Fluid reservoirs and related fluid circulation systems and methods

Abstract

The invention discloses a fluid reservoir and a related fluid circulation system and method. The fluid reservoir is rotatable to any of a variety of directions of rotation and includes a housing defining an interior chamber separated by a membrane into a working fluid chamber and a gas chamber. An inlet port is fluidly coupled with the working fluid chamber to provide working fluid into the working fluid chamber, and an outlet port is fluidly coupled with the working fluid chamber to expel working fluid from the working fluid chamber. The drain channel extends a length along an outer periphery of the working fluid chamber and is fluidly open to the working fluid chamber along the length of the drain channel. The discharge port is fluidly coupled with only a portion of the discharge passage and discharges gas out of the working fluid chamber via the discharge passage. The length of the discharge passage is such that at least a portion of the discharge passage opens toward an uppermost portion of the working fluid chamber when the housing is in any of the various rotational directions.

Description

Technical Field

[0001] The present application relates generally to a fluid reservoir and, more particularly, to a fluid reservoir capable of removing gas from a fluid in the fluid reservoir independent of the orientation of the fluid reservoir. Background Art

[0002] Fluid flow circuits such as those used in inkjet printing systems typically employ one or more reservoirs to store the working fluid and supply it to a fluid management device. Conventional reservoirs with free surfaces can be used to control the pressure level of the working fluid. However, such conventional reservoirs are not directionally independent because they are unable to exclude gas and are unable to detect and manage fill levels at certain orientations. Some sealed reservoirs may allow for reservoir direction independence. However, these conventional sealed reservoirs are unable to effectively eliminate gas from the system, which may hinder its functionality. Additionally, existing solutions are deficient in achieving infinite volume adaptability, in which case the system can adapt to changes in the volume of the working fluid without significantly changing the pressure of the working fluid. Summary of the invention

[0003] The subject matter of the present application has been developed in response to the current state of the art, and in particular in response to problems and needs arising from or not yet fully solved by fluid reservoirs. In general, the subject matter of the present application has been developed to provide a fluid reservoir that overcomes at least some of the above-mentioned disadvantages of the prior art.

[0004] A reservoir for a fluid circulation system is disclosed herein. The reservoir includes a housing defining an inner chamber that can be selectively rotated to any of a variety of rotational directions. The reservoir also includes a membrane that is positioned within the housing and separates the inner chamber into a working fluid chamber containing a portion of a working fluid and a gas chamber containing a pressurized gas. The membrane is configured to maintain the portion of the working fluid in the working fluid chamber at a constant pressure. The reservoir also includes an inlet port that is fluidly coupled to the working fluid chamber and configured to provide the working fluid to the working fluid chamber. Additionally, the reservoir includes an outlet port that is fluidly coupled to the working fluid chamber and configured to exclude the working fluid from the working fluid chamber. The reservoir also includes a discharge channel that extends a certain length along the outer periphery of the working fluid chamber and is fluidly open to the working fluid chamber along the length of the discharge channel. The reservoir also includes a discharge port that is fluidly coupled to only a portion of the discharge channel and is configured to discharge gas out of the working fluid chamber via the discharge channel. The length of the exhaust passage is such that when the housing is in any of the various rotational orientations, at least a portion of the exhaust passage opens to an uppermost portion of the working fluid chamber. The foregoing subject matter of this paragraph characterizes Example 1 of the present application.

[0005] The membrane is configured to be held under tension between the working fluid chamber and the gas chamber.The foregoing subject matter of this paragraph characterizes Example 2 of the present application, wherein Example 2 also includes subject matter according to Example 1 above.

[0006] The housing can rotate within an angle range of 0 to 90 degrees. The length of the exhaust passage spans no less than 25% of the outer periphery of the working fluid chamber. The foregoing subject matter of this paragraph characterizes Example 3 of the present application, wherein Example 3 also includes subject matter according to any one of Examples 1 to 2 above.

[0007] The housing can rotate within an angle range of 0 to 180 degrees. The length of the discharge passage spans no less than 50% of the outer periphery of the working fluid chamber. The foregoing subject matter of this paragraph characterizes Example 4 of the present application, wherein Example 4 also includes subject matter according to any one of Examples 1 to 3 above.

[0008] The housing can rotate within an angular range of 0 to 270 degrees. The length of the exhaust passage spans no less than 75% of the outer periphery of the working fluid chamber. The foregoing subject matter of this paragraph characterizes Example 5 of the present application, wherein Example 5 also includes subject matter according to any one of Examples 1 to 4 above.

[0009] The housing can rotate within an angle range of 0 to 360 degrees. The length of the exhaust passage spans along the entire outer periphery of the working fluid chamber. The aforementioned subject matter of this paragraph characterizes Example 6 of the present application, wherein Example 6 also includes subject matter according to any one of the above Examples 1 to 5.

[0010] The outer periphery of the working fluid chamber has a circular shape. The exhaust passage is curved in an arc shape along the outer periphery of the working fluid chamber. The radius of curvature of the arc is equal to the radius of curvature of the circle. The aforementioned subject matter of this paragraph characterizes Example 7 of the present application, wherein Example 7 also includes a subject matter according to any one of Examples 1 to 6 above.

[0011] The exhaust passage includes a plurality of orifices along the length of the exhaust passage. Only the plurality of orifices are open to the working fluid chamber fluid. The dimensions of the plurality of orifices are designed so that gas is easily discharged from the working fluid chamber, while working fluid is less easily discharged from the working fluid chamber. The aforementioned subject matter of this paragraph characterizes Example 8 of the present application, wherein Example 8 also includes subject matter according to any one of Examples 1 to 7 above.

[0012] The bulk port is fluidly coupled to the working fluid chamber and is configured to provide working fluid from a bulk reservoir into the working fluid chamber. The foregoing subject matter of this paragraph characterizes Example 9 of the present application, wherein Example 9 also includes subject matter according to any one of Examples 1 to 8 above.

[0013] The working fluid includes ink. The foregoing subject matter of this paragraph characterizes Example 10 of the present application, wherein Example 10 also includes subject matter according to any one of Examples 1 to 9 above.

[0014] The present application also discloses a fluid circulation system for supplying a working fluid to a fluid management device and returning the working fluid from the fluid management device. The fluid circulation system includes a supply reservoir, the supply reservoir includes a supply membrane, the supply membrane separates a supply working fluid chamber containing a portion of the working fluid and a supply gas chamber containing a pressurized gas at a first pressure. The supply reservoir also includes a supply exhaust port and a supply exhaust channel. The supply exhaust port is fluidically connected to the supply exhaust channel, and the supply exhaust channel is fluidly connected to the supply working fluid chamber. The fluid circulation system also includes a reflux reservoir, the reflux reservoir includes a reflux membrane, the reflux membrane separates a reflux working fluid chamber containing a portion of the working fluid and a reflux gas chamber containing a pressurized gas at a second pressure. The reflux reservoir also includes a reflux exhaust port and a reflux exhaust channel. The reflux exhaust port is fluidically connected to the reflux exhaust channel, and the reflux exhaust channel is fluidly connected to the reflux working fluid chamber. The fluid circulation system also includes a large volume reservoir, which includes a large volume working fluid chamber having a free surface. The supply exhaust passage is configured to exhaust the gas within the supply working fluid chamber to the large volume reservoir. The reflux exhaust passage is configured to exhaust the gas within the reflux working fluid chamber indirectly to the large volume reservoir via the supply working fluid chamber. The supply reservoir and the reflux reservoir can be independently and selectively rotated to any of a variety of rotational directions relative to the large volume reservoir. The supply reservoir is configured to receive a portion of the working fluid from the reflux working fluid chamber to the supply working fluid chamber, and is also configured to supply a portion of the working fluid from the supply working fluid chamber to the fluid management device. The reflux reservoir is configured to receive a portion of the working fluid from the fluid management device into the reflux working fluid chamber, and is also configured to supply a portion of the working fluid from the reflux working fluid chamber to the supply working fluid chamber. The foregoing subject matter of this paragraph characterizes Example 11 of the present application.

[0015] The large volume reservoir is configured to provide a portion of the working fluid to at least one of the supply working fluid chamber or the return working fluid chamber or to remove a portion of the working fluid. The foregoing subject matter of this paragraph characterizes Example 12 of the present application, wherein Example 12 also includes the subject matter described in Example 11 above.

[0016] The fluid circulation system includes a pump located between the reflux reservoir and the supply reservoir. The pump is configured to pump a portion of the working fluid from the reflux working fluid chamber to the supply working fluid chamber. The aforementioned subject matter of this paragraph characterizes Example 13 of the present application, wherein Example 13 also includes a subject matter according to any one of the above Examples 11 to 12.

[0017] The first pressure of the pressurized gas in the supply chamber is different from the second pressure of the compressed gas in the return chamber. The first pressure is higher than the second pressure. The aforementioned subject matter of this paragraph characterizes Example 14 of the present application, wherein Example 14 also includes subject matter according to any one of the above Examples 11 to 13.

[0018] The fluid circulation system includes a first pressure valve and a first vacuum and a second pressure valve and a second vacuum. The first pressure of the pressurized gas in the supply chamber is maintained at a constant pressure by the first pressure valve and the first vacuum coupled to the supply reservoir. The second pressure of the pressurized gas in the return chamber is maintained at a constant pressure by the second pressure valve and the second vacuum coupled to the return reservoir. The foregoing subject matter of this paragraph characterizes Example 15 of the present application, wherein Example 15 also includes subject matter according to any one of Examples 11 to 14 above.

[0019] The supply reservoir and the return reservoir have infinite volume adaptability, so that the pressure of a portion of the working fluid in the supply working fluid chamber and the pressure of a portion of the working fluid in the return working fluid chamber are respectively kept constant, regardless of the change in the volume of the working fluid portion. The aforementioned subject matter of this paragraph characterizes Example 16 of the present application, wherein Example 16 also includes the subject matter according to any one of the above Examples 11 to 15.

[0020] Each of the supply reservoir and the reflux reservoir is independently and rotatably mounted on a six-axis carriage. The foregoing subject matter of this paragraph characterizes Example 17 of the present application, wherein Example 17 also includes subject matter according to any one of Examples 11 to 16 above.

[0021] Also disclosed herein is a method for removing gas from a working fluid in a reservoir. The method includes: pressurizing a portion of the working fluid in the working fluid chamber of the reservoir by pressurizing the pressurized gas in the air chamber of the reservoir at a constant pressure. The working fluid chamber and the air chamber are separated by a membrane. The method also includes: receiving a portion of the working fluid into the working fluid chamber, and removing a portion of the working fluid from the working fluid chamber. The method also includes: selectively rotating the reservoir relative to a large volume reservoir. The large volume reservoir is in fluid communication with the working fluid chamber of the reservoir. When the reservoir is selectively rotated, the gas in the working fluid chamber is discharged to the large volume reservoir through a discharge port of a discharge channel fluidly connected to the working fluid chamber of the reservoir. The foregoing subject matter of this paragraph characterizes Example 18 of the present application.

[0022] The method includes maintaining the pressurized gas within the gas chamber of the reservoir at a constant pressure using a pressure valve and a vacuum. The foregoing subject matter of this paragraph characterizes Example 19 of the present application, wherein Example 19 also includes subject matter according to Example 18 above.

[0023] The step of discharging the gas in the working fluid chamber to the large volume reservoir through the discharge port also includes: indirectly discharging the gas to the large volume reservoir via a second reservoir connected to the working fluid chamber and the large volume reservoir. The aforementioned subject matter of this paragraph characterizes Example 20 of the present application, wherein Example 20 also includes subject matter according to any one of the above-mentioned Examples 19.

[0024] The described features, structures, advantages and / or characteristics of the subject matter of the present application can be combined in one or more examples in any suitable manner, and the one or more examples include implementation and / or realization. In the following description, many specific details are provided to impart a thorough understanding of the examples of the subject matter of the present application. Those skilled in the relevant art will recognize that the subject matter of the present application can be practiced in the case of one or more specific features, details, parts, materials and / or methods without a specific example, implementation or realization. In other cases, additional features and advantages can be recognized in certain examples, implementations and / or realizations, and these features and advantages may not be present in all examples, implementations or realizations. In addition, in some cases, known structures, materials or operations are not shown or described in detail to avoid blurring the various aspects of the subject matter of the present application. The features and advantages of the subject matter of the present application will become more apparent from the following description and the appended claims, or can be known by the practice of the subject matter described below. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] In order to make the advantages of the present subject matter more readily understood, the subject matter briefly described above will be described in more detail with reference to specific examples illustrated in the accompanying drawings. It should be understood that these drawings depict only typical examples of the subject matter and are not to be considered limiting of its scope. The subject matter will be described and explained with additional specificity and detail through the use of the accompanying drawings, in which:

[0026] Figure 1 is a schematic diagram of a fluid flow circuit of a fluid circulation system according to one or more examples of the present application;

[0027] Figure 2A is a schematic cross-sectional view of a fluid reservoir of a fluid circulation system according to one or more examples of the present application;

[0028] Figure 2B is a schematic cross-sectional view of another fluid reservoir of a fluid circulation system according to one or more examples of the present application;

[0029] Figure 3A is a schematic perspective view of a fluid reservoir of a fluid circulation system according to one or more examples of the present application;

[0030] Figure 3B According to one or more examples of this application Figure 3A A schematic perspective view of a fluid reservoir of , wherein the upper cover is excluded and the discharge channel is visible;

[0031] Figure 3C According to one or more examples of this application Figure 3A The fluid reservoir along Figure 3A A schematic cross-sectional side view taken along line aa of ;

[0032] Figure 4 is a schematic perspective view of another fluid reservoir of a fluid circulation system according to one or more examples of the present application;

[0033] Figure 5A is a schematic cross-sectional elevation view of a fluid reservoir of a fluid circulation system according to one or more examples of the present application, which is similar to Figure 3B The view shown in , wherein no additional ports are shown;

[0034] Figure 5B According to one or more examples of this application Figure 5A Schematic cross-sectional elevation views of a fluid reservoir shown in different rotational directions; and

[0035] Figure 6 is a schematic flow chart of a method of removing gas from a working fluid in a reservoir according to one or more examples of the present application. DETAILED DESCRIPTION

[0036] Throughout this specification, references to "one example," "example," or similar language mean that a particular feature, structure, or characteristic described in conjunction with the example is included in at least one example of the subject matter of this application. The phrases "in one example," "in an example," and similar language that appear in this specification may, but do not necessarily, all refer to the same example. Similarly, use of the term "implementation" means an implementation having a particular feature, structure, or characteristic described in conjunction with one or more examples of the subject matter of this application, however, an implementation may be associated with one or more examples if there is no clear correlation to indicate otherwise.

[0037] Examples of reservoirs for fluid circulation systems are disclosed herein. Some features of at least some examples of the reservoirs are provided below. In some examples, the reservoir may be a supply reservoir or a return reservoir for an inkjet printing system. References to inkjet printing systems throughout the text are intended only to illustrate one application of the reservoir for the fluid circulation system. The reservoirs and related systems and methods disclosed herein are particularly suitable for use in complex three-dimensional applications, wherein the direction of the reservoir (providing or receiving working fluid from a fluid management device of the fluid circulation system) may change during operation. For example, the reservoir may be associated with an inkjet printing system that prints ink on a three-dimensional surface (e.g., an aircraft surface). When the reservoir selectively moves and rotates around the printing surface, the pressure of a portion of the working fluid in the working fluid chamber is maintained at a constant pressure. Additionally, the gas in the portion of the working fluid is discharged from the working fluid chamber via an exhaust channel because at least a portion of the exhaust channel is open to the uppermost portion of the working fluid chamber, regardless of the direction of the reservoir. In addition, the reservoir can be used in combination with other components of the fluid circulation system to allow a pressure-driven incompressible fluid to flow through the fluid circulation system with infinite volume adaptability.

[0038] Reference Figure 1 According to one example, the system 100 includes a fluid circulation system 104 configured to circulate a working fluid to the fluid management device 102 and to circulate a working fluid from the fluid management device 102. Specifically, the fluid circulation system 104 supplies the working fluid to the fluid management device 102 and to return the working fluid from the fluid management device 102. Therefore, the fluid circulation system 104 is configured to supply the working fluid to the fluid management device 102 and to supply the working fluid from the fluid management device 102 at a continuous and controlled flow rate. The system 100 includes an inlet line 106, which serves as an entry point for the working fluid to enter the fluid management device 102 and fluidly couples the fluid circulation system 104 to the fluid management device 102 to supply the working fluid from the fluid circulation system 104. Similarly, the system 100 includes an outlet line 108 that serves as a return path for the working fluid, the outlet line being independent of the inlet line 106 and fluidly coupling the fluid circulation system 104 to the fluid management device 102 to return the working fluid from the fluid management device 102. When the fluid management device 102 is a dispensing device, the working fluid may be an undispensed working fluid that is not dispensed from the fluid management device 102.

[0039] In some examples, the fluid management device 102 can be any device configured to dispense a working fluid. For example, the fluid management device 102 can be a print head configured to dispense ink onto a surface. Thus, the working fluid can be an ink configured to be printed (e.g., inkjet printed) onto a surface. In some examples, the surface is a complex three-dimensional surface, such as the surface of an aircraft. In addition, the fluid management device 102 can include at least one nozzle through which the working fluid is dispensed. As used herein, a working fluid includes any incompressible fluid (i.e., a fluid that is relatively resistant to change in volume when subjected to pressure) that can be dispensed from the fluid management device 102. For example, the working fluid can be water or a water-based fluid, an oil or an oil-based fluid, a hydraulic fluid, ink, etc.

[0040] In other examples, the fluid management device 102 does not dispense the working fluid from the fluid management device 102, and therefore does not have a nozzle, but rather precisely controls the pressure of the working fluid inside the fluid management device 102. For example, the fluid management device 102 can be a pressure-based haptic device. That is, a pressure-based haptic device that is configured to use changes in fluid pressure to control the force feedback experienced by a user. Such devices have practical applications in different fields, such as robotic-assisted manufacturing, virtual and augmented reality environments, and remote telepresence systems.

[0041] The fluid management device 102 is coupled to a structure, not shown, that allows the fluid management device 102 to translate in at least one direction (e.g., forward / backward, left / right, or up / down) and rotate about a surface in at least one degree of freedom (e.g., about the X, Y, or Z axis, or pitch, yaw, and roll). In some examples, the fluid management device 102 is supported by a structure for translation and rotation in six degrees of freedom. In some examples, the structure may be an industrial multi-axis robotic arm.

[0042] The fluid circulation system 104 of the system 100 includes two reservoirs 110, namely a first reservoir 110a and a second reservoir 110b, which will be described below with reference to FIGS. 2 to 3. Figure 4These reservoirs are described in more detail. In some examples, the first reservoir 110a is a supply reservoir 148 configured to supply working fluid to the fluid management device 102, and the second reservoir 110b is a return reservoir 150 configured to store working fluid from the fluid management device 102. The first reservoir 110a and the second reservoir 110b are both configured to be rotatable to any of a variety of rotational directions. In some examples, the first reservoir 110a and the second reservoir 110b are rotatable in one degree of freedom. In other examples, the first reservoir 110a and the second reservoir 110b are rotatable in three degrees of freedom. In other examples, the first reservoir 110a and the second reservoir 110b are translatable in any of a variety of directions and can be rotated as described above. In addition, the first reservoir 110a and the second reservoir 110b can be mounted to a separate and separately actuatable six-axis bracket (e.g., a robot arm) so that the first reservoir 100a and the second reservoir 110b can be rotated independently. The fluid circulation system 104 also includes a bulk reservoir 146 to which the first reservoir 110a and the second reservoir 110b are fluidly coupled. Thus, the first reservoir 110a and the second reservoir 110b can be independently and selectively rotated to any of a variety of rotational orientations relative to the bulk reservoir 146, which is rotationally fixed so that the bulk reservoir 146 does not rotate. For example, the bulk reservoir 146 can be fixed relative to the floor of the manufacturing site, and the first reservoir 110a and the second reservoir 110b can be fixed to one or more robotic arms that can move relative to the floor of the manufacturing site.

[0043] The supply reservoir 148 is configured to supply the working fluid within the supply working fluid chamber 118a to the fluid management device 102 via the inlet line 106. In addition, the supply reservoir 148 is configured to receive additional working fluid from the return reservoir 150 to the supply working fluid chamber 118a via the supply return line 174. The supply container 148 includes a supply membrane 116a that acts as a diaphragm, thereby creating two different chambers within the inner chamber 114a of the supply container 148. The supply working fluid chamber 118a contains a portion of the working fluid, and the supply gas chamber 120a contains a pressurized gas at a first pressure P1. Figure 3C , the cross-sectional view of the supply reservoir 148 shows that the supply membrane 116a divides the open cavity of the inner chamber 114a of the supply reservoir 148 into two different chambers, namely the supply gas chamber 120a and the supply working fluid chamber 118a. The supply reservoir 148 also includes a supply exhaust channel 128a in fluid communication with the supply working fluid chamber 118a. The supply exhaust channel 128a is configured to exhaust the gas (e.g., bubbles) in the supply working fluid chamber 118a to the large volume reservoir 146.

[0044] The reflux reservoir 150 is configured to reflux the working fluid from the fluid management device 102 to the reflux working fluid chamber 118b through the outlet line 108. In addition, the reflux reservoir 150 is configured to provide the working fluid from the reflux working fluid chamber 118b to the supply working fluid chamber 118a through the supply reflux line 174. Therefore, during operation of the system 100, the working fluid flows continuously between the supply reservoir 148, the fluid management device 102 and the reflux reservoir 150. Similar to the supply reservoir 148, the reflux reservoir 150 includes a reflux membrane 116b, which acts as a partition to create two different chambers with the inner chamber 114b of the reflux reservoir 50. The reflux working fluid chamber 118b contains a portion of the working fluid, and the reflux gas chamber 120b contains a pressurized gas at a second pressure P2. The reflux reservoir 150 also includes a reflux exhaust channel 128b that is fluidly connected to the reflux working fluid chamber 118b. The return exhaust passage 128 b is configured to exhaust the gas within the return working fluid chamber 118 b to the supply reservoir 148 .

[0045] The pressurized gas in the supply chamber 120a is maintained at a first pressure P1. The gas in the supply chamber 120a is pressurized so as to pressurize the portion of the working fluid in the supply working fluid chamber 118a. In other words, by adjusting the pressure of the supply chamber 120a, the pressure of the supply working fluid chamber 118a is also adjusted, so the pressure of the working fluid portion is known. Therefore, in some examples, the first pressure valve 158a and the first vacuum 160a are connected to the supply reservoir 148 and are configured to maintain the pressurized gas in the supply chamber 120a at a first pressure P1. Similarly, the pressurized gas in the return chamber 120b is maintained at a second pressure P2. Therefore, in some examples, the second pressure valve 158b and the second vacuum 160b are connected to the return reservoir 150 and are configured to maintain the pressurized gas in the return chamber 120b at a second pressure P2. In some examples, the first pressure P1 of the pressurized gas in the supply chamber 120a has a different pressure than the second pressure P2 of the pressurized gas in the return chamber 120b. For example, the first pressure P1 can be higher than the second pressure P2. Therefore, the working fluid flowing from the return reservoir 150 to the supply reservoir 148 moves from the low pressure chamber to the high pressure chamber.

[0046] The supply reservoir 148 and the return reservoir 150 have infinite volume adaptability. As used herein, infinite volume adaptability means that the pressure of the portion of the working fluid in the reservoir 110 remains constant, regardless of changes in the volume of the working fluid portion. This is in stark contrast to conventional fluid circulation systems, in which changes in the volume of the working fluid result in corresponding changes in the pressure of the working fluid. Therefore, no matter how much gas is in the air chamber 120, the corresponding pressure valve 158 and vacuum 160 can be used to maintain the pressure of the gas. In other words, the volume of the working fluid portion in the working fluid chamber 118 is independent of (i.e., unrelated to) the working fluid pressure of that portion.

[0047] The bulk reservoir 146 includes a bulk working fluid chamber 152 having a free surface 154. As used herein, a free surface is a boundary or interface between a fluid (i.e., a liquid or gas) and the surrounding environment. That is, when the working fluid portion within the bulk working fluid chamber 152 is not limited or constrained by a physical boundary, there is a free surface 154. In other words, the working fluid portion within the bulk working fluid chamber 152 can freely change shape, flow, and be affected by external forces such as gravity. Since the bulk reservoir 146 is rotationally fixed, the working fluid portion within the bulk working fluid chamber 152 maintains the free surface 154 during operation of the system 100. The supply main pipeline 166 is fluidly connected to the supply working fluid chamber 118a of the supply reservoir 148 and the bulk working fluid chamber 152. Therefore, the bulk reservoir 146 allows the system 100 to adapt to volume changes within the fluid circulation system 104. The supply main pipeline 166 is configured to exclude the working fluid from the supply working fluid chamber 118a to the bulk working fluid chamber 152. Similarly, the return body line 168 is fluidly coupled to the return working fluid chamber 118b and the bulk working fluid chamber 152 of the return reservoir 150. The return body line 168 is configured to provide working fluid from the bulk working fluid chamber 152 to the return working fluid chamber 118b.

[0048] The bulk reservoir 146 is also configured to allow the system 100 to discharge gas within the working fluid chamber 118 of the reservoir 110 to the bulk working fluid chamber 152. That is, any gas within the supply working fluid chamber 118a can be discharged to the bulk working fluid chamber 152 via the supply main pipeline 166. Any gas discharged to the bulk working fluid chamber 152 will migrate to the free surface 154 of the bulk working fluid chamber 152 and be discharged from the working fluid circulating through the fluid circulation system 104. In addition, any gas within the return working fluid chamber 118b is configured to be indirectly discharged to the bulk working fluid chamber 152. That is, any gas within the return working fluid chamber 118b can be discharged via the supply return pipeline 174 and enter the supply working fluid chamber 118a, and then can be discharged to the bulk working fluid chamber 152 via the supply main pipeline 166. The flow of gas is unidirectional, so that the gas moves directly from the supply reservoir 148 to the bulk reservoir 146 , or indirectly from the return reservoir 150 to the supply reservoir 148 , and further into the bulk reservoir 146 .

[0049] In some examples, the main body pressure P3 of the working fluid part in the large volume working fluid chamber 152 is regulated by the main body pressure valve 158c and the main body vacuum 160c connected to the large volume reservoir 146. A main body pressure sensor 162c can be provided to determine the actual pressure generated by the main body pressure valve 158c and the main body vacuum 160c by generating a pressure signal indicating the actual pressure of the working fluid part in the large volume working fluid chamber 152. In some examples, the main body pressure P3 of the large volume reservoir 146 has a pressure different from the first pressure P1 of the pressurized gas of the supply chamber 120a. In other examples, the main body pressure P3 of the large volume reservoir 146 has a pressure different from the second pressure P2 of the pressurized gas of the return chamber 120b. In other examples, the main body pressure P3 of the large volume reservoir is pressurized between the first pressure P1 and the second pressure P2. For example, the working fluid flowing from the supply reservoir 148 to the large volume reservoir 146 and further flowing to the return reservoir 150 moves from the high pressure chamber to the medium pressure chamber, and then to the low pressure chamber. Thus, in some examples, the flow of working fluid from the supply reservoir 148 to the bulk reservoir 146 and to the return reservoir 150 is a pressure driven flow as the working fluid moves from the high pressure chamber to the low pressure chamber.

[0050] The fluid circulation system 104 may also include a pump 156 located between the return reservoir 150 and the supply reservoir 148. The pump 156 is selectively operable to move a portion of the working fluid from the return working fluid chamber 118b to the supply working fluid chamber 118a. Thus, a portion of the working fluid within the return working fluid chamber 118b (which may include undistributed working fluid from the fluid management device 102) is recirculated through the fluid circulation system 104. In other words, the pump 156 is configured to continuously circulate the working fluid through the fluid circulation system 104. In addition, in some examples, the pump 156 can be used to move the working fluid from the low-pressure return working fluid chamber 118b to the high-pressure supply working fluid chamber 118a. That is, the pump 156 is used to transfer the working fluid from the low-pressure chamber to the high-pressure chamber by actively counteracting the pressure gradient.

[0051] The fluid circulation system 104 may include one or more controllers (not shown) operably coupled to the fluid circulation system 104 to regulate at least the pressure of the supply reservoir 148, the return reservoir 150, and the bulk reservoir 146. The controller may represent any type of computing device or controller, or may be part of another device, such as a device completely contained within a server, and portions of the controller may be elsewhere or located within other computing devices. More specifically, the controller includes a processor that may execute logic stored in a data memory to control the operation of the controller. In addition, proportional valves such as proportional valve 125 and proportional valve 143 may be used throughout the fluid circulation system 104 to regulate the pressure of the gas or working fluid entering the fluid circulation system 104. Proportional valves may also be used to adjust the flow of the working fluid entering the fluid circulation system 104.

[0052] Reference Figure 2A and Figure 2B , showing some examples of reservoirs 110. The reservoir can be a portion of the fluid circulation system 104. Figure 2A The supply reservoir 148 shown in Figure 2BOne of the reflux reservoirs 150 shown in FIG. The reservoir 110 and additional features are depicted for illustrative purposes and may not be drawn to appropriate scale. The reservoir 110 includes a housing 112 that defines an inner chamber 114. The housing 112 can be selectively rotated to any of a variety of rotational directions. That is, the housing 112 can be mounted to a bracket that allows the housing 112 to rotate in at least one degree of freedom. A membrane 116 (i.e., a diaphragm) is positioned in the housing 112 and separates the inner chamber 114 into a working fluid chamber 118 and an air chamber 120. The membrane 116 is made of a flexible elastic material so that the membrane 116 can respond to pressure changes and remain in a taut state. In other words, the membrane 116 ensures effective separation of the working fluid chamber 118 and the air chamber 120 while adapting to fluctuations in gas pressure or fluid volume. In some examples, when the reservoir 110 is pressurized by pressurizing the plenum 120, the membrane 116 will maintain a curved shape, specifically a convex curve outward from the working fluid chamber 118 toward the plenum 120. The working fluid chamber 118 contains a portion of the working fluid that can flow through the fluid circulation system 104. The plenum 120 contains a pressurized gas that is kept confined within the plenum 120 for the purpose of pressure regulation.

[0053] The pressurized gas is configured to maintain the portion of the working fluid in the working fluid chamber 118 at a constant pressure. Therefore, in some examples, the pressure of the gas is controlled by a pressure valve 158 and a vacuum 160 coupled to the housing 112. A pressure port 164 extending through the housing 112 couples the air chamber 120 fluid to the pressure valve 158 and the vacuum 160. Additionally, a pressure sensor 162 is used to sense the pressure of the pressurized gas. The pressurized gas maintains tension on the membrane 116, thereby allowing the pressurized gas to pressurize the portion of the working fluid within the working fluid chamber 118. That is, by adjusting the gas pressure within the air chamber 120, the pressure of the portion of the working fluid within the working fluid chamber 118 is also adjusted, so the pressure of the portion of the working fluid is known.

[0054] The working fluid is configured to flow into and out of the working fluid chamber 118. Therefore, the working fluid chamber 118 includes an inlet port 122 that extends through the housing 112 and is fluidly coupled to the working fluid chamber 118. The inlet port 122 is configured to provide the working fluid from the fluid circulation system 104 to the working fluid chamber 118. Additionally, the working fluid chamber 118 includes an outlet port 124 that extends through the housing 112 and is fluidly coupled to the working fluid chamber 108. The outlet port 124 is configured to discharge the working fluid from the working fluid chamber 118. Specifically, as Figure 2AAs shown in FIG. 1 , when the reservoir 110 is the supply reservoir 148, the inlet port 122 fluidly couples the supply working fluid chamber 118a to the return working fluid chamber 118b via the supply return line 174. The outlet port 124 fluidly couples the supply working fluid chamber 118a to the fluid management device 102 via the inlet line 106. Similarly, as shown in FIG. Figure 2B As shown in FIG. 1 , when reservoir 110 is a return reservoir 150, inlet port 122 fluidly couples return working fluid chamber 118b to fluid management device 102 via outlet line 108. Outlet port 124 fluidly couples return working fluid chamber 118b to supply working fluid chamber 118a via supply return line 174.

[0055] The reservoir 110 also includes a discharge channel 128 extending a length L along the outer periphery 119 of the working fluid chamber 118. The discharge channel 128 is open to the working fluid chamber 118 fluid along the length L of the discharge channel 128. The discharge port 126 is fluidly connected to only a portion of the discharge channel 128. The discharge port 126 is configured to discharge gas from the working fluid chamber 118 via the discharge channel 128. Expelling gas from the working fluid chamber 118 helps maintain the pressure of the portion of the working fluid in the working fluid chamber 118. In other words, the gas in the working fluid chamber 118 may negatively affect the pressure regulation and flow of the working fluid through the fluid circulation system, and therefore should be removed from the working fluid chamber 18. Gas may inadvertently enter the working fluid chamber 118 in a variety of ways (e.g., a leaky connection in the reservoir 110 during use or air sucked into the nozzle of the fluid management device, etc.). The gas will naturally move to the uppermost portion 181 of the working fluid chamber 118. However, since the reservoir 110 is rotatable, the uppermost portion 181 of the working fluid chamber 118 will change as the reservoir 110 rotates or changes direction. Therefore, the exhaust passage 128 is configured to allow at least a portion of the length L of the exhaust passage 128 to open to the uppermost portion 181 of the working fluid chamber 118 regardless of the orientation of the reservoir 110, or at least within a certain angular range of the reservoir.

[0056] exist Figure 2A In the supply container 148 shown in FIG. 1 , the exhaust port 126 is a port separate from the inlet port 122 and the outlet port 124. The exhaust port 126 is fluidly coupled to the bulk reservoir 146 so that gas and working fluid can be exhausted into the bulk reservoir 146 through the exhaust port 126. Figure 2BIn the reflux reservoir 150 shown in the figure, the exhaust port 126 and the outlet port 124 are the same port (exhaust outlet port). That is, the port that partially discharges the working fluid from the working fluid chamber 118 to the supply reservoir 148 via the supply reflux line 174 is also used to discharge the gas from the working fluid chamber 118. Therefore, the exhaust port 126 and the outlet port 124 are a port configured to discharge the gas and a portion of the working fluid from the working fluid chamber 118. In addition, the reflux reservoir 150 also includes a large volume port 144 that extends through the housing 112 and is fluidly connected to the working fluid chamber 118. The large volume port 144 is configured to provide the working fluid from the large volume reservoir 146 to the reflux reservoir 150 via the reflux main line 168.

[0057] In some examples, the housing 112 is rotatable within an angular range between 0 and 90 degrees, and the length L of the exhaust passage 128 spans no less than 25% of the outer periphery 119 of the working fluid chamber 118. Thus, when the housing 112 is rotated between 0 and 90 degrees, at least a portion of the exhaust passage 128 is open to the uppermost portion 181 of the working fluid chamber 118. Thus, the gas accumulated at the uppermost portion 181 of the working fluid chamber 118 can be discharged from the exhaust passage 128 and pass through the exhaust port 126. Depending on the type of reservoir 110, the exhaust port 126 discharges the gas to a large volume reservoir 146 fluidly coupled to the exhaust port 126 through a supply exhaust line 170 or a return exhaust line 172. In other examples, the housing 112 is rotatable within an angular range between 0 and 180 degrees, and the length L of the exhaust passage 128 spans no less than 50% of the outer periphery 119 of the working fluid chamber 118. In other examples, the housing 112 can be rotated within an angular range between 0 and 270 degrees, and the length L of the exhaust passage 128 spans no less than 75% of the outer periphery 119 of the working fluid chamber 118. In addition, in other examples, the housing 112 can be rotated within an angular range between 0 and 360 degrees, and the length L of the exhaust passage 128 spans along the entire outer periphery 119 of the working fluid chamber 118.

[0058] Reference FIG. 3A to FIG. 3C , shows an example of a supply reservoir 148. In some examples, the outer periphery 119 of the supply working fluid chamber 118a has a circular shape. The circular shape of the outer periphery 119 is only an illustrative example of the shape of the outer periphery 119. In other examples, the shape of the outer periphery 119 can be an ellipse, a rectangle, a polygon, etc. Figure 3BIn the illustrated example, the discharge channel 128 is curved in an arc shape along the circular outer periphery 119 of the supply working fluid chamber 118a. That is, the discharge channel 128 is adjacent to the peripheral edge of the supply working fluid chamber 118a, so that when the housing 112 is in any direction of various rotation directions, the discharge channel 128 contacts the uppermost part 181 of the supply working fluid chamber 118a. In addition, the radius of curvature of the arc is equal to the radius of curvature of the circle. Therefore, when the housing 112 rotates, the discharge channel 128 remains in contact with the uppermost part 181 of the working fluid chamber 118. In some examples, as described above, the rotation of the housing 112 may be limited so that the housing 112 can only rotate from a neutral position (i.e., 0 degrees) to a specified rotation position (i.e., + / - specified degrees). Therefore, the discharge channel 128 can extend only in an arc along a portion of the supply working fluid chamber 118a to ensure that the discharge conduit 128 contacts the uppermost part 181 of the working fluid chamber while the housing 112 rotates between the neutral position and the specified rotation position. In examples where the supply working fluid chamber 118a takes a different shape, the exhaust passage 128 is configured to align with the contour of the outer perimeter 119 of the working fluid chamber 118. This alignment ensures that the exhaust passage 128 remains in contact with the uppermost portion 181 of the working fluid chamber 118 regardless of the particular rotational orientation of the housing 112.

[0059] like Figure 3A As shown in , the supply reservoir 148 includes an inlet port 122, which is configured to be connected to the supply return line 174 and supply the working fluid from the return reservoir to the supply working fluid chamber 118a. The supply reservoir 148 includes at least one outlet port 124, which is configured to be connected to the corresponding inlet line 106 and supply the working fluid to the fluid management device. When the supply reservoir 148 supplies the working fluid to more than one fluid management device, the supply reservoir 148 will have more than one outlet port 124, such as the two outlet ports 124 shown. Additionally, the supply reservoir 148 includes a discharge port 126, which is configured to discharge gas and working fluid from the supply reservoir 148 to a large volume reservoir via a supply main line 166. In some examples, a proportional valve 125 can be connected to the discharge port 126, so that the flow rate of the working fluid and gas flowing out of the supply working fluid chamber can be precisely adjusted. The proportional valve 125 can also be used to precisely adjust the working fluid pressure at the discharge port 126.

[0060] like Figure 3B, the upper cover of the housing 112 has been removed so that the interior of the supply working fluid chamber 118a is visible. Therefore, the exhaust passage 128 connected to the exhaust port 126 is shown. Therefore, the working fluid enters the supply working fluid chamber 118a via the inlet port 122 and is exhausted from the supply working fluid chamber via the outlet port 124. Additionally, the gas and some of the working fluid are exhausted from the supply working fluid chamber 118a via the exhaust passage 128 and the exhaust port 126.

[0061] Reference Figure 4 , shows an example of a reflux reservoir 150. As described above with reference to Figure 3A As described, the housing 112 of the reflux reservoir 150 may have the same size and shape as the supply reservoir 148. Alternatively, the reflux reservoir 150 may have a different size and / or shape than the supply reservoir 148, such as a larger or smaller housing circumference.

[0062] The reflux reservoir 150 includes at least one inlet port 122, and the at least one outlet port is configured to be connected to the outlet line 108 and reflux the working fluid from the fluid management device. When the reflux reservoir 150 refluxes the working fluid from more than one fluid management device, the reflux reservoir 150 will have a corresponding number of inlet ports 122, such as the three inlet ports 122 shown. The reflux reservoir 150 also includes a large volume port 144, which is configured to supply the working fluid from the large volume reservoir to the reflux working fluid chamber 118b via the main reflux line 168. In some examples, a proportional valve 143 can be connected to the large volume port 144, so that the working fluid entering the reflux working fluid chamber 118b can be precisely regulated and adjusted. Additionally, the reflux reservoir 150 includes a port that serves as both a discharge port 126 and an outlet port 124 (discharge outlet port). The exhaust outlet port is configured to exhaust gas and working fluid from the reflux reservoir 150 to the supply reservoir 148 via the supply reflux line 174. Although not shown, the reflux reservoir 150 includes an exhaust passage 128 coupled to the exhaust port 126, similar to Figure 3B The exhaust conduit 128 is shown in FIG.

[0063] like Figure 5AAs shown in , the exhaust channel 128 of the supply reservoir 148 or the return reservoir 150 includes a plurality of orifices 142 along the length of the exhaust channel 128. The plurality of orifices 142 are open to the working fluid chamber 118 fluid. The dimensions of the plurality of orifices 142 are designed so that the gas 184 in a portion of the working fluid 183 is easily discharged from the working fluid chamber 118 as exhaust gas 185 into the exhaust channel 128 and then into the exhaust port 126, while the working fluid 183 is less likely to be discharged from the working fluid chamber 118 into the exhaust channel 128 as an escape fluid 187 and then into the exhaust port 126. Therefore, more gas 184 will be drawn out of the working fluid chamber 118 via the exhaust channel 128 than the working fluid 183.

[0064] Figure 5B The reservoir 110 is shown rotated 90 degrees to the right. In this new orientation, the exhaust passage 128 remains open to the newly defined uppermost portion 181 of the working fluid chamber 118 and is in a position to draw gas 184 into the exhaust passage 128 through the orifice 142.

[0065] Reference Figure 6 , according to some examples, a method 300 of excluding gas from a working fluid in a reservoir is shown. The method 300 includes (box 302): pressurizing a portion of the working fluid of the reservoir 110 within the working fluid chamber 118 by pressurizing the pressurized gas within the gas chamber 120 of the reservoir 110 at a constant pressure. The working fluid chamber 118 and the gas chamber 120 are separated by a membrane 116. The method 300 also includes (box 304): receiving a portion of the working fluid into the working fluid chamber 118, and excluding a portion of the working fluid from the working fluid chamber 118. The method 300 also includes (box 306): selectively rotating the reservoir 110 relative to the large volume reservoir 146. The large volume reservoir 146 is in fluid communication with the working fluid chamber 118 of the reservoir 110. When the reservoir 110 is selectively rotated, the method 300 additionally includes (block 308) exhausting gas within the working fluid chamber 118 to the bulk reservoir 146 via an exhaust port 126 fluidly coupled to an exhaust passage 128 in fluid communication with the working fluid chamber 118 of the reservoir 110. The method 300 may also include maintaining the pressurized gas within the gas chamber 120 of the reservoir 110 at a constant pressure using the pressure valve 158 and the vacuum 160.

[0066] In the above description, certain terms such as "upper", "lower", "horizontal", "vertical", "left", "right", "above", "below", etc. may be used. Where applicable, these terms are used to provide some clear descriptions when dealing with relative relationships. However, these terms are not intended to indicate absolute relationships, positions and / or directions. For example, for an object, the "upper" surface can become the "lower" surface by simply flipping the object. However, it is still the same object. In addition, unless otherwise expressly specified, the terms "including", "having" and their variations all mean "including but not limited to". Unless otherwise expressly specified, the list of enumerated items does not mean that any or all of the items are mutually exclusive and / or mutually inclusive. Unless otherwise expressly specified, the terms "a", "said" and "this" also mean "one or more". In addition, the term "plurality" can be limited to "at least two"

[0067] Additionally, examples of an element "coupled" to another element in this specification may include direct and indirect coupling. Direct coupling may be defined as one element being coupled to another element and in contact with it. Indirect coupling may be defined as coupling between two elements that are not in direct contact with each other but have one or more additional elements between the coupled elements. Furthermore, as used herein, fixing one element to another element may include direct fixing and indirect fixing. Additionally, as used herein, "adjacent" does not necessarily mean contact. For example, an element may be adjacent to another element without being in contact with the other element.

[0068] As used herein, when used with a list of items, the phrase "at least one" means that different combinations of one or more of the listed items may be used, and only one of the listed items may be required. The item may be a specific object, thing, or category. In other words, "at least one" means that any combination of items or number of items can be used from the list, but not all items in the list are required. For example, "at least one of item A, item B, and item C" may refer to item A; item A and item B; item B; item A, item B, and item C; or item B and item C. In some cases, "at least one of item A, item B, and item C" may mean, for example, but not limited to, two items A, one item B, and ten items C; four items B and seven items C; or some other suitable combination.

[0069] Unless otherwise indicated, the terms "first," "second," etc. are used herein merely as labels and are not intended to impose order, position, or hierarchy requirements on the items to which these terms refer. Furthermore, reference to an item, such as "second," does not require or preclude the existence of, for example, "first" or lower-numbered items and / or, for example, "third" or higher-numbered items.

[0070] As used herein, a system, device, structure, article, element, component, or hardware that is "configured to" perform a specified function is indeed capable of performing the specified function without any changes, rather than just being likely to perform the specified function after further modification. In other words, a system, device, structure, article, element, component, or hardware that is "configured to" perform a specified function is selected, created, implemented, used, programmed, and / or designed specifically for performing the specified function. As used herein, "configured to" means existing characteristics of a system, device, structure, article, element, component, or hardware that enable the system, device, structure, article, element, component, or hardware to perform the specified function without further modification. For the purposes of this application, a system, device, structure, article, element, component, or hardware that is described as "configured to" perform a particular function may additionally or alternatively be described as being "suitable for" and / or "operable to" perform that function.

[0071] The schematic flow charts included herein are generally described as logic flow charts. Therefore, the depicted order and the steps of the labels indicate an example of the proposed method. Other steps and methods that are equivalent to one or more steps or parts thereof of the method shown in function, logic or effect can be envisioned. Additionally, the format and symbols adopted are provided to explain the logical steps of the method, and should not be understood as limiting the scope of the method. Although various arrow types and line types can be adopted in the flow chart, it should be understood that they do not limit the scope of the corresponding method. In fact, some arrows or other connectors can be used to indicate only the logical flow of the method. For example, an arrow can indicate a waiting or monitoring period of unspecified duration between the enumerated steps of the described method. In addition, the order in which a particular method occurs may or may not strictly comply with the order of the corresponding steps shown.

[0072] The subject matter may be embodied in other specific forms without departing from its spirit or essential characteristics. The described examples are to be considered in all respects as illustrative only and not restrictive. All changes within the meaning and range of equivalents of the examples herein should be included within their scope.

Claims

1. A reservoir (110) of a fluid circulation system (104), the reservoir (110) comprising: a housing (112) defining an interior chamber (114) and being selectively rotatable to any of a variety of rotational orientations; a membrane (116) positioned within the housing (112) and dividing the inner chamber (114) into a working fluid chamber (118) containing a portion of a working fluid and a gas chamber (120) containing a pressurized gas and configured to maintain the portion of the working fluid in the working fluid chamber (118) at a constant pressure; an inlet port (122) fluidly coupled to the working fluid chamber (118) and configured to provide a working fluid into the working fluid chamber (118); an outlet port (124) fluidly coupled to the working fluid chamber (118) and configured to discharge working fluid from the working fluid chamber (118); a drain passage (128) extending a length (L) along an outer periphery (119) of the working fluid chamber (118) and being fluidly open to the working fluid chamber (118) along the length (L) of the drain passage (128); as well as an exhaust port (126) fluidly coupled to only a portion of the exhaust passage (128) and configured to exhaust gas out of the working fluid chamber (118) via the exhaust passage (128); The length (L) of the discharge passage (128) is such that when the housing is in any of the various rotation directions, at least a portion of the discharge passage (128) is open to the uppermost portion of the working fluid chamber (118).

2. The reservoir (110) according to claim 1, wherein: The membrane (116) is configured to be held under tension between the working fluid chamber (118) and the air chamber (120).

3. The reservoir (110) according to claim 1, wherein: The housing (112) is rotatable within an angle range of 0 to 90 degrees; and The length (L) of the discharge passage (128) spans no less than 25% of the outer periphery (119) of the working fluid chamber (118).

4. The reservoir (110) according to claim 1, wherein: The housing (112) is rotatable within an angular range of 0 to 180 degrees; and The length (L) of the discharge passage (128) spans no less than 50% of the outer periphery (119) of the working fluid chamber (118).

5. The reservoir (110) according to claim 1, wherein: The housing (112) is rotatable within an angular range of 0 to 270 degrees; and The length (L) of the discharge passage (128) spans no less than 75% of the outer periphery (119) of the working fluid chamber (118).

6. The reservoir (110) according to claim 1, wherein: The housing (112) is rotatable within an angular range of 0 to 360 degrees; and The length (L) of the discharge passage (128) spans along the entire outer periphery (119) of the working fluid chamber (118).

7. The reservoir (110) according to claim 1, wherein: The outer periphery (119) of the working fluid chamber (118) has a circular shape; The discharge passage (128) is curved in an arc shape along the outer periphery (119) of the working fluid chamber (118); and The radius of curvature of the arc is equal to the radius of curvature of the circle.

8. The reservoir (110) according to claim 1, wherein: The exhaust passage (128) includes a plurality of orifices (142) along the length (L) of the exhaust passage (128), wherein only the plurality of orifices (142) are open to the fluid in the working fluid chamber (118), and wherein the dimensions of the plurality of orifices (142) are designed so that gas can be easily discharged from the working fluid chamber (118) while the working fluid is less easily discharged from the working fluid chamber (118).

9. The reservoir (110) of claim 1, further comprising a large volume port (144) fluidly coupled to the working fluid chamber (118) and configured to provide working fluid from a large volume reservoir (146) to the working fluid chamber (118).

10. The reservoir (110) according to claim 1, wherein: The working fluid includes ink.

11. A fluid circulation system (104) for supplying a working fluid to a fluid management device (102) and returning the working fluid from the fluid management device (102), the fluid circulation system (104) comprising: A supply reservoir (148), the supply reservoir comprising a supply membrane (116a), the supply membrane separating a supply working fluid chamber (118a) containing a portion of the working fluid and a gas supply chamber (120a) containing a pressurized gas at a first pressure (P1), wherein the supply reservoir (148) further comprises a supply exhaust port (126a) and a supply exhaust channel (128a), the supply exhaust port (126a) being fluidly coupled to the supply exhaust channel (128a), the supply exhaust channel being fluidly connected to the supply working fluid chamber (118a); A reflux reservoir (150), the reflux reservoir comprising a reflux membrane (116b), the reflux membrane separating a reflux working fluid chamber (118b) containing a portion of the working fluid and a reflux gas chamber (120b) containing a pressurized gas at a second pressure (P2), wherein the reflux reservoir (150) further comprises a reflux exhaust port (126b) and a reflux exhaust channel (128b), the reflux exhaust port (126b) being fluidically coupled to the reflux exhaust channel (128b), the reflux exhaust channel (128b) being fluidically coupled to the reflux working fluid chamber (118b); and a large volume reservoir (146) comprising a large volume working fluid chamber (152) having a free surface (154); in: The supply exhaust passage (128a) is configured to exhaust gas within the supply working fluid chamber (118a) to the bulk reservoir (146); The return exhaust passage (128b) is configured to exhaust the gas in the return working fluid chamber (118b) indirectly to the bulk reservoir (146) via the supply working fluid chamber (118a); The supply reservoir (148) and the return reservoir (150) are independently and selectively rotatable relative to the bulk reservoir (146) into any of a variety of rotational orientations; The supply reservoir (148) is configured to receive a portion of the working fluid from the return working fluid chamber (118b) to the supply working fluid chamber (118a), and is also configured to supply a portion of the working fluid from the supply working fluid chamber (118a) to the fluid management device (102); and The return reservoir (150) is configured to receive a portion of the working fluid from the fluid management device (102) to the return working fluid chamber (118b), and is also configured to supply a portion of the working fluid from the return working fluid chamber (118a) to the supply working fluid chamber (118a).

12. The fluid circulation system (104) according to claim 11, wherein: The large volume reservoir (146) is also configured to provide a portion of the working fluid to at least one of the supply working fluid chamber (118a) or the return working fluid chamber (118b) or to exclude a portion of the working fluid from at least one of the supply working fluid chamber (118a) or the return working fluid chamber (118b).

13. The fluid circulation system (104) according to claim 11, further comprising a pump (156) located between the reflux reservoir (150) and the supply reservoir (148), the pump being configured to pump the portion of the working fluid from the reflux working fluid chamber (118b) to the supply working fluid chamber (118a).

14. The fluid circulation system (104) according to claim 11, wherein: A first pressure (P1) of the pressurized gas in the supply chamber (120a) has a pressure different from a second pressure (P2) of the pressurized gas in the return chamber (120b); and The first pressure (P1) is higher than the second pressure (P2).

15. The fluid circulation system (104) according to claim 11, further comprising: a first pressure valve (158a) and a first vacuum (160a); and a second pressure valve (158b) and a second vacuum (160b); in: The first pressure (P1) of the pressurized gas within the gas supply chamber (120a) is maintained at a constant pressure by the first pressure valve (158a) coupled to the supply reservoir (148) and the first vacuum (160a); and The second pressure (P2) of the pressurized gas within the return chamber (120b) is maintained at a constant pressure by the second pressure valve (158b) coupled to the return reservoir (150) and the second vacuum (160b).

16. The fluid circulation system (104) according to claim 11, wherein: The supply reservoir (148) and the return reservoir (150) have infinite volume adaptability, so that the pressure of the portion of the working fluid in the supply working fluid chamber (118a) and the pressure of the portion of the working fluid in the return working fluid chamber (118b) are respectively kept constant, regardless of changes in the volume of the said portion of the working fluid.

17. The fluid circulation system (104) according to claim 11, wherein: Each of the supply reservoir (148) and the return reservoir (150) is independently and rotatably mounted to a six-axis carriage.

18. A method (300) for removing gas from a working fluid in a reservoir (110), the method (300) comprising: pressurizing (302) a portion of a working fluid within a working fluid chamber (118) of the reservoir (110) by pressurizing a pressurized gas within a gas chamber (120) of the reservoir (110) at a constant pressure, wherein the working fluid chamber (118) and the gas chamber (120) are separated by a membrane (116); receiving (304) a portion of the working fluid into the working fluid chamber (118) and removing a portion of the working fluid from the working fluid chamber (118); selectively rotating (306) the reservoir (110) relative to a bulk reservoir (146), wherein the bulk reservoir (146) is in fluid communication with the working fluid chamber (118) of the reservoir (110); and When the reservoir (110) is selectively rotated, gas within the working fluid chamber (118) is discharged (308) to the bulk reservoir (146) through a discharge port (126) fluidly coupled to a discharge passage (128) fluidly connected to the working fluid chamber (118) of the reservoir (100).

19. The method (300) of claim 18, further comprising: The pressurized gas within the gas chamber (120) of the reservoir (110) is maintained at a constant pressure using a pressure valve (158) and a vacuum (160).

20. The method (300) of claim 18, wherein: The step of discharging the gas within the working fluid chamber (118) to the large volume reservoir (146) through the discharge port (126) also includes indirectly discharging the gas to the large volume reservoir (146) via a second reservoir (110) coupled to the working fluid chamber (118) and the large volume reservoir (146).

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