Quantum electric field measuring device based on polar plate
By designing a combined structure of a flipping component and a cleaning roller in the quantum electric field measurement device, charged particles on the surface of the electrode plate are cleaned, solving the problem of measurement offset caused by particles adhering to the electrode plate and achieving higher measurement accuracy.
Patent Information
- Application Number
- CN202511454519.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-10-13
- Publication Date
- 2026-01-13
AI Technical Summary
In existing quantum electric field measurement devices, due to the metallic properties of the plates, charged particles in the environment can easily adhere to them, causing the measured electric field values to deviate from the true values.
A quantum electric field measurement device based on an electrode plate was designed. It adopts a combination structure of a flipping component and a cleaning roller. By flipping the electrode plate and moving the cleaning roller on its surface, the attached charged particles are cleaned away, ensuring the accuracy of the measurement.
This effectively reduces the adhesion of charged particles to the electrode plates, improves the accuracy of quantum electric field measurements, and maintains the continuity and precision of the measurements.
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Figure CN121324767A_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of quantum electric field measurement technology, and in particular to a plate-based quantum electric field measurement device. Background Technology
[0002] Current quantum electric field measurement devices generally use two large-area metal plates arranged in parallel as electrodes. The electric field strength is controlled by adjusting the distance between the plates and applying voltage. However, due to the metallic properties of the electrodes, when charged particles such as dust and fibers in the environment come into contact with the electrodes, the electric field induces the particles to polarize and generate an adsorption force to adhere to the electrodes. The adhered particles will change the potential distribution between the two electrodes, causing the measured electric field value to deviate from the true value. Summary of the Invention
[0003] The purpose of this invention is to provide a plate-based quantum electric field measurement device that can effectively reduce the adhesion of charged particles to the plate and improve the accuracy of electric field measurement.
[0004] To achieve the above objectives, the present invention provides a plate-based quantum electric field measurement device, comprising: platform; Two parallel plate mechanisms are disposed on the platform and move towards each other in a second direction. Each parallel plate mechanism includes an electrode plate, a mounting base, and a flipping assembly. The electrode plate is mounted on the flipping assembly. The flipping assembly and the mounting base are connected by a first hinge shaft extending in a first direction. A cleaning mechanism is mounted on the flipping assembly. The cleaning mechanism includes a cleaning drive assembly and a cleaning roller. The flipping assembly is driven by the cleaning drive assembly, and the cleaning drive assembly is driven by the cleaning roller. The cleaning roller is used to move along the surface of the electrode plate between a first position and a second position. A transmitter assembly is mounted on the platform and is located on the central axis between the two pole plates in a second direction; A moving mechanism is mounted on the platform and is connected to the mounting base via a transmission mechanism. The moving mechanism is used to drive the two mounting bases to move towards or away from each other in a second direction. The first direction and the second direction intersect each other perpendicularly.
[0005] Preferably, the impurity removal driving component includes: A pendulum extending along a first direction; A rotation drive component is mounted on the flipping assembly and connected to the swing arm. The rotation drive component is used to drive the swing arm to rotate. A swing arm, the first end of which is connected to the swing rod, and the second end of which is connected to the impurity removal roller.
[0006] Preferably, the self-rotation drive component includes: A conveying component, the conveying component including a main turntable, a slave turntable and a conveyor belt; The rotation axis of the main turntable extends along a first direction and is mounted on the flipping assembly. The slave turntable is sleeved on the swing arm, and the conveyor belt is wound around the main turntable and the slave turntable.
[0007] Preferably, there are two conveying components, which are arranged at intervals along a first direction, and the axes of rotation of the two main turntables are on the same straight line extending along the first direction.
[0008] Preferably, the flipping component includes: A fixing frame includes a baffle and two upright plates. The upright plates are parallel to a second direction and a third direction. The two upright plates are arranged alternately along a first direction. The baffle is parallel to the first direction and a third direction. The baffle is connected to the two upright plates on both sides of the first direction. A rotating frame is provided with a limiting hole extending along a first direction. The limiting hole extends along the length direction of the rotating frame. A first hinge shaft is mounted on the mounting base and passes through the limiting hole. A second hinge shaft extending along the first direction is provided at one end of the rotating frame away from the mounting base. The two ends of the second hinge shaft pass through the two vertical plates respectively. The rotation axis of the main turntable is connected to the second hinge shaft. An assembly component is provided, which is connected to the rotating frame and the swing arm, and the pole plate is mounted on the assembly component. The first direction, the second direction, and the third direction intersect each other perpendicularly.
[0009] Preferably, a bushing is fitted onto one end of the second hinge shaft, and a connecting pin is connected to the rotation shaft of the main turntable, with the connecting pin inserted into the bushing.
[0010] Preferably, the assembly component includes: An assembly frame is connected to one end of the rotating frame near the second hinge shaft. The bottom surface of the end of the assembly frame near the second hinge shaft has an inwardly recessed first snap-fit groove, which fits with the impurity removal roller. The electrode plate is installed on the bottom surface of the assembly frame. Two roller frames are respectively installed on both sides of the assembly frame in a first direction. The roller frames are provided with rolling holes extending in the first direction. The two ends of the swing arm pass through the two rolling holes and are connected to the swing arm. The bottom surface of the roller frame away from the flipping assembly is provided with an inwardly recessed second locking groove, which fits with the impurity removal roller.
[0011] Preferably, the swing arm has a through hole extending along a first direction. The through hole extends along the length of the swing arm. A spring rod and a bearing are installed in the through hole. The first end of the spring rod is fixed to the inner wall surface of the through hole near the swing arm. The second end of the spring rod is connected to the bearing. The bearing extends along the first direction. The two ends of the impurity removal roller are rotatably connected to the bearings on the two swing arms, respectively.
[0012] Preferably, the moving mechanism includes a moving drive assembly, a gear disk, and two racks; The motion drive component is mounted on the platform, the motion drive component is connected to one of the mounting bases, and the motion drive component is used to drive the connected mounting base to move in a second direction. The rack extends along the second direction, and the two racks are respectively located on both sides of the parallel plate mechanism in the first direction, with the teeth of the two racks facing each other in the first direction; The rotation axis of the gear disk extends along a third direction and is mounted on the platform. The gear disk is located between the two racks in a first direction and is meshed with the two racks respectively. The flipping assembly is connected to a sliding sleeve, and the sliding sleeves connected to the two flipping assemblies are respectively fixedly sleeved on the two racks; The first direction, the second direction, and the third direction intersect each other perpendicularly.
[0013] Preferably, it further includes: a sliding track extending along a second direction and mounted on the platform, wherein the mounting base slides on the sliding track.
[0014] Compared with existing technologies, the advantages of the plate-based quantum electric field measurement device of this invention are as follows: The electrode plate is installed on the flipping assembly. In the initial state, the surface of the electrode plate is facing down and the impurity removal roller is in the first position. When the moving mechanism drives the two mounting seats to move towards each other in the second direction, it drives the flipping assembly to flip outward along the first hinge axis. The electrode plate flips with the flipping assembly to a plane perpendicular to the second direction. The emission source assembly injects positive and negative charges into the two electrode plates on both sides in the second direction, respectively. At this time, a quantum electric field can be generated between the two electrode plates for testing.
[0015] As the electrode plate is flipped by the flipping assembly to a plane perpendicular to the second direction, the flipping assembly drives the impurity removal drive assembly to move the impurity removal roller from the first position to the second position along the surface of the electrode plate, cleaning the surface of the electrode plate, effectively reducing charged particles adhering to the electrode plate, and improving the accuracy of measuring electric field values. After the quantum electric field test is completed, the moving mechanism drives the two mounting seats to move in opposite directions in the second direction, causing the flipping component to flip back along the first hinge axis. During the process of the electrode plate returning to the initial state, the flipping component drives the impurity removal drive component to drive the impurity removal roller to move from the second position to the first position along the surface of the electrode plate, cleaning the surface of the electrode plate again. After cleaning, the electrode plate returns to the initial state with the surface facing down, which can also effectively prevent charged particles from adhering to the surface of the electrode plate. Attached Figure Description
[0016] Figure 1 This is a schematic diagram of the structure of the plate-based quantum electric field measurement device according to an embodiment of the present invention; Figure 2 This is a front sectional view of the plate-based quantum electric field measurement device described in an embodiment of the present invention; Figure 3 yes Figure 1 A partially enlarged view of the parallel plate mechanism and the impurity removal mechanism at point A; Figure 4 yes Figure 2 A partial enlarged view of the parallel plate mechanism and the impurity removal mechanism at point B; Figure 5 This is an exploded view of the parallel plate mechanism and the impurity removal mechanism described in the embodiments of the present invention; Figure 6 This is a schematic diagram of the structure of the electrode plate flipping to a plane perpendicular to the second direction, as described in an embodiment of the present invention; Figure 7 This is a schematic diagram of the structure of the electrode plate flipped to a plane perpendicular to the second direction from another perspective according to an embodiment of the present invention; In the diagram, 1 is the platform; 2 is the parallel plate mechanism; 21 is the pole plate; 22 is the mounting base; and 221 is the first hinge shaft. 23. Flipping assembly; 231. Fixing frame; 2311. Baffle; 2312. Vertical plate; 232. Rotating frame; 2321. Limiting hole; 2322. Second hinge shaft; 2323. Bushing; 233. Assembly component; 2331. Assembly frame; 2332. Roller frame; 2333. First locking groove; 2334. Second locking groove; 24. Impurity removal drive assembly; 241. Swing rod; 242. Swing arm; 2421. Sliding hole; 2422. Spring rod; 2423. Bearing; 243. Rotation drive component; 244. Conveying component; 2441. Main turntable; 2442. Slave turntable; 2443. Conveyor belt; 2444. Connecting pin; 25. Impurity removal roller; 3. Source assembly; 4. Moving mechanism; 41. Moving drive assembly; 411. Cylinder; 412. Telescopic rod; 42. Gear disk; 43. Rack; 5. Sliding sleeve; 6. Sliding rail; 61. Sliding rod assembly; 611. Fixed base; 612. Branch sliding rod; 7. Cleanroom; 8. First parallel plate mechanism; 9. Second parallel plate mechanism; 10. First rack; 11. Second rack; 12. Impurity removal mechanism. Detailed Implementation
[0017] The specific embodiments of the present invention will be described in further detail below with reference to the accompanying drawings and examples. The following examples are for illustrative purposes only and are not intended to limit the scope of the invention.
[0018] In the description of this invention, it should be understood that, unless otherwise expressly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in the embodiments of this invention based on the specific circumstances.
[0019] In the description of this invention, it should be understood that the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance. Furthermore, the terms "upper," "lower," "left," "right," "front," "rear," "top," "bottom," "inner," "outer," "middle," "vertical," "horizontal," "lateral," "longitudinal," "X-axis direction," "Y-axis direction," and "Z-axis direction," etc., indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as limiting the invention. Moreover, some of the above terms, in addition to indicating orientations or positional relationships, may also be used to indicate other meanings; for example, the term "upper" may in some cases be used to indicate a certain dependency or connection relationship. Those skilled in the art can understand the specific meaning of these terms in this application according to the specific circumstances.
[0020] like Figure 1-4As shown, an embodiment of the present invention provides a quantum electric field measurement device based on plates, comprising: a platform 1, an emission source assembly 3, a moving mechanism 4, and two parallel plate mechanisms 2; Two parallel plate mechanisms 2 are movable toward each other on the platform Z in the second direction X. The parallel plate mechanism 2 includes an electrode plate 21, a mounting base 22 and a flipping assembly 23. The electrode plate 21 is mounted on the flipping assembly 23. The flipping assembly 23 and the mounting base 22 are connected by a first hinge shaft 221 extending along the first direction X. A cleaning mechanism 12 is mounted on the flipping assembly 23. The cleaning mechanism 12 includes a cleaning drive assembly 24 and a cleaning roller 25. The flipping assembly 23 is connected to the cleaning drive assembly 24, and the cleaning drive assembly 24 is connected to the cleaning roller 25. The cleaning roller 25 is used to move along the surface of the electrode plate 21 between a first position and a second position. The transmitter assembly 3 is mounted on the platform 1, and the transmitter assembly 3 is located on the central axis between the two pole plates 21 in the second direction Y. The moving mechanism 4 is installed on the platform 1. The moving mechanism 4 is connected to the mounting base 22 via a transmission. The moving mechanism 4 is used to drive the two mounting bases 22 to move towards or away from each other in the second direction Y. Among them, the first direction X and the second direction Y intersect each other perpendicularly.
[0021] It should be noted that the electrode plate 21 is installed on the flipping assembly 23. In the initial state, the surface of the electrode plate 21 faces downward and the impurity removal roller 25 is located in the first position. When the moving mechanism 4 drives the two mounting seats 22 to move towards each other in the second direction Y, it drives the flipping assembly 23 to flip outward along the first hinge axis 221. The electrode plate 21 flips with the flipping assembly 23 to a plane perpendicular to the second direction Y. The emission source assembly 3 injects positive and negative charges into the two electrode plates 21 on both sides of the second direction Y, respectively. At this time, a quantum electric field can be generated between the two electrode plates 21 for testing.
[0022] As the electrode plate 21 is flipped by the flipping assembly 23 to a plane perpendicular to the second direction Y, the flipping assembly 23 drives the impurity removal drive assembly 24 to drive the impurity removal roller 25 to move from the first position to the second position along the surface of the electrode plate 21, cleaning the surface of the electrode plate 21, effectively reducing the adhesion of charged particles to the electrode plate 21, and improving the accuracy of measuring the electric field value. After the quantum electric field test is completed, the moving mechanism 4 drives the two mounting seats 22 to move in opposite directions in the second direction Y, which drives the flipping component 23 to flip back inward along the first hinge axis 221. During the process of the electrode plate 21 returning to the initial state, the flipping component 23 drives the impurity removal drive component 24 to drive the impurity removal roller 25 to move from the second position to the first position along the surface of the electrode plate 21, and cleans the surface of the electrode plate 21 again. After cleaning, the electrode plate 21 returns to the initial state with the surface facing down, which can also effectively prevent charged particles from adhering to the surface of the electrode plate 21.
[0023] The transmitter assembly 3 is located on the central axis between the two pole plates 21 in the second direction Y. The central axis refers to the position where the two pole plates 21 are at the same distance from the transmitter assembly 3.
[0024] like Figure 3-5 As shown, in this embodiment, the impurity removal drive assembly 24 further includes a rocker arm 241, a rotation drive component 243, and a swing arm 242: The lever 241 extends along the first direction X; The rotation drive component 243 is installed on the flip assembly 23. The rotation drive component 243 is connected to the swing arm 241 and is used to drive the swing arm 241 to rotate. The first end of the swing arm 242 is connected to the swing rod 241, and the second end of the swing arm 242 is connected to the impurity removal roller 25.
[0025] It should be noted that the rotation drive component 243 drives the swing arm 241 to rotate. Since the first end of the swing arm 242 is connected to the swing arm 241, the rotation of the swing arm 241 will drive the swing arm 242 to rotate and swing along the axis of the swing arm 241. The second end of the swing arm 242 is connected to the impurity removal roller 25, so the swing of the swing arm 242 can drive the impurity removal roller 25 to move along the surface of the electrode plate 21 between the first position and the second position.
[0026] like Figure 3-5 As shown, in this embodiment, the self-rotation drive component 243 further includes a transmission component 244; The conveying component 244 includes a main turntable 2441, a slave turntable 2442, and a conveyor belt 2443; The rotation axis of the main turntable 2441 extends along the first direction X and is mounted on the flipping assembly 23. The secondary turntable 2442 is sleeved on the outside of the swing arm 241, and the conveyor belt 2443 is wound around the main turntable 2441 and the secondary turntable 2442.
[0027] It should be noted that the drive main turntable 2441 rotates along the axis extending in the first direction X, and the conveyor belt 2443 surrounding the main turntable 2441 and the secondary turntable 2442 drives the secondary turntable 2442 to rotate. Since the secondary turntable 2442 is sleeved on the outside of the swing arm 241, the secondary turntable 2442 and the swing arm 241 rotate coaxially, causing the swing arm 241 to rotate.
[0028] like Figure 3-5 As shown, in this embodiment, there are two conveying components 244, which are arranged alternately along the first direction X, and the axes of rotation of the two main turntables 2441 are on the same straight line extending along the first direction X.
[0029] It should be noted that the two transmission components 244 are arranged alternately along the first direction X, and the rotation axes of the two main turntables 2441 are on the same straight line extending along the first direction X. Therefore, the two transmission components 244 jointly drive the rotation of the swing arm 241, making the rotation of the swing arm 241 more stable.
[0030] like Figure 3-6 As shown, in this embodiment, the flipping assembly 23 further includes a fixing frame 231, a rotating frame 232, and an assembly component 233; The fixing frame 231 includes a baffle 2311 and two upright plates 2312. The upright plates 2312 are parallel to the second direction Y and the third direction Z. The two upright plates 2312 are arranged alternately along the first direction X. The baffle 2311 is parallel to the first direction X and the third direction Z. The baffle 2311 is connected to the two upright plates 2312 on both sides of the first direction X. The rotating frame 232 has a limiting hole 2321 that extends through the first direction X. The limiting hole 2321 extends along the length of the rotating frame 232. The first hinge shaft 221 is installed on the mounting base 22 and passes through the limiting hole 2321. The rotating frame 232 has a second hinge shaft 2322 extending along the first direction X at one end away from the mounting base 22. The two ends of the second hinge shaft 2322 pass through two vertical plates 2312 respectively. The rotation shaft of the main turntable 2441 is connected to the second hinge shaft 2322. Assembly component 233 is connected to rotating frame 232, assembly component 233 is connected to swing rod 241, and pole plate 21 is installed on assembly component 233; Among them, the first direction X, the second direction Y, and the third direction Z intersect each other perpendicularly.
[0031] It should be noted that in the initial state, the rotating frame 232 is tilted inward, the surface of the electrode plate 21 is facing downward, the first hinge shaft 221 is located at the low position of the limiting hole 2321, and the moving mechanism 4 is connected to the mounting base 22. When the moving mechanism 4 drives the mounting base 22 to move closer to the transmitter assembly 3, the second hinge shaft 2322 of the rotating frame 232 is limited on the upright plate 2312. The upright plate 2312 needs to remain stationary. Therefore, the movement of the moving mechanism 4 will drive the first hinge shaft 221 on the mounting base 22 to move to the high position and then to the low position along the limiting hole 2321 opened in the rotating frame 232 (the high position is on the third direction Z of the low position). At the same time, the rotating frame 232 flips and becomes tilted outward. The assembly component 233 and the electrode plate 21 flip synchronously until the assembly component 233 abuts the baffle 2311. The electrode plate 21 flips to the maximum position on the plane perpendicular to the second direction Y. The moving mechanism 4 continues to drive the mounting base 22 to move, which can adjust the distance between the two parallel plate mechanisms 2.
[0032] When the quantum electric field test is completed, the moving mechanism 4 drives the mounting base 22 to move away from the emission source component 3. This causes the first hinge shaft 221 on the mounting base 22 to move along the limiting hole 2321 to a high position and then to a low position. At this time, the rotating frame 232 flips from tilting outward to tilting inward. The assembly component 233 and the electrode plate 21 flip back to their initial state, with the surface of the electrode plate 21 facing downward.
[0033] The rotating frame 232 has a second hinge shaft 2322 extending along the first direction X at one end away from the mounting base 22. The two ends of the second hinge shaft 2322 are respectively inserted through the two upright plates 2312 of the fixed frame 231. The second hinge shaft 2322 is connected to the rotation shaft of the main turntable 2441. Since the second hinge shaft 2322 also rotates when the rotating frame 232 is flipped, the second rotation shaft can drive the rotation shaft of the main turntable 2441 to rotate. At the same time, the dust removal drive assembly also drives the cleaning roller 25 to move and clean along the surface of the electrode plate 21.
[0034] This application can reduce the time gap between cleaning the surface of the electrode plate 21 and the quantum electric field test while maintaining the continuity of quantum electric field testing, effectively reducing the risk of charged particles adhering to the surface of the electrode plate 21 during this process.
[0035] Furthermore, the mounting base 22 includes a sliding plate and a protruding rod, the protruding rod being mounted on the sliding plate, and a first hinge shaft 221 being mounted on the protruding rod. The sliding plate is connected to the moving mechanism 4.
[0036] like Figure 5 As shown, in this embodiment, one end of the second hinge shaft 2322 is further fitted with a bushing 2323, and the rotation shaft of the main turntable 2441 is connected with a connecting pin 2444, which is inserted into the bushing 2323.
[0037] It should be noted that a bushing 2323 is sleeved on one end of the second hinge shaft 2322, and a connecting pin 2444 is connected to the rotation shaft of the main turntable 2441. The connecting pin 2444 is inserted into the bushing 2323, so that the main turntable 2441 can be disassembled from the second hinge shaft 2322.
[0038] Furthermore, when there are two conveying components 244, both ends of the second hinge shaft 2322 are fitted with bushings 2323, and the rotation shafts of the main turntables 2441 of the two conveying components 244 are connected with connecting pins 2444. The two connecting pins 2444 are respectively inserted into the two bushings 2323, so the two conveying components 244 are respectively connected to the two ends of the second hinge shaft 2322.
[0039] like Figure 3-7 As shown, in this embodiment, the assembly component 233 further includes an assembly frame 2331 and two roller frames 2332; The assembly frame 2331 is connected to one end of the rotating frame 232 near the second hinge shaft 2322. The bottom surface of the end of the assembly frame 2331 near the second hinge shaft 2322 is provided with an inwardly recessed first locking groove 2333. The first locking groove 2333 fits with the impurity removal roller 25. The electrode plate 21 is installed on the bottom surface of the assembly frame 2331. Two roller frames 2332 are respectively installed on both sides of the assembly frame 2331 in the first direction X. Rolling holes (not shown in the figure) extending along the first direction X are provided on the roller frames 2332. The two ends of the swing arm 241 pass through the two rolling holes and are connected to the swing arm 242. A second recessed locking groove 2334 is provided on the bottom surface of the end of the roller frame 2332 away from the flipping assembly 23. The second locking groove 2334 and the impurity removal roller 25 are matched.
[0040] It should be noted that the assembly frame 2331 is connected to one end of the rotating frame 232 near the second hinge shaft 2322, the electrode plate 21 is installed on the bottom surface of the assembly frame 2331, and the two roller frames 2332 are respectively installed on both sides of the assembly frame 2331 in the first direction X. The impurity removal roller 25 cleans the surface of the electrode plate 21 along the roller frames 2332 and the assembly frame 2331.
[0041] The bottom surface of the assembly frame 2331 near the second hinge shaft 2322 is provided with an inwardly recessed first locking groove 2333. When the impurity removal roller 25 is locked in the first locking groove 2333, it is in the first position.
[0042] The bottom surface of the roller frame 2332 away from the flipping assembly 23 has an inwardly recessed second locking groove 2334. When the impurity removal roller 25 is locked in the second locking groove 2334, it is in the second position.
[0043] Roller frame 2332 has rolling holes extending along the first direction X. The two ends of rocker arm 241 pass through the two rolling holes respectively to connect to rocker arm 242, thereby realizing the connection between rocker arm 241 and assembly component 233. Rocker arm 242 swings on the outside of roller frame 2332.
[0044] Furthermore, the bottom surface of the roller frame 2332 is flush with the bottom surface of the mounting frame 2331, so that the cleaning roller 25 can make more full contact with the electrode plate 21 when cleaning along the roller frame 2332 and the mounting frame 2331.
[0045] Furthermore, two swing arms 242 are provided. The first ends of the two swing arms 242 are connected to the two ends of the swing rod 241, and the second ends of the two swing arms 242 are connected to the two ends of the cleaning roller 25. With the two swing arms 242 supporting the cleaning roller 25, the cleaning roller 25 can clean the surface of the electrode plate 21 more stably.
[0046] like Figure 5 , 7As shown, in this embodiment, a sliding hole 2421 extending along the first direction X is further provided in the swing arm 242. The sliding hole 2421 extends along the length direction of the swing arm 242. A spring rod 2422 and a bearing 2423 are installed in the sliding hole 2421. The first end of the spring rod 2422 is fixed on the inner wall surface of the sliding hole 2421 near the end of the swing arm 241. The second end of the spring rod 2422 is connected to the bearing 2423. The bearing 2423 extends along the first direction X. The two ends of the impurity removal roller 25 are respectively rotatably connected to the bearings 2423 on the two swing arms 242.
[0047] It should be noted that, since the swing arm 242 moves in an arc shape, if the second end of the swing arm 242 is fixedly connected to the cleaning roller 25, the cleaning roller 25 cannot adhere to the surface of the flat electrode plate 21 for cleaning. Therefore, the center position between the first and second positions is set as the third position. When the cleaning roller 25 moves from the first position to the third position, the spring rod 2422 applies a pulling force to the bearing 2423, causing the bearing 2423 to move in the sliding hole 2421 towards the swing arm 241, thereby allowing the cleaning roller 25 to adhere to the surface of the electrode plate 21 for cleaning; when the cleaning roller 25 moves from the third position... During the movement to the second position, the impurity removal roller 25 applies force to the bearing 2423, causing the bearing 2423 to move away from the rocker arm 241 within the sliding hole 2421. The bearing 2423 causes the spring rod 2422 to stretch. Therefore, when the impurity removal roller 25 moves from the second position to the third position, the spring rod 2422 generates a restoring potential energy to apply tension to the bearing 2423. When the impurity removal roller 25 moves from the third position to the first position, the impurity removal roller 25 applies force to the bearing 2423, causing the bearing 2423 to move away from the rocker arm 241 within the sliding hole 2421. The bearing 2423 causes the spring rod 2422 to stretch.
[0048] The two ends of the cleaning roller 25 are rotatably connected to the bearings 2423 on the two swing arms 242, so that while the cleaning roller 25 moves along the surface of the electrode plate 21, the cleaning roller 25 can also rotate to clean the surface of the electrode plate 21, realizing circumferential sweeping cleaning.
[0049] like Figure 1-3 As shown, in this embodiment, the moving mechanism 4 further includes a moving drive assembly 41, a gear disk 42, and two racks 43; The mobile drive component 41 is installed on the platform 1 and is connected to one of the mounting bases 22. The mobile drive component 41 is used to drive the connected mounting base 22 to move in the second direction Y. The rack 43 extends along the second direction Y, and the two racks 43 are located on both sides of the parallel plate mechanism 2 in the first direction X, and the teeth of the two racks 43 are arranged facing each other in the first direction X. The rotation axis of the gear disk 42 extends along the third direction Z and is mounted on the platform 1. The gear disk 42 is located between two racks 43 in the first direction X and is meshed with the two racks 43 respectively. The flipping component 23 is connected to a sliding sleeve 5, and the sliding sleeves 5 connected to the two flipping components 23 are respectively fixedly sleeved on the two racks 43; Among them, the first direction X, the second direction Y, and the third direction Z intersect each other perpendicularly.
[0050] It should be noted that the sliding sleeves 5 of the two parallel plate mechanisms 2 are respectively fixedly sleeved on the two racks 43. That is, the sliding sleeve 5 of the first parallel plate mechanism 8 is fixedly sleeved on the first rack 10, and the sliding sleeve 5 of the second parallel plate mechanism 9 is fixedly sleeved on the second rack 11. The moving drive assembly 41 is connected to one of the parallel plate mechanisms 2, namely the first parallel plate mechanism 8. The moving drive assembly 41 drives the first parallel plate mechanism 8 to move, which in turn drives its sliding sleeve 5 and the first rack 10 to move. The movement of the first rack 10 drives the gear disk 42 to rotate. The gear disk 42 drives the meshing second rack 11 to move in the opposite direction to the movement direction of the first rack 10, thereby realizing the relative movement or opposite movement between the first parallel plate mechanism 8 and the second parallel plate mechanism 9.
[0051] Furthermore, the transmitter assembly 3 includes a transmitter plate that is parallel to the first direction X and the third direction Z.
[0052] Furthermore, platform 1 is made of steel square tubing.
[0053] Furthermore, the sliding sleeve 5 connects to the vertical plate 2312.
[0054] It should be noted that when the moving drive assembly 41 moves the mounting base 22, since the vertical plate 2312 is connected to the sliding sleeve 5, and the sliding sleeve 5 is fixedly sleeved on the rack 43, and the rack 43 is not moved at the beginning, so it remains stationary. Consequently, the sliding sleeve 5 fixedly sleeved on the rack 43 and the vertical plate 2312 also remain stationary. The moving drive assembly 41 will first drive the first hinge shaft 221 to slide from the low position to the high position and then slide back to the low position along the limiting hole 2321, and then overcome the resistance of the gear disk 42 to drive the entire parallel plate mechanism 2 and the rack 43 to move.
[0055] The sliding sleeve 5 is preferably a C-shaped plate, which includes two parallel first plates and a second plate vertically connected between the two first plates. A space for engaging the rack 43 is formed between the second plate and the two first plates, and one of the first plates is connected to the vertical plate 2312.
[0056] like Figure 3 As shown, it further includes: a rack fastener, the rack 43 having a slot extending in the second direction Y, and the sliding sleeve 5 having a fastening hole, the rack fastener being used to fix the sliding sleeve 5 and the rack 43 when inserted into the slot and the fastening hole.
[0057] The fastening hole is preferably a threaded hole, and the rack fastener is preferably an anchor bolt, which achieves the fixing effect by tightening the thread.
[0058] like Figure 1 As shown, in this embodiment, it further includes a sliding rail 6, which extends along the second direction Y and is mounted on the platform 1, with the mounting base 22 sliding on the sliding rail 6.
[0059] It should be noted that the mounting base 22 of the parallel plate mechanism 2 slides on the sliding rail 6 that extends along the second direction Y and is mounted on the platform 1. Therefore, the sliding rail 6 can limit the direction in which the moving mechanism 4 drives the parallel plate mechanism 2 to move, effectively ensuring the straight movement of the parallel plate mechanism 2 in the second direction Y.
[0060] like Figure 1-2 As shown, in this embodiment, the movement drive assembly 41 further includes a cylinder 411 and a telescopic rod 412. Cylinder 411 is mounted on platform 1 and extends along the second direction Y; The telescopic rod 412 extends along the second direction Y, with the first end of the telescopic rod 412 extending and retracting inside the cylinder 411, and the second end of the telescopic rod 412 connected to one of the mounting seats 22.
[0061] It should be noted that the two parallel plate mechanisms 2 are the first parallel plate mechanism 8 and the second parallel plate mechanism 9, respectively, and the second end of the telescopic rod 412 is connected to the mounting base 22 of the first parallel plate mechanism 8.
[0062] By driving the telescopic rod 412 to extend and retract using the cylinder 411, the amount of movement of the telescopic rod 412 can be controlled more precisely, thereby controlling the distance the parallel plate mechanism 2 moves more precisely and controlling the spacing parameter variable between the two parallel plate mechanisms 2.
[0063] like Figure 1-2 As shown, in this embodiment, the sliding track 6 further includes two slide rod assemblies 61, which are sequentially mounted on the platform 1 along the first direction X and are respectively located on both sides of the parallel plate mechanism 2 in the second first direction X. The slide bar assembly 61 includes a fixed base 611 and two branch slide bars 612; The fixed base 611 is installed on the platform 1, the branch slide rod 612 extends along the second direction Y, the two branch slide rods 612 are respectively connected to the two sides of the fixed base 611 in the second direction Y, and the two mounting bases 22 slide on the two branch slide rods 612 respectively.
[0064] It should be noted that the mounting bases 22 of the two parallel plate mechanisms 2 slide on the two branch slide rods 612 respectively, and the fixed base 611 between the two branch slide rods 612 can play a limiting role to prevent the two parallel plate mechanisms 2 from moving towards each other and colliding.
[0065] Furthermore, the gear disk 42 is located between the two parallel plate mechanisms 2 in the second direction Y, and the fixed seat 611 is located on one side of the gear disk 42 in the first direction X.
[0066] It should be noted that, in order to prevent the parallel plate mechanism 2 from hitting the gear disk 42 when it slides, a fixed seat 611 is installed on one side of the gear disk 42 in the first direction X. The fixed seat 611 is connected to the branch slide rods 612 extending in the second direction Y on both sides of the fixed seat 611. The mounting seats 22 of the two parallel plate mechanisms 2 slide on the two branch slide rods 612 respectively. Thus, when the parallel plate mechanism 2 slides to contact the fixed seat 611, the fixed seat 611 plays a limiting role, preventing the parallel plate mechanism 2 from continuing to slide and hitting the gear disk 42.
[0067] like Figure 1 As shown, in this embodiment, it further includes: a cleanroom 7, a platform 1, an emission source assembly 3, a moving mechanism 4 and two parallel plate mechanisms 2 are all installed inside the cleanroom 7, and the platform 1 is installed on the inner bottom wall of the cleanroom 7.
[0068] The working process of this invention is as follows: the electrode plate 21 is installed on the flipping assembly 23. In the initial state, the surface of the electrode plate 21 faces downward and the impurity removal roller 25 is located in the first position. When the moving mechanism 4 drives the two mounting seats 22 to move towards each other in the second direction Y, it drives the flipping assembly 23 to flip outward along the first hinge axis 221. The electrode plate 21 flips with the flipping assembly 23 to a plane perpendicular to the second direction Y. The emission source assembly 3 injects positive and negative charges into the two electrode plates 21 on both sides of the second direction Y, respectively. At this time, a quantum electric field can be generated between the two electrode plates 21 for testing.
[0069] As the electrode plate 21 is flipped by the flipping assembly 23 to a plane perpendicular to the second direction Y, the flipping assembly 23 drives the impurity removal drive assembly 24 to drive the impurity removal roller 25 to move from the first position to the second position along the surface of the electrode plate 21, cleaning the surface of the electrode plate 21, effectively reducing the adhesion of charged particles to the electrode plate 21, and improving the accuracy of measuring the electric field value. After the quantum electric field test is completed, the moving mechanism 4 drives the two mounting seats 22 to move in opposite directions in the second direction Y, which drives the flipping component 23 to flip back inward along the first hinge axis 221. During the process of the electrode plate 21 returning to the initial state, the flipping component 23 drives the impurity removal drive component 24 to drive the impurity removal roller 25 to move from the second position to the first position along the surface of the electrode plate 21, and cleans the surface of the electrode plate 21 again. After cleaning, the electrode plate 21 returns to the initial state with the surface facing down, which can also effectively prevent charged particles from adhering to the surface of the electrode plate 21.
[0070] In summary, the embodiments of the present invention provide a plate-based quantum electric field measurement device, which can effectively reduce the adhesion of charged particles to the plate and improve the accuracy of the measured electric field value.
[0071] The above are merely preferred embodiments of the present invention. It should be noted that those skilled in the art can make several improvements and substitutions without departing from the technical principles of the present invention, and these improvements and substitutions should also be considered within the scope of protection of the present invention.
Claims
1. A quantum electric field measurement device based on electrodes, characterized in that, include: platform; Two parallel plate mechanisms are disposed on the platform and move towards each other in a second direction. Each parallel plate mechanism includes an electrode plate, a mounting base, and a flipping assembly. The electrode plate is mounted on the flipping assembly. The flipping assembly and the mounting base are connected by a first hinge shaft extending in a first direction. A cleaning mechanism is mounted on the flipping assembly. The cleaning mechanism includes a cleaning drive assembly and a cleaning roller. The flipping assembly is driven by the cleaning drive assembly, and the cleaning drive assembly is driven by the cleaning roller. The cleaning roller is used to move along the surface of the electrode plate between a first position and a second position. A transmitter assembly is mounted on the platform and is located on the central axis between the two pole plates in a second direction; A moving mechanism is mounted on the platform and is connected to the mounting base via a transmission mechanism. The moving mechanism is used to drive the two mounting bases to move towards or away from each other in a second direction. The first direction and the second direction intersect each other perpendicularly.
2. The quantum electric field measuring device according to claim 1, characterized in that, The impurity removal driving component includes: A pendulum extending along a first direction; A rotation drive component is mounted on the flipping assembly and connected to the swing arm. The rotation drive component is used to drive the swing arm to rotate. A swing arm, the first end of which is connected to the swing rod, and the second end of which is connected to the impurity removal roller.
3. The quantum electric field measuring device according to claim 2, characterized in that, The self-rotation drive component includes: A conveying component, the conveying component including a main turntable, a slave turntable and a conveyor belt; The rotation axis of the main turntable extends along a first direction and is mounted on the flipping assembly. The slave turntable is sleeved on the swing arm, and the conveyor belt is wound around the main turntable and the slave turntable.
4. The quantum electric field measuring device according to claim 3, characterized in that, The conveying component is provided in two parts, which are arranged at intervals along the first direction, and the axes of rotation of the two main turntables are on the same straight line extending along the first direction.
5. The quantum electric field measuring device according to claim 3, characterized in that, The flipping component includes: A fixing frame includes a baffle and two upright plates. The upright plates are parallel to a second direction and a third direction. The two upright plates are arranged alternately along a first direction. The baffle is parallel to the first direction and a third direction. The baffle is connected to the two upright plates on both sides of the first direction. A rotating frame is provided with a limiting hole extending along a first direction. The limiting hole extends along the length direction of the rotating frame. A first hinge shaft is mounted on the mounting base and passes through the limiting hole. A second hinge shaft extending along the first direction is provided at one end of the rotating frame away from the mounting base. The two ends of the second hinge shaft pass through the two vertical plates respectively. The rotation axis of the main turntable is connected to the second hinge shaft. An assembly component is provided, which is connected to the rotating frame and the swing arm, and the pole plate is mounted on the assembly component. The first direction, the second direction, and the third direction intersect each other perpendicularly.
6. The quantum electric field measuring device according to claim 5, characterized in that, One end of the second hinge shaft is fitted with a bushing, and the rotation shaft of the main turntable is connected with a connecting pin, which is inserted into the bushing.
7. The quantum electric field measuring device according to claim 5, characterized in that, The assembly components include: An assembly frame is connected to one end of the rotating frame near the second hinge shaft. The bottom surface of the end of the assembly frame near the second hinge shaft has an inwardly recessed first snap-fit groove, which fits with the impurity removal roller. The electrode plate is installed on the bottom surface of the assembly frame. Two roller frames are respectively installed on both sides of the assembly frame in a first direction. The roller frames are provided with rolling holes extending in the first direction. The two ends of the swing arm pass through the two rolling holes and are connected to the swing arm. The bottom surface of the roller frame away from the flipping assembly is provided with an inwardly recessed second locking groove, which fits with the impurity removal roller.
8. The quantum electric field measuring device according to claim 2, characterized in that, The swing arm has a through hole extending along a first direction. The through hole extends along the length of the swing arm. A spring rod and a bearing are installed in the through hole. The first end of the spring rod is fixed to the inner wall of the through hole near the swing arm. The second end of the spring rod is connected to the bearing. The bearing extends along the first direction. The two ends of the impurity removal roller are rotatably connected to the bearings on the two swing arms, respectively.
9. The quantum electric field measuring device according to claim 1, characterized in that, The moving mechanism includes a moving drive assembly, a gear disk, and two racks; The motion drive component is mounted on the platform, the motion drive component is connected to one of the mounting bases, and the motion drive component is used to drive the connected mounting base to move in a second direction. The rack extends along the second direction, and the two racks are respectively located on both sides of the parallel plate mechanism in the first direction, with the teeth of the two racks facing each other in the first direction; The rotation axis of the gear disk extends along a third direction and is mounted on the platform. The gear disk is located between the two racks in a first direction and is meshed with the two racks respectively. The flipping assembly is connected to a sliding sleeve, and the sliding sleeves connected to the two flipping assemblies are respectively fixedly sleeved on the two racks; The first direction, the second direction, and the third direction intersect each other perpendicularly.
10. The quantum electric field measuring device according to claim 1, characterized in that, Also includes: A sliding track extends along a second direction and is mounted on the platform, and the mounting base slides on the sliding track.
