In-vacuum Hall measurement system for in-vacuum undulator

Abstract

The invention belongs to the technical field of magnetic variable measurement, and provides an in-vacuum Hall measurement system for an in-vacuum undulator, which solves the technical problem of poor magnetic field measurement precision caused by single attitude adjustment of an existing Hall measurement system. The in-vacuum Hall measurement system for the in-vacuum undulator comprises a vacuum chamber, a Hall probe and a motion executing mechanism, the motion executing mechanism comprises a guide rail and a pose adjusting mechanism, the Hall probe can move in the extending direction of the guide rail, and the pose adjusting mechanism drives the Hall probe to move in a three-dimensional mode through the guide rail to measure magnetic field distribution. The pose adjusting mechanism comprises a platform swinging around the Z direction so as to adjust the pitch angle of the guide rail; swinging the platform around the Y direction to adjust the overturning angle of the guide rail; a Y-direction moving platform, an X-direction moving platform and a Z-direction moving platform. According to the invention, the attitude in two directions and the position in three directions in the space can be adjusted, the parasitic displacement is reduced, the Hall probe is enabled to perform three-dimensional motion in the undulator, and the magnetic field measurement precision is improved.

Description

TECHNICAL FIELD

[0001] The present application generally relates to the technical field of magnetic variable measurement, and in particular to an in-vacuum Hall measurement system for an in-vacuum undulator. BACKGROUND

[0002] An in-vacuum undulator (IVU) is a core key component in modern advanced light sources. Compared with traditional external undulators, the biggest feature of the in-vacuum undulator is that the magnet array is directly installed in the vacuum cavity, which makes the magnetic pole gap very small, usually in the order of millimeters, or even smaller. Such a super-small magnetic gap can significantly enhance the magnetic field strength. According to the relationship between the undulator radiation wavelength and the magnetic field strength, higher energy and higher brightness hard X-rays can be generated, which greatly expands the application range of the light source, and plays an irreplaceable role in the fields of biological macromolecular crystallography, material science, nanotechnology, etc.

[0003] In the related art, the magnetic measurement system of the in-vacuum undulator controls the Hall probe to move in three dimensions through a motion platform, but the motion platform in the related art cannot adjust the attitude or only has a single attitude adjustment example, which makes it difficult to completely adjust the correct attitude of the Hall probe, thereby resulting in poor magnetic field measurement accuracy. SUMMARY

[0004] In view of the above defects or deficiencies in the prior art, it is desirable to provide an in-vacuum Hall measurement system for an in-vacuum undulator, which can adjust the attitude of the guide rail pick rod in two directions in space and the position adjustment in three directions, while minimizing the parasitic displacement caused by attitude adjustment, thereby enabling the Hall probe to move in three dimensions in the undulator, and further improving the magnetic field measurement accuracy.

[0005] In a first aspect, the present application provides an in-vacuum Hall measurement system for an in-vacuum undulator, characterized in that it comprises: a vacuum chamber, a Hall probe installed in the vacuum chamber, and a motion execution mechanism, the motion execution mechanism comprising a guide rail and a pose adjustment mechanism, the guide rail being installed in the vacuum chamber and the Hall probe being movable along the extension direction of the guide rail, the pose adjustment mechanism being connected with the guide rail for adjusting the position and attitude of the guide rail to drive the Hall probe to move in three dimensions in the vacuum chamber, the Hall probe being used for collecting the three-dimensional magnetic field distribution of the undulator, and the pose adjustment mechanism comprising: a guide rail pick rod, the guide rail pick rod extending into the vacuum chamber and being connected with the guide rail; an attitude adjustment unit, the attitude adjustment unit comprising: a Z-axis swing platform, the Z-axis swing platform being fixedly connected with the guide rail pick rod and driving the guide rail pick rod to rotate around a first axis to adjust the pitch angle of the guide rail; The around-Y swing platform is connected with the around-Z swing platform and the around-Z swing platform is fixedly connected with the around-Z swing platform, and the around-Z swing platform can drive the guide rail lifting lever to rotate around the second axis to adjust the overturning angle of the guide rail; the first axis and the second axis intersect with the axis of the guide rail lifting lever; The position adjusting unit comprises: The Y-direction moving platform is connected with the around-Y swing platform, drives the attitude adjusting unit to move along the Y direction, and adjusts the position of the guide rail in the Y direction; The X-direction moving platform is connected with the Y-direction moving platform, drives the Y-direction moving platform and the attitude adjusting unit to move along the X direction, and adjusts the position of the guide rail in the X direction; The Z-direction moving platform is connected with the X-direction moving platform, drives the X-direction moving platform, the Y-direction moving platform and the attitude adjusting unit to move along the Z direction, and adjusts the position of the guide rail in the Z direction.

[0006] As an optional solution, the around-Z swing platform comprises: The first base has an arc-shaped first matching surface; The first moving gland is installed on the first base, and an arc-shaped groove is formed on the first moving gland, and the arc-shaped groove has a second matching surface; The first support frame is fixedly connected with the guide rail lifting lever; The second moving gland is installed on the first support frame, and an arc-shaped guide rail is formed on the region close to the first moving gland of the second moving gland, the arc-shaped guide rail has opposite third and fourth matching surfaces, the arc-shaped guide rail is located in the arc-shaped groove, the first matching surface and the third matching surface are slidingly matched in the arc surface extension direction, and the second matching surface and the fourth matching surface are slidingly matched; The first power mechanism comprises a first driving motor, an adjusting fork and an adjusting baffle, the adjusting fork is fixedly connected with the first support frame, and the adjusting fork has an adjusting cavity, the adjusting baffle is located in the adjusting cavity, the adjusting baffle is fixedly connected with the first base, the adjusting baffle is drivingly connected with the output end of the first driving motor, the first driving motor drives the adjusting baffle to move in the adjusting cavity, drives the first support frame and the guide rail lifting lever to rotate around the first axis, and adjusts the pitch angle of the guide rail; The output end of the first driving motor is connected with a jacking rod, and the end surface of the jacking rod is in point contact with the surface of the adjusting baffle.

[0007] As an optional solution, a plurality of locking bolts are further arranged between the adjusting fork and the adjusting baffle, the plurality of locking bolts are uniformly distributed on opposite sides of the adjusting baffle, each locking bolt is in threaded connection with the adjusting fork, and the end of each locking bolt extends into the adjusting cavity, the end surface of the locking bolt is in point contact with the surface of the adjusting baffle, so as to fix the moving position of the adjusting baffle.

[0008] As an optional solution, the Y-direction swing platform comprises: An adjusting slider is fixedly connected with the Z-direction swing platform, the adjusting slider has opposite first and second arc surfaces, a part of the first arc surface is recessed towards the second arc surface, a matching groove and an adjusting platform are formed on the adjusting slider, and the abutting surfaces of the matching groove and the adjusting platform are arc surfaces; A second base is provided with an adjusting plate, the second base further has a fifth matching surface in sliding cooperation with the first arc surface, the adjusting plate comprises an abutting matching platform and an adjusting groove, the contour of the matching platform is the same as that of the matching groove, the contour of the adjusting groove is the same as that of the adjusting platform, the adjusting slider cooperates with the adjusting plate, the matching platform and the matching groove are in sliding cooperation in the extension direction of the arc surface, the adjusting platform and the adjusting groove are in sliding cooperation in the extension direction of the arc surface, and the first arc surface of the adjusting slider is slidable along the fifth matching surface of the second base; A second power mechanism comprises a second driving motor and a transmission member in driving connection with the second driving motor, the second driving motor is installed on the second base, the transmission member is connected with the adjusting slider, and the adjusting slider is driven to slide on the second base to adjust the overturning angle of the guide rail.

[0009] As an optional solution, the transmission member comprises a worm gear and a worm in meshing cooperation, one of the worm gear and the worm is in driving connection with the second driving motor, and the other is connected with the adjusting slider; The second base further comprises a hollow mounting platform, the second driving motor is installed on one side of the mounting platform, the output shaft of the second driving motor is located inside the mounting platform, the surface of the mounting platform close to the first arc surface is configured as the fifth matching surface, an arc-shaped hole is formed in the fifth matching surface, and the worm gear and the worm are in meshing cooperation at the arc-shaped hole.

[0010] As an optional solution, the Y-direction moving platform comprises: A lifting platform is fixedly connected with the Y-direction swing platform, and the lifting platform has an inclined surface; A fixed platform is oppositely arranged with the lifting platform, the surface of the fixed platform facing the lifting platform is an installation surface, a lifting space is formed between the installation surface and the inclined surface, and the inclined surface is inclined away from the installation surface; The third power mechanism comprises a third driving motor, a first guide rail, a trapezoidal screw, a first sliding block, a second guide rail, a second sliding block and a wedge-shaped connecting block. The third driving motor is in driving connection with the trapezoidal screw. The trapezoidal screw is connected with the first sliding block. The first sliding block is in sliding fit with the first guide rail. The first guide rail is installed on the mounting surface. The second guide rail is installed on the inclined surface. The extending direction of the second guide rail is the same as the inclined direction of the inclined surface. The second sliding block is in sliding fit with the second guide rail. The wedge-shaped connecting block is fixedly connected with the first sliding block and the second sliding block respectively.

[0011] As an optional solution, the Y-direction moving platform further comprises a limiting mechanism, the limiting mechanism comprising: The third guide rail and a third sliding block slidingly connected with the third guide rail. The lifting platform has a Y-direction side surface parallel to the Y direction. The third guide rail is fixedly installed on the Y-direction side surface and extends along the Y direction. A fixed plate is located on one side of the Y-direction side surface and fixedly connected with the fixed platform. The fixed plate is fixedly connected with the third sliding block.

[0012] As an optional solution, the Y-direction moving platform further comprises a first grating ruler. The first grating ruler comprises a body, a reading head and a bracket. The body is fixed on the fixed plate. A long hole is formed on the fixed plate along the Y direction. One end of the bracket passes through the long hole and is connected with the lifting platform. The other end of the bracket is provided with the reading head. The reading head is in contact with the body. The lifting platform can drive the reading head to move along the extending direction of the long hole.

[0013] As an optional solution, the X-direction moving platform comprises: A first sliding plate is fixedly connected with the Y-direction moving platform. A fourth base; A fourth power mechanism is installed on the fourth base. The fourth power mechanism comprises a fourth driving motor, a fourth guide rail, a fourth screw and a fourth sliding block. The fourth guide rail extends along the X direction. The fourth driving motor and the fourth screw are in driving connection. The fourth screw is connected with the fourth sliding block. The fourth sliding block is in sliding fit with the fourth guide rail. The fourth sliding block is fixedly connected with the first sliding plate. A second grating ruler is installed on the fourth base. The reading head of the second grating ruler is connected with the first sliding plate. A Z-direction moving platform comprises: A second sliding plate is fixedly connected with the X-direction moving platform. A fifth base; A fifth power mechanism is installed on the fifth base. The fifth power mechanism comprises a fifth driving motor, a fifth guide rail, a fifth screw and a fifth sliding block. The fifth guide rail extends along the Z direction. The fifth driving motor and the fifth screw are in driving connection. The fifth screw is connected with the fifth sliding block. The fifth sliding block is in sliding fit with the fifth guide rail. The fifth sliding block is fixedly connected with the second sliding plate. The third grating ruler is installed on the fifth base, and a reading head of the third grating ruler is connected with the second sliding plate.

[0014] The fourth base and the fifth base are further provided with locking mechanisms, respectively, which are connected with the first sliding plate and the second sliding plate, respectively, for locking the positions of the first sliding plate and the second sliding plate.

[0015] As an optional solution, the vacuum Hall measurement system for the in-vacuum undulator further comprises: an upper force sensing mounting seat, a lower force sensing mounting seat, an upper support rod, a lower support rod and a sealing pipe, the upper support rod and the lower support rod are fixedly connected with the guide rail cantilever, the upper support rod is installed on the upper force sensing mounting seat, the lower support rod is installed on the lower force sensing mounting seat, the upper force sensing mounting seat and the lower force sensing mounting seat are fixedly installed on opposite sides of the first support frame, the sealing pipe is sleeved outside the guide rail cantilever, one end of the guide rail cantilever extends into the vacuum chamber, and the guide rail cantilever is in sealing connection with the contact position of the vacuum chamber.

[0016] The vacuum Hall measurement system for the in-vacuum undulator of the present application, the guide rail cantilever is connected with the guide rail in the vacuum chamber, the Hall probe moves along the guide rail, the pitch angle of the guide rail can be reliably adjusted by the Z-direction swing platform, the roll angle of the guide rail can be reliably adjusted by the Y-direction swing platform, and the axis of Z-direction swing and the axis of Y-direction swing intersect with the axis of the guide rail cantilever, thereby reliably reducing the parasitic displacement generated by the attitude adjustment and improving the attitude adjustment accuracy; and the Y-direction moving platform, the X-direction moving platform and the Z-direction moving platform can respectively adjust the Y-direction position, the X-direction position and the Z-direction position of the guide rail cantilever, thereby improving the freedom degree of the position and attitude adjustment of the guide rail cantilever, improving the adjustment freedom degree of the position and attitude of the guide rail and the Hall probe, and being beneficial to timely compensating the motion error of the Hall probe in the process of actually measuring the magnetic field distribution, thereby improving the magnetic field measurement accuracy. BRIEF DESCRIPTION OF DRAWINGS

[0017] Other features, objects and advantages of the present application will become more apparent from the following detailed description of non-limiting embodiments made with reference to the accompanying drawings: Figure 1 A structure schematic view of a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application; Figure 2 A structure schematic view of a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application (remove the vacuum chamber); Figure 3 A cooperation structure schematic view of a guide rail and a position and attitude adjustment mechanism in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application; Figure 4A structural diagram of a guide rail and a Hall probe in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application; Figure 5 A structural diagram of a pose adjustment mechanism in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application; Figure 6 A matching structural diagram of a guide rail pick-up lever in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application; Figure 7 A structural diagram of a Z-direction swing platform in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application; Figure 8 A structural diagram of a first moving gland in a Z-direction swing platform of an embodiment of the present application; Figure 9 A structural diagram of a Z-direction swing platform in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application (remove the first moving gland); Figure 10 A structural diagram of a Y-direction swing platform in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application; Figure 11 A structural diagram of a Y-direction swing platform in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application (remove the adjusting slider); Figure 12 A structural diagram of an adjusting slider in a Y-direction swing platform of an embodiment of the present application; Figure 13 A structural diagram of a first view angle of a Y-direction moving platform in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application; Figure 14 A structural diagram of a second view angle of a Y-direction moving platform in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application; Figure 15 A structural diagram of a third view angle of a Y-direction moving platform in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application; Figure 16 A structural diagram of a Y-direction moving platform in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application (remove the fixed plate); Figure 17 A structural diagram of an X-direction moving platform in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application; Figure 18A structural diagram of a Z-direction moving platform in a vacuum internal Hall measurement system for an internal undulator of the application.

[0018] In the figure, 1, vacuum chamber, 2, guide rail, 3, Hall probe; 1000, vacuum internal Hall measurement system; 2000, pose adjustment mechanism; 2100, guide rail jib, 2200, base, 2300, support leg; 100, Z-direction swing platform, 110, first base, 111, first side plate, 112, second side plate, A1, first matching surface, 113, first moving gland, 114, arc-shaped groove, A2, second matching surface; 120, first support frame, 121, second moving gland, 123, arc-shaped guide rail, A3, third matching surface, A4, fourth matching surface, 130, first drive motor, 131, adjustment fork, 132, adjustment baffle, B1, adjustment cavity, 133, jacking rod, 134, locking bolt; 200, Y-direction swing platform, 210, adjusting slide block, C1, first arc surface, C2 second arc surface, 211, matching groove, 212, adjusting table, 220, second base, 221, adjusting plate, A5, fifth matching surface, 225, matching table, 222, adjusting groove, 223, mounting table, 224, arc-shaped hole, 230, second drive motor; 300, Y-direction moving platform, 310, lifting table, 311, Y-direction side surface, D1, inclined surface, 320, fixed table, D2, mounting surface, 330, third drive motor, 331, first guide rail, 332, trapezoidal lead screw, 333, first slide block, 334, second guide rail, 335, second slide block, 336, wedge-shaped connecting block, 340, third guide rail, 341, third slide block, 350, fixed plate, 360, first grating ruler, 361, body, 362, reading head, 363, bracket, 364, long hole; 400, X-direction moving platform, 410, first sliding plate, 420, fourth base, 430, fourth drive motor, 431, fourth guide rail, 432, fourth lead screw, 433, fourth slide block, 440, second grating ruler; 500, Z-direction moving platform, 510, second sliding plate, 520, fifth base, 530, fifth drive motor, 531, fifth guide rail, 532, fifth lead screw, 533, fifth slide block, 540, third grating ruler; 600, locking clamp, 610, fixed seat, 620, support shaft, 630, handle; 700, upper force sensing mounting seat, 710, lower force sensing mounting seat, 720, upper support rod, 730, lower support rod, 740, sealing tube. Detailed Implementation

[0019] The present application will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and not intended to limit it. Furthermore, it should be noted that, for ease of description, only the parts relevant to the invention are shown in the accompanying drawings.

[0020] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other. This application will now be described in detail with reference to the accompanying drawings and embodiments.

[0021] In related technologies, after the guide rail support structure is installed, the geometric parameters of the guide rail in the vacuum chamber are tested. If they are not up to standard, the pose of several support structures needs to be adjusted. Due to the unreasonable configuration of the adjustment mechanism in related technologies, parasitic displacements will occur during attitude adjustment. For example, in actual operation, adjusting the roll angle will affect the already adjusted Y-axis position. This coupling effect increases the difficulty of fine adjustment, requiring operators to make repeated iterative adjustments, and it relies heavily on the operator's experience, resulting in low work efficiency and poor magnetic field measurement accuracy.

[0022] Based on the above issues, such as Figures 1-18 As shown, an embodiment of this application provides a vacuum Hall effect measurement system 1000 for a vacuum undulator, comprising: a vacuum chamber 1, a Hall probe 3 installed in the vacuum chamber 1, and a motion actuator. The motion actuator includes a guide rail 2 and a position adjustment mechanism 2000. The guide rail 2 is installed in the vacuum chamber 1, and the Hall probe 3 can move along the extension direction of the guide rail 2. The position adjustment mechanism 2000 is connected to the guide rail 2 to adjust the position and orientation of the guide rail 2, thereby driving the Hall probe 3 to move in three dimensions within the vacuum chamber 1. The Hall probe 3 is used to collect the three-dimensional magnetic field distribution of the undulator. The position adjustment mechanism 2000 includes: The guide rail lever 2100 is located outside the vacuum chamber 1 and extends into the vacuum chamber 1 to connect with the guide rail 2. Attitude adjustment unit, the attitude adjustment unit includes: The Z-axis swing platform 100 is fixedly connected to the guide rail cantilever 2100, and can drive the guide rail cantilever 2100 to rotate around the first axis to adjust the pitch angle of the guide rail 2. The Y-axis swing platform 200 and the Z-axis swing platform 100 are fixedly connected. The Z-axis swing platform 100 can be rotated around the second axis to drive the guide rail lever 2100 to rotate around the second axis, thereby adjusting the flip angle of the guide rail 2. The first axis and the second axis intersect with the axis of the guide rail lever 2100. Position adjustment unit, the position adjustment unit includes: The Y-direction moving platform 300 is connected with the Y-direction swing platform 200, and drives the attitude adjustment unit to move along the Y direction, so as to adjust the position of the guide rail 2 in the Y direction. The X-direction moving platform 400 is connected with the Y-direction moving platform 300, and drives the Y-direction moving platform 300 and the attitude adjustment unit to move along the X direction, so as to adjust the position of the guide rail 2 in the X direction. The Z-direction moving platform 500 is connected with the X-direction moving platform 400, and drives the X-direction moving platform 400, the Y-direction moving platform 300 and the attitude adjustment unit to move along the Z direction, so as to adjust the position of the guide rail 2 in the Z direction.

[0023] It can be understood that, as shown in Figure 1 , Figure 2 , Figure 3 , Figure 4 and Figure 5 , the connection between the guide rail jib 2100 and the vacuum chamber 1 is a sealed connection, as long as the movement of the guide rail jib 2100 can drive the guide rail 2 to move. Figure 4 As shown in , the Hall probe 3 is installed on the guide rail 2 in the vacuum chamber 1, and can move freely along the extension direction of the guide rail 2. The guide rail jib 2100 is driven by the pose adjustment mechanism 2000 to move the guide rail 2, so that the Hall probe 3 can rotate around the Z direction, rotate around the Y direction, move along the Y direction, move along the Z direction and move along the X direction in the vacuum chamber 1, thereby improving the movement adjustment degree of freedom of the Hall probe 3, collecting more Hall voltage data in more directions, and further improving the absolute accuracy of the magnetic field measurement, and improving the reliability and repeatability of the measurement results.

[0024] As shown in Figure 6 , the vacuum Hall measurement system further comprises an upper force sensing mounting seat 700, a lower force sensing mounting seat 710, an upper support rod 720, a lower support rod 730 and a sealing pipe 740. The upper support rod 720 and the lower support rod 730 are fixedly connected with the guide rail jib 2100, and the upper support rod 720 is installed on the upper force sensing mounting seat 700, and the lower support rod 730 is installed on the lower force sensing mounting seat 710. The upper force sensing mounting seat 700 and the lower force sensing mounting seat 710 are fixedly installed on the opposite sides of the Z-direction swing platform 100 respectively. The sealing pipe 740 is sleeved outside the guide rail jib 2100. One end of the guide rail jib 2100 extends into the vacuum chamber 1, and the contact between the guide rail jib 2100 and the vacuum chamber 1 is sealed.

[0025] The vacuum inner Hall measurement system for the vacuum inner undulator of the embodiment of the present application solves the problem of the existing Hall measurement system and the single attitude adjustment. The guide rail jib 2100 of the embodiment of the present application is connected with the guide rail 2 in the vacuum chamber 1, the Hall probe 3 moves along the guide rail 2, the pitch angle of the guide rail 2 can be reliably adjusted through the Z-direction swing platform 100, the roll angle of the guide rail 2 can be reliably adjusted through the Y-direction swing platform 200, and the axis of the Z-direction swing and the axis of the Y-direction swing intersect with the axis of the guide rail jib 2100 (that is, the first axis and the second axis intersect with the axis of the guide rail jib 2100 at a point on the guide rail jib 2100), thereby reliably reducing the parasitic displacement generated by the attitude adjustment and improving the attitude adjustment accuracy; and the Y-direction moving platform 300, the X-direction moving platform 400 and the Z-direction moving platform 500 can respectively adjust the position of the guide rail jib 2100 in the Y-direction, the position of the guide rail jib 2100 in the X-direction and the position of the guide rail jib 2100 in the Z-direction, thereby improving the position adjustment degree of freedom of the guide rail jib 2100 and improving the position and attitude adjustment degree of freedom of the guide rail 2 and the Hall probe 3, which is beneficial to timely compensate for the movement error of the Hall probe in the actual measurement of the magnetic field distribution and improve the magnetic field measurement accuracy.

[0026] In some embodiments, as shown in Figure 7 、 Figure 8 and Figure 9 , the Z-direction swing platform 100 comprises: a first base 110, the first base 110 has an arc-shaped first matching surface A1; a first movable gland 113, the first movable gland 113 is installed on the first base 110, and an arc-shaped groove 114 is formed on the first movable gland 113, the arc-shaped groove 114 has a second matching surface A2; a first support frame 120, the first support frame 120 is fixedly connected with the guide rail jib 2100; a second movable gland 121, the second movable gland 121 is installed on the first support frame 120, and an arc-shaped guide rail 123 is formed in the area close to the first movable gland 113 of the second movable gland 121, the arc-shaped guide rail 123 has opposite third and fourth matching surfaces A3 and A4, the arc-shaped guide rail 123 is located in the arc-shaped groove 114, the first matching surface A1 and the third matching surface A3 are in sliding fit in the arc surface extension direction thereof, and the second matching surface A2 and the fourth matching surface A4 are in sliding fit; The first power mechanism comprises a first driving motor 130, an adjusting fork 131 and an adjusting baffle 132. The adjusting fork 131 is fixedly connected with the first supporting frame 120 and has an adjusting cavity B1. The adjusting baffle 132 is located in the adjusting cavity B1 and is fixedly connected with the first base 110. The adjusting baffle 132 is drivingly connected with an output end of the first driving motor 130. The first driving motor 130 drives the adjusting baffle 132 to move in the adjusting cavity B1, drives the first supporting frame 120 and the guide rail cantilever 2100 to rotate around the first axis, and adjusts the pitch angle of the guide rail 2. The output end of the first driving motor 130 is connected with a jacking rod 133. An end surface of the jacking rod 133 is in point contact with a surface of the adjusting baffle 132.

[0027] The first base 110 can comprise two opposite first side plates 111 and second side plates 112. An arc-shaped first matching surface A1 is formed on each of the first side plates 111 and the second side plates 112. A first moving gland 113 is fixedly connected to each of the first side plates 111 and the second side plates 112. An arc-shaped groove 114 is formed on the first moving gland 113, so that the first moving gland 113 has the function of a sliding block. The arc-shaped groove 114 is recessed in a direction away from the first side plate 111 or the second side plate 112. A second matching surface A2 is formed on the groove bottom of the arc-shaped groove 114. The sidewall of the arc-shaped groove 114 is fixedly connected with the first side plate 111 or the second side plate 112. A wear-resistant sheet can be arranged on the surface of the arc-shaped groove 114 in contact with the arc-shaped guide rail 123.

[0028] The first supporting frame 120 is mainly used for supporting the guide rail cantilever 2100. An arc-shaped guide rail 123 is formed on the area of the first supporting frame 120 close to the first side plate 111 or the second side plate 112. A third matching surface A3 is formed on the side of the arc-shaped guide rail 123 close to the first matching surface A1. A fourth matching surface A4 is formed on the side opposite to the third matching surface A3. The arc-shaped guide rail 123 is located in the arc-shaped groove 114. The first driving motor 130 can be a servo motor. The servo motor drives the jacking rod 133 to extend or retract, applies force to the adjusting baffle 132, drives the first moving gland 113 to slide along the arc-shaped guide rail 123 of the second moving gland 121, and drives the first supporting frame 120 to rotate around the first axis, so as to adjust the pitch angle of the guide rail 2 and the Hall probe 3.

[0029] In the preferred embodiment, a plurality of locking bolts 134 are further arranged between the adjusting fork 131 and the adjusting baffle 132, the plurality of locking bolts 134 are uniformly distributed on opposite sides of the adjusting baffle 132, each locking bolt 134 is threadedly connected with the adjusting fork 131, and the end of each locking bolt 134 extends into the adjusting cavity B1 through the adjusting fork 131, and the end surface of the locking bolt 134 is in point contact with the surface of the adjusting baffle 132 to fix the moving position of the adjusting baffle 132.

[0030] In the embodiment, the arrangement of the locking bolt 134 is conducive to fixing the moving position of the adjusting baffle 132 through the locking bolt 134 in addition to the brake motor locking movement of the servo electrolytic device, so that the posture of the guide rail cantilever 2100 can be further stabilized and fixed; wherein the end surface of the locking bolt 134 is arc-shaped, and the point contact between the locking bolt 134 and the adjusting baffle 132 is conducive to reducing the friction, so that the adjusting baffle 132 can reliably move when needed.

[0031] As an implementable way, as shown in Figure 10 、 Figure 11 and Figure 12 , the Y-direction swing platform 200 comprises: an adjusting slide block 210, the adjusting slide block 210 is fixedly connected with the Z-direction swing platform 100, the adjusting slide block 210 has opposite first and second arc surfaces C1 and C2, a part of the first arc surface C1 is recessed towards the second arc surface C2, a matching groove 211 and an adjusting table 212 are formed on the adjusting slide block 210, and the abutting surfaces of the matching groove 211 and the adjusting table 212 are arc-shaped; a second base 220, the second base 220 has an adjusting plate 221 formed thereon, and the second base 220 further has a fifth matching surface A5 that is in sliding cooperation with the first arc surface C1, the adjusting plate 221 comprises an abutting matching table 225 and an adjusting groove 222, the profile of the matching table 225 is the same as that of the matching groove 211, and the profile of the adjusting groove 222 is the same as that of the adjusting table 212, the adjusting slide block 210 cooperates with the adjusting plate 221, the matching table 225 and the matching groove 211 are in sliding cooperation in the extension direction of the arc surface, the adjusting table 212 and the adjusting groove 222 are in sliding cooperation in the extension direction of the arc surface, and the first arc surface C1 of the adjusting slide block 210 is slidable along the fifth matching surface A5 of the second base 220; a second power mechanism, the second power mechanism comprises a second driving motor 230 and a transmission member that is drivingly connected with the second driving motor 230, the second driving motor 230 is installed on the second base 220, the transmission member is connected with the adjusting slide block 210 to drive the adjusting slide block 210 to slide on the second base 220, so as to adjust the overturning angle of the guide rail 2.

[0032] In the preferred embodiment, the transmission member comprises a worm gear and a worm, one of which is drivingly connected with the second driving motor 230, and the other is connected with the adjusting slide 210; The second base 220 further comprises a hollow mounting table 223, the second driving motor 230 is mounted on one side of the mounting table 223, and the output shaft of the second driving motor 230 is located inside the mounting table 223. The surface of the mounting table 223 close to the first arc surface C1 is configured as a fifth matching surface A5, and an arc-shaped hole 224 is formed on the fifth matching surface A5, and the worm gear and the worm are engaged at the arc-shaped hole 224.

[0033] It can be understood that the adjusting slide 210 is fixedly connected with the first base 110 described above, so that the adjusting slide 210 is fixedly connected with the Z-direction swing platform and can drive the Z-direction swing platform to swing as a whole around the Y-direction swing platform. The adjusting slide 210 can be approximately quadrilateral, and the opposite two sides are respectively the first arc surface C1 and the second arc surface C2. In the thickness direction of the adjusting slide 210, part of the first arc surface C1 is recessed to form a matching groove 211 and an adjusting table 212. The adjusting plate 221 and the adjusting slide 210 are matched, that is, the matching groove 211 and the matching table 225 are matched, and the adjusting table 212 and the adjusting groove 222 are matched. The surface where the matching groove 211 and the matching table 225 contact can also be provided with an abrasion-reducing sheet to facilitate the mutual sliding of the adjusting plate 221 and the adjusting slide 210. Due to the existence of the arc surface, the adjusting slide 210 can drive the Y-direction swing platform 200 and the guide rail cantilever 2100 to rotate around the second axis.

[0034] The second driving motor 230 can be a servo motor, the output shaft of the servo motor extends into the mounting cavity to drive the worm gear and the worm to slide the adjusting slide 210 at the arc-shaped hole 224. The arc-shaped hole 224 extends along the arc-shaped extension direction of the fifth matching surface A5.

[0035] Of course, in some embodiments, the transmission member can also be other gear mechanisms. In addition to the lock-up motion of the servo motor realized by the equipped brake, a mechanical lock-up structure can also be provided between the adjusting slide 210 and the second base 220. For example, the lock-up structure can comprise a lock-up hole formed on the second base 220, a pin shaft inserted into the lock-up hole, and the pin shaft and the adjusting slide 210 are limited relative to each other, so as to fix the position of the adjusting slide.

[0036] In some embodiments, a high-precision arc-shaped grating ruler can also be provided between the adjusting slide 210 and the second base 220. The high-precision arc-shaped grating ruler cooperates with the high-precision encoder equipped on the servo motor to feedback the motion parameters, so as to improve the motion precision.

[0037] As an implementable way, as Figure 13 , Figure 14 , Figure 15 and Figure 16As shown, the Y-direction moving platform 300 comprises: a lifting platform 310 fixedly connected with the Y-direction swing platform 200, the lifting platform 310 having an inclined surface D1; a fixed platform 320 oppositely arranged with the lifting platform 310, a surface of the fixed platform 320 facing the lifting platform 310 being a mounting surface D2, and a lifting space being formed between the mounting surface D2 and the inclined surface D1, the inclined surface D1 being inclined towards a direction away from the mounting surface D2; a third power mechanism comprising a third driving motor 330, a first guide rail 331, a trapezoidal screw 332, a first sliding block 333, a second guide rail 334, a second sliding block 335 and a wedge-shaped connecting block 336, the third driving motor 330 being drivingly connected with the trapezoidal screw 332, the trapezoidal screw 332 being connected with the first sliding block 333, the first sliding block 333 being slidingly fitted with the first guide rail 331, the first guide rail 331 being mounted on the mounting surface D2, the second guide rail 334 being mounted on the inclined surface D1, and an extending direction of the second guide rail 334 being the same as an inclined direction of the inclined surface D1, the second sliding block 335 being slidingly fitted with the second guide rail 334, and the wedge-shaped connecting block 336 being fixedly connected with the first sliding block 333 and the second sliding block 335 respectively.

[0038] In a preferred embodiment, as shown in Figure 15 and Figure 16 the Y-direction moving platform 300 further comprises a limiting mechanism comprising: a third guide rail 340 and a third sliding block 341 slidingly connected with the third guide rail 340, the lifting platform 310 having a Y-direction side surface 311 parallel to the Y-direction, the third guide rail 340 being fixedly mounted on the Y-direction side surface 311 and extending along the Y-direction; a fixed plate 350 located on one side of the Y-direction side surface 311 and fixedly connected with the fixed platform 320, the fixed plate 350 being fixedly connected with the third sliding block 341.

[0039] It is understood that the lifting platform 310 and the second base 220 are fixedly connected, and the inclined surface of the wedge-shaped connecting block 336 is fixedly connected to the second slider 335 located on the second guide rail 334. The third drive motor 330 can be a servo motor. The servo motor drives the trapezoidal lead screw 332 to move the first slider 333 along the first guide rail 331, thereby moving the second slider 335 along the second guide rail 334. Due to the inclined surface D1 of the lifting platform 310 and the inclined setting of the second guide rail 334, the lifting platform 310 can move. Furthermore, since the fixed plate 350 and the fixed platform 320 are fixedly connected, the third guide rail 340 is fixed on the Y-direction side 311 of the lifting platform 310, and the third slider 341 that slides on the third guide rail 340 is fixedly connected to the fixed plate 350. This restricts the lifting platform 310 to only move in the Y-direction. On the one hand, this avoids movement in other directions, reduces parasitic displacement, and improves adjustment accuracy. On the other hand, the trapezoidal lead screw 332 and the wedge-shaped connecting block 336 improve adjustment accuracy and also help reduce costs.

[0040] In a preferred embodiment, such as Figure 16 As shown, the Y-axis moving platform 300 also includes: a first grating ruler 360, which includes a body 361, a reading head 362, and a bracket 363. The body 361 is fixed on a fixed plate 350. An elongated hole 364 is provided on the fixed plate 350 along the Y direction. One end of the bracket 363 passes through the elongated hole 364 and is connected to the lifting platform 310. The other end of the bracket 363 is equipped with a reading head 362, which contacts the body 361. The lifting platform 310 can drive the reading head 362 to move along the extension direction of the elongated hole 364.

[0041] In this embodiment, the first grating ruler 360 is used to provide feedback on the actual movement position of the lifting platform 310, which is then fed back to the control system, thus improving the adjustment accuracy. Alternatively, a high-precision encoder can be equipped on the servo motor to work in conjunction with the first grating ruler 360 to detect the movement position of the lifting platform 310.

[0042] In some other embodiments, in addition to the brake mechanism on the servo motor for locking the movement, a mechanical locking structure can be provided between the lifting platform 310 and the first guide rail 331 to stabilize and fix the position of the lifting platform 310.

[0043] In some embodiments, such as Figure 17 As shown, the X-axis mobile platform 400 includes: The first sliding plate 410 is fixedly connected to the Y-axis moving platform 300; Fourth base 420; A fourth power mechanism is installed on the fourth base 420, and the fourth power mechanism comprises a fourth driving motor 430, a fourth guide rail 431, a fourth lead screw 432 and a fourth sliding block 433. The fourth guide rail 431 extends along the X direction. The fourth driving motor 430 is drivingly connected with the fourth lead screw 432. The fourth lead screw 432 is connected with the fourth sliding block 433. The fourth sliding block 433 is slidingly matched with the fourth guide rail 431. The fourth sliding block 433 is fixedly connected with the first sliding plate 410. A second grating ruler 440 is installed on the fourth base 420, and a reading head of the second grating ruler 440 is connected with the first sliding plate 410. As shown in Figure 18 The Z direction moving platform 500 comprises: A second sliding plate 510 is fixedly connected with the X direction moving platform 400. A fifth base 520 is provided. A fifth power mechanism is installed on the fifth base 520, and the fifth power mechanism comprises a fifth driving motor 530, a fifth guide rail 531, a fifth lead screw 532 and a fifth sliding block 533. The fifth guide rail 531 extends along the Z direction. The fifth driving motor 530 is drivingly connected with the fifth lead screw 532. The fifth lead screw 532 is connected with the fifth sliding block 533. The fifth sliding block 533 is slidingly matched with the fifth guide rail 531. The fifth sliding block 533 is fixedly connected with the second sliding plate 510. A third grating ruler 540 is installed on the fifth base 520, and a reading head of the third grating ruler 540 is connected with the second sliding plate 510.

[0044] Locking mechanisms are further provided on the fourth base 420 and the fifth base 520 respectively, and the locking mechanisms are connected with the first sliding plate 410 and the second sliding plate 510 respectively, so as to lock the positions of the first sliding plate 410 and the second sliding plate 510.

[0045] It can be understood that the second grating ruler 440 and the third grating ruler 540 can be used to feedback the movement displacement of the first sliding plate 410 and the second sliding plate 510 in the Z direction and the X direction respectively, so as to improve the adjustment accuracy.

[0046] As shown in Figure 18As shown, the locking mechanism can include a locking clamp 600, a fixing base 610, a support shaft 620 and a handle 630, the support shaft 620 is fixed on the fixing base 610, the fixing base 610 is respectively installed on the fourth base 420 and the fifth base 520, the support shaft 620 of the X-direction moving platform 400 is arranged along the X-direction, the support shaft 620 of the Y-direction moving platform 300 is arranged along the Y-direction, the locking clamp 600 is slidingly installed on the support shaft 620, the locking clamp 600 is fixedly connected with the first sliding plate 410 and the second sliding plate 510, when the first sliding plate 410 or the second sliding plate 510 moves to the target position, the handle 630 is operated to lock the locking clamp 600 on the support shaft 620, so as to fix the position of the first sliding plate 410 or the second sliding plate 510.

[0047] In some embodiments, the vacuum internal Hall measurement system further comprises a base 2200 and support legs 2300, the fifth base 520 is installed on the base 2200, the support legs 2300 are installed on the bottom surface of the base 2200, the support legs 2300 are at least three, which is conducive to integrating the pose adjustment mechanism 2000 on the base 2200, so that the overall structure is compact, convenient to install and use, and conducive to ensuring stable work of the pose adjustment mechanism 2000.

[0048] In actual application, a plurality of pose adjustment mechanisms 2000 can be arranged along the length direction of the vacuum chamber of the vacuum internal undulator, which can be appropriately increased or decreased according to the length of the vacuum chamber, for example, as shown in Figure 1 、 Figure 2 and Figure 3 a 4-meter-long vacuum internal undulator can be provided with 5 pose adjustment mechanisms 2000.

[0049] The upper support rod 720 is installed on the upper force sensing mount 700, and the lower support rod 730 is installed on the lower force sensing mount 710. The upper force sensing mount 700 and the lower force sensing mount 710 are fixed on the first support frame 120 respectively. The guide rail cantilever rod 2100 extends into the vacuum chamber 1 and is connected with the guide rail 2. The connection between the guide rail cantilever rod 2100 and the vacuum chamber 1 is sealed and connected through the sealing pipe 740 and other sealing components. The positions of the upper support rod 720 and the lower support rod 730 are adjusted so as to be close to the guide rail cantilever rod 2100. The guide rail cantilever rod 2100 is connected with the upper support rod 720 and the lower support rod 730 respectively. Since the upper support rod 720 is installed on the upper force sensing mount 700, and the lower support rod 730 is installed on the lower force sensing mount 710, the force generated by adjusting the upper support rod 720 and the lower support rod 730 can be sensed and combined to calculate the direction of the adjusting force (torque). By adjusting appropriate motion parameters (based on the force-position hybrid control principle), the adjusting force considered to be applied to the upper support rod 720 and the lower support rod 730 can be converted into the motion of the pose adjustment mechanism 2000 in the desired direction and position. When the position is almost aligned, fastening members can be installed to fix the guide rail cantilever rod 2100. During the installation of the fastening members, since the guide rail cantilever rod 2100 is not completely and accurately connected with the upper support rod 720 and the lower support rod 730, additional assembly force will be generated. The force sensing structure can still sense the additional assembly force. The adaptive force-position hybrid control algorithm can intelligently and automatically adjust the pose adjustment mechanism 2000 so that the force received by each axis of the sensing structure is as small as possible. When this state is reached, it is considered that the connection is accurate. The pose adjustment mechanism 2000 is connected with the guide rail 2 in the vacuum chamber 1 one by one to achieve the preliminary support of the guide rail 2. After assembly is completed, the pose of the guide rail 2 is detected. If the pose of a certain section does not meet the requirements, the position and attitude adjustment amount of the corresponding guide rail cantilever rod 2100 is obtained through accurate calculation by a computer. Then, the pose adjustment mechanism 2000 corresponding to the guide rail 2 is adjusted. The Y-direction swing platform 200 and the Z-direction swing platform 100 are formed to have a remote motion center located at the end connected with the guide rail 2 of the guide rail cantilever rod 2100, so that no parasitic displacement is generated during attitude adjustment, avoiding the simultaneous adjustment of position and attitude, greatly reducing the complexity of adjustment amount calculation, and greatly improving the calculation and adjustment efficiency. When the adjustment is completed once, the pose of the guide rail 2 is continuously detected. If the requirements are met, the adjustment is stopped. If not, the above process is repeated until the requirements are met.

[0050] Wherein, the force sensing structure on the first support frame 120 not only works when docking, but also works when adjusting. When adjusting, if the force sensing signal abnormally increases, it is possible to calculate errors, timely suspend the adjustment action, issue an alarm and re-perform measurement and adjustment amount calculation.

[0051] In summary, the vacuum inner Hall measurement system for the vacuum inner undulator of the embodiment of the present application has the following technical effects: (1) Not only can the two-direction attitude of the guide rail cantilever 2100 be adjusted, but also the intersection of the two attitude rotation axes is located at the docking position of the guide rail cantilever 2100 and the guide rail 2, so that the parasitic displacement caused by attitude adjustment is minimized, and a large amount of displacement adjustment operation in the process of attitude adjustment is avoided.

[0052] (2) In the process of assembly and fastening, based on the force-position hybrid control principle, the device plays the role of intelligent sensing and cooperation, reduces the installation difficulty and improves the assembly efficiency; (3) It has the ability of precise adjustment of position in three directions in space and adjustment of attitude in two directions. When the spatial attitude of the guide rail 2 is not accurate or the overall structure of the guide rail 2 is deformed and needs to be adjusted, intelligent and automatic adjustment and compensation can be performed according to the measurement results, and the process is monitored by the force sensor to avoid damage caused by excessive adjustment amplitude; (4) The pose adjustment mechanism 2000 is compact and light, each pose adjustment mechanism 2000 is an independent stable platform, and constitutes a complete functional module, which changes the heavy form of the traditional large overall platform and effectively reduces the difficulty and cost of the device in the process of installation, disassembly and transportation. The number of pose adjustment mechanisms 2000 can be flexibly configured according to the length and type of the undulator. This "on-demand configuration" strategy enhances the universality and economy of the entire system and can widely adapt to the measurement needs of various scientific devices.

[0053] It should be understood that the above-mentioned terms such as "center", "longitudinal", "transverse", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the indicated panel or element must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. In addition, the terms "first", "second" are only for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features limited by "first", "second" can explicitly or implicitly include one or more features. In the description of the present application, unless otherwise stated, the meaning of "multiple" is two or more.

[0054] The above description is merely exemplary of the application and the application principles. It is to be understood that the application scope of the present application is not limited to the above-described technical solutions formed by the specific combinations of the technical features, and should also cover other technical solutions formed by the combinations of the above technical features or equivalent features without departing from the inventive concept. For example, the above technical features can be replaced by the technical features disclosed in the present application (but not limited to) having similar functions to form technical solutions.

Claims

1. A vacuum internal Hall effect measurement system for a vacuum internal undulator, characterized in that, include: The system comprises a vacuum chamber, a Hall effect sensor mounted within the vacuum chamber, and a motion actuator. The motion actuator includes a guide rail and a position adjustment mechanism. The guide rail is mounted within the vacuum chamber, and the Hall effect sensor is movable along the extension direction of the guide rail. The position adjustment mechanism is connected to the guide rail and is used to adjust the position and orientation of the guide rail to drive the Hall effect sensor in three-dimensional motion within the vacuum chamber. The Hall effect sensor is used to acquire the three-dimensional magnetic field distribution of the undulator. The position adjustment mechanism includes: A guide rail lever extends into the vacuum chamber and connects to the guide rail; Attitude adjustment unit, the attitude adjustment unit includes: A Z-axis swing platform is fixedly connected to the guide rail lever, and the guide rail lever can rotate around a first axis to adjust the pitch angle of the guide rail. A swing platform is provided around the Y-axis, and a swing platform around the Z-axis is fixedly connected to the swing platform around the Z-axis. The swing platform around the Z-axis can be rotated around the second axis to drive the guide rail lever to rotate around the second axis, thereby adjusting the flip angle of the guide rail. The first axis and the second axis intersect with the axis of the guide rail lever. Position adjustment unit, the position adjustment unit comprising: The Y-axis moving platform is connected to the Y-axis swinging platform, which drives the attitude adjustment unit to translate along the Y-axis to adjust the position of the guide rail in the Y-axis. An X-axis moving platform is connected to a Y-axis moving platform, which drives the Y-axis moving platform and the attitude adjustment unit to move along the X-axis to adjust the position of the guide rail in the X-axis. The Z-axis moving platform is connected to the X-axis moving platform and drives the X-axis moving platform, the Y-axis moving platform and the attitude adjustment unit to move along the Z-axis to adjust the position of the guide rail in the Z-axis.

2. The vacuum Hall effect measurement system for a vacuum undulator according to claim 1, characterized in that, The Z-axis swing platform includes: A first base, the first base having an arc-shaped first mating surface; A first movable cover is mounted on the first base, and an arc-shaped groove is formed on the first movable cover, the arc-shaped groove having a second mating surface; A first support frame is fixedly connected to the guide rail cantilever. The second movable cover is mounted on the first support frame. An arc-shaped guide rail is formed in the area of ​​the second movable cover near the first movable cover. The arc-shaped guide rail has a third mating surface and a fourth mating surface. The arc-shaped guide rail is located in the arc-shaped groove. The first mating surface and the third mating surface slide in contact with each other in the arc-shaped extension direction. The second mating surface and the fourth mating surface slide in contact with each other. The first power mechanism includes a first drive motor, an adjusting fork, and an adjusting baffle. The adjusting fork is fixedly connected to the first support frame and has an adjusting cavity. The adjusting baffle is located in the adjusting cavity and is fixedly connected to the first base. The adjusting baffle is drivenly connected to the output end of the first drive motor. The first drive motor drives the adjusting baffle to move within the adjusting cavity, thereby causing the first support frame and the guide rail lever to rotate around a first axis to adjust the pitch angle of the guide rail. The output end of the first drive motor is connected to a lifting rod, and the end face of the lifting rod makes point contact with the surface of the adjusting baffle.

3. The vacuum Hall effect measurement system for a vacuum undulator according to claim 2, characterized in that, Multiple locking bolts are also provided between the adjusting fork and the adjusting baffle. The multiple locking bolts are evenly distributed on opposite sides of the adjusting baffle. Each locking bolt is threaded to the adjusting fork, and the end of each locking bolt passes through the adjusting fork and extends into the adjusting cavity. The end face of the locking bolt makes point contact with the surface of the adjusting baffle to fix the moving position of the adjusting baffle.

4. The vacuum Hall effect measurement system for a vacuum undulator according to claim 1, characterized in that, The Y-axis swing platform includes: An adjusting slider is fixedly connected to the Z-axis swing platform. The adjusting slider has a first arc surface and a second arc surface, and a portion of the first arc surface is recessed toward the second arc surface. A mating groove and an adjusting platform are formed on the adjusting slider. The surface of the mating groove adjacent to the adjusting platform is an arc surface. A second base has an adjustment plate formed on it. The second base also has a fifth mating surface that slides with a first arc surface. The adjustment plate includes an adjacent mating platform and an adjustment groove. The outline of the mating platform is the same as the outline of the mating groove, and the outline of the adjustment groove is the same as the outline of the adjustment platform. The adjustment slider mates with the adjustment plate. The mating platform and the mating groove slide in the extension direction of the arc surface. The first arc surface of the adjustment slider is slidable along the fifth mating surface of the second base. The second power mechanism includes a second drive motor and a transmission component that is driven and connected to the second drive motor. The second drive motor is mounted on the second base, and the transmission component is connected to the adjusting slider, which drives the adjusting slider to slide on the second base to adjust the flip angle of the guide rail.

5. The vacuum internal Hall effect measurement system for a vacuum internal undulator according to claim 4, characterized in that, The transmission component includes a worm gear and a worm that mesh with each other, one of which is connected to the second drive motor and the other is connected to the adjusting slider; The second base also includes a hollow mounting platform. The second drive motor is mounted on one side of the mounting platform, and the output shaft of the second drive motor is located inside the mounting platform. The surface of the mounting platform near the first arc surface is configured as the fifth mating surface, and an arc-shaped hole is provided on the fifth mating surface. The worm gear and the worm mesh at the arc-shaped hole.

6. The vacuum Hall effect measurement system for a vacuum undulator according to claim 1, characterized in that, The Y-axis mobile platform includes: A lifting platform, which is fixedly connected to the swing platform around the Y direction, has an inclined surface; A fixed platform is provided, which is arranged opposite to the lifting platform. The surface of the fixed platform facing the lifting platform is a mounting surface, and a lifting space is formed between the mounting surface and the inclined surface. The inclined surface is inclined in a direction away from the mounting surface. The third power mechanism includes a third drive motor, a first guide rail, a trapezoidal lead screw, a first slider, a second guide rail, a second slider, and a wedge-shaped connecting block. The third drive motor is driven by the trapezoidal lead screw, which is connected to the first slider. The first slider is slidably engaged with the first guide rail. The first guide rail is mounted on the mounting surface, and the second guide rail is mounted on the inclined surface, with the extension direction of the second guide rail being the same as the inclination direction of the inclined surface. The second slider is slidably engaged with the second guide rail, and the wedge-shaped connecting block is fixedly connected to both the first slider and the second slider.

7. The vacuum Hall effect measurement system for a vacuum undulator according to claim 6, characterized in that, The Y-axis moving platform further includes: a limiting mechanism, the limiting mechanism comprising: The third guide rail and the third slider are slidably connected on the third guide rail. The lifting platform has a Y-direction side parallel to the Y direction. The third guide rail is fixedly installed on the Y-direction side and extends along the Y direction. A fixing plate is located on one side of the Y-direction side and is fixedly connected to the fixing platform. The fixing plate is also fixedly connected to the third slider.

8. The vacuum Hall effect measurement system for a vacuum undulator according to claim 7, characterized in that, The Y-axis moving platform further includes: a first grating ruler, which includes a body, a reading head, and a bracket. The body is fixed on the fixed plate, and an elongated hole is provided on the fixed plate along the Y direction. One end of the bracket passes through the elongated hole and is connected to the lifting platform. The other end of the bracket is equipped with the reading head, which is in contact with the body. The lifting platform can drive the reading head to move along the extension direction of the elongated hole.

9. The vacuum internal Hall effect measurement system for a vacuum internal undulator according to any one of claims 1-8, characterized in that, The X-axis mobile platform includes: A first sliding plate is fixedly connected to the Y-axis moving platform; Fourth base; A fourth power mechanism is installed on the fourth base. The fourth power mechanism includes a fourth drive motor, a fourth guide rail, a fourth lead screw, and a fourth slider. The fourth guide rail extends along the X direction. The fourth drive motor and the fourth lead screw are driven and connected. The fourth lead screw is connected to the fourth slider. The fourth slider is slidably engaged with the fourth guide rail. The fourth slider is fixedly connected to the first sliding plate. The second grating ruler is mounted on the fourth base, and the reading head of the second grating ruler is connected to the first sliding plate; The Z-axis mobile platform includes: The second sliding plate is fixedly connected to the X-axis moving platform; The fifth base; The fifth power mechanism is installed on the fifth base. The fifth power mechanism includes a fifth drive motor, a fifth guide rail, a fifth lead screw, and a fifth slider. The fifth guide rail extends along the Z direction. The fifth drive motor and the fifth lead screw are driven and connected. The fifth lead screw is connected to the fifth slider. The fifth slider is slidably engaged with the fifth guide rail. The fifth slider is fixedly connected to the second sliding plate. The third grating ruler is mounted on the fifth base, and the reading head of the third grating ruler is connected to the second sliding plate. The fourth base and the fifth base are each provided with a locking mechanism, which is connected to the first sliding plate and the second sliding plate respectively, and is used to lock the position of the first sliding plate and the second sliding plate.

10. The vacuum Hall effect measurement system for a vacuum undulator according to claim 2, characterized in that, The vacuum Hall effect measurement system further includes: an upper force sensing mounting base, a lower force sensing mounting base, an upper support rod, a lower support rod, and a sealing tube. The upper support rod and the lower support rod are respectively fixedly connected to the guide rail bracket. The upper support rod is mounted on the upper force sensing mounting base, and the lower support rod is mounted on the lower force sensing mounting base. The upper force sensing mounting base and the lower force sensing mounting base are respectively fixedly mounted on opposite sides of the first support frame. The sealing tube is sleeved on the outside of the guide rail bracket. One end of the guide rail bracket extends into the vacuum chamber, and the contact point between the guide rail bracket and the vacuum chamber is sealed.

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