A method for purifying hydrogen bromide by removing bromine, water and impurities before liquefaction

By combining red phosphorus packing layers, liquid phosphorus tribromide, and cyclone separators, the problems of free bromine, moisture, and mechanical impurities in hydrogen bromide gas have been solved, achieving high-efficiency purification and stability, making it suitable for industrial applications of high-purity hydrogen bromide.

CN120622411BActive Publication Date: 2026-02-24WEIFANG HUITAO CHEM
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Patent Information

Application Number
CN202511148575.2
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2025-08-18
Publication Date
2026-02-24
Estimated Expiration
2045-08-18

AI Technical Summary

Technical Problem

In existing technologies, hydrogen bromide gas contains free bromine, moisture, and mechanical impurities, which leads to equipment corrosion, reduced gas purity, and uneven semiconductor etching. Traditional bromine removal methods are inefficient, moisture removal is incomplete, and mechanical impurity separation is difficult to achieve.

Method used

Free bromine is removed using a red phosphorus packing layer, water is initially removed using liquid phosphorus tribromide, trace amounts of water are deeply removed using a strong acid cation exchange resin or mordenite zeolite, mechanical impurities are separated by a cyclone separator, and the final liquefaction is achieved through a condenser. Combined with a gas buffer tank and a dew point detector for dynamic adjustment, efficient purification is ensured.

Benefits of technology

It achieves efficient removal of free bromine and moisture from hydrogen bromide gas, reduces the content of mechanical impurities, ensures gas purity of 99.9%, and improves equipment stability and semiconductor etching effect.

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Abstract

The application belongs to the technical field of fine chemical industry, and particularly relates to a hydrogen bromide purification method for removing bromine, water and impurities before liquefaction, which comprises the following steps: S1, removal of free bromine: hydrogen bromide gas is introduced into a first bromine removal tank filled with a red phosphorus filler layer; S2, preliminary removal of water: the gas treated in S1 is introduced into a first drying tank filled with liquid phosphorus tribromide; S3, deep removal of trace water: the gas treated in S2 is introduced into a second drying tank filled with resin or mordenite; and S4, separation of mechanical impurities: the gas treated in S3 is introduced into a cyclone separator. By adopting the red phosphorus filler layer and controlling the loading amount, particle size and loading density of the red phosphorus, the free bromine in the hydrogen bromide gas can be efficiently removed, liquid phosphorus tribromide is used as a drying medium and is supplemented in real time to maintain the mass concentration of the phosphorus tribromide, so that the bromine and water content in the gas can be effectively reduced, and high-quality gas is provided for subsequent deep drying and impurity separation.
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