A magnetron sputtering power supply self-adaptive control method, system, device and medium

Abstract

The application provides a magnetron sputtering power supply adaptive control method, system, device and medium, the method comprising: for the magnetron sputtering process under the reaction sputtering condition, collecting multiple source operation signals for representing the reaction sputtering running state; based on the multiple source operation signals, analyzing the reaction sputtering running state, and dividing it into running state categories including stable running state, transition running state and abnormal trend running state; selecting corresponding intermediate frequency pulse participation modulation strategies based on the running state categories; based on the preset modulation parameter sub-gear set, mapping the intermediate frequency pulse participation proportion interval and the intermediate frequency pulse participation duration interval defined by each intermediate frequency pulse participation modulation strategy into multiple intermediate frequency pulse modulation parameter sub-gears, and determining the target intermediate frequency pulse modulation parameter sub-gear based on the reaction sputtering running state deviation, and controlling the output of the magnetron sputtering power supply according to the target intermediate frequency pulse modulation parameter sub-gear.

Images