A nickel plate electroplating forming pool for light guide plates

Abstract

This application discloses a nickel plate electroplating forming cell for light guide plates, relating to the technical field of light guide plate processing, comprising a cell body, an electroplating device, and an auxiliary device; the cell body has an electroplating tank filled with electroplating solution; the electroplating device includes an electrolytic assembly and a clamping assembly, and the auxiliary device includes a screen; the screen divides the electroplating tank and has multiple mesh holes evenly distributed on the screen; the electrolytic assembly and the clamping assembly are respectively located on either side of the screen, and multiple electrolytic rods of the electrolytic assembly are immersed in the electroplating solution. The light guide plate is clamped on the clamping assembly and then immersed in the electroplating solution; the multiple mesh holes on the screen are aligned with the concave and lattice structure on the light guide plate. This application can effectively improve the preparation quality of nickel plates, reduce costs, and improve efficiency, thereby effectively improving the uniformity of the concave or lattice results obtained after hot pressing of the light guide plate, thereby ensuring the optical performance of the light guide plate.

Description

Technical Field

[0001] The present application relates to the technical field of light guide plate processing, and in particular to a nickel plate electroplating forming pool for light guide plates. Background Art

[0002] A light guide plate is an optical element used to convert a point light source or a line light source into a uniform surface light source. Its surface is usually designed with tiny pits or dots to achieve uniform diffusion of light. It is widely used in liquid crystal display (LCD) backlight modules, lighting equipment and other fields.

[0003] The concave or lattice structure on the surface of a light guide plate is typically formed using hot pressing. However, due to the poor uniformity of conventional hot pressing plates, this can easily lead to an uneven structure of concave or lattice points on the surface of the light guide plate, which in turn affects its optical performance. In recent years, with the rapid development of display technology, the requirements for the precision of the surface structure of light guide plates have become increasingly stringent. Traditional hot pressing plates have been unable to meet the high precision and high uniformity requirements.

[0004] Currently, the hot-pressed parts used for hot pressing the surface of light guide plates are usually nickel plates, and common nickel plate preparation technologies mostly use mechanical processing or chemical deposition methods. However, these methods have problems such as high cost, low efficiency, and insufficient uniformity, which limit their application in hot pressing treatment of light guide plates. Summary of the Invention

[0005] The present application provides a nickel plate electroplating forming pool for light guide plates, which can effectively improve the preparation quality of the nickel plate, reduce costs and improve efficiency, thereby effectively improving the uniformity of the pits or dots obtained after hot pressing treatment of the light guide plate to ensure the optical performance of the light guide plate.

[0006] The present application provides a nickel plate electroplating forming pool for light guide plates, which adopts the following technical solutions:

[0007] A nickel plate electroplating forming cell for a light guide plate, comprising a cell body, an electroplating device and an auxiliary device;

[0008] The interior of the cell body is provided with an electroplating tank with an upward opening, and the electroplating solution is contained in the electroplating tank;

[0009] The electroplating device includes an electrolytic component for electrolyzing the electroplating solution and a clamping component for clamping the light guide plate, and the auxiliary device includes a screen plate;

[0010] The mesh plate is arranged on the cell body and separates the electroplating tanks, and a plurality of mesh holes are evenly distributed on the mesh plate, and the two ends of the mesh holes are respectively connected to the apertures on both sides of the mesh plate;

[0011] The electrolytic assembly and the clamping assembly are both arranged on the cell body and are respectively located on both sides of the screen. The multiple electrolytic rods of the electrolytic assembly are all located in the electroplating tank and immersed in the electroplating solution. The light guide plate is clamped on the clamping assembly and then immersed in the electroplating solution.

[0012] The plurality of mesh holes on the mesh plate are aligned with the concave and lattice structures on the light guide plate clamped by the clamping assembly along their own opening direction.

[0013] By adopting the above technical solution, the nickel precipitated after the electrolytic component electrolyzes the plating solution can flow with the plating solution through the mesh of the stencil to the surface of the light guide plate, so that the nickel can be evenly adsorbed on the concave points of the light guide plate to form a nickel plate of a certain thickness. After that, the nickel plate is peeled off from the light guide plate to obtain a hot-pressed part with better hot pressing effect; the preparation quality of the nickel plate is effectively improved, the cost is reduced and the efficiency is improved, thereby effectively improving the uniformity of the concave points or points obtained after the hot pressing treatment of the light guide plate, so as to ensure the optical performance of the light guide plate.

[0014] Optionally, a stirring device is further included, and the stirring device includes a lifting component and a plurality of flow-pushing components;

[0015] The lifting assembly includes a lifting frame and a driving member; the lifting frame is movably connected to the pool body along the vertical direction, and the driving member is used to drive the lifting frame to move;

[0016] The push-flow assembly is located in the electroplating tank and on the side of the electrolytic rod away from the mesh plate, and includes a seat body and a plurality of push-flow blades; the seat body is arranged on the lifting frame, and the push-flow blades are rotatably connected to the seat body and the rotation axis is parallel to the opening direction of the mesh hole; the push-flow blades are arranged at an angle, and during the rotation of the push-flow blades relative to the seat body, the electroplating liquid is driven to flow toward the direction close to the mesh plate.

[0017] By adopting the above technical solution, the uniformity of the electroplating solution can be improved to ensure the electrolysis effect and efficiency of the electrolytic component on the electroplating solution; at the same time, it can facilitate the nickel obtained after the electrolysis of the electroplating solution to move through the mesh plate with the electroplating solution to form a nickel plate on the light guide plate.

[0018] Optionally, the flow-pushing assembly further includes a driving blade and a driving structure;

[0019] The driving blades are rotatably connected to the seat body, and are inclined relative to the moving direction of the lifting frame when they are rotated to the extreme position relative to the seat body; the driving structure is arranged inside the seat body, and the driving blades rotate with the movement of the lifting frame. The rotation of the driving blades drives the multiple thrust blades to rotate through the driving structure.

[0020] By adopting the above technical solution, during the movement of the lifting frame, the driving blades will rotate relative to the base body due to the resistance of the electroplating liquid, thereby driving the multiple flow-pushing blades to rotate through the driving structure to drive the electroplating liquid to flow through the mesh plate, thereby improving the uniformity of the electroplating liquid around the electrolytic rod and effectively improving the efficiency and effect of forming the nickel plate on the surface of the light guide plate.

[0021] Optionally, the driving structure drives the plurality of push flow blades to have different rotational speeds, and the rotational speeds of the plurality of push flow blades decrease one by one as they approach the driving blade.

[0022] By adopting the above technical solution, the uniformity of the plating solution around the electrolytic rod can be further improved, and the effect and efficiency of the flow-pushing component in driving the plating solution to flow through the mesh plate to the surface of the light guide plate can be improved.

[0023] Optionally, a plurality of clearance holes are provided on the push flow blade in a direction perpendicular to the rotation axis thereof, and the clearance holes allow the plating solution to flow.

[0024] By adopting the above technical solution, the resistance of the electroplating liquid encountered by the propelling blades during their rotation relative to the seat body can be effectively reduced, thereby further improving the propelling effect of the propelling assembly.

[0025] Optionally, the stirring device further includes four disturbance components, and the four disturbance components are respectively located on both sides of the screen and close to both sides of the electroplating tank.

[0026] By adopting the above technical solution, the influence of the disturbance component on the flow-pushing effect of the flow-pushing component can be effectively reduced, while the uniformity of the electroplating solution in the electroplating tank can be further improved.

[0027] Optionally, the disturbance assembly includes a body, a rotating rod and a disturbance member;

[0028] The body is mounted on the lifting frame; one end of the rotating rod is rotatably connected to the body, and its rotation axis is parallel to the direction in which the meshes are opened; the disturbing member is disposed at one end of the rotating rod away from the body, and a plurality of flexible and elastic disturbing bars extending outward from the surface of the disturbing member are configured to contact the wall of the electroplating tank;

[0029] During the downward movement of the lifting frame, the disturbing member contacts the bottom wall of the electroplating tank and drives the rotating rod to rotate, so that the disturbing member moves along the bottom wall of the electroplating tank.

[0030] By adopting the above-mentioned technical solution, the effect of the disturbance component in improving the uniformity of the electroplating solution can be further improved, and at the same time, the probability of nickel obtained by electrolysis of the electroplating solution adhering to the wall of the electroplating tank can be reduced, thereby further improving the effect and efficiency of nickel adsorbed on the light guide plate to obtain a nickel plate.

[0031] Optionally, the disturbance component further includes a movable part, a floating part and a linkage structure;

[0032] The movable member is movably connected to the body in a vertical direction, and one end of the rotating rod is rotatably connected to the movable member;

[0033] The floating member is movably arranged on the body in a vertical direction, and the linkage structure is arranged inside the body and is used to link the movable member and the floating member;

[0034] During the upward movement of the floating member, the movable member is driven to move downward by the linkage structure.

[0035] By adopting the above technical solution, during the movement of the lifting frame, the floating part can drive the movable part to move in a certain direction through the linkage structure, thereby further improving the effect of the disturbing part on improving the uniformity of the electroplating solution and reducing the probability of nickel obtained by electrolysis of the electroplating solution adhering to the wall of the electroplating tank.

[0036] Optionally, the disturbance member is rotatably connected to the rotating rod, and the rotation axis of the disturbance member is parallel to the rotation axis of the rotating rod.

[0037] By adopting the above technical solution, the disturbance effect of the disturbing member on the electroplating solution during movement can be further improved, and at the same time, the disturbing member can easily disturb the nickel attached to the wall of the electroplating tank so that it continues to be free in the electroplating solution.

[0038] Optionally, the disturbance component further includes an elastic member; both ends of the elastic member are respectively connected to the rotating rod and the body, and the elastic member has a tendency to drive the rotating rod to rotate so that the disturbance member contacts and maintains the side wall of the electroplating tank.

[0039] By adopting the above technical solution, the effect of the disturbance component in reducing the probability of nickel obtained by electrolysis of the plating solution adhering to the wall of the plating tank can be further improved, and at the same time, the influence of the disturbance component on the process of nickel flowing through the screen with the plating solution can be further reduced.

[0040] In summary, this application has at least one of the following beneficial effects:

[0041] 1. It can effectively improve the preparation quality of nickel plates, reduce costs and improve efficiency, thereby effectively improving the uniformity of the pits or dots obtained after the hot pressing treatment of the light guide plate, thereby ensuring the optical performance of the light guide plate;

[0042] 2. It can effectively improve the uniformity of the electroplating solution, thereby effectively ensuring the efficiency and effect of electrolysis of the electroplating solution;

[0043] 3. It can effectively improve the effect and efficiency of nickel forming a nickel plate on the surface of the light guide plate after the nickel flows through the stencil with the electroplating solution, and at the same time effectively reduce the probability of nickel adhering to the wall of the electroplating tank;

[0044] 4. It can effectively reduce the influence of the process in which nickel forms a nickel plate on the surface of the light guide plate after flowing through the stencil with the plating liquid to improve its uniformity. BRIEF DESCRIPTION OF THE DRAWINGS

[0045] Figure 1 This is a schematic structural diagram of a nickel plate electroplating forming pool for a light guide plate according to an embodiment of the present application;

[0046] Figure 2 This is a cross-sectional view of a nickel plate electroplating forming pool for a light guide plate according to an embodiment of the present application;

[0047] Figure 3 This is a schematic diagram of the internal structure of the streaming component in the embodiment of the present application;

[0048] Figure 4 yes Figure 2 Partial cross-sectional view along line AA;

[0049] Figure 5 yes Figure 2 Partial cross-sectional view along line BB (clamping assembly and light guide plate omitted);

[0050] Figure 6 This is a schematic diagram of the internal structure of the disturbance component body in an embodiment of the present application;

[0051] Figure 7 It is a structural diagram of the disturbance component disturbing the bottom of the electroplating tank in an embodiment of the present application.

[0052] Description of reference numerals: 1. cell body; 11. electroplating tank; 2. electroplating device; 21. electrolytic assembly; 211. power supply module; 212. electrolytic rod; 22. clamping assembly; 3. auxiliary device; 31. mesh plate; 311. mesh; 4. stirring device; 41. lifting assembly; 411. lifting frame; 412. driving member; 42. flow-pushing assembly; 421. seat; 422. driving blade; 423. flow-pushing blade; 4 231. Clearance hole; 424. Driving structure; 4241. Rotating shaft; 4242. Rotating seat; 4243. Synchronous belt; 43. Disturbance component; 431. Body; 432. Movable part; 433. Rotating rod; 434. Disturbance part; 435. Elastic part; 436. Floating part; 437. Linkage structure; 4371. First rack; 4372. Second rack; 4373. Linkage gear; 5. Light guide plate. DETAILED DESCRIPTION

[0053] The following is combined with Figure 1-7 This application is described in further detail.

[0054] An embodiment of the present application discloses a nickel plate electroplating forming pool for a light guide plate, in which nickel is electroplated to form a nickel plate of a certain thickness on the surface of the light guide plate having a concave dot structure. After the nickel plate is peeled off from the light guide plate, it can be used to perform hot pressing on the light guide plate to improve the uniformity of the subsequent forming of the concave dot structure on the surface of the light guide plate and ensure the optical performance of the light guide plate.

[0055] Reference Figure 1 and Figure 2 The electroplating forming tank includes a tank body 1, an electroplating device 2, an auxiliary device 3, and a stirring device 4. The tank body 1 contains the electroplating solution and also provides a place for the nickel plate electroplating forming process. The electroplating device 2 is used to electroplate the nickel plate on the surface of the light guide plate 5 immersed in the electroplating solution. The auxiliary device 3 is used to assist the electroplating process and improve the efficiency and effect of the electroplating. The stirring device 4 is used to stir the electroplating solution to improve the uniformity of the electroplating solution and reduce the probability of the electroplated nickel adhering to the inner wall of the tank body 1, thereby improving the effect and efficiency of the nickel plate electroplating forming process.

[0056] The cell body 1 is generally rectangular in structure, and contains an upwardly open electroplating tank 11 within the cell body 1. The electroplating tank 11 contains a certain amount of electroplating solution for forming nickel. In this embodiment, the electroplating tank 11 is preferably rectangular in shape, with the length and width of the electroplating tank 11 being parallel to the length and width of the cell body 1, respectively. Since electroplating solutions having the aforementioned effects are known in the art, they will not be described in detail here.

[0057] The electroplating device 2 includes an electrolytic assembly 21 and a clamping assembly 22. The electrolytic assembly 21 is used to electrolyze the plating solution to obtain nickel, while the clamping assembly 22 is used to clamp and position the light guide plate 5 so that the light guide plate 5 remains stable after being immersed in the plating solution.

[0058] The electrolytic assembly 21 is installed on the cell body 1 near one end of the cell body 1 in the longitudinal direction, and includes a power supply module 211 and a plurality of electrolytic rods 212. The cell body 1 has a frame structure for installing the electrolytic assembly 21, and the power supply module 211 is fixedly installed on the top of the frame structure to supply power to the plurality of electrolytic rods 212; the electrolytic rods 212 are installed in a vertical state, and the plurality of electrolytic rods 212 are evenly spaced along the width direction of the cell body 1, with their tops fixedly connected to the frame structure, and their bottoms extending into the electroplating tank 11 and located near the bottom tank wall of the electroplating tank 11. After the power supply module 211 supplies power to the electrolytic rods 212, the electrolytic rods 212 can electrolyze the plating solution in the electroplating tank 11. In this embodiment, since the electrolytic assembly 21 with the above-mentioned functions is a prior art in this field, it will not be described in detail here, and it is only briefly shown in the accompanying drawings.

[0059] The clamping assembly 22 is detachably connected to the cell body 1 and is installed at a position of the cell body 1 away from the electrolytic assembly 21. The light guide plate 5 is also detachably connected to the clamping assembly 22. When the light guide plate 5 is clamped by the clamping assembly 22 and the clamping assembly 22 is connected to the cell body 1, the surface of the light guide plate 5 with the concave dot structure is in a vertical state and faces the electrolytic assembly 21, so that the nickel obtained after the electroplating solution is electrolyzed by the electrolytic assembly 21 is adsorbed to obtain a nickel plate. In this embodiment, the clamping assembly 22 is preferably detachably connected to the cell body 1 by screws, and the clamping assembly 22 is preferably used to clamp and position light guide plates 5 of different sizes by two relatively slidable clamping pieces to achieve detachable connection. Since the clamping assembly 22 with the above-mentioned functions is a common prior art, it will not be described in detail here, and it is only briefly shown in the accompanying drawings.

[0060] The light guide plate 5 is a rectangular plate-shaped structure as a whole. It is completely immersed in the electroplating solution when clamped by the clamping assembly 22. Its length direction is parallel to the height direction of the cell body 1, and its width direction is parallel to the width direction of the cell body 1. In this embodiment, it is preferred that when the light guide plate 5 is clamped and positioned by the clamping assembly 22 installed on the cell body 1, the surface of the light guide plate 5 facing away from the concave dot network structure is in contact with the side wall of the electroplating tank 11 away from the electrolytic assembly 21 along its own length direction. The clamping assembly 22 clamps both sides of the light guide plate 5 in the width direction while also in contact with the tank walls on both sides of the electroplating tank 11, thereby reducing the probability of nickel obtained by electrolysis in the electroplating solution contacting the surface of the light guide plate 5 that is not related to the nickel-plated plate. In this embodiment, since the above-mentioned light guide plate 5 is a prior art in this field, it will not be described in detail here, and it is only briefly shown in the drawings.

[0061] The auxiliary device 3 includes a screen 31. The screen 31 is an overall rectangular plate-shaped structure. It is installed in the electroplating tank 11 in a vertical position in its longitudinal direction and divides the electroplating tank 11 into two spaces. The screen 31 is located between the electrolytic assembly 21 and the clamping assembly 22. The nickel obtained by the electrolytic plating solution of the electrolytic assembly 21 needs to pass through the screen 31 before it can be adsorbed on the surface of the light guide plate 5 having the concave dot structure. In this embodiment, the screen 31 is preferably detachably connected to the tank body 1, and the detachable connection between the screen 31 and the tank body 1 is achieved by plugging and fitting. After the screen 31 is connected to the tank body 1, it is preferably centered in the electroplating tank 11 along the longitudinal direction of the electroplating tank 11. The two sides of the screen 31 in the width direction are respectively in contact with the tank walls on both sides of the electroplating tank 11. The top of the screen 31 is exposed above the electroplating solution, and the bottom of the screen 31 is in contact with the tank wall at the bottom of the electroplating tank 11.

[0062] A plurality of mesh holes 311 are formed on the mesh plate 31 in a direction perpendicular to the thickness direction thereof. The plurality of mesh holes 311 are evenly distributed on the mesh plate 31 , and the mesh holes 311 allow the spaces on both sides of the electroplating tank 11 to communicate with each other, so that the nickel obtained from the electroplating liquid of the electrolytic component 21 flows through the mesh holes 311 with the electroplating liquid and is adsorbed on the surface of the light guide plate 5 having a concave dot structure.

[0063] Furthermore, the multiple mesh holes 311 on the stencil 31 are preferably aligned one-to-one with the multiple points of the concave dot structure on the light guide plate 5 along the length of the cell body 1. This facilitates the absorption and filling of nickel on the surface of the light guide plate 5 after the nickel flows through the stencil 31 with the electroplating solution, thereby improving the quality of the nickel plate forming. In this embodiment, the stencil 31 preferably has different specifications based on the distribution pattern and size of the mesh holes 311. The operator can select a stencil 31 that matches the concave dot structure on the light guide plate 5 for use.

[0064] The stirring device 4 includes a lifting assembly 41, multiple flow-pushing assemblies 42, and multiple disturbance assemblies 43. The lifting assembly 41 is used to control the positions of the flow-pushing assemblies 42 and the disturbance assemblies 43 in the electroplating tank 11; the flow-pushing assemblies 42 are used to drive the electroplating solution to flow through the stencil 31, helping nickel to flow with the electroplating solution to the light guide plate 5; and the disturbance assemblies 43 are used to disturb the electroplating solution to improve its uniformity and reduce the probability of nickel adhering to the walls of the electroplating tank 11.

[0065] The lifting assembly 41 comprises a lifting frame 411 and a driver 412. A frame structure for mounting the lifting assembly 41 is located at the top of the tank body 1, midway along its length. The driver 412 is fixedly mounted to the top of the frame structure, while the lifting frame 411 is mounted below it. The driver 412 is used to drive the lifting frame 411 to move vertically relative to the tank body 1. In this embodiment, the driver 412 is preferably a servo cylinder, and the lifting frame 411 remains above the plating solution during movement. Since servo cylinders are common in the art, they will not be described in detail here, and are only briefly illustrated in the accompanying drawings.

[0066] Reference Figure 1 and Figure 3 The flow-pushing assembly 42 is installed at the bottom of the lifting frame 411 and is located on the side of the electrolysis rod 212 away from the mesh plate 31. In this embodiment, the stirring device 4 preferably includes two flow-pushing assemblies 42, and the two flow-pushing assemblies 42 are symmetrically distributed relative to the cell body 1.

[0067] Reference Figure 2 and Figure 3 The flow-pushing assembly 42 includes a seat body 421 , a driving blade 422 , a plurality of flow-pushing blades 423 and a driving structure 424 .

[0068] The top of the base 421 is fixedly connected to the bottom of the lifting frame 411 . The bottom of the base 421 is immersed in the electroplating solution. When the lifting frame 411 moves, the bottom of the base 421 remains immersed in the electroplating solution.

[0069] The driving blade 422 is a rectangular sheet structure as a whole, and one end of the driving blade 422 is rotatably connected to the bottom of the base 421 . The rotation axis 4241 is parallel to the width direction of the driving blade 422 and the length direction of the pool body 1 .

[0070] The driving blade 422 is limited in its rotation relative to the seat 421. During the downward movement of the lifting member, the driving blade 422 rotates upward to its limit position under the action of the resistance of the plating solution. At this time, the length direction of the driving blade 422 is tilted, and the end away from the bottom of the seat 421 is the tilted upper end. During the upward movement of the lifting member, the driving blade 422 rotates downward to its limit position under the action of the resistance of the plating solution. At this time, the length direction of the driving blade 422 is tilted, and the end away from the bottom of the seat 421 is the tilted lower end. In this embodiment, it is preferred that the driving blade 422 remain located on the side of the bottom of the seat 421 near the other flow-pushing component 42 during its rotation relative to the seat 421.

[0071] The propellant blade 423 is an overall rectangular sheet-like structure, with one end of its length pivotally connected to the bottom of the base 421. Its rotation axis 4241 coincides with the rotation axis 4241 of the corresponding drive blade 422, and its width is inclined relative to its own rotation axis 4241. Rotating relative to the base 421 in a certain direction, the propellant blade 423 can drive the plating solution surrounding the propellant blade 423 to flow parallel to the length of the cell body 1 toward the screen 31.

[0072] The plurality of flow-propelling blades 423 are all located on the side of the corresponding driving blade 422 close to the mesh plate 31 and are evenly spaced at the bottom of the base 421 along the length of the tank body 1. In this embodiment, the flow-propelling assembly 42 preferably includes three flow-propelling blades 423 in total.

[0073] Reference Figure 3 and Figure 4 Furthermore, in order to improve the effect of the flow-pushing component 42 driving the nickel obtained by the electrolytic component 21 to electrolyze the plating solution and flow through the mesh plate 31 along with the plating solution, it is preferred that the two flow-pushing components 42 are aligned with the space around the multiple electrolytic rods 212 along the length direction of the cell body 1.

[0074] The driving structure 424 is installed inside the seat body 421 to form a linkage between the driving blade 422 and the multiple flow-pushing blades 423, so that the driving blade 422 can drive the multiple flow-pushing blades 423 to rotate relative to the seat body 421 during the rotation relative to the seat body 421.

[0075] The drive structure 424 includes a rotating shaft 4241 and a plurality of corresponding rotating seats 4242 and a plurality of synchronous belts 4243. In this embodiment, the drive structure 424 preferably includes a total of four rotating seats 4242 and four synchronous belts 4243. Each of the four rotating seats 4242 and four synchronous belts 4243 corresponds one-to-one to the drive blades 422 and the three flow-propelling blades 423. The rotating seats 4242 are rotationally connected to the seat body 421, and the drive blades 422 and the flow-propelling blades 423 are both rotationally connected to the seat body 421 via the rotating seats 4242. That is, the rotating shaft 4241 line of the rotating seat 4242 coincides with the rotating shaft 4241 line of the corresponding drive blade 422 or the rotating shaft 4241 line of the flow-propelling blade 423.

[0076] The rotating shaft 4241 is a cylindrical structure as a whole. It is rotatably installed inside the seat body 421 and is located above the driving blade 422 and the thrust blade 423. Its rotating shaft 4241 line coincides with its own axis and is parallel to the rotating shaft 4241 line of the driving blade 422; the rotating shaft 4241 has four annular protrusion structures extending outward in the radial direction, and the four annular protrusion structures correspond one by one to the four rotating seats 4242 in the vertical direction.

[0077] The synchronous belt 4243 is simultaneously wound around and mounted on the corresponding rotating seat 4242 and the corresponding annular protrusion on the rotating shaft 4241. At this time, the driving blade 422 rotates relative to the seat body 421 due to the resistance of the electroplating solution, and in the process of driving the corresponding rotating seat 4242 to rotate relative to the seat body 421, the corresponding synchronous belt 4243 can drive the rotating shaft 4241 to rotate relative to the seat body 421. Then, the remaining three synchronous belts 4243 drive the three propelling blades 423 and the remaining three rotating seats 4242 to rotate relative to the seat body 421. In this embodiment, since the driving structure 424 with the above-mentioned functions is common in the prior art, it will not be described in detail here, and it will only be briefly illustrated in the drawings.

[0078] Furthermore, it is preferred that the three push flow blades 423 and the corresponding rotating seat 4242 are all connected in a one-way rotation manner, that is, the rotating seat 4242 can drive the corresponding push flow blade 423 to rotate relative to the seat body 421 only when it rotates in a certain direction relative to the seat body 421, driving the surrounding electroplating liquid to flow toward the direction close to the screen plate 31.

[0079] Reference Figure 2 and Figure 3In this embodiment, preferably, when the lifting frame 411 moves upward, the driving blade 422 rotates relative to the seat body 421 due to the resistance of the plating solution, and only then can the driving structure 424 drive the three propellant blades 423 to rotate relative to the seat body 421, and the rotation direction of the three propellant blades 423 is the same as the rotation direction of the driving blade 422. When the lifting frame 411 moves downward, the driving blade 422 rotates relative to the seat body 421 due to the resistance of the plating solution, and only then can the driving structure 424 drive the three rotating seats 4242 corresponding to the three propellant blades 423 to rotate relative to the seat body 421. In this embodiment, since the one-way rotation connection method with the above-mentioned function is a common prior art (such as a ratchet structure), it will not be described in detail here, and its structure is omitted in the drawings.

[0080] Furthermore, in order to improve the flow-pushing effect of the flow-pushing component 42 , it is preferred that the driving component has different driving effects on different flow-pushing blades 423 , and among the three flow-pushing blades 423 , the driving effect is gradually improved in the direction away from the driving blade 422 .

[0081] As the lifting frame 411 moves upward, the driving blade 422 rotates from one extreme position to the other relative to the base 421, driving the closest propellant blade 423 via the driving structure 424 to rotate at least one revolution, with the angles of rotation of the three propellant blades 423 increasing gradually in the direction away from the driving blade 422. In this embodiment, the driving structure 424 preferably achieves this function by adjusting the radial dimensions of the three annular protrusions on the rotating shaft 4241 corresponding to the three propellant blades 423, with the radial dimensions of the corresponding three annular protrusions increasing gradually in the direction away from the annular protrusion corresponding to the driving blade 422.

[0082] At this time, the three push flow blades 423 rotate relative to the base body 421 to exert a push flow effect on the plating liquid, which can gradually increase the flow rate of the plating liquid affected by the push flow effect. At the same time, the three push flow blades 423 rotating at different speeds can improve the uniformity of the plating liquid around them.

[0083] Reference Figure 3 and Figure 4 Furthermore, in order to reduce the probability that the push flow blade 423 rotates relative to the seat body 421 during the top-down movement of the lifting frame 411 to produce a reverse push flow effect on the plating liquid, and at the same time reduce the resistance of the plating liquid encountered during the process of the push flow blade 423 rotating to produce a forward push flow effect on the plating liquid, it is preferred that a plurality of clearance holes 4231 are opened on the push flow blade 423 in a direction perpendicular to its rotation axis 4241 and perpendicular to its length direction, and the plurality of clearance holes 4231 are evenly distributed on the push flow blade 423, so that the plating liquid can pass through the push flow blade 423 through the clearance holes 4231.

[0084] Reference Figure 1 and Figure 2 Multiple agitation assemblies 43 are also mounted on the bottom of the lifting frame 411. These agitation assemblies 43 are distributed on both sides of the stencil 31 and between the electrolytic assembly 21 and the clamping assembly 22. As the lifting frame 411 moves up and down, the agitation assemblies 43 move closer to the sides and bottom of the electroplating tank 11, thereby minimizing the impact of the agitation assemblies 43 on the nickel flowing through the electroplating tank 31. In this embodiment, the stirring device 4 preferably includes four agitation assemblies 43, two on each side of the stencil 31. The two agitation assemblies 43 on the same side of the stencil 31 are symmetrically distributed, close to either side of the width of the electroplating tank 11.

[0085] Reference Figure 5 and Figure 6 The disturbance assembly 43 includes a body 431 , a movable part 432 , a rotating rod 433 , a disturbance part 434 , an elastic part 435 , a floating part 436 and a linkage structure 437 .

[0086] Reference Figure 2 and Figure 5 The bottom of the body 431 is fixedly connected to the bottom of the lifting frame 411, and its bottom is immersed in the electroplating solution, and its bottom remains immersed in the electroplating solution during the up and down movement of the lifting frame 411.

[0087] Reference Figure 5 and Figure 6 The movable part 432 is movably connected to the body 431, and its moving direction is parallel to the moving direction of the lifting frame 411; one end of the rotating rod 433 is rotatably connected to the movable part 432, and its rotating axis 4241 is parallel to the length direction of the pool body 1.

[0088] The disruptor 434 is generally cylindrical and rotatably connected to the end of the rotating rod 433 away from the movable member 432. Its rotation axis 4241 coincides with its own axis and is parallel to the rotation axis 4241 of the rotating rod 433. The outer side of the disruptor 434 is elastic and has multiple disruptive bars extending radially outward. These disruptive bars enable the disruptor 434 to contact and abut the side and bottom walls of the electroplating tank 11. When the disruptive bars of the disruptor 434 contact and abut the walls of the electroplating tank 11, they effectively disrupt nickel adhering to the walls of the electroplating tank 11, thereby increasing the utilization rate of nickel adsorbed on the surface of the light guide plate 5.

[0089] The elastic member 435 is mounted at the pivoting connection between the rotating rod 433 and the movable member 432. Its ends are fixedly connected to the rotating rod 433 and the movable member 432, respectively, and it has the tendency to drive the rotating rod 433 to rotate downward to the limit position and maintain it. In this embodiment, the elastic member 435 is preferably a torsion spring, and when the rotating rod 433 is rotated downward to the limit position, the length direction of the rotating rod 433 is preferably parallel to the height direction of the tank body 1. Since torsion springs are common in the prior art, they are not described in detail here. The drawings only show the installation location of the elastic member 435 and omit the structure.

[0090] Floating member 436 is movably mounted on body 431, its movement direction being parallel to that of movable member 432, and it tends to float above the surface of the electroplating solution. In this embodiment, floating member 436 is preferably mounted on body 431 on a side of movable member 432 that is adjacent to the sidewall of electroplating tank 11.

[0091] The linkage structure 437 is installed inside the body 431 to form a linkage between the floating part 436 and the corresponding movable part 432. When the floating part 436 moves relative to the body 431, the linkage structure 437 can drive the movable part 432 to move in the opposite direction relative to the body 431.

[0092] The linkage structure 437 includes a first rack 4371 , a second rack 4372 and a linkage gear 4373 .

[0093] The first rack 4371 is fixedly mounted on the floating part 436, and its extension direction is parallel to the movement direction of the floating part 436, and it is located on the side of the floating part 436 close to the corresponding movable part 432; the second rack 4372 is fixedly mounted on the movable part 432, and its extension direction is parallel to the movement direction of the movable part 432, and it is located on the side of the movable part 432 close to the corresponding floating part 436; the linkage gear 4373 is rotatably mounted inside the body 431 and is located between the first rack 4371 and the second rack 4372, and its rotation axis 4241 line is parallel to the rotation axis 4241 line of the rotating rod 433, and it is engaged with the first rack 4371 and the second rack 4372 at the same time.

[0094] Reference Figure 2 and Figure 6 The floating member 436 is limited in its movement relative to the body 431. During the movement of the lifting frame 411, the floating member 436 remains immersed in the electroplating solution, and the first rack 4371 and the second rack 4372 remain engaged with the linkage gear 4373 during this process.

[0095] Reference Figure 2 and Figure 5When the lifting frame 411 moves upward to the extreme position, the floating part 436 is in a state of moving downward to the extreme position relative to the body 431. At this time, the corresponding movable part 432 is in a state of moving upward to the extreme position, and at this time the movable rod is in a position state in which the length direction is parallel to the height direction of the pool body 1, and the disturbing part 434 is in a position state in which it is in contact with the side wall of the electroplating tank 11 and there is a distance between it and the tank wall at the bottom of the electroplating tank 11.

[0096] Reference Figure 2 and Figure 7 Afterwards, during the downward movement of the lifting frame 411, the disturbance member 434 will be in contact with and against the side wall of the electroplating tank 11. On the one hand, it will move downward with the machine body 431, and on the other hand, the floating member 436 will move upward relative to the machine body 431 under the buoyancy of the electroplating liquid and be driven downward by the linkage structure 437, thereby improving the disturbance effect of the disturbance member 434 on the nickel attached to the side wall of the electroplating tank 11; during this process, the disturbance member 434 will also rotate relative to the rotating rod 433, thereby improving its disturbance effect on the surrounding electroplating liquid and further improving the uniformity of the electroplating liquid.

[0097] Afterwards, the lifting frame 411 moves downward until the disturbance member 434 contacts the bottom wall of the electroplating tank 11 and then continues to move downward to the extreme position. The force acting on the disturbance member 434 will drive the rotating rod 433 to rotate relative to the movable member 432 to overcome the force of the elastic member 435, so that the disturbance member 434 can move toward the middle position of the electroplating tank 11 in a state of contact with the bottom wall of the electroplating tank 11. In this process, the disturbance member 434 will rotate relative to the rotating rod 433, disturbing the nickel attached to the bottom wall of the electroplating tank 11 while also disturbing the electroplating liquid around it.

[0098] Afterwards, when the lifting frame 411 moves from bottom to top, the operation rules of the disturbance component 43 can be deduced in the same way, and it can again have a disturbance effect on the nickel attached to the wall of the electroplating tank 11 and the surrounding electroplating liquid on the moving path.

[0099] The implementation principle of a nickel plate electroplating forming pool for a light guide plate in the embodiment of the present application is as follows:

[0100] During the process of electroplating the light guide plate 5 with nickel, the light guide plate 5 is first clamped and positioned by the clamping assembly 22 and the light guide plate 5 is completely immersed in the electroplating solution. Then, a suitable stencil 31 is selected according to the concave dot structure on the light guide plate 5 and installed on the cell body 1. Then, the electrolytic assembly 21 is controlled to operate the electrolytic plating solution to obtain nickel, and the stirring device 4 is controlled to operate at the same time.

[0101] During the operation of the stirring device 4, the lifting component 41 will cause multiple flow-pushing components 42 and multiple disturbance components 43 to move up and down repeatedly; during the up and down movement of the flow-pushing component 42, the plating liquid in the plating tank 11 can be driven to flow toward the direction close to the light guide plate 5, so that the nickel obtained by the electrolysis component 21 electrolyzing the plating liquid can flow with the plating liquid through the mesh plate 31 to the light guide plate 5 and be adsorbed to form a nickel plate of a certain thickness; at the same time, the disturbance component 43 can disturb the plating liquid in the plating tank 11 while minimizing the impact on the flow-pushing effect of the flow-pushing component 42, thereby improving the uniformity of the plating liquid, and can disturb the nickel attached to the wall of the plating tank 11, thereby improving the efficiency and effect of the nickel adsorbed on the light guide plate 5 to form a nickel plate.

[0102] The above are all preferred embodiments of the present application, and are not intended to limit the scope of protection of the present application. Therefore, any equivalent changes made based on the structure, shape, and principle of the present application should be included in the scope of protection of the present application.

Claims

1. A nickel plate electroplating forming pool for light guide plates, characterized in that: It comprises a cell body (1), an electroplating device (2) and an auxiliary device (3); The cell body (1) has an electroplating tank (11) with an upward opening inside, and the electroplating tank (11) contains electroplating liquid; The electroplating device (2) comprises an electrolytic component (21) for electrolyzing the electroplating solution and a clamping component (22) for clamping the light guide plate (5); the auxiliary device (3) comprises a screen plate (31); The mesh plate (31) is arranged on the cell body (1) and separates the electroplating tank (11), a plurality of mesh holes (311) are evenly distributed on the mesh plate (31), and two ends of the mesh holes (311) are respectively connected to the apertures on both sides of the mesh plate (31); The electrolytic component (21) and the clamping component (22) are both arranged on the cell body (1) and are respectively located on both sides of the screen (31); the multiple electrolytic rods (212) of the electrolytic component (21) are all located in the electroplating tank (11) and immersed in the electroplating solution; and the light guide plate (5) is clamped on the clamping component (22) and then immersed in the electroplating solution; The plurality of mesh holes (311) on the mesh plate (31) are aligned along their own opening direction with the concave dot structure on the light guide plate (5) clamped by the clamping assembly (22); It also includes a stirring device (4), and the stirring device (4) includes a lifting component (41) and a plurality of flow-pushing components (42); The lifting assembly (41) comprises a lifting frame (411) and a driving member (412); the lifting frame (411) is movably connected to the pool body (1) in a vertical direction, and the driving member (412) is used to drive the lifting frame (411) to move; The flow-pushing assembly (42) is located in the electroplating tank (11) and on the side of the electrolytic rod (212) facing away from the mesh plate (31), and includes a seat body (421) and a plurality of flow-pushing blades (423); the seat body (421) is arranged on the lifting frame (411), and the flow-pushing blades (423) are rotatably connected to the seat body (421), and the rotation axis is parallel to the opening direction of the mesh (311); the flow-pushing blades (423) are arranged at an angle, and when the flow-pushing blades (423) rotate relative to the seat body (421), they drive the electroplating solution to flow in a direction close to the mesh plate (31); The flow-pushing assembly (42) further includes a driving blade (422) and a driving structure (424); The driving blade (422) is rotatably connected to the seat body (421), and when the driving blade (422) is rotated to an extreme position relative to the seat body (421), it is inclined relative to the moving direction of the lifting frame (411); the driving structure (424) is arranged inside the seat body (421), and the driving blade (422) rotates along with the movement of the lifting frame (411). The rotation of the driving blade (422) drives the plurality of the thrust blades (423) to rotate through the driving structure (424); The driving structure (424) drives the plurality of flow-pushing blades (423) to have different rotational speeds, and the rotational speeds of the plurality of flow-pushing blades (423) decrease one by one in a direction approaching the driving blade (422).

2. The nickel plate electroplating forming pool for light guide plates according to claim 1, characterized in that: A plurality of clearance holes (4231) are provided on the push flow blade (423) in a direction perpendicular to the rotation axis thereof, and the clearance holes (4231) allow the plating solution to circulate.

3. The nickel plate electroplating forming pool for light guide plates according to claim 1, characterized in that: The stirring device (4) further comprises four disturbance components (43), and the four disturbance components (43) are respectively located on both sides of the screen plate (31) and close to both sides of the electroplating tank (11).

4. The nickel plate electroplating forming pool for light guide plates according to claim 3, characterized in that: The disturbance component (43) includes a body (431), a rotating rod (433) and a disturbance member (434); The body (431) is arranged on the lifting frame (411); one end of the rotating rod (433) is rotatably connected to the body (431), and its rotation axis is parallel to the opening direction of the mesh (311); the disturbing member (434) is arranged at one end of the rotating rod (433) away from the body (431), and a plurality of disturbing bars with flexibility and elasticity extending outward from its surface and used to contact the tank wall of the electroplating tank (11); During the downward movement of the lifting frame (411), the disturbance member (434) contacts the bottom wall of the electroplating tank (11) and drives the rotating rod (433) to rotate, causing the disturbance member (434) to move along the bottom wall of the electroplating tank (11).

5. The nickel plate electroplating forming pool for light guide plates according to claim 4, characterized in that: The disturbance assembly (43) further includes a movable member (432), a floating member (436) and a linkage structure (437); The movable member (432) is movably connected to the machine body (431) in a vertical direction, and one end of the rotating rod (433) is rotatably connected to the movable member (432); The floating member (436) is movably arranged on the machine body (431) in a vertical direction, and the linkage structure (437) is arranged inside the machine body (431) and is used to link the movable member (432) and the floating member (436); During the upward movement of the floating member (436), the movable member (432) is driven to move downward via the linkage structure (437).

6. The nickel plate electroplating forming pool for light guide plates according to claim 4, characterized in that: The disturbance member (434) is rotatably connected to the rotating rod (433), and its rotation axis is parallel to the rotation axis of the rotating rod (433).

7. The nickel plate electroplating forming pool for light guide plates according to claim 4, characterized in that: The disturbance component (43) further includes an elastic member (435); the two ends of the elastic member (435) are respectively connected to the rotating rod (433) and the body (431), and the elastic member (435) has a tendency to drive the rotating rod (433) to rotate so that the disturbance member (434) contacts and maintains the side wall of the electroplating tank (11).

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