Ion source incoming material detection device and method

Abstract

The invention provides an ion source incoming material detection device and method. The device comprises a hardware system, a control system and a data processing system. A hardware system adopts a multi-station isomorphic design which is uniformly distributed on the circumference, and each station is provided with a quick release interface and an integrated electrical and ionization performance detection module and shares a vacuum pumping system. And the control system controls all the stations to synchronously execute the processes of pre-vacuumizing, preheating and parameter and sensitivity detection through the synchronous detection engine, and adopts a timestamp algorithm to synchronize data. And the data processing system can uniformly configure all station parameters at one time, carry out batch analysis and consistency evaluation on detection data, and automatically generate a report. According to the invention, the problems of low detection precision, low efficiency and difficulty in data tracing in the prior art are solved, and efficient and high-precision automatic detection and data management of the ion source are realized.

Description

Technical Field

[0001] This invention relates to the field of ion detection technology, and in particular to an ion source incoming material detection device and method. Background Technology

[0002] As the core component that generates and emits ions, the performance of the ion source directly determines the analytical accuracy and technological level of high-end equipment such as mass spectrometers, and it is widely used in fields such as semiconductor manufacturing, materials science, and chemical analysis. Therefore, conducting comprehensive and accurate quality testing on the ion source before installation is a crucial step in ensuring the reliability and stability of the final equipment.

[0003] Currently, incoming material testing of ion sources generally relies on single-function, stand-alone equipment. Mechanically, these devices often use fixed flanges or threaded interfaces, lacking effective positioning and adjustment mechanisms. This results in poor sealing when different ion sources are connected, introducing significant errors. In terms of the testing process, electrical parameters, vacuum performance, and ionization efficiency must be tested at different stations, requiring manual handling of multiple sample disassembly, transfer, and parameter settings. This is not only inefficient and time-consuming but also increases the risk of sample damage due to frequent operations. Furthermore, the existing equipment's control and data management methods are outdated. Parameters at each station are set manually, and test data relies on manual recording and scattered storage, making it difficult to guarantee data consistency and extremely challenging to trace quality.

[0004] In summary, existing detection technologies suffer from several core shortcomings, including limited detection accuracy due to mechanical structure and human operation, low detection efficiency due to discrete processes, and poor traceability caused by outdated data management. These limitations fail to meet the urgent needs of modern industry for efficient, high-precision, and traceable quality control of batches of ion source materials. Therefore, an integrated, automated, and intelligent detection solution is required. Summary of the Invention

[0005] The technical problem to be solved by this invention is the comprehensive defects of existing ion source detection technology, namely low detection efficiency, insufficient accuracy, and scattered and untraceable data management.

[0006] To solve the above-mentioned technical problems, the technical solution adopted by the present invention is: an ion source incoming material detection device, comprising: The hardware system includes a main cavity with at least four identical detection stations evenly distributed around its circumference. Each detection station is equipped with a quick-release interface for connecting to an ion source and an integrated electrical performance detection module and ionization capacity detection module. The hardware system also includes a vacuum pumping system shared by all detection stations. The control system includes a synchronous detection engine, which is configured to control all the detection stations to synchronously execute the pre-vacuuming, filament preheating, parameter detection and sensitivity detection processes. The data processing system is configured to uniformly configure the detection parameters of all detection stations at once, perform batch analysis of the detection data of all stations, and automatically generate batch detection reports.

[0007] Furthermore, the electrical performance testing module includes a fixed probe group with adjustable probe spacing and a high-precision ADC analog-to-digital converter for collecting the emission current and filament voltage of the ion source.

[0008] Furthermore, the ionization capability detection module includes an ion beam detector and a miniature vacuum gauge, wherein the ion beam detector is a Faraday cup.

[0009] Furthermore, the vacuum pumping system includes a molecular pump and a backing pump, and each of the detection stations is connected to the vacuum pumping system through an independent switching valve, so that any one of the detection stations can be isolated individually.

[0010] Furthermore, the synchronous detection engine employs a timestamp synchronization algorithm to ensure that the detection data of electrical parameters, vacuum pressure, and ion beam signals of all detection stations are aligned in time.

[0011] Furthermore, the data processing system has a built-in consistency evaluation algorithm, which is used to calculate the standard deviation or fluctuation coefficient of multiple ion source detection parameters in the same batch, and automatically determine the batch's qualification based on the calculation results.

[0012] Furthermore, the data processing system is also configured to automatically mark the abnormal workstation and generate an abnormal report when the detection data of a single workstation exceeds a preset threshold, while maintaining the normal detection process of other workstations.

[0013] This invention also provides a method for detecting incoming materials from an ion source, comprising the following steps: Multiple ion sources are respectively mounted on each detection station; The data processing system configures the detection parameters of all detection stations in a unified manner at one time. The detection is initiated, and the synchronous detection engine of the control system controls all detection stations to synchronously execute the pre-vacuuming, filament preheating, parameter detection and sensitivity detection processes. The data processing system performs batch analysis on the detection data from all workstations and automatically generates batch detection reports.

[0014] Furthermore, in the sensitivity detection process, when the sensitivity value of a certain station is detected to be within the critical range, a retest process for that station is automatically triggered. The retest process includes: closing the detection valve of that station, letting it stand for a predetermined time, re-vacuuming, and performing a second test.

[0015] The beneficial effects of this invention are as follows: By using at least four circumferentially distributed detection stations in conjunction with a shared vacuum system, parallel and synchronous processing of multiple ion sources is achieved, fundamentally solving the inefficiency problem caused by serial and discrete detection in existing technologies, thus improving detection efficiency by more than 70%. The synchronous detection engine ensures strict synchronization of the detection process and data acquisition at all stations. Combined with uniformly configured parameters, it greatly eliminates errors introduced by manual operation and station differences, increasing the detection accuracy compliance rate to over 95%. The data processing system automatically generates batch analysis and reports of multi-station parameters, realizing structured management and second-level traceability of detection data, completely solving the quality management problems of scattered data and difficult traceability. Attached Figure Description

[0016] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the structures shown in these drawings without creative effort.

[0017] Figure 1 This is a schematic diagram of the system structure of the ion source incoming material detection device according to an embodiment of the present invention; Figure 2 This is a hardware system architecture diagram of the ion source incoming material detection device according to an embodiment of the present invention; Figure 3 This is a schematic diagram of the ionization capacity and electrical performance testing module according to an embodiment of the present invention; Figure 4 This is a flowchart of the ion source incoming material detection method according to an embodiment of the present invention.

[0018] Among them, 10 is the forepump; 20 is the molecular pump; 30 is the vacuum gauge; 411 is the first station interface; 412 is the first station detection valve; 421 is the second station interface; 422 is the second station detection valve; 431 is the third station interface; 432 is the third station detection valve; 441 is the fourth station interface; 442 is the fourth station detection valve; 51 is the ionization capacity detection module; and 52 is the electrical performance detection module. Detailed Implementation

[0019] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of the present invention.

[0020] It should be noted that the descriptions involving "first," "second," etc., in this invention are for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first" or "second" may explicitly or implicitly include at least one of that feature. Furthermore, the technical solutions of the various embodiments can be combined with each other, but only on the basis of being achievable by those skilled in the art. When the combination of technical solutions is contradictory or impossible to implement, such a combination of technical solutions should be considered non-existent and not within the scope of protection claimed by this invention.

[0021] like Figure 1 As shown, an embodiment of the present invention is: an ion source incoming material detection device, comprising: The hardware system includes a main cavity with at least four identical detection stations evenly distributed along its circumference. Each detection station is equipped with a quick-release interface for connecting to an ion source and an integrated electrical performance detection module and ionization capacity detection module. The hardware system also includes a vacuum pumping system shared by all detection stations.

[0022] The electrical performance testing module includes a fixed probe group with adjustable probe spacing and a high-precision ADC analog-to-digital converter, used to collect the emission current and filament voltage of the ion source.

[0023] The ionization capability detection module includes an ion beam detector and a miniature vacuum gauge, wherein the ion beam detector is a Faraday cup.

[0024] The vacuum pumping system includes a molecular pump and a backing pump. Each of the detection stations is connected to the vacuum pumping system through an independent switching valve, so that any one of the detection stations can be isolated individually.

[0025] like Figure 2 The system includes a forepump 10, a molecular pump 20, a vacuum gauge 30, a first station interface 411, a first station detection valve 412, a second station interface 421, a second station detection valve 422, a third station interface 431, a third station detection valve 432, a fourth station interface 441, and a fourth station detection valve 442. The forepump 10 and the molecular pump 20 are connected by a pipeline, the molecular pump 20 is connected to the main chamber, and the vacuum gauge is located on the main chamber.

[0026] In this embodiment, the main cavity is a cylindrical stainless steel structure with four identical detection stations evenly distributed at 90° intervals along its circumference. Each station is equipped with a KF16 quick-release interface and a manual fine-tuning bracket, which allows for manual adjustment in the X, Y, and Z directions with an adjustment accuracy of 0.1 mm. This design enables operators to manually and precisely adjust the installation position of ion sources of different specifications, ensuring reliable docking between their electrodes and the detection module. This solves the problems of poor sealing reliability and misalignment caused by fixed interfaces, laying a mechanical foundation for subsequent high-precision detection.

[0027] like Figure 3 As shown, each workstation integrates an electrical performance testing module 52. The probe spacing of its fixed probe group can be manually adjusted according to the electrode layout of different ion sources, thus adapting to various product models. The module's built-in 16-bit high-precision ADC can perform analog-to-digital conversion on parameters such as the ion source's emission current and filament voltage. Its ±1μA current accuracy and ±0.1V voltage accuracy directly improve the accuracy of electrical parameter testing, effectively reducing the previous ±5% manual operation error. Simultaneously, each workstation also integrates an ionization capability testing module 51, which includes a Faraday cup as an ion beam detector and a miniature vacuum gauge. The Faraday cup has a 10... -12 A sensitivity is used to accurately monitor the ion beam current generated by ion source ionization; the miniature vacuum gauge provides 10 -8 The Pa resolution is used to monitor the local vacuum level within the workstation in real time. The combination of these two methods enables a direct and quantitative assessment of the ionization performance of the ion source.

[0028] The shared vacuum pumping system for all testing stations consists of a molecular pump with a pumping speed of ≥200L / s and a backing pump. Each station is connected to the shared vacuum system via an independent on / off valve. This design allows for isolation and repair of a station during testing if a leak occurs due to installation issues, by closing its independent on / off valve, without affecting the vacuum environment or testing progress of other stations. This ensures the continuity of batch testing and overall efficiency, solving the problem of system downtime due to a single sample issue.

[0029] The control system includes a synchronous detection engine, which is configured to control all the detection stations to synchronously execute the pre-vacuuming, filament preheating, parameter detection and sensitivity detection processes. The synchronous detection engine employs a timestamp synchronization algorithm to ensure that the detection data of electrical parameters, vacuum pressure, and ion beam signals at all detection stations are aligned in time.

[0030] In this embodiment, the core of the control system lies in its synchronous detection engine. This engine is configured to control all four detection stations to synchronously execute the entire process from pre-evacuation to sensitivity detection. Specifically, after a one-key startup, the four stations simultaneously start pre-evacuation, and the vacuum degree of each station is independently monitored. When the vacuum degree of each station reaches the set value of 1×10 -6 mbar, the system synchronously enters the next stage. Then, the filaments of the four stations are synchronously turned on and a 2-hour preheating countdown is performed. Subsequently, the parameter detection and sensitivity detection processes are also strictly synchronized. The engine adopts a timestamp synchronization algorithm to ensure that all data such as electrical parameters, vacuum pressure, and ion beam signals collected by the four stations are strictly aligned in time, and its synchronization accuracy reaches 1 millisecond. This synchronization control mechanism is the key to generating a multi-station parameter comparison table and comparison curve that can be used for direct comparison, making it possible to quickly locate abnormal stations during batch detection, and fundamentally improving the detection efficiency and the accuracy of data analysis.

[0031] A data processing system, which is configured to be able to uniformly configure the detection parameters of all detection stations at one time, and batch-analyze the detection data of all stations, and automatically generate a batch detection report.

[0032] Among them, the data processing system is built-in with a consistency evaluation algorithm, and the consistency evaluation algorithm is used to calculate the standard deviation or fluctuation coefficient of the detection parameters of multiple ion sources in the same batch, and automatically determine the batch qualification according to the calculation result.

[0033] Among them, the data processing system is also configured to: when the detection data of a single station exceeds the preset threshold, automatically mark the abnormal station and generate an abnormal report, while maintaining the normal detection process of other stations.

[0034] In this embodiment, the data processing system realizes the one-time unified configuration of the detection parameters of all stations through its software interface. For example, the scanning mass number range, dwell time, etc. of the four stations are set at one time, which improves the parameter configuration efficiency by 4 times and avoids the human error that may be introduced by repeated single-station operations. After the detection is completed, the built-in consistency evaluation algorithm of the system starts to work, and automatically calculates the standard deviation or fluctuation coefficient of the key parameters (such as sensitivity) of the four ion sources in the same batch. If the fluctuation coefficient < 3%, it is automatically determined that the batch is qualified, and a batch detection report including the details of each single station and the overall statistical results is generated. In addition, the system also has the ability to handle exceptions: when the detection data of a single station exceeds the preset threshold (such as the background noise current > 3×10 -14A) The system automatically marks the abnormal workstation and generates an anomaly report while maintaining normal testing at other workstations. This design not only automates the testing process but also structurally associates and stores testing data with sample information and testing conditions. This allows users to quickly retrieve complete testing records using the sample number, achieving data traceability with a response time in seconds, fully meeting the requirements of industrial quality systems.

[0035] like Figure 4 As shown, this embodiment of the invention also provides a method for detecting incoming materials from an ion source, comprising the following steps: S10. Install multiple ion sources at each detection station respectively; S20. Configure the detection parameters of all detection stations in a unified manner through the data processing system at one time; S30. Start the detection process. The synchronous detection engine of the control system controls all detection stations to synchronously execute the pre-vacuuming, filament preheating, parameter detection and sensitivity detection processes. S40. The data processing system performs batch analysis on the detection data of all workstations and automatically generates batch detection reports.

[0036] In the sensitivity detection process, when the sensitivity value of a certain station is detected to be within the critical range, a retest process for that station is automatically triggered. The retest process includes: closing the detection valve of that station, letting it stand for a predetermined time, re-vacuuming, and performing a second test.

[0037] In this embodiment, the ion source incoming material detection method is implemented through the following specific steps: First, the operator clamps four ion source samples from the same batch onto the KF16 quick-release interfaces of the four detection stations, and uses a three-way fine-tuning bracket for precise alignment to ensure good contact between the ion source electrodes and the detection probes in the station. Then, in the software interface of the data processing system, the operator does not need to set parameters for each station individually; instead, they can uniformly set the core detection parameters for all stations at once. For example, the mass number scanning range can be uniformly set to 1-100 amu, the filament heating temperature to 1000℃, and the reference pressure range for sensitivity calculation to 3×10⁻⁶. -6 mbar to 1×10 -5 mbar greatly improves the efficiency and accuracy of parameter settings, eliminating errors that may be caused by repeated manual input from the source.

[0038] After parameter configuration, the testing process is initiated. The synchronous detection engine of the control system starts working, controlling the four stations to simultaneously perform pre-vacuuming: the forepump and molecular pump start sequentially, and the system monitors the vacuum level of each station in real time, ensuring that all stations reach a vacuum level of 1×10⁻⁶. -6After reaching the preset threshold of mbar, the system synchronously proceeds to the next stage. This design avoids dragging down overall efficiency due to slow pumping speeds at individual stations. Next, the engine synchronously applies heating voltage to the ion source filaments at all four stations and begins a 120-minute countdown preheating process. This ensures the filaments reach stable operating conditions and eliminates interference from thermal inertia on subsequent measurements of critical electrical parameters. During the parameter and sensitivity detection phase, the engine controls the mass spectrometers at all four stations to begin scanning at strictly synchronized times (based on the PTP protocol, with a deviation of less than 1 millisecond), and synchronously adjusts the gas path solenoid valves at each station to precisely control the pressure. Throughout this process, the system collects and records data such as emission current and ion beam intensity at each station in real time.

[0039] All test data are analyzed in batches by the data processing system. The system's built-in consistency assessment algorithm automatically calculates the standard deviation and fluctuation coefficient of the four ion sources on key performance parameters (such as the sensitivity to nitrogen, S1). If the fluctuation coefficient is less than 3%, the system automatically determines that the batch of products has consistent performance and is qualified, and generates a test report integrating data from all workstations and overall statistical conclusions. Furthermore, this method also has an intelligent retesting mechanism. For example, in the sensitivity testing process, if the system finds that the calculated sensitivity value of workstation two is within a preset critical range (such as 7.50 × 10⁻⁶), the system will automatically retest the source. -5 A / mbar, very close to the acceptable lower limit of 7.60 × 10⁻⁶. -5 If the pressure is (A / mbar), a retesting process for that station will be automatically triggered: first, the detection valve of station two will be closed to isolate it, and it will be left to stand for 5 minutes to stabilize its internal state. Then, the vacuum will be re-evacuated and a second test will be performed. This targeted retesting mechanism can effectively eliminate accidental fluctuations while continuously monitoring the overall testing process, ensuring the accuracy of the judgment of samples in critical states, thereby improving the reliability and impartiality of the test results.

[0040] The above description is merely an embodiment of the present invention and does not limit the patent scope of the present invention. Any equivalent structural or procedural transformations made based on the content of the present invention's specification and drawings, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of the present invention.

Claims

1. An ion source incoming material detection device, characterized in that, include: The hardware system includes a main cavity with at least four identical detection stations evenly distributed around its circumference. Each detection station is equipped with a quick-release interface for connecting to an ion source and an integrated electrical performance detection module and ionization capacity detection module. The hardware system also includes a vacuum pumping system shared by all detection stations. The control system includes a synchronous detection engine, which is configured to control all the detection stations to synchronously execute the pre-vacuuming, filament preheating, parameter detection and sensitivity detection processes. The data processing system is configured to uniformly configure the detection parameters of all detection stations at once, perform batch analysis of the detection data of all stations, and automatically generate batch detection reports.

2. The ion source incoming material detection device according to claim 1, characterized in that, The electrical performance testing module includes a fixed probe group with adjustable probe spacing and a high-precision ADC analog-to-digital converter, used to collect the emission current and filament voltage of the ion source.

3. The ion source incoming material detection device according to claim 1, characterized in that, The ionization capability detection module includes an ion beam detector and a miniature vacuum gauge, wherein the ion beam detector is a Faraday cup.

4. The ion source incoming material detection device according to claim 1, characterized in that, The vacuum pumping system includes a molecular pump and a backing pump. Each of the detection stations is connected to the vacuum pumping system through an independent switching valve, so that any one of the detection stations can be isolated individually.

5. The ion source incoming material detection device according to claim 1, characterized in that, The synchronous detection engine employs a timestamp synchronization algorithm to ensure that the detection data of electrical parameters, vacuum pressure, and ion beam signals at all detection stations are aligned in time.

6. The ion source incoming material detection device according to claim 1, characterized in that, The data processing system has a built-in consistency evaluation algorithm, which is used to calculate the standard deviation or fluctuation coefficient of multiple ion source detection parameters in the same batch, and automatically determine the batch's qualification based on the calculation results.

7. The ion source incoming material detection device according to any one of claims 1 to 6, characterized in that, The data processing system is also configured to automatically mark the abnormal workstation and generate an abnormal report when the detection data of a single workstation exceeds a preset threshold, while maintaining the normal detection process of other workstations.

8. A method for detecting incoming materials using an ion source, characterized in that, Includes the following steps: Multiple ion sources are respectively mounted on each detection station; The data processing system configures the detection parameters of all detection stations in a unified manner at one time. The detection is initiated, and the synchronous detection engine of the control system controls all detection stations to synchronously execute the pre-vacuuming, filament preheating, parameter detection and sensitivity detection processes. The data processing system performs batch analysis on the detection data from all workstations and automatically generates batch detection reports.

9. The ion source incoming material detection method according to claim 8, characterized in that, In the sensitivity detection process, when the sensitivity value of a certain station is detected to be within the critical range, a retest process for that station is automatically triggered. The retest process includes: closing the detection valve of that station, letting it stand for a predetermined time, re-vacuuming, and performing a second test.

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