Method, computer program product and particle beam device for creating an image

Abstract

The invention relates to a method for creating an image of a device in a particle beam apparatus. The invention also relates to a method for creating an image of an object holder and / or an object stage in a particle beam apparatus. The invention also relates to a computer program product and to a particle beam apparatus for carrying out the method. The method comprises the following method steps: (A) recording a partial image of a first partial region of the device using a camera, the region imaged by the camera being referred to as the field of view of the camera; (B) performing a relative movement with respect to the device and the field of view of the camera by adapting: (i) the position of the camera; (ii) the position of the device; (iii) setting of the optical unit; and / or (iv) the position of the optical unit; (C) recording a further partial image of a second partial region of the device using the camera; and (D) stitching the recorded partial image and the recorded further partial image using a processor unit to form an image of the device.

Description

Technical Field

[0001] The present invention relates to a method for creating an image of a device in a particle beam apparatus. The present invention also relates to another method for creating an image of an object holder and / or an object carrier in a particle beam apparatus. The present invention also relates to a computer program product and a particle beam apparatus for performing one of the methods according to the present invention. For example, the particle beam apparatus takes the form of an electron beam apparatus and / or an ion beam apparatus. Background Art

[0002] Electron beam devices, in particular scanning electron microscopes (hereinafter also referred to as SEM) and / or transmission electron microscopes (hereinafter also referred to as TEM), are used to examine objects (specimens) in order to gain insights into properties and behavior under certain conditions.

[0003] In the SEM, an electron beam (hereinafter also referred to as a primary electron beam) is generated with the aid of a beam generator and is focused on the object to be inspected by a beam guidance system. The primary electron beam is guided onto the surface of the object to be inspected in a raster scanning manner with the aid of a deflection device. In this process, the electrons of the primary electron beam interact with the object to be inspected. As a result of the interaction, in particular, electrons are emitted by the object (so-called secondary electrons) and the electrons of the primary electron beam are backscattered (so-called backscattered electrons). The secondary electrons and the backscattered electrons are detected and used for image creation. Thus, an image representation of the object to be inspected is obtained. In addition, interaction radiation, such as x-ray radiation and cathode luminescence, is generated due to the interaction. In particular, the interaction radiation is used to analyze the object.

[0004] In the case of TEM, a primary electron beam is also generated with the aid of a beam generator and is focused on the object to be inspected with the aid of a beam guidance system. The primary electron beam passes through the object to be inspected. When the primary electron beam passes through the object to be inspected, the electrons of the primary electron beam interact with the material of the object to be inspected. The electrons that pass through the object to be inspected are imaged on a fluorescent screen or a detector (e.g. a camera) by a system consisting of an objective lens and a projection unit. Here, imaging can also be performed in the scanning mode of the TEM. Typically, such a TEM is referred to as an STEM. Additionally, another detector may be provided to detect electrons backscattered at the object to be inspected and / or secondary electrons emitted by the object to be inspected in order to image the object to be inspected.

[0005] Furthermore, the prior art discloses the use of combined devices for examining objects, in which both electrons and ions can be directed at the object to be examined. For example, it is known to additionally equip an SEM with an ion beam column. An ion beam generator arranged in the ion beam column is used to generate ions for preparing the object (e.g., ablating material from or applying material to the object) or for imaging. The SEM is used in particular for observing the preparation, but also for further examination of the prepared or unprepared object.

[0006] A material is applied to an object using an air intake. Known particle beam devices are combined devices that provide both an electron beam and an ion beam. The particle beam device includes an electron beam column and an ion beam column. The electron beam column provides an electron beam focused on the object. The object is placed in a sample chamber maintained under vacuum. The ion beam column provides an ion beam that is also focused on the object. For example, a layer on the surface of the object is removed by means of the ion beam. Once the layer has been removed, another surface of the object is exposed. With the help of an air intake device, a gaseous precursor substance (so-called precursor) can be allowed to enter the sample chamber. It is known to implement the air intake device as a needle-shaped device that can be arranged very close to the position of the object, at a distance of several microns, so that the gaseous precursor substance can be guided to that position as accurately as possible and in high concentration. Due to the interaction between the ion beam and the gaseous precursor substance, a layer of material is deposited on the surface of the object. For example, it is known to allow gaseous phenanthrene as a gaseous precursor substance to enter the sample chamber with the help of the air intake device. Then, a carbon layer or a carbon-containing layer is basically deposited on the surface of the object. It is also known to use gaseous precursor substances containing metals to deposit a metal layer or a metal-containing layer on the surface of an object. However, the deposited substances are not limited to carbon and / or metals. Rather, any desired substance can be deposited on the surface of an object, such as semiconductors, non-conductors, or other compounds. Furthermore, it is known to use gaseous precursor substances to ablate material from an object when interacting with a particle beam.

[0007] As explained above, backscattered electrons and secondary electrons emitted by the interaction of the primary electron beam with the object can be detected and used to create an image. Thus, an image representation of the object is obtained. However, this image representation typically depicts only a very spatially restricted region of the object. For example, this region is less than 1 mm x 1 mm, while the object is typically at least 1 cm x 1 cm in size. This makes it difficult for the user to orient themselves on the object, as only a section of the object is depicted at any one time, and this section is at least an order of magnitude smaller than the object's extent.

[0008] The following describes a prior art method for creating an image of an object, which is performed using a camera using a TEM or SEM. The object is arranged below the beam column of a particle beam device. The particle beam of the particle beam device is directed to the object in the irradiation direction of the beam column. In addition, the object is arranged on an object holder that can perform translational movement and rotational movement. Additionally, a camera is arranged on the particle beam device, which can record the image of the object at a certain angle, and this angle is different from the irradiation direction of the beam column. Performing a rotational movement will position the object in the field of view of the camera, so that an image of the object that is as undisturbed as possible can be recorded by means of the camera. If necessary, a translational movement can also be implemented before performing the rotational movement to avoid collision between the object and the beam column.

[0009] The prior art also discloses placing the object on an object holder capable of performing at least one translational movement. In this case, the translational movement of the object holder can be used to laterally displace the object from a first position on the axis of the beam column to a second position on the visual axis of the camera. In this case, the arrangement of a reflector allows the camera to have any desired orientation relative to the object. When following the light path from the object to the camera, the reflector is positioned between the camera and the object. The camera can then record an image of the object at the second position.

[0010] The prior art further discloses the practice of arranging the object on an object holder capable of performing at least one rotational movement. In this case, the rotational movement of the object holder can be used to move the object laterally from a first position located on the axis of the beam to a second position located on the visual axis of the camera. In this case, the rotation axis of the rotational movement is different from the axis of the beam. The camera can then be used to record an image of the object in this second position. It is also known to create an image of an object by stitching together multiple partial images of the object. The object can be moved to a position in the field of view of the camera in order to record one of the partial images, wherein the field of view of the camera does not capture the entire object, for example, but only a partial area. Then, by further moving the object holder on which the object is arranged, another partial area can be introduced into the field of view of the camera. Thus, the camera can record another partial image. Finally, the recorded partial images can be stitched together using a processor unit to form another image of the object.

[0011] With regard to the prior art, reference is made to US 10,872,744 B2, US 11,239,051 B2, US 2021 / 0383519 A1, DE 10 2010 046 902 A1 and DE 10 2019 213 907 B3.

[0012] It is known to record a plurality of partial images using a camera and to stitch them together using a processor unit in order to create an optical image (e.g. an overview image) of the device. Additionally or alternatively, it is known to perform a rotational movement relative to the field of view of the device and the camera.

[0013] In this case, a device may refer to any component and / or any object arranged in a sample chamber of a particle beam apparatus.

[0014] For example, light-optical images are used to facilitate navigation relative to devices in particle beam systems. Compared to particle beam optical images, light-optical images have many advantages: They can be recorded much faster than particle beam optical images with comparable quality. Furthermore, light-optical images create an image impression that is easily perceived by the observer, as the image impression of a light-optical image corresponds to the image impression of the observer's eye. Furthermore, the recording of light-optical images is not accompanied by interfering effects, such as sample charging, which can occur when recording particle beam optical images. Summary of the Invention

[0015] The problem to be solved by the present invention is to specify an additional method for creating an image of an apparatus in a particle beam device, a further method for creating an image of an object holder and / or an object carrier in a particle beam device, a computer program product, and a particle beam device, by means of which an image of an apparatus in a particle beam device can be easily created, in particular the image creation can be performed in an automatic manner.

[0016] According to the present invention, this problem is solved by means of a method for creating the image of the device in the particle beam apparatus with features as described below. Provided hereinafter is another method for creating the image of the object holder and / or the object carrier in the particle beam apparatus. Provided hereinafter is a computer program product with program code, which loads or can be loaded into a processor unit and controls the particle beam apparatus when executed so as to perform one of methods according to the present invention. Further, the present invention relates to a particle beam apparatus with features as described below. Other features of the present invention become apparent from the following description and / or accompanying drawings.

[0017] The method according to the invention serves to create an image of an arrangement in a particle beam system, wherein the method according to the invention includes, in particular, the following:

[0018] - recording a partial image of a first partial area of the device using a camera;

[0019] - performing a relative movement with respect to the device and the area in the form of the field of view imaged by the camera;

[0020] at least one further partial image of at least one second sub-region of the recording device; and

[0021] - Stitching the recorded partial images using a processor unit to form an image of the device.

[0022] In this case, as mentioned above, a device may refer to any component and / or any object arranged in a sample chamber of a particle beam apparatus.

[0023] The method according to the invention comprises method steps for creating an image of an arrangement in a particle beam system. These method steps are explained in detail below.

[0024] The method according to the present invention comprises using a camera to record a sub-image of a first partial area of the device. As explained above, the device is arranged in the sample chamber of the particle beam device. The sub-image is recorded by using a camera to detect light beams, wherein these light beams are generated by a light source and reflected from the device into the area imaged by the camera. The area imaged by the camera is the field of view of the camera. The light source generates light of at least one wavelength within the wavelength range of 300nm to 1500nm. The light source is arranged in the particle beam device, on the particle beam device and / or spaced apart from the particle beam device. In other words, the light source can be arranged in the sample chamber of the particle beam device. In addition or in an alternative, the light source can also be arranged on the particle beam device, for example, outside the sample chamber. In addition or in an alternative, the light source can also be arranged outside the sample chamber and spaced apart from the particle beam device. In other words, the light source can be formed separately from the particle beam device.

[0025] The camera may include an aperture, such as a slot stop, a pinhole, and / or a rectangular stop, which limits the field of view of the camera.

[0026] For example, the camera may take the form of a CCD camera, a CMOS camera and / or a video camera.The characteristics of the camera (eg gain, brightness, aperture, focus and / or zoom) may be set, for example, using a processor unit.

[0027] Within the meaning of the present invention, a partial image is understood to mean an image of a partial region, wherein the partial region is a region of the device. In particular, the partial region is smaller than the outer dimensions of the device, so that the device can include multiple partial regions.

[0028] Within the meaning of the present invention, a light source is understood to be a unit designed to provide light for irradiating the device. For example, the light source can take the form of an incandescent lamp, a gas discharge lamp, a light-emitting diode, an electroluminescent emitter, a phosphorescent emitter, a fluorescent emitter and / or a laser. In particular, the device itself can also be designed as a light source, for example by cathode luminescence. However, in addition to or as an alternative, the light source can also be the sun and / or an ambient light source, the light of which can be guided to the device via, for example, a light guide and / or a window, which is arranged, for example, in the wall or ceiling of the sample chamber.

[0029] The method according to the invention also comprises performing relative movement relative to the field of view of the device and the camera. The relative movement can be implemented by adapting:

[0030] - the position of the camera,

[0031] - the location of the device,

[0032] - settings of the optical unit, and / or

[0033] - Position of the optical unit.

[0034] Setting the optical unit is explained in detail below.

[0035] The relative movement is implemented so that the at least one second partial area of the device can be imaged by the camera. In other words, the movement is performed so that the field of view of the camera overlaps with the at least one second partial area of the device. For example, this adaptation can be achieved by:

[0036] - Change the camera position via the camera mover,

[0037] - changing the position of the device by means of at least one translational movement of the device using a device movement means,

[0038] - changing the settings of the optical unit via the unit control, and / or

[0039] - Changing the position of the optical unit by means of the unit control device.

[0040] Within the meaning of the present invention, an optical unit is understood to be a unit comprising at least one optical component designed to influence the light path from the device to the camera. In other words, the optical unit is designed to direct the light beam reflected from the device into the field of view of the camera. For example, the optical unit comprises a mirror. In addition or as an alternative, the optical unit can take the form of, for example, a mirror system, a prism, a rhombus prism, a grating, a spatial light modulator (SLM) and / or an acousto-optic modulator (AOM).

[0041] Within the meaning of the present invention, a unit control device of an optical unit is understood to mean a unit that is designed to change the above-mentioned light path influenced by the optical unit. For example, this change can be implemented by a translational movement and / or rotational movement of the optical unit with the help of the unit control device. For example, the unit control device influences the position of the optical unit in space, so that the light path guided by the optical unit is influenced. In this case, the position can explicitly include the position and / or orientation of the optical unit in space. However, in addition to this and / or as an alternative, the unit control device of the optical unit can also influence the characteristics of the optical unit. For example, the unit control device can output an electronic signal to the optical unit, which electronic signal, for example, activates the optical unit in the form of an SLM and / or AOM to influence the light path.

[0042] Within the meaning of the present invention, a camera movement device is understood to mean a unit designed to influence the position of a camera in space. As explained above, in this context, the position can explicitly include the position and / or orientation of the camera in space. For example, this influence can be implemented by a translational and / or rotational movement of the camera using the camera movement device.

[0043] For example, the rotational movement of the camera can be performed around an axis, wherein the axis is aligned perpendicular to the optical axis of the camera. In other words, the rotational movement of the camera can be implemented in such a way that the camera is tilted, specifically in such a way that there is a tilt axis different from the optical axis of the camera.

[0044] Within the meaning of the present invention, device movement means are understood to mean units designed to influence the position of the device to be imaged in space. As explained above, in this case, the position may explicitly include the position and / or orientation of the device in space. For example, this influence may be implemented by a translational movement and / or rotational movement of the device using the device movement means. The translational movement of the device using the device movement means is hereinafter also referred to as device translational movement. The rotational movement of the device using the device movement means is hereinafter also referred to as device rotational movement.

[0045] Method according to the present invention also comprises at least one other partial image of at least one second partial area of recording device.Use camera and another light source to record at least one other partial image by utilizing camera to detect other light beam.Other light beam is produced by another light source and is reflected from device in the area being imaged by camera.In this case, another light source produces the light of at least one wavelength in the wavelength range of 300nm to 1500nm.Another light source is arranged in particle beam device, on particle beam device and / or is arranged at intervals with particle beam device.About the arrangement of another light source, refer to the explanation provided about the arrangement of light source above; These statements also apply similarly here.

[0046] Within the meaning of the present invention, at least one further partial image is understood to mean an image of at least one second partial region, wherein the at least one second partial region is a region of the device. In particular, the at least one second partial region is smaller than the outer dimensions of the device. Reference is made to the fact that the first partial region and the at least one second partial region may overlap.

[0047] Within the meaning of the present invention, a further light source is understood to be a unit designed to provide light for irradiating the device. For example, the further light source can take the form of an incandescent lamp, a gas discharge lamp, a light-emitting diode, an electroluminescent emitter, a phosphorescent emitter, a fluorescent emitter and / or a laser. In particular, the device itself can also be designed as a further light source, for example by cathode luminescence. However, in addition to or as an alternative, the further light source can also be the sun and / or an ambient light source, the light of which can be guided to the device via, for example, a light guide and / or a window, which is, for example, arranged in a wall or ceiling of the sample chamber.

[0048] With regard to the arrangement and properties of the further light source, reference is made to the above explanations regarding the arrangement and properties of the light sources; these statements apply analogously here as well.

[0049] Mention is made to the fact that the further light source and the light source may be identical.

[0050] The method according to the invention further comprises stitching the recorded partial image and the recorded at least one further partial image using a processor unit to form an image of the device.

[0051] The totality of the above-described method steps is also referred to below as the basic method.

[0052] The present invention is advantageous in that, in particular, images of devices in a particle beam apparatus can be easily created. In particular, images of devices in a particle beam apparatus can be automatically created. The present invention allows a user to easily orient themselves based on the created image. For example, a device movement device can be used to determine and / or correct the position of the device based on the created image. Furthermore, the present invention allows images of devices in a particle beam apparatus to be created even if, for example, the movement of the device within the particle beam apparatus is restricted. Furthermore, the present invention allows images of devices in a particle beam apparatus to be created even if the device is not completely within the field of view of a camera.

[0053] Additionally or alternatively, an embodiment of the method according to the invention provides that stitching is performed using a processor unit to form an image of the device such that the recorded partial images and the recorded at least one further partial image are stitched together laterally adjacently in one direction. For example, this embodiment relates to a so-called banner camera, in which the partial images are recorded in the form of so-called banner images. For example, a banner image in this context refers to an image representation that is stitched together from only a few pixels (e.g., single pixels) in a first direction and from a significantly larger number of pixels in a second direction in comparison to the few pixels in the first direction. To create the image of the device, a plurality of banner images are stitched together, for example, using the processor unit.

[0054] Reference is made to the fact that in an embodiment of the method according to the invention, at least one second partial region can overlap with the first partial region.

[0055] Within the meaning of the present invention, a pixel denotes a single surface element of an image and / or a partial image.

[0056] Mention is also made of the fact that, in addition to or as an alternative to the above-described variants, the stitching can also be implemented such that the partial images are stitched together laterally adjacent, for example in two directions. This embodiment will be discussed below.

[0057] Additionally or alternatively, another embodiment of the method according to the invention provides for performing further method steps. In this embodiment, three partial images are combined. As explained above, the following method steps are used to determine two of the partial images:

[0058] A partial image of a first partial area of the device is recorded using a camera. The partial image is recorded by detecting a light beam using the camera. The light beam is generated by a light source and reflected from the device into the area imaged by the camera. Regarding the light source, the explanations given above also apply here.

[0059] - performing a relative movement of the device and the field of view of the camera by adapting: (i) the position of the camera; (ii) the position of the device; (iii) the settings of the optical unit; and / or (iv) the position of the optical unit. The adaptation is implemented so that at least a second partial area of the device is imaged by the camera. The adaptation is achieved in the following ways: (a) changing the position of the camera by means of a camera moving device; (b) changing the position of the device by means of at least one translational movement of the device using the device moving device; (c) changing the settings of the optical unit by means of a unit control device; and / or (d) changing the position of the optical unit by means of a unit control device. The optical unit is arranged in the particle beam device so that a light beam reflected from the device is directed into the field of view of the camera.

[0060] At least one further partial image of at least a second sub-area of the device is recorded using the camera and the further light source. The at least one further partial image is recorded by detecting the further light beam using the camera. The further light beam is generated by the further light source and reflected from the device into the area imaged by the camera, wherein the statements made above regarding the further light source also apply here.

[0061] Now, in this embodiment of the method according to the invention, further method steps are provided:

[0062] - performing an additional relative movement of the device and the field of view of the camera by adapting: (i) the position of the camera; (ii) the position of the device; (iii) the settings of the optical unit; and / or (iv) the position of the optical unit. The adaptation is implemented so that at least a second additional subarea of the device is imaged by the camera. The adaptation is performed by: (a) changing the position of the camera by means of the camera movement device; (b) changing the position of the device by means of at least one additional translational movement of the device using the device movement device; (c) changing the settings of the optical unit by means of the unit control device; and / or (d) changing the position of the optical unit by means of the unit control device.

[0063] - use camera and another light source to record at least one other partial image of at least one other second partial area of the device. Record at least one other partial image by using camera to detect another light beam. Another light beam is generated by another light source and reflected from the device into the area imaged by the camera. Another light source generates light of at least one wavelength in the wavelength range of 300nm to 1500nm, wherein this another light source is arranged in the particle beam device, on the particle beam device and / or spaced apart from the particle beam device.

[0064] Stitching using the processor unit to form an image of the device. Stitching comprises stitching the recorded partial images, the recorded at least one further partial image and / or the recorded at least one further partial image to form the image of the device.

[0065] Reference is made to the fact that the at least one further second partial region can overlap with the first partial region and / or with the at least one second partial region.

[0066] Mention is made of the fact that this embodiment of the method according to the invention can be managed in particular without the above-mentioned method steps of the basic method as follows:

[0067] stitching the recorded partial image and the recorded at least one further partial image using a processor unit to form an image of the device

[0068] No replacement is necessary, since the exemplary embodiment already envisages stitching together all recorded partial images.

[0069] With regard to the arrangement and properties of the further light source, reference is made to the above explanations regarding the arrangement and properties of the light sources; these statements apply analogously here as well.

[0070] Additionally or alternatively, another embodiment of the method according to the present invention provides for using a light source as a further light source. Additionally or alternatively, using a light source as a further light source. Additionally or alternatively, using a further light source as a further light source. In other words, in practice, the group comprising a light source, a further light source, and a further light source can be implemented by a single light source, two light sources, or three light sources.

[0071] Additionally or alternatively, another embodiment of the method according to the present invention provides that, using at least one object as a device, a particle beam device is utilized to process, analyze and / or image the at least one object. In addition or in an alternative, an object holder for holding an object and / or an object stage for moving an object can be used as a device. Therefore, for example, an object, an object holder and / or an object stage can be used as the above-mentioned device. In addition or in an alternative, at least one other object, at least one other object holder and / or at least one other object stage can be used. Further in addition or in an alternative, a structure made of an object stage, an object holder, an object, at least one other object, at least one other object holder and / or at least one other object stage can be used. In the latter case, the method for creating an image of a device according to the present invention will, for example, create an image of the structure.

[0072] Mention is made of the fact that an image may also depict, for example, only a portion of a device. Thus, even if a structure made of an object carrier, an object holder and at least one object is used as a device, an image may, for example, depict only a portion of the at least one object.

[0073] Additionally or alternatively, a further embodiment of the method according to the invention provides that stitching is carried out using a processor unit to form an image of the device so that the recorded partial images, the at least one further recorded partial image and the at least one further recorded partial image are stitched together laterally adjacently in one direction. For example, this embodiment relates to a so-called banner camera, in which the partial images are recorded in the form of so-called banner images. For example, in this context, a banner image refers to an image representation that is stitched together from only a few pixels (e.g., single pixels) in a first direction and from a significantly larger total number of pixels in a second direction compared to the few pixels in the first direction. In order to create the image of the device, a plurality of banner images are combined together, for example, using a processor unit. Reference is again made to the fact that different partial images can also partially depict the same partial area of the device. This means that the partial images can also be stitched together in an overlapping manner to form the image of the device.

[0074] Reference is also made to the fact that, in addition to or as an alternative to the above-described variants, the stitching can also be implemented so that the partial images are stitched together, for example, laterally adjacent in two directions. In other words, the partial images can be stitched together in at least a first direction and at least a second direction. In this case, the first and second directions can form any angle. For example, the first direction can be aligned perpendicular to the second direction.

[0075] Furthermore, the following fact is mentioned: in addition to or as an alternative to the above-mentioned variants, the stitching can also be implemented so that the image can have any desired shape. In particular, the images can be stitched to form the shape of an irregular polygon.

[0076] Furthermore, the fact that the partial images can be adjusted or supplemented, for example by a processor unit, to produce any desired shape is mentioned. Additionally or alternatively, the partial images can have different shapes. Furthermore, the fact that adjacent partial images can be stitched together independently of the temporal order in which they were recorded is mentioned. In other words, successively recorded partial images may not be precisely spatially adjacent to one another.

[0077] Furthermore, it should be noted that, in addition to or as an alternative to the above-described variants, the stitching can also be implemented so that regions of the partial images overlap. In other words, a first edge of a first partial image has at least two points in common with a second edge of a second partial image. Points that constitute both edges should be understood as points common to both edges. In this case, both above and below, the term "edge" should be understood to refer to the boundary of a partial image, where this boundary can have any suitable shape. For example, a boundary can be circular, arc-shaped, and / or straight. Therefore, an edge should not be understood solely as a straight line.

[0078] Furthermore, the following fact is mentioned: in addition to or as an alternative to the above-mentioned variants, the stitching can also be implemented so that the edges of the partial images touch. In other words, the first edge of the first partial image has at least one point in common with the second edge of the second partial image.

[0079] Furthermore, the following fact is mentioned: in addition to the above-mentioned variants or in an alternative, the stitching can be implemented so that the edges of the score images do not touch. In other words, the first edge of the first component image has no points in common with the second edge of the second component image. In this case, the component images are stitched to form the image so that the score images are stitched together at a certain distance from each other. For example, in this case, the space between the spaced-apart component images in the image can be filled with predeterminable values so that firstly, a filled image is created between the two component images and secondly, there is no gap between the two component images in the image. In addition to this or in an alternative, the space can be filled with values created by the processor unit. For example, the processor unit can create values that result from interpolating the component images around the space. In this case, interpolation is understood to mean, for example, a method of determining image values of an image using image values of adjacent areas of an image. In addition to this or in an alternative, the space may not be filled with values.

[0080] Regarding the circular component images, reference is made to the explanation given above.

[0081] Below, we consider partial images with corners. In other words, these partial images are not circular. In other words, the edge of a partial image contains at least one point where the edge is closed but not continuously differentiable. This point is referred to below as a corner.

[0082] In addition to or as an alternative to the above-described variants, the stitching can also be implemented such that the corners of the partial images are not arranged spatially adjacent to one another. In other words, the corners of a first partial image can be arranged at any desired number of corners of the other partial images, but in particular, they can also not be arranged at any corner of another partial image.

[0083] Furthermore, the following should be mentioned: In addition to or as an alternative to the above-described variants, the stitching can also be implemented such that the recorded partial image, at least one further recorded partial image, and at least one further recorded partial image are stitched together adjacently and / or spaced apart. In particular, the partial images can be arranged directly adjacent to each other. In other words, if the edges of two partial images are arranged directly adjacent to each other, then the edges of the two partial images share at least one common point. In particular, the partial images can be arranged overlapping. In addition or as an alternative, the partial images can have any desired shape, for example, a shape having at least one curve and / or at least one corner. Thus, the image can also include more or fewer pixels than the sum of the pixels of the recorded partial images.

[0084] Additionally or alternatively, according to another embodiment of the method according to the invention, a camera moving device for performing a camera translation movement and / or a camera rotation movement is used as the camera moving device. For example, a device moving device for performing at least one device translation movement or for performing at least one device translation movement in combination with a device rotation movement is used as the device moving device. In particular, a unit control device for performing a unit translation movement and / or a unit rotation movement is used as the unit control device. For example, in addition to or in an alternative, a unit control device for adapting the settings of the optical unit can be used as the unit control device. In other words, a camera moving device for performing a translation movement and / or a rotation movement is used as the camera moving device. For example, a unit control device for performing a translation movement and / or a rotation movement is used as the unit control device. In particular, a device moving device for performing a translation movement is used as the device moving device. For example, the device moving device can additionally be used to perform a rotation movement.

[0085] Within the meaning of the present invention, a translational movement is understood to mean a movement in which all points of a body undergo the same displacement relative to a reference system.

[0086] For the purposes of this invention, a rotational movement is understood to mean a movement about at least one axis of rotation relative to a reference system. During a rotational movement, all points on the axis of rotation remain stationary, while all other points of the body move through the same angle along a circle lying in a plane at a fixed distance from the axis of rotation. In this context, the axis of rotation is the normal to the plane and forms the center of the circle.

[0087] The present invention also relates to a further method according to the present invention. The further method according to the present invention is used to create an image of an apparatus in a particle beam system, wherein, in the further method according to the present invention, in particular the following are implemented:

[0088] - recording a partial image of a first partial area of the device using a camera;

[0089] - performing a relative movement with respect to the device and the area in the form of the field of view imaged by the camera;

[0090] at least one further partial image of at least one second sub-region of the recording device; and

[0091] - Stitching the recorded partial images using a processor unit to form an image of the device.

[0092] In this case, in contrast to the method according to the invention explained above, the at least one object holder and / or the at least one object carrier arranged in the sample chamber of the particle beam device may be referred to as an apparatus.

[0093] A further method according to the invention comprises method steps for creating an image of an arrangement in a particle beam system. These method steps are explained in detail below.

[0094] Another method according to the present invention includes recording partial images of the first partial area of the device using a camera. With regard to exemplary embodiments of recording partial images, the camera, the camera's field of view, the partial images, and the light source, reference is made to the explanations given above regarding the method according to the present invention; these explanations also apply analogously here.

[0095] Another method according to the present invention also includes performing relative movement relative to the field of view of the device and the camera. The relative movement can be implemented by adapting the following:

[0096] - the position of the camera,

[0097] - the location of the device,

[0098] - settings of the optical unit, and / or

[0099] - Position of the optical unit.

[0100] Setting the optical unit is explained in detail below.

[0101] The relative movement is implemented so that the at least one second partial area of the device can be imaged by the camera. In other words, the movement is performed so that the field of view of the camera overlaps with the at least one second partial area of the device. For example, this adaptation can be achieved by:

[0102] - Change the camera position via the camera mover,

[0103] - changing the position of the device by means of at least one translational movement of the device using the device moving means and / or by means of at least one rotational movement of the device using the device moving means,

[0104] - changing the settings of the optical unit via the unit control, and / or

[0105] - Changing the position of the optical unit by means of the unit control device.

[0106] With regard to the optical unit, the unit control means, the camera movement means and the camera rotational movement, reference is made to the explanations given above with regard to the method according to the invention; these explanations also apply analogously here.

[0107] Within the meaning of the present invention, device movement means are understood to mean units designed to influence the position of the device to be imaged in space. As explained above, in this case, the position may explicitly include the position and / or orientation of the device in space. For example, this influence may be implemented by a translational movement and / or rotational movement of the device using the device movement means. The translational movement of the device using the device movement means is hereinafter also referred to as device translational movement. The rotational movement of the device using the device movement means is hereinafter also referred to as device rotational movement.

[0108] A further method according to the present invention further comprises recording at least one further partial image of at least one second sub-area of the device. With regard to the recording of the at least one further partial image, the embodiment of the further light source, and the at least one further partial image, reference is made to the above explanations regarding the method according to the present invention; these explanations apply analogously here as well.

[0109] A further method according to the invention further comprises stitching the recorded partial image and the recorded at least one further partial image using the processor unit to form an image of the device.

[0110] Furthermore, in addition or in the alternative, a further method according to the present invention may comprise at least one feature as specified above or below or a combination of at least two of these features as specified above or below.

[0111] The embodiments of the method according to the invention and of the further method according to the invention are not limited to the order of the method steps listed above. Rather, any order of method steps suitable for solving the problem within the meaning of the invention may be used. Alternatively or in addition, it is also provided that at least two method steps are carried out in parallel. Alternatively or in addition, it is also provided that individual method steps are omitted.

[0112] The present invention further relates to a computer program product having a program code that can be loaded or loaded into a processor unit of a particle beam device, wherein, when the program code is executed in the processor unit, the program code controls the particle beam device so as to perform a method having at least one of the above or following features or a combination of at least two of the above or following features. In other words, the present invention further relates to a non-transient computer-readable medium, which includes software that can be loaded or loaded into a processor unit of a particle beam device, wherein, when the software is executed in the processor unit, the software controls the particle beam device so as to perform a method having at least one of the above or following features or a combination of at least two of the above or following features. The software includes an executable code for performing at least one of the above or following method steps. In this regard, the present invention further relates to a processor unit that is arranged on a particle beam device and is designed to perform a method having at least one of the above or following features or a combination of at least two of the above or following features.

[0113] The present invention also relates to a particle beam apparatus for imaging, processing, and / or analyzing at least one object, wherein the particle beam apparatus has been further explained above and will be further detailed below. These explanations will be briefly summarized below. The particle beam apparatus according to the present invention includes at least one beam generator for generating at least one particle beam having charged particles. For example, the charged particles are electrons and / or ions. Furthermore, the particle beam apparatus according to the present invention includes at least one guiding device for directing, shaping, and / or focusing the particle beam onto at least one object. For example, the guiding device includes an objective lens for focusing the particle beam onto the apparatus, an electrostatic unit and / or a magnetic unit for beam shaping or beam guiding, an stigmator, a condenser lens, and / or a mechanically adjustable aperture unit, by means of which the particle beam is delimited. In particular, the beam column of the particle beam apparatus should also be understood as a guiding device. Furthermore, the particle beam apparatus according to the present invention includes at least one light source. The light source is designed to generate a light beam having at least one wavelength within a wavelength range of 300 nm to 1500 nm that can be directed to the apparatus. In this context, the term "apparatus" may refer to any component and / or any object arranged in the sample chamber of the particle beam apparatus. The light source is arranged in the particle beam apparatus, on the particle beam apparatus and / or spaced apart from the particle beam apparatus. The light source is designed to provide the light that arrives at the device. For example, the light source can take the form of an incandescent lamp, a gas discharge lamp, a light emitting diode, an electroluminescent emitter, a phosphorescent emitter, a fluorescent emitter and / or a laser. In particular, the device itself also can be designed to, for example, a light source by cathode luminescence. However, in addition or in an alternative, the light source can also be the sun and / or an ambient light source, and its light can be directed to the device via, for example, a light guide and / or a window, which is for example arranged in the chamber wall or the ceiling of the sample chamber.

[0114] In addition, the particle beam device according to the present invention includes at least one camera for imaging the device by detecting a light beam reflected from the device in the direction of the camera. In addition, the particle beam device according to the present invention includes at least one of the following components for performing relative movement relative to the device and the camera's field of view, wherein the area imaged by the camera is the camera's field of view. Possible components are: (a) a camera moving device for adapting the position of the camera; (b) a device moving device for adapting the position of the device, wherein the device moving device is designed to perform at least one translational movement; and / or (c) a unit control device and an optical unit, wherein the unit control device is designed to adapt the settings of the optical unit and / or the position of the optical unit. In both the above and below, position refers to both location and alignment. For example, the above-mentioned components for performing relative movement can also be referred to as functional units. A functional unit should be understood above and below as any structural unit of the particle beam device that can be set in any way. The functional unit affects at least one predeterminable characteristic of the particle beam device. For example, the position of the functional unit in the particle beam device can be set. The present invention is not limited to the above-mentioned setting options. Rather, the functional units can be configured in any manner suitable for the present invention.The particle beam device according to the invention furthermore comprises a processor unit in which a computer program product having the features already mentioned further above is loaded.

[0115] The camera may include an aperture, such as a slot stop, a pinhole, and / or a rectangular stop, which limits the field of view of the camera.

[0116] For example, the camera may take the form of a CCD camera, a CMOS camera and / or a video camera.The characteristics of the camera (eg gain, brightness, aperture, focus and / or zoom) may be set, for example, using a processor unit.

[0117] Additionally or alternatively, what another embodiment of particle beam apparatus according to the present invention provides is that device takes the form of at least one object, and this at least one object can use particle beam apparatus to carry out imaging, processing and / or analysis.In addition or in an alternative, device takes the form of the object holder for holding object.Further in addition or in an alternative, device takes the form of the object carrier for moving object.About the embodiment of device, the explanation further provided above also applies similarly here.

[0118] Additionally or alternatively, what another embodiment of particle beam apparatus according to the present invention provides is that optical unit comprises at least one catoptron.In addition or in the alternative, the guiding device of particle beam apparatus comprises beam column, and wherein optical unit comprises at least one catoptron device and takes the form in the zone of beam column.In this case, optical unit takes the form of the milling area of beam column and / or the polishing area of beam column.

[0119] Additionally or alternatively, the at least one mirror can be shaped such that it can be arranged on a conical portion of an objective of the particle beam device.

[0120] Additionally or alternatively, a further embodiment of the particle beam device according to the invention provides that the optical unit comprises a first reflector and a second reflector.

[0121] Additionally or alternatively, the first mirror and / or the second mirror can be shaped such that it / they can be arranged on a conical portion of an objective of the particle beam device.

[0122] Additionally or alternatively, another embodiment of the particle beam apparatus according to the present invention provides that the optical unit includes at least one reflector for correcting image distortion. For example, the at least one reflector for correcting image distortion can take a specific form. For example, the at least one reflector can have a curved surface embodiment.

[0123] Additionally or alternatively, a further embodiment of the particle beam device according to the invention provides that the optical unit comprises at least one prism, a rhombus prism, a grating, a spatial light modulator (SLM) and / or an acousto-optic modulator (AOM).

[0124] Additionally or alternatively, another embodiment of the particle beam apparatus according to the present invention provides that the device takes the form of a movable multi-object holder. In other words, the object holder can be designed so that it is movable, and a plurality of objects can be arranged on the object holder.

[0125] Alternatively or additionally, this further embodiment of the particle beam apparatus provides that the apparatus comprises a first object and a second object, and that the first object and / or the second object are imaged, processed and / or analyzed using the particle beam apparatus.

[0126] Additionally or alternatively, another embodiment of a particle beam apparatus according to the present invention provides that the particle beam apparatus includes a sample chamber. In particular, in this case, the camera is arranged on or in a roof of the sample chamber and / or on or in a chamber wall. In addition or in an alternative, the sample chamber takes the form of a vacuum chamber.

[0127] Additionally or alternatively, what another embodiment of particle beam apparatus according to the present invention provides is that guiding device comprises object lens and / or scanning device.For example, scanning device is designed so that particle beam can be directed to the region on the surface of device in a targeted manner.For example, scanning device is designed so that performs raster scanning operation.In exemplary raster scanning operation, particle beam is directed to device and is guided on device.Especially, in the process of exemplary raster scanning operation, particle beam is directed to the site of any desired number in the region on the surface of device.

[0128] Additionally or alternatively, another embodiment of particle beam equipment according to the present invention provides that beam generator takes the form of a first beam generator. In this case, particle beam takes the form of a first particle beam with a first charged particle, and guiding device takes the form of a first guiding device for guiding, shaping and / or focusing the first particle beam on the device. In addition, particle beam equipment comprises at least one second beam generator for generating at least one second particle beam with a second charged particle and at least one second guiding device for guiding, shaping and / or focusing at least one second particle beam on the device.

[0129] In a further embodiment of the particle beam apparatus according to the invention, it is provided that the particle beam apparatus is an electron beam apparatus and / or an ion beam apparatus. BRIEF DESCRIPTION OF THE DRAWINGS

[0130] Further practical embodiments and advantages of the present invention are described below with reference to the accompanying drawings, in which:

[0131] Figure 1 shows a schematic diagram of a first particle beam apparatus;

[0132] Figure 1A Another schematic diagram of a first particle beam apparatus is shown;

[0133] Figure 1B shows another schematic diagram of a first particle beam apparatus;

[0134] Figure 2 shows a schematic diagram of a second particle beam apparatus;

[0135] Figure 3 shows a schematic diagram of a third particle beam apparatus;

[0136] Figure 4 shows a schematic diagram of an object carrier;

[0137] Figure 5 Shown according to Figure 4 Another schematic diagram of the object carrier;

[0138] Figure 6A schematic diagram showing the operation sequence of a first embodiment of the method according to the present invention;

[0139] Figure 7 A schematic diagram showing the operation sequence of a second embodiment of the method according to the present invention;

[0140] Figure 8 A schematic diagram showing a first stitching for forming an image of a device according to the method of the invention is shown;

[0141] Figure 8A shows a schematic diagram of a second stitching for forming an image of a device according to the method of the invention;

[0142] Figure 8B shows a schematic diagram of a third stitching for forming an image of a device according to the method of the invention;

[0143] Figure 8C a schematic diagram showing a fourth stitching for forming an image of a device according to the method according to the invention; and

[0144] Figure 8D A schematic diagram of a fifth stitching for forming an image of a device according to the method according to the invention is shown. DETAILED DESCRIPTION

[0145] The invention will now be explained in detail with the aid of a particle beam apparatus in the form of an SEM and in the form of a combined apparatus comprising an electron beam column and an ion beam column. Explicit mention is made of the fact that the invention can be used in any particle beam apparatus, in particular in any electron beam apparatus and / or any ion beam apparatus.

[0146] The figures are not drawn to scale.

[0147] Figure 1 A schematic diagram of a SEM 100 is shown. The SEM 100 includes a first beam generator in the form of an electron source 101, which is in the form of a cathode. The SEM 100 is also provided with an extraction electrode 102 and an anode 103, which is arranged at one end of a particle beam column in the form of a beam guide tube 104 of the SEM 100. For example, the electron source 101 is in the form of a thermal field emitter. However, the present invention is not limited to this type of electron source 101. Rather, any electron source may be used.

[0148] Electrons emitted from electron source 101 form a primary electron beam. Due to the potential difference between electron source 101 and anode 103, the electrons are accelerated to the anode potential. In the embodiment presented here, the anode potential is 100 V to 35 kV, for example, 5 kV to 15 kV, and particularly 8 kV, relative to the ground potential of the housing of sample chamber 120. However, alternatively, the anode potential may also be at ground potential.

[0149] Two condenser lenses are arranged on the beam guide tube 104, specifically a first condenser lens 105 and a second condenser lens 106. When viewed starting from the electron source 101 in the direction of the first objective lens 107, the first condenser lens 105 is arranged first, followed by the second condenser lens 106. Explicit reference is made to the fact that further embodiments of the SEM 100 may comprise only a single condenser lens.

[0150] A first aperture unit 108 is arranged between the anode 103 and the first condenser lens 105. Together with the anode 103 and the beam guide tube 104, the first aperture unit 108 is at a high voltage potential (specifically the potential of the anode 103) or is connected to ground. The first aperture unit 108 includes a plurality of first apertures 108A. Figure 1 One of these is depicted in . For example, there are two first apertures 108A. Each of the multiple first apertures 108A has a different aperture diameter. With the aid of an adjustment mechanism (not shown here), the desired first aperture 108A can be set on the optical axis OA of the SEM 100. It is explicitly mentioned that in another embodiment, the first aperture unit 108 may be provided with only a single aperture 108A. In this embodiment, an adjustment mechanism may not be provided. Thus, the first aperture unit 108 is fixed. A fixed second aperture unit 109 is arranged between the first condenser lens 105 and the second condenser lens 106. Alternatively, the second aperture unit 109 may be movable.

[0151] The first objective lens 107 comprises pole shoes 110 in which a borehole is formed. The beam guide tube 104 is guided through the borehole. A coil 111 is arranged in the pole shoe 110.

[0152] An electrostatic deceleration device is arranged in the object-side region of the beam guide tube 104. The electrostatic deceleration device comprises a single electrode 112 and a tubular electrode 113. The tubular electrode 113 is arranged at one end of the beam guide tube 104, which faces the object 125 arranged on the object holder 114.

[0153] The tubular electrode 113, together with the beam guide tube 104, is at the potential of the anode 103, while the single electrode 112 and the object 125 are at the same potential or at a lower potential relative to the potential of the anode 103. In the present case, this potential is the ground potential of the housing of the sample chamber 120. In this way, the electrons of the primary electron beam can be decelerated to the desired energy required for examining the object 125.

[0154] The SEM 100 further comprises a scanning device 115, by means of which the primary electron beam can be deflected and raster scanned over the object 125. In the process, the electrons of the primary electron beam interact with the object 125. As a result of the interaction, interaction particles and / or interaction radiation are generated, which are detected. In particular, the interaction particles are electrons emitted from the surface of the object 125 (so-called secondary electrons) or electrons backscattered from the primary electron beam (so-called backscattered electrons).

[0155] The object 125 and the single electrode 112 can also be at different potentials and at a potential different from ground. This makes it possible to set the location of the deceleration of the primary electron beam relative to the object 125. For example, if the deceleration is performed very close to the object 125, the aberrations become smaller.

[0156] The scanning device 115 and / or the first objective lens 107 are referred to as a guiding device of the SEM 100. For example, in one embodiment of the SEM 100, the scanning device 115 is designed such that the primary electron beam can be directed in a targeted manner to areas on and above the surface of the object 125. In particular, during an exemplary raster scanning operation, the primary electron beam is directed to any desired number of locations within the area on the surface of the object 125.

[0157] A detector arrangement comprising a first detector 116 and a second detector 117 is arranged in the beam guide tube 104 for detecting secondary electrons and / or backscattered electrons. In this embodiment, the first detector 116 is arranged on the source side along the optical axis OA, while the second detector 117 is arranged on the object side along the optical axis OA. In this embodiment, the source side refers to the optical axis OA. The first detector 116 is arranged spatially closer to the electron source 101 than the second detector 117, which is arranged spatially closer to the object 125 than the first detector 116. The first and second detectors 116, 117 are aligned in the direction of the object 125 via their sensor areas. The first and second detectors 116, 117 are arranged offset from each other along the optical axis OA of the SEM 100. Both the first and second detectors 116, 117 have corresponding passage openings through which the primary electron beam can pass. The first and second detectors 116, 117 are approximately at the potential of the anode 103 and the beam guide tube 104. The optical axis OA of the SEM 100 extends through the respective through-opening.

[0158] The second detector 117 is mainly used to detect secondary electrons. When emitted from the object 125, the secondary electrons initially have low kinetic energy and a random direction of motion. The secondary electrons are accelerated in the direction of the first objective lens 107 by a strong extraction field emitted from the tubular electrode 113. The secondary electrons enter the first objective lens 107 approximately parallel to the optical axis OA. The beam diameter of the secondary electron beam remains small even in the first objective lens 107. The first objective lens 107 then has a strong effect on the secondary electrons and produces a relatively short secondary electron focus at a sufficiently steep angle relative to the optical axis OA, so that the secondary electrons significantly diverge from each other downstream of the focus and are mainly incident on the effective area of the second detector 117. In contrast, the second detector 117 detects only a small portion of the electrons backscattered at the object 125 (i.e., backscattered electrons having a relatively high kinetic energy compared to the secondary electrons when emitted from the object 125). The high kinetic energy of the backscattered electrons when they emerge from the object 125 and the angle relative to the optical axis OA have the effect that the beam waist (i.e., the beam region of minimum diameter) of the backscattered electrons is located near the second detector 117. Most of the backscattered electrons pass through the passage opening of the second detector 117. Therefore, the first detector 116 is essentially used to detect the backscattered electrons.

[0159] In another embodiment of the SEM 100, the first detector 116 may be further formed with a backscatter grating 116A. The backscatter grating 116A is arranged on the side of the first detector 116 facing the object 125. The backscatter grating 116A has a negative potential relative to the potential of the beam guide tube 104, so that only backscattered electrons with high energy pass through the backscatter grating 116A and reach the first detector 116. In addition or in the alternative, the second detector 117 includes another backscatter grating having a similar embodiment and having a similar function as the above-described backscatter grating 116A of the first detector 116.

[0160] The detection signals generated by the first detector 116 and the second detector 117 are used to create one or more electron-optical images of the surface of the object 125 .

[0161] The following fact is explicitly mentioned: the apertures of the first aperture unit 108 and the second aperture unit 109, as well as the through-openings in the first detector 116 and the through-openings in the second detector 117, are depicted in an exaggerated manner. The through-openings in the first detector 116 and the through-openings in the second detector 117 are within a range of 0.5 mm to 5 mm perpendicular to the optical axis OA. For example, the through-openings are circular and have a diameter perpendicular to the optical axis OA in the range of 1 mm to 3 mm.

[0162] The second aperture unit 109 is configured as a pinhole aperture in the embodiment shown here and is provided with a second aperture 118 for the passage of the primary electron beam, the second aperture ranging from 5 μm to 500 μm, for example 35 μm. In an alternative embodiment, another embodiment provides that the second aperture unit 109 is provided with a plurality of apertures, which can be mechanically displaced relative to the primary electron beam or can be made to reach the primary electron beam by using electrical deflection elements and / or magnetic deflection elements. For example, the second aperture unit 109 takes the form of a pressure-stage aperture. This separates a first region in which the electron source 101 is arranged and in which an ultrahigh vacuum (10 -7 hPa to 10 -12 hPa), the second region has a high vacuum (10 -3 hPa to 10 -7 hPa). The second region is an intermediate pressure region of the beam guide tube 104 , which leads to the sample chamber 120 .

[0163] The sample chamber 120 is under vacuum. In order to generate the vacuum, a pump (not shown) is arranged on the sample chamber 120. Figure 1 In the depicted embodiment, the sample chamber 120 operates within a first pressure range or within a second pressure range. The first pressure range only includes pressures less than or equal to 10 -3 hPa, and the second pressure range only includes pressures greater than 10 -3 The sample chamber 120 is vacuum-tight to ensure these pressure ranges.

[0164] The object holder 114 is arranged on the object carrier 122 or forms the object carrier 122. The object carrier 122 is configured to be movable in three directions arranged perpendicular to each other, specifically in the x-direction (first carrier axis), the y-direction (second carrier axis) and the z-direction (third carrier axis). In addition, the object carrier 122 can rotate around two rotation axes (rotation axes of the carrier) arranged perpendicular to each other. The present invention is not limited to the above-mentioned object carrier 122. Instead, the object carrier 122 may have additional translation axes and rotation axes along or around which the object carrier 122 can move. The present invention is also not limited to the order of controlling the above-mentioned axes. In addition to this or in the alternative, the present invention is not limited to the order of mechanically connecting the above-mentioned axes.

[0165] Yet another embodiment of the SEM 100 provides that the object holder 114 takes the form of a movable multiple object holder. In other words, the object holder 114 can be designed so that it is movable and a plurality of objects 125 can be arranged on the object holder 114.

[0166] Alternatively or additionally, this further embodiment of the SEM 100 provides that the first object and the second object are arranged on an object holder. The first object and / or the second object are imaged, processed and / or analyzed using the SEM 100 .

[0167] The SEM 100 further includes a third detector 121 disposed in the sample chamber 120. More precisely, the third detector 121 is disposed downstream of the object stage 122 when viewed from the electron source 101 along the optical axis OA. The object stage 122, and therefore the object holder 114, can be rotated so that the primary electron beam can radiate through an object 125 disposed on the object holder 114. The ability to transmit radiation need not be solely achieved through rotation. Slits in the object holder 114 and in the object stage 122 can be envisioned so that the primary electron beam can radiate through the object 125 disposed on the object holder 114. To achieve this, the object 125 should be sufficiently thin. When the primary electron beam passes through the object 125 to be examined, the electrons of the primary electron beam interact with the material of the object 125 to be examined. The third detector 121 detects the electrons that have passed through the object 125 to be examined.

[0168] A radiation detector 119 for detecting interaction radiation (e.g., x-ray radiation and / or cathodoluminescence) is arranged in the sample chamber 120. The radiation detector 119, the first detector 116, and the second detector 117 are connected to a control unit 123 comprising a monitor 124 and a processor unit 127. The third detector 121 is also connected to the control unit 123. For the sake of clarity, this connection is not depicted. In addition or in an alternative, a further detector in the form of a chamber detector 500, in particular for detecting secondary electrons, can be arranged in the sample chamber 120. A grating with an extraction voltage can be arranged in the sample chamber 120 in order to extract secondary electrons towards the chamber detector 500. The chamber detector 500 is likewise connected to the control unit 123. The control unit 123 processes the detection signals generated by the first detector 116, the second detector 117, the third detector 121, the radiation detector 119 and / or the chamber detector 500 and displays these detection signals on the monitor 124 in the form of numerical values, diagrams, images and / or analyses.

[0169] Furthermore, a camera 140 (e.g., a CCD camera, a CMOS camera, or a video camera) is arranged on or in the sample chamber 120; the camera detects light transmitted by a light source 142 arranged in the sample chamber 120 and reflected, for example, from the object 125. The camera 140 is connected to a control unit 123. The control unit 123 processes the camera signals generated by the camera 140 and displays them on the monitor 124 in the form of numerical values, graphs, images, and / or analyses. The characteristics of the camera 140 (e.g., gain, brightness, aperture, focus, and / or zoom) can be set, for example, using the processor unit 127. Furthermore, an optical unit 141 is arranged in the sample chamber 120 and, through the positioning and / or settings of the optical unit, directs light from the light source 142, for example, to the object 125 and / or from the object 125 to the camera 140. The light source 142 generates light of at least one wavelength within the wavelength range of 300 nm to 1500 nm. The light source 142 may be disposed in the SEM 100, on the SEM 100, and / or spaced apart from the SEM 100. Figure 1 In FIG. 1 , a light source 142 is arranged in the sample chamber 120 of the SEM 100 .

[0170] Another light source 142A and another light source 142B are also arranged in the sample chamber 120. The other light source 142A generates light of at least one wavelength in the wavelength range of 300 nm to 1500 nm. The yet another light source 142B generates light of at least one wavelength in the wavelength range of 300 nm to 1500 nm.

[0171] A device may refer to any component and / or any object 125 arranged in the sample chamber 120 of the SEM 100. In the SEM 100, for example, the object 125, the object stage 122, and / or the object holder 114 may be used as a device.

[0172] Camera 140 is wired to camera movement device 150. Camera movement device 150 is designed to adapt the position of camera 140. In both the above and below, position refers to both location and alignment. For example, camera movement device 150 is designed to perform relative movement relative to device 114, 122, and / or 125 and the field of view of camera 140, wherein the area imaged by camera 140 is the field of view of camera 140. For example, the position of camera 140 in SEM 100 can be set by camera movement device 150.

[0173] The camera 140 may include an aperture, such as a slot stop, a pinhole, and / or a rectangular stop, which limits the field of view of the camera 140 .

[0174] The optical unit 141 is wired to a unit control device 151. The unit control device 151 is designed to adapt the settings of the optical unit 141 and / or the position of the optical unit 141. In both the above and below, the term "position" refers to both position and alignment. For example, the unit control device 151 is designed to move the optical unit 141 so that the fields of view of the devices 114, 122, and / or 125 and the camera 140 are moved relative to each other. For example, the position of the optical unit 141 within the SEM 100 can be set by the unit control device 151. Additionally or alternatively, the unit control device 151 can be designed to adapt the properties of the optical unit 141. For example, the unit control device 151 transmits electrical signals to the optical unit 141, thereby adapting the properties of the optical unit 141. The properties modified by the unit control device 151 can relate, for example, to the reflectivity, absorption, and / or deflection of a light beam incident on and / or emitted from the optical unit 141. Furthermore, these characteristics may be related to further influencing factors suitable for causing a relative movement between the devices 114 , 122 and / or 125 and the field of view of the camera 140 within the meaning of the present invention.

[0175] Object stage 122 is wired to device movement device 152. Device movement device 152 is designed to adapt the position of devices 114, 122, and / or 125; for example, device movement device 152 is designed to perform relative movements relative to devices 114, 122, and / or 125 and the field of view of camera 140. Both above and below, position refers to both location and alignment. For example, the position of object stage 122 within SEM 100 can be set by device movement device 152. In this context, device movement device 152 is designed to enable at least one translational movement of the device.

[0176] For example, the device moving device 152 may also take the form of the object holder 114 and / or the object stage 122 described above.

[0177] A further embodiment of the SEM 100 provides that the camera 140 is arranged on or in the chamber ceiling and / or on or in the chamber wall of the sample chamber 120 .

[0178] Another embodiment of the SEM 100 provides that the optical unit 141 comprises at least one mirror. Additionally or alternatively, the guiding device of the SEM 100 comprises a beam column 104, wherein the optical unit 141 comprises at least one mirror arrangement and takes the form of a region of the beam column 104. In this case, the optical unit 141 takes the form of a milling region of the beam column 104 and / or a polishing region of the beam column 104.

[0179] Additionally or alternatively, the at least one mirror may be shaped such that it can be arranged on a conical portion of the objective 107 of the particle beam device 100 .

[0180] Yet another embodiment of the SEM 100 provides that the optical unit 141 comprises a first reflecting mirror and a second reflecting mirror.

[0181] Additionally or alternatively, the first mirror and / or the second mirror may be shaped such that it / they can be arranged on a conical portion of the objective 107 of the particle beam device 100 .

[0182] Another embodiment of the SEM 100 provides that the optical unit 141 comprises at least one mirror for correcting image distortion. For example, the at least one mirror for correcting image distortion may take a specific form; for example, the at least one mirror may have a curved embodiment.

[0183] Yet another embodiment of the SEM 100 provides that the optical unit 141 comprises at least one prism, a rhombus prism, a grating, a spatial light modulator (SLM) and / or an acousto-optic modulator (AOM).

[0184] The control unit 123 further comprises a database 126 in which data is stored and from which data is read.

[0185] The above-described embodiments of the SEM 100 may be used to create an image of the object 125. Furthermore, an image of a device may be created. For example, the object 125, the object stage 122, and / or the object holder 114 may be used as a device.

[0186] Figure 1A Another schematic diagram of the SEM 100 is shown. Another schematic diagram of the SEM 100 is based on Figure 1 Reference Figure 1 , and first refer to the explanations provided above, which also apply in this case.

[0187] and Figure 1 Different, according to Figure 1A Neither the optical unit 141 nor the unit control device 151 is formed on the SEM 100. Figure 1A On the SEM 100, neither another light source 142A nor another light source 142B is formed. Figure 1A The SEM 100 also does not include the device moving device 152 .

[0188] Figure 1B Another schematic diagram of the SEM 100 is shown. Another schematic diagram of the SEM 100 is based on Figure 1Reference Figure 1 , and first refer to the explanations provided above, which also apply in this case.

[0189] and Figure 1 Different, in accordance with Figure 1B The unit control device 151 is not formed on the SEM 100. Figure 1B The camera moving device 150 is not formed on the SEM 100. Figure 1B On the SEM 100 of FIG. 1 , the optical unit takes the form of the polishing region 143 of the beam column 104 .

[0190] Figure 2 A particle beam device in the form of a combined device 200 is shown. The combined device 200 comprises two particle beam columns. First, as already described Figure 1 As depicted in FIG, the combined device 200 is provided with the SEM 100, but without the sample chamber 120. Instead, the SEM 100 is arranged in a sample chamber 201. The sample chamber 201 is under vacuum. To generate the vacuum, a pump (not shown) is arranged on the sample chamber 201. Figure 2 In the depicted embodiment, the sample chamber 201 operates within a first pressure range or within a second pressure range. The first pressure range only includes pressures less than or equal to 10 -3 hPa, and the second pressure range only includes pressures greater than 10 -3 The sample chamber 201 is vacuum-tight to ensure these pressure ranges.

[0191] The third detector 121 is arranged in the sample chamber 201 .

[0192] The SEM 100 is used to generate a first particle beam, specifically a primary electron beam as described above, and has an optical axis as mentioned above, which is located at Figure 2 The ion beam device 300 is provided with the reference numeral 709 and is also referred to as the first beam axis in the following. The combined device 200 is further provided with an ion beam device 300 which is also arranged on the sample chamber 201. The ion beam device 300 also has an optical axis which is located at Figure 2 The beam axis is provided with reference numeral 710 and is hereinafter also referred to as the second beam axis.

[0193] For example, the SEM 100 is arranged vertically relative to the sample chamber 201. In contrast, the ion beam device 300 is arranged in a manner tilted, for example, at an angle of approximately 0° to 90° relative to the SEM 100. Figure 2, an arrangement of approximately 50° is shown in FIG. The ion beam device 300 includes a second beam generator in the form of an ion beam generator 301. The ion beam generator 301 generates ions, which form a second particle beam in the form of an ion beam. These ions are accelerated by means of an extraction electrode 302 at a predeterminable potential. The second particle beam then passes through the ion optical unit of the ion beam device 300, which includes a focusing lens 303 and a second objective lens 304. The second objective lens 304 ultimately generates an ion probe, which is focused on an object 125 arranged on an object holder 114. The object holder 114 is arranged on an object carrier 122.

[0194] Arranged above the second objective lens 304 (i.e., in the direction of the ion beam generator 301) are a settable or selectable aperture 306, a first electrode arrangement 307, and a second electrode arrangement 308, wherein the first electrode arrangement 307 and the second electrode arrangement 308 are designed as scanning electrodes. The second particle beam is raster-scanned over the surface of the object 125 by means of the first electrode arrangement 307 and the second electrode arrangement 308, wherein the first electrode arrangement 307 acts in a first direction and the second electrode arrangement 308 acts in a second direction opposite to the first direction. Thus, for example, raster scanning is performed in the first direction. Raster scanning in the second direction, which is perpendicular to the first direction, is performed by further electrodes (not depicted) on the first electrode arrangement 307 and the second electrode arrangement 308, which are rotated by 90°.

[0195] As explained above, the object holder 114 is arranged on or forms the object carrier 122. Figure 2 In the illustrated embodiment, the object stage 122 is also designed to move in three perpendicular directions: specifically, in the x-direction (first stage axis), the y-direction (second stage axis), and the z-direction (third stage axis). Furthermore, the object stage 122 can rotate about two perpendicular rotation axes (stage rotation axes).

[0196] In order to better illustrate the various units of the combined device 200, the components are presented in an exaggerated manner. Figure 2 The distances between the various units of the combined device 200 depicted in FIG.

[0197] A radiation detector 119 for detecting interaction radiation (e.g., x-ray radiation and / or cathodoluminescence) is arranged in the sample chamber 201. The radiation detector 119 is connected to a control unit 123, which includes a monitor 124 and a processor unit 127. In addition or as an alternative, a further detector, in particular for detecting secondary electrons, in the form of a chamber detector 500 can be arranged in the sample chamber 201. The further detector is likewise connected to the control unit 123.

[0198] The control unit 123 processes the data generated by the first detector 116 ( Figure 2 Not depicted), the second detector 117 ( Figure 2 ), the detection signals generated by the third detector 121, the radiation detector 119 and / or the chamber detector 500, and these detection signals are displayed on the monitor 124 in the form of numerical values, charts, images and / or analysis.

[0199] Furthermore, a camera 140 is arranged above the sample chamber 201; the camera detects light transmitted by a light source 142 arranged in the sample chamber 201 and reflected, for example, from the object 125. The camera 140 is connected to a control unit 123. The control unit 123 processes the camera signals generated by the camera 140 and displays them on the monitor 124 in the form of numerical values, graphs, images, and / or analyses. Furthermore, an optical unit 141 is arranged within the sample chamber 201. Due to the positioning and / or settings of the optical unit, the optical unit directs light from the light source 142, for example, toward the object 125 and / or from the object 125 toward the camera 140. The light source 142 generates light having at least one wavelength within the wavelength range of 300 nm to 1500 nm. The light source 142 is arranged within, on, and / or spaced apart from the SEM 100.

[0200] The control unit 123 further comprises a database 126 in which data is stored and from which data is read.

[0201] Figure 3 4 is a schematic diagram of another embodiment of a particle beam apparatus according to the present invention. This embodiment of a particle beam apparatus is provided with reference numeral 400 and includes a reflector corrector for correcting, for example, chromatic aberration and / or spherical aberration. Particle beam apparatus 400 includes a particle beam column 401, which takes the form of an electron beam column and corresponds substantially to the electron beam column of a corrected SEM. However, particle beam apparatus 400 is not limited to the SEM with the reflector corrector. Instead, particle beam apparatus can include any type of corrector unit.

[0202] Particle beam column 401 comprises a particle beam generator, an extraction electrode 403 and an anode 404 in the form of an electron source 402 (cathode). For example, the electron source 402 takes the form of a thermal field emitter. The electrons emitted from the electron source 402 are accelerated to arrive at the anode 404 due to the potential difference between the electron source 402 and the anode 404. Accordingly, a particle beam in the form of an electron beam is formed along the first optical axis OA1.

[0203] After the particle beam is emitted from the electron source 402, the particle beam is guided along a beam path corresponding to the first optical axis OA1. The first electrostatic lens 405, the second electrostatic lens 406 and the third electrostatic lens 407 are used to guide the particle beam.

[0204] Further, beam guide is used to set particle beam along beam path. The beam guide in this embodiment includes a source setting unit, which has two magnetic deflection units 408 arranged along the first optical axis OA1. In addition, particle beam equipment 400 includes an electrostatic beam deflection unit. The first electrostatic beam deflection unit 409 (also taking the form of a quadrupole in another embodiment) is arranged between the second electrostatic lens 406 and the 3rd electrostatic lens 407. The first electrostatic beam deflection unit 409 is arranged in the downstream of the magnetic deflection unit 408. The first multipole unit 409A in the form of the first magnetic deflection unit is arranged on one side of the first electrostatic beam deflection unit 409. In addition, the second multipole unit 409B in the form of the second magnetic deflection unit is arranged on the other side of the first electrostatic beam deflection unit 409. The first electrostatic beam deflection unit 409, the first multipole unit 409A and the second multipole unit 409B are set for setting the particle beam relative to the axis of the 3rd electrostatic lens 407 and the entrance window of the beam deflection device 410. The first electrostatic beam deflection unit 409 , the first multipole unit 409A and the second multipole unit 409B can interact like a Wien filter. A further magnetic deflection element 432 is arranged at the entrance of the beam deflection device 410 .

[0205] The beam deflector 410 serves as a particle beam deflector, deflecting the particle beam in a specific manner. The beam deflector 410 includes a plurality of magnetic sectors, specifically a first magnetic sector 411A, a second magnetic sector 411B, a third magnetic sector 411C, a fourth magnetic sector 411D, a fifth magnetic sector 411E, a sixth magnetic sector 411F, and a seventh magnetic sector 411G. A particle beam enters the beam deflector 410 along a first optical axis OA1 and is deflected by the beam deflector 410 toward a second optical axis OA2. The beam is deflected by an angle of 30° to 120° using the first magnetic sector 411A, the second magnetic sector 411B, and the third magnetic sector 411C. The second optical axis OA2 is oriented at the same angle relative to the first optical axis OA1. The beam deflector 410 also precisely deflects the particle beam directed along the second optical axis OA2 toward the third optical axis OA3. Beam deflection is provided by the third magnetic sector 411C, the fourth magnetic sector 411D, and the fifth magnetic sector 411E. Figure 3In the embodiment of the present invention, the deflection relative to the second optical axis OA2 and relative to the 3rd optical axis OA3 is provided by making the particle beam deflection 90 ° angle. Therefore, the 3rd optical axis OA3 extends coaxially with respect to the first optical axis OA1. However, the following fact is mentioned: the particle beam equipment 400 according to the present invention described herein is not limited to 90 ° of deflection angles. Instead, beam deflection device 410 can select any suitable deflection angle, for example 70 ° or 110 °, as a result of which the first optical axis OA1 does not extend coaxially with respect to the 3rd optical axis OA3. More details about beam deflection device 410 are provided with reference to WO 2002 / 067286 A2.

[0206] After the particle beam has been deflected by the first magnetic sector 411A, the second magnetic sector 411B, and the third magnetic sector 411C, the particle beam is guided along the second optical axis OA2. The particle beam is guided to the electrostatic mirror 414 and, on its path to the electrostatic mirror 414, travels along the fourth electrostatic lens 415, the third multipole unit 416A in the form of a magnetic deflection unit, the second electrostatic beam deflection unit 416, the third electrostatic beam deflection unit 417, and the fourth multipole unit 416B in the form of a magnetic deflection unit. The electrostatic mirror 414 includes a first mirror electrode 413A, a second mirror electrode 413B, and a third mirror electrode 413C. The electrons of the particle beam reflected back at the electrostatic mirror 414 travel along the second optical axis OA2 again and reenter the beam deflection device 410. These electrons are then deflected to the third optical axis OA3 by the third magnetic sector 411C, the fourth magnetic sector 411D, and the fifth magnetic sector 411E.

[0207] Electrons of the particle beam are emitted from the beam deflection device 410 and directed along the third optical axis OA3 toward an object 425 to be inspected and disposed in the object holder 114. On the way to the object 425, the particle beam is directed to a fifth electrostatic lens 418, a beam guide tube 420, a fifth multipole unit 418A, a sixth multipole unit 418B, and an objective lens 421. The fifth electrostatic lens 418 is an electrostatic immersion lens. The particle beam is decelerated or accelerated by the fifth electrostatic lens 418 to the potential of the beam guide tube 420.

[0208] By means of objective lens 421, particle beam is focused on the focal plane that object 425 is arranged on.Object holder 114 is arranged on movable object carrier 424 or forms object carrier 424.Moveable object carrier 424 is arranged in the sample chamber 426 of particle beam device 400.Object carrier 424 is configured to be movable in three directions arranged perpendicularly to each other, specifically moves in x direction (first carrier axis), y direction (second carrier axis) and z direction (third carrier axis).In addition, object carrier 424 can rotate around two rotation axes (rotation axis of carrier) arranged perpendicularly to each other.

[0209] The sample chamber 426 is under vacuum. In order to generate the vacuum, a pump (not shown) is arranged on the sample chamber 426. Figure 3 In the depicted embodiment, the sample chamber 426 operates within a first pressure range or within a second pressure range. The first pressure range only includes pressures less than or equal to 10 -3 hPa, and the second pressure range only includes pressures greater than 10 -3 The sample chamber 426 is vacuum sealed to ensure these pressure ranges.

[0210] The objective lens 421 can be in the form of a combination of a magnetic lens 422 and a sixth electrostatic lens 423. The end of the beam guide tube 420 can also be an electrode of the electrostatic lens. After exiting the beam guide tube 420, the particles of the particle beam are decelerated to the potential of the object 425. The objective lens 421 is not limited to the combination of the magnetic lens 422 and the sixth electrostatic lens 423. Rather, the objective lens 421 can take any suitable form. For example, the objective lens 421 can also take the form of a pure magnetic lens or a pure electrostatic lens.

[0211] The particle beam focused on object 425 interacts with object 425, generating interacting particles. Specifically, secondary electrons are emitted from object 425, or backscattered electrons are backscattered from object 425. The secondary electrons or backscattered electrons are also accelerated and guided along the third optical axis OA3 into the beam guide tube 420. Specifically, the trajectories of the secondary electrons and backscattered electrons on the beam path of the particle beam travel in a direction opposite to that of the particle beam.

[0212] The particle beam device 400 includes a first analytical detector 419, which is arranged along the beam path between the beam deflection device 410 and the objective lens 421. Secondary electrons traveling in a direction oriented at a large angle relative to the third optical axis OA3 are detected by the first analytical detector 419. Backscattered electrons and secondary electrons at a small axial distance relative to the third optical axis OA3 at the location of the first analytical detector 419 enter the beam deflection device 410 and are deflected by the fifth magnetic sector 411E, the sixth magnetic sector 411F, and the seventh magnetic sector 411G along the detection beam path 427 to the second analytical detector 428. For example, the deflection angle is 90° or 110°.

[0213] The first analysis detector 419 generates a detection signal which is mainly generated by the emitted secondary electrons. The detection signal generated by the first analysis detector 419 is directed to the control unit 123 and is used to obtain information about the characteristics of the interaction area of the focused particle beam and the object 425. In particular, the focused particle beam is raster scanned on the object 425 using a scanning device 429. With the help of the detection signal generated by the first analysis detector 419, an image of the raster scanned area of the object 425 can then be created and displayed on a display unit. The display unit is, for example, a monitor 124 arranged on the control unit 123. The control unit 123 additionally comprises a processor unit 127.

[0214] A second analyzing detector 428 is also connected to the control unit 123. The detection signal of the second analyzing detector 428 is transmitted to the control unit 123 and used to create an image of the raster-scanned area of the object 425 and to display the image on a display unit. The display unit is, for example, a monitor 124 arranged on the control unit 123.

[0215] A radiation detector 119 for detecting interaction radiation (e.g., x-ray radiation and / or cathodoluminescence) is arranged on or in the sample chamber 426. The radiation detector 119 is connected to a control unit 123, which includes a monitor 124. The control unit 123 processes the detection signals from the radiation detector 119 and displays these detection signals on the monitor 124 in the form of an image.

[0216] Furthermore, a camera 140 is arranged on or in the sample chamber 426; the camera detects light, wherein the light is transmitted by a light source 142 arranged in the sample chamber 426 and, for example, reflected from the object 125. The camera 140 is connected to the control unit 123. The control unit 123 processes the camera signal generated by the camera 140 and displays the signal on the monitor 124 in the form of numerical values, graphs, images, and / or analyses. Furthermore, an optical unit 141 is arranged in the sample chamber 426 and, through the positioning and / or settings of the optical unit, directs light from the light source 142, for example, to the object 125 and / or, for example, from the object 125 to the camera 140. The light source 142 generates light having at least one wavelength within the wavelength range of 300 nm to 1500 nm. The light source 142 is arranged in the particle beam device 400, on the particle beam device 400, and / or spaced apart from the particle beam device 400.

[0217] The control unit 123 further comprises a database 126 in which data is stored and from which data is read.

[0218] Furthermore, the particle beam apparatus 400 includes a chamber detector 500 connected to the control unit 123 .

[0219] In the case of the particle beam device 400, the primary electron beam can be rotated (e.g., tilted) relative to the object 425, for example, using the fifth multipole unit 418A and the sixth multipole unit 418B. Additionally or alternatively, the primary electron beam can be rotated (e.g., tilted) relative to the object 425, for example, using the first multipole unit 409A and the second multipole unit 409B.

[0220] The object carriers 122, 424 of the particle beam apparatuses 100, 200 and 400 explained above will now be discussed in detail below. The object carriers 122, 424 are designed to Figure 4 and Figure 5 Reference is made to the fact that the present invention is not limited to the object carriers 122, 424 described herein. Rather, the present invention may comprise any movable object carrier suitable for the present invention.

[0221] The object holder 114 is arranged on an object stage 122, 424. The object stage 122, 424 comprises movement elements which ensure that the object stage 122, 424 is moved in such a way that a region of interest on the object 125, 425 can be examined, for example, by means of a particle beam. Figure 4 and Figure 5 The moving elements are schematically depicted in FIG and explained below.

[0222] The object carrier 122, 424 comprises a first movement element 600, for example, which is arranged on a housing 601 of a sample chamber 120, 201 or 426, in which the object carrier 122, 424 is in turn arranged. The first movement element 600 enables the object carrier 122, 424 to be moved along the z-axis (third carrier axis). A second movement element 602 is also provided. The second movement element 602 enables the object carrier 122, 424 to be rotated about a first carrier rotation axis 603 (also referred to as the tilt axis). This second movement element 602 is used to tilt an object 125, 425 about the first carrier rotation axis 603, wherein the object 125, 425 is arranged on the object holder 114.

[0223] Arranged on the second movement element 602 is a third movement element 604, which is designed as a guide for a slider and ensures that the object carrier 122, 424 can move in the x-direction (first carrier axis). The slider is in turn a further movement element, specifically a fourth movement element 605. The fourth movement element 605 is designed to enable the object carrier 122, 424 to move in the y-direction (second carrier axis). For this purpose, the fourth movement element 605 includes a guide in which a further slider is guided, and the object holder 114 is arranged on this further slider.

[0224] The object holder 114 is in turn designed with a fifth movement element 606 which enables the object holder 114 to be rotated about a second stage rotation axis 607. The second stage rotation axis 607 is oriented perpendicularly to the first stage rotation axis 603.

[0225] Due to the above arrangement, the object stage 122, 424 of the embodiment discussed herein has the following kinematic chain: first moving element 600 (moves along the z-axis) - second moving element 602 (rotates about the stage's first rotation axis 603) - third moving element 604 (moves along the x-axis) - fourth moving element 605 (moves along the y-axis) - fifth moving element 606 (rotates about the stage's second rotation axis 607). Other kinematic chains may also be implemented in addition to or in the alternative.

[0226] In a further embodiment (not shown), it is provided that further movement elements are arranged on the object carrier 122 , 424 , making possible a movement along further translation axes and / or about further rotation axes.

[0227] from Figure 5 As is apparent from the diagram, each of the aforementioned moving elements is connected to a drive unit in the form of a motor M1 to M5. In this regard, the first moving element 600 is connected to the first drive unit M1 and is driven due to the driving force provided by the first drive unit M1. The second moving element 602 is connected to the second drive unit M2, which drives the second moving element 602. The third moving element 604 is in turn connected to the third drive unit M3. The third drive unit M3 provides the driving force for driving the third moving element 604. The fourth moving element 605 is connected to the fourth drive unit M4, wherein the fourth drive unit M4 drives the fourth moving element 605. Further, the fifth moving element 606 is connected to the fifth drive unit M5. The fifth drive unit M5 provides the driving force for driving the fifth moving element 606.

[0228] The above-mentioned drive units M1 to M5 may take the form of, for example, stepper motors and are controlled by the drive control unit 608, and each drive unit is supplied with power current by the drive control unit 608 (see Figure 5 ). Explicit reference is made to the fact that the invention is not limited to movement by means of stepper motors. Rather, any drive unit can be used as drive unit, for example a brushless motor.

[0229] In the following, based on Figure 1 An embodiment of the method according to the present invention is explained in detail with reference to SEM 100 .

[0230] Figure 6 A schematic diagram showing the operation sequence of a first embodiment of the method according to the present invention, wherein the method is performed according to Figure 1 The same applies correspondingly to the above-mentioned further particle beam devices 200 and 400 with respect to the execution of this embodiment of the method according to the invention.

[0231] The method according to the present invention is used to create an image of a device. In this context, the device may refer to any component and / or any object arranged in the sample chamber 120 of the SEM 100. Within the meaning of the present invention, the device may, for example, take the form of the aforementioned object holder 114, the aforementioned object stage 122, and / or the aforementioned object 125.

[0232] In particular, the method according to the present invention implements the following: (A) recording a partial image of a first partial area of the device using a camera 140; (B) performing a relative movement relative to the device and the area imaged by the camera 140; (C) recording at least one additional partial image of at least one second partial area of the device; and (D) stitching the recorded partial images using a processor unit 127 to form an image of the device.

[0233] In method step S1 of the method according to the present invention, a partial image of a first partial area of device 114, 122, and / or 125 is initially recorded using camera 140. The partial image is recorded by using camera 140 to detect light beams, wherein these light beams are generated by light source 142 and reflected from device 114, 122, and / or 125 into the area imaged by camera 140. The area imaged by camera 140 is the field of view of camera 140. Light source 142 generates light having at least one wavelength in the wavelength range of 300 nm to 1500 nm. Light source 142 is arranged in SEM 100, on SEM 100, and / or spaced apart from SEM 100.

[0234] Within the meaning of the present invention, a partial image is understood to mean an image of a partial region. A partial region is a region of device 114, 122, and / or 125. In particular, in this case, the partial region is smaller than the outer dimensions of device 114, 122, and / or 125, so that device 114, 122, and / or 125 can include multiple partial regions.

[0235] Light source 142 is understood to mean a unit designed to provide light for irradiating device 114, 122, and / or 125. For example, light source 142 can take the form of an incandescent lamp, a gas discharge lamp, a light-emitting diode, an electroluminescent emitter, a phosphorescent emitter, a fluorescent emitter, and / or a laser. In particular, device 114, 122, and / or 125 can also be designed as a light source 142, for example, by cathode luminescence. However, in addition or as an alternative, light source 142 can also be the sun and / or an ambient light source, the light of which can be guided to device 114, 122, and / or 125 via, for example, a light guide and / or a window, which is arranged, for example, in a wall or ceiling of sample chamber 120.

[0236] In method step S2 of the method according to the present invention, a relative movement is performed relative to the field of view of device 114, 122, and / or 125 and camera 140. The relative movement can be implemented by adapting: (i) the position of camera 140; (ii) the position of device 114, 122, and / or 125; (iii) the settings of optical unit 141; and / or (iv) the position of optical unit 141. The relative movement is implemented such that at least one second subregion of device 114, 122, and / or 125 can be imaged by camera 140. In other words, the movement is performed such that the field of view of camera 140 overlaps with at least one second subregion of device 114, 122, and / or 125. For example, the adaptation can be achieved by: (a) changing the position of the camera 140 by means of the camera moving device 150; (b) changing the position of the device 114, 122 and / or 125 by means of at least one device translation movement performed using the device moving device 152; (c) changing the setting of the optical unit 141 by means of the unit control device 151; and / or (d) changing the position of the optical unit 141 by means of the unit control device 151.

[0237] Within the meaning of the present invention, optical unit 141 is understood to be a unit comprising at least one optical component designed to influence the light path from device 114, 122, and / or 125 to camera 140. In other words, optical unit 141 is designed to direct the light beam reflected from device 114, 122, and / or 125 into the field of view of camera 140. For example, optical unit 141 comprises a mirror. Additionally or alternatively, optical unit 141 may take the form of, for example, a mirror system, a prism, a rhombus prism, a grating, a spatial light modulator (SLM), and / or an acousto-optic modulator (AOM).

[0238] Within the meaning of the present invention, the unit control device 151 of the optical unit 141 is understood to mean a unit that is designed to change the aforementioned light path influenced by the optical unit 141. For example, this change can be implemented by a translational movement and / or rotational movement of the optical unit 141. For example, the unit control device 151 of the optical unit 141 influences the position of the optical unit 141 in space, so that the light path guided by the optical unit 141 is influenced. In this case, the position can explicitly include the position and / or orientation of the optical unit 141 in space. However, in addition to this and / or as an alternative, the unit control device 151 of the optical unit 141 can also influence the properties of the optical unit 141. For example, the unit control device 151 can output an electronic signal to the optical unit 141, which electronic signal, for example, activates the optical unit 141 in the form of an SLM and / or AOM to influence the light path.

[0239] Within the meaning of the present invention, camera movement device 150 is understood to mean a unit designed to influence the position of camera 140 in space. As explained above, in this case, the position can explicitly include the position and / or orientation of camera 140 in space. For example, this influence can be implemented by a translational and / or rotational movement of camera 140 by means of camera movement device 150. For example, a rotational movement of camera 140 can be performed about an axis, wherein the axis is aligned perpendicular to the optical axis of the camera.

[0240] Within the meaning of the present invention, the device movement device 152 is understood to mean a unit designed to influence the position of the device 114, 122, and / or 125 in space. As explained above, in this case, the position can explicitly include the position and / or orientation of the device 114, 122, and / or 125 in space. For example, this influence can be implemented by a translational and / or rotational movement of the device 114, 122, and / or 125 using the device movement device 152. For example, the device movement device 152 can also take the form of the above-mentioned object holder 114, object carrier 122, first movement element 600, second movement element 602, third movement element 604, fourth movement element 605, and / or fifth movement element 606. The translational movement of the device 114, 122, and / or 125 using the device movement device 114, 122, 152, 600, 604, and / or 605 is also referred to as device translation movement in the following text. The rotational movement of the device 114 , 122 and / or 125 using the device moving device 114 , 122 , 152 , 602 and / or 606 is also referred to as device rotational movement in the following.

[0241] In method step S3 of the method according to the present invention, at least one further partial image of at least one second subarea of device 114, 122, and / or 125 is recorded. The at least one further partial image is recorded using camera 140 and further light source 142A by detecting a further light beam with camera 140. As explained above, the further light beam is generated by further light source 142A and reflected from device 114, 122, and / or 125 into the area imaged by camera 140. In this case, further light source 142A generates light of at least one wavelength in the wavelength range of 300 nm to 1500 nm.

[0242] Within the meaning of the present invention, at least one further partial image is understood to mean an image of at least one second partial region. The at least one second partial region is a region of device 114, 122, and / or 125. In particular, the at least one second partial region is smaller than the outer dimensions of device 114, 122, and / or 125. Reference is made to the fact that the first partial region and the at least one second partial region may overlap.

[0243] Within the meaning of the present invention, a further light source 142A is understood to mean a unit designed to provide light for irradiating the devices 114, 122 and / or 125. For example, the further light source 142A can take the form of an incandescent lamp, a gas discharge lamp, a light-emitting diode, an electroluminescent emitter, a phosphorescent emitter, a fluorescent emitter and / or a laser. In particular, the devices 114, 122 and / or 125 themselves can also be designed as a further light source 142A, for example by cathode luminescence. However, in addition or as an alternative, the further light source 142A can also be the sun and / or an ambient light source, the light of which can be guided to the devices 114, 122 and / or 125 via, for example, a light guide and / or a window, which is, for example, arranged in a chamber wall or a chamber ceiling of the sample chamber 120.

[0244] With regard to the arrangement and characteristics of the further light source 142A, reference is made to the above explanations regarding the arrangement and characteristics of the light source 142 ; these statements analogously apply here as well.

[0245] In addition or in the alternative, at least one further partial image can be recorded using camera 140 and light source 142. To this end, camera 140 detects the light beam generated by light source 142. As explained above, the light beam is reflected from devices 114, 122, and / or 125 into the area imaged by camera 140. In this case, SEM 100 can also be designed without further light source 142A.

[0246] Mention is made of the fact that the further light source 142A and the light source 142 may be identical.

[0247] In method step S4 of the method according to the invention, the recorded partial image and the recorded at least one further partial image are stitched together using processor unit 127 to form an image of device 114 , 122 and / or 125 .

[0248] The totality of the above-described method steps is also referred to below as the basic method.

[0249] Figure 7 Schematic diagram showing the operation sequence of the second embodiment of the method according to the present invention. Figure 7 A second embodiment of the method according to the invention is based on Figure 6 The first embodiment of the method according to the invention is therefore first referred to the explanations provided above, which also apply in this case. Figure 6 Compared with the first embodiment of the method according to the present invention, Figure 7 A second embodiment of the method according to the invention comprises the further method steps S5, S6 and S7. Figure 6 Compared with the first embodiment of the method according to the present invention, Figure 7The second embodiment of the method according to the invention does not comprise method step S4.

[0250] In method step S5 of the second embodiment of the method according to the invention, a further relative movement is performed with respect to the device 114, 122 and / or 125 and the field of view of the camera 140. For example, to this end, the following are adapted in such a way that at least one further second partial area of the device 114, 122 and / or 125 is imaged by means of the camera 140: (i) the position of the camera 140, (ii) the position of the device 114, 122 and / or 125, (iii) the settings of the optical unit 141 and / or (iv) the position of the optical unit 141. The adaptation is achieved by: (a) changing the position of the camera 140 by means of the camera moving device 150; (b) changing the position of the device 114, 122 and / or 125 by means of at least one additional device translation movement performed using the device moving device 114, 122, 152, 600, 604 and / or 605; (c) changing the settings of the optical unit 141 by means of the unit control device 151; and / or (d) changing the position of the optical unit 141 by means of the unit control device 151.

[0251] In method step S6 of the second embodiment of the method according to the present invention, at least one further partial image of at least one further second subarea of device 114, 122, and / or 125 is recorded using camera 140 and further light source 142B. In this case, the at least one further partial image is recorded by detecting a further light beam using camera 140. As explained above, the further light beam is generated by further light source 142B and reflected from device 114, 122, and / or 125 into the area imaged by camera 140. Further light source 142B generates light of at least one wavelength in the wavelength range of 300 nm to 1500 nm.

[0252] Within the meaning of the present invention, at least one further partial image is understood to mean an image of at least one further second subregion. The at least one further second subregion is a region of device 114, 122, and / or 125. In particular, the at least one further second subregion is smaller than the outer dimensions of device 114, 122, and / or 125. Reference is made to the fact that the at least one further second subregion and the first subregion can overlap and / or the at least one further second subregion and the at least one second subregion can overlap.

[0253] Within the meaning of the present invention, a further light source 142B is understood to mean a unit designed to provide light for irradiating the devices 114, 122 and / or 125. For example, the further light source 142B can take the form of an incandescent lamp, a gas discharge lamp, a light-emitting diode, an electroluminescent emitter, a phosphorescent emitter, a fluorescent emitter and / or a laser. In particular, the devices 114, 122 and / or 125 themselves can also be designed as a further light source 142B, for example by cathode luminescence. However, in addition or as an alternative, the further light source 142B can also be the sun and / or an ambient light source, the light of which can be guided to the devices 114, 122 and / or 125 via, for example, a light guide and / or a window, which is, for example, arranged in a chamber wall or a chamber ceiling of the sample chamber 120.

[0254] With regard to the arrangement and properties of the further light source 142B, reference is made to the above explanations regarding the arrangement and properties of the light source 142 ; these statements apply analogously here as well.

[0255] In addition or in the alternative, at least one further partial image can be recorded using camera 140 and light source 142. To this end, camera 140 detects the light beam generated by light source 142. As explained above, the light beam is reflected from devices 114, 122, and / or 125 into the area imaged by camera 140. In this case, SEM 100 can also be designed without further light source 142B.

[0256] Mention is made to the fact that the further light source 142B and the light source 142 may be identical. Additionally or in the alternative, the further light source 142B and the further light source 142A may be identical.

[0257] In method step S7 of the second embodiment of the method according to the present invention, the images of the devices 114, 122 and / or 125 are stitched together using the processor unit 127. Stitching includes stitching together the recorded partial images, the at least one further recorded partial image and / or the at least one further recorded partial image to form the image of the devices 114, 122 and / or 125.

[0258] Reference is made to the fact that the at least one further second partial region can overlap with the first partial region and / or with the at least one second partial region.

[0259] Mention is made of the fact that the second embodiment of the method according to the invention can be managed in particular without the above-mentioned method step S4 of the basic method, without replacement.

[0260] Additionally or alternatively, a third embodiment of the method according to the invention provides that at least object 125 is used as a device. In addition or in an alternative, object holder 114 and / or object carrier 122 can be used as a device. Thus, for example, object 125, object holder 114 and / or object carrier 122 can be used as the aforementioned device. Additionally or in an alternative, at least one further object, at least one further object holder and / or at least one further object carrier can be used. Further additionally or in an alternative, a structure made of object carrier 122, object holder 114, object 125, at least one further object, at least one further object holder and / or at least one further object carrier can be used. In the latter case, the method according to the invention for creating an image of a device will, for example, create an image of the structure.

[0261] Mention is made of the fact that the image may also, for example, depict only a portion of the apparatus 114, 122 and / or 125. Thus, even if a structure made of the object stage 122, the object holder 114 and the object 125 is used as the apparatus, the image may, for example, depict only a portion of the object 125.

[0262] Figure 8 A schematic diagram of a first stitching of method step S4 and / or method step S7 according to a fourth embodiment of the method according to the invention is shown, which first stitching is used to form an image 800 of the device 114, 122 and / or 125. The fourth embodiment is based on Figure 6 and / or Figure 7 . refer to Figure 6 and / or Figure 7 Therefore, reference is first made to the explanations provided above, which also apply in this case. Method step S4 and / or method step S7 can be as follows Figure 8 Proceed as described.

[0263] In this case, the fourth embodiment of the method according to the invention relates in particular to a first stitching of the partial images to form an image 800 of the device 114, 122 and / or 125. Figure 8A fourth embodiment of the method according to the present invention provides for performing a first stitching operation using processor unit 127 to form image 800 of device 114, 122, and / or 125 such that recorded partial image 801, at least one further recorded partial image 802, and at least one further recorded partial image 803 are stitched together laterally adjacent in one direction (in this case, first direction 901). In particular, partial images 801 through 803 are arranged directly adjacent to each other in the first stitching operation shown here. In other words, if the edges of two partial images 801 through 803 are arranged directly adjacent to each other, then the edges of the two partial images share at least one common point.

[0264] For example, the fourth embodiment relates to a so-called banner camera, in which partial images 801 to 803 are recorded in the form of so-called banner images. In this context, a banner image refers to an image representation that is composed of only a few pixels (e.g., individual pixels) stitched together in a first direction 901, and a significantly larger number of pixels stitched together in a second direction 902 than the few pixels in the first direction 901. To create the image 800 of the device 114, 122, and / or 125, the processor unit 127 is used to stitch together, for example, a plurality of banner images in the first direction 901.

[0265] In this case, within the meaning of the present invention, a pixel denotes a single surface element of the image 800 and / or of the partial images 801 to 803 .

[0266] Reference is again made to the fact that different partial images 801 to 803 can also partially depict the same partial area of device 114, 122, and / or 125. This means that partial images 801 to 803 can also be joined together in an overlapping manner to form image 800 of device 114, 122, and / or 125. The total number of partial images 801 to 803 joined together to form image 800 of device 114, 122, and / or 125 is selected here by way of example and, in practice, can also exceed or fall below the total number depicted here.

[0267] Additionally or alternatively, the partial images may also be stitched together in a spaced-apart manner to form the image 800 of the device 114 , 122 and / or 125 .

[0268] Figure 8A A schematic diagram of a second stitching of method step S4 and / or method step S7 according to a fifth embodiment of the method according to the present invention is shown, which is used to form an image 800 of the device 114, 122 and / or 125. The fifth embodiment is based on Figure 6 and / or Figure 7 . refer to Figure 6 and / or Figure 7Therefore, reference is first made to the explanations provided above, which also apply in this case. Method step S4 and / or method step S7 can be as follows Figure 8A Proceed as described.

[0269] In this case, the fifth embodiment of the method according to the invention relates in particular to a second stitching of the partial images to form an image 800 of the device 114, 122 and / or 125. Figure 8A A fifth embodiment of the method according to the present invention provides for performing a second stitching process using processor unit 127 to form image 800 of device 114, 122, and / or 125, such that, for example, recorded partial image 804 and at least one further recorded partial image 805 are stitched together laterally adjacent in first direction 901. Furthermore, for example, recorded partial image 804 and at least one further recorded partial image 809 are stitched together laterally adjacent in second direction 902. Similarly, further partial images 806, 807, 808, and 810 to 823 are also stitched together laterally adjacent in first direction 901 and / or in second direction 902. In particular, two of partial images 804 to 823 are arranged directly adjacent to one another within the scope of the second stitching process shown here. The total number of partial images 804 to 823 that are stitched together to form image 800 of device 114 , 122 and / or 125 is selected here by way of example and in practice may also exceed or fall below the total number depicted here.

[0270] Figure 8B A schematic diagram of a third stitching of method step S4 and / or method step S7 according to a sixth embodiment of the method according to the present invention is shown, which is used to form an image 800 of the device 114, 122 and / or 125. The sixth embodiment is based on Figure 6 and / or Figure 7 . refer to Figure 6 and / or Figure 7 Therefore, reference is first made to the explanations provided above, which also apply in this case. Method step S4 and / or method step S7 can be as follows Figure 8B Proceed as described.

[0271] In this case, the sixth embodiment of the method according to the invention relates in particular to a third stitching of the partial images to form an image 800 of the device 114, 122 and / or 125. Figure 8BA sixth embodiment of the method according to the present invention provides for performing a third stitching operation using processor unit 127 to form image 800 of device 114, 122, and / or 125, such that recorded partial image 824 and at least one further recorded partial image 825 are stitched together laterally adjacent in first direction 901. Furthermore, recorded partial image 824 and at least one further recorded partial image 829 are stitched together laterally adjacent in second direction 902. Similarly, further partial images 826, 827, 828, 830, through 837 are also stitched together laterally adjacent in first direction 901 and / or in second direction 902. In particular, two of partial images 824 through 837 are arranged directly adjacent to each other within the scope of the third stitching operation shown here. In this case, image 800 is created by performing the third stitching operation on partial images 824 through 837, wherein image 800 does not have a rectangular shape, for example. For example, in this case, the total number of laterally adjacent partial images 824 to 837 that are stitched together to form image 800 may differ in different rows and / or columns. The total number of partial images 824 to 837 that are stitched together to form image 800 of devices 114, 122, and / or 125 is selected here by way of example and, in practice, may also exceed or fall below the total number depicted here.

[0272] Figure 8C A schematic diagram of a fourth stitching of method step S4 and / or method step S7 according to a seventh exemplary embodiment of the method according to the present invention is shown, which is used to form an image 800 of the device 114, 122 and / or 125. The seventh exemplary embodiment is based on Figure 6 and / or Figure 7 . refer to Figure 6 and / or Figure 7 Therefore, reference is first made to the explanations provided above, which also apply in this case. Method step S4 and / or method step S7 can be as follows Figure 8C Proceed as described.

[0273] In this case, the seventh embodiment of the method according to the invention relates in particular to a fourth stitching of the partial images to form an image 800 of the device 114, 122 and / or 125. Figure 8CA seventh embodiment of the method according to the present invention provides for performing a fourth stitching operation using processor unit 127 to form image 800 of device 114, 122, and / or 125, such that recorded partial image 838 and at least one further recorded partial image 839 are stitched together laterally adjacent in first direction 901. Furthermore, recorded partial image 838 and at least one further recorded partial image 843 are stitched together laterally adjacent in second direction 902. Similarly, second partial images of further partial images 840, 841, 842, 844, through 851 are also stitched together laterally adjacent in first direction 901 and / or in second direction 902. During the fourth stitching of partial images 838 through 851, these partial images 838 through 851 are arranged such that a corner of a first partial image is positioned at only one corner of a second partial image. The third partial image arranged at a corner of the first partial image is, for example, arranged at a corner of the first partial image and at a corner of the edge of the second partial image having the third partial image. In particular, two of the partial images 838 to 851 are arranged directly adjacent to one another within the scope of the fourth stitching shown here. The total number of partial images 838 to 851 stitched together to form the image 800 of the device 114, 122, and / or 125 is selected here as an example and, in practice, may exceed or fall below the total number shown here.

[0274] Figure 8D A schematic diagram of a fifth stitching of method step S4 and / or method step S7 according to an eighth exemplary embodiment of the method according to the present invention is shown, which is used to form an image 800 of the device 114, 122 and / or 125. The eighth exemplary embodiment is based on Figure 6 and / or Figure 7 . refer to Figure 6 and / or Figure 7 Therefore, reference is first made to the explanations provided above, which also apply in this case. Method step S4 and / or method step S7 can be as follows Figure 8D Proceed as described.

[0275] In this case, the eighth embodiment of the method according to the invention relates in particular to a fifth stitching of the partial images to form an image 800 of the device 114, 122 and / or 125. Figure 8DAn eighth embodiment of the method according to the invention provides that a fifth stitching is performed using the processor unit 127 to form the image 800 of the device 114, 122 and / or 125 so that the recorded partial image 852, the recorded at least one further partial image 853 and the recorded at least one further partial image 854 are stitched together adjacently and / or spaced apart. Furthermore, the partial images 852 to 854 and the further partial images 855 to 857 can in particular be arranged in an overlapping manner. Figure 8D , recorded partial image 852 and at least one further recorded partial image 853 are arranged in an overlapping manner. In other words, the area of recorded partial image 852 and the area of at least one further recorded partial image 853 intersect. In other words, first edge 952 of recorded partial image 852 has at least two points 960 and 961 in common with second edge 953 of at least one further recorded partial image 853. Points that are part of both edges 952 and 953 are to be understood as being points 960 and 961 that are common to both edges 952 and 953.

[0276] exist Figure 8D , the recorded partial image 852 and the recorded at least one further partial image 854 are arranged adjacent to each other. In other words, the first edge 952 of the recorded partial image 852 has at least one point 962 in common with the third edge 954 of the recorded at least one further partial image 854. Figure 8D In the image 800, the at least one further partial image 854 and the still further partial image 855 are arranged in a spaced-apart manner. In other words, the third edge 954 of the at least one further partial image 854 does not share any points with the fourth edge 955 of the still further partial image 855. For example, in this case, the space 970 between the spaced-apart partial images 854 and 855 in the image 800 may be filled with a predeterminable value to thereby create a filled image for the space between the two spaced-apart partial images 854 and 855. Additionally or alternatively, the space 970 may be filled with values created by the processor unit 127 to thereby create an image of the space between the two spaced-apart partial images 854 and 855. For example, the processor unit 127 may create values resulting from interpolating the partial images 852 to 857 around the space 970. In this case, interpolation should be understood to refer to a method of determining image values for the image 800 using image values of adjacent regions of the image 800. Thus, the image values in the space 970 may be determined, for example, using the image values of the adjacent partial images 852 to 857. Additionally or alternatively, the space 970 may not be filled with values.

[0277] Therefore, the image 800 can also include more pixels or fewer pixels than the sum of the pixels of the recorded partial images 852 to 857.

[0278] Within the scope of the fifth stitching, reference is made to the fact that the partial images 852 to 857 can also have any desired shape.

[0279] Mention is made of the fact that any desired combination of the above-mentioned splicing types (first splicing, second splicing, third splicing, fourth splicing, fifth splicing) is also conceivable.

[0280] Additionally or alternatively, a ninth embodiment of the method according to the invention provides that: (a) the camera moving device 150 is designed to perform a camera translation movement and / or a camera rotation movement; (b) the device moving device 114, 122, 152, 600, 602, 604, 605 and / or 606 is designed to perform at least one device translation movement or at least one device translation movement in combination with a device rotation movement; (c) the unit control device 151 is designed to adapt the settings of the optical unit (141); and / or (d) the unit control device 151 is designed to perform a unit translation movement and / or a unit rotation movement. In other words, the camera moving device 150 and the unit control device 151 are designed so that they can perform a translation movement and / or a rotation movement. The device moving device 114, 122, 152, 600, 602, 604, 605 and / or 606 is designed so that it can perform a translation movement. The device movement device can additionally be designed such that it can also perform a rotational movement.

[0281] Within the meaning of the present invention, a translational movement is understood to mean a movement in which all points of a body undergo the same displacement relative to a reference system.

[0282] For the purposes of this invention, a rotational movement is understood to mean a movement about at least one axis of rotation relative to a reference system. During a rotational movement, all points on the axis of rotation remain stationary, while all other points of the body move through the same angle along a circle lying in a plane at a fixed distance from the axis of rotation. In this context, the axis of rotation is the normal to the plane and forms the center of the circle.

[0283] The embodiments of the method according to the present invention described herein are not limited to the order of the method steps listed above. Rather, any order of the method steps is conceivable and can be used in the method according to the present invention, wherein any order is suitable for solving the problem within the meaning of the present invention. In an alternative or additional embodiment, at least two method steps can also be carried out in parallel. In an alternative or additional embodiment, individual method steps can also be omitted.

[0284] The features of the invention disclosed in the present description, drawings, and claims may be essential for realizing the invention in its various embodiments, either individually or in any desired combination. The invention is not limited to the described embodiments. Variations are possible within the scope of the claims and taking into account the knowledge of a person skilled in the art.

[0285] List of Reference Numerals 100 SEM

[0286] 101 Electron Source

[0287] 102 lead electrode

[0288] 103 Anode

[0289] 104 bundle guide tube

[0290] 105 First beam-forming lens 106 Second beam-forming lens 107 First Objective

[0291] 108 First aperture unit 108A First Aperture

[0292] 109 Second aperture unit 110 pole shoes

[0293] 111 Coil

[0294] 112 Single Electrode

[0295] 113 Tubular Electrode

[0296] 114 Object Holder 115 Scanning Device

[0297] 116 First Detector 116A Backscatter Grating 117 Second Detector 118 Second Aperture

[0298] 119 Radiation Detector 120 Sample Room

[0299] 121 Third Detector 122 Object carrier

[0300] 123 Control Unit

[0301] 124 Monitor

[0302] 125 objects

[0303] 126 Database

[0304] 127 processor units

[0305] 140 Camera

[0306] 141 Optical Unit

[0307] 142 Light Source

[0308] 142A Another light source

[0309] 142B Another Light Source

[0310] 143 polishing area

[0311] 150 Camera Moving Device

[0312] 151 unit control device

[0313] 152 Device Mobile Device

[0314] 200 combination equipment

[0315] 201 Sample Room

[0316] 300 ion beam equipment

[0317] 301 Ion Beam Generator

[0318] 302 Extraction electrode in ion beam equipment

[0319] 303 Focusing lens

[0320] 304 Second Objective Lens

[0321] 306 Settable or selectable aperture

[0322] 307 First Electrode Arrangement

[0323] 308 Second Electrode Arrangement

[0324] 400 Particle beam device with corrector unit

[0325] 401 particle beam column

[0326] 402 electron source

[0327] 403 lead electrode

[0328] 404 anode

[0329] 405 First Electrostatic Lens

[0330] 406 Second Electrostatic Lens

[0331] 407 Third Electrostatic Lens

[0332] 408 Magnetic Deflection Unit

[0333] 409 First electrostatic beam deflection unit

[0334] 409A First Multipole Unit

[0335] 409B Second multipole unit

[0336] 410 Beam Deflection Device

[0337] 411A First magnetic sector

[0338] 411B Second magnetic sector

[0339] 411C Third magnetic sector

[0340] 411D Fourth magnetic sector

[0341] 411E Fifth magnetic sector

[0342] 411F Sixth magnetic sector

[0343] 411G seventh magnetic sector

[0344] 413A First reflector electrode

[0345] 413B Second reflector electrode

[0346] 413C Third reflector electrode

[0347] 414 Electrostatic Mirror

[0348] 415 Fourth Electrostatic Lens

[0349] 416 Second electrostatic beam deflection unit

[0350] 416A third multi-pole unit

[0351] 416B Fourth multipole unit

[0352] 417 Third Electrostatic Beam Deflection Unit

[0353] 418 Fifth Electrostatic Lens

[0354] 418A Fifth Multipole Unit

[0355] 418B Sixth multipole unit

[0356] 419 First Analytical Detector

[0357] 420 bundle guide tube

[0358] 421 objective lens

[0359] 422 Magnetic Lens

[0360] 423 Sixth Electrostatic Lens

[0361] 424 Object Carrier

[0362] 425 objects

[0363] 426 Sample Room

[0364] 427 Detection beam path

[0365] 428 Secondary Analytical Detector

[0366] 429 Scanning Device

[0367] 432 Additional magnetic deflection elements

[0368] 500 Chamber Detector

[0369] 600 First moving element

[0370] 601 housing

[0371] 602 Second moving element

[0372] 603 First stage rotation axis

[0373] 604 Third moving element

[0374] 605 Fourth Moving Element

[0375] 606 Fifth Moving Element

[0376] 607 Second stage rotation axis

[0377] 608 drive control unit

[0378] 709 First Beam Axis

[0379] 710 Second beam axis

[0380] 800 images

[0381] 801 points image

[0382] 802 Additional sub-images

[0383] 803 Another sub-image

[0384] 804-point image

[0385] 805 to 808 Additional sub-images

[0386] 809 Another sub-image

[0387] 810 to 823 Additional sub-images

[0388] 824-point image

[0389] 825 to 828 Additional sub-images

[0390] 829 Another sub-image

[0391] 830 to 837 Additional sub-images

[0392] 838 points image

[0393] 839 to 842 Additional sub-images

[0394] 843 Another sub-image

[0395] 844 to 851 Additional sub-images

[0396] 852 points image

[0397] 853 Additional sub-images

[0398] 854 Another sub-image

[0399] 855 to 857 Additional sub-images

[0400] 901 First Direction

[0401] 902 Second Direction

[0402] 952 First Edge

[0403] 953 The Second Edge

[0404] 954 The Third Edge

[0405] 955 The Fourth Edge

[0406] 960 to 962 Public Points

[0407] 970 Space

[0408] M1 first drive unit

[0409] M2 Second drive unit

[0410] M3 third drive unit

[0411] M4 fourth drive unit

[0412] M5 fifth drive unit

[0413] OA optical axis

[0414] OA1 first optical axis

[0415] OA2 Second Optical Axis

[0416] OA3 third optical axis

[0417] S1 to S7 method steps.

Claims

1. A method for creating an image (800) of a device (114, 122, 125, 424, 425) in a particle beam apparatus (100, 200, 400), wherein: The method comprises the following steps: - recording partial images (801 to 857) of a first partial area of the device (114, 122, 125, 424, 425) using a camera (140), wherein the partial images (801 to 857) are recorded by detecting light beams using the camera (140), wherein the light beams are generated by a light source (142, 142A, 142B) and reflected from the device (114, 122, 125, 424, 425) into the area imaged by the camera (140), wherein the light source (142, 142A, 142B) generates a wavelength between 300 nm and 150 nm. 00 nm, wherein the light source (142, 142A, 142B) is arranged in the particle beam device (100, 200, 400), on the particle beam device (100, 200, 400) and / or spaced apart from the particle beam device (100, 200, 400), wherein the device (114, 122, 125, 424, 425) is arranged in the particle beam device (100, 200, 400), and wherein the area imaged by the camera (140) is the field of view of the camera (140); - performing a relative movement relative to the device (114, 122, 125, 424, 425) and the field of view of the camera (140) by adapting: (i) the position of the camera (140); (ii) the device (114, 122, 125, 424, (iii) the setting of an optical unit (141) arranged in the particle beam apparatus (100, 200, 400) such that the light beams reflected from the device (114, 122, 125, 424, 425) are directed into the field of view of the camera (140); and / or (iv) the position of the optical unit (141), wherein the adaptation is achieved by: (a) changing the position of the camera (140) by means of a camera moving device (150); (b) using a device moving device (114, 122, 152, 424, (c) changing the setting of the optical unit (141) by means of a unit control device (151); and / or (d) changing the position of the optical unit (141) by means of the unit control device (151), - recording at least one further partial image (801 to 857) of at least one second partial area of the device (114, 122, 125, 424, 425) using the camera (140) and a further light source (142, 142A, 142B), wherein the at least one further partial image (801 to 857) is recorded by detecting a further light beam using the camera (140), wherein the further light beams are generated by the further light source (142, 142A, 142B) and reflected from the device (114, 122, 125, 424, 425) into the area imaged by the camera (140), wherein the further light source (142, 142A, 142B) generates light of at least one wavelength in the wavelength range of 300 nm to 1500 nm, wherein The other light source (142, 142A, 142B) is arranged in the particle beam device (100, 200, 400), on the particle beam device (100, 200, 400) and / or spaced apart from the particle beam device (100, 200, 400); and - stitching the recorded partial images (801 to 857) and at least one further recorded partial image (801 to 857) using a processor unit (127) to form an image (800) of the device (114, 122, 125, 424, 425).

2. The method according to claim 1, wherein The stitching is performed using the processor unit (127) to form an image (800) of the device (114, 122, 125, 424, 425) such that the recorded partial images (801 to 857) and the at least one further recorded partial image (801 to 857) are stitched together laterally adjacent in one direction (901, 902).

3. The method according to claim 1 or 2, wherein: The method comprises the following steps: - performing a further relative movement relative to the device (114, 122, 125, 424, 425) and the field of view of the camera (140) such that at least one further second partial area of the device (114, 122, 125, 424, 425) is imaged by the camera (140) by adapting: (i) the position of the camera (140); (ii) the position of the device (114, 122, 125, 424, 425); (iii) the setting of the optical unit (141); and / or (iv) the position of the optical unit (141), wherein the adaptation is achieved by: (a) changing the position of the camera (140) using the camera moving device (150); (b) changing the position of the device (114, 122, 125, 424, 425) by means of at least one further device translation movement using the device moving device (114, 122, 152, 424, 600, 604, 605); (c) changing the settings of the optical unit (141) by means of the unit control device (151); and / or (d) changing the position of the optical unit (141) by means of the unit control device (151); - recording at least one further partial image (801 to 857) of at least one further second partial area of the device (114, 122, 125, 424, 425) using the camera (140) and a further light source (142, 142A, 142B), wherein the at least one further partial image (801 to 857) is recorded by detecting further light beams using the camera (140), wherein the further light beams are generated by the further light source (142, 142A, 142B) and are emitted from the device (114, 122, 125, 424, 425) is reflected into an area imaged by the camera (140), wherein the further light source (142, 142A, 142B) generates light of at least one wavelength in a wavelength range of 300 nm to 1500 nm, wherein the further light source (142, 142A, 142B) is arranged in the particle beam device (100, 200, 400), on the particle beam device (100, 200, 400) and / or spaced apart from the particle beam device (100, 200, 400); and - wherein the stitching comprises stitching the recorded partial images (801 to 857), at least one further recorded partial image (801 to 857) and at least one further recorded partial image (801 to 857) to form an image (800) of the device (114, 122, 125, 424, 425).

4. The method according to claim 3, wherein: The stitching is performed using the processor unit (127) to form an image (800) of the device (114, 122, 125, 424, 425) such that the recorded partial images (801 to 857), the at least one further recorded partial image (801 to 857), and the at least one further recorded partial image (801 to 857) are stitched together laterally adjacent in one direction (901, 902).

5. A method according to any one of the preceding claims, wherein The light source (142, 142A, 142B) is used as the other light source (142, 142A, 142B), and / or the light source (142, 142A, 142B) is used as the further light source (142, 142A, 142B), and / or the further light source (142B) is used as the further light source (142, 142A, 142B).

6. A method according to any one of the preceding claims, wherein The device (114, 122, 125, 424, 425) includes at least one of the following features: - using at least one object (125, 425) as the device (114, 122, 125, 424，425)； - using an object holder (114) as the device (114, 122, 125, 424, 425); - Using an object carrier (122, 424) as the device (114, 122, 125, 424, 425).

7. The method according to any one of the preceding claims, comprising at least one of the following features: - using a camera moving device (150) for performing a camera translation movement and / or a camera rotation movement as the camera moving device (150); - using, as the device moving means, a device moving means (114, 122, 152, 424, 600, 602, 605 and / or 606) for performing the at least one device translation movement or for performing the at least one device translation movement in combination with a device rotation movement; - using a unit control device (151) for adapting the settings of the optical unit (141) as the unit control device (151); and / or - Using a unit control device (151) for performing a unit translation movement and / or a unit rotation movement as the unit control device (151).

8. A method for creating an image (800) of a device (114, 122, 424) in a particle beam apparatus (100, 200, 400), wherein: The device (114, 122, 424) comprises at least one object holder and / or at least one object carrier, and wherein the method comprises the following method steps: - recording a partial image (801 to 857) of a first partial area of the device (114, 122, 424) using a camera (140), wherein the partial image (801 to 857) is recorded by detecting light beams using the camera (140), wherein the light beams are generated by a light source (142, 142A, 142B) and are reflected from the device (114, 122, 424) into the area imaged by the camera (140), wherein the light source (142, 142A, 142B) generates light of at least one wavelength in the wavelength range of 300 nm to 1500 nm, wherein the light source (142, 142A, 142B) is arranged in the particle beam device (100, 200, 400), on the particle beam device (100, 200, 400) and / or spaced apart from the particle beam device (100, 200, 400), wherein the device (114, 122, 424) is arranged in the particle beam device (100, 200, 400), and wherein the area imaged by the camera (140) is the field of view of the camera (140); - performing a relative movement relative to the device (114, 122, 424) and the field of view of the camera (140) such that at least a second partial area of the device (114, 122, 424) is imaged by the camera (140) by adapting: (i) the position of the camera (140); (ii) the position of the device (114, 122, 424); (iii) the setting of an optical unit (141) which is arranged in the particle beam device (100, 200, 400) such that the light beams reflected from the device (114, 122, 424) are directed into the field of view of the camera (140); and / or (iv) the position of the optical unit (141), wherein the Adaptation is achieved by: (a) changing the position of the camera (140) by means of a camera moving device (150); (b) changing the position of the device (114, 122, 424) by means of at least one device translation movement using a device moving device (114, 122, 152, 424, 600, 604 and / or 605) and / or by means of at least one device rotation movement using the device moving device (114, 122, 152, 424, 602 and / or 606); (c) changing the settings of the optical unit (141) by means of a unit control device (151); and / or (d) changing the position of the optical unit (141) by means of the unit control device (151), - recording at least one further partial image (801 to 857) of at least one second partial area of the device (114, 122, 424) using the camera (140) and a further light source (142, 142A, 142B), wherein the at least one further partial image (801 to 857) is recorded by detecting a further light beam using the camera (140), wherein The further light beams are generated by the further light source (142, 142A, 142B) and reflected from the device (114, 122, 424) into the area imaged by the camera (140), The other light source (142, 142A, 142B) generates light of at least one wavelength within a wavelength range of 300 nm to 1500 nm, wherein the other light source (142, 142A, 142B) is arranged in the particle beam device (100, 200, 400), on the particle beam device (100, 200, 400) and / or with the particle beam device (100, 200, 400) are arranged at intervals; and - stitching the recorded partial images (801 to 857) and at least one further recorded partial image (801 to 857) to form an image (800) of the device (114, 122, 424) using a processor unit (127).

9. A computer program product having a program code which can be loaded into a processor unit (127) of a particle beam system (100, 200, 400) and which, when executed, controls the particle beam system (100, 200, 400) such that the method according to at least one of the preceding claims is carried out.

10. A particle beam device (100, 200, 400) for imaging, processing and / or analyzing at least one object (125, 425), the particle beam device having at least one beam generator (101, 301, 402) for generating at least one particle beam having charged particles; at least one guiding device (107, 115, 304, 421) for guiding, shaping and / or focusing the particle beam having charged particles onto the at least one object (125, 425); at least one light source (142, 142A, 142B) for generating a light beam capable of being directed to the device (114, 122, 125, 424, 425) and having at least one wavelength in the wavelength range of 300 nm to 1500 nm; at least one camera (140) for imaging the device (114, 122, 125, 424, 425) by detecting the light beams reflected from the device (114, 122, 125, 424, 425) in the direction of the camera (140); - at least one of the following components for performing relative movement relative to the device (114, 122, 125, 424, 425) and the field of view of the camera (140), wherein the area imaged by the camera (140) is the field of view of the camera (140): ■ a camera moving device (150), which is used to adapt the position of the camera (140); ■ device moving means (114, 122, 152, 424, 600, 604, 605) for adapting the position of the device (114, 122, 125, 424, 425), wherein the device moving means (114, 122, 152, 424, 600, 604, 605) is designed to perform at least one translational movement; ■ a unit control (151) and an optical unit (141), wherein the unit control (151) is designed to adapt the settings of the optical unit (141) and / or to adapt the position of the optical unit (141); and - at least one processor unit (127) in which the computer program product according to claim 9 is loaded.

11. The particle beam device (100, 200, 400) according to claim 10, wherein: The device (114, 122, 125, 424, 425) includes at least one of the following features: - the device (114, 122, 125, 424, 425) takes the form of at least one object (125, 425); - the device (114, 122, 125, 424, 425) is in the form of an object holder (114); - The device (114, 122, 125, 424, 425) takes the form of an object carrier (122, 424).

12. The particle beam device (100, 200, 400) according to claim 10 or 11, wherein: The optical unit (141) includes at least one of the following elements: - prism; - rhombus prisms; - grating; -Spatial light modulator; -Acousto-optic modulator.

13. The particle beam device (100, 200, 400) according to any one of claims 10 to 12, comprising at least one of the following features: - the optical unit (141) comprises at least one reflector; The guiding device (107, 115, 304, 421) of the particle beam device (100, 200, 400) comprises a beam column (104, 300, 401), wherein The optical unit (141) comprises at least one mirror arrangement and takes the form of a region of the beam column (104, 300, 401), wherein the optical unit (141) takes the form of a region of the beam column (104, 300, 401) and / or the form of a milling area (143) of the beam column (104, 300, 401).

14. The particle beam device (100, 200, 400) according to any one of claims 10 to 13, wherein: The optical unit (141) includes a first reflecting mirror and a second reflecting mirror.

15. The particle beam device (100, 200, 400) according to claim 13 or 14, wherein: The optical unit (141) includes at least one reflecting mirror for correcting image distortion.

16. The particle beam device (100, 200, 400) according to any one of claims 10 to 15, wherein: The device (114) takes the form of a movable multiple object holder, or wherein the device (114) includes a first object and a second object.

17. The particle beam device (100, 200, 400) according to any one of claims 10 to 16, wherein: The particle beam apparatus (100, 200, 400) comprises a sample chamber (120, 201, 426), wherein at least one of the following features is provided: The camera (140) is arranged on or in the chamber ceiling and / or on or in the chamber wall of the sample chamber (120, 201, 426); - The sample chamber (120, 201, 426) takes the form of a vacuum chamber.

18. The particle beam device (100, 200, 400) according to any one of claims 10 to 17, wherein: The guiding device (107, 115, 304, 421) comprises an objective lens (107, 304, 421) and / or a scanning device (115).

19. The particle beam device (200) according to any one of claims 10 to 18, wherein The beam generator (101) is in the form of a first beam generator, wherein the particle beam is in the form of a first particle beam having first charged particles, wherein the guiding device (107, 115) is in the form of a first guiding device for guiding, shaping and / or focusing the first particle beam on the at least one object (125), and wherein the particle beam apparatus (200) further comprises: - at least one second beam generator (301) for generating at least one second particle beam having second charged particles; and - at least one second guiding device (304) for guiding, shaping and / or focusing the at least one second particle beam onto the device (114, 122, 125).

20. The particle beam device (100, 200, 400) according to any one of claims 10 to 19, wherein: The particle beam device (100, 200, 400) is an electron beam device and / or an ion beam device.

Images