OLED. It is worth emphasizing that the design of the OLED and the thin film ultrasonic layer sharing the same flexible substrate significantly simplifies the overall structure and reduces the complexity and thickness of the multi-layer stacking. The advantages of this structural design include: improved integration and lightness: the shared substrate avoids the design of a separate stacked substrate, making the overall thickness lower, which is suitable for the demand for lightness and thinness of flexible beauty equipment. Enhanced flexibility and durability: the flexible substrate carries the OLED and the thin film ultrasonic layer at the same time, reduces the number of interfaces between the functional layers, and improves mechanical flexibility and reliability. Functional synergy: the organic combination of ultrasound and phototherapy functions helps to provide more uniform and efficient effects in beauty and treatment.

[0159] The electrical connector 7040 includes but is not limited to one or more of thin film metal, transparent conductive material, and FPC lead. The negative pressure giving layer 701 may further include a series (at least one) of micro-pipes and channels connected to the entrance 7070 of the negative pressure pipe 707, so that the negative pressure can be evenly distributed throughout the area to be treated, thereby improving the treatment effect. The device 700 also includes a heating template, which is not specifically shown in the figure. The heating template can be integrated into the wire of the OLED panel and can work simultaneously with the OLED light-emitting panel to promote the opening of skin pores; the heating module can also be integrated into the wire of the thin film ultrasound layer. The thin film ultrasound layer 703 includes a plurality of piezoelectric units for generating uniform and efficient ultrasonic vibrations, and the arrangement of the channels is intended to achieve a negative pressure effect or guide the function of air flow. In order to ensure the best cooperation between the two, the design of the channels must strictly avoid piezoelectric devices to avoid interfering with the vibration mode and energy transfer path of the piezoelectric units. The layout of the channels is based on the physical distribution of the piezoelectric devices, and the gap area between the piezoelectric units is preferably selected for opening. Specifically, when the piezoelectric devices are arranged in a matrix form, the channels can be arranged in the non-working area around each piezoelectric unit, or in the blank space of the central spacing area. To ensure the stability and functional integrity of the mechanical structure, each channel maintains a buffer distance from the edge of the adjacent piezoelectric unit, preferably within the range of 5-10 microns. Such a buffer design can effectively avoid the influence of the channel on the vibration process of the piezoelectric device, while ensuring that the existence of the channel does not weaken the strength or reliability of the thin film ultrasonic layer. During the optimization process, the opening diameter, shape and arrangement of the channel are precisely designed to balance the ultrasonic performance and the negative pressure effect. For example, the channel can adopt a circular, elliptical or other optimized geometric shape, and the opening density can be adjusted according to actual needs to achieve uniform propagation of ultrasonic waves and uniform distribution of negative pressure. This layout design ensures the stability and efficiency of ultrasonic vibration, while maximizing the functional performance of the channel. The film material used in the thin film ultrasonic layer 703 can be a flexible polymer film, a metal film or other composite material with good mechanical properties and conductive properties, and further integrates piezoelectric devices and metal wires. Piezoelectric devices can use common piezoelectric ceramic materials (such as PZT, lead zirconium titanate) or piezoelectric polymer materials (such as PVDF, polyvinylidene fluoride), and their function is to convert electrical energy into mechanical energy to generate ultrasonic vibrations. Metal wires can use materials with high conductivity and good flexibility, such as gold, silver or copper wires, or metal grid structures based on flexible electronic technology to ensure the stability and reliability of current transmission. The electric drive device of the thin film ultrasonic layer and the OLED light-emitting panel may be the same or different, but the same electric drive device is preferred. Figure 7aThe thin film ultrasonic layer is connected to an external electric drive device 709 via an electric connection device 7040. The electric drive device can provide drive signals of different frequencies and powers according to specific application requirements to control the vibration mode and intensity of the thin film ultrasonic layer, thereby achieving efficient ultrasonic effects in various functional scenarios.

[0160] The encapsulation layer 706 protects the OLED layer and the ultrasound device layer from being affected by external environments such as moisture and oxygen.

[0161] The negative pressure giving layer 701 can also be arranged between the OLED light-emitting panel 705 and the functional isolation layer 704, or between the thin film ultrasound layer 703 and the functional isolation layer 704. In this case, in order to provide a path for ultrasonic propagation, it is necessary to open holes in the negative pressure giving layer. The pore size of the negative pressure giving layer should not be too large, preferably less than 1 mm, to ensure the vacuum effect of the negative pressure. For example, the negative pressure giving layer can choose a grid design to ensure the transmission of ultrasonic waves without affecting the adsorption effect.

[0162] The electric drive device 709 includes but is not limited to one or more devices such as a power supply, a charging device (preferably a wireless charging device), a Bluetooth communication device, a chip, a lead, a circuit board, a switch, etc. The power supply includes a battery, and the battery can be selected from one or more of a thin film battery, a micro battery, a button battery, a chemical battery, a lithium battery, and a hydrogen battery. The electric drive device 709 can also be wirelessly connected to an external electronic device through a Bluetooth communication device, and controlled by an external electronic device, such as a switch, brightness adjustment, and partition control, for example, only lighting up the red light emitting device, or lighting up the red light emitting device and the near-infrared light emitting device at the same time. The external electronic device can be a smart phone, a smart watch, a tablet computer, a laptop computer, etc. Further, the external electronic device can also be controlled in conjunction with an application (APP). Note that although the electric drive device 709 and the negative pressure pump component 708 are drawn as two independent components, the negative pressure pump component 708 can also be driven by the electric drive device 709, and / or, the negative pressure pump component 709 can be arranged in the same housing as the electric drive device 709. A skin-friendly layer can also be set on the flexible OLED light-emitting panel 705, which is no longer drawn in the figure. The material of the skin-friendly layer can be selected from mesh fabrics made of natural cotton, silk, linen, etc. to ensure light transmittance; it can also be a transparent material such as medical silicone, preferably transparent medical silicone. A series of channels are also provided on the skin-friendly layer (the channels run through the upper and lower surfaces of the skin-friendly layer), and are aligned one by one with the channels of the flexible OLED light-emitting panel 705. Preferably, the channels on the skin-friendly layer and the flexible OLED light-emitting panel 705 are formed at the same time, for example, by laser etching at the same time.

[0163] The flexible substrate 702 is the basis for integrating various functional layers, and carries the thin film ultrasonic layer 703 and the flexible OLED panel 705. The thin film ultrasonic layer 703 is directly deposited on the flexible substrate, and generates ultrasonic vibrations through piezoelectric devices, which are used to clean the skin, introduce nutrient solution or promote blood circulation. In order to ensure the efficient conduction of ultrasound and be compatible with the subsequent OLED deposition process, a functional isolation layer 704 is set between the thin film ultrasonic layer 703 and the flexible OLED panel 705. The functional isolation layer ensures the firm structural combination of the ultrasonic device and the OLED layer through 704 adhesion, shock absorption and thermal management, while optimizing its overall performance. This functional isolation layer can be made of materials such as polyimide (PI), silica gel, polyethylene terephthalate (PET), etc., because its flexibility, insulation and thermal stability can meet multiple requirements. In order to achieve the bonding effect, the thickness of the functional isolation layer is usually designed to be between 10 and 50 microns. Thinner isolation layers are suitable for applications that require close bonding, while thicker isolation layers help to enhance the shock absorption effect and reduce the impact of ultrasonic vibration transmission on OLED. The functional isolation layer plays multiple roles in this structure. First, it provides mechanical bonding, and the thin film ultrasound layer and the OLED layer are firmly bonded through the adhesion of the material itself or the use of adhesives such as optically clear adhesive (OCA) to prevent delamination or sliding. Secondly, it can absorb ultrasonic vibrations and functionally isolate the interference of ultrasonic equipment on the OLED layer, especially in high-precision scenarios of dot matrix lighting. In addition, the functional isolation layer can also serve as a thermal management component to prevent the heat generated by the ultrasonic equipment during operation from being transferred to the OLED layer, avoiding the degradation of luminous performance or structural deformation caused by temperature rise. For scenarios requiring electrical insulation, the insulating properties of the functional isolation layer can also prevent the electrical signals of the ultrasonic equipment from interfering with the driving circuit of the OLED layer. In addition to the functional isolation layer, other bonding methods can also be used. For example, transparent adhesive is used to directly bond the two layers, or partitioned bonding is used to reduce the impact on overall flexibility through the distribution of local bonding points. For some high-strength bonding requirements, laser welding or hot melt welding technology can also be used to achieve firm bonding locally through flexible welding. The functional isolation layer not only plays a role in vibration reduction and providing a flat surface, but also realizes the effective transmission of ultrasonic energy by designing a series of channels without interfering with the light output performance of the OLED.

[0164] The flexible OLED panel 705 is stably integrated on the thin film ultrasound layer through a functional isolation layer to form a compact stacked structure. The OLED panel can emit light with a peak wavelength of 400-1400nm, preferably red light, deep red light and near infrared light of 600-1400nm, which is used to promote skin metabolism and blood circulation. The light-emitting panel is also designed with precisely arranged channels, which are completely aligned with the channels of the thin film ultrasound layer, realizing the synergistic effect of ultrasound and light, and ensuring the efficient integration of each layer of function.

[0165] The thin film ultrasonic layer 703 and the flexible OLED panel 705 not only share a flexible substrate, but can also preferably be controlled by the same electric drive device 709, so as to achieve efficient operation of the multifunctional device through precise electrical signal regulation.

[0166] Here are several working modes of multifunctional beauty devices:

[0167] Option 1: Ultrasonic cleaning + near-infrared light therapy

[0168] In this solution, the user first activates the thin film ultrasonic layer 703 to perform deep cleaning through ultrasonic vibration. The piezoelectric device in the thin film ultrasonic layer 703 converts electrical energy into mechanical vibration, promoting the cleaning of the pores on the skin surface and removing dirt and excess sebum. At the same time, the flexible OLED light-emitting panel 705 emits near-infrared light of 750nm and above to help heat the area to be treated and further open the skin pores so that the cleaning process can be more in-depth. This solution is suitable for skin cleaning and pore dredging, improving the skin's oil secretion and cleaning effect.

[0169] Option 2: Ultrasound nutrition introduction + deep red light therapy

[0170] This solution combines ultrasound introduction and red light therapy functions. After the user wears the device, he first applies nutrient solution (such as moisturizing or anti-aging ingredients) on the skin surface, and then activates the ultrasound function to effectively introduce the nutrient solution into the deep layer of the skin using the micro-vibration of the thin film ultrasound layer 703. In addition, the deep red light (wavelength 600-750nm) emitted by the flexible OLED panel 705 helps promote the metabolism of skin cells and stimulate collagen production, thereby achieving anti-aging and skin tightening effects. This solution is particularly suitable for anti-aging and deep moisturizing treatments.

[0171] Option 3: Ultrasonic cleaning + negative pressure adsorption + near-infrared phototherapy

[0172] This solution combines the functions of ultrasonic cleaning, negative pressure adsorption and phototherapy to provide a full range of skin treatments. The thin film ultrasonic layer 703 cleans the skin through ultrasonic vibrations to remove impurities and dirt in the pores; the negative pressure giving layer 701 helps to clean clogged pores and adsorb waste on the skin surface through the suction force generated by the negative pressure pump component 708; and the flexible OLED light-emitting panel 705 emits near-infrared light to help warm the skin, relax the pores, and enhance the cleaning and adsorption effects. This solution is very suitable for deep cleansing, acne removal and skin tightening.

[0173] Option 4: Full-function combined treatment

[0174] In this solution, all functions (ultrasonic cleaning, phototherapy, negative pressure adsorption and nutrient introduction) are activated at the same time to provide the most comprehensive treatment effect. Users can choose to use this solution for integrated treatment, including cleaning pores through ultrasound and negative pressure adsorption, promoting skin metabolism and improving skin firmness through the red light and near-infrared light of the flexible OLED light-emitting panel 705, and effectively penetrating the nutrient solution into the deep layer of the skin through the ultrasound introduction function of the thin film ultrasound layer 703, improving skin condition and anti-aging effects.

[0175] Option 5: Heating promotion + mild light therapy

[0176] This solution focuses on gentle skin soothing and heating effects. After the user wears the device, the flexible OLED light-emitting panel 705 provides gentle light therapy, emitting deep red light or near-infrared light to promote skin blood circulation, help open pores, and promote the skin's absorption of external care ingredients. At the same time, the heating module is set on the wires of the piezoelectric device or the wires of the flexible OLED light-emitting panel. The heating function can be combined with the flexible OLED light-emitting panel 705 to further enhance the openness of the skin pores and amplify the light therapy effect. It can also be combined with the ultrasonic function to provide a good foundation for subsequent skin care or nutrition introduction. This solution is suitable for daily skin care and soothing treatment.

[0177] Solution 6: Directed deep red light therapy + ultrasonic vibration

[0178] In this solution, users can choose to use only the deep red light therapy and ultrasonic vibration functions. The deep red light emitted by the flexible OLED light-emitting panel 705 stimulates the skin surface, promotes blood circulation and cell metabolism, and improves uneven skin tone and sagging. At the same time, the thin film ultrasonic layer 703 provides micro-vibration, promotes blood circulation and helps the skin absorb the light therapy effect, thereby achieving the effect of firming the skin, removing wrinkles and promoting skin repair. This solution is suitable for people who want to improve skin health through mild light therapy and ultrasonic massage.

[0179] Solution 7: Negative pressure adsorption + heating + OLED light therapy

[0180] The solution focuses on cleaning the skin through negative pressure adsorption and thermotherapy, helping to relax the skin and promote the unclogging of pores. The negative pressure pipe 707 effectively removes waste and blockages on the skin surface through the suction force generated by the negative pressure pump component 708. The heating module works in conjunction with the flexible OLED panel 705, using red light and near-infrared light to help open skin pores and thermotherapy, while promoting blood circulation and enhancing cleaning and care effects. The solution is suitable for deep cleansing, promoting skin metabolism and unclogging pores, and is particularly suitable for the treatment of dull skin and clogged pores.

[0181] 7b Figure 7aOn the basis of the above, a down-conversion layer 720 is added, and its core structure remains the same, including a flexible substrate 712, a thin film ultrasonic layer 713, a functional isolation layer 714, an OLED surface light source component 715 and an encapsulation layer 716, an electric drive device 719, a negative pressure giving layer 711, a negative pressure pipeline 717, a negative pressure pump component 718, an electric drive device 719, etc., still continuing the design concept that the OLED and the thin film ultrasonic layer share the same flexible substrate, and the relevant description is not repeated. The introduction of the down-conversion layer further optimizes the optical performance of the device, by converting the light emitted by the OLED into light in a target wavelength range (such as deep red light or near-infrared light) to meet specific treatment or beauty needs. This improvement improves the versatility of the device and the applicability of application scenarios on the basis of ensuring the overall structure is light and thin and efficient functional integration. At this time, the light-emitting surface is a flexible OLED light-emitting panel 715, and emits light with a peak wavelength of 400-600nm, preferably 400-560nm. The absorption peak of the lower conversion layer 720 is within the range of + / -20nm of the peak wavelength of the light emitted by the flexible OLED light-emitting panel 715, and its emission peak is within the range of +100nm and above of the peak wavelength of the light emitted by the flexible OLED light-emitting panel 715. Preferably, the emission peak of the lower conversion layer 720 is 600nm and above. The material of the lower conversion layer 720 may include but is not limited to fluorescent materials, perovskite materials, quantum dot materials, organic small molecule luminescent materials, graphene, etc. In order to protect the lower conversion material and OLED from water and oxygen erosion, it is necessary to set an encapsulation layer on the lower conversion layer 720. Similarly, there are a series of channels 7110 on the lower conversion layer 720 and the encapsulation layer, which penetrate the encapsulation layer, the lower conversion layer 720 and the flexible OLED light-emitting panel 715. The channel formation method is similar to the above, and can be formed by laser etching together with the flexible OLED light-emitting panel 715 after the lower conversion layer 720 and its encapsulation layer are completed. Of course, a skin-friendly layer can also be set on the encapsulation layer, which is no longer drawn in the figure. The negative pressure providing layer 711 may further include a series (at least one) of microchannels and holes connected to the inlet 7170 of the negative pressure pipeline 717, so that the negative pressure can be evenly distributed in the entire area to be treated, thereby improving the treatment effect.

[0182] Figure 8 The figure shows a cross-sectional schematic diagram of a multifunctional cosmetic phototherapy device 800 according to the third embodiment of the present invention, which comprises a flexible substrate 802, a thin film ultrasonic layer 803, a surface light source component, namely an OLED 805, an encapsulation layer 806, an electric drive device 809, a negative pressure providing layer 801, a negative pressure pipeline 807, and a negative pressure pump component 808. The thin film ultrasonic layer 803 is arranged on a side of the flexible substrate 802 away from the light source component 805, and its main function is the same as Figure 7aThe ultrasonic vibration is also used to achieve specific functions, such as cleaning, introducing nutrient solution or promoting blood circulation. In order to achieve the ultrasonic effect, the thin film ultrasonic layer 803 is designed with a series of channels. The channel design can optimize the energy transfer path of the ultrasonic wave, so that the ultrasonic wave can be more evenly transmitted to the treatment target (such as the skin surface), and the treatment efficiency can be improved. A flexible OLED panel 805 is arranged on the flexible substrate 802, and the light emission direction of the flexible OLED 805 is toward the part to be treated, as shown by the arrow. As described above, a series of channels 8010 are arranged on the flexible OLED light-emitting panel 805. The double-sided integrated design scheme of integrating the ultrasonic device and the light source component on the upper and lower sides of the flexible substrate 802 has unique advantages, such as clear functional divisions and reduced mutual interference. For example, ultrasonic vibrations will be generated during the operation of the piezoelectric device, and the OLED light source has high requirements for the flatness of the deposition surface. By arranging the two partitions on both sides of the substrate, the impact of vibration on the luminous efficiency and life of the OLED light source can be effectively reduced. The functional layer on each side is optimized independently: one side is dedicated to the efficient transmission of ultrasonic vibrations, and the other side focuses on high-quality light source output. In this way, the material, thickness and processing technology can be designed for each functional module, thereby optimizing the overall performance. Space saving: The double-sided arrangement highly layers the functional modules, reducing the area occupied laterally, which is suitable for wearable devices or portable devices that require a compact structure. Enhanced heat dissipation performance---dispersed heat source: The operation of piezoelectric devices and OLED light sources will generate heat, and distributing them on both sides can avoid overheating caused by heat accumulation, thereby improving the safety and service life of the device. Convenient heat dissipation design: The double-sided structure allows the design of heat dissipation channels on both sides of the substrate to further optimize thermal management.

[0183] The flexible OLED light-emitting panel here can emit light with a peak wavelength of 400-1400nm, preferably, red light, deep red light and near-infrared light of 600-1400nm. The flexible OLED light-emitting panel 805 is connected to the electric drive device 809 via an electrical connection 8040. The negative pressure giving layer 801 may further include a series (at least one) of micro-pipes and channels connected to the entrance 8070 of the negative pressure pipe 807, so that the negative pressure can be evenly distributed throughout the area to be treated, thereby improving the treatment effect. The device 800 also includes a heating template, which is not specifically shown in the figure. The heating template can be integrated into the wire of the OLED panel and can work simultaneously with the OLED light-emitting panel to promote the opening of skin pores, or the heating module can be integrated into the wire of the thin film ultrasound layer. The electric drive devices of the thin film ultrasound layer and the OLED light-emitting panel may be the same or different, but preferably the same electric drive device, Figure 8The thin film ultrasonic layer is connected to an external electric drive device 809 via an electrical connection device 8040. The electric drive device can provide drive signals of different frequencies and powers according to specific application requirements to control the vibration mode and intensity of the thin film ultrasonic layer, thereby achieving efficient ultrasonic effects in various functional scenarios. The encapsulation layer 806 protects the OLED layer and the ultrasonic device layer from the influence of external environments such as moisture and oxygen.

[0184] The light source component can also adopt a partitioned integrated small-piece flexible OLED. Its design feature is that the OLED light source component on the flexible substrate is partitioned and integrated in the form of small pieces. This design avoids the situation in which holes have to be opened in the traditional full-coverage OLED structure due to the need to arrange negative pressure channels, thereby effectively improving the structural integrity and luminous uniformity of the OLED light source. In contrast, the ultrasonic layer and the encapsulation layer still need to be designed with channels to meet the realization of the negative pressure function. These channels run through the ultrasonic layer and the encapsulation layer, but because the flexible OLED light source component adopts a partitioned small-piece design, the channels are only located in the gaps between the OLED light sources, and do not need to penetrate the OLED light source itself, thereby avoiding the impact on the luminous efficiency and structural strength of the light source.

[0185] This partitioned OLED design brings many advantages. First, by avoiding opening holes directly in the OLED device, the light uniformity of the light source component and the reliability of the device are significantly improved. Second, the partitioned design makes the flexible OLED light source easier to adapt to curved structures and is suitable for complex shapes such as the face and neck. In addition, the design of the ultrasound layer channel optimizes the ultrasound energy transfer path, ensuring a uniform treatment effect, while the synergy with the negative pressure channel further improves the device performance.

[0186] In the multifunctional cosmetic phototherapy device of the present invention, the flexible OLED light source component is connected to the electric drive device through an electrical connection to realize independent drive control of the OLED units in each area. The negative pressure channel in the negative pressure giving layer is connected to the negative pressure pump component through a negative pressure pipeline to provide a uniform negative pressure adsorption effect for the treatment area. The channel shape and arrangement of the ultrasound layer can be consistent with the channel of the encapsulation layer, and can also be optimized according to actual needs to ensure efficient coordination of the light source, ultrasound and negative pressure functions.

[0187] Fig. 9The cross-sectional schematic diagram of the multifunctional cosmetic phototherapy device 900 of the fourth embodiment of the present invention is shown, which includes a flexible substrate 902, a thin film ultrasonic layer 903, a surface light source component, namely an OLED light-emitting panel 905, an encapsulation layer 906, an electric drive device 909, a negative pressure giving layer 901, a negative pressure pipeline 907, and a negative pressure pump component 908. The light emission direction of the flexible OLED light-emitting panel 905 is toward the part to be treated, as shown by the arrow. The flexible OLED light-emitting panel 905 in the device adopts a bottom-emitting device, and its light emission direction is from the flexible substrate 902 to the part to be treated, as shown by the arrow. This design enables light energy to act more directly on the target area, further improving the treatment efficiency. The negative pressure giving layer 901 can also further include a series (at least one) of micro-pipes and channels connected to the inlet 9070 of the negative pressure pipeline 907, so that the negative pressure can be evenly distributed throughout the area to be treated, improving the treatment effect.

[0188] The location of the thin film ultrasonic layer 903 can be flexibly designed, and can be arranged on the side of the encapsulation layer 906 away from the light-emitting layer (such as Fig. 9 As shown), it can also be set on the side of the encapsulation layer close to the light-emitting layer (not shown in the figure). An innovation in this embodiment is that the thin film ultrasound layer 903 directly uses the flexible encapsulation layer 906 as a substrate. Its advantage is that it can improve the integration and compactness of the overall structure and reduce the use of independent substrates: the flexible encapsulation layer 906 is used as the substrate of the thin film ultrasound layer 903, and there is no need to add an additional supporting structure for the ultrasound layer separately, thereby reducing the overall number of layers and the thickness of the device, making the device lighter and more compact, and convenient to wear and use. Improve mechanical flexibility: The flexible encapsulation layer itself has good mechanical flexibility and can better adapt to the vibration characteristics of the ultrasound device while maintaining the overall bendability of the device. The direct combination of the ultrasound layer and the flexible encapsulation layer reduces the interface layer and reduces the loss of energy during the propagation process, thereby improving the transmission efficiency of the ultrasonic vibration and making the treatment effect more significant. Simplify the manufacturing process and reduce costs, such as reducing processing steps: there is no need to prepare or assemble additional substrates separately, and use the existing flexible encapsulation layer directly as the substrate of the ultrasound layer, which greatly simplifies the production process and reduces the process complexity and production cost. Strong compatibility: The flexible encapsulation layer is usually made of polymer or composite materials, has good processing adaptability, and can form a stable combination with the thin film ultrasound layer material (such as piezoelectric ceramics or piezoelectric polymers). The flexible encapsulation layer can be designed with sound-permeable channels as needed to ensure that ultrasound can be effectively transmitted to the treatment area without affecting the sealing performance of the encapsulation layer. Similarly, the multifunctional beauty device also includes a series of channels 9010, which pass through the flexible substrate 902, the OLED panel 905, the encapsulation layer 906, and the thin film ultrasound layer 903. Fig. 9 The thin film ultrasound layer or flexible OLED light emitting panel shown is connected to an external electric driving device 909 via an electrical connection device 9040. The hole formation method is similar to the above.

[0189] Fig.10 The figure shows a cross-sectional schematic diagram of a multifunctional cosmetic phototherapy device 1000 of the fifth embodiment of the present invention, which comprises a flexible substrate 1002, a thin film ultrasonic layer 1003, a surface light source component, namely an OLED light-emitting panel 1005, a packaging layer 1006, an electric drive device 1009, a negative pressure providing layer 1001, a negative pressure pipeline 1007, and a negative pressure pump component 1008. The light-emitting direction of the flexible OLED light-emitting panel 1005 is toward the part to be treated, as shown by the arrow. Similarly, the multifunctional cosmetic device also comprises a series of channels 10010, which penetrate the flexible substrate 1002, the OLED panel 1005, the packaging layer 1006, and the thin film ultrasonic layer 1003. Fig.10 The thin film ultrasonic layer or flexible OLED light-emitting panel shown is connected to the external electric drive device 1009 via an electrical connection device 10040. The channel formation method is similar to the above. The ultrasonic layer 1003 in the device is embedded in the flexible substrate 1002. The process of embedding the core component piezoelectric device of 1003 into the flexible substrate requires a combination of advanced material science and micro-machining technology to ensure that it does not affect the mechanical properties and overall thickness of the flexible substrate while ensuring the function. Flexible substrates are usually made of polymer materials (such as polyimide PI, polyethylene terephthalate PET or polydimethylsiloxane PDMS), which have excellent flexibility, processability and compatibility with electronic components. In the embedding process of the piezoelectric device, first select a material with high piezoelectric properties and mechanical flexibility, such as piezoelectric ceramic film (PZT, lead zirconium titanate), piezoelectric polymer (PVDF, polyvinylidene fluoride) or composite piezoelectric material. The thickness of these materials is usually controlled at 50-300μm to minimize the impact on the flexibility of the substrate.

[0190] The first step of embedding is to design and process the microstructure of the flexible substrate. Specific micro grooves or areas are formed on the surface of the substrate by laser etching, plasma etching or template printing to accommodate the piezoelectric material. The depth and spacing of these grooves are precisely calculated to match the thickness and shape of the piezoelectric film, while ensuring that the material can fit closely to the substrate after embedding and does not protrude from the substrate surface.

[0191] Subsequently, the piezoelectric film is deposited in these micro grooves by solution spin coating, sputtering or physical vapor deposition (PVD) technology. This deposition method can accurately control the thickness and distribution of the piezoelectric film while avoiding defects on the film surface. After the piezoelectric material is deposited, it needs to be heat treated (such as annealing) to improve its crystal quality and optimize the piezoelectric performance.

[0192] In order to further fix the piezoelectric device and protect it from external mechanical stress and environmental factors (such as moisture and oxygen), a functional adhesive layer (such as epoxy resin and low modulus silicone) is used to integrate the piezoelectric film with the substrate package. These adhesive layers not only enhance adhesion, but also have a certain elasticity, which can absorb local stress and maintain the flexibility of the substrate. In addition, to prevent the thickness of the piezoelectric device from affecting the overall flatness of the substrate, a thin layer of flattening material (such as transparent conductive oxide ITO) can be added between the encapsulation layer and the piezoelectric device to balance the surface height and provide support for subsequent electronic device integration.

[0193] Electrode design is a key step in the embedding process of piezoelectric devices. The piezoelectric device is connected to the external circuit by depositing conductive layers (such as gold, silver, copper or flexible transparent conductive materials Ag nanowires, ITO) on the upper and lower surfaces of the piezoelectric film and using flexible printed circuit (FPC) technology. The design of the electrode needs to ensure conductivity and mechanical flexibility, and try to avoid electrode breakage or performance degradation caused by external forces.

[0194] Finally, the flexible substrate embedded with the piezoelectric device will undergo rigorous performance tests, including flexibility, durability and functionality tests, to ensure its reliability and consistency in dynamic environments. This embedded design can not only give full play to the function of the piezoelectric device, but also maintain the flexibility of the substrate to the greatest extent, providing a solid technical foundation for lightweight and multifunctional equipment. An OLED light-emitting panel 1005 is also provided on the flexible substrate 1002, and its light-emitting direction is shown by the arrow. The negative pressure giving layer 1001 may further include a series (at least one) of micro-pipes and channels to connect them to the negative pressure pipe 1007 and the inlet 10070, so that the negative pressure can be evenly distributed throughout the area to be treated, thereby improving the treatment effect.

[0195] The embedded ultrasound-luminescence integrated design directly integrates the ultrasonic vibration function on the OLED flexible substrate 1002, and uses a multifunctional composite material (such as a flexible piezoelectric film) as a luminous substrate and vibration element to achieve a high degree of integration of structure and function. This design significantly reduces the complexity of multi-layer stacking and greatly reduces the thickness of the device, while enhancing flexibility and fit, and is suitable for beauty devices that require ultra-thinness and high flexibility. The thickness of the flexible piezoelectric film is controlled at 50-300μm, and the synergistic effect of phototherapy and ultrasonic vibration is achieved in the same material through functional zoning design, which can not only promote collagen production through OLED phototherapy, but also accelerate blood circulation and nutrient introduction through ultrasonic vibration, thereby improving the beauty effect. In addition, the embedded design uses thermal conductive materials (such as graphene film or thermal conductive gel) to effectively disperse the heating area of ​​OLED and ultrasonic vibration to ensure the safety and stability of the equipment; highly flexible conductive materials (such as Ag nanowires or ITO films) are used to achieve electrical connection between the vibration area and the light-emitting area to ensure the reliability of the equipment in a bent state; a vibration reduction layer is set between the ultrasonic vibration and the OLED light-emitting area, and low-modulus organic glue is used as a buffer material to reduce the impact of vibration interference on the light-emitting performance; the packaging process combines local dispensing with thin film packaging to solve the problem of thickness difference between the ultrasonic and light-emitting areas, while ensuring the overall sealing and flexibility. This design has successfully broken through the limitations of traditional multi-layer equipment. While reducing thickness and optimizing functional integration, it meets the needs of the beauty field for lightness, thinness and efficiency, showing a broad market application prospect.

[0196] The cross-sectional schematic diagram of the multifunctional beauty phototherapy device 1100 according to the sixth embodiment of the present invention is shown in FIG. Fig.11aAs shown, it includes at least one light source component 1101, an optical waveguide component 1102, a thin film ultrasound layer 1103, an electric drive device 1104, a negative pressure giving layer 1105, a negative pressure pump component 1106, a negative pressure pipeline 1107 and an inlet 11070, and a flexible substrate 1108. The optical waveguide component 1102 converts the light emitted by the light source component 1101 into a surface light source to form a light-emitting surface. Among them, a series of channels 11020 are also provided on the optical waveguide component 1102. The light source component 1101 can be a point light source, a line light source, or a surface light source. Preferably, the light source component 1101 includes but is not limited to LED lamp beads, lasers or OLEDs. Preferably, the light source component 1101 includes LED lamp beads or lasers. The special multifunctional beauty phototherapy device in the present invention can convert a point light source or a line light source into a surface light source even if an LED lamp bead or a laser is used, so that large-area treatment can be achieved without being limited to the more expensive OLED. The light source component 1101 emits light with a peak wavelength of 400-1400nm. Preferably, the light source component 1101 emits blue light with a peak wavelength of 400-480nm, or red light, deep red light and near infrared light with a peak wavelength of 600-1400nm. The light source component 1101 may include multiple light emitting devices, for example, multiple LED lamp beads (such as Fig.11a ), preferably, the plurality of LED lamp beads can emit light of different colors, for example, at least one LED lamp bead emits red light and deep red light with a peak wavelength of 600-700nm, and at least another LED lamp bead emits near infrared light with a peak wavelength of 700-1400nm. The light source component 1101 is connected to the electric drive device 1104 via an electrical connector 11040.

[0197] Fig.11a The negative pressure pump component 1106 also includes an electric drive device (not shown in the figure) for driving the pump. Preferably, the electric drive device of the negative pressure pump and the electric drive device 1104 of the light source component 1101 can be the same electric drive device. Fig.11a The multifunctional beauty phototherapy device 1100 can turn on the negative pressure pump to form negative pressure to absorb the skin and discharge dirt, grease or other residues on the skin surface through the hole. Negative pressure can also enhance the blood and lymph circulation of the skin and promote the discharge of metabolic products.

[0198] The light source component 1101 can be fixed to the edge (i.e., the side) of the optical waveguide component 1102 by optical glue. The light emitted by the light source component 1101 is converted into a surface light source by the optical waveguide component 1102, and is emitted from the front in the form of surface light emission. As shown by the arrow in the figure, the emission direction points to the part to be treated. The area of ​​the entire optical waveguide component 1102 is the area to be treated. The area of ​​the optical waveguide component 1102 (i.e., the light emitting area of ​​the light emitting surface of the optical waveguide component 1102) is not less than 5cm 2, preferably, not less than 10cm 2 , more preferably, not less than 20cm 2 . The optical waveguide component 1102 is flexible. Preferably, the optical waveguide component 1102 is a three-dimensional structure designed according to the part to be treated and can fit tightly with the part to be treated. The optical waveguide component 1102 in the present invention can convert an incident point light source or line light source into a surface light source for emission, and by reasonably setting the structure, such as adding a scattering structure, etc., a uniform ground light source can be emitted. The uniformity of the light emitted by the optical waveguide component 1102 refers to the ratio of the light intensity values ​​of any two areas on the entire light-emitting surface. The uniformity of the light emitted by the optical waveguide component 1102 is within the range of 1±0.5, preferably within the range of 1±0.3, and more preferably within the range of 1±0.1.

[0199] It should be noted that the multifunctional cosmetic phototherapy device 1100 combines the thin film ultrasound layer 1103 and the optical waveguide component 1102 on the same flexible substrate 1108, and uses a highly transparent and highly flexible material as a substrate, such as polyimide (PI), polyethylene terephthalate (PET) or thermoplastic polyurethane (TPU), which can not only carry the optical waveguide component, but also support the integration of the ultrasonic device. These materials need to have good mechanical stability and optical properties, and perform surface pretreatment (such as plasma treatment or chemical treatment) to enhance the adhesion of each functional layer. The basic structure of the optical waveguide component is formed on the flexible substrate by laser etching, nanoimprinting or injection molding. The optical waveguide component has a light guide channel and a scattering structure, which may include micron or nanometer-level tiny bumps, gratings or scattering particles to ensure uniform scattering of point light sources or line light sources, and finally convert them into uniform surface light sources. The design of these structures requires accurate calculation of the light propagation path to ensure the uniformity of light (light intensity uniformity is better than 1±0.1). The thin film ultrasonic layer 1103 is made of a flexible piezoelectric material (such as PVDF or its copolymer) and is directly deposited on the back of the optical waveguide component by solution coating, spraying, spin coating or physical vapor deposition (PVD). This material can generate mechanical vibrations under electrical drive while maintaining the flexibility and adhesion of the film. To ensure that the ultrasonic vibration does not interfere with the optical properties of the optical waveguide, a functional adhesive material with a low modulus (such as a silicone-based adhesive or a polymer adhesive) is used to combine the thin film ultrasonic layer with the optical waveguide component. These adhesive materials can not only effectively absorb the impact of ultrasonic vibrations, but also maintain a firm adhesion between the two. In addition, the bonding area at the junction of the ultrasonic layer and the optical waveguide is optimized to reduce local stress concentration. The evenly distributed channels 11020 on the optical waveguide component 1102 are designed as multifunctional channels for light and ultrasonic vibrations. On the one hand, these channels allow the surface light generated by the optical waveguide to be uniformly emitted, and on the other hand, provide a transmission path for the ultrasonic vibration to reach the part to be treated directly, thereby achieving the synergistic therapeutic effect of phototherapy and mechanical vibration. The size and distribution of the pores have been optimized through simulation, and will neither significantly affect the optical properties of the optical waveguide nor weaken the energy transfer of the ultrasound. An ultra-thin flexible encapsulation layer (such as a transparent film or a composite coating) is used to encapsulate the entire structure to ensure the stability of the optical waveguide and the ultrasonic device in the external environment while retaining the flexibility of the device. The encapsulation material must have high transparency and excellent gas barrier properties (such as a polymer multilayer structure or an oxide film) to prevent the optical waveguide from being attenuated due to the intrusion of external moisture or oxygen. The electric drive device 1104 connects the light source component 1101 and the thin film ultrasonic layer 1103 (not specifically shown in the figure) through a flexible conductive material (such as silver nanowires, a flexible ITO film or a conductive polymer) to form a unified circuit system. The electric drive system is optimized to independently or collaboratively control the light source light emission and ultrasonic vibration, and has low power consumption and high reliability. Through the above steps and technical means, the ultrasonic device and the optical waveguide structure are highly integrated on the same flexible film.The optical waveguide component provides uniform surface light irradiation to meet the needs of large-area phototherapy; at the same time, the mechanical vibration of the thin film ultrasound layer enhances the penetration depth and therapeutic effect of phototherapy. In addition, this structure takes into account flexibility, lightness, and conformability, and can perfectly adapt to complex skin curves. It is widely used in beauty scenarios such as facial care and local treatment. This solution not only breaks through the design limitations of traditional multi-layer stacking, but also effectively reduces production costs and device thickness. It is an innovative example of the combination of phototherapy and ultrasound technology.

[0200] The cross-sectional schematic diagram of the multifunctional beauty phototherapy device 1110 according to the seventh embodiment of the present invention is shown in FIG. Fig.11bAs shown, the difference between 11b and 11a is that the light source component 1111 is arranged outside the optical waveguide component 1112, is electrically connected to the electric drive device 1114 through the electrical connector 11141, and is optically coupled to the light transmission component 11111 through the optical connection structure 11190. The light transmission component 11111 transmits light to the other end and optically couples with the optical waveguide component 1112 through the optical connection structures 11191 and 11192, and finally emits light from one side of the optical waveguide component 1112 in the form of a surface light source. In addition, its core structure remains the same, and the design concept of the optical waveguide component and the thin film ultrasound layer sharing the same flexible substrate is still continued, and the relevant description is not repeated. As shown by the arrow in the figure, the light emission direction of the light emitting surface points to the part to be treated. For example, the ultrasonic thin film layer 1113 is arranged on one side of the substrate 1118 close to the negative pressure providing layer 1115, and the optical waveguide component 1112 is arranged on the layer away from the negative pressure providing layer. The negative pressure giving layer 1115 is connected to the negative pressure pump component 1116 and the entrance 11170 through the negative pressure pipe 1117. At the same time, a series of channels 11120 are also provided on the optical waveguide component 1112 (the channels 11120 run through the entire optical waveguide component 1112) to ensure that the negative pressure can be transmitted to the part to be treated. The optical transmission component 11111 can transmit light energy from one end to the other end with low loss or even nearly lossless, and the loss is not higher than 50%, preferably, not higher than 20%, and more preferably, not higher than 10%. The optical transmission component 11111 is preferably an optical fiber. Generally, total reflection occurs when light propagates in the optical fiber, so it can be transmitted from one end to the other end almost losslessly. It should be understood that any tubular or sheet-like component that can form total reflection of the internal light path can be used as an optical transmission component. The light source component 1111 and the light transmission component 11111 are optically coupled via the optical connection structure 11190, that is, the light emitted by the light source component 1111 is transmitted to the light transmission component 11111. Similarly, the light at the other end of the light transmission component 11111 can be optically coupled to the optical waveguide component 1112 via the optical connection structures 11191 and 11192. Note that at this time, the light source component 1111 and the electric drive device 1114 can be arranged in the same housing. Preferably, the negative pressure pump component 1116 can share an electric drive device 1114 with the light source component 1111 and be arranged in the same housing. The light transmission component 11111 can be close to the negative pressure pipe 1117, making the entire device more concise and beautiful. It should be noted that although only one light source component 1111 is drawn in the figure, it can include multiple light-emitting devices, and each light-emitting device can also have its own corresponding light transmission component.

[0201] The cross-sectional schematic diagram of the multifunctional beauty phototherapy device 1120 according to the eighth embodiment of the present invention is shown in FIG. Fig.11cAs shown, the difference between 11c and 11a is that, based on 11a, a skin-friendly layer 1128 is provided between the optical waveguide component 1122 and the part to be treated. In addition, the core structure remains the same, and the design concept of the optical waveguide component and the thin film ultrasound layer sharing the same flexible substrate is still continued, and the relevant description is not repeated. Fig.11a As shown, it includes at least one light source component 1121, an optical waveguide component 1122, a flexible substrate 1128, a thin film ultrasonic layer 1123, an electric driving device 1124, a negative pressure providing layer 1125, a negative pressure pump component 1126 and a negative pressure pipeline 1127. The optical waveguide component 1122 converts the light emitted by the light source component 1121 into a surface light source so that the optical waveguide component 1122 forms a light-emitting surface. Among them, a series of channels 11220 are also provided on the optical waveguide component 1122. The light source component 1121 is connected to the electric driving device 1124 through an electrical connector 11240. The negative pressure providing layer 1125 can further include a series (at least one) of micro-channels and channels to connect them to the entrance 11270 of the negative pressure pipeline 1127. The material of the skin-friendly layer can be selected from a mesh fabric composed of natural cotton, silk, linen, etc. to ensure light transmittance; it can also be a transparent material such as medical silicone, preferably transparent medical silicone. The skin-friendly layer 1128 is also provided with a series of holes (the holes run through the upper and lower surfaces of the skin-friendly layer 1128), and are aligned one by one with the holes of the optical waveguide component 1122. Preferably, the holes on the skin-friendly layer 1128 and the optical waveguide component 1122 are formed simultaneously, for example, by laser etching at the same time. When this multifunctional cosmetic phototherapy device is used, the negative pressure pump can be turned on at the same time to promote wound healing, and the light source component can be turned on to further stimulate cell regeneration by light, further accelerate wound healing and reduce scars. Of course, it can also be used independently at different stages of wound healing.

[0202] As described in the sixth embodiment of the present invention, the multifunctional beauty phototherapy devices 1110 and 1120 of the seventh and eighth embodiments of the present invention also preferably combine the thin film ultrasound layer and the optical waveguide component on the same flexible substrate. An optical waveguide is arranged on one side of the flexible substrate, and a thin film ultrasound device is integrated on the other side. This design fully reflects the advantages of integrated integration by sharing the same flexible substrate as a supporting structure. The flexible substrate not only serves as a physical carrier of the optical waveguide and the thin film ultrasound device, but also clarifies the independent functions of the two through functional partitioning. The optical waveguide is used to achieve uniform illumination, while the thin film ultrasound device provides cleaning or drug introduction functions. This shared substrate method not only simplifies the manufacturing process and packaging steps, significantly reduces the thickness and weight of the device, but also improves the flexibility and fit of the device, and increases the wearing comfort of the user. In addition, the efficient heat transfer and stable characteristics of the flexible substrate further enhance the energy utilization of the overall device, optimize the luminous effect of the optical waveguide and the efficiency of ultrasonic vibration. Through this layout, the device achieves the synergistic effect of phototherapy and ultrasound functions in a limited design space, ensuring that the multifunctional beauty device has the characteristics of high efficiency, convenience and economy, while providing users with excellent experience effects.

[0203] A specific cross-sectional schematic diagram of an optical waveguide component is shown in FIG. Fig.12aAs shown, the optical waveguide component 1200 can be further divided into several components, including but not limited to an optical waveguide body 1201, a reflective layer 1202 and a scattering layer 1203. The reflective layer 1202 is arranged on the side of the optical waveguide body 1201 away from the part to be treated; the scattering layer 1203 is arranged on the side of the optical waveguide body 1201 close to the part to be treated. The optical waveguide body 1201 can be a transparent material with a high refractive index, and the refractive index is greater than or equal to 1.4, preferably greater than or equal to 1.45, and more preferably greater than or equal to 1.48. The material of the optical waveguide body 1201 includes but is not limited to flexible glass, silicone, PET (polyethylene terephthalate), PEN (polyethylene naphthalate), PMMA (polymethyl methacrylate), PI (polyimide), etc. The optical waveguide body 1201 can also be an optical waveguide with a grating structure on the surface. The reflective layer 1202 may be a film layer with high reflectivity, and the reflectivity of the film layer is greater than or equal to 50%, preferably greater than or equal to 70%, and more preferably greater than or equal to 90%. The reflective layer 1202 may include any one or more of a metal reflective layer, a metal oxide reflective layer, and a non-metal reflective layer. The metal reflective layer may include a metal film layer of silver, aluminum, copper, etc. The metal oxide reflective layer may include a metal oxide film layer formed by any one or more of titanium dioxide, tin oxide, indium oxide, and zinc oxide. The non-metal reflective layer may include a non-metal film layer composed of any one or two of carbon fiber and magnesium fluoride. The scattering layer 1203 may be a transparent film layer doped with scattering nanoparticles, or may be a micro-nano structure formed on the surface of the optical waveguide body 1201 to achieve scattering. The material of the transparent film layer may be various transparent organic macromolecular polymers, including but not limited to PMMA (polymethyl methacrylate), PET (polyethylene terephthalate), PEN (polyethylene naphthalate), PI (polyimide), etc. The scattering layer 1203 may contain nanoparticles, including but not limited to SiO x , oxide particles such as Al2O3, TiO2, ZrO, ZnO, or metal particles such as Ag, Pt, Cu, Au, or organic particles such as polystyrene microspheres (PS), polymethyl methacrylate (PMMA), silica gel, or a combination thereof. The diameter of the nanoparticles should be between 10nm-1000nm, preferably between 100-1000nm, and more preferably between 100-800nm. Scattering points can be further added to the optical waveguide component 1200, such as Fig.12aThe scattering structures 12030 in the optical waveguide body 1201 are distributed at intervals throughout the optical waveguide body 1201. When the optical waveguide material is an organic material, scattering nanoparticles can be injected into a specified area during the preparation process before the optical waveguide material is cured to form scattering points. Alternatively, an organic material with the same refractive index can be poured between multiple optical waveguide units, and scattering nanoparticles can be added therein, and then cured to achieve regionalized scattering points. The scattering layer 1203 and the scattering structure 12030 are collectively referred to as a scattering structure, which can be used separately or in combination. The optical waveguide component 1200 can also only include the optical waveguide body 1201 and the reflective layer 1202, and the scattering structure is uniformly doped in the optical waveguide body 1201 in the form of nanoparticles to achieve scattering. For example, scattering nanoparticles can be doped into an organic polymer material used to prepare the optical waveguide body, and the doped material (such as silica gel doped with scattering nanoparticles) can be molded to form an optical waveguide body that has scattering properties. In this case, the scattering structure can no longer be set separately. In some specific embodiments, the reflective layer can be prepared on the optical waveguide body by metal sputtering, thermal evaporation, etc., or by coating the optical waveguide body with metal particles or nanowires, including but not limited to silver paste, copper paste, silver nanowires, carbon nanowires, etc., dissolved in a solution method. The scattering layer can also be prepared by a solution method, firstly dispersing the nanoparticles uniformly in a matrix, which can be various organic macromolecular polymers or their precursors, and then coating them on the optical waveguide body and then curing them into shape.

[0204] In the optical waveguide component 1200, a series of channels 1204 are passed through from the scattering layer 1203 to the optical waveguide body 1201 and then to the reflective layer 1202. These channels allow gas and liquid to pass through. The diameter of the channel is between 1-2 mm, preferably between 0.2-1 mm, and more preferably between 0.2-0.5 mm. The shortest distance between the centers of the channels is between 2-10 mm, preferably between 2-5 mm. Since the channel is filled with air, its optical refractive index is 1.0, and the optical refractive index of the optical waveguide body 1201 is 1.45 and above, which is higher than that of air. Therefore, a part of the light inside the optical waveguide body will be totally reflected at the channel interface, which increases the uniformity of the light emitted by the optical waveguide body, while the other part of the light refracted from the channel can still reach the treatment site. Therefore, the reasonably arranged channels do not affect the phototherapy effect. The channels can be formed by wet etching, dry etching, and laser etching.

[0205] Figure 12b and 12c The structures of the other two optical waveguide components 1210 and 1220 are respectively given. Figure 12bThe cross-sectional view of the optical waveguide component 1210 in FIG. 1 shows that a down-conversion layer 1215 is further arranged between the optical waveguide body 1211 and the reflective layer 1212, and a scattering layer 1213 is arranged on the lower surface of the optical waveguide body 1211; Fig.12c The middle and lower conversion layer 1225 is arranged between the optical waveguide body 1221 and the scattering layer 1223, and the reflective layer 1222 is arranged on the upper surface of the optical waveguide body 1221. In both structures, the channels 1214 and 1224 penetrate all the film layers. The lower conversion layers 1215 and 1225 have an absorption peak and an emission peak, and their absorption peak is within the range of + / -20nm of the peak wavelength of the output light of the light source component, and their emission peak is within the range of +100nm and above of the peak wavelength of the output light of the light source component. Preferably, the emission peak of the lower conversion layers 1215 and 1225 is 600nm and above. The material of the lower conversion layers 1215 and 1225 may include but is not limited to fluorescent materials, perovskite materials, quantum dot materials, organic small molecule luminescent materials, graphene, etc.

[0206] Fig.12d Another cross-sectional schematic diagram of an optical waveguide component 1230 with a down-conversion layer is provided. In this case, the down-conversion layer 1235 is arranged between the scattering layer 1233 and the part to be treated. In order to ensure that the down-conversion layer 1235 is not invaded by water and oxygen, an encapsulation layer 1236 is also required to be arranged between the down-conversion layer 1235 and the part to be treated (i.e., on the side of the down-conversion layer 1235 away from the optical waveguide body 1231). The reflective layer 1232 is arranged on the upper surface of the optical waveguide body 1231. The channels 1234 all penetrate all the film layers. The down-conversion layer 1235 can also be prepared by a solution method, where the down-conversion material is dissolved in a solvent and then coated on one side of the optical waveguide component, and then cured into a film. In another embodiment, the down-conversion material, such as a granular material such as quantum dots and perovskites or a soluble material such as an organic small molecule, can also be doped into an optical waveguide component (such as an optical waveguide body) to directly realize down-conversion inside the optical waveguide component (not shown in the figure). The entire optical waveguide component and other film layers can be prepared and cured by a solution method, and a layer of optical glue can be coated between different film layers for fixation. In another embodiment, the entire optical waveguide component and other film layers can be further integrated on a housing, and the film layers can be fixed together by a structural design on the housing.

[0207] Fig.13A top view of the thin film ultrasonic layer 1300 is given. The thin film ultrasonic layer 1300 includes a flexible substrate 1301, a flexible circuit 1303, an electrode 1304, and a channel 1305. A piezoelectric device 1302 is arranged on the flexible circuit, and the piezoelectric device is connected through the flexible circuit 1303. The flexible substrate 1301 can be an ultra-thin flexible glass, preferably a non-fragile material, including but not limited to plastic (PET, PEN, PI), silicone rubber, textiles, leather, paper, metal foil or a combination thereof. The preparation of the flexible circuit can be to coat a polyimide PI film on the copper foil in advance, press the treated copper foil on a glass sheet coated with PDMS, and treat it with ultraviolet ozone to improve the bonding strength. Use a laser system to accurately ablate the copper foil, carve out a circuit pattern, and transfer it to other flexible films as needed. For example, use a water-soluble glue to transfer the engraved circuit pattern to a flexible silicone rubber material. After removing the tape, use a flux to clean the surface oxide to ensure that the subsequent welding is firm. Subsequently, the circuit is connected to the upper and lower electrodes by solder paste, and then the glass sheet is peeled off. In order to protect the circuit and the device, the circuit can be flexibly encapsulated. The encapsulation layer can be an ultra-thin glass adhered to the device using UV curing glue. Preferably, the flexible encapsulation layer is a thin film encapsulation layer, and the thickness is usually above 5μm, such as a single-layer inorganic film, or a multilayer structure of alternating organic and inorganic films, formed by PECVD, ALD, printing, spin coating, etc., or silicone rubber, etc. Preferably, it is silicone rubber, which is a soft and stretchable elastomeric material suitable for matching with stretchable circuits. Its flexible properties allow the device to maintain structural integrity and functional stability when bent or stretched. To eliminate the gap at the encapsulation interface, an additional layer of Silbione (Silbione is a high-performance medical-grade silicon-based material) can be spin-coated on the surface of the device with a thickness ranging from 5μm to 20μm, thereby ensuring that the ultrasonic device can obtain a uniform sound field distribution without adding a medium during use. After the flexible circuit is completed, the piezoelectric device is aligned and placed in the corresponding area of ​​the flexible circuit, and the upper and lower electrodes of the piezoelectric device are connected to the corresponding wires of the flexible circuit using conductive glue (such as silver glue or conductive epoxy resin). The conductive glue can achieve conductivity and mechanical stability under low-temperature curing conditions.

[0208] In order to achieve ultrasonic beauty and effective introduction of nutrient solution, holes can be designed on the surface of the flexible ultrasonic device. The location of the holes should be away from the circuit wiring and welding points to avoid damaging the integrity and conductivity of the circuit. It is preferred to make holes in the blank area of ​​the flexible circuit where there are no electronic components or circuit wiring. The aperture should be moderate so that sufficient nutrient solution can be transmitted without excessively weakening the mechanical strength of the device. Generally, the aperture range can be selected from 20μm to 500μm, preferably 50μm to 200μm. The shape of the hole can be circular, elliptical or other regular patterns, preferably circular to reduce stress concentration.

[0209] In the multifunctional cosmetic phototherapy device disclosed in the present invention, since it involves a multi-layer structure, in which the OLED layer, the optical waveguide component or the negative pressure providing layer all have openings, the design of the channel is preferably to achieve alignment and overlap between the OLED layer or the optical waveguide component, the negative pressure providing layer and the flexible ultrasound layer to ensure the continuity and efficiency of the liquid channel while avoiding negative impacts on the performance of the device. High-precision laser ablation or plasma etching technology can be used to simultaneously process multiple layers of channels to ensure accurate alignment of the channels in each layer.

[0210] The multifunctional beauty phototherapy device of the present invention can flexibly adapt to different usage scenarios and body parts, and can be easily worn without restriction, whether the user is performing facial care, neck treatment, or beauty phototherapy of other body parts. This degree of freedom is reflected in the following aspects:

[0211] Flexible design: Since the device uses flexible materials, such as flexible substrates and optical waveguide components, these components can be easily bent and adjusted according to the different parts of the body. The shape of the device can naturally fit the skin surface, whether it is the face, neck, arms or other parts of the body, it can accurately fit and ensure good treatment effects.

[0212] Hands-free operation: The hands-free design of the device allows users to move freely without having to hold their hands in a certain position or support the device for a long time. This means that users can easily wear the device while reading, watching TV or doing other activities without having to free up their hands.

[0213] Adjustable fit: The design takes into account the needs of different users, and the device provides flexible adjustment functions. For example, the flexible optical waveguide component can be fine-tuned according to the facial contour or body curve to ensure that the device always fits closely to the skin and optimizes the treatment effect. At the same time, the wearing method of the device (such as headband, fitting strap, etc.) can be adjusted according to the user's body shape and comfort, further increasing the freedom of wearing.

[0214] Applicable to multiple parts: Through flexible design, the device is not only suitable for the face, but can also be used to treat other areas such as the neck and hands. This cross-part applicability allows the device to be freely worn according to personal needs, greatly enhancing the freedom of use.

[0215] Convenient disassembly and storage: Due to its simple and lightweight design, users can easily disassemble and store it, making it easy to use in different scenarios. Whether it is used at home or carried out, it can be easily stored without worrying about taking up too much space.

[0216] It should be understood that the various embodiments described herein are only examples and are not intended to limit the scope of the present invention. Therefore, as will be apparent to those skilled in the art, the claimed invention may include variations of the specific embodiments and preferred embodiments described herein. Many of the materials and structures described herein may be replaced with other materials and structures without departing from the spirit of the present invention. It should be understood that the various theories about why the present invention works are not intended to be restrictive.

Claims

1. A multifunctional beauty phototherapy device, comprising: a thin film ultrasound layer, a light-emitting component, a negative pressure providing layer and an electric driving device; The light emitting assembly comprises a light source component; The light source component comprises a point light source component or a surface light source component; The light emitting component and the thin film ultrasonic layer share a layer, and the layer is a common layer; The light-emitting component has at least one light-emitting surface, and the light-emitting area of ​​the light-emitting surface is not less than 5cm 2 ; The light emitting assembly is electrically connected to the electric drive device; At least one hole, the at least one hole passing through the light-emitting component and the thin film ultrasound layer; The negative pressure imparting layer is arranged on a side of the thin film ultrasonic layer away from the light emitting direction of the light emitting component.

2. The multifunctional beauty phototherapy device according to claim 1, characterized in that: The light source component is a point light source component, and the light source component further includes an optical waveguide component. The optical waveguide component is planar and has at least one light-emitting surface, and the common layer is a part of the optical waveguide component.

3. The multifunctional beauty phototherapy device according to claim 2, characterized in that: The point light source component is disposed at an edge or both sides of the optical waveguide component.

4. The multifunctional beauty phototherapy device according to claim 2, characterized in that: The optical waveguide component further includes a reflective layer, which is disposed on a side of the optical waveguide component close to the thin film ultrasonic layer.

5. The multifunctional beauty phototherapy device according to claim 1, characterized in that: The light source component is a surface light source component, the surface light source component comprises at least one flexible OLED light-emitting panel, the flexible OLED light-emitting panel has at least one light-emitting surface, and the common layer is a part of the flexible OLED light-emitting panel.

6. The multifunctional beauty phototherapy device according to claim 1, characterized in that: The light emitted by the light source component has at least one peak wavelength in the range of 400-1400nm; preferably, the light emitted by the light source component has at least 2 peak wavelengths, and the peak wavelengths of the light emitted by the light source component differ by 50nm or more.

7. The multifunctional beauty phototherapy device according to claim 1, characterized in that: The vibration frequency of the thin film ultrasonic layer ranges from 20kHz to 1MHz; Preferably, the vibration frequency of the thin film ultrasonic layer ranges from 20kHz to 100kHz; More preferably, the vibration frequency of the thin film ultrasonic layer ranges from 100 kHz to 500 kHz.

8. The multifunctional beauty phototherapy device according to claim 1, characterized in that: The thin film ultrasound layer further includes a piezoelectric device and a metal wire, and the piezoelectric device and the metal wire are arranged on a common layer.

9. The multifunctional beauty phototherapy device according to claim 5, characterized in that: The common layer is a flexible substrate or encapsulation layer of a flexible OLED light-emitting panel; preferably, the common layer is a flexible film.

10. The multifunctional beauty phototherapy device according to claim 1, characterized in that: The electric drive device further includes a heating module.

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