Plasma head and plasma generating device

Abstract

The plasma head includes: a pair of electrodes to which a voltage is applied and to which a circulating process gas is converted into plasma; a support part that supports the electrode; a grounding part which is in contact with and grounded to an electrode member including an electrode and / or a member electrically connected to the electrode; and one or more discharge receiving parts provided on the support part and formed toward the electrode member.

Description

Technical Field

[0001] This specification discloses a plasma head and a plasma generating device. Background Technology

[0002] Conventionally, plasma generating devices have been proposed, for example, in which a dielectric section is provided on the opposing surfaces of a pair of electrodes, and a slit passage forming a discharge section is formed between these dielectric members via electrodes. The two ends of the dielectric members in the width direction extend from the opposing surfaces of the electrodes, and spacers are provided between these extended ends (e.g., Patent Document 1). In this device, the inner end face of the slit passage formed by the spacers in the width direction is located outside the discharge section in the width direction, thereby mitigating the electric field concentration at the inner end face of the slit passage used for discharge.

[0003] Existing technical documents Patent documents Patent Document 1: Japanese Patent Application Publication No. 2006-228658 Summary of the Invention

[0004] The technical problem that the invention aims to solve However, in the aforementioned plasma generating device, certain abnormalities may occur at the grounding point, such as electric arcs sometimes falling onto the object being processed. In this plasma generating device, the base plate opposite the object being processed is used as a lightning rod; however, in structures where the base plate opposite the object cannot be positioned near the blow-out port, plasma processing sometimes cannot be performed normally.

[0005] The present invention was made in view of such a problem, and its main objective is to provide a plasma head and a plasma generation device that can perform plasma processing more reliably.

[0006] Technical solutions for solving technical problems In order to achieve the above-mentioned main objectives, the following technical solutions are adopted in this invention.

[0007] The plasma head of the present invention comprises: A pair of electrodes, to which a voltage is applied, plasmaizes the flowing process gas; A support portion that supports the electrode; A grounding portion that contacts and is grounded in relation to an electrode component, the electrode component comprising the electrode and / or a component electrically connected to the electrode; and One or more discharge receiving portions are disposed on the support portion and are formed facing the electrode member.

[0008] In this plasma head, even when the grounding part cannot be used, the electric arc is guided to the discharge receiving part, which is provided on the support part and is formed towards the electrode member. Therefore, plasma processing can be performed more reliably by further suppressing false discharges. Attached Figure Description

[0009] Figure 1 This is a schematic diagram illustrating an example of a plasma generating device 10.

[0010] Figure 2 These are a perspective view and a cross-sectional view of the plasma head 40.

[0011] Figure 3 This is an explanatory diagram of the rectifier section 50 and the discharge receiving section 46.

[0012] Figure 4 This is an explanatory diagram of the cover component 35 and the confirmation part 36.

[0013] Figure 5 This is an illustrative diagram illustrating plasma treatment when the brushes of plasma heads 140 and 40 are consumed. Detailed Implementation

[0014] This embodiment will be described with reference to the accompanying drawings. Figure 1 This is a schematic diagram illustrating an example of a plasma generating device 10. Figure 2 These are a perspective view and a cross-sectional view of the plasma head 40. Figure 3 This is an explanatory diagram of the rectifier section 50 and the discharge receiving section 46. Figure 4 This is an explanatory diagram of the cover component 35 and the confirmation part 36. It should be noted that, in this embodiment, for convenience, the left-right direction (X-axis), front-back direction (Y-axis), and up-down direction (Z-axis) are as follows... Figure 1 As shown. Here, we will take the case where the plasma generating device 10 is, for example, an atmospheric pressure plasma generating device as an example for explanation.

[0015] The plasma generating device 10 is a device that generates plasma under atmospheric pressure. For example... Figure 1 As shown, the plasma generating apparatus 10 includes an arm robot 12, a control unit 20, a power supply unit 28, a gas supply unit 30, and a plasma head 40. The plasma generating apparatus 10 receives power from the power supply unit 28 via a power cable to the plasma head 40, and receives plasmaified process gas from the gas supply unit 30 via a supply pipe 31. The plasma generating apparatus 10 irradiates the workpiece W with plasma gas from the plasma head 40, performing surface treatment on the workpiece W.

[0016] The arm robot 12 is configured as a moving part that moves the plasma head 40 by approaching or moving away from the workpiece W. This arm robot 12 can be configured as, for example, a vertical multi-joint type five-axis robot or a six-axis robot. The arm robot 12 has a mounting part 13, an arm 14, a drive motor 15, and a base part 16. The mounting part 13 is a part that can mount and detach the plasma head 40, and is disposed at the front end of the arm 14. The arm 14 is a plurality of components supported by joint axes, which can rotate freely around the joint axes, allowing the plasma head 40 to move in three-dimensional space in the front-back, left-right, and up-down directions. The drive motor 15 is disposed at each joint axis and drives the joint axis to rotate. The base part 16 supports and mounts the arm 14. It should be noted that, here, an arm robot 12 is used as the moving part, but as long as the plasma head 40 can move freely, it could also be an XY robot capable of moving the plasma head 40 in the up-down direction.

[0017] The control unit 20 controls each component of the plasma generating apparatus 10. The control unit 20 includes a control unit 21, a storage unit 22, a communication unit 23, a display unit 24, and an operation unit 25. The control unit 21 is configured as a microprocessor centered on a CPU, controlling the entire plasma generating apparatus 10. The control unit 21 outputs control signals to the arm robot 12, the power supply unit 28, the gas supply unit 30, the plasma head 40, etc. The storage unit 22 is a high-capacity storage medium such as flash memory, storing the program for controlling the plasma generating apparatus 10, including work information such as the shape of the workpiece W and the surface treatment position. The communication unit 23 is an interface for exchanging information with external devices such as a management server (not shown). The display unit 24 is a display showing information to the operator. The operation unit 25 allows the operator to make various inputs, including various buttons, levers, etc. It should be noted that in the plasma generating device 10, the control device 20 is used to control the arm robot 12, the power supply device 28, the gas supply device 30, and the plasma head 40. However, control units can be set up in each device, or multiple control units can be used to handle each control process.

[0018] The power supply device 28 is a device that supplies power to the external electrode 41 and the internal electrode 42. For example, the power supply device 28 generates high-frequency alternating current from a commercial power source to supply the pair of external electrodes 41 and internal electrodes 42 of the plasma head 40. The power supply device 28 supplies the generated alternating current to the external electrodes 41 and internal electrodes 42 of the plasma head 40.

[0019] The gas supply device 30 is a device for supplying process gas to the external electrode 41 and internal electrode 42 of the plasma head 40. The gas supply device 30 can also pressurize and supply air, containing at least one of an inert gas such as nitrogen and an active gas such as oxygen, as the process gas. The gas supply device 30 includes a supply pipe 31, a supply valve 32, and a gas supply tank (not shown). The supply pipe 31 is a pipe connecting the supply tank of the gas supply device 30 to the plasma head 40. The supply valve 32 controls the supply and stop of the process gas. It should be noted that the gas supply device 30 may also, if necessary, include a heater for heating the process gas supplied to the plasma head 40.

[0020] The plasma head 40 irradiates the workpiece W, which is supported on the workpiece stage, with plasma gas to modify the surface of the workpiece W. Examples of surface modification include changing the surface from hydrophobic to hydrophilic. The plasma head 40 is detachably mounted to the mounting portion 13 of the arm robot 12. The base end of the plasma head 40 is mounted to the mounting portion 13, and the front end is covered by a cover member 35. A nozzle 47 for irradiating the plasma gas generated by the plasma head 40 is provided at the lower part of the cover member 35. The plasma head 40 includes an external electrode 41, an internal electrode 42, a drive portion 43, a support portion 44, a nozzle 47, and a grounding portion 50.

[0021] The external electrode 41 is a component with a nozzle 47 forming it, through which process gas flows. The external electrode 41 is electrically grounded by means of a brush 51, which serves as a grounding component 50. Figure 2 , Figure 3As shown, the external electrode 41 is fixed to the bracket 41a. The bracket 41a is a cylindrical component disposed at the top end of the main body 48 and allowing the process gas to flow. It should be noted that the bracket 46 is a component electrically connected to the external electrode 41, and therefore the bracket 46 can also be part of the external electrode 41. The internal electrode 42 is an electrode housed inside the bracket 41a connected to the external electrode 41, and is used to plasma-encode the process gas between the internal electrode 42 and the external electrode 41. The internal electrode 42 is fixed to the bracket 42s and electrically connected to a power cable connected to the power supply device 28, and applies voltage to the process gas using the power supplied from the power supply device 28. The bracket 42a is a component connected to the power supply device 28, formed with a thinner front end, and capable of inserting the internal electrode 42 inside. It should be noted that the bracket 42a is a component electrically connected to the internal electrode 42, and therefore the bracket 42a can also be part of the internal electrode 42. A rectifier member 55 is disposed on the upper part of the internal electrode 42. The rectifier 55 is a component that causes the process gas to flow in a spiral stream between the external electrode 41 and the internal electrode 42 during plasmaization. In the plasma head 40, plasma gas is generated by applying a voltage to the process gas supplied between the external electrode 41 and the internal electrode 42. The plasma head 40 includes components electrically connected to the external electrode 41 and the internal electrode 42; for ease of explanation, these are collectively referred to as "electrode components." The nozzle 47 is a front-end component that forms an outlet for ejecting plasma-generated plasma gas. The nozzle 47 is disposed at the lower end of the plasma head 40 in a manner opposite to the workpiece W. An internally inclined surface 52 is formed at the upstream end of the internal component 51 in the flow direction of the process gas, tilting towards the second component 57. In the plasma head 40, plasma gas is generated by applying a voltage to the process gas supplied between the external electrode 41 and the internal electrode 42.

[0022] The drive unit 43 is a motor that drives the rotation of the main body 48 at the front end of the plasma head 40. The plasma head 40 rotates the main body 48 while irradiating plasma gas onto the workpiece W. The main body 48 is equipped with an external electrode 41, an internal electrode 42, and a nozzle 47, etc.

[0023] The support portion 44 is a component that supports the main body 48 of the plasma head 40 so that it can rotate about its central axis. The support portion 44 is detachably mounted to the mounting portion 13. In addition to supporting the main body 48, the support portion 44 also supports the supply pipe 31 connected to the gas supply device 30, the power cable connected to the power supply device 28, and the like. The support portion 44 supports the main body 48 in a rotatable manner using a fixing member 45 disposed below it. The fixing member 45 is a component with a box-shaped wall portion that houses the upper part of the main body 48. The fixing member 45 is a conductive component, connected to a conductive cable (not shown), and electrically grounded. Figure 2 , Figure 3 As shown, the fixing member 45 fixes the grounding portion 50 to the electrode member on a fixing surface in a direction orthogonal to the rotation axis of the main body 48. The fixing member 45 has an opening 49 that allows the main body 48, including the outer electrode 41 and the inner electrode 42, to be received internally in a non-contact state. The grounding portion 50 is fixed near the opening edge 49a of the opening 49.

[0024] In addition, such as Figure 3 As shown, a discharge receiving portion 46 is provided on the fixing member 45. The discharge receiving portion 46 is a portion that effectively grounds the external electrode 41 when the grounding portion 50, which grounds the external electrode 41, is not functioning. The discharge receiving portion 46 is provided on the fixing member 45 of the support portion 44 and is formed towards the electrode member. This discharge receiving portion 46 is non-contact with the electrode member and is a conductive member grounded by means of the fixing member 45. The discharge receiving portion 46 is provided on the fixing member 45, which is provided with the grounding portion 50 and is electrically grounded. This discharge receiving portion 46 is formed on the fixing member 45 of the support portion 44 as a portion protruding towards the electrode member that rotates toward the axis. The discharge receiving portion 46 can be another member disposed on the fixing member 45, or it can be an integrally formed piece in which a portion of the fixing member 45 is machined into a protruding shape. The discharge receiving portion 46 can also be formed by a portion of the fixing member 45 protruding toward the electrode member side, the fixing member 45 being disposed with the grounding portion 50 and electrically grounded, and facing the electrode member. Alternatively, the discharge receiving portion 46 may be formed to protrude from the opening edge 49a of the fixing member 45 toward the electrode member. The discharge receiving portion 46 may be located opposite the electrode member, and may be provided only once on the support portion 44, or it may be provided at multiple locations. For example, more than one discharge receiving portion 46 may be present, but it may also be provided only once on the front side of the plasma head 40, or it may be provided at three locations between the fixing portions of the grounding portion 50.

[0025] The grounding portion 50 contacts the electrode member containing the external electrode 41 and / or a component electrically connected to the external electrode 41, grounding the external electrode 41. The grounding portion 50 also contacts the rotating body 48, electrically grounding it. Figures 1-3 As shown, the grounding portion 50 includes a brush 51 and a brush fixing portion 52. The brush 51 is a contact member that contacts the electrode component electrically connected to the external electrode 41. The brush 51 is formed of a conductive material such as carbon and is a consumable item that is consumed during use. The brush 51 is replaced by the operator as it is consumed. The brush fixing portion 52 is a member that fixes the brush 51 so that it can contact the electrode component. In the plasma head 40, since the electrode component rotates, the grounding portion 50 is fixed at three locations on the opening edge 49a from the viewpoint of further improving the contact during rotation. The brush fixing portion 52 has a force-applying part, such as a spring, built in to apply force to the brush 51 toward the electrode component. The external electrode 41 is grounded by means of the conductive brush 51, the brush fixing portion 52, the fixing member 45, and the conductive cable.

[0026] The cover component 35 is a component that covers the electrode components of the plasma head 40. For example... Figure 1 , Figure 4 As shown, the cover member 35 includes: a wall portion 36 that covers the electrode member; and a confirmation portion 37 formed on the wall portion 36 such that the discharge receiving portion 46 can be visually confirmed. The wall portion 36 is a member that protects the electrode member and improves the safety of the operator and the surrounding area by covering the electrode member. The confirmation portion 37 can be an opening that allows visual confirmation of the interior, or it can be a window portion in which a transparent window member is embedded. One or more confirmation portions 37 may be provided depending on the placement of the discharge receiving portion 46. When a discharge receiving portion 46 is provided on the front side of the plasma head 40, the confirmation portion 37 is provided at a position where the discharge receiving portion 46 can be confirmed. Furthermore, when the discharge receiving portion 46 is provided in multiple locations, the confirmation portion 37 may also be provided in multiple locations depending on its placement. The operator can, for example, confirm the condition of the discharge receiving portion 46 and its surroundings, such as the occurrence of an arc discharge to the discharge receiving portion 46. It should be noted that, preferably, when a discharge receiving part 46 and a confirmation part 37 are provided, the operator can easily confirm the arc discharge.

[0027] Next, the surface modification treatment of the workpiece W performed by the plasma generation apparatus 10 configured as described will be explained. If the start of the surface modification treatment is input from the operation unit 25, firstly, the control unit 21 outputs a command signal to the gas supply device 30, causing process gas to be supplied to the plasma head 40. Next, the control unit 21 moves the plasma head 40 to a position opposite the workpiece W via the robotic arm 12, and drives the main body 48 to rotate via the drive unit 43. Then, the control unit 21 applies a voltage between the external electrode 41 and the internal electrode 42, causing the process gas to plasmaize and irradiate the workpiece W.

[0028] Figure 5This is an explanatory diagram of plasma treatment when the brushes of plasma heads 140 and 40 are consumed. Figure 5 (A) is an explanatory diagram of plasma processing in a conventional plasma head 140 without a discharge receiving section 46. Figure 5 (B) is an explanatory diagram of plasma processing in a plasma head 40 having a discharge receiving section 46. When plasma processing is performed, the external electrode 41 is grounded in the plasma head 40 via a brush 51; however, the brush 51 wears down with use. Here, the control device 20 of the plasma generating apparatus 10 can also count the usage time of the brush 51 to determine its replacement period. When the replacement period for the brush 51 is reached, the control device 20 can display a message or alarm on the display section 24, urging the operator to replace the brush 51. However, this message or alarm can be reset via the operation section 25, making it difficult for the control device 20 to determine whether the brush 51 has actually been replaced. If the brush 51 is not replaced and the plasma head 40 is used, a situation may occur where the grounding section 50 is not grounded. For example, as... Figure 5 As shown in (A), in a plasma head 140 without a discharge receiver 46, if the grounding part 50 fails to function, the high-voltage return path disappears, potentially causing accidental discharge to nearby metal. On the other hand, in a plasma head 40 where a discharge receiver 46 is provided near the electrode members of the external electrode 41, the arc is guided towards the discharge receiver 46, thus forming a safe current loop via the discharge receiver 46. Furthermore, since the discharge receiver 46 can be seen from the confirmation part 37, the replacement of the brush 51 can be prompted by the operator's visual confirmation.

[0029] Here, the correspondence between the constituent elements of this embodiment and the constituent elements of the present invention is clarified. The external electrode 41 and the internal electrode 42 of this embodiment are an example of a pair of electrodes of the present invention, the support portion 44 and the fixing member 45 are examples of a support portion and a fixing member, the grounding portion 50 is an example of a grounding portion, and the discharge receiving portion 46 is an example of a discharge receiving portion.

[0030] The plasma generating apparatus 10 of this embodiment described above has a plasma head 40, which includes: a pair of electrodes that are ionized by applying voltage to ionize flowing process gas; a support portion 44 that supports the electrodes; a grounding portion 50 that contacts and grounds an electrode member, the electrode member including an electrode and / or a member electrically connected to the electrode; and one or more discharge receiving portions 46 disposed on the support portion 44 and formed toward the electrode member. In this plasma head 40, even when the grounding portion 50 cannot be used, since the electric arc is guided to the discharge receiving portion 46 disposed on the support portion 44 and formed toward the electrode member, plasma processing can be performed more reliably by further suppressing false discharges.

[0031] Furthermore, the plasma head 40 includes a drive unit 43 that rotates around a main body 48 including an electrode member, a support unit 44 that supports the main body 48 so that it can rotate, a grounding part 50 that contacts the rotating electrode member, and a discharge receiving part 46 formed toward the rotating electrode member in the support unit 44. In this plasma head 40, plasma processing can be performed more reliably due to the presence of a rotating electrode member. Additionally, in this plasma head 40, since the discharge receiving part 46 only needs to be disposed on the outer periphery of the electrode member, it is easier to install the discharge receiving part 46. The discharge receiving part 46 is non-contact with the electrode member and can also serve as a grounded conductive member. Furthermore, the discharge receiving part 46 is disposed on a fixed member 45 that is electrically grounded and provided with a grounding part 50. In this plasma head, since the discharge receiving part 46 is easily grounded, its construction and structure can be further simplified. Furthermore, the discharge receiving portion 46 is formed by a portion of the fixing member 45 protruding non-contactly toward the electrode member side. The fixing member 45 is provided with a grounding portion 50 and electrically grounded, and is opposite to the electrode member. In this plasma head 40, since a portion of the fixing member 45 becomes the discharge receiving portion 46, its structure can be further simplified.

[0032] Furthermore, in the plasma head 40, the support portion 44 includes a fixing member 45 that secures the grounding portion 50 to the electrode member in a contactable manner. The fixing member 45 has an opening that can accommodate the electrode internally, and the discharge receiving portion 46 is formed to protrude from the opening edge 49a of the fixing member 45 toward the electrode member. In this plasma head 40, forming the discharge receiving portion 46 at the opening edge 49a of the fixing member 45 further simplifies its structure. The plasma head 40 also includes a cover member 35, which has a wall portion 36 that covers the electrode member and a confirmation portion 37 formed in the wall portion 36 such that the discharge receiving portion 46 can be visually confirmed. In this plasma head 40, by confirming the condition of the discharge receiving portion 46 using the confirmation portion 37, the condition of the grounding portion 50 can be indirectly confirmed. Moreover, since a discharge receiving portion 46 is provided in the support portion 44, it is easy to install the confirmation portion 37, thereby making it easy for the operator to confirm the presence or absence of arc discharge in the discharge receiving portion 46. Therefore, the operator can identify the wear status of the brush 51 of the grounding portion 50. Furthermore, in the plasma head 40, a pair of electrodes includes: an external electrode 41, which is electrically grounded through the grounding portion 50 to allow process gas to flow; and an internal electrode 42, which is housed inside a support 41a that serves as an external electrode member connected to the external electrode 41, and is energized by applying voltage to ionize the process gas between itself and the external electrode 41. In this plasma head 40, for the electrodes having the external electrode 41 and the internal electrode 42, accidental arc discharge can be further suppressed, and plasma processing can be performed more reliably.

[0033] In addition, the plasma generating apparatus 10 includes: the plasma head 40 described above; a power supply device 28 that supplies power to the electrodes; and a gas supply device 30 that supplies process gas to the electrodes. Because the plasma generating apparatus 10 includes the plasma head described above, it can further suppress accidental discharge of electric arcs and perform plasma processing more reliably.

[0034] It should be noted that the plasma head and plasma generating device of the present invention are not limited to any of the above embodiments. As long as they fall within the technical scope of the present invention, they can be implemented in various ways.

[0035] For example, in the above embodiment, the main body 48 is driven to rotate, but it is not particularly limited to this, and the main body 48, including the electrodes, may not be rotated. In such a plasma head 40, the presence of the discharge receiving part 46 can further suppress accidental discharges and perform plasma processing more reliably.

[0036] In the above embodiment, the discharge receiving part 46 is provided on the conductive fixing member 45 that is provided with the grounding part 50, but it is not particularly limited to this. The discharge receiving part 46 may also be provided on a member different from the member provided with the grounding part 50. In addition, the discharge receiving part 46 may also be provided on a non-conductive member.

[0037] In the above embodiment, the discharge receiving portion 46 is provided at the opening edge 49a of the fixing member 45, but the location is not particularly limited to this. For example, it may also be provided at a grounding portion 50 such as the brush fixing portion 52. In this case, it is preferable to facilitate grounding of the discharge receiving portion 46. In addition, the discharge receiving portion 46 may be other components mounted on the fixing member 45, or it may be a component integral with the fixing member 45.

[0038] In the above embodiment, a confirmation part 37 of the opening is provided in the cover member 35, but it is not particularly limited to this and the confirmation part 37 may be omitted. In addition, a cover member 35 is provided in the plasma head 40, but it is not particularly limited to this and the cover member 35 may be omitted.

[0039] In the above embodiments, the present invention has been described as a plasma generating device 10, but it is not particularly limited thereto. It can also be used as a plasma head 40 or a discharge receiving part 46.

[0040] This specification also discloses the technical ideas of changing "the plasma head described in technical solution 1 or 2" in the original application's technical solution 4 to "the plasma head described in any one of technical solutions 1 to 3", changing "the plasma head described in technical solution 1 or 2" in the original application's technical solution 5 to "the plasma head described in any one of technical solutions 1 to 4", changing "the plasma head described in technical solution 1 or 2" in the original application's technical solution 6 to "the plasma head described in any one of technical solutions 1 to 5", changing "the plasma head described in technical solution 1 or 2" in the original application's technical solution 7 to "the plasma head described in any one of technical solutions 1 to 6", and changing "the plasma head described in technical solution 1 or 2" in the original application's technical solution 8 to "the plasma head described in any one of technical solutions 1 to 7".

[0041] (Industry availability) This invention can be applied to the field of surface treatment of workpieces.

[0042] (Label Explanation) 10: Plasma generating device; 12: Arm robot; 13: Mounting part; 14: Arm; 15: Drive motor; 16: Base part; 20: Control device; 21: Control part; 22: Storage part; 23: Communication part; 24: Display part; 25: Operation part; 28: Power supply device; 30: Gas supply device; 31: Supply pipe; 32: Supply valve; 35: Cover component; 36: Wall part; 37: Confirmation part; 40, 140: Plasma head; 41: External electrode; 41a: Support; 42: Internal electrode; 42a: Support; 43: Drive part; 44: Support part; 45: Fixing component; 46: Discharge receiving part; 47: Nozzle; 48: Main body; 49: Opening part; 49a: Opening edge; 50: Grounding part; 51: Brush; 52: Brush fixing part; W: Workpiece.

Claims

1. A plasma head, comprising: A pair of electrodes, to which a voltage is applied, plasmaizes the flowing process gas; A support portion that supports the electrode; A grounding portion that contacts and is grounded to the electrode component, the electrode component comprising the electrode and / or a component electrically connected to the electrode; as well as One or more discharge receiving portions are disposed on the support portion and are formed toward the electrode member.

2. The plasma head according to claim 1, wherein, The plasma head includes a driving unit that drives the electrode to rotate around its central axis. The support portion supports the electrode in a manner that allows it to rotate about an axis. The grounding part contacts the electrode component that rotates about the axis. The discharge receiving portion is formed in the support portion toward the electrode member that rotates about the axis.

3. The plasma head according to claim 1 or 2, wherein, The discharge receiving part is disposed on the fixed member, and the fixed member is provided with the grounding part and is electrically grounded.

4. The plasma head according to claim 1 or 2, wherein, The discharge receiving portion is formed by a part of a fixing member protruding toward the electrode member, the fixing member being electrically grounded by the grounding portion and facing the electrode member.

5. The plasma head according to claim 1 or 2, wherein, The discharge receiving part is provided at the support part.

6. The plasma head according to claim 1 or 2, wherein, The plasma head includes a cover member having: a wall portion that covers the electrode member; and a confirmation portion formed in the wall portion such that the discharge receiving portion can be visually confirmed.

7. The plasma head according to claim 1 or 2, wherein, The electrode has: a cylindrical outer electrode electrically grounded through the grounding portion and allowing process gas to flow through it; and an inner electrode housed inside the outer electrode and subjected to a voltage to plasmaize the process gas between the inner and outer electrodes.

8. A plasma generating device, comprising: The plasma head according to claim 1 or 2; A power supply device that supplies power to the electrodes; and A gas supply device that supplies the process gas to the electrode.

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