Device with adjustable reflectivity

By applying voltage in the projected overlapping area between the first transparent conductive layer and the second transparent conductive layer of the reflective electrochromic device, electrodeposition and dedeposition are performed using metal ions in the active material, the problem of uneven color discoloration of the electrochromic device is solved, and a more uniform electrochromic effect and higher flexibility are achieved.

CN120085498APending Publication Date: 2025-06-03FENSHIPU CO LTD
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Patent Information

Application Number
CN202311585736.5
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2023-11-24
Publication Date
2025-06-03

AI Technical Summary

Technical Problem

When the size of the reflective electrochromic device increases, the operating voltage becomes smaller due to the large resistance of the conductive electrode, and the metal electrodeposition and dedeposition efficiency becomes worse, and the color discoloration is uneven.

Method used

Using the relatively arranged first transparent conductive layer and second transparent conductive layer, the active material between the two includes a cathode material and anode material, and electrochromic is achieved by applying a negative or positive voltage in the projected overlapping region to reduce or oxidize the metal ions.

Benefits of technology

By controlling the voltage difference of each projected overlapping region, uniform electrodeposition and dedeposition are achieved, the discoloration uniformity of the electrochromic device is improved, and the state of each projected overlapping region can be controlled separately to meet the flexibility of different display needs.

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Abstract

The invention discloses an adjustable reflectivity device which comprises a first transparent conductive layer (a main color-changing polar plate), a second transparent conductive layer (a slave polar plate) and an active material between the first transparent conductive layer and the second transparent conductive layer. The second transparent conductive layer is arranged into a plurality of second conductive subareas which are insulated from one another and are independently electrified, and the first conductive subareas and the second conductive subareas have projection overlapping areas; therefore, the working state and the voltage difference of each projection overlapping area can be independently controlled in a regionalization mode by applying voltage to the corresponding first conductive subarea and the corresponding second conductive subarea, color changing uniformity is improved, and various patterns are displayed. In addition, under the condition that the area of the second transparent conductive layer is small, the area of the electrified second conductive subarea in the second transparent conductive layer is controlled to be larger than the area of the electrified first conductive subarea in the first transparent conductive layer, so that the deposition efficiency is improved, and the color change uniformity is further improved.
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Description

Technical Field

[0001] This application relates to the field of electrochromic technology, and particularly to an adjustable reflectivity device. Background Art

[0002] Electrochromic devices have the adjustability of light absorption and transmittance under the action of an electric field. For example, electrochromic smart glass can selectively absorb or reflect external thermal radiation and internal heat diffusion under the action of an electric field, reducing the large amount of energy that must be consumed to keep office buildings and civilian residences cool in summer and warm in winter. At the same time, it serves the purpose of improving the natural light level and preventing peeping. Moreover, electrochromic smart glass can adjust the light intensity inside cars and airplanes with a relatively low voltage (2V - 5V) and low power, making the journey more comfortable. Currently, it has been applied in some high-end cars and airplanes. After half a century of development, electrochromic devices have achieved many effective results and have been put into use in certain fields. With the continuous development of science and technology, electrochromic materials and their devices will surely play a more important role.

[0003] However, solving the problem of photothermal regulation by controlling the light absorption rate of electrochromic devices is usually not very efficient. Because when the light absorption rate on the surface of the electrochromic device increases, most of the light energy is converted into heat energy, causing the temperature of the device to rise, and part of the heat on the device surface will enter the space through convection and radiation. In contrast, electrochromic devices that regulate light reflectivity can perform photothermal management more efficiently. When less energy is required in the space, the light reflectivity of the electrochromic device can be increased to reflect most of the light (including ultraviolet light, visible light, and infrared light) back into the air, and the temperature of neither the electrochromic device nor the space will increase. Therefore, electrochromic devices with adjustable light reflectivity, as an important product for energy conservation and emission reduction, can more effectively assist buildings and cars in photothermal management.

[0004] However, up to now, there has been a technical difficulty that electrochromic devices have been unable to overcome. In order to maintain the high transmittance of electrochromic devices, the selection of their electrode materials is severely restricted. Currently, the commonly used electrode materials are inorganic oxides such as ITO (indium tin oxide) and FTO (fluorine-doped SnO 2 conductive glass). The sheet resistance of such materials is much larger than that of good conductor materials such as metals. As a result, when the size of the electrochromic device increases, the voltage will gradually or even sharply decrease from the edge to the central region, resulting in uneven color change. There are relevant literature reports that for a square electrochromic glass with a side length of 10 cm, the voltage drop from the edge to the center point can reach 0.3V. Both absorption-type and reflection-type electrochromic devices are similarly troubled by this.

[0005] In particular, for a reflective electrochromic device, it often forms a metal layer through the oxidation reaction of metal ions by electrodeposition to be in a reflective state, and the metal layer undergoes a reduction reaction to de-deposit and form metal ions again to be in a transparent state. When the device is powered on, due to the large resistance of the conductive electrode, as the size of the device increases, the actual working voltage in the area of the device far from the power connection position becomes smaller, resulting in poor efficiency of metal electrodeposition and de-deposition. Uniform electrodeposition and de-deposition cannot be achieved on the conductive electrode, and the color change is uneven, specifically manifested as a series of problems such as a slow color change rate and uneven color change from the edge to the center. Moreover, in order to improve the efficiency of electrodeposition and de-deposition, usually the area of the counter electrode (the electrode forming a loop with the main color-changing electrode plate) needs to be larger than the area of the main color-changing electrode plate (the electrode where electrodeposition and de-deposition occur), that is to say, the area of the counter electrode needs to be set large enough, which undoubtedly exacerbates the problem of uneven color change in the reflective electrochromic device. Summary of the Invention

[0006] To solve the above technical problems, an embodiment of the present application provides an adjustable reflectivity device to improve the color change uniformity of the reflective electrochromic device.

[0007] To achieve the above object, the embodiment of the present application provides the following technical solutions:

[0008] An adjustable reflectivity device, comprising:

[0009] A first transparent conductive layer and a second transparent conductive layer arranged opposite to each other;

[0010] An active material between the first transparent conductive layer and the second transparent conductive layer, the active material comprising a cathode material and an anode material, the cathode material comprising metal ions;

[0011] Wherein, the first transparent conductive layer comprises a plurality of first conductive partitions that are insulated from each other and independently energized, the second transparent conductive layer comprises a plurality of second conductive partitions that are insulated from each other and independently energized, and the first conductive partitions and the second conductive partitions have a projection overlapping area;

[0012] When a negative voltage is applied between the first conductive partition and the second conductive partition corresponding to the projection overlapping area, the metal ions undergo a reduction reaction in the projection overlapping area corresponding to the first conductive partition to generate a metal thin film, and the anode material undergoes an oxidation reaction, and the projection overlapping area is in a reflective state; when a positive voltage is applied between the first conductive partition and the second conductive partition corresponding to the projection overlapping area, the metal thin film undergoes an oxidation reaction and turns back into the metal ions, and the anode material undergoes a reduction reaction, and the projection overlapping area is in a non-reflective state;

[0013] When being electrified, the area of the second conductive partition that is electrified in the second transparent conductive layer is larger than the area of the first conductive partition that is electrified in the first transparent conductive layer.

[0014] Optionally, the anode material includes a transparent conductive compound layer located on the side of the second transparent conductive layer close to the first transparent conductive layer;

[0015] When a negative voltage is applied between the first conductive partition and the second conductive partition corresponding to the projection overlapping area, an oxidation reaction occurs in the projection overlapping area corresponding to the transparent conductive compound layer; when a positive voltage is applied between the first conductive partition and the second conductive partition corresponding to the projection overlapping area, a reduction reaction occurs in the projection overlapping area corresponding to the transparent conductive compound layer.

[0016] Optionally, the metal ions include Fe 3+ , Bi 3+ , Cu 2+ , Ag + , Zn 2+ and Sn 2+ at least one of the six;

[0017] The material of the transparent conductive compound layer includes at least one of 3,4-ethylenedioxythiophene monomer polymer (PEDOT), poly-3,4-ethylenedioxythiophene-polystyrene sulfonate polymer (PEDOT-PSS), and nickel oxide (NiO).

[0018] Optionally, the anode material and the metal ions are mixed in the active material;

[0019] When a negative voltage is applied between the first conductive partition and the second conductive partition corresponding to the projection overlapping area, an oxidation reaction occurs in the projection overlapping area corresponding to the second conductive partition of the anode material; when a positive voltage is applied between the first conductive partition and the second conductive partition corresponding to the projection overlapping area, a reduction reaction occurs in the projection overlapping area corresponding to the second conductive partition of the anode material.

[0020] Optionally, the metal ions include Fe 3+ , Bi 3+ , Cu 2+ , Ag + , Zn 2+ and Sn 2+ at least one of the six;

[0021] The anode material includes ferrocyanide, phenazine, ferrocene, citric acid, ammonium citrate, Br - , I -and NO 2 - at least one of the seven.

[0022] Optionally, the active material is in the form of a solution or a gel;

[0023] When the active material is in the form of a gel, the active material further includes at least one of hydroxyethyl cellulose, polyacrylamide, sodium polyacrylate, polyvinyl alcohol, and polyethylene glycol diacrylate.

[0024] Optionally, in the first transparent conductive layer, each of the first conductive partitions extends along a first direction and is arranged along a second direction;

[0025] In the second transparent conductive layer, each of the second conductive partitions extends along the second direction and is arranged along the first direction;

[0026] The first direction and the second direction are perpendicular, and each of the projection overlapping regions is arranged in an array along the first direction and the second direction.

[0027] Optionally, when being powered on, the area of the energized second conductive partitions in the second transparent conductive layer is larger than the area of the energized first conductive partitions in the first transparent conductive layer, including:

[0028] When being powered on, all of the second conductive partitions in the second transparent conductive layer are energized, and the first conductive partitions in the first transparent conductive layer are energized one by one along the second direction.

[0029] Optionally, the voltage difference between the partial first conductive partitions and the partial second conductive partitions corresponding to each of the projection overlapping regions is equal.

[0030] Optionally, each of the first conductive partitions has a first connection region on the same side along the first direction, the first connection regions of each of the first conductive partitions do not project and overlap with the second conductive partitions, and the first connection regions of each of the first conductive partitions are respectively and electrically connected to a first electrode controller;

[0031] Each of the second conductive partitions has a second connection region on the same side along the second direction, the second connection regions of each of the second conductive partitions do not project and overlap with the first conductive partitions, and the second connection regions of each of the second conductive partitions are respectively and electrically connected to a second electrode controller.

[0032] Optionally, when a negative voltage is applied between the first conductive partition and the second conductive partition corresponding to the projection overlapping region, the voltage applied to the first conductive partition farther away from the second connection region along the second direction is more negative, and the voltage applied to the second conductive partition farther away from the first connection region along the first direction is more positive;

[0033] When a positive voltage is applied between the first conductive partition and the second conductive partition corresponding to the projection overlapping region, the voltage applied to the first conductive partition farther away from the second connection region along the second direction is more positive, and the voltage applied to the second conductive partition farther away from the first connection region along the first direction is more negative.

[0034] Optionally, the adjustable reflectivity device further includes a third electrode and a third electrode controller electrically connected to the third electrode. The third electrode is insulated from the first conductive partition and insulated from the second conductive partition;

[0035] When the projection overlapping region is in the non-reflective state and the metal thin film still remains on the first conductive partition, a positive voltage is applied between the first conductive partition and the third electrode to cause the metal thin film remaining on the first conductive partition to undergo an oxidation reaction and turn into the metal ions again;

[0036] Alternatively, when the projection overlapping region is in the non-reflective state and there is an opaque substance caused by a side reaction on the second conductive partition, a positive voltage is applied between the second conductive partition and the third electrode to cause the substance remaining on the second conductive partition to undergo an oxidation reaction, and the second conductive partition becomes transparent again.

[0037] Optionally, in the first transparent conductive layer, each of the first conductive partitions extends along the first direction and is arranged along the second direction, and the first direction and the second direction are perpendicular;

[0038] The third electrode is provided on the same layer as the first transparent conductive layer, and the third electrode is located on one side, opposite sides or the middle region of the first transparent conductive layer along the second direction.

[0039] Optionally, in the second transparent conductive layer, each of the second conductive partitions extends along the second direction and is arranged along the first direction, and the first direction and the second direction are perpendicular;

[0040] The third electrode is provided on the same layer as the second transparent conductive layer, and the third electrode is located on one side, opposite sides or the middle region of the second transparent conductive layer along the first direction.

[0041] Optionally, the third electrode is made of a metal material or a metal alloy material, and the third electrode is located in the invisible area around the adjustable reflectivity device.

[0042] Optionally, the adjustable reflectivity device further includes:

[0043] a first transparent substrate located on a side of the first transparent conductive layer facing away from the second transparent conductive layer;

[0044] a second transparent substrate located on a side of the second transparent conductive layer facing away from the first transparent conductive layer;

[0045] and a connection structure connecting the first transparent substrate and the second transparent substrate, so as to form a receiving cavity between the first transparent conductive layer and the second transparent conductive layer, and the receiving cavity is used to carry the active material.

[0046] Optionally, adjacent first conductive partitions are insulated and isolated by etching lines, and adjacent second conductive partitions are also insulated and isolated by etching lines.

[0047] Compared with the prior art, the above technical solution has the following advantages:

[0048] The adjustable reflectivity device provided by the embodiment of the present application includes a first transparent conductive layer and a second transparent conductive layer which are oppositely arranged, and an active material between the first transparent conductive layer and the second transparent conductive layer. The active material includes a cathode material and an anode material. The cathode material includes metal ions. The first transparent conductive layer includes a plurality of first conductive partitions that are insulated from each other and independently energized. The second transparent conductive layer includes a plurality of second conductive partitions that are insulated from each other and independently energized. The first conductive partitions and the second conductive partitions have a projection overlapping area. Specifically, during operation, when a negative voltage is applied between the first conductive partition and the second conductive partition corresponding to the projection overlapping area, a reduction reaction occurs for the metal ions in the projection overlapping area corresponding to the first conductive partition to generate a metal thin film, and an oxidation reaction occurs for the anode material. The projection overlapping area is in a reflective state because a metal thin film is electrodeposited on the first conductive partition corresponding thereto; when a positive voltage is applied between the first conductive partition and the second conductive partition corresponding to the projection overlapping area, the metal thin film undergoes an oxidation reaction to become metal ions again, and a reduction reaction occurs for the anode material. The projection overlapping area is in a non-reflective state because the metal thin film on the first conductive partition corresponding thereto is de-deposited.

[0049] With such a setting, the working state and voltage difference of each projection overlapping region can be individually and regionally controlled by applying a voltage between its corresponding first conductive partition and second conductive partition. Thus, by controlling the voltage difference between the first conductive partition and the second conductive partition corresponding to the projection overlapping region, the voltage difference between the first conductive partition part and the second conductive partition part corresponding to each projection overlapping region can be made equal, which is beneficial to achieving uniform electrodeposition and de-deposition in each projection overlapping region, improving the color change uniformity of the electrochromic device. Moreover, each projection overlapping region can be individually and regionally controlled to meet the requirements of different display patterns, with strong flexibility.

[0050] Meanwhile, when energizing, the area and number of the energized second conductive partitions in the second transparent conductive layer and the area and number of the energized first conductive partitions in the first transparent conductive layer can be controlled such that the area of the energized second conductive partitions in the second transparent conductive layer is larger than the area of the energized first conductive partitions in the first transparent conductive layer, improving the electrodeposition and de-deposition efficiency. And the area of the second transparent conductive layer (the secondary electrode plate) forming a loop with the first transparent conductive layer (the main color-changing electrode plate) does not need to be set so large, reducing the voltage drop on the second transparent conductive layer and further improving the color change uniformity of the electrochromic device. Also, when the area of the energized second conductive partitions in the second transparent conductive layer is larger than the area of the energized first conductive partitions in the first transparent conductive layer, a stable Faraday current can be formed in the loop composed of the first conductive partition and the second conductive partition, increasing the stability and service life of the device. BRIEF DESCRIPTION OF THE DRAWINGS

[0051] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the drawings in the following description are only some embodiments of the present application. For those of ordinary skill in the art, without creative efforts, other drawings can be obtained based on these drawings.

[0052] Figure 1 It is a schematic structural diagram of an electrochromic device provided by an embodiment of the present application;

[0053] Figure 2 It is a plan view of a first transparent conductive layer in the electrochromic device provided by an embodiment of the present application;

[0054] Figure 3 It is a plan view of a second transparent conductive layer in the electrochromic device provided by an embodiment of the present application;

[0055] Figure 4 For Figure 2 shown first transparent conductive layer and Figure 3Schematic diagram of the stack of the second transparent conductive layer shown;

[0056] Figure 5 Schematic diagram of the structure of another electrochromic device provided by an embodiment of the present application;

[0057] Figure 6 Schematic diagram of the stack of the first transparent conductive layer and the second transparent conductive layer in an electrochromic device provided by an embodiment of the present application;

[0058] Figure 7 Schematic diagram of the working state of an electrochromic device provided by an embodiment of the present application;

[0059] Figure 8 Schematic diagram of the stack of the first transparent conductive layer, the second transparent conductive layer and the third electrode in an electrochromic device provided by an embodiment of the present application;

[0060] Figure 9 For Figure 8 Schematic diagram of the layer separation of the first transparent conductive layer, the second transparent conductive layer and the third electrode in;

[0061] Figure 10 Schematic diagram of the stack of the first transparent conductive layer, the second transparent conductive layer and the third electrode in another electrochromic device provided by an embodiment of the present application;

[0062] Figure 11 For Figure 10 Schematic diagram of the layer separation of the first transparent conductive layer, the second transparent conductive layer and the third electrode in;

[0063] Figure 12 Schematic diagram of the stack of the first transparent conductive layer, the second transparent conductive layer and the third electrode in yet another electrochromic device provided by an embodiment of the present application;

[0064] Figure 13 For Figure 12 Schematic diagram of the layer separation of the first transparent conductive layer, the second transparent conductive layer and the third electrode in;

[0065] Figure 14 Schematic diagram of the stack of the first transparent conductive layer, the second transparent conductive layer and the third electrode in still another electrochromic device provided by an embodiment of the present application;

[0066] Figure 15 For Figure 14 Schematic diagram of the layer separation of the first transparent conductive layer, the second transparent conductive layer and the third electrode in;

[0067] Figure 16In yet another electrochromic device provided by an embodiment of the present application, it is a stacked schematic diagram of a first transparent conductive layer, a second transparent conductive layer, and a third electrode;

[0068] Figure 17 is Figure 16 a layered schematic diagram of the first transparent conductive layer, the second transparent conductive layer, and the third electrode in;

[0069] Figure 18 In still another electrochromic device provided by an embodiment of the present application, it is a stacked schematic diagram of a first transparent conductive layer, a second transparent conductive layer, and a third electrode;

[0070] Figure 19 is Figure 18 a layered schematic diagram of the first transparent conductive layer, the second transparent conductive layer, and the third electrode in. Detailed implementation manners

[0071] Next, the technical solutions in the embodiments of the present application will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present application.

[0072] In the following description, many specific details are set forth in order to fully understand the present application. However, the present application may also be implemented in other ways different from those described herein. Those skilled in the art can make similar generalizations without departing from the connotation of the present application. Therefore, the present application is not limited by the specific embodiments disclosed below.

[0073] Secondly, the present application will be described in detail with reference to the schematic diagrams. When detailing the embodiments of the present application, for the convenience of description, the cross-sectional views showing the device structure will be enlarged locally out of the general proportion, and the schematic diagrams are only examples and should not limit the protection scope of the present application herein. In addition, in actual production, three-dimensional spatial dimensions including length, width, and depth should be included.

[0074] An embodiment of the present application provides an adjustable reflectivity device, specifically an electrochromic device with adjustable reflectivity. Figure 1 shows a structural schematic diagram of an adjustable reflectivity device provided by an embodiment of the present application. As Figure 1 shown, the adjustable reflectivity device includes a first transparent conductive layer 10 and a second transparent conductive layer 20 disposed opposite to each other, and an active material SS between the first transparent conductive layer 10 and the second transparent conductive layer 20. The active material SS includes a cathode material and an anode material, and the cathode material includes metal ions.

[0075] It can be understood that the first transparent conductive layer 10 and the second transparent conductive layer 20 are two electrode plates, one of which is the main color-changing electrode plate, also known as the working electrode, where metal electrodeposition and de-deposition occur, that is, the region where the conversion between the reflective state and the transparent state occurs; the other is the auxiliary electrode plate, also known as the counter electrode, which forms a circuit with the main color-changing electrode plate (working electrode) and cooperates with the main color-changing electrode plate to form a stable Faraday current. In the embodiments of the present application, for the convenience of description, the first transparent conductive layer 10 is set as the main color-changing electrode plate, and the second transparent conductive layer 20 is set as the auxiliary electrode plate. However, it can be understood that the present application does not limit the placement order of the first transparent conductive layer 10 and the second transparent conductive layer 20.

[0076] It can also be understood that the active material SS is located between the first transparent conductive layer 10 and the second transparent conductive layer 20, and metal electrodeposition or de-deposition occurs under the action of the voltage difference between the first transparent conductive layer 10 and the second transparent conductive layer 20, that is, the conversion between the reflective state and the transparent state occurs. Specifically, the active material SS includes a cathode material and an anode material. Among them, the cathode material can gain electrons to undergo a reduction reaction, and the obtained product can lose electrons again to undergo an oxidation reaction. The cathode material includes metal ions; conversely, the anode material can lose electrons to undergo an oxidation reaction, and the obtained product can gain electrons again to undergo a reduction reaction.

[0077] Figure 2 The figure shows a schematic plan view of a first transparent conductive layer 10 in the adjustable reflectivity device provided by the embodiments of the present application. As Figure 2 shown, the first transparent conductive layer 10 includes a plurality of first conductive partitions 11 that are insulated from each other and independently energized. Optionally, adjacent first conductive partitions 11 are insulated and isolated by etching lines W11, and each first conductive partition 11 is correspondingly electrically connected to a first electrode controller 12. For example, the first conductive partition 11 is electrically connected to the first electrode controller 12 through a connection trace H11, so as to achieve the mutual insulation and independent energization of each first conductive partition 11.

[0078] Figure 3 The figure shows a schematic plan view of a second transparent conductive layer 20 in the adjustable reflectivity device provided by the embodiments of the present application. As Figure 3 shown, the second transparent conductive layer 20 includes a plurality of second conductive partitions 21 that are insulated from each other and independently energized. Optionally, adjacent second conductive partitions 21 are insulated and isolated by etching lines W21, and each second conductive partition 21 is correspondingly electrically connected to a second electrode controller 22. For example, the second conductive partition 21 is electrically connected to the second electrode controller 22 through a connection trace H21, so as to achieve the mutual insulation and independent energization of each second conductive partition 21.

[0079] Figure 4 It is further shown that Figure 2Schematic diagram of the stack of the first transparent conductive layer 10 and Figure 3 the second transparent conductive layer 20 shown. From Figure 4 it can be seen that the first conductive partition 11 and the second conductive partition 21 have a projection overlapping area AA.

[0080] During specific operation, in combination with Figure 1 and Figure 4 as shown, when a negative voltage is applied between the first conductive partition 11 and the second conductive partition 21 corresponding to the projection overlapping area AA, metal ions undergo a reduction reaction in the projection overlapping area AA corresponding to the first conductive partition 11 to generate a metal thin film, and the anode material undergoes an oxidation reaction. The projection overlapping area AA is in a reflective state due to the electro-deposition of the metal thin film on the corresponding first conductive partition. At this time, based on the characteristics of the metal itself, the incident sunlight will be completely or partially reflected back by the metal thin film, so that these light rays will neither be absorbed by the device nor enter the interior of the room or vehicle.

[0081] It should be noted that applying a negative voltage between the first conductive partition 11 and the second conductive partition 21 corresponding to the projection overlapping area AA means that the voltage applied to the first conductive partition 11 corresponding to the projection overlapping area AA is negative relative to the voltage applied to the second conductive partition 21 corresponding to the projection overlapping area AA. At this time, the first conductive partition 11 corresponding to the projection overlapping area AA is equivalent to the cathode, the second conductive partition 21 corresponding to the projection overlapping area AA is equivalent to the anode, the metal ions are the cathode material, and the metal ions gain electrons in the first conductive partition 11 corresponding to the projection overlapping area AA to undergo a reduction reaction, generating a metal thin film deposited on the first conductive partition 11 corresponding to the projection overlapping area AA, making the projection overlapping area AA in a reflective state, and the anode material undergoes an oxidation reaction accordingly.

[0082] Similarly, in this application, for the sake of convenient description, applying a negative voltage between one electrode and another electrode means that the voltage applied to this one electrode is negative relative to the voltage applied to the other electrode. This one electrode is equivalent to the cathode, and the other electrode is equivalent to the anode.

[0083] When a positive voltage is applied between the first conductive partition 11 and the second conductive partition 21 corresponding to the projection overlapping area AA, the metal thin film undergoes an oxidation reaction and turns back into metal ions, and the anode material undergoes a reduction reaction. The projection overlapping area AA is in a non-reflective state, that is, a transparent state, due to the deposition removal of the metal thin film on the corresponding first conductive partition. At this time, the incident light can pass through the device and enter the interior of the room or vehicle.

[0084] It should be noted that a positive voltage is applied between the first conductive partition 11 and the second conductive partition 21 corresponding to the projection overlapping region AA, that is, the voltage applied to the first conductive partition 11 corresponding to the projection overlapping region AA is a positive voltage relative to the voltage applied to the second conductive partition 21 corresponding to the projection overlapping region AA. At this time, the first conductive partition 11 corresponding to the projection overlapping region AA is equivalent to the anode, and the second conductive partition 21 corresponding to the projection overlapping region AA is equivalent to the cathode. The metal thin film loses electrons and undergoes an oxidation reaction on the first conductive partition 11 corresponding to the projection overlapping region AA, and then becomes metal ions, that is, the metal thin film undergoes de-deposition on the first conductive partition 11 corresponding to the projection overlapping region AA, making the projection overlapping region AA in a non-reflective state, and the anode material undergoes a reduction reaction accordingly.

[0085] Similarly, in the present application, for the sake of convenience of description, a positive voltage is applied between one electrode and another electrode, that is, the voltage applied to the one electrode is a positive voltage relative to the voltage applied to the another electrode. The one electrode is equivalent to the anode, and the another electrode is equivalent to the cathode.

[0086] It can be seen that in the adjustable reflectivity device provided by the embodiment of the present application, the working state and voltage difference of each projection overlapping region AA can be controlled separately and regionally by applying a voltage between the corresponding first conductive partition 11 and second conductive partition 21. Therefore, by controlling the voltage difference between the first conductive partition 11 and the second conductive partition 21 corresponding to the projection overlapping region AA, the voltage differences between the first conductive partition part and the second conductive partition part corresponding to each projection overlapping region AA can be made equal, which is beneficial to realizing uniform electrodeposition and de-deposition of each projection overlapping region, improving the color change uniformity of the electrochromic device. Moreover, each projection overlapping region AA can be controlled separately and regionally to meet the requirements of different display patterns, with strong flexibility.

[0087] Meanwhile, when being electrified, the area and number of the second conductive sub-regions 21 electrified in the second transparent conductive layer 20 and the area and number of the first conductive sub-regions 11 electrified in the first transparent conductive layer 10 can be controlled, so that the area of the second conductive sub-regions 21 electrified in the second transparent conductive layer 20 is larger than the area of the first conductive sub-regions 11 electrified in the first transparent conductive layer 10. Thus, the area of the second transparent conductive layer 20 (the slave color-changing electrode plate) forming a loop with the first transparent conductive layer 10 (the main color-changing electrode plate) does not need to be set so large, the voltage drop on the second transparent conductive layer 20 is reduced, and the color-changing uniformity of the electrochromic device is further improved; moreover, since the area of the second conductive sub-regions 21 electrified in the second transparent conductive layer 20 is larger than the area of the first conductive sub-regions 11 electrified in the first transparent conductive layer 10, a stable Faraday current can be formed in the loop formed by the first conductive sub-regions 11 and the second conductive sub-regions 21, and the stability and service life of the device are increased.

[0088] As known from the foregoing, when the device size becomes larger, uneven color change is a difficulty of electrochromic devices. In the adjustable reflectivity device provided in the embodiments of the present application, by dividing the first transparent conductive layer 10 into a plurality of mutually insulated and independently electrified first conductive sub-regions 11, and dividing the second transparent conductive layer 20 into a plurality of mutually insulated and independently electrified second conductive sub-regions 12, it is set that the first conductive sub-regions 11 and the second conductive sub-regions 21 have a projection overlapping region AA. Thus, by controlling the voltage difference between the first conductive sub-regions 11 and the second conductive sub-regions 21, the voltage difference between the corresponding first conductive sub-region part and the second conductive sub-region part of each projection overlapping region AA can be made equal, and the color-changing uniformity of the electrochromic device is improved; moreover, by controlling the area of the second conductive sub-regions 21 electrified in the second transparent conductive layer 20 to be larger than the area of the first conductive sub-regions 11 electrified in the first transparent conductive layer 10, the area of the second transparent conductive layer 20 as the slave electrode plate can be relatively small, the voltage drop on the second transparent conductive layer 20 is reduced, the color-changing uniformity of the electrochromic device is further improved, and meanwhile, the stability and service life of the device are increased.

[0089] In fact, in existing reflective electrochromic devices, there is still a problem that needs to be overcome, namely the transparency problem. Specifically, in existing reflective electrochromic devices, since the counter electrode is often a metal electrode, when metal ions undergo a reduction reaction to form a metal thin film, the metal undergoes an oxidation reaction at the counter electrode, and when the metal thin film undergoes an oxidation reaction, the metal undergoes a reduction reaction at the counter electrode. Since the metal electrode is opaque, the application of reflective electrochromic devices will be greatly restricted, and they can only be applied to some light-impermeable fields. Although some researchers have tried to set the counter electrode around the device, when the counter electrode is set around the device, when the device size is large, the counter electrode is far from the central area of the device, resulting in an exacerbation of the uneven color change phenomenon.

[0090] In view of this, in the adjustable reflectivity device provided in the embodiments of the present application, the second transparent conductive layer 20 as the counter electrode is also transparent. At the same time, an anode material is provided in the active material SS between the first transparent conductive layer 10 and the second transparent conductive layer 20, so that when metal ions undergo a reduction reaction to form a metal thin film, the anode material in the active material SS undergoes an oxidation reaction, and when the metal thin film undergoes an oxidation reaction, the anode material in the active material SS undergoes a reduction reaction. With such a setting, both the first transparent conductive layer 10 as the main color-changing electrode plate and the second transparent conductive layer 20 as the counter electrode can be transparent, greatly expanding the application of electrochromic devices, especially reflective electrochromic devices.

[0091] Optionally, in some embodiments of the present application, as Figure 5 shown, the anode material includes a transparent conductive compound layer S1 located on the side of the second transparent conductive layer 20 close to the first transparent conductive layer 10. At this time, the projection overlapping area between the second transparent conductive layer 20 and the first transparent conductive layer 10 will also correspond to the transparent conductive compound layer S1, and there is a corresponding projection overlapping area on the transparent conductive compound layer S1.

[0092] During specific operation, when a negative voltage is applied between the first conductive partition 11 and the second conductive partition 21 corresponding to the projection overlapping area AA, the projection overlapping area AA corresponding to the transparent conductive compound layer S1 undergoes an oxidation reaction; when a positive voltage is applied between the first conductive partition 11 and the second conductive partition 21 corresponding to the projection overlapping area AA, the projection overlapping area AA corresponding to the transparent conductive compound layer S1 undergoes a reduction reaction.

[0093] In this embodiment, in order to achieve the reduction reaction of metal ions, the oxidation reaction of the metal thin film, and the oxidation-reduction reaction occurring on the transparent conductive compound layer S1, and considering the compatibility and stability of ions in the active material SS, as well as the compatibility between electroplated metal ions and the conductive electrode plate, optionally, the metal ions in the active material SS may include Fe3+ 、Bi 3+ 、Cu 2+ 、Ag + 、Zn 2+ and Sn 2+ At least one of the six; the material of the transparent conductive compound layer S1 may include at least one of 3,4-ethylenedioxythiophene monomer polymer (PEDOT), poly-3,4-ethylenedioxythiophene-polystyrene sulfonate polymer (PEDOT-PSS), and nickel oxide (NiO).

[0094] In this embodiment, metal ions can be disposed in a solution or a gel; when the metal ions are disposed in the gel, the gel may further include at least one of hydroxyethyl cellulose, polyacrylamide, sodium polyacrylate, polyvinyl alcohol, and polyethylene glycol diacrylate. These above-mentioned polymer system materials can form a gel and are compatible with other components such as metal ions in the gel.

[0095] Another alternative is that in some embodiments of the present application, as Figure 1 shown, the anode material and metal ions are mixed in the overall active material SS. Specifically, during operation, when a negative voltage is applied between the first conductive partition 11 and the second conductive partition 21 corresponding to the projection overlapping region AA, the anode material undergoes an oxidation reaction in the projection overlapping region AA corresponding to the second conductive partition 21 (i.e., on the second transparent conductive layer 20); when a positive voltage is applied between the first conductive partition 11 and the second conductive partition 21 corresponding to the projection overlapping region AA, the anode material undergoes a reduction reaction in the projection overlapping region AA corresponding to the second conductive partition 21 (i.e., on the second transparent conductive layer 20).

[0096] In this embodiment, in order to achieve the reduction reaction of metal ions, the oxidation reaction of the metal thin film, and the oxidation-reduction reaction of the anode material occurring on the second conductive partition 21 (i.e., on the second transparent conductive layer 20), and considering the compatibility and stability of ions within the active material SS, as well as the compatibility between the electroplated metal ions and the conductive electrode plate, optionally, the metal ions in the active material SS may include Fe 3+ 、Bi 3+ 、Cu 2+ 、Ag + 、Zn 2+ and Sn 2+ At least one of the six; the anode material may include at least one of ferrocyanide, phenazine, ferrocene, citric acid, ammonium citrate, Br - 、I - and NO 2 - At least one of the seven.

[0097] In this embodiment, the active material SS between the first transparent conductive layer 10 and the second transparent conductive layer 20 may be in a solution or gel state as a whole. When the active material SS is in a gel state, the active material SS may further include at least one of hydroxyethyl cellulose, polyacrylamide, sodium polyacrylate, polyvinyl alcohol, and polyethylene glycol diacrylate. These polymer system materials can form a gel and are compatible with other components such as metal ions in the gel.

[0098] Figure 6 More clearly shows a stacked schematic diagram of the first transparent conductive layer 10 and the second transparent conductive layer 20 in an adjustable reflectivity device provided by an embodiment of the present application, as Figure 6 shown, in the first transparent conductive layer 10, each first conductive partition 11 extends along the first direction X and is arranged along the second direction Y; in the second transparent conductive layer 20, each second conductive partition 21 extends along the second direction Y and is arranged along the first direction X; the first direction X and the second direction Y are perpendicular, and each projection overlapping area AA is arranged in an array along the first direction X and the second direction Y.

[0099] It can be understood that by setting each first conductive partition 11 in the first transparent conductive layer 10 to extend along the first direction X and be arranged along the second direction Y, and at the same time setting each second conductive partition 21 in the second transparent conductive layer 20 to extend along the second direction Y and be arranged along the first direction X, so that the projection overlapping areas AA of each first conductive partition 11 and the second conductive partition 21 are arranged in an array along the first direction X and the second direction Y, it is more convenient to individually control the working state and voltage difference of each projection overlapping area AA in a regionalized manner to meet the requirements of different display patterns, with strong flexibility.

[0100] Specifically, for example, as Figure 7As shown, the first transparent conductive layer 10 includes four columns of first conductive partitions 11 extending along the first direction X and arranged along the second direction Y, and the second transparent conductive layer 20 includes four rows of second conductive partitions 21 extending along the second direction Y and arranged along the first direction X. By applying a negative voltage between the first column and the fourth column of the first conductive partitions 11 from left to right and the four rows of second conductive partitions 21, a reflection state is formed in the projection overlapping area AA between the first column and the fourth column of the first conductive partitions 11 from left to right and the four rows of second conductive partitions 21, that is, metal ions undergo a reduction reaction and are electrodeposited on the first column and the fourth column of the first conductive partitions 11 from left to right; then, by applying a positive voltage between the first column and the fourth column of the first conductive partitions 11 from left to right and the four rows of second conductive partitions 21, the metal thin film on the first column and the fourth column of the first conductive partitions 11 from left to right undergoes an oxidation reaction and becomes metal ions again, so that the projection overlapping area AA between the first column and the fourth column of the first conductive partitions 11 from left to right and the four rows of second conductive partitions 21 forms a non-reflection state (i.e., a transparent state).

[0101] Figure 7 Only the cases where the projection overlapping area AA between the first column and the fourth column of the first conductive partitions 11 from left to right and the four rows of second conductive partitions 21 forms a reflection state and a transparent state are listed. It can be understood that in the case where the respective projection overlapping areas AA are arranged in an array along the first direction X and the second direction Y, and the present application does not limit the area and number of the first conductive partitions 11 included in the first transparent conductive layer 10 that extend along the first direction X and are arranged along the second direction Y, and the present application also does not limit the area and number of the second conductive partitions 21 included in the second transparent conductive layer 20 that extend along the second direction Y and are arranged along the first direction X. Thus, as long as a voltage is applied to one first transparent conductive partition 11 and one second transparent conductive partition 21, the working state and voltage difference of the projection overlapping area AA of the intersection of the one first transparent conductive partition 11 and the one second transparent conductive partition 21 can be controlled to meet the requirements of various display patterns.

[0102] As known from the foregoing, when being energized, the area of the energized second conductive partitions 21 in the second transparent conductive layer 20 needs to be larger than the area of the energized first conductive partitions 11 in the first transparent conductive layer 10. Then, on the basis that the respective projection overlapping areas AA are arranged in an array along the first direction X and the second direction Y, optionally, when being energized, the area of the energized second conductive partitions 21 in the second transparent conductive layer 20 is larger than the area of the energized first conductive partitions 11 in the first transparent conductive layer 10, including:

[0103] When being energized, all the second conductive partitions 21 in the second transparent conductive layer 20 are energized, and the first conductive partitions 11 in the first transparent conductive layer 10 are energized one by one along the second direction.

[0104] In this embodiment, at each moment of power-on, all the second conductive partitions 21 in the second transparent conductive layer 20 are powered on, and only one first conductive partition 11 in the first transparent conductive layer 10 is powered on. Therefore, it is necessarily satisfied that the area of the second conductive partitions 21 powered on in the second transparent conductive layer 20 is larger than the area of the first conductive partition 11 powered on in the first transparent conductive layer 10. At different moments of power-on, each of the first conductive partitions 11 in the first transparent conductive layer 10 is powered on one by one along the second direction Y, that is, each of the first conductive partitions 11 in the first transparent conductive layer 10 is quickly scanned. Specifically, it can be scanned from one side to the other side along the second direction Y, or scanned from the middle area to both sides along the second direction Y, or scanned from both sides to the middle area along the second direction Y. The present application does not limit the scanning order. Thus, a metal thin film is deposited on each of the first conductive partitions 21 in sequence. When the scanning speed reaches a certain level, for example, the scanning time for each first conductive partition 21 is 20 ms, the entire surface of the first transparent conductive layer 10 visually appears to change color uniformly.

[0105] Moreover, on the basis that the projection overlapping regions AA are arranged in an array along the first direction X and the second direction Y, it is also more convenient to control the voltage difference between the first conductive partition 11 and the second conductive partition 21 corresponding to the projection overlapping region AA, so that the voltage differences between the first conductive partition part and the second conductive partition part corresponding to each projection overlapping region AA are equal, realizing uniform electro-deposition and de-deposition of each projection overlapping region and improving the color change uniformity of the electrochromic device.

[0106] Optionally, in some embodiments of the present application, as shown in Figure 2 and Figure 4 , each of the first conductive partitions 11 has a first connection region 110 on the same side along the first direction X. The first connection regions 110 of each of the first conductive partitions 11 do not project and overlap with the second conductive partition 21, and each of the first connection regions 110 of each of the first conductive partitions 11 is electrically connected to a first electrode controller 12 respectively.

[0107] Similarly, as shown in Figure 3 and Figure 4 , each of the second conductive partitions 21 has a second connection region 210 on the same side along the second direction Y. The second connection regions 210 of each of the second conductive partitions 21 do not project and overlap with the first conductive partition 11, and each of the second connection regions 210 of each of the second conductive partitions 21 is electrically connected to a second electrode controller 22 respectively.

[0108] In this embodiment, each first conductive partition 11 has a first connection region 110 on the same side along the first direction X, so as to be electrically connected to the first electrode controller 12 through their respective corresponding connection traces H11, realizing independent power-on of each first conductive partition 11. Moreover, by arranging the first connection region 110 on the same side of each first conductive partition 11 along the first direction X to be electrically connected to the first electrode controller 12, it is convenient for the connection design between each first conductive partition 11 and the corresponding first electrode controller 12, making the connection traces H11 more regular and easier to implement in terms of technology.

[0109] Similarly, each second conductive partition 21 has a second connection region 210 on the same side along the second direction Y, so as to be electrically connected to the second electrode controller 22 through their respective corresponding connection traces H21, realizing independent power-on of each second conductive partition 21. Moreover, by arranging the second connection region 210 on the same side of each second conductive partition 21 along the second direction Y to be electrically connected to the second electrode controller 22, it is convenient for the connection design between each second conductive partition 21 and the corresponding second electrode controller 22, making the connection traces H21 more regular and easier to implement in terms of technology.

[0110] Based on the above embodiments, optionally, in some embodiments of the present application, referring to Figure 4 As shown, when a negative voltage is applied between the first conductive partition 11 and the second conductive partition 21 corresponding to the projection overlapping region AA, that is, when metal electrodeposition (coloring) is performed on the first conductive partition 11 corresponding to the projection overlapping region AA, the voltage applied to the first conductive partition 11 that is farther away from the second connection region 210 along the second direction Y is more negative, and the voltage applied to the second conductive partition 210 that is farther away from the first connection region 110 along the first direction X is more positive;

[0111] When a positive voltage is applied between the first conductive partition 11 and the second conductive partition 21 corresponding to the projection overlapping region AA, that is, when metal stripping (fading) is performed on the first conductive partition 11 corresponding to the projection overlapping region AA, the voltage applied to the first conductive partition that is farther away from the second connection region 210 along the second direction Y is more positive, and the voltage applied to the second conductive partition 21 that is farther away from the first connection region 110 along the first direction X is more negative.

[0112] It can be understood that there will be a voltage drop on the first conductive partition 11 extending along the first direction X. That is to say, on a first conductive partition 11, the farther away from the first connection region 110 along the first direction X, the greater the voltage drop thereon, and the greater the voltage difference between the actual voltage on the corresponding projection overlapping region AA and the voltage applied on the first connection region 110. Thus, it can be thought that, as Figure 4As shown, in the projection overlapping region AA arranged in an array along the first direction X and the second direction Y, the first row of the projection overlapping region AA from top to bottom is closer to the first connection region 110, so the voltage drop on the corresponding first conductive partition part of the first row of the projection overlapping region AA is smaller. As it extends downward along the first direction X, the voltage drop on the corresponding first conductive partition part of the projection overlapping region AA gradually increases. For example, the voltage drop on the corresponding first conductive partition part of the second row of the projection overlapping region AA from top to bottom is greater than that of the first row of the projection overlapping region AA, and the voltage drop on the corresponding first conductive partition part of the third row of the projection overlapping region AA from top to bottom is greater than that of the second row of the projection overlapping region AA, and so on.

[0113] Similarly, there will also be a voltage drop on the second conductive partition 21 extending along the second direction Y. On one second conductive partition 21, the farther it is from the second connection region 210 along the second direction Y, the greater the voltage drop on it, and the greater the voltage difference between the actual voltage on the corresponding projection overlapping region AA and the voltage applied on the second connection region 210. Thus, it can be thought that, as Figure 4 shown, in the projection overlapping region AA arranged in an array along the first direction X and the second direction Y, the first column of the projection overlapping region AA from left to right is closer to the second connection region 210, so the voltage drop on the corresponding second conductive partition part of the first column of the projection overlapping region AA is smaller. As it extends from left to right along the second direction Y, the voltage drop on the corresponding second conductive partition part of the projection overlapping region AA gradually increases. For example, the voltage drop on the corresponding second conductive partition part of the second column of the projection overlapping region AA from left to right is greater than that of the first column of the projection overlapping region AA, and the voltage drop on the corresponding second conductive partition part of the third column of the projection overlapping region AA from left to right is greater than that of the second column of the projection overlapping region AA, and so on.

[0114] From the above analysis, it can be seen that in this embodiment, when a negative voltage is applied between the first conductive partition 11 and the second conductive partition 21 corresponding to the projection overlapping region AA, considering that the voltage applied on the first conductive partition 11 corresponding to the projection overlapping region AA is a negative voltage relative to the voltage applied on the second conductive partition 21 corresponding to the projection overlapping region AA, the voltage applied on the first conductive partition 11 that is farther from the second connection region 210 along the second direction Y is more negative, and the voltage applied on the second conductive partition 210 that is farther from the first connection region 110 along the first direction X is more positive, so as to ensure that the actual voltage differences between the corresponding first conductive partition parts and the second conductive partition parts of each projection overlapping region AA are equal, and realize uniform coloring on the corresponding first conductive partition parts of each projection overlapping region AA.

[0115] Similarly, when a positive voltage is applied between the first conductive partition 11 and the second conductive partition 21 corresponding to the projection overlapping region AA, considering that the voltage applied to the first conductive partition 11 corresponding to the projection overlapping region AA is a positive voltage relative to the voltage applied to the second conductive partition 21 corresponding to the projection overlapping region AA, the voltage applied to the first conductive partition farther away from the second connection region 210 in the second direction Y is more positive, and the voltage applied to the second conductive partition 21 farther away from the first connection region 110 in the first direction X is more negative, so as to ensure that the actual voltage differences between the first conductive partition part and the second conductive partition part corresponding to each projection overlapping region AA are equal, and uniform fading on the first conductive partition part corresponding to each projection overlapping region AA is achieved.

[0116] Specifically, referring to Figure 4As shown, when a negative voltage is applied between the first conductive partition 11 and the second conductive partition 21 corresponding to the projection overlapping region AA, specifically, voltages V11, V12, V13, and V14 are sequentially set on the first conductive partition 11 in the first to fourth columns arranged from left to right along the second direction Y, and V11, V12, V13, and V14 are increasingly negative in sequence. At the same time, voltages V21, V22, V23, and V24 are sequentially set on the second conductive partition 21 in the first to fourth rows arranged from top to bottom along the first direction X, and V21, V22, V23, and V24 are increasingly positive in sequence. Thus, V11, V12, V13, V14, V21, V22, V23, and V24 can be regulated so that the actual voltage differences between the first conductive partition portions and the second conductive partition portions corresponding to each projection overlapping region AA are equal. For example, the theoretical voltage difference between the first conductive partition portion and the second conductive partition portion corresponding to the projection overlapping region AA in the upper left corner is V21 - V11, and the theoretical voltage difference between the first conductive partition portion and the second conductive partition portion corresponding to the projection overlapping region AA in the lower right corner is V24 - V14. However, in fact, since the projection overlapping region AA in the upper left corner is close to the first connection region 110 and the second connection region 210, the theoretical voltage difference and the actual voltage difference between the first conductive partition portion and the second conductive partition portion corresponding to the projection overlapping region AA in the upper left corner are approximately equal. But the projection overlapping region AA in the lower right corner is far from both the first connection region 110 and the second connection region 210. Due to the voltage drops of the first conductive partition 11 and the second conductive partition along their respective extending directions, the actual voltage difference between the first conductive partition portion and the second conductive partition portion corresponding to the projection overlapping region AA in the lower right corner is less than its theoretical voltage difference V24 - V14. By regulating V11, V12, V13, V14, V21, V22, V23, and V24, the actual voltage differences between the first conductive partition portions and the second conductive partition portions corresponding to each projection overlapping region AA can be made equal, so that each projection overlapping region is evenly colored.

[0117] Similarly, when a positive voltage is applied between the first conductive partition 11 and the second conductive partition 21 corresponding to the projection overlapping region AA, specifically, voltages V11’, V12’, V13’ and V14’ are sequentially set on the first to fourth columns of the first conductive partition 11 arranged from left to right along the second direction Y, and V11’, V12’, V13’ and V14’ are sequentially more positive. At the same time, voltages V21’, V22’, V23’ and V24’ are sequentially set on the first to fourth rows of the second conductive partition 21 arranged from top to bottom along the first direction X, and V21’, V22’, V23’ and V24’ are sequentially more negative. Thus, V11’, V12’, V13’, V14’, V21’, V22’, V23’ and V24’ can be adjusted so that the actual voltage differences between the first conductive partition part and the second conductive partition part corresponding to each projection overlapping region AA are equal. For example, the theoretical voltage difference between the first conductive partition part and the second conductive partition part corresponding to the upper left projection overlapping region AA is V11’ - V21’, and the theoretical voltage difference between the first conductive partition part and the second conductive partition part corresponding to the lower right projection overlapping region AA is V14’ - V24’. However, in fact, since the upper left projection overlapping region AA is close to the first connection region 110 and the second connection region 210, the theoretical voltage difference and the actual voltage difference between the first conductive partition part and the second conductive partition part corresponding to the upper left projection overlapping region AA are approximately equal. However, the lower right projection overlapping region AA is far from both the first connection region 110 and the second connection region 210. Due to the voltage drops of the first conductive partition 11 and the second conductive partition along their respective extension directions, the actual voltage difference between the first conductive partition part and the second conductive partition part corresponding to the lower right projection overlapping region AA is less than its theoretical voltage difference V14’ - V24’. By adjusting V11’, V12’, V13’, V14’, V21’, V22’, V23’ and V24’, the actual voltage differences between the first conductive partition part and the second conductive partition part corresponding to each projection overlapping region AA can be made equal, so that each projection overlapping region fades evenly.

[0118] It should be noted that the above embodiments are described by taking the example that each first conductive partition 11 has a first connection area 110 on the same side along the first direction X, and each second conductive partition 21 has a second connection area 210 on the same side along the second direction Y, but the present application is not limited to this. In other embodiments of the present application, at least two first conductive partitions 11 may also be provided with first connection areas 110 arranged relatively to each other along the first direction X, that is, at least one first conductive partition 11 is provided with a first connection area 110 electrically connected to the first electrode controller 12 on one side along the first direction X, and another first conductive partition 11 is provided with a first connection area 110 electrically connected to the first electrode controller 12 on the other side along the first direction X; similarly, at least two second conductive partitions 21 may also be provided with second connection areas 210 arranged relatively to each other along the second direction Y, that is, at least one second conductive partition 21 is provided with a second connection area 210 electrically connected to the second electrode controller 22 on one side along the second direction Y, and another second conductive partition 21 is provided with a second connection area 210 electrically connected to the second electrode controller 22 on the other side of the second direction Y. In the above case, the voltage applied to each first conductive partition 11 and each second conductive partition can also be controlled so that the actual voltage difference between the first conductive partition part and the second conductive partition part corresponding to each projection overlapping area AA is equal, so that each projection overlapping area changes color or fades uniformly.

[0119] Furthermore, the inventors found that when a forward voltage is applied between the first conductive partition 11 and the second conductive partition 21 corresponding to the projection overlap area AA, in an ideal state, the metal film undergoes an oxidation reaction and is completely converted into metal ions, but in actual applications, part of the metal film may remain on the first conductive partition 11, affecting the transparent state of the first conductive partition 11. If the forward voltage is continuously applied between the first conductive partition 11 and the second conductive partition 21, the metal ions may also run to the second conductive partition 21 or the transparent conductive compound layer S1 to perform electrodeposition of the metal film.

[0120] Based on this, optionally, in some embodiments of the present application, such as Figure 8 , Figure 10 , Figure 12 , Figure 14 , Figure 16 and Figure 18As shown, the adjustable reflectivity device further includes a third electrode 30 and a third electrode controller 31 electrically connected to the third electrode 30, and the third electrode 30 is insulated from the first conductive partition 11 and the second conductive partition 21. In specific operation, when the projection overlap area AA is in a non-reflective state and the metal film still remains on the first conductive partition 11, the loop between the first conductive partition 11 and the second conductive partition 21 is cut off, and a forward voltage is applied between the first conductive partition 11 and the third electrode 30, so that the metal film remaining on the first conductive partition 11 undergoes an oxidation reaction and then turns into metal ions, so that the first conductive partition 11 becomes transparent again. At this time, a forward voltage is applied between the first conductive partition 11 and the third electrode 30, that is, the voltage applied to the first conductive partition 11 is a forward voltage relative to the voltage applied to the third electrode 30, that is, the first conductive partition 11 is equivalent to an anode, so that the metal film remaining on the first conductive partition 11 undergoes an oxidation reaction and then turns into metal ions, and the third electrode 30 is equivalent to a cathode, and a reduction reaction occurs.

[0121] The inventors also found that when a forward voltage is applied between the first conductive partition 11 and the second conductive partition 21 corresponding to the projected overlapping area AA, a side reaction may also occur on the second conductive partition 21 to produce opaque substances, for example, metal ions run to the second conductive partition 21 to electro-deposit a metal film.

[0122] Based on this, optionally, in some embodiments of the present application, such as Figure 8 , Figure 10 , Figure 12 , Figure 14 , Figure 16 and Figure 18 As shown, the electrochromic device further includes a third electrode 30 and a third electrode controller 31 electrically connected to the third electrode 30, and the third electrode 30 is insulated from the first conductive partition 11 and the second conductive partition 21. In specific operation, when the projection overlap area AA is in a non-reflective state, and there is an opaque substance caused by a side reaction on the second conductive partition 21, a forward voltage is applied between the second conductive partition 21 and the third electrode 30, so that the substance remaining on the second conductive partition 21 undergoes an oxidation reaction, and the second conductive partition 21 becomes transparent again. At this time, a forward voltage is applied between the second conductive partition 21 and the third electrode 30, that is, the voltage applied to the second conductive partition 21 is a forward voltage relative to the voltage applied to the third electrode 30, that is, the second conductive partition 21 is equivalent to an anode, so that the opaque substance on the second conductive partition 21 undergoes an oxidation reaction, and the second conductive partition 21 becomes transparent again, and the third electrode 30 is equivalent to a cathode, and a reduction reaction occurs.

[0123] For example, when the projection overlapping region AA is in a non-reflective state and there is a metal thin film caused by side reactions on the second conductive partition 21, a positive voltage is applied between the second conductive partition 21 and the third electrode 30, causing the remaining metal thin film on the second conductive partition 21 to undergo an oxidation reaction and turn into metal cations, thereby making the second conductive partition 21 become transparent again.

[0124] It should be emphasized that by providing a third electrode in the electrochromic device, when a metal thin film remains on the first conductive partition or an opaque substance generated by side reactions remains on the second conductive partition, a circuit can be formed between the third electrode and the corresponding first conductive partition or second conductive partition to eliminate the remaining metal thin film on the first conductive partition and the opaque substance generated by side reactions on the second conductive partition. By setting it in this way, the effects of electro-depositing and de-depositing metal thin films (i.e., reversible electro-deposition) can be optimized, and the service life of the device can be greatly improved.

[0125] Optionally, in some embodiments of the present application, as Figure 4 shown, in the first transparent conductive layer 10, each first conductive partition 11 extends along the first direction X and is arranged along the second direction Y, and the first direction X and the second direction Y are perpendicular; the third electrode 30 can be provided on the same layer as the first transparent conductive layer 10. At this time, the third electrode 30 can be located on one side of the first transparent conductive layer 10 along the second direction Y, as Figure 8 and Figure 9 shown; or, the third electrode 30 can be located on opposite sides of the first transparent conductive layer 10 along the second direction Y, as Figure 10 and Figure 11 shown; or, the third electrode 30 can be located in the middle region of the first transparent conductive layer 10 along the second direction Y, as Figure 12 and Figure 13 shown.

[0126] Optionally, in some other embodiments of the present application, in the second transparent conductive layer 20, each second conductive partition 21 extends along the second direction Y and is arranged along the first direction X, and the first direction X and the second direction Y are perpendicular; the third electrode 30 can be provided on the same layer as the second transparent conductive layer 20. At this time, the third electrode 30 can be located on one side of the second transparent conductive layer 20 along the second direction Y, as Figure 14 and Figure 15 shown; or, the third electrode 30 can be located on opposite sides of the second transparent conductive layer 20 along the second direction Y, as Figure 16 and Figure 17 shown; or, the third electrode 30 can be located in the middle region of the second transparent conductive layer 20 along the second direction Y, as Figure 18 and Figure 19 shown.

[0127] It can be understood that when the third electrode 30 is in the same layer as the first transparent conductive layer 10 or the second transparent conductive layer 20, the third electrode 30 can be prepared simultaneously with the preparation of the first transparent conductive layer 10 or the second transparent conductive layer 20, thereby simplifying the process.

[0128] Optionally, in some further embodiments of the present application, the third electrode 30 may neither be in the same layer as the first transparent conductive layer 10 nor the second transparent conductive layer 20, that is, the third electrode may be located in other film layers independent of the first transparent conductive layer 10 and the second transparent conductive layer 20, depending on the specific situation.

[0129] Optionally, in some embodiments of the present application, the third electrode 30 may be made of a metal material or a metal alloy material. Thus, when the projection overlapping region AA is in a non-reflective state and there is still a residue of the metal thin film on the first conductive partition 11, a positive voltage is applied between the first conductive partition 11 and the third electrode 30 to cause the residual metal thin film on the first conductive partition 11 to undergo an oxidation reaction and turn into metal ions, and the metal material or metal alloy material of the third electrode 30 undergoes a reduction reaction; or, when the projection overlapping region AA is in a non-reflective state and there is an opaque substance caused by a side reaction on the second conductive partition 21, a positive voltage is applied between the second conductive partition 21 and the third electrode 30 to cause the residual substance on the second conductive partition 21 to undergo an oxidation reaction, and the metal material or metal alloy material of the third electrode 30 undergoes a reduction reaction.

[0130] In this embodiment, considering that when the third electrode 30 is made of a metal material or a metal alloy material, the third electrode 30 is non-transparent. Therefore, preferably, the third electrode 30 is disposed in the invisible area around the electrochromic device to prevent affecting the transparent states of the first transparent conductive layer 10 and the second transparent conductive layer 20. For example, the third electrode 30 may be located on one side or opposite sides of the first transparent conductive layer 10 along the second direction Y, rather than the middle area, and the third electrode 30 may also be located on one side or opposite sides of the second transparent conductive layer 20 along the first direction X, rather than the middle area. Of course, if the third electrode 30 is a transparent material, it may also be located in the middle area of the first transparent conductive layer 10 along the second direction Y and the middle area of the second transparent conductive layer 20 along the first direction X.

[0131] Based on any of the above embodiments, optionally, in some embodiments of the present application, as Figure 1 and Figure 3 shown, the electrochromic device further includes:

[0132] A first transparent substrate 40 located on the side of the first transparent conductive layer 10 away from the second transparent conductive layer 20;

[0133] A second transparent substrate 50 located on a side of the second transparent conductive layer 20 facing away from the first transparent conductive layer 10;

[0134] And a connection structure 60 connecting the first transparent substrate 40 and the second transparent substrate 50, so as to form a receiving cavity KK between the first transparent conductive layer 40 and the second transparent conductive layer 50, and the receiving cavity KK is used to carry the active material SS.

[0135] Optionally, the first transparent substrate 40 and the second transparent substrate 50 may be inorganic glass substrates. In order to expand the application scenarios of the device, the first transparent substrate 40 and the second transparent substrate 50 may also be other transparent flexible substrates, such as substrates formed of polymer film organic materials such as polyethylene terephthalate (PET), polycarbonate (PC), polyethylene naphthalate (PEN), or polymethyl methacrylate (PMMA).

[0136] It should be noted that in the above embodiments, the first transparent conductive layer 10 and the second transparent conductive layer 20 in the electrochromic device are mainly shown as rectangles, but the present application does not limit the shapes of the first transparent conductive layer 10 and the second transparent conductive layer 20 in the electrochromic device. The first transparent conductive layer 10 and the second transparent conductive layer 20 may also be circular, triangular, pentagonal or other irregular shapes. At this time, multiple conductive partitions can still be formed on the first transparent conductive layer 10 and the second transparent conductive layer 20 by means of parallel etching line cutting.

[0137] It should also be noted that in the above embodiments, the related descriptions of "upper", "lower", "left", "right", "row" and "column" are only for convenient and clear description with reference to the corresponding drawings, and do not constitute a limitation to the present application.

[0138] In this specification, each part is described in a combined manner of parallel and progressive. The key points of each part are the differences from other parts. For the same or similar parts between each part, reference can be made to each other.

[0139] Regarding the above description of the disclosed embodiments, the features described in each embodiment of this specification can be replaced or combined with each other, so that those skilled in the art can implement or use the present application. Various modifications to these embodiments will be obvious to those skilled in the art. The general principles defined herein can be implemented in other embodiments without departing from the spirit or scope of the present application. Therefore, the present application will not be limited to the embodiments shown herein, but will conform to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. An adjustable reflectivity device, characterized in that, it includes: A first transparent conductive layer and a second transparent conductive layer which are oppositely arranged; An active material between the first transparent conductive layer and the second transparent conductive layer, the active material includes a cathode material and an anode material, and the cathode material includes metal ions; Wherein, the first transparent conductive layer includes a plurality of first conductive partitions that are insulated from each other and independently energized, the second transparent conductive layer includes a plurality of second conductive partitions that are insulated from each other and independently energized, and the first conductive partitions and the second conductive partitions have a projection overlapping area; When a negative voltage is applied between the first conductive partition and the second conductive partition corresponding to the projection overlapping area, the metal ions undergo a reduction reaction in the projection overlapping area corresponding to the first conductive partition to generate a metal thin film, and the anode material undergoes an oxidation reaction, and the projection overlapping area is in a reflective state; when a positive voltage is applied between the first conductive partition and the second conductive partition corresponding to the projection overlapping area, the metal thin film undergoes an oxidation reaction and turns back into the metal ions, and the anode material undergoes a reduction reaction, and the projection overlapping area is in a non-reflective state; When energized, the area of the second conductive partition energized in the second transparent conductive layer is larger than the area of the first conductive partition energized in the first transparent conductive layer.

2. The adjustable reflectivity device according to claim 1, characterized in that, The anode material includes a transparent conductive compound layer on the side of the second transparent conductive layer close to the first transparent conductive layer; When a negative voltage is applied between the first conductive partition and the second conductive partition corresponding to the projection overlapping area, the projection overlapping area corresponding to the transparent conductive compound layer undergoes an oxidation reaction; when a positive voltage is applied between the first conductive partition and the second conductive partition corresponding to the projection overlapping area, the projection overlapping area corresponding to the transparent conductive compound layer undergoes a reduction reaction.

3. The adjustable reflectivity device according to claim 2, characterized in that, The metal ions include Fe 3+ , Bi 3+ , Cu 2+ , Ag + , Zn 2+ and Sn 2+ and at least one of the six; The material of the transparent conductive compound layer includes at least one of 3,4-ethylenedioxythiophene monomer polymer (PEDOT), poly-3,4-ethylenedioxythiophene-polystyrene sulfonate polymer (PEDOT-PSS), and nickel oxide (NiO).

4. The adjustable reflectivity device according to claim 1, characterized in that, The anode material and the metal ions are mixed in the active material; When a negative voltage is applied between the first conductive partition and the second conductive partition corresponding to the projection overlapping area, the anode material undergoes an oxidation reaction in the projection overlapping area corresponding to the second conductive partition; when a positive voltage is applied between the first conductive partition and the second conductive partition corresponding to the projection overlapping area, the anode material undergoes a reduction reaction in the projection overlapping area corresponding to the second conductive partition.

5. The adjustable reflectivity device according to claim 4, characterized in that, The metal ions include Fe 3+ , Bi 3+ , Cu 2+ , Ag + , Zn 2+ and Sn 2+ and at least one of the six; The anode material includes at least one of ferrocyanide, phenazine, ferrocene, citric acid, ammonium citrate, Br - , I - and NO 2 - among the seven substances.

6. The adjustable reflectivity device according to claim 4, wherein, the active material is in a solution or gel state; when the active material is in a gel state, the active material further includes at least one of hydroxyethyl cellulose, polyacrylamide, sodium polyacrylate, polyvinyl alcohol, and polyethylene glycol diacrylate.

7. The adjustable reflectivity device according to claim 1, wherein, in the first transparent conductive layer, each of the first conductive partitions extends along a first direction and is arranged along a second direction; in the second transparent conductive layer, each of the second conductive partitions extends along the second direction and is arranged along the first direction; the first direction and the second direction are perpendicular, and each of the projection overlapping regions is arranged in an array along the first direction and the second direction.

8. The adjustable reflectivity device according to claim 7, wherein, when being energized, the area of the energized second conductive partition in the second transparent conductive layer is larger than the area of the energized first conductive partition in the first transparent conductive layer, including: when being energized, all of the second conductive partitions in the second transparent conductive layer are energized, and the first conductive partitions in the first transparent conductive layer are energized one by one along the second direction.

9. The adjustable reflectivity device according to claim 7, wherein, the voltage difference between the corresponding portions of the first conductive partition and the second conductive partition in each of the projection overlapping regions is equal.

10. The adjustable reflectivity device according to claim 9, wherein, each of the first conductive partitions has a first connection region on the same side along the first direction, the first connection regions of each of the first conductive partitions do not overlap with the second conductive partitions in projection, and the first connection regions of each of the first conductive partitions are respectively and electrically connected to a first electrode controller; each of the second conductive partitions has a second connection region on the same side along the second direction, the second connection regions of each of the second conductive partitions do not overlap with the first conductive partitions in projection, and the second connection regions of each of the second conductive partitions are respectively and electrically connected to a second electrode controller.

11. The adjustable reflectivity device according to claim 10, wherein, when a negative voltage is applied between the first conductive partition and the second conductive partition corresponding to the projection overlapping region, the voltage applied to the first conductive partition farther away from the second connection region along the second direction is more negative, and the voltage applied to the second conductive partition farther away from the first connection region along the first direction is more positive; when a positive voltage is applied between the first conductive partition and the second conductive partition corresponding to the projection overlapping region, the voltage applied to the first conductive partition farther away from the second connection region along the second direction is more positive, and the voltage applied to the second conductive partition farther away from the first connection region along the first direction is more negative.

12. The adjustable reflectivity device according to any one of claims 1-11, wherein, The adjustable reflectivity device further includes a third electrode and a third electrode controller electrically connected to the third electrode. The third electrode is insulated from the first conductive partition and also insulated from the second conductive partition; When the projection overlapping area is in the non-reflective state and there is still a residue of the metal thin film on the first conductive partition, a positive voltage is applied between the first conductive partition and the third electrode to cause the oxidation reaction of the metal thin film remaining on the first conductive partition to turn back into the metal ions; Alternatively, when the projection overlapping area is in the non-reflective state and there is an opaque substance caused by a side reaction on the second conductive partition, a positive voltage is applied between the second conductive partition and the third electrode to cause the oxidation reaction of the substance remaining on the second conductive partition, and the second conductive partition becomes transparent again.

13. The adjustable reflectivity device according to claim 12, wherein, In the first transparent conductive layer, each of the first conductive partitions extends along a first direction and is arranged along a second direction, and the first direction and the second direction are perpendicular; The third electrode is provided on the same layer as the first transparent conductive layer, and the third electrode is located on one side, opposite sides or the middle area of the first transparent conductive layer along the second direction.

14. The adjustable reflectivity device according to claim 12, wherein, In the second transparent conductive layer, each of the second conductive partitions extends along the second direction and is arranged along the first direction, and the first direction and the second direction are perpendicular; The third electrode is provided on the same layer as the second transparent conductive layer, and the third electrode is located on one side, opposite sides or the middle area of the second transparent conductive layer along the first direction.

15. The adjustable reflectivity device according to claim 12, wherein, The third electrode is made of a metal material or a metal alloy material, and the third electrode is located in the invisible area around the adjustable reflectivity device.

16. The adjustable reflectivity device according to any one of claims 1-11, wherein, The adjustable reflectivity device further includes: A first transparent substrate located on the side of the first transparent conductive layer away from the second transparent conductive layer; A second transparent substrate located on the side of the second transparent conductive layer away from the first transparent conductive layer; And a connection structure connecting the first transparent substrate and the second transparent substrate, so as to form an accommodation cavity between the first transparent conductive layer and the second transparent conductive layer, and the accommodation cavity is used to carry the active material.

17. The adjustable reflectivity device according to any one of claims 1-11, wherein, Adjacent first conductive partitions are insulated and isolated by etching lines, and adjacent second conductive partitions are also insulated and isolated by etching lines.