Holographic anti-counterfeiting graph and manufacturing device and method thereof

Abstract

The invention relates to a holographic anti-counterfeiting graph and a manufacturing device and method thereof, and belongs to the technical field of holographic anti-counterfeiting graph manufacturing. The holographic anti-counterfeiting graph manufacturing device comprises a light source, a small hole filter, a mask plate, a condensing lens and a photosensitive material which are arranged in sequence. And the mask plate is manually carved and formed by personnel. The mask plate provided by the invention is manually manufactured by personnel, the unique cutting work and artistic style of an engraver are reflected in the engraving process, and the microcosmic randomness of the mask plate is stronger than that of photoetching plate making, so that the imitation difficulty is greatly improved, and the anti-counterfeiting effect is improved.

Description

Technical Field

[0001] The present application belongs to the technical field of holographic anti-counterfeiting pattern production, and specifically relates to a holographic anti-counterfeiting pattern and a production device and method thereof. Background Art

[0002] Traditional holographic platemaking is a two-step optical imaging process, namely the interference process and the diffraction process. During the interference process, the laser emits a highly coherent light beam, which is divided into two paths by a beam splitter. One path is the object light, which illuminates the object being photographed. After reflection or scattering, it carries the amplitude and phase information of the object surface and is projected onto the recording medium; the other path is the reference light, which is directly emitted to the recording medium and superimposed with the object light to produce interference. During the diffraction process, the hologram is equivalent to a complex grating structure. When irradiated with coherent light (such as the original reference light), the object light wavefront will be reproduced in the diffracted light wave, forming the original virtual image (stereoscopic three-dimensional image) and the conjugate real image (convex-concave inverted image). The three-dimensional sense of the reproduced image comes from the complete phase information record, but laser illumination is required. White light reproduction will cause multi-wavelength image overlap, and it is necessary to use rainbow holography and other technologies for optimization.

[0003] Furthermore, most current mask plates are made using photolithography, which can achieve nanometer-level precision and is more suitable for mass production. However, photolithography relies on digital masks, and pattern complexity is limited by software algorithms and equipment resolution, making it difficult to generate unique random features. Embossed replication relies on a single master, resulting in identical patterns on all labels and a lack of variable information, which in turn reduces anti-counterfeiting effectiveness and makes imitation difficult. Summary of the Invention

[0004] The technical problem to be solved by the present application is: to overcome the deficiencies of the prior art and to provide a holographic anti-counterfeiting pattern and a device and method for producing the same. The mask plate of the present application is manually made, and the engraver's unique knife skills and artistic style are reflected in the plate. Its microscopic randomness is stronger than that of photolithography, thus greatly increasing the difficulty of imitation and improving the anti-counterfeiting effect.

[0005] The technical solution adopted by this application to solve the problems existing in the prior art is:

[0006] A holographic anti-counterfeiting pattern production device comprises a light source, a pinhole filter, a mask, a focusing lens and a photosensitive material arranged in sequence. The mask is formed by manual carving.

[0007] Preferably, the light source is a laser with a beam splitter.

[0008] Preferably, the focusing lens is a lens with aberration.

[0009] Preferably, the focusing lens is a convex lens.

[0010] A method for preparing a holographic anti-counterfeiting pattern, based on the above-mentioned holographic anti-counterfeiting pattern production device, comprises the following steps:

[0011] S01, build optical path system;

[0012] S02, making a mask;

[0013] S03, leveling the mask obtained in step B in the optical path;

[0014] S04. Adjust the front and back positions of the photosensitive material and properly control the viewing angle range for exposure.

[0015] Preferably, in step S04, when adjusting the front and rear positions of the photosensitive material, the adjustment is performed based on the following formula:

[0016]

[0017] Among them, f is the focal length of the focusing lens, u is the distance from the mask to the optical center of the focusing lens, and v is the distance from the photosensitive material to the optical center of the focusing lens.

[0018] A holographic anti-counterfeiting pattern, an information layer obtained based on the above-mentioned method for preparing a holographic anti-counterfeiting pattern, comprising a PET layer, an information layer, an aluminum-plated layer, a glue-coated layer, and a silicone oil paper layer arranged in sequence from top to bottom.

[0019] Compared with the prior art, this application has the following beneficial effects:

[0020] (1) The mask is manually made instead of photolithography, skipping the steps of digital design, mask direct writing, complex development and etching, and directly forming by physical engraving or simple etching, making the process more simplified. When the design changes, there is no need to re-make the mask, and manual corrections can be made, which is suitable for the R&D stage with frequent iterations.

[0021] (2) It can realize the engraving of non-standard graphics such as large curvature continuous edges, non-planar substrate patterns, etc., which are more difficult to imitate and improve the anti-counterfeiting effect.

[0022] (3) The mask plate has physical properties that cannot be replicated through manual engraving. The engraver's knife skills, force control, line curvature and other operating details are highly personalized. Even the same engraver cannot completely replicate two identical plates. This micro-randomness (such as burrs on the edges of lines and subtle differences in light and dark transitions) becomes a natural anti-counterfeiting mark. Hand-engraving often incorporates personal artistic style (such as specific curvature turns, dot-line combinations), and it is difficult for imitators to accurately imitate their aesthetic logic through mechanical means. During manual gravure printing, the ink fills the concave part and is transferred under high pressure to form a touchable three-dimensional effect on the substrate, while the nano-scale structure of the photolithography mask cannot directly produce such a tactile feeling. The photolithography mask can be copied through electron microscope scanning + high-precision equipment, while the micro-randomness of the hand-engraved plate requires reverse deconstruction of the engraver's technical logic, and the cost of imitation far exceeds its economic value.

[0023] (4) The preparation method of the holographic anti-counterfeiting pattern is simple and reliable. The holographic effect of the anti-counterfeiting pattern is unique. The holographic effect is an erratic phantom effect. While retaining the main body of the element, there is also a rainbow tail. As the lighting source moves, the rainbow tail will also drift around the main body of the element, and its drifting trajectory is not fixed. It cannot be imitated by peers. It has excellent anti-counterfeiting effect and is easy to promote and apply. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] The present application is further described below with reference to the accompanying drawings and examples.

[0025] Figure 1 This is a structural diagram of a holographic anti-counterfeiting device for this application.

[0026] Figure 2 This is the observation effect diagram of the holographic anti-counterfeiting pattern of this application.

[0027] In the figure: 1-pinhole filter, 2-mask, 3-focusing lens, 4-photosensitive material. DETAILED DESCRIPTION

[0028] The holographic anti-counterfeiting pattern and the production device and method thereof are further described in detail in conjunction with the accompanying drawings, but are not intended to limit the present application.

[0029] Depend on Figure 1 As shown, a holographic anti-counterfeiting pattern production device includes a light source, a pinhole filter 1, a mask 2, a focusing lens 3 and a photosensitive material 4 arranged in sequence, that is, the mask 2 is arranged between the pinhole filter 1 and the focusing lens 3, and the photosensitive material 4 is arranged on the rear side of the focusing lens 3, wherein the mask 2 is manually carved by personnel.

[0030] In this embodiment, the light source is a laser equipped with a beam splitter. The beam splitter splits the laser's light into two paths: object light and reference light. The object light is directed toward pinhole filter 1. The reticle 2 provides information about the final hologram's appearance; the focusing lens 3 is used to converge the light waves; and the photosensitive material 4 is used to generate the hologram.

[0031] The condenser lens 3 is a lens with aberrations, and is used to generate distortion based on the aberrations to improve anti-counterfeiting performance. Further, the condenser lens 3 is a convex lens.

[0032] A method for preparing a holographic anti-counterfeiting pattern, based on the above-mentioned holographic anti-counterfeiting pattern production device, comprises the following steps:

[0033] S01, build optical path system;

[0034] S02, making mask 2;

[0035] S03, leveling the mask 2 obtained in step B in the optical path;

[0036] S04. Adjust the front-to-back position of the photosensitive material 4 to properly control the viewing angle for exposure. Reticle 2 carries the appearance information of the hologram. After passing through reticle 2, the object light enters condenser lens 3, forming a light field. Condenser lens 3 is placed in a suitable position to converge the light waves. Condenser lens 3 is an aberrated lens that produces distorted light waves based on the aberrations to improve anti-counterfeiting performance. The focal length and aperture ratio of condenser lens 3 are matched to the size of the hologram and the diffracted light field.

[0037] When adjusting the front and rear positions of the photosensitive material 4, the adjustment is performed based on the following formula:

[0038]

[0039] Wherein, f is the focal length of the condensing lens 3 , u is the distance from the mask 2 to the optical center of the condensing lens 3 , and v is the distance from the photosensitive material 4 to the optical center of the condensing lens 3 .

[0040] In step S01, when assembling the optical path system, pinhole filter 1 is used to filter out stray light and generate a pure point light source. The distance between the pinhole filter and the laser must ensure that the light beam forms an ideal spherical wavefront after passing through the pinhole. This distance is adjusted through experiments and is a fixed value.

[0041] The distance between the reticle 2 and the pinhole filter 1 affects the uniformity of the reticle's illumination. Köhler illumination conditions must generally be met, with the pinhole imaged at the entrance pupil of the condenser lens 3, to ensure uniform illumination of the reticle 2. This distance is also adjusted experimentally and remains constant.

[0042] A holographic anti-counterfeiting pattern comprises, from top to bottom, a PET layer, an information layer, an aluminum-plated layer, a glue-coated layer and a silicone oil paper layer. The information layer is prepared by the preparation device and preparation method of the holographic anti-counterfeiting pattern.

[0043] Its visual effects are Figure 2 As shown, when viewed from the front, the graphic information is on the hologram surface and serves as the primary information. When viewed from the side, the graphic information appears three-dimensional and dynamic, changing with the viewing angle. The primary image information does not change with viewing angle; the image moves and changes 360 degrees.

[0044] The above describes the implementation methods of the present application in detail in conjunction with the accompanying drawings, but the present application is not limited to the above implementation methods. Various changes can be made within the scope of knowledge possessed by ordinary technicians in the relevant technical field without departing from the purpose of the present application.

Claims

1. A holographic anti-counterfeiting pattern production device, characterized by: The invention comprises a light source, a pinhole filter (1), a mask (2), a focusing lens (3) and a photosensitive material (4) which are arranged in sequence. The mask (2) is formed by manual carving.

2. The holographic anti-counterfeiting pattern production device according to claim 1, characterized in that: The light source is a laser with a beam splitter.

3. The holographic anti-counterfeiting pattern production device according to claim 1, characterized in that: The condenser lens (3) is a lens with aberration.

4. The holographic anti-counterfeiting pattern production device according to claim 3, characterized in that: The condenser lens (3) is a convex lens.

5. A method for preparing a holographic anti-counterfeiting pattern, based on the holographic anti-counterfeiting pattern production device according to any one of claims 1 to 4, characterized in that: The following steps are involved: S01, build optical path system; S02, making a mask (2); S03, leveling the mask (2) obtained in step B in the optical path; S04, adjusting the front and rear positions of the photosensitive material (4) and reasonably controlling the viewing angle range for exposure.

6. The method for preparing a holographic anti-counterfeiting pattern according to claim 5, wherein: In step S04, when adjusting the front and rear positions of the photosensitive material (4), the adjustment is performed based on the following formula: Wherein, f is the focal length of the focusing lens (3), u is the distance from the mask (2) to the optical center of the focusing lens (3), and v is the distance from the photosensitive material (4) to the optical center of the focusing lens (3).

7. A holographic security pattern, comprising an information layer obtained by the method for preparing a holographic security pattern according to claim 5, characterized in that: It includes a PET layer, an information layer, an aluminum-plated layer, a glue-coated layer and a silicone oil paper layer which are arranged in sequence from top to bottom.

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