Non-inspection area identification method, identification system and computer device

Abstract

The application discloses a non-inspection area identification method and system and a computer device, and relates to the technical field of semiconductors. The identification method comprises the following steps: determining a mask pattern, wherein the mask pattern comprises a street pattern, and the street pattern comprises a non-inspection area with different widths; dividing the non-inspection area into a plurality of preset rule patterns satisfying a quadrilateral rule to obtain a first pattern set and a second pattern set; determining area information of the non-inspection area in the mask pattern based on mask coordinate information of the mask pattern, the first pattern set and the second pattern set, wherein the area information comprises start point information, width information and height information of non-inspection patterns in each pattern set; the first pattern set comprises first non-inspection patterns with a width equal to a street width of the street pattern, and the second pattern set comprises second non-inspection patterns with a width smaller than the street width. The non-inspection area is accurately and reliably identified, and the efficiency and accuracy of mask detection are improved.

Description

Technical Field

[0001] This application relates to the field of semiconductor technology, and in particular to a method, system and computer device for identifying non-inspection areas. Background Technology

[0002] After two exposures, a phase-shifted mask (PSM) leaves residual chromium areas on the cut surface. These chromium areas are non-inspection regions, and the patterns that may exist within them are diverse, resulting in irregular variations within the non-inspection regions. By performing one or more Mask Rule Checks (MRCs), regions exceeding the MRC rules are identified, and one or more corresponding Do Not Inspect Regions (DNIRs) are automatically generated. Each DNIR corresponds to one or more identified locations exceeding the rules. This technique is highly effective for identifying small patterned areas on the mask. However, due to the relatively large width of the cut surface, it is impossible to accurately locate and define the extent of the non-inspection regions when identifying the DNIR regions. Summary of the Invention

[0003] This application provides a method, system, and computer device for identifying non-detection areas, which can optimize the identification of non-detection areas and improve the efficiency and accuracy of identifying non-detection areas.

[0004] A method for identifying non-inspection areas includes:

[0005] Determine the photomask pattern, which includes a cutout pattern, and the cutout pattern includes non-detection areas of different widths;

[0006] The non-detection area is divided into multiple preset rule patterns that satisfy the quadrilateral rule, resulting in a first pattern set and a second pattern set;

[0007] Based on the photomask coordinate information, the first set of graphics, and the second set of graphics, the region information of the non-detection area in the photomask pattern is determined. The region information includes the starting point information, width information, and height information of the non-detection graphics in each set of graphics.

[0008] The first graphic set includes a first non-detected graphic whose width is equal to the width of the cutting path graphic, and the second graphic set includes a second non-detected graphic whose width is less than the width of the cutting path graphic.

[0009] In one embodiment, dividing the non-detection area into multiple preset rule patterns that satisfy quadrilateral rules to obtain a first pattern set and a second pattern set includes:

[0010] The non-detection area is sized, and the portion of the non-detection area whose width is less than the width of the cutting channel is eliminated, resulting in multiple first non-detection graphics that satisfy the quadrilateral rule and whose width is equal to the width of the cutting channel, forming the first graphic set;

[0011] Based on the non-detection area and the first graphic set, multiple second non-detection graphics that satisfy the quadrilateral rule and have a width smaller than the width of the cutting channel are obtained, forming the second graphic set.

[0012] In one embodiment, the step of performing a size calculation on the non-detection area to eliminate portions of the non-detection area whose width is less than the width of the cutting track results in multiple first non-detection graphics that satisfy the quadrilateral rule and whose width is equal to the width of the cutting track, forming the first graphic set, including:

[0013] Size calculations are performed on the non-detection area in both the extension direction and the vertical direction to eliminate the portion of the non-detection area whose width is less than the width of the cutting channel in both the extension direction and the vertical direction, resulting in multiple first non-detection graphics that satisfy the quadrilateral rule and whose width is equal to the width of the cutting channel, forming the first graphic set;

[0014] Wherein, the extending direction and the vertical direction intersect.

[0015] In one embodiment, the first non-detection pattern includes a first non-detection sub-pattern and a second non-detection sub-pattern, the first non-detection sub-pattern extending along a first direction, and the second non-detection sub-pattern extending along a second direction perpendicular to the first direction.

[0016] The non-detection area is sized in both the extension and vertical directions to eliminate portions of the non-detection area whose width is less than the cutting width in both directions, resulting in multiple first non-detection patterns that satisfy quadrilateral rules and have a width equal to the cutting width, including:

[0017] In the extending direction, a second dimension calculation is performed on the non-detection area to eliminate the portion of the non-detection area extending along the vertical direction;

[0018] In the vertical direction, a first dimension calculation is performed on the non-detection area to eliminate the portion of the non-detection area whose width in the vertical direction is less than the width of the cutting channel;

[0019] Wherein, if the second dimension is larger than the first dimension, the extension direction is the first direction, and the vertical direction is the second direction, the first non-detection sub-shape is obtained; if the extension direction is the second direction and the vertical direction is the first direction, the second non-detection sub-shape is obtained.

[0020] In one embodiment, the non-detection area includes a first boundary extending along the extension direction and a second boundary extending along the vertical direction;

[0021] The step of performing a second-dimensional dimensional calculation on the non-detection area in the extending direction to eliminate the portion of the non-detection area extending along the vertical direction includes:

[0022] In the extending direction, the second boundary is reduced inward by the second dimension to eliminate the portion of the non-detection area extending along the vertical direction;

[0023] In the extending direction, the second boundary of the non-detection area that is inwardly recessed by the second dimension is expanded outward by the second dimension, restoring the portion of the non-detection area that extends along the extending direction;

[0024] The step of performing a first-dimensional dimensional calculation on the non-detection area in the vertical direction to eliminate portions of the non-detection area whose width in the vertical direction is less than the width of the cutting channel includes:

[0025] In the vertical direction, the first boundary is reduced inward by the first dimension to eliminate the portion of the non-detection area whose width in the vertical direction is less than the width of the cutting channel;

[0026] In the vertical direction, the first boundary of the non-detection area, which is inwardly recessed by the first size, is outwardly expanded by the first size, restoring the width of the non-detection area in the vertical direction.

[0027] In one embodiment, the first dimension is greater than or equal to half the maximum width of the second non-detection pattern and less than half the width of the cutting track; the second dimension is greater than or equal to half the width of the cutting track.

[0028] In one embodiment, the process of obtaining multiple second non-detection graphics that satisfy quadrilateral rules and have a width smaller than the cutting width, based on the non-detection area and the first graphic set, to form the second graphic set, includes:

[0029] Boolean operations are performed on the non-detection area and the first graphic set to obtain a second initial graphic set;

[0030] The second set of graphics is obtained based on the second initial set of graphics.

[0031] In one embodiment, obtaining the second graphics set based on the second initial graphics set includes:

[0032] If a second initial non-detected graphic in the second initial graphic set satisfies the quadrilateral rule, then the second initial non-detected graphic is used as the second non-detected graphic.

[0033] In one embodiment, obtaining the second graphics set based on the second initial graphics set further includes:

[0034] If the second initial undetected graphic in the second initial graphic set does not satisfy the quadrilateral rule, the second initial undetected graphic is cut to obtain the second undetected graphic.

[0035] In one embodiment, the step of cutting the second initial non-detection graphic to obtain the second non-detection graphic includes:

[0036] Based on the photomask coordinate information of the photomask pattern and the second initial non-detection pattern, determine the first endpoint coordinate information of each endpoint of the second initial non-detection pattern;

[0037] Based on the first endpoint coordinate information, the second initial non-detection graphic is cut to obtain multiple second non-detection graphics.

[0038] In one embodiment, determining the region information of the non-detection area in the photomask pattern based on the photomask coordinate information, the first pattern set, and the second pattern set includes:

[0039] Based on the photomask coordinate information, the first graphic set, and the second graphic set, determine the second endpoint coordinate information of each endpoint in the first non-detection graphic and the second non-detection graphic;

[0040] Based on the photomask coordinate information in the first coordinate system and the detection coordinate information in the second coordinate system, the coordinate information of the second endpoint is transformed from the first coordinate system to the second coordinate system to obtain the area information; wherein, the detection coordinate information corresponds to the detection machine.

[0041] In one embodiment, the step of converting the coordinate information of the second endpoint from the first coordinate system to the second coordinate system based on the photomask coordinate information of the first coordinate system and the detection coordinate information of the second coordinate system to obtain the region information includes:

[0042] Based on the coordinate information of the second endpoint of each endpoint, the initial region information is obtained. The initial region information includes the initial starting point information, initial width information, and initial height information of the non-tested graphics in each graphics set.

[0043] The starting point information is obtained based on the initial starting point information, the photomask coordinate information, and the detection coordinate information;

[0044] The width information is obtained based on the initial width information, the photomask coordinate information, and the detection coordinate information;

[0045] The height information is obtained based on the initial height information, the photomask coordinate information, and the detection coordinate information.

[0046] In one embodiment, the identification method further includes:

[0047] Based on the region information, the graphic coordinate information of the photomask pattern is determined, and the graphic coordinate information includes the coordinate information of non-detected patterns in each graphic set;

[0048] Based on the photomask pattern, the photomask coordinate information in the first coordinate system, and the detection coordinate information in the second coordinate system corresponding to the region information, the graphic information corresponding to the non-detection area is determined;

[0049] If the coordinate information and the graphic information meet preset conditions, the accuracy of the region information is determined.

[0050] In one embodiment, determining the accuracy of the region information when a preset condition is met between the coordinate information and the graphic information includes:

[0051] Perform an XOR operation on the coordinate information and the graphic information to obtain the calculated graphic;

[0052] When the transmittance of the calculated graphic is zero, it is determined that the coordinate information and the graphic information satisfy a preset condition.

[0053] In one embodiment, the identification method further includes:

[0054] If the preset conditions are not met between the coordinate information and the graphic information, the region information is determined to be inaccurate.

[0055] Repeat the steps of determining each graphic set and region information until the coordinate information and the graphic information meet the preset conditions.

[0056] In one embodiment, the identification method further includes:

[0057] The pattern of the photomask to be tested is verified based on the area information.

[0058] A non-inspection area identification system, comprising:

[0059] An acquisition module is used to determine a photomask pattern, the photomask pattern including a cut-out pattern, the cut-out pattern including non-detection areas of different widths;

[0060] The calculation module, connected to the acquisition module, is used to divide the non-detection area into multiple preset rule graphics that satisfy the quadrilateral rule, to obtain a first graphic set and a second graphic set; the first graphic set includes a first non-detection graphic with a width equal to the width of the cutting track graphic, and the second graphic set includes a second non-detection graphic with a width less than the width of the cutting track.

[0061] A conversion module, connected to the computing module, is used to determine the region information of the non-detection area in the photomask pattern based on the photomask coordinate information, the first non-detection pattern, and the second non-detection pattern; the region information includes the starting point information, width information, and height information of the non-detection patterns in each pattern set.

[0062] A computer device includes a memory and a processor, the memory storing a computer program, and the processor executing the computer program to implement the steps of the above-described method for identifying non-inspection areas.

[0063] The unexpected technical effects that this application can produce are:

[0064] In the aforementioned method for identifying non-inspection areas, the non-inspection areas in the cutting pattern are divided into preset regular patterns that satisfy the quadrilateral rule. This results in a first set of patterns including a first set of non-inspection patterns with a width equal to the cutting width, and a second set of patterns including a second set of non-inspection patterns with a width less than the cutting width. This method can accurately identify non-inspection areas with irregular sizes and shapes, completing the precise division of non-inspection areas and generating non-inspection patterns with different widths. Based on the photomask coordinate information, the first set of patterns, and the second set of patterns, the region information of the non-inspection areas in the photomask pattern is determined. The region information includes the starting point information, width information, and height information of each non-inspection pattern. The identification of non-inspection areas is accurate and reliable. During the inspection process of the photomask corresponding to the photomask pattern based on the region information, the inspection machine can accurately avoid non-inspection areas, improving the efficiency and accuracy of photomask inspection. Furthermore, the non-inspection area identification method in this application meets the photomask inspection needs of various scenarios and is applicable to the identification of non-inspection areas in photomask production inspection processes of various manufacturing processes. In practical applications, the inspection accuracy of photomasks reaches its highest level.

[0065] In the aforementioned non-inspection area recognition system, the computation module divides the non-inspection area in the cutting pattern into preset regular shapes that satisfy the quadrilateral rule, resulting in a first set of shapes including a first set of non-inspection shapes with a width equal to the cutting width, and a second set of shapes including a second set of non-inspection shapes with a width less than the cutting width. This accurately identifies non-inspection areas with irregular sizes and shapes, completing the precise division of non-inspection areas and generating non-inspection shapes with different widths. The conversion module, based on the photomask coordinate information, the first set of shapes, and the second set of shapes, determines the region information of the non-inspection areas in the photomask pattern. The region information includes the starting point information, width information, and height information of each non-inspection shape. The recognition of non-inspection areas is accurate and reliable. During the inspection process of the photomask corresponding to the photomask pattern based on the region information, the inspection machine can accurately avoid non-inspection areas, improving the efficiency and accuracy of photomask inspection. Furthermore, the non-inspection area recognition system in this application meets the photomask inspection needs of various scenarios and is applicable to the recognition of non-inspection areas in photomask production inspection processes of various manufacturing processes. In practical applications, the inspection accuracy of photomasks reaches its highest level. Attached Figure Description

[0066] To more clearly illustrate the technical solutions in the embodiments or related technologies of this application, the accompanying drawings used in the description of the embodiments or related technologies will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0067] Figure 1 This is a flowchart illustrating the method for identifying non-inspection areas in an embodiment of this application;

[0068] Figure 2 This is one of the schematic diagrams of the initial photomask pattern in the embodiments of this application;

[0069] Figure 3 Examples of embodiments in this application Figure 2 A schematic diagram of the corresponding photomask pattern;

[0070] Figure 4 In this embodiment of the application, the non-detection area is divided into multiple preset rule shapes that satisfy the quadrilateral rule;

[0071] Figure 5 As described in this embodiment of the disclosure Figure 3 The diagram shown is a schematic diagram after step S3021 is executed on the photomask pattern.

[0072] Figure 6 As described in this embodiment of the disclosure Figure 5 The diagram shown is a schematic diagram after step S3041 is executed on the photomask pattern.

[0073] Figure 7As described in this embodiment of the disclosure Figure 6 The diagram shown is a schematic diagram after step S3022 is executed on the photomask pattern.

[0074] Figure 8 As described in this embodiment of the disclosure Figure 7 The diagram shown is a schematic diagram after step S3042 is executed on the photomask pattern.

[0075] Figure 9 As described in this embodiment of the disclosure Figure 3 The diagram shown is a schematic diagram after step S3041 is executed on the photomask pattern.

[0076] Figure 10 As described in this embodiment of the disclosure Figure 9 The diagram shown is a schematic diagram after step S3021 is executed on the photomask pattern.

[0077] Figure 11 As described in this embodiment of the disclosure Figure 10 The diagram shown is a schematic diagram after step S3042 is executed on the photomask pattern.

[0078] Figure 12 As described in this embodiment of the disclosure Figure 11 The diagram shown is a schematic diagram after step S3022 is executed on the photomask pattern.

[0079] Figure 13 This is a second schematic diagram of the initial photomask pattern in an embodiment of this application;

[0080] Figure 14 Examples of embodiments in this application Figure 13 A schematic diagram of the corresponding photomask pattern;

[0081] Figure 15 Examples of embodiments in this application Figure 3 A schematic diagram of the second initial pattern set corresponding to the photomask pattern shown;

[0082] Figure 16 Examples of embodiments in this application Figure 13 A schematic diagram of the second initial pattern set corresponding to the photomask pattern shown;

[0083] Figure 17 For the embodiments of this application Figure 16 A schematic diagram of the photomask pattern after the second initial non-detection pattern has been cut;

[0084] Figure 18 This is a schematic diagram showing the distribution of non-detection areas of the photomask pattern on the photomask in an embodiment of this application;

[0085] Figure 19 This is a schematic diagram of the structure of the identification system for the non-inspection area in an embodiment of this application.

[0086] Explanation of reference numerals in the attached figures:

[0087] Photomask pattern 100; device pattern 102; dicing pattern 104; detection area 202; non-detection area 204; first boundary line 2043; second boundary line 2044; first non-detection pattern 302; first non-detection sub-pattern 3021; ​​second non-detection sub-pattern 3022; second non-detection pattern 304; second initial non-detection pattern 306; acquisition module 402; calculation module 404; conversion module 406. Detailed Implementation

[0088] To facilitate understanding of the embodiments of this application, a more comprehensive description of the embodiments of this application will be provided below with reference to the accompanying drawings. The drawings illustrate preferred embodiments of the embodiments of this application. However, the embodiments of this application can be implemented in many different forms and are not limited to the embodiments described herein. Rather, these embodiments are provided to make the disclosure of the embodiments of this application more thorough and complete.

[0089] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which embodiments of this application belong. The terminology used herein in the description of embodiments of this application is for the purpose of describing particular embodiments only and is not intended to be limiting of the embodiments of this application. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0090] In the description of the embodiments of this application, it should be understood that the terms "upper", "lower", "vertical", "horizontal", "inner", "outer", etc., indicate the orientation or positional relationship based on the method or positional relationship shown in the drawings. They are only for the convenience of describing the embodiments of this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the embodiments of this application.

[0091] It is understood that the terms "first," "second," etc., used in this application may be used herein to describe various elements, but these elements are not limited by these terms. These terms are only used to distinguish one element from another. For example, without departing from the scope of this application, a first drawing set may be referred to as a second drawing set, and similarly, a second drawing set may be referred to as a first drawing set.

[0092] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified. In the description of this application, "several" means at least one, such as one, two, etc., unless otherwise explicitly specified.

[0093] The exposure process of a PSM photomask consists of two stages: a first exposure and a second exposure. After the first exposure, the photomask simultaneously displays the Quartz region (quartz area) and the CR region (chromium chromium area). After the second exposure, the photomask simultaneously displays the Quartz region, the MoSi region (Molybdenum Silicide), and the CR region. Since a portion of the CR region remains on the dicing path of the photomask after the two exposures, and this CR region is not within the inspection scope in actual production, it is necessary to accurately determine the location of the DNIR (Do Not Inspect Region). This ensures that the non-inspection area information of the photomask is accurately provided to the inspection equipment, thereby optimizing the inspection process and improving production efficiency and product quality.

[0094] Ideally, the boundary between the Quartz, MoSi, and CR regions should form a 90-degree angle. However, in actual exposure, the angle at the boundary is less than 90 degrees. When the inspection machine scans the boundary from top to bottom using transmitted light, it does not affect the inspection results; however, when the inspection machine scans the boundary from bottom to top using reflected light, it detects wider defects, resulting in inconsistencies between the scan results of transmitted and reflected light. To resolve this inconsistency, during the photomask inspection stage, the entire cutting path on the frame is manually designated as a non-inspection area at the machine end. This means that the cd bar (Critical Dimension Bar) and test key areas on the cutting path are excluded from inspection. Defects such as pinholes appearing on the cutting path are overlooked, posing a potential risk to product quality control.

[0095] Existing DNIR region identification technologies primarily identify regions exceeding MRC rules by performing one or more Mask Rule Checks (MRCs), automatically generating one or more corresponding DNIR regions. Each DNIR region corresponds to one or more identified locations exceeding the rules. This technology is highly effective for identifying small-sized graphic areas on the mask. However, due to the large width of the cut track, it cannot achieve ideal results when identifying the DNIR region of the cut track, making it difficult to accurately locate and define the non-inspection area of ​​the cut track, thus presenting certain limitations in practical applications.

[0096] Figure 1 This is a flowchart illustrating the non-inspection area identification method in an embodiment of this application. See [link / reference] Figure 1 In this embodiment, a method for identifying non-inspection areas is provided, including steps S102-S106.

[0097] S102, Determine the photomask pattern, which includes a cut pattern, and the cut pattern includes non-detection areas of different widths.

[0098] The photomask pattern is the pattern on the photomask, including the dicing pattern and the device pattern. When the photomask is used for exposure and development, the projection of the dicing pattern on the wafer coincides with the dicing, and the projection of the device pattern on the wafer coincides with the device area. The dicing is the area on the wafer used for dicing and dividing the chip, and the device area is the area on the wafer where the chip is formed. The edge of the dicing coincides with the edge of the device area on one side.

[0099] The cutting pattern includes a detection area and a non-detection area. The detection area is the region within the cutting pattern that has preset patterns, including test patterns and alignment patterns. The non-detection area is the blank area within the cutting pattern that does not have preset patterns. The width of the non-detection area on one side of the detection area is less than or equal to the cutting width of the cutting pattern. It can be understood that the position of the preset patterns affects the width and position of the non-detection area. The cutting pattern includes non-inspection areas of varying widths.

[0100] Here, the width is the dimension of the graphic in the width direction, which is perpendicular to the length direction of the cutting groove graphic. The width direction changes with the length direction. As an example, the extension directions of the cutting groove graphic include intersecting first and second directions. When the length direction is the first direction, the width direction is the second direction; when the length direction is the second direction, the width direction is the first direction. Furthermore, the first direction is perpendicular to the second direction. The cutting groove width is the maximum dimension of the cutting groove graphic in the width direction.

[0101] S104, divide the non-detection area into multiple preset rule graphics that satisfy the quadrilateral rule, to obtain the first graphic set and the second graphic set.

[0102] The non-detection area in the photomask pattern is divided into multiple preset regular patterns, each of which satisfies the quadrilateral rule. The preset regular patterns include a first non-detection pattern and a second non-detection pattern. The width of the first non-detection pattern is equal to the width of the cutting path pattern, and the width of the second non-detection pattern is less than the width of the cutting path pattern. Multiple sets of first patterns constitute a first pattern set, and multiple sets of second patterns constitute a second pattern set.

[0103] As an example, A satisfying the quadrilateral rule can be understood as A being a rectangle or square, meaning A has four right-angled sides and four endpoints; the cut track width is the dimension of the cut track pattern in the width direction. As an example, the cut track width can be the distance in the width direction between adjacent device areas on both sides of the cut track pattern. As an example, two cut track patterns with different extension directions have the same cut track width.

[0104] It can be understood that the first non-detection graphic is a blank area with a width equal to the width of the cutting track, and the second non-detection graphic is a blank area with a width less than the width of the cutting track.

[0105] S106, Based on the photomask coordinate information, the first graphic set, and the second graphic set, determine the region information of the non-detection area in the photomask pattern.

[0106] The photomask coordinate information can be the origin and unit information of the photomask pattern in the first coordinate system. For example, the origin information is the reference point of the photomask pattern in the two-dimensional Cartesian coordinate system, such as O(0,0); the unit information can represent the mapping unit of the photomask pattern, such as millimeters or micrometers.

[0107] Based on the photomask coordinate information, and according to the positions of the first and second non-detection graphics in the photomask pattern, the region information of the non-detection area in the photomask pattern is determined. The region information includes the starting point information, width information and height information of each first non-detection graphic in the first graphic set, and the starting point information, width information and height information of each second non-detection graphic in the second graphic set.

[0108] As an example, the starting point information of the first non-detected graphic is the starting point coordinates of the first non-detected graphic, the width information is the size information of the first non-detected graphic relative to the starting point coordinates in the width direction, and the height information is the size information of the first non-detected graphic relative to the starting point coordinates in the length direction.

[0109] As an example, the first graphic set includes a first non-detection graphic A11 and a first non-detection graphic A12, and the second graphic set includes a second non-detection graphic A21 and a second non-detection graphic A22. Based on the photomask coordinate information and the position of the first non-detection graphic A11 on the photomask graphic, the starting point information, width information, and height information of the first non-detection graphic A11 are obtained. Based on the photomask coordinate information and the position of the first non-detection graphic A12 on the photomask graphic, the starting point information, width information, and height information of the first non-detection graphic A12 are obtained. Based on the photomask coordinate information and the position of the second non-detection graphic A21 on the photomask graphic, the starting point information, width information, and height information of the second non-detection graphic A22 are obtained.

[0110] The non-detection area information includes the starting point, width, and height information of the first non-detection graphic A11, the first non-detection graphic A12, the second non-detection graphic A21, and the second non-detection graphic A22. It can be understood that the starting point, width, and height information of each non-detection graphic is a set, corresponding to the non-detection graphic itself.

[0111] In the aforementioned method for identifying non-inspection areas, the non-inspection areas in the cutting pattern are divided into preset regular patterns that satisfy the quadrilateral rule, resulting in a first set of patterns including a first set of non-inspection patterns with a width equal to the cutting width, and a second set of patterns including a second set of non-inspection patterns with a width less than the cutting width. This method can accurately identify non-inspection areas with irregular sizes and shapes, completing the precise division of non-inspection areas and generating non-inspection patterns with different widths. Based on the photomask coordinate information, the first set of patterns, and the second set of patterns, the region information of the non-inspection areas in the photomask pattern is determined. The region information includes the starting point information, width information, and height information of each non-inspection pattern. The identification of non-inspection areas is accurate and reliable. During the process of the inspection machine inspecting the photomask corresponding to the photomask pattern according to the region information, it can accurately avoid non-inspection areas, improving the efficiency and accuracy of photomask inspection. At the same time, the non-inspection area identification method in this application meets the photomask inspection needs of various scenarios and is applicable to the identification of non-inspection areas in the photomask production inspection process of various processes. In practical applications, the inspection accuracy of photomasks reaches the highest level.

[0112] Compared to existing methods that manually define the entire cutting track as a non-inspection area at the machine end, this application avoids missing inspection areas on the cutting track, has a wider range of applications, and avoids human error and manual burden in identifying non-inspection areas, thus improving production efficiency to a certain extent. Compared to other existing non-inspection area identification methods that can only identify non-inspection areas within a fixed size range, this application breaks through the limitation on the size of non-inspection areas, and can accurately identify non-inspection areas of different sizes and irregular shapes.

[0113] Figure 2 This is one of the schematic diagrams of the initial photomask pattern in the embodiments of this application. Figure 3 Examples of embodiments in this application Figure 2 A schematic diagram of the corresponding photomask pattern, exemplarily, the first direction can be... Figure 2 The X direction is shown, and the second direction can be... Figure 2 The Y-direction is shown, and the X-direction intersects the Y-direction. Furthermore, the X-direction is perpendicular to the Y-direction.

[0114] like Figure 2 and Figure 3 As shown, as an example, the initial photomask pattern's corresponding GDS format graphic data L200 is used as input data. The input data is merged (Merge GDS) and enlarged according to a preset value to obtain GDS format graphic data type 0. Based on graphic data type 0, photomask pattern 100 is determined. The preset value is the ratio between photomask pattern 100 and the initial photomask pattern. For example, the preset value is 4. By enlarging, the size of the obtained photomask pattern 100 is the same as that of the actual photomask pattern, and the area information corresponds to the actual photomask pattern.

[0115] like Figure 3 As shown, the photomask pattern 100 includes a device pattern 102 and a dicing pattern 104, and the dicing pattern 104 includes a detection area 202 and a non-detection area 204.

[0116] Figure 4 This is a flowchart illustrating the process of dividing the non-detection area into multiple preset rule shapes that satisfy the quadrilateral rule, thus obtaining the first and second shape sets, as described in this embodiment of the application. Figure 4 In one embodiment, the non-detection area 204 is divided into multiple preset rule patterns that satisfy the quadrilateral rule to obtain a first pattern set and a second pattern set, including steps S202-S204.

[0117] S202, perform size calculations on the non-detection area, eliminate the portion of the non-detection area whose width is less than the width of the cutting track, and obtain the first graphic set.

[0118] The dimensional calculation can be to increase or decrease the size of the non-detection area 204; by performing the dimensional calculation on the non-detection area 204, the part of the non-detection area 204 with a width less than the cutting width W is eliminated, and multiple first non-detection graphics 302 with a width W1 equal to the cutting width W and satisfying the quadrilateral rule are obtained; wherein, the multiple first non-detection graphics 302 constitute the first graphic set.

[0119] As an example, the width directions of any two first non-detected graphics 302 can be the same or different.

[0120] S204, based on the non-detection area and the first graphic set, the second graphic set is obtained.

[0121] Based on the non-detection area 204 and multiple first non-detection graphics 302, multiple second non-detection graphics 304 with a width W2 less than the cutting path width W and satisfying the quadrilateral rule are obtained; wherein, the multiple second non-detection graphics 304 constitute a second graphic set.

[0122] As an example, the width directions of any two second undetected graphics 304 can be the same or different.

[0123] In one embodiment, a size calculation is performed on the non-detection area 204 to eliminate the portion of the non-detection area 204 whose width is less than the cutting width W, resulting in multiple first non-detection graphics 302 that satisfy the quadrilateral rule and whose width is equal to the cutting width W, forming a first graphic set. This includes: performing a size calculation on the non-detection area 204 in the extension direction and the vertical direction respectively, eliminating the portion of the non-detection area 204 whose width is less than the cutting width W in the extension direction and the vertical direction, resulting in multiple first non-detection graphics 302 that satisfy the quadrilateral rule and whose width is equal to the cutting width W, forming a first graphic set.

[0124] The extension direction intersects with the perpendicular direction, one being the first direction X and the other the second direction Y.

[0125] In one embodiment, the first non-detection pattern 302 includes a first non-detection sub-pattern and a second non-detection sub-pattern, the first non-detection sub-pattern extending along a first direction X, and the second non-detection sub-pattern extending along a second direction Y perpendicular to the first direction X.

[0126] Specifically, in the extension direction and the vertical direction, the size calculation of the non-detection area 204 is performed to eliminate the part of the non-detection area 204 whose width is less than the width W of the cutting channel in the extension direction and the vertical direction, so as to obtain multiple first non-detection graphics that satisfy the quadrilateral rule and whose width is equal to the width of the cutting channel, including steps S302-S304.

[0127] S302, in the extension direction, the non-detection area 204 is subjected to a second dimension calculation to eliminate the portion of the non-detection area 204 that extends in the vertical direction.

[0128] S304, in the vertical direction, perform a first dimension calculation on the non-detection area 204 to eliminate the portion of the non-detection area 204 whose width in the vertical direction is less than the width W of the cutting channel.

[0129] The second dimension L2 is larger than the first dimension L1, which facilitates the elimination of the portion of the non-detection area 204 extending vertically. By performing a dimension calculation on the second dimension L2 in the extension direction, the portion of the non-detection area 204 extending vertically can be eliminated. By performing a dimension calculation on the first dimension L1 in the vertical direction, the portion of the non-detection area 204 whose width in the vertical direction is less than the cutting width W can be eliminated.

[0130] As an example, the extension direction is the first direction X, and the vertical direction is the second direction Y. The first non-detection sub-pattern is obtained through steps S302-S304. Specifically, steps S302-S304 involve performing at least one second dimension L2 dimensional calculation on the non-detection area 204 in the first direction X to eliminate the portion of the non-detection area 204 extending along the second direction Y, that is, eliminating the portion of the non-detection area 204 whose width in the first direction X is less than the cutting width W, and the portion of the non-detection area 204 whose width in the first direction X is equal to the cutting width W; then, performing at least one first dimension L1 dimensional calculation on the non-detection area 204 in the second direction Y to eliminate the portion of the non-detection area 204 that extends along the first direction X and whose width in the second direction Y is less than the cutting width W, thus obtaining the first non-detection sub-pattern extending along the first direction X. As an example, the extension direction is the second direction Y, and the vertical direction is the first direction X. The second non-detection sub-pattern is obtained through steps S302-S304. Specifically, steps S302-S304 involve performing at least one second dimension L2 dimensional calculation on the non-detection area 204 in the second direction Y to eliminate the portion of the non-detection area 204 extending along the first direction X, that is, eliminating the portion of the non-detection area 204 whose width in the second direction Y is less than the cutting width W, and the portion of the non-detection area 204 whose width in the second direction Y is equal to the cutting width W. Then, in the first direction X, the non-detection area 204 is performed at least one first dimension L1 dimensional calculation to eliminate the portion of the non-detection area 204 extending along the second direction Y and whose width in the first direction X is less than the cutting width W, thus obtaining the second non-detection sub-pattern extending along the second direction Y.

[0131] As an example, in order to improve the speed of the first dimension L1 dimension calculation, the non-detection area 204 is subjected to a first dimension L1 dimension calculation in the vertical direction to eliminate the portion of the non-detection area 204 whose width is less than the cutting width W in the vertical direction.

[0132] As an example, in order to improve the speed of the second dimension L2 dimension calculation, the non-detection area 204 is subjected to a second dimension L2 dimension calculation in the extension direction to eliminate the portion of the non-detection area 204 that extends in the vertical direction.

[0133] In one embodiment, the first dimension L1 is greater than or equal to half the maximum width of the second non-detection pattern 304 and less than half the width W of the cutting sill; the second dimension L2 is greater than or equal to half the width W of the cutting sill. By calculating the first dimension L1, the portion of the non-detection area 204 whose width in the vertical direction is less than the width W of the cutting sill is eliminated, while avoiding affecting the portion of the non-detection area 204 whose width in the vertical direction is equal to the width W of the cutting sill. By calculating the second dimension L2, the portion of the non-detection area 204 whose width in the vertical direction is equal to the width W of the cutting sill, and the portion whose width is less than the width W of the cutting sill, is eliminated, while avoiding the residue of the portion of the non-detection area 204 extending in the vertical direction, thus improving the efficiency and accuracy of the obtained first and second non-detection sub-patterns.

[0134] See Figure 3 In some embodiments, the non-detection area 204 includes a first boundary line and a second boundary line extending in an extension direction; wherein, a plurality of first boundary lines and a plurality of second boundary lines enclose the non-detection area 204.

[0135] It can be understood that the first boundary line is the boundary line extending along the extension direction in the non-detection area 204, and the second boundary line is the boundary line extending along the vertical direction in the non-detection area 204.

[0136] In the extension direction, the non-detection area 204 is subjected to a second dimension L2 dimension calculation to eliminate the portion of the non-detection area 204 extending in the vertical direction, including steps S3021 and S3022.

[0137] S3021, in the extension direction, the second boundary 2044 is reduced inward by the second dimension L2 to eliminate the portion of the non-detection area 204 that extends in the vertical direction.

[0138] S3022, in the extension direction, the second boundary 2044 of the non-detection area 204, which is inwardly contracted by the second dimension L2, is outwardly expanded by the second dimension L2, restoring the portion of the non-detection area 204 that extends along the extension direction.

[0139] As an example, steps S3021 and S3022 are respectively: in the extension direction, each second boundary line 2044 in the non-detection area 204 is moved by a second dimension L2 into the interior of the non-detection area 204 to eliminate the portion of the non-detection area 204 extending in the vertical direction.

[0140] For the photomask pattern obtained after moving the second boundary line 2044 inward by a second dimension L2 into the non-detection area 204, in the extension direction, each of the second boundaries 2044 of the non-detection area 204, which is inward by a second dimension L2, is moved outward by a second dimension L2 into the non-detection area 204. This restores the portion of the non-detection area 204 extending along the extension direction and eliminates the influence of the process of moving the second boundary line 2044 inward by a second dimension L2 into the non-detection area 204 on the portion of the non-detection area 204 extending along the extension direction. It can be understood that after step S3022, there is no portion extending in the vertical direction in the photolithographic pattern.

[0141] In the vertical direction, the non-detection area 204 is subjected to a first dimension L1 dimensional calculation to eliminate the portion of the non-detection area 204 whose width in the vertical direction is less than the width W of the cutting channel, including steps S3041 and S3042.

[0142] S3041, in the vertical direction, the first boundary 2043 is shrunk inward by a first dimension L1 to eliminate the portion of the non-detection area 204 whose width in the vertical direction is less than the width W of the cutting channel.

[0143] S3042, in the vertical direction, the first boundary 2043 of the non-detection area 204, which is inwardly shrunk by the first dimension L1, is outwardly expanded by the first dimension L1 to restore the width of the non-detection area 204 in the vertical direction.

[0144] As an example, steps S3041 and S3042 are respectively: in the vertical direction, each of the first boundaries 2043 in the non-detection area 204 is moved by a first dimension L1 into the interior of the non-detection area 204, thereby eliminating the portion of the non-detection area 204 whose width is less than the width W of the cutting channel in the vertical direction.

[0145] For the photomask pattern obtained after the first boundary line 2043 is moved inward by a first dimension L1 into the non-detection area 204, in the vertical direction, each of the first boundaries 2043 of the non-detection area 204, which is inward by a first dimension L1, is moved outward by a first dimension L1 into the non-detection area 204 to restore the width of the non-detection area 204 in the vertical direction. This eliminates the influence of the process of moving the first boundary line 2043 inward by a first dimension L1 into the non-detection area 204 on the width of the non-detection pattern, which is the width of the cutting path W.

[0146] It is understandable that, in the vertical direction, if there is no part in the non-detection area 204 with a width less than the cutting width W, the non-detection pattern with a width of the cutting width W can be obtained through steps S3021 and S3022, and can be removed in steps S3041 and S3042.

[0147] As an example, if step S3022 is executed before step S3021 and step S3042 is executed before step S3041, the order of executing steps S3021, S3041, S3022 and S3042 can be interchanged.

[0148] As an example, according to the order of execution, the order of steps S3021, S3022, S3041, and S3042 can be: S3021, S3022, S3041, S3042; S3021, S3041, S3022, S3042; S3021, S3041, S3042, S3042; S3041, S3042, S3021, S3022; S3041, S3021, S3042, S3022; or S3041, S3021, S3022, S3042.

[0149] Figure 5 As described in this embodiment of the disclosure Figure 3 The diagram shown is a schematic representation of the photomask pattern after step S3021. Figure 6 As described in this embodiment of the disclosure Figure 5 The diagram shown is a schematic representation of the photomask pattern after step S3041. Figure 7 As described in this embodiment of the disclosure Figure 6 The diagram shown is a schematic representation of the photomask pattern after step S3022. Figure 8 As described in this embodiment of the disclosure Figure 7 The diagram shown is a schematic diagram after step S3042 of the photomask pattern is executed.

[0150] The following description uses the extension direction as the first direction X, the vertical direction as the second direction Y, and the sequence of steps S3021, S3022, S3041, and S3042 as steps S3021, S3041, S3022, and S3042, to illustrate the process of obtaining the first non-detection sub-graphic 3021. Figures 5-8 As shown, at this time, the first boundary line 2043 extends along the first direction X, and the second boundary line 2044 extends along the second direction Y. It can be understood that the first boundary line 2043 is the boundary line extending along the first direction X corresponding to the non-detection area 204, and the second boundary line 2044 is the boundary line extending along the second direction Y corresponding to the non-detection area 204.

[0151] The steps to obtain the first non-detection sub-pattern 3021 include: First, in the first direction X, the second boundary 2044 is shrunk inward by a second dimension L2 to eliminate the portion of the non-detection area 204 extending along the second direction Y; at this time, the photomask pattern 100 is as follows Figure 5 As shown.

[0152] The second step is to shrink the first boundary 2043 inward by a first dimension L1 in the second direction Y, eliminating the portion of the non-detection area 204 whose width in the second direction Y is less than the cutting width W; at this time, the photomask pattern 100 is as follows. Figure 6 As shown.

[0153] Thirdly, in the first direction X, the second boundary 2044 of the non-detection area 204, which is inwardly contracted by the second dimension L2, is outwardly expanded by the second dimension L2, restoring the portion of the non-detection area 204 extending along the first direction X; at this time, the photomask pattern 100 is as follows. Figure 7 As shown.

[0154] Fourth step: In the second direction Y, the first boundary 2043 of the non-detection area 204, which is inwardly reduced by the first dimension L1, is outwardly expanded by the first dimension L1, restoring the width of the non-detection area 204 in the second direction Y, resulting in a first non-detection sub-pattern 3021 extending along the first direction X and with a width in the second direction Y equal to the cutting width W; at this time, the photomask pattern 100 is as follows. Figure 8 As shown.

[0155] As an example, taking graphic data type 0 as input data, a bilateral dimensioning operation is performed on the first boundary 2043 and the second boundary 2044. First, in the first bilateral dimensioning operation, the parameter of the second boundary 2044 is set to -W / 2, and the parameter of the first boundary 2043 is set to -W / 4. Second, in the second bilateral dimensioning operation, the parameter of the second boundary 2044 is set to W / 2, and the parameter of the first boundary 2043 is set to W / 4, resulting in multiple first non-detection sub-graphics 3021, and the corresponding GDS format graphic data dnir1 for the multiple first non-detection sub-graphics 3021. Here, a negative parameter of the boundary indicates that the boundary shrinks inward, and a positive parameter of the boundary indicates that the boundary expands outward.

[0156] like Figures 5-8 As shown, taking the maximum width of the second non-detection pattern as W / 4, the first dimension L1 as W / 4, and the second dimension L2 as W / 2 as an example, the method for obtaining the first non-detection sub-pattern 3021 is illustrated. Based on the pattern data type0, the photomask pattern 100 is determined, and the photomask pattern 100 is as follows... Figure 3 As shown.

[0157] In the first bilateral dimensioning operation, the parameter of the second boundary 2044 is set to -W / 2, and the parameter of the first boundary 2043 is set to -W / 4. This means that in the first direction X, the second boundary 2044 is shrunk inward by a second dimension L2, and in the second direction Y, the first boundary 2043 is shrunk inward by a first dimension L1. After the first bilateral dimensioning operation, the photomask pattern 100 is as follows: Figure 6 As shown.

[0158] In the second bilateral sizing operation, the parameter of the second boundary 2044 is set to W / 2, and the parameter of the first boundary 2043 is set to W / 4. This can be achieved by expanding the second boundary 2044 outward by a second dimension L2 in the first direction X, and expanding the first boundary 2043 outward by a first dimension L1 in the second direction Y. After the second bilateral sizing operation, the photomask pattern 100 and the first non-detection sub-pattern 3021 are as follows: Figure 8 As shown.

[0159] Figure 9 As described in this embodiment of the disclosure Figure 3 The diagram shown is a schematic representation of the photomask pattern after step S3041. Figure 10 As described in this embodiment of the disclosure Figure 9 The diagram shown is a schematic representation of the photomask pattern after step S3021. Figure 11 As described in this embodiment of the disclosure Figure 10 The diagram shown is a schematic representation of the photomask pattern after step S3042. Figure 12 As described in this embodiment of the disclosure Figure 11 The diagram shown is a schematic diagram after step S3022 of the photomask pattern is executed.

[0160] The following description uses the extension direction as the second direction Y, the vertical direction as the first direction X, and the sequence of steps S3021, S3022, S3041, and S3042 as steps S3041, S3021, S3042, and S3022 to illustrate the process of obtaining the second non-detection sub-graphic 3022. Figures 9-12 As shown, at this time, the first boundary line 2043 extends along the second direction Y, and the second boundary line 2044 extends along the first direction X. It can be understood that the first boundary line 2043 is the boundary line extending along the second direction Y corresponding to the non-detection area 204, and the second boundary line 2044 is the boundary line extending along the first direction X corresponding to the non-detection area 204.

[0161] The steps to obtain the second non-detection sub-pattern 3022 include: First, in the first direction X, the first boundary 2043 is shrunk inward by a first dimension L1 to eliminate the portion of the non-detection area 204 whose width in the first direction X is less than the cutting width W; at this time, the photomask pattern 100 is as follows Figure 9 As shown.

[0162] The second step is to shrink the second boundary 2044 inward by a second dimension L2 in the second direction Y, eliminating the portion of the non-detection area 204 extending along the first direction X; at this time, the photomask pattern 100 is as follows. Figure 10 As shown.

[0163] Thirdly, in the first direction X, the first boundary 2043 of the non-detection area 204, which is inwardly contracted by the first dimension L1, is outwardly expanded by the first dimension L1, restoring the width of the non-detection area 204 in the first direction X, that is, restoring the width of the portion of the non-detection area 204 that serves as the second non-detection sub-pattern 3022 to the cutting width W; at this time, the photomask pattern 100 is as follows Figure 11 As shown.

[0164] Fourth step: In the second direction Y, the second boundary 2044 of the non-detection area 204, which is inwardly contracted by the second dimension L2, is outwardly expanded by the second dimension L2, restoring the portion of the non-detection area 204 extending along the second direction Y, resulting in a second non-detection sub-pattern 3022 extending along the second direction Y and having a width in the upper first direction X equal to the cutting width W; at this time, the photomask pattern 100 is as follows Figure 12 As shown.

[0165] As an example, taking graphic data type 0 as input data, a bilateral dimensioning operation is performed on the first boundary 2043 and the second boundary 2044. First, in the first bilateral dimensioning operation, the parameter of the first boundary 2043 is set to -W / 4, and the parameter of the second boundary 2044 is set to -W / 2. Second, in the second bilateral dimensioning operation, the parameter of the first boundary 2043 is set to W / 4, and the parameter of the second boundary 2044 is set to W / 2, resulting in multiple second non-detection sub-graphics 3022, and the corresponding GDS format graphic data dnir2 for the multiple second non-detection sub-graphics 3022. Here, a negative parameter of the boundary indicates that the boundary shrinks inward, and a positive parameter of the boundary indicates that the boundary expands outward.

[0166] like Figures 9-11 As shown, taking the maximum width of the second non-detection pattern as W / 4, the first dimension L1 as W / 4, and the second dimension L2 as W / 2 as an example, the method for obtaining the second non-detection sub-pattern 3022 is illustrated. Based on the pattern data type0, the photomask pattern 100 is determined, and the photomask pattern 100 is as follows... Figure 3 As shown.

[0167] In the first bilateral dimensioning operation, the parameter of the first boundary 2043 is set to -W / 4, and the parameter of the second boundary 2044 is set to -W / 2. This means that in the first direction X, the first boundary 2043 is shrunk inward by a first dimension L1, and in the second direction Y, the second boundary 2044 is shrunk inward by a second dimension L2. After the first bilateral dimensioning operation, the photomask pattern 100 is as follows: Figure 10 As shown.

[0168] In the second bilateral sizing operation, the parameter of the first boundary 2043 is set to W / 4, and the parameter of the second boundary 2044 is set to W / 2. This can be achieved by expanding the first boundary 2043 outward by a first dimension L1 in the first direction X, and expanding the second boundary 2044 outward by a second dimension L2 in the second direction Y. After the second bilateral sizing operation, the photomask pattern 100 and the second non-detection sub-pattern 3022 are as follows: Figure 12 As shown.

[0169] Figure 13 This is the second schematic diagram of the initial photomask pattern in the embodiments of this application. Figure 14 Examples of embodiments in this application Figure 13 A schematic diagram of the corresponding photomask pattern, such as Figure 13 and Figure 14 As shown, as an example, the initial photomask pattern corresponding to the GDS format graphic data L201 is used as input data. The input data is merged (Merge GDS) and enlarged according to a preset value to obtain the GDS format graphic data type1. Based on the graphic data type1, the photomask pattern 100 is determined.

[0170] The preset value is the ratio between the photomask pattern 100 and the initial photomask pattern. For example, the preset value is 4. By magnification, the size of the obtained photomask pattern 100 is the same as that of the actual photomask pattern, and the area information corresponds to the actual photomask pattern.

[0171] It is understood that the first pattern set corresponding to the photomask pattern 100 can be obtained according to the method for obtaining the first pattern set corresponding to the photomask pattern 100 in the above embodiments. As an embodiment, in the first pattern set of the photomask pattern 200, the first non-detectable sub-pattern is the same as the first non-detectable sub-pattern 3021 of the photomask pattern 100, and the second non-detectable sub-pattern is the same as the second non-detectable sub-pattern 3022 of the photomask pattern 100.

[0172] In one embodiment, based on the non-detection area and the first graphic set, multiple second non-detection graphics 304 that satisfy the quadrilateral rule and have a width smaller than the cutting width W are obtained to form a second graphic set, including steps S402-S404.

[0173] S402, perform Boolean operations on the non-detection area 204 and the first graphic set to obtain the second initial graphic set.

[0174] As an example, Boolean operations are performed on the non-detection area 204, the first non-detection sub-graphic 3021, and the second non-detection sub-graphic 3022. That is, the part corresponding to the first non-detection sub-graphic 3021 and the part corresponding to the second non-detection sub-graphic 3022 are removed from the non-detection area 204 respectively. The remaining non-detection area 204 is the second initial graphic set; wherein, the second initial graphic set includes several second initial non-detection graphics.

[0175] Figure 15 Examples of embodiments in this application Figure 3 A schematic diagram of the second initial pattern set corresponding to the photomask pattern shown, as follows: Figure 3 , Figure 8 , Figure 12 and Figure 15 The first non-detection sub-pattern 3021 and the second non-detection sub-pattern 3022 are subtracted from the non-detection area 204 of the photomask pattern 100, and the remaining non-detection area 204 in the photomask pattern 100 is used as the second initial pattern set; wherein, the second initial pattern set includes two second initial non-detection patterns 306 set at intervals.

[0176] Figure 16 Examples of embodiments in this application Figure 13 A schematic diagram of the second initial pattern set corresponding to the photomask pattern shown, as follows: Figure 8 , Figure 12 , Figure 14 and 16 As shown, the first non-detection sub-pattern 3021 and the second non-detection sub-pattern 3022 are subtracted from the non-detection area 204 of the photomask pattern 100, and the remaining non-detection area 204 in the photomask pattern 100 is used as the second initial pattern set; wherein, the second initial pattern set includes one second initial non-detection pattern 306.

[0177] As an example, the graphic data type0, the graphic data dnir1 corresponding to the first non-detected sub-graphic 3021, and the graphic data dnir2 corresponding to the second non-detected sub-graphic 3022 are used as input data. By performing Boolean operations on the graphic data type0, graphic data dnir1, and graphic data dnir2, the second initial graphic set and the graphic data dnir3 corresponding to the second initial graphic set are determined.

[0178] S404, based on the second initial graphic set, obtain the second graphic set.

[0179] like Figure 15 As shown, in some embodiments, a second set of graphics is obtained based on a second initial set of graphics, including: if a second initial non-detection graphic 306 in the second initial set of graphics satisfies the quadrilateral rule, the second initial non-detection graphic 306 is used as a second non-detection graphic 304.

[0180] It can be understood that if any of the second initial undetected graphics 306 in the second initial graphics set is a rectangle and has four endpoints, then the second initial undetected graphics 306 is determined to satisfy the quadrilateral rule and is thus the second undetected graphics 304.

[0181] like Figure 15 As shown, as an example, based on the mask coordinate information of the mask pattern 100 and the second initial pattern set, the first endpoint coordinate information of each endpoint of the second initial non-detection pattern 306 is determined; wherein, the first endpoint coordinate information of multiple endpoints of each second initial non-detection pattern 306 together constitutes a set of coordinate information corresponding to the second initial non-detection pattern 306. For example, based on the reference point O (0,0) of the mask pattern 100 and the second initial pattern set, the first endpoint coordinate information of each endpoint of each second initial non-detection pattern 306 is determined.

[0182] As an example, the first coordinate system of the photomask pattern includes a first coordinate axis and a second coordinate axis that are perpendicular to each other. The reference point O (0,0) of the photomask pattern and the first endpoint coordinate information of the endpoint Q are Q (x01, y01); x01 is the length of the endpoint Q relative to the reference point O on the first coordinate axis, and y01 is the length of the endpoint Q relative to the reference point O on the second coordinate axis.

[0183] Given a set of coordinate information including the coordinate information of four first endpoints, the second initial non-detection graphic 306 corresponding to this set of coordinate information is determined to satisfy the quadrilateral rule and is the second non-detection graphic 304.

[0184] As an example, if all the second initial undetected graphics 306 in the second initial graphics set satisfy the quadrilateral rule, then the second initial graphics set is the second graphics set. For example, Figure 15 The two second initial non-detection graphics 306 each have four endpoints, and the corresponding set of coordinate information each includes the coordinate information of the four first endpoints, satisfying the quadrilateral rule. Both second initial non-detection graphics 306 are second non-detection graphics 304. The graphic data dnir3 in GDS format is the graphic data dnir4 corresponding to the two second non-detection graphics 304. Figure 15 In the diagram, the endpoints are indicated by the dashed origin.

[0185] As an example, taking graphic data dnir1, graphic data dnir2, and graphic data dnir3 as input data, the output is graphic data dnir_sum in GDS format; where dnir_sum = dnir1 + dnir2 + dnir3, the union of graphic data is achieved.

[0186] Secondly, the GDS format graphic data dnir_sum is used as input data to generate a dnir_sum.clib file containing coordinate information; and the dnir_sum.clib file is converted into a dnir_sum.ctxt file that stores coordinate information; the dnir_sum.ctxt file includes multiple sets of coordinate information, each set of coordinate information corresponding to a non-detected graphic, such as the first non-detected sub-graphic, the second non-detected group graphic, and the second non-detected graphic.

[0187] Furthermore, given that each set of coordinate information in the dnir_sum.ctxt file contains four endpoint coordinates (coordinate points), the second initial non-detected graphic 306 in the second initial graphic set is determined to satisfy the quadrilateral rule. The second initial non-detected graphic 306 is the second non-detected graphic 304; the gds format graphic data dnir3 is the graphic data dnir4 corresponding to the second non-detected graphic 304.

[0188] like Figure 16 As shown, in some embodiments, obtaining a second graphic set based on a second initial graphic set further includes: if a second initial non-detection graphic 306 in the second initial graphic set does not satisfy the quadrilateral rule, the second initial non-detection graphic 306 is cut to obtain a second non-detection graphic. By cutting the second initial non-detection graphic 306, a second non-detection graphic that satisfies the quadrilateral rule is obtained.

[0189] In some embodiments, the second initial non-detection pattern 306 is cut to obtain a second non-detection pattern, including steps S502 and S504.

[0190] S502, based on the photomask coordinate information of the photomask pattern and the second initial non-detection pattern, determine the first endpoint coordinate information of each endpoint of the second initial non-detection pattern.

[0191] S504, based on the coordinate information of the first endpoint, the second initial non-detection graphic is cut to obtain multiple second non-detection graphics.

[0192] like Figure 16 As shown, as an example, based on the mask coordinate information of the mask pattern 100 and the second initial non-detection pattern, the first endpoint coordinate information of each endpoint of the second initial non-detection pattern 306 is determined; wherein, the first endpoint coordinate information of multiple endpoints of each second initial non-detection pattern 306 together constitutes a set of coordinate information corresponding to the second initial non-detection pattern 306. For example, based on the reference point O (0,0) of the mask pattern 100, the first endpoint coordinate information of each endpoint of each second initial non-detection pattern 306 is determined.

[0193] When a set of coordinate information includes more than four first endpoint coordinates, the second initial undetected shape 306 corresponding to this set of coordinate information is determined to not satisfy the quadrilateral rule. For example, Figure 16 One of the second initial non-detected graphics 306 includes 12 endpoints, and the corresponding set of coordinate information includes the coordinate information of the 12 first endpoints, which does not satisfy the quadrilateral rule. Figure 16 In the diagram, the endpoints are indicated by the dashed origin.

[0194] Figure 17 For the embodiments of this application Figure 16 The diagram shows the photomask pattern after the second initial non-detection pattern has been cut. (See attached image.) Figure 16 and Figure 17 As an example, based on the coordinate information of the 12 first endpoints in a set of coordinate information of the second initial undetected graphic 306, the second initial undetected graphic 306 is cut into multiple second undetected graphics 304 with 4 endpoints, forming a second graphic set, such as... Figure 17 The second initial undetected graphic 306 is cut into five second undetected graphics 304 with four endpoints, and graphic data dnir4 corresponding to the multiple second undetected graphics 304 are generated.

[0195] As an example, if a set of coordinate information in the dnir_sum.ctxt file includes more than 4 endpoint coordinates (coordinate points), it is determined that the non-detected graphic corresponding to this set of coordinate information does not conform to the quadrilateral rule. For example, this set of coordinate information corresponds to the second initial non-detected graphic 306, and the set of coordinate information is output. The endpoint coordinate information in this set of coordinate information is the first endpoint coordinate information of each endpoint of the second initial non-detected graphic 306.

[0196] Based on the coordinate information of the first endpoints of each endpoint of the second initial undetected graphic 306, the irregular region in the graphic data dnir_sum is located, which is the part corresponding to the second undetected graphic 304; based on the coordinate information of each first endpoint, the second initial undetected graphic 306 is cut to obtain multiple second undetected graphics 304 that satisfy the quadrilateral rule, and multiple second undetected graphics 304 corresponding to the GDS format graphic data dnir4.

[0197] In one embodiment, based on the photomask coordinate information of the photomask pattern 100, the first pattern set, and the second pattern set, the region information of the non-detection area in the photomask pattern is determined, including steps S602 and S604.

[0198] S602, based on the photomask coordinate information, the first graphic set and the second graphic set, determine the second endpoint coordinate information of each endpoint in the first non-detection graphic and the second non-detection graphic.

[0199] As an example, based on the photomask coordinate information, multiple first non-detection sub-patterns 3021, multiple second non-detection sub-patterns 3022, and multiple second non-detection patterns 304, the second endpoint coordinate information of each endpoint of the non-detection area 204 in the photomask pattern is determined.

[0200] As an example, first, take the graphic data dnir1, dnir2, and dnir4 as input data, and output the graphic data dnir_sum1 in GDS format; where dnir_sum1 = dnir1 + dnir2 + dnir4, thus realizing the union of the graphic data.

[0201] Secondly, the GDS format graphic data dnir_sum1 is used as input data to generate a dnir_sum1.clib file containing coordinate information; and the dnir_sum1.clib file is converted into a dnir_sum1.ctxt file storing coordinate information; wherein, the dnir_sum1.ctxt file includes multiple sets of coordinate information, each set of coordinate information corresponding to a non-detected graphic; wherein, the non-detected graphic includes a first non-detected sub-graphic 3021, a second non-detected sub-graphic 3022, and a second non-detected graphic 304; the coordinate information of multiple endpoints (coordinate points) in a set of coordinate information is the second endpoint coordinate information of each endpoint of the corresponding non-detected graphic.

[0202] S604. Based on the photomask coordinate information in the first coordinate system and the detection coordinate information in the second coordinate system, the coordinate information of the second endpoint is transformed from the first coordinate system to the second coordinate system to obtain the region information.

[0203] The detection machine that detects the coordinate information and the photomask pattern corresponds to the detection platform. As an example, the first coordinate system includes two mutually perpendicular coordinate axes: a first coordinate axis and a second coordinate axis. The first coordinate system is a Cartesian coordinate system; where the first coordinate axis is the X-axis and the second coordinate axis is the Y-axis. For example, the second coordinate system is also a Cartesian coordinate system.

[0204] Table 1 shows the correspondence between the photomask image viewpoint and the coordinate information of the coordinate system and the reference point. As shown in Table 1, the viewpoint of the GDS format image data is Cr side down, and the inspection viewpoint of the inspection machine is Cr side up. That is, the photomask coordinate information of the first coordinate system is the reference point O (0,0), and the inspection coordinate information of the second coordinate system is the reference point P (X,Y). Based on the photomask coordinate information of the first coordinate system and the inspection coordinate information of the second coordinate system, the coordinate information of the second endpoint is transformed from the first coordinate system to the second coordinate system to obtain the area information. The area information matches the inspection viewpoint of the inspection machine.

[0205] It is understandable that the viewing angle of the GDS format graphic data can be the viewing angle of the photomask graphic on the photomask, and the detection viewing angle of the inspection machine can be the viewing angle of the photomask graphic set by the inspection machine.

[0206] Table 1

[0207]

[0208] As an example, based on the mask coordinate information of the first coordinate system and the detection coordinate information of the second coordinate system, the coordinate information of the second endpoint is transformed from the first coordinate system to the second coordinate system to obtain the region information, including steps S6041-S6044.

[0209] S6041. Based on the coordinate information of the second endpoint of each endpoint, the initial region information is obtained. The initial region information includes the initial starting point information, initial width information, and initial height information of the non-test graphics in each graphics set.

[0210] As an example, based on the second endpoint coordinate information of each endpoint of any non-detected graphic, the initial starting point information, initial width information, and initial height information corresponding to the non-detected graphic are obtained; wherein, the initial starting point information is the second endpoint coordinate information of one endpoint of the non-detected graphic; the initial width information is the length of the non-detected graphic on the first coordinate axis, denoted by dx0; and the initial height information is the length of the non-detected graphic on the second coordinate axis, denoted by dy0.

[0211] As an example, non-detection pattern 1 is selected from multiple first non-detection sub-patterns 3021, multiple second non-detection sub-patterns 3022, and a second non-detection pattern 304. The four endpoints of non-detection pattern 1 are represented by endpoints Q1, Q2, Q3, and Q4, respectively. Relative to the reference point O (0,0) of the photomask pattern, the second endpoint coordinates of endpoint Q1 are Q1(x11, y11), the second endpoint coordinates of endpoint Q2 are Q2(x11, y12), the second endpoint coordinates of endpoint Q3 are Q3(x12, y12), and the second endpoint coordinates of endpoint Q4 are Q4(x12, y11). Among them, x11 is less than x12, and y11 is less than y12.

[0212] As an example, the initial starting point information is the endpoint Q1 closest to the reference point O (0,0) of the photomask pattern among the four endpoints of the non-detection pattern 1. The coordinate information of the second endpoint of endpoint Q1 is Q1 (x11, y11) as the initial starting point information; dx0 is the difference between x12 and x11, and dy0 is the difference between y12 and y11, that is, dx0 = x12 - x11, dy0 = y12 - y11.

[0213] S6042, the starting point information is obtained based on the initial starting point information, the photomask coordinate information, and the detection coordinate information.

[0214] As an example, the viewing angle of the GDS format graphic data (mask graphic) is Cr side down, and the inspection viewing angle of the inspection machine is Cr side up. Based on the reference point O (0,0) of the mask coordinate information and the reference point P (X,Y) of the inspection coordinate information, a mirror transformation is performed on Q1 (x11, y11) which serves as the initial starting point information. That is, the initial starting point information is symmetrically transformed with the central axis along the Y-axis in the mask where the mask graphic is located as the axis of symmetry to obtain the starting point information.

[0215] S6043, based on the initial width information, the photomask coordinate information, and the detection coordinate information, the width information is obtained.

[0216] Specifically, based on the reference point O (0,0) of the photomask coordinate information and the reference point P (X,Y) of the detection coordinate information, the initial width information dx0 is mirrored. That is, the initial width information dx0 is symmetrically transformed with the central axis along the Y-axis in the photomask containing the photomask pattern as the axis of symmetry to obtain the width information.

[0217] S6044: Based on the initial height information, photomask coordinate information, and detection coordinate information, the height information is obtained.

[0218] Specifically, based on the reference point O (0,0) of the photomask coordinate information and the reference point P (X,Y) of the detection coordinate information, the initial height information dy0 is mirrored. That is, the initial height information dy0 is symmetrically transformed with the central axis along the Y-axis in the photomask containing the photomask pattern as the axis of symmetry to obtain the height information. This includes the area information of the starting point, width, and height, which matches the actual detection angle of the detection machine.

[0219] Figure 18 This is a schematic diagram showing the distribution of the non-detection area of ​​the photomask pattern on the photomask in an embodiment of this application. Figure 18 The photomask coordinate information of the photomask pattern 100 is the reference point O (0,0) at the lower left corner. The detection coordinate information of the detection machine of the photomask pattern 100 is a specific point on the photomask, namely the reference point P (X,Y). The initial area information with the reference point O (0,0) as the origin is converted to obtain the area information with the reference point P (X,Y) as the origin, so that the area information and the detection settings of the detection machine with the reference point P (X,Y) as the detection coordinate information are completely consistent.

[0220] As an example, the size of the photomask pattern is D*D. Taking the central axis along the Y-axis as the axis of symmetry, the initial starting point information Q1(x11, y11), width information dx0, and height information dy0 corresponding to the non-detection pattern 1 are mirrored and transformed to obtain the starting point information Q11(x21, y21), width information dx01, and height information dy02 corresponding to the non-detection pattern 1 with the reference point P(X, Y) as the origin; where x21=DX-x11-dx0, y21= y11, dx01=dx0, and dy02=dy0.

[0221] As an example, the dnir_sum1.ctxt file includes multiple sets of coordinate information. It converts the coordinate information corresponding to each non-inspection graphic into initial starting point information, initial width information, and initial height information for that non-inspection graphic. Based on the photomask coordinate information corresponding to the GDS format graphic data and the detection coordinate information of the inspection machine, it performs coordinate and unit conversion on the initial starting point information, initial width information, and initial height information corresponding to each non-inspection graphic, obtaining the region information corresponding to each non-inspection graphic, and the corresponding dnir_sum1.srs file. Through the conversion of the coordinate perspective and coordinate system information (reference point) corresponding to the photomask graphic viewpoint, the coordinate setting conditions of the dnir_sum1.srs file are made consistent with the parameter settings of the inspection machine, allowing it to be directly read into the inspection machine.

[0222] It is understood that the area information satisfies the requirement of taking Cr side up as the detection perspective, using millimeters as the unit, taking the reference point P(X,Y) as the origin, and including the starting point information, width information, and height information of each first non-detection graphic 302, as well as the starting point information, width information, and height information of each second non-detection graphic 304.

[0223] It is understandable that when the mask coordinate information in the first coordinate system and the detection coordinate information in the second coordinate system are the same, the initial region information is the region information of the non-detection area.

[0224] It is understood that the non-verification area identification method in this application is applicable to photomask platforms of different processes and to CIS products. For common process platforms, photomasks only have a "NO" case, meaning that the photomask pattern does not need to be rotated or mirrored, and the corresponding initial area information is the non-detection area information. For CIS products, there are nine cases: NO, R0MY, R90MY, R180MY, R270MY, R0MX, R90MX, R180MX, and R270MX. R0MY indicates that the non-detection pattern on the photomask pattern is processed by first rotating it counterclockwise by 0 degrees and then mirroring it with the Y-axis as the axis of symmetry. Table 2 shows the area information of the photomask pattern for CIS products in these nine cases.

[0225] Table 2

[0226]

[0227] As an example, given a mask size of D*D, detection coordinates of a CIS product of P(X, Y), initial starting point information for non-detection pattern 1 of Q1(x11, y11), width information dx0, height information dy0, and NO, then x=x11, y=y11, dx=dx0, dy=dy0; and R0MY, then x1=DX-x11-dx0, y1=y11, dx1=dx0, dy1= In the case of R90MY, x2=DY-y11-dy0, y2=DX-x11-dx0, dx2=dy0, dy2=dx0; in the case of R180MY, x3=x11, y3=DY-y11-dy0, dx3=dx0, dy3=dy0; in the case of R270MY, x4=y11, y4=x11, dx4=dy0, dy4=dx0; in the case of R0MX, x5=x11, y5= DY-y11-dy0, dx5=dx0, dy5=dy0; In the case of R90MX, x6=y11, y6=x11, dx6=dy0, dy6=dx0; In the case of R180MX, x7= DX-x11-dx0, y7=y11, dx7=dx0, dy7=dy0; In the case of R270MX, x8=DY-y11-dy0, y8=DX-x11-dx0, dx8=dy0, dy8=dx0; Where x11, y11, dx0 and dy0 are all greater than 0.

[0228] In one embodiment, the method for identifying non-verification areas further includes steps S702-S706.

[0229] S702, based on the area information, determine the graphic coordinate information of the photomask pattern, which includes the coordinate information of the non-detected patterns in each graphic set.

[0230] As an example, the graphic coordinate information of the photomask pattern is determined based on the area information of the non-detection area 204. The graphic coordinate information includes the coordinate information of multiple first non-detection patterns 302 in the first graphic set and the coordinate information of multiple second non-detection patterns 304 in the second graphic set.

[0231] As an example, the dnir_sum1.srs file corresponding to the region information is used as input data and converted into a dnir_sum2.ctxt file. Based on the dnir_sum2.ctxt file, a dnir_sum2.clib file is generated, and based on the dnir_sum2.clib file, a dnir_sum2.db file is generated to obtain the graphic coordinate information of the photomask pattern. The graphic coordinate information includes the coordinates of each endpoint of the first non-detection pattern 302 and the coordinates of each endpoint of the second non-detection pattern 304. The photomask pattern viewpoint corresponding to the coordinate information is Cr side up, and the reference point is P(X, Y). It can be understood that the coordinate information represents the coordinates of each endpoint of the non-detection pattern in each graphic set of the photomask pattern.

[0232] S704. Based on the photomask pattern, the photomask coordinate information in the first coordinate system, and the detection coordinate information in the second coordinate system corresponding to the area information, determine the graphic information corresponding to the non-detection area.

[0233] As an example, the initial mask pattern corresponding to the GDS format image data L200 is used as input data. The input data is magnified according to a preset value to obtain the initial image information 2nd_pattern with a mask pattern viewing angle of Cr side down and a reference point of O(0,0). The initial image information is the image of the non-detection area 204 in the mask pattern, which is used for the secondary exposure of the mask including the mask pattern. According to the mask coordinate information of the first coordinate system and the detection coordinate information of the second coordinate system, the initial image information 2nd_pattern is transformed from the first coordinate system to the second coordinate system to obtain the image information xor_pattern corresponding to the non-detection area. The coordinate information of the non-detection image and the image information xor_pattern corresponding to the non-detection area in each image set have the same mask pattern viewing angle and reference point.

[0234] As an example, when the viewpoint of the mask pattern corresponding to the detection coordinate information in the second coordinate system is Cr side up and the reference point is P(X,Y), the initial pattern information 2nd_pattern is mirrored using the central axis along the Y-axis in the mask where the mask pattern is located as the axis of symmetry, and the pattern information xor_pattern corresponding to the mask pattern is obtained.

[0235] As an example, the initial graphic information 2nd_pattern can be rotated and mirrored according to the processing method of non-detection patterns in the photomask pattern to obtain graphic information xor_pattern. The recognition method for non-verification areas has a high usage rate.

[0236] S706, under the condition that the coordinate information and graphic information meet the preset conditions, the area information is accurately determined.

[0237] As an example, under the condition that the coordinate information and graphic information meet the preset conditions, the accuracy of the area information is determined, including: performing an XOR operation on the coordinate information and graphic information corresponding to the same photomask graphic to obtain the calculated graphic; under the condition that the transmittance of the calculated graphic is zero, the preset conditions are met between the coordinate information and graphic information, that is, the coordinate information and graphic information match, and the area information is accurate, which can be used by the detection machine to detect the photomask graphic.

[0238] As an example, an XOR operation is performed on dnir_sum2.db and xor_pattern, and the result of the XOR operation, xor_result, is output. If xor_result does not correspond to the actual graphic, it is determined that the transmittance of the graphic is zero, the coordinate information and the graphic information meet the preset conditions, and the area information is accurate.

[0239] In one embodiment, the method for identifying non-verified areas further includes: determining that the area information is inaccurate when the coordinate information and graphic information do not meet preset conditions; and repeating the steps of determining each graphic set and area information until the coordinate information and graphic information meet preset conditions.

[0240] As an example, when xor_result corresponds to a real image, if the transmittance of the processed image is not zero, the coordinate information and image information do not meet the preset conditions, and the region information is inaccurate, the step of determining the region information needs to be repeated until the coordinate information and image information meet the preset conditions and the region information is accurate. This method ensures the correctness of the region information, the correctness of the division between the first and second non-detected images, improves the accuracy and reliability of the non-detection area identification method, and achieves the highest detection accuracy for the non-detection area.

[0241] In one embodiment, the method for identifying non-verification areas further includes: verifying the pattern of the photomask to be tested based on the area information.

[0242] It should be understood that, although Figure 1 and Figure 4 The steps in the flowchart are shown sequentially as indicated by the arrows, but these steps are not necessarily executed in the order indicated by the arrows. Unless otherwise specified herein, there is no strict order in which these steps are executed, and they can be performed in other orders. Figure 1 and Figure 4At least some of the steps in the process may include multiple sub-steps or multiple stages. These sub-steps or stages are not necessarily completed at the same time, but can be executed at different times. The execution order of these sub-steps or stages is not necessarily sequential, but can be executed in turn or alternately with other steps or at least some of the sub-steps or stages of other steps.

[0243] Based on the same inventive concept, this application also provides a non-inspection area identification system. The solution provided by this identification system is similar to the solution described in the above-mentioned non-inspection area identification method. The parts that are the same as or corresponding to the embodiments in the above-mentioned non-inspection area identification method will not be described in detail below.

[0244] Figure 19 This is a schematic diagram of the structure of the identification system for the non-inspection area in an embodiment of this application. See also... Figure 19 In this embodiment, a non-inspection area identification system is provided, including: an acquisition module 402, a calculation module 404, and a conversion module 406.

[0245] The acquisition module 402 is used to determine the photomask pattern, which includes a cut-out pattern and non-detection areas of varying widths. As an example, the acquisition module 402 is used to input the initial photomask pattern's corresponding GDS format image data L200, perform a merge operation on the data (Merge GDS), and enlarge it according to a preset value to obtain GDS format image data type 0; it is also used to determine the photomask pattern based on image data type 0.

[0246] The calculation module 404 is connected to the acquisition module 402 and is used to divide the non-detection area into multiple preset rule graphics that satisfy the quadrilateral rule to obtain a first graphic set and a second graphic set; the first graphic set includes a first non-detection graphic with a width equal to the width of the cutting track graphic, and the second graphic set includes a second non-detection graphic with a width less than the width of the cutting track.

[0247] The conversion module 406 is connected to the calculation module 404 and is used to determine the region information of the non-detection area in the photomask pattern based on the photomask coordinate information, the first non-detection pattern, and the second non-detection pattern; the region information includes the starting point information, width information, and height information of the non-detection patterns in each pattern set.

[0248] In the aforementioned non-inspection area recognition system, the computation module 404 divides the non-inspection area in the cutting pattern into preset regular graphics that satisfy the quadrilateral rule, resulting in a first set of graphics including a first non-inspection graphic with a width equal to the cutting width, and a second set of graphics including a second non-inspection graphic with a width less than the cutting width. This accurately identifies non-inspection areas with irregular sizes and shapes, completing the precise division of non-inspection areas and generating non-inspection graphics with different widths. The conversion module 406, based on the photomask coordinate information, the first set of graphics, and the second set of graphics, determines the region information of the non-inspection area in the photomask pattern. The region information includes the starting point information, width information, and height information of each non-inspection graphic. The recognition of non-inspection areas is accurate and reliable. During the process of the inspection machine inspecting the photomask corresponding to the photomask pattern according to the region information, it can accurately avoid non-inspection areas, improving the efficiency and accuracy of photomask inspection. Furthermore, the non-inspection area recognition system in this application meets the photomask inspection needs of various scenarios and is applicable to the recognition of non-inspection areas in photomask production inspection processes of various manufacturing processes. In practical applications, the photomask inspection accuracy reaches 100%.

[0249] This disclosure also provides a computer device, including a memory and a processor, wherein the memory stores a computer program, and the processor executes the computer program to implement the steps of the above-described method for identifying non-inspection areas.

[0250] This disclosure also provides a computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, implements the steps of the above-described method for identifying non-inspection areas.

[0251] Those skilled in the art will understand that all or part of the processes in the methods of the above embodiments can be implemented by a computer program instructing related hardware. The computer program can be stored in a non-volatile computer-readable storage medium, and when executed, it can include the processes of the embodiments of the methods described above. Any references to memory, storage, databases, or other media used in the embodiments provided in this application can include at least one of non-volatile and volatile memory. Non-volatile memory can include read-only memory (ROM), magnetic tape, floppy disk, flash memory, or optical storage, etc. Volatile memory can include random access memory (RAM) or external cache memory. By way of illustration and not limitation, RAM can be in various forms, such as static random access memory (SRAM) or dynamic random access memory (DRAM), etc.

[0252] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0253] The above-described embodiments are merely illustrative of several implementation methods of the embodiments of this application, and their descriptions are relatively specific and detailed, but they should not be construed as limiting the scope of the invention patent. It should be noted that those skilled in the art can make several modifications and improvements without departing from the concept of the embodiments of this application, and these all fall within the protection scope of the embodiments of this application.

Claims

1. A method for identifying non-detection areas, characterized in that, include: Determine the photomask pattern, which includes a cutout pattern, and the cutout pattern includes non-detection areas of different widths; The non-detection area is divided into multiple preset rule patterns that satisfy the rectangular rule, resulting in a first pattern set and a second pattern set; Based on the photomask coordinate information, the first set of graphics, and the second set of graphics, the region information of the non-detection area in the photomask pattern is determined. The region information includes the starting point information, width information, and height information of the non-detection graphics in each set of graphics. The first graphic set includes a first non-detected graphic whose width is equal to the width of the cutting path graphic, and the second graphic set includes a second non-detected graphic whose width is less than the width of the cutting path graphic.

2. The identification method according to claim 1, characterized in that, The step of dividing the non-detection area into multiple preset rule shapes that satisfy the quadrilateral rule, to obtain a first shape set and a second shape set, includes: The non-detection area is sized, and the portion of the non-detection area whose width is less than the width of the cutting channel is eliminated, resulting in multiple first non-detection graphics that satisfy the quadrilateral rule and whose width is equal to the width of the cutting channel, forming the first graphic set; Based on the non-detection area and the first graphic set, multiple second non-detection graphics that satisfy the quadrilateral rule and have a width smaller than the width of the cutting channel are obtained, forming the second graphic set.

3. The identification method according to claim 2, characterized in that, The step involves performing dimensional calculations on the non-detection area to eliminate portions of the non-detection area whose width is less than the width of the cutting track, resulting in multiple first non-detection graphics that satisfy the quadrilateral rule and have a width equal to the width of the cutting track, forming the first graphic set, including: Size calculations are performed on the non-detection area in both the extension direction and the vertical direction to eliminate the portion of the non-detection area whose width is less than the width of the cutting channel in both the extension direction and the vertical direction, resulting in multiple first non-detection graphics that satisfy the quadrilateral rule and whose width is equal to the width of the cutting channel, forming the first graphic set; Wherein, the extending direction and the vertical direction intersect.

4. The identification method according to claim 3, characterized in that, The first non-detection pattern includes a first non-detection sub-pattern and a second non-detection sub-pattern, wherein the first non-detection sub-pattern extends along a first direction and the second non-detection sub-pattern extends along a second direction perpendicular to the first direction. The non-detection area is sized in both the extension and vertical directions to eliminate portions of the non-detection area whose width is less than the cutting width in both directions, resulting in multiple first non-detection patterns that satisfy quadrilateral rules and have a width equal to the cutting width, including: In the extending direction, a second dimension calculation is performed on the non-detection area to eliminate the portion of the non-detection area extending along the vertical direction; In the vertical direction, a first dimension calculation is performed on the non-detection area to eliminate the portion of the non-detection area whose width in the vertical direction is less than the width of the cutting channel; Wherein, if the second dimension is larger than the first dimension, the extension direction is the first direction, and the vertical direction is the second direction, the first non-detection sub-shape is obtained; if the extension direction is the second direction and the vertical direction is the first direction, the second non-detection sub-shape is obtained.

5. The identification method according to claim 4, characterized in that, The non-detection area includes a first boundary line extending along the extension direction and a second boundary line extending along the vertical direction; The step of performing a second-dimensional dimensional calculation on the non-detection area in the extending direction to eliminate the portion of the non-detection area extending along the vertical direction includes: In the extending direction, the second boundary is reduced inward by the second dimension to eliminate the portion of the non-detection area extending along the vertical direction; In the extending direction, the second boundary of the non-detection area that is inwardly recessed by the second dimension is expanded outward by the second dimension, restoring the portion of the non-detection area that extends along the extending direction; The step of performing a first-dimensional dimensional calculation on the non-detection area in the vertical direction to eliminate portions of the non-detection area whose width in the vertical direction is less than the width of the cutting channel includes: In the vertical direction, the first boundary is reduced inward by the first dimension to eliminate the portion of the non-detection area whose width in the vertical direction is less than the width of the cutting channel; In the vertical direction, the first boundary of the non-detection area, which is inwardly recessed by the first size, is outwardly expanded by the first size, restoring the width of the non-detection area in the vertical direction.

6. The identification method according to claim 2, characterized in that, Based on the non-detection area and the first graphic set, multiple second non-detection graphics that satisfy the quadrilateral rule and have a width smaller than the cutting width are obtained, forming the second graphic set, including: Boolean operations are performed on the non-detection area and the first graphic set to obtain a second initial graphic set; The second set of graphics is obtained based on the second initial set of graphics.

7. The identification method according to claim 6, characterized in that, The process of obtaining the second graphics set based on the second initial graphics set includes: If a second initial non-detected graphic in the second initial graphic set satisfies the quadrilateral rule, then the second initial non-detected graphic is used as the second non-detected graphic.

8. The identification method according to claim 6, characterized in that, The process of obtaining the second graphics set based on the second initial graphics set further includes: If the second initial undetected graphic in the second initial graphic set does not satisfy the quadrilateral rule, the second initial undetected graphic is cut to obtain the second undetected graphic.

9. The identification method according to claim 8, characterized in that, The step of cutting the second initial non-detection graphic to obtain the second non-detection graphic includes: Based on the photomask coordinate information of the photomask pattern and the second initial non-detection pattern, determine the first endpoint coordinate information of each endpoint of the second initial non-detection pattern; Based on the first endpoint coordinate information, the second initial non-detection graphic is cut to obtain multiple second non-detection graphics.

10. The identification method according to claim 1, characterized in that, The determination of the non-detection area information in the photomask pattern based on the photomask coordinate information, the first pattern set, and the second pattern set includes: Based on the photomask coordinate information, the first graphic set, and the second graphic set, determine the second endpoint coordinate information of each endpoint in the first non-detection graphic and the second non-detection graphic; Based on the photomask coordinate information in the first coordinate system and the detection coordinate information in the second coordinate system, the coordinate information of the second endpoint is transformed from the first coordinate system to the second coordinate system to obtain the area information; wherein, the detection coordinate information corresponds to the detection machine.

11. The identification method according to claim 10, characterized in that, The step of converting the coordinate information of the second endpoint from the first coordinate system to the second coordinate system based on the photomask coordinate information in the first coordinate system and the detection coordinate information in the second coordinate system to obtain the region information includes: Based on the coordinate information of the second endpoint of each endpoint, the initial region information is obtained. The initial region information includes the initial starting point information, initial width information, and initial height information of the non-detected graphics in each graphics set. The starting point information is obtained based on the initial starting point information, the photomask coordinate information, and the detection coordinate information; The width information is obtained based on the initial width information, the photomask coordinate information, and the detection coordinate information; The height information is obtained based on the initial height information, the photomask coordinate information, and the detection coordinate information.

12. The identification method according to claim 1, characterized in that, The identification method further includes: Based on the region information, the graphic coordinate information of the photomask pattern is determined, and the graphic coordinate information includes the coordinate information of non-detected patterns in each graphic set; Based on the photomask pattern, the photomask coordinate information in the first coordinate system, and the detection coordinate information in the second coordinate system corresponding to the region information, the graphic information corresponding to the non-detection area is determined; If the coordinate information and the graphic information meet preset conditions, the accuracy of the region information is determined.

13. The identification method according to claim 12, characterized in that, Determining the accuracy of the region information when a preset condition is met between the coordinate information and the graphic information includes: Perform an XOR operation on the coordinate information and the graphic information to obtain the calculated graphic; When the transmittance of the calculated graphic is zero, it is determined that the coordinate information and the graphic information satisfy a preset condition.

14. The identification method according to claim 12, characterized in that, The identification method further includes: If the preset conditions are not met between the coordinate information and the graphic information, the region information is determined to be inaccurate. Repeat the steps of determining each graphic set and region information until the coordinate information and the graphic information meet the preset conditions.

15. The identification method according to claim 1, characterized in that, The identification method further includes: The pattern of the photomask to be tested is verified based on the area information.

16. A recognition system for non-detection areas, characterized in that, include: An acquisition module is used to determine a photomask pattern, the photomask pattern including a cut-out pattern, the cut-out pattern including non-detection areas of different widths; The calculation module, connected to the acquisition module, is used to divide the non-detection area into multiple preset rule graphics that satisfy the quadrilateral rule, to obtain a first graphic set and a second graphic set; the first graphic set includes a first non-detection graphic with a width equal to the width of the cutting track graphic, and the second graphic set includes a second non-detection graphic with a width less than the width of the cutting track. A conversion module, connected to the computing module, is used to determine the region information of the non-detection area in the photomask pattern based on the photomask coordinate information of the photomask pattern, the first non-detection pattern, and the second non-detection pattern; The region information includes the starting point, width, and height information of the non-detected graphics in each graphics set.

17. A computer device comprising a memory and a processor, wherein the memory stores a computer program, characterized in that, When the processor executes the computer program, it implements the steps of the non-detection area identification method according to any one of claims 1 to 15.

Images