Preparation method of transparent hydrophobic glass surface with high wear resistance

Abstract

The invention discloses a preparation method of a transparent hydrophobic glass surface with high wear resistance, and aims to solve the technical problems that a hydrophobic coating on the glass surface is poor in wear resistance and the light transmittance is reduced. The preparation method of the transparent hydrophobic glass surface comprises the following steps: 1, carrying out surface pretreatment by adopting a hexamethyldisilazane tackifier, and spin-coating photoresist on the surface of a pretreated glass substrate; 2, carrying out photoetching exposure treatment on the glass substrate coated with the photoresist; 3, performing rotary spraying of a developing solution on the surface of the photoetched glass substrate; 4, hardening treatment; 5, carrying out circular hole microstructure etching on the hardened glass substrate by adopting a microwave plasma chemical vapor deposition process; 6, depositing a SiO2 particle layer on the surface of the glass substrate; and 7, depositing a PTFE film on the surface of the glass substrate. According to the prepared transparent hydrophobic glass surface, the visible light transmittance of 380-780 nm is larger than 87.5%, the hydrophobic angle is larger than 141.35 degrees, and good durability is achieved.

Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of transparent hydrophobic material preparation, and particularly relates to a preparation method of a transparent hydrophobic glass surface with high wear resistance. BACKGROUND

[0002] In harsh marine environments, the optical windows of ships and underwater camera lenses fail mainly due to seawater corrosion and the attachment of marine biofouling, which seriously affects the operational function and service life of the equipment. As they cannot meet the long-term marine service requirements, they need frequent maintenance and replacement, which poses a major threat to human life and property, highlighting the critical need to develop extremely durable, transparent and hydrophobic glass surfaces to resist biofouling.

[0003] To meet the high requirements of harsh marine environments, including high optical transmittance, anti-biofouling, corrosion resistance and long-term stability, optical windows are increasingly modified by superhydrophobic technology. When an object surface exhibits extremely high water contact angle and low sliding angle, the surface is considered superhydrophobic. Such surfaces have excellent self-cleaning and anti-attachment properties, making them widely used in corrosion resistance, anti-icing and anti-fogging fields.

[0004] Superhydrophobicity is usually achieved by constructing micro-nano hierarchical roughness and modified by low surface energy coating. This microstructure forms an air film at the solid-liquid interface, thereby isolating the surface from seawater and preventing the initial attachment of microorganisms. At the same time, low surface energy materials exhibit poor wettability, making it difficult for microbial slime to attach or remain firmly attached. As seawater flows over the surface, the larvae and spores of attached organisms are easily washed away, effectively inhibiting biofouling. However, these modified coatings have low durability, unstable air films retained during long-term immersion, and increased halos and reduced light transmittance due to inherent structural roughness, which are major obstacles to the widespread application of superhydrophobic materials.

[0005] Therefore, in order to improve the durability of transparent antifouling optical windows and meet the urgent needs of ship windows and camera lenses for transparent antifouling optical windows, it is essential to study the preparation and performance of high-durability, high-transparency antifouling optical windows. SUMMARY

[0006] The purpose of the present application is to solve the technical problems of low bio-durability of hydrophobic coatings on glass surfaces, reduced light transmittance due to inherent structural roughness, and poor wear resistance, and to provide a preparation method of a transparent hydrophobic glass surface with high wear resistance.

[0007] The preparation method of the transparent hydrophobic glass surface with high wear resistance according to the present application is realized according to the following steps:

[0008] I. The glass substrate is ultrasonically cleaned, dried, and then pre-treated on the surface with hexamethyldisilazane adhesion promoter. Then, photoresist is spin-coated on the pre-treated glass substrate surface to obtain a glass substrate coated with photoresist.

[0009] II. The glass substrate coated with photoresist is subjected to photolithography exposure treatment according to a circular hole array structure using a laser direct writing device to obtain a glass substrate after photolithography.

[0010] III. A developing solution is spin-sprayed on the surface of the glass substrate after photolithography to dissolve the photoresist subjected to exposure treatment. After water washing, a glass substrate after developing treatment is obtained.

[0011] IV. The glass substrate after developing treatment is heated to 100-110℃ for baking treatment to obtain a glass substrate after film hardening.

[0012] V. The glass substrate after film hardening is subjected to circular hole array (micro) structure etching using a microwave plasma chemical vapor deposition process (MPCVD). The glass substrate after film hardening is placed in a reaction cavity, a vacuum pump is turned on, vacuum is drawn, a hydrogen valve is opened, the hydrogen flow is controlled at 110-200 sccm, the gas pressure in the reaction cavity is 50-70 Torr, and plasma etching is performed to obtain a glass substrate with a micro-hole array structure. The diameter of the circular holes in the micro-hole array structure is 50-130 μm, the (edge) distance between the circular holes is 3-10 μm, and the depth of the circular holes is 1-4 μm.

[0013] VI. A SiO2 particle layer is deposited on the surface of the glass substrate with a micro-hole array structure using a pull-dip method through a nano-SiO2 particle dispersion liquid. After heating and solidification, a glass substrate with a SiO2 particle layer is obtained.

[0014] VII. A PTFE film (polytetrafluoroethylene) is deposited on the surface of the glass substrate with a SiO2 particle layer using a reactive direct current magnetron sputtering process. After annealing treatment, a high wear-resistant transparent hydrophobic glass surface is obtained.

[0015] The application aims to provide a preparation method of transparent hydrophobic glass with high wear resistance, which is mainly applied to ship windows, optical lenses and other scenes. The method first designs a set of regular micron-sized circular hole array based on the Cassie-Baxter equation, which provides the best theoretical basis for air trapping and surface hydrophobicity, while minimizing light scattering. Secondly, a hybrid manufacturing process is developed, which etches micron-sized circular hole microstructure on the glass surface through microwave plasma chemical vapor deposition equipment (MPCVD), then deposits a layer of nano-SiO2 particles on the surface of the micro-hole structure through the pull-coating method, constructs a micron-nanometer rough structure, and then uniformly deposits a non-polar PTFE film (polytetrafluoroethylene) on the surface of the microstructure by reactive direct current magnetron sputtering process, to construct a three-level micro-nanometer composite structure of transparent hydrophobic glass surface. The nano-SiO2 particles can be uniformly covered on the surface of the microstructure, and when the transparent hydrophobic glass surface is subjected to mechanical friction, the convex part of the microstructure bears the main stress, which protects the nano-SiO2 particles and PTFE film inside the micro-hole, effectively improving the wear resistance of the transparent hydrophobic structure. The reactive direct current magnetron sputtering technology makes the film particles uniformly cover the surface of the substrate, forming a uniform and dense film layer, which significantly improves the wear resistance of the hydrophobic film layer. In the process of magnetron sputtering coating, ions with high energy impact the surface of the substrate, promoting the formation of strong physical and chemical bonds between the film and the substrate, greatly enhancing the adhesion of the film and the substrate.

[0016] The transparent hydrophobic glass surface prepared by the application has a visible light transmittance of greater than 87.5% at 380-780 nm, a hydrophobic angle of greater than 141.35°, and a surface hydrophobic angle of greater than 100° after 30 cycles of friction along the horizontal direction under the action of a 100g weight (9.8KPa), with each cycle defined as a 10cm friction.

[0017] The preparation method of the transparent hydrophobic glass surface with high wear resistance has the following beneficial effects:

[0018] ① Design: According to the Cassie-Baxter equation, a regular array composed of micron-sized circular holes is designed, which provides the best theoretical basis for air trapping and liquid repelling, while also minimizing light scattering. The prepared transparent hydrophobic surface has excellent visible light transmittance, with a visible light transmittance of greater than 87.5% at 380-780 nm, which is suitable for optical lenses, marine ship light windows and other scenes.

[0019] ②Manufacturing process: A hybrid manufacturing process was developed, which uses microwave plasma chemical vapor deposition equipment (MPCVD) to prepare a microporous pattern, uses the lift-off coating method to increase the nanoscale roughness of the glass surface, and uses reactive direct current magnetron sputtering technology to deposit a uniform, dense and strongly adherent PTFE (polytetrafluoroethylene) film. This process ensures excellent coating uniformity and strong substrate adhesion, which is crucial for product durability.

[0020] ③Structure: This unique process forms a clear and distinct two-layer micro-nano composite structure, which consists of micron-sized holes, nano-sized SiO2 particles, and holes decorated with nano-sized PTFE (polytetrafluoroethylene) particles, which enhance the anti-fouling, light-transmitting and wear-resistant properties of the glass surface.

[0021] ④Friction resistance: The prepared transparent hydrophobic surface has high wear resistance, and after 30 cycles of 10 cm pressure along the horizontal direction of the ruler under the action of a 100 g weight (9.8 kpa), the surface hydrophobic angle is still greater than 100°, which enhances the surface scratch resistance and solves the technical problem of current transparent hydrophobic surfaces that are not resistant to wear, significantly improving the service life of the transparent hydrophobic surface. BRIEF DESCRIPTION OF DRAWINGS

[0022] Figure 1 Process flow chart for the preparation method of the high wear-resistant transparent hydrophobic glass surface of the present application and corresponding SEM scanning electron microscope images;

[0023] Figure 2 Atomic force microscope (AFM) images before and after the deposition of SiO2 nanoparticles on the circular hole microporous structure in Example 1;

[0024] Figure 3 Water droplet static contact angle test chart of the high wear-resistant transparent hydrophobic glass surface prepared in Example 1 after the friction experiment;

[0025] Figure 4 Transmittance chart of the high wear-resistant transparent hydrophobic glass surface prepared in Example 1 in the 380-780 nm wavelength band. DETAILED DESCRIPTION

[0026] Detailed implementation: The preparation method of the high wear-resistant transparent hydrophobic glass surface of the present embodiment is implemented according to the following steps:

[0027] I. The glass substrate is ultrasonically cleaned, dried and then surface pretreated with hexamethyldisilazane adhesion promoter, then the pretreated glass substrate surface is spin-coated with photoresist to obtain a glass substrate coated with photoresist;

[0028] II. The glass substrate coated with photoresist is exposed to laser direct writing equipment according to the circular hole array structure to obtain a photoetched glass substrate;

[0029] III. The surface of the photoetched glass substrate is sprayed with a developing solution to dissolve the photoresist exposed to light, and the glass substrate is obtained after water washing;

[0030] IV. The glass substrate after developing is heated to 100-110°C for baking treatment to obtain a glass substrate after film hardening;

[0031] V. The glass substrate after film hardening is etched by a microwave plasma chemical vapor deposition process (MPCVD) to obtain a glass substrate with a micro-porous array structure. The glass substrate after film hardening is placed in a reaction chamber, a vacuum pump is opened, and after vacuumizing, a hydrogen valve is opened. The hydrogen flow is controlled at 110-200 sccm, the gas pressure in the reaction chamber is 50-70 Torr, and plasma etching is carried out to obtain a glass substrate with a micro-porous array structure. The diameter of the circular hole in the micro-porous array structure is 50-130 μm, the (edge) distance between the circular holes is 3-10 μm, and the depth of the circular hole is 1-4 μm;

[0032] VI. A SiO2 particle layer is deposited on the surface of the glass substrate with a micro-porous array structure by a pull-up dipping method through a nano-SiO2 particle dispersion liquid. After heating and solidification, a glass substrate with a SiO2 particle layer is obtained;

[0033] VII. A PTFE film (polytetrafluoroethylene) is deposited on the surface of the glass substrate with a SiO2 particle layer by a reactive direct current magnetron sputtering process, and a high wear-resistant transparent hydrophobic glass surface is obtained after annealing treatment.

[0034] Specific embodiment II: The difference between this embodiment and specific embodiment I is that the diameter of the glass substrate in step I is 2-8 inches.

[0035] Specific embodiment III: The difference between this embodiment and specific embodiment I or II is that the temperature of the drying in step I is 80°.

[0036] Specific embodiment IV: The difference between this embodiment and one of specific embodiments I to III is that the baking treatment time in step IV is 3-6 min.

[0037] Specific embodiment V: The difference between this embodiment and one of specific embodiments I to IV is that the microwave source power is controlled at 1200-2800 w during the microwave plasma chemical vapor deposition process in step V.

[0038] Sixth embodiment: the difference between this embodiment and one of the first to fifth embodiments is that the diameter of the round holes in the micropore array structure in step five is 50-130 μm, the (edge) spacing of the round holes is 4-6 μm, and the depth of the round holes is 2 μm.

[0039] The size characteristics of the round holes in the micropore array structure in this embodiment are determined by the Cassie-Baxter equation. The Cassie-Baxter state is that a liquid drop is set to be unable to wet the gaps of the rough structure on a hydrophobic surface, a large amount of air is stored in the grooves on the surface, the liquid drop is actually in contact with the upper surface of the rough structure, and the liquid is located on a composite surface composed of a solid-air combination, thereby forming a solid-liquid-air three-phase interface. The calculation formula is as follows:

[0040] (1)

[0041] In the formula, θ is the apparent contact angle of the liquid drop in the Cassie-Baxter state, represents the proportion of solid-liquid contact on the contact surface, is the intrinsic contact angle of the corresponding ideal smooth surface of the material. The geometric parameters of the hole structure are the height h of the round hole, the diameter a of the round hole, and the spacing d of the round hole, and the area fraction is

[0042] as follows:

[0043] (2)

[0044] Seventh embodiment: the difference between this embodiment and one of the first to sixth embodiments is that the particle size of the nano-SiO2 particles in the nano-SiO2 particle dispersion liquid in step six is 10-150 nm, and the mass percentage content of the nano-SiO2 particles is 10%-20%.

[0045] Eighth embodiment: the difference between this embodiment and one of the first to seventh embodiments is that the pulling speed in the pulling and dipping method in step six is controlled to be 2.5 cm / s.

[0046] Ninth embodiment: the difference between this embodiment and one of the first to eighth embodiments is that the temperature for heating and curing in step six is 80°C, and the curing time is 1 hour.

[0047] Tenth embodiment: the difference between this embodiment and one of the first to ninth embodiments is that the thickness of the PTFE thin film deposited in step seven is 8-30 nm.

[0048] Example 1: the preparation method of the transparent and hydrophobic glass surface with high wear resistance in this example is implemented according to the following steps:

[0049] ​I. The glass substrate is ultrasonically cleaned, dried, and then pre-treated on the surface with hexamethyldisilazane (HMDS) for 10 minutes. After heating and solidification, the pre-treated glass substrate is spin-coated with AZ4620 photoresist at a speed of 1500 r / min to obtain a glass substrate coated with photoresist, and the thickness of the photoresist is 3 μm;

[0050] II. The glass substrate coated with photoresist is exposed to light according to a circular hole array structure using a laser direct writing device. A single point light source is used, and the light exposure accuracy is 300 nm to obtain a glass substrate after light exposure;

[0051] III. The glass substrate after light exposure is spin-sprayed with AZ400K developing solution to dissolve the photoresist after light exposure. The glass substrate is washed with ultrapure water for 20 minutes to remove the residual developing solution, and a glass substrate after development is obtained;

[0052] IV. The glass substrate after development is heated to 100°C for 3 minutes for baking treatment to further volatilize the residual solvent in the photoresist after development. The baking treatment makes the photoresist and the substrate surface more closely combined to prevent the photoresist from falling off in the subsequent dry etching process, and a glass substrate after film hardening is obtained;

[0053] V. A microwave plasma chemical vapor deposition process (MPCVD) is used to etch the circular hole microstructure of the glass substrate after film hardening. The glass substrate after film hardening is placed in the reaction cavity of the microwave plasma chemical vapor deposition device. The vacuum pump is turned on, and the pressure in the reaction cavity is reduced to below 1 Torr. After vacuumizing, the hydrogen valve is opened, the hydrogen flow is controlled at 150 sccm, the gas pressure in the reaction cavity is 65 Torr, the microwave source power is set to 3000 w for ion etching, and a glass substrate with a micro-hole array structure is obtained. The diameter of the circular hole in the micro-hole array structure is 50 μm, the (edge) distance between the circular holes is 5 μm, and the depth of the circular hole is 2 μm;

[0054] VI. A nano-SiO2 particle dispersion liquid is used to deposit a SiO2 particle layer on the surface of the glass substrate with a micro-hole array structure by a pull-up dipping method. The diameter of the nano-SiO2 particles in the nano-SiO2 particle dispersion liquid is 10 nm, the mass percentage of the nano-SiO2 is 10%, the dispersion phase is deionized water, the pull-up speed is 2.5 cm / s, and the solidification is performed at 80°C for 1 hour to obtain a glass substrate with a SiO2 particle layer;

[0055] VII. After ultrasonic water washing and drying, a PTFE film (polytetrafluoroethylene) is deposited on the surface of the glass substrate with a SiO2 nano-particle by a reactive direct current magnetron sputtering process. A mechanical pump and a diffusion pump pumping system are used to pump out the gas in the vacuum chamber, and the chamber gas pressure is reduced to 3×10 -4Pa, sputtering power is 60W; finally, the PTFE film is treated at high temperature by using a tube furnace to obtain a film, the annealing temperature is 200 DEG C, the PTFE film thickness is about 12nm, and the transparent hydrophobic glass surface with high wear resistance is obtained.

[0056] Under the action of the same external load, compared with the smooth substrate, the micro-nano structure causes stress concentration problem due to the reduction of stress area, and is prone to crack in extreme environment, resulting in structural failure.According to the Cassie-Baxter model, the shape of the micro-nano structure affects the hydrophobicity, and the essence is to realize the regulation of the hydrophobicity by changing the surface area fraction.Under the same area fraction, the columnar and platform structure is inclined to the needle-shaped structure, and the local stress concentration is easy to cause structural failure.The micro-hole array in the glass substrate of the embodiment is relative to the nano-scale conical column array structure, the area outside the micro-hole structure is connected as a whole, and has high structural stability and friction resistance.

[0057] A layer of nano-SiO2 particles is uniformly deposited on the surface of the micro-hole structure, the nano-particles fill the inside of the circular hole microstructure, and when the surface is subjected to friction, the upper end of the circular hole microstructure can protect the nano-particles and the PTFE film (polytetrafluoroethylene) in the circular hole from damage, and the modified layer in the hole can still maintain the original hydrophobic property.

[0058] Figure 1 A flow chart and corresponding SEM scanning electron microscope graph are prepared for the present application, wherein ① a circular hole microstructure is prepared by a microwave plasma chemical vapor deposition process (MPCVD) → ② a layer of SiO2 nano-particles is uniformly deposited on the circular hole microstructure by a pulling film coating method → ③ a PTFE film (polytetrafluoroethylene) is deposited on the surface of the glass substrate with SiO2 nano-particles by a reaction direct current magnetron sputtering process.

[0059] Figure 2 The atomic force microscope (AFM) graphs before and after depositing SiO2 nano-particles show that the surface roughness is significantly improved by depositing SiO2 nano-particles by the pulling film coating method.

[0060] Figure 3 The water droplet static contact angle test graph of the transparent hydrophobic glass after the friction experiment shows that the friction resistance of the transparent hydrophobic surface is significantly improved due to the existence of the micro-hole structure.

[0061] Figure 4 The transmittance test graph of the transparent hydrophobic glass prepared in the embodiment in the 380-780nm wave band shows that the average transmittance is 87.44%.

[0062] The high durability transparent hydrophobic glass obtained in the embodiment has a transmittance of greater than 87.39% in a wavelength range of 380-780 nm, and a static hydrophobic angle of greater than 141°. The diameter of the circular holes in the micropore array structure of the embodiment is 50 μm or greater. As the diameter of the circular holes increases, the etched area of the surface increases, and the overall effect is that the area fraction decreases, i.e., the proportion of solid-liquid contact on the contact surface decreases, the amount of air stored in the grooves of the surface increases, and according to the Cassie-Baxter equation, the smaller the area fraction, the greater the hydrophobic angle, and the more easily water droplets on the surface slide off, and the better the hydrophobicity. Due to the increase in the diameter of the circular holes, the number of nano-SiO2 particles filled in the circular holes increases, and due to the protective effect of the microstructure, the surface can be protected from damage when the substrate surface is subjected to external friction, and the original hydrophobic properties are maintained. Under the action of a 100 g weight (9.8 kPa), pushing 10 cm along the horizontal direction of the ruler is defined as one cycle, and after 30 cycles, the surface hydrophobic angle is still greater than 100°.

[0063] Example 2: The difference between this embodiment and Example 1 is that step five forms a micropore array structure on the surface of the glass substrate, wherein the micropores are circular holes, the diameter of the circular holes is 70 μm, the edge distance of the circular holes is 5 μm, the depth of the circular holes is 2 μm, and the particle size of the nano-silicon dioxide particles is 100 nm.

[0064] The high durability transparent hydrophobic glass obtained in the embodiment has a transmittance of greater than 88.03% in a wavelength range of 380-780 nm, and a static hydrophobic angle of greater than 141°, and after 30 cycles, the surface hydrophobic angle is still greater than 100°.

[0065] Example 3: The difference between this embodiment and Example 1 is that step five forms a micropore array structure on the surface of the glass substrate, wherein the micropores are circular holes, the diameter of the circular holes is 90 μm, the edge distance of the circular holes is 5 μm, the depth of the circular holes is 2 μm, and the particle size of the nano-silicon dioxide particles is 150 nm.

[0066] The high durability transparent hydrophobic glass obtained in the embodiment has a transmittance of greater than 87.83% in a wavelength range of 380-780 nm, and a static hydrophobic angle of greater than 141°, and after 30 cycles, the surface hydrophobic angle is still greater than 100°.

Claims

1. A method for preparing a highly wear-resistant transparent hydrophobic glass surface, characterized in that... The preparation method of a highly abrasion-resistant transparent hydrophobic glass surface is carried out according to the following steps:

1. The glass substrate is ultrasonically cleaned and dried. After drying, the surface is pretreated with hexamethyldisilazane thickener. Then, photoresist is spin-coated onto the pretreated glass substrate to obtain a glass substrate coated with photoresist.

2. A laser direct writing device is used to perform photolithography exposure on a glass substrate coated with photoresist according to a circular aperture array structure to obtain a photolithographically lithographic glass substrate.

3. Spray developer onto the surface of the photolithographically etched glass substrate to dissolve the photoresist in the exposed area, and then wash with water to obtain the developed glass substrate.

4. The developed glass substrate is heated to 100~110℃ and baked to obtain the hardened glass substrate.

5. Microwave plasma chemical vapor deposition is used to etch a circular hole array structure on the hardened glass substrate. The hardened glass substrate is placed in the reaction chamber, the vacuum pump is turned on, the vacuum is drawn and the hydrogen valve is opened, the hydrogen flow rate is controlled at 110~200 sccm, the gas pressure in the reaction chamber is 50~70 Torr, and plasma etching is performed to obtain a glass substrate with a micropore array structure. The diameter of the circular holes in the micropore array structure is 50-130 μm, the spacing between the circular holes is 3~10 μm, and the depth of the circular holes is 1~4 μm. VI. A SiO2 particle layer is deposited on the surface of a glass substrate with a microporous array structure using a nano-SiO2 particle dispersion solution via dip-coating method. After heating and curing, a glass substrate with a SiO2 particle layer is obtained.

7. A PTFE film is deposited on the surface of a glass substrate with a SiO2 particle layer using a reactive DC magnetron sputtering process, and after annealing, a highly wear-resistant transparent hydrophobic glass surface is obtained.

2. The method for preparing a highly wear-resistant transparent hydrophobic glass surface according to claim 1, characterized in that... In step one, the diameter of the glass substrate is 2 to 8 inches.

3. The method for preparing a highly wear-resistant transparent hydrophobic glass surface according to claim 1, characterized in that... The drying temperature described in step one is 80°C.

4. The method for preparing a highly wear-resistant transparent hydrophobic glass surface according to claim 1, characterized in that... The baking time in step four is 3 to 6 minutes.

5. The method for preparing a highly wear-resistant transparent hydrophobic glass surface according to claim 1, characterized in that... In step five, the microwave source power is controlled to be 1200~2800W during the microwave plasma chemical vapor deposition process.

6. The method for preparing a highly wear-resistant transparent hydrophobic glass surface according to claim 1, characterized in that... In step five, the diameter of the circular holes in the micropore array structure is 50~130μm, the spacing between the circular holes is 4~6μm, and the depth of the circular holes is 2μm.

7. The method for preparing a highly wear-resistant transparent hydrophobic glass surface according to claim 1, characterized in that... In step six, the particle size of the nano-SiO2 particles in the nano-SiO2 particle dispersion is 10~150nm, and the mass percentage of nano-SiO2 particles is 10%~20%.

8. The method for preparing a highly wear-resistant transparent hydrophobic glass surface according to claim 1, characterized in that... Step six: Control the lifting speed in the lifting immersion method to 2.5 cm / s.

9. The method for preparing a highly wear-resistant transparent hydrophobic glass surface according to claim 1, characterized in that... In step six, the heating and curing temperature is 80℃, and the curing time is 1 hour.

10. The method for preparing a highly wear-resistant transparent hydrophobic glass surface according to claim 1, characterized in that... In step seven, the thickness of the deposited PTFE film is 8~30nm.

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