Pressure regulation and control method and device of reaction cavity, electronic equipment and storage medium

Abstract

The invention provides a pressure regulation and control method and device of a reaction cavity, electronic equipment and a storage medium, and relates to the technical field of control. The method comprises the following steps: acquiring a first pressure value of a reaction cavity at the current moment, and determining a valve control direction and a target control parameter set of a pressure control valve of the reaction cavity based on a pressure difference value between a preset pressure threshold value and the first pressure value; wherein the preset pressure threshold value is determined according to the pressure requirement of the reaction cavity, and the valve control direction and the target control parameter set are used for adjusting the cavity pressure of the reaction cavity from the first pressure value to the pressure threshold value; first information is sent to a pressure control valve, so that the pressure control valve regulates and controls the pressure of the reaction cavity based on the first information; wherein the first information is used for indicating the valve control direction and the target control parameter set. Therefore, the speed and the accuracy of regulating and controlling the pressure of the reaction cavity are improved.

Description

Technical Field

[0001] The present application relates to the field of control technology, and in particular to a method, device, electronic device, and storage medium for regulating the pressure of a reaction chamber. Background Art

[0002] In atomic layer deposition (ALD) equipment, stable control of the reaction chamber pressure plays a crucial role in determining the deposition results of thin films on precursors (e.g., wafers). The chamber pressure is typically controlled within a certain range and adaptively adjusted to the varying pressure requirements of the reactants being generated.

[0003] Currently, during the process of regulating the pressure of a reaction chamber, a pressure-control valve installed in the reaction chamber's gas outlet passage typically adjusts its valve opening based on a set desired pressure and the actual pressure within the reaction chamber until the actual pressure within the reaction chamber equals the set desired pressure. At this point, the pressure-control valve has completed pressure regulation of the reaction chamber.

[0004] However, during the aforementioned pressure control process, the pressure control valve opening must be continuously adjusted based on the actual pressure within the reaction chamber and the set pressure requirement, resulting in a relatively slow process of pressure control within the reaction chamber. Furthermore, the fixed pressure control parameters (i.e., pressure control parameters) pre-set for the pressure control valve cannot effectively adapt to the changing atmospheric conditions within the reaction chamber, resulting in inaccurate pressure control within the reaction chamber.

[0005] Therefore, using the above method, the speed of regulating the pressure of the reaction chamber is slow and the accuracy is low. Summary of the Invention

[0006] The embodiments of the present application provide a method, device, electronic device, and storage medium for regulating the pressure of a reaction chamber, so as to improve the speed and accuracy of regulating the pressure of the reaction chamber.

[0007] In a first aspect, an embodiment of the present application provides a method for regulating the pressure of a reaction chamber, the method comprising:

[0008] Obtaining a first pressure value of the reaction chamber at a current moment, and determining a valve control direction and a target control parameter set for a pressure control valve of the reaction chamber based on a pressure difference between a preset pressure threshold and the first pressure value; wherein the preset pressure threshold is determined based on a pressure requirement for the reaction chamber, and the valve control direction and the target control parameter set are used to adjust the chamber pressure of the reaction chamber from the first pressure value to the pressure threshold;

[0009] First information is sent to the pressure control valve so that the pressure control valve regulates the pressure of the reaction chamber based on the first information; wherein the first information is used to indicate the valve control direction and the target control parameter set.

[0010] In an optional implementation, determining a valve control direction and a target control parameter set of a pressure control valve of a reaction chamber based on a pressure difference between a preset pressure threshold and a first pressure value includes:

[0011] determining a valve control direction of the pressure control valve based on a magnitude relationship between a preset pressure threshold represented by the pressure difference and the first pressure value; and

[0012] The difference interval to which the absolute difference corresponding to the pressure difference belongs is determined, and the valve control parameter set associated with the difference interval is used as the target control parameter set.

[0013] In an optional implementation, determining a valve control direction of the pressure control valve based on a magnitude relationship between a preset pressure threshold represented by a pressure difference and a first pressure value includes:

[0014] If the magnitude relationship is that the preset pressure threshold is greater than the first pressure value, the valve control direction is the first control direction; the first control direction is the direction of reducing the valve opening of the pressure control valve;

[0015] If the magnitude relationship is that the preset pressure threshold is less than the first pressure value, the valve control direction is the second control direction; the second control direction is the direction of increasing the valve opening of the pressure control valve.

[0016] In an optional implementation, the difference interval is a first interval, a second interval or a third interval; wherein, any pressure value included in the first interval is less than the first pressure threshold, any pressure value included in the second interval is greater than or equal to the first pressure threshold and less than or equal to the second pressure threshold, and any pressure value included in the third interval is greater than the second pressure threshold.

[0017] In an optional implementation, the valve control parameter set associated with the difference interval is used as the target control parameter set, including:

[0018] If the difference interval is the second interval, determining a valve control parameter set associated with the second interval based on the gas outlet rate and gas inlet rate of the reaction chamber at the current moment;

[0019] The valve control parameter set associated with the second interval is used as the target control parameter set.

[0020] In an optional implementation, determining a valve control parameter set associated with the second interval based on the gas outlet rate and gas inlet rate of the reaction chamber at a current moment includes:

[0021] Selecting a target control parameter set that matches the air outlet rate and the air inlet rate from a plurality of preset candidate control parameter sets;

[0022] The target control parameter set is used as the valve control parameter set associated with the second interval.

[0023] In an optional implementation, after sending the first information to the pressure control valve, the method further includes:

[0024] When it is determined that the second pressure value of the reaction chamber after pressure regulation is the preset pressure threshold, second information is generated; wherein the second information is used to instruct the pressure control valve to stop pressure regulation of the reaction chamber;

[0025] A second message is sent to the pressure control valve.

[0026] In a second aspect, an embodiment of the present application further provides a pressure control device for a reaction chamber, the device comprising:

[0027] a processing module, configured to obtain a first pressure value of the reaction chamber at a current moment, and determine a valve control direction and a target control parameter set of a pressure control valve of the reaction chamber based on a pressure difference between a preset pressure threshold and the first pressure value; wherein the preset pressure threshold is determined based on a pressure requirement for the reaction chamber, and the valve control direction and the target control parameter set are used to adjust the chamber pressure of the reaction chamber from the first pressure value to the pressure threshold;

[0028] The sending module is used to send first information to the pressure-control valve, so that the pressure-control valve can regulate the pressure of the reaction chamber based on the first information; wherein the first information is used to indicate the valve control direction and the target control parameter set.

[0029] In an optional implementation, when determining the valve control direction and the target control parameter set of the pressure control valve of the reaction chamber based on the pressure difference between the preset pressure threshold and the first pressure value, the processing module is specifically configured to:

[0030] determining a valve control direction of the pressure control valve based on a magnitude relationship between a preset pressure threshold represented by the pressure difference and the first pressure value; and

[0031] The difference interval to which the absolute difference corresponding to the pressure difference belongs is determined, and the valve control parameter set associated with the difference interval is used as the target control parameter set.

[0032] In an optional implementation, when determining the valve control direction of the pressure control valve based on the magnitude relationship between the preset pressure threshold represented by the pressure difference and the first pressure value, the processing module is specifically configured to:

[0033] If the magnitude relationship is that the preset pressure threshold is greater than the first pressure value, the valve control direction is the first control direction; the first control direction is the direction of reducing the valve opening of the pressure control valve;

[0034] If the magnitude relationship is that the preset pressure threshold is less than the first pressure value, the valve control direction is the second control direction; the second control direction is the direction of increasing the valve opening of the pressure control valve.

[0035] In an optional implementation, the difference interval is a first interval, a second interval, or a third interval; wherein any pressure value included in the first interval is less than a first pressure threshold, any pressure value included in the second interval is greater than or equal to the first pressure threshold and less than or equal to the second pressure threshold, and any pressure value included in the third interval is greater than the second pressure threshold;

[0036] When the valve control parameter set associated with the difference interval is used as the target control parameter set, the processing module is specifically configured to:

[0037] If the difference interval is the second interval, determining a valve control parameter set associated with the second interval based on the gas outlet rate and gas inlet rate of the reaction chamber at the current moment;

[0038] The valve control parameter set associated with the second interval is used as the target control parameter set.

[0039] In an optional implementation, when determining the valve control parameter set associated with the second interval based on the gas outlet rate and gas inlet rate of the reaction chamber at the current moment, the processing module is specifically configured to:

[0040] Selecting a target control parameter set that matches the air outlet rate and the air inlet rate from a plurality of preset candidate control parameter sets;

[0041] The target control parameter set is used as the valve control parameter set associated with the second interval.

[0042] In an optional implementation, after sending the first information to the pressure control valve, the sending module is further configured to:

[0043] When it is determined that the second pressure value of the reaction chamber after pressure regulation is the preset pressure threshold, second information is generated; wherein the second information is used to instruct the pressure control valve to stop pressure regulation of the reaction chamber;

[0044] A second message is sent to the pressure control valve.

[0045] In a third aspect, an embodiment of the present application further provides an electronic device, including:

[0046] processor; and

[0047] Memory for storing programs,

[0048] The program includes instructions, and when the instructions are executed by the processor, the processor executes the pressure control method of the reaction chamber as described in the first aspect.

[0049] In a fourth aspect, an embodiment of the present application further provides a non-transitory computer-readable storage medium storing computer instructions, wherein the computer instructions are used to enable a computer to execute the pressure control method of the reaction chamber as described in the first aspect.

[0050] In a fifth aspect, the present application provides a computer program product, which, when called by a computer, enables the computer to execute the steps of the pressure control method for the reaction chamber as described in the first aspect.

[0051] The beneficial effects of this application are as follows:

[0052] In the pressure control method for a reaction chamber provided in an embodiment of the present application, after obtaining the first pressure value of the reaction chamber at the current moment, the valve control direction and target control parameter set of the pressure control valve of the reaction chamber can be determined based on the pressure difference between the preset pressure threshold and the first pressure value, thereby sending the first information for indicating the valve control direction and the target control parameter set to the pressure control valve, so that the pressure control valve controls the pressure of the reaction chamber based on the first information.

[0053] It can be seen that the valve control direction and target control parameter set of the pressure control valve of the reaction chamber determined by the above-mentioned pressure difference instruct the pressure control valve to regulate the pressure of the reaction chamber, thereby avoiding the problem in the related art that the valve opening of the pressure control valve needs to be continuously adjusted according to the actual pressure in the reaction chamber and the set pressure requirement, which makes the speed of pressure regulation of the reaction chamber slow, and the fixed pressure regulation parameters (i.e., pressure regulation parameters) pre-set for the pressure control valve cannot adapt well to the real-time changing atmospheric environment in the reaction chamber, thereby resulting in inaccurate pressure regulation of the reaction chamber. Therefore, the speed and accuracy of pressure regulation of the reaction chamber are improved.

[0054] In addition, other features and advantages of the present application will be described in the following description, and in part will become apparent from the description, or may be understood by practicing the present application. The objectives and other advantages of the present application can be realized and obtained through the structures particularly pointed out in the written description, claims, and drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0055] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following briefly introduces the drawings required for describing the embodiments. Obviously, the drawings described here are used to provide a further understanding of the present application, constitute a part of the present application, and do not constitute an improper limitation of the present application. In the drawings:

[0056] Figure 1 A schematic diagram of the structure of a reaction chamber provided in an embodiment of the present application;

[0057] Figure 2 This is a schematic diagram of an optional system architecture applicable to the embodiments of the present application;

[0058] Figure 3 A schematic diagram of an implementation flow of a pressure control method for a reaction chamber provided in an embodiment of the present application;

[0059] Figure 4 A logic diagram for determining valve control direction provided in an embodiment of the present application;

[0060] Figure 5 A schematic structural diagram of a pressure control device for a reaction chamber provided in an embodiment of the present application;

[0061] Figure 6 A schematic diagram of the structure of an electronic device provided in an embodiment of the present application. DETAILED DESCRIPTION

[0062] The following describes embodiments of the present application in more detail with reference to the accompanying drawings. Although certain embodiments of the present application are shown in the accompanying drawings, it should be understood that the present application can be implemented in various forms and should not be construed as limited to the embodiments described herein. Rather, these embodiments are provided to provide a more thorough and complete understanding of the present application. It should be understood that the drawings and embodiments of the present application are for illustrative purposes only and are not intended to limit the scope of protection of the present application. The terms "including" and "including" and their variations as used herein are open-ended inclusions, i.e., "including but not limited to." The term "based on" means "based at least in part on." The term "one embodiment" means "at least one embodiment"; the term "another embodiment" means "at least one additional embodiment"; and the term "some embodiments" means "at least some embodiments." Relevant definitions of other terms are provided in the following description. It should be noted that the concepts of "first" and "second" mentioned in this application are only used to distinguish different devices, modules, or units, and are not intended to limit the order or interdependence of the functions performed by these devices, modules, or units.

[0063] It should be noted that the modifications of "one" and "multiple" mentioned in this application are illustrative rather than restrictive. Those skilled in the art should understand that unless otherwise clearly indicated in the context, they should be understood as "one or more".

[0064] The names of the messages or information exchanged between multiple devices in the embodiments of the present application are only used for illustrative purposes and are not used to limit the scope of these messages or information.

[0065] The following is a brief introduction to the design concept of the embodiment of the present application:

[0066] ALD is an advanced thin film deposition technology that consists of five main components: a reaction chamber (chamber), a source cabinet, a gas cabinet, a vacuum system, and a water system. Stable pressure control in the reaction chamber plays a decisive role in the film deposition results. Normally, the pressure in the reaction chamber is controlled within a certain range and is adaptively adjusted according to the different pressure requirements of the reactants to be generated. Figure 1 As shown, it is a schematic diagram of the structure of a reaction chamber provided in an embodiment of the present application. The reaction chamber includes: a water system 1, an inner chamber 2, a wafer 3, a vacuum system 4, a heating wire 5, an outer chamber 6, a wafer tray (or work plate) 7, an air intake system 8, and a heating wire 9. Among them, the water system 1 refers to the circulating water system added to the outer wall of the chamber to ensure that the outside of the reaction chamber is not affected by internal heating, preventing various safety hazards caused by excessive temperatures. The main purpose of the inner chamber 2 is to ensure that the wafer 3 can have a stable reaction environment, thereby creating a physically isolated space. The reactants of the wafer 3 mainly react on its front side to grow into the required film layer. The vacuum system 4 is mainly used to create a vacuum environment to meet the chamber pressure requirements of the process. The heating wires 5 and 9 located on the upper and lower sides of the reaction chamber are used to ensure that a controllable heat source is provided to maintain the stable chamber temperature when the entire chamber heats up. The outer chamber 6 is mainly used to provide a stable transition zone for the wafer during lifting, loading and unloading to reduce external influences. The wafer tray 7 is used to support the wafer 3 to ensure that it can carry out normal processing. The gas inlet system 8 is used to pass various gases required for the process into the chamber for reaction. Figure 1 As shown, P1 represents the pressure detection point of the inner cavity 2, which is used to detect the pressure of the inner cavity 2; D1 represents a pressure control valve (such as a pressure control butterfly valve), which is used to adjust the pressure of the inner cavity 2, that is, to regulate the pressure of the inner cavity 2.

[0067] Currently, during the process of regulating the pressure of a reaction chamber, a pressure-control valve installed in the reaction chamber's gas outlet passage typically adjusts its valve opening based on a set desired pressure and the actual pressure within the reaction chamber until the actual pressure within the reaction chamber equals the set desired pressure. At this point, the pressure-control valve has completed pressure regulation of the reaction chamber.

[0068] Still Figure 1 As shown, the pressure control process of the existing reaction chamber is specifically as follows: first, the pressure control valve D1 is fully opened, the vacuum pumping is started, and the entire reaction chamber is evacuated to a vacuum state through the vacuum system 4; then, the reaction gas is introduced into the inner chamber 2 through the air intake system 8; finally, when the pressure control valve D1 adjusts the valve opening so that the pressure value of the pressure detection point P1 is consistent with the required pressure SP set on the host computer, it can be determined that the pressure control valve D1 has completed the pressure control of the reaction chamber.

[0069] However, during the aforementioned pressure control process, the pressure control valve opening must be continuously adjusted based on the actual pressure within the reaction chamber and the set pressure requirement, resulting in a relatively slow process of pressure control within the reaction chamber. Furthermore, the fixed pressure control parameters (i.e., pressure control parameters) pre-set for the pressure control valve cannot effectively adapt to the changing atmospheric conditions within the reaction chamber, resulting in inaccurate pressure control within the reaction chamber.

[0070] In other words, directly controlling the pressure within the reaction chamber using a pressure-control valve has the following drawbacks: 1. Response hysteresis: Pressure-control valves adjust the reaction chamber pressure by changing the cross-sectional area of ​​the fluid channel through an actuator-driven valve movement. This process requires constant adjustment of the valve opening, resulting in slow pressure regulation and insufficiently meeting the demand for rapid reaction chamber pressure adjustment. 2. Overshoot and fluctuation: During operation, pressure-control valves can often cause the system pressure to exceed the set value (e.g., the set demand pressure SP) due to inappropriate pressure control parameters. This is known as overshoot. Furthermore, issues with pressure control parameters, vacuum system pumping speed, actuator response speed, and accuracy can also cause the reaction chamber pressure to fluctuate repeatedly around the set value. 3. Poor process adaptability: During operation, pressure-control valves can become unusable or fail to meet pressure requirements due to variations in gas flow, flow rate, and vacuum system pumping speed, resulting in poor adaptability to diverse process environments. 4. Waste of reaction source: Due to fluctuations and hysteresis in the pressure regulation process, precursor deposition cannot be effectively performed under non-steady-state pressure conditions, resulting in excessive consumption of reaction source gas and increased process costs.

[0071] In view of this, in order to solve or improve the above-mentioned problems, an embodiment of the present application proposes a method for controlling the pressure of a reaction chamber, which specifically includes: obtaining a first pressure value of the reaction chamber at a current moment, and determining a valve control direction and a target control parameter set of a pressure-control valve of the reaction chamber based on a pressure difference between a preset pressure threshold and the first pressure value, thereby sending first information to the pressure-control valve so that the pressure-control valve controls the pressure of the reaction chamber based on the first information. The preset pressure threshold can be determined based on a pressure requirement for the reaction chamber, the valve control direction and the target control parameter set can be used to adjust the chamber pressure of the reaction chamber from the first pressure value to the pressure threshold, and the first information can be used to indicate the valve control direction and the target control parameter set. The valve control direction and target control parameter set of the pressure control valve of the reaction chamber determined by the aforementioned pressure difference value instruct the pressure control valve to regulate the pressure of the reaction chamber, thereby avoiding the problem in the related art that the valve opening of the pressure control valve needs to be continuously adjusted according to the actual pressure in the reaction chamber and the set pressure requirement, resulting in a slow speed of pressure regulation of the reaction chamber, and the problem that the fixed pressure regulation parameters (i.e., pressure regulation parameters) pre-set for the pressure control valve cannot well adapt to the real-time changing atmospheric environment in the reaction chamber, thereby resulting in inaccurate pressure regulation of the reaction chamber. Therefore, the speed and accuracy of pressure regulation of the reaction chamber are improved.

[0072] In particular, the preferred embodiments of the present application are described below in conjunction with the drawings in the specification. It should be understood that the preferred embodiments described herein are only used to illustrate and explain the present application and are not used to limit the present application. In addition, the embodiments of the present application and the features in the embodiments may be combined with each other if there is no conflict.

[0073] See Figure 2 As shown, it is a schematic diagram of an optional system architecture applicable to an embodiment of the present application, and the system architecture may include: an ALD device 201 and a server 202. The ALD device 201 and the server 202 can exchange information through a communication network, wherein the communication mode adopted by the communication network may include: a wireless communication mode and a wired communication mode.

[0074] Exemplarily, the ALD device 201 can access the network via cellular mobile communication technology to communicate with the server 202. The cellular mobile communication technology, for example, includes fifth generation mobile networks (5G) technology or next generation mobile communication technology.

[0075] Optionally, the ALD device 201 may access the network via short-range wireless communication to communicate with the server 202. The short-range wireless communication may include, for example, wireless fidelity (Wi-Fi) technology.

[0076] The embodiment of the present application does not impose any restrictions on the number of devices involved in the above system architecture. For example, the above system architecture may include more ALD devices and / or servers, or may also include other devices. Figure 1 As shown, only the ALD device 201 and the server 202 are described as examples, and each device and its respective functions are briefly introduced below.

[0077] The ALD device 201 may include Figure 1 The reaction chamber shown is used to deposit atomic-level thin film materials layer by layer by alternately introducing reaction gases and performing surface chemical reactions, thereby achieving thickness control at the nanometer level (single-layer atomic precision).

[0078] The server 202 may be an independent physical server, or a server cluster or distributed system composed of multiple physical servers. It may also be a cloud server that provides basic cloud computing services such as cloud services, cloud databases, cloud computing, cloud functions, cloud storage, network services, cloud communications, middleware services, domain name services, security services, content delivery networks (CDNs), and big data and artificial intelligence platforms. For example, the server 202 in the embodiment of the present application may be a host computer for sending voltage control information to the ALD device 201, or a programmable logic controller (PLC) deployed on the host computer for implementing voltage control of the reaction chamber.

[0079] It is worth noting that the server 202 in the embodiment of the present application can be used to obtain a first pressure value of the reaction chamber at the current moment, and based on the pressure difference between a preset pressure threshold and the first pressure value, determine the valve control direction and target control parameter set of the pressure-control valve of the reaction chamber, thereby sending first information to the pressure-control valve so that the pressure-control valve regulates the pressure of the reaction chamber based on the first information. The preset pressure threshold can be determined based on the pressure requirement for the reaction chamber, the valve control direction and target control parameter set can be used to adjust the chamber pressure of the reaction chamber from the first pressure value to the pressure threshold, and the first information can be used to indicate the valve control direction and target control parameter set.

[0080] The following describes the pressure control method of the reaction chamber provided by the exemplary embodiment of the present application in combination with the above-mentioned system architecture and with reference to the accompanying drawings. It should be noted that the above-mentioned system architecture is only shown to facilitate understanding of the spirit and principles of the present application, and the implementation of the present application is not limited in this respect.

[0081] See Figure 3As shown, it is a schematic diagram of the implementation process of a pressure control method of a reaction chamber provided in an embodiment of the present application. The execution subject is a server as an example. The specific implementation process of the method is as follows:

[0082] S301: Obtain a first pressure value of the reaction chamber at a current moment, and determine a valve control direction and a target control parameter set of a pressure control valve of the reaction chamber based on a pressure difference between a preset pressure threshold and the first pressure value.

[0083] The preset pressure threshold may be determined based on a pressure requirement for the reaction chamber, which is the pressure environment required for performing film deposition on the wafers in the reaction chamber.

[0084] The above-mentioned valve control direction and target control parameter set can be used to adjust the cavity pressure of the reaction chamber from a first pressure value to a pressure threshold. Optionally, the aforementioned valve control direction can be a first control direction or a second control direction. Among them, the aforementioned first control direction can be a direction of increasing the valve opening of the pressure control valve, and the aforementioned second control direction can be a direction of reducing the valve opening of the pressure control valve. The aforementioned target control parameter set may include: control parameters such as valve rotation speed, valve rotation time and valve opening to be achieved. The embodiments of the present application do not specifically limit this.

[0085] For example, when executing step S301, the server can collect pressure data through the pressure collection sensor. Figure 1 The pressure at the pressure detection point P1 shown is used to obtain the first pressure value of the reaction chamber at the current moment. The collected pressure value is used as the first pressure value of the reaction chamber at the current moment. Optionally, when using a high-precision pressure acquisition sensor, data compensation (e.g., system error compensation) can be performed on the collected pressure value to further improve the accuracy of the first pressure value.

[0086] Furthermore, in an optional implementation, when executing step S301, after the server obtains the first pressure value, it can determine the valve control direction of the pressure control valve based on the magnitude relationship between the preset pressure threshold represented by the pressure difference and the first pressure value; and determine the difference interval to which the absolute difference corresponding to the pressure difference belongs, and use the valve control parameter set associated with the difference interval as the target control parameter set. Optionally, the aforementioned pressure difference calculation formula is expressed as follows:

[0087] ΔP=SP-P1

[0088] Wherein, ΔP represents the difference between the preset pressure threshold and the first pressure value, i.e., the pressure difference value, SP represents the preset pressure threshold value, and P1 represents the first pressure value. Optionally, the pressure difference value ΔP, the preset pressure threshold value SP, and the first pressure value P1 may be measured in units of Torr, a unit for measuring vacuum, where 1 Torr is 1 / 760 of 1 atmosphere.

[0089] Furthermore, the absolute difference corresponding to the above pressure difference can be expressed as: |ΔP|=|SP-P1|.

[0090] It should be understood that the magnitude relationship between the above-mentioned preset pressure threshold and the first pressure value can be: the preset pressure threshold is greater than the first pressure value, the preset pressure threshold is equal to the first pressure value, or the preset pressure threshold is less than the first pressure value. Optionally, the magnitude relationship between the above-mentioned preset pressure threshold and the first pressure value can be determined according to the sign or magnitude of the pressure difference. For example, when the pressure difference is greater than 0 (i.e., the pressure difference is positive), it can be determined that the preset pressure threshold is greater than the first pressure value; when the pressure difference is equal to 0, it can be determined that the preset pressure threshold is equal to the first pressure value; when the pressure difference is less than 0 (i.e., the pressure difference is negative), it can be determined that the preset pressure threshold is less than the first pressure value.

[0091] Therefore, in an optional implementation, see Figure 4 As shown, when the server determines the valve control direction of the pressure control valve based on the magnitude relationship between the preset pressure threshold represented by the pressure difference and the first pressure value, if the magnitude relationship is such that the preset pressure threshold is greater than the first pressure value, the valve control direction may be determined to be the first control direction, i.e., a direction that decreases the valve opening of the pressure control valve. If the magnitude relationship is such that the preset pressure threshold is less than the first pressure value, the valve control direction may be determined to be the second control direction, i.e., a direction that increases the valve opening of the pressure control valve.

[0092] In addition, the above-mentioned difference interval can be a first interval, a second interval, or a third interval. In particular, any pressure value included in the first interval is less than the first pressure threshold, any pressure value included in the second interval is greater than or equal to the first pressure threshold and less than or equal to the second pressure threshold, and any pressure value included in the third interval is greater than the second pressure threshold.

[0093] For example, assuming that the first pressure threshold is 2 Torr and the second pressure threshold is 10 Torr, the first interval can be expressed as: (0, 2], unit: Torr, the second interval can be expressed as [2, 10], unit: Torr, and the third interval can be expressed as: (10, +∞), unit: Torr.

[0094] Of course, the above-mentioned difference interval can also include more intervals (for example, further dividing the above-mentioned third interval into a fourth interval and a fifth interval), or include fewer intervals (for example, merging the above-mentioned first interval and the above-mentioned second interval into a sixth interval). The embodiment of the present application does not make specific limitations on this.

[0095] Optionally, if the difference interval is the first interval, it can be determined that the pressure of the reaction chamber needs to be fine-tuned to improve the stability of pressure control; if the difference interval is the second interval, it can be determined that the pressure of the reaction chamber needs to be normally adjusted; if the difference interval is the third interval, it can be determined that the pressure of the reaction chamber needs to be rapidly adjusted to improve the response speed of pressure control. Therefore, the valve control parameter set associated with the first interval is used for the pressure control valve to fine-tune the pressure of the reaction chamber, the valve control parameter set associated with the second interval is used for the pressure control valve to normally adjust the pressure of the reaction chamber, and the valve control parameter set associated with the third interval is used for the pressure control valve to rapidly adjust the pressure of the reaction chamber.

[0096] Exemplarily, the valve control parameter set associated with the first interval can be represented as valve control parameter set T1, the valve control parameter set associated with the second interval can be represented as valve control parameter set K, and the valve control parameter set associated with the third interval can be represented as valve control parameter set T2.

[0097] Based on the aforementioned pressure control method, when |SP-P1| > 10 Torr, rapid pressure control adjustment is first performed. When 2 ≤ |SP-P1| ≤ 10 Torr, normal pressure control adjustment is performed. Finally, when |SP-P1| < 2 Torr, fine-tuning of pressure control is performed to ensure that the first pressure value P1 of the reaction chamber reaches the set pressure SP as quickly as possible. At the final stage of the pressure regulation process (i.e., |SP-P1| < 2 Torr), fine-tuning of the valve control parameter set T2 is used to improve pressure control stability and avoid overshoot and fluctuation.

[0098] Since, during the normal adjustment of the reaction chamber's pressure, the comprehensive reaction chamber's gas outlet rate and gas inlet rate can further improve the accuracy of the reaction chamber's pressure control, when the server determines that the aforementioned difference interval is the second interval, it can combine the reaction chamber's gas outlet rate and gas inlet rate at the current moment to determine the valve control parameter set associated with the second interval. In other words, in an optional implementation, when the server determines that the aforementioned difference interval is the second interval, it can determine the valve control parameter set associated with the second interval based on the reaction chamber's gas outlet rate and gas inlet rate at the current moment, thereby using the valve control parameter set associated with the second interval as the target control parameter set.

[0099] For example, Figure 1As shown, the reaction chamber's intake rate (or charging rate) can be measured at an intake flow detection point S1 of the reaction chamber's intake pipe, and the reaction chamber's outlet rate (or pumping rate) can be measured at an outlet flow detection point V1 of the reaction chamber's outlet pipe. The aforementioned intake rate can be expressed as S1, and the aforementioned outlet rate can be expressed as V1.

[0100] In an optional implementation, after obtaining the exhaust rate and intake rate of the reaction chamber at the current moment, the server can filter out a target control parameter set that matches the exhaust rate and intake rate from multiple preset candidate control parameter sets, thereby using the target control parameter set as the valve control parameter set associated with the second interval.

[0101] For example, the outlet velocity V1 is the first velocity (eg, Am 3 / h) or a second rate (e.g., Bm 3 / h), the intake rate S1 (unit can be: standard cubic centimeter per minute (SCCM)), and the rate interval corresponding to the first rate interval, the second rate interval, or the third rate interval is taken as an example. Among them, the aforementioned first rate interval can be expressed as: (0, 500], unit: sccm, the aforementioned second rate interval can be expressed as: (500, 1000], unit: sccm, and the aforementioned third rate interval can be expressed as [1000, +∞), unit: sccm. In order to improve the speed of determining the valve control parameter set, the server can pre-construct 6 candidate control parameter sets (i.e., K1 to K6) as shown in Table 1 for the two rate values ​​corresponding to the aforementioned outlet rate and the three rate intervals corresponding to the intake rate S1.

[0102] Table 1 Example of the correspondence between the rate ranges of the outlet rate, the inlet rate and the candidate control parameter sets

[0103]

[0104] Based on the correspondence between the outflow rate, the inflow rate interval, and the candidate control parameter set recorded in Table 1 above, the server can quickly determine the valve control parameter set associated with the second interval after obtaining the specific value of the outflow rate and the inflow rate interval. For example, assuming that the outflow rate of the reaction chamber is Am 3 / h and the rate interval corresponding to the intake rate S1 is: [1000, +∞), the unit is: sccm, then based on the corresponding relationship recorded in Table 1, the server can determine that the valve control parameter set associated with the second interval is the candidate control parameter set K3.

[0105] It should be noted that the eight valve control parameter sets (i.e., T1, K1-K6, and T2) described above are determined through tuning and learning of the pressure control valves based on different process environments. The key reference variables are: outlet gas rate V1, inlet gas rate S1, preset pressure threshold SP, and first pressure value P1. Through tuning and learning, six general control parameter sets (i.e., K1, K2…K6) and two special control parameter sets T1 and T2 are derived and stored on the server. Subsequently, the server autonomously calls the valve control parameter sets based on an algorithm and outputs them to the pressure control valves for pressure adjustment, depending on the process environment.

[0106] It can be seen that, through the above-mentioned method of determining the valve control parameter set, adaptive pressure control can be achieved according to the preset pressure threshold SP, the first pressure value P1, the intake rate S1 and the exhaust rate V1. That is, the server will call different valve control parameter sets (i.e., T1, K1~K6 and T2) according to the actual conditions of the difference between SP-P1, the absolute value of SP-P1 (i.e., the absolute difference), the intake rate S1 and the exhaust rate V1, so as to ensure that the actual pressure of the reaction chamber (i.e., the pressure inside the chamber) can quickly and stably reach the preset pressure threshold SP, thereby improving process adaptability. In addition, the use of an adaptive pressure control method can enable the pressure inside the chamber to quickly reach a steady state, thereby avoiding the reaction source being drawn away in large quantities by the vacuum system during the frequent adjustment of the pressure control valve, thereby reducing the waste of the reaction source. Therefore, the problem that the pressure control of the existing reaction chamber is to perform autonomous pressure control through the pressure control valve and cannot quickly respond to various situations in which the process environment changes is solved.

[0107] S302: Sending first information to the pressure control valve, so that the pressure control valve regulates the pressure of the reaction chamber based on the first information.

[0108] In response, the pressure-control valve receives the first information sent by the server. The first information indicates the valve control direction and target control parameter set. Thus, after receiving the first information, the pressure-control valve can regulate the pressure in the reaction chamber based on the valve control direction and target control parameter set included in the first information.

[0109] Optionally, the first information may include first and second sub-information. The first sub-information indicates the valve control direction, while the second sub-information indicates the target control parameter set. This approach, by carrying only a single sub-information, can improve the subsequent information processing speed of the pressure control valve and enhance the valve control response speed. It should be understood that the first sub-information can be determined as either a negative or positive direction signal based on the valve control direction.

[0110] Among them, the above-mentioned negative direction signal can be used to instruct the pressure control valve to perform valve control in the direction of reducing the valve opening of the pressure control valve (i.e., along the first control direction), and the above-mentioned positive direction signal can be used to instruct the pressure control valve to perform valve control in the direction of increasing the valve opening of the pressure control valve (i.e., the second control direction).

[0111] Furthermore, after sending the first information to the pressure control valve, the server can determine whether the cavity pressure of the reaction chamber has reached the preset pressure threshold. And, when it is determined that the second pressure value of the reaction chamber after pressure regulation is the preset pressure threshold, the server can generate second information. The aforementioned second information can be used to instruct the pressure control valve to stop pressure regulation of the reaction chamber, that is, the pressure regulation of the reaction chamber has been completed. Exemplarily, the aforementioned second pressure value as the preset pressure threshold can be expressed as: P2=SP, wherein P2 represents the second pressure value and SP represents the preset pressure threshold.

[0112] In an optional implementation, the pressure control valve can monitor the actual coating condition of the reaction chamber in real time to determine whether the above-mentioned preset pressure threshold needs to be modified. If the preset pressure threshold needs to be modified, the pressure control valve can send a third message to the server. Accordingly, the server receives the third information sent by the pressure control valve. The third information is used to indicate that the preset pressure threshold needs to be modified. In this way, the server regulates the pressure of the reaction chamber in combination with the information fed back by the pressure control valve (i.e., the third information), thereby reducing the power consumption required for the server to directly monitor the actual coating condition of the reaction chamber in real time.

[0113] In summary, in the pressure control method of the reaction chamber provided in the embodiment of the present application, after obtaining the first pressure value of the reaction chamber at the current moment, the valve control direction and target control parameter set of the pressure control valve of the reaction chamber can be determined based on the pressure difference between the preset pressure threshold and the first pressure value, thereby sending the first information for indicating the valve control direction and the target control parameter set to the pressure control valve, so that the pressure control valve performs pressure control on the reaction chamber based on the first information. It can be seen that the valve control direction and target control parameter set of the pressure control valve of the reaction chamber determined by the above-mentioned pressure difference indicate that the pressure control valve performs pressure control on the reaction chamber, avoiding the problem in the related art that the valve opening of the pressure control valve needs to be continuously adjusted according to the actual pressure in the reaction chamber and the set pressure demand, so that the speed of pressure control on the reaction chamber is slow, and the fixed pressure regulating parameters (i.e., pressure control parameters) pre-set for the pressure control valve cannot be well adapted to the atmospheric environment that changes in real time in the reaction chamber, resulting in the problem that the pressure control on the reaction chamber is not accurate enough. Therefore, the speed and accuracy of pressure control on the reaction chamber are improved.

[0114] Furthermore, the pressure control valve receives a set of target control parameters, making the entire pressure control process more targeted and accurate than autonomous pressure control. This reduces the valve's execution time and extends its lifespan. Furthermore, adaptive pressure control prevents drastic pressure fluctuations within the reaction chamber during the entire pressure control process.

[0115] Furthermore, based on the same technical concept, the embodiment of the present application also provides a pressure control device for a reaction chamber, and the pressure control device for the reaction chamber is used to implement the above-mentioned method flow of the embodiment of the present application. Figure 5 As shown, the pressure control device 500 of the reaction chamber may include: a processing module 501 and a sending module 502, wherein:

[0116] Processing module 501 is configured to obtain a first pressure value of the reaction chamber at a current moment, and determine a valve control direction and a target control parameter set for a pressure control valve of the reaction chamber based on a pressure difference between a preset pressure threshold and the first pressure value; wherein the preset pressure threshold is determined based on a pressure requirement for the reaction chamber, and the valve control direction and the target control parameter set are used to adjust the chamber pressure of the reaction chamber from the first pressure value to the pressure threshold;

[0117] The sending module 502 is configured to send first information to the pressure control valve so that the pressure control valve regulates the pressure of the reaction chamber based on the first information; wherein the first information is used to indicate the valve control direction and the target control parameter set.

[0118] In an optional implementation, when determining the valve control direction and target control parameter set of the pressure control valve of the reaction chamber based on the pressure difference between the preset pressure threshold and the first pressure value, the processing module 501 is specifically configured to:

[0119] determining a valve control direction of the pressure control valve based on a magnitude relationship between a preset pressure threshold represented by the pressure difference and the first pressure value; and

[0120] The difference interval to which the absolute difference corresponding to the pressure difference belongs is determined, and the valve control parameter set associated with the difference interval is used as the target control parameter set.

[0121] In an optional implementation, when determining the valve control direction of the pressure control valve based on the magnitude relationship between the preset pressure threshold represented by the pressure difference and the first pressure value, the processing module 501 is specifically configured to:

[0122] If the magnitude relationship is that the preset pressure threshold is greater than the first pressure value, the valve control direction is the first control direction; the first control direction is the direction of reducing the valve opening of the pressure control valve;

[0123] If the magnitude relationship is that the preset pressure threshold is less than the first pressure value, the valve control direction is the second control direction; the second control direction is the direction of increasing the valve opening of the pressure control valve.

[0124] In an optional implementation, the difference interval is a first interval, a second interval, or a third interval; wherein any pressure value included in the first interval is less than a first pressure threshold, any pressure value included in the second interval is greater than or equal to the first pressure threshold and less than or equal to the second pressure threshold, and any pressure value included in the third interval is greater than the second pressure threshold;

[0125] When the valve control parameter set associated with the difference interval is used as the target control parameter set, the processing module 501 is specifically configured to:

[0126] If the difference interval is the second interval, determining a valve control parameter set associated with the second interval based on the gas outlet rate and gas inlet rate of the reaction chamber at the current moment;

[0127] The valve control parameter set associated with the second interval is used as the target control parameter set.

[0128] In an optional implementation, when determining the valve control parameter set associated with the second interval based on the gas outlet rate and gas inlet rate of the reaction chamber at the current moment, the processing module 501 is specifically configured to:

[0129] Selecting a target control parameter set that matches an air intake rate interval corresponding to an air outlet rate and an air intake rate from a plurality of preset candidate control parameter sets;

[0130] The target control parameter set is used as the valve control parameter set associated with the second interval.

[0131] In an optional implementation, after sending the first information to the pressure control valve, the sending module 502 is further configured to:

[0132] When it is determined that the second pressure value of the reaction chamber after pressure regulation is the preset pressure threshold, second information is generated; wherein the second information is used to instruct the pressure control valve to stop pressure regulation of the reaction chamber;

[0133] A second message is sent to the pressure control valve.

[0134] Based on the description of the above method embodiment and apparatus embodiment, the exemplary embodiments of the present invention further provide an electronic device, comprising: at least one processor; and a memory communicatively connected to the at least one processor. The memory stores a computer program executable by the at least one processor, and when executed by the at least one processor, the computer program causes the electronic device to perform a method according to an embodiment of the present invention.

[0135] An embodiment of the present application further provides a non-transitory computer-readable storage medium storing a computer program, wherein the computer program, when executed by a processor of a computer, is used to cause the computer to execute a method according to an embodiment of the present application.

[0136] An embodiment of the present application further provides a computer program product, including a computer program, wherein the computer program, when executed by a processor of a computer, is used to cause the computer to perform a method according to an embodiment of the present application.

[0137] See Figure 6 As shown, the structural block diagram of the electronic device 600 that can be used as the server or client of the present application will now be described, which is an example of a hardware device that can be applied to various aspects of the present application. The electronic device is intended to represent various forms of digital electronic computer equipment, such as laptop computers, desktop computers, workbenches, personal digital assistants, servers, blade servers, mainframe computers, and other suitable computers. The electronic device can also represent various forms of mobile devices, such as personal digital processing, cellular phones, smart phones, wearable devices and other similar computing devices. The components shown herein, their connections and relationships, and their functions are merely examples and are not intended to limit the implementation of the present application described and / or required herein.

[0138] like Figure 6 As shown, the electronic device 600 includes a computing unit 601, which can perform various appropriate actions and processes according to a computer program stored in a read-only memory (ROM) 602 or a computer program loaded from a storage unit 608 into a random access memory (RAM) 603. Various programs and data required for the operation of the device 600 can also be stored in the RAM 603. The computing unit 601, the ROM 602, and the RAM 603 are connected to each other via a bus 604. An input / output (I / O) interface 605 is also connected to the bus 604.

[0139] Multiple components within electronic device 600 are connected to I / O interface 605, including an input unit 606, an output unit 607, a storage unit 608, and a communication unit 609. Input unit 606 can be any type of device capable of inputting information into electronic device 600. Input unit 606 can receive input numeric or character information and generate key input signals related to user settings and / or function control of the electronic device. Output unit 607 can be any type of device capable of presenting information and may include, but is not limited to, a display, a speaker, a video / audio output terminal, a vibrator, and / or a printer. Storage unit 608 may include, but is not limited to, a magnetic disk or an optical disk. Communication unit 609 allows electronic device 600 to exchange information / data with other devices via computer networks such as the Internet and / or various telecommunication networks and may include, but is not limited to, a modem, a network card, an infrared communication device, a wireless communication transceiver, and / or a chipset, such as a Bluetooth device, a WiFi device, a Worldwide Interoperability for Microwave Access (WiMax) device, a cellular communication device, and / or the like.

[0140] The computing unit 601 can be a variety of general and / or special processing components with processing and computing capabilities. Some examples of the computing unit 601 include, but are not limited to, a central processing unit (CPU), a graphics processing unit (GPU), various artificial intelligence (AI) computing chips, various computing units that run machine learning model algorithms, a digital signal processor (DSP), and any appropriate processor, controller, microcontroller, etc. The computing unit 601 performs the various methods and processes described above. For example, in some embodiments, the pressure control method of the reaction chamber described above can be implemented as a computer software program, which is tangibly contained in a machine-readable medium, such as a storage unit 608. In some embodiments, part or all of the computer program can be loaded and / or installed on the electronic device 600 via the ROM 602 and / or the communication unit 609. In some embodiments, the computing unit 601 can be configured to perform the pressure control method of the reaction chamber described above by any other appropriate means (e.g., by means of firmware).

[0141] The program code for implementing the methods of the present application can be written in any combination of one or more programming languages. Such program code can be provided to a processor or controller of a general-purpose computer, a special-purpose computer, or other programmable data processing device, so that when the program code is executed by the processor or controller, the functions / operations specified in the flow charts and / or block diagrams are implemented. The program code can be executed entirely on the machine, partially on the machine, as a stand-alone software package, partially on the machine and partially on a remote machine, or entirely on a remote machine or server.

[0142] In the context of the present application, a machine-readable medium can be a tangible medium that can contain or store a program for use by an instruction execution system, device or equipment or used in combination with an instruction execution system, device or equipment. A machine-readable medium can be a machine-readable signal medium or a machine-readable storage medium. A machine-readable medium can include, but is not limited to, an electronic, magnetic, optical, electromagnetic, infrared or semiconductor system, device or equipment, or any suitable combination of the foregoing. A more specific example of a machine-readable storage medium can include an electrical connection based on one or more lines, a portable computer disk, a hard disk, a RAM, a ROM, an erasable programmable read-only memory (EPROM) or a flash memory, an optical fiber, a portable compact disc read-only memory (CD-ROM), an optical storage device, a magnetic storage device, or any suitable combination of the foregoing.

[0143] As used herein, the terms "machine-readable medium" and "computer-readable medium" refer to any computer program product, apparatus, and / or device (e.g., a magnetic disk, an optical disk, a memory, a programmable logic device (PLD)) for providing machine instructions and / or data to a programmable processor, including machine-readable media that receives machine instructions as a machine-readable signal. The term "machine-readable signal" refers to any signal for providing machine instructions and / or data to a programmable processor.

[0144] To provide interaction with a user, the systems and techniques described herein can be implemented on a computer having: a display device (e.g., a cathode ray tube (CRT) or a liquid crystal display (LCD) monitor) for displaying information to the user; and a keyboard and pointing device (e.g., a mouse or trackball) through which the user can provide input to the computer. Other types of devices can also be used to provide interaction with the user; for example, the feedback provided to the user can be any form of sensory feedback (e.g., visual feedback, auditory feedback, or tactile feedback); and input from the user can be received in any form (including acoustic input, voice input, or tactile input).

[0145] The systems and techniques described herein can be implemented in a computing system that includes back-end components (e.g., as a data server), or a computing system that includes middleware components (e.g., an application server), or a computing system that includes front-end components (e.g., a user computer having a graphical user interface or a web browser through which a user can interact with implementations of the systems and techniques described herein), or a computing system that includes any combination of such back-end components, middleware components, or front-end components. The components of the system can be interconnected by any form or medium of digital data communication (e.g., a communication network). Examples of communication networks include a local area network (LAN), a wide area network (WAN), and the Internet.

[0146] Computer systems may include clients and servers. A client and server are generally remote from each other and typically interact through a communication network. The client and server relationship arises through computer programs running on the respective computers and having a client-server relationship to each other.

[0147] Furthermore, it should be understood that what is disclosed above is merely a preferred embodiment of the present application and certainly cannot be used to limit the scope of rights of the present invention. Therefore, equivalent changes made according to the claims of the present invention are still within the scope covered by the present application.

Claims

1. A method for regulating the pressure of a reaction chamber, characterized in that: include: obtaining a first pressure value of the reaction chamber at a current moment, and determining a valve control direction and a target control parameter set of a pressure control valve of the reaction chamber based on a pressure difference between a preset pressure threshold and the first pressure value; wherein the preset pressure threshold is determined based on a pressure requirement for the reaction chamber, and the valve control direction and the target control parameter set are used to adjust the chamber pressure of the reaction chamber from the first pressure value to the pressure threshold; Sending first information to the pressure control valve so that the pressure control valve regulates the pressure of the reaction chamber based on the first information; wherein the first information is used to indicate the valve control direction and the target control parameter set.

2. The method according to claim 1, wherein The determining, based on the pressure difference between the preset pressure threshold and the first pressure value, of the valve control direction and the target control parameter set of the pressure control valve of the reaction chamber comprises: determining the valve control direction of the pressure control valve based on a magnitude relationship between the preset pressure threshold represented by the pressure difference and the first pressure value; and The difference interval to which the absolute difference corresponding to the pressure difference belongs is determined, and the valve control parameter set associated with the difference interval is used as the target control parameter set.

3. The method according to claim 2, wherein The determining the valve control direction of the pressure control valve based on the magnitude relationship between the preset pressure threshold represented by the pressure difference and the first pressure value includes: If the magnitude relationship is that the preset pressure threshold is greater than the first pressure value, the valve control direction is a first control direction; the first control direction is a direction for reducing the valve opening of the pressure control valve; If the magnitude relationship is that the preset pressure threshold is less than the first pressure value, the valve control direction is a second control direction; the second control direction is a direction of increasing the valve opening of the pressure control valve.

4. The method according to claim 2, wherein The difference interval is a first interval, a second interval or a third interval; wherein any pressure value included in the first interval is less than a first pressure threshold, any pressure value included in the second interval is greater than or equal to the first pressure threshold and less than or equal to the second pressure threshold, and any pressure value included in the third interval is greater than the second pressure threshold.

5. The method according to claim 4, wherein The step of using the valve control parameter set associated with the difference interval as the target control parameter set includes: If the difference interval is the second interval, determining a valve control parameter set associated with the second interval based on the gas outlet rate and gas inlet rate of the reaction chamber at the current moment; The valve control parameter set associated with the second interval is used as the target control parameter set.

6. The method according to claim 5, wherein The determining of the valve control parameter set associated with the second interval based on the gas outlet rate and the gas inlet rate of the reaction chamber at the current moment includes: Filtering a target control parameter set that matches an air intake rate interval corresponding to the air outlet rate and the air intake rate from a plurality of preset candidate control parameter sets; The target control parameter set is used as the valve control parameter set associated with the second interval.

7. The method according to claim 1, wherein After sending the first information to the pressure control valve, the method further includes: When it is determined that the second pressure value of the reaction chamber after pressure regulation is the preset pressure threshold, second information is generated; wherein the second information is used to instruct the pressure control valve to stop pressure regulation of the reaction chamber; The second information is sent to the pressure control valve.

8. A pressure control device for a reaction chamber, characterized in that: include: a processing module, configured to obtain a first pressure value of the reaction chamber at a current moment, and determine a valve control direction and a target control parameter set of a pressure control valve of the reaction chamber based on a pressure difference between a preset pressure threshold and the first pressure value; wherein the preset pressure threshold is determined based on a pressure requirement for the reaction chamber, and the valve control direction and the target control parameter set are used to adjust the chamber pressure of the reaction chamber from the first pressure value to the pressure threshold; A sending module is used to send first information to the pressure-control valve, so that the pressure-control valve can regulate the pressure of the reaction chamber based on the first information; wherein the first information is used to indicate the valve control direction and the target control parameter set.

9. An electronic device comprising: processor; as well as Memory for storing programs, The program includes instructions, which, when executed by the processor, cause the processor to perform the method according to any one of claims 1 to 7.

10. A non-transitory computer-readable storage medium storing computer instructions, wherein: The computer instructions are used to cause the computer to execute the method according to any one of claims 1 to 7.

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