Processing method of polishing disc for polishing crystal glass

Abstract

The invention relates to a machining method of a polishing disc for crystal glass polishing, and belongs to the technical field of glass polishing. In order to solve the existing problems of poor water resistance and easy generation of scratches, the invention provides a processing method of a polishing disk for crystal glass polishing, the method comprises the following steps: weighing raw materials for processing the polishing disk, the raw materials comprise the following components by weight: 10 parts of cerium oxide polishing powder; 11 to 13 parts of resin; 13-15 parts of sodium sulfate; the resin is selected from one or more of epoxy resin glue, unsaturated polyester resin glue and phenolic resin glue; the preparation method comprises the following steps: uniformly mixing the raw materials to form a pasty mixture, adding the pasty mixture into a polishing disk mold, and performing high-pressure compression molding under the condition that the processing temperature is controlled to be 80-90 DEG C to form the polishing disk; the pressure of high-pressure compression molding is controlled to be 15 MPa or above. The water-resistant polishing disk has the advantage of good water resistance, does not have the defect of dissolving in water, can form a high-density polishing disk, and prolongs the service life of the polishing disk.

Description

Technical Field

[0001] This invention relates to a processing method for a polishing disc used for polishing crystal glass, belonging to the field of glass polishing technology. Background Technology

[0002] Crystal glass processing includes two steps: grinding and polishing. Polishing is achieved by using a polishing pad on the crystal glass. However, polishing pads typically use soft abrasives with small particle sizes, whose hardness cannot exceed that of the workpiece. For example, using a rare-earth polishing pad made of cerium oxide or other rare-earth polishing powder would result in scratches on the workpiece during relative movement if high-hardness abrasives were used, making polishing impossible. Existing polishing pads mainly use cerium oxide-containing pads, with cerium oxide content exceeding 60%. However, the traditional method involves directly placing the mixed gel into a mold and compacting it under low pressure at room temperature. This type of polishing pad for crystal glass has the following drawbacks: it is easily dissolved in water after use, requiring auxiliary materials for polishing; the polishing process is prone to scratches or insufficient transparency; and the loose structure of ordinary polishing pads leads to insufficient lifespan. Summary of the Invention

[0003] To address the problems existing in the prior art, this invention provides a processing method for a polishing disc used for polishing crystal glass, solving the problem of how to achieve good water resistance and prevent scratches from appearing on the product.

[0004] The objective of this invention is achieved through the following technical solution: a method for processing a polishing disc for polishing crystal glass, characterized in that the method includes the following steps:

[0005] A. Weigh the raw material used for processing the polishing disc, wherein the raw material comprises the following components in parts by weight:

[0006] Cerium oxide polishing powder: 10; resin: 11-13; sodium sulfate: 13-15; the resin is selected from one or more of epoxy resin, unsaturated polyester resin and phenolic resin.

[0007] B. Mix the raw materials evenly to form a slurry mixture, add it to the polishing disc mold, and then press it under high pressure at a processing temperature of 80℃~90℃ to form a polishing disc; the pressure of the high-pressure pressing is controlled above 15MPa.

[0008] By using cerium oxide polishing powder and sodium sulfate as raw materials for the polishing pad, and mixing them with resin to form a slurry, the mixture is placed into a polishing pad mold. Under high temperature conditions of 80℃~90℃ and high pressure pressing controlled at 15MPa or higher (equivalent to a pressure of 150kg or higher), the sodium sulfate (effective component equivalent to sodium oxide) in the raw materials undergoes a high-temperature solid-phase reaction with cerium oxide, forming a sodium-containing cerate compound, sodium-cerium composite oxide, rather than a simple mixture of sodium sulfate and cerium oxide. Furthermore, the high-pressure pressing results in a highly dense polishing pad, preventing looseness and giving it excellent water resistance and a dense structure, preventing dissolution in water and thus extending its service life. More importantly, the high-pressure control of this invention, combined with the high-temperature conditions, effectively enables the formation of a high-temperature solid-phase reaction to form the sodium-containing cerate compound, sodium-cerium composite oxide. Simultaneously, the polishing pad formed under high temperature and high pressure has a smooth surface, preventing scratches during crystal glass processing and ensuring product quality.

[0009] In the above-mentioned processing method for polishing discs used for polishing crystal glass, preferably, the high-pressure pressing pressure is controlled at 16MPa to 20MPa. By employing ultra-high pressing pressure, not only can the high-temperature solid-phase reaction be more effectively promoted, but a dense structure can also be formed, better preventing loosening. This pressing pressure differs from the ordinary compaction process using around 1.5MPa. This is because it facilitates the high-temperature solid-phase reaction at 80℃ to 90℃, effectively forming sodium-containing cerium salt compounds (sodium-cerium composite oxides), rather than a conventional chemical reaction or physical mixing process.

[0010] In the above-described processing method for polishing discs used for polishing crystal glass, preferably, the particle size of the cerium oxide polishing powder is in the nanometer range, specifically 10 nm to 30 nm. By ensuring the particle size of the main material, cerium oxide, is in the nanometer range, combined with the high pressure and high temperature conditions during pressing, a high-gloss surface can be formed on the surface of the finished polishing disc, effectively preventing scratches and other problems caused by excessively large particle sizes on the surface of the polishing disc.

[0011] In the above-described processing method for the polishing pad used for polishing crystal glass, preferably, the cerium oxide polishing powder also contains 1.0% to 1.2% by mass of rare earth lanthanum oxide. This better synergizes the properties of cerium oxide, improves the polishing effect, more effectively avoids scratches and other phenomena during the polishing process, and ensures the polishing quality of the product.

[0012] In the above-described processing method for polishing discs used for polishing crystal glass, preferably, the high-pressure pressing time is 8 to 12 hours. This ensures that the high-temperature solid-phase reaction during high-temperature and high-pressure pressing is fully formed, resulting in better product quality.

[0013] In the above-described processing method for a polishing disc used for polishing crystal glass, preferably, the surface finish of the polishing disc is at the nanometer level. Because the polishing disc is formed by pressing under high temperature and high pressure, the surface density is high, and the resulting high-temperature solid-phase reaction products better ensure the smoothness and finish of the surface, thus improving the polishing quality and giving the polished product a better surface finish. Furthermore, the nanometer-level surface finish can reduce light scattering, increase the transmittance of the lens, and thereby improve the imaging quality of optical instruments.

[0014] In the above-described processing method for a polishing pad used for polishing crystal glass, preferably, the resin is a mixture of epoxy resin and unsaturated polyester resin, and the mass ratio of the epoxy resin to the unsaturated polyester resin is 1:0.2 to 0.3. This helps to better ensure the quality of the adhesion and results in superior adhesion performance.

[0015] In summary, compared with the prior art, the present invention has the following advantages:

[0016] 1. The polishing disc of the present invention has the advantage of good water resistance and will not dissolve in water. In addition, it can form a high-density polishing disc when pressed under high pressure, thereby improving the service life of the polishing disc.

[0017] 2. The most important aspect of the high-pressure control in this invention is that it effectively forms a high-temperature solid-phase reaction under high-temperature conditions to create sodium-containing cerate compounds, specifically sodium cerium composite oxides. Simultaneously, the polished disc, produced by high-temperature solid-phase reaction and high-pressure pressing, has a smooth surface, preventing scratches during crystal glass processing and ensuring product quality. Detailed Implementation

[0018] The technical solution of the present invention will be further described in detail below through specific embodiments, but the present invention is not limited to these embodiments.

[0019] Example 1

[0020] The polishing pads used for polishing crystal glass are mainly made of the following raw materials in parts by weight: cerium oxide polishing powder: 1.0 kg; resin: 1.1 kg; sodium sulfate: 1.5 kg; the above resin is selected from epoxy resin glue, the cerium oxide content of the cerium oxide polishing powder is greater than 98.2%, and the particle size of cerium oxide is 10 nm to 30 nm.

[0021] The specific processing of the polishing pads used for polishing crystal glass described above can be achieved through the following methods:

[0022] According to the above-mentioned raw material ratio, weigh out the corresponding cerium oxide polishing powder, resin and sodium sulfate raw materials; stir and mix the above raw materials evenly to form a slurry mixture, then add the above slurry mixture into the polishing disc mold, and then press and form the polishing disc under high pressure at a processing temperature of 85℃~90℃; the pressure of the above high pressure pressing is controlled at 15MPa~16MPa, and the high pressure pressing time is 8 hours.

[0023] Example 2

[0024] The polishing pads used for polishing crystal glass are mainly made of the following raw materials in parts by weight: cerium oxide polishing powder: 1.0 kg; resin: 1.3 kg; sodium sulfate: 1.3 kg; the above resin is selected from epoxy resin glue, the cerium oxide content of the cerium oxide polishing powder is greater than 98.5%, and the particle size of cerium oxide is 10 nm to 30 nm.

[0025] The specific processing of the polishing pads used for polishing crystal glass described above can be achieved through the following methods:

[0026] According to the above-mentioned raw material ratio, weigh out the corresponding cerium oxide polishing powder, resin and sodium sulfate raw materials; stir and mix the above raw materials evenly to form a slurry mixture, then add the above slurry mixture into the polishing disc mold, and then press and form the polishing disc under high pressure at a processing temperature of 85℃~90℃; the pressure of the above high pressure pressing is controlled at 16MPa~17MPa, and the high pressure pressing time is 10 hours.

[0027] Example 3

[0028] The polishing pads used for polishing crystal glass are mainly made of the following raw materials in parts by weight: cerium oxide polishing powder: 1.0 kg; resin: 1.2 kg; sodium sulfate: 1.4 kg; the above resin is selected from epoxy resin adhesive, the cerium oxide content of the cerium oxide polishing powder is greater than 98.5%, and the particle size of cerium oxide is 10 nm to 30 nm.

[0029] The specific processing of the polishing pads used for polishing crystal glass described above can be achieved through the following methods:

[0030] According to the above-mentioned raw material ratio, weigh out the corresponding cerium oxide polishing powder, resin and sodium sulfate raw materials; stir and mix the above raw materials evenly to form a slurry mixture, then add the above slurry mixture into the polishing disc mold, and then press and form the polishing disc under high pressure at a processing temperature of 80℃~85℃; the pressure of the above high pressure pressing is controlled at 17MPa~18MPa, and the high pressure pressing time is 8 hours.

[0031] Example 4

[0032] The polishing pads used for polishing crystal glass are mainly made of the following raw materials in parts by weight: cerium oxide polishing powder: 1.0 kg; resin: 1.2 kg; sodium sulfate: 1.4 kg; the above resin is selected from epoxy resin adhesive, the cerium oxide content of the cerium oxide polishing powder is greater than 98.5%, and the particle size of cerium oxide is 10 nm to 30 nm.

[0033] The specific processing of the polishing pads used for polishing crystal glass described above can be achieved through the following methods:

[0034] According to the above-mentioned raw material ratio, weigh out the corresponding cerium oxide polishing powder, resin and sodium sulfate raw materials; stir and mix the above raw materials evenly to form a slurry mixture, then add the above slurry mixture into the polishing disc mold, and then press and form the polishing disc under high pressure at a processing temperature of 85℃~89℃; the pressure of the above high pressure pressing is controlled at 18MPa~20MPa, and the high pressure pressing time is 8 hours.

[0035] Example 5

[0036] The polishing pads used for polishing crystal glass are mainly made of the following raw materials in parts by weight: cerium oxide polishing powder: 1.0 kg; resin: 1.2 kg; sodium sulfate: 1.4 kg; the above resin is selected from unsaturated polyester resin glue, the cerium oxide content of the cerium oxide polishing powder is greater than 98.5%, and the particle size of cerium oxide is 10 nm to 30 nm.

[0037] The specific processing of the polishing pads used for polishing crystal glass described above can be achieved through the following methods:

[0038] According to the above-mentioned raw material ratio, weigh out the corresponding cerium oxide polishing powder, resin and sodium sulfate raw materials; stir and mix the above raw materials evenly to form a slurry mixture, then add the above slurry mixture into the polishing disc mold, and then press and form the polishing disc under high pressure at a processing temperature of 85℃~90℃; the pressure of the above high pressure pressing is controlled at 16MPa~17MPa, and the high pressure pressing time is 10 hours.

[0039] Example 6

[0040] The polishing pads used for polishing crystal glass are mainly made of the following raw materials in parts by weight: cerium oxide polishing powder: 1.0 kg; resin: 1.1 kg; sodium sulfate: 1.45 kg; the resin is selected from epoxy resin adhesive, the cerium oxide content of the cerium oxide polishing powder is greater than 98.5%, the particle size of cerium oxide is 10 nm to 30 nm, and the cerium oxide polishing powder contains 1.0% lanthanum oxide by mass (based on the mass of the cerium oxide polishing powder).

[0041] The specific processing of the polishing pads used for polishing crystal glass described above can be achieved through the following methods:

[0042] According to the above-mentioned raw material ratio, weigh out the corresponding cerium oxide polishing powder, resin and sodium sulfate raw materials; stir and mix the above raw materials evenly to form a slurry mixture, then add the above slurry mixture into the polishing disc mold, and then press and form the polishing disc under high pressure at a processing temperature of 80℃~85℃; the pressure of the above high pressure pressing is controlled at 17MPa~18MPa, and the high pressure pressing time is 8 hours.

[0043] Example 7

[0044] The polishing pads used for polishing crystal glass are mainly made of the following raw materials in parts by weight: cerium oxide polishing powder: 1.0 kg; resin: 1.3 kg; sodium sulfate: 1.3 kg; the resin is selected from epoxy resin adhesive, the cerium oxide content of the cerium oxide polishing powder is greater than 98.5%, the particle size of cerium oxide is 10 nm to 30 nm, and the cerium oxide polishing powder contains 1.2% lanthanum oxide by mass (based on the mass of the cerium oxide polishing powder).

[0045] The specific processing of the polishing pads used for polishing crystal glass described above can be achieved through the following methods:

[0046] According to the above-mentioned raw material ratio, weigh out the corresponding cerium oxide polishing powder, resin and sodium sulfate raw materials; stir and mix the above raw materials evenly to form a slurry mixture, then add the above slurry mixture into the polishing disc mold, and then press and form the polishing disc under high pressure at a processing temperature of 80℃~85℃; the pressure of the above high pressure pressing is controlled at 17MPa~18MPa, and the high pressure pressing time is 8 hours.

[0047] Comparative Example 1

[0048] The polishing pads used for polishing crystal glass are mainly made of the following raw materials in parts by weight: cerium oxide polishing powder: 1.0 kg; resin: 1.2 kg; sodium sulfate: 1.4 kg; the above resin is selected from epoxy resin adhesive, the cerium oxide content of the cerium oxide polishing powder is greater than 98.5%, and the particle size of cerium oxide is 10 nm to 30 nm.

[0049] The specific processing of the polishing pads used for polishing crystal glass described above can be achieved through the following methods:

[0050] According to the above-mentioned raw material ratio, weigh out the corresponding cerium oxide polishing powder, resin and sodium sulfate raw materials; stir and mix the above raw materials evenly to form a slurry mixture, then add the above slurry mixture into the polishing disc mold, and then control the processing temperature at room temperature and the pressure at 1.5MPa (equivalent to 15kg) to compact and form a polishing disc. The pressing time is 10 hours.

[0051] Application Example 1

[0052] One hundred crystal glass pieces of the same weight and size were taken from each group and divided into 5 groups. The polishing discs obtained in Examples 1, 2, 4, 6 and Comparative Example 1 were used to polish the corresponding crystal glass pieces. The polishing equipment was started and the polishing process was carried out. According to the CNC machining program, the polishing time for each surface was 1 minute and the polishing speed was 60 rpm. The quality of the polished crystal glass pieces is shown in Table 1 below:

[0053] Table 1:

[0054]

[0055] As can be seen from the results in Table 1 above, the surface appearance of the crystal glass shards polished by the polishing disc obtained by the method of the present invention is smooth and free of scratches and indentations, and the polishing transparency is good, with a product qualification rate of 100%, while the product qualification rate of Comparative Example 1 can only reach 86%.

[0056] Meanwhile, tests showed that the polishing discs of the present invention have a continuous service life of over 480 hours without any loosening upon contact with water. In contrast, the polishing disc in Comparative Example 1 only has a service life of about 30 hours, and it becomes loose upon contact with water after 8 to 10 hours of use.

[0057] The specific embodiments described in this invention are merely illustrative of the spirit of the invention. Those skilled in the art to which this invention pertains can make various modifications or additions to the described specific embodiments or use similar methods to replace them, without departing from the spirit of the invention or exceeding the scope defined by the appended claims.

[0058] Although the present invention has been described in detail and specific embodiments have been cited, it will be apparent to those skilled in the art that various changes or modifications can be made without departing from the spirit and scope of the invention.

Claims

1. A method for processing a polishing disc for polishing crystal glass, characterized in that, The method includes the following steps: A. Weigh the raw material used for processing the polishing disc, wherein the raw material comprises the following components in parts by weight: Cerium oxide polishing powder: 10; resin: 11-13; sodium sulfate: 13-15; the resin is selected from one or more of epoxy resin, unsaturated polyester resin and phenolic resin. B. Mix the raw materials evenly to form a slurry mixture, add it to the polishing disc mold, and then press it under high pressure at a processing temperature of 80℃~90℃ to form a polishing disc; the pressure of the high-pressure pressing is controlled above 15MPa.

2. The processing method of the polishing disc for polishing crystal glass according to claim 1, characterized in that, The pressure for high-pressure molding is controlled between 16 MPa and 20 MPa.

3. The processing method of the polishing disc for polishing crystal glass according to claim 1, characterized in that, The particle size of the cerium oxide polishing powder is in the nanometer range, and the particle size of the cerium oxide is 10nm to 30nm.

4. The processing method of the polishing disc for polishing crystal glass according to claim 3, characterized in that, The cerium oxide polishing powder also contains 1.0% to 1.2% by mass of rare earth lanthanum oxide.

5. The processing method of the polishing disc for polishing crystal glass according to claim 1, characterized in that, The high-pressure pressing time is 8h to 12h.

6. The method for processing a polishing disc for polishing crystal glass according to any one of claims 1-5, characterized in that, The surface finish of the polishing disc is at the nanometer level.

7. The method for processing a polishing disc for polishing crystal glass according to any one of claims 1-5, characterized in that, The resin is a mixture of epoxy resin and unsaturated polyester resin, and the mass ratio of epoxy resin to unsaturated polyester resin is 1:0.2 to 0.3.

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