Ultra-wideband metamaterial wave absorber based on four-quadrant heterogeneous coupling

Abstract

The invention relates to the technical field of electromagnetic wave absorption and metamaterials, in particular to an ultra wide band metamaterial wave absorber based on four-quadrant heterogeneous coupling. The dielectric layer is arranged at the upper end of the metal bottom plate; the metasurface resonance layer is installed at the upper end of the dielectric layer, the metasurface resonance layer is composed of a ceramic substrate and a plurality of resistive films, each resistive film is of a central symmetry structure, the ceramic substrate is arranged at the upper end of the dielectric layer, and the upper end of the ceramic substrate is coated with the resistive films in a silk-screen printing mode; and the protection layer is arranged at the upper end of the metasurface resonance layer, and the design realizes excitation of electromagnetic resonance at adjacent frequency points through resonance structures with different geometrical shapes and sizes, so that coupling and fusion of multiple resonance peaks are formed, and a continuous ultra-wide absorption band is formed in an X-Ku broadband.

Description

TECHNICAL FIELD

[0001] The application is a kind of ultra-wideband metamaterial wave absorber based on four-quadrant heterogeneous coupling, belonging to the technical field of electromagnetic wave absorption and metamaterials. BACKGROUND

[0002] With the development of 5G technology, the working frequency and integration of electronic devices are continuously improved, and electromagnetic interference (EMI) problems are increasingly prominent, which seriously affect signal quality and signal integrity. Currently, the solutions to EMI problems are mainly divided into two categories: reflection suppression and absorption suppression; The reflection suppression scheme is realized by sputtering or electroplating a thin metal layer on the radiation unit, but it has the defects of high cost and easy to cause electromagnetic wave reflection in the package, thereby causing electromagnetic interference problems. The absorption suppression scheme absorbs incident electromagnetic waves to avoid reflection and transmission, which is more conducive to improving signal integrity. Among them, the metamaterial absorber (MMA) has become a research hotspot due to its thin thickness, high absorption rate, and adjustable resonance frequency. However, the existing metamaterial absorber has the problems of large unit size, narrow bandwidth, and poor incident angle stability. Moreover, most metamaterial absorbers are prone to impedance mismatch and frequency shift when the incident angle of electromagnetic waves increases. Therefore, it is of great significance to develop a miniaturized, ultra-wideband, high-absorption-rate, and angle-stable metamaterial wave absorber. SUMMARY

[0003] In view of the problems in the prior art, the application provides an ultra-wideband metamaterial wave absorber based on four-quadrant heterogeneous coupling.

[0004] The technical scheme adopted by the application to solve the technical problems is: An ultra-wideband metamaterial wave absorber based on four-quadrant heterogeneous coupling, comprising: a metal base plate; a dielectric layer arranged on the upper end of the metal base plate; a metasurface resonance layer installed on the upper end of the dielectric layer, the metasurface resonance layer is composed of a ceramic substrate and a plurality of resistance films, each resistance film has a center-symmetric structure, the ceramic substrate is arranged on the upper end of the dielectric layer, and the plurality of resistance films are coated on the upper end of the ceramic substrate by screen printing; a protective layer arranged on the upper end of the metasurface resonance layer.

[0005] Further, the protective layer is made of a transparent material member, and the metal base plate is made of a copper plate.

[0006] Further, the resistance film is made of resistance ink with a square resistance of 20-180Ω / sq. Rs Further, the resistance film is made of resistance ink with a square resistance of 20-180Ω / sq.

[0007] Further, the resistance film comprises a first quadrant, a second quadrant, a third quadrant and a fourth quadrant, which are uniformly arranged on the upper end of the ceramic substrate, the shapes of the first quadrant, the second quadrant, the third quadrant and the fourth quadrant are axisymmetric figures, and the shapes of the first quadrant, the second quadrant, the third quadrant and the fourth quadrant are different.

[0008] Further, the first quadrant, the second quadrant, the third quadrant and the fourth quadrant are one of circular, annular structure, square structure and square ring structure.

[0009] Further, the medium of the medium layer is one or more of aluminum oxide, silicon dioxide, silicon carbide and foam medium material.

[0010] Further, the relative dielectric constant of the medium layer is 4.0-10.0, the loss tangent value is 0.0001-0.001, and the thickness h is 1.0-8.0mm.

[0011] Further, the thickness of the ceramic substrate is 2.0-5.0mm.

[0012] Further, the lower end of the protective layer is provided with a shielding layer, the shielding layer is made of resistance ink, the shielding layer has a net structure, the shielding layer is located directly above the gap formed by the first quadrant, the second quadrant, the third quadrant and the fourth quadrant, the independent line size of the shielding layer is greater than the gap size, the lower end of the shielding layer is provided with a transparent layer, the transparent layer is installed on the upper end of the resistance film, and the transparent layer is made of a transparent material.

[0013] The beneficial effects of the present application are: The resistance film is made of resistance ink and comprises the first quadrant, the second quadrant, the third quadrant and the fourth quadrant, and the shapes of the first quadrant, the second quadrant, the third quadrant and the fourth quadrant are different, so that a plurality of different resonant structures are formed in a single resistance film, electromagnetic resonance is excited at adjacent frequency points through resonant structures with different geometric shapes and sizes, and coupling and fusion of multiple resonant peaks are formed, so that a continuous ultra-wide absorption band is formed in the wide frequency band of X-Ku. BRIEF DESCRIPTION OF DRAWINGS

[0014] Other features, objects and advantages of the present application will become more apparent from the following detailed description of non-limiting embodiments, read in conjunction with the accompanying drawings: Figure 1 The structure of the present application is a four-quadrant isomerization coupling-based ultra-wideband metamaterial wave absorber. Figure 2This is a schematic diagram of the metasurface resonant layer in an ultrawideband metamaterial absorber based on four-quadrant heterogeneous coupling according to the present invention. Figure 3 This is an assembly diagram of the transparent layer and the shielding layer in an ultrawideband metamaterial absorber based on four-quadrant heterogeneous coupling according to the present invention. Figure 4 The present invention provides the reflection coefficient and absorptivity curves of an ultrawideband metamaterial absorber based on four-quadrant heterogeneous coupling within the frequency band.

[0015] In the picture: 1. Metal base plate; 2. Dielectric layer; 3. Metasurface resonant layer; 31. First quadrant; 32. Second quadrant; 33. Ceramic substrate; 34. Third quadrant; 35. Fourth quadrant; 36. Transparent layer; 37. Masking layer. 4. Protective layer. Detailed Implementation

[0016] To make the technical means, creative features, objectives and effects of this invention easier to understand, the invention will be further described below in conjunction with specific embodiments.

[0017] Example 1, as Figure 1 , Figure 2 and Figure 4 As shown, an ultrawideband metamaterial absorber based on four-quadrant heterogeneous coupling is provided, including: a metal base plate 1 made of copper plate, the function of which is to block electromagnetic wave transmission, so that the transmission coefficient of the absorber S21≈0, thereby achieving perfect absorption A=1-|S11|²; a dielectric layer 2 with a relative permittivity of 4.0~10.0, a loss tangent of 0.0001~0.001, and a thickness h of 1.0~8.0mm is disposed on the upper end of the metal base plate 1, and the dielectric of the dielectric layer 2 is one or more of alumina, silicon dioxide, silicon carbide, and foam dielectric materials. Through the dielectric layer 2, the metasurface resonant layer 3 can be supported, and it can also participate in the overall electromagnetic resonance and control the impedance matching. A ceramic substrate 33 with a thickness of 2.0~5.0mm is disposed on the upper end of the dielectric layer 2. The ceramic substrate 33 provides a base for the resistive thin film. Multiple resistive thin films with a centrally symmetrical structure are screen-printed onto the upper end of the ceramic substrate 33. The resistive thin films composed of the first quadrant 31, the second quadrant 32, the third quadrant 34, and the fourth quadrant 35 are all sheet resistors. Rs It is made of resistive ink with a resistance of 20~180Ω / sq. It utilizes a resistive thin film to allow electromagnetic waves to be incident on the surface of the metamaterial and generate resonance. Quadrants 31, 32, 34, and 35 are uniformly disposed on the upper end of ceramic substrate 33. The shapes of Quadrants 31, 32, 34, and 35 are all axially symmetric. Quadrant 31 is a ring structure with an outer radius of 2.0~4.5mm and an inner radius of 1.5~4.0mm. Quadrant 32 is a square structure with a length of 2.5~5.0mm and a width of 2.0~4.5mm. Quadrant 34 is a circular structure with a radius of 1.5~3.5mm. Quadrant 35 is a square ring structure with a side length of 3.0~5.0mm. The shapes of Quadrants 31, 32, 34, and 35 include, but are not limited to, one or more of the following: triangle, square, regular hexagon, arc, circle, ring, and strip. The resistance values ​​of the resistive films may be the same or different. A protective layer 4 made of transparent material is placed on the upper end of the structure formed by multiple resistive films. The protective layer 4 protects the multiple resistive films on the one hand, and ensures transparency on the other.

[0018] In the fabrication process, a ceramic substrate 33 with a thickness of 2.0~5.0mm is first selected. Resistive ink is uniformly coated on the surface by screen printing, so that the surface structure is divided into four quadrants with the following structural parameters: the structure of the first quadrant 31 is a ring structure with an outer radius of 2.0~4.5mm and an inner radius of 1.5~4.0mm; the structure of the second quadrant 32 is a square structure with a length of 2.5~5.0mm and a width of 2.0~4.5mm; the structure of the third quadrant 34 is a circular structure with a radius of 1.5~3.5mm; and the structure of the fourth quadrant 35 is a square ring structure with a side length of 3.0~5.0mm. Then, the protective layer 4 is installed on the upper end of the resistive film formed by the first quadrant 31, the second quadrant 32, the third quadrant 34, and the fourth quadrant 35 to obtain a semi-finished product. The semi-finished product is then cut to obtain a 180mm×180mm metamaterial absorber. When electromagnetic waves are incident on the metamaterial absorber, the electromagnetic waves penetrate the protective layer 4 and irradiate the resistive film. The resistive film is composed of the first quadrant 31, the second quadrant 32, the third quadrant 34, and the fourth quadrant 35, and the shapes of the first quadrant 31, the second quadrant 32, the third quadrant 34, and the fourth quadrant 35 are different. This allows multiple resonant structures of different shapes to be formed within a single resistive film, which respectively regulate their electromagnetic response in different frequency bands. The geometric dimensions of each structure determine its resonant frequency. Through different pattern size designs, these four resonant frequency points are made close to each other and continuous, exciting multiple mutually coupled resonant peaks in the 8.0–18.0 GHz frequency band, which are finally merged into a flat and continuous broadband absorption spectrum. When electromagnetic waves irradiate the resistive film, the current paths in the first quadrant 31, the second quadrant 32, the third quadrant 34, and the fourth quadrant 35 are all excited, generating strong local electromagnetic resonances, thus producing extremely high electromagnetic responses near the resonant frequency. Simultaneously, the ohmic loss of the resistive ink and the synergistic effect of electromagnetic resonance efficiently convert electromagnetic energy into heat energy and other forms of energy dissipation, while the metal substrate 1 ensures zero transmission of electromagnetic waves. This, in turn, achieves efficient energy conversion through multiple physical mechanisms such as conductive loss and multiple reflections from the resonant cavity. By using resonant structures of different geometries and sizes to excite electromagnetic resonance at adjacent frequency points, the coupling and fusion of multiple resonant peaks are formed, thereby creating a continuous ultra-wide absorption band in the wide frequency range of X ~ Ku. At the same time, through the synergistic effect of resistive loss and resonant loss, broadband energy dissipation is enhanced, achieving high broadband and high absorption performance in thin thickness. As a result, the metamaterial absorber of this invention has the advantages of miniaturization, ultra-wide bandwidth, and high absorption rate. The fabrication process is simple and suitable for industrial applications.

[0019] Example 2, as Figures 1-4 As shown, a shielding layer 37 made of resistive ink is installed on the lower end of the protective layer 4. The shielding layer 37 has a mesh structure and is located directly above the gap formed between the first quadrant 31, the second quadrant 32, the third quadrant 34, and the fourth quadrant 35. The independent line size of the shielding layer 37 is larger than the gap size. The shielding layer blocks the gap formed between the first quadrant 31, the second quadrant 32, the third quadrant 34, and the fourth quadrant 35. A transparent layer 36 made of transparent material is then placed on the lower end of the shielding layer 37. A structure formed by multiple resistive films is placed on the lower end of the transparent layer 36. The transparent layer provides a processing carrier for the shielding layer and ensures transparency.

[0020] In the fabrication process, a ceramic substrate 33 with a thickness of 2.0~5.0mm is first selected. Resistive ink is uniformly coated on the surface by screen printing, so that the surface structure is divided into four quadrants with the following structural parameters: the structure of the first quadrant 31 is a ring structure with an outer radius of 2.0~4.5mm and an inner radius of 1.5~4.0mm; the structure of the second quadrant 32 is a square structure with a length of 2.5~5.0mm and a width of 2.0~4.5mm; the structure of the third quadrant 34 is a circular structure with a radius of 1.5~3.5mm; and the structure of the fourth quadrant 35 is a square ring structure with a side length of 3.0~5.0mm. Then, the transparent layer 36 is installed on the upper end of the resistive film formed by the first quadrant 31, the second quadrant 32, the third quadrant 34 and the fourth quadrant 35. Then, calculations are performed and a mesh-like shielding layer 37 is processed on the upper end of the transparent layer 36 by printing resistive ink. The independent line size of the shielding layer 37 is larger than the size of the gap formed between the first quadrant 31, the second quadrant 32, the third quadrant 34 and the fourth quadrant 35. Then, the protective layer 4 is installed on the upper surface of the shielding layer 37 to obtain a semi-finished product. The semi-finished product is then cut to obtain a 180mm×180mm metamaterial absorber. When electromagnetic waves are incident on the metamaterial absorber, they penetrate the protective layer 4 and the transparent layer 36 and irradiate the resistive film. The resistive film is composed of the first quadrant 31, the second quadrant 32, the third quadrant 34, and the fourth quadrant 35. The shapes of the first quadrant 31, the second quadrant 32, the third quadrant 34, and the fourth quadrant 35 are different, thus forming multiple resonant structures of different shapes within a single resistive film. The electromagnetic response of each structure is controlled in different frequency bands. The geometric dimensions of each structure determine its resonant frequency. Through different pattern size designs, these four resonant frequency points are made close to each other and continuous, exciting multiple mutually coupled resonant peaks in the 8.0–18.0 GHz frequency band, which are finally merged into a flat and continuous broadband absorption spectrum. When electromagnetic waves irradiate the resistive film, the current paths in the first quadrant 31, the second quadrant 32, the third quadrant 34, and the fourth quadrant 35 are all excited, generating strong local electromagnetic resonances, thus producing extremely high electromagnetic responses near the resonant frequency. Simultaneously, the ohmic loss of the resistive ink and the synergistic effect of electromagnetic resonance efficiently convert electromagnetic energy into heat energy and other forms of energy dissipation, while the metal substrate 1 ensures zero transmission of electromagnetic waves. This, in turn, achieves efficient energy conversion through multiple physical mechanisms such as conductive loss and multiple reflections from the resonant cavity. When a portion of the electromagnetic wave is located between the gaps formed by the first quadrant 31, the second quadrant 32, the third quadrant 34, and the fourth quadrant 35, during the electromagnetic wave irradiation process, this portion of the electromagnetic wave will irradiate the shielding layer 37. At this time, the resistive ink on the shielding layer 37 will cause ohmic loss to the electromagnetic wave, and then work together with the dielectric loss of the dielectric layer 2 to convert the electromagnetic energy of this portion into heat energy and dissipate it.

[0021] Although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole. The technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. An ultrawideband metamaterial absorber based on four-quadrant heterogeneous coupling, characterized in that, include: Metal base plate (1); The dielectric layer (2) is disposed on the upper end of the metal base plate (1); A metasurface resonant layer (3) is installed on the upper end of the dielectric layer (2). The metasurface resonant layer (3) is composed of a ceramic substrate (33) and multiple resistive films. Each resistive film has a centrally symmetrical structure. The ceramic substrate (33) is disposed on the upper end of the dielectric layer (2). Multiple resistive films are coated on the upper end of the ceramic substrate (33) by screen printing. A protective layer (4) is disposed on the upper end of the metasurface resonant layer (3).

2. The ultrawideband metamaterial absorber based on four-quadrant heterogeneous coupling according to claim 1, characterized in that: The protective layer (4) is made of a transparent material component, and the metal base plate (1) is made of a copper plate.

3. The ultrawideband metamaterial absorber based on four-quadrant heterogeneous coupling according to claim 1, characterized in that: The resistive film is a sheet resistor. Rs It is made from resistive ink with a resistance of 20~180Ω / sq.

4. The ultrawideband metamaterial absorber based on four-quadrant heterogeneous coupling according to claim 3, characterized in that: The resistive film includes a first quadrant (31), a second quadrant (32), a third quadrant (34), and a fourth quadrant (35). The first quadrant (31), the second quadrant (32), the third quadrant (34), and the fourth quadrant (35) are uniformly disposed on the upper end of the ceramic substrate (33). The shapes of the first quadrant (31), the second quadrant (32), the third quadrant (34), and the fourth quadrant (35) are all axisymmetric, and the shapes of the first quadrant (31), the second quadrant (32), the third quadrant (34), and the fourth quadrant (35) are all different.

5. The ultrawideband metamaterial absorber based on four-quadrant heterogeneous coupling according to claim 4, characterized in that: The first quadrant (31), the second quadrant (32), the third quadrant (34), and the fourth quadrant (35) are each one of a circular, ring, square, and square-ring structure.

6. The ultrawideband metamaterial absorber based on four-quadrant heterogeneous coupling according to claim 1, characterized in that: The medium of the medium layer (2) is one or more of aluminum dioxide, silicon dioxide, silicon carbide, and foam medium materials.

7. The ultrawideband metamaterial absorber based on four-quadrant heterogeneous coupling according to claim 6, characterized in that: The dielectric layer (2) has a relative permittivity of 4.0 to 10.0, a loss tangent of 0.0001 to 0.001, and a thickness h of 1.0 to 8.0 mm.

8. The ultrawideband metamaterial absorber based on four-quadrant heterogeneous coupling according to claim 1, characterized in that: The ceramic substrate (33) has a thickness of 2.0~5.0 mm.

9. The ultrawideband metamaterial absorber based on four-quadrant heterogeneous coupling according to claim 4, characterized in that: The lower end of the protective layer (4) is fitted with a shielding layer (37), which is made of resistive ink. The shielding layer (37) has a mesh structure and is located directly above the gap formed between the first quadrant (31), the second quadrant (32), the third quadrant (34), and the fourth quadrant (35). The independent line size of the shielding layer (37) is larger than the gap size. A transparent layer (36) is provided at the lower end of the shielding layer (37). The transparent layer (36) is installed on the upper end of the resistive film and is made of transparent material components.

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