Particle containing device, non-contact type particle processing equipment and light sensing structure of non-contact type particle processing equipment

Abstract

The invention provides a particle containing device, non-contact type particle processing equipment and a light sensing structure of the non-contact type particle processing equipment. The particle accommodating device is used for accommodating a liquid specimen and comprises a plurality of particles. The accommodating device comprises a light sensing structure and a matching structure spaced from the light sensing structure. The light sensing structure comprises a substrate, an electrode layer and a photoelectric layer which are formed on the substrate, and an insulator formed on the photoelectric layer. The insulator includes a charge-type track protruding from the photoelectric layer. The optoelectronic layer is operable to generate a plurality of charges concentrated on the charge-type track such that the charge density of the charge-type track is greater than the charge density of the outer surface of the optoelectronic layer, so that the charge-type track positions at least one of the particles thereon through electrostatic adsorption. Therefore, the particles are moved and positioned in an electrostatic adsorption manner, so that the positioning of the particles is accurately realized.

Description

Technical Field

[0001] This application relates to a particulate processing device, and more particularly to a particulate container, a non-contact particulate processing device and its photosensitive structure. Background Technology

[0002] Existing particulate processing devices can drive target particles to move by applying an electric field. However, how to move the target particles accurately along a predetermined route to a predetermined target area without contacting them is the direction in which existing particulate processing devices need further improvement and refinement.

[0003] Therefore, the applicant believes that the above-mentioned defects can be improved. So, the applicant has devoted himself to research and applied scientific principles, and finally proposed a design that is reasonable and effectively improves the above-mentioned defects. Summary of the Invention

[0004] The technical problem to be solved by this application is to provide a particle containing device and a non-contact particle processing device and its photosensitive structure, which can effectively improve the defects that may occur in existing particle processing devices.

[0005] This application discloses a non-contact particulate processing device, comprising: a particulate containing device for containing a liquid sample containing multiple parts; the particulate containing device includes: a photosensitive structure including a first substrate, a first electrode layer formed on the first substrate, a photoelectric layer formed on the first substrate, and an insulator formed on the photoelectric layer; wherein the insulator includes: a substrate layer embedded within the photoelectric layer; a track layer connected to the substrate layer and at least partially protruding from the photoelectric layer, and a charge track formed at the top edge of the track layer; wherein the photoelectric layer is operable to generate multiple charges concentrated in the charge track, so that the charge track can attract at least... A microparticle is positioned thereon, and at least one microparticle is defined as a target microparticle; a mating structure is spaced apart from the photosensitive structure, and at least one of the photosensitive structure and the mating structure is transparent; wherein the mating structure includes a second substrate and a second electrode layer formed on the second substrate, and the second electrode layer faces the photosensitive structure; a light driving device faces the microparticle receiving device; wherein the light driving device is capable of emitting light to illuminate the photosensitive structure so that the photosensitive structure forms a dielectric electrophoretic pattern; wherein when the target microparticle is electrostatically adsorbed and positioned on the charge track, the light driving device can move the target microparticle along the charge track by moving the dielectric electrophoretic pattern.

[0006] Optionally, when the photoelectric layer is in operation to generate multiple charges concentrated in charge orbitals, the charge density of the charge orbitals is greater than the charge density of the outer surface of the photoelectric layer.

[0007] Optionally, the photoelectric layer can be used to generate multiple charges concentrated in charge orbitals by receiving external ambient light.

[0008] Optionally, the orbital layer includes two arms extending from the substrate layer, and a gap is formed between the inner surfaces of the two arms; wherein the free ends of the two arms are located outside the photoelectric layer and are in contact with each other, such that the gap is surrounded by the inner surfaces of the two arms and the substrate layer, and the free ends of the two arms form at least a portion of the charge orbital.

[0009] Optionally, the orbital layer includes two arms extending from the substrate layer, and a gap is formed between the inner surfaces of the two arms; wherein the free end faces of the two arms are located outside the photoelectric layer and are far apart from each other, such that the gap is connected to the outside, and the inner surfaces of the two arms form at least a portion of the charge orbital.

[0010] Optionally, the charge-type orbit includes: a plurality of transverse orbit slots, each parallel to a first direction; a plurality of longitudinal orbit slots, each parallel to a second direction, intersecting with the plurality of transverse orbit slots; wherein, the plurality of transverse orbit slots and the plurality of longitudinal orbit slots at multiple overlapping points where they intersect are each defined as a charge concentration region; wherein, when the photoelectric layer is in operation to generate multiple charges concentrated in the charge-type orbit, the charge concentration region has the maximum charge density in the photosensitive structure.

[0011] Optionally, any one of the plurality of transverse track slots and the plurality of longitudinal track slots has two adjacent inner corners and two outer corners located outside the two inner corners; in any one of the plurality of transverse track slots and the plurality of longitudinal track slots, the height position of the two inner corners is different from the height position of the two outer corners.

[0012] Optionally, the photoelectric layer includes a plurality of transistors arranged in a matrix, and the orbital layer includes a plurality of annular segments surrounding the plurality of transistors, with the plurality of annular segments being adjacent to each other and arranged in a matrix, and the top edges of the plurality of annular segments together forming a charge orbital.

[0013] Optionally, the outer contour of each annular segment is square, and a charge concentration region is formed at the center of any four annular segments that are adjacent to each other and arranged in a square; wherein, when the photoelectric layer is in operation to generate multiple charges concentrated in the charge orbitals, the charge concentration region has the maximum charge density in the photosensitive structure.

[0014] This application also discloses a particle containing device for containing a liquid sample comprising a plurality of particles. The containing device includes: a photosensitive structure comprising: a first substrate; a first electrode layer formed on the first substrate; a photoelectric layer formed on the first substrate; an insulator formed on the photoelectric layer; wherein the insulator includes a charge track protruding from the photoelectric layer; wherein the photoelectric layer is operable to generate a plurality of charges concentrated on the charge track, such that the charge density of the charge track is greater than the charge density of the outer surface of the photoelectric layer, so that the charge track positions at least one particle thereon by electrostatic adsorption; a mating structure spaced apart from the photosensitive structure, and at least one of the photosensitive structure and the mating structure is transparent; wherein the mating structure includes a second substrate and a second electrode layer formed on the second substrate, and the second electrode layer faces the photosensitive structure.

[0015] Optionally, the insulator includes: a substrate layer embedded within the photoelectric layer; and an orbital layer connected to the substrate layer and protruding from the photoelectric layer, wherein a charge orbital is formed at the top edge of the orbital layer.

[0016] Optionally, the charge-type orbit includes: a plurality of transverse orbit slots, each parallel to a first direction; a plurality of longitudinal orbit slots, each parallel to a second direction, intersecting with the plurality of transverse orbit slots; wherein, the plurality of transverse orbit slots and the plurality of longitudinal orbit slots at multiple overlapping points where they intersect are each defined as a charge concentration region; wherein, when the photoelectric layer is in operation to generate multiple charges concentrated in the charge-type orbit, the charge concentration region has the maximum charge density in the photosensitive structure.

[0017] Optionally, the photoelectric layer includes a plurality of transistors arranged in a matrix, and the orbital layer includes a plurality of annular segments surrounding the plurality of transistors, with the plurality of annular segments being adjacent to each other and arranged in a matrix, and the top edges of the plurality of annular segments together forming a charge orbital.

[0018] This application also discloses a photosensitive structure for a non-contact particle processing device, comprising: a first substrate; a first electrode layer formed on the first substrate; a photoelectric layer formed on the first substrate; and an insulator formed on the photoelectric layer; wherein the insulator includes a charge track protruding from the photoelectric layer; wherein the photoelectric layer is operable to generate multiple charges concentrated in the charge track, such that the charge density of the charge track is greater than the charge density of the outer surface of the photoelectric layer.

[0019] Optionally, the photoelectric layer can be used to generate multiple charges concentrated in charge orbitals by receiving external ambient light.

[0020] In summary, the particle containing device and non-contact particle processing equipment and their photosensitive structure disclosed in the embodiments of this application can move and position the target particles by forming the insulator on the photoelectric layer, so that the charge track of the insulator can be matched with the operation of the photoelectric layer, thereby accurately positioning the target particles by electrostatic adsorption.

[0021] Furthermore, the charge-type track can be used in conjunction with the light-driving device to allow the target particle to be propelled by the dielectrophoretic pattern and move rapidly along the charge-type track. In other words, the target particle can be propelled by the dielectrophoretic pattern or moved along the charge-type track after being touched (or lightly bumped), thereby effectively reducing the potential damage to the target particle caused by the photomask.

[0022] The other effects and embodiments of this application are described in detail below with reference to the accompanying drawings. Attached Figure Description

[0023] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0024] Figure 1 This is a perspective view of the non-contact particulate treatment device according to Embodiment 1 of this application;

[0025] Figure 2 This is a cross-sectional schematic diagram of the non-contact particulate treatment device according to Embodiment 1 of this application;

[0026] Figure 3 This is a top view schematic diagram of the non-contact particulate treatment device according to Embodiment 1 of this application;

[0027] Figure 4 for Figure 3 An enlarged schematic diagram of region IV;

[0028] Figure 5 for Figure 4 A diagram illustrating the subsequent actions;

[0029] Figure 6 for Figure 4 Another diagram illustrating subsequent actions;

[0030] Figure 7 This is a partial cross-sectional schematic diagram of the non-contact particulate treatment device according to Embodiment 1 of this application;

[0031] Figure 8 for Figure 7 A diagram illustrating the subsequent actions;

[0032] Figure 9 This is a partial cross-sectional schematic diagram of the non-contact particulate treatment device according to Embodiment 2 of this application;

[0033] Figure 10 This is a cross-sectional schematic diagram of the non-contact particulate treatment device according to Embodiment 3 of this application. Detailed Implementation

[0034] The following specific embodiments illustrate the implementation of the "particle containing device, non-contact particle processing equipment and its photosensitive structure" disclosed in this application. Those skilled in the art can understand the advantages and effects of this application from the content disclosed in this specification. This application can be implemented or applied through other different specific embodiments, and various details in this specification can also be modified and changed based on different viewpoints and applications without departing from the concept of this application. Furthermore, the accompanying drawings are for simple illustration only and are not depictions of actual dimensions, as stated in advance. The following embodiments will further describe the relevant technical content of this application in detail, but the disclosed content is not intended to limit the scope of protection of this application.

[0035] It should be understood that while terms such as "first," "second," and "third" may be used in this document to describe various components or features, these components or features should not be limited by these terms. These terms are primarily used to distinguish one component from another, or one feature from another. Furthermore, the term "or" as used in this document should, as appropriate, include any combination of one or more related listed items.

[0036] [Example 1]

[0037] Please see Figures 1 to 8 As shown, this is an embodiment of this application. Figures 1 to 4 As shown, this embodiment discloses a non-contact particulate processing device 100, which includes a particulate container 1, an AC power device 2 electrically coupled to the particulate container 1, and a light driving device 3 facing the particulate container 1. However, this application is not limited to this. For example, in other embodiments not shown in this application, the particulate container 1 can be used independently (e.g., for sale) or in conjunction with other devices as needed.

[0038] In this embodiment, the particle containing device 1 is a rectangular structure at the chip-scale, and it is used to contain a liquid sample S containing a plurality of particles P, but this application is not limited thereto. For example, the number of particles P contained in the liquid sample S can also be adjusted according to actual needs (e.g., at least one).

[0039] Furthermore, in this embodiment, the microparticle P is described as a biological microparticle; more specifically, the liquid sample S can be a bodily fluid sample from an animal (e.g., blood, lymph, saliva, or urine), and the microparticle P can be a specific type of cell or cell cluster, such as circulating tumor cells (CTCs), fetal nucleated red blood cells (FNRBCs), or bacteria, but this application is not limited to the above. For example, in other embodiments not shown in this application, the liquid sample S can also be a liquid sample from a plant. In addition, the microparticle P can also be plastic microparticles, used to adsorb viruses, bacteria, or exosomes, depending on actual needs.

[0040] The particle containing device 1 includes a photosensitive structure 11, a mating structure 12 spaced apart from the photosensitive structure 11, and an adhesive layer 13 joining the periphery of the photosensitive structure 11 and the periphery of the mating structure 12. At least one of the photosensitive structure 11 and the mating structure 12 is transparent, and in this embodiment, the photosensitive structure 11 and the mating structure 12 are two plate-like structures arranged parallel to each other with a distance between them greater than the size of any one of the particles P; however, this application is not limited to the above description.

[0041] More specifically, the photosensitive structure 11 includes a first substrate 111, a first electrode layer 112 formed on the first substrate 111, a photoelectric layer 113 formed on the first substrate 111, and an insulator 114 formed on the photoelectric layer 113. In this embodiment, the first electrode layer 112 is formed on the bottom side of the first substrate 111, the photoelectric layer 113 is formed on the top side of the first substrate 111, and the photoelectric layer 113 has a plurality of transistors 1131 arranged in a matrix; wherein, the photoelectric layer 113 may adopt an NPN transistor architecture, a PNP transistor architecture, an NP diode architecture, or a PN diode architecture according to actual needs, but this application is not limited to this.

[0042] The mating structure 12 includes a second substrate 121 and a second electrode layer 122 formed on the second substrate 121, and the second electrode layer 122 faces the photosensitive structure 11 (e.g., the photoelectric layer 113 and the insulator 114). In this embodiment, the AC device 2 is electrically coupled to the first electrode layer 112 of the photosensitive structure 11 and the second electrode layer 122 of the mating structure 12, so that the photosensitive structure 11 can be irradiated by the light emitted by the light driving device 3 to form a dielectric pattern F, thereby moving any one of the particles P (e.g., ...) within the liquid sample S through the dielectric pattern F. Figure 5 and Figure 6 ).

[0043] For example, the light driving device 3 may include a camera 31 and a light source 32 associated with the camera 31. The light driving device 3 can emit light through the light source 32 to illuminate the photosensitive structure 11, so that the photosensitive structure 11 (or the photoelectric layer 113) forms the dielectric electrophoretic pattern F.

[0044] The insulator 114 includes a charge orbital T protruding from the photoelectric layer 113, and the photoelectric layer 113 is operable to generate multiple charges concentrated on the charge orbital T, such that the charge density of the charge orbital T is greater than the charge density of the outer surface of the photoelectric layer 113, so that the charge orbital T can position at least one particle P thereon by electrostatic adsorption, and the at least one particle P is defined as a target particle P1.

[0045] The photoelectric layer 113 can be used to generate multiple charges concentrated in the charge orbital T by receiving external ambient light; or, the photoelectric layer 113 can also generate multiple charges concentrated in the charge orbital T by emitting light from the light driving device 3. This application does not limit this.

[0046] As described above, when the target particle P1 is electrostatically attracted and positioned on the charge orbit T, the photo-driving device 3 can move the target particle P1 along the charge orbit T by moving the dielectrophoretic pattern F (e.g., ...). Figure 5 and Figure 6 ).

[0047] Therefore, in this embodiment, the non-contact particle processing device 100 can form the insulator 114 on the photoelectric layer 113 so that the charge orbitals T of the insulator 114 can move and position the target particle P1 by electrostatic adsorption in conjunction with the operation of the photoelectric layer 113, thereby accurately positioning the target particle P1.

[0048] Furthermore, the charged orbital T can be used in conjunction with the optical driving device 3 so that the target particle P1 can be propelled by the dielectrophoretic pattern F and move rapidly on the charged orbital T. In other words, the target particle P1 can be propelled by the dielectrophoretic pattern F (e.g., ...). Figure 6 ), or after being touched (or lightly bumped), it moves along the charge track T (e.g.: Figure 5 This effectively reduces the potential damage to the target particle P1 caused by the photomask.

[0049] It should be noted that the structure of the insulator 114 can be adjusted and varied according to actual needs, provided that the charged orbital T can adsorb the target particle P1 or further provide the target particle P1 to move on it. However, in order to enable the target particle P1 to move more smoothly and quickly on the charged orbital T, the insulator 114 may optionally include at least some of the following technical features, but this application is not limited thereto.

[0050] In this embodiment, as Figure 2 ,and Figure 7 and Figure 8 As shown, the insulator 114 includes a substrate layer 1141 and a track layer 1142. The substrate layer 1141 is embedded within the photoelectric layer 113, and the track layer 1142 is connected to the substrate layer 1141 and at least partially protrudes from the photoelectric layer 113. The top edge of the track layer 1142 forms the charge track T. It should be noted that the structure of the insulator 114 will be described from different angles (e.g., cross-sectional view or top view) in the following description, and the insulator 114 can be designed with a structure described from a specific angle according to actual needs.

[0051] Furthermore, the insulator 114 is in Figure 2 The presented cross-sectional view contains several blocks with largely the same structure. For ease of understanding, the following description refers only to the insulator 114. Figure 2 One of the blocks mentioned therein (e.g.: Figure 7 This is to illustrate the point, but the application is not limited thereto. For example, in other embodiments not shown in this application, the insulator 114 may have different configurations in the multiple blocks shown in the cross-sectional view.

[0052] In this embodiment Figure 7 and Figure 8 In this structure, the orbital layer 1142 includes two arms 1143 extending from the substrate layer 1141, and a gap G is formed between the inner surfaces 1143b of the two arms 1143. The free end faces 1143a of the two arms 1143 are located outside the photoelectric layer 113 and are in contact with each other, such that the gap G is jointly surrounded by the inner surfaces 1143b of the two arms 1143 and the substrate layer 1141, and the free end faces 1143a of the two arms 1143 form at least a portion of the charge orbital T.

[0053] Furthermore, each of the supporting arms 1143 includes an inner corner 1143c and an outer corner 1143d located on opposite sides of the free end face 1143a, and the height of the two inner corners 1143c is different from (e.g., lower than) the height of the two outer corners 1143d. In this embodiment, the two supporting arms 1143 are in contact with each other at their two inner corners 1143c, so that the charge track T formed by the two free end faces 1143a is generally V-shaped and facilitates the movement of the target particle P1 on it. Moreover, since each supporting arm 1143 has the inner corner 1143c and the outer corner 1143d, it is beneficial for multiple charges to concentrate at the inner corner 1143c and the outer corner 1143d.

[0054] From another perspective, such as Figures 4 to 6 As shown in the top view, the charge-type track T includes a plurality of transverse track slots T1 and a plurality of longitudinal track slots T2. Each transverse track slot T1 is parallel to a first direction D1, and each longitudinal track slot T2 is parallel to a second direction D2, intersecting with the plurality of transverse track slots T1. In this embodiment, the first direction D1 and the second direction D2 are perpendicular to each other, but this is not a limitation.

[0055] Furthermore, each of the multiple transverse track slots T1 and the multiple longitudinal track slots T2 at their intersections is defined as a charge concentration region T3. When the photoelectric layer 113 is operating to generate multiple charge concentrations in the charge-type track T, the charge concentration region T3 has the highest charge density within the photosensitive structure 11, thereby facilitating the electrostatic adsorption of the target particle P1 to any one of the charge concentration regions T3.

[0056] Change Figure 4 and Figure 7In this embodiment, any one of the plurality of transverse track grooves T1 and the plurality of longitudinal track grooves T2 is equivalent to being formed by two support arms 1143. That is, any one of the plurality of transverse track grooves T1 and the plurality of longitudinal track grooves T2 has two adjacent inner corners 1143c and two outer corners 1143d located outside the two inner corners 1143c. Furthermore, in any one of the plurality of transverse track grooves T1 and the plurality of longitudinal track grooves T2, the height position of the two inner corners 1143c is different from (e.g., lower than) the height position of the two outer corners 1143d.

[0057] It should be added that, such as Figure 4 As shown, the transverse track groove T1 is a continuous groove along the first direction D1 without segmentation, and the longitudinal track groove T2 can also be a continuous groove along the second direction D2 without segmentation, but this application is not limited thereto.

[0058] Furthermore, in this embodiment, the particle containing device 1 is described with the photosensitive structure 11 in conjunction with the mating structure 12 and the bonding layer 13, but this application is not limited thereto. For example, in other embodiments not shown in this application, the photosensitive structure 11 may be used independently (e.g., for sale) or in conjunction with other structures, depending on actual needs.

[0059] [Example 2]

[0060] Please see Figure 9 As shown, this is Embodiment Two of this application. Since this embodiment is similar to Embodiment One described above, the similarities between the two embodiments will not be repeated. The main differences between this embodiment and Embodiment One described above are explained as follows:

[0061] In this embodiment, the free end faces 1143a of the two arms 1143 are located outside the photoelectric layer 113 and are far apart from each other, so that the gap G is connected to the outside, and the inner side faces 1143b of the two arms 1143 form at least a portion of the charge track T.

[0062] More specifically, the height of the inner corners 1143c of the two arms 1143 is higher than the height of the outer corners 1143d of the two arms 1143. In this embodiment, the two arms 1143 are positioned such that their inner corners 1143c are far apart from each other, so that the charge track T formed by the inner surfaces 1143b of the two arms is generally V-shaped and facilitates the movement of the target particle P1 on it. That is, the target particle P1 can be partially located within the gap G.

[0063] [Example 3]

[0064] Please see Figure 10 As shown, this is Embodiment Three of this application. Since this embodiment is similar to Embodiments One and Two described above, the similarities between the above embodiments will not be repeated. The main differences between this embodiment and Embodiments One and Two are explained below:

[0065] In this embodiment, each of the transverse track grooves T1 is composed of multiple segments along the first direction D1, and each of the longitudinal track grooves T2 is composed of multiple segments along the second direction D2. The segmented structure of the transverse track grooves T1 and the longitudinal track grooves T2 can be adjusted and varied according to actual needs. The following description only illustrates one optional implementation method and is not intended to limit it.

[0066] More specifically, the orbital layer 1142 includes a plurality of annular segments 1144 surrounding the plurality of transistors 1131, and the plurality of annular segments 1144 are arranged adjacent to each other in a matrix, and the top edges of the plurality of annular segments 1144 together constitute the charge-type orbits T. That is, the top edges of the plurality of annular segments 1144 together constitute a plurality of transverse orbital slots T1 and a plurality of longitudinal orbital slots T2.

[0067] Furthermore, the outer contour of each of the annular segments 1144 is square, and the charge concentration region T3 is formed at the center of any four adjacent annular segments 1144 arranged in a square. From another perspective, any two adjacent arms 1143 belong to two separate annular segments 1144.

[0068] [Technical Effects of the Embodiments in this Application]

[0069] In summary, the particle containing device and non-contact particle processing equipment and their photosensitive structure disclosed in the embodiments of this application can move and position the target particles by forming the insulator on the photoelectric layer, so that the charge track of the insulator can be matched with the operation of the photoelectric layer, thereby accurately positioning the target particles by electrostatic adsorption.

[0070] Furthermore, the charge-type track can be used in conjunction with the light-driving device to allow the target particle to be propelled by the dielectrophoretic pattern and move rapidly along the charge-type track. In other words, the target particle can be propelled by the dielectrophoretic pattern or moved along the charge-type track after being touched (or lightly bumped), thereby effectively reducing the potential damage to the target particle caused by the photomask.

[0071] The embodiments and / or implementation methods described above are merely preferred embodiments and / or implementation methods for implementing the technology of this application, and are not intended to limit the implementation methods of the technology of this application in any way. Any person skilled in the art may make some modifications or alterations to other equivalent embodiments without departing from the scope of the technical means disclosed in this application, but these should still be regarded as the technology or embodiments that are substantially the same as those of this application.

Claims

1. A non-contact particulate matter treatment device, characterized in that, The non-contact particulate treatment device includes: A particulate container for containing a liquid sample comprising a plurality of particles, and the particulate container comprising: A photosensitive structure includes a first substrate, a first electrode layer formed on the first substrate, a photoelectric layer formed on the first substrate, and an insulator formed on the photoelectric layer; wherein the insulator comprises: A substrate layer is embedded within the photoelectric layer; and An orbital layer, connected to the substrate layer and at least partially protruding from the photoelectric layer, wherein a charge orbital is formed at the top edge of the orbital layer; wherein the photoelectric layer is operable to generate multiple charges concentrated on the charge orbital, so that the charge orbital can electrostatically attract and position at least one of the particles thereon, and the at least one particle is defined as a target particle; and A mating structure is spaced apart from the photosensitive structure, and at least one of the photosensitive structure and the mating structure is transparent; wherein the mating structure includes a second substrate and a second electrode layer formed on the second substrate, and the second electrode layer faces the photosensitive structure; and A light-driven device is provided facing the particle-containing device; wherein the light-driven device is capable of emitting light to illuminate the photosensitive structure, so that the photosensitive structure forms a dielectric electrophoretic pattern. When the target particle is electrostatically adsorbed and positioned on the charge track, the light-driven device can move the target particle along the charge track by moving the dielectrophoretic pattern.

2. The non-contact particulate treatment device according to claim 1, characterized in that, When the photoelectric layer is in operation to generate multiple charges concentrated in the charge orbitals, the charge density of the charge orbitals is greater than the charge density of the outer surface of the photoelectric layer.

3. The non-contact particulate treatment device according to claim 1, characterized in that, The photoelectric layer can be used to generate multiple charges concentrated in the charge orbitals by receiving external ambient light.

4. The non-contact particulate treatment device according to claim 1, characterized in that, The orbital layer includes two arms extending from the substrate layer, and a gap is formed between the inner surfaces of the two arms; wherein the free end faces of the two arms are located outside the photoelectric layer and in contact with each other, such that the gap is surrounded by the inner surfaces of the two arms and the substrate layer, and the free end faces of the two arms form at least a portion of the charge orbital.

5. The non-contact particulate treatment device according to claim 1, characterized in that, The orbital layer includes two arms extending from the substrate layer, and a gap is formed between the inner surfaces of the two arms; wherein the free end faces of the two arms are located outside the photoelectric layer and are far apart from each other, such that the gap is connected to the outside, and the inner surfaces of the two arms form at least a portion of the charge orbital.

6. The non-contact particulate treatment device according to claim 1, characterized in that, The charge orbital includes: Multiple transverse track slots, each parallel to a first direction; and Multiple longitudinal track slots, each parallel to a second direction, intersect with the multiple transverse track slots; wherein, at multiple overlapping points where the multiple transverse track slots and the multiple longitudinal track slots intersect, each is defined as a charge concentration region; When the photoelectric layer is in operation to generate multiple charges concentrated in the charge orbitals, the charge concentration region has the largest charge density in the photosensitive structure.

7. The non-contact particulate treatment device according to claim 6, characterized in that, Each of the plurality of transverse track slots and the plurality of longitudinal track slots has two adjacent inner corners and two outer corners located outside the two inner corners; in any one of the plurality of transverse track slots and the plurality of longitudinal track slots, the height position of the two inner corners is different from the height position of the two outer corners.

8. The non-contact particulate treatment device according to claim 1, characterized in that, The photoelectric layer includes a plurality of transistors arranged in a matrix, and the orbital layer includes a plurality of annular segments surrounding the plurality of transistors, with the plurality of annular segments being adjacent to each other and arranged in a matrix, and the top edges of the plurality of annular segments together forming the charge orbital.

9. The non-contact particulate treatment device according to claim 8, characterized in that, Each of the annular segments has a square outer contour, and a charge concentration region is formed at the center of any four annular segments that are adjacent to each other and arranged in a square; wherein, when the photoelectric layer is in operation to generate multiple charges concentrated in the charge orbitals, the charge concentration region has the maximum charge density in the photosensitive structure.

10. A particle containing device, characterized in that, The particle containing device is used to contain a liquid sample comprising multiple particles; the containing device includes: A light-sensing structure, comprising: First substrate; A first electrode layer is formed on the first substrate; A photoelectric layer is formed on the first substrate; and An insulator is formed in the photoelectric layer; wherein the insulator includes a charge orbital protruding from the photoelectric layer; The photoelectric layer is operable to generate multiple charges concentrated in the charge orbitals, such that the charge density of the charge orbitals is greater than the charge density of the outer surface of the photoelectric layer, so that at least one of the particles is positioned thereon by electrostatic adsorption. A mating structure is spaced apart from the photosensitive structure, and at least one of the photosensitive structure and the mating structure is transparent; wherein the mating structure includes a second substrate and a second electrode layer formed on the second substrate, and the second electrode layer faces the photosensitive structure.

11. The particle containing device according to claim 10, characterized in that, The insulator comprises: A substrate layer is embedded within the photoelectric layer; and An orbital layer is connected to the substrate layer and protrudes from the photoelectric layer, and the charge orbitals are formed on the top edge of the orbital layer.

12. The particle containing device according to claim 10, characterized in that, The charge orbital includes: Multiple transverse track slots, each parallel to a first direction; and Multiple longitudinal track slots, each parallel to a second direction, intersect with the multiple transverse track slots; wherein, at multiple overlapping points where the multiple transverse track slots and the multiple longitudinal track slots intersect, each is defined as a charge concentration region; When the photoelectric layer is in operation to generate multiple charges concentrated in the charge orbitals, the charge concentration region has the largest charge density in the photosensitive structure.

13. The particle containing device according to claim 11, characterized in that, The photoelectric layer includes a plurality of transistors arranged in a matrix, and the orbital layer includes a plurality of annular segments surrounding the plurality of transistors, with the plurality of annular segments being adjacent to each other and arranged in a matrix, and the top edges of the plurality of annular segments together forming the charge orbital.

14. A photosensitive structure for a non-contact particulate processing device, characterized in that, The photosensitive structure of the non-contact particle processing device includes: First substrate; A first electrode layer is formed on the first substrate; A photoelectric layer is formed on the first substrate; and An insulator is formed in the photoelectric layer; wherein the insulator includes a charge orbital protruding from the photoelectric layer; The photoelectric layer can operate to generate multiple charges concentrated in the charge orbitals, such that the charge density of the charge orbitals is greater than the charge density of the outer surface of the photoelectric layer.

15. The photosensitive structure of the non-contact particle processing device according to claim 14, characterized in that, The photoelectric layer can be used to generate multiple charges concentrated in the charge orbitals by receiving external ambient light.

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