Display panel, preparation method thereof and display device

Abstract

The invention provides a display panel, a preparation method thereof and a display device, the display panel is provided with a display area and a non-display area surrounding the display area, the non-display area comprises a transition area adjacent to the display area, and the transition area comprises a positioning area. The display panel further comprises a substrate, an isolation structure and a plurality of first electrodes, wherein the isolation structure and the first electrodes are located on the substrate. The first electrode array is distributed on the substrate, at least part of the first electrodes are located in the transition area, the isolation structure comprises a plurality of isolation openings, at least part of the isolation structure is located in the transition area, and the isolation openings correspond to at least part of the first electrodes respectively. First electrodes are distributed in the positioning area, the orthographic projection of the isolation structure on the substrate is located outside the orthographic projection of the positioning area on the substrate, and the reflective rate of the first electrodes is different from the reflective rate of the isolation structure. In this way, the reflective rate difference between the positioning area and other areas of the transition area can be increased, and therefore the alignment precision of the display panel is improved.

Description

Technical Field

[0001] This relates to the field of display technologies, and more particularly, to a display panel, a method for manufacturing the same, and a display device. Background Art

[0002] An organic light-emitting diode (OLED) is an organic thin-film electroluminescent unit, which has attracted great attention due to its advantages such as simple manufacturing process, low cost, low power consumption, high brightness, wide viewing angle, high contrast, and flexible display, and has been widely used in electronic display products.

[0003] In the process of manufacturing a traditional display panel, light-emitting pixel patterning is usually achieved through a fine metal mask (FMM). The FMM technology is mature and has rich mass production experience. However, the FMM technology also has problems such as limited precision, high development cost, and long development cycle. The fine metal maskless technology eliminates the limitations of the traditional OLED process on the display screen size, resolution, and other screen body performances, and has the advantages of high performance, full-domain size, and agile delivery. Patents CN118251982A, CN116648095A, CN117062489A, CN118742138A, CN118678783A, CN118660598A, CN118675450A, CN118824188A, CN118781966A record the relevant content of the fine metal maskless technology for reference.

[0004] However, due to the design of its own structure, current electronic display products are difficult to further improve the accuracy during alignment operations while increasing the pixel density, and thus it is difficult to further improve the yield of the display panel. Summary of the Invention

[0005] In a first aspect of the present disclosure, a display panel is provided. The display panel has a display area and a non-display area surrounding the display area. The non-display area includes a transition area adjacent to the display area, and the transition area includes a positioning area. The display panel further includes a substrate, an isolation structure, and a plurality of first electrodes located on the substrate. The first electrodes are arranged in an array on the substrate, and at least some of the first electrodes are located in the transition area. The isolation structure includes a plurality of isolation openings, and at least some of the isolation structure is located in the transition area, and the isolation openings respectively correspond to at least some of the first electrodes. The first electrodes are distributed in the positioning area, the orthographic projection of the isolation structure on the substrate is located outside the orthographic projection of the positioning area on the substrate, and the light reflectance of the first electrodes is different from that of the isolation structure.

[0006] In the above solution, the isolation structure extends into the transition region, so it can act as a shielding layer to avoid signal interference in the transition region. In addition, the isolation structure is not distributed in the positioning region. Therefore, the reflectance in the positioning region is mainly determined by the first electrode. Thus, compared with the design where the isolation structure is distributed in the positioning region, the difference in reflectance between the positioning region and other regions of the transition region can be increased, thereby improving the alignment accuracy of the display panel.

[0007] In a specific embodiment of the first aspect of the present disclosure, the isolation openings are distributed in the display region and the transition region. The display panel further includes a light-emitting functional layer and a second electrode respectively located in the isolation openings, and the light-emitting functional layer and the second electrode are sequentially stacked on the first electrode. In the display region, the first electrode, the light-emitting functional layer, and the second electrode sequentially stacked at the isolation opening form a display light-emitting device. In the transition region, the first electrode, the light-emitting functional layer, and the second electrode sequentially stacked at the isolation opening form a dummy light-emitting device. Thus, it is equivalent to extending the manufacturing process of the light-emitting device into the transition region, so that in the process of manufacturing the light-emitting device, the isolation structure and the structure of the light-emitting device can shield the transition region to reduce the risk of signal interference in the display panel.

[0008] Optionally, the first electrode is a reflective electrode and the second electrode is a transparent electrode.

[0009] In a specific embodiment of the first aspect of the present disclosure, a plurality of first electrodes are provided in the positioning region, and the area of any first electrode in the positioning region is equal to the area of the first electrode of at least one display light-emitting device.

[0010] Optionally, the first electrodes in the positioning region are spaced apart from each other.

[0011] Optionally, the first electrodes in the positioning region are connected to each other. Thus, the area of the reflective structure formed by the first electrodes in the positioning region can be increased to further improve the difference in reflectance between the positioning region and the surrounding regions, thereby further improving the alignment accuracy of the display panel.

[0012] In a specific embodiment of the first aspect of the present disclosure, the isolation structure includes a support portion and a crown portion. The support portion is located between the crown portion and the substrate, and the projection of the end of the support portion facing the crown portion on the substrate is located within the projection of the crown portion on the substrate. Thus, in the process of manufacturing the light-emitting device, the isolation effect of the isolation structure on the light-emitting functional layer can be improved to reduce the risk of current crosstalk between different light-emitting devices.

[0013] In a specific embodiment of the first aspect of the present disclosure, the reflectance of the first electrode is greater than the reflectance of the crown portion.

[0014] Optionally, the first electrode includes a first film layer and a second film layer. The first film layer includes a high work function material. The second film layer is located between the first film layer and the substrate, and the light reflectance of the second film layer is greater than that of the crown portion.

[0015] Optionally, the material of the second film layer includes silver, or the second film layer is a stacked structure composed of molybdenum, aluminum, molybdenum, or titanium, aluminum, titanium in sequence.

[0016] Optionally, the material of the crown portion includes titanium.

[0017] In a specific embodiment of the first aspect of the present disclosure, the support portion is a conductive structure, and the second electrode is connected to the side surface of the support portion. The support portion can be used to assist in connecting the second electrode, and because the support portion is located at the gap of the light-emitting device, it can have a higher design thickness (greater than the thickness of the second electrode) and can be prepared using a material with high conductivity. Thus, when connected to the second electrode, the voltage drop problem generated on the second electrode when driving the light-emitting device can be reduced.

[0018] Optionally, the orthographic projection of the end portion of the support portion facing the crown portion on the substrate is located within the orthographic projection of the end portion of the support portion facing the substrate on the substrate. In this way, the support portion generally presents a shape that is wider at the bottom and narrower at the top to have a relatively inclined side surface, thereby facilitating the deposition of the edge portion of the second electrode on the side surface of the support portion to reduce the impedance at the connection between the support portion and the second electrode.

[0019] Optionally, the orthographic projection of the support portion on the substrate is located within the orthographic projection of the crown portion on the substrate, and the edge of the light-emitting functional layer is spaced from the support portion. In this way, during the preparation of the light-emitting functional layer and the second electrode, the evaporation angle of the evaporation equipment can be controlled so that at least part of the film layer of the light-emitting functional layer is disconnected from the support portion while ensuring the connection between the second electrode and the support portion.

[0020] Optionally, the isolation structure includes a bottom portion, the bottom portion is located between the support portion and the substrate, and the orthographic projection of the support portion on the substrate is located within the orthographic projection of the support portion on the substrate. Relative to the support portion, the surface of the bottom portion facing away from the substrate is more conducive to the deposition of the second electrode, thereby further reducing the impedance at the connection between the isolation structure and the second electrode.

[0021] Optionally, the orthographic projection of the bottom portion on the substrate is located within the orthographic projection of the crown portion on the substrate. In this way, during the preparation of the light-emitting functional layer and the second electrode, the evaporation angle of the evaporation equipment can be controlled so that at least part of the film layer of the light-emitting functional layer is disconnected from the bottom portion while ensuring the connection between the second electrode and the bottom portion.

[0022] In a specific embodiment of the first aspect of the present disclosure, the display panel may further include a pixel definition layer, which is located between the isolation structure and the substrate and includes a plurality of pixel openings. At least some of the isolation openings respectively correspond to the pixel openings, and the corresponding pixel openings and isolation openings are communicated with each other.

[0023] Optionally, the projection of the end of the isolation structure facing the substrate on the substrate is located within the projection of the pixel definition layer on the substrate.

[0024] Optionally, the pixel definition layer is an inorganic film layer. When preparing a light-emitting device using the isolation structure, the pixel definition layer does not need to have a large thickness to accommodate and separate some film layers in the light-emitting device, so that the pixel definition layer can be directly prepared using inorganic materials. In this way, the pixel definition layer can separate the isolation structure and the first electrode, so that a smaller gap can be designed between the first electrodes, which reduces the pixel gap and thus increases the pixel density PPI of the display panel; in addition, the inorganic layer has high compactness and strong resistance, so that the design thickness of the display panel can be reduced; in addition, the thickness of the inorganic film layer is relatively small, which enables the pixel opening to have a small depth to ensure the film layer continuity of the film layer (such as the second electrode) formed at the pixel opening; in addition, as an inorganic film layer, the pixel definition layer can have a large bonding strength with the isolation structure, thereby reducing the risk of the isolation structure falling off.

[0025] In a specific embodiment of the first aspect of the present disclosure, at least some of the pixel openings are distributed in the display area and the transition area, and the pixel openings and the isolation openings correspond to each other one by one.

[0026] Optionally, at least one pixel opening is located in the positioning area and corresponds to the first electrode in the positioning area.

[0027] Optionally, the pixel definition layer is located between the first electrode and the isolation structure, and the projection of the pixel opening on the substrate is located within the projection of the first electrode on the substrate.

[0028] In a specific embodiment of the first aspect of the present disclosure, the pixel opening is located in the display area. In the display area, the pixel opening and the isolation opening correspond to each other one by one. In the transition area, the pixel definition layer is located between the first electrode and the isolation structure, and the projection of the isolation opening on the substrate is located within the projection of the pixel definition layer on the substrate. The dummy light-emitting device is not used for display. Therefore, during the preparation of the dummy light-emitting device, the part of the pixel definition layer covering the first electrode does not need to form a pixel opening. Therefore, in the transition area, the pixel definition layer is a continuous film layer, so as to protect the underlying structure such as signal lines during the process of preparing the light-emitting device (there are multiple etching processes).

[0029] Optionally, in the transition region, the positive projection of the first electrode on the substrate is located within the positive projection of the pixel defining layer on the substrate.

[0030] Optionally, in the display region, the pixel defining layer is located between the first electrode and the isolation structure, and the positive projection of the pixel opening on the substrate is located within the positive projection of the first electrode on the substrate.

[0031] In a specific embodiment of the first aspect of the present disclosure, the display panel may further include a first encapsulation layer located on the side of the isolation structure away from the substrate. The first encapsulation layer includes a plurality of encapsulation units corresponding to the isolation openings respectively to cover the display light-emitting devices and dummy light-emitting devices defined by the isolation openings. During the process of fabricating the light-emitting devices in batches based on the isolation structure, the encapsulation units are formed synchronously with the corresponding light-emitting devices. After each batch of light-emitting devices is fabricated, the encapsulation units can encapsulate and protect the fabricated light-emitting devices in the process of fabricating the next batch of light-emitting devices to ensure the light-emitting effect of the light-emitting devices.

[0032] Optionally, the edge of the encapsulation unit extends to the side of the crown away from the substrate, and at least a part of the encapsulation unit extending to the side of the crown away from the substrate is spaced from the crown to form a suspended portion.

[0033] In a specific embodiment of the first aspect of the present disclosure, both the display light-emitting devices and the dummy light-emitting devices are classified into multiple types of light-emitting devices that emit different color lights, and the encapsulation units corresponding to adjacent light-emitting devices that emit different colors are spaced apart from each other.

[0034] In a specific embodiment of the first aspect of the present disclosure, the display panel may further include a second encapsulation layer and a third encapsulation layer covering and stacked on the first encapsulation layer. The second encapsulation layer is located between the first encapsulation layer and the third encapsulation layer. The first encapsulation layer and the third encapsulation layer are inorganic film layers, and the second encapsulation layer is an organic film layer.

[0035] In a specific embodiment of the first aspect of the present disclosure, the display panel may further include a touch structure located on the side of the isolation structure away from the substrate. A part of the touch structure's positive projection on the substrate is located within the transition region and outside the positioning region. Thus, in the transition region, the structure formed by the isolation structure and the second electrode of the light-emitting device can shield the signal lines and the touch structure in the display panel to avoid signal interference between the two.

[0036] In a specific embodiment of the first aspect of the present disclosure, the touch structure includes a touch electrode structure and touch traces. The orthographic projection of the touch electrode structure on the substrate is located within the display area. At least a part of the touch traces is located within the transition area in the orthographic projection on the substrate, and the orthographic projection of the part of the touch traces overlapping with the transition area on the substrate is located outside the positioning area. In this way, in the transition area, the touch traces will avoid the positioning area. Therefore, the structure formed by the isolation structure and the second electrode of the light-emitting device can shield the signal lines in the display panel and the touch traces of the touch structure to avoid signal interference between the two.

[0037] In a specific embodiment of the first aspect of the present disclosure, the touch electrode structure includes a plurality of first touch electrodes arranged in parallel and a plurality of second touch electrodes arranged in parallel. The first touch electrodes and the second touch electrodes cross each other. The touch traces include a first touch signal line and a second touch signal line. The first touch signal line is connected to the first touch electrodes, and the second touch signal line is connected to the second touch electrodes.

[0038] Optionally, the first touch electrode includes a plurality of first touch electrode blocks spaced apart from each other and a plurality of first connection parts. Each of the first touch electrode blocks of the first touch electrode is connected by the first connection parts. The second touch electrode includes a plurality of second touch electrode blocks spaced apart from each other and a plurality of second connection parts. Each of the second touch electrode blocks of the second touch electrode is connected by the second connection parts. The first connection parts and the second connection parts cross each other.

[0039] Optionally, the first touch electrodes and the second touch electrode blocks are of the same layer and the same material. The second connection parts and the second touch electrode blocks are located in different layers, and the second connection parts are conductive bridges.

[0040] The second aspect of the present disclosure provides a method for manufacturing a display panel. The manufacturing method includes: providing a substrate, dividing a display area and a non-display area surrounding the display area. The non-display area includes a transition area adjacent to the display area, and the transition area includes a positioning area; forming a plurality of first electrodes on the substrate, wherein at least a part of the first electrodes are formed in the transition area; forming an isolation structure having a plurality of isolation openings on the substrate, wherein at least a part of the isolation structure is formed in the transition area, and the isolation openings respectively correspond to at least a part of the first electrodes; wherein the first electrodes are distributed in the positioning area, the orthographic projection of the isolation structure on the substrate is located outside the orthographic projection of the positioning area on the substrate, and the reflectance of the first electrodes is different from the reflectance of the isolation structure.

[0041] In the display panel obtained by the above preparation method, the isolation structure extends into the transition region, so that it can act as a shielding layer to avoid signal interference in the transition region; in addition, the isolation structure is not distributed in the positioning region. Therefore, the reflectance in the positioning region is mainly determined by the first electrode. Thus, compared with the design in which the isolation structure is distributed in the positioning region, the reflectance difference between the positioning region and other regions of the transition region can be increased, thereby improving the alignment accuracy of the display panel.

[0042] In a specific implementation manner of the second aspect of the present disclosure, the preparation method may further include: after forming the isolation structure, depositing a light-emitting functional material and an electrode material to form a light-emitting functional structure layer and a second electrode structure layer respectively; depositing a first insulating material film layer to form a first encapsulation structure layer; forming a photoresist layer on the first encapsulation structure layer, and performing patterning on the photoresist layer to form a photoresist pattern, the photoresist pattern covering part of the isolation opening; etching the first encapsulation structure layer, the second electrode structure layer and the light-emitting functional structure layer based on the photoresist pattern to remove the parts of the first encapsulation structure layer, the second electrode structure layer and the light-emitting functional structure layer that are not covered by the photoresist pattern, and the remaining parts of the first encapsulation structure layer, the second electrode structure layer and the light-emitting functional structure layer form an encapsulation unit, a second electrode and a light-emitting functional layer respectively. In the display region, the first electrode, the light-emitting functional layer and the second electrode stacked in each isolation opening form a display light-emitting device. In the transition region, the first electrode, the light-emitting functional layer and the second electrode stacked in each isolation opening form a dummy light-emitting device; removing the remaining photoresist pattern; repeating the above steps to form a light-emitting functional layer, a second electrode and an encapsulation unit at the remaining isolation openings, wherein the light-emitting colors of the light-emitting functional layers formed in different processes are different, and all the encapsulation units form a first encapsulation layer.

[0043] In a specific implementation manner of the second aspect of the present disclosure, the preparation method may further include: depositing a pixel defining material film layer on the substrate after forming the first electrode and before forming the isolation structure; after forming the isolation structure, performing patterning on the pixel defining material film layer to form a plurality of pixel openings in the pixel defining layer, wherein at least some of the isolation openings correspond to the pixel openings respectively, and the corresponding pixel openings and isolation openings are connected to each other.

[0044] In a specific implementation manner of the second aspect of the present disclosure, the pixel openings are distributed in the display region and the transition region, the pixel defining layer is located between the first electrode and the isolation structure, and the orthographic projection of the pixel opening on the substrate is located within the orthographic projection of the first electrode on the substrate.

[0045] In another specific embodiment of the second aspect of the present disclosure, the pixel opening is located in the display area. In the display area, the pixel openings and the isolation openings are in one-to-one correspondence. In the transition area, the pixel defining layer is located between the first electrode and the isolation structure. The orthographic projection of the isolation opening on the substrate is located within the orthographic projection of the pixel defining layer on the substrate. In the transition area and outside the positioning area, the orthographic projection of the first electrode on the substrate is located within the orthographic projection of the pixel defining layer on the substrate. In the display area, the pixel defining layer is located between the first electrode and the isolation structure, and the orthographic projection of the pixel opening on the substrate is located within the orthographic projection of the first electrode on the substrate.

[0046] The third aspect of the present disclosure provides a display device, which includes the display panel in the first aspect above or the display panel obtained by the manufacturing method in the second aspect above.

[0047] In a specific embodiment of the third aspect of the present disclosure, the display device may further include a cover plate, which is located on the side of the isolation structure away from the substrate and covers the display area and the non-display area of the display panel. Description of the Drawings

[0048] Figure 1 It is a schematic plan view of a display panel provided by an embodiment of the present disclosure.

[0049] Figure 2 is Figure 1 An enlarged view of area S1 of the shown display panel under a certain design.

[0050] Figure 3 is Figure 2 A cross-sectional view of the shown display panel along M1-N1.

[0051] Figure 4 is Figure 2 A cross-sectional view of the shown display panel along M2-N2.

[0052] Figure 5 is Figure 2 A cross-sectional view of the shown display panel along M3-N3.

[0053] Figure 6 is Figure 1 An enlarged view of area S1 of the shown display panel under another design.

[0054] Figure 7A is Figure 2 A cross-sectional view of the shown display panel along M2-N2 under another design.

[0055] Figure 7B is Figure 2 A cross-sectional view of the shown display panel along M3-N3 under another design.

[0056] Figure 8 The Figure 2 cross-sectional view along M1-N1 of the display panel shown under another design.

[0057] Figure 9 The Figure 2 cross-sectional view along M1-N1 of the display panel shown under another design.

[0058] Figure 10 The Figure 2 cross-sectional view along M1-N1 of the display panel shown under another design.

[0059] Figure 11 The Figure 1 enlarged view of area S1 of the display panel shown under another design.

[0060] Figure 12 The Figure 11 schematic plan view of the display area of the corresponding display panel.

[0061] Figure 13A The Figure 12 enlarged view of a partial area of the display panel shown.

[0062] Figure 13B The Figure 13A cross-sectional view along M4-N4 of the structure shown.

[0063] Figure 13C The Figure 13A cross-sectional view along M5-N5 of the structure shown.

[0064] Figure 14 Flowchart of a preparation method of a display panel provided by an embodiment of the present disclosure.

[0065] Figure 15 Flowchart of another preparation method of a display panel provided by an embodiment of the present disclosure.

[0066] Figures 16A to 16I The Figure 4 process diagram of a preparation method provided by an embodiment of the present disclosure for forming the display panel shown.

[0067] Figure 17 Schematic structural view of a partial area of a display device provided by an embodiment of the present disclosure.

[0068] Explanation of reference numerals:

[0069] 10 - display panel; 11 - display area; 12 - non-display area; 13 - transition area; 14 - positioning area; 15 - bonding area;

[0070] 100 - Substrate; 200 - Light - emitting device; 200a - Display light - emitting device; 200b - dummy light - emitting device; 210 - First electrode; 220 - Light - emitting functional layer; 221 - First functional layer; 222 - Light - emitting layer; 223 - Second functional layer; 230 - Second electrode;

[0071] 300 - Isolation structure; 301 - Isolation opening; 310 - Support portion; 320 - Crown portion; 330 - Bottom portion; 400 - Pixel definition layer; 401 - Pixel opening;

[0072] 500 - Encapsulation structure; 510 - First encapsulation layer; 511 - Encapsulation unit; 520 - Second encapsulation layer; 530 - Third encapsulation layer;

[0073] 600 - Touch - control structure; 610 - First touch - control electrode; 611 - First touch - control electrode block; 612 - First connection portion; 620 - Second touch - control electrode; 621 - Second touch - control electrode block; 622 - Second connection portion; 630 - Touch - control trace; 631 - First touch - control signal line; 632 - Second touch - control signal line; 700 - Photoresist pattern; 800 - Cover plate. Detailed implementation manners

[0074] Next, the technical solutions in the embodiments of this specification will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of this specification. Obviously, the described embodiments are only a part of the embodiments of this specification, rather than all the embodiments. Based on the embodiments in this specification, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the scope of protection of this specification.

[0075] In a display product, some functional film layers in a light - emitting device are formed by evaporation. There are multiple functional film layers in each light - emitting device, and the materials of some functional film layers (such as the light - emitting layer) in light - emitting devices that emit different lights are different. Therefore, when evaporating these functional film layers through a mask plate (such as a fine mask plate), multiple alignments are required. To solve the problem of position deviation caused by alignment accuracy errors, sufficient space (a safety margin related to the alignment error) needs to be reserved between different light - emitting devices to ensure that the position of the actual light - emitting area of the light - emitting device can have a certain overlap rate with the designed position (designed area). This is equivalent to compressing the designed area of the light - emitting area of the light - emitting device, which not only limits the light - emitting area of the light - emitting device but also makes it impossible to further increase the arrangement density of the light - emitting devices, thus making it difficult to further improve the PPI (pixel density) of the display panel.

[0076] In the present disclosure, an isolation structure (the isolation structure and the second isolation structure described below) is provided at the gap between the light-emitting devices to isolate the functional film layers of the adjacent light-emitting devices. In this way, in the evaporation process of the functional film layer, it is only necessary to perform evaporation on the entire surface of the display panel without using a mask plate to prepare the functional film layer of each light-emitting device separately. The process does not need to consider the alignment accuracy during evaporation, so that the gap between the light-emitting devices can be designed to be smaller in size to increase the PPI (the principle of which can be seen in the following and Figures 16A to 16I (See also the relevant description in the relevant embodiments).

[0077] In some scenarios, circuits are arranged near the display area in the non-display area of ​​the display panel, and signal interference is easily generated between the circuits when they are driven, resulting in malfunction of the display panel. In this case, the isolation structure can be extended to the non-display area as a shielding layer to eliminate the signal interference problem between the circuits.

[0078] The applicant found that if the isolation structure is extended to the non-display area, the overall reflectivity of the display panel will become relatively uniform, making it difficult to determine the edge position of the display panel when aligning the display panel with other structures such as a cover plate, resulting in low alignment accuracy, which seriously limits the improvement of the yield of display products.

[0079] The embodiments of the present disclosure provide a display panel and a method for manufacturing the same, and a display device to at least solve the above technical problems. The display panel has a display area and a non-display area surrounding the display area, the non-display area includes a transition area adjacent to the display area, and the transition area includes a positioning area. The display panel also includes a substrate, an isolation structure and a plurality of first electrodes located on the substrate. The first electrode array is distributed on the substrate, and at least part of the first electrodes are located in the transition area. The isolation structure includes a plurality of isolation openings, at least part of the isolation structure is located in the transition area, and the isolation openings correspond to at least part of the first electrodes respectively. The first electrode is distributed in the positioning area, the orthographic projection of the isolation structure on the substrate is located outside the orthographic projection of the positioning area on the substrate, and the reflectivity of the first electrode is different from the reflectivity of the isolation structure. In the display panel, the isolation structure extends into the transition area so that it can act as a shielding layer to avoid signal interference in the transition area; in addition, the isolation structure is not distributed in the positioning area, so the reflectivity in the positioning area is mainly determined by the first electrode, so that compared with the design in which the isolation structure is distributed in the positioning area, the reflectivity difference between the positioning area and other areas of the transition area can be increased, thereby improving the alignment accuracy of the display panel.

[0080] Next, with reference to the accompanying drawings, the structures of the display panel and the display device according to at least one embodiment of the present disclosure will be described in detail. In addition, in these drawings, a spatial rectangular coordinate system is established based on the substrate in the display panel to more intuitively present the positional relationship of the relevant structures in the display panel. In this spatial rectangular coordinate system, the X-axis and the Y-axis are parallel to the plane where the substrate is located, and the Z-axis is perpendicular to the plane where the substrate is located.

[0081] As Figures 1 to 5 shown, the display panel 10 includes a display area 11 and a non-display area 12 surrounding the display area 11. The non-display area 12 includes a transition area 13 adjacent to the display area 11, and the transition area 13 includes a positioning area 14. Sub-pixels (which can be referred to as sub-pixels, etc.) can be arranged in the display area 11. For example, R, G, and B sub-pixels. The physical structure of the sub-pixel can be a light-emitting device in the following embodiments. Adjacent sub-pixels with different emitted light colors form a pixel (which can be referred to as a pixel unit, a large pixel, etc.). The arrangement density of the pixel in the display area 11 represents the pixel density PPI.

[0082] The physical structure of the display panel 10 includes a substrate 100, an isolation structure 300, and a plurality of first electrodes 210 located on the substrate 100. The first electrodes 210 are arranged in an array on the substrate 100, and a part of the first electrodes 210 is located in the transition area 13. The isolation structure 300 includes a plurality of isolation openings 301. A part of the isolation structure 300 is located in the transition area 13, and the isolation openings 301 correspond to at least some of the first electrodes 210 respectively. The first electrodes 210 are distributed in the positioning area 14, and the orthographic projection of the isolation structure 300 on the substrate 100 is located outside the orthographic projection of the positioning area 14 on the substrate 100.

[0083] The reflectance of the first electrode 210 is different from that of the isolation structure 300. In the positioning area 14, due to the absence of the isolation structure 300, there is a difference in reflectance between the positioning area 14 and other areas of the transition area 13. Thus, during alignment, the accurate position and distribution boundary of the positioning area 14 can be obtained based on this reflectance difference, thereby improving the alignment accuracy.

[0084] In at least one embodiment of the present disclosure, as Figures 1 to 5As shown, the isolation openings 301 are distributed in the display area 11 and the transition area 13. The display panel further includes a light-emitting functional layer 220 and a second electrode 230 respectively located in the isolation openings 301. The light-emitting functional layer 220 and the second electrode 230 are sequentially stacked on the first electrode 210. In the display area 11, the first electrode 210, the light-emitting functional layer 220, and the second electrode 230 sequentially stacked at the isolation opening 301 constitute a display light-emitting device 200a. In the transition area 13, the first electrode 210, the light-emitting functional layer 220, and the second electrode 230 sequentially stacked at the isolation opening 301 constitute a dummy light-emitting device 200b. In this way, it is equivalent to extending the manufacturing process of the light-emitting device 200 to the transition area 13. In the process of manufacturing the light-emitting device 200 (the display light-emitting device 200a and the dummy light-emitting device 200b), the structures of the isolation structure 300 and the light-emitting device 200 can shield the transition area 13 to reduce the risk of signal interference in the display panel.

[0085] In at least one embodiment of the present disclosure, as Figures 3 to 5 shown, the light-emitting functional layer 220 may further include a light-emitting layer 222 and a second functional layer 223. The first functional layer 221, the light-emitting layer 222, and the second functional layer 223 are sequentially stacked on the first electrode 210. The first functional layer 221 may include a hole injection layer, a hole transport layer, an electron blocking layer, etc. The second functional layer 223 may include an electron injection layer, an electron transport layer, a hole blocking layer, etc. It should be noted that one or more light-emitting layers 222 may be provided in the light-emitting device 200. In the case of multiple light-emitting layers 222, the light-emitting device 200 may have a higher light extraction efficiency.

[0086] For example, in at least one embodiment of the present disclosure, the first electrode 210 may be set as an anode, and the second electrode 230 may be set as a cathode.

[0087] In at least one embodiment of the present disclosure, as Figures 3 to 5 shown, the substrate 100 may include a substrate and a driving circuit layer located on the substrate. The driving circuit layer includes a plurality of pixel driving circuits located in the display area, and the display functional layer is located on the driving circuit layer. For example, the pixel driving circuit may include a plurality of transistors TFT, capacitors, etc., and may be formed in various forms such as 2T1C (i.e., 2 transistors (TFT) and 1 capacitor (C)), 3T1C, or 7T1C. The pixel driving circuit is connected to the light-emitting device 200 to control the on / off state and the light-emitting brightness of the light-emitting device 200.

[0088] It should be noted that the light-emitting device 200 (dummy light-emitting device 200b) in the transition area 13 may not need to participate in light emission. Therefore, in the transition area 13, the pixel driving circuit may not be connected to the first electrode 210 of the light-emitting device 200.

[0089] In at least one embodiment of the present disclosure, the first electrode 210 may be a reflective electrode, and the second electrode 230 may be a transparent electrode. That is, the light-emitting device 200 in the display panel is in a top-emission mode. In this case, the first electrode 210 is designed to have a high reflectivity to increase the light extraction efficiency of the light-emitting device 200. Therefore, the reflectivity of the first electrode 210 is higher than that of the isolation structure 300.

[0090] In at least one embodiment of the present disclosure, as Figures 2 to 5 shown, a plurality of first electrodes 210 are provided in the positioning area 14, and the area of any one of the first electrodes 210 in the positioning area 14 is equal to the area of the first electrode 210 of at least one display light-emitting device 200a. That is, when manufacturing the light-emitting device 200 in the display area 11, the process range for manufacturing the light-emitting device 200 is directly extended to the transition area 13, so that there is no need to additionally design the pattern of the first electrode 210 in the transition area 13 and the positioning area 14 therein, thereby simplifying the design process.

[0091] In some embodiments of the present disclosure, as Figures 2 to 5 shown, the first electrodes 210 in the positioning area 14 are spaced apart from each other.

[0092] In some other embodiments of the present disclosure, as Figure 6 shown, the first electrodes 210 in the positioning area 14 are connected to each other. In this way, the area of the reflective structure formed by the first electrodes 210 in the positioning area 14 can be increased to further improve the difference in reflectivity between the positioning area 14 and the surrounding area, thereby further improving the alignment accuracy of the display panel.

[0093] In at least one embodiment of the present disclosure, referring back to Figures 3 to 5 , the isolation structure 300 includes a support portion 310 and a crown portion 320. The support portion 310 is located between the crown portion 320 and the substrate 100, and the projection of the end of the support portion 310 facing the crown portion 320 on the substrate 100 is located within the projection of the crown portion 320 on the substrate 100. In this way, during the process of manufacturing the light-emitting device 200, the isolation effect of the isolation structure 300 on the light-emitting functional layer 220 can be improved to reduce the risk of current crosstalk problems between different light-emitting devices 200.

[0094] For the setting method of the isolation structure 300, reference can also be further made to the descriptions in Patent CN118251982A, 202410864269.8, PCT / CN2024 / 098407, PCT / CN2024 / 102783, PCT / CN2024 / 098217, PCT / CN2024 / 100935, PCT / CN2024 / 102785, PCT / CN2024 / 099419, PCT / CN2024 / 099072, and CN116685174A. Below, several setting methods of the isolation structure 300 will be used to illustrate the structure of the display panel of the present disclosure.

[0095] In at least one embodiment of the present disclosure, the reflectivity of the first electrode 210 is greater than the reflectivity of the crown portion 320.

[0096] For example, the first electrode 210 includes a first film layer and a second film layer. The first film layer includes a high work function material (such as indium tin oxide, etc.). The second film layer is located between the first film layer and the substrate 100, and the reflectivity of the second film layer is greater than the reflectivity of the crown portion 320.

[0097] For example, the material of the second film layer includes silver, or the second film layer is a laminated structure composed of molybdenum, aluminum, molybdenum or titanium, aluminum, titanium in sequence.

[0098] For example, the material of the crown portion 320 includes titanium.

[0099] In at least one embodiment of the present disclosure, as Figures 3 to 5 shown, the support portion 310 is a conductive structure, and the second electrode 230 is connected to the side surface of the support portion 310. The support portion 310 can be used to assist in connecting the second electrode 230. Since the support portion 310 is located at the gap of the light-emitting device 200, it can have a higher design thickness (greater than the thickness of the second electrode 230) and can be prepared using a high conductivity material. Thus, when connected to the second electrode 230, the voltage drop problem generated on the second electrode 230 when driving the light-emitting device 200 can be reduced.

[0100] In at least one embodiment of the present disclosure, as Figures 3 to 5 shown, the orthographic projection of the end portion of the support portion 310 facing the crown portion 320 on the substrate 100 is located within the orthographic projection of the end portion of the support portion 310 facing the substrate 100 on the substrate 100. In this way, the support portion 310 generally presents a shape that is wider at the bottom and narrower at the top to have a relatively inclined side surface, so as to facilitate the deposition of the edge portion of the second electrode 230 on the side surface of the support portion 310, thereby increasing the thickness of the portion where the second electrode 230 contacts the support portion 310, and thus reducing the impedance at the connection between the support portion 310 and the second electrode 230.

[0101] In at least one embodiment of the present disclosure, as Figures 3 to 5 shown, the orthographic projection of the support portion 310 on the substrate 100 is located within the orthographic projection of the crown portion 320 on the substrate 100, and the edge of the light-emitting functional layer 220 is spaced from the support portion 310. Thus, the isolation structure 300 as a whole presents a shape that is wider at the top and narrower at the bottom. Therefore, during the evaporation process of some film layers in the light-emitting device 200 (such as the light-emitting functional layer 220 and the second electrode 230 mentioned in the above embodiment), by controlling the evaporation angle of each film layer, under the blocking action of the isolation structure 300, while ensuring that the edge of a part of the film layer (such as the second electrode 230 mentioned above) can be connected to the conductive structure (such as the support portion 310) of the isolation structure 300, it is possible to prevent another part of the film layer (such as the light-emitting functional layer or a part of the film layer including the hole material, i.e., the first functional layer 221) from contacting the isolation structure 300. Thus, while blocking a part of the film layer (including electrical isolation, the light-emitting functional layers of adjacent light-emitting devices or parts thereof will not be directly or indirectly electrically connected), it is ensured that another part of the film layer (such as the second electrode 230 mentioned above) can be connected to the conductive structure of the isolation structure 300.

[0102] In at least one embodiment of the present disclosure, as Figure 7A and Figure 7B shown, the isolation structure 300 may further include a bottom portion 330. The bottom portion 330 is located between the support portion 310 and the substrate 100, and the orthographic projection of the support portion 310 on the substrate 100 is located within the orthographic projection of the support portion 310 on the substrate 100. Relative to the support portion 310, the surface of the bottom portion 330 facing away from the substrate 100 is more conducive to the deposition of the second electrode 230, thereby further reducing the impedance at the connection between the isolation structure 300 and the second electrode 230.

[0103] Optionally, the orthographic projection of the bottom portion 330 on the substrate 100 is located within the orthographic projection of the crown portion 320 on the substrate 100. Thus, during the preparation of the light-emitting functional layer 220 and the second electrode 230, the evaporation angle of the evaporation equipment can be controlled so that at least part of the film layer of the light-emitting functional layer 220 is disconnected from the bottom portion 330 while ensuring the connection between the second electrode 230 and the bottom portion 330.

[0104] For example, the bottom portion 330, the support portion 310, and the crown portion 320 may be molybdenum, aluminum, and titanium respectively, and the corrosion resistance of aluminum, molybdenum, and titanium increases in sequence. During etching, the film layers formed by these materials can form the isolation structure 300 as shown in Figure 7A and Figure 7B shown.

[0105] In at least one embodiment of the present disclosure, as Figure 7A and Figure 7BAs shown, the display panel may further include a pixel defining layer 400. The pixel defining layer 400 is located between the isolation structure 300 and the substrate 100, and includes a plurality of pixel openings 401. At least some of the isolation openings 301 correspond to the pixel openings 401 respectively, and the corresponding pixel openings 401 and isolation openings 301 communicate with each other. The pixel defining layer 400 is used to space the first electrode 210 and the isolation structure 300 to avoid short circuit.

[0106] In at least one embodiment of the present disclosure, as Figure 7A and Figure 7B shown, the orthographic projection of the end of the isolation structure 300 facing the substrate 100 on the substrate 100 is located within the orthographic projection of the pixel defining layer 400 on the substrate 100. In this way, the isolation structure 300 completely falls on the pixel defining layer 400 to improve the flatness of each film layer of the isolation structure 300.

[0107] In at least one embodiment of the present disclosure, the pixel defining layer 400 may be an inorganic film layer. When preparing the light-emitting device 200 using the isolation structure 300, the pixel defining layer 400 does not need to have a large thickness to accommodate and partition some film layers in the light-emitting device 200, so that the pixel defining layer 400 can be directly prepared using inorganic materials. In this way, the pixel defining layer 400 can space the isolation structure 300 and the first electrode 210, so that a smaller gap can be designed between the first electrodes 210, which reduces the pixel gap and thus improves the pixel density PPI of the display panel; in addition, the inorganic layer has high compactness and strong resistance ability, so that the designed thickness of the display panel can be reduced; furthermore, the thickness of the inorganic film layer is relatively small, which makes the pixel opening 401 have a smaller depth to ensure the film layer continuity of the film layer (such as the second electrode 230) formed at the pixel opening 401; in addition, as an inorganic film layer, the pixel defining layer 400 has a greater bonding strength with the isolation structure 300, thus reducing the risk of the isolation structure 300 falling off.

[0108] In some embodiments of the present disclosure, referring back to Figures 3 to 5 , the pixel openings 401 are distributed in the display area 11 and the transition area 13, and at least some of the pixel openings 401 correspond to the isolation openings 301 respectively.

[0109] For example, as Figures 3 to 5 shown, at least one pixel opening 401 is located in the positioning area 14 and corresponds to the first electrode in the positioning area 14.

[0110] For example, as Figures 3 to 5 shown, at the position where the isolation opening 301 is provided, the pixel defining layer 400 is located between the first electrode 210 and the isolation structure 300, and the orthographic projection of the pixel opening 401 on the substrate 100 is located within the orthographic projection of the first electrode 210 on the substrate 100.

[0111] In some other embodiments of the present disclosure, as Figure 8 shown, the pixel opening 401 is located in the display area 11. In the display area 11, the pixel openings 401 and the isolation openings 301 are in one-to-one correspondence. In the transition area 13, the pixel defining layer 400 is located between the first electrode 210 and the isolation structure 300. The orthographic projection of the isolation opening 301 on the substrate 100 is located within the orthographic projection of the pixel defining layer 400 on the substrate 100. The dummy light-emitting device 200b is not used for display. Therefore, during the preparation of the dummy light-emitting device 200b, the portion of the pixel defining layer 400 covering the first electrode 210 does not need to form a pixel opening 401. Therefore, in the transition area 13, the pixel defining layer 400 is a continuous film layer, so as to protect the underlying structures such as signal lines during the process of manufacturing the light-emitting device 200 (there are multiple etching processes).

[0112] For example, as Figure 8 shown, in the transition area 13, the orthographic projection of the first electrode 210 on the substrate 100 is located within the orthographic projection of the pixel defining layer 400 on the substrate 100. In the display area 11, the pixel defining layer 400 is located between the first electrode 210 and the isolation structure 300, and the orthographic projection of the pixel opening 401 on the substrate 100 is located within the orthographic projection of the first electrode 210 on the substrate 100.

[0113] In at least one embodiment of the present disclosure, referring back to Figures 3 to 5 , the display panel may further include a first encapsulation layer 510. The first encapsulation layer 510 is located on the side of the isolation structure 300 away from the substrate 100. The first encapsulation layer 510 includes a plurality of encapsulation units 511. The encapsulation units 511 correspond to the isolation openings 301 respectively to cover the display light-emitting device 200a and the dummy light-emitting device 200b defined by the isolation openings 301. During the process of manufacturing the light-emitting device 200 in batches based on the isolation structure 300, the encapsulation units 511 are formed synchronously with the corresponding light-emitting devices 200. After each batch of light-emitting devices 200 is manufactured, the encapsulation units 511 can encapsulate and protect the manufactured light-emitting devices 200 during the process of manufacturing the next batch of light-emitting devices 200 to ensure the light-emitting effect of the light-emitting devices 200.

[0114] In at least one embodiment of the present disclosure, both the display light-emitting device 200a and the dummy light-emitting device 200b are classified as multiple types of light-emitting devices 200 that emit different color lights, such as light-emitting devices R, G, and B. The packaging units 511 corresponding to adjacent light-emitting devices 200 that emit different colors are spaced apart from each other. It should be noted that the light-emitting devices 200 that emit different color lights are separately manufactured independently, but the film layers (such as evaporation film layers, for example, light-emitting functional layers) in each type of light-emitting device 200 are evaporated over the entire display panel during evaporation. For example, taking the preparation of light-emitting devices R, G, and B in sequence as an example, when preparing the light-emitting device R, the light-emitting device R is formed in each isolation opening 301, and the first packaging layer 510 is prepared on the display panel to cover the light-emitting device R. Then, the first packaging layer 510, the second electrode, and the light-emitting functional layer in some of the isolation openings 301 (used to form the light-emitting devices G and B in the final product) are removed. During this process, the first packaging layer 510 is used to protect the light-emitting device R in other isolation openings 301 (used to form the light-emitting device R in the final product). Based on this method, the light-emitting devices G and B are prepared in sequence, and finally, the first packaging layer 510 as shown in Figures 3 to 5 is formed, that is, the first packaging layer 510 on the entire display panel is obtained through multiple manufacturing processes, and the first packaging layer 510 also forms multiple packaging units 511 that are spaced apart from each other.

[0115] It should be noted that in the embodiments of the present disclosure, the preparation sequence of the three types of light-emitting devices R, G, and B is not limited and can be designed according to the actual process requirements. For example, the manufacturing process can also be implemented based on the sequence of light-emitting devices B, G, and R.

[0116] In at least one embodiment of the present disclosure, as shown in Figures 3 to 5 the edge of the packaging unit 511 extends to the side of the crown 320 away from the substrate 100, and at least a part of the packaging unit 511 that extends to the side of the crown 320 away from the substrate 100 is spaced apart from the crown 320 to form a suspended portion. The formation method of the packaging unit 511 is related to the process method of preparing the light-emitting device 200 based on the isolation structure, and the relevant description can be referred to in the preparation method of the display panel described below Figures 16A to 16I and will not be elaborated here.

[0117] In at least one embodiment of the present disclosure, as shown in Figure 9As shown, the display panel may further include a second encapsulation layer 520 and a third encapsulation layer 530 that are stacked on the first encapsulation layer 510. The second encapsulation layer 520 is located between the first encapsulation layer 510 and the third encapsulation layer 530. The first encapsulation layer 510, the second encapsulation layer 520, and the third encapsulation layer 530 form an encapsulation structure 500. For example, the first encapsulation layer 510 and the third encapsulation layer 530 are inorganic film layers, and the second encapsulation layer 520 is an organic film layer. The second encapsulation layer 520 can improve the flatness of the surface of the display panel to facilitate the setting of other components (such as the touch structure described below) on the encapsulation structure 500. In addition, the second encapsulation layer 520 can have a certain flexibility to relieve the stress of the first encapsulation layer 510 and the third encapsulation layer 530, thereby improving the reliability of the display panel and being more conducive to the application of the display panel in the flexible display field. Additionally, the third encapsulation layer 530 has high density and has a high barrier effect on water, oxygen, etc., and the third encapsulation layer 530 has higher strength to facilitate the preparation of other components (such as structures related to touch functions, optical film layers, etc.) on it.

[0118] In at least one embodiment of the present disclosure, as Figure 10 and Figure 11 shown, the display panel may further include a touch structure 600. The touch structure 600 is located on the side of the isolation structure 300 away from the substrate 100, and a part of the touch structure 600 is orthogonally projected onto the substrate 100 within the transition region 13 and outside the positioning region 14. In this way, in the transition region 13, the structure formed by the isolation structure 300 and the second electrode 230 of the light-emitting device 200 can shield the signal lines in the display panel and the touch structure 600 to avoid signal interference between the two.

[0119] In at least one embodiment of the present disclosure, as Figures 10 to 12 shown, the touch structure 600 includes a touch electrode structure ( Figure 12 the structure shown) and touch traces 630. The orthographic projection of the touch electrode structure onto the substrate 100 is located within the display area 11, and at least a part of the touch traces 630 is orthogonally projected onto the substrate 100 within the transition region 13, and the part of the touch traces 630 overlapping with the transition region 13 is orthogonally projected onto the substrate 100 outside the positioning region 14. In this way, in the transition region 13, the touch traces 630 will avoid the positioning region 14. Therefore, the structure formed by the isolation structure 300 and the second electrode 230 of the light-emitting device 200 can shield the signal lines in the display panel and the touch traces 630 of the touch structure 600 to avoid signal interference between the two.

[0120] In at least one embodiment of the present disclosure, as Figure 1 、 Figures 10 to 12 and Figures 13A to 13CAs shown, the touch electrode structure includes a plurality of first touch electrodes 610 arranged in parallel and a plurality of second touch electrodes 620 arranged in parallel. The first touch electrodes 610 and the second touch electrodes 620 cross each other to form touch units (capacitors) with touch detection functions at the crossing points. The touch traces 630 include a first touch signal line 631 and a second touch signal line 632. The first touch signal line 631 is connected to the first touch electrodes 610, and the second touch signal line 632 is connected to the second touch electrodes 620 for touch detection.

[0121] For example, as Figure 1 shown, the non-display area 12 further includes a bonding area 15. Bonding terminals are provided in the bonding area 15 for bonding a driving chip or an external circuit (such as a flexible circuit board, etc.). The first touch signal line 631 and the second touch signal line 632 can extend to the bonding area 15 to be connected to the bonding terminals therein.

[0122] In at least one embodiment of the present disclosure, as Figure 12 and Figures 13A to 13C shown, the first touch electrode 610 includes a plurality of first touch electrode blocks 611 spaced apart from each other and a plurality of first connection portions 612. Each of the first touch electrode blocks 611 of the first touch electrode 610 is connected by the first connection portions 612. The second touch electrode 620 includes a plurality of second touch electrode blocks 621 spaced apart from each other and a plurality of second connection portions 622. Each of the second touch electrode blocks 621 of the second touch electrode 620 is connected by the second connection portions 622. The first connection portions 612 and the second connection portions 622 cross each other.

[0123] For example, the first touch electrode 610 and the second touch electrode blocks 621 are of the same layer and the same material. The second connection portions 622 and the second touch electrode blocks 621 are located in different layers, and the second connection portions 622 are conductive bridges.

[0124] For example, the touch traces 630 can be of a single-layer design or can be of a double-layer design. For example, in the case of a single-layer design, the touch traces 630 can be of the same layer and the same material as one of the first touch electrodes 610 and the second connection portions 622; in the case of a double-layer design, one layer of the touch traces 630 can be of the same layer and the same material as the first touch electrodes 610, and the other layer thereof can be of the same layer and the same material as the second connection portions 622. In this way, the touch traces 630 can be formed by the parallel connection of double-layer wires to reduce the voltage drop generated thereon.

[0125] At least one embodiment of the present disclosure provides a method for manufacturing a display panel. The manufacturing method may include steps S110 to S130 as Figure 14 shown, specifically as follows.

[0126] S110. Provide a substrate, divide the substrate into a display area and a non-display area surrounding the display area, where the non-display area includes a transition area adjacent to the display area, and the transition area includes a positioning area.

[0127] S120. Form a plurality of first electrodes on the substrate, with at least part of the first electrodes formed in the transition area.

[0128] S130. Form an isolation structure with a plurality of isolation openings on the substrate. At least part of the isolation structure is formed in the transition area, and the isolation openings respectively correspond to at least part of the first electrodes. The first electrodes are distributed in the positioning area. The orthographic projection of the isolation structure on the substrate is located outside the orthographic projection of the positioning area on the substrate, and the light reflectivity of the first electrodes is different from that of the isolation structure.

[0129] In the display panel prepared in steps S110 to S130, the isolation structure extends into the transition area, thereby acting as a shielding layer to avoid signal interference in the transition area. In addition, the isolation structure is not distributed in the positioning area. Therefore, the light reflectivity in the positioning area is mainly determined by the first electrodes. Thus, compared with the design where the isolation structure is distributed in the positioning area, the light reflectivity difference between the positioning area and other areas of the transition area can be increased, thereby improving the alignment accuracy of the display panel. For the structure of the display panel obtained by this preparation method, reference can be made to the relevant descriptions in the foregoing embodiments, which will not be elaborated here.

[0130] The preparation method provided by at least one embodiment of the present disclosure may further include steps S140 to S190 as shown in Figure 15 below, specifically as follows.

[0131] S140. After forming the isolation structure, deposit a light-emitting functional material and an electrode material to respectively form a light-emitting functional structure layer and a second electrode structure layer.

[0132] S150. Deposit a first insulating material film layer to form a first encapsulation structure layer.

[0133] S160. Form a photoresist layer on the first encapsulation structure layer, and perform patterning on the photoresist layer to form a photoresist pattern, where the photoresist pattern covers part of the isolation openings.

[0134] S170. Etch the first encapsulation structure layer, the second electrode structure layer, and the light-emitting functional structure layer based on the photoresist pattern, removing the portions of the first encapsulation structure layer, the second electrode structure layer, and the light-emitting functional structure layer that are not covered by the photoresist pattern. The remaining portions of the first encapsulation structure layer, the second electrode structure layer, and the light-emitting functional structure layer respectively form an encapsulation unit, a second electrode, and a light-emitting functional layer. In the display area, the first electrode, the light-emitting functional layer, and the second electrode stacked in each isolation opening constitute a display light-emitting device. In the transition area, the first electrode, the light-emitting functional layer, and the second electrode stacked in each isolation opening constitute a dummy light-emitting device;

[0135] S180. Remove the remaining photoresist pattern.

[0136] S190. Repeat the above steps to form a light-emitting functional layer, a second electrode, and an encapsulation unit at the remaining isolation openings, where the light-emitting colors of the light-emitting functional layers formed in different processes are different, and all the encapsulation units constitute the first encapsulation layer.

[0137] Regarding the structure of the display panel obtained from the above steps S110 to S190, the technical problems solved, the corresponding technical effects, and possible further improvements, reference can be made to the relevant descriptions in the foregoing embodiments, which will not be elaborated here.

[0138] In at least one embodiment of the present disclosure, the manufacturing method may further include: depositing a pixel defining material film layer on the substrate after forming the first electrode and before forming the isolation structure; after forming the isolation structure, performing a patterning process on the pixel defining material film layer to form a plurality of pixel openings in the pixel defining layer, where at least some of the isolation openings correspond to the pixel openings respectively, and the corresponding pixel openings and isolation openings communicate with each other. Regarding the structure of the display panel obtained by this manufacturing method, reference can be made to the relevant descriptions in the foregoing embodiments, which will not be elaborated here.

[0139] In the manufacturing method of the display panel provided in some embodiments of the present disclosure, the pixel openings are distributed in the display area and the transition area, the pixel defining layer is located between the first electrode and the isolation structure, and the orthographic projection of the pixel opening on the substrate is located within the orthographic projection of the first electrode on the substrate. Regarding the structure of the display panel obtained by this manufacturing method, reference can be made to the relevant descriptions in the foregoing Figures 3 to 5 related embodiments, which will not be elaborated here.

[0140] In the method for manufacturing a display panel provided in some other embodiments of the present disclosure, the pixel opening is located in the display area. In the display area, the pixel openings and the isolation openings correspond one by one. In the transition area, the pixel defining layer is located between the first electrode and the isolation structure. The orthographic projection of the isolation opening on the substrate is located within the orthographic projection of the pixel defining layer on the substrate. In the transition area and outside the positioning area, the orthographic projection of the first electrode on the substrate is located within the orthographic projection of the pixel defining layer on the substrate. In the display area, the pixel defining layer is located between the first electrode and the isolation structure, and the orthographic projection of the pixel opening on the substrate is located within the orthographic projection of the first electrode on the substrate. For the structure of the display panel obtained by this manufacturing method, reference may be made to the relevant descriptions in the foregoing Figure 8 related embodiments, which will not be elaborated herein.

[0141] Next, in conjunction with Figures 16A to 16I with Figures 3 to 5 the manufacturing process of the display panel shown (directly showing the structure shown Figure 4 is described to visually demonstrate the manufacturing method of the display panel and the principle that the isolation structure can increase the pixel arrangement density PPI.

[0142] As Figure 16A shown, a substrate 100 is provided and a first electrode 210 arranged in an array is formed on the substrate 100.

[0143] As Figure 16B shown, a pixel defining material film layer 400a is deposited on the substrate 100 on which the first electrode 210 is formed.

[0144] As Figure 16C shown, a first material layer 310a and a second material layer 320a are formed on the pixel defining material film layer 400a. For example, the material of the first material layer 310a can be aluminum, and the material of the second material layer 320a can be titanium.

[0145] As Figure 16D shown, a patterning process is performed on the first material layer 310a and the second material layer 320a so that the first material layer 310a is formed into a support portion 310, and the second material layer 320a is formed into a crown portion 320. The support portion 310 and the crown portion 320 define the isolation opening 301 and constitute the isolation structure 300. For the specific structure of the isolation structure 300, reference may be made to the relevant descriptions in the foregoing embodiments, which will not be elaborated herein.

[0146] In an embodiment of the present disclosure, the patterning process may be a photolithography patterning process, which may include, for example: coating a photoresist on a structural layer to be patterned, exposing the photoresist using a mask, developing the exposed photoresist to obtain a photoresist pattern, etching the structural layer using the photoresist pattern (optionally wet etching or dry etching), and then optionally removing the photoresist pattern. It should be noted that when the material of the structural layer (such as the following photoresist pattern 700) includes a photoresist, the structural layer can be directly exposed through a mask to form a required pattern.

[0147] It should be noted that if the corrosion resistance of the second material layer 320a (such as titanium) is greater than that of the first material layer 310a (such as aluminum), the etching rate of the first material layer 310a will be greater than that of the second material layer 320a, so that the width of the crown portion 320 will be greater than the width of the support portion 310 to form a structure as Figure 16D shown.

[0148] As Figure 16E shown, a patterning process is performed on the pixel defining material film layer 400a to form pixel openings 401 at positions where some of the isolation openings 301 are located, and the pixel defining material film layer 400a is formed into a pixel defining layer 400 (non-final form). In this way, in this process, the pixel defining layer 400 still exists at the partial isolation openings 301 to protect the underlying first electrode 210 in the subsequent etching process.

[0149] It should be noted that in the Figure 16E corresponding process, it is also possible to choose to form all the pixel openings 401 of the corresponding final product at one time, thereby simplifying the manufacturing process flow of the display panel.

[0150] It should be noted that in the steps as Figure 16E shown, a photolithography patterning process can be used to form the pixel openings 401. In this process, the isolation structure 300 can also be used to expose the photoresist, thereby precisely controlling the formation position of the pixel openings 401.

[0151] As Figure 16F shown, a light-emitting functional material and an electrode material are evaporated on the substrate 100 to form light-emitting devices 200 in each of the isolation openings 301 of the isolation structure 300. In this process, no mask is used for evaporation, so the evaporated material will also be deposited on the crown portion 320. It should be noted that in the actual process, the evaporated material will be deposited on the upper surface of the crown portion 320 facing away from the substrate 100 and the side walls (not shown in the figure); then a first encapsulation film 510a is deposited to cover the light-emitting devices 200 and the isolation structure 300. All the light-emitting devices 200 formed in this process emit blue light B.

[0152] It should be noted that at the position where the isolation opening 301 is formed but the pixel opening 401 is not formed, the light-emitting functional layer 220 and the first electrode 210 are spaced apart. Therefore, the light-emitting functional layer 220 and the first electrode 210 of the light-emitting device 200 at this position are separated from each other and do not have the light-emitting function. If this structure is retained (in the transition region), a display panel as shown in Figure 8 can be formed.

[0153] As shown in Figure 16G , a photoresist is formed (such as by coating etc.) on the substrate 100 on which the first encapsulation film 510a is formed, and then a patterning process is performed on it to form a photoresist pattern 700. The photoresist pattern 700 only covers a part of the isolation openings 301 of the isolation structure 300 (the isolation openings 301 corresponding to the pixel openings 401).

[0154] As shown in Figure 16H , using the photoresist pattern 700 as a mask, the surface of the display panel is etched to remove the first encapsulation film 510a, the electrode material, and the light-emitting functional material that are not covered by the photoresist pattern 700. The remaining part of the first encapsulation film 510a forms the encapsulation unit 511 of the first encapsulation layer 410; then the remaining photoresist pattern 700 is removed.

[0155] As shown in Figure 16I , a patterning process is performed on the pixel defining layer 400 to form pixel openings 401 at the positions where the other part of the isolation openings 301 are located (where pixel openings 401 are not formed at these positions).

[0156] Repeat the above Figures 16E to 16H steps to respectively form light-emitting devices 200 that emit red light R and light-emitting devices 200 that emit green light G in other isolation openings 301, and form a display panel as shown in Figure 4 .

[0157] At least one embodiment of the present disclosure provides a display device, which is the display panel mentioned in any of the above embodiments or the display panel obtained by the manufacturing method mentioned in any of the above embodiments.

[0158] As shown in Figure 17 , the display device provided by at least one embodiment of the present disclosure may further include a cover plate 800. The cover plate 800 is located on the side of the isolation structure 300 away from the substrate 100 and covers the display area and the non-display area of the display panel. During the process of aligning the display panel and the cover plate 800, the aligning device can determine the edge position of the display panel based on the positioning area of the display panel to achieve precise positioning.

[0159] For example, the display device may be any product or component with a display function, such as a television, digital camera, mobile phone, watch, tablet computer, laptop computer, navigator, etc.

[0160] For such understanding, various forms of processes shown above can be used to reorder, add or delete steps. For example, the steps described in the present invention can be executed in parallel, sequentially or in a different order, as long as the desired results of the technical solution of the present invention can be achieved, and no limitation is made herein.

[0161] The above specific embodiments do not constitute a limitation on the protection scope of the present invention. Those skilled in the art should understand that various modifications, combinations, sub - combinations and substitutions can be made according to design requirements and other factors. Any modifications, equivalent substitutions and improvements made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

[0162] The above are only the preferred embodiments of this specification and are not intended to limit this specification. Any modifications, equivalent substitutions, etc. made within the spirit and principle of this specification shall be included within the protection scope of this specification.

Claims

1. A display panel, characterized in that: The display panel has a display area and a non-display area surrounding the display area, wherein the non-display area includes a transition area adjacent to the display area, and the transition area includes a positioning area, wherein the display panel further includes: substrate; A plurality of first electrodes are distributed in an array on the substrate, and at least part of the first electrodes are located in the transition region; an isolation structure, located on the substrate and comprising a plurality of isolation openings, wherein at least a portion of the isolation structure is located in the transition region, and the isolation openings correspond to at least a portion of the first electrodes respectively; The first electrode is distributed in the positioning area, the orthographic projection of the isolation structure on the substrate is located outside the orthographic projection of the positioning area on the substrate, and the reflectivity of the first electrode is different from that of the isolation structure.

2. The display panel according to claim 1, characterized in that: The isolation openings are distributed in the display area and the transition area, the display panel further comprises a light-emitting functional layer and a second electrode respectively located in the isolation openings, the light-emitting functional layer and the second electrode are sequentially stacked on the first electrode, and In the display area, the first electrode, the light-emitting functional layer and the second electrode sequentially stacked at the isolation opening constitute a display light-emitting device, and in the transition area, the first electrode, the light-emitting functional layer and the second electrode sequentially stacked at the isolation opening constitute a dummy light-emitting device; Preferably, the first electrode is a reflective electrode, and the second electrode is a transparent electrode.

3. The display panel according to claim 2, characterized in that: A plurality of the first electrodes are arranged in the positioning area, and an area of ​​any of the first electrodes in the positioning area is equal to an area of ​​the first electrode of at least one of the display light-emitting devices; Preferably, The first electrodes in the positioning area are spaced apart from each other; or The first electrodes in the positioning areas are connected to each other.

4. The display panel according to claim 2 or 3, characterized in that: The isolation structure includes a support portion and a crown portion, wherein the support portion is located between the crown portion and the base plate. An orthographic projection of an end of the support portion facing the crown portion on the base plate is located within an orthographic projection of the crown portion on the base plate.

5. The display panel according to claim 4, characterized in that: The reflectivity of the first electrode is greater than the reflectivity of the crown; Preferably, the first electrode comprises a first film layer and a second film layer, the first film layer comprises a high work function material, the second film layer is located between the first film layer and the substrate, and the reflectivity of the second film layer is greater than the reflectivity of the crown; Preferably, the material of the second film layer includes silver, or the second film layer is a stacked structure consisting of molybdenum, aluminum, molybdenum or titanium, aluminum, and titanium in sequence; Preferably, the material of the crown comprises titanium.

6. The display panel according to claim 4, characterized in that: The support portion is a conductive structure, and the second electrode is connected to a side surface of the support portion; Preferably, the orthographic projection of the end of the support portion facing the crown portion on the base plate is located within the orthographic projection of the end of the support portion facing the base plate on the base plate; Preferably, the orthographic projection of the support portion on the substrate is located within the orthographic projection of the crown portion on the substrate, and the edge of the light-emitting functional layer is spaced from the support portion; Preferably, the isolation structure comprises a bottom, the bottom is located between the support portion and the substrate, and the orthographic projection of the support portion on the substrate is located within the orthographic projection of the support portion on the substrate; Preferably, the orthographic projection of the bottom portion on the substrate is located within the orthographic projection of the crown portion on the substrate.

7. The display panel according to claim 2 or 3, characterized in that: Also included is a pixel defining layer, wherein the pixel defining layer is located between the isolation structure and the substrate and includes a plurality of pixel openings, At least part of the isolation openings correspond to the pixel openings respectively, and the pixel openings corresponding to each other are connected to the isolation openings; Preferably, an orthographic projection of an end portion of the isolation structure facing the substrate on the substrate is located within an orthographic projection of the pixel defining layer on the substrate; Preferably, the pixel defining layer is an inorganic film layer.

8. The display panel according to claim 7, characterized in that: The pixel openings are distributed in the display area and the transition area, and at least part of the pixel openings correspond to the isolation openings one by one; Preferably, at least one of the pixel openings is located in the positioning area and corresponds to the first electrode in the positioning area; Preferably, the pixel defining layer is located between the first electrode and the isolation structure, and the orthographic projection of the pixel opening on the substrate is located within the orthographic projection of the first electrode on the substrate.

9. The display panel according to claim 7, characterized in that: The pixel opening is located in the display area. In the display area, the pixel opening corresponds to the isolation opening one by one. In the transition area, the pixel definition layer is located between the first electrode and the isolation structure. The orthographic projection of the isolation opening on the substrate is located within the orthographic projection of the pixel definition layer on the substrate. Preferably, in the transition region, the orthographic projection of the first electrode on the substrate is located within the orthographic projection of the pixel defining layer on the substrate; Preferably, in the display area, the pixel defining layer is located between the first electrode and the isolation structure, and the orthographic projection of the pixel opening on the substrate is located within the orthographic projection of the first electrode on the substrate.

10. The display panel according to claim 4, characterized in that: It also includes a first packaging layer, wherein the first packaging layer is located on a side of the isolation structure away from the substrate, The first encapsulation layer includes a plurality of encapsulation units, and the encapsulation units correspond to the isolation openings respectively to cover the display light-emitting device and the dummy light-emitting device defined by the isolation openings; Preferably, the edge of the packaging unit extends to the side of the crown away from the substrate, and at least a portion of the packaging unit extending to the side of the crown away from the substrate is spaced from the crown to form a suspended portion.

11. The display panel according to claim 10, characterized in that: The display light-emitting devices and the dummy light-emitting devices are classified into multiple types of light-emitting devices that emit light of different colors, and the packaging units corresponding to the adjacent light-emitting devices that emit light of different colors are spaced apart from each other.

12. The display panel according to claim 10, characterized in that: It also includes a second encapsulation layer and a third encapsulation layer covering and stacking the first encapsulation layer, the second encapsulation layer is located between the first encapsulation layer and the third encapsulation layer, the first encapsulation layer and the third encapsulation layer are inorganic film layers, and the second encapsulation layer is an organic film layer.

13. The display panel according to claim 2 or 3, characterized in that: It also includes a touch structure, wherein the touch structure is located on a side of the isolation structure away from the substrate, and an orthographic projection of a portion of the touch structure on the substrate is located within the transition area and outside the positioning area.

14. The display panel according to claim 13, characterized in that: The touch structure includes a touch electrode structure and a touch trace, the orthographic projection of the touch electrode structure on the substrate is located within the display area, at least part of the orthographic projection of the touch trace on the substrate is located within the transition area, and the orthographic projection of a part of the touch trace overlapping with the transition area on the substrate is located outside the positioning area.

15. The display panel according to claim 14, characterized in that: The touch electrode structure includes a plurality of parallel first touch electrodes and a plurality of parallel second touch electrodes, wherein the first touch electrodes and the second touch electrodes intersect each other. The touch control wiring includes a first touch control signal line and a second touch control signal line, the first touch control signal line is connected to the first touch control electrode, and the second touch control signal line is connected to the second touch control electrode; Preferably, the first touch electrode comprises a plurality of first touch electrode blocks spaced from each other and a plurality of first connecting portions, the first touch electrode blocks of the first touch electrode are connected via the first connecting portions, the second touch electrode comprises a plurality of second touch electrode blocks spaced from each other and a plurality of second connecting portions, the second touch electrode blocks of the second touch electrode are connected via the second connecting portions, and the first connecting portions and the second connecting portions intersect each other; Further preferably, the first touch electrode and the second touch electrode block are in the same layer and made of the same material, the second connecting portion and the second touch electrode block are in different layers, and the second connecting portion is a conductive bridge.

16. A method for preparing a display panel, characterized in that: include: Providing a substrate, dividing a display area and a non-display area surrounding the display area, wherein the non-display area includes a transition area adjacent to the display area, and the transition area includes a positioning area; forming a plurality of first electrodes on the substrate, wherein at least part of the first electrodes are formed in the transition region; forming an isolation structure having a plurality of isolation openings on the substrate, wherein at least a portion of the isolation structure is formed in the transition region, and the isolation openings correspond to at least a portion of the first electrodes respectively; The first electrode is distributed in the positioning area, the orthographic projection of the isolation structure on the substrate is located outside the orthographic projection of the positioning area on the substrate, and the reflectivity of the first electrode is different from that of the isolation structure.

17. The preparation method according to claim 16, characterized in that: Also includes: After forming the isolation structure, depositing a light-emitting functional material and an electrode material to form a light-emitting functional structure layer and a second electrode structure layer respectively; Depositing a first insulating material film layer to form a first packaging structure layer; Forming a photoresist layer on the first packaging structure layer, and patterning the photoresist layer to form a photoresist pattern, wherein the photoresist pattern covers a portion of the isolation opening; Based on the photoresist pattern, the first encapsulation structure layer, the second electrode structure layer and the light-emitting functional structure layer are etched to remove the portions of the first encapsulation structure layer, the second electrode structure layer and the light-emitting functional structure layer that are not covered by the photoresist pattern, and the remaining portions of the first encapsulation structure layer, the second electrode structure layer and the light-emitting functional structure layer respectively form an encapsulation unit, a second electrode and a light-emitting functional layer, in the display area, the first electrode, the light-emitting functional layer and the second electrode stacked in each of the isolation openings constitute a display light-emitting device, and in the transition area, the first electrode, the light-emitting functional layer and the second electrode stacked in each of the isolation openings constitute a dummy light-emitting device; removing the remaining photoresist pattern; Repeat the above steps to form the light-emitting functional layer, the second electrode and the packaging unit at the remaining isolation openings, wherein the light-emitting functional layers formed by different processes have different light emission colors, and all the packaging units constitute a first packaging layer.

18. The preparation method according to claim 16, characterized in that: Also includes: After forming the first electrode and before forming the isolation structure, depositing a pixel definition material film layer on the substrate; as well as After forming the isolation structure, patterning the pixel definition material film layer to form a plurality of pixel openings in the pixel definition layer, wherein at least some of the isolation openings correspond to the pixel openings respectively, and the corresponding pixel openings are connected to the isolation openings; Preferably, The pixel openings are distributed in the display area and the transition area, the pixel defining layer is located between the first electrode and the isolation structure, and the orthographic projection of the pixel opening on the substrate is located within the orthographic projection of the first electrode on the substrate; or The pixel opening is located in the display area, and in the display area, the pixel opening corresponds to the isolation opening one by one, in the transition area, the pixel defining layer is located between the first electrode and the isolation structure, and the orthographic projection of the isolation opening on the substrate is located within the orthographic projection of the pixel defining layer on the substrate, in the transition area, the orthographic projection of the first electrode on the substrate is located within the orthographic projection of the pixel defining layer on the substrate, and in the display area, the pixel defining layer is located between the first electrode and the isolation structure, and the orthographic projection of the pixel opening on the substrate is located within the orthographic projection of the first electrode on the substrate.

19. A display device, characterized in that: A display panel comprising any one of claims 1 to 15 or a display panel obtained by the preparation method of any one of claims 16 to 18.

20. The display device according to claim 19, characterized in that A cover plate is also included, wherein the cover plate is located on a side of the isolation structure away from the substrate and covers the display area and the non-display area of ​​the display panel.

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