Hyperspectral data analysis method based on plasma resonance metal film substrate
By using plasma resonant metal thin film substrates and deep learning technology in microscopic hyperspectral imaging technology, the problem of difficult equipment cost and imaging performance is solved, and high sensitivity and high resolution spectral analysis is achieved.
Patent Information
- Application Number
- CN202510092476.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-21
- Publication Date
- 2025-06-03
AI Technical Summary
Existing microscopic hyperspectral imaging technologies are difficult to take into account both equipment cost and imaging performance, especially in reducing background interference and improving signal-to-noise ratio.
Using a hyperspectral data analysis method based on a plasma resonant metal thin film substrate, a metal nano-film substrate with plasma resonance effect is pre-prepared, the sample to be tested is loaded on the substrate, and spectral testing is performed through a reflective bright-field microscopic hyperspectral imaging system, and feature extraction and analysis are performed in combination with a deep neural network or a support vector machine.
It realizes that the spectral characteristic information of the sample is significantly enhanced and the spectral information is interpreted accurately and efficiently under the conditions of low equipment costs. It is suitable for biomedical, materials science and environmental monitoring and other fields.