Electrode preparation method and device and solar cell

Abstract

The invention relates to an electrode preparation method and device and a solar cell, an organic polymer thin film is formed on the surface of a cell substrate, the organic polymer thin film is etched to form a groove penetrating through the organic polymer thin film, the width of the groove can be smaller at the moment, slurry is filled in the groove, and the thickness of the groove is reduced. And the preparation of the electrode is completed after the residual organic polymer film is removed. According to the electrode preparation method, the electrode with smaller width and higher resolution can be prepared, the shading rate of the solar cell can be reduced, the contact resistance can be improved, and the photoelectric conversion efficiency of the solar cell can be improved.

Description

Technical Field

[0001] The present application relates to the technical field of solar cell preparation, and in particular to an electrode preparation method and device thereof, and a solar cell. Background Art

[0002] In the field of solar cell preparation technology, optimizing the electrode preparation technology of solar cells is an important way to reduce the contact resistance of solar cells and improve the photoelectric conversion efficiency of solar cells.

[0003] Currently, the preparation of solar cell electrodes is mainly achieved through screen printing technology. The preparation of electrodes through screen printing technology has the following disadvantages: 1. The metal screen is limited by its service life; 2. During large-scale mass production, the storage and use of the screen are cumbersome and occupy a large area; 3. The pattern resolution of the screen is poor, making it difficult to print electrodes with a width of less than 20μm, and the edges of the transferred electrodes are rough; 4. The customization cycle of the screen is long, and multiple screens are often required to obtain different electrode patterns. Summary of the Invention

[0004] Based on this, it is necessary to provide an electrode preparation method and its device and solar cell to address the above technical problems.

[0005] In a first aspect, the present application provides a method for preparing an electrode, comprising:

[0006] forming an organic polymer film on the surface of the cell substrate;

[0007] etching the organic polymer film to form a groove penetrating the organic polymer film;

[0008] Filling the groove with slurry;

[0009] The remaining organic polymer film is removed to form an electrode.

[0010] On the one hand, the above-mentioned electrode preparation method abandons the conventional screen printing step, thereby shortening the electrode preparation cycle and avoiding the tedious storage and use of the screen. On the other hand, the electrode preparation method in this application forms an organic polymer film on the surface of the cell substrate, etches the organic polymer film to form a groove penetrating the organic polymer film, and the groove width can be made smaller at this time. The groove is filled with slurry, and the electrode preparation is completed after removing the remaining organic polymer film. This application can prepare electrodes with smaller width and higher resolution, which is beneficial to reduce the shading rate of solar cells and increase contact resistance, thereby improving the photoelectric conversion efficiency of solar cells.

[0011] In one embodiment, forming an organic polymer film on the surface of the cell substrate includes:

[0012] The organic polymer film is formed on the surface of the cell substrate by physical vapor deposition.

[0013] In one embodiment, the material of the organic polymer film includes at least one of polyvinyl pyrrolidone, polymethyl methacrylate, polyethylene terephthalate, and fluorine-containing resin.

[0014] In one embodiment, the thickness of the organic polymer film is 20 μm to 100 μm.

[0015] In one embodiment, etching the organic polymer film to form a groove penetrating the organic polymer film comprises:

[0016] etching the organic polymer film using an electron beam to form a plurality of electrode patterns penetrating the organic polymer film;

[0017] The battery cell substrate is immersed in a developing solution to develop the plurality of electrode patterns into a plurality of grooves.

[0018] In one embodiment, the width of each groove is 1 μm to 50 μm, and the spacing between adjacent grooves is 1 μm to 50 μm.

[0019] In one embodiment, before etching the organic polymer film to form a groove penetrating the organic polymer film, the method further comprises:

[0020] The organic polymer film is annealed to solidify the organic polymer film on the surface of the cell substrate.

[0021] In one embodiment, the temperature for annealing the organic polymer film is 80 degrees Celsius to 250 degrees Celsius.

[0022] In one embodiment, before removing the organic polymer film, the method further comprises:

[0023] The slurry in the cell substrate is dried at a preset temperature.

[0024] In one embodiment, it further includes:

[0025] The slurry is sintered to form an electrode.

[0026] In a second aspect, the present application provides an electrode preparation device, comprising:

[0027] A thin film deposition module is used to form an organic polymer thin film on the surface of the cell substrate;

[0028] an etching module, configured to etch the organic polymer film to form a groove penetrating the organic polymer film;

[0029] A slurry filling module, used for filling the groove with slurry;

[0030] The cleaning module is used to remove the remaining organic polymer film.

[0031] The above-mentioned electrode preparation device forms an organic polymer film on the surface of the battery cell substrate through a thin film deposition module, etches the organic polymer film through an etching module to form a groove that penetrates the organic polymer film. At this time, the groove width can be made smaller, and then the slurry is filled in the groove through a slurry filling module. Finally, the remaining organic polymer film is removed through a cleaning module to form an electrode. Therefore, the electrode preparation device in this application can prepare electrodes with smaller width and higher resolution, which is beneficial to reduce the shading rate of solar cells and increase contact resistance, thereby improving the photoelectric conversion efficiency of solar cells.

[0032] In one embodiment, it further includes:

[0033] The annealing module is used to perform annealing treatment on the organic polymer film to solidify the organic polymer film on the surface of the battery cell substrate.

[0034] In one embodiment, it further includes:

[0035] The drying module is used to dry the slurry in the cell substrate at a preset temperature.

[0036] In one embodiment, it further includes:

[0037] The sintering module is used to sinter the slurry to form an electrode.

[0038] In a third aspect, the present application provides a solar cell, comprising an electrode prepared by the electrode preparation method as described above or an electrode prepared by the electrode preparation device as described above.

[0039] The above-mentioned solar cell includes an electrode prepared by the electrode preparation method or electrode preparation device in this application. Since the electrode preparation method and electrode preparation device in this application can prepare electrodes with smaller width and higher resolution, the solar cell in this application can have a lower shading rate and a larger contact resistance under the action of the electrode, thereby having a higher photoelectric conversion efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0040] In order to more clearly illustrate the technical solutions in the embodiments of the present application or related technologies, the following briefly introduces the drawings required for use in the embodiments or related technical descriptions. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0041] Figure 1 This is one of the flow charts of the electrode preparation method in one embodiment of the present application;

[0042] Figure 2 This is a schematic structural diagram of a cell substrate having an organic polymer film formed thereon in one embodiment of the present application;

[0043] Figure 3 This is a schematic structural diagram of a groove in an embodiment of the present application;

[0044] Figure 4 Schematic diagram of a process of etching an organic polymer film to form a groove penetrating the organic polymer film in one embodiment of the present application;

[0045] Figure 5 This is a second flow chart of the electrode preparation method in one embodiment of the present application;

[0046] Figure 6 This is a third flow chart of the electrode preparation method in one embodiment of the present application;

[0047] Figure 7 FIG4 is a fourth flow chart of the electrode preparation method in one embodiment of the present application;

[0048] Figure 8 FIG5 is a fifth flow chart of the electrode preparation method in one embodiment of the present application;

[0049] Figure 9 Schematic diagram of the structure of an electrode preparation device in one embodiment of the present application. DETAILED DESCRIPTION

[0050] To make the above-mentioned objects, features, and advantages of the present application more clearly understood, the specific embodiments of the present application are described in detail below with reference to the accompanying drawings. The following description sets forth many specific details to facilitate a full understanding of the present application. However, the present application can be implemented in many other ways than those described herein, and those skilled in the art can make similar improvements without violating the scope of the present application. Therefore, the present application is not limited to the specific embodiments disclosed below.

[0051] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0052] Furthermore, in this application, unless otherwise expressly specified or limited, the terms "installed," "connected," "connect," "fixed," and the like should be understood in a broad sense. For example, they may refer to fixed connections, detachable connections, or integration; mechanical connections, electrical connections; direct connections, or indirect connections through an intermediate medium; and internal connections between two components or interactions between two components, unless otherwise expressly limited. Those skilled in the art will understand the specific meanings of the above terms in this application based on specific circumstances.

[0053] See Figure 1 , Figure 1 One of the flow charts of the electrode preparation method in one embodiment of the present application is shown. The solar cell preparation method provided in one embodiment of the present application includes the following steps S102 to S108.

[0054] Step S102 , forming an organic polymer film on the surface of the cell substrate.

[0055] See Figure 2 , Figure 2 Figure 2 is a schematic diagram of the structure of a cell substrate 210 formed with an organic polymer film 220 in this embodiment. The organic polymer film 220 is disposed on the surface of the cell substrate 210. Depending on the type of solar cell, the corresponding cell substrate 210 also varies. The cell substrate 210 in this embodiment can be any cell substrate 210 corresponding to the solar cell type. For example, for a monocrystalline silicon solar cell, the corresponding cell substrate 210 can be a monocrystalline silicon wafer, which can be an N-type silicon wafer or a P-type silicon wafer; for a polycrystalline silicon solar cell, the corresponding cell substrate 210 can be a polycrystalline silicon wafer; and for a perovskite solar cell, the corresponding cell substrate 210 can be a conductive glass substrate, without limitation.

[0056] The organic polymer film can be any micron-sized film capable of being etched as a mask layer. The material used for the film includes, but is not limited to, at least one of polyvinyl pyrrolidone (PVP), polymethyl methacrylate (PMMA), polyethylene terephthalate (PET), and fluorine-containing resin (CYTOP). It is understood that as long as the organic polymer film can be etched, the examples of the materials used in this embodiment are merely illustrative and do not limit the material.

[0057] Specifically, methods for forming an organic polymer film on the surface of a cell substrate include, but are not limited to, spin coating, doctor blade coating, spray coating, and physical vapor deposition.

[0058] In one exemplary embodiment, the preparation of an organic polymer film on a cell substrate surface by spin coating primarily includes the following steps: evenly coating the cell substrate surface with a pre-prepared organic polymer film preparation solution; placing the cell substrate on a rotating disk; and rapidly rotating the rotating disk for a predetermined period of time to prepare the organic polymer film. The rapid rotation of the rotating disk generates centrifugal force, which causes the organic polymer film preparation solution coated on the cell substrate to be flung outward, causing the organic polymer film preparation solution coated on the cell substrate to become thinner during the rotation until a film of the target thickness is formed. After the rotating disk stops rotating, the solvent in the organic polymer film preparation solution gradually evaporates, causing the material remaining on the cell substrate surface to solidify and form an organic polymer film. In order to speed up the solidification of the material remaining on the surface of the battery cell substrate, the material remaining on the surface of the battery cell substrate can also be heated, wherein the heating temperature can be 100 degrees Celsius (℃) ~ 200 degrees Celsius (℃), such as 100℃, 110℃, 120℃, 130℃, 160℃, 170℃, 180℃, 190℃, 200℃ and so on.

[0059] In another exemplary embodiment, the organic polymer film is formed on the surface of a cell substrate by doctor blade coating, which primarily includes the following steps: adjusting the doctor blade to a set angle; adjusting the distance between the doctor blade and the cell substrate to a predetermined distance, where the predetermined distance is equal to the thickness of the organic polymer film; injecting the organic polymer film preparation solution onto the cell substrate surface; controlling the horizontal movement of the doctor blade to create relative motion between the doctor blade and the substrate during doctor blade coating, thereby forming a continuous, crystallized organic polymer film on the substrate surface; and after the cell substrate surface is fully coated with the organic polymer film, performing a consolidation treatment on the organic polymer film. Methods for consolidating the organic polymer film include, but are not limited to, heating and freezing. For example, the organic polymer film can be heated at a temperature between 100 and 200 degrees Celsius (°C) to cure the organic polymer film under the heating conditions. Specifically, the heating temperature can be 100°C, 110°C, 120°C, 130°C, 160°C, 170°C, 180°C, 190°C, 200°C, and so on.

[0060] In another exemplary embodiment, the organic polymer film is formed on the surface of the cell substrate by physical vapor deposition, primarily comprising the following steps: irradiating a target with a pulsed laser of a preset intensity; the organic polymer material on the target surface is heated and melted by the pulsed laser, vaporizing until it becomes a plasma (typically in an ambient gas) and transported from the target to the cell substrate. Finally, the ablated material transported to the cell substrate condenses on the cell substrate surface, nucleating to form an organic polymer film. After the cell substrate surface is fully coated with the organic polymer film, the organic polymer film is subjected to a consolidation treatment. Methods for consolidating the organic polymer film include, but are not limited to, heating and freezing. For example, the organic polymer film can be heated at a temperature between 100°C and 200°C, thereby curing the organic polymer film under the heating conditions. Specifically, the heating temperature can be 100°C, 110°C, 120°C, 130°C, 160°C, 170°C, 180°C, 190°C, 200°C, and so on.

[0061] Among them, since the subsequent steps require etching through the organic polymer film to form grooves and filling the grooves with slurry to form the final electrodes, the thickness of the organic polymer film formed in this embodiment can be flexibly set according to the requirements of the solar cell for electrode thickness. For example, it can be 20μm~100μm, such as 20μm, 25μm, 30μm, 50μm, 80μm, 90μm, 95μm, 100μm, etc.

[0062] In step S104 , the organic polymer film is etched to form grooves penetrating the organic polymer film.

[0063] See Figure 3 3 is a schematic diagram of the structure of the groove 310 in this embodiment. The groove 310 penetrates the organic polymer film, and the battery cell substrate 210 can be exposed through the groove 310.

[0064] Specifically, the method for etching the organic polymer film can be selected based on the material from which the organic polymer film is prepared. For example, if the organic polymer film comprises polymethyl methacrylate, the organic polymer film can serve as a photoresist layer. Accordingly, the organic polymer film can be etched using optical methods such as laser direct writing, electron beam direct writing, and photolithography-assisted reactive ion etching. For example, etching the organic polymer film using laser direct writing technology primarily involves the following steps: using a variable-intensity laser to perform variable-dose exposure on the location of the organic polymer film where the electrode pattern is to be formed, and then forming grooves on the surface of the electrode pattern using a developer.

[0065] For another example, see the attached Figure 4 , attached Figure 4 4 is a schematic diagram of a process of etching an organic polymer film to form a groove penetrating the organic polymer film in this embodiment. In this embodiment, the process of etching an organic polymer film to form a groove penetrating the organic polymer film includes the following steps S402 to S404.

[0066] In step S402 , the organic polymer film is etched using an electron beam to form a plurality of electrode patterns penetrating the organic polymer film.

[0067] Among them, the resolution of the electrode pattern formed by etching the organic polymer film by electron beam can be less than 1 μm, thereby achieving higher resolution of the prepared electrode.

[0068] In step S404 , the cell substrate is immersed in a developing solution to develop the plurality of electrode patterns into a plurality of grooves.

[0069] The material of the developer includes but is not limited to isopropyl alcohol and methyl isobutyl ketone. Under the action of the developer, each electrode pattern can be displayed as a groove.

[0070] Among them, the number of grooves in this embodiment is multiple, and the spacing between adjacent grooves can be 1μm~50μm, such as 1μm, 5μm, 10μm, 15μm, 20μm, 25μm, 30μm, 40μm, 50μm, etc. The width of each groove can be set according to the requirements of the solar cell for shading rate, contact resistance, etc. Since the grooves are directly etched in the organic polymer film, the width of the groove can be less than 5μm and a high-resolution electrode pattern can be prepared. For example, the groove width in this embodiment can be 1μm~50μm, such as 1μm, 5μm, 10μm, 15μm, 20μm, 25μm, 30μm, 40μm, 50μm, etc.

[0071] Step S106 , filling the groove with slurry.

[0072] Continue to refer to the attached Figure 3 Schematic diagram of the structure of the groove 310 in the present embodiment is shown. The slurry 320 is filled in the groove 310 so that the slurry 320 fills the groove 310 to form an electrode pattern corresponding to the groove 310. As an example, the slurry 320 can be a combination of metal powder, glass material, and liquid carrier, wherein the metal slurry can be silver paste, copper paste, aluminum paste, etc. As another example, the filled slurry 320 can be a plurality of types of slurries 320, and the plurality of types of slurries 320 are stacked in the groove 310. Specifically, in this embodiment, the method of filling the slurry 320 in the groove 310 includes but is not limited to printing and scraping. It can be understood that the method of filling the slurry 320 in the groove 310 needs to be able to meet the requirements for the width of the groove 310.

[0073] Step S108 , removing the remaining organic polymer film to form an electrode.

[0074] The remaining organic polymer film refers to the organic polymer film that has not been etched to form grooves. Since the organic polymer film serves as a mask for the transfer electrode in this embodiment, the remaining organic polymer film must be removed after the slurry filling is completed to prevent it from affecting the photoelectric conversion efficiency of the solar cell. Methods for removing the remaining organic polymer film include, but are not limited to, chemical removal and mechanical scraping.

[0075] In this embodiment, by etching the organic polymer film to form a groove that penetrates the organic polymer film, the width of the groove can be made smaller, so that the electrode preparation method in this embodiment can prepare an electrode with a smaller width and higher resolution, which is beneficial to reducing the shading rate of the solar cell and increasing the contact resistance, thereby improving the photoelectric conversion efficiency of the solar cell.

[0076] See Figure 5 , Figure 5The second flow chart of the electrode preparation method in one embodiment of the present application is shown. The electrode preparation method in this embodiment further includes step S502: annealing the organic polymer film to solidify the organic polymer film on the surface of the battery cell substrate before etching the organic polymer film to form a groove penetrating the organic polymer film.

[0077] Specifically, in this embodiment, the organic polymer film can be annealed at a temperature of 80 degrees Celsius (°C) to 250 degrees Celsius (°C), such as 80°C, 100°C, 130°C, 150°C, 200°C, 250°C, etc.

[0078] See Figure 6 , attached Figure 6 The third flow chart of the electrode preparation method in one embodiment of the present application is shown. The electrode preparation method in this embodiment further includes step 602: drying the slurry in the cell substrate at a preset temperature before removing the organic polymer film.

[0079] Among them, the preset temperature can be 100 degrees Celsius (°C) ~ 300 degrees Celsius (°C), such as 100°C, 130°C, 150°C, 200°C, 250°C, 300°C, etc.

[0080] See Figure 7 , attached Figure 7 FIG4 shows a fourth flow chart of an electrode preparation method in an embodiment of the present application. The electrode preparation method in this embodiment further includes step S702: sintering the slurry to form an electrode.

[0081] It is understandable that the corresponding preparation process varies depending on the type of solar cell. For example, when preparing HJT (Hereto-junction with Intrinsic Thin-layer) cells, there is no need to sinter the slurry filled in the groove. However, for solar cells such as perovskite cells, PERC (Passivated Emitter and Rear Cell) cells, and Topcon (Thin Oxide Passivated Contact) cells, the slurry needs to be sintered after filling. Therefore, sintering the slurry in this embodiment helps to prepare the electrodes of solar cells that require slurry sintering. The temperature for sintering the slurry can be 600 degrees Celsius (℃) to 800 degrees Celsius (℃), specifically, it can be 600℃, 650℃, 700℃, 750℃, 800℃, etc.

[0082] See Figure 8 , attached Figure 8FIG5 shows a fifth flow chart of an electrode preparation method in an embodiment of the present application. The electrode preparation method in this embodiment includes the following steps S802 to S816.

[0083] Step S802 , depositing an organic polymer film on the surface of the cell substrate by physical vapor deposition; the thickness of the organic polymer film is 50 μm.

[0084] Step S804 , heating the organic polymer film on the surface of the cell substrate at a temperature of 120° C. to solidify the organic polymer.

[0085] Step S806 , etching the organic polymer film using electron beam direct writing technology to form a plurality of electrode patterns penetrating the organic polymer film; the width of each electrode pattern is 20 μm, and the interval between adjacent electrode patterns is 30 μm.

[0086] In step S808 , the cell substrate with the electrode patterns etched thereon is immersed in a developer, so that each electrode pattern is correspondingly developed to form a plurality of grooves; the width of each groove is 20 μm, and the interval between adjacent grooves is 30 μm.

[0087] In step S810 , a scraper is used to apply the slurry to fill the plurality of grooves.

[0088] Step S812: drying the slurry at a temperature of 300°C.

[0089] In step S814 , the cell substrate filled with the slurry is immersed in an acetone solution to remove the remaining organic polymer film.

[0090] Step S816: placing the cell substrate in a sintering furnace to perform sintering treatment on the cell substrate; the sintering temperature is 750°C.

[0091] In this embodiment, on the one hand, the above-mentioned electrode preparation method abandons the conventional screen printing step, thereby shortening the electrode preparation cycle and avoiding the tedious storage and use of the screen. On the other hand, the electrode preparation method in this embodiment forms an organic polymer film on the surface of the solar cell substrate, etches the organic polymer film to form grooves penetrating the organic polymer film, and then fills the groove with slurry. After removing the remaining organic polymer film, the electrode preparation is completed. The electrode preparation method in this embodiment can produce electrodes with smaller width and higher resolution, which is beneficial for reducing the shading rate of solar cells and increasing contact resistance, thereby improving the photoelectric conversion efficiency of solar cells.

[0092] It should be understood that, although the various steps in the flowcharts involved in the various embodiments described above are displayed in sequence according to the instructions of the arrows, these steps are not necessarily executed in sequence in the order indicated by the arrows. Unless otherwise specified herein, there is no strict order restriction on the execution of these steps, and these steps can be executed in other orders. Moreover, at least a portion of the steps in the flowcharts involved in the various embodiments described above can include multiple steps or multiple stages, and these steps or stages are not necessarily executed and completed at the same time, but can be executed at different times, and the execution order of these steps or stages is not necessarily to be carried out in sequence, but can be executed in turn or alternately with other steps or at least a portion of steps or stages in other steps.

[0093] Based on the same inventive concept, the present application also provides an electrode preparation device for implementing the electrode preparation method mentioned above. The solution to the problem provided by the device is similar to the solution described in the above method. Therefore, the specific limitations of one or more electrode preparation device embodiments provided below can be referred to the limitations of the electrode preparation method above and will not be repeated here.

[0094] See Figure 9 , attached Figure 9 A schematic structural diagram of an electrode preparation device 900 in an embodiment of the present application is shown. The electrode preparation device 900 provided in this embodiment includes a thin film deposition module 910, an etching module 920, a slurry filling module 930 and a cleaning module 940.

[0095] The thin film deposition module 910 is used to form an organic polymer thin film on the surface of the cell substrate. The thin film deposition module 910 can be flexibly selected based on the method of preparing the organic polymer thin film. For example, it can be a spin coater, a doctor blade, a physical vapor deposition device, etc.

[0096] The etching module 920 is used to etch the organic polymer film to form grooves penetrating the organic polymer film. The etching module 920 can be flexibly selected according to the etching method of the organic polymer film, such as laser direct writing equipment, electron beam lithography machine, photolithography-assisted reactive ion etcher, etc.

[0097] The slurry filling module 930 is used to fill the groove with slurry. The slurry filling module 930 can be flexibly selected according to the method of filling the groove with slurry, such as a scraping device, a printing device, etc.

[0098] The cleaning module 940 is used to remove the remaining organic polymer film. The cleaning module 940 can be flexibly selected according to the method of removing the remaining organic polymer film, for example, it can be a chemical cleaning tank.

[0099] In this embodiment, the above-mentioned electrode preparation device 900 forms an organic polymer film on the surface of the cell substrate through the thin film deposition module 910, etches the organic polymer film through the etching module 920 to form a groove penetrating the organic polymer film. At this time, the groove width can be made smaller, and then the slurry is filled in the groove through the slurry filling module 930. Finally, the remaining organic polymer film is removed through the cleaning module 940 to form an electrode. Therefore, the electrode preparation device 900 in this embodiment can prepare electrodes with smaller width and higher resolution, which is beneficial to reduce the shading rate of solar cells and increase contact resistance, thereby improving the photoelectric conversion efficiency of solar cells.

[0100] In one embodiment, the electrode preparation device in this embodiment further includes an annealing module, which is used to perform annealing treatment on the organic polymer film to solidify the organic polymer film on the surface of the battery cell substrate.

[0101] The annealing module may be any device capable of providing a corresponding annealing temperature for annealing the organic polymer film, wherein the annealing temperature may be 80 degrees Celsius (°C) to 250 degrees Celsius (°C), such as 80°C, 100°C, 130°C, 150°C, 200°C, 250°C, and the like.

[0102] In one embodiment, the electrode preparation device in this embodiment further includes a drying module, which is used to dry the slurry in the battery cell substrate at a preset temperature.

[0103] The drying module may be a temperature regulating device, which can at least achieve drying temperature regulation such as 100 degrees Celsius (°C) to 300 degrees Celsius (°C), specifically, it may be 100°C, 130°C, 150°C, 200°C, 250°C, 300°C, etc.

[0104] In one embodiment, the electrode preparation device in this embodiment further includes a sintering module, and the sintering module is used to sinter the slurry to form the electrode.

[0105] The sintering module may be a sintering furnace, which can at least provide a temperature of 600 degrees Celsius (°C) to 800 degrees Celsius (°C), specifically, 600°C, 650°C, 700°C, 750°C, 800°C, etc.

[0106] In one embodiment, a solar cell is provided. The solar cell in this embodiment comprises an electrode prepared by the electrode preparation method in any of the above embodiments or an electrode prepared by the electrode preparation device in any of the above embodiments.

[0107] It can be understood that since the electrode is prepared by the electrode preparation method or electrode preparation device in the present application, and since the electrode preparation method and electrode preparation device in the present application can prepare electrodes with smaller width and higher resolution, the solar cell in this embodiment can have a lower shading rate and a larger contact resistance under the action of the electrode, thereby having a higher photoelectric conversion efficiency.

[0108] The technical features of the above-mentioned embodiments can be combined arbitrarily. In order to make the description concise, not all possible combinations of the technical features in the above-mentioned embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0109] The above-described embodiments merely represent several implementation methods of the present application. While the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the present application. It should be noted that a person skilled in the art may make various modifications and improvements without departing from the spirit of the present application, and these modifications and improvements fall within the scope of protection of the present application. Therefore, the scope of protection of the present patent application shall be determined by the appended claims.

Claims

1. A method for preparing an electrode, characterized in that: include: forming an organic polymer film on the surface of the cell substrate; etching the organic polymer film to form a groove penetrating the organic polymer film; Filling the groove with slurry; The remaining organic polymer film is removed to form an electrode.

2. The electrode preparation method according to claim 1, characterized in that: Forming an organic polymer film on the surface of the cell substrate comprises: The organic polymer film is formed on the surface of the cell substrate by physical vapor deposition.

3. The electrode preparation method according to claim 1 or 2, characterized in that: The material of the organic polymer film includes at least one of polyvinyl pyrrolidone, polymethyl methacrylate, polyethylene terephthalate, and fluorine-containing resin.

4. The electrode preparation method according to claim 1 or 2, characterized in that: The thickness of the organic polymer film is 20 μm to 100 μm.

5. The electrode preparation method according to claim 1, characterized in that: Etching the organic polymer film to form a groove penetrating the organic polymer film, comprising: etching the organic polymer film using an electron beam to form a plurality of electrode patterns penetrating the organic polymer film; The battery cell substrate is immersed in a developing solution to develop the plurality of electrode patterns into a plurality of grooves.

6. The electrode preparation method according to claim 1 or 5, characterized in that: The width of each groove is 1 μm to 50 μm, and the distance between adjacent grooves is 1 μm to 50 μm.

7. The electrode preparation method according to claim 1 or 5, characterized in that: Before etching the organic polymer film to form a groove penetrating the organic polymer film, the method further includes: The organic polymer film is annealed to solidify the organic polymer film on the surface of the cell substrate.

8. The electrode preparation method according to claim 7, characterized in that: The temperature for annealing the organic polymer film is 80 degrees Celsius to 250 degrees Celsius.

9. The electrode preparation method according to claim 1, characterized in that: Before removing the organic polymer film, the method further comprises: The slurry in the cell substrate is dried at a preset temperature.

10. The electrode preparation method according to claim 1, characterized in that: Also includes: The slurry is sintered to form an electrode.

11. An electrode preparation device, characterized in that: include: A thin film deposition module is used to form an organic polymer thin film on the surface of the cell substrate; an etching module, configured to etch the organic polymer film to form a groove penetrating the organic polymer film; A slurry filling module, used for filling the groove with slurry; The cleaning module is used to remove the remaining organic polymer film.

12. The electrode preparation device according to claim 11, characterized in that: Also includes: The annealing module is used to perform annealing treatment on the organic polymer film to solidify the organic polymer film on the surface of the battery cell substrate.

13. The electrode preparation device according to claim 11, characterized in that: Also includes: The drying module is used to dry the slurry in the cell substrate at a preset temperature.

14. The electrode preparation device according to claim 11, characterized in that: Also includes: The sintering module is used to sinter the slurry to form an electrode.

15. A solar cell, characterized in that: The invention comprises an electrode prepared by the electrode preparation method according to any one of claims 1 to 10 or an electrode prepared by the electrode preparation device according to any one of claims 11 to 14.

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