Color filter, display device including the same, and method of manufacturing the same

Abstract

A color filter is disclosed, the color filter comprising: a glass substrate; a glass frit formed on the glass substrate; a pattern boundary part formed on the glass substrate on the inner side of the frit; a black matrix (BM) layer which is formed on the glass substrate on the inner side of the pattern boundary portion; and a first colored layer formed between the black matrix layers, and a second colored layer formed between the pattern boundary portion and the black matrix layers.

Description

Technical Field

[0001] The invention relates to a color filter, a display device including the color filter and a manufacturing method thereof. Background Art

[0002] An organic light-emitting diode (OLED) panel may reflect external light such as sunlight and lighting due to the exposure of electrodes, and the reflected external light may reduce visibility and contrast, thereby resulting in poor display quality.

[0003] Therefore, as disclosed in Korean Patent Publication No. 2009-0122138, a circular polarizer combining a linear polarizer and a λ / 4 phase difference can be attached to the visible side of the OLED panel as an anti-reflection polarizer to block reflection of external light on the surface to have a black field of view when the power is turned off.

[0004] However, the use of such an anti-reflective polarizing plate may result in a problem of reduced brightness of the OLED panel. Therefore, as an alternative to the anti-reflective polarizing plate, people are paying more attention to color filters.

[0005] Meanwhile, frit may be used to seal the display panel after manufacturing the display panel.

[0006] Korean Patent Publication No. 2012-0139557 discloses "a method for manufacturing a sealed body, the method comprising: a step of forming a heat-generating layer on a first substrate; a step of forming a glass paste including a glass material and an adhesive on the heat-generating layer; a step of heating the heat-generating layer by induction heating to melt the glass material and remove the adhesive to form glass frit; a step of providing a first substrate and a second substrate opposite to each other via the glass frit; and a step of irradiating the glass frit with a laser to melt the glass frit and the second substrate". In other words, in order to solve the problem caused by the high firing temperature of the glass frit, a method of locally heating the heat-generating layer using induction heating is proposed.

[0007] However, in order to form glass frit using induction heating, an additional process of forming a heat generating layer is required, thereby increasing time and cost. In addition, Korean Patent Publication No. 2012-0139557 also discloses that "the heat generating layer 113 is formed of glass frit paste in a pattern substantially consistent with the glass frit paste 115 formed later". Due to the accuracy and alignment error when forming the heat generating layer and the glass frit paste, the width of the heat generating layer is required to be wider than the glass frit. However, when a wide heat generating layer is formed, the frame area of ​​the display panel becomes wider. Summary of the invention

[0008] Technical issues

[0009] An object of the present invention is to solve the above-mentioned problems of the prior art and to provide a color filter that can be sealed with glass frit, has a simple process, and has a narrow frame area.

[0010] Another object of the present invention is to provide a color filter. By forming the color filter on a glass substrate, a color filter capable of replacing a polarizing plate for OLED is provided.

[0011] Still another object of the present invention is to improve the flatness of film thickness when manufacturing a color filter that can be sealed using frit.

[0012] Another object of the present invention is to provide a display device including the color filter.

[0013] Another object of the present invention is to provide a method for manufacturing the color filter.

[0014] Solution

[0015] One solution of the present invention for achieving this object provides a color filter, the color filter comprising: a glass substrate; a glass material formed on the glass substrate; a pattern boundary portion formed on the glass substrate inside the glass material; a black matrix (BM) layer formed on the glass substrate inside the pattern boundary portion; and a first coloring layer and a second coloring layer, wherein the first coloring layer is formed between the black matrix layers, and the second coloring layer is formed between the pattern boundary portion and the black matrix layer. The pattern boundary portion comprises a first upper surface inclined from the glass material toward the black matrix layer.

[0016] The pattern boundary portion may further include a second upper surface that is flat in a direction from the first upper surface toward the black matrix layer.

[0017] The width and average height of the pattern boundary portion may be respectively greater than the width and average height of the black matrix layer.

[0018] The cross section of the glass frit may be a trapezoidal shape, and the angle of the hypotenuse of the trapezoidal shape relative to the horizontal direction may be 5 degrees to 30 degrees.

[0019] The distance between the glass frit and the pattern boundary portion may be 200 μm to 1500 μm.

[0020] According to another embodiment of the present invention, a color filter is provided, the color filter comprising: a glass substrate; a glass material formed on the glass substrate; a first pattern boundary portion formed on the glass substrate on the inner side of the glass material; a second pattern boundary portion formed on the glass substrate on the inner side of the first pattern boundary portion; a black matrix (BM) layer formed on the glass substrate on the inner side of the second pattern boundary portion; and a first coloring layer and a second coloring layer, wherein the first coloring layer is formed between the black matrix layers, and the second coloring layer is formed between the second pattern boundary portion and the black matrix layer. The first pattern boundary portion comprises a first upper surface inclined from the glass material toward the black matrix layer.

[0021] In the color filter according to the present invention, the thickness of the glass substrate may be 0.2 mm to 0.5 mm, and the refractive index of the glass substrate may be 1.4 to 1.8.

[0022] The color filter according to the present invention can be used for antireflection or for replacing a polarizing plate.

[0023] According to another aspect of the present invention, a display device is provided. The display device includes the color filter described above, and a display panel combined with the color filter.

[0024] According to another embodiment of the present invention, a method for manufacturing a color filter is provided, the method comprising: forming a pattern boundary portion and a black matrix (BM) layer on the inner side of the glass frit on a glass substrate formed with glass frit; and forming a first coloring layer between the black matrix layers, and forming a second coloring layer between the pattern boundary portion and the black matrix layer. The pattern boundary portion is formed to have a first upper surface inclined from the glass frit toward the black matrix layer.

[0025] The method for manufacturing a color filter according to the present invention may further include a step of forming glass frit on a glass substrate before the step of forming a pattern boundary portion and a black matrix layer.

[0026] The pattern boundary portion and the black matrix layer may be formed by a slit coating method.

[0027] The first coloring layer and the second coloring layer may be formed by a slit coating method.

[0028] The coating speed of the slit coating method can be 20 mm / s to 80 mm / s.

[0029] In the step of forming the pattern boundary portion and the black matrix layer, and the step of forming the first coloring layer and the second coloring layer, the exposure amount may be 80 mj to 120 mj.

[0030] Effects of the Invention

[0031] According to the present invention, by forming a pattern boundary portion having the same material as the black matrix layer between the glass material and the pixel area on the glass substrate, the color filter can be sealed through a simplified process, the flatness of the film thickness of the black matrix layer and the coloring layer can be improved, and a narrow frame area can be obtained. Such a color filter provides an effect of improving light efficiency and suppressing external light reflection, thereby being able to replace a polarizing plate in an OLED display device. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] Figure 1 is a cross-sectional view of a color filter according to a first embodiment of the present invention.

[0033] Figure 2 for Figure 1 An enlarged view of part II.

[0034] Figure 3 and Figure 4 2 is a cross-sectional view of a portion of a color filter according to a second embodiment and a third embodiment of the present invention.

[0035] Figure 5a to Figure 5d 1 is a cross-sectional view of each step of a method for manufacturing a color filter according to a first embodiment of the present invention.

[0036] Figure 6 is a cross-sectional view of a display device including a color filter according to a first embodiment of the present invention. DETAILED DESCRIPTION

[0037] Hereinafter, preferred embodiments of the present invention will be described in more detail with reference to the accompanying drawings. However, the drawings accompanying this specification are only for the purpose of illustrating the present invention, and the present invention is not limited by the drawings. For the convenience of description, some components may be enlarged, reduced or omitted in the drawings.

[0038] Figure 1 is a cross-sectional view of a color filter according to a first embodiment of the present invention, and Figure 2 for Figure 1 An enlarged view of part II.

[0039] Reference Figure 1 The color filter according to the first embodiment of the present invention may include a substrate 110 , a sealing glass frit 120 , a black matrix (BM) layer 130 , a pattern boundary portion 135 , and a coloring layer 140 .

[0040] The substrate 110 may be a glass substrate. The thickness of the substrate 110 may be 0.2 mm to 0.5 mm. As for the refractive index of the substrate 110, it is preferably 1.4 to 1.8 similar to that of the color filter in consideration of light efficiency.

[0041] The glass frit 120 is formed on the substrate 110 to overlap with an opposing substrate (not shown) and seal the substrate 110. The material or method of making the glass frit 120 and the sealing method using the glass frit 120 are not particularly limited by the present invention, and any conventional technology in the art can be used.

[0042] Now, refer to Figure 2 , the width f of the glass frit 120 may be 300μm to 1500μm. If the width of the glass frit 120 is narrower than this range, when the glass frit is subsequently used to bond two substrates, delamination is more likely to occur due to the small area of ​​bonding with the opposing substrate. On the contrary, a wider width of the glass frit 120 reduces the cutting efficiency and increases the frame area. The height of the glass frit 120 may be 4μm to 10μm, preferably 5μm to 8μm. If the height of the glass frit 120 is higher than this range, the distance from the OLED (not shown in the figure) formed on the opposing substrate becomes larger and the viewing angle decreases. If the height of the glass frit 120 is less than this range, the distance to the OLED is too close and may contact the OLED, and the contact pressure is therefore increased.

[0043] The angle α indicating the slope of the glass frit 120 may be 5 to 30 degrees. A slope greater than this range, i.e., a large angle α, may result in poor processability during coating. If the slope is too low, i.e., the angle α is too small, the contact area with the opposite substrate during substrate bonding may be small, and delamination may occur.

[0044] The patterns of the BM layer 130 and the coloring layer 140 are formed inside the glass frit 120 , and a pattern boundary 135 is formed between the glass frit 120 and the pattern along the edge of the pattern.

[0045] The BM layer 130 is a light shielding layer for dividing the pixel area, blocking light from areas outside the pixel area, and preventing color mixing at the boundaries of each coloring layer. Therefore, the BM layer 130 is formed of an opaque material and is patterned to surround the pixel area.

[0046] The BM layer 130 is formed of a material containing carbon black, which may include a polymer material. The polymer material may include, for example, one or more selected from the group consisting of polyacrylate, polymethacrylate (e.g., PMMA), polyimide, polyamide, polyvinyl alcohol, polyamic acid, polyolefin (e.g., PE, PP), polystyrene, polynorbornene, phenylmaleimide copolymer, polyazobenzene, polyphenylenephthalamide, polyester (e.g., PET, PBT), polyarylester, cinnamate polymer, coumarin polymer, phthalinmidine polymer, chalcone polymer, and aromatic acetylene polymer.

[0047] An organic material including a black pigment may also be used for the BM layer 130. When an organic material is used, it is advantageous for low reflection.

[0048] The film thickness, i.e., height of the BM layer 130 may be 0.8 μm to 1.8 μm, preferably 1.0 μm to 1.5 μm. If the height of the BM layer 130 is higher than this range, the BM layer 130 may contact the OLED, which may cause defects due to increased contact pressure. If the height of the BM layer 130 is formed to be lower, an area where the BM layer 130 pattern is not generated may appear during the manufacturing process by coating.

[0049] The pattern boundary portion 135 is formed of the same material as the BM layer 130. Figure 1 and Figure 2 In the color filter according to the first embodiment of the present invention, the pattern boundary portion 135 is composed of a first portion ( Figure 2 A) in the figure and a second part having a flat upper surface ( Figure 2 B) in the composition.

[0050] The total width w of the pattern boundary portion 135 may be 50 μm to 500 μm. Figure 2The width w1 of A) in FIG. 5 may be 5 μm to 495 μm, and the second portion ( Figure 2 The width w2 of B) in FIG. 5 may be 5 μm to 495 μm. The inclination angle θ of the inclined upper surface may be 0 degree to 2 degrees.

[0051] The distance d between the pattern boundary 135 and the frit 120 may be 200 to 1500 μm, preferably 400 to 1000 μm. When sealing with the frit 120 using laser, a closer distance d may damage the pattern formed inside the frit 120, while a larger distance d may increase the frame area.

[0052] The present invention does not require an independent heat generating layer or the like to form the glass frit 120, and the glass frit 120 can be directly formed on the substrate 110. Therefore, compared with the prior art, a narrower frame area can be achieved.

[0053] The coloring layer 140 is a layer for realizing the color of the color display, which is usually patterned with red, green and blue, and is disposed in the pixel area between the BM layers 130. In the color filter according to the first embodiment of the present invention, the coloring layer 140 is formed in the pixel area between the BM layers 130 and in the area between the BM layer 130 and the pattern boundary portion 135. At the same time, the coloring layer 140 does not necessarily include patterns of all colors of red, green and blue, or only includes patterns of red, green and blue. Depending on the color expression method of the display device, the coloring layer 140 may include any part of the patterns of these colors, or further include patterns of other colors such as white patterns.

[0054] The coloring layer 140 may also be formed of the above-mentioned polymer material, and at least one of the BM layer 130 and the coloring layer 140 is preferably formed of a low-reflective material. Specifically, a low-reflective material is preferably used as the material of the coloring layer 140. When the color filter according to an embodiment of the present invention is used to prevent external light reflection in an OLED display device, preferably, at the center wavelength of the OLED light source, the transmittance of each color is 50% or more.

[0055] The film thickness of the coloring layer 140, that is, its height may be 1.0 μm to 2.5 μm, preferably 1.2 μm to 2.0 μm. If the height of the coloring layer 140 is higher than this range, the coloring layer 140 may contact the OLED, which may cause defects due to increased contact pressure. If the height of the coloring layer 140 is formed to be low, an area where the pattern of the coloring layer 140 is not generated may appear during the manufacturing process by coating.

[0056] Figure 3 and Figure 4Partial cross-sectional views of color filters according to the second embodiment and the third embodiment of the present invention respectively.

[0057] In the color filters according to the second and third embodiments of the present invention, the shapes of the pattern boundary portions 335 , 435 , and 437 are different from those of the pattern boundary portions of the color filter according to the first embodiment of the present invention.

[0058] Reference Figure 3 In the color filter according to the second embodiment of the present invention, the entire upper surface of the pattern boundary portion 335 is configured to be inclined. Since the configuration other than the shape of the pattern boundary portion 335 is the same as that of the first embodiment of the present invention, it will not be described in detail.

[0059] Reference Figure 4 In the color filter according to the third embodiment of the present invention, the pattern boundary portion is divided into two parts, namely, a first pattern boundary portion 435 having an inclined upper surface and a second pattern boundary portion 437 having a substantially flat upper surface. Since the configuration other than the shapes of the pattern boundary portions 435 and 437 is the same as that of the first embodiment of the present invention, it will not be described in detail.

[0060] In other embodiments of the present invention, the pattern boundary portion may be divided into two parts, but the upper surfaces of the two parts may be configured to be inclined.

[0061] Now, a method of manufacturing a color filter according to a first embodiment of the present invention will be described.

[0062] Figure 5a to Figure 5d 1 is a cross-sectional view of each step of a method for manufacturing a color filter according to a first embodiment of the present invention.

[0063] First, if Figure 5a As shown, a substrate 110 formed with glass frit 120 is prepared. The substrate 110 may be a glass substrate. The glass frit 120 is pre-formed on the substrate 110. The material or manufacturing method of the glass frit is not particularly limited by the present invention, and any conventionally used technology in this field may be used.

[0064] Next, if Figure 5b As shown, a composition 530 for forming a BM layer and a pattern boundary portion is applied through a nozzle 500. The arrow marked with C in the figure indicates the coating direction. As a coating method, slit coating or the like can be used. As a composition 530 for forming a BM layer and a pattern boundary portion, the above-mentioned polymer material including carbon black can be used.

[0065] In the process of coating the composition 530 for forming the BM layer and the pattern boundary portion, the coating gap is 50 μm to 350 μm, preferably 100 μm to 250 μm. If the coating gap is higher than this range, an uncoated area may appear depending on the viscosity. On the contrary, if the coating gap is lower than this range, bead pushing of the composition may occur in the nozzle 500, resulting in poor coating uniformity and damage to the nozzle due to impurities.

[0066] The coating speed may be 1 mm / s to 150 mm / s, preferably 20 mm / s to 80 mm / s. If the coating speed is higher than this range, uncoated areas may appear depending on the viscosity, and if the coating speed is lower than this range, delay in processing speed may become a problem.

[0067] Then, the coating film of the composition 530 for forming the BM layer and the pattern boundary portion is patterned, such as Figure 5c As shown, a BM layer 130 and a pattern boundary portion 135 are formed.

[0068] The exposure amount in the process of forming the BM layer 130 and the pattern boundary portion 135 is 30 mj to 200 mj, preferably 80 mj to 120 mj. If the exposure amount is lower than this range, the adhesive force may be reduced, and if the exposure amount is higher than this range, the delay in the processing speed may become a problem.

[0069] The size and shape of the formed BM layer 130 and the pattern boundary portion 135 are as previously described. Figure 1 and Figure 2 described.

[0070] Afterwards, if Figure 5d As shown, a coloring layer 140 is formed on the BM layer 130 and the pattern boundary portion 135 .

[0071] The coloring layer 140 is formed by applying a composition for forming each coloring layer for color expression to the pixel area divided by the BM layer 130 and the pattern boundary portion 135, and exposing and developing the composition in a predetermined pattern. The colors constituting the coloring layer can be arbitrarily selected, and the order of forming each color can also be arbitrarily selected.

[0072] The steps of applying the composition for forming the coloring layer, exposing and developing the composition are similar to those of the reference Figure 5b and Figure 5c The process of forming the BM layer 130 and the pattern boundary portion 135 is to form the coloring layer by using a method such as slit coating under the above conditions of coating gap, coating speed and exposure amount.

[0073] As described above, the coloring layer 140 may be formed to have a film thickness, that is, a height, of 1.0 μm to 2.5 μm, preferably 1.2 μm to 2.0 μm.

[0074] By forming a color filter according to the above-described manufacturing method, the flatness of the film thickness of the black matrix layer and the coloring layer in the color filter according to the embodiment of the present invention can be improved.

[0075] Next, a display device including a color filter according to a first embodiment of the present invention will be described.

[0076] Figure 6 is a cross-sectional view of a display device including a color filter according to a first embodiment of the present invention.

[0077] like Figure 6 As shown, the display device according to the first embodiment of the present invention may include the color filter 100 according to the first embodiment of the present invention, and a display panel 200 bonded to the color filter 100 .

[0078] The color filter 100 can be compared with the reference Figure 1 and Figure 2 The color filters according to the first embodiment of the present invention are the same or similar.

[0079] The display panel 200 may have a structure in which an OLED layer 220 is formed on a second substrate 210. However, Figure 6 The structure of the display panel 200 shown in FIG. 2 is presented only as an example, and the structure is not particularly limited in the present invention as long as it can be used in a display device.

[0080] The display panel 200 is bonded to the color filter 100 through the frit glass 120 on the color filter 100 .

[0081] At the same time, you can configure the reference in a similar way Figure 3 and Figure 4 The display device of the color filter according to the second embodiment and the third embodiment of the present invention is described.

[0082] Hereinafter, the present invention will be further described in detail by way of examples and comparative examples. These examples and comparative examples are only intended to illustrate the present invention, and it is obvious to those skilled in the art that the scope of the present invention is not limited thereto.

[0083] Examples and Comparative Examples

[0084] A substrate was prepared in which a glass frit was simulated by an organic film on a glass substrate. The width of the glass frit was 1.1 mm and the height was 6.5 μm.

[0085] The composition for forming the BM layer was coated on a simulated substrate, and the properties of the formed film were measured after preheating, exposure, development, and curing. The width of the film was measured using Mercury 8000s (V-Technology), and the height was measured using PSIS5006 (SNU Precision).

[0086] The values ​​in the area far enough from the frit not to be affected by the frit are averaged, and the values ​​based on the position from the frit are compared with the average.

[0087] Table 1 shows the measurement results as a function of coating speed, Table 2 shows the measurement results as a function of exposure amount, and Table 3 shows the measurement results as a function of frit slope.

[0088] In the measurements in Table 1, the coating gap was 150 μm, the coating amount of the composition was 16 cc, the exposure amount was 87 mj, and the glass frit slope α was kept constant at 36 degrees.

[0089] [Table 1]

[0090]

[0091]

[0092] As shown in Table 1, for Examples 1 to 3 in which the coating speed was maintained at 80 mm / s or less, the width and height at 0 mm and 0.5 mm from the glass material were maintained within a constant range compared to the average value, while for Comparative Example 1 in which the coating speed was 100 mm / s, the width and height at 0 mm and 0.5 mm from the glass material increased significantly.

[0093] In the measurements in Table 2, the width and height of the film varying with the exposure amount were compared with the average value while keeping the coating gap at 150 μm, the coating speed at 100 mm / s, the composition coating amount at 16 cc, and the glass frit slope α at 36 degrees constant.

[0094] [Table 2]

[0095]

[0096] As shown in Table 2, for Example 4 and Example 5 exposed to 87 mj and 108 mj, respectively, the width and height at 0 mm and 0.5 mm from the glass frit were kept constant compared to the average value. On the other hand, for Comparative Example 2 with an exposure of 70 mj, the width and height at 0 mm and 0.5 mm from the glass frit increased significantly.

[0097] In the measurements in Table 3, the width and height of the film varying with the slope α of the glass material were compared with the average value while keeping the coating gap at 150 μm, the coating speed at 100 mm / s, the composition coating amount at 16 cc and the exposure amount at 70 mj constant.

[0098] [Table 3]

[0099]

[0100]

[0101] As shown in Table 3, for Example 6 and Example 7, in which the slope α of the glass frit was formed to 19 degrees and 27 degrees, respectively, the width and height at 0 mm and 0.5 mm from the glass frit were kept within a constant range compared to the average value. On the other hand, for Comparative Example 3, in which the slope α of the glass frit was 36 degrees, the width and height at 0 mm and 0.5 mm from the glass frit increased significantly.

[0102] In summary, the results shown in Tables 1 to 3 above indicate that coating speed, exposure, and the slope of the glass frit affect the properties of the film formed using the composition for forming the BM layer. To further confirm the influence of these conditions, additional tests were performed using the composition for forming the colored layer.

[0103] In Comparative Example 4 used as a reference, a film was formed using the composition for forming red, green, and blue coloring layers without forming a glass frit, and then the transmittance and brightness were measured respectively. In Example 8, by combining the results shown in Tables 1 to 3 above, a coating gap of 150 μm, a coating speed of 50 mm / s, a coating amount of the composition of 16 cc, an exposure amount of 108 mj, and a glass frit slope α of 19 degrees were applied. In Comparative Example 5, a coating gap of 150 μm, a coating speed of 100 mm / s, a coating amount of the composition of 16 cc, an exposure amount of 87 mj, and a glass frit slope α of 36 degrees were applied.

[0104] The width of the formed film was measured using Mercury 8000s (V-Tech). Chromaticity, optical density, and transmittance were measured using a spectrometer LCF-5100 (Otsuka Electronics, Korea). The film thickness and properties of the area around the glass frit and the area not affected by the glass frit were measured, and the properties were compared based on the deviation (Max-Min) / Ave×100 / 2 (where Max is the maximum value, Min is the minimum value, and Ave is the value of the area not affected by the glass frit).

[0105] [Table 4]

[0106]

[0107] For Comparative Example 4 used as a reference, the deviation is ±3% as shown by shading in Table 4, for Example 8, the deviation is ±4% as shown by bold in Table 4, and for Comparative Example 5, the deviation is ±6% as shown by italics in Table 4.

[0108] Furthermore, films were formed using the composition for forming the BM layer under the same conditions, and their properties were compared.

[0109] [Table 5]

[0110]

[0111] Similarly, for the film using the composition for forming the BM layer, Comparative Example 4 used as a reference showed a deviation of ±3% as indicated by the shading in Table 4, Example 8 showed a deviation of ±4% as indicated by the bold in Table 4, and Comparative Example 5 showed a deviation of ±6% as indicated by the italics in Table 4.

[0112] It was confirmed that by adjusting the coating speed, exposure amount, and glass frit slope in this manner, a colored layer and a BM layer suitable for the corresponding specifications can be formed.

[0113] The preferred embodiments of the present invention are described above with reference to the accompanying drawings. However, the present invention is not limited to the above embodiments, and the present invention can be implemented in a deformed form within the scope of the essential characteristics of the present invention. The above embodiments of the present invention can be applied independently or in combination with part or all of their features.

[0114] Therefore, the scope of the present invention should be defined by the claims rather than the above description, and all differences within the scope equivalent thereto should be construed as being included in the present invention.

[0115] Explanation of symbols

[0116] 100: color filter, 110: substrate, 120: glass material, 130: black matrix layer, 135: pattern boundary portion, 140: coloring layer, 200: display panel, 210: second substrate, 220: OLED layer.

Claims

1. A color filter, characterized in that: include: Glass substrate; Glass frit formed on the glass substrate; a pattern boundary portion formed on the glass substrate at the inner side of the glass frit; A black matrix layer formed on the glass substrate at the inner side of the pattern boundary portion; and a first coloring layer and a second coloring layer, wherein the first coloring layer is formed between the black matrix layers, and the second coloring layer is formed between the pattern boundary portion and the black matrix layer, The pattern boundary portion includes a first upper surface inclined in a direction from the glass frit toward the black matrix layer.

2. The color filter according to claim 1, characterized in that The pattern boundary portion further includes a second upper surface that is flat in a direction from the first upper surface toward the black matrix layer.

3. The color filter according to claim 1, characterized in that The width and average height of the pattern boundary portion are respectively greater than the width and average height of the black matrix layer.

4. The color filter according to claim 1, characterized in that The cross section of the glass material is trapezoidal in shape, The angle of the hypotenuse of the trapezoidal shape relative to the horizontal direction is 5 degrees to 30 degrees.

5. The color filter according to claim 1, characterized in that A distance between the glass frit and the pattern boundary portion is 200 μm to 1500 μm.

6. A color filter, characterized in that: include: Glass substrate; Glass frit formed on the glass substrate; a first pattern boundary portion formed on the glass substrate and inside the glass frit; a second pattern boundary portion formed on the glass substrate at an inner side of the first pattern boundary portion; A black matrix layer formed on the glass substrate at an inner side of the second pattern boundary portion; and a first coloring layer and a second coloring layer, wherein the first coloring layer is formed between the black matrix layers, and the second coloring layer is formed between the second pattern boundary portion and the black matrix layer, The first pattern boundary portion includes a first upper surface inclined in a direction from the glass frit toward the black matrix layer.

7. The color filter according to any one of claims 1 to 6, characterized in that The thickness of the glass substrate is 0.2 mm to 0.5 mm.

8. The color filter according to any one of claims 1 to 6, characterized in that The refractive index of the glass substrate is 1.4 to 1.

8.

9. The color filter according to any one of claims 1 to 6, characterized in that: The color filter is used for anti-reflection.

10. The color filter according to any one of claims 1 to 6, characterized in that: The color filter is used to replace the polarizing plate.

11. A display device, characterized in that: include: The color filter according to any one of claims 1 to 6; as well as A display panel is combined with the color filter.

12. A method for manufacturing a color filter, characterized in that: include: On a glass substrate formed with glass frit, a step of forming a pattern boundary portion and a black matrix layer inside the glass frit; as well as forming a first coloring layer between the black matrix layers and forming a second coloring layer between the pattern boundary and the black matrix layer, The pattern boundary portion is formed to have a first upper surface inclined in a direction from the glass frit toward the black matrix layer.

13. The method for manufacturing a color filter according to claim 12, characterized in that: Before the step of forming the pattern boundary portion and the black matrix layer, the method further includes the step of forming the glass frit on the glass substrate.

14. The method for manufacturing a color filter according to claim 12, characterized in that: The pattern boundary portion and the black matrix layer are formed by a slit coating method.

15. The method for manufacturing a color filter according to claim 12, characterized in that: The first coloring layer and the second coloring layer are formed by a slit coating method.

16. The method for manufacturing a color filter according to claim 14 or 15, characterized in that: The coating speed of the slit coating method is 20 mm / s to 80 mm / s.

17. The method for manufacturing a color filter according to claim 14 or 15, characterized in that: In the step of forming the pattern boundary portion and the black matrix layer, and the step of forming the first coloring layer and the second coloring layer, the exposure amount is 80 mj to 120 mj.

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