View field stitching method in charged particle beam system, electronic device and storage medium

Abstract

The invention discloses a field-of-view stitching method in a charged particle beam system, electronic equipment and a storage medium. The method comprises the following steps: constructing a first relation model between an optical navigation device and a magnetic deflection device under different working distances based on first calibration; performing resolution processing on the first image by using a preprocessing model so as to match a second image shot by the magnetic deflection device; forming a first view field switching point from the optical navigation device to the magnetic deflection device according to the first relation model and the matched first image and second image; constructing a second relation model between the magnetic deflection device and the electric deflection device based on the second calibration; forming a second view field switching point from the magnetic deflection device to the electric deflection device according to a second relation model; and performing corresponding view field compensation based on the first view field switching point and the second view field switching point. According to the scheme of the invention, non-inductive switching of image resolution in different modes can be realized, and the overall performance of the charged particle beam system is improved.

Description

Technical Field

[0001] The present application generally relates to the technical field of field of view stitching in a charged particle beam system, and more specifically to a method, electronic device and storage medium for stitching a field of view in a charged particle beam system. Background Art

[0002] As the performance requirements for charged particle beam systems in application scenarios such as scientific research and industrial inspection continue to increase, how to optimize the imaging function of charged particle beam systems and improve operational convenience has become a key issue. Existing charged particle beam systems mainly rely on magnetic deflection and electric deflection technologies to meet different imaging needs. Magnetic deflection can meet large-field requirements, allowing operators to observe a larger range of sample areas and obtain overall information; electric deflection can meet high-resolution requirements and clearly present the microscopic details of the sample. In actual operation, users often need to frequently switch imaging modes between different deflection modes or optical modes to achieve comprehensive observation from macro to micro.

[0003] For example, a system that can seamlessly switch from optical navigation images to scanning electron microscope images and achieve a senseless switching of image resolution from hundreds of millimeters to a few nanometers is of great significance for improving the convenience of operation and imaging quality of charged particle beam systems. Such a system allows users to quickly transition from macroscopic overview to microscopic detail observation without complicated mode switching operations during operation, greatly improving work efficiency. At the same time, in terms of imaging quality, senseless switching can avoid the loss or dislocation of image information caused by resolution jumps, ensuring the integrity and accuracy of the image. However, the prior art lacks an effective method to achieve seamless switching between optical navigation images and scanning electron microscope images and continuous adjustment of resolution. This leads to problems such as difficulty in image splicing and resolution mismatch when switching from optical navigation images to scanning electron microscope images, making it impossible for users to accurately match the sample position determined in the optical navigation with the scanning electron microscope image; when switching between different deflection scanning modes, the center position of the image is prone to offset, and the angle is difficult to accurately calibrate, which seriously affects the observation and analysis results.

[0004] In view of this, there is an urgent need to provide a solution for field of view stitching in a charged particle beam system, so as to achieve seamless switching of image resolution in different modes and improve the overall performance of the charged particle beam system. Summary of the invention

[0005] In order to at least solve one or more of the technical problems mentioned above, the present application proposes a solution for field of view stitching in a charged particle beam system in multiple aspects.

[0006] In a first aspect, the present application provides a method for field of view stitching in a charged particle beam system, wherein the charged particle beam system includes an optical navigation device, a magnetic deflection device and an electric deflection device, and the method includes: based on a first calibration, constructing a first relationship model between the optical navigation device and the magnetic deflection device at different working distances; using a preprocessing model to perform resolution processing on a first image taken by the optical navigation device to match a second image taken by the magnetic deflection device; forming a first field of view switching point from the optical navigation device to the magnetic deflection device according to the first relationship model, the matched first image and the second image; based on a second calibration, constructing a second relationship model between the magnetic deflection device and the electric deflection device; forming a second field of view switching point from the magnetic deflection device to the electric deflection device according to the second relationship model; performing corresponding field of view compensation based on the first field of view switching point and the second field of view switching point to achieve field of view stitching in the charged particle beam system.

[0007] In one embodiment, the first calibration is performed by the following operations: moving the sample stage, wherein the first target and the second target are marked on the sample stage, and the first target is located at the center of the sample stage; using the optical navigation device to capture multiple first images of the sample stage to calibrate the distance relationship between the first image and the sample stage; based on the distance relationship and using the magnetic deflection device to capture a second image of the sample stage at the target working distance, to calibrate the angular relationship between the first image and the second image at the target working distance.

[0008] In another embodiment, using the optical navigation device to capture multiple first images of the sample stage to calibrate the distance relationship between the first image and the sample stage includes: acquiring the actual position of the sample stage corresponding to each of the first images; calculating the moving distance of the first target and the second target on the corresponding first image; and determining a distance matrix based on the actual position and the moving distance to calibrate the distance relationship between the first image and the sample stage.

[0009] In another embodiment, based on the distance relationship and using the magnetic deflection device to capture a second image of the sample stage at the target working distance to calibrate the angular relationship between the first image and the second image at the target working distance includes: determining a first position of the first target and the second target on the first image at the target working distance based on the distance relationship; acquiring a second position of the first target and the second target on the second image at the target working distance; and calibrating the angular relationship between the first image and the second image at the target working distance based on the first position and the second position.

[0010] In another embodiment, constructing a first relationship model between the optical navigation device and the magnetic deflection device at different working distances based on a first calibration includes: moving the sample stage to calculate the angular deviation of a second image taken by the magnetic deflection device at different working distances; determining the relative angular difference between the optical navigation device and the magnetic deflection device based on the angular relationship of the first calibration and the angular deviation to construct the first relationship model between the optical navigation device and the magnetic deflection device at different working distances.

[0011] In another embodiment, moving the sample stage and calculating the angular deviation of the second image taken by the magnetic deflection device at different working distances includes: moving the sample stage and calculating the image deviation of the second image taken by the magnetic deflection device at the target feature area before and after the working distance is changed; adjusting the deflector of the magnetic deflection device according to the image deviation and a preset threshold until the image deviation is less than the preset threshold, and obtaining a corresponding deflection angle to calculate the angular deviation of the second image taken by the magnetic deflection device at different working distances.

[0012] In another embodiment, the preprocessing model includes a downsampling module and an upsampling module, and using the preprocessing model to perform resolution processing on the first image taken by the optical navigation device includes: using the downsampling module to perform a downsampling operation on the first image taken by the optical navigation device to obtain downsampling features; using the upsampling module to perform an upsampling operation on the downsampling features, and fusing the corresponding downsampling features in the upsampling operation to obtain upsampling features; and superimposing the final upsampling features with the first image to obtain a target image, so as to perform resolution processing on the first image taken by the optical navigation device.

[0013] In another embodiment, the preprocessing model is a Restormer model.

[0014] In another embodiment, constructing a second relationship model between the magnetic deflection device and the electric deflection device based on the second calibration includes: calculating a magnification and an angle difference between a deflector of the magnetic deflection device and a deflector of the electric deflection device based on the second calibration to construct the second relationship model between the magnetic deflection device and the electric deflection device.

[0015] In another embodiment, based on the second calibration, calculating the magnification and the angle difference between the deflector of the magnetic deflection device and the deflector of the electric deflection device comprises: identifying a first grid number and a second grid number corresponding to calibration samples under the magnetic deflection device and the electric deflection device, respectively; adjusting the amplification gain multiple of the deflector of the magnetic deflection device so that the first grid number is consistent with the second grid number, so as to calculate the magnification between the deflector of the magnetic deflection device and the deflector of the electric deflection device; identifying the angle deviation between the grids corresponding to the magnetic deflection device and the electric deflection device under the magnification, so as to calculate the angle difference between the deflector of the magnetic deflection device and the deflector of the electric deflection device.

[0016] In another embodiment, it also includes: setting a third field of view switching point and a fourth field of view switching point; performing corresponding field of view compensation based on the first field of view switching point, the second field of view switching point, the third field of view switching point and the fourth field of view switching point to achieve field of view stitching in the charged particle beam system.

[0017] In another embodiment, the third field of view switching point and the fourth field of view switching point are reverse field of view switching of the first field of view switching point and the second field of view switching point.

[0018] In a second aspect, the present application provides an electronic device, comprising: a processor; and a memory, wherein program instructions for field of view stitching in a charged particle beam system are stored, and when the program instructions are executed by the processor, the electronic device implements one or more embodiments of the aforementioned first aspect.

[0019] In a third aspect, the present application provides a computer-readable storage medium having stored thereon computer-readable instructions for field of view stitching in a charged particle beam system, wherein when the computer-readable instructions are executed by one or more processors, one or more embodiments of the aforementioned first aspect are implemented.

[0020] Through the scheme for stitching the field of view in the charged particle beam system provided above, the embodiment of the present application constructs the first relationship model between the optical navigation device and the magnetic deflection device, the second relationship model between the magnetic deflection device and the electric deflection device through calibration, and performs resolution processing on the first image taken by the optical navigation device to match the second image taken by the magnetic deflection device, thereby completing the gap between the optical navigation device and the magnetic and electric deflection scanning. The first field of view switching point and the second field of view switching point are formed through the aforementioned calibration, and the corresponding field of view compensation is performed at the corresponding field of view switching point, so that the stitching angle of the navigation camera and the magnetic and electric deflection scanning is accurate, the image stitching accuracy is guaranteed, and the angle deviation or misalignment after the image stitching is avoided, providing an accurate image basis for subsequent analysis, realizing the senseless switching of image resolution in different modes, and improving the overall performance of the charged particle beam system. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] By reading the detailed description below with reference to the accompanying drawings, the above and other purposes, features and advantages of the exemplary embodiments of the present application will become easy to understand. In the accompanying drawings, several embodiments of the present application are shown in an exemplary and non-limiting manner, and the same or corresponding reference numerals represent the same or corresponding parts, wherein: Figure 1 is an exemplary schematic diagram showing image switching in a charged particle beam system; Figure 2 is an exemplary flowchart showing a method for field of view stitching in a charged particle beam system according to an embodiment of the present application; Figure 3 is an exemplary schematic diagram showing a sample stage for performing a first calibration according to an embodiment of the present application; Figure 4 is an exemplary schematic diagram showing the use of an optical navigation device to photograph a sample stage according to an embodiment of the present application; Figure 5 is an exemplary schematic diagram showing respective recognition targets on a first image and a second image according to an embodiment of the present application; Figure 6 is an exemplary flowchart showing the establishment of angle relationships at different working distances according to an embodiment of the present application; Figure 7 is an exemplary schematic diagram showing the angle relationship at different working distances according to an embodiment of the present application; Figure 8 is an exemplary schematic diagram showing resolution processing of a first image captured by an optical navigation device according to an embodiment of the present application; Fig. 9 is an exemplary flowchart showing calculation of the amplification gain multiple and the angle difference of two deflectors according to an embodiment of the present application; Fig.10is an exemplary schematic diagram of an identification sample grid according to an embodiment of the present application; Fig.11 is an exemplary schematic diagram of image switching with increasing field of view switching points according to an embodiment of the present application; Fig.12 is a block diagram showing an exemplary structure of an electronic device according to an embodiment of the present application. DETAILED DESCRIPTION

[0022] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work are within the scope of protection of the present application.

[0023] It should be understood that the terms "include" and "comprising" used in the specification and claims of the present application indicate the presence of described features, wholes, steps, operations, elements and / or components, but do not exclude the presence or addition of one or more other features, wholes, steps, operations, elements, components and / or collections thereof.

[0024] It should also be understood that the terms used in this application specification are only for the purpose of describing specific embodiments and are not intended to limit the present application. As used in this application specification and claims, unless the context clearly indicates otherwise, the singular forms of "a", "an" and "the" are intended to include plural forms. It should also be further understood that the term "and / or" used in this application specification and claims refers to any combination of one or more of the associated listed items and all possible combinations, and includes these combinations.

[0025] As used in this specification and claims, the term "if" can be interpreted as "when" or "upon" or "in response to determining" or "in response to detecting," depending on the context. Similarly, the phrases "if it is determined" or "if [described condition or event] is detected" can be interpreted as meaning "upon determination" or "in response to determining" or "upon detection of [described condition or event]" or "in response to detecting [described condition or event]," depending on the context.

[0026] Figure 1 FIG. 1 is an exemplary schematic diagram showing image switching in a charged particle beam system. Figure 1As shown in , the charged particle beam system may include an optical navigation device (corresponding to OM), a magnetic deflection device (corresponding to magnetic deflection) and an electric deflection device (corresponding to electric deflection), wherein the magnetic deflection device and the electric deflection device are combined into a magneto-electric composite scanning deflection focusing system, such as a scanning electron microscope. In actual application scenarios, the entire switching process can be divided into two sections, the first section is the switching of the optical navigation device to the magnetic deflection device, i.e., OM→magnetic. The second section is the switching of the magnetic deflection device to the electric deflection device, i.e., magnetic→electric. According to the description of the background technology, when switching from the optical navigation image to the scanning electron microscope image, there are often problems of image stitching difficulties and resolution mismatch, which makes it impossible for the user to accurately match the sample position determined in the optical navigation with the scanning electron microscope image. In addition, when switching from the magnetic deflection device to the electric deflection device, the center position of the image is prone to offset, and the angle is difficult to accurately calibrate, which seriously affects the observation and analysis results. The prior art lacks an effective method to achieve seamless switching between optical navigation images and scanning electron microscope images and continuous adjustment of resolution.

[0027] As mentioned above, the charged particle beam system may include an optical navigation device, a magnetic deflection device, and an electric deflection device. In some embodiments, the optical navigation device may include a navigation lens and an industrial camera. In the implementation scenario, in order to ensure that the optical navigation image can be spliced ​​with the magnetic and electric deflection images, the optical navigation device must first be selected to adapt to the magnetic deflection device and the electric deflection device. For example, the theoretical resolution of the optical navigation device needs to reach 30um, so that the image of the optical navigation device can match the image of the magnetic deflection device and the electric deflection device under the application conditions after cropping and super-resolution algorithm.

[0028] In addition, the field of view ("FOV") of the optical navigation device needs to meet the needs of users to view and find samples. Specifically, the FOV should at least cover the area where the entire sample tray is located. It can be understood that when the size and pixels of the camera's photosensitive element are fixed, a larger FOV means a larger pixel point and a lower resolution, so the FOV needs to be appropriate and not too large. In addition, try to ensure that the image resolution of the navigation lens is the same as the resolution of the industrial camera chip (CMOS / CCD), that is, the pixel size is the same.

[0029] Based on the above requirements, we can use the geometric optics formula: , and Calculate relevant parameters to select the optical navigation device, where represents the image distance, l represents the object distance, represents the focal length of the lens, θ represents the field of view angle, β represents the vertical axis magnification, Represents image height, and y represents object height. That is, after clarifying the object height y, object distance l and object resolution required by the navigation camera, the required field of view can be calculated, or the object resolution can be calculated based on the pixel size to see if it meets the requirements. For example, a 1 / 1.7” CMOS chip, a target size of 5.7mm, and an object height of 90mm, can be calculated according to the above formula to obtain a vertical axis magnification of 1 / 15.8; the pixel y' is 1.85um, and the object resolution is calculated to be 29.2um (1.85×15.8), which meets the object resolution requirement of 30um. Therefore, after clarifying the requirements for object height, object distance, and object resolution parameters, the navigation camera can be selected accordingly based on the parameters such as field of view angle, pixel size, focal length, etc. calculated using the above geometric optics related formulas.

[0030] In other embodiments, the magnetic deflection device and the electric deflection device each include a corresponding deflector. The electric deflection device is implemented by an electrostatic deflector, which includes a plurality of metal electrodes that are not connected to each other and are distributed on the same cylindrical surface. The basic principle is to control the deflection of the electron beam by applying a voltage signal to the pole piece. To achieve this effect, the size arrangement and excitation voltage distribution of the deflector electrodes conform to a specific rule to generate a nearly uniform dipolar deflection electric field of a specific intensity inside the cylindrical surface.

[0031] The magnetic deflection device is realized by an electromagnetic deflector, which refers to a number of electromagnetic coils distributed symmetrically along an axis. The basic principle is to control the deflection of the electron beam by applying a current signal to the coil. To achieve this effect, the coil shape may be rectangular, saddle-shaped or ring-shaped, and its structure may be hollow or with an iron core, in order to generate an approximately uniform secondary deflection electric field that meets a specific strength inside the electromagnetic deflector.

[0032] In other embodiments, the charged particle beam system may also include, for example, an electron lens, which is an electrostatic or electromagnetic lens having a circularly symmetrical structure and used to converge the electron beam. In the implementation scenario, several groups of electrostatic deflectors, several groups of electromagnetic deflectors, and several groups of electron lenses are coaxially distributed at specific positions along the main axis of the electron beam or ion beam. When the user changes the magnification (that is, increases the field of view), the deflector and the lens will automatically switch the combination mode, that is, control the on and off of the scanning excitation signal on each group of deflectors and the on and off of the excitation signal on the electron lens.

[0033] For example, when the magnification is the lowest (that is, when the field of view is the largest), the charged particle beam system of the embodiment of the present application will use a higher position lens and a magnetic deflector to form a set of rear-mirror deflection system; when the magnification is the highest (that is, when the field of view is the smallest), the charged particle beam system of the embodiment of the present application will use a lower position lens and an electrostatic deflector to form a set of double-mirror front deflection system or mirror inner deflection system, at this time, the overall aberration of the system is the smallest, the resolution is the highest, and the scanning speed is the fastest. Between the above two situations, there are also several other combinations of deflectors and lenses, each of which corresponds to the best imaging conditions within a certain field of view, and these field of view ranges overlap with each other.

[0034] Due to the limitations of mechanical structure and imaging conditions, images under different deflector and objective lens combinations may have differences in angle or center position. At the same time, there may be differences in angle and center position between the optical navigation map and the electron microscope image. Select appropriate field of view stitching points, switch to different usage conditions, and use image recognition and processing algorithms to correct and align images under different conditions by changing parameters such as scanning direction and sample stage position, so as to achieve seamless switching from large field of view to high speed and high resolution. Similarly, seamless switching from optical navigation map to electron microscope image can also be achieved.

[0035] Based on this, the present application provides a method for field of view stitching in a charged particle beam system, which can achieve seamless switching of image resolution in different modes and improve the overall performance of the charged particle beam system.

[0036] The specific implementation of the present application is described in detail below with reference to the accompanying drawings.

[0037] Figure 2 FIG. 2 is an exemplary flow chart showing a method 200 for stitching a field of view in a charged particle beam system according to an embodiment of the present application. Figure 2 As shown in, method 200 includes step S201: based on a first calibration, constructing a first relationship model between the optical navigation device and the magnetic deflection device at different working distances; step S202: using a preprocessing model to perform resolution processing on the first image taken by the optical navigation device to match the second image taken by the magnetic deflection device; step S203: forming a first field of view switching point from the optical navigation device to the magnetic deflection device according to the first relationship model, the matched first image and the second image; step S204: based on a second calibration, constructing a second relationship model between the magnetic deflection device and the electric deflection device; step S205: forming a second field of view switching point from the magnetic deflection device to the electric deflection device according to the second relationship model; step S206: performing corresponding field of view compensation based on the first field of view switching point and the second field of view switching point to achieve field of view stitching in the charged particle beam system.

[0038] First, at step S201, based on the first calibration, a first relationship model between the optical navigation device and the magnetic deflection device at different working distances is constructed. It can be understood that due to different objective lens excitations at different working distances, there will be an angle difference between the first image of the optical navigation device and the second image taken by the magnetic deflection device; or the second image taken by the magnetic deflection device has a rotation angle. Therefore, by establishing the first relationship model between the optical navigation device and the magnetic deflection device through the first calibration, the existing angle difference can be determined, so that the angle difference can be compensated by adjusting the working distance when the field of view is stitched, so as to achieve field of view stitching. In some embodiments, the first calibration can be performed by the following operations: moving the sample stage, wherein the first target and the second target are marked on the sample stage, and the first target is located at the center of the sample stage. Next, a plurality of first images of the sample stage are taken using an optical navigation device to calibrate the distance relationship between the first image and the sample stage, and then based on the distance relationship and using a magnetic deflection device to take a second image of the sample stage at the target working distance, the angle relationship between the first image and the second image at the target working distance is calibrated. That is, the distance relationship between the first image and the sample stage is first determined by taking a photo using an optical navigation device, and then the angle relationship between the first image and the second image at the target working distance is calibrated in combination with the magnetic deflection device taking a photo and the distance relationship.

[0039] In some implementation scenarios, the aforementioned first target and second target may include but are not limited to a sample of a circle or other features, and the first target is located at the center of the sample stage, and the second target may be located near the first target. When the sample stage is moved and multiple first images of the sample stage are captured using an optical navigation device, it may be selected to capture the corresponding first image when the sample stage is in the original position (not moved), to capture the corresponding first image when the sample stage is moved along the x-axis direction, and to capture the corresponding first image when the sample stage is moved along the y-axis direction.

[0040] In some embodiments, the actual position of the sample stage corresponding to each first image can be obtained to calculate the moving distance of the first target and the second target on the corresponding first image, and then a distance matrix can be determined according to the actual position and the moving distance to calibrate the distance relationship between the first image and the sample stage. As an example, suppose the matrix composed of the actual position of the sample stage corresponding to the three first images is , the matrix composed of the moving distances of the first and second targets on the first image is In this case, it can be based on Calculate the distance matrix , to calibrate the distance relationship between the first image and the sample stage.

[0041] In some embodiments, the first position of the first target and the second target on the first image at the target working distance can be determined based on the distance relationship, and then the second position of the first target and the second target on the second image at the target working distance is obtained, and the angle relationship between the first image and the second image at the target working distance is calibrated according to the first position and the second position. In the implementation scenario, the working distance corresponds to the distance between the electron beam source and the sample stage, so that the actual position S of the sample stage at the target working distance can be determined. By combining the above distance relationship , the first positions of the first target and the second target on the first image at the target working distance can be obtained. For example, the first positions of the first target and the second target on the first image at the target working distance are recorded as (x'1, y'1) and (x'2, y'2) respectively.

[0042] Further, the second positions of the first target and the second target on the second image at the target working distance are obtained, for example, recorded as (x1, y1) and (x2, y2) respectively. In this scenario, the angular relationship between the first image and the second image at the target working distance can be calibrated by polar coordinates. ,in . Thus, the aforementioned first calibration is completed.

[0043] In some embodiments, the sample stage is moved, the angle deviation of the second image captured by the magnetic deflection device at different working distances is calculated, and the relative angle difference between the optical navigation device and the magnetic deflection device is determined based on the first calibrated angle relationship and the angle deviation, so as to construct a first relationship model between the optical navigation device and the magnetic deflection device at different working distances. More specifically, in some embodiments, the sample stage is moved, the image deviation of the second image captured by the magnetic deflection device at the target feature area before and after the working distance is changed is calculated, and the deflector of the magnetic deflection device is adjusted according to the image deviation and a preset threshold until the image deviation is less than the preset threshold, and the corresponding deflection angle is obtained to calculate the angle deviation of the second image captured by the magnetic deflection device at different working distances.

[0044] It can be understood that when the user actually uses it, it is necessary to move the sample stage to different positions along the Z axis (direction of the electron beam), and the corresponding working distances are also different, thereby establishing the angle relationship at different working distances. As an example, calibrate the angles at multiple working distances, such as calibrating the angles between 5mm-50mm, with each 5mm being a calibration point, and select a target feature area (such as a solder ball sample). By moving the sample stage, matching the images before and after the movement, and continuously iterating until the image deviation before and after the movement is less than the preset threshold, the current deflection angle is calculated. Then transform the next calibration point, calculate the current deflection angle using the same method, and finally fit the calibration point and angle into a curve relationship, that is, the angle deviation. Combined with the aforementioned angle relationship based on the first calibration, the relative angle difference can be obtained. More details about constructing the first relationship model between the optical navigation device and the magnetic deflection device at different working distances based on the first calibration will be discussed later in conjunction with Figure 3-Figure 7 Detailed description.

[0045] Next, at step S202, the preprocessing model is used to process the resolution of the first image taken by the optical navigation device to match the second image taken by the magnetic deflection device. Based on this, the pixel size of the first image taken by the optical navigation device and the second image taken by the magnetic deflection device can be stitched in the field of view by super-resolution.

[0046] In some embodiments, the preprocessing model may include a downsampling module and an upsampling module, firstly, downsampling the first image captured by the optical navigation device is performed using the downsampling module to obtain downsampling features, then upsampling the downsampling features using the upsampling module, and fusing the corresponding downsampling features in the upsampling operation to obtain upsampling features, and the final upsampling features are superimposed on the first image to obtain a target image, so as to perform resolution processing on the first image captured by the optical navigation device. In some embodiments, the preprocessing model may be, for example, a Restormer model.

[0047] In some implementation scenarios, the downsampling module may include a convolution layer and a transformer layer, and the upsampling module may include a transformer layer, a feature fusion layer, and a deconvolution layer. In other implementation scenarios, the upsampling module may also include a feedforward network (such as GDFN) and an attention layer (such as MDTA). In other implementation scenarios, before the first image is input into the preprocessing model, the first image may be subjected to preprocessing operations such as image cropping and image resizing. More details about resolution processing will be discussed later in conjunction with Figure 8 Detailed description.

[0048] Further, at step S203, a first field of view switching point from the optical navigation device to the magnetic deflection device is formed according to the first relationship model, the matched first image and the second image. That is, the first field of view switching from the optical navigation device to the magnetic deflection device can be achieved according to the first relationship model, the matched first image and the second image.

[0049] At step S204, based on the second calibration, a second relationship model between the magnetic deflection device and the electric deflection device is constructed. In some embodiments, the magnification and angle difference between the deflector of the magnetic deflection device and the deflector of the electric deflection device are calculated to construct the second relationship model between the magnetic deflection device and the electric deflection device.

[0050] More specifically, in some embodiments, the first grid number and the second grid number corresponding to the calibration sample under the magnetic deflection device and the electric deflection device are respectively identified, and the amplification gain multiple of the deflector of the magnetic deflection device is adjusted so that the first grid number is consistent with the second grid number, so as to calculate the amplification multiple between the deflector of the magnetic deflection device and the deflector of the electric deflection device. Further, the angle deviation between the grids corresponding to the magnetic deflection device and the electric deflection device under the amplification multiple is identified, so as to calculate the angle difference between the deflector of the magnetic deflection device and the deflector of the electric deflection device.

[0051] It can be understood that there is a linear relationship between the field of view size and the amplification gain of the deflector. Therefore, according to the multiple values ​​of the actual field of view size of the magnetic deflection device and the electric deflection device, the corresponding multiple of the amplification gain of the deflector can be adjusted to keep the field of view of the two deflectors consistent. At the same time, the grid deflection angle is identified, so as to calculate the angle deviation of the two deflectors to construct a second relationship model between the magnetic deflection device and the electric deflection device. More details about the construction of the second relationship model will be combined later. Fig. 9 and Fig.10 Detailed description.

[0052] Further, at step S205, a second field of view switching point from the magnetic deflection device to the electric deflection device is formed according to the second relationship model. That is, the second field of view switching from the magnetic deflection device to the electric deflection device can be achieved according to the second relationship model. Finally, at step S206, corresponding field of view compensation is performed based on the first field of view switching point and the second field of view switching point to achieve field of view stitching in the charged particle beam system.

[0053] Specifically, according to the relative angle difference, magnification, and angle deviation determined by the first relationship model and the second relationship model at the first field of view switching point and the second field of view switching point, the deflector is automatically switched at the switching point by increasing or decreasing the magnification when in use, so as to realize the senseless magnification from the millimeter-level field of view to the nanometer-level field of view. In the first field of view switching point, the first image is also subjected to resolution processing to obtain a super-resolution image in the super-resolution area (such as the above-mentioned Figure 1The missing parts are filled in by the optical navigation device and the image scanned by the magnetic deflection device, thereby improving the overall performance of the charged particle beam system.

[0054] Figure 3 FIG. 1 is an exemplary schematic diagram showing a sample stage for performing a first calibration according to an embodiment of the present application. Figure 3 The left side of the figure shows a top view of the sample stage, and the right side shows a side view of the sample stage. The sample stage is a standard nail stage, and a first target 1 and a second target 2 with a hole of 1 mm in diameter are shown on the sample stage, where the first target 1 is located at the center of the sample stage, and the second target 2 is 2 mm away from the first target 1. In the implementation scenario, the sample stage is first photographed using an optical navigation device to calibrate the distance relationship between the first image of the optical navigation device and the sample stage.

[0055] Figure 4 FIG. 1 is an exemplary schematic diagram showing the use of an optical navigation device to photograph a sample stage according to an embodiment of the present application. Figure 4 The left side of the lower middle part shows that the sample stage is in the original position, the right side of the lower part of the figure shows that the sample stage is moved 10 mm along the x-axis direction, and the upper part of the figure shows that the sample stage is moved 10 mm along the y-axis direction, and the three first images correspondingly taken using the optical navigation device. It can be understood that the x-axis and the y-axis are two directions perpendicular to the electron beam direction (that is, the z-axis) and in the same plane. In the implementation scenario, based on the three first images taken, the actual position S of the corresponding sample stage is obtained. Then, according to the first images at different positions, the pixel distance moved by the first target 1 and the second target 2 in the image is calculated. For example, after the sample stage moves 10 mm along the x-axis direction from the original position, the difference between the pixel coordinates of the first target 1 and the second target 2 on the first image at the original position and the pixel coordinates of the first target 1 and the second target 2 on the first image moved 10 mm along the x-axis direction is the moving distance.

[0056] Similarly, the difference between the pixel coordinates of the first target 1 and the second target 2 on the first image at the original position and the pixel coordinates of the first target 1 and the second target 2 on the first image moved 10 mm along the y-axis direction is calculated; or the difference between the pixel coordinates of the first target 1 and the second target 2 on the first image moved 10 mm along the x-axis direction and the pixel coordinates of the first target 1 and the second target 2 on the first image moved 10 mm along the y-axis direction is calculated, and the moving distance group D can be obtained. According to Calculate the distance matrix , to calibrate the distance relationship between the first image and the sample stage.

[0057] Based on the above distance relationship , it is possible to correspond the points on the first image taken by the optical navigation device to the actual sample stage position; or correspond to the points on the first image taken by the optical navigation device based on the sample stage position. Based on this, the sample stage position can be determined at the target working distance, so that the position of the target on the first image taken by the optical navigation device can be identified. In addition, based on the pixel coordinates on the second image taken by the magnetic deflection device, the position of the target on the second image can also be identified, for example Figure 5 shown.

[0058] Figure 5 is an exemplary schematic diagram showing the recognition of targets on the first image and the second image respectively according to an embodiment of the present application. Figure 5 The left side of the figure shows the first target 1 and the second target 2 identified in the first image, which can be identified according to the above distance relationship. The positions are automatically identified and recorded as (x'1, y'1) and (x'2, y'2) respectively. Figure 5 The middle shows the first target 1 and the second target 2 identified in the second image, whose corresponding positions can be obtained according to the pixel coordinates, for example, recorded as (x1, y1) and (x2, y2) respectively. In this scenario, based on the above angle relationship The angle between the first image and the second image can be calibrated at the target working distance ,For example Figure 5 Shown on the right.

[0059] As can be seen from the foregoing, the second image at different working distances will also have a rotation angle, thereby establishing an angle relationship at different working distances. Subsequently, by combining the angle relationship between the first image and the second image calibrated above, the angle phase difference between the optical navigation device and the magnetic deflection device can be obtained to construct a first relationship model.

[0060] Figure 6 FIG. 1 is an exemplary flowchart showing the establishment of angle relationships at different working distances according to an embodiment of the present application. Figure 6 As shown in , at step S601, the sample stage is moved to the calibration point. For example, a calibration point is set every 5 mm between the angles of 5 mm and 50 mm, thereby the sample stage working distance can be moved to a 5 mm position. Next, at step S602, a target feature area is selected in the second image, and at step S603, the sample stage Y axis is moved. As an example, the aforementioned moving distance may be 1 / 5 of the current field of view. Further, at step S604, the image deviation of the second image taken by the magnetic deflection device before and after the working distance is changed at the target feature area is calculated. In some implementation scenarios, the image deviation in the current y direction may be calculated, for example, by an image matching algorithm.

[0061] At step S605, it is determined whether the image deviation is less than a preset threshold. In some implementation scenarios, the preset threshold may be, for example, 0.1 pixels. When the image deviation is not less than the preset threshold, at step S606, the deflector of the magnetic deflection device is adjusted, and the Y axis is moved again at step S603 to adjust the deflector by comparing the new image deviation with the preset threshold. The specific adjustment method is that if the image deviation is greater than 10 pixels, the deflector angle of the magnetic deflection device is adjusted by 1.5°; if the image deviation is between 3-10 pixels, the deflector angle of the magnetic deflection device is adjusted by 0.5°; if the image deviation is less than 3 pixels, the deflector angle of the magnetic deflection device is adjusted by 0.1°. Until the image deviation is less than the preset threshold, at step S607, the current deflection angle is recorded. Then, by changing the next calibration point, the above steps are repeated to obtain the deflection angle at different working distances.

[0062] Figure 7 is an exemplary schematic diagram showing the angle relationship at different working distances according to an embodiment of the present application. Figure 7 As shown in , the horizontal axis is the working distance (unit: mm) and the vertical axis is the deflection angle (unit: °). It can be seen from the figure that the angle relationship at different working distances is finally fitted into a curve relationship. For example, the dotted line in the figure shows the corresponding deflection angle at different working distances, and the solid line represents the final fitted curve relationship y=-0.0004x^3+0.0537x^2-2.467x+5.6253. In the implementation scenario, combined with the angle relationship between the first image and the second image calibrated above, the angular phase difference between the optical navigation device and the magnetic deflection device can be obtained. As an example, assuming that according to the angle relationship at different working distances, when the working distance WD=5 is transformed to the working distance WD=10, the deflection angle corresponding to the second image is 5°; when the working distance WD=10 is transformed to the working distance WD=15, the deflection angle corresponding to the second image is 3°. Based on the first calibration, the angle between the first image and the second image at the target working distance WD=15 is 30°, and the angular phase difference between the first image and the second image at the working distance WD=10 can be calculated to be 27°. In this scenario, the first image and the second image can be stitched in the field of view by rotating the optical navigation device to compensate for the angular phase difference at the first field of view switching point.

[0063] Figure 8 FIG. 2 is an exemplary schematic diagram showing resolution processing of a first image captured by an optical navigation device according to an embodiment of the present application. Figure 8As shown in , the preprocessing model may include a downsampling module 801 and an upsampling module 802, wherein the downsampling module 801 includes a convolutional layer 801-1 and multiple transformer layers 801-2; the upsampling module 802 includes multiple transformer layers 802-1, a feature fusion layer 802-2 and a deconvolution layer 802-3. In addition, the upsampling module 802 may also include a GDFN layer 802-4 and an MDTA layer 802-5. The GDFN layer 802-4 introduces a gating mechanism and a depth-separable convolution to enhance feature expression capabilities and reduce the amount of calculation; the MDTA layer 802-5 introduces deep convolution and transposed attention to efficiently capture long-range dependencies to achieve image restoration such as image deblurring.

[0064] In the implementation scenario, the first image can be firstly cropped into image blocks 803, and the size thereof can be enlarged to obtain an enlarged image 804. As an example, the first image captured by the optical navigation device is cut into multiple 256×256 image blocks and adjusted to an image of 1024×1024. Next, the enlarged image 804 is input into the preprocessing model, and firstly passes through a convolution layer 801-1 and multiple transformer layers 801-2 in the downsampling module 801 to perform a downsampling operation, and obtains a downsampling feature. Further, the upsampling operation is performed sequentially through multiple transformer layers 802-1, a feature fusion layer 802-2, an MDTA layer 802-5, a GDFN layer 802-4 and a deconvolution layer 802-3 in the upsampling module 802, wherein the downsampling features of the corresponding number of layers are fused through the feature fusion layer 802-2 to obtain an upsampling feature 805. Further, the upsampling feature 805 and the enlarged image 804 are superimposed to obtain a target image 806.

[0065] It can be understood that according to the selection of the optical navigation device, assuming that the field of view size is 122mm×91mm, and the size of the first image captured is 4072×3046, the actual pixel size can be calculated to be 30um based on the shortest side 91mm / 3046×1000≈30um. When the acceleration voltage of the magnetic deflection device is 30kv and the working distance is 5mm, the limit condition is reached. Under this condition, the magnetic scanning field is the smallest. After actual testing, the minimum field of view is 4.5mm×4.5mm, which can meet the most extreme conditions and cover other acceleration voltages and working distances. Since the field of view stitching of the optical navigation device and the magnetic deflection device needs to ensure the same resolution, which is not met in actual conditions, the above-mentioned resolution processing operation of the embodiment of the present application makes the pixel size of the optical navigation device coincide with the pixel size of the magnetic deflection device. That is, the image details of the first image are restored through the preprocessing model, and the pixel size of the first image is reduced. When the pixel size of the first image is 30um, the image is enlarged, and the field of view is fixed, and the pixel size is reduced according to the magnification factor until it coincides with the field of view of the second image taken by the magnetic deflection device. For example, the first image of size 4072×3046 taken by the optical navigation device is reconstructed into an image of size 28504×21322 through super-resolution of the preprocessing model, and the field of view is fixed. The current pixel size is calculated to be 4.27um. This value is smaller than the field of view of the second image taken by the magnetic deflection device, and meets the field of view coincidence condition with the second image.

[0066] Fig. 9 FIG. 1 is an exemplary flowchart showing the calculation of the amplification gain multiple and the angle difference of the two deflectors according to an embodiment of the present application. Fig. 9 As shown in , at step S901, a standard sample is selected. The standard sample needs to have known real size and have straight lines or other identical features. Based on the standard sample, at step S902, the charged particle beam system is switched to the magnetic deflection device, and at step S903, the sample grid is identified by an image recognition algorithm to calculate the field of view size under magnetic deflection. It can be understood that the number of grids corresponds to the field of view size.

[0067] Next, at step S904, the charged particle beam system is switched to the electric deflection device, and at step S905, the sample grid is identified by an image recognition algorithm to calculate the field size under electric deflection. According to the field size under magnetic deflection and the field size under electric deflection, at step S906, the amplification gain multiple is calculated. Specifically, by adjusting the amplification gain multiple of the deflector of the magnetic deflection device, the field size under magnetic deflection is consistent with the field size under electric deflection. That is, when the corresponding number of grids is consistent, the amplification gain multiple is obtained. Further, at step S907, the angle deviation is calculated based on the angle between the grid corresponding to the adjusted amplification gain multiple and the grid corresponding to the electric deflection, and a second relationship model between the magnetic deflection device and the electric deflection device is obtained.

[0068] Fig.10 FIG. 1 is an exemplary schematic diagram of identifying a sample grid according to an embodiment of the present application. Fig.10 The left side of the figure shows the original sample grid, and the middle shows the sample grid corresponding to the adjusted amplification gain multiple. As can be seen from the figure, the sample grid corresponding to the adjusted amplification gain multiple is rotated. In the implementation scenario, the grid can be grouped into rows and columns to identify the grid cross, for example Fig.10 to calculate the angular deviation.

[0069] In combination with the above description, it can be known that through the above first and second calibrations, two field of view switching points (for example, Figure 1 The field of view switching points O1 and O2 shown in ), include the relative angle difference between the optical navigation device and the magnetic deflection device, the angle deviation and the amplification gain multiple between the magnetic deflection device and the electric deflection device. In the implementation scenario, based on the above two field of view switching points, the image super-resolution reconstruction technology is performed on the first image taken by the optical navigation device using the preprocessing model to complete the missing part, so that the first image and the second image taken by the magnetic deflection device overlap. Furthermore, by adjusting the magnification in the system, the system seamlessly switches the magnification between 10,000 and 1,000,000 times, automatically selects the field of view mode to match the current field of view size, and adjusts parameters such as the relative angle difference and angle deviation to achieve visually imperceptible switching. Based on this, the efficiency of the use of the charged particle beam system is greatly improved, and the image is always in the best display effect by selecting the appropriate field of view size according to the magnification.

[0070] In some embodiments, the embodiments of the present application may further set a third field of view switching point and a fourth field of view switching point, and perform corresponding field of view compensation based on the first field of view switching point, the second field of view switching point, the third field of view switching point, and the fourth field of view switching point to achieve field of view stitching in the charged particle beam system. The third field of view switching point and the fourth field of view switching point are reverse field of view switching of the first field of view switching point and the second field of view switching point.

[0071] Fig.11 FIG. 1 is an exemplary schematic diagram of image switching with an increased field of view switching point according to an embodiment of the present application. Fig.11 As shown in , in addition to the first field of view switching point O1 and the second field of view switching point O2, a third field of view switching point O3 and a fourth field of view switching point O4 are also set. That is, the embodiment of the present application adds a redundant design of the deflector, by setting four field of view switching points and dividing them into two groups. The first group includes two reference points for the field of view switching from the optical navigation device to the magnetic deflection device with positive magnification increase adjustment, and the field of view switching from the magnetic deflection device to the electric deflection device. The second group includes two reference points for the field of view switching from the electric deflection device to the magnetic deflection device with reverse magnification reduction adjustment, and the field of view switching from the magnetic deflection device to the optical navigation device. In some implementation scenarios, 1.2 times the parameters (amplification gain multiples) calibrated in the previous text can be selected as the first group of positive adjustment field of view switching points, and 1~1.2 times the adjacent parameters of the first group of field of view switching points can be selected as the second group of reverse adjustment field of view switching points. Based on this, it can not only prevent users from repeatedly switching the field of view mode at the critical point, but also avoid the problem of repeated automatic switching at a certain magnification during use, which affects use, due to errors in the calculation of the magnification based on the current pixel size.

[0072] Fig.12 1 is a block diagram showing an exemplary structure of an electronic device 1200 according to an embodiment of the present application. Fig.12 As shown in , the electronic device 1200 of the present application may include a processor 1201 and a memory 1202, wherein the processor 1201 and the memory 1202 communicate with each other through a bus. The memory 1202 stores program instructions for field of view stitching in a charged particle beam system. When the program instructions are executed by the processor 1201, the method steps described in the above text in combination with the accompanying drawings are implemented: based on the first calibration, a first relationship model between the optical navigation device and the magnetic deflection device at different working distances is constructed; the first image taken by the optical navigation device is subjected to resolution processing using a preprocessing model to match the second image taken by the magnetic deflection device; a first field of view switching point from the optical navigation device to the magnetic deflection device is formed according to the first relationship model, the matched first image and the second image; based on the second calibration, a second relationship model between the magnetic deflection device and the electric deflection device is constructed; a second field of view switching point from the magnetic deflection device to the electric deflection device is formed according to the second relationship model; corresponding field of view compensation is performed based on the first field of view switching point and the second field of view switching point to achieve field of view stitching in the charged particle beam system.

[0073] According to the above description in combination with the accompanying drawings, those skilled in the art can also understand that the embodiments of the present application can also be implemented by a software program. Therefore, the present application also provides a computer-readable storage medium. The computer-readable storage medium stores computer-readable instructions for field of view stitching in a charged particle beam system. When the computer-readable instructions are executed by one or more processors, the present application in combination with the accompanying drawings can be implemented. Figure 2 A method for field of view stitching in a charged particle beam system is described.

[0074] Through the description of the above implementation methods, those skilled in the art can clearly understand that each implementation method can be implemented by means of software plus a necessary general hardware platform, and of course, can also be implemented by hardware. Based on this understanding, the above technical solution is essentially or the part that contributes to the prior art can be embodied in the form of a software product, and the computer software product can be stored in a computer-readable storage medium, such as ROM / RAM, a disk, an optical disk, etc., including a number of instructions for a computer device (which can be a personal computer, a server, or a network device, etc.) to execute the methods described in each embodiment or some parts of the embodiments.

[0075] It should be noted that although the operations of the method of the present application are described in a specific order in the accompanying drawings, this does not require or imply that the operations must be performed in this specific order, or that all the operations shown must be performed to achieve the desired results. On the contrary, the steps depicted in the flow chart can be performed in a different order. Additionally or alternatively, some steps can be omitted, multiple steps can be combined into one step, and / or one step can be decomposed into multiple steps.

[0076] It should be understood that when the terms "first", "second", "third" and "fourth" are used in the claims, the specification and the drawings of the present application, they are only used to distinguish different objects, rather than to describe a specific order. The terms "include" and "comprise" used in the specification and claims of the present application indicate the presence of the described features, wholes, steps, operations, elements and / or components, but do not exclude the presence or addition of one or more other features, wholes, steps, operations, elements, components and / or their collections.

[0077] It should also be understood that the terms used in this application specification are only for the purpose of describing specific embodiments and are not intended to limit the present application. As used in this application specification and claims, unless the context clearly indicates otherwise, the singular forms of "a", "an" and "the" are intended to include plural forms. It should also be further understood that the term "and / or" used in this application specification and claims refers to any combination of one or more of the associated listed items and all possible combinations, and includes these combinations.

[0078] Although the implementation methods of the present application are as above, the contents described are only examples adopted to facilitate the understanding of the present application, and are not intended to limit the scope and application scenarios of the present application. Any technician in the technical field described in the present application can make any modifications and changes in the form and details of the implementation without departing from the spirit and scope disclosed in the present application, but the scope of patent protection of the present application shall still be subject to the scope defined in the attached claims.

Claims

1. A method for stitching a field of view in a charged particle beam system, characterized in that: The charged particle beam system comprises an optical navigation device, a magnetic deflection device and an electric deflection device, and the method comprises: Based on the first calibration, constructing a first relationship model between the optical navigation device and the magnetic deflection device at different working distances; Using a preprocessing model, the resolution of the first image taken by the optical navigation device is processed to match the second image taken by the magnetic deflection device; forming a first field of view switching point from the optical navigation device to the magnetic deflection device according to the first relationship model, the matched first image and the second image; constructing a second relationship model between the magnetic deflection device and the electric deflection device based on the second calibration; forming a second field of view switching point from the magnetic deflection device to the electric deflection device according to the second relationship model; Corresponding field of view compensation is performed based on the first field of view switching point and the second field of view switching point to achieve field of view stitching in a charged particle beam system.

2. The method according to claim 1, characterized in that The first calibration is performed by the following operations: moving a sample stage, wherein a first target and a second target are marked on the sample stage, and the first target is located at the center of the sample stage; Using the optical navigation device to take a plurality of first images of the sample stage to calibrate the distance relationship between the first images and the sample stage; Based on the distance relationship and using the magnetic deflection device, a second image of the sample stage at the target working distance is captured to calibrate the angular relationship between the first image and the second image at the target working distance.

3. The method according to claim 2, characterized in that The step of using the optical navigation device to capture a plurality of first images of the sample stage to calibrate the distance relationship between the first images and the sample stage includes: Acquire the actual position of the sample stage corresponding to each of the first images; Calculating movement distances of the first target and the second target on the corresponding first image; A distance matrix is ​​determined according to the actual position and the moving distance to calibrate the distance relationship between the first image and the sample stage.

4. The method according to claim 3, characterized in that Wherein, based on the distance relationship and using the magnetic deflection device to capture a second image of the sample stage at the target working distance, so as to calibrate the angular relationship between the first image and the second image at the target working distance comprises: Determine, based on the distance relationship, a first position where the first target and the second target are located on a first image at the target working distance; Acquire a second position of the first target and the second target on the second image at the target working distance; The angular relationship between the first image and the second image at a target working distance is calibrated according to the first position and the second position.

5. The method according to claim 2, characterized in that: Wherein, based on the first calibration, constructing a first relationship model between the optical navigation device and the magnetic deflection device at different working distances includes: Moving the sample stage, and calculating the angle deviation of the second image captured by the magnetic deflection device at different working distances; The relative angle difference between the optical navigation device and the magnetic deflection device is determined based on the first calibrated angle relationship and the angle deviation to construct the first relationship model between the optical navigation device and the magnetic deflection device at different working distances.

6. The method according to claim 5, characterized in that Wherein moving the sample stage and calculating the angle deviation of the second image captured by the magnetic deflection device at different working distances comprises: Moving the sample stage, and calculating the image deviation of the second image captured by the magnetic deflection device at the target feature area before and after the working distance is changed; The deflector of the magnetic deflection device is adjusted according to the image deviation and a preset threshold value until the image deviation is less than the preset threshold value, and a corresponding deflection angle is obtained to calculate the angle deviation of the second image taken by the magnetic deflection device at different working distances.

7. The method according to claim 1, characterized in that The preprocessing model includes a downsampling module and an upsampling module, and using the preprocessing model to perform resolution processing on the first image captured by the optical navigation device includes: Using the downsampling module to perform a downsampling operation on the first image captured by the optical navigation device to obtain a downsampling feature; Performing an upsampling operation on the downsampled features using the upsampling module, and fusing the corresponding downsampled features in the upsampling operation to obtain upsampled features; and The final up-sampling feature is superimposed on the first image to obtain a target image, so as to perform resolution processing on the first image taken by the optical navigation device.

8. The method according to claim 7, characterized in that The preprocessing model is a Restormer model.

9. The method according to claim 1, characterized in that: Wherein, based on the second calibration, constructing a second relationship model between the magnetic deflection device and the electric deflection device comprises: Based on the second calibration, the magnification and the angle difference between the deflector of the magnetic deflection device and the deflector of the electric deflection device are calculated to construct a second relationship model between the magnetic deflection device and the electric deflection device.

10. The method according to claim 9, characterized in that Wherein, based on the second calibration, calculating the magnification and the angle difference between the deflector of the magnetic deflection device and the deflector of the electric deflection device comprises: Respectively identifying a first grid number and a second grid number corresponding to the calibration sample under the magnetic deflection device and the electric deflection device; adjusting the amplification gain multiple of the deflector of the magnetic deflection device so that the first grid number is consistent with the second grid number, so as to calculate the amplification multiple between the deflector of the magnetic deflection device and the deflector of the electric deflection device; An angular deviation between the grids corresponding to the magnetic deflection device and the electric deflection device at the magnification is identified to calculate an angular difference between the deflector of the magnetic deflection device and the deflector of the electric deflection device.

11. The method according to claim 1, characterized in that: It also includes: Setting a third field of view switching point and a fourth field of view switching point; Corresponding field of view compensation is performed based on the first field of view switching point, the second field of view switching point, the third field of view switching point, and the fourth field of view switching point to achieve field of view stitching in a charged particle beam system.

12. The method according to claim 11, characterized in that The third field of view switching point and the fourth field of view switching point are reverse field of view switching of the first field of view switching point and the second field of view switching point.

13. An electronic device, characterized in that: include: processor; as well as A memory storing program instructions for field of view stitching in a charged particle beam system, wherein when the program instructions are executed by the processor, the electronic device implements the method according to any one of claims 1-12.

14. A storage medium, characterized in that: The storage medium is a computer-readable storage medium, on which computer-readable instructions for field of view stitching in a charged particle beam system are stored. When the computer-readable instructions are executed by one or more processors, the method described in any one of claims 1 to 12 is implemented.

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