Vaporizer pressure monitoring system and vaporizer system

Abstract

The invention provides a vaporizer pressure monitoring system and a vaporizer system. The monitoring system comprises an internal pressure sensor which is arranged on a gas flow path in the vaporizer and is used for detecting the gas pressure in the gas flow path, the third pressure sensor is arranged at the gas output end of the gas flow path and is used for detecting the gas pressure at the gas output end; the monitoring part is used for monitoring the pressure of each part of the vaporizer; and the monitoring part judges whether the vaporizer is abnormal or not according to the pressure detected by the internal pressure sensor and the third pressure sensor. By means of the vaporizer pressure monitoring system, the problems that in an existing vaporizer pressure monitoring system, whether the pressure changes or not can only be indirectly confirmed, leakage or pressure abnormity occurs in the whole line, the accurate position of gas leakage is difficult to master, and the pressure changes of the vaporizer cannot be correctly sensed can be solved.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor device manufacturing, and more particularly, to a vaporizer pressure monitoring system and a vaporizer system. Background Art

[0002] Semiconductor deposition equipment includes, for example, chemical vapor deposition equipment, physical vapor deposition equipment, etc. Chemical vapor deposition includes plasma enhanced chemical vapor deposition (PE-CVD), which is a method for preparing semiconductor thin film materials and other material thin films by performing chemical reactions on a substrate after ionization using glow discharge in a deposition chamber. Since the gas molecules or ions participating in the reaction when preparing materials by PE-CVD need to be deposited on a substrate at a certain temperature according to different processes, generally, PE-CVD equipment is equipped with a vaporizer, and a pressure sensor for measuring the vaporizer is provided on the vaporizer.

[0003] In the prior art, in Figure 1 the illustrated embodiment, only pressure sensors (the first pressure sensor 4 and the second pressure sensor 5) are provided inside the vaporizer. The vaporizer is directly connected to an external gas pipeline (gasline), so as to measure the pressure by confirming the pressure value inside the vaporizer or the pressure value measured by a chamber, that is, the pressure values of the first pressure sensor 4 and the second pressure sensor 5. However, this method performs a single measurement on the entire line of the pressure sensor from the vaporizer to the vicinity of the chamber. It is an indirect confirmation rather than a direct one. Therefore, even if there is a leak or abnormal pressure in the entire line, it is difficult to determine the exact location of the gas leak, so it is difficult to respond in a timely manner. This indirect measurement method is difficult to correctly sense the pressure change, thus restricting the stability and efficiency of the manufacturing process. Summary of the Invention

[0004] Technical Problem

[0005] For this reason, an object of the present invention is to provide a vaporizer pressure monitoring system including an internal pressure sensor provided inside the vaporizer, which can detect the gas pressure in the gas flow path in the gas flow path inside the vaporizer.

[0006] Another object of the present invention is to provide a vaporizer pressure monitoring system including a third sensor provided at the gas output end of the gas flow path, which can detect the pressure between the inside of the vaporizer and the output end outside the vaporizer.

[0007] Another object of the present invention is to provide a vaporizer pressure monitoring system including a monitoring unit for monitoring the pressures of various parts of the vaporizer, which can determine whether there is an abnormality in the vaporizer by monitoring the pressures detected by the internal pressure sensor and the third pressure sensor, so as to determine whether there is a leakage point inside the vaporizer and whether there is a leakage point between the inside of the vaporizer and the output end outside the vaporizer.

[0008] Another object of the present invention is to provide a vaporizer pressure monitoring system including an alarm device, which can give an alarm in time when a problem occurs, so as to quickly sense the leakage or system abnormality and take measures.

[0009] Technical solution

[0010] As an embodiment, the present invention provides a vaporizer pressure monitoring system, including an internal pressure sensor disposed in the gas flow path inside the vaporizer for detecting the gas pressure in the gas flow path, a third pressure sensor disposed at the gas output end of the gas flow path for detecting the gas pressure at the gas output end, and a monitoring unit for monitoring the pressures of various parts of the vaporizer, wherein,

[0011] The monitoring unit determines whether there is an abnormality in the vaporizer based on the pressures detected by the internal pressure sensor and the third pressure sensor.

[0012] In some embodiments, the internal pressure sensor includes a first pressure sensor and a second pressure sensor, the first pressure sensor is disposed at the front end of the gas flow path, and the second pressure sensor is disposed at the rear end of the gas flow path;

[0013] The monitoring unit monitors the pressure change of the gas flow path inside the vaporizer through the first pressure sensor and the second pressure sensor to determine whether there is an abnormality in the gas flow path;

[0014] The monitoring unit monitors the pressure change between the inside of the vaporizer and the output end of the vaporizer through the second pressure sensor and the third pressure sensor to determine whether there is an abnormality between the rear end of the gas flow path and the output end of the vaporizer.

[0015] In some embodiments, the monitoring unit determines whether the pressure difference between the first pressure sensor and the second pressure sensor is above a predetermined first threshold. When the pressure difference between the first pressure sensor and the second pressure sensor is above the predetermined first threshold, it is determined that there is an abnormality in the gas flow path.

[0016] In some embodiments, the monitoring unit determines whether the pressure difference between the second pressure sensor and the third pressure sensor is equal to or greater than a predetermined second threshold, and when the pressure difference between the second pressure sensor and the third pressure sensor is equal to or greater than the predetermined second threshold, determines that there is an abnormality between the rear end of the gas flow path and the output end of the vaporizer.

[0017] In some embodiments, the second threshold is in the range of 5 psig to 30 psig.

[0018] In some embodiments, a fourth pressure sensor is provided on the gas pipeline connected to the output end of the vaporizer to measure the gas pressure of the gas pipeline.

[0019] The monitoring unit determines whether the pressure difference between the third pressure sensor and the fourth pressure sensor is equal to or greater than a predetermined third threshold, and when the pressure difference between the third pressure sensor and the fourth pressure sensor is equal to or greater than the predetermined third threshold, determines that there is an abnormality in the gas pipeline.

[0020] In some embodiments, a piezoelectric valve is provided between the first pressure sensor and the second pressure sensor, and the piezoelectric valve is used to connect the front end and the rear end inside the vaporizer.

[0021] In some embodiments, an alarm device is further included, and when the monitoring unit detects an abnormality in the vaporizer based on the pressure, an alarm is given.

[0022] The present invention further provides a vaporizer system, including:

[0023] A vaporizer, the vaporizer including:

[0024] A vaporizing unit for vaporizing a liquid into a gas; and

[0025] A gas flow path provided inside the vaporizer and connected to the vaporizing unit to convey the vaporized gas;

[0026] A gas pipeline connected to the output end of the gas flow path; and

[0027] The above-mentioned vaporizer pressure monitoring system.

[0028] In some embodiments, the vaporizer further includes a gas shut-off valve for controlling the flow of the gas in the gas flow path to the gas pipeline.

[0029] In some embodiments, the vaporizer further includes a piezoelectric valve provided on the gas flow path, and the internal pressure sensor is provided on at least one of the inlet side and the outlet side of the piezoelectric valve.

[0030] In some embodiments, the vaporizer further includes a thermal sensor for measuring the temperature inside the vaporizer.

[0031] In some embodiments, the vaporizer includes a liquid pipeline for introducing liquid into the vaporization section, and a liquid valve is provided on the liquid pipeline for controlling the flow of the liquid in the liquid pipeline to the vaporization section.

[0032] Beneficial effects

[0033] As can be seen from the above technical solutions, the vaporizer pressure monitoring system and the vaporizer system provided by the present invention have the following beneficial effects compared with the prior art:

[0034] 1) By providing an internal pressure sensor inside the vaporizer, the gas pressure in the gas flow path of the gas flow path inside the vaporizer can be detected.

[0035] 2) By providing a third sensor at the gas output end of the gas flow path, the pressure at the output end inside and outside the vaporizer can be detected.

[0036] 3) By monitoring the pressure detected by the internal pressure sensor and the third pressure sensor by the monitoring unit to determine whether there is an abnormality in the vaporizer, it is possible to determine whether there is a leakage point inside the vaporizer and whether there is a leakage point between the inside of the vaporizer and the output end outside the vaporizer.

[0037] 4) By providing an alarm device, it can give an alarm in time when a problem occurs, so as to quickly sense the leakage or system abnormality and take measures.

[0038] 4) By providing multiple pressure sensors inside and outside the vaporizer, dual internal and external monitoring of the vaporizer is achieved, so as to collect accurate data in the manufacturing process, improve the stability of the system, and maximize the efficiency.

[0039] To achieve the above and related purposes, one or more aspects of the present invention include the features described in detail later. The following description and the accompanying drawings illustrate certain exemplary aspects of the present invention in detail. However, these aspects indicate only some of the various ways in which the principles of the present invention can be used. In addition, the present invention is intended to include all these aspects and their equivalents. BRIEF DESCRIPTION OF THE DRAWINGS

[0040] Figure 1 is a schematic diagram of an existing vaporizer pressure monitoring system.

[0041] Figure 2 is a schematic diagram of a vaporizer system with a vaporizer pressure monitoring system according to an embodiment of the present invention.

[0042] The accompanying reference numerals include:

[0043] 1: Gas tank;

[0044] 2: Preheating device;

[0045] 3: Vaporizer;

[0046] 4: First pressure sensor;

[0047] 5: Second pressure sensor;

[0048] 6: Third pressure sensor;

[0049] 7: Liquid valve;

[0050] 8: Piezoelectric valve;

[0051] 9: Shut-off valve;

[0052] 10: Exhaust system.

[0053] In all the drawings, the same reference numerals indicate similar or corresponding features or functions. Detailed implementation manners

[0054] Next, with reference to the drawings of one or more embodiments of the present invention, one or more embodiments of the present invention will be described in detail. Obviously, these one or more embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative work are also within the scope of protection of the present invention.

[0055] The terms used in the following embodiments are only for the purpose of illustrating or explaining specific embodiments, and are not intended to limit the scope of protection of the present invention. In addition, the singular forms used in the present invention, such as "a", "an", "the", "above-mentioned", "this" and "that", are intended to include plural forms such as "one or more", unless there is a clear contrary indication in the context. It should also be understood that when terms such as "one or more", "at least one", and "more than one" are used in the embodiments of the present invention, they are intended to include the cases of one, two, and at least three.

[0056] In addition, when terms such as "in one embodiment", "in some embodiments", or "in one or more embodiments" are used in the description of the present invention, it is intended that one or more embodiments of the present invention may include specific technical features described in conjunction with that embodiment. Therefore, the appearances of "in one embodiment", "in some embodiments", or "in one or more embodiments" at different places in this specification do not necessarily refer to the same embodiment, but may refer to the same embodiment or different embodiments, unless the specific technical features described in these embodiments cannot be used alone or in combination.

[0057] In addition, in the present invention, when an element is described as "comprising", "including", or "having" another element, it is intended to be an open-ended limitation, that is, in addition to including the other element, the one element may further include other elements. When an element is described as "only comprising", "only including", "only having" another element, or "consisting of" another element, it is intended to be a closed limitation, that is, the one element does not include other elements other than the other element. However, it should be noted that when the term "formed by" another element is used to illustrate the formation relationship between multiple elements, this term is not intended to be a closed limitation, and it should be considered that the other element forms a part of the one element, and the one element may include other elements in addition to the other element.

[0058] It should be understood that when ordinal terms such as "first" and "second" are used to describe each element herein, these ordinal terms are only used to distinguish one element from another, and the terms such as "first" and "second" should not imply meanings such as primary-secondary relationship or sequence relationship. Without departing from the scope of the present invention, the first element may be labeled as the second element, and the second element may also be labeled as the first element.

[0059] In the present invention, when terms such as "on", "under", or "between" are used to describe the positional relationship between two or more elements, it means that one or more other elements may be further provided between the two or more elements, unless terms such as "exactly" or "adjacently" are used.

[0060] Hereinafter, one or more embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art can clearly and completely understand the present invention. When the description of well-known structures or features will unnecessarily obscure the gist of the present invention, the description of these well-known structures or features will be omitted.

[0061] Regarding the problem that in the existing vaporizer pressure monitoring system mentioned above, only the change in pressure can be indirectly confirmed. Even if there is a leak or abnormal pressure in the overall circuit, it is difficult to grasp the exact location of the gas leak, resulting in the inability to correctly sense the pressure change of the vaporizer. Therefore, to solve this problem, the present invention proposes a vaporizer pressure monitoring system and a vaporizer system.

[0062] The following will describe the specific embodiments of the present invention in detail with reference to the accompanying drawings.

[0063] To illustrate the structure of the vaporizer pressure monitoring system provided by the present invention, as Figure 2 shown, the vaporizer pressure monitoring system provided by the present invention includes an internal pressure sensor disposed in the gas flow path inside the vaporizer 3 to detect the gas pressure in the gas flow path, a third pressure sensor 6 disposed at the gas output end of the gas flow path to detect the gas pressure at the gas output end, and a monitoring unit for monitoring the pressure of each part of the vaporizer. Among them, the monitoring unit determines whether there is an abnormality in the vaporizer based on the pressures detected by the internal pressure sensor and the third pressure sensor 6.

[0064] Specifically, the internal pressure sensor includes a first pressure sensor 4 and a second pressure sensor 5. Among them, the first pressure sensor 4 is disposed at the front end of the gas flow path, and the second pressure sensor 5 is disposed at the rear end of the gas flow path; the monitoring unit monitors the pressure change of the gas flow path inside the vaporizer 3 through the first pressure sensor 4 and the second pressure sensor 5; the monitoring unit monitors the pressure change between the inside of the vaporizer 3 and the output end of the vaporizer 3 through the second pressure sensor 5 and the third pressure sensor 6 to determine whether there is an abnormality between the rear end of the gas flow path and the output end of the vaporizer.

[0065] In an embodiment of the present invention, the monitoring unit determines whether the pressure difference between the first pressure sensor and the second pressure sensor is above a predetermined first threshold. When the pressure difference between the first pressure sensor and the second pressure sensor is above the predetermined first threshold, it is determined that there is an abnormality in the gas flow path. That is to say, the monitoring unit monitors the pressure change of the gas flow path inside the vaporizer by monitoring the pressure difference between the first pressure sensor 4 and the second pressure sensor 5. According to the relationship between the pressure difference between the first pressure sensor 4 and the second pressure sensor 5 and the predetermined first threshold, it is determined whether there is a leakage point in the gas flow path inside the vaporizer. If the pressure difference between the first pressure sensor 4 and the second pressure sensor 5 is less than the predetermined first threshold, then there is no leakage in the gas flow path inside the vaporizer; if the pressure difference between the first pressure sensor 4 and the second pressure sensor 5 is greater than the predetermined first threshold, then there is already a leakage in the gas flow path inside the vaporizer.

[0066] In an embodiment of the present invention, the monitoring unit determines whether the pressure difference between the second pressure sensor 5 and the third pressure sensor 6 is above a predetermined second threshold, and when the pressure difference between the second pressure sensor 5 and the third pressure sensor 6 is above the predetermined second threshold, it is determined that there is an abnormality between the rear end of the gas flow path and the output end of the vaporizer.

[0067] Wherein, the gas output end of the vaporizer is connected to the gas pipeline. The pressure change between the rear end of the gas flow path of the vaporizer and the output end of the vaporizer is monitored by the pressure difference between the second pressure sensor 5 and the third pressure sensor 6, that is, it is detected whether the pressure flowing from the rear end of the vaporizer to the gas pipeline changes, and whether there is a leakage point in this process is determined according to the change range of the pressure.

[0068] Wherein, the pressure of the third pressure sensor 6 is less than the pressure of the second pressure sensor 5. In an application, according to the second threshold of the pressure difference between the second pressure sensor 5 and the third pressure sensor 6, it is determined whether there is a gas leakage between the rear end of the gas flow path of the vaporizer and the output end of the vaporizer. If the pressure difference between the second pressure sensor 5 and the third pressure sensor 6 is less than or within the second threshold range, there is no gas leakage between the rear end of the gas flow path of the vaporizer and the output end of the vaporizer. If the pressure difference between the second pressure sensor 5 and the third pressure sensor 6 is greater than the second threshold range, there must be a gas leakage between the rear end of the gas flow path and the output end of the vaporizer.

[0069] Among them, the second threshold is 5 psig to 30 psig. When the pressure difference between the third pressure sensor 6 and the second pressure sensor 5 is greater than 5 psig to 30 psig, gas leakage occurs between the rear end of the gas flow path and the output end of the vaporizer.

[0070] In addition, in an embodiment of the present invention, a fourth pressure sensor is provided on the gas pipeline connected to the output end of the vaporizer to measure the gas pressure of the gas pipeline. The monitoring unit determines whether the pressure difference between the third pressure sensor 6 and the fourth pressure sensor is above a predetermined third threshold, and when the pressure difference between the third pressure sensor and the fourth pressure sensor is above the predetermined third threshold, it is determined that there is an abnormality in the gas pipeline.

[0071] In an embodiment of the present invention, when gas leakage occurs between the rear end of the gas flow path and the output end of the vaporizer, in order to make corresponding processing as soon as possible, an alarm device is provided in the vaporizer pressure monitoring system. The alarm device gives an alarm prompt when the pressure difference between the third pressure sensor 6 and the second pressure sensor 5 detected by the monitoring unit is greater than the second threshold.

[0072] In an embodiment of the present invention, through the third pressure sensor provided at the output end of the vaporizer, the pressure value at the output end can be accurately measured, the leakage point or abnormal phenomenon of the vaporizer in the process can be sensed in real time, and an alarm function is added to the pressure sensor, so that measures can be taken in time according to the alarm prompt. This setting method can greatly improve the stability of the vaporizer pressure monitoring system and the service life of the vaporizer. Moreover, measuring the correct pressure value is also helpful for process optimization, which is crucial for manufacturing high-quality products.

[0073] In the present invention, a vaporizer system is also provided, including: a vaporizer, the vaporizer includes a vaporizing part for vaporizing a liquid into a gas; a gas flow path provided inside the vaporizer and connected to the vaporizing part to convey the vaporized gas; a gas pipeline connected to the output end of the gas flow path; and the above-mentioned vaporizer pressure monitoring system.

[0074] Among them, the vaporizer further includes a gas shut-off valve 9 for controlling the flow of gas in the gas flow path to the gas pipeline.

[0075] The vaporizer further includes a piezoelectric valve 8 disposed on the gas flow path, and the internal pressure sensor is disposed on at least one of the inlet side and the outlet side of the piezoelectric valve 8. The piezoelectric valve 8 is a two-position (or proportional) control valve made based on the principle that a functional ceramic sheet generates bending deformation under the action of voltage. Controlling the piezoelectric valve only requires providing sufficient voltage, and the power consumption is almost zero. The piezoelectric valve acts as a pilot valve in the E / P conversion unit. Two piezoelectric valves are applied to each E / P conversion unit. Since the piezoelectric valve has too little pilot pressure and does not have the ability to generate air flow, pressurization must be carried out. Its operating principle: In the initial state (non-powered) of the piezoelectric valve, the functional ceramic sheet acts on the first nozzle orifice. At this time, the second nozzle orifice and the third nozzle orifice are communicated with the pilot chamber to form a whole. When the piezoelectric valve is powered on, the functional ceramic sheet deforms and warps upward, pressing the third nozzle orifice, so that the second nozzle orifice is communicated with the first nozzle orifice.

[0076] Wherein, a thermal sensor is disposed inside the vaporizer, and the thermal sensor is used to measure the temperature inside the vaporizer. The thermal sensor is a conversion device that converts temperature into an electrical signal. In the present invention, the thermal sensor is used to detect the ambient temperature inside the vaporizer 3 and is used as a temperature control switch.

[0077] Wherein, the vaporizer further includes a liquid pipeline for introducing liquid into the vaporization part, and a liquid valve 7 for controlling the flow of the liquid in the liquid pipeline into the vaporization part is disposed on the liquid pipeline.

[0078] In addition, an exhaust system 10 is further disposed on the gas tank 1, and the exhaust system 10 is used to discharge the waste gas generated inside the vaporizer 2.

[0079] In Figure 2 In the illustrated embodiment, the liquid enters the gas tank 1, and the liquid enters the preheating device 2 in the vaporizer 3 through the liquid valve 7 to preheat the liquid, thereby forming gas. The front-end pressure inside the vaporizer of the formed gas is measured by the first pressure sensor 4. The gas passes through the piezoelectric valve 8 and enters the rear end inside the vaporizer, and the gas pressure at the rear end inside the vaporizer is measured by the second pressure sensor 5; the gas at the rear end inside the vaporizer passes through the stop valve 9 and the output end and enters the gas pipeline, and the gas pressure of the gas passing through the output end is tested by the third pressure sensor.

[0080] The vaporizer pressure monitoring system of the present invention can optimize the pressure monitoring systems of various semiconductor process equipment, but is not limited thereto. This pressure monitoring system can also be used in other mechanical equipment fields that require optimizing the pressure monitoring system.

[0081] In one or some embodiments of the present invention, the present invention further provides a semiconductor device, such as a plasma enhanced chemical vapor deposition (not shown) device, which may include the above vaporizer pressure monitoring system, and monitor whether there are abnormalities in the vaporizer and gas pipelines. Hereinafter, the parts that are repeated with the above content are omitted, and the same applies here. The semiconductor device may be a semiconductor processing device or a semiconductor manufacturing device, for example, a semiconductor deposition device, a semiconductor etching device, a semiconductor cleaning device, a lithography machine, a thinning machine, a dicing machine, a testing machine, a sorting machine, a probe machine, etc. The present invention is not limited thereto, as long as it can optimize the pressure monitoring system, it can be applied.

[0082] The embodiments of the present invention have been described above, but this is only for helping to comprehensively understand the present invention. The present invention is not limited thereto, and those skilled in the art can make various modifications and deformations from these descriptions. Therefore, the technical idea of the present invention is not limited to the above embodiments, and the appended claims and their equivalent or equivalent deformations all belong to the scope of the present invention.

Claims

1. A vaporizer pressure monitoring system, characterized in that, An internal pressure sensor that is disposed inside a vaporizer and detects the gas pressure in the gas flow path, a third pressure sensor that is disposed at the gas output end of the gas flow path and detects the gas pressure at the gas output end, and a monitoring unit that monitors the pressures of various parts of the vaporizer, wherein, the monitoring unit determines whether there is an abnormality in the vaporizer based on the pressures detected by the internal pressure sensor and the third pressure sensor.

2. The vaporizer pressure monitoring system according to claim 1, characterized in that, The internal pressure sensor includes a first pressure sensor and a second pressure sensor. The first pressure sensor is disposed at the front end of the gas flow path, and the second pressure sensor is disposed at the rear end of the gas flow path; the monitoring unit monitors the pressure change of the gas flow path inside the vaporizer through the first pressure sensor and the second pressure sensor, and determines whether there is an abnormality in the gas flow path; the monitoring unit monitors the pressure change between the inside of the vaporizer and the output end of the vaporizer through the second pressure sensor and the third pressure sensor, and determines whether there is an abnormality between the rear end of the gas flow path and the output end of the vaporizer.

3. The vaporizer pressure monitoring system according to claim 2, characterized in that, The monitoring unit determines whether the pressure difference between the first pressure sensor and the second pressure sensor is equal to or greater than a predetermined first threshold value. When the pressure difference between the first pressure sensor and the second pressure sensor is equal to or greater than the predetermined first threshold value, it is determined that there is an abnormality in the gas flow path.

4. The vaporizer pressure monitoring system according to claim 2, characterized in that, The monitoring unit determines whether the pressure difference between the second pressure sensor and the third pressure sensor is equal to or greater than a predetermined second threshold value, and when the pressure difference between the second pressure sensor and the third pressure sensor is equal to or greater than the predetermined second threshold value, it is determined that there is an abnormality between the rear end of the gas flow path and the output end of the vaporizer.

5. The vaporizer pressure monitoring system according to claim 4, characterized in that, The second threshold value is in the range of 5 psig to 30 psig.

6. The vaporizer pressure monitoring system according to claim 1, characterized in that, It further includes: a fourth pressure sensor that is disposed on a gas pipeline connected to the output end of the vaporizer and measures the gas pressure of the gas pipeline, the monitoring unit determines whether the pressure difference between the third pressure sensor and the fourth pressure sensor is equal to or greater than a predetermined third threshold value, and when the pressure difference between the third pressure sensor and the fourth pressure sensor is equal to or greater than the predetermined third threshold value, it is determined that there is an abnormality in the gas pipeline.

7. The vaporizer pressure monitoring system according to claim 1, characterized in that, It further includes an alarm device that gives an alarm when the monitoring unit determines that there is an abnormality in the vaporizer based on the detected pressure.

8. A vaporizer system, comprising: A vaporizer, the vaporizer includes: a vaporization unit for vaporizing a liquid into a gas; and a gas flow path that is disposed inside the vaporizer and connected to the vaporization unit to convey the vaporized gas; a gas pipeline connected to the output end of the gas flow path; and the vaporizer pressure monitoring system according to any one of claims 1 to 7.

9. The vaporizer system according to claim 8, characterized in that, The vaporizer further includes a gas shut-off valve for controlling the flow of gas in the gas flow path to the gas pipeline.

10. The vaporizer system according to claim 8, characterized in that, The vaporizer further includes a piezoelectric valve disposed on the gas flow path, and the internal pressure sensor is disposed on at least one of the inlet side and the outlet side of the piezoelectric valve.

11. The vaporizer system according to claim 8, characterized in that, The vaporizer further includes a thermal sensor for measuring the temperature inside the vaporizer.

12. The vaporizer system according to claim 8, characterized in that, The vaporizer further includes a liquid pipe for introducing liquid into the vaporizing section, and a liquid valve for controlling the flow of the liquid in the liquid pipe to the vaporizing section is provided on the liquid pipe.

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