Pattern optical anti-counterfeiting structure, manufacturing method thereof and coin medal
By combining embossed patterns and grating microstructures on coins and medals, the problem of applying diffraction optical variable image anti-counterfeiting technology to coins and medals has been solved, achieving richer optical visual effects and higher anti-counterfeiting difficulty, thus meeting the anti-counterfeiting requirements of high-security products.
Patent Information
- Application Number
- CN202511133914.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2022-06-29
- Publication Date
- 2025-12-19
AI Technical Summary
In the existing technology, diffraction optical variable image anti-counterfeiting technology has not been maturely applied to coins and medals, and it is difficult to meet the anti-counterfeiting requirements of high-security products.
It adopts a patterned optical anti-counterfeiting structure, including embossed patterns and grating microstructures. The embossed patterns are composed of text and/or graphic elements, and the grating microstructures are filled within the outline of the embossed patterns. The three-dimensional embossed patterns present different colors when viewed from different angles. The combination of planar and three-dimensional embossed patterns enhances the anti-counterfeiting effect.
It improves the three-dimensional effect and optical visual effect of the relief, increases the difficulty of replication, and meets the anti-counterfeiting requirements of high-security products.
Smart Images
Figure CN121171101A_ABST
Abstract
Description
[0001] This application is a divisional application of the Chinese Patent Application No. 202210747054.9, filed on June 29, 2022, entitled "Pattern Optical Anti-fake Structure, Manufacturing Method Thereof and Seal", the whole content of which is incorporated herein by reference. TECHNICAL FIELD
[0002] The present application relates to the field of high-security or high-value printed matter, in particular, to a pattern optical anti-fake structure, a manufacturing method thereof and a seal. BACKGROUND
[0003] At present, in order to prevent counterfeiting by means of scanning and copying, diffraction optical variable image (such as hologram, dynamic diffraction image, etc.) optical anti-fake elements are widely used in various high-security or high-value printed matter such as banknotes, ID cards and product packaging, and have achieved very good results. For example, the large denomination of Euro banknotes adopts diffraction optical variable image hot stamping identification, the small denomination adopts diffraction optical variable image hot stamping wide strip, and the RMB banknotes in China except 1 yuan banknotes all adopt diffraction optical variable image windowed security thread, and the UnionPay credit card in China adopts diffraction optical variable image hot stamping identification, and important certificates such as ID cards, driver's licenses and passports in China also adopt diffraction optical variable image anti-fake technology. So far, most of the banknotes, credit cards and security cards such as passports in the world have adopted diffraction optical variable image anti-fake technology.
[0004] With the increasing popularity of diffraction optical variable image technology, this technology has also been widely used in general commodities and packaging, such as packaging of cigarettes, wine and pharmaceuticals, and even labels of textiles and toys. However, due to technical limitations, diffraction optical variable image anti-fake technology has not been maturely applied to seals.
[0005] Therefore, how to propose a new pattern optical anti-fake structure that can be applied to seals has become a problem to be solved at present. SUMMARY
[0006] The present application aims to provide a pattern optical anti-fake structure to solve the problems in the prior art or related art.
[0007] Therefore, the first object of the present application is to provide a pattern optical anti-fake structure.
[0008] The second object of the present application is to provide a manufacturing method of the pattern optical anti-fake structure for manufacturing the above-mentioned pattern optical anti-fake structure.
[0009] The third object of the present application is to provide a seal comprising the above-mentioned pattern optical anti-fake structure, or manufactured by the manufacturing method of the above-mentioned pattern optical anti-fake structure.
[0010] To achieve the above object, the technical scheme of the present application provides a pattern optical anti-counterfeiting structure for a seal, which comprises: a relief pattern arranged on the seal; the relief pattern comprises a planar relief pattern or a three-dimensional relief pattern or a combination of the planar relief pattern and the three-dimensional relief pattern; the contour of the relief pattern comprises text and / or graphic elements, and the contour of the relief pattern is filled with a raster microstructure with preset graphic elements; wherein the raster microstructure enables the relief pattern to present a three-dimensional relief pattern with different colors when viewed from different viewing angles.
[0011] According to the pattern optical anti-counterfeiting structure provided by the present application, the pattern optical anti-counterfeiting structure for the seal comprises a relief pattern composed of text and graphic elements, which comprises a planar relief pattern or a three-dimensional relief pattern or a combination of the planar relief pattern and the three-dimensional relief pattern, that is, the pattern optical anti-counterfeiting structure can be a planar relief pattern alone, or a three-dimensional relief pattern alone, or a relief pattern formed by combining a planar relief pattern and a three-dimensional relief pattern, so that the anti-counterfeiting structure of the present application has multiple forms for anti-counterfeiting. The contour of the relief pattern is composed of text and / or graphic elements, and the contour of the relief pattern is filled with a raster microstructure with preset graphic elements, that is, the raster microstructure itself is also in a preset graphic and shape. By filling the raster microstructure, the pattern optical anti-counterfeiting structure can present a three-dimensional relief pattern with different colors when viewed from different viewing angles. Compared with the prior art, the present application not only enhances the three-dimensional effect of the relief and produces more rich optical visual effects, but also combines planar relief and three-dimensional relief for anti-counterfeiting, and presents a unique visual effect. This combined relief is extremely difficult to counterfeit, so it increases the difficulty of copying and counterfeiting, makes the anti-counterfeiting effect better, realizes the anti-counterfeiting technology difficult to copy, and meets the anti-counterfeiting requirements of high security products. Therefore, it has outstanding progress in the field of anti-counterfeiting.
[0012] In the above technical scheme, the height of the raster microstructure is less than the height of the contour of the relief pattern.
[0013] In the above technical scheme, the height of the raster microstructure is less than the height of the contour of the relief pattern.
[0014] In the above technical scheme, the planar relief pattern is arranged on the seal or the three-dimensional relief pattern, and the three-dimensional relief pattern is arranged on the seal.
[0015] In the technical solution, the planar relief pattern can be arranged on the seal or the three-dimensional relief pattern arranged on the seal. The planar relief pattern can be arranged on the three-dimensional relief pattern, thereby forming a relief pattern combining the planar relief pattern and the three-dimensional relief pattern. The relief pattern is difficult to counterfeit, and thus the anti-counterfeiting capability can be enhanced.
[0016] In the above technical solution, the magnification of the pattern optical anti-counterfeiting structure can present at least one or a combination thereof: text, graphic elements, planar relief patterns, three-dimensional relief patterns, and grating microstructures.
[0017] In the technical solution, the magnification of the pattern optical anti-counterfeiting structure can present at least one or a combination thereof: text, graphic elements, planar relief patterns, three-dimensional relief patterns, and grating microstructures. The magnification of the relief pattern can be used for anti-counterfeiting judgment by presenting the content. For example, whether the text and graphics presented by the grating microstructure are consistent with the preset text and graphics and shape can be checked for anti-counterfeiting judgment.
[0018] When the pattern optical anti-counterfeiting structure is observed by magnification, the micro-text or elements can be seen to be composed of smaller grating microstructures.
[0019] In the above technical solution, the height of the text, graphic elements, planar relief patterns, and three-dimensional relief patterns is greater than or equal to 0.01 mm and less than or equal to 0.4 mm.
[0020] In the technical solution, the height of the text, graphic elements, planar relief patterns, and three-dimensional relief patterns is greater than or equal to 0.01 mm and less than or equal to 0.4 mm. By limiting the height of the text, graphic elements, planar relief patterns, and three-dimensional relief patterns to be greater than or equal to 0.01 mm and less than or equal to 0.4 mm, the visual effect of the relief pattern can be better.
[0021] In the above technical solution, the grating period of the grating microstructure is greater than or equal to 0.01 mm and less than or equal to 0.3 mm; and / or the grating groove depth of the grating microstructure is greater than or equal to 50 nm and less than or equal to 350 nm.
[0022] In the technical solution, the grating period of the grating microstructure is greater than or equal to 0.01 mm and less than or equal to 0.3 mm; and / or the grating groove depth of the grating microstructure is greater than or equal to 50 nm and less than or equal to 350 nm. By limiting the grating period of the grating microstructure and the grating groove depth of the grating microstructure to a certain range, the effect of the pattern optical anti-counterfeiting structure can be ensured.
[0023] In any of the above technical solutions, the preset graphic elements include at least one of the following or a combination thereof: a character, a graphic element, a planar relief pattern, and a three-dimensional relief pattern.
[0024] In the technical solution, the preset graphic elements include at least one of the following or a combination thereof: a character, a graphic element, a planar relief pattern, and a three-dimensional relief pattern. That is, the character, the graphic element, the planar relief pattern, and the three-dimensional relief pattern can be filled in the outline of the relief pattern, so as to form a more complex relief pattern, thereby increasing the difficulty of copying the relief pattern.
[0025] In any of the above technical solutions, the three-dimensional relief pattern includes a continuous or discontinuous pattern, and the planar relief pattern includes a discontinuous pattern.
[0026] In the technical solutions, the three-dimensional relief pattern includes a continuous or discontinuous pattern, and the planar relief pattern includes a discontinuous pattern.
[0027] In any of the above technical solutions, the graphic pattern optical anti-counterfeiting structure is embossed or engraved on the seal; and / or the graphic pattern optical anti-counterfeiting structure is arranged in an array.
[0028] In the technical solutions, the graphic pattern optical anti-counterfeiting structure is embossed or engraved on the seal; and / or the graphic pattern optical anti-counterfeiting structure is arranged in an array, further increasing the difficulty of copying and improving the anti-counterfeiting effect.
[0029] In any of the above technical solutions, the graphic pattern optical anti-counterfeiting structure presents a consistent or inconsistent pattern when viewed from different viewing angles.
[0030] In the technical solutions, the graphic pattern optical anti-counterfeiting structure presents a consistent or inconsistent pattern when viewed from different viewing angles, further increasing the difficulty of anti-counterfeiting.
[0031] The technical scheme of the second aspect of the present application provides a manufacturing method of the pattern optical anti-counterfeiting structure, which is used for manufacturing the pattern optical anti-counterfeiting structure in the first aspect of the present application. The manufacturing method comprises the following steps: obtaining image data of at least one feature area on the surface of the coin seal; calculating the image data of each feature area respectively, identifying the characteristics of each feature area, bending or deflecting the curve in the grating array matched with the result of identification, highlighting a specific contour to form a planar relief pattern; arranging the text and / or graphic elements according to the bent or deflected curve to form a text planar relief pattern or an element planar relief pattern; engraving the text planar relief pattern or the element planar relief pattern on the coin seal mold by laser with specific parameters; filling and engraving the grating microstructure in the contour of the planar relief pattern or the preset three-dimensional relief pattern on the coin seal mold by laser with specific parameters; and transferring or engraving the coin seal by using the hard mold with the planar relief pattern and / or the preset three-dimensional relief pattern having the grating microstructure characteristics at a predetermined temperature to form the pattern optical anti-counterfeiting structure.
[0032] According to the manufacturing method of the pattern optical anti-counterfeiting structure provided by the present application, the image data of at least one feature area on the surface of the coin seal is obtained, the image data of each feature area is calculated respectively, the characteristics of each feature area are identified, the curve in the grating array matched with the result of identification is bent or deflected, a specific contour is highlighted to form a planar relief pattern, the text and / or graphic elements are arranged according to the bent or deflected curve to form a text planar relief pattern or an element planar relief pattern, the text planar relief pattern or the element planar relief pattern is engraved on the coin seal mold by laser with specific parameters, the grating microstructure is filled and engraved in the contour of the planar relief pattern or the preset three-dimensional relief pattern on the coin seal mold by laser with specific parameters, and the coin seal is transferred or engraved by using the hard mold with the planar relief pattern and / or the preset three-dimensional relief pattern having the grating microstructure characteristics at a predetermined temperature to form the pattern optical anti-counterfeiting structure. The present application forms the relief pattern by the step-by-step manufacturing, so that the manufacturing of the relief pattern is more complex, and the difficulty of counterfeiting is greatly improved. Since the present application is used for manufacturing the pattern optical anti-counterfeiting structure in the first aspect of the present application, the manufacturing method of the pattern optical anti-counterfeiting structure provided by the present application has all the beneficial effects of the pattern optical anti-counterfeiting structure provided by the first aspect of the present application, and details are not repeated here.
[0033] The technical scheme of the third aspect of the present application provides a coin seal comprising the pattern optical anti-counterfeiting structure of the first aspect of the present application, or the pattern optical anti-counterfeiting structure is manufactured by the manufacturing method of the pattern optical anti-counterfeiting structure provided by the second aspect of the present application.
[0034] According to the coin seal provided by the application, the coin seal comprises the pattern optical anti-counterfeiting structure provided by the first aspect, or the pattern optical anti-counterfeiting structure is manufactured by the manufacturing method of the pattern optical anti-counterfeiting structure provided by the second aspect. Therefore, the coin seal provided by the application has all the beneficial effects of the pattern optical anti-counterfeiting structure provided by the first aspect, or has all the beneficial effects of the manufacturing method of the pattern optical anti-counterfeiting structure provided by the second aspect, which will not be described here.
[0035] In the above technical solution, the coin seal comprises one of a coin, a badge, a commemorative coin and a game coin.
[0036] In any of the above technical solutions, the coin seal is provided with the pattern optical anti-counterfeiting structure on one side or both sides.
[0037] Additional aspects and advantages of the application will become apparent in the description that follows, or will be learned by practice of the application. BRIEF DESCRIPTION OF DRAWINGS
[0038] The above and / or additional aspects and advantages of the application will become apparent and be readily understood by considering the following detailed description, including the accompanying drawings, in which: Figure 1 is a structure schematic diagram of a coin seal with a pattern optical anti-counterfeiting structure provided by an embodiment of the application; Figure 2 is a schematic diagram of a pattern optical anti-counterfeiting structure provided by an embodiment of the application; Figure 3 is a flowchart of a manufacturing method of a pattern optical anti-counterfeiting structure provided by an embodiment of the application.
[0039] In the above technical solution, Figure 1 and Figure 2 the correspondence between the reference signs and the component names in 1 coin seal, 2 embossed pattern.DETAILED DESCRIPTION
[0040] In order to more clearly understand the above-mentioned purposes, features and advantages of the application, the application will be further described in detail below with reference to the drawings and specific embodiments. It should be noted that the embodiments of the application and the features in the embodiments can be combined with each other without conflict.
[0041] In the following description, many specific details are set forth in order to provide a thorough understanding of the application, but the application can also be implemented in other ways different from those described herein, therefore, the scope of protection of the application is not limited by the specific embodiments disclosed below.
[0042] The following will be described with reference to Figure 1 and Figure 2To describe the pattern optical anti-counterfeiting structure provided by the embodiment of the present application.
[0043] As shown in Figure 1 and Figure 2 The embodiment of the present application provides a pattern optical anti-counterfeiting structure for a seal 1, the pattern optical anti-counterfeiting structure comprising: a relief pattern 2 arranged on the seal 1; the relief pattern 2 comprises a planar relief pattern or a three-dimensional relief pattern or a combination of the planar relief pattern and the three-dimensional relief pattern; the contour of the relief pattern 2 comprises text and / or graphic elements, and the contour of the relief pattern 2 is filled with a raster microstructure with preset graphic elements; wherein the raster microstructure enables the relief pattern 2 to present a three-dimensional relief pattern 2 with different colors when viewed from different viewing angles.
[0044] The pattern optical anti-counterfeiting structure provided by the present application is used on a seal 1, and the pattern optical anti-counterfeiting structure comprises a relief pattern 2 composed of text and graphic elements, the relief pattern 2 comprising a planar relief pattern or a three-dimensional relief pattern or a combination of the planar relief pattern and the three-dimensional relief pattern, that is, the pattern optical anti-counterfeiting structure can be a planar relief pattern alone, or a three-dimensional relief pattern alone, or a relief pattern 2 formed by combining the planar relief pattern and the three-dimensional relief pattern, so that the anti-counterfeiting structure of the present application has multiple forms for anti-counterfeiting. The contour of the relief pattern 2 is composed of text and / or graphic elements, and the contour of the relief pattern 2 is filled with a raster microstructure with preset graphic elements, that is, the raster microstructure itself is also in a preset graphic and shape. By filling the raster microstructure, the pattern optical anti-counterfeiting structure can present a three-dimensional relief pattern 2 with different colors when viewed from different viewing angles. Compared with the prior art, the present application not only enhances the three-dimensional effect of the relief, produces more rich optical visual effects, but also combines the planar relief and the three-dimensional relief for anti-counterfeiting, and such combined relief is extremely difficult to counterfeit, so that the difficulty of copying and counterfeiting is increased, the anti-counterfeiting effect is better, the anti-counterfeiting technology is difficult to copy, and the anti-counterfeiting requirements of high-security products are met. Therefore, the present application has outstanding progress in the field of anti-counterfeiting.
[0045] In the above embodiment, the height of the raster microstructure is less than the height of the contour of the relief pattern 2.
[0046] In this embodiment, the height of the raster microstructure is less than the height of the contour of the relief pattern 2, so that the three-dimensional effect of the relief pattern 2 is better, and a more beautiful effect can be presented.
[0047] In the above embodiment, the planar relief pattern is arranged on the seal 1 or the three-dimensional relief pattern, and the three-dimensional relief pattern is arranged on the seal 1.
[0048] In this embodiment, the planar relief pattern can be arranged on the seal 1 or on the three-dimensional relief pattern arranged on the seal 1. In this way, the planar relief pattern can be arranged on the three-dimensional relief pattern to form a combined relief pattern 2 of the planar relief pattern and the three-dimensional relief pattern, which is difficult to counterfeit, thereby facilitating the enhancement of the anti-counterfeiting capability.
[0049] In the above embodiment, the magnification of the pattern optical anti-counterfeiting structure can present at least one of the following or a combination thereof: text, graphic elements, planar relief patterns, three-dimensional relief patterns, and grating microstructures.
[0050] In this embodiment, the magnification of the pattern optical anti-counterfeiting structure can present at least one of the following or a combination thereof: text, graphic elements, planar relief patterns, three-dimensional relief patterns, and grating microstructures. In this way, the anti-counterfeiting judgment can be made by magnifying the relief pattern 2 and presenting the content for anti-counterfeiting judgment, for example, by checking whether the text and graphics presented by the grating microstructure are consistent with the preset text and graphics and shape.
[0051] In this embodiment, the magnification of the pattern optical anti-counterfeiting structure can present at least one of the following or a combination thereof: text, graphic elements, planar relief patterns, three-dimensional relief patterns, and grating microstructures. In this way, the anti-counterfeiting judgment can be made by magnifying the relief pattern 2 and presenting the content for anti-counterfeiting judgment, for example, by checking whether the text and graphics presented by the grating microstructure are consistent with the preset text and graphics and shape.
[0052] In the above embodiment, the height of the text, graphic elements, planar relief patterns, and three-dimensional relief patterns is greater than or equal to 0.01 mm and less than or equal to 0.4 mm.
[0053] In this embodiment, the height of the text, graphic elements, planar relief patterns, and three-dimensional relief patterns is greater than or equal to 0.01 mm and less than or equal to 0.4 mm. In this way, by limiting the height of the text, graphic elements, planar relief patterns, and three-dimensional relief patterns to be greater than or equal to 0.01 mm and less than or equal to 0.4 mm, the visual effect of the relief pattern 2 can be better.
[0054] In the above embodiment, the grating period of the grating microstructure is greater than or equal to 0.01 mm and less than or equal to 0.3 mm; and / or the grating groove depth of the grating microstructure is greater than or equal to 50 nm and less than or equal to 350 nm.
[0055] In this embodiment, the grating period of the grating microstructure is greater than or equal to 0.01 mm and less than or equal to 0.3 mm; and / or the grating trench depth of the grating microstructure is greater than or equal to 50 nm and less than or equal to 350 nm. This setting, by limiting the grating period and grating trench depth of the grating microstructure within a certain range, can ensure the effect achieved by the patterned optical anti-counterfeiting structure.
[0056] In any of the above embodiments, the preset graphic elements include at least one of the following or a combination thereof: text, graphic elements, planar relief patterns, and three-dimensional relief patterns.
[0057] In this embodiment, the preset graphic elements include at least one or a combination of the following: text, graphic elements, planar embossed patterns, and three-dimensional embossed patterns. That is, text, graphic elements, planar embossed patterns, and three-dimensional embossed patterns can be filled within the outline of the embossed pattern 2, thereby forming a more complex embossed pattern 2 and increasing the difficulty of imitating the embossed pattern 2.
[0058] In any of the above embodiments, the three-dimensional relief pattern includes a continuous or discontinuous pattern, and the planar relief pattern includes a discontinuous pattern.
[0059] In these embodiments, the three-dimensional relief pattern includes continuous or discontinuous patterns, and the planar relief pattern includes discontinuous patterns.
[0060] In any of the above embodiments, the patterned optical anti-counterfeiting structure is flipped or engraved on the coin 1; and / or the patterned optical anti-counterfeiting structure is arranged in an array.
[0061] In these embodiments, the patterned optical anti-counterfeiting structure is embossed or engraved on the coin 1; and / or the patterned optical anti-counterfeiting structure is arranged in an array, further increasing the difficulty of counterfeiting and improving the anti-counterfeiting effect.
[0062] In any of the above embodiments, the embossed pattern 2 may present the same or different patterns when viewed from different viewing angles.
[0063] In these embodiments, the embossed pattern 2 appears consistent or inconsistent when viewed from different angles, further increasing the difficulty of anti-counterfeiting.
[0064] like Figure 3 As shown, an embodiment of the second aspect of the present invention provides a method for manufacturing a patterned optical anti-counterfeiting structure, used to manufacture the patterned optical anti-counterfeiting structure in the first aspect embodiment. The manufacturing method includes: S102, acquire image data of at least one feature area on the surface of the coin or medal.
[0065] S104, image data of each feature area is calculated respectively, characteristics of each feature area are identified, and a curve in a grating array matched with the identified result is bent or deflected to highlight a specific contour to form a planar relief pattern.
[0066] S106, the text and / or graphic elements are arranged according to the bent or deflected curve to form a text planar relief pattern or an element planar relief pattern.
[0067] S108, the text planar relief pattern or the element planar relief pattern is engraved on the seal mold by laser with specific parameters.
[0068] S110, the grating microstructure is filled and engraved in the contour of the planar relief pattern or the preset three-dimensional relief pattern on the seal mold by laser with specific parameters.
[0069] S112, the seal is transferred or engraved by the hard mold with the planar relief pattern and / or the preset three-dimensional relief pattern having the grating microstructure characteristics at a predetermined temperature to form the pattern optical anti-counterfeiting structure.
[0070] According to the method for manufacturing the pattern optical anti-counterfeiting structure provided by the application, the image data of at least one feature area on the surface of the seal is obtained, the gray scale of each pixel of the image data of each feature area is calculated respectively, the characteristics of each feature area are identified, a curve in a grating array matched with the identified result is bent or deflected to highlight a specific contour to form a planar relief pattern, the text and / or graphic elements are arranged according to the bent or deflected curve to form a text planar relief pattern or an element planar relief pattern, the text planar relief pattern or the element planar relief pattern is engraved on the seal mold by laser with specific parameters, the grating microstructure is filled and engraved in the contour of the planar relief pattern or the preset three-dimensional relief pattern on the seal mold by laser with specific parameters, and the seal is transferred or engraved by the hard mold with the planar relief pattern and / or the preset three-dimensional relief pattern having the grating microstructure characteristics at a predetermined temperature to form the pattern optical anti-counterfeiting structure. The relief pattern is formed by the step-by-step manufacturing, the manufacturing of the relief pattern is more complex, and the difficulty of counterfeiting is greatly improved. Since the pattern optical anti-counterfeiting structure is used for manufacturing the pattern optical anti-counterfeiting structure in the first aspect, the method for manufacturing the pattern optical anti-counterfeiting structure provided by the application has all the beneficial effects of the pattern optical anti-counterfeiting structure provided by the first aspect, and details are not repeated here.
[0071] The embodiment of the third aspect of the application provides a seal 1 comprising the pattern optical anti-counterfeiting structure of the first aspect or manufactured by the method for manufacturing the pattern optical anti-counterfeiting structure provided by the second aspect.
[0072] According to the coin seal 1 provided by the present application, since the coin seal 1 comprises the pattern optical anti-counterfeiting structure provided by the first aspect, or the pattern optical anti-counterfeiting structure is made by the manufacturing method provided by the second aspect. Therefore, the coin seal provided by the present application has all the beneficial effects of the pattern optical anti-counterfeiting structure provided by the first aspect, or has all the beneficial effects of the manufacturing method of the pattern optical anti-counterfeiting structure provided by the second aspect, which will not be repeated here.
[0073] In the above embodiments, the coin seal 1 comprises one of a coin, a badge, a commemorative coin, and a game coin.
[0074] In any of the above embodiments, the coin seal 1 is provided with the pattern optical anti-counterfeiting structure on one side or both sides.
[0075] In the description of the present specification, the terms "connection", "installation", "fixation" and the like should be understood in a broad sense, for example, "connection" can be fixed connection, or detachable connection, or integral connection; can be directly connected, or indirectly connected through an intermediate medium. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.
[0076] In the description of the present specification, the terms "one embodiment", "some embodiments", "a specific embodiment" and the like mean that the specific features, structures, materials or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present application. In the present specification, the illustrative description of the above terms does not necessarily mean the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner.
[0077] The above is only the preferred embodiment of the present application, and is not used to limit the present application. For those skilled in the art, the present application can have various modifications and changes. Any modification, equivalent replacement, improvement, etc. made within the spirit and principles of the present application shall be included in the protection scope of the present application.
Claims
1. A patterned optical security structure, characterized in that, The pattern optical anti-counterfeiting structure comprises: a relief pattern arranged on the coin; the relief pattern comprises a planar relief pattern or a three-dimensional relief pattern or a combination of the planar relief pattern and the three-dimensional relief pattern; the contour of the relief pattern comprises text and / or graphic elements, and the contour of the relief pattern is filled with a raster microstructure with preset graphic elements; wherein the raster microstructure enables the relief pattern to present a three-dimensional relief pattern with different colors when viewed from different viewing angles; the pattern optical anti-counterfeiting structure presents consistent or inconsistent patterns when the relief pattern is viewed from different viewing angles.
2. The patterned optical security structure according to claim 1, wherein The height of the raster microstructure is less than the height of the contour of the relief pattern.
3. The patterned optical security structure according to claim 1, wherein The planar relief pattern is arranged on the coin or the three-dimensional relief pattern is arranged on the coin.
4. The patterned optical security structure according to claim 1, wherein Magnifying the pattern optical anti-counterfeiting structure can present at least one of the following or a combination thereof: the text, the graphic elements, the planar relief pattern, the three-dimensional relief pattern, and the raster microstructure.
5. The patterned optical security structure according to claim 1, wherein The height of the text, the graphic elements, the planar relief pattern, and the three-dimensional relief pattern is greater than or equal to 0.01 mm and less than or equal to 0.4 mm; and / or The raster period of the raster microstructure is greater than or equal to 0.01 mm and less than or equal to 0.3 mm; and / or The raster groove depth of the raster microstructure is greater than or equal to 50 nm and less than or equal to 350 nm.
6. The pattern optical anti-counterfeiting structure according to any one of claims 1 to 3, wherein the preset graphic elements comprise at least one of the following or a combination thereof: text, graphic elements, planar relief patterns, and three-dimensional relief patterns; and / or the three-dimensional relief pattern comprises a continuous or discontinuous pattern, and the planar relief pattern comprises a discontinuous pattern; and / or the pattern optical anti-counterfeiting structure is embossed or engraved on the coin; and / or the pattern optical anti-counterfeiting structure is arranged in an array.
7. A method for producing a patterned optical security structure, characterized in that A method for manufacturing the pattern optical anti-counterfeiting structure according to any one of claims 1 to 6, the manufacturing method comprising: obtaining image data of at least one feature area of a coin surface; calculating the image data of each feature area respectively, identifying the characteristics of each feature area, and according to the identified results, bending or deflecting the curves in the raster array matched therewith to highlight specific contours to form planar relief patterns; arranging text and / or graphic elements according to the bent or deflected curves to form text planar relief patterns or element planar relief patterns; laser engraving the text planar relief patterns or the element planar relief patterns on a coin mold with specific parameters; laser focus-filling and engraving a raster microstructure in the contour of the planar relief pattern or a preset three-dimensional relief pattern on the coin mold with specific parameters; transferring or engraving the coin with a hard mold with the planar relief pattern and / or the preset three-dimensional relief pattern with the characteristics of the raster microstructure at a predetermined temperature to form the pattern optical anti-counterfeiting structure.
8. A coin, comprising: The coin seal comprises the pattern optical anti-counterfeiting structure according to any one of claims 1 to 6; or The pattern optical anti-counterfeiting structure is made by the method for making the pattern optical anti-counterfeiting structure according to claim 7.
9. The coin seal according to claim 8, characterized in that The coin seal comprises one of a coin, a badge, a commemorative coin, and a game coin.
10. The coin seal according to claim 8 or 9, characterized in that The pattern optical anti-counterfeiting structure is arranged on one face or both faces of the coin seal.