Electrowetting electronic paper display panel and display device

Abstract

The invention relates to an electrowetting electronic paper display panel and a display device. The electrowetting electronic paper display panel comprises a first substrate and a second substrate which are oppositely arranged, the second substrate is located above the first substrate, and a plurality of pixel units arranged in an array mode are arranged on the side, facing the first substrate, of the second substrate; the color resistance layer is arranged on the surface, facing the first substrate, of the second substrate, the color resistance layer comprises color resistance units and black resistance, each pixel unit is provided with one color resistance unit, an interval area is formed between every two adjacent color resistance units, and the black resistance is arranged in the interval area; in the direction from the second substrate to the first substrate, a sub-pixel space with a narrow upper part and a wide lower part is formed between every two adjacent black resistors, so that the sub-pixel space is provided with an ink hidden area located at a corner position; at least part of the structure of the black resistor is used for limiting ambient light from entering the ink hidden area.

Description

Technical Field

[0001] This application relates to the field of electrowetting electronic paper displays, and more particularly to an electrowetting electronic paper display panel and display device. Background Technology

[0002] Electronic paper technology, as a highly promising reflective display technology, has been widely applied in various fields such as e-book readers, electronic tags, and smart wearable devices due to its outstanding characteristics such as paper-like display effect, low power consumption, high resolution, and flexibility. Among them, electrowetting electronic paper technology, as an important branch of electronic paper technology, works by controlling interfacial tension through interfacial charge. This changes the contact angle between charged ink droplets and the substrate, causing the charged ink to contract or expand, thus functioning as an optical switch. Compared with traditional electrophoretic electronic paper, it has significant advantages in response speed and color performance, making it one of the key research directions in the industry.

[0003] However, in the practical application of current electro-wetting electronic paper display devices, there are still technical bottlenecks that urgently need to be addressed. Specifically, when the display panel is in a bright state, the charged ink will shrink under the influence of an electric field. However, the shrunken ink droplets still occupy a certain display area. These shrunken ink droplets block reflected light, forming obvious black spots in the display image, directly leading to a decrease in overall display brightness and seriously affecting the visual experience. At the same time, the presence of black spots also reduces the uniformity of the image display, hindering the development of electro-wetting electronic paper towards high-precision, high-quality displays.

[0004] To address the aforementioned ink spot problem, some improvements have been implemented in the prior art. For example, a reflective baffle is placed above the ink spot, attempting to block the shrunken ink and reduce its interference with display brightness. However, this approach has significant drawbacks: it cannot efficiently contain shrunken ink and cannot simultaneously achieve high brightness and high contrast.

[0005] Therefore, there is an urgent need for a new type of electrowetting electronic paper display panel. Summary of the Invention

[0006] This application provides an electrowetting electronic paper display panel and display device to solve the technical problems in the prior art that it cannot efficiently contain shrinkage ink and cannot simultaneously achieve high brightness and high contrast.

[0007] The electrowetting electronic paper display panel provided in this application includes: Two opposing first substrates and second substrates, with the second substrate located above the first substrate, and the second substrate having a plurality of pixel units arranged in an array on the side facing the first substrate; A color resist layer is disposed on the surface of the second substrate facing the first substrate. The color resist layer includes a color resist unit and a black resist. Each pixel unit has one color resist unit. An interval region is formed between adjacent color resist units. The black resist is disposed in the interval region to separate two adjacent pixel units. In the direction from the second substrate to the first substrate, a sub-pixel space is formed between two adjacent black resists, which is narrow at the top and wide at the bottom, so that the sub-pixel space has an ink hiding area located at the corner; at least a part of the structure of the black resist is used to limit ambient light incident on the ink hiding area; the sub-pixel space has a charged ink layer, which is configured to shrink into a clump structure and be housed in the ink hiding area when in the on state.

[0008] The black ink block includes a light-shielding body and spacer microstructures. The light-shielding body is located on the surface of the second substrate facing the first substrate, and the spacer microstructures protrude from the surface of the light-shielding body facing the first substrate. Two adjacent spacer microstructures are used to limit the position of the two side boundaries of the sub-pixel space, which are narrower at the top and wider at the bottom. The light-shielding body is used to limit the ambient light incident on the ink hiding area.

[0009] The spacer microstructure includes a first surface and a second surface arranged opposite to each other. The first surface is attached to the light-shielding body, and the second surface is arranged facing the first substrate. Along the array arrangement direction of the pixel units, the width of the first surface is greater than the width of the second surface.

[0010] The display panel further includes: An electrode layer is disposed on the surface of the first substrate facing the second substrate; A reflective layer is disposed on the surface of the electrode layer facing away from the first substrate; A superhydrophobic layer is disposed on the surface of the reflective layer facing the second substrate, and the color resist layer is located between the second substrate and the superhydrophobic layer; The spacer microstructure is located between the light-shielding body and the superhydrophobic layer. The spacer microstructure also includes an outer peripheral side. The outer peripheral side is connected between the corresponding sides of the first surface and the second surface. A portion of the outer peripheral side near the first substrate and the superhydrophobic layer constitutes the ink hiding region. The cross-sectional structure of the ink hiding region is an acute angle.

[0011] The light-shielding body has a concave structure on the side facing the superhydrophobic layer, and the surface of the concave structure and each surface of the spacer microstructure are highly reflective surfaces; the spacer microstructure and the concave structure of the light-shielding body form an interlocking structure.

[0012] The spacer microstructure is constructed as a parallelogram microstructure, and the corners of the parallelogram microstructure and the superhydrophobic layer enclose the ink hiding area.

[0013] The superhydrophobic layer has an OC pore layer on the side facing the reflective layer. The OC pore layer has a pore structure corresponding to the ink hiding area, and the pore structure is used to accommodate the clump structure.

[0014] The inner wall of the aperture structure is provided with a high-reflectivity coating.

[0015] The electrode layer includes a control electrode, which is used to regulate the electrowetting effect to achieve the shrinkage and expansion of the charged ink layer. When the control electrode is charged, the charged ink layer shrinks into the ink hiding area. When the control electrode is not charged, the charged ink layer expands on the surface of the superhydrophobic layer.

[0016] This application also provides a display device, including the electrowetting electronic paper display panel described above.

[0017] The technical solutions provided in this application have the following advantages compared with the prior art: The electrowetting electronic paper display panel and display device provided in this application achieve a synergistic optimization effect of efficiently accommodating shrinkable ink and balancing high brightness and high contrast by rationally setting the structural morphology of the color resist layer and sub-pixel space. Specifically, the sub-pixel space, which is narrower at the top and wider at the bottom in the direction from the second substrate to the first substrate, forms a dedicated ink hiding area at the corner. When the display panel is in the on state, the charged ink layer can precisely shrink into a clump structure and be accommodated in the hiding area, completely avoiding the problem of shrinkable ink occupying the display area and blocking reflected light to form black spots in traditional solutions, and significantly improving the brightness and uniformity of the bright display.

[0018] Meanwhile, at least part of the structure of the black barrier can effectively limit ambient light from entering the ink-hidden area. On the one hand, it avoids unnecessary reflection or obstruction caused by ambient light shining on the ink contained in the hidden area, further enhancing the clarity of the bright state display. On the other hand, this setting does not require additional auxiliary structures such as reflectors, thus avoiding the core contradiction of existing reflector solutions that lead to increased brightness and decreased contrast in dark states, achieving a balance between high brightness and high contrast.

[0019] Furthermore, the above-mentioned structural setup achieves efficient ink containment and optical performance optimization through the morphological coordination of the color resist layer and the sub-pixel space, without the need for complex additional components. It ensures the simplicity of the display panel structure and the feasibility of the process while realizing efficient ink containment and optical performance optimization. It effectively solves the technical bottlenecks in the prior art, which is unable to efficiently contain shrinkage ink and is difficult to balance high brightness and high contrast. Attached Figure Description

[0020] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with the invention and, together with the description, serve to explain the principles of the invention.

[0021] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, for those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0022] One or more embodiments are illustrated by way of example with reference numerals in the accompanying drawings. These illustrations do not constitute a limitation on the embodiments. Elements with the same reference numerals in the drawings are denoted as similar elements. Unless otherwise stated, the figures in the drawings are not to be limited by scale.

[0023] Figure 1 A cross-sectional structural diagram of the electrowetting electronic paper display panel provided in the embodiment of this application in the off state; Figure 2 This is one of the cross-sectional structural diagrams of the electrowetting electronic paper display panel provided in the embodiments of this application in the open state; Figure 3 A second cross-sectional structural diagram of the electrowetting electronic paper display panel provided in the embodiment of this application in the open state (arrows indicate optical path examples). Figure 4 The third schematic diagram of the cross-sectional structure of the electrowetting electronic paper display panel provided in the embodiment of this application in the open state.

[0024] Explanation of reference numerals in the attached figures: 101, First substrate; 102, Electrode layer; 103, Reflective layer; 104, Superhydrophobic layer; 105, Ink; 106, High-reflectivity coating; 107, OC hole layer; 201, Color resist unit; 202, Black resist; 2021, Light-shielding body; 2022, Spacer microstructure; 204, Hole structure; 205, Second substrate. Detailed Implementation

[0025] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0026] The following disclosure provides numerous different embodiments or examples for implementing various structures of the invention. To simplify the disclosure, specific examples of components and arrangements are described below. These are merely examples and are not intended to limit the scope of the invention. Furthermore, reference numerals and / or letters may be repeated in different examples. Such repetition is for simplification and clarity and does not in itself indicate a relationship between the various embodiments and / or arrangements discussed.

[0027] For ease of description, spatial relative terms may be used in this text to describe the relative position or movement of one element or feature relative to another element or feature, as shown in the figure. These relative terms include, for example, "inside," "outside," "middle," "outer," "below," "below," "above," "front," "back," etc. Such spatial relative terms are intended to include different orientations of the device in use or operation, other than those depicted in the figure. For example, if the device in the figure undergoes a positional flip, orientation change, or change of motion, these directional indications will change accordingly. For instance, an element described as "below other elements or features" or "below other elements or features" will subsequently be oriented "above other elements or features" or "above other elements or features." Therefore, the example term "below" can include both upper and lower orientations. The device may be otherwise oriented (rotated 90 degrees or in other directions), and the spatial relative descriptions used in this text have been explained accordingly.

[0028] In current applications of electro-wetting electronic paper display devices, when the display panel is in a bright state, the charged ink shrinks under the influence of an electric field. However, the shrunken ink droplets still occupy a certain display area, blocking reflected light and forming noticeable black spots on the display screen. This directly leads to a decrease in overall display brightness and severely affects the visual experience. Furthermore, the presence of these black spots reduces the uniformity of the image, hindering the development of electro-wetting electronic paper towards high-precision, high-quality displays.

[0029] To address the aforementioned ink spot problem, a few improvements have emerged, such as placing a reflective baffle above the ink spots to attempt to block the shrunken ink and reduce its interference with display brightness. However, this type of solution has significant drawbacks: it cannot efficiently contain shrunken ink and cannot simultaneously achieve high brightness and high contrast.

[0030] To alleviate the above problems, refer to Figures 1-4This application provides an electrowetting electronic paper display panel, comprising: a color resist layer and two opposing first substrates 101 and second substrates 205, wherein the second substrate 205 is located above the first substrate 101, and the second substrate 205 has a plurality of arrayed pixel units on the side facing the first substrate 101; the color resist layer is disposed on the surface of the second substrate 205 facing the first substrate 101, and the color resist layer includes color resist units 201 and black resist units 202, each pixel unit having one color resist unit 201, and a spacing region is formed between adjacent color resist units 201, and black resist units 202 are used. A black resist 202 is disposed in the spacing region to separate two adjacent pixel units; in the direction from the second substrate 205 to the first substrate 101, two adjacent black resists 202 form a sub-pixel space that is narrow at the top and wide at the bottom, so that the sub-pixel space has an ink 105 hidden area located at the corner; at least a portion of the structure of the black resist 202 is used to limit ambient light incident on the ink 105 hidden area; the sub-pixel space has a charged ink 105 layer, which is configured to shrink into a clump structure and be housed in the ink 105 hidden area when in the on state.

[0031] For example, the first substrate 101 is a glass substrate, which serves as the basic support carrier for the electronic paper; the second substrate 205 is located above the first substrate 101, and the two are arranged in parallel relative to each other. The spacing is adapted to the stacking thickness of each functional layer of the electronic paper. For example, it can be a common electrode layer 102, reflective layer 103, superhydrophobic layer 104, etc.

[0032] For example, the pixel unit is a display basic unit arranged in an array, such as red, green and blue sub-pixels, which are evenly distributed on the side of the second substrate 205 facing the first substrate 101. Each pixel unit corresponds to a color resist unit 201, forming a basic array for color display. Its arrangement density can be set according to the display resolution requirements, such as the high pixel density array required for high-definition display.

[0033] For example, the color resist layer is directly formed on the surface of the second substrate 205 facing the first substrate 101, wherein the color resist unit 201 includes red, green, blue and other color resists, which correspond to the color display function of different pixel units respectively; a strip or square interval area is naturally formed between two adjacent color resist units 201, and this area is used to set the black resist 202.

[0034] For example, the black resist 202 is made of light-shielding black resist 202 material, and its width matches the spacing area. It is vertically set in the spacing area and can completely block the light from passing between adjacent pixel units, realizing the physical separation and optical isolation of pixel units, and avoiding the interference of light from pixels of different colors.

[0035] For example, the light-limiting function of the black resist 202 is achieved through its own structure. The light-blocking body 2021 of the black resist 202 is a dense light-blocking material that can directly block ambient light from shining directly into the ink 105 hidden area from the spacing area of ​​the pixel unit.

[0036] Based on this, by rationally setting the structural form of the color resist layer and the sub-pixel space, a synergistic optimization effect of efficiently accommodating and shrinking ink 105 while maintaining high brightness and high contrast is achieved. Specifically, the sub-pixel space, which is narrower at the top and wider at the bottom in the direction from the second substrate 205 to the first substrate 101, forms a dedicated ink 105 hiding area at the corner. When the display panel is in the on state, the charged ink 105 layer can precisely shrink into a clump structure and be accommodated in this hiding area, completely avoiding the problem of shrinking ink 105 occupying the display area and blocking reflected light to form black spots in the traditional solution, and significantly improving the brightness and uniformity of the bright display.

[0037] Meanwhile, at least part of the structure of the black resist 202 can effectively limit ambient light incident on the hidden area of ​​the ink 105. On the one hand, it avoids unnecessary reflection or occlusion caused by ambient light shining on the ink 105 contained in the hidden area, further enhancing the clarity of the bright state display. On the other hand, this setting does not require additional auxiliary structures such as reflectors, fundamentally avoiding the core contradiction of existing reflector solutions that lead to increased brightness and decreased contrast in dark states, thus achieving a balance between high brightness and high contrast.

[0038] Furthermore, the above-mentioned structural setup achieves efficient ink 105 containment and optical performance optimization through the morphological coordination of the color resist layer and the sub-pixel space, without the need for complex additional components. It also ensures the simplicity of the display panel structure and the feasibility of the process, effectively solving the technical bottlenecks in the prior art that cannot efficiently contain shrink ink 105 and are difficult to balance high brightness and high contrast.

[0039] In some embodiments, the black ink block 202 includes a light-shielding body 2021 and spacer microstructures 2022. The light-shielding body 2021 is located on the surface of the second substrate 205 facing the first substrate 101, and the spacer microstructures 2022 protrude from the surface of the light-shielding body 2021 facing the first substrate 101. Two adjacent spacer microstructures 2022 are used to limit the position of the two side boundaries of the sub-pixel space, which are narrow at the top and wide at the bottom. The light-shielding body 2021 is used to limit ambient light incident on the hidden area of ​​the ink 105.

[0040] For example, the light-shielding body 2021 is the basic functional part of the black resist 202. It is made of dense light-shielding black resist 202 material and has a sheet or block structure. It is directly fixed to the surface of the second substrate 205 facing the first substrate 101 and can be formed by mature processes such as coating and photolithography. Its shape is not limited to a specific structure and can be set as a flat plate, a concave shape on the lower side, etc., according to display requirements. Its core function is to block light leakage between adjacent pixel units and provide a mounting base for the spacer microstructure 2022.

[0041] It should be noted that the thickness and width of the light-shielding body 2021 can be flexibly adjusted according to pixel density and light-shielding requirements, as long as the core function of limiting ambient light incident on the ink 105 hidden area can be achieved, without limiting specific size parameters.

[0042] For example, the spacer microstructures 2022 are protrusions extending from the light-shielding body 2021 toward the surface of the first substrate 101. Their number and distribution must match the arrangement of the sub-pixel spaces, such as two sets of oppositely arranged spacer microstructures 2022 corresponding to each sub-pixel space. The structural shape may include, but is not limited to, trapezoids, parallelograms, polygons, etc. The protrusion height must be adapted to the overall thickness of the sub-pixel space to ensure that it is enclosed with the superhydrophobic layer 104 and other structures below to form the ink 105 hidden area.

[0043] It should be noted that the spacer microstructure 2022 can be integrally formed with the light-shielding body 2021, such as by a single photolithography process, or by a secondary processing to fix it to the surface of the light-shielding body 2021, as long as it can stably protrude from the light-shielding body 2021 and form a preset spatial boundary.

[0044] For example, two adjacent spacer microstructures 2022 correspond to the two sides of the sub-pixel space, and together define the outline of the sub-pixel space by their own arrangement angle and spacing changes. For example, when the spacer microstructure 2022 is a trapezoidal protrusion, the spacing at the end (upper end) closer to the second substrate 205 is smaller, and the spacing at the end (lower end) closer to the first substrate 101 is larger, so that the inner sidewalls of the two adjacent spacer microstructures 2022 form an inclined boundary that is narrow at the top and wide at the bottom; if it is a parallelogram microstructure, the angle between it and the light-shielding body 2021 can be adjusted so that the opposite faces of the two microstructures are inclined, which also encloses a sub-pixel space that is narrow at the top and wide at the bottom.

[0045] It should be noted that the core of limiting the boundary position is to make the sub-pixel space form a stable shape that is narrow at the top and wide at the bottom by arranging the space of the spacer microstructures 2022. There is no need to limit the specific tilt angle or spacing value of the spacer microstructures 2022, as long as it can be contained in the corner hidden area after the ink 105 shrinks.

[0046] It should also be noted that the light-limiting function of the light-blocking body 2021 does not depend on a specific structural form. Flat, concave, stepped, etc. are all acceptable, as long as the light-blocking properties of the material or the blocking effect of the structure can reduce the ambient light from shining on the ink 105 in the hidden area of ​​the ink 105. It is not necessary to limit it to only being achieved through a concave structure.

[0047] In this way, by splitting the black resist 202 into a combination of a light-shielding body 2021 and spacer microstructures 2022, with the spacer microstructures 2022 protruding from the surface of the light-shielding body 2021 facing the first substrate 101, two adjacent spacer microstructures 2022 can precisely define the positions of the two side boundaries of the sub-pixel space, which are narrower at the top and wider at the bottom. This makes the shape of the sub-pixel space more stable and regular, thereby ensuring the size consistency and positional accuracy of the ink 105 hidden area. This configuration allows the charged ink 105 to more reliably enter the preset hidden area when it shrinks, avoiding ink 105 containment failure or displacement due to unstable spatial shape, further improving the stability and uniformity of black spot elimination during bright display, and meeting the needs of high-precision display.

[0048] Meanwhile, the light-blocking main body 2021 focuses on the function of limiting light. As a dense light-blocking structure, it can directly block ambient light from shining directly into the hidden area of ​​ink 105 from the pixel spacing area. The spacing microstructure 2022, while defining the spatial boundary, can also form an additional light-blocking barrier, which plays an auxiliary role in blocking stray light that is obliquely incident on the hidden area of ​​ink 105. The two work together to form a dual light-limiting effect of main barrier combined with auxiliary barrier, which more thoroughly prevents ambient light from shining on the hidden ink 105 and causing reflection or blockage, further enhancing the clarity and brightness of the bright state display.

[0049] It should be noted that the light-shielding body 2021 and the spacer microstructure 2022 can be fabricated simultaneously using mature photolithography, coating and other processes without the need for additional complex procedures. This improves structural stability and optical performance while maintaining the simplicity and feasibility of the process, avoiding the increased cost or process difficulty caused by the additional auxiliary structures in existing technologies.

[0050] In some embodiments, the spacer microstructure 2022 includes a first surface and a second surface disposed opposite to each other. The first surface is disposed in contact with the light-shielding body 2021, and the second surface is disposed toward the first substrate 101. Along the array arrangement direction of the pixel units, the width of the first surface is greater than the width of the second surface.

[0051] For example, the first surface and the second surface are two surfaces on the spacer microstructure 2022 that are functionally and positionally opposite, not necessarily physically parallel or directly opposite. The first surface is the connection surface that enables the spacer microstructure 2022 to be fixedly connected to the light-shielding body 2021, and the second surface is the free surface of the spacer microstructure 2022 away from the light-shielding body 2021 and facing the first substrate 101. The two surfaces are distributed vertically opposite each other along the protrusion direction of the spacer microstructure 2022, and together they constitute the core contour surface of the spacer microstructure 2022. The protrusion direction can be understood as the direction from the light-shielding body 2021 to the first substrate 101.

[0052] It should be noted that the relative relationship between the two is not limited to planar relative relationships, but can also include curved relative relationships, stepped relative relationships, etc., as long as they can form a preset spatial shape through their respective size differences, without needing to limit the surface flatness or parallelism.

[0053] For example, the array arrangement direction of pixel units refers to the regular arrangement and extension direction of multiple pixel units on the second substrate 205, including but not limited to the row direction of the horizontal extension direction and the column direction of the vertical extension direction in a horizontal row and column arrangement, or the array extension direction in a honeycomb arrangement. For example, when the pixel units are arranged horizontally and uniformly, this direction is the horizontal direction; when the pixel units are arranged vertically, this direction is the vertical direction.

[0054] It should be noted that the core of this direction is the arrangement and extension trajectory of the pixel units. It does not need to be limited to a single direction, as long as it is consistent with the overall array distribution trend of the pixel units, it can adapt to display panel settings with different resolutions and different layouts.

[0055] For example, the width dimension refers to the projected width along the array arrangement direction, rather than the thickness or height of the spacer microstructure 2022. For instance, measured along the row direction of the array arrangement direction, the projected width of the first surface of the connecting surface of the light-shielding body 2021 is the first dimension, and the projected width of the second surface of the free surface facing the first substrate 101 is the second dimension. The first dimension is larger than the second dimension, and the difference in width between the two causes the side surface of the spacer microstructure 2022 to naturally form an inclined angle.

[0056] It should be noted that the measurement benchmark for the width dimension is the maximum extension span of the surface in the array arrangement direction, and there is no need to limit the specific location of the measurement point; the width difference between the first surface and the second surface does not need to be set to a fixed ratio. As long as the first surface is wider than the second surface along the array arrangement direction, the required sub-pixel spatial shape can be formed to adapt to the setting requirements of different ink 105 shrinkage volumes.

[0057] In this way, by setting the width of the first surface to be greater than that of the second surface along the pixel unit array arrangement direction, the spacing microstructure 2022 naturally forms a cross-sectional shape that is wider at the top and narrower at the bottom, such as a trapezoid or trapezoidal shape. This makes the characteristic of the sub-pixel space enclosed by two adjacent spacing microstructures 2022 being narrower at the top and wider at the bottom more prominent and the outline more regular. This morphological optimization makes the entrance to the ink 105 hidden area wider and the internal accommodating space more suitable for the size of the clump of ink 105. When the charged ink 105 shrinks, it can enter the hidden area more smoothly, and after being contained, it is not easy to shift due to external vibration or electric field fluctuations, further improving the stability and reliability of black spot elimination during bright display.

[0058] Meanwhile, this width difference makes the second side of the spaced microstructure 2022, that is, the side facing the first substrate 101, more compact. Combined with the wide-width bonding of the first side, the side facing the ink 105 hidden area forms a better tilt angle, which can more accurately block ambient light incident obliquely along the pixel array direction. Together with the direct blocking function of the light-shielding body 2021, it forms an all-round light restriction effect that combines direct and oblique light, more thoroughly preventing ambient light from shining on the hidden ink 105 and causing reflection or occlusion, further enhancing the clarity and brightness uniformity of the bright state display.

[0059] In addition, the setting that the width of the first surface is greater than the width of the second surface increases the contact area between the spacing microstructure 2022 and the light-shielding body 2021, making the spacing microstructure 2022 more firmly fixed and structurally stable. This effectively avoids the problem of changes in the spatial shape of sub-pixels due to structural deformation during processing or long-term use, ensuring the consistency of display effects of different pixel units and adapting to the display requirements of high precision and high reliability.

[0060] It should be noted that this feature does not require a specific width ratio or tilt angle. By simply varying the width between the first and second surfaces, the synergistic optimization of sub-pixel spatial morphology, light-blocking effect, and structural stability can be achieved without increasing the complexity of the manufacturing process.

[0061] In some embodiments, the display panel further includes: Electrode layer 102 is disposed on the surface of the first substrate 101 facing the second substrate 205; A reflective layer 103 is disposed on the surface of the electrode layer 102 facing away from the first substrate 101; A superhydrophobic layer 104 is disposed on the surface of the reflective layer 103 facing the second substrate 205, and a color resist layer is located between the second substrate 205 and the superhydrophobic layer 104. The spacer microstructure 2022 is located between the light-shielding body 2021 and the superhydrophobic layer 104. The spacer microstructure 2022 also includes an outer peripheral side. The outer peripheral side is connected between the corresponding sides of the first surface and the second surface. A portion of the outer peripheral side near the first substrate 101 and the superhydrophobic layer 104 constitutes an ink 105 hidden area. The cross-sectional structure of the ink 105 hidden area is an acute angle.

[0062] For example, the sub-pixel space is formed by two adjacent black resists 202, the second substrate 205 and the superhydrophobic layer 104 below. Its shape, which is narrow at the top and wide at the bottom, is achieved by the spacer microstructure 2022 on the black resist 202. That is, the spacer microstructure 2022 protrudes from the side of the black resist 202 facing the superhydrophobic layer 104. The spacer microstructure 2022 can be trapezoidal or trapezoidal, and the width of the bottom base of the trapezoidal or trapezoidal side near the superhydrophobic layer 104 is greater than the width of the top base of the side near the second substrate 205, so that the enclosed space presents a trumpet shape that is wide at the bottom and narrow at the top.

[0063] For example, the ink 105 hidden area is specifically located at the corner of the sub-pixel space, that is, at the junction of the left and right sides of the spacer microstructure 2022 and the superhydrophobic layer 104, forming an independent micro-accommodating chamber. The size of the chamber matches the clump structure of the shrunken ink 105 and is specifically used to accommodate the shrunken ink 105.

[0064] For example, the charged ink layer 105 uses conventional charged ink material for electrowetting electronic paper. In the initial state, that is, when the control electrode is not charged, the charged ink layer 105 naturally spreads on the surface of the superhydrophobic layer 104, covering part of the sub-pixel space. When the display panel is in the open state, the control electrode is energized, and the interfacial tension is regulated by the interfacial charge, changing the contact angle between the ink 105 and the superhydrophobic layer 104, causing the ink 105 to shrink from the spread state into a clump-like structure.

[0065] For example, the electrode layer 102 employs a control electrode structure for electrowetting electronic paper, directly formed on the surface of the first substrate 101 facing the second substrate 205. It is made of a metal with excellent conductivity or a transparent conductive material, such as ITO. Its core function is to generate an electric field through voltage regulation, changing the contact angle between the ink 105 and the substrate. The reflective layer 103 is disposed on the side of the electrode layer 102 facing away from the first substrate 101. It can be formed by a coating process and is made of a high-reflectivity material, such as aluminum film or silver film. It is used to reflect ambient light to enhance the brightness of the bright display. The superhydrophobic layer 104 covers the surface of the reflective layer 103 facing the second substrate 205. It is made of superhydrophobic materials such as fluoropolymers and has a low surface energy to reduce the adhesion of the ink 105. The three layers are stacked sequentially along the direction of the first substrate 101, electrode layer 102, reflective layer 103, and superhydrophobic layer 104. The layers are fixed by conventional bonding or coating processes, and the spacing is adapted to the functional requirements of each layer. For example, the spacing between electrode layer 102 and reflective layer 103 meets the requirements of electric field control.

[0066] For example, the second surface of the spacer microstructure 2022 facing the free surface of the first substrate 101 is disposed opposite to the superhydrophobic layer 104. The two can be in direct contact or have a small gap between them, without limiting the specific connection method. The core is that the protrusions of the spacer microstructure 2022 extend so that the outer peripheral side can be enclosed with the superhydrophobic layer 104 to form the ink 105 hidden area, which ensures the stability of the spatial shape and does not affect the surface properties of the superhydrophobic layer 104.

[0067] For example, the shape of the outer peripheral side can include a plane, a slightly curved surface, or a stepped surface. For instance, when the spacer microstructure 2022 is trapezoidal, the outer peripheral side is the two waist surfaces of the trapezoid; if it is a polygonal microstructure, the outer peripheral side is an inclined surface connecting the corresponding sides, without needing to limit the surface flatness or inclination angle.

[0068] For example, a cross section refers to a section plane perpendicular to the pixel unit array arrangement direction. The acute angle is the angle formed by a portion of the outer peripheral side of the spaced microstructure 2022 near the first substrate 101 and the surface of the superhydrophobic layer 104. The angle range can be any range of less than 90°. For example, if the tilt angle of the outer peripheral side is 45° and the surface of the superhydrophobic layer 104 is horizontal, the 45° angle formed between them is an acute angle. This acute angle space can accurately adapt to the size of the shrunken agglomerated ink 105, while utilizing the low adhesion characteristics of the superhydrophobic layer 104 to ensure that the ink 105 is stably contained in this area.

[0069] In this way, the electrode layer 102 can precisely control the electrowetting effect, providing a stable electric field drive for the shrinkage and expansion of the charged ink 105, ensuring that the ink 105 can respond accurately and enter the preset ink 105 hiding area; the reflective layer 103 can maximize the reflection of ambient light, and together with the light-blocking effect of the black resist 202 and the spacer microstructure 2022, reduce light loss and further improve the brightness of the bright state display; the superhydrophobic layer 104 reduces the adhesion between the ink 105 and the surface, so that the ink 105 can more smoothly detach from the effective display area when shrinking, and can avoid ink 105 residue, improving the cleanliness of the display screen and the switching response speed.

[0070] Meanwhile, the spacer microstructure 2022 is located between the light-shielding body 2021 and the superhydrophobic layer 104. Its outer peripheral side connects the first and second surfaces. Combined with the ink 105 hidden area formed by the superhydrophobic layer 104, the ink 105 is precisely and stably contained through the cross-sectional structure of the acute angle. The spatial shape of the acute angle can form a narrow-mouth containment structure, which not only provides a suitable space for the shrunken clump of ink 105, but also prevents the ink 105 from shifting due to electric field fluctuations or vibrations through spatial constraints, ensuring that the ink 105 is always confined to the non-display area and completely eliminating the risk of black spots. At the same time, the acute angle makes the inner wall of the hidden area form an inclined guide surface. Combined with the low adhesion characteristics of the superhydrophobic layer 104, it guides the ink 105 to shrink quickly and be positioned in this area, improving the response efficiency of display switching.

[0071] In addition, the outer peripheral side and the superhydrophobic layer 104 together constitute the ink 105 hidden area, forming an integrated spatial structure of light-shielding body 2021, spacer microstructure 2022 and superhydrophobic layer 104. This not only improves the connection stability between the color resist layer and the functional layer below, but also avoids the process complexity caused by setting up additional fixed structures. At the same time, the outer peripheral side continues the light-blocking function of the spacer microstructure 2022, further blocking stray light incident obliquely into the hidden area, which echoes the reflection effect of the reflective layer 103, ensuring the light utilization rate in the bright state and avoiding light leakage in the dark state.

[0072] In some embodiments, the side of the light-shielding body 2021 facing the superhydrophobic layer 104 is constructed as a concave structure, and the surface of the concave structure and each surface of the spacer microstructure 2022 are highly reflective surfaces.

[0073] For example, the black resist 202 is configured with a concave structure on the lower side. The sidewall of the concave structure can block ambient light incident at an angle. Combined with the shielding effect of the trapezoidal microstructure, it forms a double barrier to prevent ambient light from shining on the ink 105 in the hidden area and causing reflection or shielding.

[0074] For example, a high-reflectivity coating 106 can be provided on the surface of the concave structure of the black resist 202 and the surface of the spacer microstructure 2022, which can not only enhance the utilization rate of the effective reflected light, but also further reduce the stray light incident on the hidden area of ​​the ink 105 by adjusting the reflection direction.

[0075] For example, the concave structure is a structure formed by the light-shielding body 2021 being recessed inward towards the superhydrophobic layer 104. Its shape may include, but is not limited to, arc-shaped concave, trapezoidal concave, polygonal concave, etc. For example, the curved surface of the arc-shaped concave structure has a smooth transition, and the sidewall of the trapezoidal concave structure is inclined. Its concave depth and width need to be adapted to the height and spacing of the spaced microstructures 2022 to ensure that it does not affect the spatial size of the ink 105 hidden area, while effectively converging light.

[0076] It should be noted that the core function of the concave structure is to work with the highly reflective surface to achieve light convergence. There is no need to limit the specific concave angle, depth or width values, as long as a concave contour that can reflect light can be formed, it can be adapted to different sizes of pixel units.

[0077] For example, a high-reflectivity surface refers to a surface with high light reflectivity, which can be ≥85%, a common threshold for high-reflectivity surfaces in the industry, without limiting a specific value; it is achieved through surface treatment or coating processes. For instance, high-reflectivity can be achieved by depositing high-reflectivity metal coatings such as aluminum or silver films on the surface through vacuum deposition, or by improving surface smoothness through plasma surface treatment, without limiting specific reflectivity values ​​or preparation processes.

[0078] It should be noted that the high reflectivity of a high-reflectivity surface is relative to the industry's conventional surfaces. As long as its reflectivity is significantly higher than that of the untreated light-shielding body 2021 or the spaced microstructure 2022 surface, it can achieve enhanced light reflection, and is not limited to a specific reflectivity standard.

[0079] For example, when the spacer microstructure 2022 is trapezoidal, its top and bottom first surfaces, second surfaces, and outer peripheral surfaces are all treated with high reflectivity to ensure that light incident on any surface of the spacer microstructure 2022 can be reflected without light absorption loss.

[0080] It should be noted that each surface emphasizes full coverage, without omitting any exposed surface of the spaced microstructure 2022. There is no need to limit the specific number or shape of the surfaces, as long as all surfaces that may come into contact with ambient light are highly reflective surfaces.

[0081] In this way, by combining the concave structure of the light-shielding main body 2021 with the setting of a highly reflective surface, a color rendering effect of high brightness in bright states and high contrast in dark states can be achieved.

[0082] Regarding the principle of bright-state color rendering: When the display panel is turned on, the electrode layer 102 is energized to form an electric field. By regulating the interfacial tension through the interface charge, the contact angle between the charged ink 105 and the superhydrophobic layer 104 is changed, causing the charged ink 105 to shrink from an expanded state into a clump-like structure and be precisely housed within the ink 105 hidden area formed by the spacer microstructure 2022 and the superhydrophobic layer 104. At this time, when ambient light is incident on the display panel, it undergoes multiple reflection enhancements: on the one hand, the concave surface of the light-shielding body 2021 is a highly reflective surface, which can converge and reflect the obliquely incident ambient light to the reflective layer 103; on the other hand, each surface of the spacer microstructure 2022 (including the first surface, the second surface, and the outer peripheral surface) is a highly reflective surface, which can reflect the ambient light incident on its surface to the reflective layer 103 or directly guide it to the color resist unit 201; finally, the reflective layer 103 reflects all the reflected light again, and after being filtered by the color resist unit 201, it forms a specific color of emitted light, which is emitted from the display panel to present a bright image. Throughout the process, the shrunken ink 105 is contained in the hidden area, and the highly reflective surface minimizes light loss, significantly improving light utilization.

[0083] Regarding the principle of color rendering in dark states: When the display panel is off, the electrode layer 102 is de-energized, the electric field disappears, and the charged ink 105 naturally spreads under the action of surface tension and covers the effective display area of ​​the superhydrophobic layer 104. At this time, when ambient light is incident, most of the light is absorbed by the spread black ink 105; while the highly reflective surface of the concave structure of the light-shielding body 2021 and the spacer microstructure 2022, because they are partially blocked by the spread ink 105, or because the light is still absorbed by the ink 105 layer after reflection, will not produce additional reflected light, thus avoiding the problem of increased brightness in dark states. At the same time, the light-shielding properties of the black resist 202 and the light-absorbing properties of the ink 105 work together to make the display panel present a low-brightness dark state image, forming a sharp contrast with the bright state.

[0084] In some embodiments, the spacer microstructure 2022 and the concave structure of the light-shielding body 2021 form an interlocking structure.

[0085] By adapting the concave structure of the light-shielding body 2021 to the shape of the spacer microstructure 2022, a snap-fit ​​structure is formed, achieving a stable connection between the two without the need for additional fixing components. In bright display mode, the snap-fit ​​structure does not occupy the effective space of the ink 105's hidden area and does not affect the shrinkage of the charged ink 105 into the hidden area. In dark display mode, the snap-fit ​​structure's fixing effect ensures the stability of the sub-pixel space's narrow top and wide bottom shape, without interfering with the natural expansion of the ink 105. Simultaneously, the snap-fit ​​structure and the underlying superhydrophobic layer 104 form a coordinated positioning, further constraining the position of the spacer microstructure 2022, ensuring a stable light reflection path on the highly reflective surface, and preventing optical performance fluctuations due to structural displacement.

[0086] For example, the snap-fit ​​structure refers to the mutual adaptation between the concave structure of the light-shielding body 2021 and the shape of the spacer microstructure 2022, naturally forming a concave-convex fit relationship, without the need for additional fasteners such as screws or adhesives. For instance, the concave structure of the light-shielding body 2021 is a trapezoidal groove, and the root of the spacer microstructure 2022 is a matching trapezoidal protrusion, with the protrusion embedded in the groove to form a snap-fit; or the concave structure is an arc-shaped groove, and the corresponding position of the spacer microstructure 2022 is an arc-shaped protrusion, with the two fitting together and snapping together.

[0087] It should be noted that the overall formation emphasizes that the snap-fit ​​structure is part of the structure of both, rather than being spliced ​​or assembled later; the core function of the snap-fit ​​structure is to fix the relative position of the spaced microstructure 2022 and the light-shielding body 2021. Its specific matching form is not limited, as long as it can achieve stable positioning and does not affect the ink 105 containment and light transmission.

[0088] In this way, the snap-fit ​​structure integrates the light-shielding main body 2021 with the spacer microstructure 2022, preventing relative displacement due to long-term use or environmental vibration. This solves the problem of easy deformation of suspended structures in existing technologies, ensuring the long-term stability of the sub-pixel spatial shape and the size of the ink 105 hidden area. Simultaneously, the snap-fit ​​structure is naturally formed by the concave structure and the spacer microstructure 2022, without adding additional shielding components, thus not obstructing the propagation of ambient light or reflected light, ensuring that the synergistic effect of high brightness and high contrast is not affected. Furthermore, the snap-fit ​​structure can be integrally formed using mature processes such as photolithography and coating in a single step, eliminating the need for additional assembly steps. This improves structural reliability without increasing process complexity or production costs, making it suitable for large-scale mass production.

[0089] In some embodiments, the spacer microstructure 2022 is configured as a parallelogram microstructure, the corners of which are enclosed by the superhydrophobic layer 104 to form the ink 105 hidden area.

[0090] For example, the parallelogram microstructure has four connected sides, and its corners refer to the four vertices and a certain area around them. The parallelogram microstructures of two adjacent pixel units are arranged opposite each other, and their corresponding corners, such as opposite acute or obtuse vertices, together with the surface of the superhydrophobic layer 104 below, form a closed or semi-closed microspace, which is the ink 105 hiding area. For example, the lower right corner of the left parallelogram microstructure and the lower left corner of the right parallelogram microstructure, together with the horizontal surface of the superhydrophobic layer 104, enclose a triangular or quadrilateral ink 105 receiving chamber.

[0091] It should be noted that the specific side length ratio and interior angle of the parallelogram are not limited, as long as its corners can be enclosed with the superhydrophobic layer 104 to form a space that can accommodate the shrinkable ink 105; the enclosure does not need to be completely closed, as long as the ink 105 can be confined to this area through spatial constraints to prevent it from being exposed to the effective display area.

[0092] In this way, the corners of the parallelogram microstructure can form a more compact and precise ink 105 hiding area with the superhydrophobic layer 104. The acute or obtuse angles of its corners can adapt to the contour of the shrunken ink 105, making the ink 105 more closely contained and less prone to displacement, further reducing the risk of black spots appearing. At the same time, the side tilt angle of the parallelogram, in conjunction with the superhydrophobic layer 104, can additionally block stray light incident at an angle, reducing the probability of ambient light illuminating the hidden ink 105 and enhancing the clarity of the bright display.

[0093] It should be noted that the morphology of parallelogram microstructures is more compatible with mature photolithography processes. Compared with irregular microstructures, they can be mass-produced using standardized photomasks, achieving higher processing precision. Furthermore, they can better coordinate with the concave and snap-fit ​​structures of the light-shielding body 2021, improving structural stability without increasing process complexity, thus meeting the needs of large-scale mass production.

[0094] In some embodiments, the superhydrophobic layer 104 is provided with an OC pore layer 107 on the side facing the reflective layer 103. The OC pore layer 107 is provided with a pore structure 204 at the position corresponding to the hidden area of ​​the ink 105. The pore structure 204 is used to accommodate the clump-like structure.

[0095] Through the adaptive arrangement of the OC pore layer 107 and the pore structure 204, combined with the electrowetting effect and the low adhesion characteristics of the superhydrophobic layer 104, the ink 105 is completely contained. In the bright state, the electrode layer 102 is energized to form an electric field, driving the charged ink 105 to shrink into a clump-like structure. The superhydrophobic layer 104 reduces the adhesion between the ink 105 and the surface, guiding the ink 105 from the hidden area enclosed by the spacer microstructure 2022 and the superhydrophobic layer 104, further into the corresponding pore structure 204 on the OC pore layer 107. The pore structure 204 provides an independent and enclosed containment space, completely confining the ink 105 to the non-display area, without interfering with the light reflection of the reflective layer 103. In the dark state, the electrode layer 102 is de-energized, and the ink 105 expands under the action of surface tension. The pore structure 204 does not prevent the ink 105 from covering the effective area of ​​the superhydrophobic layer 104, ensuring that the light absorption effect in the dark state is not affected.

[0096] For example, the OC aperture layer 107 is an insulating layer made of conventional overcoat material for display panels. It is formed on the side of the superhydrophobic layer 104 facing the reflective layer 103 by photolithography. Its thickness is adapted to the depth of the aperture structure 204. Its core function is to support the aperture structure 204 and realize the structural transition between the superhydrophobic layer 104 and the reflective layer 103. The material needs to have good flatness and process compatibility, and not affect the overall optical performance of the electronic paper.

[0097] For example, the pore structure 204 is a cavity structure formed by an inward recess on the OC pore layer 107. The opening position is completely aligned with the hidden area of ​​the ink 105 enclosed by the spacer microstructure 2022 and the superhydrophobic layer 104, ensuring that the shrunken ink 105 can enter precisely. Its shape may include circular, square, polygonal, etc., and the inner diameter and depth are adapted to the size of the clump of ink 105. There is no need to limit the specific shape and size, as long as it can completely accommodate the clump of ink 105.

[0098] For example, when the display panel is in a bright state, the shrunken clump of ink 105, guided by the electric field force and the low adhesion properties of the superhydrophobic layer 104, will enter the hole structure 204 from the initial ink 105 hiding area; the ink 105 is completely fixed by the cavity constraint of the hole structure 204, and will not shift even when the display is switched or there is slight vibration, ensuring that the ink 105 is always in the non-display area, thus achieving complete hiding.

[0099] In this way, the aperture structure 204 provides a dedicated enclosed space for the clump-shaped ink 105. Compared with the open hidden area enclosed only by the spacer microstructure 2022 and the superhydrophobic layer 104, it can prevent the ink 105 from overflowing due to electric field fluctuations, vibrations, or display switching, completely eliminating the risk of black spots. At the same time, it maximizes the release of the effective display area of ​​the sub-pixels, increases the aperture ratio, and allows more reflected light to be emitted through the color resist unit 201, further improving the display brightness and image accuracy. Meanwhile, the OC aperture layer 107 is formed by photolithography. The size and shape of the aperture structure 204 can be flexibly adapted to the volume and shape of the clump-shaped ink 105, and the preparation process is compatible with existing electronic paper processes without the need for additional complex procedures. In addition, the aperture structure 204 is only set for the hidden area of ​​the ink 105, without blocking the effective reflective surface of the reflective layer 103, and without interfering with the light-blocking effect of the black resist 202 and the spacer microstructure 2022, ensuring that the synergistic effect of high reflectivity in bright state and low light leakage in dark state is not affected.

[0100] In some embodiments, the inner wall of the aperture structure 204 is provided with a high-reflectivity coating 106.

[0101] By adding a high-reflectivity coating 106 to the inner wall of the aperture structure 204, a synergistic reflection system is formed with the high-reflectivity surfaces of the reflective layer 103, the black resist 202, and the spacer microstructures 2022. In the bright state, the contracted, clump-shaped ink 105 is contained within the aperture structure 204. After ambient light is reflected by the reflective layer 103, some light will enter the inner wall of the aperture structure 204. The high-reflectivity coating 106 can reflect this light back to the effective display area, preventing the light from being absorbed by the substrate of the aperture structure 204. At the same time, the reflected light is filtered by the color resist unit 201 before being emitted, maximizing the light utilization rate. In the dark state, the extended ink 105 covers the superhydrophobic layer 104 and blocks the opening of the aperture structure 204. The high-reflectivity coating 106 is covered by the ink 105, and no additional reflected light is generated, which does not affect the light absorption effect in the dark state, ensuring that the contrast is not affected.

[0102] For example, the high-reflectivity coating 106 refers to a functional layer coated or deposited on the inner wall of the pore structure 204, which has a high light reflection capability. Its reflectivity is significantly higher than that of the pore structure 204 substrate, such as OC material. Its core function is to reduce light loss and improve light reflection efficiency.

[0103] For example, the high-reflectivity coating 106 may include a metal coating, a high-reflectivity dielectric film, or other composite coatings with high reflectivity, as long as they can achieve efficient light reflection.

[0104] For example, the high-reflectivity coating 106 can be formed by conventional processes such as vacuum evaporation coating, magnetron sputtering, sol-gel coating, and screen printing, without limiting the specific process method.

[0105] For example, it is sufficient to cover all the inner surfaces of the aperture structure 204 that may come into contact with light. It can cover the key reflective areas completely or partially, without limiting the integrity of the coverage. The coating thickness can be flexibly adjusted according to the reflectivity requirements without limiting the specific size. Moreover, there is no need to set a fixed reflectivity value, as long as its reflectivity is significantly higher than that of the aperture structure 204 substrate.

[0106] In this way, the high-reflectivity coating 106 avoids light loss on the inner wall of the aperture structure 204, allowing more ambient light to participate in the color development process. Compared with the uncoated aperture structure 204, the brightness of the bright state is further improved, and the light distribution is more uniform, reducing the brightness difference of the image. In the bright state, the intensity of the effective reflected light is enhanced, and in the dark state, it is completely blocked by the ink 105, so there is no light leakage. This further widens the brightness difference between the bright and dark states, making the colors of the image more vivid and the details clearer. The high-reflectivity coating 106 can be prepared by mature processes such as vacuum deposition, sputtering, and coating, and is compatible with the photolithography process of the OC aperture layer 107. No additional complex processes are required, which improves the functionality while maintaining the feasibility of large-scale mass production.

[0107] In some implementations, the cross-section of the concave structure is arc-shaped or polygonal.

[0108] For example, the arc-shaped concave structure refers to the smooth and continuous concave surface formed on the side of the light-shielding body 2021 facing the superhydrophobic layer 104, with a cross-section in the shape of a circular arc, elliptical arc, or parabola, etc., without sharp edges. Its concave depth can be flexibly set according to the pixel size, and the radius of curvature is adapted to the protrusion height of the spacer microstructure 2022 to ensure a close snap-fit ​​fit with the spacer microstructure 2022.

[0109] In this way, the curved surface, without sharp edges, can form a uniform high-reflectivity coating 106 through coating or surface treatment. This coating can converge and reflect obliquely incident ambient light to the reflective layer 103, reducing light scattering loss and avoiding blind spots in the reflection of light at sharp edges, thus improving the utilization rate of bright light. Simultaneously, the smooth curved surface and the sides of the spaced microstructures 2022 form a close-fitting snap-fit ​​structure, resulting in a larger contact area and stronger structural stability. This prevents displacement due to vibration during long-term use and does not affect the guiding path of the ink 105 during shrinkage. Furthermore, the curved surface has no protrusions or depressions, and combined with the low adhesion properties of the superhydrophobic layer 104, it prevents ink 105 residue in corners, ensuring uniform spreading of the ink 105 in dark conditions and improving the cleanliness of the displayed image.

[0110] For example, the polygonal concave structure refers to the concave portion of the light-shielding body 2021 having a polygonal cross-section, including but not limited to trapezoidal, triangular, quadrilateral, pentagonal, and other angular shapes. Its side length and interior angle can be adjusted according to light-blocking requirements and process feasibility. The core is to achieve light blocking and structural snap-fit ​​through the cooperation of multiple sides.

[0111] In this way, the multiple sides of the polygon can form multi-directional blocking. For example, the two side walls of the trapezoidal concave structure are inclined, which can block oblique incident light at different angles. Combined with the light-blocking properties of the black block 202, it further reduces light leakage in dark states and improves contrast. At the same time, the edges or sides of the polygon can be precisely adapted to the contour of the spacer microstructure 2022. For example, the lower base of the trapezoidal concave structure fits into the upper surface of the spacer microstructure 2022, and the two side walls form a snap-fit ​​with the side of the spacer microstructure 2022. Compared with the curved structure, the snap-fit ​​positioning is more precise and avoids structural displacement. In addition, the polygonal structure can be realized through standardized photolithography process, without the need for complex curved surface processing, making it suitable for mass production. Moreover, the internal angle can be flexibly adjusted to adapt to pixel units and spacer microstructures 2022 of different sizes.

[0112] In some implementations, the highly reflective surface is formed by a surface treatment process or a coating process.

[0113] In this way, through mature surface treatment or coating processes, highly reflective surfaces are formed on the concave surface of the light-shielding main body 2021 and the surfaces of the spacer microstructures 2022, without changing the original structure's shape, size, or functional adaptability. In the bright state, this highly reflective surface, in conjunction with the reflective layer 103 and the superhydrophobic layer 104, efficiently reflects incident ambient light to the effective display area, reducing light absorption loss on the structural surface. In the dark state, the spread ink 105 covers the superhydrophobic layer 104 and blocks the main reflection path of the highly reflective surface, preventing additional light leakage and ensuring that the light absorption effect in the dark state is unaffected. Both processes can precisely control the reflectivity of the highly reflective surface and are compatible with existing core processes such as photolithography and lamination in electronic paper, without requiring a restructuring of the production process.

[0114] In some embodiments, the electrode layer 102 includes a control electrode for regulating the electrowetting effect to achieve the shrinkage and expansion of the charged ink layer 105; when the control electrode is charged, the charged ink layer 105 shrinks into the ink 105 hidden area; when the control electrode is not charged, the charged ink layer 105 expands on the surface of the superhydrophobic layer 104.

[0115] Thus, based on the electrowetting effect, the interfacial charge and interfacial tension are regulated by controlling the charging state of the control electrode, thereby changing the contact angle between the charged ink layer 105 and the superhydrophobic layer 104: when the control electrode is charged, the electric field causes the interfacial tension to change, the surface energy of the charged ink layer 105 decreases, and it shrinks from a stretched state to a clumped structure. Guided by the low adhesion characteristics of the superhydrophobic layer 104, it precisely enters the hidden area of ​​the ink layer 105; when the control electrode is not charged, the electric field disappears, the interfacial tension returns to its initial state, and the charged ink layer 105 naturally stretches under the action of surface tension, uniformly covering the surface of the superhydrophobic layer 104, thereby realizing the switching of the display state.

[0116] In some embodiments, the color resist unit 201 includes at least one of red, green and blue color resists, and the black resist 202 is made of light-shielding black resist 202 material.

[0117] In this way, the color resist unit 201 covers at least one of red, green, and blue, which can flexibly meet the application needs of color and monochrome electronic paper and adapt to different scenarios such as e-books and electronic tags. The light-shielding material of the black resist 202 can efficiently achieve optical isolation between pixels, avoiding color shift or image blur caused by light crosstalk. Combined with the aforementioned high reflective surface and ink 105 hiding setting, the color display is more vivid and the details are clearer. At the same time, the selected color resist and black resist 202 materials are both mature materials in the field of electronic paper and are compatible with photolithography, coating and other processes. While expanding the display function, it does not increase the process difficulty and maintains the feasibility of mass production and cost control of the solution.

[0118] To better understand the technical solutions of the electrowetting electronic paper display panel and display device provided in the embodiments of this disclosure, the following exemplary description is provided: Example 1: like Figure 1 and Figure 2 As shown, this embodiment includes multiple structures: a color resist layer for color display, a black resist 202 for light blocking, and the black resist 202 having a concave shape on the lower side; a trapezoidal microstructure (i.e., spacer microstructure 2022), which is the area between the corner of the parallelogram microstructure and the superhydrophobic layer 104, used as the hiding area for the ink 105 dots, and the trapezoidal microstructure and the concave structure of the black resist 202 together form a snap-fit ​​structure to improve structural stability; black ink 105, which is a commonly used material for electrowetting electronic paper; a reflective layer 103, disposed on the lower side of the superhydrophobic layer 104, for reflective display; a control electrode, used to regulate the electrowetting effect to realize the on / off display; and a first substrate 101, which is a conventional glass substrate.

[0119] Principle of the closed state: like Figure 1 As shown, at this time, the control electrode is not charged, and the black ink 105 naturally spreads on the upper side of the superhydrophobic layer 104. External light will be incident on the black ink 105 or the black color resist through surface reflection and be absorbed, without the problem of high brightness in the dark state caused by the reflection of the dark state reflector as in the background scheme.

[0120] Principle of display status: like Figure 2 At this time, the control electrode is in the open state, and the contact angle between the ink 105 and the substrate changes. The black ink 105 retracts into the hidden area of ​​the trapezoidal structure on both sides. The microcavity structure is narrow at the bottom and wide at the top, which can greatly reduce the amount of external light incident on the ink 105 dots, thereby reducing the appearance of black ink 105 dots and improving display brightness. At the same time, as shown in the figure, the green and yellow external light portions can be reflected through a series of reflections and finally emitted into the corresponding color resist opening areas, without incident into adjacent color resist areas. This also reduces the problem of color shift in the display.

[0121] Example 2: like Figure 3 Based on Example 1, Example 2 can further optimize the trapezoidal microstructure and the black barrier 202. The concave side surface of the light-shielding body 2021 is set as a high-reflectivity surface, which can be achieved through surface treatment or coating. The trapezoidal structure surface is also covered with a high-reflectivity coating 106, which can control the reflected light. Together with the reflective layer 103 below, it can further maximize the light utilization rate in the bright state, improve the brightness, and reduce light leakage in the dark state, thereby improving the CR.

[0122] Example 3: like Figure 4 Based on Example 2, Example 3 can further optimize the hidden area of ​​the black resist 202-trapezoidal structure. Under the superhydrophobic layer 104, an OC hole layer 107 is formed through photolithography and photolithography. In the hidden area of ​​the black resist 202-trapezoidal structure, a hole structure 204 is formed. When the black ink 105 shrinks, it enters the hidden area, further realizing the hiding of the ink 105. Moreover, the setting of the gentle slope does not affect the control of the hydrophobic layer on the ink 105, realizing the complete hiding of the ink 105. In the bright state, the aperture ratio is maximized, improving the display brightness and display effect.

[0123] The above embodiments 1-3 are applicable not only to color electronic paper but also to black and white electronic paper, and the settings can all be manufactured using mature processes and equipment. In summary, the above solutions are beneficial to improving the aperture ratio and light utilization rate of electronic paper, and are suitable for high-precision and high-brightness settings.

[0124] It should be understood that the terminology used herein is for the purpose of describing particular exemplary embodiments only and is not intended to be limiting. Unless the context clearly indicates otherwise, the singular forms “a,” “an,” and “described” as used herein may also include the plural forms. The terms “comprising,” “including,” “containing,” and “having” are inclusive and therefore indicate the presence of the stated features, steps, operations, elements, and / or components, but do not exclude the presence or addition of one or more other features, steps, operations, elements, components, and / or combinations thereof. The method steps, processes, and operations described herein are not construed as requiring them to be performed in a particular order described or illustrated unless the order of performance is explicitly indicated. It should also be understood that additional or alternative steps may be used.

[0125] Although terms such as first, second, third, etc., may be used in this document to describe multiple elements, components, regions, layers, and / or segments, these elements, components, regions, layers, and / or segments should not be limited by these terms. These terms may be used only to distinguish one element, component, region, layer, or segment from another. Unless the context clearly indicates otherwise, terms such as "first," "second," and other numerical terms used herein do not imply order or sequence. Therefore, the first element, component, region, layer, or segment discussed below may be referred to as the second element, component, region, layer, or segment without departing from the teachings of the exemplary embodiments.

[0126] The above description is merely a specific embodiment of the present invention, enabling those skilled in the art to understand or implement the invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the invention. Therefore, the present invention is not to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features claimed herein.

Claims

1. An electrowetting electronic paper display panel, comprising: Two opposing first substrates and second substrates, with the second substrate located above the first substrate and having a plurality of pixel units arranged in an array on the side of the second substrate facing the first substrate; A color resist layer is disposed on the surface of the second substrate facing the first substrate. The color resist layer includes a color resist unit and a black resist. Each pixel unit has one color resist unit. An interval region is formed between adjacent color resist units. The black resist is disposed in the interval region to separate two adjacent pixel units. In the direction from the second substrate to the first substrate, a sub-pixel space is formed between two adjacent black resists, which is narrow at the top and wide at the bottom, so that the sub-pixel space has an ink hiding area located at the corner; at least a part of the structure of the black resist is used to limit ambient light incident on the ink hiding area; the sub-pixel space has a charged ink layer, which is configured to shrink into a clump structure and be housed in the ink hiding area when in the on state.

2. The electrowetting electronic paper display panel according to claim 1, characterized in that, The black ink block includes a light-shielding body and spacer microstructures. The light-shielding body is located on the surface of the second substrate facing the first substrate, and the spacer microstructures protrude from the surface of the light-shielding body facing the first substrate. Two adjacent spacer microstructures are used to limit the position of the two side boundaries of the sub-pixel space, which are narrower at the top and wider at the bottom. The light-shielding body is used to limit the ambient light incident on the ink hiding area.

3. The electrowetting electronic paper display panel according to claim 2, characterized in that, The spacer microstructure includes a first surface and a second surface disposed opposite to each other. The first surface is attached to the light-shielding body, and the second surface is disposed facing the first substrate. Along the array arrangement direction of the pixel units, the width of the first surface is greater than the width of the second surface.

4. The electrowetting electronic paper display panel according to claim 3, characterized in that, The display panel also includes: An electrode layer is disposed on the surface of the first substrate facing the second substrate; A reflective layer is disposed on the surface of the electrode layer facing away from the first substrate; A superhydrophobic layer is disposed on the surface of the reflective layer facing the second substrate, and the color resist layer is located between the second substrate and the superhydrophobic layer; The spacer microstructure is located between the light-shielding body and the superhydrophobic layer. The spacer microstructure also includes an outer peripheral side. The outer peripheral side is connected between the corresponding sides of the first surface and the second surface. A portion of the outer peripheral side near the first substrate and the superhydrophobic layer constitutes the ink hiding region. The cross-sectional structure of the ink hiding region is an acute angle.

5. The electrowetting electronic paper display panel according to claim 4, characterized in that, The side of the light-shielding body facing the superhydrophobic layer is constructed as a concave structure, and the surface of the concave structure and each surface of the spacer microstructure are highly reflective surfaces; the spacer microstructure and the concave structure of the light-shielding body form an interlocking structure.

6. The electrowetting electronic paper display panel according to claim 4, characterized in that, The spacer microstructure is constructed as a parallelogram microstructure, and the corners of the parallelogram microstructure and the superhydrophobic layer enclose the ink hiding area.

7. The electrowetting electronic paper display panel according to claim 4, characterized in that, The superhydrophobic layer has an OC pore layer on the side facing the reflective layer. The OC pore layer has a pore structure corresponding to the position of the ink hiding area. The pore structure is used to accommodate the clump structure.

8. The electrowetting electronic paper display panel according to claim 7, characterized in that, The inner wall of the aperture structure is coated with a high-reflectivity coating.

9. The electrowetting electronic paper display panel according to claim 4, characterized in that, The electrode layer includes a control electrode, which is used to regulate the electrowetting effect to achieve the shrinkage and expansion of the charged ink layer; when the control electrode is charged, the charged ink layer shrinks into the ink hiding area; when the control electrode is not charged, the charged ink layer expands on the surface of the superhydrophobic layer.

10. A display device, characterized in that, Including the electrowetting electronic paper display panel as described in any one of claims 1-9.

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