Gas treatment device
By designing a gas treatment device including the main body cavity, the air intake part and the buffer chamber, the problem of low gas treatment efficiency in the prior art is solved, effective filtration and purification of gas is realized, and environmental and human health is protected.
Patent Information
- Application Number
- CN202510111894.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-24
- Publication Date
- 2025-05-06
AI Technical Summary
In the prior art, it is difficult for gas treatment devices to effectively filter and purify polluted gases emitted by factories, affecting the environment and human health.
A gas treatment device is designed, including a main body inner cavity for filtering the gas, and the intake part consists of first and second air intake ports for inleting nitrogen or argon, and gas mixing and filtering through the buffer chamber and the filter.
Through the design of this device, it can effectively filter and purify gas, improve the uniformity and filtration efficiency of exhaust gas, reduce gas residue, and protect the environment and human health.
Smart Images
Figure CN119926087A_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the field of environmental protection equipment, and more specifically, to a gas processing device. Background Art
[0002] With the rapid development of science and technology, the demand for various working equipment in the fields of material science, electronic engineering, optical manufacturing, etc. is increasing, and the gases discharged from these equipment will have an impact on the environment and human health. Therefore, the present application proposes an improved gas treatment device. Summary of the invention
[0003] One of the objectives of the present application is to provide a gas processing device to solve at least one problem existing in the prior art.
[0004] According to the first aspect of the present application, a gas processing device includes: a main body, which is provided with an inner cavity inside, for filtering gas; an air inlet part, which is located at one end of the main body and is used to allow gas to enter, and the air inlet part includes a first air inlet port and a second air inlet port; and an air outlet part, which is located at the other end of the main body and is used to discharge the filtered gas.
[0005] In some embodiments, at least one of the first gas inlet and the second gas inlet is used to introduce nitrogen gas or argon gas.
[0006] In some embodiments, the air intake portion further includes a buffer chamber.
[0007] In some embodiments, the buffer chamber and the inner cavity may be separated by a filter.
[0008] In some embodiments, the inner cavity is divided into a plurality of chambers by a plurality of partitions.
[0009] According to a second aspect of the present application, a gas processing device includes: a main body, which is provided with an inner cavity inside for filtering gas; an air inlet part, which is located at one end of the main body and is used to allow gas to enter, and the air inlet part includes an air inlet and a buffer chamber; and an air outlet part, which is located at the other end of the main body and is used to discharge the filtered gas.
[0010] According to a third aspect of the present application, a processing equipment comprises the aforementioned gas processing device.
[0011] The gas processing device proposed in this application can effectively filter the gas. BRIEF DESCRIPTION OF THE DRAWINGS
[0012] Figure 1 This is a schematic diagram of a gas processing device according to some embodiments of the present application.
[0013] Figure 2A and Figure 2B Schematic diagrams of two different air intake parts 110 .
[0014] Figure 3 Schematic diagram of a gas outlet 120 of a gas processing device according to some embodiments of the present application.
[0015] Figure 4 This is a schematic diagram of one end of a main body of a gas processing device according to some embodiments of the present application.
[0016] Figure 5 Schematic diagrams of gas processing devices according to other embodiments of the present application. DETAILED DESCRIPTION
[0017] The embodiments of the present application are described in detail below with reference to the accompanying drawings.
[0018] The following describes the implementation methods of the present application through specific examples, and those skilled in the art can easily understand other advantages and effects of the present application from the contents disclosed in this specification. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. The present application can also be implemented or applied through other different specific implementation methods, and the details in this specification can also be modified or changed in various ways based on different viewpoints and applications without departing from the spirit of the present application. It should be noted that, in the absence of conflict, the following embodiments and the features in the embodiments can be combined with each other. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in the field without making creative work belong to the scope of protection of the present application.
[0019] Embodiments of the present application will be described in detail below. Throughout the present application specification, as used herein, the terms "roughly", "substantially", "substantially" and "approximately" are used to describe and illustrate small changes. When used in conjunction with an event or situation, the term may refer to an example in which an event or situation occurs precisely and an example in which an event or situation occurs very approximately. For example, when used in conjunction with a numerical value, the term may refer to a range of variation of less than or equal to ±10% of the numerical value, such as less than or equal to ±5%, less than or equal to ±4%, less than or equal to ±3%, less than or equal to ±2%, less than or equal to ±1%, less than or equal to ±0.5%, less than or equal to ±0.1%, or less than or equal to ±0.05%. For example, two values may be considered “substantially” the same if the difference between them is less than or equal to ±10% of the average of the values (e.g., less than or equal to ±5%, less than or equal to ±4%, less than or equal to ±3%, less than or equal to ±2%, less than or equal to ±1%, less than or equal to ±0.5%, less than or equal to ±0.1%, or less than or equal to ±0.05%).
[0020] In this specification, unless otherwise specified or limited, relative terms such as "central", "longitudinal", "lateral", "front", "rear", "right", "left", "inner", "outer", "lower", "higher", "horizontal", "vertical", "above", "below", "above", "below", "top", "bottom" and their derivative terms (such as "horizontally", "downwardly", "upwardly", etc.) should be interpreted as referring to the directions described in the discussion or depicted in the drawings. These relative terms are only used for convenience of description and do not require that the present application be constructed or operated in a specific direction.
[0021] In addition, sometimes amounts, ratios and other numerical values are presented in range format herein. It should be understood that such range format is for convenience and brevity, and should be flexibly understood to include not only the numerical values explicitly specified as range limits, but also all individual numerical values or sub-ranges encompassed within the range, as if each numerical value and sub-range were explicitly specified.
[0022] Furthermore, for ease of description, “first”, “second”, “third”, etc. may be used herein to distinguish different components in one figure or a series of figures. “First”, “second”, “third”, etc. are not intended to describe the corresponding components.
[0023] In the embodiments of the present application, unless otherwise specified or limited, the terms "set", "connected", "coupled", "fixed" and similar terms are used broadly, and those skilled in the art may understand that the above terms may be, for example, fixed connection, detachable connection or integrated connection according to the specific circumstances; it may also be a mechanical connection or an electrical connection; it may also be a direct connection or an indirect connection through an intermediate structure; it may also be internal communication between two components.
[0024] Figure 1 This is a schematic diagram of a gas processing device according to some embodiments of the present application.
[0025] like Figure 1 As shown, a gas processing device includes a main body 100, which is provided with an inner cavity 130 inside for filtering gas; an air inlet part 110, which is located at one end of the main body 100 and is used to allow gas to enter, and the air inlet part 110 includes a first air inlet port 111 and a second air inlet port 112; and an air outlet part 120, which is located at the other end of the main body and is used to discharge the filtered gas.
[0026] The first gas entering through the first gas inlet and the second gas entering through the second gas inlet can pass into the inner cavity through cooperation to filter the gas.
[0027] In some embodiments, the first gas and the second gas may enter the gas inlet portion simultaneously from different directions, such as Figure 1 As shown, the first gas enters the air inlet along the direction d1, and the second gas enters the air inlet along the direction d2. The two gases interact with each other and are fully mixed before entering the inner cavity 130.
[0028] The first gas inlet 111 and the second gas inlet 112 can be arranged at relative positions in the gas inlet portion so that the first gas and the second gas can be fully mixed after entering the main body.
[0029] Figure 2A and Figure 2B Schematic diagrams of two different air intake parts 110 .
[0030] like Figure 2A As shown, in the top view of the air inlet section, the first air inlet 111 and the second air inlet 112 can be symmetrically arranged around the center P of the inner cavity of the air inlet section and located on the same straight line, so that the first gas enters the air inlet section along the direction d1 and the second gas enters the air inlet section along the direction d2, so that the two gases collide and collide in the inner cavity of the air inlet section, and are effectively mixed, and then enter the inner cavity 130 ( Figure 2A not shown).
[0031] like Figure 2B As shown, the first air inlet 111 and the second air inlet 112 can be staggered in the same direction along the circumferential tangent direction of the inner cavity of the air inlet portion, so that the first gas enters the air inlet portion along the direction d1 and the second gas enters the air inlet portion along the direction d2, so that the gas flows counterclockwise in the inner cavity of the air inlet portion, thereby generating a swirling flow, and effectively mixing after merging, and then enters the inner cavity 130 ( Figure 2B not shown).
[0032] According to some embodiments of the present application, the first gas may be waste gas, and the second gas may be nitrogen or argon. By setting the position of the gas inlet, the first gas and the second gas collide or swirl, and enter the inner cavity for filtration after mixing. The use of the second gas can improve the uniformity of the waste gas in the main body, so that the waste gas is fully filtered, and the inner cavity can be provided with a filling material for filtering the waste gas.
[0033] Figure 3 Schematic diagram of a gas outlet 120 of a gas processing device according to some embodiments of the present application.
[0034] In some embodiments, Figure 3As shown, the inner cavity 130 can be divided into multiple chambers by multiple partitions 131, so that the gas is evenly distributed in the inner cavity. Filling materials can be installed on the partitions to react with the exhaust gas to achieve the purpose of purifying the exhaust gas. The partitions in the inner cavity can be made of stainless steel; the partitions can also be made of filling materials, which can react with the exhaust gas to remove unnecessary substances in the exhaust gas.
[0035] In some embodiments, a filling material may be placed in the chamber, and the partition is used to separate the gas in the chamber.
[0036] Figure 4 This is a schematic diagram of one end of a main body of a gas processing device according to some embodiments of the present application.
[0037] In some embodiments, Figure 4 As shown, the air inlet 110 further includes a buffer chamber 101, so that the gas can be buffered before entering the inner cavity 130. The gas then enters the inner cavity 130 from the buffer chamber 101, which can increase the contact area between the gas and the inner cavity and make the filtration more complete.
[0038] In some embodiments, a filter screen may be provided between the inner cavity and the air inlet, so that the gas can be further buffered by the filter screen before entering the inner cavity, thereby forming a uniform air pressure, and allowing each portion of the gas passing through the through hole of the filter screen to enter the inner cavity at a uniform speed. The provision of the filter screen allows the gas in the buffer chamber to enter the inner cavity under pressure uniformly, so that the gas is evenly distributed in the inner cavity, and is discharged from the air outlet after filtration, thereby further reducing gas residue. For example, Figure 4 As shown, the buffer chamber 101 and the inner cavity 130 can be separated by the filter 102, so that the gas can enter the inner cavity evenly. The partition 131 in the inner cavity 103 can further make the gas uniformly transmitted in the inner cavity, so that the gas can fully interact with the filling material on the partition.
[0039] According to some embodiments of the present application, the air inlet portion 110 further includes a base 103 for supporting the buffer chamber 101 . The height of the base may be approximately 20-200 mm, but is not limited to this value and may be set according to specific requirements.
[0040] Some other embodiments of the present application also provide another gas processing device, which includes: a main body, which is provided with an inner cavity inside, for filtering gas; an air inlet part, which is located at one end of the main body and is used to allow gas to enter, and the air inlet part includes a third air inlet and a buffer chamber; and an air outlet part, which is located at the other end of the main body and is used to discharge the filtered gas.
[0041] Figure 5 Schematic diagrams of gas processing devices according to other embodiments of the present application.
[0042] like Figure 5 As shown, gas can enter from the air inlet 210 , be filtered through the inner cavity 230 , and then be discharged from the air outlet 220 .
[0043] and Figure 3 Similar to the structure shown, the inner cavity 230 can also be divided into multiple chambers by multiple partitions. The partitions in the inner cavity can be made of stainless steel and are used to divide the inner cavity into multiple chambers. The filling material is placed in the chamber so that the gas passes through the chamber and reacts with the filling material in the chamber to filter the gas, effectively increasing the action area of the gas and the filling material. The partition can also be made of filling material and can react with the exhaust gas to remove unnecessary substances in the exhaust gas.
[0044] and Figure 4 Similar to the structure shown, the air inlet 210 and the inner cavity 230 may also be separated by a filter. For example, the filter may be disposed between the inner cavity and the buffer chamber. The air inlet may also include a base.
[0045] In some embodiments, the air inlet may further include a fourth air inlet for introducing nitrogen or argon to act on the third gas entering through the third air inlet, and after mixing, enter the inner cavity for effective filtration.
[0046] Some further embodiments of the present application provide a processing device, which includes the aforementioned gas processing device. The processing device can be used for coating or etching processes.
[0047] The technical content and technical features of this application have been disclosed as above, but those skilled in the art may still make various substitutions and modifications based on the teachings and disclosures of this application without departing from the spirit of this application. Therefore, the protection scope of this application should not be limited to the contents disclosed in the embodiments, but should include various substitutions and modifications without departing from this application, and be covered by the claims of this application.
Claims
1. A gas processing device, comprising: A main body, wherein an inner cavity is provided inside the main body for filtering gas; an air inlet portion, located at one end of the main body and used for allowing gas to enter, the air inlet portion comprising a first air inlet and a second air inlet; and The gas outlet is located at the other end of the main body and is used to discharge the filtered gas. 2 . The gas processing device according to claim 1 , wherein at least one of the first gas inlet and the second gas inlet is used to introduce nitrogen gas or argon gas. The gas processing device according to claim 1 , wherein the gas inlet portion further comprises a buffer chamber. The gas processing device according to claim 3 , wherein the buffer chamber and the inner cavity are separated by a filter. The gas processing device according to claim 1 , wherein the inner cavity is divided into a plurality of chambers by a plurality of partitions.
6. A gas processing device, comprising: A main body, wherein an inner cavity is provided inside the main body for filtering gas; An air inlet portion, located at one end of the main body and used for allowing gas to enter, the air inlet portion comprising a third air inlet and a buffer chamber; as well as The gas outlet is located at the other end of the main body and is used to discharge the filtered gas. 7 . The gas processing device according to claim 6 , wherein the buffer chamber is separated from the inner cavity by a filter. The gas processing device according to claim 6 , wherein the inner cavity is divided into a plurality of chambers by a plurality of partitions. 9 . The gas processing device according to claim 6 , wherein the gas inlet portion comprises a fourth gas inlet. 10 . The gas processing device according to claim 9 , wherein the fourth gas inlet is used to introduce nitrogen gas or argon gas.