Kr-85 detection parameter control adjustment method and system for liquid scintillation spectrometer

Abstract

The application provides a liquid scintillation spectrometer Kr-85 detection parameter control adjustment method and system, relates to the technical field of parameter control, and comprises the following steps: collecting the gas component data of the gas input into a primary enrichment unit after pre-impurity removal, inputting a pre-trained dynamic parameter controller, outputting obtained adsorption control parameters, and performing adsorption of the gas by using the adsorption control parameters; collecting the impurity residual amount of the gas in a separation process in real time by using a nitrogen oxygen sensor, and dynamically adjusting and controlling a preset separation time; collecting the Kr residual amount in the primary enrichment unit in an analysis process, and dynamically adjusting and controlling analysis control parameters; collecting the gas component data of the gas input into a secondary enrichment unit, and dynamically adjusting and controlling the adsorption control parameters, the separation time and the analysis control parameters; acquiring the Xe / Kr concentration ratio of the gas input into a chromatographic separation unit through the secondary enrichment unit, and dynamically adjusting and controlling a TCD chromatographic column temperature. The technical problem of low detection accuracy of the liquid scintillation spectrometer Kr-85 in the prior art is solved.

Description

Technical Field

[0001] The present invention relates to the field of parameter control, and in particular to a method and system for controlling and adjusting detection parameters of a liquid scintillation spectrometer Kr-85. Background Art

[0002] During nuclear power plant operation, the detection of Kr-85 in gaseous effluents is crucial for operational dose estimation and monitoring for leaks or explosions. However, the radioactivity concentration of Kr-85 is extremely low, and the high specific activity of Xe in inert gases emitted by nuclear power plants. The similar liquefaction temperatures of Kr and Xe make the separation and detection of Kr-85 challenging.

[0003] Furthermore, when using a liquid scintillation spectrometer to detect Kr-85, since TCD chromatography has an upper limit on its separation capacity for the volume of the injected gas, multi-stage activated carbon is required for separation and enrichment so that the gas entering the chromatographic separation reaches a volume that the chromatographic separation can handle. However, the separation and enrichment process of multi-stage activated carbon involves a large number of control parameters, such as adsorption temperature, adsorption time, desorption temperature, desorption time, etc. Traditional methods use static parameter control, resulting in the inability to dynamically adjust the detection of Kr-85 according to the dynamic fluctuations of the gas composition data, which in turn leads to low detection accuracy of Kr-85 by the liquid scintillation spectrometer. Summary of the Invention

[0004] The present invention aims to solve the technical problem of low detection accuracy of liquid scintillation spectrometer Kr-85 in the prior art and provides a method and system for controlling and adjusting detection parameters of liquid scintillation spectrometer Kr-85.

[0005] The technical solution of the present invention to solve the above technical problems is as follows:

[0006] In a first aspect, the present invention provides a method for controlling and adjusting detection parameters of a liquid scintillation spectrometer Kr-85, comprising:

[0007] Collecting gas component data input into the primary enrichment unit after pre-impurity removal, inputting the gas component data into a pre-trained dynamic parameter controller, outputting adsorption control parameters, and adsorbing the gas using the adsorption control parameters;

[0008] According to the real-time collection of the residual impurities in the gas during the separation process by the nitrogen and oxygen sensor, the preset separation time is dynamically adjusted;

[0009] Collecting the Kr residual amount in the primary enrichment unit during the analysis process, and dynamically adjusting the analysis control parameters, wherein the analysis control parameters include helium purge parameters;

[0010] Collecting gas component data input into the secondary enrichment unit through the primary enrichment unit, and dynamically adjusting adsorption control parameters, separation time, and analytical control parameters, wherein the dynamic adjustment process is the same as that of the primary enrichment unit;

[0011] The Xe / Kr concentration ratio of the gas input into the chromatographic separation unit through the secondary enrichment unit is obtained, and the temperature of the TCD chromatographic column is dynamically adjusted.

[0012] In a second aspect, the present invention provides a liquid scintillation spectrometer Kr-85 detection parameter control and adjustment system, comprising:

[0013] An adsorption control module is used to collect gas component data input into the primary enrichment unit after pre-impurity removal, input the gas component data into a pre-trained dynamic parameter controller, output adsorption control parameters, and perform gas adsorption with the adsorption control parameters;

[0014] A separation control module is used to dynamically adjust the preset separation time based on the real-time collection of the residual impurities in the gas during the separation process by the nitrogen and oxygen sensor;

[0015] An analysis control module is used to collect the Kr residual amount of the primary enrichment unit during the analysis process and dynamically adjust the analysis control parameters, wherein the analysis control parameters include helium purge parameters;

[0016] A collaborative control module, configured to collect gas component data processed by the primary enrichment unit and input into the secondary enrichment unit, and dynamically adjust adsorption control parameters, separation time, and analytical control parameters, wherein the dynamic adjustment process is the same as that of the primary enrichment unit;

[0017] The chromatographic temperature control module is used to obtain the Xe / Kr concentration ratio of the gas input into the chromatographic separation unit through the secondary enrichment unit and dynamically adjust the TCD chromatographic column temperature.

[0018] The beneficial effects of the present invention are:

[0019] Compared with the existing technology, this application first collects the gas component data of the first-level enrichment unit after pre-impurity removal, inputs the gas component data into a pre-trained dynamic parameter controller, outputs the adsorption control parameters, and uses the adsorption control parameters to adsorb the gas. In the case of fluctuations in the input gas component data, the adsorption control parameters of the first-level enrichment unit are dynamically adjusted by artificial intelligence, providing a reliable guarantee for the high-precision detection of Kr-85 by the liquid scintillation spectrometer. Secondly, based on the real-time collection of the impurity residue of the gas during the separation process by the nitrogen and oxygen sensor, the preset separation time is dynamically adjusted, and the separation process is transformed from extensive time control to precise control based on real-time data, achieving multi-objective optimization of detection efficiency, energy consumption and accuracy. Thirdly, the Kr residue in the first-level enrichment unit during the analysis process is collected and the analysis control parameters are dynamically adjusted. Through refined parameter analysis, dynamic regulation of the analysis control parameters is achieved, significantly improving the recovery efficiency of Kr-85 and providing reliable technical support for radioactive gas detection. Furthermore, the system collects gas composition data from the primary enrichment unit and feeds it into the secondary enrichment unit. Adsorption control parameters, separation time, and desorption control parameters are dynamically adjusted, resulting in a second round of adsorption, separation, and desorption. This ensures that the volume of gas entering the chromatographic separation unit is sufficient for chromatographic processing. Finally, the Xe / Kr concentration ratio of the gas entering the chromatographic separation unit after the secondary enrichment unit is determined, and the TCD column temperature is dynamically controlled. By monitoring the Xe / Kr concentration ratio in real time and adjusting the column temperature, efficient krypton and xenon separation and precise detection are achieved.

[0020] Through the above technical solution, the present application fully considers the dynamic fluctuations of many control parameters involved in the liquid scintillation spectrometer Kr-85 detection process with the gas composition data, and controls the adsorption temperature and time based on the concentrations of H2O and CO2, controls the separation time according to the residual amount of impurities, controls the analytical parameters according to the residual amount of Kr, controls the chromatographic column temperature according to the Xe / Kr concentration ratio, etc., which can effectively separate Kr-85 and reduce impurity interference, thereby significantly improving the accuracy and reliability of the liquid scintillation spectrometer's Kr-85 detection results. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 A schematic flow chart of a method for controlling and adjusting detection parameters of a liquid scintillation spectrometer Kr-85 provided by the present invention;

[0022] Figure 2 This is a structural schematic diagram of a detection parameter control and adjustment system for a liquid scintillation spectrometer Kr-85 provided by the present invention.

[0023] In the accompanying drawings, the components represented by the reference numerals are as follows:

[0024] Adsorption control module 11 , separation control module 12 , analysis control module 13 , coordination control module 14 , and chromatographic temperature control module 15 . DETAILED DESCRIPTION

[0025] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without making any creative efforts shall fall within the scope of protection of the present invention.

[0026] In the description of the present invention, the terms "first" and "second" are used for descriptive purposes only and should not be understood to indicate or imply relative importance or implicitly specify the number of the technical features indicated. Therefore, a feature specified as "first" or "second" may explicitly or implicitly include one or more of the specified features. In the description of the present invention, "plurality" means two or more, unless otherwise specifically defined.

[0027] In the description of the present invention, the term "for example" is used to mean "used as an example, illustration or illustration". Any embodiment of the present invention described as "for example" is not necessarily to be construed as being more preferred or advantageous than other embodiments. The following description is given to enable any person skilled in the art to implement and use the present invention. In the following description, details are listed for the purpose of explanation. It should be understood that a person of ordinary skill in the art can recognize that the present invention can be implemented without using these specific details. In other examples, well-known structures and processes are not elaborated in detail to avoid obscuring the description of the present invention with unnecessary details. Therefore, the present invention is not intended to be limited to the embodiments shown, but is consistent with the widest scope consistent with the principles and features disclosed herein.

[0028] Example 1, as Figure 1 As shown, an embodiment of the present invention provides a method for controlling and adjusting detection parameters of a liquid scintillation spectrometer Kr-85, comprising:

[0029] Under normal operating conditions, Kr-85 accounts for only 0.09% of the gaseous effluent from a nuclear power plant. However, in abnormal circumstances such as leakage at a nuclear power plant, the specific activity of Kr-85 can reach as high as 85%, which is several orders of magnitude higher than other isotopes of Kr and Xe. Therefore, the detection of Kr-85 is of great significance for estimating the operating dose of a nuclear power plant and detecting whether there is a leak or explosion at the nuclear power plant.

[0030] When detecting the beta radiation emitted by Kr-85 decaying in air using a liquid scintillation spectrometer, the radioactivity concentration is too low, necessitating enrichment and separation of the Kr-85 in the air before detection. Traditional detection methods typically use low-temperature activated carbon adsorption and desorption to enrich and separate Kr-85, but the purity of the Kr separated by this method is low, and the boiling points of Kr and Xe are similar, making them difficult to separate using activated carbon. Alternatively, TCD chromatography can be used to separate Kr and Xe. TCD (thermal conductivity detector) chromatography uses the differences in thermal conductivity of different gases to separate and detect components. Due to the varying thermal conductivities of gases (e.g., Kr has a thermal conductivity of approximately 0.0094 W / (m·K) and Xe has a thermal conductivity of approximately 0.0052 W / (m·K)), when a gas mixture passes through a chromatographic column, the distribution coefficients of the components in the stationary and mobile phases differ, resulting in different migration rates and, therefore, separation.

[0031] However, TCD chromatography has an upper limit on its separation capacity for the volume of the input gas, necessitating the use of multiple stages of activated carbon for separation and enrichment, so that the gas entering the chromatographic separation reaches a volume that the chromatographic process can handle. The separation and enrichment process in a single enrichment unit is primarily divided into three stages: Kr adsorption, impurity separation, and analytical desorption. Combining two enrichment units yields multi-stage activated carbon. To prevent ice formation within the enrichment unit during ultra-low temperature enrichment and separation of Kr, which could cause pipeline blockage, the air entering the primary enrichment unit must be pre-cleaned to remove H2O and CO2.

[0032] In summary, the process of detecting Kr-85 by liquid scintillation spectrometry is: air → pre-impurity removal → primary enrichment unit → secondary enrichment unit → chromatographic separation unit → liquid scintillation spectrometry detection.

[0033] Among them, the first-level enrichment unit mainly adsorbs (adsorbs Kr), separates (separates oxygen and nitrogen), and analyzes and purges (analyzes Kr and purges it into the second-level enrichment unit with helium) the pre-removed air. The control parameters involved include: adsorption temperature and time, separation temperature and time, analysis temperature and time, helium purge concentration and time, etc.

[0034] The secondary enrichment unit mainly adsorbs (adsorbs Kr), separates (separates oxygen and nitrogen), and desorbs (desorbs Kr and purges it into the chromatographic separation unit with helium) the air purged from the primary enrichment unit. Therefore, the control parameters involved include: adsorption temperature and time, separation temperature and time, desorption temperature and time, helium purge concentration and time, etc.

[0035] The chromatographic separation unit is mainly used to separate Xe, which has a boiling point close to that of Kr. Therefore, the control parameters involved are: TCD column temperature.

[0036] In summary, this application improves the efficiency and accuracy of Kr-85 detection by regulating the important control parameters involved in the primary enrichment unit, secondary enrichment unit, and chromatographic separation unit of the liquid scintillation spectrometer during the Kr-85 detection process. Specifically:

[0037] S10: collecting gas component data input into the primary enrichment unit after pre-impurity removal, inputting the gas component data into a pre-trained dynamic parameter controller, outputting adsorption control parameters, and adsorbing the gas with the adsorption control parameters;

[0038] To prevent ice formation in the first enrichment unit and pipeline blockage during ultra-low temperature enrichment and separation of Kr, the air needs to be pretreated using a decontamination tank composed of silica gel and alumina to remove H2O and CO2. However, in actual operation, there are problems such as material aging and adsorption saturation in the decontamination tank, which leads to a decrease in the decontamination effect. Residual H2O and CO2 may still condense and block the pipeline in the ultra-low temperature environment. Moreover, the content of H2O and CO2 directly affects the adsorption efficiency and stability of the first enrichment unit. Therefore, it is necessary to establish a dynamic monitoring and intelligent control mechanism.

[0039] To address the above problems, the present application collects gas component data input into the primary enrichment unit after pre-removal of impurities, inputs the gas component data into a pre-trained dynamic parameter controller, outputs adsorption control parameters, and uses the adsorption control parameters to adsorb gas.

[0040] Specifically, step S10 in the method includes:

[0041] The gas component data input into the primary enrichment unit after pre-impurity removal is collected by multiple sensors, wherein the pre-impurity removal is to remove H2O and CO2 in the gas through the impurity removal tank, and the gas component data includes the concentration of H2O and CO2;

[0042] When the gas composition data exceeds a preset threshold, an alarm is triggered and a backup impurity removal tank is activated;

[0043] Inputting the gas composition data into a dynamic parameter controller and outputting adsorption control parameters, wherein the adsorption control parameters include adsorption temperature and adsorption time;

[0044] The gas is adsorbed in the first-stage enrichment unit using the adsorption control parameters.

[0045] In the embodiment of the present application, a multi-sensor system is first used to collect gas composition data for input into the primary enrichment unit after pre-purification. Pre-purification involves removing H2O and CO2 from the gas through a purifier tank, and the gas composition data includes the concentrations of H2O and CO2. For example, air is pre-treated using a purifier tank composed of silica gel and alumina to remove H2O and CO2. A high-precision humidity sensor and a CO2 concentration detector are installed at the outlet of the purifier tank to monitor the residual H2O and CO2 concentrations in real time. For example, the high-precision humidity sensor installed at the outlet of the purifier tank detects an H2O concentration of 4.5 ppm, and the CO2 concentration detector detects a CO2 concentration of 6 ppm.

[0046] Secondly, when the gas component data exceeds the preset threshold, an alarm is triggered and the standby impurity removal tank is started. This is to avoid the impurity removal effect being reduced due to problems such as aging of the impurity removal tank material and adsorption saturation, and the H2O and CO2 exceeding the preset threshold condensing and blocking the pipeline in an ultra-low temperature environment. Among them, based on a large amount of experimental data, this application recommends setting the preset threshold to 5ppm for H2O content and 10ppm for CO2 content. Those skilled in the art can adjust it according to actual conditions. Furthermore, a dual impurity removal tank parallel structure can be adopted, one for normal use and one for offline standby. When the concentration of H2O or CO2 exceeds the safety threshold, the PLC controller emits an audible and visual alarm and sends a fault code to the remote monitoring system, automatically closing the current impurity removal tank air inlet valve and opening the standby impurity removal tank air inlet valve. The switching time is <5s. For example, the preset threshold is 5ppm for H2O content and 10ppm for CO2 content. The detected gas component data is: the concentration of H2O is 4.5ppm and the concentration of CO2 is 6ppm, which is less than the preset threshold and does not trigger an early warning.

[0047] Next, the gas composition data is input into a dynamic parameter controller, which outputs adsorption control parameters, including adsorption temperature and adsorption time. Specifically, the concentrations of H2O and CO2 directly affect the adsorption time and temperature of the primary enrichment unit. A dynamic parameter controller built based on an LSTM neural network inputs the gas composition data and predicts and outputs the optimal adsorption control parameters, including adsorption temperature and adsorption time. For example, gas composition data (e.g., an H2O concentration of 4.5 ppm and a CO2 concentration of 6 ppm) is input into a pre-trained dynamic parameter controller, which predicts and outputs adsorption control parameters (e.g., an adsorption temperature of -80°C and an adsorption time of 5 minutes).

[0048] Finally, the gas is adsorbed in the primary enrichment unit using the adsorption control parameters. Specifically, the adsorption column temperature and adsorption time of the primary enrichment unit are precisely controlled based on the adsorption control parameters output by the dynamic parameter controller. The adsorption column temperature is stabilized within ±0.5°C of the target value, and the adsorption time is stabilized within ±0.5 minutes of the target value, ensuring maximum adsorption efficiency.

[0049] Specifically, the training steps of the "dynamic parameter controller" include:

[0050] According to the historical database of the liquid scintillation spectrometer, a sample gas component data set is collected, and the optimal adsorption control parameters of the next-level enrichment unit of different sample gas component data are collected, and the sample adsorption control parameter set is obtained by annotation;

[0051] Construct a dynamic parameter controller based on LSTM neural network;

[0052] Under the sample gas component data set and the sample adsorption control parameter set, supervised training parameter optimization is performed on the dynamic parameter controller, and the training is completed after the test accuracy converges.

[0053] In an embodiment of the present application, a set of sample gas component data is first collected from a liquid scintillation spectrometer's historical database. The optimal adsorption control parameters for the next-level enrichment unit for each sample gas component data set are then collected and annotated to obtain the sample adsorption control parameter set. For example, operational records covering the past 12 months, covering operational data under different seasonal environments, are extracted from the liquid scintillation spectrometer's historical database. Pre-cleaned gas component data, including H2O and CO2 concentrations, are collected. Offline gas chromatography-mass spectrometry analysis is then used to calibrate the adsorption temperature and adsorption time required to achieve a Kr adsorption efficiency of 95% or greater for each gas component data set, using these as target adsorption control parameters. A sliding window technique is then used to construct a time series dataset. The raw data is then preprocessed, for example, by outlier detection and removal (based on the 3σ principle), sliding window median filtering (window size 5), and Z-score normalization. Consequently, the optimal adsorption control parameters for the next-level enrichment unit for each sample gas component data set are obtained, and the sample adsorption control parameter set is annotated to obtain the sample adsorption control parameter set.

[0054] Secondly, a dynamic parameter controller based on an LSTM neural network was constructed. For example, a two-layer stacked LSTM structure was employed. The first layer had 64 neurons processing temporal features, while the second layer had 32 neurons extracting abstract representations. Dropout (0.2) and BatchNormalization were used to suppress overfitting. An adaptive weighting mechanism was designed for the input layer, assigning higher weights (up to twice the base weight) to H2O / CO2 concentrations near the threshold, enhancing the learning effect of key data. The output layer employed a dual-branch structure to predict adsorption temperature and adsorption time, respectively. A linear activation function was used to ensure an unconstrained output range.

[0055] Finally, supervised training of the dynamic parameter controller is performed using a sample gas component dataset and a sample adsorption control parameter set. Training is completed after test accuracy converges. For example, supervised training of the dynamic parameter controller can be achieved through the following technical approaches: 1. Data preparation: The corresponding sample gas component dataset and sample adsorption control parameter set are divided into a training set, a validation set, and a test set in a ratio of 7:1.5:1.5, which serve as training data for the dynamic parameter controller. 2. Model training: A hybrid training model combining transfer learning and incremental learning is employed. The initial model is pre-trained on simulated data, using the Adam optimizer (learning rate 0.001) to minimize the Mean Sequential Error (MSE) loss function. During the training phase on real data, dynamic learning rate scheduling (decaying by 0.9 every five epochs) and gradient clipping (norm ≤ 5) are introduced to ensure training stability. Early stopping and model fusion mechanisms are designed, and ensemble weights are selected from the models of the ten consecutive best epochs. The final model achieves a temperature prediction error of ≤1.5°C and a time prediction error of ≤3% on the test set. This is considered convergence, resulting in a trained dynamic parameter controller.

[0056] Furthermore, by continuously collecting new data and using the federated learning framework to update the global model, the dynamic parameter controller can maintain its adaptability to environmental changes.

[0057] In this way, based on historical data, a mapping relationship between gas composition data and optimal adsorption parameters was constructed, which solved the problem of gas composition fluctuations that were difficult to handle with traditional control methods. Even in a scenario where the residual H2O content increased threefold due to aging of the impurity removal tank filler, the adsorption performance could still be maintained stable by dynamically adjusting the parameters.

[0058] In summary, compared to the prior art, this application collects gas composition data for input into a primary enrichment unit after pre-cleaning, feeds this data into a pre-trained dynamic parameter controller, outputs adsorption control parameters, and then performs gas adsorption using these adsorption control parameters. In this way, even when the input gas composition data fluctuates, the adsorption control parameters of the primary enrichment unit are dynamically adjusted through artificial intelligence, providing reliable support for high-precision detection using the liquid scintillation spectrometer Kr-85.

[0059] S20: dynamically adjusting the separation time according to the amount of impurities remaining in the gas during the separation process collected in real time by the nitrogen and oxygen sensor;

[0060] Nearly 4 / 5 of the components in the air are O2 and N2 gases. Since TCD chromatography has an upper limit on its separation capacity for the volume of the injected gas, it is necessary to separate O2, N2 from Kr. During the separation process of the primary enrichment unit, at the pre-set separation temperature, Kr remains in an adsorbed state. However, due to the low boiling points of impurity factors such as O2 and N2, some of them desorb from the activated carbon surface and are discharged with the carrier gas, thereby achieving the separation of Kr from O2 and N2. During this separation process, when the content of O2 and N2 is lower than the threshold, the residual O2 and N2 have minimal interference with the subsequent analysis and final detection of Kr, and the separation effect can be considered to meet the standard. Since the concentrations of O2 and N2 in the input air fluctuate in this process, the separation time should also be dynamically adjusted accordingly to reduce unnecessary energy consumption while ensuring that the separation effect meets the standard.

[0061] In response to the above problems, the present application dynamically controls the separation time by collecting the residual impurities of the gas in the separation process in real time using a nitrogen and oxygen sensor.

[0062] Specifically, step S20 in the method includes:

[0063] Separating the gas at a preset separation temperature;

[0064] collecting, in real time, the amount of residual impurities in the gas during the separation process using a nitrogen and oxygen sensor, wherein the residual impurities include the concentrations of O2 and N2;

[0065] When the O2 and N2 concentrations are less than or equal to a preset threshold, the early stop mechanism is triggered, wherein the preset threshold is 1000 ppm of the O2 and N2 concentrations.

[0066] In the embodiments of the present application, the gas separation is first performed at a preset separation temperature. For example, during the separation process in the primary enrichment unit, impurity separation is performed at a preset separation temperature (e.g., -100°C). This separation temperature is determined based on the physical property differences between Kr and the impurity gases (O2, N2). At this temperature, Kr remains adsorbed, while impurities such as O2 and N2, due to their lower boiling points, partially desorb from the activated carbon surface and are discharged with the carrier gas, thereby achieving separation of Kr from the impurities.

[0067] Secondly, the nitrogen and oxygen sensor collects the residual impurity content of the gas during the separation process in real time, where the residual impurity content includes the concentrations of O2 and N2. Specifically, a high-precision nitrogen and oxygen sensor is installed at the gas outlet of the separation unit. This sensor uses electrochemical principles or paramagnetic methods to simultaneously detect the concentrations of O2 and N2. The detection accuracy of the nitrogen and oxygen sensor reaches ±10ppm, and the response time is less than 5 seconds, ensuring that subtle changes in impurity concentrations during the separation process can be quickly captured. The nitrogen and oxygen sensor collects O2 and N2 concentration data at a frequency of once per second and transmits it in real time to the control system's PLC (programmable logic controller) or edge computing device via industrial Ethernet or fieldbus (such as Modbus TCP). The collected data is filtered to remove outliers caused by sensor noise to ensure data accuracy.

[0068] Finally, when the O2 and N2 concentrations are less than or equal to a preset threshold, the early stop mechanism is triggered. The preset threshold is 1000 ppm for both O2 and N2, a value derived from extensive experiments and theoretical calculations. When the O2 and N2 concentrations are below this threshold, the residual O2 and N2 minimally interfere with the subsequent Kr analysis and final detection, and the separation effect can be considered to have met the standard. Furthermore, by continuously receiving real-time data collected by the nitrogen oxide sensor and comparing the O2 and N2 concentrations with the 1000 ppm threshold, if both O2 and N2 concentrations are less than or equal to 1000 ppm, the early stop mechanism is immediately triggered, sending a command to shut down the separation unit's heating / cooling device, carrier gas valve, and other components, halting the current separation operation. If the concentration of either gas exceeds 1000 ppm, the current separation state is maintained and operation continues until the concentration meets the standard. In this way, the separation time can be flexibly adjusted according to the actual impurity residue situation. Under conditions where the initial impurity concentration is low, the separation time can be shortened by 30%-50%, significantly improving the detection throughput, allowing more samples to be processed per unit time, avoiding unnecessary over-separation, and reducing the consumption of resources such as refrigeration equipment and carrier gas.

[0069] In summary, compared to existing technologies, this application dynamically controls the separation time based on the residual impurities in the gas collected in real time by the nitrogen and oxygen sensors during the separation process. This transforms the separation process from crude time control to precise control based on real-time data, achieving multi-objective optimization of detection efficiency, energy consumption, and accuracy.

[0070] S30: collecting the Kr residual amount in the primary enrichment unit during the analysis process, and dynamically adjusting the analysis control parameters, wherein the analysis control parameters include helium purge parameters;

[0071] After adsorption and impurity separation in the primary enrichment unit, the enriched Kr needs to be analyzed and input into the secondary enrichment unit for a second round of adsorption and separation. During the Kr analysis process, the analyzed Kr is input into the secondary enrichment unit through helium purging. This process can dynamically adjust the analysis control parameters according to the residual Kr in the primary enrichment unit.

[0072] In response to the above problems, the present application collects the Kr residue in the primary enrichment unit during the analysis process and dynamically adjusts the analysis control parameters.

[0073] Specifically, step S30 in the method includes:

[0074] The Kr residual amount of the primary enrichment unit during the collection and analysis process;

[0075] Based on a preset Kr residual target value, calculating a deviation between the Kr residual and the target value;

[0076] Helium purge parameters are adjusted according to the deviation to obtain analytical control parameters, wherein the helium purge parameters include a purge amount and a purge time.

[0077] In the examples of the present application, the residual Kr content of the primary enrichment unit during the desorption process is first collected. The residual Kr content of the primary enrichment unit is the Kr content remaining in the activated carbon adsorption layer after desorption. For example, a micro-ionization chamber or semiconductor detector is installed in the desorption gas outlet pipe of the primary enrichment unit to directly measure the real-time Kr concentration during the desorption process. The detection principle utilizes the beta radioactivity of Kr-85 for non-contact detection, with a detection limit of up to 0.1 Bq / mL and a response time of <2 seconds.

[0078] Next, based on a preset target value for residual Kr, the deviation between the residual Kr and the target value is calculated. For example, a target value for residual Kr of 5% can be preset (i.e., the residual Kr in the activated carbon bed after desorption does not exceed 5% of the initial amount), which balances recovery efficiency with helium consumption. Furthermore, the absolute deviation ΔKr between the actual residual amount collected in real time and the preset target value for residual Kr is calculated. For example, if the target value for residual Kr is 5% and the actual residual amount is 8% of the initial amount, the absolute deviation ΔKr = 8% - 5% = 3%.

[0079] Finally, helium purge parameters are adjusted based on the deviation to obtain analytical control parameters, wherein the helium purge parameters include a purge volume and a purge time. Specifically, a preset helium purge volume and a preset helium purge time are adjusted based on the deviation to obtain adjusted helium purge volume and adjusted helium purge time, which are used as analytical control parameters to perform analytical control of the primary enrichment unit.

[0080] Furthermore, the “adjusting helium purge parameters according to the deviation to obtain analytical control parameters, wherein the helium purge parameters include purge volume and purge time” includes:

[0081] adjusting a preset helium purge amount according to the deviation to obtain an adjusted helium purge amount;

[0082] adjusting the preset helium purge time according to the deviation to obtain an adjusted helium purge time;

[0083] The analytical control of the primary enrichment unit is performed using the adjusted helium purge amount and the adjusted helium purge time as analytical control parameters.

[0084] In the present embodiment, the preset helium purge volume is first adjusted based on the deviation to obtain an adjusted helium purge volume. The adjusted helium purge volume is calculated as follows: the preset helium purge volume * (1 + deviation). The preset helium purge volume is 50 mL / min, a value derived through extensive experiments and theoretical calculations. For example, if the calculated deviation ΔKr = 3% and the preset helium purge volume is 50 mL / min, then the adjusted helium purge volume = 50 mL / min * (1 + 3%) = 51.5 mL / min. Thus, when the actual residual volume is greater than the preset Kr residual target value, the helium purge volume is increased to ensure Kr analysis efficiency.

[0085] Next, the preset helium purge time is adjusted based on the deviation to obtain an adjusted helium purge time. The adjusted helium purge time is calculated as follows: preset helium purge time * (1 + deviation). The preset helium purge time is 10 minutes, a value derived through extensive experiments and theoretical calculations. For example, if the calculated deviation ΔKr = 3% and the preset helium purge time is 10 minutes, the adjusted helium purge time = 10 minutes * (1 + 3%) = 10.3 minutes. This ensures Kr analysis efficiency by increasing the helium purge time when the actual residual amount exceeds the preset Kr residual target value.

[0086] Finally, the primary enrichment unit's analytical control is performed using the adjusted helium purge volume and time as analytical control parameters. Specifically, the helium purge volume and time are adjusted in real time to maximize analytical efficiency. The adjusted analytical control parameters are transmitted to the solenoid valve and timer via the PLC, achieving an execution accuracy of ±0.1 seconds (for time) and ±0.3 mL / min (for purge volume).

[0087] In summary, compared to existing technologies, this application collects the residual Kr in the primary enrichment unit during the analytical process and dynamically adjusts the analytical control parameters. This dynamic regulation of analytical control parameters is achieved through refined parameter analysis, significantly improving Kr-85 recovery efficiency and providing reliable technical support for radioactive gas detection.

[0088] S40: collecting gas component data input into the secondary enrichment unit through the primary enrichment unit, and dynamically adjusting adsorption control parameters, separation time, and analytical control parameters, wherein the dynamic adjustment process is the same as that of the primary enrichment unit;

[0089] Because TCD chromatography has an upper limit on its separation capacity for the volume of the injected gas, multiple stages of activated carbon are required for separation and enrichment to ensure that the gas entering the chromatographic separation reaches a volume that the chromatographic system can handle. After adsorption, separation, and desorption by the primary enrichment unit, the gas is then fed into the secondary enrichment unit for a second round of adsorption, separation, and desorption. The structure and function of the secondary enrichment unit are identical to those of the primary enrichment unit, and therefore, the control parameters for the secondary enrichment unit are controlled in the same way as for the primary enrichment unit.

[0090] To address the above issues, the present application collects gas component data input into the secondary enrichment unit through the primary enrichment unit, and dynamically adjusts adsorption control parameters, separation time and analytical control parameters, wherein the dynamic adjustment process is the same as that of the primary enrichment unit.

[0091] Specifically, step S40 in the method includes:

[0092] Collecting gas component data input into the secondary enrichment unit through the primary enrichment unit through multiple sensors, wherein the gas component data includes the concentrations of H2O and CO2;

[0093] Inputting the H2O and CO2 concentrations in the gas component data into the dynamic parameter controller, outputting adsorption control parameters, wherein the adsorption control parameters include adsorption temperature and adsorption time, and adsorbing the gas on the secondary enrichment unit using the adsorption control parameters;

[0094] The nitrogen and oxygen sensor collects the residual impurities of the gas during the separation process of the secondary enrichment unit in real time, and triggers the early stop mechanism when the concentration of the residual impurities is less than or equal to a preset threshold;

[0095] The Kr residual amount of the secondary enrichment unit during the analysis process is collected, and the analysis control parameters are dynamically adjusted, wherein the analysis control parameters include helium purge parameters.

[0096] In the embodiment of the present application, gas composition data, including the concentrations of H2O and CO2, is first collected via multiple sensors from the primary enrichment unit into the secondary enrichment unit. For example, a high-precision humidity sensor and a CO2 concentration detector are installed at the entrance of the secondary enrichment unit in the same manner as described in step S10 above to monitor the concentrations of H2O and CO2 entering the secondary enrichment unit in real time. For example, the high-precision humidity sensor installed at the entrance of the secondary enrichment unit detects an H2O concentration of 1.5 ppm, and the CO2 concentration detector detects a CO2 concentration of 2 ppm.

[0097] Next, the H2O and CO2 concentrations from the gas composition data are input into the dynamic parameter controller, which outputs adsorption control parameters, including adsorption temperature and adsorption time. The gas is adsorbed by the secondary enrichment unit using these adsorption control parameters. For example, the H2O and CO2 concentrations from the gas composition data (e.g., H2O concentration of 1.5 ppm and CO2 concentration of 2 ppm) are input into the dynamic parameter controller, which outputs adsorption control parameters (e.g., -85°C and adsorption time of 8 minutes).

[0098] Next, the nitrogen and oxygen sensor collects real-time data on the residual impurities in the gas during the separation process of the secondary enrichment unit. When the concentration of these impurities is less than or equal to a preset threshold, the early stop mechanism is triggered. Specifically, gas separation is performed at a preset separation temperature, and the nitrogen and oxygen sensor collects real-time data on the residual impurities in the gas during the separation process (including the concentrations of O2 and N2). When the concentrations of O2 and N2 are less than or equal to a preset threshold, the early stop mechanism is triggered. The preset threshold is 800 ppm for both O2 and N2.

[0099] Finally, the residual Kr content of the secondary enrichment unit during the analytical process is collected, and analytical control parameters, including helium purge parameters, are dynamically adjusted. Specifically, the residual Kr content of the secondary enrichment unit during the analytical process is collected, and based on a preset target Kr residual content, the deviation between the residual Kr content and the target value is calculated. The helium purge parameters are adjusted based on the deviation to obtain analytical control parameters, including purge volume and purge time.

[0100] In summary, compared to the prior art, this application collects gas composition data from the primary enrichment unit and feeds it into the secondary enrichment unit, dynamically adjusting adsorption control parameters, separation time, and desorption control parameters. The dynamic regulation process is identical to that of the primary enrichment unit. This second round of adsorption, separation, and desorption ensures that the gas entering the chromatographic separation reaches a volume that the chromatographic system can handle.

[0101] S50: Obtaining the Xe / Kr concentration ratio of the gas input into the chromatographic separation unit through the secondary enrichment unit, and dynamically adjusting the temperature of the TCD chromatographic column.

[0102] In the prior art, the temperature of the TCD column in chromatographic separation is usually fixed. However, due to the fluctuation of the concentration of gases Xe and Kr, the separation effect is poor.

[0103] In response to the above problems, the present application obtains the Xe / Kr concentration ratio of the gas input into the chromatographic separation unit through the secondary enrichment unit and dynamically controls the temperature of the TCD chromatographic column.

[0104] Specifically, step S50 in the method includes:

[0105] collecting Xe and Kr concentrations of the gas input into the chromatographic separation unit through the secondary enrichment unit, and calculating the Xe / Kr concentration ratio;

[0106] Input the Xe / Kr concentration ratio into a mapping table of Xe / Kr concentration ratio and TCD column temperature, and output the obtained TCD column temperature;

[0107] Xe is separated by the TCD column temperature, and Kr is passed into a liquid scintillation detector for detection.

[0108] In the embodiment of the present application, the Xe and Kr concentrations of the gas input into the chromatographic separation unit through the secondary enrichment unit are first collected, and the Xe / Kr concentration ratio is calculated. For example, a micro mass spectrometer or laser Raman spectrometer is installed between the outlet of the secondary enrichment unit and the inlet of the chromatographic separation unit to analyze the gas composition data in real time. The mass spectrometry method uses the Xe (main isotopes ¹³²Xe, ¹³¹Xe) and Kr (main isotopes 84 Kr, 86The laser Raman method is to detect the difference in mass-to-charge ratio of Xe (peak at 299 cm) and Kr (peak at 299 cm) to quantitatively analyze the difference in mass-to-charge ratio of Xe (131-136 amu, Kr: 80-86 amu). The detection limit is 0.1 ppm. ⁻¹ ) and Kr (peak 218 cm ⁻¹ ) characteristic Raman scattering peak intensity ratio, enabling non-contact measurement. Furthermore, the Xe / Kr concentration ratio = Xe concentration / Kr concentration. For example, if Xe = 50 ppm and Kr = 100 ppm, Xe / Kr = 50 / 100 = 0.5.

[0109] Next, the Xe / Kr concentration ratio is input into a mapping table of Xe / Kr concentration ratios and TCD column temperatures, and the TCD column temperature is obtained as the output. This mapping table establishes a correspondence between the Xe / Kr concentration ratio and the optimal separation temperature based on chromatographic separation theory (the Van Deemter equation). The mapping table is generated by fitting experimental data and covers common concentration ratio ranges. For example, Xe / Kr concentration ratios of 0.1-0.3, 0.3-0.7, 0.7-1.2, and 1.2-2.0 correspond to column temperatures of 30±1°C, 40±1°C, 45±1°C, and 50±1°C. For example, an Xe / Kr concentration ratio (e.g., 0.5) is input into the mapping table, and the TCD column temperature (e.g., 40±1°C) is obtained as the output.

[0110] Finally, Xe is separated using the TCD column temperature, and Kr is detected by a liquid scintillation detector. For example, a PWM (pulse width modulation) controller can be used to adjust the column heating element, achieving a temperature control accuracy of ±0.1°C and a heating / cooling rate of ≤5°C / min to avoid thermal stress damage. This effectively separates Xe. Furthermore, Kr is detected by a liquid scintillation detector.

[0111] In summary, compared to existing technologies, this application obtains the Xe / Kr concentration ratio of the gas entering the chromatographic separation unit through the secondary enrichment unit and dynamically controls the TCD column temperature. Thus, by real-time monitoring of the Xe / Kr concentration ratio and dynamic adjustment of the column temperature, efficient krypton and xenon separation and precise detection are achieved.

[0112] In summary, the embodiments of the present application have at least the following technical effects:

[0113] Compared to existing technologies, this application first collects gas composition data for the primary enrichment unit after pre-cleaning, then feeds this data into a pre-trained dynamic parameter controller, outputting adsorption control parameters. Gas adsorption is then performed using these adsorption control parameters. In this way, even when the input gas composition data fluctuates, the adsorption control parameters of the primary enrichment unit are dynamically adjusted through artificial intelligence, providing reliable support for high-precision detection using the liquid scintillation spectrometer Kr-85.

[0114] Secondly, this application dynamically controls the separation time based on the residual impurities in the gases collected during the separation process by the nitrogen and oxygen sensors in real time. This shifts the separation process from crude time control to precise control based on real-time data, achieving multi-objective optimization of detection efficiency, energy consumption, and accuracy.

[0115] Thirdly, the present invention collects the residual Kr in the primary enrichment unit during the analytical process and dynamically adjusts the analytical control parameters. Thus, through refined parameter analysis, dynamic regulation of analytical control parameters is achieved, significantly improving the recovery efficiency of Kr-85 and providing reliable technical support for radioactive gas detection.

[0116] Furthermore, the present application collects gas composition data from the primary enrichment unit and feeds it into the secondary enrichment unit, dynamically adjusting adsorption control parameters, separation time, and desorption control parameters. The dynamic regulation process is identical to that of the primary enrichment unit. This second round of adsorption, separation, and desorption ensures that the gas entering the chromatographic separation reaches a volume that the chromatographic system can process.

[0117] Finally, the present invention obtains the Xe / Kr concentration ratio of the gas entering the chromatographic separation unit through the secondary enrichment unit and dynamically controls the TCD column temperature. Thus, by monitoring the Xe / Kr concentration ratio in real time and dynamically adjusting the column temperature, efficient krypton and xenon separation and precise detection are achieved.

[0118] Through the above technical solution, the present application fully considers the dynamic fluctuations of many control parameters involved in the liquid scintillation spectrometer Kr-85 detection process with the gas composition data, and controls the adsorption temperature and time based on the concentrations of H2O and CO2, controls the separation time according to the residual amount of impurities, controls the analytical parameters according to the residual amount of Kr, controls the chromatographic column temperature according to the Xe / Kr concentration ratio, etc., which can effectively separate Kr-85 and reduce impurity interference, thereby significantly improving the accuracy and reliability of the liquid scintillation spectrometer's Kr-85 detection results.

[0119] Example 2, as Figure 2 As shown, based on the same inventive concept as the method for controlling and adjusting detection parameters of a liquid scintillation spectrometer Kr-85 provided in Example 1, an embodiment of the present invention further provides a system for controlling and adjusting detection parameters of a liquid scintillation spectrometer Kr-85, comprising:

[0120] The adsorption control module 11 is used to collect gas component data input into the primary enrichment unit after pre-impurity removal, input the gas component data into a pre-trained dynamic parameter controller, output adsorption control parameters, and perform gas adsorption with the adsorption control parameters;

[0121] The separation control module 12 is used to dynamically adjust the separation time according to the real-time collection of the residual impurities in the gas during the separation process by the nitrogen and oxygen sensor;

[0122] The analysis control module 13 is used to collect the Kr residual amount of the primary enrichment unit during the analysis process and dynamically adjust the analysis control parameters, wherein the analysis control parameters include helium purge parameters;

[0123] A collaborative control module 14 is used to collect gas component data processed by the primary enrichment unit and input into the secondary enrichment unit, and dynamically adjust adsorption control parameters, separation time, and analytical control parameters, wherein the dynamic adjustment process is the same as that of the primary enrichment unit;

[0124] The chromatographic temperature control module 15 is used to obtain the Xe / Kr concentration ratio of the gas input into the chromatographic separation unit through the secondary enrichment unit and dynamically adjust the temperature of the TCD chromatographic column.

[0125] The adsorption control module 11 is specifically used to:

[0126] The gas component data input into the primary enrichment unit after pre-impurity removal is collected by multiple sensors, wherein the pre-impurity removal is to remove H2O and CO2 in the gas through the impurity removal tank, and the gas component data includes the concentration of H2O and CO2;

[0127] When the gas composition data exceeds a preset threshold, an alarm is triggered and a backup impurity removal tank is activated;

[0128] Inputting the gas composition data into a dynamic parameter controller and outputting adsorption control parameters, wherein the adsorption control parameters include adsorption temperature and adsorption time;

[0129] The gas is adsorbed in the first-stage enrichment unit using the adsorption control parameters.

[0130] Furthermore, the training steps of the "dynamic parameter controller" include:

[0131] According to the historical database of the liquid scintillation spectrometer, a sample gas component data set is collected, and the optimal adsorption control parameters of the next-level enrichment unit of different sample gas component data are collected, and the sample adsorption control parameter set is obtained by annotation;

[0132] Construct a dynamic parameter controller based on LSTM neural network;

[0133] Under the sample gas component data set and the sample adsorption control parameter set, supervised training parameter optimization is performed on the dynamic parameter controller, and the training is completed after the test accuracy converges.

[0134] The separation control module 12 is specifically configured to:

[0135] Separating the gas at a preset separation temperature;

[0136] collecting the residual impurities of the gas in the separation process in real time using a nitrogen and oxygen sensor, wherein the residual impurities include the concentrations of O2 and N2;

[0137] When the O2 and N2 concentrations are less than or equal to a preset threshold, the early stop mechanism is triggered, wherein the preset threshold is 1000 ppm of the O2 and N2 concentrations.

[0138] The analysis control module 13 is specifically configured to:

[0139] The Kr residual amount of the primary enrichment unit during the collection and analysis process;

[0140] Based on a preset Kr residual target value, calculating a deviation between the Kr residual and the target value;

[0141] Helium purge parameters are adjusted according to the deviation to obtain analytical control parameters, wherein the helium purge parameters include a purge amount and a purge time.

[0142] Furthermore, the “adjusting helium purge parameters according to the deviation to obtain analytical control parameters, wherein the helium purge parameters include purge volume and purge time” includes:

[0143] adjusting a preset helium purge amount according to the deviation to obtain an adjusted helium purge amount;

[0144] adjusting the preset helium purge time according to the deviation to obtain an adjusted helium purge time;

[0145] The analytical control of the primary enrichment unit is performed using the adjusted helium purge amount and the adjusted helium purge time as analytical control parameters.

[0146] The collaborative control module 14 is specifically configured to:

[0147] Collecting gas component data input into the secondary enrichment unit through the primary enrichment unit through multiple sensors, wherein the gas component data includes the concentrations of H2O and CO2;

[0148] Inputting the H2O and CO2 concentrations in the gas component data into the dynamic parameter controller, outputting adsorption control parameters, wherein the adsorption control parameters include adsorption temperature and adsorption time, and adsorbing the gas on the secondary enrichment unit using the adsorption control parameters;

[0149] The nitrogen and oxygen sensor collects the residual impurities of the gas during the separation process of the secondary enrichment unit in real time, and triggers the early stop mechanism when the concentration of the residual impurities is less than or equal to a preset threshold;

[0150] The Kr residual amount of the secondary enrichment unit during the analysis process is collected, and the analysis control parameters are dynamically adjusted, wherein the analysis control parameters include helium purge parameters.

[0151] Wherein, the chromatographic temperature control module 15 is specifically used for:

[0152] collecting Xe and Kr concentrations of the gas input into the chromatographic separation unit through the secondary enrichment unit, and calculating the Xe / Kr concentration ratio;

[0153] Input the Xe / Kr concentration ratio into a mapping table of Xe / Kr concentration ratio and TCD column temperature, and output the obtained TCD column temperature;

[0154] Xe is separated by the TCD column temperature, and Kr is passed into a liquid scintillation detector for detection.

[0155] In summary, the embodiments of the present application have at least the following technical effects:

[0156] Compared to the prior art, this application first uses an adsorption control module to collect gas composition data from the primary enrichment unit after pre-cleaning. This gas composition data is then fed into a pre-trained dynamic parameter controller, which outputs adsorption control parameters. Gas adsorption is performed using these adsorption control parameters. When the input gas composition data fluctuates, the adsorption control parameters of the primary enrichment unit are dynamically adjusted through artificial intelligence, providing reliable support for high-precision detection of Kr-85 by liquid scintillation spectrometers. Secondly, a separation control module dynamically adjusts the preset separation time based on real-time data-based data collection of gas impurity residues during the separation process, transforming the separation process from extensive time control to precise control based on real-time data, achieving multi-objective optimization of detection efficiency, energy consumption, and accuracy. Thirdly, an analysis control module collects Kr residues in the primary enrichment unit during the analysis process and dynamically adjusts the analysis control parameters. Through refined parameter analysis, dynamic regulation of the analysis control parameters is achieved, significantly improving Kr-85 recovery efficiency and providing reliable technical support for radioactive gas detection. Furthermore, the collaborative control module collects gas composition data from the primary enrichment unit into the secondary enrichment unit, dynamically adjusting adsorption control parameters, separation time, and desorption control parameters. This allows for a second round of adsorption, separation, and desorption, further ensuring that the volume of gas entering the chromatographic separation unit reaches a volume that the chromatographic system can handle. Finally, the chromatographic temperature control module obtains the Xe / Kr concentration ratio of the gas entering the chromatographic separation unit through the secondary enrichment unit, dynamically adjusting the TCD column temperature. By monitoring the Xe / Kr concentration ratio in real time and dynamically adjusting the column temperature, efficient krypton and xenon separation and precise detection are achieved. This significantly improves the accuracy and reliability of Kr-85 detection results using liquid scintillation spectrometers.

[0157] It should be noted that, in the above embodiments, the description of each embodiment has its own focus. For parts that are not described in detail in a certain embodiment, reference can be made to the relevant descriptions of other embodiments.

[0158] Those skilled in the art will appreciate that embodiments of the present invention may be provided as methods, systems, or computer program products. Thus, the present invention may take the form of an entirely hardware embodiment, an entirely software embodiment, or an embodiment combining software and hardware aspects. Furthermore, the present invention may take the form of a computer program product implemented on one or more computer-usable storage media (including but not limited to magnetic disk storage, CD-ROM, optical storage, etc.) containing computer-usable program code.

[0159] The present invention is described with reference to flowcharts and / or block diagrams of methods, devices (systems), and computer program products according to embodiments of the present invention. It should be understood that each process and / or block in the flowcharts and / or block diagrams, as well as combinations of processes and / or blocks in the flowcharts and / or block diagrams, can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general-purpose computer, a special-purpose computer, an embedded computer, or other programmable data processing device to produce a machine, so that the instructions executed by the processor of the computer or other programmable data processing device generate instructions for implementing the processes in the flowcharts and / or block diagrams. Figure 1 a process or multiple processes and / or boxes Figure 1 A device that provides the functions specified in a block or multiple blocks.

[0160] These computer program instructions may also be stored in a computer readable memory that can direct a computer or other programmable data processing device to work in a specific manner, so that the instructions stored in the computer readable memory produce an article of manufacture comprising an instruction device, which implements the process Figure 1 a process or multiple processes and / or boxes Figure 1 The function specified in one or more boxes.

[0161] These computer program instructions can also be loaded onto a computer or other programmable data processing device so that a series of operational steps are executed on the computer or other programmable device to produce a computer-implemented process, thereby providing the instructions executed on the computer or other programmable device for implementing the process. Figure 1 a process or multiple processes and / or boxes Figure 1 A step that specifies a function in one or more boxes.

[0162] Although preferred embodiments of the present invention have been described, additional changes and modifications to these embodiments may occur to those skilled in the art once the basic inventive concepts become known.

[0163] Obviously, those skilled in the art can make various changes and modifications to the present invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the present invention and its equivalents, the present invention is also intended to include these modifications and variations.

Claims

1. A method for controlling and adjusting detection parameters of a liquid scintillation spectrometer Kr-85, characterized in that: The method comprises: Collecting gas component data input into the primary enrichment unit after pre-impurity removal, inputting the gas component data into a pre-trained dynamic parameter controller, outputting adsorption control parameters, and adsorbing the gas using the adsorption control parameters, wherein the gas component data includes the concentrations of H2O and CO2; According to the historical database of the liquid scintillation spectrometer, a sample gas component data set is collected, and the optimal adsorption control parameters of the next-level enrichment unit of different sample gas component data are collected, and the sample adsorption control parameter set is obtained by annotation; Construct a dynamic parameter controller based on LSTM neural network; Performing supervised training parameter optimization on the dynamic parameter controller based on the sample gas component data set and the sample adsorption control parameter set, and completing the training after the test accuracy converges; Dynamically adjust the separation time based on the real-time collection of the residual impurities of the gas during the separation process by the nitrogen and oxygen sensor, wherein the residual impurities include the concentrations of O2 and N2; Collecting the Kr residual amount in the primary enrichment unit during the analysis process, and dynamically adjusting the analysis control parameters, wherein the analysis control parameters include helium purge parameters; Collecting gas component data input into the secondary enrichment unit through the primary enrichment unit, and dynamically adjusting adsorption control parameters, separation time, and analytical control parameters, wherein the dynamic adjustment process is the same as that of the primary enrichment unit, wherein the adsorption control parameters include adsorption temperature and adsorption time; Obtaining the Xe / Kr concentration ratio of the gas input into the chromatographic separation unit through the secondary enrichment unit, and dynamically adjusting the temperature of the TCD chromatographic column; collecting Xe and Kr concentrations of the gas input into the chromatographic separation unit through the secondary enrichment unit, and calculating the Xe / Kr concentration ratio; Input the Xe / Kr concentration ratio into a mapping table of Xe / Kr concentration ratio and TCD column temperature, and output the obtained TCD column temperature; Xe is separated by the TCD column temperature, and Kr is passed into a liquid scintillation detector for detection.

2. The method for controlling and adjusting detection parameters of a liquid scintillation spectrometer Kr-85 according to claim 1, characterized in that: Collecting gas component data input into the primary enrichment unit after pre-impurity removal, inputting the gas component data into a pre-trained dynamic parameter controller, outputting adsorption control parameters, and adsorbing the gas using the adsorption control parameters, including: The gas component data input into the primary enrichment unit after pre-impurity removal is collected by multiple sensors, wherein the pre-impurity removal is to remove H2O and CO2 in the gas through the impurity removal tank, and the gas component data includes the concentration of H2O and CO2; When the gas composition data exceeds a preset threshold, an alarm is triggered and a backup impurity removal tank is activated; Inputting the gas composition data into a dynamic parameter controller and outputting adsorption control parameters, wherein the adsorption control parameters include adsorption temperature and adsorption time; The gas is adsorbed in the first-stage enrichment unit using the adsorption control parameters.

3. The method for controlling and adjusting detection parameters of a liquid scintillation spectrometer Kr-85 according to claim 1, characterized in that: According to the real-time collection of the residual impurities of the gas during the separation process by the nitrogen and oxygen sensor, the preset separation time is dynamically adjusted, including: Separating the gas at a preset separation temperature; collecting the residual impurities of the gas in the separation process in real time using a nitrogen and oxygen sensor, wherein the residual impurities include the concentrations of O2 and N2; When the O2 and N2 concentrations are less than or equal to a preset threshold, the early stop mechanism is triggered, wherein the preset threshold is 1000 ppm of the O2 and N2 concentrations.

4. The method for controlling and adjusting detection parameters of a liquid scintillation spectrometer Kr-85 according to claim 1, characterized in that: The residual amount of Kr in the primary enrichment unit during the analysis process is collected, and the analysis control parameters are dynamically adjusted, wherein the analysis control parameters include helium purge parameters, including: The Kr residual amount of the primary enrichment unit during the collection and analysis process; Based on a preset Kr residual target value, calculating the deviation of the Kr residual amount from the target value; Helium purge parameters are adjusted according to the deviation to obtain analytical control parameters, wherein the helium purge parameters include a purge amount and a purge time.

5. The method for controlling and adjusting detection parameters of a liquid scintillation spectrometer Kr-85 according to claim 4, characterized in that: Adjusting helium purge parameters according to the deviation to obtain analytical control parameters, wherein the helium purge parameters include purge volume and purge time, including: adjusting a preset helium purge amount according to the deviation to obtain an adjusted helium purge amount; adjusting the preset helium purge time according to the deviation to obtain an adjusted helium purge time; The analytical control of the primary enrichment unit is performed using the adjusted helium purge amount and the adjusted helium purge time as analytical control parameters.

6. The method for controlling and adjusting detection parameters of a liquid scintillation spectrometer Kr-85 according to claim 1, characterized in that: Collect gas component data input into the secondary enrichment unit through the primary enrichment unit, and dynamically adjust adsorption control parameters, separation time, and analytical control parameters. The dynamic adjustment process is the same as that of the primary enrichment unit, including: Collecting gas component data input into the secondary enrichment unit through the primary enrichment unit through multiple sensors, wherein the gas component data includes the concentrations of H2O and CO2; Inputting the H2O and CO2 concentrations in the gas component data into the dynamic parameter controller, outputting adsorption control parameters, wherein the adsorption control parameters include adsorption temperature and adsorption time, and adsorbing the gas on the secondary enrichment unit using the adsorption control parameters; The nitrogen and oxygen sensor collects the residual impurities of the gas during the separation process of the secondary enrichment unit in real time, and triggers the early stop mechanism when the concentration of the residual impurities is less than or equal to a preset threshold; The Kr residual amount of the secondary enrichment unit during the analysis process is collected, and the analysis control parameters are dynamically adjusted, wherein the analysis control parameters include helium purge parameters.

7. A liquid scintillation spectrometer Kr-85 detection parameter control and adjustment system, characterized in that: Used to perform the method according to any one of claims 1 to 6, comprising: An adsorption control module is used to collect gas component data input into the primary enrichment unit after pre-impurity removal, input the gas component data into a pre-trained dynamic parameter controller, output adsorption control parameters, and perform gas adsorption with the adsorption control parameters; A separation control module is used to collect the residual impurities of the gas in the separation process in real time according to the nitrogen and oxygen sensor, and dynamically adjust the separation time; An analysis control module is used to collect the Kr residual amount of the primary enrichment unit during the analysis process and dynamically adjust the analysis control parameters, wherein the analysis control parameters include helium purge parameters; A collaborative control module, configured to collect gas component data processed by the primary enrichment unit and input into the secondary enrichment unit, and dynamically adjust adsorption control parameters, separation time, and analytical control parameters, wherein the dynamic adjustment process is the same as that of the primary enrichment unit; The chromatographic temperature control module is used to obtain the Xe / Kr concentration ratio of the gas input into the chromatographic separation unit through the secondary enrichment unit and dynamically adjust the TCD chromatographic column temperature.

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