A target material sputtering angle control device for pet copper foil manufacturing

Abstract

The application provides a PET copper foil manufacturing target sputtering angle control device, which is used for solving the problems of low target utilization, poor film uniformity, short target service life, complicated replacement, limited process adaptability and limited production efficiency in the prior art. To this end, the application provides a PET copper foil manufacturing target sputtering angle control device, which comprises a sealed working cabin, a pay-off end, a vacuum sputtering cavity, an argon plasma cleaning cavity, an inert gas transition cavity, a horizontal plating section and a winding end, and the cavities are sequentially connected in a head-to-tail mode and are in communication with each other. The vacuum sputtering cavity is provided with a magnetic pole mechanism and a target support adjusting mechanism, wherein the target support adjusting mechanism is used for adjusting the position and sputtering angle of the target, cooperates with the magnetic pole mechanism, dynamically adjusts the target position, optimizes the magnetic field distribution, expands the effective etching area, optimizes the density distribution of the plasma, reduces the waste of edge material, improves the target utilization, and ensures the film uniformity.

Description

TECHNICAL FIELD

[0001] The application relates to the technical field of magnetron sputtering composite copper foil production, and particularly relates to a target sputtering angle control device for PET copper foil production. BACKGROUND

[0002] As an important physical vapor deposition method, the basic principle of the magnetron sputtering technology is that high-energy particles bombard the surface of a target material to make target atoms separate and deposit on the surface of a substrate to form a thin film. The technology is widely used in the fields of semiconductors, display devices, optical coating and new energy materials. In the field of composite copper foil production, the combination of magnetron sputtering and electroplating has become the mainstream technical route. However, the existing technology has significant limitations, resulting in low overall yield.

[0003] The existing magnetron sputtering equipment mainly includes a vertical magnetron sputtering device as described in the invention patent with the publication number CN118516643A. The device discloses a high-voltage magnetron sputtering device for silicon dioxide thin film, and the technical solution is to adjust the distance and angle between the substrate and the target material through the design of a right-angle track groove and an electric telescopic rod driving transmission structure, so as to improve the uniformity and purity of the coating and prevent the thin film from being sputtered too thick. However, the device is aimed at the traditional vertical single magnetron sputtering process, which can only process a single workpiece or substrate at a time, and manual intervention is required for substrate loading and unloading and target replacement in each processing cycle, resulting in low production efficiency. The technical solution and processing method cannot meet the continuous processing needs of the coil material, and there are inherent defects in the target utilization rate and process adaptability, which are specifically manifested as follows:

[0004] 1. Fixed sputtering angle of traditional planar target: The existing technology mainly uses fixed-angle planar target design, and copper atoms are deposited in the non-coating area, resulting in serious material waste. This fixed geometric configuration cannot adapt to the changing needs of different substrate shapes and sizes, resulting in low resource utilization.

[0005] 2. Short target life and complicated replacement operation, affecting production progress: The average service life of the existing target is only about 200 hours, and the target replacement operation is complicated. Each time the target is replaced, the process balance needs to be re-established, increasing the production downtime.

[0006] 3. Poor uniformity of the edge area: The fixed-angle sputtering method and magnetic field distribution result in large thickness uniformity error of the edge area of the thin film, which seriously affects the performance consistency of the product. This non-uniformity will be further amplified in the subsequent electroplating process, ultimately affecting the overall quality of the composite copper foil.

[0007] 4. Limited process adaptability: The traditional target design is difficult to adapt to the coating needs of special-shaped substrates, limiting the application range and development space of the technology.

[0008] 5. Gas cross-contamination problem: Lack of effective isolation measures at the junction of each processing section, leading to mixing of process gases, affecting film purity and quality.

[0009] 6. Limited production efficiency: Most existing magnetron sputtering and water plating integrated devices cannot achieve synchronous coating on both sides, limiting production rhythm and unable to meet large-scale industrialization needs. SUMMARY

[0010] In view of the above-mentioned shortcomings of the prior art, the purpose of the present application is to provide a PET copper foil manufacturing target sputtering angle control device to solve the problems of low target utilization rate, poor coating uniformity, short target life and cumbersome replacement, limited process adaptability, and limited production efficiency in the prior art magnetron sputtering composite copper foil production line.

[0011] To achieve the above-mentioned purposes and other related purposes, the present application provides a PET copper foil manufacturing target sputtering angle control device, which comprises a sealed working cabin, an unwinding end, a vacuum sputtering chamber, an argon plasma cleaning chamber, an inert gas transition chamber, a horizontal plating section, and a winding end. The unwinding end, vacuum sputtering chamber, argon plasma cleaning chamber, inert gas transition chamber, horizontal plating section, and winding end are arranged in order from left to right and connected end to end, and are in communication with each other. The outside of the unwinding end and the vacuum sputtering chamber is provided with a sealed working cabin.

[0012] The sealed working cabin is used to isolate the external environment and provide a dustproof and oxidation-resistant environment for PET film input and reversing transmission.

[0013] The unwinding end is used to output uncoated PET film and to reverse the PET film that has only one side coated, and output it to the vacuum sputtering chamber.

[0014] The vacuum sputtering chamber is used to deposit metal on the surface of the PET film through magnetron sputtering to form a conductive layer.

[0015] The argon plasma cleaning chamber is used to bombard the PET film surface deposition layer with high-energy ions to remove impurities on the film surface, increase the roughness of the film surface, and activate the surface molecular structure through active radicals generated by argon ionization.

[0016] The inert gas transition chamber is used to maintain an inert environment in the chamber and balance the pressure difference between the front and rear chambers by using inert gas.

[0017] The horizontal plating section is used to thicken and homogenize the metal layer on the surface of the PET film through water plating.

[0018] The winding end is used for winding the PET film cloth with double-side film covering completed and reversing the PET film cloth with one-side film covering completed and outputting to the unwinding end.

[0019] The vacuum sputtering cavity comprises a vacuum chamber, film cloth conveying grooves, a rotary sealing cover plate and an isolation plate. The right end of the unwinding end is fixedly connected with the vacuum chamber. Two film cloth conveying grooves are arranged in the left wall and the right wall of the vacuum chamber, and the positions of the film cloth conveying grooves in the left wall and the right wall are horizontally corresponding. The rotary sealing cover plate is installed on the top of the vacuum chamber. The isolation plate is installed in the middle of the vacuum chamber. Gas transition boxes are installed on the inner and outer sides of the film cloth conveying grooves of the vacuum sputtering cavity, and the gas transition boxes are also installed on the inner and outer sides of the communication grooves of the argon plasma cleaning cavity, the inert gas transition cavity and the horizontal plating section. A group of magnetic pole mechanisms are installed on the bottom and the top of the vacuum chamber. Four groups of target material supporting and adjusting mechanisms are arranged in the vacuum chamber, two of which are arranged above the isolation plate and below the upper group of magnetic pole mechanisms, and the other two are arranged below the isolation plate and above the lower group of magnetic pole mechanisms.

[0020] The gas transition box is used for limiting the gas flow between grooves when the film cloth is continuously conveyed in each processing section, avoiding direct mixing of the gas between grooves, and realizing gradual transition of gas pressure.

[0021] The magnetic pole mechanism is used for adjusting the distance between magnets and dynamically optimizing the magnetic field distribution.

[0022] The target material supporting and adjusting mechanism is used for adjusting the position and sputtering angle of the target material, dynamically adjusting the position of the target material, expanding the effective etching area, optimizing the density distribution of the plasma, and controlling the sputtering structure affecting the PET film cloth.

[0023] Optionally, the unwinding end comprises an unwinding roller, unwinding lifting tensioning rollers and unwinding guide rollers. The unwinding roller is rotatably installed on the left part of the machine case of the unwinding end. Six unwinding lifting tensioning rollers are vertically slidably installed on the right part of the machine frame of the unwinding end. Four unwinding guide rollers are rotatably installed on the left part of the machine case of the unwinding end. An input transition rack is arranged at the connection between the unwinding end and the vacuum sputtering cavity. Unwinding guide rollers are also arranged in the input transition rack.

[0024] Optionally, the winding end comprises a winding roller, winding lifting tensioning rollers and winding guide rollers, a winding roller is rotatably installed on the right part of the machine case of the winding end, three winding lifting tensioning rollers are vertically slidably installed on the left part of the machine frame of the winding end, three winding guide rollers are rotatably installed on the right part of the machine case of the winding end, and an output transition machine frame is arranged at the connection between the horizontal electroplating section and the winding end, and a winding guide roller is also arranged in the output transition machine frame, the PET film is unwound from the unwinding roller, and is wound by the winding roller through the outer walls of the unwinding lifting tensioning rollers, unwinding guide rollers, winding lifting tensioning rollers and winding guide rollers.

[0025] Optionally, the gas transition box comprises a transition box body, a transition conveying port, a fixed partition plate, a mounting sliding seat and a sealing rubber roller, the left wall and the right wall of the transition box body are both provided with a transition conveying port, the front part and the rear part of the transition box body are both provided with a fixed partition plate, the left part and the right part of the two fixed partition plates are both slidably provided with a mounting sliding seat, the positions of the front mounting sliding seat and the rear mounting sliding seat are vertically corresponding, the two mounting sliding seats vertically corresponding in front and back positions form a pair, the upper part and the lower part between the two mounting sliding seats of each pair are rotatably provided with a sealing rubber roller, the adjacent two sealing rubber rollers are rotatably tangent, the tangent lines of the two pairs of sealing rubber rollers are both on the same horizontal plane as the horizontal center line of the transition conveying port, the left pair of sealing rubber rollers are rotatably tangent to the inner side of the left wall of the transition box body, and the right pair of sealing rubber rollers are rotatably tangent to the inner side of the right wall of the transition box body.

[0026] Optionally, the gas transition box further comprises a first hexagonal transmission shaft, a sealing transmission pulley, a rotating shaft sleeve, a first driving bevel gear, a first driven bevel gear and a linkage spur gear, the front part of the left wall of the transition box body, the front part of the right wall and the left wall and the right wall of the vacuum chamber are all rotatably provided with a rotating shaft sleeve, which is arranged on the inner side and the outer side of the vacuum chamber and on the same horizontal line, the inner walls of the rotating shaft sleeves of two adjacent transition box bodies on the same horizontal line are both fixedly sleeved with a first hexagonal transmission shaft, the outer ends of the first hexagonal transmission shafts are both fixedly sleeved with a sealing transmission pulley, the outer wall of the first hexagonal transmission shaft is slidably sleeved with four first driving bevel gears, the front end of the lower sealing rubber roller is fixedly sleeved with a first driven bevel gear, and the first driving bevel gears and the first driven bevel gears corresponding in position are in meshing connection, the rear end of the sealing rubber roller is fixedly sleeved with a linkage spur gear, and the two linkage spur gears adjacent in up and down are in meshing connection.

[0027] Optionally, the magnetic pole mechanism comprises a magnetic separation plate, a magnetic yoke and a permanent magnet, the bottom and the top in the vacuum chamber are both fixed with a magnetic separation plate, the lower wall of the front end and the rear end of the magnetic separation plate is fixed with a magnetic yoke, and the inner side of the magnetic separation plate is provided with a plurality of permanent magnets.

[0028] Optionally, the permanent magnets are arranged in parallel outside the rotating target material, four permanent magnets are arranged outside each rotating target material, the diameter of the permanent magnet is one tenth of the rotating target material, the magnetic pole direction of adjacent permanent magnets is N-S alternately arranged, the inner side of the magnetic shield plate is slidably installed with a plurality of sliding blocks matched with the number of permanent magnets, and the permanent magnets are fixed on the sliding blocks.

[0029] Optionally, the target material support adjusting mechanism comprises a fixed base plate, a clamping groove, a universal clamping seat, a lifting guide rail, a lifting guide rail block, a front lifting base plate, a support seat, a second hexagonal transmission shaft, a speed reducer, a front and rear stable tension guide rail, a limiting guide rail block, a rotary power pulley and a power transmission belt, the inner side of the rear wall of the vacuum chamber is installed with a fixed base plate, sixteen clamping grooves are equidistantly arranged on the front wall of the fixed base plate, the universal clamping seat is slidably installed in the clamping groove, two lifting guide rails are installed on the inner side of the front wall of the vacuum chamber, and the positions of the two lifting guide rails correspond to the left and right ends of the fixed base plate respectively, the lifting guide rail block is slidably installed in the lifting guide rail, the front lifting base plate is fixed between the two lifting guide rail blocks, sixteen support seats are equidistantly installed on the front lifting base plate, the second hexagonal transmission shaft is rotatably installed on the upper part of the sixteen support seats, the speed reducer is arranged in the vacuum chamber, two front and rear stable tension guide rails are installed on the inner side of the front wall of the vacuum chamber through a support, the limiting guide rail block is slidably installed in the two front and rear stable tension guide rails, the rotary power pulley is installed on the output end outer wall of the speed reducer and the right end of the second hexagonal transmission shaft between the two limiting guide rail blocks, and the outer wall of the three rotary power pulleys on the same vertical plane is rotatably sleeved with the power transmission belt.

[0030] Optionally, the sealing transmission pulley is kept synchronous with the rotation of the rotary power pulley through the belt transmission mechanism.

[0031] Optionally, the target material support adjusting mechanism further comprises a second driving bevel gear, a second driven bevel gear, a front threaded installation cylinder, a sliding rotating seat, a rotating target material, a rear threaded installation cylinder and a universal ball, the outer wall of the second hexagonal transmission shaft is slidably sleeved with sixteen second driving bevel gears equidistantly, sixteen sliding rotating seats are equidistantly slidably installed in the front lifting base plate, the sliding rotating seat is in the shape of a C-shaped key, the front threaded installation cylinder is rotatably installed in the bottom of the sixteen sliding rotating seats, the second driven bevel gear is fixedly sleeved on the front end outer wall of the front threaded installation cylinder, the second driven bevel gear is correspondingly engaged with the position-matched second driving bevel gear, the rotating target material is threadedly installed on the rear end inner wall of the front threaded installation cylinder, the rear threaded installation cylinder is threadedly installed on the rear end inner wall of the rotating target material, the rear end of the rear threaded installation cylinder is fixed with the universal ball, and the universal ball is multi-degree-of-freedom rotatably installed in the universal clamping seat.

[0032] As described above, the PET copper foil target material sputtering angle control device has at least the following beneficial effects:

[0033] 1. The target material is rotated by the target material support adjustment mechanism to realize dynamic adjustment of the sputtering angle of the target material, increase the effective utilization area of the target material, reduce local over-etching, prolong the service life of the target material, reduce material waste caused by copper atom deposition in non-base film areas, greatly improve the utilization rate of the target material, and reduce material costs.

[0034] 2. The magnetic field control of the magnetic pole mechanism optimizes the density distribution of the plasma, effectively solves the problem of poor thickness uniformity in the edge area of the film caused by the traditional fixed-angle sputtering method, and improves the consistency of product performance.

[0035] 3. The target head inclination angle adjustment of the target material support adjustment mechanism can further improve the utilization rate of the target material, and can control the energy and angle of incident particles, thereby affecting the distribution density of the plasma on the surface of the target material, controlling the compactness of the film layer, and meeting the film coating needs of special-shaped substrates, which is conducive to expanding the application range and development space of magnetron sputtering technology.

[0036] 4. The threaded connection of the target material support adjustment mechanism and the sliding installation of the transmission mechanism simplify the replacement operation of the target material, reduce the target replacement time, improve the overall efficiency of the equipment, and are conducive to efficient production.

[0037] 5. Through the design of the gas transition box, the gas flow between each processing section is limited, the gradual transition of gas pressure is realized, the mutual mixing of process gases is effectively prevented, cross-contamination is prevented, the purity and quality of the film are ensured, and film distortion caused by sudden pressure changes is avoided.

[0038] 6. Through the continuous film cloth transmission path guiding design of the unwinding end and the winding end, a double-sided continuous film coating production transmission system is formed from the unwinding end, the vacuum sputtering cavity, the argon plasma cleaning cavity, the inert gas transition cavity, the horizontal electroplating section, the winding end, and back to the unwinding end, realizing double-sided continuous film coating of PET film cloth, greatly improving production efficiency, and being conducive to meeting large-scale production needs. BRIEF DESCRIPTION OF DRAWINGS

[0039] Figure 1 The front view schematic diagram of the overall structure of the present application is shown.

[0040] Figure 2 The front view schematic diagram of the overall structure of the present application in the state of no sealed work cabin is shown.

[0041] Figure 3 The front view schematic diagram of the PET film cloth in the winding end, the unwinding end and the vacuum sputtering cavity of the present application is shown.

[0042] Figure 4 The southeast view schematic diagram of the overall structure of the vacuum sputtering cavity of the present application is shown.

[0043] Figure 5 Figure 1 shows a perspective view of the vacuum sputtering chamber in the state of the non-rotating sealing cover plate of the present application.

[0044] Figure 6 Figure 2 shows a perspective view of the gas transition box and the target support adjustment mechanism of the present application in the installed position in the vacuum chamber, southeast view.

[0045] Figure 7 Figure 3 shows a front view of the vacuum chamber of the present application.

[0046] Figure 8 Figure 4 shows an enlarged view of the A area structure in the present application. Figure 7

[0047] Figure 9 Figure 5 shows a top view of the gas transition box in the state of the non-capped cover of the present application.

[0048] Figure 10 Figure 6 shows a southeast view of the transmission structure in the gas transition box of the present application.

[0049] Figure 11 Figure 7 shows a left view of the magnetic pole mechanism of the present application.

[0050] Figure 12 Figure 8 shows a southeast view of the target support adjustment mechanism of the present application.

[0051] Figure 13 Figure 9 shows an enlarged view of the B area structure in the present application. Figure 12

[0052] Figure 14 Figure 10 shows a southwest view of the single rotating target transmission structure of the present application.

[0053] Element number explanation

[0054] 1. Sealing work cabin

[0055] 2. Unwinding end; 201, unwinding roller; 202, unwinding lifting tension stabilizing roller; 203, unwinding guide roller

[0056] 3. Vacuum sputtering chamber; 301, vacuum chamber; 302, film cloth conveying groove; 303, rotating sealing cover plate; 304, isolation plate

[0057] 4. Argon plasma cleaning chamber

[0058] 5. Inert gas transition chamber

[0059] 6. Horizontal electroplating section

[0060] 7. Winding end​​

[0061] 8. Gas transition box; 801. Transition box body; 802. Transition transfer port; 803. Fixed partition; 804. Mounting slide; 805. Sealing rubber roller; 806. First hexagonal transmission shaft; 807. Sealing transmission pulley; 808. Rotating shaft sleeve; 809. First driving bevel gear; 810. First driven bevel gear; 811. Linking spur gear;

[0062] 9. Magnetic pole mechanism; 901. Magnetic isolation plate; 902. Magnetic yoke; 903. Permanent magnet; 904. Slider;

[0063] 10. Target material support adjustment mechanism; 101. Fixed base plate; 102. Clamping groove; 103. Universal clamping seat; 104. Lifting guide rail; 105. Lifting guide rail block; 106. Front lifting base plate; 107. Support seat; 108. Second hexagonal transmission shaft; 109. Reducer; 110. Front and rear stable tension guide rail; 111. Limiting guide rail block; 112. Rotating power pulley; 113. Power transmission belt; 114. Second driving bevel gear; 115. Second driven bevel gear; 116. Front threaded mounting cylinder; 117. Sliding rotating seat; 118. Rotating target material; 119. Rear threaded mounting cylinder; 120. Universal ball. DETAILED DESCRIPTION

[0064] The embodiments of the present application will be described in detail by the following specific examples, and other advantages and effects of the present application can be easily understood by those skilled in the art from the contents disclosed in the specification.

[0065] As described in the background, in the field of composite copper foil production, the combination of magnetron sputtering and water plating process has significant limitations, resulting in low overall yield. As disclosed in the patent CN118516643A, a high-pressure magnetron sputtering equipment for silicon dioxide film is disclosed. The technical solution of the equipment is to adjust the distance and angle between the substrate and the target material through the design of the right-angle track groove and the electric telescopic rod driving transmission structure, to improve the uniformity and purity of the coating, and to prevent the thin film from being sputtered too thick. However, this equipment is for traditional vertical single magnetron sputtering process, which can only process a single workpiece or substrate at a time, and manual intervention is required for substrate loading and unloading and target replacement in each processing cycle, resulting in low production efficiency. Its technical solution and processing method cannot meet the continuous processing needs of the coil material, and there are inherent defects in target utilization rate and process adaptability, which are specifically manifested as follows: 1. Fixed sputtering angle of traditional planar target: the existing technology mostly uses fixed-angle planar target design, which causes serious material waste due to copper atom deposition in non-film area. This fixed geometry cannot adapt to the changing needs of different substrate shapes and sizes, resulting in low resource utilization; 2. Short target life and complicated replacement operation, affecting production progress: the average service life of the existing target is only about 200 hours, and the target replacement operation is complicated, and each time the target is replaced, the process balance needs to be re-established, increasing the production downtime; 3. Poor uniformity in edge area: fixed-angle sputtering method and magnetic field distribution result in large thickness uniformity error in the edge area of the film, seriously affecting the performance consistency of the product. This non-uniformity will be further amplified in the subsequent water plating process, ultimately affecting the overall quality of the composite copper foil; 4. Limited process adaptability: traditional target design is difficult to adapt to the film plating needs of special-shaped substrates, limiting the application range and development space of the technology; 5. Gas cross-contamination problem: there is a lack of effective isolation measures at the junction of each processing section, resulting in mutual mixing of process gases, affecting the purity and quality of the film; 6. Limited production efficiency: most existing magnetron sputtering and water plating integrated equipment cannot realize synchronous coating of both sides, and the production rhythm is limited, which cannot meet the large-scale industrialization needs. Example 1

[0066] Please refer to Figures 1-3To solve the problems that the traditional vertical single magnetron sputtering device cannot realize continuous production, cannot perform double-sided synchronous film coating and has low production efficiency, the application provides a PET copper foil manufacturing target sputtering angle control device, which comprises a sealed working cabin 1, an unwinding end 2, a vacuum sputtering cavity 3, an argon plasma cleaning cavity 4, an inert gas transition cavity 5, a horizontal electroplating section 6 and a winding end 7, the unwinding end 2, the vacuum sputtering cavity 3, the argon plasma cleaning cavity 4, the inert gas transition cavity 5, the horizontal electroplating section 6 and the winding end 7 are arranged in sequence from left to right and are sequentially connected end to end and communicated with each other, the outer cover of the unwinding end 2 and the vacuum sputtering cavity 3 is provided with the sealed working cabin 1, the sealed working cabin 1 is used for isolating the external environment and provides a dustproof and anti-oxidation environment for PET film cloth input and reversing transmission, the unwinding end 2 is used for outputting uncoated PET film cloth and reversing the PET film cloth that has only one side coated, and outputting the PET film cloth to the vacuum sputtering cavity 3, the vacuum sputtering cavity 3 is used for depositing metal on the surface of the PET film cloth through magnetron sputtering to form a conductive layer, the argon plasma cleaning cavity 4 is used for removing impurities on the surface of the PET film through high-energy ion bombardment of the PET film surface deposition layer, increasing the roughness of the surface of the PET film, improving the adhesion of the subsequent plating layer, and activating the surface molecular structure through active free radicals generated by argon ionization to enhance the bonding strength of the film layer, the inert gas transition cavity 5 is used for maintaining the inert environment in the cavity through inert gas to prevent the PET film cloth from being oxidized, balance the pressure difference between the front and rear cavities, and avoid deformation or pollution of the film material caused by sudden vacuum change, the horizontal electroplating section 6 is used for thickening and homogenizing the metal layer on the surface of the PET film cloth through water electroplating, and the winding end 7 is used for winding the PET film cloth that has completed double-sided coating and reversing the PET film cloth that has only one side coated and outputting the PET film cloth to the unwinding end 2.

[0067] More perfectly, as shown in Figures 3-7 The vacuum sputtering cavity 3 comprises a vacuum cavity 301, a film cloth conveying groove 302, a rotary sealing cover plate 303 and an isolation plate 304, the right end of the unwinding end 2 is fixedly connected with the vacuum cavity 301, two film cloth conveying grooves 302 are formed in the left wall and the right wall of the vacuum cavity 301, the upper two film cloth conveying grooves 302 and the lower two film cloth conveying grooves 302 provide conveying paths for synchronous processing of two films, and the positions of the left wall film cloth conveying groove 302 and the right wall film cloth conveying groove 302 horizontally correspond to each other, the rotary sealing cover plate 303 is installed on the top of the vacuum cavity 301, and the isolation plate 304 is installed in the middle of the vacuum cavity 301, and the isolation plate 304 can divide the vacuum sputtering cavity 3 into two magnetron processing spaces.

[0068] More perfectly, as shown in Figure 3As shown, the unwinding end 2 includes an unwinding roller 201, unwinding lifting tension roller 202 and unwinding guide roller 203, the unwinding roller 201 is rotatably installed on the left part of the machine frame of the unwinding end 2, six unwinding lifting tension rollers 202 are vertically slidably installed on the right part of the machine frame of the unwinding end 2, the unwinding lifting tension rollers 202 can adjust the film tension by vertical sliding, so that the film unwinding and reversing tension is stable, four unwinding guide rollers 203 are rotatably installed on the left part of the machine frame of the unwinding end 2, which can help the film reversing output, and the input transition machine frame is arranged at the connection between the unwinding end 2 and the vacuum sputtering cavity 3, and the unwinding guide roller 203 is also arranged in the input transition machine frame.

[0069] More perfect, such as Figure 3 As shown, the winding end 7 includes a winding roller 701, a winding lifting tension roller 702 and a winding guide roller 703, the winding roller 701 is rotatably installed on the right part of the machine frame of the winding end 7, three winding lifting tension rollers 702 are vertically slidably installed on the left part of the machine frame of the winding end 7, the winding lifting tension rollers 702 can adjust the film tension by vertical sliding, three winding guide rollers 703 are rotatably installed on the right part of the machine frame of the winding end 7, and the output transition machine frame is arranged at the connection between the horizontal electroplating section 6 and the winding end 7, and the winding guide roller 703 is also arranged in the output transition machine frame, the PET film is unwound from the unwinding roller 201, the film is reversed by the guide roller 703 and the lifting tension roller 702 at the winding end 7, and is wound by the winding roller 701 through the outer wall of the unwinding lifting tension roller 202, the unwinding guide roller 203, the winding lifting tension roller 702 and the winding guide roller 703.

[0070] Specifically, in use, the unwinding roller 201 rotates to the right to output the uncoated PET film cloth, and the PET film cloth first passes between the two unwinding lifting tension rollers 202 in the middle of the right part of the frame of the unwinding end 2, and then enters each processing section of the film coating process, first passes through the film cloth conveying groove 302 at the lower part of the vacuum sputtering cavity 3 to complete the deposition of the first surface metal, then passes through the argon plasma cleaning cavity 4 for surface cleaning treatment and roughening, then passes through the inert gas transition cavity 5 for pressure balance, and then enters the horizontal electroplating section 6 for metal layer thickening, after the single-sided film coating is completed, continues to be output to the right to the winding end 7, so that the film cloth changes direction through the two winding guide rollers 703 in the middle of the right part of the frame of the winding end 7, and is output to the left, passes through the winding lifting tension roller 702 at the lower part of the left part of the frame of the winding end 7, and passes through each processing section of the film coating process from right to left, and returns to the unwinding end 2, changes direction through the unwinding lifting tension roller 202 at the lower part of the right part of the frame of the unwinding end 2 and the four unwinding guide rollers 203 on the left part of the frame, and continues to change the film cloth to be output from left to right, then passes through the three unwinding lifting tension rollers 202 at the upper part of the right part of the frame of the unwinding end 2, enters the film cloth conveying groove 302 at the upper part of the vacuum sputtering cavity 3 to the right for film coating processing of the other surface, and finally reaches the winding end 7, passes through the two winding lifting tension rollers 702 at the upper part of the left part of the frame of the winding end 7 and the winding guide roller 703 on the right part of the frame, and is wound by the winding roller 701. In this way, a double-sided continuous film coating production conveying system is formed from the unwinding end 2, the vacuum sputtering cavity 3, the argon plasma cleaning cavity 4, the inert gas transition cavity 5, the horizontal electroplating section 6, the winding end 7 and back to the unwinding end 2, which realizes double-sided continuous film coating of the PET film cloth through a unique film cloth conveying path, greatly improves the production efficiency, and is conducive to meeting the large-scale production demand. Example 2

[0071] Please refer to Figure 3 and Figures 6-10 To solve the film deformation problem caused by gas cross contamination and pressure sudden change in each process section, the application provides a PET copper foil manufacturing target sputtering angle control device, which further comprises: a gas transition box 8, the gas transition box 8 is installed on the inner and outer sides of the film cloth conveying groove 302 of the vacuum sputtering cavity 3, and the gas transition box 8 is also installed on the inner and outer sides of the communication slots of the argon plasma cleaning cavity 4, the inert gas transition cavity 5 and the horizontal electroplating section 6, the gas transition box 8 is used to limit the gas flow between the grooves when the film cloth is continuously conveyed in each processing section, to avoid direct mixing of the gas between the grooves, and to realize gradual transition of the gas pressure, so as to prevent film cloth deformation caused by pressure sudden change;

[0072] More perfectly, as Figures 6-10As shown, the gas transition box 8 comprises a transition box body 801, a transition conveying port 802, a fixed partition plate 803, a mounting slide 804 and a sealing rubber roller 805. The left wall and the right wall of the transition box body 801 are provided with the transition conveying port 802. The front part and the rear part of the transition box body 801 are provided with the fixed partition plate 803. The left part and the right part of the two fixed partition plates 803 are slidingly provided with the mounting slide 804. The front mounting slide 804 and the rear mounting slide 804 are vertically corresponding. The two mounting slides 804 vertically corresponding in front and back positions form a pair. The upper part and the lower part between the two mounting slides 804 of each pair are rotatably provided with the sealing rubber roller 805. The adjacent two sealing rubber rollers 805 are rotatably tangent. The tangent lines of the two pairs of sealing rubber rollers 805 are on the same horizontal plane of the horizontal center line of the transition conveying port 802. The left pair of sealing rubber rollers 805 is rotatably tangent to the inner side of the left wall of the transition box body 801. The right pair of sealing rubber rollers 805 is rotatably tangent to the inner side of the right wall of the transition box body 801. The adjacent sealing rubber rollers 805 are rotatably tangent to each other and are rotatably extruded with the side wall of the transition box body 801, forming a dynamic sealing barrier, limiting the gas between the included angle formed by the upper and lower sealing rubber rollers 805 and the side wall of the transition box body 801.

[0073] More perfect, as Figures 6-10 As shown, the gas transition box 8 further comprises a first hexagonal transmission shaft 806, a sealing transmission pulley 807, a rotating shaft sleeve 808, a first driving bevel gear 809, a first driven bevel gear 810 and a linkage spur gear 811. The front part of the left wall of the transition box body 801, the front part of the right wall and the left wall and the right wall of the front part of the vacuum chamber 301 are rotatably provided with the rotating shaft sleeve 808. The rotating shaft sleeves 808 are provided on the inner side and the outer side of the vacuum chamber 301 and are on the same horizontal line. The inner walls of the two adjacent rotating shaft sleeves 808 are fixedly sleeved with the first hexagonal transmission shaft 806. The outer ends of the first hexagonal transmission shaft 806 are fixedly sleeved with the sealing transmission pulley 807. The outer wall of the first hexagonal transmission shaft 806 is slidingly sleeved with four first driving bevel gears 809. The front end of the lower sealing rubber roller 805 is fixedly sleeved with the first driven bevel gear 810. The first driving bevel gear 809 and the first driven bevel gear 810 which are corresponding in position are meshingly connected. The rear end of the sealing rubber roller 805 is fixedly sleeved with the linkage spur gear 811. The upper and lower adjacent two linkage spur gears 811 are meshingly connected, which can ensure that each pair of sealing rubber rollers 805 rotates synchronously and reversely with consistent speed, conveying the film cloth. The first hexagonal transmission shaft 806 is kept synchronous with the rotating power pulley 112 through the sealing transmission pulley 807, matching the gas isolation with the film cloth conveying speed.

[0074] Specifically, in use, when the PET film cloth transitions between the two processing cavities, the PET film cloth enters the transition box 801 through the transition conveying port 802, the front and rear two pairs of sealing rubber rollers 805 form sealing contact on the upper and lower surfaces of the film cloth, the adjacent sealing rubber rollers 805 are tangent to each other and are pressed against the side wall of the transition box 801, forming a dynamic sealing barrier, limiting the gas between the two sealing rubber rollers 805 and the side wall of the transition box 801, and at the same time, through the meshing transmission of the first driving bevel gear 809 and the first driven bevel gear 810 and the linkage synchronization of the linkage spur gear 811, the synchronous reverse rotation of each pair of sealing rubber rollers 805 is ensured, the rotation speed is consistent, the film cloth is conveyed, and the first hexagonal transmission shaft 806 is kept synchronous with the rotary power pulley 112 through the sealing transmission belt wheel 807, so that the gas isolation and the film cloth conveying speed are matched, thereby reducing the gas cross contamination of the film cloth during conveying in each processing section, ensuring the sputtering film coating effect of the vacuum sputtering cavity 3, and preventing the mixing and consumption of a large amount of gas in the argon plasma cleaning cavity 4 and the inert gas transition cavity 5, ensuring the processing effect and quality of the film coating, and realizing the gradual transition of the gas pressure, preventing the deformation of the film cloth caused by the excessive pressure difference between the vacuum cavity 301 and other cavities. Example 3

[0075] Please refer to Figure 3 , Figures 5-7 and Figures 11-14 , to solve the "runway effect" and uneven sputtering caused by the traditional fixed magnetic field, and the waste of target material and the complicated disassembly of the traditional fixed-angle sputtering of the planar target material, the application provides a PET copper foil manufacturing target sputtering angle control device, which also includes: a magnetic pole mechanism 9 and a target support adjusting mechanism 10, a group of magnetic pole mechanisms 9 are installed on the bottom and top of the vacuum chamber 301, four groups of target support adjusting mechanisms 10 are arranged in the vacuum chamber 301, two groups of target support adjusting mechanisms 10 are arranged above the isolation plate 304 and below the upper group of magnetic pole mechanisms 9, and the other two groups of target support adjusting mechanisms 10 are arranged below the isolation plate 304 and above the lower group of magnetic pole mechanisms 9, the magnetic pole mechanism 9 is used to adjust the distance between the magnets, dynamically optimize the magnetic field distribution, avoid local over-etching caused by "runway effect", and improve the uniformity of target sputtering, the target support adjusting mechanism 10 is used to adjust the position and sputtering angle of the target, and cooperates with the magnetic pole mechanism 9 to dynamically adjust the position of the target, expand the effective etching area, reduce the waste of edge material, improve the utilization rate of the target, optimize the density distribution of the plasma through the linkage of the angle and the magnetic field, control the sputtering structure affecting the PET film cloth, improve the deposition rate and film layer density, and meet the differentiated film coating needs in different fields.

[0076] More perfect, such as Figure 11As shown in the drawings, the magnetic pole mechanism 9 comprises a magnetic shield plate 901, a magnetic yoke 902 and permanent magnets 903, the magnetic shield plate 901 is fixed on the bottom and top of the vacuum chamber 301, the magnetic shield plate 901 can prevent the magnetic field from leaking, the magnetic yoke 902 is fixed on the front end and rear end of the lower wall of the magnetic shield plate 901, the magnetic yoke 902 can enhance the magnetic field strength, the inside of the magnetic shield plate 901 is provided with a plurality of permanent magnets 903, the permanent magnets 903 generate a magnetic field to constrain the movement of electrons.

[0077] More perfect, as shown in Figure 5 , Figure 7 and Figure 11 , the permanent magnets 903 are arranged in parallel outside the rotating target material 118, four permanent magnets 903 are arranged outside each rotating target material 118, the diameter of the permanent magnet 903 is one tenth of the rotating target material 118, so that the permanent magnet 903 can form a strong enough magnetic field to effectively constrain the electrons, but will not limit the movement of the electrons too much, the magnetic pole direction of the adjacent permanent magnets 903 is N-S alternately arranged, the arrangement of N-S alternately arranged can effectively bind the electron movement path, prolong the residence time of the electrons on the surface of the target material, the inside surface of the magnetic shield plate 901 is slidingly installed with a plurality of sliding blocks 904 matched with the number of the permanent magnets 903, and the permanent magnets 903 are fixed on the sliding blocks 904, by controlling the movement of the position of the sliding block 904, the distance between the permanent magnets 903 can be dynamically adjusted to change the relative distance between the permanent magnets 903 and the rotating target material 118, and the magnetic field distribution is dynamically optimized.

[0078] More perfect, as shown in Figures 6-7 and Figures 12-14As shown, the target material support adjusting mechanism 10 comprises a fixed base plate 101, a clamping groove 102, a universal clamping seat 103, a lifting guide rail 104, a lifting guide rail block 105, a front lifting base plate 106, a support seat 107, a second hexagonal transmission shaft 108, a speed reducer 109, front and rear stable tension guide rails 110, a limiting guide rail block 111, a rotary power pulley 112 and a power transmission belt 113, the fixed base plate 101 is installed on the inner side of the rear wall of the vacuum chamber 301, sixteen clamping grooves 102 are equidistantly arranged on the front wall of the fixed base plate 101, the universal clamping seat 103 is slidingly installed in the clamping groove 102, two lifting guide rails 104 are installed on the inner side of the front wall of the vacuum chamber 301, and the positions of the two lifting guide rails 104 correspond to the left and right ends of the fixed base plate 101 respectively, the lifting guide rail block 105 is slidingly installed in the lifting guide rail 104, the front lifting base plate 106 is fixed between the two lifting guide rail blocks 105, the overall height of the front lifting base plate 106 can be adjusted by controlling the sliding of the lifting guide rail block 105 in the lifting guide rail 104, sixteen support seats 107 are equidistantly installed on the front lifting base plate 106, the second hexagonal transmission shaft 108 is rotatably installed on the upper part of the sixteen support seats 107, the speed reducer 109 is arranged in the vacuum chamber 301, two front and rear stable tension guide rails 110 are installed on the inner side of the front wall of the vacuum chamber 301 through supports, the limiting guide rail block 111 is slidingly installed in each of the two front and rear stable tension guide rails 110, the rotary power pulley 112 is installed on the outer wall of the output end of the speed reducer 109 and the right end of the second hexagonal transmission shaft 108, the three rotary power pulleys 112 located on the same vertical plane are rotatably sleeved with the power transmission belt 113, the position of the middle rotary power pulley 112 can be adjusted by controlling the forward and backward sliding of the limiting guide rail block 111 in the front and rear stable tension guide rails 110, so as to adapt to the tension change of the power transmission belt 113 and prevent the belt transmission from failing, the sealing transmission pulley 807 rotates synchronously with the rotary power pulley 112 through the belt transmission mechanism, so that the gas isolation matches the membrane cloth conveying speed.

[0079] More perfect, such as Figure 6 And Figures 12-14As shown, the target support adjusting mechanism 10 further comprises a second driving bevel gear 114, a second driven bevel gear 115, a front threaded mounting cylinder 116, a sliding rotating seat 117, a rotating target 118, a rear threaded mounting cylinder 119 and a universal ball 120, the outer wall of the second hexagonal transmission shaft 108 is equidistantly sleeved with sixteen second driving bevel gears 114, the front lifting base plate 106 is equidistantly sleeved with sixteen sliding rotating seats 117, and the sliding rotating seats 117 are in the shape of C-shaped keys, the bottom of the sixteen sliding rotating seats 117 is rotatably installed with the front threaded mounting cylinder 116, the front end of the outer wall of the front threaded mounting cylinder 116 is fixedly sleeved with the second driven bevel gear 115, and the second driven bevel gear 115 is correspondingly meshed and connected with the second driving bevel gear 114 matched in position, the rear end of the inner wall of the front threaded mounting cylinder 116 is threadedly installed with the rotating target 118, the second driving bevel gear 114 on the second hexagonal transmission shaft 108 is meshed with the second driven bevel gear 115 on the front threaded mounting cylinder 116, so as to drive the front threaded mounting cylinder 116 to rotate, since the rotating target 118 is threadedly installed in the front threaded mounting cylinder 116, the rotation of the front threaded mounting cylinder 116 drives the rotating target 118 to rotate in linkage, so that the target surface is uniformly exposed in the bombardment area of the plasma, and the utilization rate of the target is improved, the rear end of the inner wall of the rotating target 118 is threadedly installed with the rear threaded mounting cylinder 119, which is threadedly installed, so as to facilitate the disassembly and replacement of the rotating target 118, the rear end of the rear threaded mounting cylinder 119 is fixedly installed with the universal ball 120, and the universal ball 120 is rotatably installed in the universal clamp seat 103 in multiple degrees of freedom, so that the universal ball 120 can move in cooperation with the rotating target 118.

[0080] Specifically, in use, by controlling the movement of the slider 904 position, the distance between the permanent magnets 903 can be dynamically adjusted to change the relative distance between the permanent magnets 903 and the rotating target 118, dynamically optimize the magnetic field distribution, the permanent magnets 903 arranged alternately in N-S poles generate a gradient magnetic field, control the plasma distribution range, for example, when the rotating target 118 rotates at a speed of 5-30 rpm, the changing magnetic field gradient is 50-200 Gauss, which indirectly adjusts the effective sputtering angle range, avoids the "runway effect" caused by excessive concentration of plasma, improves the sputtering uniformity, the magnetic yoke 902 can enhance the magnetic field strength, the magnetic shielding plate 901 prevents the magnetic field from leaking, and the isolation plate 304 divides the vacuum chamber 301 into two independent magnetron sputtering spaces, prevents the upper and lower magnetic fields from affecting each other, and ensures the sputtering film effect;

[0081] Meanwhile, the rotation of the power transmission belt 113 is driven by the rotation of the upper rotary power pulley 112 driven by the speed reducer 109, and the second hexagonal transmission shaft 108 is driven to rotate, and the second driving bevel gear 114 on the second hexagonal transmission shaft 108 meshes with the second driven bevel gear 115 on the front threaded mounting cylinder 116, thereby driving the front threaded mounting cylinder 116 to rotate. Since the rotating target material 118 is threaded into the front threaded mounting cylinder 116, the rotation of the front threaded mounting cylinder 116 drives the rotating target material 118 to rotate. The rotation of the rotating target material 118 can uniformly expose the surface of the target material to the bombardment area of the plasma, improve the utilization rate of the target material, and compensate for the unevenness of the distribution during the magnetic field adjustment process, stabilize the sputtering deposition rate, prevent the formation of deep grooves in the fixed position of the PET film cloth during sputtering, and make the surface of the PET film cloth sputter evenly.

[0082] In addition, by controlling the sliding of the lifting guide rail block 105 in the lifting guide rail 104, the overall height of the front lifting base plate 106 can be adjusted, thereby adjusting the target head inclination angle of the rotating target material 118. During the adjustment process, the tension of the power transmission belt 113 will change regardless of the upward or downward movement of the upper rotary power pulley 112. At this time, by controlling the sliding of the limiting guide rail block 111 in the front and rear tension guide rail 110, the position of the middle rotary power pulley 112 can be adjusted to adapt to the change of the tension of the power transmission belt 113, prevent the second hexagonal transmission shaft 108 from stopping due to the failure of the belt transmission, and make the target head inclination angle of the rotating target material 118 during the adjustment process. The target material can still rotate. The universal ball 120 can cooperate with the movement of the rotating target material 118 to rotate in the universal clamp seat 103 with multiple degrees of freedom. In this way, the utilization rate of the target material is further improved, and the energy and angle of the incident particles can be controlled by adjusting the inclination angle of the target material, thereby affecting the distribution density of the plasma on the surface of the target material, controlling the compactness of the film layer, and meeting the film coating needs of special-shaped substrates. It is beneficial to expand the application range and development space of magnetron sputtering technology.

[0083] Finally, the threaded connection of the rotating target material 118 with the front threaded mounting cylinder 116 and the rear threaded mounting cylinder 119, as well as the sliding installation of the sliding seat 117 and the front lifting base plate 106, and the sliding installation of the universal clamp seat 103 and the clamp groove 102, all facilitate the disassembly and replacement of the rotating target material 118 when it needs to be replaced. Workers can either rotate the rotating target material 118 by fixing the front threaded mounting cylinder 116 or the rear threaded mounting cylinder 119 to disassemble and replace a single target material, or slide out the sliding seat 117 and the universal clamp seat 103 together to disassemble and replace the target material. The operation is simple, which can reduce the time of production interruption and avoid affecting the production progress.

[0084] It should be pointed out finally that the above embodiments are only used to illustrate the technical solutions of the present application, but not to limit the same; although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that the technical solutions recorded in the foregoing embodiments can still be modified, or some technical features therein can be replaced equivalently; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the spirit and scope of the technical solutions of the embodiments of the present application.

Claims

1. A PET copper foil manufacturing target material sputtering angle control device, characterized by, The utility model relates to a kind of PET film production line, including: sealed work cabin (1), unwinding end (2), vacuum sputtering chamber (3), argon plasma cleaning cavity (4), inert gas transition cavity (5), horizontal electroplating section (6) and winding end (7), the unwinding end (2), vacuum sputtering chamber (3), argon plasma cleaning cavity (4), inert gas transition cavity (5), horizontal electroplating section (6) and winding end (7) are sequentially arranged from left to right, and sequentially head-to-tail, intercommunication, the outer cover of the unwinding end (2) and vacuum sputtering chamber (3) is equipped with sealed work cabin (1); Wherein, the sealed work cabin (1) is used to isolate external environment, and provides a dustproof and anti-oxidation environment for PET film cloth input and reversing transmission; Wherein, the unwinding end (2) is used to output uncoated PET film cloth, and to change the surface of PET film cloth which has only one side coated, and output to vacuum sputtering chamber (3); Wherein, the vacuum sputtering chamber (3) is used to deposit metal on the surface of PET film cloth by magnetron sputtering, to form conductive layer; Wherein, the argon plasma cleaning cavity (4) is used to clean the impurities on the surface of PET film by high-energy ion bombardment, to increase the roughness of the surface of PET film, and to activate the surface molecular structure by active free radicals generated by argon ionization; Wherein, the inert gas transition cavity (5) is used to maintain inert environment in the cavity by inert gas, and to balance the pressure difference between the front and rear cavities; Wherein, the horizontal electroplating section (6) is used to thicken and homogenize the metal layer on the surface of PET film by water electroplating; Wherein, the winding end (7) is used to wind PET film cloth which has completed double-sided coating, and to change the direction of PET film cloth which has only one side coated, and output to unwinding end (2); The vacuum sputtering chamber (3) includes vacuum chamber (301), film cloth conveying groove (302), rotary sealing cover plate (303) and isolation plate (304), the right end of the unwinding end (2) is fixedly connected with the vacuum chamber (301), the left wall and the right wall of the vacuum chamber (301) are both provided with two film cloth conveying grooves (302), and the positions of the left wall film cloth conveying groove (302) and the right wall film cloth conveying groove (302) horizontally correspond, the top of the vacuum chamber (301) is installed with the rotary sealing cover plate (303), the middle part of the vacuum chamber (301) is installed with the isolation plate (304), the inner and outer sides of the film cloth conveying groove (302) of the vacuum sputtering chamber (3) are both installed with gas transition box (8), and the inner and outer sides of the connecting grooves of the argon plasma cleaning cavity (4), the inert gas transition cavity (5) and the horizontal electroplating section (6) are also both installed with gas transition box (8), the bottom and the top in the vacuum chamber (301) are both installed with a group of magnetic pole mechanisms (9), four groups of target material support adjusting mechanisms (10) are arranged in the vacuum chamber (301), two groups of target material support adjusting mechanisms (10) are arranged above the isolation plate (304) and below the upper group of magnetic pole mechanisms (9), and the other two groups of target material support adjusting mechanisms (10) are arranged below the isolation plate (304) and above the lower group of magnetic pole mechanisms (9). ​ The gas transition box (8) is used for limiting the gas flow between the tanks when the film is continuously conveyed in each processing section, avoiding direct mixing of the gas between the tanks, and realizing gradual transition of the gas pressure. The magnetic pole mechanism (9) is used for adjusting the distance between the magnets and dynamically optimizing the magnetic field distribution. The target support adjustment mechanism (10) is used for adjusting the position and sputtering angle of the target material, cooperates with the magnetic pole mechanism (9), dynamically adjusts the target material position, expands the effective etching area, optimizes the density distribution of the plasma, and controls the sputtering structure affecting the PET film. The gas transition box (8) includes a transition box body (801), a transition conveying port (802), a fixed partition plate (803), a mounting sliding seat (804), a sealing rubber roller (805), a first hexagonal transmission shaft (806), a sealing transmission belt wheel (807), a rotating shaft sleeve (808), a first driving bevel gear (809), a first driven bevel gear (810), and a linkage spur gear (811). The left wall and the right wall of the transition box body (801) are both provided with the transition conveying port (802). The front and rear parts of the transition box body (801) are both provided with the fixed partition plate (803). The left part and the right part of the two fixed partition plates (803) are both provided with the mounting sliding seat (804). The front mounting sliding seat (804) and the rear mounting sliding seat (804) are vertically corresponding. The two mounting sliding seats (804) are a pair of vertically corresponding mounting sliding seats (804). The upper part and the lower part between the two mounting sliding seats (804) are both provided with the sealing rubber roller (805). The adjacent two sealing rubber rollers (805) are rotationally tangent. The tangent lines of the two pairs of sealing rubber rollers (805) are on the same horizontal plane as the horizontal center line of the transition conveying port (802). The left pair of sealing rubber rollers (805) are rotationally tangent to the left wall of the transition box body (801). The right pair of sealing rubber rollers (805) are rotationally tangent to the right wall of the transition box body (801). The left wall front part of the transition box body (801), the right wall front part of the transition box body (801), and the left wall and the right wall front part of the vacuum chamber (301) are all provided with the rotating shaft sleeve (808). The rotating shaft sleeves (808) are provided on the inner side and the outer side of the vacuum chamber (301) and on the same horizontal line. The inner walls of the rotating shaft sleeves (808) of two adjacent transition box bodies (801) are both fixedly sleeved with the first hexagonal transmission shaft (806). The outer ends of the first hexagonal transmission shaft (806) are both fixedly sleeved with the sealing transmission belt wheel (807). The outer wall of the first hexagonal transmission shaft (806) is slidably sleeved with the four first driving bevel gears (809). The front end of the lower sealing rubber roller (805) is fixedly sleeved with the first driven bevel gear (810). The first driving bevel gear (809) and the first driven bevel gear (810) are in meshing connection. The rear end of the sealing rubber roller (805) is fixedly sleeved with the linkage spur gear (811). The upper and lower adjacent linkage spur gears (811) are in meshing connection.

2. The PET copper foil manufacturing target sputtering angle control apparatus according to claim 1, characterized by: The unwinding end (2) comprises an unwinding roller (201), unwinding lifting tensioning rollers (202) and unwinding guide rollers (203), the left part of the machine case of the unwinding end (2) is rotatably provided with the unwinding roller (201), the right part of the machine frame of the unwinding end (2) is vertically slidably provided with six unwinding lifting tensioning rollers (202), the left part of the machine case of the unwinding end (2) is rotatably provided with four unwinding guide rollers (203), and the connecting part of the unwinding end (2) and the vacuum sputtering cavity (3) is provided with an input transition machine frame, and the input transition machine frame is also provided with unwinding guide rollers (203).

3. The PET copper foil manufacturing target sputtering angle control apparatus according to claim 2, characterized by: The winding end (7) comprises a winding roller (701), winding lifting tensioning rollers (702) and winding guide rollers (703), the right part of the machine case of the winding end (7) is rotatably provided with a winding roller (701), the left part of the machine frame of the winding end (7) is vertically slidably provided with three winding lifting tensioning rollers (702), the right part of the machine case of the winding end (7) is rotatably provided with three winding guide rollers (703), and the connecting part of the horizontal electroplating section (6) and the winding end (7) is provided with an output transition machine frame, and the output transition machine frame is also provided with winding guide rollers (703), the PET film is unwound from the unwinding roller (201), passes through the outer walls of the unwinding lifting tensioning rollers (202), the unwinding guide rollers (203), the winding lifting tensioning rollers (702) and the winding guide rollers (703), and is wound by the winding roller (701).

4. The PET copper foil manufacturing target sputtering angle control apparatus according to claim 3, characterized by: The magnetic pole mechanism (9) comprises a magnetic separation plate (901), a magnetic yoke (902) and a permanent magnet (903), the bottom and the top of the vacuum cavity (301) are fixedly provided with the magnetic separation plate (901), the front end and the rear end of the lower wall of the magnetic separation plate (901) are fixedly provided with the magnetic yoke (902), and the inner side of the magnetic separation plate (901) is provided with a plurality of permanent magnets (903).

5. The PET copper foil manufacturing target sputtering angle control apparatus according to claim 4, characterized by: The permanent magnets (903) are arranged outside the rotating target material (118) in parallel, four permanent magnets (903) are arranged outside each rotating target material (118), the diameter of the permanent magnet (903) is one tenth of the rotating target material (118), the magnetic pole directions of adjacent permanent magnets (903) are alternately arranged in N-S directions, a plurality of sliding blocks (904) matched with the number of the permanent magnets (903) are slidably arranged on the inner side of the magnetic separation plate (901), and the permanent magnets (903) are fixed on the sliding blocks (904).

6. The PET copper foil manufacturing target sputtering angle control apparatus according to claim 5, characterized by: The target material support adjusting mechanism (10) comprises a fixing base plate (101), clamping grooves (102), universal clamping seats (103), lifting guide rails (104), lifting guide rail blocks (105), a front lifting base plate (106), support seats (107), second hexagonal transmission shafts (108), speed reducers (109), front and rear stable tension guide rails (110), limiting guide rail blocks (111), rotary power pulleys (112) and power transmission belts (113), the inner side of the rear wall of the vacuum chamber (301) is provided with the fixing base plate (101), sixteen clamping grooves (102) are equidistantly formed in the front wall of the fixing base plate (101), the universal clamping seats (103) are slidably installed in the clamping grooves (102), two lifting guide rails (104) are installed in the inner side of the front wall of the vacuum chamber (301), and the positions of the two lifting guide rails (104) correspond to the left and right ends of the fixing base plate (101) respectively, the lifting guide rail blocks (105) are slidably installed in the lifting guide rails (104), the front lifting base plate (106) is fixed between the two lifting guide rail blocks (105), sixteen support seats (107) are equidistantly installed on the front lifting base plate (106), the second hexagonal transmission shafts (108) are rotatably installed on the upper parts of the sixteen support seats (107), the speed reducers (109) are arranged in the vacuum chamber (301), two front and rear stable tension guide rails (110) are installed on the inner side of the front wall of the vacuum chamber (301) through supports, the limiting guide rail blocks (111) are slidably installed in the two front and rear stable tension guide rails (110), the rotary power pulleys (112) are installed on the outer walls of the three rotary power pulleys (112) located on the same vertical plane and the output end outer wall of the speed reducer (109) and the right end of the second hexagonal transmission shaft (108), and the power transmission belts (113) are rotatably sleeved on the outer walls of the rotary power pulleys (112).

7. The PET copper foil manufacturing target sputtering angle control apparatus according to claim 6, characterized by: The sealing transmission pulley (807) is kept synchronous with the rotation of the rotary power pulley (112) through the belt transmission mechanism.

8. The PET copper foil manufacturing target sputtering angle control apparatus according to claim 6, characterized by: The target support adjusting mechanism (10) further comprises a second driving bevel gear (114), a second driven bevel gear (115), a front threaded mounting cylinder (116), a sliding rotating seat (117), a rotating target material (118), a rear threaded mounting cylinder (119) and a universal ball (120), the outer wall of the second hexagonal transmission shaft (108) is equidistantly sleeved with sixteen second driving bevel gears (114), the front lifting base plate (106) is equidistantly sleeved with sixteen sliding rotating seats (117) inside, the sliding rotating seats (117) are in the shape of C-shaped keys, the bottom of the sixteen sliding rotating seats (117) is rotatably installed with a front threaded mounting cylinder (116) inside, the front end of the outer wall of the front threaded mounting cylinder (116) is fixedly sleeved with a second driven bevel gear (115), the second driven bevel gear (115) is correspondingly engaged with the second driving bevel gear (114) in position, the rear end of the outer wall of the front threaded mounting cylinder (116) is threadedly installed with a rotating target material (118) inside, the rear end of the inner wall of the rotating target material (118) is threadedly installed with a rear threaded mounting cylinder (119), the rear end of the rear threaded mounting cylinder (119) is fixedly installed with a universal ball (120), and the universal ball (120) is multi-degree-of-freedom rotatably installed in the universal clamping seat (103).

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