193 nanometer nanosecond laser damage threshold measuring device and service life testing method

Abstract

The invention relates to a 193 nanometer nanosecond laser damage threshold measuring device and a life testing method, the 193 nanometer nanosecond laser damage threshold measuring device comprises a laser light source, a light beam regulation and control module, a sample positioning module, a damage diagnosis module, a control and data acquisition module and a sealed chamber, a laser irradiation area image is acquired in real time through a CCD imaging system, and an image processing algorithm is utilized to compare gray level changes before and after irradiation so as to judge damage; synchronously monitoring optical performance attenuation of the sample; the laser-induced fluorescence is analyzed using a spectrometer to identify a color center defect. The device has the multi-flux testing capability, and the spot size on the surface of the sample is changed by switching the focus lens group. According to the L-on-1 test mode, automatic operation can be realized under preset conditions, and failure can be automatically judged according to real-time monitoring of spectral performance change or damage morphology, so that the long-term service life of the element can be efficiently and reliably evaluated. According to the invention, in-situ, high-precision and automatic damage judgment is realized, and the efficiency and the accuracy of reliability testing of the 193-nanometer-waveband optical element are improved.

Description

Technical Field

[0001] This invention relates to the field of laser damage performance testing technology for optical components, and in particular to a device for measuring the damage threshold of optical components under the action of nanosecond pulsed laser in the 193 nm deep ultraviolet band. Background Technology

[0002] Photolithography machines are core equipment in integrated circuit manufacturing, and their overall performance directly determines chip process nodes and yield rates. Currently, high-end photolithography machines for deep ultraviolet and shorter wavelengths, along with their required ultra-high purity fused silica, low thermal expansion substrates, deep ultraviolet coating components, precision optical components, and key optomechanical structural components, are almost entirely dependent on imports. The risk of supply disruptions for these specialized materials and components has become a critical bottleneck restricting the development of my country's integrated circuit industry. Therefore, conducting research on key core technologies for specialized materials and components used in high-end photolithography machines and achieving domestic supply is of great significance.

[0003] Deep ultraviolet (DUV) optical components play a crucial role in lithography machines, and their resistance to laser damage determines the stability and lifespan of the optical system. With the development of integrated circuits and the improvement of node technology, the resolution of lithography machines is constantly increasing, while the exposure wavelength is continuously decreasing. Optical components are exposed to high peak power density DUV irradiation environments for extended periods, making them highly susceptible to damage such as multiphoton absorption, color center accumulation, nanoscale abrasion, and film cracking. This damage not only leads to decreased optical performance and wavefront distortion but can also generate particulate contamination, becoming one of the bottlenecks restricting the production capacity and yield of lithography machines.

[0004] Currently, 193 nm laser damage threshold measurement faces significant technical challenges. Firstly, in terms of damage assessment, conventional methods often rely on single, post-hoc offline microscopic observations or single in-process criteria (such as scattered light detection). Offline observation cannot establish a precise correspondence between damage and specific laser pulses and is inefficient; while single in-process criteria lack sensitivity for early damage and subsurface defects (such as color centers) that do not produce significant morphological changes, leading to high risks of misjudgment and missed detection, and poor data reliability. Secondly, regarding the testing environment, 193 nm lasers are strongly absorbed by water and oxygen in the air, producing ozone. This not only significantly attenuates laser energy and alters the actual energy density of the sample surface but also contaminates and corrodes optical surfaces. In terms of testing efficiency and versatility, obtaining complete damage characteristics requires testing at different energy densities, which typically necessitates changing the focused spot size. Traditional devices have limited functionality and struggle to quickly and flexibly switch testing conditions, resulting in cumbersome and time-consuming testing processes. Furthermore, the consistency of data obtained under different conditions is difficult to guarantee, failing to meet the needs of batch component screening and rapid process iteration.

[0005] To achieve reliability assessment of deep ultraviolet (DUV) optical components under extreme irradiation conditions, it is necessary to conduct detailed characterization of their damage performance and failure mechanisms, and simultaneously improve the measurement accuracy and repeatability of the damage threshold, thereby providing quantitative basis for iterative optimization of the fabrication process. Therefore, developing a device capable of measuring the damage threshold of DUV lasers in a low-oxygen environment is of great significance for establishing a reliability database for DUV optical components and supporting the localization of key optical components for high-end lithography machines. Summary of the Invention

[0006] To address the aforementioned issues, this invention proposes a 193 nm nanosecond laser damage threshold measurement device and a lifetime testing method. This device can effectively improve the accuracy of online detection of nanosecond laser damage to optical components under nitrogen atmosphere.

[0007] The technical solution of the present invention is as follows: A 193-nanosecond laser damage threshold measurement device, characterized in that it includes: Laser source module, used to generate 193 nanometer nanosecond laser pulses; A beam control module is used to adjust and monitor the energy, polarization state, and spot size of the laser pulse; A sealed chamber is used to provide a controlled testing environment; A sample positioning module, located within the sealed chamber, is used to carry and move the sample to be tested; The damage diagnosis module is used to perform online damage assessment on samples after laser irradiation. The control and data acquisition module is connected to the laser source module, beam control module, sample positioning module and damage diagnosis module respectively, and is used to control the coordinated work of each module and to acquire and process data; wherein, the damage diagnosis module integrates at least three independent damage determination methods, including a morphology determination unit based on image recognition, a function determination unit based on changes in optical performance and a defect determination unit based on spectral analysis. Furthermore, the control and data acquisition module is configured to execute various laser damage testing procedures.

[0008] Furthermore, the beam control module comprises, in sequence along the optical path: The shutter is located on the optical path after the laser light is emitted and is used to control the on and off of the laser pulse; The polarization adjustment unit, consisting of a prism and a rotatable half-wave plate, is used to adjust the laser polarization state. The energy adjustment unit, consisting of a rotatable attenuation plate assembly, is used to continuously adjust the laser energy. A beam splitter is used to split an incident laser into two paths, with the reflected light path serving as the sampling light. The energy monitoring unit consists of a focusing lens and a beam splitter energy meter disposed on the sampling optical path, and is used for real-time monitoring and calibration of pulse energy; A beam expander assembly is used to shape the main test beam transmitted through the beam splitter. A switchable focusing lens group is set in the main test optical path and before the sealed chamber to form focused light spots of different sizes on the sample surface to achieve multi-throughput density testing; The beam quality monitoring unit includes a beam quality analyzer and a reflector that can be inserted into the main test optical path, used to calibrate the size and shape of the focused beam before or during testing.

[0009] Furthermore, the morphology determination unit based on image recognition is a CCD imaging system, whose optical axis forms an angle with the main test optical path, pointing to the laser irradiation area on the sample surface, and is configured to be synchronously triggered by the control and data acquisition module before and after laser pulse irradiation, acquire high-resolution images of the sample surface, and automatically determine damage by comparing the grayscale changes of the images before and after irradiation through image processing algorithms.

[0010] Furthermore, the functional determination unit based on changes in optical performance includes an energy meter located on the optical path behind the sample, used to monitor the energy of the laser pulse after it passes through the sample in real time. The control and data acquisition module calculates the sample transmittance in real time based on the readings of the energy meter and the beam splitter energy meter to determine the attenuation of its optical performance.

[0011] Furthermore, the defect determination unit based on spectral analysis includes a spectrometer and an excitation source. The emitted light from the excitation source is guided to the laser irradiation area on the sample surface to induce fluorescence. The fiber optic probe of the spectrometer is aligned with the irradiation area to collect fluorescence signals and analyze their characteristic spectra to identify the formation of defects such as color centers.

[0012] Furthermore, the sealed chamber is divided into at least two segments that can be isolated by a gate valve, including a laser incident segment for accommodating part of the beam control module and a sample positioning segment for accommodating the sample positioning module.

[0013] Furthermore, the sample positioning section has a sample replacement window on its chamber sidewall, which is sealed by a sealing assembly and equipped with an independent vacuum and inflation valve.

[0014] Furthermore, the control and data acquisition module is synchronized with the laser source module, CCD imaging system, and energy meter to ensure that laser irradiation, image acquisition, and energy recording are strictly time-sequential.

[0015] Furthermore, it also includes the environmental control module, which includes an air extraction system and a high-purity gas source connected to the sealed chamber, as well as a pressure monitoring unit for real-time monitoring and feedback of the gas pressure inside the sealed chamber and an atmosphere monitoring unit for analyzing the gas composition inside the chamber.

[0016] Furthermore, the various laser damage testing procedures include 1-on-1, S-on-1, R-on-1, N-on-1, or L-on-1.

[0017] Furthermore, the L-on-1 laser damage testing process is as follows: the control and data acquisition module sets a constant laser energy density and performs continuous or high-frequency repeated pulse irradiation on a test point on the sample. At the same time, the damage diagnosis module monitors the spectral performance changes of the test point according to a preset time and automatically stops the test when any of the following preset conditions are met: a) the sample spectral performance degradation value monitored by the functional determination unit reaches or exceeds a first preset threshold; or b) the morphology determination unit determines that damage has occurred on the sample surface.

[0018] Second, the present invention also provides a method for evaluating the long-term operational stability of optical components using the above-mentioned measuring device, characterized by comprising the following steps: S1. Mount the sample to be tested on the three-dimensional displacement sample stage, seal the sealed chamber, and establish the test environment; set the laser repetition frequency, energy density, test stop conditions, and optical parameter acquisition interval; S2. By moving the three-dimensional displacement sample stage, the laser spot is positioned at the test point of the sample, and the coordinates at this point are set as the starting point.

[0019] S3. Remove the sample and irradiate the point with continuous or high-frequency pulses at a fixed energy density; during the process, the damage diagnosis module monitors in real time online, the energy meter records the transmission energy of each pulse, and the computer calculates the changes in spectral performance in real time. S4. The control computer compares the continuous monitoring results with the preset stop conditions. Once either condition is met—that is, the spectral performance is detected to have decreased to a threshold or the CCD detects damage—the computer immediately issues a command to close the shutter, stop laser irradiation, and records all relevant data such as the total number of irradiation pulses and the reason for stopping. If neither of the above two conditions is met, but the number of irradiation pulses has reached the set safety limit, the test is also stopped, and it is recorded that the point did not fail at the current energy.

[0020] S5. Data Processing Steps: Based on the test data recorded in step S4, extract the number of pulses corresponding to a 2% decrease in transmittance at different energy densities; construct a dataset between the energy density and the corresponding number of pulses, and establish a functional relationship model between the two through nonlinear regression fitting; the model is used to characterize the laser damage resistance of the optical element under test, and can estimate the number of pulses corresponding to a 2% decrease in transmittance at any given energy density, thereby establishing a lifetime prediction model for the optical element under test.

[0021] Because of the above-described solution, the present invention has the following advantages: Attached Figure Description

[0022] Figure 1 This is a schematic diagram of a 193-nanometer nanosecond laser damage threshold measurement device according to the present invention; Figure 2 This is an example of a comparison image of a laser-irradiated area before and after damage, obtained by a CCD imaging system in this invention. Figure 3 This is a comparison of the characteristic fluorescence spectra of the sample before and after laser irradiation, collected by the spectrometer in this invention; Figure 4 This is a damage probability map obtained by performing a 1-on-1 laser damage threshold test on optical components according to the present invention; Figure 5 This is a damage probability map obtained by performing a 200000-on-1 laser damage threshold test on optical components according to the present invention.

[0023] Figure 6 This is a graph showing the change in transmittance of calcium fluoride samples over time, as recorded by the L-on-1 test in this invention.

[0024] Figure 7 This is an experimental data graph and fitting curve of the present invention showing a 2% decrease in transmittance of fused silica under different energy densities and pulse numbers. Detailed Implementation

[0025] The present invention will be further described below with reference to embodiments and accompanying drawings, but this should not be construed as limiting the scope of protection of the invention.

[0026] Please see Figure 1This embodiment provides a 193 nm nanosecond laser damage threshold measurement device, which is implemented as follows: A nanosecond laser generates a 193 nm wavelength laser pulse. This pulse is reflected by a mirror and enters a beam control module. The laser pulse is first controlled by a computer-controlled shutter. Subsequently, the polarization state is controlled by a polarization adjustment unit consisting of a prism and a rotatable half-wave plate. The rotation of the half-wave plate is driven by a motor and receives computer commands to achieve continuous and precise control of the polarization state of the laser incident on the sample surface. Unused stray light is absorbed by a light trap.

[0027] The polarization-adjusted laser pulse is redirected by a reflector and enters the energy adjustment unit. This unit consists of multiple attenuators with different attenuation coefficients mounted on a motor-driven rotating wheel. The attenuators are switched via computer control, enabling wide-range and continuous adjustment of the laser energy.

[0028] Subsequently, the laser beam is split into two paths by a beam splitter: the reflected beam serves as the sampling beam, which is focused by a focusing lens and detected by a beam splitter energy meter to monitor and calibrate the energy of each incident laser pulse in real time; the transmitted beam serves as the main test beam, which is collimated and shaped by a beam expander group, and then focused by an electrically switchable focusing lens group (any one of 15, 16, or 17), finally incident perpendicularly onto the surface of the sample to be tested, which is fixed on a three-dimensional displacement sample stage. The switchable focusing lens group, controlled by a computer, can quickly select lenses with different focal lengths to form focused spots of different sizes (e.g., from 100 μm to 1 mm) on the sample surface, enabling multi-throughput density testing without disrupting the chamber vacuum or performing complex optical path readjustment.

[0029] To perform spot quality calibration, mirrors (19) and (20) can be electrically cut into the optical path to guide the outgoing beam from the focusing lens group into the beam quality analyzer to measure the size, energy distribution and morphology of the spot.

[0030] Under the command of the control computer, the three-dimensional displacement sample stage can precisely move the sample in the X, Y, and Z directions, thereby accurately positioning the laser spot in different regions of the sample under test. The laser serves as an indicator light to assist in optical path adjustment.

[0031] The damage diagnosis module enables online, in-situ assessment through collaborative operation. Morphology assessment: Under the synchronous triggering of the control computer, the CCD imaging system ensures that images of the test area are acquired instantaneously before and after laser pulse irradiation of the sample. The computer runs image processing algorithms to compare the grayscale distribution of the images of the same area before and after irradiation, identifying and determining whether damage has occurred. When the grayscale change exceeds a preset threshold, the system automatically determines that surface morphology damage has occurred. Figure 2This demonstrates typical damage morphology captured by a CCD imaging system. The left image shows the intact sample surface before irradiation, while the right image shows obvious damage points appearing in the same area after laser irradiation. These differences are clearly identifiable through image grayscale comparison. Functional assessment: An energy meter located behind the sample monitors the energy of each laser pulse transmitted through the sample in real time. The computer calculates the sample's optical performance in real time based on the readings from the beam splitter and the energy meter. When the transmittance decreases by more than a preset threshold (e.g., 2%) relative to the initial value, the system determines that the sample's optical function has deteriorated. Defect assessment: The excitation light emitted by the laser is guided to the test point on the sample that has just been irradiated, inducing fluorescence. This fluorescence signal is collected by a spectrometer. The computer analyzes the fluorescence spectrum to determine whether new characteristic emission peaks appear, thus identifying defects such as color centers within the material. Figure 3 The results of the spectral analysis are presented. The lower curve shows the background fluorescence spectrum of the sample before irradiation, while the upper curve shows the spectrum measured in the same region after irradiation. A new characteristic fluorescence peak appears at a specific wavelength, indicating that laser irradiation induced color center defects within the sample. The entire optical path and sample stage are enclosed in a sealed chamber. This chamber is connected to a vacuum system and a high-purity nitrogen (≥99.999%) gas source via a vacuum line. Before testing, the chamber is first evacuated, then filled with high-purity nitrogen to create an oxygen-free and water-free inert testing environment, ensuring stable transmission of the 193 nm laser and preventing sample surface contamination. An optical trap is used to absorb residual laser light after it has passed through the sample, preventing stray light interference.

[0032] Please see Figure 4 To verify the accuracy of the damage assessment results of the device of the present invention, a standard 1-on-1 damage threshold test was performed on a fused silica optical element. During the test, the CCD imaging system monitored each test point online in real time. The experimental results show that the damage points observed online by the CCD imaging system of the present invention are completely consistent with the damage morphology and location observed under an offline microscope after the test, which fully demonstrates the reliability of the online damage assessment system of the present invention. Based on the test data, the zero-probability damage threshold of the fused silica element was calculated to be 2.68 J / cm². This embodiment not only verifies the damage threshold of a specific material, but more importantly, it confirms that the device of the present invention revolutionizes the traditional offline, post-event assessment process into an in-situ, online, and automated process, with accurate and reliable results.

[0033] Please see Figure 5To investigate the damage accumulation effect of fused silica optical elements under multi-pulse irradiation, a damage threshold test was conducted on them using the S-on-1 test mode of this invention, involving 200,000 pulses. The test was performed in a nitrogen atmosphere, with the control and data acquisition module automatically controlling the laser irradiation and damage assessment process. Experimental results show that under 200,000 pulses of irradiation, the zero-probability damage threshold of the fused silica element decreased to 1.34 J / cm². This result directly contrasts with the damage threshold (2.68 J / cm²) under the single-pulse (1-on-1) condition in the previous embodiment, clearly revealing the significant laser damage accumulation effect of this material under the tested conditions. This embodiment demonstrates that the device of this invention can not only accurately measure the single-pulse damage threshold but also effectively evaluate the performance degradation and reliability of optical elements under multi-pulse conditions, providing crucial data for studying the damage accumulation law of materials.

[0034] A L-on-1 test method for evaluating the long-term operational stability of optical components, the specific implementation steps of which are as follows: Through the above process, the device of this invention achieves automated evaluation of the long-term stability of optical components under constant load. This method utilizes two key criteria—transmittance degradation and surface damage—to provide direct, quantitative experimental data for component lifetime prediction and reliability analysis.

[0035] Please see Figure 6 As an example, the long-term operational stability of a calcium fluoride (CaF2) optical element was evaluated using the apparatus of the present invention and the L-on-1 test method described above. The test was conducted in a nitrogen atmosphere. The laser energy density was set to a constant 60 mJ / cm², and the test stop condition was set as follows: a decrease in transmittance exceeding 2% of the initial value, or surface damage detected by the CCD imaging system. The apparatus operated automatically after the test began. Figure 6 As shown, the transmittance of the sample remained stable with minimal fluctuations during the initial irradiation period and up to approximately 350 million pulses, indicating excellent short-term stability at this energy density. Simultaneously, the CCD imaging system did not detect any surface damage throughout the process. Although the preset transmittance reduction threshold or morphological damage condition was not met, this embodiment successfully verified that the calcium fluoride sample withstood at least 350 million pulse irradiations at a flux of 60 mJ / cm² without performance degradation. The entire testing process was performed automatically by the device, continuously monitoring and recording hundreds of thousands of sets of energy, transmittance, and image data, fully demonstrating the device's ability to complete ultra-long-term, high-reliability tests under unattended conditions, providing crucial data for predicting the lifespan of optical components.

[0036] Please see Figure 7To fully demonstrate the data processing and lifetime prediction capabilities of this invention, we conducted corresponding tests on a piece of fused silica. We performed tests at six different energy densities (20, 30, 40, 60, 80, 100 mJ / cm³). 2 Under these conditions, the L-on-1 test was repeated at different test points on the sample. For each test point, the control computer continuously monitored until the transmittance decreased by 2%, and accurately recorded the corresponding cumulative pulse count. Through the above test, we obtained a set of key data. Subsequently, the control computer invoked the built-in algorithm, using the power-law function y=a*x b Nonlinear fitting was performed on the data points. Through fitting, we obtained specific model parameters: a = 17539.7, b = -0.39. Using this model, we can calculate the expected lifetime of the optical element at any energy density. Specific embodiments of the present invention have been described above. It should be understood that the present invention is not limited to the specific embodiments described above, and those skilled in the art can make various modifications or variations within the scope of the claims, which do not affect the essence of the present invention. In the absence of conflict, the above embodiments and features in the embodiments can be combined with each other.

Claims

1. A 193-nanosecond laser damage threshold measurement device, characterized in that, include: Laser source module (01) is used to generate 193 nanometer nanosecond laser pulses; A beam control module is used to adjust and monitor the energy, polarization state, and spot size of the laser pulse; A sealed chamber is used to provide a controlled testing environment; The sample positioning module (22) is located in the sealed chamber and is used to carry and move the sample to be tested; The damage diagnosis module is used to perform online damage assessment on samples after laser irradiation. The control and data acquisition module (27) is connected to the laser source module (01), beam control module, sample positioning module (22) and damage diagnosis module respectively, and is used to control the collaborative work of each module and to acquire and process data; wherein, the damage diagnosis module integrates at least three independent damage determination methods, including a morphology determination unit based on image recognition, a function determination unit based on changes in optical performance and a defect determination unit based on spectral analysis. Furthermore, the control and data acquisition module (27) is configured to perform a variety of laser damage testing procedures.

2. The 193 nm nanosecond laser damage threshold measuring device according to claim 1, characterized in that, The beam control module includes, along the optical path direction, the following components in sequence: The shutter (03) is set in the optical path after the laser light is emitted and is used to control the on and off of the laser pulse; The polarization adjustment unit, consisting of a prism (04) and a precisely rotatable half-wave plate (06), is used to adjust the laser polarization state; The energy adjustment unit, consisting of a rotatable attenuation plate group (09, 10), is used to continuously adjust the laser energy; A beam splitter (11) is used to split the incident laser into two paths, with the reflected light path serving as the sampling light. The energy monitoring unit consists of a focusing lens (12) and a beam splitter (13) disposed on the sampling optical path, and is used for real-time monitoring and calibration of pulse energy; The beam expander assembly (14) is used to shape the main test beam transmitted through the beam splitter (11); A switchable focusing lens group (15, 16, 17) is set in the main test optical path and before the sealed chamber to form focused light spots of different sizes on the sample surface to achieve multi-throughput density testing; The beam quality monitoring unit includes a beam quality analyzer (21) and a reflector (19, 20) that can be inserted into the main test optical path, for calibrating the size and shape of the focused beam before or during the test.

3. The 193 nm nanosecond laser damage threshold measuring device according to claim 1, characterized in that, The image recognition-based morphology determination unit is a CCD imaging system (23), whose optical axis forms an angle with the main test optical path, pointing to the laser irradiation area on the sample surface, and is configured to be synchronously triggered by the control and data acquisition module (27) before and after laser pulse irradiation, acquire high-resolution images of the sample surface, and automatically determine damage by comparing the grayscale changes of the images before and after irradiation through image processing algorithms.

4. The 193 nm nanosecond laser damage threshold measuring device according to claim 1, characterized in that, The functional determination unit based on changes in optical performance includes an energy meter (25) located on the optical path behind the sample, which is used to monitor the laser pulse energy after passing through the sample in real time. The control and data acquisition module (27) calculates the sample transmittance in real time based on the readings of the energy meter (25) and the beam splitter energy meter (13) to determine the attenuation of its optical performance.

5. The 193 nm nanosecond laser damage threshold measuring device according to claim 1, characterized in that, The defect determination unit based on spectral analysis includes a spectrometer (26) and an excitation source (18). The emitted light from the excitation source (18) is guided to the laser irradiation area on the sample surface to induce fluorescence. The fiber optic probe of the spectrometer (26) is aligned with the irradiation area to collect fluorescence signals and analyze their characteristic spectra. To identify the generation of defects such as color centers.

6. The 193 nm nanosecond laser damage threshold measuring device according to claim 1, characterized in that, The sealed chamber is divided into at least two segments that can be isolated by a gate valve, including a laser incident segment for accommodating part of the beam control module and a sample positioning segment for accommodating the sample positioning module (22).

7. The 193 nm nanosecond laser damage threshold measuring device according to claim 1, characterized in that, The sample positioning section has a sample replacement window on its chamber sidewall. The window is sealed by a sealing assembly and equipped with an independent vacuum and inflation valve.

8. The 193 nm nanosecond laser damage threshold measuring device according to claim 1, characterized in that, The control and data acquisition module (27) is synchronized with the laser source module (01), the CCD imaging system (23) and the energy meter (25) to ensure that the laser irradiation, image acquisition and energy recording are strictly corresponding in time.

9. The 193 nm nanosecond laser damage threshold measuring device according to claim 1, characterized in that, It also includes an environmental control module, which includes an air extraction system and a high-purity gas source connected to the sealed chamber, as well as a pressure monitoring unit for real-time monitoring and feedback of the gas pressure inside the sealed chamber and an atmosphere monitoring unit for analyzing the gas composition inside the chamber.

10. The 193 nm nanosecond laser damage threshold measuring device according to any one of claims 1-9, characterized in that, The various laser damage testing procedures include 1-on-1, S-on-1, R-on-1, N-on-1, or L-on-1.

11. The 193 nm nanosecond laser damage threshold measuring device according to claim 10, characterized in that, The L-on-1 laser damage test process is as follows: the control and data acquisition module (27) sets a constant laser energy density and performs continuous or high-frequency repeated pulse irradiation on a test point on the sample. At the same time, the damage diagnosis module monitors the spectral performance change of the test point according to the preset time and automatically stops the test when any of the following preset conditions are met: a) the sample spectral performance degradation value monitored by the functional determination unit reaches or exceeds the first preset threshold; or b) the morphology determination unit determines that the sample surface is damaged.

12. A method for evaluating the long-term operational stability of optical components using the measuring device described in any one of claims 1-11, characterized in that, Includes the following steps: S1. Install the sample to be tested on the three-dimensional displacement sample stage (22), seal the sealed chamber, and establish the test environment; set the laser repetition frequency, energy density, test stop conditions, and optical parameter acquisition interval; S2. By moving the three-dimensional displacement sample stage (22), the laser spot is positioned at the test point of the sample, and the coordinates at this time are set as the starting point. S3. Remove the sample and irradiate the point with continuous or high-frequency pulses at a fixed energy density; During the process, the damage diagnosis module monitors online in real time, the energy meter (25) records the transmission energy of each pulse, and the control computer (27) calculates the changes in spectral performance in real time; S4. The control computer (27) compares the results of continuous monitoring with the preset stop conditions. Once either condition is met—that is, the spectral performance is detected to have decreased to the threshold or the CCD detects damage—the computer (27) immediately issues a command to close the shutter (03), stop laser irradiation, and record all relevant data such as the total number of irradiation pulses and the reason for stopping. If neither of the above two conditions is met, but the number of irradiation pulses has reached the set safety limit, the test is also stopped, and it is recorded that the point has not failed at the current energy. S5. Data Processing Steps: Based on the test data recorded in step S4, extract the number of pulses corresponding to a 2% decrease in transmittance at different energy densities; construct a dataset between the energy density and the corresponding number of pulses, and establish a functional relationship model between the two through nonlinear regression fitting; the model is used to characterize the laser damage resistance of the optical element under test, and can estimate the number of pulses corresponding to a 2% decrease in transmittance at any given energy density, thereby establishing a lifetime prediction model for the optical element under test.

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